(US4937129-A)      Thin film pattern is formed on a glass substrate on which a Si oxide ion blocking film is formed then transparent conductive film of eg Su oxide. A laser beam is repeatedly projected on the substrate in the form of pulses, to form grooves. The residue left in an around the grooves is selectively removed by an acid, followed by cleaning. A second blocking film of organic resin is formed on the substrate over the grooves.    USE/ADVANTAGE -   Liq. crystal devices, avoiding contamination by Na ions from the substrate. @(6pp)    (JP94045483-B2)      A thin-film pattern structure of the type in which the ion-blocking and conductive films have been partly removed (esp. by patternwise laser scribing) from a glass substrate (1) is characterised by having at least the portions at which substrate (1) is exposed covered with a second ion-blocking film (8) which is pref. of polyimide or silicon oxide.    USE/ADVANTAGE -   Use is esp. in the mfr. of electrode patterns for LCDs (claimed). By covering the exposed portions, contamination of the liq. crystal material by Na ions from the soda lime glass substrate can be prevented. In such cases the second ion-blocking film (8) can also act as an orientation control film. Other (non-claimed) applications are in image sensors and solar cells where contamination of the amorphous semiconductors (and hence) reduction in photoelectric conversion) can be prevented.    (JP2587971-B2)      A thin-film pattern structure of the type in which the ion-blocking and conductive films have been partly removed (esp. by patternwise laser scribing) from a glass substrate (1) is characterised by having at least the portions at which substrate (1) is exposed covered with a second ion-blocking film (8) which is pref. of polyimide or silicon oxide.    USE/ADVANTAGE -   Use is esp. in the mfr. of electrode patterns for LCDs (claimed). By covering the exposed portions, contamination of the liq. crystal material by Na ions from the soda lime glass substrate can be prevented. In such cases the second ion-blocking film (8) can also act as an orientation control film. Other (non-claimed) applications are in image sensors and solar cells where contamination of the amorphous semiconductors (and hence) reduction in photoelec. conversion) can be prevented.    (JP2587972-B2)      A thin-film pattern structure of the type in which the ion-blocking and conductive films have been partly removed (esp. by patternwise laser scribing) from a glass substrate (1) is characterised by having at least the portions at which substrate (1) is exposed covered with a second ion-blocking film (8) which is pref. of polyimide or silicon oxide.    USE/ADVANTAGE -   Use is esp. in the mfr. of electrode patterns for LCDs (claimed). By covering the exposed portions, contamination of the liq. crystal material by Na ions from the soda lime glass substrate can be prevented. In such cases the second ion-blocking film (8) can also act as an orientation control film. Other (non-claimed) applications are in image sensors and solar cells where contamination of the amorphous semiconductors (and hence) reduction in photoelec. conversion) can be prevented.