(US5011706-A)      Forming a continuous coating on a substrate comprises introducing a vapour into an evacuated chamber contg. the structure so that the vapour pressure is 0.001-300 Torr. The vapour comprises a Si contg. cyclobutane selected from silacyclobutanes of formula (I) and 1,3-disilacyclobutanes of formula (II). In the formulae, R is H, F, or 1-4C hydrocarbon and R1 is H or 1-4C hydrocarbon.    The Si contg. cyclobutane is decomposed by effecting a plasma discharge. The vapour is pref. continuously introduced into and drawn out of the chamber to obtain a flow of vapour through the chamber and the plasma discharge is produced by Ac or DC. The temp.    of the structure is 20-600 (200-350) deg.C.    USE/ADVANTAGE -   Coatings may be formed on electronic devices and prevent corrosion and abrasion.    (6pp)    (JP95081186-B2)      A method of forming a continuous coating on a structure comprises, continuously introducing and withdrawing sufficient quantity of vapour into an evacuated chamber contg. the structure to provide a vapour pressure of 0.001-300 Torr. The vapour consists of a Si-contg. cyclobutane (I) and diluent inert gas, where (I) is selected from the gp. consisting essentially of silacyclobutanes of formula (I) and 1,3-disilacyclobutanes of formula (II), where, R = independently selected from the gp. consisting of H, F and hydrocarbon radicals having 1-4C atoms; R1 = independently selected from the gp. consisting of H and hydrocarbon radicals having 1-4C atoms, and followed by decomposition of (I) by using a plasma discharge, with frequency of about 25 KHz - 3 GHz and produced by AC or DC current, within the chamber contg. the structure at 20-about 600 deg. C. An electronic device contg. multilayers of metalisation separated by an insulating layer formed by the method described above is also claimed.    USE -   /ADVNATAGE - An efficient and safe method of continuous coatings contg. amorphous silicon carbide on structures are obtd. The coatings have useful properties such as corrosion and abrasion resistance and are highly electrically insulating. These coatings are used in photovoltaic devices, where they serve as relatively large band gap "windows" in the top layer of a solar cell. @(8pp Dwg.No 0/0)@