EP407088-A  PHYSICAL REVIEW, B. CONDENSED MATTER vol. 31, no. 8, 15 April 1985, pages 5311 - 5321, New York, US; M. JANAI et al.: "Properties of fluorinated glow-discharge amorphous silicon";  SOLAR & WIND TECHNOLOGY vol. 6, no. 3, 1989, pages 241 - 246, Den Haag, NL; Y. HAMAKAWA: "Physics and Technologies of Efficiency Improvements for Amorphous Silicon Solar Cells";  SOLAR CELLS vol. 24, nos. 34, August 1988, pages 237 - 248, Lausanne, CH; R.S. CRANDALL: "Fundamental studies of amorphous silicon materials at the solar energy research institute";  SOLAR CELLS vol. 24, nos. 34, August 1988, pages 249 - 256, Lausanne, CH; Y.S. TSUO et al.: "Ion-beam hydrogenation of amorphous silicon";  SOLAR ENERGY MATERIALS vol. 17, no. 4, June 1988, pages 237 - 245, Amsterdam, NL; G. GANGULY et al.: "A study of the optoelectronic and structural properties of glow-discharge-deposited amorphous silicon thin films";  THIN SOLID FILMS vol. 147, no. 2, 2 March 1987, pages 213 - 222, Lausanne, CH; K.P. CHICK et al.: "A comparative study of the properties of evaporated a-Si films before and after hydrogenation";  PATENT ABSTRACTS OF JAPAN vol. 12, no.217 (E-624), 21 June 1988; & JP-A-63 014 420 (HITACHI) 21.01.1988;  JOURNAL OF APPLIED PHYSICS vol. 65, no. 6, 15 March 1989, pages 2439 - 2444, New York, US; A. ASANO et al.: "Preparation of highly photoconductive hydrogenated amorphous silicon carbide films with a multiplasme-zone apparatus";  THIN SOLID FILMS vol. 171, no. 1, 1 April 1989, pages 217 - 233, Lausanne, CH; M. PINARBASI et al.: "Hydrogenated amorphous silicon films deposited by reactive sputtering: The electronic properties hydrogen bonding and microstructure";  PATENT ABSTRACTS OF JAPAN vol. 12, no.217 (E-624), 21 June 1988;&JP-A-63 014 420 (HITACHI) 21.01.1988;  SOLAR&WIND TECHNOLOGY vol. 6, no. 3, 1989, pages 241 - 246, Den Haag, NL; Y. HAMAKAWA: "Physics and Technologies of Efficiency Improvements for Amorphous Silicon Solar Cells";  SOLAR CELLS vol. 24, nos. 3/4, August 1988, pages 249 - 256, Lausanne, CH; Y.S. TSUO et al.: "Ion-beam hydrogenation of amorphous silicon";  SOLAR CELLS vol. 24, nos. 3/4, August 1988, pages 237 - 248, Lausanne, CH; R.S. CRANDALL: "Fundamental studies of amorphous silicon materials at the solar energy research institute"US5194398-A  A. Asano et al, J. Appl. Phys., vol. 65, No. 6, Mar. 1989, pp. 2439-2444.;  K. Takahashi et al, "Amorphous Silicon Solar Cells", J. Wiley (New York 1986), pp. 114 and 118.;  M. Pinarbasi et al, Thin Solid Films, vol. 171, No. 1, Apr. 1989, pp. 217-233.EP407088-B1  JOURNAL OF APPLIED PHYSICS vol. 65, no. 6, 15 March 1989, pages 2439 - 2444, New York, US; A. ASANO et al.: "Preparation of highly photoconductive hydrogenated amorphous silicon carbide films with a multiplasme-zone apparatus";  PATENT ABSTRACTS OF JAPAN vol. 12, no.217 (E-624), 21 June 1988; & JP-A-63 014 420 (HITACHI) 21.01.1988;  PHYSICAL REVIEW, B. CONDENSED MATTER vol. 31, no. 8, 15 April 1985, pages 5311 - 5321, New York, US; M. JANAI et al.: "Properties of fluorinated glow-discharge amorphous silicon";  SOLAR & WIND TECHNOLOGY vol. 6, no. 3, 1989, pages 241 - 246, Den Haag, NL; Y. HAMAKAWA: "Physics and Technologies of Efficiency Improvements for Amorphous Silicon Solar Cells";  SOLAR CELLS vol. 24, nos. 3/4, August 1988, pages 237 - 248, Lausanne, CH; R.S. CRANDALL: "Fundamental studies of amorphous silicon materials at the solar energy research institute";  SOLAR CELLS vol. 24, nos. 3/4, August 1988, pages 249 - 256, Lausanne, CH; Y.S. TSUO et al.: "Ion-beam hydrogenation of amorphous silicon";  SOLAR ENERGY MATERIALS vol. 17, no. 4, June 1988, pages 237 - 245, Amsterdam, NL; G. GANGULY et al.: "A study of the optoelectronic and structural properties of glow-discharge-deposited amorphous silicon thin films";  THIN SOLID FILMS vol. 147, no. 2, 2 March 1987, pages 213 - 222, Lausanne, CH; K.P. CHICK et al.: "A comparative study of the properties of evaporated a-Si films before and after hydrogenation";  THIN SOLID FILMS vol. 171, no. 1, 1 April 1989, pages 217 - 233, Lausanne, CH; M. PINARBASI et al.: "Hydrogenated amorphous silicon films deposited by reactive sputtering: The electronic properties hydrogen bonding and microstructure"