(US5130170-A)      In a method for continuously forming a large area semiconductor film, a substrate web (101) is continuously moved while being cured and projected by transporting rollers (102,103), producing a columnar portion (116) as the circumferential wall of the film-forming chamber. Supporting rings (104,105) maintain the columnar shape. Film-forming gas is passed through a feed pipe (112) and a microwave applicator (108) radiates energy into the chamber. Temp. of the web is controlled (106,107).    USE/ADVANTAGE -   E.g. solar cell mfr. at low cost.    od    (JP2722115-B2)      Continuous microwave plasma CVD process for a moving substrate web (101) includes moving the web in a curving and projecting columnar fashion (116) through an enclosed film-forming chamber (113) into which uni-directional microwave energy (108) and deposition gas (112) is continuously supplied such that a film is continuously deposited on the inner surface of the columnar substrate. Microwave radiation is prevented from leaking by mesh (114,115) and the substrate is supported on transporting rollers (102,103). The two ends of the column (116) are supported by transporting rings (104,105).    USE/ADVANTAGE -   Esp. in prodn. of large scale solar cells of e.g. amorphous Si, and also image sensors, etc.. Method allows continuous deposition of high quality films over a large area, with high gas utilisation and low cost; the microwave plasma can be applied uniformly over a large area and vol..    (JP2819030-B2)      Continuous microwave plasma CVD process for a moving substrate web (101) includes moving the web in a curving and projecting columnar fashion (116) through an enclosed film-forming chamber (113) into which uni-directional microwave energy (108) and deposition gas (112) is continuously supplied such that a film is continuously deposited on the inner surface of the columnar substrate. Microwave radiation is prevented from leaking by mesh (114,115) and the substrate is supported on transporting rollers (102,103). The two ends of the column (116) are supported by transporting rings (104,105).    USE/ADVANTAGE -   Esp. in prodn. of large scale solar cells of e.g. amorphous Si, and also image sensors, etc.. Method allows continuous deposition of high quality films over a large area, with high gas utilisation and low cost; the microwave plasma can be applied uniformly over a large area and vol..