(US5714010-A)      Continuous microwave plasma CVD process for a moving substrate web (101) includes moving the web in a curving and projecting columnar fashion through a film-forming chamber (116) into which microwave energy (107,108) and deposition gas (113) is continuously supplied such that a film is continuously deposited on the inner surface of the columnar substrate.    The substrate is supported on a pair of transporting rollers (102,103) and the two ends of the substrate columnar portion are supported by transporting rings (104,105).    USE/ADVANTAGE -   Esp. in prodn. of large scale solar cells of e.g. amorphous Si, and also image sensors, etc.. Allows continuous deposition of high quality films over a large area, with high gas utilisation efficiency and low cost; the microwave plasma can be applied uniformly over a large area and vol..    (JP2722114-B2)      Continuous microwave plasma CVD process for a moving substrate web (101) includes moving the web in a curving and projecting columnar fashion through a film-forming chamber (116) into which microwave energy (107,108) and deposition gas (113) is continuously supplied such that a film is continuously deposited on the inner surface of the columnar substrate.    The substrate is supported on a pair of transporting rollers (102,103) and the two ends of the substrate columnar portion are supported by transporting rings (104,105).    USE/ADVANTAGE -   Esp. in prodn. of large scale solar cells of e.g. amorphous Si, and also image sensors, etc.. Allows continuous deposition of high quality films over a large area, with high gas utilisation efficiency and low cost; the microwave plasma can be applied uniformly over a large area and vol..    (JP2819031-B2)      Continuous microwave plasma CVD process for a moving substrate web (101) includes moving the web in a curving and projecting columnar fashion through a film-forming chamber (116) into which microwave energy (107,108) and deposition gas (113) is continuously supplied such that a film is continuously deposited on the inner surface of the columnar substrate.    The substrate is supported on a pair of transporting rollers (102,103) and the two ends of the substrate columnar portion are supported by transporting rings (104,105).    USE/ADVANTAGE -   Esp. in prodn. of large scale solar cells of e.g. amorphous Si, and also image sensors, etc.. Allows continuous deposition of high quality films over a large area, with high gas utilisation efficiency and low cost; the microwave plasma can be applied uniformly over a large area and vol..