(US5154810-A)      Optical quality relatively thick, thin film coatings are formed on e.g. detectors or solar cells in a rotary cylindrical sputtering system in which substrates (60) are mounted on a drum (34) which rotates past circumferential work stations in which one material e.g. Si is deposited (37) and another station deposits another material e.g. Al (38) while a reaction device (39) chemically reacts O to convert the metals to oxide. A cantilever beam stressometer system (50) monitors stress in the coating and controls relative amounts of constituents.    ADVANTAGE -   High stresses, warpage, and breakage are avoided.    (JP6132554-A)      PVD process comprises: simultaneously depositing and oxidising at least two materials on a substrate, one imparting compressive force characteristics and the other imparting tensile force characteristics; monitoring the stress in the coating during formation; and adjusting the relative deposited amts. of the two materials to control the stress in the coating. Materials are pref. Si and Al.    Substrates are pref. mounted on a drum which is rotated past circumferential work stations. Stress in the deposited coatings is measured using a cantilever beam stressometer which includes a cantilever reflector mounted on the drum. Two materials (Si and Al) may be deposited by Ar sputtering.    USE/ADVANTAGE -   Mfr. of an optical detector or solar cell. Optical grade (protective) coatings are formed with min. stress, warpage and breakage.    In an example, relatively thick films of AlxSiyO2 are deposited on Si solar cell substrates by linear magnetron cathode sputtering. Cantilever beam stressometer system is operated throughout the deposition/oxidn. to maintain coating stress at zero.    (JP2501510-B2)      PVD process comprises: simultaneously depositing and oxidising at least two materials on a substrate, one imparting compressive force characteristics and the other imparting tensile force characteristics; monitoring the stress in the coating during formation; and adjusting the relative deposited amts. of the two materials to control the stress in the coating. Materials are pref. Si and Al.    Substrates are pref. mounted on a drum which is rotated past circumferential work stations. Stress in the deposited coatings is measured using a cantilever beam stressometer which includes a cantilever reflector mounted on the drum. Two materials (Si and Al) may be deposited by Ar sputtering.    USE/ADVANTAGE -   Mfr. of an optical detector or solar cell. Optical grade (protective) coatings are formed with min. stress, warpage and breakage.    In an example, relatively thick films of AlxSiyO2 are deposited on Si solar cell substrates by linear magnetron cathode sputtering. Cantilever beam stressometer system is operated throughout the deposition/oxidn. to maintain coating stress at zero.