(WO9322070-A1)      Prepn. comprises (a) heating a surface of the substrate, pref. to 450-600 deg. C, (b) contacting the surface with a vapour consisting of (i) a metal oxide precursor; (ii) an O2-contg. agent; and (iii) a dopant contg. a vinylic fluorine; and (c) thermally reacting the vapour into a F-contg. metal oxide.    Also claimed is the provision of a tin oxide film layer on a substrate in which the vapour consists of (i) a tin chloride; (ii) an hydroxylated cpd.; and (iii) as for (b) (iii).    A further claim is for the prepn. of a high conductivity F-contg. titanium oxide layer on a substrate in which the heated surface is contacted with a vapour contg. (i) SnCl4 and a dopant contg. a vinylic fluorine and (ii) a vapour consisting of an hydroxylated cpd. the two vapours are mixed near the substrate surface, followed by step (c).    (b)(iii) is pref. chlorotrifluoroethylene or di-fluoroethylene. (b)(ii) is a hydroxylated cpd. such as O2, H2O or a low molecular wt. alcohol. (b)(i) is SnCl4 or tetramethyl tin.    USE/ADVANTAGE -   Used as thermal insulator on glass and other substrate, or provide transparent electrodes for use with solar cells or other electro-optical prods. such as liq. crystal displays. The thin film coated glass has reduced haze.    (JP7508798-W)      Prepn. comprises (a) heating a surface of the substrate, pref. to 450-600 deg. C, (b) contacting the surface with a vapour consisting of (i) a metal oxide precursor; (ii) an O2-contg. agent; and (iii) a dopant contg. a vinylic fluorine; and (c) thermally reacting the vapour into a F-contg. metal oxide.    Also claimed is the provision of a tin oxide film layer on a substrate in which the vapour consists of (i) a tin chloride; (ii) an hydroxylated cpd.; and (iii) as for (b) (iii).    A further claim is for the prepn. of a high conductivity F-contg. titanium oxide layer on a substrate in which the heated surface is contacted with a vapour contg. (i) SnCl4 and a dopant contg. a vinylic fluorine and (ii) a vapour consisting of an hydroxylated cpd. the two vapours are mixed near the substrate surface, followed by step (c).    (b)(iii) is pref. chlorotrifluoroethylene or difluoroethylene. (b)(ii) is a hydroxylated cpd. such as O2, H2O or a low molecular wt. alcohol. (b)(i) is SnCl4 or tetramethyl tin.    USE/ADVANTAGE -   Used as thermal insulator on glass and other substrate, or provide transparent electrodes for use with solar cells or other electro-optical prods. such as liquid crystal displays. The thin film coated glass has reduced haze.