TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The polymeric sulfonic acid salt is polyetheretherketone, polyethersulfone, polyphenylsulfone, polyphenylene sulfide and/or polyphenylene oxide. The sulfonic acid salt has a repeating aromatic core structure of formula (R1) or (R2). A solution of a polymeric sulfonic acid in a dipolar aprotic solvent is mixed with an equivalent amount (w.r.t. sulfonic acid groups) of a primary, secondary or tertiary amine and mixed with a solid polymer or a solution of a polymer in a dipolar aprotic solvent having imidazole or benzimidazole groups and optionally adding a further polymer having primary, secondary or tertiary basic nitrogen groups, preferably poly(4-vinylpyridine), poly(2-vinylpyridine), poly(ethersulfone-ortho-sulfone-dialkylamine), poly(ether-sulfone ortho sulfone-alkylamine), poly(ethersulfone-ortho-ether-dialkylamine) and/or poly(ethersulfone-ortho-ether-alkylamine). The SO3H form of the blends is formed by post treatment in a dilute mineral acid at 20-80 degreesC. The benzimidazole group containing polymer is poly((2,2'-m-phenylene)-5,5'-bibenimidazole). The polymer blend or polymer blend membrane is an anion exchanger. The sulfonic acid salt is a poly(etheretherketone) with ((R5-R2-R5-R2-R7)n; x=1, R4=H), poly(ethersulfone) ((R1-R5-R2-R6-R2-R5)n; R2:x=1, R4=H), poly(ethersulfone) ((R2-R6-R2-R5)m;R2:x=1, R4=H), poly(phenylsulfone) ((R22-R5-R2-R6-R2)m; R2:x=2, R4=H); polyetherethersulfone ((R5-R2-R5-R2-R6)n-(R5-R2-R6-R2)m: x=1, R4=H, n/m=0, 18), poly(phenylensulfide) ((R2-R8)n; R2:x=1, R4=H) and/or poly(phenylenoxide) ((R2-R5)n; R4=CH3).R3 = H, trifluoromethyl or CNH2n+1;n = 1-10, preferably 1;R4 = H, CnH2n+1; preferably methyl or phenyl, x=1-3, optionally containing bridging groups R5 or R6;R5 = -O-;R6 = -SO2 EXAMPLE - A mixture of 10.067 g of a 20.16 % solution of sulfonated poly(etheretherketone) (ion exchange capacity 1.8 meq sO3 H/g polymer) and 26.8 g of a 1.875 % solution of Celazol (RTM; poly(2,2'-(m-phenylene)-5,5'-bibeazimidazole) in N-methylpyrrolidone was cast as a 300 micron thick film onto a glass plate and the solvent evaporated off at 120-140 degreesC. The coated glass plate was soaked in deionized water to separate the membrane which was post treated at 60-80 degreesC in 8% HCl for 24 hours followed by 24 hours at 20-80 degreesC in deionized water. The 20 micron thick membrane had an ion exchange capacity of 1.06 meq 503 H/g polymer, 22.8 % swelling (H2O, RT, H+ form), surface resistance of 0.116 ohm.cm2 (0.5N HCl, RT, H+ form), specific resistance of 58.125 ohm.cm and thermal stability of upto 350 degreesC in air (heating rate 20 degreesC/min).