(JP11214307-A)   NOVELTY - A film-forming apparatus comprises a vacuum chamber (C4) with a device for forming a pre-film of crystalline silicon on a target substrate and an energy beam-irradiating device for crystallizing the pre-film.    USE - In forming crystalline silicon films for thin film transistor switches in liquid crystal displays, integrated circuits and solar batteries and for insulating film    ADVANTAGE - Films have good quality and adhesion and are formed with high productivity: pre-film and final film are formed in the same chamber.    (CN1235367-A)   NOVELTY - A film-forming apparatus comprises a vacuum chamber (C4) with a device for forming a pre-film of crystalline silicon on a target substrate and an energy beam-irradiating device for crystallizing the pre-film.    USE - In forming crystalline silicon films for thin film transistor switches in liquid crystal displays, integrated circuits and solar batteries and for insulating film    ADVANTAGE - Films have good quality and adhesion and are formed with high productivity: pre-film and final film are formed in the same chamber.    (JP3027968-B2)   NOVELTY - A film-forming apparatus comprises a vacuum chamber (C4) with a device for forming a pre-film of crystalline silicon on a target substrate and an energy beam-irradiating device for crystallizing the pre-film.    USE - In forming crystalline silicon films for thin film transistor switches in liquid crystal displays, integrated circuits and solar batteries and for insulating film    ADVANTAGE - Films have good quality and adhesion and are formed with high productivity: pre-film and final film are formed in the same chamber.    (US6258173-B1)   NOVELTY - A film-forming apparatus comprises a vacuum chamber (C4) with a device for forming a pre-film of crystalline silicon on a target substrate and an energy beam-irradiating device for crystallizing the pre-film.    USE - In forming crystalline silicon films for thin film transistor switches in liquid crystal displays, integrated circuits and solar batteries and for insulating film    ADVANTAGE - Films have good quality and adhesion and are formed with high productivity: pre-film and final film are formed in the same chamber.