(JP11343119-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP11343123-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP11343185-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP11349333-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000001701-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000024579-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000030720-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000034167-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000034168-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000036307-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000044245-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000044369-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000053425-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000053471-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000067889-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000086342-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000239081-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000290065-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (JP2000353530-A)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.    (EP1081778-A1)   NOVELTY - A dense ceramic layer having a gas permeation flux Q1 of 50 m.hr-1.atm-1 or less is formed on the air electrode. On this ceramic layer a dense ceramic interconnector film is formed. The gas permeation flux Q2 of the interconnector film is 0.01 m.hr-1 .atm-1 or less. This value is preferable to an interconnector film of a solid electrolyte fuel cell.    USE - None given.