NOVELTY - Phosphorus-containing junction layer having the n++ part on the front surface of P type silicon substrate is formed by printing an organic silica compound paste containing phosphorus on the substrate in a pattern corresponding to a pattern of the front surface electrode, and subjecting the substrate to vapor phase phosphorus diffusion heat treatment.    USE - None given.    ADVANTAGE - The process for manufacturing the solar cell is simplified and the amount of material used in the process is reduced. Hence solar cell having high efficiency is formed at a high productivity and a low cost.    DETAILED DESCRIPTION - Solar cell manufacture comprises at least forming a phosphorus-containing junction layer (2) having a n++ part (3) in which phosphorus is doped at high concentration on the front surface of a P type silicon substrate (1), forming a front surface electrode (6) on the n++ part and forming a back surface electrode (7) on the back surface of the P type silicon substrate. The phosphorus-containing junction layer having the n++ part on the front surface is formed by printing an organic silica compound paste containing phosphorus on the P type silicon substrate in a pattern corresponding to a pattern of the front surface electrode, and subjecting the P type silicon substrate to vapor phase phosphorus diffusion heat treatment.    INDEPENDENT CLAIMS are also included for the following:    (A) A method for fabricating a solar cell at least comprising forming a phosphorus-containing junction layer on the P type silicon substrate, forming a front surface electrode on the front surface of the phosphorus-containing junction layer, and forming a back surface electrode on the back surface of the P type silicon substrate. Before the back surface electrode is formed, a passivation oxide film is formed on the back surface of the P type silicon substrate, an aluminum paste is printed on the passivation oxide film in a dot pattern and fired so that aluminum may pass through the passivation oxide film and may be diffused in silicon of the P type silicon substrate to form a p+ part in a dot pattern in which aluminum is doped on the back surface of the P type silicon substrate.    (B) A solar cell fabricated by the above methods.    DESCRIPTION OF DRAWING(S) - The diagram is a flow chart showing an example of a method for fabricating a solar cell.    Substrate (1)    Phosphorus-containing junction layer (2)    n++ part (3)    p+ part (4)    Passivation oxide film (5)    Surface electrode (6)    Back surface electrode (7)    Silicon oxide surface reflectron preventing film (8)    Aluminum-silicon alloy layer (9)    Solar cell (10)    Silica reflection preventing film (11)