TECHNOLOGY FOCUS - POLYMERS - Preferred Materials: The polymeric backbone is a poly(phenylene ether), an aromatic polyamide, an aromatic polycarbonate, an aromatic polyester, an aromatic polyurea, an aromatic polyurethane, an aromatic polysulfone, an aromatic polyimide, a polybenzazole, a polyquinoxaline or a polyquinoline, a perfluoro poly(para-phenylene oxide), a perfluorosulfo poly(para-phenylene sulfide), a perfluorosulfo poly(para-phenylene sulfone), a perfluorosulfo organic polyamide, a perfluorosulfo aromatic polycarbonate, a perfluorosulfo aromatic polyimide, a perfluorosulfo aromatic polyester, a perfluorosulfo aromatic polyurea, a perfluorosulfo aromatic polyurethane, a perfluorosulfo aromatic polysulfone, a perfluorosulfo polybenzazole, a perfluorosulfo polyquinoxaline or a perfluorosulfo polyquinoline.The high temperature polymer electrolyte is poly(perfluoroethersulfone)sulfonic acid and the basic polymer is a polybenzimidazole. The polymeric electrolyte film further comprises an organic polybasic compound or a metal ion. The polymeric backbone comprises a phenylene and at least one heteroatom. Preferred Method: The electrolyte and the backbone are conjugated.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic polybasic compound is a triazine or a benzotriazole. The electrolyte further comprises an electron withdrawing group selected from -COR1, -SOR1, -SO2R1, -COOR1 or CF3.R1 = an aromatic group.The electron withdrawing group is covalently bonded to at least one of the aromatic constituents.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The heteroatom is oxygen, nitrogen, sulfur or phosphorus. The atom having pi-cloud is carbon, oxygen, nitrogen, sulfur or phosphorus. The halogen atom is a fluorine atom. The electron withdrawing group is also selected from -Cl, -NO2 or -CN. The metal ion is an alkaline earth metal ion (preferably calcium ion) or a transition metal ion (preferably platinum ion). EXAMPLE - To a mixture of polysulfonyl chloride (4.84 g) in ethylene glycol dimethyl ether (75 ml) was added sodium hydroxide (1.46 g) in water (20 ml) with stirring at 15 degreesC. The mixture was stirred for two hours at room temperature and concentrated in vacuo. The mixture was treated with IR120 (30 g) in water with stirring for two hours, passed through an additional resin (15 g) and concentrated to form a crude product. The crude product was dissolved in methanol (20 ml), filtered and added to diethyl ether (400 ml). The solid polymer was triturated with dichloromethane and ethyl acetate and dried to form poly(perfluoroethersulfone)sulfonic acid (A) (2.64 g) as a tan powder.    A film of poly(perfluoroethersulfone)sulfonic acid (A) was fabricated by solvent casting from a solution in dimethyl formamide on a 60 microns thick glass fiber non-woven membrane. The polymer film was initially dried at 80 degreesC and then thermal cured. The polymer film was then heated at a rate of 20 degreesC/hour from room temperature to 250 degreesC. This temperature was maintained for 8 hours, and then cooled to room temperature at the same rate.    The fabricated poly(perfluoroethersulfone)sulfonic acid (A) was then dissolved in dimethyl acetamide and triethylamine. The resulting solution was then added dropwise to a solution of polybenzimidazole in dimethylacetamide. The resulting solution was cast over a thin nonwoven glass fiber separator and dried at 60 degreesC. The polymer film was then examined for cracks. The film showed no cracks. The polymer film was transferred into an electrode conductivity cell where it was held at 100 degreesC, at 100% relative humidity over a few hours for hydration. The proton film conductivity of poly(perfluoroethersulfone)sulfonic acid (A) was found to be 0.05 S/cm at 200 degreesC.