WO200103232-A1 -- EP692800-A2   ;  EP718858-A2   BASF AG (BADI)   HAEUSSLING L,  ETZBACH K,  SIEMENSMEYER K,  PAULUS W,  MEISSNER D,  ANTONIUS C,  ENGEL K,  HAARER D,  KUMAR S,  SCHUHMACHER P;  JP06318766-A   ;  JP10067515-A   ;  JP11260428-A   ;  US3989542-A   EXXON RES & ENG CO (ESSO)   CLARK W D K;  US4927721-A   GEBR SULZER AG (SULZ);  SULZER INNOTEC AG (SULZ);  GRATZEL M (GRAT-Individual);  EPFL ECOLE POLYTECHNIQUE FED LAUSANNE (EPFL)   GRATZEL M;  US5362514-A   ;  EP1119068-A1 -- US5232801-A   ;  WO1997035227-A2   ;  US6580026-B1 -- JP01220380-A   ;  JP03218915-A   ;  JP04021515-A   ;  JP07140472-A   ;  JP11260428-A   ;  JP62072514-A   MERCK PATENT GMBH (MERE)   UNGER K,  GIESCHE H,  KINKEL J;  JP63058878-A   ;  JP05504023-W   ;  JP6394224   ;  US4775520-A   MERCK PATENT GMBH (MERE)   UNGER K,  GIESCHE H,  KINKEL J;  US4927721-A   GEBR SULZER AG (SULZ);  SULZER INNOTEC AG (SULZ);  GRATZEL M (GRAT-Individual);  EPFL ECOLE POLYTECHNIQUE FED LAUSANNE (EPFL)   GRATZEL M;  US5350644-A   GRAETZEL M (GRAE-Individual)   NAZEERUDDI M,  OREGAN B;  US5486941-A   SEKISUI FINE CHEM CO LTD (SEKI-Non-standard)   SAIUCHI K,  HARA M,  YAMADA K,  KANKI K;  US5683833-A   BASF AG (BADI)   HAEUSSLING L,  ETZBACH K,  SIEMENSMEYER K,  PAULUS W,  MEISSNER D,  ANTONIUS C,  ENGEL K,  HAARER D,  KUMAR S,  SCHUHMACHER P;  US20010004901-A1   ;  US6291763-B1   FUJI PHOTO FILM CO LTD (FUJF)   NAKAMURA S;  US6849797-B2 -- JP06318766-A   ;  JP11260428-A   ;  JP63058878-A   ;  US5350644-A   GRAETZEL M (GRAE-Individual)   NAZEERUDDI M,  OREGAN B;  US6291763-B1   FUJI PHOTO FILM CO LTD (FUJF)   NAKAMURA S;  US6580026-B1   CATALYSTS & CHEM IND CO LTD (NISH)   KOYANAGI T,  KOMATSU M;  JP01220380-A   ;  JP03218915-A   ;  JP04021515-A   ;  JP07140472-A   ;  JP62072514-A   MERCK PATENT GMBH (MERE)   UNGER K,  GIESCHE H,  KINKEL J;  JP63094224-A   ;  JP05504023-W   ;  US4775520-A   MERCK PATENT GMBH (MERE)   UNGER K,  GIESCHE H,  KINKEL J;  US4927721-A   GEBR SULZER AG (SULZ);  SULZER INNOTEC AG (SULZ);  GRATZEL M (GRAT-Individual);  EPFL ECOLE POLYTECHNIQUE FED LAUSANNE (EPFL)   GRATZEL M;  US5486941-A   SEKISUI FINE CHEM CO LTD (SEKI-Non-standard)   SAIUCHI K,  HARA M,  YAMADA K,  KANKI K;  US5683833-A   BASF AG (BADI)   HAEUSSLING L,  ETZBACH K,  SIEMENSMEYER K,  PAULUS W,  MEISSNER D,  ANTONIUS C,  ENGEL K,  HAARER D,  KUMAR S,  SCHUHMACHER P;  US6469243-B2   YAMANAKA R (YAMA-Individual);  HAN L (HANL-Individual)   YAMANAKA R,  HAN L;  AU2004201869-B2 -- US4275118-A   DOW CORNING CORP (DOWO)   CHI F K,  BANEY R H;  JP4169138-B2 -- JP11283682-A   ;  JP2000113913-A   ;  JP4624512-B2 -- JP10290018-A   ;  JP11339867-A   CATALYSTS & CHEM IND CO LTD (NISH)   KOYANAGI T,  KOMATSU M,  TANAKA H,  SHIRONO K;  JP4738559-B2 -- JP11160428-A   ;  JP11260428-A