TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Materials: Suitable materials included are glass, preferably float glass, for the substrate; and conductive glass frits or metal wires for the conductor tracks. The granular particles (40) of the second main layer have a diameter up to 60 mum and consist of semiconductor material, preferably photovoltaic material, especially II-VI compound semiconductor. Preferred materials are copper indium diselenide, copper indium disulfide, copper indium gallium diselenide and/or copper indium gallium diselenide disulfide. The n-conducting buffer layer (80) consists of cadmium sulfide, zinc selenide (ZnSe) or zinc telluride (ZnTe); and the third main layer (70) of zinc oxide (ZnO). The fourth main layer (80) forms the front contact and preferably consists of a transparent conductive oxide (TCO).    TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Process: The main layers (30, 70, 80) are applied at an angle by physical vapor deposition (PVD), preferably with particle flux perpendicular to the conductor track direction. The tracks are applied by screen printing, preferably with graphite and/or silver paste, and/or bonded to the substrate with conductive adhesive. The granular particles of layer (40) are strewn, dusted and/or printed on the substrate. The application angle alpha of the first main layer (10) is selected so that, depending on the height (H) and width (B) of the conductor tracks (20), the shadow range at the sides of the conductor tracks is as least as wide as the diameter of the granular particles. An insulating layer (50) is applied, preferably by dipping or spraying, after the granular particles so that they are 10-70% covered, then the insulating materials is removed from the surface of the particles, preferably by etching or machining. After applying the insulating layer, a p/n-junction is produced, preferably by applying an n-conducting buffer layer. The application angle beta of the third main layer (70) is in the 70-89degrees range, whilst the application angle gamma of the fourth main layer is the opposite of alpha. Main layers (30, 70, 80) and layers (50, 60) are applied by sputtering, chemical vapor deposition (CVD), atomic layer deposition (ALD) and/or ILGAR process and/or chemical bath deposition.    TECHNOLOGY FOCUS - ELECTRONICS - Preferred Circuit: The conductor tracks are parallel and have a length of 30 cm to 6 m, height of 5-500 mum and width of 10-500 mum. There are 50-200 conductor tracks/m on the substrate surface.    TECHNOLOGY FOCUS - POLYMERS - Preferred Materials: Suitable materials include polymer film as substrate and conductive polymer composition for the conductor tracks. The first main layer (30) consists of conductive adhesive and preferably is based on a polymer, especially epoxide resin, polyurethane, polyacrylic, polyimide or intrinsically conductive polymer (PANis).The insulating layer (50) comprises a polymer, preferably epoxide resin, polyurethane, polyacrylic or polyimide.