NOVELTY - A plasma deposition apparatus comprises vacuum chamber (52), cathode (54) disposed in vacuum chamber, first anode(s) (56) for generating electromagnetic field between cathode and first anode, second anode structure(s) (60) for generating electromagnetic field to direct charge constituents particles to substrate, and wall and screen to control flow of neutral constituent particles.    USE - The invention is used or applying thin film material(s) into substrate by controlling the depositing plasma constituents that will reach a substrate from cathode. It is also used in for the manufacture of variety of devices, e.g. fuel cells. (All claimed)    ADVANTAGE - The invention controls the plasma constituents reaching a substrate material. It is capable of producing nanostructures with variable particle sizes, amorphous continuous films, and crystalline structures in multiple layers with the same device. It eliminates the need to employ complex pasting, printing, and bonding technologies.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for:    (a) a plasma deposition process for applying selected target material particles from cathode comprising mounting the cathode and substrate in spaced apart relation in vacuum chamber, providing in vacuum chamber first anode structure(s), powering the cathode to generate an electric arc to create plasma of constituted target particles including charged particles, generating electromagnetic field between cathode and first anode, generating electromagnetic field around the second anode structure, and adjusting the openings of the screen to control flow of neutral particles to the substrate; and    (b) a process for manufacturing fuel cell comprising depositing carbon layer on the substrate, depositing micro-particle metal catalyst layer on the carbon layer, introducing reactive gas into the vacuum chamber and forming solid polymer membrane layer on the metal catalyst layer, and repeating deposition to form the fuel cell.    DESCRIPTION OF DRAWING(S) - The figure is a diagrammatic view of the ionic plasma deposition apparatus.    Vacuum chamber (52)    Cathode (54)    First anode structure (56)    Second anode structure (60)    Anode components (62)    Third anode component (70)