TECHNOLOGY FOCUS - POLYMERS - Preferred Polymers: The semiconductor polymers are chosen from homopolymers and copolymers of polyfluorenes, polybenzothiazoles, polytriarylamines, poly(phenylenevinylenes), polyphenylenes, polythiophenes, polypyrroles, polyacetylenes, polyisonaphthalenes, and polyquinolines, preferably polymers and copolymers of polyfluorenes, polybenzothiazoles, polytriarylamines, poly(phenylenevinylenes) and polythiophenes. At least one of semiconductor polymers is chosen from polyfluorenes, and poly(phenylenevinylenes), and at least one of semiconductive polymers is an alkyl-substituted polythiophene. The blend in the organic material layer comprises two semiconductive polymers in a ratio of 1:1.Preferred Condition: Thermal annealing of photoresponsive device is performed by heating the device at 60-220 degrees C, preferably 100-180 degrees C.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Materials: The electrode (1) comprises a material of high work function chosen from indium-tin oxide, tin oxide, indium-doped zinc oxide, aluminum-doped zinc oxide, magnesium-indium oxide, cadmium-tin oxide, gold, silver, nickel, palladium and tin, and electrode (5) comprises a material of low work function chosen from lithium, sodium, potassium, rubidium, beryllium, magnesium, calcium, strontium, barium, ytterbium, samarium, aluminum and/or their alloys. A layer of dielectric material chosen from oxides and fluorides of alkali metals and alkaline earth metals, is formed between electrode (5) and layer of organic material. The substrate is made of glass, acrylic resins, polycarbonate resins, polyester resins, or polyethylene terephthalate resins.    TECHNOLOGY FOCUS - ELECTRONICS - Preferred Device: The photoresponsive device comprises charge transporting and/or charge injecting layers. The photoresponsive device comprises a hole transporting layer between electrode (1) and layer of organic material. The photoresponsive device comprises a layer of polyethylene dioxythiophene (PEDOT):polystyrene sulfonic acid (PSS) between electrode (1) and layer of organic material. The photoresponsive device is a photovoltaic device. The photoresponsive device is a photodetector and comprises external unit for converting the current flowing across the device into a signal. EXAMPLE - An indium-tin oxide coated glass substrate was cleaned using etch resist-stripper and subsequently deionizing water in an ultrasonic bath. The substrate was exposed to an oxygen-plasma etch process to further clean the indium-tin oxide. A solution of polyethylene dioxythiophene (PEDOT)-polystyrene sulfonic acid (PSS) was mixed with PSS solution and water in a ratio of 20:1.45:5. The resulting solution was filtered and deposited by spin coating onto the indium-tin oxide coated glass substrate. The spun film of PEDOT-PSS was baked at 200 degrees C for 1 hour under continuous nitrogen flow. Solutions of poly(3-hexylthiophene) and poly(2,7-(9,9-di-n-octylfluorene)-(4,7-di-2-thienyl-(benzothiazole)) were made of concentration 15 mg/ml in anhydrous chloroform. The solutions were heated to 80 degrees C and agitated. The solutions were prepared under protective nitrogen atmosphere and mixed together in equal quantities. The resulting solution was deposited by spin coating at 3000 rpm at room temperature onto the PEDOT-PSS coated substrate under nitrogen atmosphere. The coated substrate was transferred to a vacuum chamber in which aluminum was thermally deposited onto the polymer surface. A shadow mask defined in the shape of the deposited metal electrodes. The photoresponsive device was transferred to a vacuum oven and annealed at 140 degrees C for 12 hours. The device was encapsulated by placing small amount of epoxy resin onto the aluminum side and placing a glass slide on top. Annealing improved performance of the photoresponsive device.