EP1300889-A2  MENG L-J ET AL: "Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures" THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 303, no. 1-2, 15 July 1997 (1997-07-15), pages 151-155, XP004087627 ISSN: 0040-6090;  ROTTMANN M ET AL: "VARIATIONS IN MICROSTRUCTURE AND COMPOSITION OF INDIUM TIN OXIDE FILMS WITH THE DEPOSITION TECHNIQUE" JOURNAL OF MATERIALS SCIENCE, CHAPMAN AND HALL LTD. LONDON, GB, vol. 31, 1996, pages 6495-6500, XP002928462 ISSN: 0022-2461;  KAMEI M ET AL: "Origin of characteristic grain-subgrain structure of tin-doped indium oxide films" THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 259, no. 1, 1 April 1995 (1995-04-01), pages 38-45, XP004004749 ISSN: 0040-6090;  THILAKAN P ET AL: "Oxidation dependent crystallization behaviour of IO and ITO thin films deposited by reactive thermal deposition technique" MATERIALS SCIENCE AND ENGINEERING B, ELSEVIER SEQUOIA, LAUSANNE, CH, vol. 55, no. 3, 4 September 1998 (1998-09-04), pages 195-200, XP004142071 ISSN: 0921-5107EP1300889-B1  KAMEI M ET AL: "Origin of characteristic grain-subgrain structure of tin-doped indium oxide films" THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 259, no. 1, 1 April 1995 (1995-04-01), pages 38-45, XP004004749 ISSN: 0040-6090;  MENG L-J ET AL: "Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures" THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 303, no. 1-2, 15 July 1997 (1997-07-15), pages 151-155, XP004087627 ISSN: 0040-6090;  ROTTMANN M ET AL: "VARIATIONS IN MICROSTRUCTURE AND COMPOSITION OF INDIUM TIN OXIDE FILMS WITH THE DEPOSITION TECHNIQUE" JOURNAL OF MATERIALS SCIENCE, CHAPMAN AND HALL LTD. LONDON, GB, vol. 31, 1996, pages 6495-6500, XP002928462 ISSN: 0022-2461;  THILAKAN P ET AL: "Oxidation dependent crystallization behaviour of IO and ITO thin films deposited by reactive thermal deposition technique" MATERIALS SCIENCE AND ENGINEERING B, ELSEVIER SEQUOIA, LAUSANNE, CH, vol. 55, no. 3, 4 September 1998 (1998-09-04), pages 195-200, XP004142071 ISSN: 0921-5107US7214872-B2  C. Nunes de Carvalho et al, "Effect of substrate temperature on the surface structure, composition and morphology of indium-tin oxide films." Surface and Coatings Technology. 124 (2000) 70-75.;  International Centre for Diffraction Data, Card 06-0416, In2O3 powder diffraction data.;  J.S. Kim et al, "Characterisation of the properties of surface-treated indium-tin oxide thin films." Synthetic Metals. 101 (1999) 111-112.;  Origin of Characteristic Grain-Subgrain Structure of Tin-Doped Indium Oxide Films, Masayuki Kamei et al. (vol. 259, No. 1, Apr. 1, 1995, pp. 38-45.;  Oxidation Dependent Crystallization Behaviour of IO and ITO Thin Films Deposited By Reactive Thermal Deposition Technique, P. Thilakan et al. (vol. 55, No. 3, Sep. 4, 1998, pp. 195-200).;  Properties of Indium Tin Oxide (ITO) Films Prepared By R.F. Reactive Magnetron Sputtering At Different Pressures, L. Meng et al. (vol. 303, No. 1-2, Jul. 15, 1997, pp. 151-155).;  Shigesato et al., The Structural Changes of Indium-Tin Oxide and a-Wo3 Films by Introducing Water to the Deposition Processes, Apr. 1991, Japanese Journal of Applied Physics 30(4): 814-819.;  Variations in Microstructure and Composition of Indium Tin Oxide Film With the Deposition Technique, M. Rottmann et al. (vol. 31, 1996, pp. 6495-6500).EP1786040-A1  KAMEI M ET AL: "Origin of characteristic grain-subgrain structure of tin-doped indium oxide films" THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 259, no. 1, 1 April 1995 (1995-04-01), pages 38-45, XP004004749 ISSN: 0040-6090;  MENG L-J ET AL: "Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures" THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 303, no. 1-2, 15 July 1997 (1997-07-15), pages 151-155, XP004087627 ISSN: 0040-6090;  ROTTMANN M ET AL: "VARIATIONS IN MICROSTRUCTURE AND COMPOSITION OF INDIUM TIN OXIDE FILMS WITH THE DEPOSITION TECHNIQUE" JOURNAL OF MATERIALS SCIENCE, CHAPMAN AND HALL LTD. LONDON, GB, vol. 31, 1996, pages 6495-6500, XP002928462 ISSN: 0022-2461;  THILAKAN P ET AL: "Oxidation dependent crystallization behaviour of IO and ITO thin films deposited by reactive thermal deposition technique" MATERIALS SCIENCE AND ENGINEERING B, ELSEVIER SEQUOIA, LAUSANNE, CH, vol. 55, no. 3, 4 September 1998 (1998-09-04), pages 195-200, XP004142071 ISSN: 0921-5107