NOVELTY - A nanotube/fullerene production device comprises a vacuum-tight chamber having inlet port and evacuation port, an inductor supplied from a high- frequency generator, and a graphite element to be placed in the electromagnetic field generated from the inductor. Continuous heating and consequent vaporization of graphite element and formation of plasma are accomplished inside the vacuum chamber in the presence of inert gas flow.    USE - For producing nanotubes, fullerene, and their derivatives for production of nanometric devices (nano-motor, nano-transistor, etc.), additive for polymers, production of Field Emission Device (flat panels for high resolution electronic displays), as vehicles for pharmaceutically active molecules, and as hydrogen storage media to be used in fuel cells technology.    ADVANTAGE - A large amount of nanotubes, fullerene and their derivatives is simply produced with high yield.    DETAILED DESCRIPTION - A nanotube/fullerene production device comprises a vacuum-tight chamber (1) having an inlet port (2) and an evacuation port (3), an inductor (8) supplied from a high-frequency generator (9), and a graphite element to be placed in the electromagnetic field generated from the inductor. Continuous heating for induced eddy currents and consequent vaporization of graphite element and a plasma (10) that stays inside the inductor around the head of graphite element are accomplished inside the vacuum chamber in the presence of inert gas flow along the axis of graphite element and inductor between the inlet port and evacuation port.    An INDEPENDENT CLAIM is also included for production of nanotubes, fullerene, and their derivatives in an inert gas environment at atmospheric pressure or at lower pressure with respect to atmospheric pressure, by subjecting graphite element to high-frequency electromagnetic field, and heating the graphite element to vaporization and simultaneous formation and persistence of plasma around the vaporization zone of graphite element.    DESCRIPTION OF DRAWING(S) - The figure is a schematic view of the device.    Vacuum chamber (1)    Inlet port (2)    Evacuation port (3)    Valve (4)    Graphite rods (5, 7)    Support (6)    Inductor (8)    High-frequency generator (9)    Plasma (10)