NOVELTY - A colored photosensitive resin composition contains at least resin binder, photopolymerizable monomer, bisimidazole compound as photoinitiator, coloring material and solvent. The powder X-ray-diffraction pattern of bisimidazole compound has a diffraction peak at 2(theta) angle of Cu-K(alpha) X-ray diffraction at least in the range of 9.7-9.9 degrees and in the range of 10.0-10.2 degrees.    USE - For resist for forming colored image used by color liquid crystal display and image sensor.    ADVANTAGE - The composition contains coloring material of high concentration and excellent sensitivity. The colored pixel obtained using the resin composition has excellent surface smoothness, pattern shape and brightness. The composition is used as pigment dispersion resist. The yield and productivity are not reduced at the time of production of color filter, and color filter of high quality is obtained.    DETAILED DESCRIPTION - A colored photosensitive resin composition contains at least resin binder, photopolymerizable monomer, bisimidazole compound as photoinitiator, coloring material and solvent. The solvent is aliphatic cyclic ketone type solvent and propylene glycol monoalkyl ether acetate solvent. The powder X-ray diffraction pattern of the bisimidazole compound has a diffraction peak at 2(theta) angle of Cu-K(alpha) X-ray diffraction at least in the range of 9.7-9.9 degrees and in the range of 10.0-10.2 degrees. The aliphatic cyclic ketone type solvents are selected from cyclopentanone and/or cyclohexanone.    INDEPENDENT CLAIMS are also included for the following:    (1) formation method of pattern to develop. The photosensitive resin composition is applied on a layer which consists of solid content of a substrate. Then a volatile component is removed from the applied photosensitive resin composition layer, and the layer is exposed through a photomask;    (2) color filter which contains the pattern; and    (3) liquid crystal display which uses the color filter.