WO2004089822-A1  HOUJIN HUANG ET AL.: &apos;14N C60 formation in a nitrogen rf-plasma&apos; CHEM. COMMUN. no. 18, 2002, pages 2076 - 2077, XP002904723;  HOUJIN HUANG ET AL.: '14N@C60 formation in a nitrogen rf-plasma' CHEM. COMMUN. no. 18, 2002, pages 2076 - 2077, XP002904723;  PIETZAK B. ET AL.: &apos;Properties of endohedral N C60&apos; CARBON vol. 36, no. 5-6, 1998, pages 613 - 615, XP004124238;  PIETZAK B. ET AL.: 'Properties of endohedral N@C60' CARBON vol. 36, no. 5-6, 1998, pages 613 - 615, XP004124238;  WATANABE S. ET AL.: &apos;Synthesis of endohedral 133Xe-fullerene by ion implantation&apos; JAERI-REVIEW no. 2001-039, 2001, pages 228 - 229, XP008040726;  WATANABE S. ET AL.: 'Synthesis of endohedral 133Xe-fullerene by ion implantation' JAERI-REVIEW no. 2001-039, 2001, pages 228 - 229, XP008040726;  KOMATSU KOICHI ET AL.: &apos;Naiho fullerene no yuki gosei ni idomu&apos; CHEMISTRY vol. 59, no. 2, 01 February 2004, pages 23 - 28, XP002983025;  KOMATSU KOICHI ET AL.: 'Naiho fullerene no yuki gosei ni idomu' CHEMISTRY vol. 59, no. 2, 01 February 2004, pages 23 - 28;  HATAKEYAMA R. ET AL.: &apos;Arc hoden ni yoru tanso cluster no gosei to oyo, 6. fullerene plasma no seishitsu to oyo&apos; JOURNAL OF PLASMA AN FUSION RESEARCH vol. 75, no. 8, 1999, pages 927 - 933, XP002976400;  HATAKEYAMA R. ET AL.: &apos;Formation of alkali- and Si-endohedralfullerenes based on plasma technology&apos; ELECTROCHEMICAL SOCIETY PROCEEDINGS vol. 2001-11, 2001, pages 341 - 348, XP002976399;  HATAKEYAMA R. ET AL.: 'Arc hoden ni yoru tanso cluster no gosei to oyo, 6. fullerene plasma no seishitsu to oyo' JOURNAL OF PLASMA AN FUSION RESEARCH vol. 75, no. 8, 1999, pages 927 - 933, XP002976400;  HATAKEYAMA R. ET AL.: 'Formation of alkali- and Si-endohedralfullerenes based on plasma technology' ELECTROCHEMICAL SOCIETY PROCEEDINGS vol. 2001-11, 2001, pages 341 - 348, XP002976399;  HATAKEYAMA R.: &apos;Teijoteki hoden plasma no gensho o oyo&apos; THE JOURNAL OF THE JAPAN RESEARCH GROUP OF ELECTRICAL DISCHARGES vol. 45, no. 4, 2002, pages 73 - 82, XP002983024;  HATAKEYAMA R.: 'Teijoteki hoden plasma no gensho o oyo' THE JOURNAL OF THE JAPAN RESEARCH GROUP OF ELECTRICAL DISCHARGES vol. 45, no. 4, 2002, pages 73 - 82;  HIRATA T. ET AL.: &apos;The K+-C60 plasma for material processing&apos; PLASMA SOURCES SCI. TECHNOL. vol. 5, 1996, pages 288 - 292, XP002904722;  HIRATA T. ET AL.: 'The K+-C60 plasma for material processing' PLASMA SOURCES SCI. TECHNOL. vol. 5, 1996, pages 288 - 292, XP002904722KR1124178-B1  Electrochemical society proceedings, Vol.2001-11, Abstract, 2001.;  J. Vac. Sci. Technol. A, 14(2), pages 615-618, Mar/Apr 1996.