TECHNOLOGY FOCUS - POLYMERS - Preferred Material: The polymer sheets are polyethylene terephthalate (polyester or PET) and polyimide Kapton KJ. Preferred Method: The treatment of the substrate with nitrogen plasma consists placing the polymer substrates in a substrate holder in a vacuum chamber at at most1x10-4 Pa; connecting the substrate holder to a source of supply; establishing a nitrogen gas flow in the vacuum chamber, maintaining the pressure in the vacuum chamber at 2 Pa; establishing the power level for the ignition of the plasma to start the plasma attack on the exposed side of the polymer substrates; and reducing the power level until the plasma is extinguished, after the time required for the preparation of the exposed side of the polymer substrate. Deposition by cathode sputtering of the ITO electrodes consists leaving the substrates in the vacuum chamber in the substrate holder, again reducing the vacuum pressure to 1x10-4 Pa; positioning a cathode sputtering target over the substrate holder; connecting the sputtering target to the source of supply; establishing a flow of argon and oxygen gases inside of the vacuum chamber; forming a reactive argon/oxygen atmosphere; maintaining the pressure in the vacuum chamber at 0.5 Pa; establishing the power level; igniting a plasma to start the cathode sputtering of the material of the target on the exposed side of the polymer substrates; and reducing the power level until the plasma is extinguished after obtaining the thickness required for the ITO electrode on the polymer substrates. The ITO electrode is prepared without heating the polymer sheets. The ITO film is prepared in reactive sputtering conditions, without damaging the polymer sheets in the reactive argon/oxygen atmosphere used. Preferred Parameter: The time established for the plasma attack on the substrate is approximately 20 seconds. The substrate has a light transmission of nearly 80% in the 400-1100 nm spectra range. The ITO electrode analyzed by x-ray diffraction shows an intensity ratio of the principal (400)/(222) peaks of up to 0.83. Preferred Property: The ITO electrode on a polymer sheet base has a resistivity value as low as 4 OMEGA/square.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The cathode sputtering target consists of a mix of indium oxides and tin in tablet form. Preferred Parameter: The mix of indium oxides and tin is formed by In2O3/SnO2 in a ratio of 19/1. The cathode sputtering process is established with a deposition speed of 1.2 nm/s for the ITO electrode.