NOVELTY - Texturing an as cut unpolished semiconductor material comprises: negatively biasing semiconductor material to potential more negative than minus sixty volts relative to standard reference electrode; and illuminating exposed part of surface contacted and wetted by etching solution, during negative biasing, for period of time starting from initiation of illuminating, such that value of cathodic current density of semiconductor material is higher.    USE - For texturing an as cut unpolished semiconductor material used for manufacturing a solar cell or a photovoltaic panel (claimed).    ADVANTAGE - The method decreases reflectance of incident sunlight away from the semiconductor material surfaces, thus improving trapping of the solar energy inside the semiconductor materials of the solar cells or photovoltaic panels.    DETAILED DESCRIPTION - Texturing an as cut unpolished semiconductor material, comprises:    (a) exposing part of a surface of the semiconductor material to an etching solution, such that the exposed part of the surface is contacted and wetted by the etching solution;    (b) negatively biasing the semiconductor material to a potential more negative than minus sixty volts relative to a standard reference electrode; and    (c) illuminating the exposed part of the surface contacted and wetted by the etching solution, during the negative biasing, for a period of time starting from initiation of the illuminating, such that value of cathodic current density of the semiconductor material is higher at end of the illumination time period than at beginning of the illumination time period.    An INDEPENDENT CLAIM is also included for a textured semiconductor material.    DESCRIPTION OF DRAWING(S) - The figure is a graphical plot of cathodic current density (A/cm2) as a function of time (sec), representing proposed model graphically illustrating the multi-phenomenological behavior of value of cathodic current density of as cut unpolished semiconductor material as function of time, during negative biasing time period, during dark conditions, of texturing method.