NOVELTY - Formation of a transparent conductive oxide film comprises depositing the transparent conductive film in a pulsed direct current (DC) reactive ion process with a substrate bias; and controlling at least one process parameter to provide at least one characteristic of the conductive oxide film at a particular value.    USE - The method is for forming transparent conductive oxide film for deposition on a substrate (claimed) used for solar cells, organic light emitting diodes, electric field devices, current devices (i.e. touch screens), energy efficient windows, conductive anti-reflective devices, electromagnetic interference shields, heaters, transparent electrodes, and coatings for cathode ray tube displays. The film is also used for touch sensitive micro-electro-mechanical devices, such as those used, e.g. in fingerprint sensors.    ADVANTAGE - The smoother layers of transparent conductive oxides can be cost effectively deposited with greater control over layer properties such as resistivity and transparency. By applying RF bias on wafer during deposition, the deposited film can be densified by energetic ion bombardment and the columnar structure can be eliminated.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for depositing a transparent conductive oxide film on a substrate, comprising:    (1) placing the substrate in a reaction chamber;    (2) adjusting power to a pulsed DC power supply (14) coupled to a target (12) in the reaction chamber;    (3) adjusting a radio frequency (RF) bias power (18) coupled to the substrate;    (4) adjusting gas flow into the reaction chamber; and    (5) providing a magnetic field at the target in order to direct deposition of the film on the substrate in a pulsed-DC biased reaction deposition process, where the film exhibits at least one particular property.    DESCRIPTION OF DRAWING(S) - The figure illustrated a pulsed-DC biased reactive ion deposition apparatus.    Reactor apparatus (10)    Target (12)    Pulsed DC power supply (14)    Substrate (16)    RF bias power (18)    Plasma (53)