NOVELTY - A surface treating agent comprises fluorine-containing compounds (A) or perfluoro polyether (B). Compound (A) is reactive group-containing compound (i), partially condensed silsesquioxane (ii), condensed product of partially condensed silsesquioxane and bissilane (iii), polymer (iv) obtained by polymerizing specific monomer, and low molecular weight perfluoro polyether compound (v). Component (ii) has molecular weight of 500-100000.    USE - For manufacture of substrate having pattern used for manufacture of functional material which is used in analytic chemistry, electronic device, optical device and medical device (all claimed), such as transistor, memory, electroluminescent element, solar cell, flexible display, wireless tag, wearable computer, optical memory, image memory, light modulator, optical shutter, harmonic element, polarizing element, photo Nitta crystal, lens array, biochip and DNA array.    ADVANTAGE - The irradiation time required for patterning a coating film of surface treating agent by lithography method is shortened.    DETAILED DESCRIPTION - A surface treating agent comprises fluorine-containing compounds having 1-5C fluoro alkyl group, or a perfluoro polyether having molecular weight of 1000 or less. The fluorine-containing compound is a reactive group-containing compound of formula (i): Rf-A-B, a partially condensed silsesquioxane of formula (ii): (R-Si(OH)O2/2)l(R'-SiO3/2)m, a condensed product of partially condensed silsesquioxane and bissilane (iii), a polymer of formula (iv): (Rf-A'-OCOCH2CZH)n-A-B, and a low molecular weight perfluoro polyether compound of formula (v): PFPE-A-B. The partially condensed silsesquioxane (ii) has molecular weight of 500-100000. The polymer (iv) is obtained by polymerizing monomer having 1-5C fluoroalkyl group. The surface treating agent enables preparation of a substrate having a pattern comprising several regions having different surface free energies by a lithography method.    Rf=1-5C fluoro alkyl group;    A=coupling group containing oxygen atom or 1-4C alkylene group;    B=silane base of formula: -SiXnY3-n, thiol group (-SH), sulfide group (-S-), disulfide group (-S-S-) or phosphoric acid group of formula: P(=O)(OH)l(O-)3-l;    X=H, halogen or 1-4C alkoxy group;    Y=1-4C alkyl;    n=1-3;    l=1-3;    R,R'=Rf, Rf-A, 1-10C alkyl or derivative of 1-10C alkyl;    Rf=1-5C fluoro alkyl;    A of Rf-A=coupling group containing oxygen atom, 1-4C alkylene, -SO2N (R21)R22- or -CH2CH(OH)CH2-;    R21=1-4C alkyl;    R22=1-4C alkylene;    m=1 or more;    A'=coupling group containing oxygen atom, 1-4C alkylene, group of formula: -R2-N(R1)-S(=O)(=O)-O or group of formula: -CH2-CH(OH)-CH2-;    R1=1-4C alkyl;    R2=1-4C alkylene;    Z=H or CH3, or fluorine or chlorine;    n in formula (iv)=1-1000;    PFPE=perfluoro polyether base having molecular weight of 1000 or less;and    A of formula (v)=same as A' excluding coupling group.    INDEPENDENT CLAIMS are included for the following:    (1) manufacture of substrate having pattern, which involves using the surface treating agent;    (2) substrate having pattern obtained by the above method;    (3) manufacture of functional material, which involves applying a functional compound solution on pattern substrate, and removing solvent; and    (4) functional material manufactured by the above method.    DESCRIPTION OF DRAWING(S) - The graph shows the result of in-water contact angle of surface-treated substrate. (Drawing includes non-English language text).