NOVELTY - The fluorine gas generator (30) has a flow control valve (56) provided at a piping (52) to control flow rate of fluorine gas passed through the piping. A controller (57) adjusts the valve opening based on information indicating the state of an electrolytic cell (32). A cartridge (54) arranged at the piping, contains a pellet of sodium chloride to absorb hydrogen fluoride mixed with gas passed through the piping.    USE - For generating fluorine gas in semiconductor processing system used for performing etching, diffusion and film formation with respect to substrate such as semiconductor wafer and liquid crystal display (LCD) substrate, during manufacture of semiconductor device.    ADVANTAGE - The fluorine gas generator is operated with high safety and reliability, for long duration.    DETAILED DESCRIPTION - The electrolytic cell generates by product gases containing fluorine and hydrogen gases as main components by electrolyzing hydrogen fluoride in a fused salt. The by product gases are passed through the pipings (52,72). The flow control valve provided at the piping (52) controls flow rate of fluorine gas passed through the piping. The opening of the valve is adjusted based on information indicating the state of the electrolytic cell. The cartridge (54) arranged at the piping (52), contains a pellet of sodium chloride to absorb hydrogen fluoride mixed with gas passed through the piping and mist of fused salt. The other cartridge (74) arranged at the piping (72) contains pellet of sodium fluoride to absorb mist of fused salt. The other flow control valve (76) provided at the piping (72) controls flow rate of gas passed through corresponding piping. The controllers (57,77) adjust the openings of the respective valves (56,76) based on information indicating state of the electrolytic cell and pressures of gaseous-phase portions of anode and cathode chambers (34,36) measured using pressure indicators (46,48).    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of the semiconductor processing system incorporating fluorine gas generator.    semiconductor processor (10)    processing chamber (12)    exhaust system (18)    gas supply system (20)    fluorine gas generator (30)    electrolytic cell (32)    anode chamber (34)    cathode chamber (36)    pressure indicators (46,48)    pipings (52,72)    cartridges (54,74)    flow control valves (56,76)    controllers (57,77)