WO2005006482-A1 -- JP2003157914-A   FUJI PHOTO FILM CO LTD (FUJF)   ONO M;  EP1653549-A1 -- JP2003157914-A   FUJI PHOTO FILM CO LTD (FUJF)   ONO M;  KR838805-B1 -- JP2003157914-A   FUJI PHOTO FILM CO LTD (FUJF)   ONO M;  AU2007202986-B2 -- AU2003268729-A1   DAIKIN IND LTD (DAIK)   KOH M,  ARAKI T;  US4189827-A   ;  EP2234132-A2 -- JP09328307-A   ;  US4189827-A   ;  US5128006-A   AT & T BELL LAB (AMTT)   MITCHELL J W,  VALDES J L;  JP2001160427-A   TOSHIBA KK (TOKE)   MIKOSHIBA S,  SUMINO H,  YONETSU M,  HAYASE S;  JP2002184478-A   ;  JP2664194-B2   GEBR SULZER AG (SULZ);  SULZER INNOTEC AG (SULZ);  GRATZEL M (GRAT-Individual);  EPFL ECOLE POLYTECHNIQUE FED LAUSANNE (EPFL)   GRATZEL M;  EP2234133-A2 -- JP2003157914-A   FUJI PHOTO FILM CO LTD (FUJF)   ONO M;  US20020018938-A1   ;  WO2003054894-A1   SONY INT EURO GMBH (SONY);  SONY CORP (SONY)   NELLES G,  MITEVA T,  NODA K,  YASUDA A;  JP2001160427-A   TOSHIBA KK (TOKE)   MIKOSHIBA S,  SUMINO H,  YONETSU M,  HAYASE S;  JP2002184478-A   ;  JP2664194-B2   GEBR SULZER AG (SULZ);  SULZER INNOTEC AG (SULZ);  GRATZEL M (GRAT-Individual);  EPFL ECOLE POLYTECHNIQUE FED LAUSANNE (EPFL)   GRATZEL M;  JP4579160-B2 -- JP11306858-A   ;  JP11306859-A   ;  JP2001229967-A   ;  JP2003157719-A   HITACHI MAXELL KK (HITM)   MORIMOTO H,  NISHIHARA S,  MIYATA I;  JP2003157914-A   FUJI PHOTO FILM CO LTD (FUJF)   ONO M;  JP2006525632-A   ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (EPFL)   WANG P,  ZAKEERUDDIN S,  GRAETZEL M;  US7872191-B2 -- AU2003268729-A1   DAIKIN IND LTD (DAIK)   KOH M,  ARAKI T;  AU2004235426-A1   ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (EPFL)   WANG P,  ZAKEERUDDIN S,  GRAETZEL M;  EP855726-A1   LECLANCHE SA (LECL-Non-standard)   DESILVESTRO H,  AZAM A,  PETTERSON H;  EP1551036-A1   DAIKIN IND LTD (DAIK)   KOH M,  ARAKI T;  JP09328307-A   ;  JP11306858-A   ;  JP11306859-A   ;  JP2001160427-A   TOSHIBA KK (TOKE)   MIKOSHIBA S,  SUMINO H,  YONETSU M,  HAYASE S;  JP2001229967-A   ;  JP2002184478-A   ;  JP2003055649-A   ISHIZUKA KENKYUSHO (ISHI-Non-standard)   KAYAMA T,  YAMANAKA H,  ISHIZUKA H;  JP2003157719-A   HITACHI MAXELL KK (HITM)   MORIMOTO H,  NISHIHARA S,  MIYATA I;  JP2003157914-A   FUJI PHOTO FILM CO LTD (FUJF)   ONO M;  JP2006525632-A   ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (EPFL)   WANG P,  ZAKEERUDDIN S,  GRAETZEL M;  JP2664194-B2   GEBR SULZER AG (SULZ);  SULZER INNOTEC AG (SULZ);  GRATZEL M (GRAT-Individual);  EPFL ECOLE POLYTECHNIQUE FED LAUSANNE (EPFL)   GRATZEL M;  US4189827-A   ;  US4927721-A   GEBR SULZER AG (SULZ);  SULZER INNOTEC AG (SULZ);  GRATZEL M (GRAT-Individual);  EPFL ECOLE POLYTECHNIQUE FED LAUSANNE (EPFL)   GRATZEL M;  US5128006-A   AT & T BELL LAB (AMTT)   MITCHELL J W,  VALDES J L;  US20020055046-A1   ;  US20020085968-A1   ;  US20030179537-A1   ;  US20030196692-A1   ;  US20080006322-A1   ;  US6301039-B1   ROCKWELL TECHNOLOGIES LLC (ROCW)   TENCH D M;  US7074310-B2   UNIV RICE WILLIAM MARSH (RICV)   SMALLEY R E,  HAUGE R H,  KITTRELL W C,  SIVARAJAN R,  STRANO M S,  BACHILO S M,  WEISMAN R B;  WO2004097871-A2   ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (EPFL)   WANG P,  ZAKEERUDDIN S,  GRAETZEL M;  EP1653549-B1 -- JP2003157914-A   FUJI PHOTO FILM CO LTD (FUJF)   ONO M