TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The acid has a pKa of less than or equal to2 or less than or equal to0. Preferred Component: The acid comprises an inorganic acid comprising hydrochloric acid, nitric acid, perchloric acid, chloric acid, hydrogen iodide, hydrogen bromide, or thiocyanic acid. The solvent comprises water. An initiator is also added and comprises an oxidant comprising an iron (II) salt (preferably), hydrogen peroxide, potassium chromate, alkali metal persulfates, ammonium persulfates, alkali metal perborates, potassium permanganate, or copper salts. The iron (III) salt comprises ferric chloride (FeCl3) or ferric chlorate (Fe(ClO3). The conductive material comprises indium tin oxide, tin oxide, or fluorine-doped tin oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The acid has a pKa of less than or equal to2 or less than or equal to0. Preferred Component: The acid comprises an inorganic acid comprising hydrochloric acid, nitric acid, perchloric acid, chloric acid, hydrogen iodide, hydrogen bromide, or thiocyanic acid. The solvent comprises water. An initiator is also added and comprises an oxidant comprising an iron (II) salt (preferably), hydrogen peroxide, potassium chromate, alkali metal persulfates, ammonium persulfates, alkali metal perborates, potassium permanganate, or copper salts. The iron (III) salt comprises ferric chloride (FeCl3) or ferric chlorate (Fe(ClO3). The conductive material comprises indium tin oxide, tin oxide, or fluorine-doped tin oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The acid comprises an organic acid comprising trifluoromethanesulfonic acid, benzenesulfonic acid, methanesulfonic acid, p-toluenesulfonic acid, or tricyanomethane. The monomer comprises a thiophene monomer, preferably ethylene dioxythiophene. The solvent comprises a polar organic solvent comprising an alcohol, a sulfoxide, a sulfone, an amide, or a nitrile. It comprises methanol, ethanol, i-propanol, dichloromethane, dichloroethane, acetonitrile, dimethyl sulfoxide, sulfolane, methyl acetamide, or dimethyl formamide. The iron (III) salt can be iron (III) salt of organic acids. It comprises iron (III) tosylate. Preferred Composition: The composition comprises at least 0.01 or less than or equal to0.02 molar acid. A ratio of a molar concentration of the monomer to a molar concentration of the initiator in the composition is less than or equal to5. POLYMER - Preferred Component: The polymer is transparent. It is a polythiophene. Preferred Method: The monomer is polymerized by heating the surface comprising the polymer at above 50 or above 100degreesC, after disposing the solution on the surface to form a layer on the surface comprising the polymer. The surface is washed after forming the layer, by exposing the layer to a washing solvent comprising a polar solvent, i.e. water or alcohol. Preferred Property: The layer is less than 100 or less than 50 nm thick. The second layer is less than or equal to100 or less than or equal to50 nm. EXAMPLE - A 0.04 g ethylene-dioxythiophene and 1 g Baytron CB-40 (Bayer, 40 weight percent iron tosylate in 1-butanol) were dissolved in 3 g 1-butanol. The resulting solution was applied on a substrate at 400 rpm for 110 seconds. The coated film was heated at 120degreesC for 5 minutes and cooled. The resulting film was washed using methanol. The coating completely peeled off the base during washing. The transmission of film at 550 nm was 83% (about the same as a clean substrate that is 83.5%).