TECHNOLOGY FOCUS - POLYMERS - Preferred Diene: The fluorine-containing diene (1) is preferably of formula (2): CF2=CFCH2CHQ1-(CH2)2CR2=CHR3 or formula (3): CF2=CFCH2CHQ2-CR2=CHR3.R2,R3=same as defined above;andQ1,Q2=Q.The fluorine-containing diene of formula (14) is preferably of formula (14-1): CF2=CFCF2C(CF3)(OH)-(CH2)nCR2=CHR3, where R2,R3 and n are same as defined above. The diene of formula (14-1) is preferably of formula (14-1-1): CF2=CFCF2C(CF3)(OH)-CH=CH2, or formula (14-1-2): CF2=CFCF2C(CF3)(OH)-CH2CH=CH2. The fluorine-containing diene of formula (15) is preferably of formula (15-1): CF2=CFCH2CH(C(CF3)2(OH))(CH2)nCR2=CHR3, where R2, R3 and n are same as defined above. The diene of formula (15-1) is preferably of formula (15-1-1): CF2=CFCH2CH(C(CF3)2(OH)CH2CH=CH2. The vinyl ester group monomer of formula (16) is preferably of formula (16-1): CH2=CHOC(O)CH3 or formula (16-2): CH2=CHOC(O)CH2CH3. EXAMPLE - Compound (CF2ClCFClCF2C(O)CF3) (in g) (254) and dehydrated tetrahydrofuran (1500 ml) were mixed and cooled to -20degreesC. Tetrahydrofuran solution of magnesium bromide compound (CH2=CHMgBr) (850 ml) was added for 1.5 hours in nitrogen atmosphere. The resulting solution was stirred at 0degreesC after dripping completion for 120 minutes. 1N hydrochloric acid (850 ml) was added, and the two layers of reaction solution were separated. The organic layer, which was the upper layer, was recovered, and low-boiling-point component was removed by vacuum distillation, to obtain rough target component (CF2ClCFClCF2C(CF3)(OH)CH=CH2) (234). Zinc (47) and water (200 ml) were added, and the obtained target compound was continuously dripped. Zinc (20) was further added after dripping completion, and stirring was continued for 36 hours. Zinc, which remained, was removed, and rough product (CF2=CFCF2C(CF3)(OH)CH=CH2) was obtained. The obtained product was vacuum distillated to obtain pure product (monomer) (45). A powder-form white polymer having weight average molecular weight of 12800, molecular weight distribution of 2.25 and glass transition temperature of 83degreesC, was obtained using the obtained monomer. The polymer was used for forming a resist composition. The obtained resist composition provided a resist pattern with excellent sensitivity, resolution, flatness, and heat resistance.