TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Phosphor Layer: At least one phosphorescent phosphor layer contains a photostimulable phosphor containing an alkali halide of formula (M1XxaM2X'xbM3X":eA) as base.M1 = alkali-metal atom chosen from lithium, sodium, potassium, rubidium and/or cesium;M2 = divalent-metal atom chosen from beryllium, magnesium, calcium, strontium, barium, zinc, cadmium, copper and/or nickel;M3 = trivalent metal atom chosen from scandium, yttrium, lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium, aluminum, gallium and/or indium;X, X' and X" = halogen atoms chosen from fluorine, chlorine, bromine and/or iodine;A = metal atom chosen from europium, terbium, indium, cerium, thulium, dysprosium, praseodymium, holmium, neodymium, ytterbium, erbium, gadolinium, lutetium, samarium, yttrium, thallium, sodium, silver, copper and/or magnesium;0 less than or equal to a less than 0.5;0 less than or equal to b less than 0.5; and0 less than e less than or equal to 0.2.Preferred Adhesive Layer: The adhesive layer is vapor deposited on a support, followed by vapor-depositing photostimulable phosphor. The adhesive layer containing SiOx (where x = 1.3-1.7) has a film thickness of 50 nm to 10 microns.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Phosphor Layer: At least one phosphorescent phosphor layer contains a photostimulable phosphor containing an alkali halide of formula (M1XxaM2X'xbM3X":eA) as base.M1 = alkali-metal atom chosen from lithium, sodium, potassium, rubidium and/or cesium;M2 = divalent-metal atom chosen from beryllium, magnesium, calcium, strontium, barium, zinc, cadmium, copper and/or nickel;M3 = trivalent metal atom chosen from scandium, yttrium, lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium, aluminum, gallium and/or indium;X, X' and X" = halogen atoms chosen from fluorine, chlorine, bromine and/or iodine;A = metal atom chosen from europium, terbium, indium, cerium, thulium, dysprosium, praseodymium, holmium, neodymium, ytterbium, erbium, gadolinium, lutetium, samarium, yttrium, thallium, sodium, silver, copper and/or magnesium;0 less than or equal to a less than 0.5;0 less than or equal to b less than 0.5; and0 less than e less than or equal to 0.2.Preferred Adhesive Layer: The adhesive layer is vapor deposited on a support, followed by vapor-depositing photostimulable phosphor. The adhesive layer containing SiOx (where x = 1.3-1.7) has a film thickness of 50 nm to 10 microns.