TECHNOLOGY FOCUS - ELECTRONICS - Preferred Arrangement: The live portion has medium regeneration unit to regenerate acid medium and/or basic medium from electric power generation product. The reaction substance regeneration unit has anode and cathode, and further has direct current power supply. Oxygen and water are supplied to cathode, and hydrogen peroxide is regenerated. The medium regeneration unit has salt room, acid room and base room formed by arranging cation exchange membrane, bipolar film and anion exchange membrane. The neutralized salt water solution, which is electric power generation product is supplied to slat room and electrodialyzed. The aqueous acid and basic aqueous solution are emitted from acid room and base room, respectively. A flow path structure in which aqueous acid and basic aqueous solution form laminar flow, is provided inside the portion (a). Preferred Electrodes: The electrodes (I,II) consist of platinum, platinum black, platinum-oxide coated platinum, silver, gold, passivated titanium, passivated nickel, passivated aluminum, carbon structure, amorphous carbon and/or glassy carbon, and have shape of plate, thin film, mesh or fiber.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Mediums: The acid and basic mediums contain reaction substance, which is hydrogen peroxide. The reaction substance contained in acid and basic mediums are same. The acid medium contains aqueous acid chosen from sulfuric acid, methane sulfonic acid, trifluoro methane sulfonic acid, hydrochloric acid, hydroiodic acid, hydrobromic acid, perchloric acid, periodic acid, ortho phosphoric acid, polyphosphoric acid, nitric acid, tetrafluoro boric acid, hydrogen hexafluorosilicate, hexafluoro phosphate, hexafluoro arsenic acid, hexachloroplatinic acid, acetic acid, trifluoro acetic acid, citric acid, oxalic acid, salicylic acid, tartaric acid, maleic acid, malonic acid, phthalic acid, picric acid and/or fumaric acid. The basic medium contains basic aqueous solution having base and alkali metal salt. The base is sodium hydroxide, potassium hydroxide, calcium hydroxide, lithium hydroxide, barium hydroxide, magnesium hydroxide, ammonium hydroxide, hydrated tetramethyl ammonium, hydrated tetraethyl ammonium, hydrated tetrapropyl ammonium and/or hydrated tetrabutyl ammonium. The alkali metal salt is sodium carbonate, sodium hydrogen carbonate, potassium carbonate, potassium hydrogen carbonate, sodium borate, potassium borate, silicate, potassium silicate, sodium tripolyphosphate, potassium tripolyphosphate, sodium aluminate and/or potassium aluminate. The acid medium and basic medium are respectively arranged with respect to electrodes by non-electrolytic plating, vapor deposition or sputtering method.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Mediums: The acid and basic mediums contain reaction substance, which is hydrogen peroxide. The reaction substance contained in acid and basic mediums are same. The acid medium contains aqueous acid chosen from sulfuric acid, methane sulfonic acid, trifluoro methane sulfonic acid, hydrochloric acid, hydroiodic acid, hydrobromic acid, perchloric acid, periodic acid, ortho phosphoric acid, polyphosphoric acid, nitric acid, tetrafluoro boric acid, hydrogen hexafluorosilicate, hexafluoro phosphate, hexafluoro arsenic acid, hexachloroplatinic acid, acetic acid, trifluoro acetic acid, citric acid, oxalic acid, salicylic acid, tartaric acid, maleic acid, malonic acid, phthalic acid, picric acid and/or fumaric acid. The basic medium contains basic aqueous solution having base and alkali metal salt. The base is sodium hydroxide, potassium hydroxide, calcium hydroxide, lithium hydroxide, barium hydroxide, magnesium hydroxide, ammonium hydroxide, hydrated tetramethyl ammonium, hydrated tetraethyl ammonium, hydrated tetrapropyl ammonium and/or hydrated tetrabutyl ammonium. The alkali metal salt is sodium carbonate, sodium hydrogen carbonate, potassium carbonate, potassium hydrogen carbonate, sodium borate, potassium borate, silicate, potassium silicate, sodium tripolyphosphate, potassium tripolyphosphate, sodium aluminate and/or potassium aluminate. The acid medium and basic medium are respectively arranged with respect to electrodes by non-electrolytic plating, vapor deposition or sputtering method.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The acid medium contains acidic ionic conductive gel, which gelatinizes aqueous acid by cross-linking polyacrylic acid, water glass, anhydrous silicon dioxide, agar or its salts. The basic medium contains basic ionic conductive gel, which gelatinizes basic aqueous solution by carboxymethyl cellulose, cross-linking polyacrylic acid or its salts.