NOVELTY - A photovoltaic cell comprises: a first passivation layer positioned over a first wafer surface; first and second electrical contacts positioned over a second wafer surface; a second passivation layer positioned over the second wafer surface; and a semiconductor material layer of conductivity opposite to that of wafer and positioned in the region between the second passivation layer and the first contact.    USE - For generating electrical energy.    ADVANTAGE - The invention provides photovoltaic cells that are highly efficient in converting light energy, particularly solar energy, to electrical energy.    DETAILED DESCRIPTION - A photovoltaic cell comprises: a wafer (5) including a semiconductor material of a first conductivity type and comprising a first light receiving surface and a second surface opposite the first surface; a first passivation layer positioned over the first surface of the wafer; a first electrical contact positioned over the second surface of the wafer; a second electrical contact (45) positioned over the second surface of the wafer and separated electrically from the first electrical contact; a second passivation layer (25) positioned over the second surface of the wafer in the region on the wafer that is at least between the first electrical contact and the second surface of the wafer; and a layer comprising a semiconductor material of a conductivity opposite the conductivity of the wafer and positioned in the region between the second passivation layer and the first contact.    INDEPENDENT CLAIMS are also included for:    (a) a method for making a photovoltaic cell, comprising: depositing a first passivation layer on a first surface of a wafer; depositing a second passivation layer on a second surface of the wafer; depositing a layer of semiconductor material having conductivity type opposite the wafer over the second passivation layer; optionally depositing a transparent conductive oxide (TCO) layer (35) over the layer of semiconductor material; depositing a first electrical contact layer over the layer of semiconductor material or the TCO layer; forming holes through at least the first electrical contact layer and the TCO layer; depositing a layer of insulating material over the first electrical contact layer and into the holes; depositing a second electrical contact layer over the insulating layer; and forming point contacts from the second electrical contact layer to the wafer;    (b) a method for forming an electrical contact between an electrical conducting layer and a second layer, comprising: forming a first opening in a third layer positioned between the electrical conducting layer and the second layer; forming an insulating layer comprising an insulating material over the third layer, wherein the insulating material fills the first opening; forming a second opening in the insulation layer inside an area of the first opening leaving a region of the insulation material along a perimeter of the second opening; and forming a layer of electrical conducting material over the insulation layer and filling the second opening to form an electrical contact between the electrical conduction layer and the second layer; and    (c) an electrical contact made by the method.    DESCRIPTION OF DRAWING(S) - The figure shows a cross-sectional view of a portion of a photovoltaic cell having point contacts.    Wafer (5)    Texture line (10)    First passivation layer (15)    Layer of silicon nitride (20)    Second passivation layer (25)    Layer of n-type amorphous hydrogenated silicon (30)    TCO layer (35)    Metal layers (40, 48)    Second contact (45)    Point contacts (55)    Dimples (60)    Back surface field (65)