NOVELTY - An apparatus (1) comprises a processing chamber; a main roll disposed at center of chamber to move polymeric article while article is wrapped around outer periphery of roll; a radiofrequency power supply unit (22) with radiofrequency power supply (22a), matching box (22b) and antenna (22c) to supply radiofrequency power for generation of plasma; a process gas supply unit (24); a pumping unit for reducing pressure in chamber; and a grid unit.    USE - For treating a film-shaped polymeric article e.g. a carrier tape, a spacer film, an antistatic sheet, a reflective plate, a less reflective film, a diffusive plate, an LCD protection film, a prism film, a semiconductor tray, an LCD module tray (claimed).    ADVANTAGE - By using the apparatus for treating a three-dimensional molded polymeric article, a problem of deterioration of surface conductivity dose not occur even though a certain period of time passes or temperature is raised. The plasma sheet is generated to conform to the surface contours of the three-dimensional molded polymeric article and a proper ion motion distance is secured. Thus, the entire surface of the article is treated uniformly. The ions are deeply implanted into the surface of the polymeric article, and therefore it is possible to obtain a three-dimensional molded polymeric article with superior surface conductivity.    DETAILED DESCRIPTION - The processing chamber defines a hermetic space. The grid unit includes a negative voltage generator and a grid to focus ions. The process gas supply unit includes a process gas source, a process gas supply passage and a flow rate control unit to supply a process gas for constituting the plasma generated within the processing chamber. The pumping unit maintains the interior of the processing chamber under a vacuum condition. The antenna and the grid are provided to be spaced apart by a distance of 250 - 400 mm from each other.    An INDEPENDENT CLAIM is included for a method for treating a film-shaped polymeric article.    DESCRIPTION OF DRAWING(S) - The figure shows a sectional view of the apparatus.    apparatus (1)    loading chamber (10)    pre-processing chamber (20)    radiofrequency power supply (22a)    matching box (22b)    antenna (22c)    process gas source (24a)    process gas supply passage (24b)    flow rate control unit (24c)    negative voltage generator (26a)    grid (26b)