TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compound: The inorganic metal compound is oxide, nitride or oxynitride of silicon, aluminum, magnesium, titanium, tantalum, indium, tin and zinc preferably SiOx, where x is 1.0-1.9. Preferred Film: The laminated film has water vapor permeability of 1 g/m2/day or less and oxygen permeating degree of 5 cc/m2/day or less. The laminated film further has a transparent conductive layer which consists of oxide of indium, tin, gallium, zinc and aluminum.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The inorganic metal compound is oxide, nitride or oxynitride of silicon, aluminum, magnesium, titanium, tantalum, indium, tin and zinc preferably SiOx, where x is 1.0-1.9. Preferred Film: The laminated film has water vapor permeability of 1 g/m2/day or less and oxygen permeating degree of 5 cc/m2/day or less. The laminated film further has a transparent conductive layer which consists of oxide of indium, tin, gallium, zinc and aluminum.    TECHNOLOGY FOCUS - POLYMERS - Preferred Resin: The acrylic resin having lactone ring, has repeating unit (A) of formula (1), and repeating unit (B) of formula (2). The content (a) of repeating unit (A) and content (b) of repeating unit (B) satisfies the relation: a/(a+b)=3-50 mol%.R1,R2,R3=undefined.Preferred Layer: The resin layer consists of acrylic resin and energy beam curable resin. The amount of acrylic resin is 60 wt.% or less with respect to the total amount of acrylic resin and energy beam curable resin. EXAMPLE - A biaxially stretching polyethylene terephthalate film of thickness 125 microns was used. A resin solution obtained by mixing resin (a1) (n:m=20:80) and resin (a2) (n;m=25:75) of formula (3) in weight ratio of 1:1, in toluene and methyl isobutyl ketone, was applied on one surface of the film. A solution of NK oligo U6HA-50P was coated on the film and dried. The coated surface was irradiated with UV light. A resin layer of thickness 2.5 microns was formed. The film with resin layer was provided in a sputtering chamber and silicon oxide layer was formed on resin layer by magnetron sputtering. A transparent gas barrier laminated film was obtained. The laminated film had water vapor permeability of 0.09 g/m2/day, oxygen permeation of 1.0 cc/m2/day and total light transmittance of 90%.