NOVELTY - The thin film solar cell for minimizing dissipation of electrical power, comprises a unit cell of a first solar cell layer with a multi-junction structure and a second solar cell layer, which are mutually electrically connected in parallel, a transparent insulating layer at adjacent portions of each cell to be electrically insulated, and a repeat unit. The solar cell layers are an amorphous silicon solar cell layer or a microcrystalline silicon solar cell layer. The amorphous silicon solar cell layer has an amorphous silicon p-, i-, and n-layer.    USE - Useful for minimizing the dissipation of electrical power by a unit of the mismatch of the short-circuit current in a solar cell.    ADVANTAGE - The solar cell is capable of improving a connection between unit cells so that dissipation of electrical power can be minimized, provides high photoelectric conversion efficiency and has good reliability.    DETAILED DESCRIPTION - The thin film solar cell for minimizing dissipation of electrical power, comprises a unit cell of a first solar cell layer with a multi-junction structure and a second solar cell layer, which are mutually electrically connected in parallel, a transparent insulating layer at adjacent portions of each cell to be electrically insulated, and a repeat unit. The solar cell layers are an amorphous silicon solar cell layer or a microcrystalline silicon solar cell layer. The amorphous silicon solar cell layer has an amorphous silicon p-, i-, and n-layer, which are sequentially stacked. The cell is connected in serial. The microcrystalline silicon solar cell layer includes a microcrystalline silicon p-layer, a microcrystalline silicon i-layer and a microcrystalline silicon n-layer, which are sequentially stacked. The first and second solar cell layer uses a common electrode. The repeat unit comprises a first transparent conductive layer formed on a substrate, a first solar cell formed on the first transparent conductive layer, and a second transparent conductive layer formed on the first solar cell, the second solar cell formed on the second transparent conductive layer and an upper electrode layer. The p, i, and n-type amorphous silicon (221, 222, 223) or microcrystalline silicon are sequentially formed. The upper electrode layer comprises a third electrode layer. The unit cells are coupled in serial each other by the first, second and third transparent conductive layer. An INDEPENDENT CLAIM is included for a method of fabricating a thin film solar cell.    DESCRIPTION OF DRAWING(S) - The diagram shows a stacked structure of thin-film solar cell elements.    Glass substrate (200)    Transparent conductive oxide (210)    P-type amorphous silicon layer (221)    I-type amorphous silicon layer (222)    N-type amorphous silicon layer. (223)