NOVELTY - Deposition of a material on a substrate comprises introducing a material and a carrier gas into a first chamber; heating the material such that portion(s) of the material vaporizes into a vapor; directing a mixture of the vapor and carrier gas through a second chamber to form a uniform vapor/carrier gas composition; and directing the uniform vapor/carrier gas composition toward a surface of a substrate (400) having a temperature lower than the vapor.    USE - For depositing a material on a substrate to provide a film, e.g. semiconductor film for solar panels.    ADVANTAGE - The method provides a semiconductor film with improved film thickness uniformity and grain structure uniformity. It provides improved definition of the film deposition area, resulting in higher material utilization. It results in higher efficiency in the production of solar panels. A solid to be vaporized and a carrier gas introduced into the system are passed through the system in such a manner that the vapor and the carrier gas mix to form and maintain a uniform composition. Segregation between the vapor and the carrier gas is reduced.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for:    (1) a distributor assembly comprising a first chamber (250) into which a solid material and carrier gas are introduced; heating element within the first chamber and providing a temperature high enough that portion(s) of the solid material vaporizes into a vapor; second chamber proximate to the first chamber and providing a material flow sufficiently indirect to mix the vapor and the carrier gas into a uniform vapor/carrier gas composition; and outlet proximate to the second chamber and positioned in a manner that directs the uniform vapor/carrier gas composition toward a surface of a proximate substrate; and    (2) a system for depositing a film on a substrate comprising a material source connected to a distributor assembly (300) such that a solid material and carrier gas supplied by the material source are introduced into the distributor assembly; and conveyor for transporting the substrate sufficiently proximate to the distributor assembly such that the vapor may be deposited on the substrate as a film.    DESCRIPTION OF DRAWING(S) - The figure shows a system for depositing a semiconductor on a glass sheet substrate.    Rollers (230)    Chamber (250)    Exhaust pump (260)    Distributor assembly (300)    Substrate (400)