NOVELTY - The method involves mounting substrate (4) on substrate cartridge (2) . A catalyst film (4b) is formed on the surface of the substrate. The arrangement structure comprising substrate arranged on the cartridge is set inside a heat chemical vapor deposition (CVD) apparatus (6). The substrate cartridge is picked-out from the CVD apparatus. The carbon fiber is peeled from the substrate surface by introducing gas containing carbon and does not react with catalyst film, at specific pressure. The carbon fiber is collected completely from substrate surface.    USE - For manufacture of carbon fiber such as carbon nanotube used in electrode of fuel cell, electronic emitter material, hydrogen storage structure, high capacitance capacitor and secondary battery, and also for carbon fiber such as carbon nanohorn, carbon-nano cone, carbon-nano bamboo and graphite nano fiber.    ADVANTAGE - The carbon fiber is peeled-off completely from the substrate surface without any residue carbon fiber by applying gas pressure and so, the same substrate can be recycled for further carbon fiber manufacture and mass production of the carbon fiber is improved.    DETAILED DESCRIPTION - The method involves forming catalyst film on surface of substrate (4) mounted on substrate cartridge (2). The carbon fiber is peeled from the substrate surface by controlling flow rate of gas supplied to substrate surface. The substrate is cleaned using acid after removing the carbon fiber from the substrate surface to recycle substrate for further carbon fiber manufacture. INDEPENDENT CLAIMS are included for the following:    (1) substrate cartridge stores several substrates arranged in parallel and spaced apart; and    (2) chemical vapor deposition apparatus has main chamber for accommodating substrate cartridge to perform CVD processing. A load-lock chamber attached to main chamber through a gate valve controls storage and removal operation of the substrate cartridge with respect to the main chamber. The carbon fiber above the substrate surface is peeled while controlling flow rate of gas supplied to the substrate surface during fiber peeling process.    DESCRIPTION OF DRAWING(S) - The figure illustrates carbon fiber manufacture using chemical vapor deposition (CVD) apparatus.(Drawing includes non-English language text)    Substrate cartridge (2)    Substrate (4)    Catalyst film (4b)    Plating solution (5)    CVD apparatus (6)