WO2006113607-A2 -- DE3619327-A   ;  DE10151072-A1   RETTER U (RETT-Individual)   RETTER U;  DE19537121-A1   BERNKLAU R (BERN-Individual);  US2984696-A   ;  US3088989-A   ;  WO1979000626-A   ;  WO1980001438-A   ;  WO2004008042-A2   PARISE R J (PARI-Individual)   PARISE R J;  WO2005074463-A2   VENKATASUBRAMANIAN R (VENK-Individual);  OQUINN B (OQUI-Individual);  SIIVOLA E (SIIV-Individual);  COONLEY K (COON-Individual);  ADDEPALLI P (ADDE-Individual);  ALLEY R (ALLE-Individual);  POSTHILL J (POST-Individual);  COLPITTS T (COLP-Individual);  REDDY A (REDD-Individual);  CAYLOR C (CAYL-Individual);  THOMAS P (THOM-Individual);  NEXTREME THERMAL SOLUTIONS (NEXT-Non-standard)   VENKATASUBRAMANIAN R,  OQUINN B,  SIIVOLA E,  COONLEY K,  ADDEPALLI P,  ALLEY R,  POSTHILL J,  COLPITTS T,  REDDY A,  CAYLOR C,  THOMAS P,  O'QUINN B;  US7638705-B2 -- DE3619327-A   ;  DE10151072-A1   RETTER U (RETT-Individual)   RETTER U;  DE19537121-A1   BERNKLAU R (BERN-Individual);  EP687020-A1   SEIKO INSTR INC (DASE)   KISHI M,  NEMOTO H,  OKANO H;  EP805501-A1   UNION MATERIAL KK (UNMA-Non-standard)   SAKURAGI S;  GB2037072-B   BROSSMANN E K (BROS-Individual)   BROSSMANN E K;  JP06097512-A   ;  US2984696-A   ;  US3088989-A   ;  US3136134-A   ;  US3296034-A   ;  US3607444-A   ;  US3663307-A   ;  US4008709-A   JARDINE D M (JARD-Individual)   JARDINE D M;  US4106952-A   KRAVITZ J H (KRAV-Individual)   KRAVITZ J H;  US4238759-A   UNIV DELAWARE (UYDE)   HUNSPERGER R G;  US4279292-A   US SEC OF NAVY (USNA)   SWIATOSZ E;  US4443650-A   UNIV KYOTO (KYOU);  KYOTO DAIGAKU CHO (KYOU)   MATSUBARA K,  TAKAGI T;  US5006178-A   BIJVOETS T (BIJV-Individual)   BIJVOETS T;  US5012325-A   IBM CORP (IBMC)   MANSURIA M S,  MOSLEY J M,  MUSA R D,  TUOZZOLO V J;  US5254178-A   NIPPONDENSO CO LTD (NPDE)   YAMADA K,  TOMATSU Y,  OIKE T,  NISHIZAWA K;  US5362983-A   NIPPON FERROFLUIDICS CORP (NIFE-Non-standard);  INT THERMOELECTRIC INC (ITTH-Non-standard)   YAMAMURA A,  BALDWIN J;  US5419780-A   AST RES INC (ASTR-Non-standard)   SUSKI E D;  US5430322-A   AGENCY OF IND SCI & TECHNOLOGY (AGEN)   KOYANAGI T,  OOHIRA T;  US5712448-A   CALIFORNIA INST OF TECHNOLOGY (CALY)   LYON H B,  FLEURIAL J,  VANDERSANDE I W,  EWELL R;  US5837929-A   MANTRON INC (MANT-Non-standard)   ADELMAN L W;  US5865975-A   BELTRONICS INC (BELT-Non-standard)   BISHOP R;  US5869242-A   MYRIAD GENETICS INC (MYRI)   KAMB A;  US5874219-A   AFFYMETRIX INC (AFFY)   TRULSON M,  FODOR S P,  RAVA R P;  US5900071-A   MASSACHUSETTS INST TECHNOLOGY (MASI)   HARMAN T C;  US5922988-A   HONDA MOTOR CO LTD (HOND)   NISHIMOTO S;  US6060331-A   UNIV CALIFORNIA (REGC)   BOWERS J E,  SHAKOURI A;  US6060657-A   MASSACHUSETTS INST TECHNOLOGY (MASI)   HARMAN T C;  US6062681-A   HEWLETT-PACKARD CO (HEWP)   FIELD L A,  STEFANO S,  BARTH P W,  HOEN S T,  NAOTO,  DAVID,  CHANNING,  JONATHAN;  US6071351-A   VENKATASUBRAMANIAN R (VENK-Individual)   VENKATASUBRAMANIAN R;  US6072925-A   CANON KK (CANO)   SAKATA H;  US6084050-A   NIPPON TELEGRAPH & TELEPHONE CORP (NITE)   OOBA N,  WATANABE T,  KURIHARA T,  IMAMURA S,  HAYASHIDA S,  TAMAMURA T,  ISHII T,  INOUE Y,  TOYODA S;  US6094919-A   INTEL CORP (ITLC)   BHATIA R;  US6154266-A   NEC CORP (NIDE)   OKAMOTO M,  ISHIYAMA T;  US6154479-A   NEC CORP (NIDE)   YOSHIKAWA T,  KOSAKA H,  KURIHARA K;  US20010013224-A1   ;  US20010052234-A1   ;  US20020017102-A1   ;  US20020053359-A1   ;  US20020062648-A1   ;  US20020069906-A1   ;  US20020071222-A1   ;  US20020071223-A1   ;  US20020092307-A1   ;  US20020092557-A1   ;  US20020095243-A1   ;  US20020113289-A1   ;  US20020139123-A1   ;  US20020166839-A1   ;  US20020174660-A1   ;  US20030099279-A1   ;  US20030100137-A1   ;  US20030111516-A1   ;  US20030112844-A1   ;  US20030113950-A1   ;  US20030126865-A1   ;  US20030131609-A1   ;  US20030156623-A1   ;  US20030169798-A1   ;  US20030186471-A1   ;  US20030230332-A1   ;  US20040018729-A1   ;  US20040028117-A1   ;  US20040118129-A1   ;  US20040182088-A1   ;  US20040262745-A1   ;  US20050150535-A1   ;  US20050150536-A1   ;  US20050150537-A1   ;  US20050150539-A1   ;  US20050160752-A1   ;  US20050178423-A1   ;  US20060076046-A1   ;  US20060086096-A1   ;  US20060086118-A1   ;  US20060088271-A1   ;  US20060137359-A1   ;  US20060137360-A1   ;  US20060137361-A1   ;  US6180351-B1   AGILENT TECHNOLOGIES INC (AGIL)   CATTELL H F;  US6196002-B1   ADVANCED MICRO DEVICES INC (ADMI)   NEWMAN R,  LEE C;  US6271459-B1   WAFERMASTERS INC (WAFE-Non-standard)   YOO W S;  US6282907-B1   INT BUSINESS MACHINES CORP (IBMC)   GHOSHAL U S;  US6300150-B1   RES TRIANGLE INST (RTRI)   VENKATASUBRAMANIAN R;  US6323414-B1   UNIV CALIFORNIA (REGC)   SHAKOURI A,  BOWERS J E;  US6365821-B1   INTEL CORP (ITLC)   PRASHER R;  US6384312-B1   INT BUSINESS MACHINES CORP (IBMC)   GHOSHAL U S,  CORDES S A,  DIMILIA D,  DOYLE J P,  SPEIDELL J L;  US6403876-B1   INT BUSINESS MACHINES CORP (IBMC);  IBM UK LTD (IBMC)   GHOSHAL U S,  ROBINSON E W;  US6410971-B1   FERROTEC USA CORP (FERR-Non-standard)   OTEY R W;  US6412286-B1   SAMSUNG ELECTRONICS CO LTD (SMSU)   PARK R,  KWON J,  KIM C,  KIM Y,  LEE J;  US6424533-B1   INT BUSINESS MACHINES CORP (IBMC)   CHU R C,  ELLSWORTH M J,  SIMONS R E;  US6557354-B1   INT BUSINESS MACHINES CORP (IBMC)   CHU R C,  ELLSWORTH M J,  SIMONS R E;  US6619045-B1   DELTA T LLC (DELT-Non-standard)   CLARK G A;  US6625991-B1   DELTA T LLC (DELT-Non-standard)   CLARK G A;  US6658858-B1   ;  US6733605-B1   ;  US6417060-B2   TAVKHELIDZE A (TAVK-Individual);  KOPTONASHVILI L (KOPT-Individual);  BERISHVILI Z (BERI-Individual);  SKHILADZE G (SKHI-Individual)   TAVKHELIDZE A,  KOPTONASHVILI L,  BERISHVILI Z,  SKHILADZE G;  US6505468-B2   RES TRIANGLE INST (RTRI)   VENKATASUBRAMANIAN R;  US6605772-B2   MASSACHUSETTS INST TECHNOLOGY (MASI)   HARMAN T C,  TAYLOR P J,  WALSH M P;  US6662570-B2   RES TRIANGLE INST (RTRI)   VENKATASUBRAMANIAN R;  US6696635-B2   PRASHER R (PRAS-Individual)   PRASHER R;  US6722140-B2   RES TRIANGLE INST (RTRI)   VENKATASUBRAMANIAN R;  US6787691-B2   CALIFORNIA INST OF TECHNOLOGY (CALY)   FLEURIAL J,  RYAN M A,  BORSHOHEVSKY A,  PHILLIPS W,  KOLAWA E A,  SNYDER G J,  CAILLAT T,  KASCICH T,  MUELLER P;  US6826916-B2   SHIMADA M (SHIM-Individual);  KIMURA N (KIMU-Individual);  NODA H (NODA-Individual);  NAKAMURA Y (NAKA-Individual)   SHIMADA M,  KIMURA N,  NODA H,  NAKAMURA Y;  US6867978-B2   WHITTENBURG K J (WHIT-Individual);  HUA F (HUAF-Individual);  DEPPISCH C L (DEPP-Individual);  HOULE S J (HOUL-Individual);  BRANDENBURGER P (BRAN-Individual);  PHILLIPPE K L (PHIL-Individual)   WHITTENBURG K J,  HUA F,  DEPPISCH C L,  HOULE S J,  BRANDENBURGER P,  PHILLIPPE K L;  US7005320-B2   KWON H K (KWON-Individual)   KWON H K;  US7005738-B2   ;  US7009289-B2   HU C (HUCC-Individual);  LU D (LUDD-Individual)   HU C,  LU D;  US7038316-B2   HU C (HUCC-Individual);  LU D (LUDD-Individual);  WANG Z (WANG-Individual);  VANDENTOP G (VAND-Individual)   HU C,  LU D,  WANG Z,  VANDENTOP G;  US7164077-B2   VENKATASUBRAMANIAN R (VENK-Individual)   VENKATASUBRAMANIAN R;  US7235735-B2   RES TRIANGLE INST (RTRI)   VENKATASUBRAMANIAN R,  SIIVOLA E P;  WO1979000626-A   ;  WO1980001438-A   ;  WO1998044562-A1   ;  WO2000049664-A1   ;  WO2001008800-A1   ;  WO2002045150-A1   ;  WO1998043740-A2   ;  WO2004008042-A2   PARISE R J (PARI-Individual)   PARISE R J;  WO2005074463-A2   VENKATASUBRAMANIAN R (VENK-Individual);  OQUINN B (OQUI-Individual);  SIIVOLA E (SIIV-Individual);  COONLEY K (COON-Individual);  ADDEPALLI P (ADDE-Individual);  ALLEY R (ALLE-Individual);  POSTHILL J (POST-Individual);  COLPITTS T (COLP-Individual);  REDDY A (REDD-Individual);  CAYLOR C (CAYL-Individual);  THOMAS P (THOM-Individual);  NEXTREME THERMAL SOLUTIONS (NEXT-Non-standard)   VENKATASUBRAMANIAN R,  OQUINN B,  SIIVOLA E,  COONLEY K,  ADDEPALLI P,  ALLEY R,  POSTHILL J,  COLPITTS T,  REDDY A,  CAYLOR C,  THOMAS P,  O'QUINN B;  WO2006113607-A3 -- EP462794-A3   OXFORD GLYCOSYSTEMS LTD (OXFO-Non-standard);  OXFORD GLYCOSCIENCES UK LTD (OXFO-Non-standard)   PAREKH R B,  MERRY A H,  BRUCE J,  IOANNIDES A C,  PLATT A E;  WO2003080678-A1   CHIRON SRL (CHIR)   COSTANTINO P,  BERTI F,  NORELLI F,  BARTOLONI A;  WO2003007985-A2   CHIRON SPA (CHIR)   COSTANTINO P