NOVELTY - Several vapor deposition processing line consisting of charge generating layer deposition chamber (1), positive hole injection layer deposition chamber (2), hole transport layer deposition chamber(3), light emitting layer deposition chamber (4), electron injection layer deposition chamber (5) and aluminum deposition chamber (6), are arranged in parallel. An organic layer unit obtained from pair of stages of multiple layers on the substrate, is formed into a film and conveyed from inlet port of vapor deposition processing line to the exit using bypass lines (8,9).    USE - For manufacturing organic electroluminescent panel, organic solar cell, organic semiconductor, etc.    ADVANTAGE - Since the organic layer unit is conveyed through the bypass lines for forming the film, a continuous processing of the substrate can be performed, hence the time is shortened and mass production is achieved.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for organic electroluminescent panel manufacturing apparatus, has vapor deposition processing line consisting of charge generating layer deposition chamber, positive hole injection layer deposition chamber, hole transport layer deposition chamber, light emitting layer deposition chamber, electron injection layer deposition chamber and aluminum deposition chamber arranged in parallel. The bypass lines provided in parallel to the vapor deposition line, conveys the film of organic layer unit which is obtained from stages of multiple layers on the substrate, from inlet port of vapor deposition processing line to the exit, after cooling the substrate in the substrate cooling and heating unit which is installed in the arbitrary positions of the vapor deposition lines.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of the organic electroluminescent panel manufacturing apparatus. (Drawing includes non-English language text)    Charge generating layer deposition chamber (1)    Hole injection layer deposition chamber (2)    Hole transport layer deposition chamber (3)    Light emitting layer deposition chamber (4)    Electron injection layer deposition chamber (5)    Aluminum deposition chamber (6)    Bypass lines (8,9)