NOVELTY - A thin film battery manufacture comprises annealing a battery substrate (12) to a temperature at which organic materials are burned off the battery substrate to clean the battery substrate, and forming thin films on the annealed battery substrate. The thin films comprises electrolyte between a pair of electrodes, and the thin films adapted to generate or store an electrical charge. The battery substrate comprises a thickness of less than 100microns.    USE - The method is useful for manufacturing thin film battery.    ADVANTAGE - The method provides thin film battery that is capable of providing relative high energy density and specific energy levels. The method reduces the temperatures of fabrication of crystalline thin film materials, especially fabrication of cathode comprising lithium cobalt dioxide. The annealing increases the battery capacity by 10-20% increase the charge and discharge current by greater than 50% and improves the resistance to moisture. The method eliminates point defects and reduction of electrical contact resistances in cathode material.    DETAILED DESCRIPTION - The method includes annealing the battery substrate by heating the battery substrate in air to 400degreesC, heating the battery substrate to 150-600degreesC, annealing the battery substrate by heating the battery substrate for 10 minutes, and annealing the battery substrate by heating the battery substrate to a temperature that is high to eliminate defects. The forming the thin films on the battery substrate by physical or chemical vapor deposition, oxidation, nitridation or electro-plating, and annealing the battery substrate to temperature high to eliminate defects in the thin films formed on the battery substrate such that battery capacity increases by 10-20% and the charge and discharge current increases by greater than 50%. The second step includes placing the battery substrate in a chamber containing target made of lithium cobalt dioxide, introducing a process gas into the chamber, energizing the process gas by applying a current at a power density level of from about 0.1 -20 W/cm to the target, thus sputtering material from the target to deposit onto the battery substrate, and exhausting the process gas from the chamber. The chamber comprises a magnetron-sputtering cathode. The method comprises energizing the process gas by applying a potential across the target and a magnetron-sputtering cathode to form a plasma of the process gas that has an ion flux of from about 0.1-5 mA/cm2. The method includes maintaining the battery substrate at a potential of from about -5--200 V. The method includes applying a non-uniform magnetic field about the target in the chamber. The non-uniform magnetic field comprises a weaker central magnetic field strength and a surrounding stronger peripheral magnetic field strength.    DESCRIPTION OF DRAWING(S) - The figure shows schematic cross sectional view of the thin film battery.    Battery (10)    Battery substrate (12)    Adhesion layer (14)    Current collector (16)    First electrode (18)    Electrolyte film (20)    Second electrode (22)