NOVELTY - A plasma deposition apparatus comprises a conveyor (106) having a longitudinal axis for supporting substrate(s) (104); a reactant supply mechanism; at least two modules, each having high-frequency induction coupled plasma torch(es) (102) located at 30-55 mm from the substrate for depositing a layer of reaction product on the substrate; a chamber (112) for containing the conveyor and two modules; and an exhaust system.    USE - For making solar cells, e.g. silicon thin film solar cells or copper-indium-gallium-diselenide (CIGS) thin film solar cells.    ADVANTAGE - The apparatus has high deposition and throughput rates and can easily inject desired materials to the right deposition module and deposit the designed layer on one conveyor system as the substrate moves from one deposition module or chamber to another deposition module or chamber. The apparatus allows solar cell to enter and reenter the same deposition modules as different chemicals are introduced in each cycle. Direct control of dopants distribution and a better concentration profile than the typical diffusion process are achieved. Using a deposition process instead of diffusion process to make p-type or n-type doped thin films not only provides better control and more uniform dopants distribution, but also eliminates the two-step process, yielding a higher production rate. The apparatus meets the challenges of producing high quality solar cell that includes optimizing the quality i-type layer.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method of forming a layer of solar cells on a substrate in deposition chamber.    DESCRIPTION OF DRAWING(S) - The figure shows a cutaway side view of a plasma deposition apparatus.    Plasma torch (102)    Substrate (104)    Conveyor (106)    Outer and inner quartz tubes (108, 110)    Chamber (112)    Copper induction coil (114)    Windings (116)    Injection ports (118)    Plasma gas inlets (120)    Coolant inlet (122)    Coolant outlet (124)