TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Particles: The carbon fine particles supports noble metal catalyst.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The structural unit (a) having metal-oxygen bond is of formula: Si(R1)4, Si(R1)n(R2)4-n, R1n-Si(R5)3-n-R3-Si-(R5)3-n-R1n and R1n-Si(R5)3-n-R4.The structural unit (b) having acidic radical bonded by covalent bond with structural unit (a) is of formula: R1n-Si(R2)3-n-(CH2)m-SO3H.R1 = Cl, OCH3, OC2H5, OC3H7, OC4H9, OC4H9, OC6H5, OH, OCOCH3 or crosslinking -O- bond;R2 = 20C or less alkyl or phenyl;R3 = 30C or less hydrocarbon group;R4 = preferably sulfonic acid or phosphonic acid group;R5 = CH3, C2H5, C3H7, C4H9 or phenyl;n = 1-3; andm = 1-20. EXAMPLE - Sodium naphthalene complex group fluorine surfactants (in g) (100) and tetrahydrofuran (THF) (120 ml) were mixed to obtain liquid mixture. The obtained liquid mixture was used for immersing square shaped polytetrafluoroethylene (PTFE) porous material having thickness of 50 microns. The PTFE porous material was processed using THF and methanol to obtain hydrophilization treated porous material. Water (0.12) and triethyl amine (0.06) were dripped into liquid containing copolymer (4.07) of mixture (1) containing 3-mercapto-propyltrimethoxysilane, tetraethoxysilane and tetraethoxysilane and was stirred for 20 minutes at room temperature. The obtained solution was developed on fluorine film and impregnated into hydrophilization-treated porous material. The resin film was covered and cured at room temperature. The fluorine resin film was then peeled, cured and interposed by glass plate. The film was baked at 260degreesC or more for 3 hours. The baked film was then processed with 1 N hydrochloric acid, mixture (125 ml) of acetic acid and peracetic acid and 30% hydrogen peroxide solution (100 ml). The obtained film was washed with water to obtain proton-conductive film. Methanol (10.7), 3-mercaptopropyltrimethoxysilane (21.2) and tetraethoxysilane (52.5) were stir-mixed at room temperature. Mixture containing 0.1 N hydrochloric acid (6.2) and methanol (8.2) was added to obtained mixture. Potassium fluoride (0.057) and methanol (9.7) were added, stir-heated at 80degreesC in oil bath and cooled at 5degreesC. Diethyl ether (120 ml) was stir-mixed to obtained solution, cooled, filtered and diethyl ether was further fractionated from the obtained filtrate. Sulfonic acid- group-containing oligomer was obtained using the filtrate. Sulfonic acid group-containing oligomer (1), water (0.5) and isopropanol (3) were mixed and applied on surface of obtained proton-conductive film and bonded with gas diffusion electrode having platinum. The obtained conjugant was pressed for 30 minutes and further for 15 minutes at 160degreesC to obtain membrane-electrode assembly.    The membrane-electrode assembly had high heat resistance, chemical resistance, workability even at high temperature and excellent electric power generation capability.