WO2007054470-A1 -- DE19757312-A1   ;  DE19809840-A1   ;  DE19848555-A1   LANGHALS H (LANG-Individual)   LANGHALS H,  KIRNER S;  JP2000243463-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  HIROSE H,  TAKADA H;  JP2001093589-A   FUJI XEROX CO LTD (XERF)   IMAI A,  HIROSE H,  SATO K,  ONO Y;  US4599408-A   ;  WO2002066438-A1   ;  WO2006117383-A1   BASF AG (BADI)   PSCHIRER N G,  QU J,  KOENEMANN M;  KR2008075864-A -- JP2000243463-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  HIROSE H,  TAKADA H;  JP2001093589-A   FUJI XEROX CO LTD (XERF)   IMAI A,  HIROSE H,  SATO K,  ONO Y;  US8231809-B2 -- DE19757312-A1   ;  DE19809840-A1   ;  DE19848555-A1   LANGHALS H (LANG-Individual)   LANGHALS H,  KIRNER S;  EP1176646-A1   ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (EPFL)   GRAETZEL M,  PLASS R,  BACH U;  JP10189065-A   FUJI XEROX CO LTD (XERF)   IMAI A,  HIROSE H,  ONO Y,  SATO K;  JP10334954-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  ONO Y;  JP2000100484-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  HIROSE H;  JP2000243463-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  HIROSE H,  TAKADA H;  JP2001093589-A   FUJI XEROX CO LTD (XERF)   IMAI A,  HIROSE H,  SATO K,  ONO Y;  US4492648-A   ;  US4599408-A   ;  US4927721-A   GEBR SULZER AG (SULZ);  SULZER INNOTEC AG (SULZ);  GRATZEL M (GRAT-Individual);  EPFL ECOLE POLYTECHNIQUE FED LAUSANNE (EPFL)   GRATZEL M;  US5530644-A   ;  US6359211-B1   CHEMMOTIF INC (CHEM-Non-standard)   SPITLER M T,  EHRET A,  STUHL L S;  US6878825-B2   BASF AG (BADI)   KRIEGER M,  BOEHM A,  REUTHER E,  MUELLEN K;  US7138522-B2   BASF AG (BADI)   KRIEGER M,  BOEHM A,  REUTHER E,  MUELLEN K;  US7763727-B2   MITSUI CHEM INC (MITA)   FUJIYAMA T,  SUGIMOTO K,  SEKIGUCHI M;  US7799919-B2   MAX PLANCK GES FOERDERUNG WISSENSCHAFTEN (PLAC)   KOHL C,  QU J,  MUELLEN K;  WO2002066438-A1   ;  WO2006117383-A1   BASF AG (BADI)   PSCHIRER N G,  QU J,  KOENEMANN M;  US8501046-B2 -- DE19757312-A1   ;  DE19809840-A1   ;  DE19848555-A1   LANGHALS H (LANG-Individual)   LANGHALS H,  KIRNER S;  EP1176646-A1   ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (EPFL)   GRAETZEL M,  PLASS R,  BACH U;  JP10189065-A   FUJI XEROX CO LTD (XERF)   IMAI A,  HIROSE H,  ONO Y,  SATO K;  JP10334954-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  ONO Y;  JP2000100484-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  HIROSE H;  JP2000243463-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  HIROSE H,  TAKADA H;  JP2001093589-A   FUJI XEROX CO LTD (XERF)   IMAI A,  HIROSE H,  SATO K,  ONO Y;  US4492648-A   ;  US4599408-A   ;  US4927721-A   GEBR SULZER AG (SULZ);  SULZER INNOTEC AG (SULZ);  GRATZEL M (GRAT-Individual);  EPFL ECOLE POLYTECHNIQUE FED LAUSANNE (EPFL)   GRATZEL M;  US5530644-A   ;  US6359211-B1   CHEMMOTIF INC (CHEM-Non-standard)   SPITLER M T,  EHRET A,  STUHL L S;  US6878825-B2   BASF AG (BADI)   KRIEGER M,  BOEHM A,  REUTHER E,  MUELLEN K;  US7138522-B2   BASF AG (BADI)   KRIEGER M,  BOEHM A,  REUTHER E,  MUELLEN K;  US7763727-B2   MITSUI CHEM INC (MITA)   FUJIYAMA T,  SUGIMOTO K,  SEKIGUCHI M;  US7799919-B2   MAX PLANCK GES FOERDERUNG WISSENSCHAFTEN (PLAC)   KOHL C,  QU J,  MUELLEN K;  WO2002066438-A1   ;  WO2006117383-A1   BASF AG (BADI)   PSCHIRER N G,  QU J,  KOENEMANN M;  WO2005089094-A2   UNIV NEVADA & COMMUNITY COLLEGE SYSTEM (UYNE-Non-standard)   CARSON T D,  CASEY S M,  IVERSON I K,  SEO W,  TAM-CHANG S;  JP5393154-B2 -- DE3703513-A   LANGHALS H (LANG-Individual)   LANGHALS H;  JP81169691-A   ;  JP95089962-A   ;  JP2000243463-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  HIROSE H,  TAKADA H;  JP2001093589-A   FUJI XEROX CO LTD (XERF)   IMAI A,  HIROSE H,  SATO K,  ONO Y;  JP2002527517-A   LANGHALS H (LANG-Individual)   LANGHALS H,  KIRNER S;  JP2002534552-A   CIBA SPECIALTY CHEM HOLDING INC (CIBA)   LANGHALS H,  ISMAEL R;  JP2004506635-A   BASF AG (BADI)   WUERTHNER F,  THALACKER C;  JP2004518738-A   BASF AG (BADI)   KRIEGER M,  BOEHM A,  REUTHER E,  MUELLEN K;  CN101351524-B -- CN1323243-A   ASAHI KASEI KOGYO KK (ASAH)   NAKABAYASHI A;  DE19848555-A1   LANGHALS H (LANG-Individual)   LANGHALS H,  KIRNER S;  JP2000243463-A   FUJI XEROX CO LTD (XERF)   IMAI A,  SATO K,  HIROSE H,  TAKADA H;  US4599408-A   ;  WO2002066438-A1