;  US8846149-B2 -- JP2058322-A   HITACHI LTD (HITA);  HITACMI TOBU SEMICONDUCT (HITA-Non-standard);  JP62062050-B2   ;  US4741964-A   IBM CORP (IBMC)   HALLER I;  US4776896-A   FUJI ELECTRIC MFG CO LTD (FJIE);  US5449640-A   INMOS LTD (INMS);  SGS THOMSON MICROELECTRONICS LTD (SGSA);  STMICROELECTRONICS LTD (SGSA)   HUNT P A,  LILES I M,  GUITE D R;  US5656547-A   MICRO TECHNOLOGY PARTNERS (MICR-Non-standard)   RICHARDS J G,  SANDER W B,  RICHMOND D P,  FLORES H;  US5681616-A   GENERAL ELECTRIC CO (GENE)   GUPTA B K,  FARMER G,  WALKER A;  US6194249-B1   TAIWAN SEMICONDUCTOR MFG CO (TSMC)   CHEN M H,  LI M,  CHEN L,  CHEN C;  US6534396-B1   TAIWAN SEMICONDUCTOR MFG CO LTD (TSMC)   FAHN F,  LIN K,  CHEN J,  CHEU E,  PENG C,  FAN G;  US6586347-B1   TAIWAN SEMICONDUCTOR MFG CO (TSMC)   LIU C,  WANG H,  WU S,  TSAN C,  WANG Y L,  KUAN T H;  US7696101-B2   MICRON TECHNOLOGY INC (MICR-Non-standard)   LI M;  US2001006846-A1   AGILENT TECHNOLOGIES INC (AGIL)   CAO M,  THEIL J A,  RAY G W,  VOOK D W;  US2001038367-A1   INUKAI K (INUK-Individual)   INUKAI K;  US2002011598-A1   SEMICONDUCTOR ENERGY LAB (SEME);  US2002016073-A1   HITACHI LTD (HITA)   KONDO S,  SAKUMA N,  HOMMA Y;  US2003006468-A1   MA Q (MAQQ-Individual);  CHENG P (CHEN-Individual)   MA Q,  CHENG P;  US2003040195-A1   CHANG T (CHAN-Individual);  LIU P (LIUP-Individual)   CHANG T,  LIU P;  US2003124462-A1   TEXAS INSTR INC (TEXI)   MILLER S A;  US2003151020-A1   CABOT MICROELECTRONICS CORP (CABO)   LEE J,  YU C C,  MIKOLAS D G;  US2004067616-A1   MITSUBISHI DENKI KK (MITQ)   HACHISUKA A,  AMO A,  KASAOKA T,  KUBO S;  US2005023145-A1   ;  US2005029109-A1   MICROFABRICA INC (MICR-Non-standard)   ZHANG G,  COHEN A L,  LOCKARD M S,  KUMAR A H,  KRUGLICK E J J,  KIM K;  US2005029660-A1   INFINEON TECHNOLOGIES AG (INFN)   RUTTKOWSKI E,  HOFMAN F,  EVERSMANN B;  US2005253268-A1   HSU S (HSUS-Individual);  CHENG K (CHEN-Individual);  JENG S (JENG-Individual);  LIU H (LIUH-Individual);  CHU W (CHUW-Individual);  LIN Y (LINY-Individual);  WANG Y (WANG-Individual)   HSU S,  CHENG K,  JENG S,  LIU H,  CHU W,  LIN Y,  WANG Y