NOVELTY - Reuse of remainders or other residual silicon of high purity silicon, such as saw dust or kerf from solar cells wafers or semiconductor devices manufacturing, comprises using as feedstock, the dry kerf potentially contaminated with silicon carbide particles and iron and/or other metal impurities, chips, and/or other residual silicon from wafer production processes or semiconductor devices, together with metallurgical grade silicon in a direct chlorination reactor (1) producing silicon tetrachloride.    USE - The process is for reusing remainders or other residual Si of high purity Si, such as saw dust or kerf from solar cells wafers or semiconductor devices manufacturing (claimed). It is especially useful for an integrated plant, i.e. a plant where the unit processes involving chlorination of Si, purification of SiCl4, reduction of SiCl4, ingot casting, ingot slicing (wafer production), and separation of sawing chips from cutting fluid are co-located.    ADVANTAGE - Unlike the prior art processes, which handle fine particles or dust generated internally by the process, the process utilizes an alternative feedstock (kerf), which contains a large fraction of fine particles; and is designed to handle contaminants in the silicon kerf such as SiC particles and Fe and/or other metallic impurities. Thus, the process recycles silicon kerf to solar grade Si quality in a cheap and effective manner via production of SiCl4 in a reactor.    DETAILED DESCRIPTION - Reuse of remainders or other residual silicon (Si) of high purity Si, such as saw dust or kerf from solar cells wafers or semiconductor devices manufacturing, comprises using as feedstock, the dry kerf potentially contaminated with silicon carbide (SiC) particles and iron (Fe) and/or other metal impurities, chips, and/or other residual Si from wafer production processes or semiconductor devices, together with metallurgical grade Si in a direct chlorination reactor (1) producing silicon tetrachloride (SiCl4). Un-reacted kerf or other small particles that escape the reaction zone un-reacted are captured and repeatedly returned to the reactor for further chlorination regardless of their size.    DESCRIPTION OF DRAWING(S) - The drawing is a schematic view of processing equipment for the reuse of remainders or other residual Si of high purity Si, such as saw dust or kerf from solar cells wafers or semiconductor devices manufacturing.    Direct chlorination reactor (1)    Storage device (2)    Cyclone (3)    Nozzle plate (5)    Return feeding mechanism (9)