NOVELTY - The high frequency plasma generator has several comb-shaped electrodes (105) that are arranged in parallel at predetermined in-between distance. Connection rods (102) of each comb-shaped electrode are connected with that of adjacent electrode. Electric power supply feeding points (142) are formed at both sides in the center region of the electrodes. The feeding points are connected to electric power distribution line (140), so that high frequency electric power is applied to the feeding points in opposite directions at predetermined time difference.    USE - High frequency plasma generator for thin-film deposition apparatus and thin film etching apparatus (both claimed), for forming amorphous, fine crystal or polycrystalline silicon thin film for manufacturing solar cell, thin film transistor (TFT), and for etching thin film for manufacturing plasma display apparatus. Can also be used in dry etching equipment using ultrahigh frequency power supply, cleaning equipment, surface treatment equipment, etc.    ADVANTAGE - The standing wave generated by the comb-shaped electrodes while supplying ultrahigh power is suppressed. Hence thin film of uniform thickness can be formed.    DETAILED DESCRIPTION - The comb-shaped electrodes have two electrodes (101) connected by connecting rod. The electrodes are covered with aluminum, steel use stainless (SUS) type stainless steel and insulation material like silicon dioxide, quartz crystal or Teflon (RTM: Waxy, opaque material, polytetrafluoroethylene). The sides of the comb-shaped electrodes are either grounded or not grounded. The electric power distribution line is connected to an electric power feeding circuit comprised of a pair of high frequency electric power supply circuits and a pair of impedance matching circuits. A control circuit controls the electric power supply units such that either the supply units are connected simultaneously to electrodes or connected to either of the electrodes through a switch. The wirings of the electric power distribution line are arranged in a tree structure. The frequency of the electric power supply is 13.56-100 MHz. INDEPENDENT CLAIMS are included for the following:    (1) plasma generation method; and    (2) manufacturing method of plasma display apparatus.    DESCRIPTION OF DRAWING(S) - The drawing shows a block diagram of the plasma generator. (Drawing includes non-English language text)    Electrodes (101)    Connection rods (102)    Comb-shaped electrodes (105)    Electric power distribution line (140)    Electric power supply feeding points (142)