TECHNOLOGY FOCUS - ELECTRONICS - Preferred Process: The electrical potential and/or electrical current are changed many times between at least one first value (A) and at least one second value (B) different from the first value (A), where at least one of the value is sufficient to cause the deposition. The electro-deposition is current controlled.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The metallic or metalloid layer is electro-deposited using a roll-to-roll technique. In the method, a stack comprising many metallic, metalloid oxidized metallic or oxidized metalloid layers is provided, where at least two of the layers are separated by an intermediate layer. The metallic or metalloid layer is at least partially oxidized by thermal oxidation or electrochemical oxidation. The metal or metalloid layer is oxidized to form a metal oxide or a metalloid oxide layer. In the method, at least part of the surface is exposed to electromagnetic radiation. Preferred Components: The metal ions or metalloid ions are aluminum, silicon, tantalum, titanium, chromium, bismuth, zirconium, hafnium, tungsten, niobium or zinc. The surface is a surface of a cathode, particularly cathode comprising an organic semi-conductive material or a cathode comprising an inorganic conductive or semi-conductive material deposited on an organic semi-conductive material. The surface is porous, particularly microporous or mesoporous. The barrier layer consists of a single metal layer, a single metalloid layer, a single metal oxide layer or a single metalloid oxide layer. The barrier layer consists of a combination of a single metal or metalloid layer and a single metal oxide or metalloid oxide layer, where the metal layer is present in between the metal oxide or metalloid oxide layer and the core of the article. The plating liquid is essentially water-free.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The ionic liquid comprises a salt, which is liquid under the process conditions, and are salts formed from the cations of monosubstituted imidazolium derivatives, disubstituted imidazolium derivatives, trisubstituted imidazolium derivatives, pyridinium derivatives, pyrrolidinium derivatives, phosphonium derivatives, ammonium derivatives, guanidinium derivatives and/or isouronium derivatives; and the anions of chloride, bromide, iodide, nitrate, nitrite, fluoride, phosphate, imide, amide, borate, tosylate, tetrafluoroborate, hexafluoroborate, hexafluorophosphate, trifluoromethanesulfonate, methylsulfate, bis(pentafluoroethyl)phosphinate, thiocyanate, octylsulfate, hexylsulfate, butylsulfate, ethylsulfate, dicyanamide, hexafluoroantimonate, bis-(pentafluoroethyl)phosphinate, bis-(trifluoromethyl)imide, trifluoroacetate, bis-trifluorsulfonimide, triflate and/or dicyanamide. Preferred Process: The salts are formed by the reaction of at least one amine salt of formula (R1R2R3R4N+X-) with at least one hydrated salt, which is a chloride, nitrate, sulfate or acetate of lithium, magnesium, calcium, chromium, manganese, iron, cobalt, nickel, copper, zinc, cadmium, lead, bismuth, lanthanum or cerium.Either R1-R3 = 1-5C alkyl or 6-10C cycloalkyl; orR2R3 = 4-10C alkylene; orNR2R3 = 5-11 membered heterocyclic ring;R4 = 1-12C alkyl or cycloalkyl (optionally substituted with OH, Cl, Br, F, I, phenyl, NH2, CN, NO2, COOR5, CHO, COR5 or OR5), H or phenyl;R5 = 1-10C alkyl or cycloalkyl; andX- = an anion capable of being complexed by the hydrated salt.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The substrate is foils, films or sheets. EXAMPLE - None given.