TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The fine particles of the polyvalent metal oxide are fine particles of silica, titanium oxide, zirconium oxide, alumina oxide, zinc oxide, tin oxide, composite fine particles of silica and titanium oxide, composite fine particles of silica and zirconium oxide, or composite fine particles of silica and alumina. The silane compound is dihydrogen dichlorosilane, hydrogen trichlorosilane, dihydrogen dimethoxysilane, dihydrogen diethoxysilane, hydrogen trimethoxysilane, hydrogen triethoxysilane, tetrachlorosilane and/or tetraethoxysilane (along with the hydrogen silane compounds, in case of tetrachlorosilane or tetraethoxysilane). The polyvalent metal atom is silicon, titanium, zirconium, aluminum, zinc, tin, or combinations of atoms of silicon with titanium, zirconium or aluminum. The inorganic substrate is a thin glass plate or a thin stainless steel plate. The semiconductor layer is a thin silicon semiconductor layer, or a compound-type semiconductor layer. The semiconductor device is a thin film solar cell. Preferred Method: The curing is carried out by: heating at greater than or equal to 150 degrees C in an oxygen-containing atmosphere, heating at greater than or equal to 200 degrees C in an inert gas or in a vacuum, irradiating with a high-energy beam, exposing to ozone, exposing to nitrous oxide gas, or exposing to wet ammonia gas. Preferred Process: (A) is obtained by subjecting a metal halide or a metal alkoxylate of formula (MXm) to hydrolysis and condensation in an organic solvent and then subjecting (I) to a reaction of condensation, or to a reaction of hydrolysis with condensation, in the organic solvent.M = polyvalent metal atom;X = halo or 1-4C alkoxyl; andm = valence of M. EXAMPLE - A glass-made reactor vessel equipped with a stirrer, a nitrogen-supply tube, condenser, thermometer, and injection port was filled with ethanol (65 g), toluene (65 g), water (3.5 g), and hydrolysis catalyst (0.20 g) of a 35% aqueous solution of a hydrochloric acid (with 0.128 g of water). The components were vigorously stirred for 10 minutes to give a homogeneous liquid. Then, tetraethoxysilane (20.8 g) were added, the mixture was stirred for 1 hour at 30 degrees C. The reaction product was combined with butyl alcohol (10 g), and the ethanol was removed by heating. Toluene was added simultaneously with removal of butanol. As a result, a toluene dispersion of fine silica particles having silanol groups was prepared. The resultant toluene dispersion was cooled below 5 degrees C, toluene solution (10 ml) that contained of dihydrogen dichlorisilane (2.02 g) were added during 1 hour, the resultant mixture was stirred for 2 hours. Then, toluene (65 g) was added to the resultant reaction product, and after removal of hydrochloric acid, ethanol and butyl alcohol together with a part of toluene, at below 40 degrees C to give curable liquid composition.