TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The composition includes reducing agent(s) and/or co-solvent(s). The reducing agent is (a) zinc, magnesium, cadmium, mercury, sodium, potassium, lithium, boron, aluminum, and their alloys; (b) hydrogen, alcohols, formaldehyde, silanes, thiols, amines, phosphines, alkenes, dienes, ketones, diketones, and/or heterocyclics; or (c) lithium aluminum hydride, sodium borohydride, potassium ferricyanide, sodium naphthalenide, lithium amines, calcium hydride, iron (II) complexes, cobaltocene, and/or organoboranes. The reducing agent is preferably hydrogen. The metal precursor is present at 0.001-20 wt.%. The supercritical solvent is present at 10-99.9 wt.%. The composition is surfactant-free. The metal precursor comprises transition metals. The transition metals are scandium, yttrium, lanthanum, actinium, titanium, zirconium, hafnium, rutherfordium, vanadium, niobium, tantalum, dubnium, chromium, molybdenum, tungsten, seaborgium, manganese, technitium, rhenium, bohrium, iron, ruthenium, osmium, hassium, cobalt, rhodium, iridium, meitnerium, nickel, palladium, platinum, darmstadtium, copper, silver, gold, zinc, cadmium, and/or mercury. The metal precursor preferably comprises tantalum, hafnium, zirconium, titanium, tungsten, molybdenum, and/or chromium. The metal in the metal precursor has an oxidation state that is lower than the thermodynamically favored oxidation state of the metal. The elemental metal film comprises elemental metal(s). Preferred Parameters: The supercritical solvent is at 20-150 degrees C. The semiconductor substrate is at 20-450 degrees C. The method is carried out in a vessel at 1000-7000 psi.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The co-solvent is alcohols, ketones, amines, esters, ethers, lactones, carbonates, alkanes, arenes, heterocyclics, and/or amides. The co-solvent is preferably methanol, ethanol, N-alkyl pyrrolidones, N-aryl pyrrolidones, dimethylsulfoxide, sulfolane, catechol, ethyl lactate, acetone, butyl carbitol, monoethanolamine, butyrol lactone, diglycol amine, gamma -butyrolactone, butylene carbonate, ethylene carbonate, propylene carbonate, hydrofluorocarbons, hydrofluoroethers, sulfur hexafluoride, propane, butane, pentane, hexane, methane, propane, dimethylformamide, N-methylpyrrolidone, diethyl ether, acetone, isopropyl alcohol, and/or dimethylsulfoxide. The mole ratio of neutral labile ligands to metal precursor is greater than or equal to 10:1, preferably greater than or equal to 100:1. The neutral labile ligands are ethers, nitriles, thioethers, alkenes, alkynes, acyclic dienes, arenes, aromatics, ketones, amines, phosphines, isocyanides, isonitriles, carbon monoxide, and/or dinitrogen. The neutral labile ligands are preferably carbon monoxide, acetonitrile, tetrahydrofuran, and/or ether. The supercritical solvent is carbon dioxide, oxygen, argon, krypton, xenon, ammonia, methane, methanol, dimethyl ketone, hydrogen forming gas, and/or sulfur hexafluoride. EXAMPLE - No suitable example given.