TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Gas: The gas is a saturated inert gas chosen from air, xenon, argon, nitrogen and oxygen.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Solvent: The non-solvent is water, phenol, ether, methanol, ethanol, propanol or butane. The solvent is chosen from carbon disulfide, tetrahydrofuran, chloroform, toluene, dichloroethane, dichloromethane, benzene, hexane, xylene, ethylbenzene, methylene chloride and carbon tetrachloride. Preferred Composition: The solution further comprises a functional material such as a charge generation material or a charge transport material. The charge generation material comprises a material chosen from quinacridone, dibromo anthanthrone pigment, perylene diamine, perinone diamine, polynuclear aromatic quinone, azo pigment, oxyvanadium phthalocyanine, chloroaluminum phthalocyanine, copper phthalocyanine, oxytitanium phthalocyanine, chlorogallium phthalocyanine, hydroxygallium phthalocyanine, magnesium phthalocyanine and metal-free phthalocyanine. The charge transport material comprises a tertiary aromatic amine chosen from N,N'-diphenyl-N,N'-bis(3-hydroxyphenyl)-1,1'-biphenyl-4,4'-diamine, N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1,1'-biphenyl-4,4'-diamine, N,N,N'N'-tetra(4-methylphenyl)-(1,1'-biphenyl)-4,4'-diamine, 4,4'-(3,4-dimethylphenylazanediyl)bis(4,1-phenylene)dimethanol and N,N'-bis(3-methylphenyl)-N,N'-bis(4-n-butylphenyl)-1,1'-terphenyl-4,4-diamine.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer comprises a block copolymer, a linear polymer or a branched polymer. The polymer comprises a material capable of forming micelles. The block copolymer has a block chosen from polystyrene, poly(paraphenylene), polyimide, poly-2-vinylpyridine, poly(n-alkylmethacrylate), poly(n-butylmethacrylate), poly(methyl methacrylate), poly(2-vinylpyridine), polyisoprene, poly(ferrocenyldimethylsilane), poly(cyclohaylethylene), polylactide, poly(ferrocenyldimethylsilane), poly(dimethysiloxane), poly(ethylene-propylene), polyethylene, polybutadiene, poly(ethyleneoxide), polystyrenepolybutadiene, poly( alpha -methylstyrene), poly(4-hydroxystyrene), poly(methyltetraclododecene), poly(substituted-2-norbornene), poly(propyleneoxide), poly(butadienevinylpyridinium), poly(tert-butylacrylate), poly(cinnamoyl-ethylmethacrylate), pentadecyl phenol modified polystyrene, poly(4-vinylpyridine) and poly(tert-butylmethacrylate). Preferred Methods: The hollow spaces in the patterned binder layer are filled with filler or functional material. The patterned binder layer is formed by immersing the substrate into the solution comprising polymer and solvent, pulling the substrate out of the solution at a rate of 20-60 cm/minute, and drying the resulting film at 15-600 degrees C. Alternatively, the self-assembled patterned binder layer having hollow spaces is formed by depositing the block copolymer on to the support and applying the solvent to dissolve a portion of the block copolymer.