NOVELTY - A transparent insulator substrate (12) and a single crystal silicon substrate (11) are prepared. Hydrogen and rare gas ions are implanted to silicon substrate to form ion implanted layer (14). A transparent electroconductive film (16) is formed on insulator substrate. Surface activating treatment is applied to ion implanting surface and electroconductive film, and surface and film are bonded. An impact is applied to implanted layer to delaminate substrate leaving single crystal silicon layer (17). A diffusion layer is formed in silicon layer to form a p-n junction.    USE - Method for producing thin-film single crystal silicon solar cell.    ADVANTAGE - The single crystal silicon substrate and the transparent insulator substrate can be strongly bonded without applying a high-temperature heat treatment, as ion implanting surface of silicon substrate and electroconductive film of transparent insulator substrate are bonded after applying surface treatment. Since the joining surfaces are strongly joined, it becomes possible to apply an impact to the ion implanted layer to mechanically delaminate the single crystal silicon substrate. Thus, the single crystal silicon thin-film can be obtained, even without conducting a heat treatment for delamination. The formation of the single crystal silicon layer acting as the light conversion layer is achieved by the delamination from the single crystal silicon substrate. The crystallinity of the single crystal silicon layer and the conversion efficiency of the solar cell are enhanced. The delamination of the single crystal silicon substrate for formation of the single crystal silicon layer is conducted as mechanical delamination without relying on heating, thus introduction of cracks and defects into the light conversion layer due to a difference of thermal expansion coefficient can be suppressed.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for single crystal silicon solar cell.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the single crystal silicon solar cell manufacturing process.    Single crystal silicon substrate (11)    Transparent insulator substrate (12)    Ion implanted layer (14)    Transparent electroconductive film (16)    Single crystal silicon layer (17)