TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Chlorination is accomplished in a fluidized bed reactor with a material cushion, perforated plate, or nozzle plate (5) supporting the reaction zone. The kerf potentially contaminated with SiC particles and Fe and/or other metal impurities, chips, and/or other residual Si, which are mainly larger than the smallest particles of metallurgical grade Si, are mixed with the metallurgical grade Si in a storage device (2); and added to the reactor on a continuous or intermittent basis. The kerf potentially contaminated with SiC particles and Fe and/or other metal impurities, chips, and/or other residual Si of mainly smaller size than the smallest particles of metallurgical grade Si, are added and mixed into liquid SiCl4 on a continuous or intermittent basis forming a slurry that is subsequently added directly to the reaction zone of the reactor for simultaneous cooling and temperature control; or added directly into the hot reaction zone just above the material cushion, perforated plate, or nozzle plate, on a continuous or intermittent basis, or added directly into the cold chlorine gas flow upstream of the material cushion, perforated plate, or nozzle plate, on a continuous or intermittent basis. The kerf potentially contaminated with SiC particles and Fe and/or other metal impurities, chips, and other residual Si from wafer production processes or semiconductor devices, are pressed to tablets or pellets and mixed with the metallurgical grade Si in a storage device and added to the reactor on a continuous or intermittent basis; or pressed to tablets or pellets and added to the reactor from a separate device on a continuous or intermittent basis. The largest particles escaping the chlorination process are separated from SiCl4 by a cyclone (3) and returned to the reaction zone by a return feeding mechanism (9). The smallest sized particles escaping the chlorination process and the cyclone follow the SiCl4 gas to the condensation unit and are subsequently returned to the reaction zone in the form of a slurry with the liquid SiCl4 that is used for cooling and temperature control. The fraction of the smallest sized particles following the SiCl4 liquid out of the loop to a liquid/solid separation unit is subsequently separated from the solid chlorides by dissolving the chlorides in water, and after drying it is returned to the reaction zone.