NOVELTY - A precursor laminate having precursor layer (A) (11) and precursor layer (B) (12) is provided on substrate (10), precursor laminate (13) is heated and annealed, to form metal-oxide layer (13'). Thus, electroconductor is manufactured. The precursor layer (A) is titanium-oxide layer. The precursor layer (B) is amorphous titanium-oxide layer. The titanium-oxide layer of precursor layer (A) and (B) is composed of niobium, tantalum, molybdenum, arsenic, antimony, aluminum, hafnium, silicon, germanium, zirconium, tungsten, cobalt, iron, nickel, vanadium, manganese and/or bismuth.    USE - Manufacture of electroconductor used for transparent conductive film, antistatic film, heat reflective glass, ultraviolet reflection glass, product for electromagnetic shielding and transparent electrode (all claimed) for plasma display panel, field emission display, flat panel display, solar cell and touch panel.    ADVANTAGE - The electroconductor has excellent conductive property, transparency and productivity.    DETAILED DESCRIPTION - A precursor laminate having precursor layer (A) and precursor layer (B) is provided on a substrate, the precursor laminate is heated under reduced atmosphere and annealed, to form metal-oxide layer from the precursor layer (A) and (B). Thus, electroconductor is manufactured. The precursor layer (A) is titanium-oxide layer. The precursor layer (B) is amorphous titanium-oxide layer. The titanium-oxide layer of precursor layer (A) and (B) is composed of dopant chosen from niobium, tantalum, molybdenum, arsenic, antimony, aluminum, hafnium, silicon, germanium, zirconium, tungsten, cobalt, iron, chromium, tin, nickel, vanadium, manganese, technetium, rhenium, phosphorus and/or bismuth. The titanium oxide layer of precursor layer (A) includes polycrystal excluding rutile type crystal when subjected to single layer anneal test. The titanium oxide layer of precursor layer (B) includes polycrystal including rutile type crystal when subjected to single layer anneal test.    DESCRIPTION OF DRAWING(S) - The drawing shows sectional view of structure of laminated metal-oxide layer on substrate.    Substrate (10)    Precursor layers (11,12)    Precursor laminate (13)    Metal-oxide layer (13')    Film thickness (T1,T2)