EP2168189-A1  See also references of WO 2008156241A1US2012118724-A1  Wu et al. "Corrosion Resistance of TiN Coatings Prepared by Filtered Cathodic Vacuum Arc Process", Materials Research Society Symposium Proceedings, Vol. 885E, January 9, 2006.US8440368-B2  A.D. Verkhoturov, et al., Electrochemical Behavior of Transition Metals&Refractory Compounds of Titanium in Synthetic Sea Water, Institute of Mining of the Far East Scientific Center, Academy of Sciences of the USSR, No. 2 (302), pp. 81-87, Feb. 1988.;  I. Milosev, et al., Electrochemical and Thermal Oxidation of TiN Coatings Studied by XPS, Surface&Interface Analysis, vol. 23, pp. 529-539 (1995).;  Naresh C. Saha, et al., Titanium Nitride Oxidation Chemistry: An Xray Photoelectron Spectroscopy Study, AIP Journal of Applied Physics, 72, 3072 (1992).;  I. Milosev, et al., A Corrosion Study of TiN (Physical Vapour Deposition) Hard Coatings Deposited on Various Substrates, Surface and Coatings Technology, 63 (1994) 173-180.;  Y. Massiani , et al., Electrochemical Study of Titanium Nitride Films Obtained by Reactive Sputtering, Thin Solid Films, 191 (1990) 305-316.;  C. Ernsberger, et al., Low Temperature Oxidation Behavior of Reactively Sputtered TiN by X-Ray Photoelectron Spectroscopy&Contact Resistance Measurements, J. Vac. Sci. Technol. A 4 (6) Nov./Dec. 1986.;  M.P. Brady, et al., The Formation of Protective Nitride Surfaces for PEM Fuel Cell Metallic Bipolar Plates, JOM, Aug. 2006.;  K.K. Shin et al; "Ti/Ti-N. Hf/Hf-N. and W/W-N multilayer films with high mechanical hardness"; Appl. Phys. Lett. 61, 654 (1992); http://dx.doi.org/10.1063/1.107812; IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, New York; 2 pages.US8524050-B2  Wu et al. "Corrosion Resistance of TiN Coatings Prepared by Filtered Cathodic Vacuum Arc Process", Materials Research Society Symposium Proceedings, vol. 885E, Jan. 9, 2006.;  A.D. Verkhoturov, et al., Electrochemical Behavior of Transition Metals & Refractory Compounds of Titanium in Synthetic Sea Water, Institute of Mining of the Far East Scientific Center, Academy of Sciences of the USSR, No. 2 (302), pp. 81-87, Feb. 1988.;  I. Miklosev, et al., Electrochemical and Thermal Oxidation of TiN Coatings Studied by XPS, Surface & Interface Analysis, vol. 23, pp. 529-539 (1995).;  Naresh C. Saha, et al., Titanium Nitride Oxidation Chemistry: An Xray Photoelectron Spectroscopy Study, AIP Journal of Applied Physics, 72, 3072 (1992).;  J. Milosev, et al., A Corrosion Study of TiN (Physical Vapour Deposition) Hard Coatings Deposited on Various Substrates, Surface and Coatings Technology, 63 (1994) 173-180.;  Y. Massiani , et al., Electrochemical Study of Titanium Nitride Films Obtained by Reactive Sputtering, Thin Solid Films, 191 (1990) 305-316.;  C. Ernsberger, et al., Low Temperature Oxidation Behavior of Reactively Sputtered TiN by X-Ray Photoelectron Spectroscopy & Contact Resistance Measurements, J. Vac. Sci. Technol. A 4 (6) Nov./Dec. 1986.;  M.P. Brady, et al., The Formation of Protective Nitride Surfaces for PEM Fuel Cell Metallic Bipolar Plates, JOM, Aug. 2006.;  K. K. Shin et al.; "Ti/Ti-N Hf/Hf-N and W/W-N multilayer films with high mechanical hardness"; Applied Physics Letters; vol. 61; Issue 6; 1992; http://dx.doi.org/10.1063/1.107812.EP2168189-B1  None