TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The sputter target comprises ceramic material including Me1Ox.x=less than s, which is a rational number corresponding to the stoichiometric quantity of oxygen in Me1Ox material.The sputter target comprises ceramic material including ZnOx and TiOx.x=greater than 0.3, less than 1 (for ZnOx); or less than 2 (for TiOx).The sputter target includes an amount of a second metal material (Me2). It comprises a material including Me1Ox:Me2; ZnOx:Me2; and TiOx:Me2. The second metal (Me2) is aluminum (Al), niobium (Nb), gallium (Ga), boron (B), indium (In), and/or tantalum (Ta). Preferred Parameter: The amount of Al and/or B is determined by a ratio between alumina (Al2O3) and boron oxide (B2O3), respectively, and zinc oxide (ZnO) in a range between a first value of 0.2 or 0.5 wt.% and a second value of 6 or 2 wt.%, the first value and second value, respectively referring to a stoichiometric ZnO material. The amount of Ga is determined by a ratio between Ga2O3 and ZnO in a range between a first value of 0.5 wt.% and a second value of 10 or 6 wt.%, the first value and second value, respectively, referring to a stoichiometric ZnO material. The amount of In is determined by a ratio between In2O3 and ZnO in a range between a first value of 1 or 3 wt.% and a second value of 20 or 12 wt.%, the first value and the second value, respectively, referring to a stoichiometric ZnO material. The amount of Nb is determined by a ratio between Nb2O5 and ZnO in a range between a first value of 0.005 wt.% and a second value of 5 wt.%, the first value and the second value, respectively, referring to a stoichiometric ZnO material. The amount of Nb and Ta is determined by a ratio between Nb2O5 and titanium dioxide (TiO2) and Ta2O5 and TiO2, respectively, in a range between a first value of 5 wt.% and a second value of 60 wt.%, the first value and the second value, respectively, referring to a stoichiometric TiO2 material. The quantity of oxygen is a sub-stoichiometric quantity with x=greater than 0.3, and less than 1.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The atmosphere provided in the manufacture of transparent conductive oxide layer on substrate is a reactive argon/oxygen (O2) atmosphere. The method of manufacturing a thin layer solar cell includes etching the layer.