;  WO2009067687-A1 -- US20030148565-A1   ;  US20070111349-A1   ;  US7091411-B2   INST PHYSIKALISCHE HOCHTECHNOLOGIE EV (PHYS-Non-standard)   FALK F,  ANDRAE G;  US7217605-B2   SEMICONDUCTOR ENERGY LAB (SEME)   KAWASAKI R,  NAKAJIMA S;  EP2212913-A1 -- US20040209447-A1   ;  US8557040-B2 -- CN1495848-A   SONY CORP (SONY)   GOSAIN D P,  MACHIDA A,  NAKANO K,  FUJINO T,  SATO J;  DE10103670-A1   CHRISTIANSEN J I (CHRI-Individual);  CHRISTIANSEN S (CHRI-Individual);  UNIV ERLANGEN-NUERNBERG (UYER-Non-standard);  BAYERISCHES LASER ZENT GMBH (BAYE-Non-standard)   CHRISTIANSEN J I,  CHRISTIANSEN S,  STRUNK H P,  OTTO A,  ESSER G,  URMONEIT U;  DE19839718-A1   STRUNK H P (STRU-Individual);  CHRISTIANSEN J (CHRI-Individual);  BLZ BAYERISCHES LASERZENTRUM GEMEINNUETZ (BLZB-Non-standard)   CHRISTIANSEN J I,  CHRISTIANSEN K,  CHRISTIANSEN S,  NGENDANCK M,  STRUNK H P;  EP655774-A2   SONY CORP (SONY)   NOGUCHI T,  OGAWA T,  IKEDA Y;  EP681316-A2   SONY CORP (SONY)   INO M,  HAYASHI H,  KUNII M,  URAZONO T,  NISHIHARA S,  MINEGISHI M;  EP1067593-A2   NEC CORP (NIDE);  SUMITOMO HEAVY IND LTD (SUMH);  ANELVA CORP (NICV)   TANABE H,  AKASHI T,  WATABE Y;  GB2338342-B   LG LCD INC (GLDS);  LG PHILIPS LCD CO LTD (GLDS)   PARK W,  JUNG Y,  CHUNG S;  GB2338343-B   LG LCD INC (GLDS);  LG PHILIPS LCD CO LTD (GLDS)   MOON D;  GB2338597-B   LG LCD INC (GLDS);  LG PHILIPS LCD CO LTD (GLDS)   JUNG Y;  JP01256114-A   ;  JP02081422-A   ;  JP02283036-A   ;  JP04033327-A   ;  JP04279064-A   ;  JP05041519-A   ;  JP05048190-A   ;  JP06011729-A   ;  JP06252048-A   ;  JP06260502-A   ;  JP06283422-A   ;  JP07176757-A   ;  JP08078330-A   ;  JP09007968-A   ;  JP09270393-A   ;  JP10189998-A   SONY CORP (SONY)   HAYASHI H;  JP10244390-A   TOSHIBA KK (TOKE)   TAKADA A;  JP11025064-A   SONY CORP (SONY)   YAMAGIWA Y,  NEGISHI T,  TAKEDA K,  SHIBATA M;  JP11064883-A   TOSHIBA KK (TOKE)   SUZUKI K;  JP11281997-A   TOSHIBA KK (TOKE)   GOTO Y,  IMAI N;  JP11297852-A   SONY CORP (SONY)   TSUKAMOTO M;  JP11330000-A   MATSUSHITA DENKI SANGYO KK (MATU)   MAEKAWA S,  YOSHIOKA T,  KOBAYASHI I;  JP57027035-A   HITACHI LTD (HITA)   IKEDA T,  KAWAKAMI S,  KOBAYASHI Y;  JP62160781-A   AGENCY OF IND SCI & TECHNOLOGY (AGEN)   NISHIMURA T,  SUGAHARA K,  INOUE Y,  KUSUNOKI S;  JP62181419-A   NEC CORP (NIDE)   WAKAUMI H;  JP62216320-A   FUJITSU LTD (FUIT)   SASAKI N;  JP91071971-A   CANADA CUP INC (CACU-Non-standard)   THOMAS T,  WEST J W;  JP92060681-A   NISIDA T (NISI-Individual)   NISIDA T;  JP93021210-A   ;  JP2000100653-A   TDK CORP (DENK)   OCHIAI T,  MARUNO T,  SASAKI A,  KIKUCHI K;  JP2000223425-A   NEC CORP (NIDE)   YUDA K;  JP2000315652-A   SONY CORP (SONY);  ST LCD KK (STLC-Non-standard)   MINEGISHI M,  HAYASHI H,  TAKATOKU M;  JP2000346618-A   SUMITOMO HEAVY IND LTD (SUMH)   SUGA Y;  JP2001023920-A   SUMITOMO HEAVY IND LTD (SUMH);  NEC CORP (NIDE)   YAMAZAKI K,  TANABE H;  JP2002203809-A   HITACHI LTD (HITA)   MIURA H,  MORIBE S,  KATO H,  KOIKE A,  IKEDA S,  NISHIMURA A;  JP2002353142-A   SHARP KK (SHAF)   MAKITA N;  JP2002353159-A   SUMITOMO HEAVY IND LTD (SUMH)   HARADA M;  JP2003031496-A   SHARP KK (SHAF)   NOMURA K,  MAKITA N;  JP2004031809-A   TOSHIBA KK (TOKE)   YOTSUMOTO S;  JP2004311935-A   RYU M K (RYUM-Individual);  LEE H N (LEEH-Individual);  PARK J C (PARK-Individual);  KIM E S (KIME-Individual)   RYU M K,  LEE H N,  PARK J C,  KIM E S;  TW464960-A   NEC CORP (NIDE)   OKUMURA N;  TW564465-A   MITSUBISHI DENKI KK (MITQ);  SEIKO EPSON CORP (SHIH)   OGAWA T,  TOKIOKA H,  NISHIMAE J,  OKAMOTO T,  SATO Y,  INOUE M,  MIYASAKA M,  JIROKU H;  TW457553-B   ;  TW569350-B   TSAO I (TSAO-Individual)   TSAO I;  US3632205-A   ;  US4234358-A   WESTERN ELECTRIC CO INC (AMTT);  BELL TELEPHONE LAB INC (AMTT)   CELLER G K,  KIMERLING L C,  LEAMY H J,  POATE J M,  ROZGONYI G A;  US4309225-A   MASSACHUSETTS INST TECHNOLOGY (MASI)   FAN J C C,  ZEIGER H J;  US4382658-A   HUGHES AIRCRAFT CO (HUGA)   SHIELDS S E,  FLETCHER B G;  US4456371-A   IBM CORP (IBMC)   LIN B J;  US4639277-A   EASTMAN KODAK CO (EAST)   HAWKINS G A;  US4653903-A   CANON KK (CANO)   TORIGOE M,  KOHNO M,  SUZUKI A; 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 US5173441-A   MICRON TECHNOLOGY INC (MICR-Non-standard)   YU C,  DOAN T T;  US5204659-A   HONEYWELL INC (HONE)   SARMA K R;  US5233207-A   NIPPON STEEL CORP (YAWA)   ANZAI K;  US5247375-A   HITACHI LTD (HITA)   MOCHIZUKI Y,  AOYAMA T;  US5281840-A   HONEYWELL INC (HONE)   SARMA K R;  US5285236-A   JAIN K (JAIN-Individual)   JAIN K;  US5291240-A   ANVIK CORP (ANVI-Non-standard)   JAIN K;  US5294811-A   HITACHI LTD (HITA)   MOMMA N,  USAMI K,  MOCHIZUKI Y,  AOYAMA T,  OGAWA K;  US5304357-A   RICOH KK (RICO);  RICOH OYO DENSHI KENKYUSHO KK (RICO)   KUMANO M,  OHTAKA K,  IRINODA M,  SATO Y,  HINO T,  OTAKA K;  US5338959-A   SANSEI DENSHI KK (SANS-Non-standard)   HAN J,  KIM C,  KIM W;  US5373803-A   SONY CORP (SONY)   SUZUKI T,  NOGUCHI T;  US5395481-A   UNIV CALIFORNIA (REGC)   MCCARTHY A M;  US5409867-A   FUJI ELECTRIC CO LTD (FJIE)   ASANO A;  US5453594-A   ELECTRO SCI IND INC (ESII)   KONECNY K F;  US5456763-A   UNIV CALIFORNIA (REGC)   KASCHMITTER J L,  SIGMON T W;  US5496768-A   CASIO COMPUTER CO LTD (CASK)   KUDO T; 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 US20070054477-A1   ;  US20070108472-A1   ;  US20070111349-A1   ;  US20070145017-A1   ;  US20070184638-A1   ;  US20070215877-A1   ;  US20070215942-A1   ;  US20080035863-A1   ;  US20080124526-A1   ;  US20080176414-A1   ;  US20090001523-A1   ;  US20090137105-A1   ;  US20090140173-A1   ;  US20090218577-A1   ;  US20090242805-A1   ;  US20090309104-A1   ;  US20100024865-A1   ;  US20100187529-A1   ;  US20110248278-A1   ;  US20110309370-A1   ;  US6169014-B1   KONINK PHILIPS ELECTRONICS NV (PHIG)   MCCULLOCH D J;  US6172820-B1   SANYO ELECTRIC CO LTD (SAOL)   KUWABARA T;  US6176922-B1   US SEC OF NAVY (USNA)   AKLUFI M E,  RUSSELL S D;  US6177301-B1   LG LCD INC (GLDS);  LG PHILIPS LCD CO LTD (GLDS)   JUNG Y;  US6184490-B1   ZEISS FA CARL (ZEIS)   SCHWEIZER J;  US6187088-B1   NEC CORP (NIDE)   OKUMURA N;  US6190985-B1   ADVANCED MICRO DEVICES INC (ADMI)   BUYNOSKI M;  US6193796-B1   LG ELECTRONICS INC (GLDS)   YANG M S;  US6203952-B1   3M INNOVATIVE PROPERTIES CO (MINN)   O'BRIEN D P,  FLORCZAK J M,  SMITHSON R L;  US6235614-B1   LG LCD INC (GLDS);  LG PHILIPS LCD CO LTD (GLDS)   YANG M;  US6242291-B1   SEMICONDUCTOR ENERGY LAB (SEME)   KUSUMOTO N,  YAMAZAKI S,  TANAKA K;  US6274488-B1   ULTRATECH STEPPER INC (ULTR-Non-standard)   TALWAR S,  WANG Y;  US6285001-B1   MINNESOTA MINING & MFG CO (MINN)   FLEMING P R,  OUDERKIRK A J,  BORCHERS E J;  US6300175-B1   LG LCD INC (GLDS);  LG PHILIPS LCD CO LTD (GLDS)   MOON D;  US6313435-B1   MINNESOTA MINING & MFG CO (MINN)   SHOEMAKER C L,  AGUIRRE L A;  US6316338-B1   LG PHILIPS LCD CO LTD (GLDS)   JUNG Y;  US6320227-B1   HYUNDAI ELECTRONICS IND CO LTD (HYNX)   RI S,  ZO K;  US6326186-B1   NOVO-NORDISK AS (NOVO)   KIRK O,  OHMANN A;  US6326215-B1   KEENSENSE INC (KEEN-Non-standard)   KEEN R E;  US6326286-B1   LG LCD INC (GLDS);  LG PHILIPS LCD CO LTD (GLDS)   PARK W,  JUNG Y,  CHUNG S;  US6333232-B1   MITSUBISHI DENKI KK (MITQ)   KUNIKIYO T;  US6341042-B1   TOSHIBA KK (TOKE)   MATSUNAKA S,  SUMINO T,  FUJIWARA J;  US6348990-B1   HAMAMATSU PHOTONICS KK (HAMM)   IGASAKI Y,  YOSHIDA N,  TOYODA H,  HARA T; 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 US7091411-B2   INST PHYSIKALISCHE HOCHTECHNOLOGIE EV (PHYS-Non-standard)   FALK F,  ANDRAE G;  US7115503-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  US7119365-B2   TAKAFUJI Y (TAKA-Individual);  ITOGA T (ITOG-Individual)   TAKAFUJI Y,  ITOGA T;  US7132204-B2   LG PHILIPS LCD CO LTD (GLDS)   JUNG Y H;  US7144793-B2   SONY CORP (SONY)   GOSAIN D P,  MACHIDA A,  NAKANO K,  FUJINO T,  SATO J;  US7160763-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J S,  VAN DER WILT P C;  US7164152-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J;  US7172952-B2   CHUNG S J (CHUN-Individual)   CHUNG S J;  US7183229-B2   SONY CORP (SONY)   YAMANAKA H;  US7187016-B2   EXPL NEXT GENERATION CO LTD (NEXT-Non-standard)   ARIMA Y;  US7189624-B2   TOSHIBA KK (TOKE)   ITO T;  US7192479-B2   MITANI Y (MITA-Individual);  VOUTSAS A T (VOUT-Individual);  CROWDER M A (CROW-Individual)   MITANI Y,  VOUTSAS A T,  CROWDER M A;  US7199397-B2   AU OPTRONICS CORP (AUOP)   HUANG W,  SHI L;  US7217605-B2   SEMICONDUCTOR ENERGY LAB (SEME)   KAWASAKI R,  NAKAJIMA S;  US7220660-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J S,  SPOSILI R S,  CROWDER M A;  US7297982-B2   HITACHI LTD (HITA)   SUZUKI K,  NAGATA T,  TAKAHASHI M,  SAITO M,  OGINO T,  MIYAO M;  US7311778-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J S,  VAN DER WILT P C;  US7318866-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J;  US7326876-B2   JUNG Y H (JUNG-Individual)   JUNG Y H;  US7364952-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J;  US7399359-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J S,  CHOI J B;  US7622370-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  US7629234-B2   BRULAND K J (BRUL-Individual)   BRULAND K J;  US7645337-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J S,  VAN DER WILT P C;  US7691687-B2   IM J (IMJJ-Individual)   IM J;  US7700462-B2   SEMICONDUCTOR ENERGY LAB (SEME)   TANAKA K,  YAMAZAKI S;  US7709378-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  US7804647-B2   SHARP LAB AMERICA INC (SHAF)   MITANI Y,  VOUTSAS A T,  CROWDER M A;  US7964480-B2   UNIV COLUMBIA NEW YORK (UYCO)   IM J S,  VAN DER WILT P C;  US33836-E   MRS TECHN INC (MRST-Non-standard)   RESOR G L,  MCEACHERN R A,  SCHNEIDER W C,  WORTH W H;  WO1997045827-A1   ;  WO1998024118-A1   ;  WO1999031719-A1   ;  WO2000014784-A1   ;  WO2001018854-A1   ;  WO2001018855-A1   ;  WO2001071786-A1   ;  WO2001071791-A1   ;  WO2001073769-A1   ;  WO2002042847-A1   ;  WO2002086954-A1   ;  WO2002086955-A1   ;  WO2003018882-A1   UNIV COLUMBIA NEW YORK (UYCO)   IM J S,  VAN DER WILT P C;  WO2003046965-A1   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  WO2006055003-A1   ;  WO2002031869-A2   ;  WO2005054949-A2   CYMER INC (CYME)   PARTLO W N,  DAS P P,  HUDYMA R,  THOMAS M;  WO2002031869-A3   ;  WO2003084688-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S,  CHOI J B;  WO2004017379-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  WO2004017380-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  WO2004017381-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  WO2004017382-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  WO2004075263-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  WO2005029546-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  WO2005029548-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  WO2005029550-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S;  WO2005029551-A3   UNIV COLUMBIA NEW YORK (UYCO)   IM J S,  VAN DER WILT P C;  CN101919058-B -- US20070111349-A1   ;  US7091411-B2   INST PHYSIKALISCHE HOCHTECHNOLOGIE EV (PHYS-Non-standard)   FALK F,  ANDRAE G