NOVELTY - Forming (M1) low-index silica based coating (3) having minimally visible striping, involves forming a silica precursor (P1) comprising a silica sol comprising a silane and/or a colloidal silica and a striping-reducing agent; depositing (P1) on a glass substrate (1) to form a coating layer; and curing and/or firing the coating layer in an oven at 550 degrees C for 1 to 10 minutes. The striping-reducing agent comprises a high-molecular weight solvent and an ether/oleate-based organic or a low-molecular weight solvent.    USE - For making a low-index silica based antireflective coating used in a coated article, a photovoltaic device (Claimed). These coated articles are used in devices such as storefront windows, display cases, picture frames, greenhouses, other types of windows. The AR coating is also used in sport and stadium lighting (as an AR coating on such lights), and/or street and highway lighting (as an AR coating on such lights).    ADVANTAGE - The striping reducing agent reduces a visible amount of striping on the coating after curing and/or firing. The formation of anti-reflective (AR) coatings eliminates striping at high wet thickness (i.e. upto a wet thickness of 70 mu m when heated to 220 degrees C and 50 mu m when heated to 625 degrees C). The method provides an improved anti-reflection (AR) coating on the incident glass substrate (i.e. of a solar cell), which functions to reduce reflection of light from the glass substrate, thereby allowing more light within the solar spectrum to pass through the incident glass substrate and reach the photovoltaic semiconductor so that the solar cell is more efficient. The AR coatings produced have appropriate light transmission, abrasion resistance property, they are durable and increase transmission of light to the active semiconductor film of the photovoltaic device, irrespective of the composition of the glass substrate.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following    (1) a method (M2) of making a photovoltaic device comprising a photoelectric transfer film, at least one electrode (4), and the low-index coating, involving making the low-index coating according method (M1) on a light incident side of a front glass substrate of the photovoltaic device;    (2) a photovoltaic device comprising: a photovoltaic film, and at least a glass substrate on a light incident side of the photovoltaic film; an antireflection coating provided on the glass substrate, where the antireflection coating comprises at least a layer provided directly on and contacting the glass substrate, where the layer is produced using method (m1); and    (3) a coated article comprising: a glass substrate; an antireflection coating provided on the glass substrate, where the antireflection coating comprises at least a layer provided directly on and contacting the glass substrate, the layer produced using method (M1).    DESCRIPTION OF DRAWING(S) - The figure shows cross sectional view of a photovoltaic device comprising the AR coating.    Glass (1)    Anti-reflective coating (3)    Electrode (4)    Thin film solar cell layer (5)    Reflection enhancement oxide and/or EVA (6)    Black metallic contact (7)