TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The fluorinated solvent is hydrofluoroether(s), preferably methyl nonafluorobutyl ether, methyl nonafluoroisobutyl ether, isomeric mixture of methyl nonafluorobutyl ether and methyl nonafluoroisobutyl ether, ethyl nonafluorobutyl ether, ethyl nonafluoroisobutyl ether, isomeric mixtures of ethyl nonafluorobutyl ether and ethyl nonafluoroisobutyl ether, 3-ethoxy-1,1,1,2,3,4,4,5,5,6,6,6-dodecafluoro-2-trifluoromethyl-hexane and/or 1,1,1,2,2,3,4,5,5,5-decafluoro-3-methoxy-4-trifluoromethyl-pentane. The solubility enhancement agent comprises silazane. The silazane is of 1,1,1,3,3,3-hexamethyldisilazane and/or 1,1,3,3-tetramethyldisilazane. The fluorinated photoresist material comprises resorcinarene. The fluorinated photoresist material further comprises photo-acid generator. The photo-acid generator is N-nonafluorobutane-sulfonyloxy-l,8-naphthalimide, N- nonafluoropropane-sulfonyloxy-1,8-naphthalimide, N-nonafluoroethane-sulfonyloxy-1,8- naphthalimide, N-nonafluoromethane-sulfonyloxy-l,8-naphthalimide, triphenylsulfonium perfluorooctanesulfonate, triphenylsulfonium perfluorobutanesulfonate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium hexafluorophosphate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium perfluorooctanesulfonate, diphenyliodonium perfluorobutanesulfonate, diphenyliodonium trifluoromethanesulfonate, di-(4-tert- butyl)phenyliodonium, perfluorooctanesulfonate, di-(4-tert-butyl)phenyliodonium perfluorobutanesulfonate, di-(4-tert-butyl)phenyliodonium trifluoromethanesulfonate, diphenyliodonium hexafluorophosphate, diphenyliodonium hexafluoroantimonate, di-(4-tert- butyl)phenyliodonium hexafluorophosphate, di-(4-tert-butyl)phenyliodonium hexafluoroantimonate, n-hydroxy-5-norbornene-2,3-dicarboximide perfluorooctanesulfonate, n-hydroxy-5-norbornene-2,3-dicarboximide perfluorobutanesulfonate, n-hydroxy-5- norbornene-2,3-dicarboximide trifluoromethanesulfonate, n-hydroxynaphthalimide perfluorooctanesulfonate, n-hydroxynaphthalimide perfluorobutanesulfonate, and/or n-hydroxynaphthalimide trifluoromethanesulfonate. The resorcinarene is 2,8,14,20-tetrakis((4-((5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-heptadecafluorododecyl)oxy)phenyl))pentacyclo(19.3.1.13,7.19,13.115,19)octacosa-1(25),3,5,7(28),9,11,13(27),15,17,19(26),21,23-dodecaen-4,6,10,12,16,18,22,24-octol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The developed pattern (A) of exposed fluorinated photoresist material is treated with solubility enhancement agent, to render the developed pattern (A) of exposed photoresist material soluble in the solvent. An active material is deposited on the patterns (A,B), and the pattern (A) of fluorinated photoresist material is removed with the solvent leaving the pattern (B) of active material on the substrate. The fluorinated photoresist material is fluorinated resorcinarene, fluorinated photoresist, fluorinated molecular glass photoresist, and/or polymer comprising fluorine-containing functional groups and acid-sensitive or radiation-sensitive functional groups, preferably copolymer of perfluorodecyl methacrylate and 2-nitrobenzyl methacrylate. The organic photoresist material comprises copolymer having keto-containing repeating unit of formula (II).x,y,r=not defined.