NOVELTY - A composition for forming an inorganic pattern comprises an inorganic precursor; at least one stabilizer selected from beta -diketone and beta -ketoester; and a solvent.    USE - As composition for forming an inorganic pattern (claimed) of metal oxides such as zinc oxide (ZnO), hafnium oxide (HfO2), zirconium oxide (ZrO2), gadolinium oxide (Gd2O3), lanthanum oxide (La2O3), vanadium oxide (VO2), cerium oxide (CeO2), titanium oxide (TiO2), yttrium oxide (Y2O3), tantalum oxide (Ta2O5) and aluminum oxide (Al2O3), or a pattern of nitrides such as aluminum nitride and pattern of a magnetic material such as yttrium-iron garnet (YIG) or iron oxide (Fe2O3), useful in applications such as light-emitting devices (for example, light emitting diodes and laser diodes), photoelectric conversion elements (for example, solar cells), optical devices, sensors, and magnetic recording media.    ADVANTAGE - The composition enables efficient and inexpensive formation of an inorganic micropattern; and the composition is capable of readily forming an inorganic pattern at a low production cost. The method of forming the inorganic pattern is capable of providing patterned devices with excellent processability and cost reduction; and also provides a final product via direct patterning of the inorganic material using the electrohydrodynamic method, which results in a simplification of the imaging process and commensurate improvement in economic efficiency. When the inorganic material applied to the substrate surface is patterned by electrohydrodynamic lithography, replication or new formation of the pattern can be made through control of the surface microstructure of an electrode.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following:    (1) forming an inorganic pattern involving mixing an inorganic precursor, a stabilizer and a solvent to prepare a reaction mixture (20); applying the reaction mixture to a surface of a substrate, followed by patterning of the resulting inorganic thin film using electrohydrodynamic lithography; and removing the solvent to obtain an inorganic pattern; and    (2) an inorganic pattern comprising the reaction product of a composition comprising an inorganic precursor; at least one stabilizer selected from beta -diketone and beta -ketoester; and a solvent, where the inorganic pattern has a pattern resolution of 2-100 nm.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view showing patterning of the inorganic material on a substrate by means of the electrohydrodynamic phenomenon.    Upper electrode (10)    Dielectric reaction mixture (20)    Lower electrode (30)