NOVELTY - The processing device (10) comprises an evacuatable processing chamber (14) for receiving a process gas (44), a tempering device in sections in and/or in thermal operative connection with all walls of the processing chamber, a gas conveying device (46) for creating a gas flow cycle of a forced convection in the processing chamber, a heating device (36) for heating the gas, and a gas guiding device, which is configured for receiving the processed goods stack and is disposed in the processing chamber such that a part of the gas flow cycle is created or extends through the gas guiding device.    USE - Processing device useful in a processing plant for processing stacked processed goods in the form of planar substrates for the production of conducting, semi-conducting or insulating thin layers (claimed) and for the production of semiconductor thin films such as chalcopyrite absorber layers for solar cells and solar modules.    ADVANTAGE - The processing device is capable of rapidly and continuously processing the stacked processed goods with high throughput, can be easily and simply maintained and accessed, and is compact.    DETAILED DESCRIPTION - The processing device (10) comprises an evacuatable processing chamber (14) for receiving a process gas (44), a tempering device in sections in and/or in thermal operative connection with all walls of the processing chamber, a gas conveying device (46) for creating a gas flow cycle of a forced convection in the processing chamber, a heating device (36) for heating the gas, a gas guiding device, which is configured for receiving the processed goods stack and is disposed in the processing chamber such that a part of the gas flow cycle is created or extends through the gas guiding device, and optionally a loading opening that is locked with a first gas and/or vacuum tight locking device. The chamber is equipped and suited to keep a partial region of the entire processing chamber wall at a predetermined first temperature during a part of the processing of the stacked processed goods. The first temperature is above a room temperature as the second temperature, and is below a third temperature that is generated in the processing chamber and is above room temperature. The heating device is disposed in the gas flow cycle created by the gas conveying device. The processed goods stack is inserted into the gas guiding device through the loading opening and optionally a gas inlet device for feeding the process gas into the gas flow cycle. A thermally insulating material is provided at an inner side of the processing chamber wall in a section-wise manner and is reaction-resistant under process conditions. The gas guiding device has an upper separation plate, which defines a first chamber region in the processing chamber above the gas guiding device, and a lower separation plate, which defines a second chamber region in the processing chamber below the gas guiding device. The surfaces of the gas guiding device are provided with the thermally insulating material. The gas guiding device has a distribution device for uniformly distributing the gas flow. The processed goods stack is downstreamly arranged from the distribution device. The distribution device is formed by a plate provided with slits and/or holes. The gas guiding device comprises a ventilator, which is a reaction-resistant material. The ventilator is arranged in the area of one of the front sides of the processed goods stack and/or is fastened or fastenable at a drive shaft, which reaches into the processing chamber and consists of reaction-resistant material. A further ventilator is arranged in the area of the other opposite front side of the processed goods stack. The gas inlet device is arranged and designed for introducing hydrogen sulfide- or hydrogen selenide-containing gases or gaseous sulfur and/or selenium into the gas flow cycle. The heating device comprises graphite- or silicon carbide-resistant heating element, which are formed as plate-shaped meander heating stack or bundles of heating rods. The processing device further comprises a cooling device, which is arranged in the gas flow cycle, is temperable in the range of a room temperature of up to 250 degrees C and comprises a cooling element, plate stack cooler and/or a tube bundle cooler, a gas deflection element, through which the gas flow cycle is deflectable, so that the heating device or the cooling device is disposed in the gas flow cycle, and a further loading opening that is locked with a second gas and/or vacuum tight locking device, through which the processed goods stack is removable from the gas guiding device. All walls of the processing chamber consist of alloyed stainless steel, or the processing chamber has a quartz glass tube or a ceramic tube. The constituents present in the processing chamber consist of metals or metal alloys, ceramic or carbon-containing or carbon fiber-containing materials. The first locking device and/or the second locking device consist of alloyed stainless steel, and are temperable by the tempering device. A partial region of the entire locking device is adjusted at a predetermined first temperature during a part of the processing of the stacked processed goods, where the first temperature is above a room temperature as the second temperature, and is below a third temperature that is generated in the processing chamber and is above room temperature. The processing chamber is rectangular, quadratic, trapezoidal or triangular in cross-section. The processing device includes a suction opening for evacuating the processing chamber. INDEPENDENT CLAIMS are included for:    (1) a processing plant for processing stacked processed goods; and    (2) a method for processing stacked processed goods.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic cross-sectional view of a processing device.    Processing device (10)    Processing chamber (14)    Heating device (36)    Process gas (44)    Gas conveying device. (46)