WO2009150979-A1 -- JP2006169588-A   ;  JP2007273913-A   SHIMADZU CORP (SHMA)   NAKATSU O;  JP2006515039-W   APPLIED MATERIALS INC (MATE-Non-standard)   CHOI S Y,  SHANG Q,  GREENE R I,  HOU L;  KR1202270-B1 -- KR2008037703-A   TOKYO ELECTRON LTD (TKEL)   TIAN C,  NOZAWA T,  ISHIBASHI K;  JP5520455-B2 -- JP98158847-A   ;  JP2000100805-A   ;  JP2000164392-A   SUMITOMO METAL IND LTD (SUMQ)   MABUCHI H;  JP2001267252-A   SHARP KK (SHAF);  OHMI T (OHMI-Individual)   KANETSUKI R,  TADERA T,  YAMAMOTO T,  HIRAYAMA M,  OMI T;  JP2006310794-A   TOKYO ELECTRON LTD (TKEL);  UNIV TOHOKU (TOHO)   KITAMURA M,  HIRAYAMA M,  OHMI T;  CN102760633-B -- CN1300875-A   YAMAMOTO N (YAMA-Individual);  TADERA T (TADE-Individual);  YAMAMOTO T (YAMA-Individual);  HIRAYAMA M (HIRA-Individual);  OHMI T (OHMI-Individual)   YAMAMOTO N,  TADERA T,  YAMAMOTO T,  HIRAYAMA M,  OHMI T;  JP10158847-A   ;  US20040168769-A1   ;  US9196460-B2 -- CN1300875-A   YAMAMOTO N (YAMA-Individual);  TADERA T (TADE-Individual);  YAMAMOTO T (YAMA-Individual);  HIRAYAMA M (HIRA-Individual);  OHMI T (OHMI-Individual)   YAMAMOTO N,  TADERA T,  YAMAMOTO T,  HIRAYAMA M,  OHMI T;  CN1754008-A   APPLIED MATERIALS INC (MATE-Non-standard)   CHOI S Y,  SHANG Q,  GREENE R I,  HOU L;  JP02114530-A   ;  JP10158847-A   ;  JP2000100805-A   ;  JP2006169588-A   ;  JP2007273913-A   SHIMADZU CORP (SHMA)   NAKATSU O;  JP2006515039-W   APPLIED MATERIALS INC (MATE-Non-standard)   CHOI S Y,  SHANG Q,  GREENE R I,  HOU L;  KR2008037703-A   TOKYO ELECTRON LTD (TKEL)   TIAN C,  NOZAWA T,  ISHIBASHI K;  US5091049-A   PLASMA & MAT TECHN (PLAS-Non-standard)   CAMPBELL G,  CONN R W,  SHOJI T;  US5122251-A   PLASMA & MATERIALS TECHNOLOGIES INC (PLAS-Non-standard)   CAMPBELL G A,  CONN R W,  PEARSON D C,  DECHAMBRIER A P,  SHOJI T;  US5525159-A   TOKYO ELECTRON LTD (TKEL)   HATA J,  HAMA K,  HONGO T;  US5611864-A   ;  US5620523-A   CANON SALES CO INC (CANO);  ALCAN TECH CO INC (ALCN);  SEMICONDUCTOR PROCESS LAB CO LTD (SEMI-Non-standard)   MAEDA K,  OHIRA K,  NISHIMOTO Y;  US5792272-A   WATKINS JOHNSON CO (WATK-Non-standard)   VAN OS R,  DURBIN W J,  MATTHIESEN R H,  FENSKE D C,  ROSS E D;  US6042687-A   LAM RES CORP (LRES)   MCMILLIN B,  YANG R,  SINGH V,  NI T,  BARNES M;  US6132552-A   MICRON TECHNOLOGY INC (MICR-Non-standard)   DONOHOE K G,  BLALOCK G T;  US6162323-A   TOKYO ELECTRON YAMANASHI LTD (TKEL);  KAGAKU GIJUTSU SHINKO JIGYODAN (JSTA)   KOSHIMIZU C;  US20020047541-A1   ;  US20030207033-A1   ;  US20040206305-A1   ;  US20040238104-A1   ;  US20060090704-A1   ;  US20070059944-A1   ;  US20080081114-A1   ;  US20080254220-A1   ;  US20080302761-A1   ;  US20080303744-A1   ;  US20090130335-A1   ;  US20090239364-A1   ;  US20100025821-A1   ;  US20100096362-A1   ;  US20100101728-A1   ;  US20100170872-A1   ;  US20100183827-A1   ;  US20100288439-A1   ;  US20110111557-A1   ;  US20110114600-A1   ;  US20110121736-A1   ;  US20110146910-A1   ;  US20110180213-A1   ;  US20110259523-A1   ;  US20110303364-A1   ;  US20130292047-A1   ;  US20140342575-A1   ;  US20140368110-A1   ;  US6286454-B1   OHMI T (OHMI-Individual);  SHARP KK (SHAF)   HIRAYAMA M,  OMI T,  YAMAMOTO T,  TADERA T;  US6357385-B1   OHMI T (OHMI-Individual)   OHMI T,  NITTA T,  HIRAYAMA M,  TAKANO H,  KAIWARA R;  US8568556-B2   TOKYO ELECTRON LTD (TKEL);  UNIV TOHOKU (TOHO)   HIRAYAMA M,  OHMI T;  US8733281-B2   TOKYO ELECTRON LTD (TKEL);  UNIV TOHOKU (TOHO)   HIRAYAMA M,  OHMI T,  HORIGUCHI T;  WO2005117083-A1   TOKYO ELECTRON LTD (TKEL)   NOZAWA T,  YUASA T;  WO2008153064-A1   TOKYO ELECTRON LTD (TKEL);  UNIV TOHOKU (TOHO)   HIRAYAMA M,  OHMI T,  HORIGUCHI T