NOVELTY - Depositing a ceramic thin film by sputtering involves positioning a target (21) made out of a nonconductive material inside a vacuum chamber (20); and first applying an alternating current (AC)/radio-frequency (RF) power to the target to produce plasma within the chamber, followed by the application of a hybrid power in combination of an AC/RF power and a direct current (DC) power to proceed a sputtering process within the vacuum chamber, such that a ceramic thin film is deposited on a substrate located within the vacuum chamber.    USE - For depositing a ceramic thin film such as LiCoO2, LiMn2O4 and LiNiO2 (claimed), which are used as cathode for a secondary thin film lithium battery. The CIGS (Cu(In, Ca)Se2) is used as semiconductor material for solar cells.    ADVANTAGE - The deposition of ceramic thin film by sputtering, increases deposition rate of the ceramic thin film and enhances the uniformity of deposited thin film. The method allows deposition of ceramic thin film having desirable composition and crystalline structure through the adjustment of process variables during sputtering. The method increases deposition rate of ceramic thin film suitable for thin film lithium batteries thereby ensuring mass productivity for realizing the commercialization of thin film batteries. The hybrid power in combination of the DC power and the AC/RF power can be used for the manufacture of thin film batteries through sputtering of a lithium metal oxide-based active cathode material, which contributes to decreasing the thin film deposition processing time and to improving uniformity of the deposited thin film. With the use of the hybrid power, the AC/RF power can be involved only in the plasma production so a relatively low-price, low-power AC/RF output can be utilized, instead of the conventional high-price, high-power AC/RF output used for the mass production and commercialization of thin film batteries. The method makes it possible to induce crystallization of an active cathode material having an influence on the lithium inter/deintercalation properties during the manufacture of lithium metal oxide-based thin film batteries, and to deposit thin films exhibiting satisfactory interface characteristics and chemical stability. As compared with the conventional RF sputtering, the sputtering method noticeably improves the sputtering deposition rate for a non-conductive target and the uniformity of the deposited thin film.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a thin film sputtering device using a nonconductive target comprising: a vacuum chamber including a stage (22) on which the nonconductive target and a substrate are positioned; an AC power source (11) for supplying an AC power to the target; a DC power source (41) for supplying a DC power to the target; and a matching box (12) for performing impedance matching to synthesize and/or hybridize the AC power with the DC power.    DESCRIPTION OF DRAWING(S) - The figure shows schematic view of sputtering device in which hybrid power in combination of DC power and AC/RF power are implemented.    Alternating current (AC) power supply (10)    AC Power source (11)    Matching box (12)    Vacuum chamber (20)    Target (21)    Stage (22)    Indium coating (24)    Support plate (25)    Yoke (27)    Direct current (DC) power supply (40)    DC Power source (41)    Inductor (42)    Capacitor (43)    Gas tank (50)    Valve (52)