TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition (C1) further comprises at least one mechanical reinforcement (0.5-0.8 wt.%), where the reinforcement is free from any electronically conducting material. The composition comprises perhydropolysilazane (5-30, preferably 15-25) wt.%; and pulverulent ion-conductive solid electrolytes (70-96, preferably 77-90) wt.%. The composition (C1) is designed for the preparation of a final target having a diameter of 4-10 cm, and the mechanical reinforcement is selected from fibers having a length of 0.1-5 cm. The composition (C1) is designed for the preparation of a final target having a size of 5-8 cm, and the mechanical reinforcement consists of glass fibers of 0.3 cm in length maximum and an average diameter of 0.1 mu m. Preferred Components: The perhydropolysilazanes is a compound of formula -(Si(H)2-NH)n-. The perhydropolysilazanes are in solution in a solvent. The pulverulent ion-conductive solid electrolytes are selected from lithium-, aluminum- and silicium-based electrolytes. The ion-conductive solid electrolytes are selected from lithium borates; lithium silicates; lithium germanates; lithium phosphates; lithium salts; and/or nitrides. The pulverulent ion conductive solid electrolyte is a mixture of at least lithium borate, lithium sulfate, lithium phosphate and lithium nitride. The mechanical reinforcement is selected from fibers, particles, flakes, and/or fillers made of glass, aluminum oxide, aluminum silica, asbestos, quartz and/or any other electronically insulating fillers. The mechanical reinforcement is in the form of fibers.n=integer value such that the perhydropolysilazane has a number-average molecular weight of 150-150000 g/mol.Preferred Method: In the method (M1), the formatting step is carried out by molding the cathodic sputtering target composition (C1) under a molding pressure of 20-100 (preferably 50-80) MPa. The formatting step is carried out by applying a layer of cathodic sputtering target composition (C1) on or around a solid support. The heating step is carried out at 160-220 degrees C for 3-5 minutes.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent is selected from aliphatic or aromatic hydrocarbons, halogenated hydrocarbons, esters, ketones, ethers and/or mono and polyalkyl glycol dialkylethers (preferably di-n-butylether). EXAMPLE - A mixture of lithium metaborate (42 mol.%), lithium sulphate (28 mol.%) and lithium nitride (30 mol.%) was the desired chemical composition to prepare the starting sputtering target composition. A batch composition (13 g) was selected to prepare a sputtering target suitable for the comfortable fitness in the cathode. The lithium metaborate powder (42 mol.%), lithium sulphate powder (28 mol.%) and lithium nitride powder (30 mol.%) were the weights taken for the starting materials. Since lithium metaborate and lithium nitride were hygroscopic compounds which easily react with the moisture, all the powders were kept inside a glow box which was maintained at an inert dry argon gas atmosphere before their use. An X-ray analysis of the starting material was performed before starting the manufacturing of the target to check the formation of the phases present in the starting materials. The X-ray diffraction patterns of the starting materials were found conformed to the database. The lithium based powder mixture was then mixed and grinded well in a mortar until the obtaining of a uniform mixture. Glass fibers were cut into small pieces of 0.3 cm in length. The small pieces of 0.3 cm of glass fibers (0.7 wt.%) was used in the sputtering target. These glass fibers were added in an amount of 0.7 wt.% to the lithium powder mixture which corresponds to an amount of 0.091 g of glass fibers. The small pieces of glass fibers were then mixed with the lithium based powder mixture until obtaining an intimate mixture. Perhydropolysilazane (3.25 g) in di-n-butylether was then slowly added to the mixture of starting materials under mixing with a stainless steel spatula until obtaining a homogeneous mixture of starting materials. The mixture of starting material was then pressed using a stainless steel die. A sputtering target of 5 cm of diameter suitable to fit in the cathode of thin film deposition chamber was prepared using this die. The mixture of starting materials was placed in the stainless steel die and the sputtering target was prepared by pressing 75 MPa. Applying more than 100 MPa was lead to spread the solvent out of the die and the powdered mixture. The resulting pressed mixture was then sintered at 180 degrees C for 3-5 minutes which was the minimum duration required to evaporate the solvent. The sintered sputtering target had a thickness of 0.51 cm, a diameter of 5 cm and a weight (w) of 12.784 g. The actual density of that sputtering target was found to be 1.58 g/cm3. The percentage of apparent density of the sputtering target was found to be 74%.