NOVELTY - Microporous film enhanced fluorine-containing crosslinking ion membrane comprises microporous film as enhancer, and crosslinked net structure by fluorine-containing ion exchange resin whose equivalent value is 600-1300. The thickness of the film is 10-300 mu m, and stretch strength is 10-60 MPa.    USE - A microporous film enhanced fluorine-containing crosslinking ion membrane.    ADVANTAGE - The membrane has higher stability and good mechanical strength.    DETAILED DESCRIPTION - Microporous film enhanced fluorine-containing crosslinking ion membrane comprises microporous film as enhancer, and crosslinked net structure by fluorine-containing ion exchange resin whose equivalent value is 600-1300. The thickness of the film is 10-300 mu m, and stretch strength is 10-60 Mpa. The crosslinked net structure is structure (I)-(V).    G1=CF2 or O;    G2=CF2 or O;    Rf=2-10C perfluoro carbon chain or fluorine-containing perfluoro carbon chain;    R=methylene or perfluoro methylene;and    n=0-10.    An INDEPENDENT CLAIM is included for a method for preparing the microporous film enhanced fluorine-containing crosslinking ion exchange membrane comprising preparing microporous film and fluorine-containing ion exchange resin solution or molten substance through molding, extrusion, heat pressing, spin coating, casting, screen painting, spraying or dipping, or simultaneously forming film by combining with the microporous film. Film forming crosslinking or film formed crosslinking is conducted to form crosslinked structures (I)-(V). The method for forming crosslinked structure (I) involves heat, light, electron radiation, plasma, X ray, or free radical initiator; or in the presence crosslinker(s) of formula X2R17X3 (XI). The free radical initiator is azo or organic peroxide initiator of formula R1OOR2 or R3OC(O)O-OC(O)OR4 (preferably perfluoro-organic peroxide initiator). The azo initiator is azobisformamide, azobisisobutyrynitrile, azobisisovaleronitrile, azobisisoheptonitrile, azobis isobutyric acid dimethyl ester, 1-((cyano-1-methyl ethyl)azo) formamide, 1,1'-azo(cyclohexyl-1-cyano), 2,2'-azo(2-methyl propylamidine)dihydrochloride, 4,4'-azobis(4-cyano valeric acid), or 3- hydroxyl-4-nitrobenzoic acid. The crosslinked structure (II) and (III) are obtained by reacting sulfuryl fluoride, sulfonyl chloride or sulfuryl bromide typed resin with ammonia, hydrazine, organo diamine or substance capable of releasing ammonia, hydrazine, organo diamine through chemical treatment. The organo diamine is 1-10C alkyl or fluorine-containing alkyl diamine. The substance capable of releasing ammonia, hydrazine, organo diamine through chemical treatment comprises organo or inorganic acid salt, carbamide or carbamidine of ammonia, hydrazine, or organo diamine. The crosslinked structure (IV) is obtained by fluosulfonic acid-containing resin achieved using the treatment of chlorosulfonic acid. The crosslinked structure (V) is formed where fluosulfonic acid-containing resin containing nitrile site, the fluosulfuryl fluoride-containing resin containing nitrile site, the sulfonyl chloride-containing resin containing nitrile site, or the sulfuryl bromide-containing resin containing nitrile site are formed under the function of heat or strong protonic acid or Lewis acid. The protonic acid is sulfuric acid (H2SO4), trifluoromethanesulfonic acid (CF3SO3H), or phosphoric acid (H3PO4). The Lewis acid is zinc chloride (ZnCl2), ferric chloride (FeCl3), aluminum chloride (AlCl3), organotin, organo antimony or organo tellurium. The microporous film enhanced fluorine-containing crosslinking ion exchange membrane is obtained by passing through treatment of alkali liquor and acid liquor.    X2, X3=Cl, Br, or I;    R17=perfluoroalkyl or chlorofluoroalkyl;    R1, R2=H, 1-20C alkyl or aryl-substituted alkyl, 1-20C acyl, 1-20C aroyl, 1-20C fluorine-containing or perfluoroalkyl or aryl-substituted alkyl, 1-20C fluorine-containing or perfluoroacyl, 1-20C fluorine-containing or perfluoroaroyl;and    R3, R4=1-20C alkyl or aryl-substituted alkyl, 1-20C fluorine-containing or perfluoroalkyl or aryl-substituted alkyl.