NOVELTY - The method for producing a raised marking (1) on a quartz glass article, comprises applying suspension, which contains a dispersion liquid and an amorphous silicon dioxide, on a surface of the article as pattern, and solidifying the pattern under formation of the marking at 1100-1450 degrees C or greater than 1600 degrees C. The suspension contains silicon dioxide nano-particles of 1-3 wt.% related to the total solid content. The silicon dioxide particles have particle sizes of 500 mu m and silicon dioxide nano-particles have particle sizes of 100 nm. The marking consists of material regarding the article.    USE - Method for producing a raised marking on a quartz glass article such as glass pipe useful in the semiconductor manufacture and as reactor in the solar cell manufacturing.    ADVANTAGE - The method ensures cost-effective production of optically acceptable raised marking with a uniform appearance on a quartz glass article using suspension, which is free of bonding agent, in a less-time consuming manner, thus avoiding a decrease of the viscosity of quartz glass and a devitrification of the quartz glass article.    DETAILED DESCRIPTION - The method for producing a raised marking (1) on a quartz glass article, comprises applying suspension, which contains a dispersion liquid and an amorphous silicon dioxide, on a surface of the glass article as pattern, and solidifying the pattern under formation of the marking at 1100-1450 degrees C or greater than 1600 degrees C. The suspension contains silicon dioxide nano-particles of 1-3 wt.% related to the total solid content. The silicon dioxide particles have particle sizes of 500 mu m and silicon dioxide nano-particles have particle sizes of 100 nm. The marking consists of material regarding the glass article. The suspension is applied by a mask giving the pattern using a spraying process, where the mask is applied on the surface. The marking is produced with a layer thickness of 0.1-0.5 mm. The largest volume fraction is composed of silicon dioxide particles with particle sizes of 1-60 mu m. The silicon dioxide particles comprise a multimodal distribution of particle sizes with a first maximum of the size distribution of 1-5 mu m and a second maximum of 5-50 mu m, where the multimodal distribution is characterized by a D50-value of less than 40 mu m. The suspension has a solid content of 70-80 wt.%. The silicon dioxide particles (90 wt.%) have spherical shape. A mixture of water and an alcohol-based organic solvent is used as dispersion liquid. The silicon dioxide particles consist of natural raw material and the silicon dioxide nano-particles consist of synthetic silicon dioxide. The amorphous silicon dioxide particles have 99.9 wt.% of silicon dioxide content.    DESCRIPTION OF DRAWING(S) - The diagram shows a quartz glass pipe useful as reactor in the solar cell manufacturing.    Marking (1)    Quartz glass pipe. (2)