NOVELTY - A hybrid thin-film solar cell consisting of p-type layer (I), an amorphous i-type photoelectric conversion layer (3i), n-type layer (3nb), p-type layer (4p), a crystalline i-type photoelectric conversion layer (4i), and n-type layer (4na), is manufactured under the following conditions. An additional i-type intermediate layer (3ia) is deposited after depositing layer (3i). During deposition of layer (3ia), the hydrogen diluent gas/silicon-containing gas ratio is set higher than that during deposition of amorphous i-type photoelectric conversion layer.    USE - Manufacture of hybrid thin-film solar cell.    ADVANTAGE - The method enables manufacture of hybrid thin-film solar cells having excellent photoelectric conversion efficiency, with high productivity.    DETAILED DESCRIPTION - A hybrid thin-film solar cell consisting of an amorphous photoelectric conversion unit (3) having p-type layer (I) deposited sequentially from the substrate (1) side by plasma chemical vapor deposition, an amorphous i-type photoelectric conversion layer, and n-type layer, and a crystalline photoelectric conversion unit having p-type layer, a crystalline i-type photoelectric conversion layer, and n-type layer, is manufactured under the following conditions. An additional i-type intermediate layer is deposited by plasma chemical vapor deposition, after depositing the amorphous i-type photoelectric conversion layer. During deposition of the additional i-type intermediate layer, the ratio of hydrogen diluent gas with respect to silicon-containing gas is set higher than that during deposition of amorphous i-type photoelectric conversion layer. The i-type intermediate layer is exposed to atmosphere by taking out the substrate to the atmosphere during or after completion of i-type intermediate layer. N-type layer (I) and the crystalline photoelectric conversion unit are deposited on the i-type intermediate layer. N-type layer (I) contains silicon oxide.    DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of the hybrid thin-film solar cell.    Substrate (1)    Amorphous photoelectric conversion unit (3)    Amorphous i-type photoelectric conversion layer (3i)    Additional i-type intermediate layer (3ia)    N-type layer (3nb)    Crystalline photoelectric conversion unit (4)    Crystalline i-type photoelectric conversion layer (4i)    N-type layer (4na)    P-type layer (4p)