TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic amine is of formula (A-(B1)m-C1) (I), or cyclic compounds of formula (II) or (III), preferably aniline compounds of formula (IV) or (V). In formula (I) and (II),Either A, C1 = cycloalkyl, aryl or heterocyclyl (all optionally substituted), or include at least one double bond; orA+C1 = macrocyclic ring;B1, B2 = optionally substituted bridge group or a bond; andm, n = 1-3, In formula (I), A, B1, C1, and in formula (II), A, B1, B2, C1 or their substituent is attached by at least one amine.In formula (III)-(V),A, C1 = 4-14 membered ring system comprising cycloalkyl, aryl or heterocyclyl (all optionally substituted);B1 = optionally substituted bridge group; eitherR1, R3 or R1, R5 = H or optionally joined to form 4-7 membered ring comprising cycloalkyl, aryl or heterocyclyl (all optionally substituted); orR1, R2 or R1, R4 = H or optionally joined to form a double bond; orR1, R2, R4 = optionally absent; orR2 = optionally joined to ring A to form double bond or a bridging group; orR4 = optionally joined with ring C1 to form double bond or a bridge group;Ar1 = phenyl, naphthyl or aromatic heterocyclyl (all optionally substituted), where Ar1, R1-R5, A, C1, B1 or their substituent is attached by at least one amine;either R51-R56 or R61-R66 = H or 1-4C alkyl;R57-R59, R67-R69 = H or methyl;R60 = H or 1-6C alkyl; andX- = monovalent anion.Preferred Components: The organic amine is acid blue 25, acid blue 29, acid blue 40, acid blue 45, acid blue 80, acid blue 92, acid blue 119, acid blue 120, acid blue 129, acid black 24, acid black 48, acid fuchsin, basic fuchsin, new fuchsin, acid green 25, acid green 27, acid orange 8, acid orange 51, acid orange 63, acid orange 74, acid red 1, acid red 4, acid red 8, acid red 37, acid red 88, acid red 97, acid red 114, acid red 151, acid red 183, acid red 183, methyl violet, methyl violet B, methyl violet 2B, ethyl violet, acid violet, acid violet 1, acid violet 5, acid violet 6, acid violet 7, acid violet 9, acid violet 17, acid violet 20, acid violet 30, acid violet 34, acid alizarin violet N, acid yellow 14, acid yellow 17, acid yellow 25, acid yellow 42, acid yellow 76, acid yellow 99, basic violet 1, basic violet 3, benzyl violet 4B, Coomassie violet R200 (RTM: Triphenyl methane dye), crystal violet, leucocrystal violet, resorcin crystal violet, crystal violet lactone, direct violet 17, direct violet 38, direct violet 51, fast violet B, gentian violet, pararosaniline base, cresolphthalein complexone, cresyl violet acetate, cresyl violet perchlorate, cresyl violet perchlorate, iodonitrotetrazolium violet-formazan, methylene violet 3RAX, pyoktanin blue, pyrocatechol violet, remazol brilliant violet 5R, rhodamine B, tetrazolium violet, violamine R, fast red violet IB base, iodonitrotetrazolium chloride, leuco patent blue violet, thionin acetate, calcomine violet N , disperse violet 13, disperse violet 17, disperse violet 28, phenol violet, pentachrome violet SW, reactive violet 5, vat violet 1, wool violet, eriochrome violet 5B, omega chrome dark violet D, leucomalachite green and/or their salts or ionomers. The thin film comprises an organic amine having a thickness of about 5 nm to -5 mu m and the organic amine does not penetrate into the substrate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The method further comprises prior to the disposing, forming a primary pattern on an area of the substrate, where the primary pattern defines the at least one lateral dimension of the pattern. The primary pattern comprises a self-assembled monolayer-forming species. The forming of a primary pattern, comprises contacting the substrate with a stamp having a surface including at least one indentation in it, and where the contacting transfers a self-assembled monolayer-forming species from the surface of the stamp to the substrate to form a primary pattern having a lateral dimension defined by the at least one indentation. The reacting step comprises etching. The pattern has an elevation of about 5 nm to 5 mu m. Preferred Composition: The molecular resist composition further comprises a solvent. The solvent comprises a first solvent having a boiling point below 100 degrees C and at least one second solvent having a boiling point greater than or equal to 100 degrees C. The substrate comprises a metal surface. The substrate is a composite substrate comprising a metal surface layer over a material, which is a glass, a plastic, a ceramic, a polymer and/or a second metal. The organic amine has a molar absorptivity of about 5000 M-1cm-1 or greater for at least one wavelength of about 300-900 nm. The molecular resist composition is free from any component having a molecular weight of about 2000 Daltons or greater. EXAMPLE - An elastomeric stamp was prepared from polydimethylsiloxane (PDMS). The patterned PDMS stamp (included a surface having various rectilinear indentations in it and indentations having a lateral dimension of about 500 mu m to 1 mm). The surface of the stamp was immersed in a monolayer-forming ink (a solution of 100 mM hexadecanethiol in acetone) for 15 seconds. The inked stamp was blown dry with nitrogen and the inked and dried surface of the stamp was applied to a composite substrate having a metal surface layer on it. The hexadecanethiol formed a primary pattern comprising a self-assembled monolayer (SAM) on areas of the composite substrate that contacted the stamp surface. A molecular resist composition of 0.07 wt.% basic fuchsin in ethanol was then applied to the substrate by immersing the templated surface for 1 minute in the molecular resist composition. The molecular resist was then dried for 1 minute on a hotplate set at 80 degrees C. The molecular resist composition began to de-wet the templated areas of the substrate and preferentially wet the metal areas of the substrate. Thus, the molecular resist coated the areas of the substrate not covered by the primary pattern comprising a SAM. The patterned substrate was reacted with a reactive composition by immersion in a potassium iodide/iodine based etchant solution for 11 seconds. The substrate was then rinsed with acetone and dried with dry nitrogen. The reaction produced subtractive penetrating features on the substrate corresponding to the pattern of indentations in the surface of the stamp. Areas of the substrate covered by the molecular resist were not etched.