NOVELTY - 1R,2S,4S,5R-Cyclohexane tetracarboxylic-acid dianhydride, is new.    USE - Novel 1R,2S,4S,5R-cyclohexane tetracarboxylic-acid dianhydride is used for 1,2,4,5-cyclohexane tetracarboxylic-acid dianhydride for polyimide precursor for photosensitive resin composition for forming structure and polyimide for display board, interlayer insulation film of integrated circuit and liquid crystal alignment film (all claimed). Uses include but are not limited to liquid-crystal display, organic electroluminescent display board, substrate for electronic paper, solar cell, semiconductor element protective film and optical waveguide material.    ADVANTAGE - The 1R,2S,4S,5R-cyclohexane tetracarboxylic-acid dianhydride has high transparency, high glass transition temperature, low dielectric constant, and is easily manufactured. The polyimide precursor containing the 1R,2S,4S,5R-cyclohexane tetracarboxylic-acid dianhydride has high intrinsic viscosity.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following:    (1) 1,2,4,5-cyclohexane tetracarboxylic-acid dianhydride, which contains 40% or more of 1R,2S,4S,5R-cyclohexane tetracarboxylic-acid dianhydride;    (2) manufacture of 1R,2S,4S,5R-cyclohexane tetracarboxylic-acid dianhydride;    (3) polyimide precursor, which contains polyimide-containing repeating unit of formula (1), in which the bonding position of 2 amide groups and 2 carboxyl groups or ester group is bonded with tetravalent cyclohexane (X);    (4) polyimide-containing repeating unit of formula (5);    (5) photosensitive resin composition, which contains polyimide precursor and photosensitive agent; and    (6) structure, which is formed by exposing a pattern on a base material and developing the exposed pattern. The pattern is obtained by heat-hardening the photosensitive resin composition.    X=tetravalent cyclohexane of formula (2, 3 or 4);    R=H, linear or branched 1-12C alkyl, 6-12C cyclic alkyl, linear or branched 1-12C alkoxy, 6-12C cyclic alkoxy or trialkylsilyl;    A=bivalent aromatic group or aliphatic group;    Y'=amide bonded with X;and    Z=carboxy or ester bonded with X.