TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Method: The catalyst layer is deposited by atomic layer deposition. The steps of depositing the catalyst layer and the microstructure stabilizing layer are repeated to optimize catalytic activity. The catalyst bonding layer is formed using a thin film deposition process selected from direct current/radio frequency (DC/RF) sputtering, chemical vapor deposition, electrochemical deposition, pulsed laser deposition, molecular beam epitaxy, evaporation and atomic layer deposition. The microstructure stabilizing layer is formed using a thin film deposition process selected from DC/RF sputtering, chemical vapor deposition, electrochemical deposition, pulsed laser deposition, molecular beam epitaxy, evaporation and atomic layer deposition. The structure formed by the catalyst and a current collector is a two-dimensional geometry, where the geometry may be varied. The structure formed by the catalyst layer and a current collector layer is a porous, and the catalyst layer and a fully dense the current collector layer structure or a fully dense the catalyst layer and a fully dense the current collector layer structure. The nano-island the catalyst layer and current collector layer is deposited over the fully dense catalyst and current collector layer or over the catalyst bonding layer, where the current collector layer is deposited over the fully dense electrolyte layer. The method further involves providing area selective deposition using a resist, where a patterned polymer or self-assembled monolayer is formed on the electrolyte layer using soft lithography, where the soft lithography is selected from microcontact printing, replica molding, micro-transfer molding, micro-molding in capillaries, and solvent-assisted micro-molding. The area selective deposition is performed using a thin film deposition process selected from atomic layer deposition, and chemical vapor deposition, where a patterned the polymer or monolayer directs the deposition spatially. The patterned long-chain polymer or monolayer is removed by thermal treatment, oxygen plasma, UV ozone, or wet chemical etch. The area selective deposition using a resist process is repeated to selectively deposit a current collecting layer. The current collecting layer is above or below the catalyst layer. The microstructure stabilizing layer and the catalyst layer are a combined layer, where the combined layer is deposited in a single deposition step. Preferred Cell: The fuel cell comprises at least: a thin and dense electrolyte layer; an electrode layer, where the electrolyte layer is a thin and dense layer or a thin and porous layer; a porous and patterned catalyst layer; and a current collector layer, where the current collector layer is disposed on the porous and patterned catalyst layer, and the porous and patterned catalyst layer is disposed on the electrode layer, and the electrode layer is disposed on the electrolyte layer.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate is selected from silicon wafer, glass, plastic, metal foil, anodic aluminum oxide, and aerogels, where the substrate used as a supporting material for a structure of the fuel cell. The electrolyte layer is a proton or oxygen ion conductive material, where the material is selected from Nafion, polyethereteherketone (PEEK), H3PO4 doped polybenzimidazole (PBI), Y doped BaCeO3, Y doped BaZrO3, Yb doped SrCeO3, Y doped ZrO2 (YSZ), Y doped bismuth oxide (YDB), Y doped ceria (YDC), Gd-doped ceria (GDC) and Sm doped ceria (SDC), where the electrolyte layer is formed using a thin film deposition process selected from DC/RF sputtering, chemical vapor deposition, electrochemical deposition, pulsed laser deposition, molecular beam epitaxy, evaporation and atomic layer deposition. The catalyst bonding layer is selected from RuO2, Ir and HxWO3. The catalyst layer is selected from Pt, Co, Ir, Cu, Ni, Fe, Ag, Pd, Ti, Ru, Os, Rh, WO3 and Zr. The microstructure stabilizing layer is selected from Ni, PtRuCo, PtRuOs, PtRuIrOs, PtRuNiZr and PtRuRh.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The self-assembled monolayers are selected from alkylhalosilanes, fluoroalkylhalosilanes, alkyl- and fluoroalkylalkoxysilanes, and disilazanes.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polymers are selected from polymethylacrylamide, poly(methylmethacrylate) and polyimidoamine. EXAMPLE - No suitable example is given.