TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Property: The glass substrate has improved 2-6% of transmittance of visual light ray, 2-7% transmittance of UV radiation, and 1.5-7% transmittance of infrared ray; and reduced 1-5% reflectivity of UV radiation, and 2-6% reflectivity of infrared ray. The battery module with the solar battery module containing the glass substrate has improved 1-7% maximum output quantity.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The titanium compounds are titanium (IV) isopropoxide (tetraisopropanol titan), titanium (IV) butoxide, titanium (IV) ethoxide (titan tetraethanolate), titanium (IV) methoxide, titanium (IV) stearate, titanium chloride, titanium nitrite, titanium sulfate, and/or titanium aminooxalate. The inorganic oxide is tungsten oxide, aluminum oxide, zirconium oxide, and/or lithium oxide. Preferred Composition: The first and second titanium dioxide photocatalyst sol uses the weight of the titanium dioxide as the reference, which is mix at a ratio of 20:80-80:20. The inorganic oxide is present at 0.2-3 wt.%. Preferred Dimension: The compound oxide coat is 10-500 nm thick.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The acids are formic acid, acetic acid, propionic acid, butyric acid, lactic acid, citric acid, fumaric acid, phosphoric acid, sulfuric acid, hydrochloric acid, nitric acid, hydrofluoric acid, chloro-sulfone acid, paratoluenesulfonic acid, trichloroacetic acid, polyphosphoric acid, iodic acid, iodic acid anhydride, and/or perchloric acid. The silicate compound is methyltrichlorosilane, methyl triethoxysilane, methyl tributoxysilane, ethyl trimethoxysilane, ethyl triisopropoxysilane, ethyl tributoxysilane, butyl trimethoxysilane, penta fluoro phenyl trimethoxysilane, phenyl trimethoxysilane, nona fluoro butyl ethyl trimethoxysilane, trifluoro methyl trimethoxysilane, dimethyl diaminosilane, dimethyl dichlorosilane, dimethyl diacetoxysilane, dimethyl dimethoxysilane, diphenyl dimethoxysilane, dibutyl dimethoxysilane, trimethyl chlorosilane, vinyl trimethoxysilane, (meth)acryl oxypropyl trimethoxysilane, glycidyloxytrimethoxysilane, 3-(3-methyl-3-methoxycyclobutane) propyl trimethoxysilane, oxacyclohexyl trimethoxysilane, methyl tris(meth)acryl oxysilane, methyl(2-(meth)acryl oxyethoxy)silane, methyl-triepoxypropyl oxysilane, and/or methyl tris(3-methyl-3-oxetane methoxy) silane. Preferred Condition: The hydrothermal synthesis reaction is performed at 100-300 degrees C and 10-20 atm. The hydrolysis synthesis reaction is performed at 80-90 degrees C. Preferred Composition: The silicate compound is present at 5-20 wt.%. The water is present at 50-70 wt.%.