TECHNOLOGY FOCUS - ELECTRONICS - Preferred Device: In the device, a barrier film substrate is produced by providing the barrier laminate on a substrate film which is used as a substrate. The device is sealed up with the barrier film substrate produced by providing the barrier laminate on the substrate film; or the device is sealed up with the barrier laminate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compound: The polymerizable compound is at least one selected from monofunctional (meth)acrylates and monofunctional epoxy (meth)acrylates. The polymerizable compound is of formula (Ia).X'=a single bond or a divalent linking group;L1-L4=a divalent linking group;andR1-R10=H, alkyl or aryl (both optionally substituted).At least one of R1-R10 is an optionally substituted alkyl. Preferred Composition: The polymerizable composition comprises 50-99 wt.% of a polyfunctional monomer having a bisphenol skeleton; 50-90 wt.% of a total of a compound of formula (Ib) and/or a compound of formula (Ie); and 50-99 wt.% of (Ib). The polymerizable composition comprises, as the polymerizable compound, the compound (Ia) and as the polyfunctional monomer, the compound (Ib). The polymerizable composition further comprises at least one compound represented by the formula Ac1-O-X1-O-PO-(O-Z2)-O-Z1.L5 and L6=a divalent linking group;R11-R16=H, alkyl or aryl (both optionally substituted);m and n=0-12;Z1=Ac2-O-X2-, a substituent group not having a polymerizable group, or H;Z2=Ac3-O-X3-, a substituent group not having a polymerizable group, or H;Ac1, Ac2 and Ac3=an acryloyl group or a methacryloyl group;andX1, X2 and X3=alkylene, alkyleneoxy, alkyleneoxycarbonyl, and/or an alkylenecarbonyloxy group.Preferred Laminate: The barrier laminate further comprises at least one (meth) acrylate monomer having a phosphoester group. The barrier laminate has an alternate layer structure of the organic layer and the inorganic layer and comprises at least two of the inorganic layers. The inorganic layer comprises a metal oxide, a metal carbide, a metal oxide-nitride, or a metal oxide-carbide. SPECIFIC COMPOUNDS - 7 Compounds are disclosed as (I) e.g. nonanoic acid 2-(4-(1-(4-(3-acryloyloxy-2-hydroxy-propoxy)-phenyl)-1-methyl-ethyl)-phenoxy)-1-hydroxymethyl-ethyl ester (IA); nonanoic acid 2-(4-(4-(3-acryloyloxy-2-hydroxy-propoxy)-benzenesulfonyl)-phenoxy)-1-hydroxymethyl-ethyl ester; nonanoic acid 2-(4-(1-(4-(3-acryloyloxy-2-hydroxy-propoxy)-phenyl)-1-methyl-propyl)-phenoxy)-1-hydroxymethyl-ethyl ester; nonanoic acid 2-(4-(1-(4-(3-acryloyloxy-2-hydroxy-propoxy)-phenyl)-1-methyl-butyl)-phenoxy)-1-hydroxymethyl-ethyl ester and nonanoic acid 2-(4-(1-(4-(3-acryloyloxy-2-hydroxy-propoxy)-phenyl)-1-ethyl-propyl)-phenoxy)-1-hydroxymethyl-ethyl ester.    EXAMPLE - On a substrate (Lumirror T60 (RTM: high transparent polyester film having a thickness of 100 mu m), a composition comprising nonanoic acid 2-(4-(1-(4-(3-acryloyloxy-2-hydroxy-propoxy)-phenyl)-1-methyl-ethyl)-phenoxy)-1-hydroxymethyl-ethyl ester (A1) (5 weight parts), bisphenol A epoxyacrylate (B1) (15 weight parts) and IRGACURE907 (RTM: polymerization initiator) was prepared using methyl ethyl ketone to form a film having a dry film thickness of 500 nm, and then cured through irradiation with UV rays at a dose of 0.5 J/cm2 in atmosphere having 100 parts per million of oxygen, thus producing the organic layer. Aluminum oxide was deposited on the surface of the formed organic layer according to a sputtering method to form a film having thickness of 50 nm, thus producing a barrier film substrate. Similarly a control barrier film substrate was also prepared using the composition without A1. Both the test and control barrier film substrates were tested for their water vapor permeability. The result showed that the test/control barrier film substrate showed water vapor permeability (g/m2/day) of less than 0.01/0.01. The test barrier film substrate was excellent in water vapor permeability and was smooth for the surface of the organic layer, compared to the control.