TECHNOLOGY FOCUS - POLYMERS - Preparation: None given. Preferred Compounds: Alternately, the block copolymer compound is of formula (2). Alternately, the block copolymer compound comprises a block (B1) comprising units chosen from repeating alkylene oxide monomeric units and alkylene monomeric units optionally substituted by optionally substituted alkyl, aryl, carboxyl, alkoxycarbonyl or aminocarbonyl, and a block (B2) comprising alkylene monomeric units optionally substituted by optionally substituted alkyl, aryl, carboxyl, alkoxycarbonyl or aminocarbonyl. The blocks (B1 and B2) coupled with element comprising a disulfide group, at least one block is coupled to another block of repeating monomeric units.R3,R4=R1, preferably R4 is phenyl, and n block comprises repeating styrene monomeric units;n'=1-3;A3=alkyl carboxy group;A4 =non-halide group of atom transfer radical polymerization initiation reagent or reversible addition fragmentation chain transfer initiation agent, preferably A4 is alkoxycarbonylalkyl or alkoxycarboxy;andX3,X4=blocks of repeating monomeric units, halo initiation reagent and polymer terminal group, preferably X4 is bromide and block of repeating monomeric units.When n'is 2, m block comprises repeating propylene oxide monomeric units, when A4 is ethoxycarbonyl, and n block comprises atom transfer radical polymerization product, and when A4 is ethoxycarbonyl, R4 is phenyl and n block comprises reversible addition fragmentation chain transfer polymerization product. Preferred Composition: The block copolymer compound contains block having copolymer (less than 50 volume%). The block (A1) is hydrophilic, block (A2) is hydrophobic, and the copolymer is amphiphilic. Preferred Block: The block of the block copolymer compound is subjected to disulfide reduction and removal of block to provide thin film comprising nano-pores through and inner pore walls comprising thiol group. The thiol groups are coupled to a thiol-reactive component and a metal. Preferred Components: A fluid medium contains block copolymer compound such that the concentration is sufficient for micellar configuration. The micellar configuration is contacted with at least one of a stimulus chosen from temperature, an acid and a disulfide reducing agent, such that the stimulus is at least sufficient to disrupt micellar configuration. An aqueous medium comprises the block copolymer compound, and a hydrophobic component which is dispersed in micelle. Preferred Definitions:    R1,R'1,R2,R'2=substituted carboxyl group or phenyl, R1 is H or methyl, R2 is H, methyl, substituted carboxy group or block comprising plurality of acrylate monomer, and R'2 is optionally substituted phenyl or block comprising plurality of styrene monomer;    A1,A2=alkoxy carboxyalkyl, preferably ethyl carboxyisopropyl;and    X1,X2=bromide or block of repeating monomeric units.    R1 and R'1 comprise group exhibiting temperature-dependent reversible hydrophilic-hydrophobic characteristics such as N-isopropyl aminocarbonyl group, and R2 and R'2 comprise group exhibiting acid-sensitive hydrophobic-hydrophilic characteristics such as dihydropyran-protected hydroxy-substituted acrylate group.    EXAMPLE - Copper (I) bromide (26 mg), N,N,N',N',N"-pentamethyl diethylene triamine (0.36 mmol), 2-methyl-acrylic acid 2,5-dioxo-pyrrolidin-1-yl ester (1 g) and 2-bromo-2-methyl-propionic acid 2-(pyridin-2-yldisulfanyl)-ethyl ester (0.18 mmol) polymerized at 90 degrees C for 2 hours, filtered and dried at 45 degrees C for 5 hours to obtain polymer of formula (1a) in yield of 74%. The obtained polymer had number average molecular weight of 9940.