NOVELTY - Preparing light anode substrate of solar cell comprises: (a) utilizing a piece of common glass as the substrate; (b) printing a required metal grid pattern on the clean glass substrate with a metal slurry; (c) mixing analytically pure tin chloride (SnCl2), distilled water (H2O) and absolute ethyl alcohol; (d) fixing the substrate on a spin coater; and (e) repeating the film plating process 2-4 times, processing at 500 degrees C for 10-20 minutes, and finally obtaining a fluorine-doped tin oxide (FTO) conductive glass with metal grid.    USE - The method is useful for preparing light anode substrate of solar cell (claimed).    ADVANTAGE - The invention designs a metal grid under a conductive film of the light anode substrate so as to increase the transmission rate of electrons, effectively avoid charge complex and improve photoelectric conversion rate of the cell; therefore direct contact of the metal grid with electrolyte is avoided while effective utilization area of the light anode substrate is expanded.    DETAILED DESCRIPTION - Preparing light anode substrate of solar cell comprises: (a) utilizing a piece of common glass as the substrate, soaking it in distilled water, analytically pure acetone and aqueous solution in turn, then cleaning it in an ultrasonic cleaner for 15 minutes and then airing; (b) printing a required metal grid pattern on the clean glass substrate with a metal slurry, which involves the following printing parameters: inlet pressure of screen process press: 0.4-0.5 MPa; scraper pressure: 0.2-0.25 MPa; scraping plate pressure: 0.2-0.25 MPa; scraper angle: 70 degrees ; scraper pushdown amount: 0.5 mm; scraping plate travel speed setting: 10-50 mm/second; printing materials: metal electronic slurry excellent in electrical conductivity, such as gold, aluminum, copper, platinum, silver, indium, nickel, iron, and tin; screen specification of screen printing: 250-400 meshes; degassing temperature: 250-370 degrees C; heat preservation time for degassing: 10-30 minutes; sintering temperature: 450-580 degrees C; heat preservation time for sintering: 10-30 minutes; grid line resistance value: 0.05-1 omega; required metal grid pattern in printing and obtained metal grid have a thickness of 20 nm to 10 mu m and a width of 0.1-2.0 mm; (c) mixing analytically pure tin chloride (SnCl2), distilled water (H2O) and absolute ethyl alcohol in a proportion of 12/1/70, refluxing the admixture at 80 degrees C for 3-5 hours and then adding it with an admixture of water and alcohol in a volume ratio of 1/1, refluxing the admixture at 80 degrees C for 1-3 hours and adjusting the pH value to a number between 1.5 and 3, adding it with methanamide 0.2-1 mol/L and then with ammonium fluoride (NH4F) aqueous solution in a mol ratio of iron:tin is 1:1, laying the finished solution aside for latter use after 24 hours; (d) fixing the substrate on a spin coater, dropping the finished solution in (c) to it by a sol-gal process, plating it at 1400 rotations/minute and then drying it in a vacuum drying chamber at 100 degrees C for 15 minutes, then transferring it into a sintering furnace to be heated to 300-500 degrees C slowly, keeping its temperature constant for 10 minutes, then cooling it and taking it out; and (e) repeating the film plating process 2-4 times, processing at 500 degrees C for 10-20 minutes, and finally obtaining a fluorine-doped tin oxide (FTO) conductive glass with metal grid.    DESCRIPTION OF DRAWING(S) - The drawing shows a side view of the light anode substrate of solar cell.