TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The anode active material particles each have a multilayer configuration. The anode includes the anode active material including: a carbon material, lithium metal or a material which is capable of inserting and extracting lithium ions and includes metal elements or metalloid elements; and at least one of simple substance, alloys and compounds of silicon, or the simple substance, alloys and compounds of tin. The anode includes the anode active material layer on an anode current collector (22A), and the anode active material layer is formed by at least one of a vapor-phase method, a liquid-phase method and/or a firing method. The electrolytic solution includes: an electrolyte salt including at least one of lithium hexafluorophosphate, lithium tetrafluoroborate, lithium perchlorate or lithium hexafluoroarsenate, at least one of metal containing compounds of formula (8a), (9a) or (10a), or least one of lithium compounds of formula (LiN(CmF2m+1SO2)(CnF2n+1SO2)) (14a), (15a) or (LiC(CpF2p+1SO2)(CqF2q+1SO2)(CrF2r+1SO2)) (16a); a sultone; and an acid anhydride. (8a) is 4,4-difluoro-3,5-dioxa-boracyclopentane-1,2-dione lithium, 5,5-difluoro-1,4,6,9-tetraoxa-phosphaspiro(4.4)nonane-2,3,7,8-tetrone lithium, 4,4-difluoro-2,2-bis(trifluoromethyl)-3,5-dioxa-boracyclopentan-1-one lithium, 3,3,8,8-tetrakis(trifluoromethyl)-1,4,6,9-tetraoxa-boraspiro(4.4)nonane-2,7-dione lithium, 4,4,4,4-tetrafluoro-3,5-dioxa-phosphacyclopentane-1,2-dione lithium, or 1,4,6,9-tetraoxa-boraspiro(4.4)nonane-2,3,7,8-tetrone lithium. (9a) is 8,8-difluoro-1,4,6,10-tetraoxa-boraspiro(4.5)decane-2,3,7,9-tetrone lithium, 8,8-bis(trifluoromethyl)-1,4,6,9-tetraoxa-boraspiro(4.4)nonane-2,3,7-trione lithium, 8-(trifluoromethyl)-1,4,6,9-tetraoxa-boraspiro(4.4)nonane-2,3,7-trione lithium, 9,9-bis(trifluoromethyl)-1,4,6,10-tetraoxa-boraspiro(4.5)decane-2,3,7-trione lithium, 8-methyl-8-(trifluoromethyl)-1,4,6,9-tetraoxa-boraspiro(4.4)nonane-2,3,7-trione lithium, 7,7,8,8-tetrakis(trifluoromethyl)-1,4,6,9-tetraoxa-boraspiro(4.4)nonane-2,3-dione lithium, 9-methyl-9-(trifluoromethyl)-1,4,6,10-tetraoxa-boraspiro(4.5)decane-2,3,7-trione lithium or 9-(trifluoromethyl)-1,4,6,10-tetraoxa-boraspiro(4.5)decane-2,3,7-trione lithium. (10a) is 4-fluoro-4-(trifluoromethyl)-3,5-dioxa-boracyclopentane-1,2-dione lithium.X31, X51 = Group 1 element or Group 2 element in the long form of the periodic table of the elements, or Al;M31, M41, M51 = transition metal element, or Group 13 element, Group 14 element or Group 15 element in the long form of the periodic table of the elements;R31 = halo;Y31 = -(O=)C-R32-C(=O)-, -(O=)C-C(R33)2- or -(O=)C-C(=O)-;R32 = alkylene or arylene (both optionally halogenated);R33 = alkyl or aryl (both optionally halogenated);X41 = Group 1 element or Group 2 element in the long form of the periodic table of the elements;Y41 = -(O=)C-(C(R41)2)M-C(=O)-, -(R43)2C-(C(R42)2)c4-C(=O)-, -(R43)2C-(C(R42)2)c4-C(R43)2-, -(R43)2C-(C(R42)2)c4-S(=O)2-, -(O=)2S-(C(R42)2)d4-S(=O)2- or -(O=)C-(C(R42)2)d4-S(=O)2-;R41, R43, R51, R52 = H, alkyl (optionally halogenated) or halo, where at least one of them is halo or halogenated alkylR42 = H, alkyl (optionally halogenated) or halo;R1f = fluorinated 1-10C alkyl or fluorinated 1-10C aryl;Y51 = -(O=)C-(C(R51)2)d5-C(=O)-, -(R52)2C-(C(R51)2)d5-C(=O)-, -(R52)2C-(C(R51)2)d5-, -(R52)2C-(C(R51)2)d5-S(=O)2-, -(O=)2S-(C(R51)2)e5-S(=O)2- or -(O=)C-(C(R51)2)e5-S(=O)2-;a5, f5, n5, a4, e4, n4 = 1 or 2;b5, c5, e5, a3, b4, d4 = 1-4;d5, c4 = 0-4;g5, m5, c3, d3, m3, n3, f4, m4 = 1-3;b3 = 0, 2 or 4;m, n, p-r = 1 or more; andR61 = 2-4C perfluoroalkylene.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The oxide-containing film includes at least one oxide comprising oxides of silicon, oxide of germanium or oxides of tin. The oxide-containing film includes: a fluorine anion; or a compound of fluorine and Group 13 elements, Group 14 elements or Group 15 elements in the long form of the periodic table of the elements. The oxide-containing film is formed by a liquid-phase method. The oxide-containing film is formed by at least one of a liquid-phase deposition method, a sol-gel method or a dip coating method. The metal material is arranged in a gap between the anode active material particles. The metal element is iron, cobalt, nickel, zinc or copper. The metal material is formed by at least one of method comprising: a liquid-phase method; an electrolytic plating method; or an electroless plating method.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The content of (A) in the solvent is 0.01-10 wt.%. The solvent includes: at least one of a chain carbonate compound of formula (R12-C(R13)(R11)-O-C(=O)-O-C(R14)(R16)-R15) (3a) or a cyclic carbonate compound of formula (4a) (both including halo); or cyclic carbonate compounds of formula (5a), (6a) or (7a) (all having an unsaturated carbon bond). (3a) is fluoromethyl methyl carbonate, difluoromethyl methyl carbonate or bis(fluoromethyl) carbonate. (4a) is 4-fluoro-1,3-dioxolane-2-one or 4,5-difluoro-1,3-dioxolane-2-one. (5a) is vinylene carbonate. (6a) is vinyl ethylene carbonate. (7a) is methylene ethylene carbonate. (17a) is succinyl diisocyanate or pentanedioyl diisocyanate. (17a) is present at 0.01-5 wt.%.R11-R20 = H, halo or alkyl (optionally halogenated) alkyl group, where at least one of them is halo or halogenated alkyl;R21, R22 = H or alkyl;R23-R26 = H, alkyl, vinyl or allyl, where at least one of them is vinyl or allyl; andR27 = alkylene. Preferred Definitions:    R1 = 1-10C alkyl or aryl (both optionally halogenated);    R2 = 1-10C alkylene or arylene; and    z = 2 or 3.