TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The oxide is conductive oxide or nonconductive oxide. The conductive oxide is a binary conductive oxide or a ternary conductive oxide. The binary conductive oxide is ruthenium oxide (RuOx), palladium oxide (PdOx), iridium oxide (IrOx), platinum oxide (PtOx), osmium oxide (OsOx), rhodium oxide (RhOx), rhenium oxide (ReOx) or zinc oxide (ZnOx). The ternary conductive oxide is SrRuO3, In1-xSnxO3, NaxW1-xO3, Znx(Al,Mn)1-xO or La0.5Sr0.5CoO3. The nonconductive oxide is a binary nonconductive oxide or a ternary nonconductive oxide. The binary nonconductive oxide is aluminum oxide (AlOx), titanium oxide (TiOx), tantalum oxide (TaOx), hafnium oxide (HfOx), vanadium oxide (VOx), molybdenum oxide (MoOx), strontium oxide (SrOx), niobium oxide (NbOx), magnesium oxide (MgOx), silicon oxide (SiOx), iron oxide (FeOx), chromium oxide (CrOx), nickel oxide (NiOx), copper oxide (CuOx), or zirconium oxide (ZrOx). The ternary nonconductive oxide is silicon titanate (SiTiO3), barium titanate (BaTiO3), AlxTi1-xOy, HfSi1-xOy, HfAl1-xOy, TixSi1-xOy or LaTiO3.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The self-assembled monolayer is phenethyltrichlorosilane (PETCS), phenyltrichlorosilane (PTCS), benzyltrichlorosilane (BZTCS), tolyltrichlorosilane (TTCS), 2-((trimethoxysilyl)ethyl)-2-pyridine (PYRTMS), 4-biphenylyltrimethoxysilane (BPTMS), octadecyltrichlorosilane (OTS), 1-naphthyltrimethoxysilane (NAPTMS), 1-((trimethoxysilyl)methyl)naphthalene (MNATMS) or (9- methylanthracenyl)trimethoxysilane (MANTMS).    TECHNOLOGY FOCUS - POLYMERS - Preferred Method: A neutral layer is formed on the oxide substrate. Preferred Components: The neutral layer is an organic monolayer or a neutral layer formed using etching. The organic monolayer is self-assembled monolayer (SAM), a polymer brush or MAT. The polymer brush is polystyrene-random- poly(methyl methacrylate). The MAT is BCB-functionalized polystyrene-r-poly(methacrylate) copolymer (P(s-r-BCB-r-MMA)). The neutral layer functions to enable the self-assembled block copolymer nanostructure to grow vertically. The block copolymer has a structure in which polystyrene and a polymer other than polystyrene are covalently bonded to each other. The block copolymer is polystyrene-block-poly(methylmethacrylate), polystyreneblock-poly(ethylene oxide), polystyrene-block-poly(vinyl pyridine), polystyrene-block-poly(ethylene-alt-propylene) or polystyrene-block-polyisoprene. The composition ratio of polystyrene: polymer other than polystyrene is 0.70-0.65:0.30-0.35, 0.30-0.35:0.70-0.65, 0.82-0.77:0.18-0.23 or 0.18-0.23:0.82-0.77.