NOVELTY - The plasma enhanced chemical vapor deposition coating installation useful in the production of thin-layer silicon solar modules, comprises a chamber for processing a substrate (19) in the process chamber, and an electrode assembly (12) arranged within the process chamber for generating and maintaining a plasma in the process chamber. The electrode assembly comprises an arrangement of outlet openings for feeding process gas into the process chamber, and gas distribution elements (2) each of which includes a gas distribution system.    USE - The plasma enhanced chemical vapor deposition coating installation is useful in the production of thin-layer silicon solar modules.    ADVANTAGE - The coating installation can be easily assembled and economically produced with high stability, and deposits homogenous and uniform coating on the substrate.    DETAILED DESCRIPTION - The plasma enhanced chemical vapor deposition coating installation useful in the production of thin-layer silicon solar modules, comprises a chamber for processing a substrate (19) in the process chamber, and an electrode assembly (12) arranged within the process chamber for generating and maintaining a plasma in the process chamber. The electrode assembly comprises an arrangement of outlet openings for feeding process gas into the process chamber, and gas distribution elements (2) each of which includes a gas distribution system. The gas distribution elements comprise an inlet opening and an outlet opening. The gas distribution system is arranged between the inlet opening and the outlet opening for homogenously supplying process gas fed into the inlet opening to the outlet opening. The gas distribution element is formed as a flat panel, a cassette and/or a tile-shaped element. The electrode assembly comprises a conduct system having a feed opening and outlet openings to be connected to the inlet openings of the gas distribution elements, a branch-off arranged between the feed opening and the outlet openings of the conduct system, a frame for supporting the gas distribution elements at the electrode assembly, and an electrode plate (15). The flow resistance of the paths between the feed opening and the outlet ports of the conduct system is substantially the same. The conduct system comprises a pressure stage arranged in a path between the feed opening and the outlet ports of the conduct system. The gas distribution element comprises a gas distribution space between the inlet opening and the outlet openings such that there is substantially the same pressure at the outlet openings. The frame comprises gas openings arranged near the edge of the gas distribution system for supplying process gas into the process chamber and/or for removing process gas from the process chamber. The electrode plate is arranged on top of the gas distribution elements and faces a plasma generation and maintenance zone (P). An INDEPENDENT CLAIM is included for a method of producing an electrode assembly for a plasma enhanced chemical vapor deposition coating installation.    DESCRIPTION OF DRAWING(S) - The diagram shows a sectional view of electrode assembly.    Gas distribution elements (2)    Electrode assembly (12)    Separation plate (14)    Electrode plate (15)    Substrate. (19)