NOVELTY - An organo-metallic hybrid material comprises at least one organo-metallic compound comprised of at least one unsaturated double bond; and at least one cross-linking agent comprised of at least two unsaturated double bonds capable of cross-linking the organo-metallic compound to form the organo-metallic hybrid material.    USE - As photosensitive organo-metallic hybrid material for forming thin film which is useful for preparing functional structures, including but are not limited to an optical structure; a waveguide structure; a solar cell structure; a magnetic structure; a biochemical structure; a biomedical structure; an electrical, radiation, or insulation layer based on the properties of the metal used in cross-linked polymer backbone formed upon processing; or other structures which require a metal constituent. Also the thin film becomes a substrate layer for depositing an additional metal layer through an electro-deposition process; and is used as a light-absorbing layer in a solar cell (claimed).    ADVANTAGE - The organo-metallic hybrid material functions as structural material; and photoresist material, when the material comprises the photoactive compound. The material provides organo-metallic hybrid film which upon curing becomes chemically resistant to at least one of etchants: hydrochloric acid, hydrofluoric acid, nitric and concentrated sulfuric acid, CHF3, CF4 or SF6 gas, and other wet or dry etchants, while such a chemical stability is not observed using conventional resist formulations. In the photosensitive organo-metallic hybrid material, the index of refraction of the thin film is tunable by controlling the percentage of a constituent. The removal of the organic content from the patterned organo-metallic nanostructures substantially increases electrical conductivity of the patterned organo-metallic nanostructures.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following:    (1) a photosensitive organo-metallic hybrid material which functions as both a structural material and a photoresist material, comprising: the organo-metallic compound; the cross-linking agent; and a photoactive compound capable of absorbing exposure light during a photolithography process to form the photosensitive organo-metallic hybrid material;    (2) patterning (m1) organo-metallic nanostructures involving obtaining an organo-metallic hybrid material; forming a solution of the organo-metallic hybrid material; forming a thin film on a substrate using the solution of the organo-metallic hybrid material; and patterning organo-metallic nanostructures on the thin film; and    (3) performing (m2) photolithography involving obtaining a solution of a photosensitive organo-metallic hybrid material; forming a thin film on a substrate using the solution of the photosensitive organo-metallic hybrid material, where the thin film is photosensitive; exposing the thin film with an exposure light, thus printing patterns onto the thin film; and developing the exposed thin film to obtain patterned structures in the thin film, where patterning the thin film does not require using an additional photoresist layer or etching the thin film.