NOVELTY - The apparatus (100) has a process chamber (21) processing a target object e.g. substrate, in a vacuum. A load-lock chamber (11L) stores the target object in order to load the target object into the process chamber. Another load-lock chamber (11R) stores the target object in order to unload the processed target object from the process chamber. Two valved pipes (6a, 6b) connect the chamber (11L) to the load-lock chamber (11R). A connection port of one of the two valved pipes which is connected to the load-lock chamber (11L) is directed to a bottom surface of the load-lock chamber (11L).    USE - Vacuum processing apparatus for use in an electronic device (claimed) such as solar cell and display device e.g. LCD and plasma display, that is utilized in computer and in a wall- hanging TV for undergoing target object processing such as substrate processing i.e. semiconductor wafer processing. Can also be used for manufacturing a semiconductor device, an information storage medium such as hard disk, and a printed wiring board.    ADVANTAGE - The apparatus achieves a remarkable effect of shortening the time necessary for opening the substrate loading side load-lock chamber to the atmosphere and evacuating the substrate unloading side load-lock chamber, thus shortening the tact time in the substrate processing. The apparatus prevents the dust scattering in the substrate loading side load-lock chamber or substrate unloading side load-lock chamber as the connection port of one of the two valved pipes, which is connected to the load-lock chamber is directed to a bottom surface of the load-lock chamber, so that a high processing quality for the electronic device can be maintained.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a vacuum processing method using a vacuum processing apparatus.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic top view of an overall arrangement of a vacuum processing apparatus.    Valved pipes (6a, 6b)    Intermediate chamber (7)    Load-lock chambers (11L, 11R)    Process chambers (21-24)    Direction switching mechanism (80)    Vacuum processing apparatus (100)