NOVELTY - The apparatus has a substrate (6) conveying path (15) defined in a sputtering chamber (3) connected with an exhaust device. Cathodes (16a,16b) for holding targets (17a,17b) that are obliquely opposed toward the front and back in conveying direction of the substrate, respectively, are arranged to obliquely face the conveying path. Plate-like shields (19a,19b) are arranged facing the conveying direction of substrate, between the conveying path and the cathodes, such that an extended region ranging toward the conveying path is formed in space between the targets.    USE - Continuous sputtering apparatus for manufacture of solar battery and image display device (both claimed) such as LCD, plasma display, organic electroluminescent (EL) display etc. Can also be used in manufacture of magnetic device and optical component.    ADVANTAGE - Since the shields are arranged between substrate conveying path and cathodes such that an extended region is formed in space between the targets, particles causing degradation of the film quality can be adhered to the shields and so the collision of the particles with the substrate can be avoided. Thus, a high quality film can be deposited. The substrate and the targets are blocked from each other by the shields, and so the particles can be prevented from diffusing into the chamber through the space substrate and targets. Thus, the increase in maintenance time and cost due to adhesion of particles to chamber walls can be prevented, while defective film formation or defective etching in next process due to separation of adhered particles can also be prevented. Hence the quality of solar battery or image display device produced by the sputtering apparatus can be improved.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following:    (1) method of producing solar battery; and    (2) method of producing image display device.    DESCRIPTION OF DRAWING(S) - The drawing shows the schematic side sectional view of the sputtering apparatus.    Sputtering chamber (3)    Substrate (6)    Cathodes (16a,16b)    Targets (17a,17b)    Shields (19a,19b)