NOVELTY - The method comprises collecting the gas mixture, separating oxygen from the gas mixture in catalytic and/or absorptive manner, drying the remaining gas mixture, cryogenic purifying the remaining gas mixture in a rectification column and fluidically removing cleaned argon from the rectification column. The separation of oxygen is carried out either by adsorption or by catalytic reaction with hydrogen to water depending on oxygen content of gas mixture. The separated argon is used for precooling the gas stream entering into the cryogenic purification and evaporated in evaporation unit.    USE - The method is useful for recycling argon from furnace for producing mono- and/or polycrystalline silicon by melting silicon granules (claimed), and for the production of polycrystalline silicon wafers to manufacture photovoltaic cells and/or solar cells.    ADVANTAGE - The method ensures economical and efficient separation of the argon with less effort and high selectivity and purity at industrial scale, and prevents the contamination of the silicon.    DETAILED DESCRIPTION - The method comprises collecting the gas mixture, separating oxygen from the gas mixture in catalytic and/or absorptive manner, drying the remaining gas mixture, cryogenic purifying the remaining gas mixture in a rectification column and fluidically removing cleaned argon from the rectification column. The separation of oxygen is carried out by adsorption or by catalytic reaction with hydrogen to water depending on oxygen content of gas mixture. The separated argon is used for precooling the gas stream entering into the cryogenic purification and evaporated in evaporation unit. The oxygen content in the gas mixture is calculated by determination of temperature difference between inlet and outlet of the catalyst unit. The collection of gas mixture is carried out from a furnace operated under atmospheric conditions for melting silicon by a removal system working with low pressure, where the removal system is arranged below the normal furnace outlet and sucks a partial stream of the protecting gases. The collection of gas mixture is carried out from a furnace operated under vacuum for melting silicon by removing the exhaust stream of the vacuum pump and deoiling of the gas stream is carried out before introduction into the collecting tank (2), where the pumps (3) are oil-lubricated. An INDEPENDENT CLAIM is included for a device for recycling argon by separating and cleaning the argon from gas mixture.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic representation of a device for recycling argon by separating and cleaning the argon from gas mixture.    Crystal forming furnace (1)    Collecting tank (2)    Pump (3)    Control valve (4)    Temperature sensor. (6, 7)