NOVELTY - A lining coating material is coated on base material to form lining layer and N-type or P-type polycrystalline silicon film is formed on layer. Then, polycrystalline-silicon thin film is formed and diffraction grating is processed from back surface of base material. During grating electroconductive colloid is coated to form electroconductive layer, protective film is adhered and electrode is removed. The electroconductive layer is processed, transparent conductive film is printed and electrode terminal is removed. Thus, manufacture of photoelectric converter is carried out.    USE - Manufacture of photoelectric converter used for solar cell.    ADVANTAGE - The photoelectric converter having improved photoelectric conversion efficiency, is manufactured by safe and simple method with reduced energy consumption and without generation of environmental pollution.    DETAILED DESCRIPTION - A lining coating material which contains pure silicon nitride is coated on surface of base material which consists of predetermined-shaped metal material to form a coating layer, highly purified silane gas is decomposed on the surface of base material which is heated in vacuum, and N-type polycrystalline silicon film or P-type polycrystalline silicon film is formed on the surface of coating layer. Then, polycrystalline-silicon thin film is formed by chemical vapor deposition method and diffraction grating is processed by laser engraving from the back surface of base material. During diffraction grating, low-resistance electroconductive colloid is coated on base material, to form electroconductive layer. Then, corrosion-proof protective film is adhered to the back surface of base material and electrode is removed. The electroconductive layer is processed on the front surface of polycrystalline silicon film using laser, a transparent conductive film is printed and electrode terminal is removed using ultraviolet electroconductive colloid. Thus, manufacture of photoelectric converter is carried out.