TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The nanowire structure is a metal nanowire.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The 1,2-quinonediazide compound is at least one selected from 2,3,4-trihydroxylbenzophenone-1,2-naphthoquinone diazide-4-sulfonic acid ester, 2,3,4-trihydroxylbenzophenone-1,2-naphthoquinone diazide-5-sulfonic acid ester, 4,4'-(1-(4-(1-(4-hydroxylphenyl)-1-methylethyl)phenyl)ethylidene)bisphenol-1,2-naphthoquinone diazide-4-sulfonic acid ester and 4,4'-(1-(4-(1-(4-hydroxylphenyl)-1-methylethyl)phenyl)ethylidene)bisphenol-1,2-naphthoquinone diazide-5-sulfonic acid ester (preferably 4,4'-(1-(4-(1-(4-hydroxylphenyl)-1-methylethyl)phenyl)ethylidene)bisphenol-1,2-naphthoquinone diazide-4-sulfonic acid ester).    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: In the composition, the alkali-soluble polymer is formed through copolymerization of monomer (A1) (1-80 mass.%) and monomer (B1) (20-99 mass.%). The alkali-soluble polymer is formed through copolymerization of monomer (A1) (0.5-85, preferably 1-80) mass.%, monomer (b1) (1-80, preferably 5-30) mass.%, monomer (b2) (5-50, preferably 10-30) mass.%, and monomer (b3) (1-60, preferably 5-50) mass.%. Preferred Components: The other radical polymerizable monomer (B1) contains no radical polymerizable monomer having a carboxyl group. The other radical polymerizable monomer (B1) contains at least one selected from oxetanyl-containing radical polymerizable monomer (b1), oxyranyl-containing radical polymerizable monomer (b2) and hydroxyl group-containing radical polymerizable monomer (b3). The monomer (b1) contains at least one selected from (3-methyl-3-oxetanyl)methyl (meth)acrylate, (3-ethyl-3-oxetanyl)methyl (meth)acrylate, (3-methyl-3-oxetanyl)ethyl (meth)acrylate, (3-ethyl-3-oxetanyl)ethyl (meth)acrylate, (2-methyl-2-oxetanyl)methyl (meth)acrylate, (2-ethyl-2-oxetanyl)methyl (meth)acrylate, p-vinylphenyl-3-ethyloxetan-3-yl methyl ether, 2-phenyl-3-(meth)acryloxymethyloxetane, 2-trifluoromethyl-3-(meth)acryloxymethyloxetane and 4-trifluoromethyl-2-(meth)acryloxymethyloxetane. The monomer (b1) is monomers of formulae (III) and (IV). The oxetanyl-containing radical polymerizable monomer (III) contains at least one selected from (3-ethyl-3-oxetanyl)methylacrylate and (3-ethyl-3-oxetanyl)methyl methacrylate. The oxetanyl-containing radical polymerizable monomer (IV) contains at least one selected from (2-ethyl-2-oxetanyl)methylacrylate and (2-ethyl-2-oxetanyl)methyl methacrylate. The monomer (b2) contains at least one selected from glycidyl (meth)acrylate, methylglycidyl (meth)acrylate, alpha -ethylacrylic acid glycidyl ester and 3,4-epoxycyclohexyl (meth)acrylate. The monomer (b3) contains at least one selected from hydroxylmethyl (meth)acrylate, 2-hydroxylethyl (meth)acrylate, 2-hydroxylpropyl (meth)acrylate, 3-hydroxylpropyl (meth)acrylate and 4-hydroxylbutyl (meth)acrylate.R3=H or methyl;R4-R8=H, 1-5C alkyl, 2-5C alkenyl or 2-5C alkynyl. EXAMPLE - A positive-type photosensitive composition comprising (g): an alkali-soluble polymer (containing 2-butanone (200), KAYARAD TC-110S (RTM: 2-hydroxy-3-phenoxypropyl acrylate) (1), (3-ethyl-3-oxetanyl)methyl acrylate (19), glycidyl acrylate (30), 2-hydroxylethyl acrylate (50), and 2,2'-azobis(2,4-dimethylvaleronitrile) (2)) (10), 4,4'-(1-(4-(1-(4-hydroxylphenyl)-1-methylethyl)phenyl)ethylidene)bisphenol and 1,2-naphthoquinone diazide-5-sulfonic acid chloride (0.60), and MEGAFACK R-08 (RTM: a fluorine-containing surfactant) (0.006) was prepared. The composition showed the transparency of 92%, and conductivity of 11 Omega /square.