NOVELTY - The method comprises forming a multilayer stack including pairs of structural layers and sacrificial layers on a substrate (100) by thermal oxidation, epitaxial growth, chemical vapor deposition or sputtering, patterning the multilayer stack to fabricate a nanostructure (200), and releasing the nanostructure from the patterned multilayer stack by removing the sacrificial layer by wet etching. The formation of the multilayer stack on the substrate comprises alternatively depositing the structural layers and the sacrificial layers on the substrate.    USE - The method is useful for fabricating a nanostructure, which is useful for manufacturing small-sized structures such as textiles, solar cells and biosensors or nano-biosensors, where the nanostructure is nano-scaled structure such as nanoribbon, nanoline and nanotube.    ADVANTAGE - The method is capable of simply and efficiently fabricating the nanostructure with desired shape and size.    DETAILED DESCRIPTION - The method comprises forming a multilayer stack including pairs of structural layers and sacrificial layers on a substrate (100) by thermal oxidation, epitaxial growth, chemical vapor deposition or sputtering, patterning the multilayer stack to fabricate a nanostructure (200), and releasing the nanostructure from the patterned multilayer stack by removing the sacrificial layer by wet etching. The formation of the multilayer stack on the substrate comprises alternatively depositing the structural layers and the sacrificial layers on the substrate. The pairs are pasted such that the structural layers and the sacrificial layers are alternatively deposited to each other. The patterning step comprises transferring a pattern to the multilayer stack by using photolithography, nanoimprint or electron beam lithography, and etching the structural and sacrificial layers of the multilayer stack according to the transferred pattern. The structural layers have compositions different from each other.    DESCRIPTION OF DRAWING(S) - The diagram shows a side cross-sectional view of a substrate on which a patterned multilayer stack is formed.    Substrate (100)    Nanostructures (200)    Sacrificial structures. (210)