TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: Electrodepositing the first film involves delivering the first electrodeposition solution to the base; applying a first electrodeposition potential between an anode and the base to grow a first layer of the first film from the electrodeposition solution on the base, the molar amount of Cu in the first layer being higher than the molar amount of indium (In)+gallium (Ga); applying a second electrodeposition potential to grow a second layer of the first film from the electrodeposition solution on the first layer; the second layer comprising evenly distributed copper (Cu), In and Ga amounts, where the second electrodeposition potential is greater than the first electrodeposition potential; and applying a third electrodeposition potential to grow a third layer of the first film from the electrodeposition solution on the second layer; the molar amount of In+Ga in the third layer being higher than the molar amount of Cu, where the third electrodeposition potential is greater than the second electrodeposition potential.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The molar amount of copper in the first film is less than 20%. The second film comprises the copper-selenium alloy and the molar amount of copper in the second film is at least 60%. The first electrodeposition solution includes copper (0.005-0.5 mol/l), gallium (0.01-0.7 mol/l) and indium (0.01-0.7 mol/l). The first electrodeposition solution has a pH of 9-14. The second electroplating solution includes a Cu salt and a selenious acid. The second electrodeposition solution has a pH of 9-1. The first electrodepositing solution includes a complexing agent selected from organic complexing agents including amine and carboxylic groups. The second alloy film comprises a copper-selenium alloy and the molar amount of copper in the second alloy film is at least 60%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The complexing agents comprise at least one of citric acid, tartaric acid, ethylenediamine, triethanolamine, glycine, and ethylenediaminetetraacetic acid. EXAMPLE - No suitable example is given.