NOVELTY - Grid-shaped array electrode preparation involves laying a protective film on semiconductor crystalline silicon coated with an anti-reflection layer, where the semiconductor crystalline silicon has p-n junction. The surface of the semiconductor crystalline silicon is grooved with laser. The silicon semiconductor is cleaned with a surfactant and is activated in acid containing solution or hydroxide solution. The silicon semiconductor is activated with a regular electroplating power supply with a current density of 0.5-10A/sq.dm and a regular electroplating bath.    USE - Method for preparing grid-shaped array electrode used for preparing of solar cell combined plate (claimed).    ADVANTAGE - The grid-shaped array electrode preparing method is less time consuming, improves production efficiency by easily maintaining electroplating bath, and is cost-effective due to the use of cheaper and more available materials than those of common chemical plating and screen printing, and is easily operable, with an electrode wire uniformly connected with a base body with great binding force and low voltage.    DETAILED DESCRIPTION - Grid-shaped array electrode preparation involves laying a protective film on semiconductor crystalline silicon coated with an anti-reflection layer, where the semiconductor crystalline silicon has p-n junction. The surface of the semiconductor crystalline silicon is grooved with laser. The silicon semiconductor is cleaned with a surfactant and is activated in acid containing solution or hydroxide solution. The silicon semiconductor is activated with a regular electroplating power supply with a current density of 0.5-10A/sq.dm and a regular electroplating bath. The cathode of the power supply is connected to a pre-processed silicon semiconductor, and anode to an electro-conductive metal for power supplying, and then carrying out the electroplating with current density of 0.5-10 A/sq.dm. The electroplated semiconductor crystalline silicon is immerged in organic solvent and the protective film is removed from the electrode plate, semiconductor crystalline silicon is cleaned and dried the product of a silicon solar cell array electrode.