NOVELTY - The method comprises depositing a transparent conductive metal oxide layer (3) on a substrate (5) at low temperature of the substrate and subjecting a coating to a thermal treatment by a laser irradiation device or a thermal treatment in a high convection furnace or a double chamber furnace. The thermal treatment is carried out at ambient air in a flow process. Coupled lasers are used for the production of a laser line, where two coupled lasers form a laser illumination module that produces an illumination area. The single illumination area overlaps to a joint laser line.    USE - Method for producing a coated object useful for the production of thin layer solar cells.    ADVANTAGE - The method ensures simple and efficient production of a coated object with improved transparency and electrical conductivity.    DETAILED DESCRIPTION - The method comprises depositing a transparent conductive metal oxide layer (3) on a substrate (5) at low temperature of the substrate and subjecting a coating to a thermal treatment by a laser irradiation device or a thermal treatment in a high convection furnace or a double chamber furnace. The thermal treatment is carried out at ambient air in a flow process. Laser in the form of laser diode, neodymium-doped yttrium aluminum garnet laser, ytterbium-doped yttrium aluminum garnet laser, erbium-doped yttrium aluminum garnet laser, holmium-based yttrium aluminum garnet laser or carbon dioxide laser is used for producing laser radiation. Coupled lasers are used for the production of a laser line, where two coupled lasers form a laser illumination module that produces an illumination area. The single illumination area overlaps to a joint laser line or the single illumination area forms a joint laser line in strip or a laser forms a laser illumination module that produces an illumination area that forms a laser line through linear back- and forth movement of the laser illumination module vertical to movement direction of the substrate body. A diffusion barrier is arranged between the substrate and the conductive layer. An optical interference layer is arranged between the substrate and the conductive layer or the substrate and the diffusion barrier. The diffusion layer is formed as optical interference layer. The deposition of the transparent conductive layer is carried out through sputtering or through thermal evaporation or through electron beam evaporation or laser beam evaporation. The deposition of the transparent conductive layer is carried out through thermally active chemical gas phase deposition. The transparent conductive layer consists of part layers having monolayer. The deposition of the transparent conductive layer is carried out through plasma activating chemical or laser activating chemical gas phase deposition or through sol-gel process or printing process. The surface texture (3a) of the coating is adjusted through an etching process after the temperature treatment. The adjustment of the surface texture is carried through etching process in a continuous flow process. The deposition of the metal oxide layer on the substrate is carried out at a temperature of the substrate of 130 degrees C. INDEPENDENT CLAIMS are included for:    (1) a system for the production of a coated object; and    (2) a coated object.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic representation of a method for producing a coated object.    Box (1a)    Metal oxide layer (3)    Surface texture (3a)    Substrate (5)    End product. (500)