NOVELTY - The method comprises depositing a set of silicon doped and/or intrinsic nanoparticles on a silicon substrate (308) comprising a surface, densifying the set of silicon nanoparticles into a thin film, depositing an anti-reflective coating (304) on the substrate surface, illuminating the substrate surface with an illumination source, measuring a reflected contrast between the first set of regions and the second set of regions, and depositing a fluid on the first set of regions. The set of silicon nanoparticles comprises a set of ligand molecules comprising a set of carbon atoms.    USE - The method is useful for aligning a set of patterns on a silicon substrate.    ADVANTAGE - The method ensures efficient, accurate and easy alignment of set of patterns on the silicon substrate without misalignment thus effectively and economically producing the solar cells with enhanced efficiency, lower contact resistance and improved ohmic contact formation and without impacting the device performance.    DETAILED DESCRIPTION - The method comprises depositing a set of silicon doped and/or intrinsic nanoparticles on a silicon substrate (308) having a surface, densifying the set of silicon nanoparticles into a thin film, depositing an anti-reflective coating (304) on the substrate surface, illuminating the substrate surface with an illumination source, measuring a reflected contrast between the first set of regions and the second set of regions, and depositing a fluid on the first set of regions. The set of silicon nanoparticles comprises a set of ligand molecules comprising a set of carbon atoms. A first set of regions is formed where the nanoparticles are deposited, and has a first reflectivity value and a high dopant concentration. A second set of regions is formed where the nanoparticles are not deposited, and has a second reflectivity value and a low dopant concentration. A set of silicon-organic zones are formed on the substrate surface, and comprise a second set of silicon atoms and/or a set of silicon carbide atoms. The ratio of the second reflectivity value to the first reflectivity value is greater than 1.1. The illumination source has a wavelength of 470 nm or 540 nm. The substrate surface is a front surface and/or a back surface. The method further comprises illuminating the substrate surface having a first white illumination source with a first incident power of 50-400 mW/cm2 and at a first incident angle of 2-20 degrees from a substrate surface normal vector, illuminating the substrate surface having a second white illumination source with a second incident power of 50-400 mW/cm2 and at an second incident angle of 60-80 degrees from the substrate surface normal vector, and illuminating the substrate surface having a third white illumination source with a third incident power of 1 mW/cm2 and at an incident angle of 0-85 degrees from the substrate surface normal vector, after illuminating the substrate surface with the illumination source. The reflected contrast is measured by a diffuse light sensor with a lens axis. The illumination source is parallel to the lens axis. An INDEPENDENT CLAIM is included for an apparatus for aligning a set of patterns on a substrate.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic view of a front contact solar cell with a selective emitter and an additional layer acting as back surface field.    Anti-reflective coating (304)    Set of finger (305)    Emitter (306)    Silicon substrate (308)    Back surface field. (310)