NOVELTY - Coating a substrate comprises placing a loaded substrate carrier (60) into a preheat chamber, where loaded substrate carrier comprises electrodes having a set of radiofrequency (RF) electrodes (62) and a set of ground electrodes (64), and arranged parallel to each other in an order alternating between RF electrode and ground electrode; a carrier frame (70) for holding the electrodes, and defining a front opening (82) and a rear opening (80); and substrates held upon the electrodes.    USE - Method of coating a substrate useful for large batch production of thin photovoltaic modules or photovoltaic solar cell for renewable energy applications.    ADVANTAGE - The method efficiently forms photovoltaic modules. A given substrate carrier moves cyclically through pre-heat, active layer deposition, and cool-down chambers. Operations within these chambers are conducted in parallel. Thus, valuable reactor time (time spent in the deposition chamber) is not consumed in either heating up the substrates or cooling them down. Hence, the throughput of a given deposition chamber is increased.    DETAILED DESCRIPTION - Coating a substrate comprises:    (A) placing a loaded substrate carrier (60) into a preheat chamber, where loaded substrate carrier comprises electrodes having a set of RF electrodes (62) and a set of ground electrodes (64), and arranged parallel to each other in an order alternating between RF electrode and ground electrode; a carrier frame (70) for holding the electrodes, and defining a front opening (82) and a rear opening (80); and substrates held upon the electrodes;    (B) flowing hot air between the electrodes such that the substrates and electrodes are heated to a predetermined temperature range;    (C) placing the substrate carrier into a heated chamber of a vacuum plasma deposition system;    (D) providing gaseous reactants to the deposition system such that reactants are flowed between a portion(s) of the electrodes;    (E) providing power to the RF electrodes such that a coating is deposited on the substrates; and    (F) placing the substrate carrier into a cool down chamber to provide controlled and uniform cooling of the substrates.    INDEPENDENT CLAIMS are included for:    (1) an electrode system for holding substrates to be coated in plasma depositions system comprising electrodes, frame, rear door, and front door, where simultaneous positioning of the rear door in rear door open configuration and front door in front door open configuration allows a temperature-adjusting gas to flow between each electrode such that the temperature of the electrodes is adjusted to a predetermined temperature; and    (2) a plasma chemical vapor deposition (CVD) system.    DESCRIPTION OF DRAWING(S) - The drawing is a perspective view of a substrate carrier used in a photovoltaic module fabrication process in the open configuration.    Substrate carrier (60)    RF electrodes (62)    Ground electrodes (64)    Carrier frame (70)    Rear opening (80)    Front opening (82)