NOVELTY - P-type layer (11) is deposited on glass substrate in deposition chamber using silicon hydride, methane, boron hydride and hydrogen. I-type layer (12) is deposited on substrate using silicon hydride and hydrogen. N-type layer (11) is deposited using silicon hydride, phosphine and hydrogen. P-type layer (21) is deposited using silicon hydride, boron hydride and hydrogen. I-type layer (22) is deposited using silicon hydride and hydrogen. N-type layer (23) is deposited using silicon hydride, phosphine and hydrogen, and laminated silicon thin film solar cell is manufactured.    USE - Manufacture of laminated silicon thin film solar cell.    ADVANTAGE - The laminated silicon thin film solar cell is manufactured easily with high conversion efficiency, open circuit voltage characteristics and filling factor, and low light-induced degradation effect.    DETAILED DESCRIPTION - A transparent conductive glass substrate is provided in a sealed deposition chamber. P-type layer (11) is deposited on substrate by supplying silicon hydride, methane, boron hydride and hydrogen, stopping supply of silicon hydride, methane, boron hydride and hydrogen, and supplying silicon hydride. I-type layer (12) is deposited on substrate by supplying silicon hydride and hydrogen. N-type layer (11) is deposited on substrate by supplying silicon hydride, phosphine and hydrogen, stopping supply of silicon hydride and phosphine, when volume ratio of silicon hydride and hydrogen is more than 10%, and supplying silicon hydride, phosphine and hydrogen, when volume ratio of silicon hydride and hydrogen is more than 7%. P-type layer (21) is deposited on substrate by supplying silicon hydride, boron hydride and hydrogen with silicon hydride/hydrogen ratio of less than 7%. I-type layer (22) is deposited on substrate by supplying silicon hydride and hydrogen with silicon hydride/hydrogen ratio of less than 7%. N-type layer (23) is deposited on substrate by supplying silicon hydride, phosphine and hydrogen, and laminated silicon thin film solar cell is manufactured. Deposition is carried out by plate capacitance type plasma enhanced chemical vapor deposition system.    DESCRIPTION OF DRAWING(S) - The drawing shows the schematic view of laminated silicon thin film solar cell.    P-type layers (11,21)    I-type layers (12,22)    N-type layers (13,23)    Metal back electrode layer (31)