NOVELTY - Refining and purifying electronic silane in production process of polycrystalline silicon comprises: (a) infusing the rough silane produced in the production process of polycrystalline silicon into electronic silane refining system light component removing tower by silane compressor; (b) effusing the rough silane from the tower bottom, and entering into a first heavy component tower; (c) the adsorption tower enter into a second heavy component removing tower.    USE - The method is useful for refining and purifying electronic silane in production process of polycrystalline silicon (claimed).    ADVANTAGE - The method reduces the contents of nitrogen, methane and hydrogen to be below 1.5x1/1000000000 after refining and purifying; the contents of ethane, ethylsilane, diethylsilane, ethylene, ethylsilicane, boron and phosphorus are reduced to be below 3.5asterisk100000000, finally, the purify of the rough silane is improved to more than 99.9999999%, it satisfies the use requirement of electronic and semiconductor industries.    DETAILED DESCRIPTION - Refining and purifying electronic silane in production process of polycrystalline silicon comprises: (a) infusing the rough silane produced in the production process of polycrystalline silicon into electronic silane refining system light component removing tower by silane compressor, where the operation pressure of the tower is 1.8-2.5MPa, the top temperature is between -120 and -80 degrees C and the operation pressure difference is 0.5-5kPa, removing the nitrogen, methane and hydrogen on tower top; (b) effusing the rough silane from the tower bottom, and entering into a first heavy component tower, where the operation pressure of the tower is 1.8-2.5MPa, the top temperature is between -70 and -40 degrees C and the operation pressure difference is 5-15kPa, and then removing ethane, boron and phosphorus on tower kettle, discharging the silane from the first heavy component tower top; (c) making the silane discharged from the tower top enter into the three serially-connected adsorption towers, removing ethylene, where the operation pressure of each adsorption tower bottom is 1.6-2.3MPa and the operation pressure difference of each adsorption tower is 1-25kPa; and (d) making the silane discharged from the adsorption tower enter into a second heavy component removing tower, where the operation pressure of the tower is1.6-2.3MPa, top temperature is between -70 and -40 degrees C and the operation pressure difference is 1-5kPa, and then removing ethylsilicane, discharging the pure silane gas from the second heavy component tower top to enter into the storage tank for use by special pipeline.