NOVELTY - The semiconductor film made by process comprising formulating a dispersion of nanoparticles of the Ib, IIIa and VIa group of elements, depositing the dispersion onto a substrate (118) to form a layer (120) on the substrate, and reacting the layer in a suitable atmosphere (124) to form the compound film, is claimed. The nanoparticles are solid-particulates, and are doped with inorganic materials. The deposition of the dispersion includes dip coating, spin coating, web coating, doctor blade coating, cup coating, spray coating, printing, reverse microgravure, comma, and slot/die coating.    USE - The semiconductor film is useful as a light absorbing layer in a photonic device (claimed).    ADVANTAGE - The semiconductor film has good reproducibility and device performance and stability and improved overall yield, and can be economically and efficiently manufactured with high power conversion efficiency.    DETAILED DESCRIPTION - The semiconductor film made by process comprising formulating a dispersion of nanoparticles of the Ib, IIIa and VIa group of elements, depositing the dispersion onto a substrate (118) to form a layer (120) on the substrate, and reacting the layer in a suitable atmosphere (124) to form the compound film, is claimed. The nanoparticles are solid-particulates, and are doped with inorganic materials. The deposition of the dispersion includes dip coating, spin coating, web coating, doctor blade coating, cup coating, spray coating, printing, reverse microgravure, comma, slot/die coating and lip coating. The substrate is flexible, a plastic foil or a metallized plastic foil. The process further comprises disposing a contact layer (119) between the substrate and the film and comprised of a different metal than the substrate, and depositing a window layer on the semiconductor film. The reaction of the layer in the suitable atmosphere occurs during the annealing step.    DESCRIPTION OF DRAWING(S) - The diagram shows a cross-sectional schematic view of a formation of a compound film using the composition of matter.    Substrate (118)    Contact layer (119)    Layer (120)    Suitable atmosphere. (124)