NOVELTY - A surface (200) comprises a base layer(s) (210), which contains silicide-forming metal element(s); silicide coating layer(s) (221-224) formed by exposing the base layer having silicide-forming metal element to silicon source gas(es) having silicon element, reacting the silicide-forming metal element with the silicon element, and forming the silicide coating layer; and optionally blocking layer(s).    USE - The surface i.e. silicide-coated metal surface is for reactor for use in common chemical production methods and for a reaction vessel. It is useful for fluidized-bed reactors e.g. for processes for production/enrichment/distillation of granular polysilicon, preferably highly pure polycrystalline silicon (polysilicon) used as starting material for the fabrication of electronic components and solar cells; silicon deposition; silicon purification processes; and other conditions (e.g. Siemens process), environments, and/or reactions that may exhibit characteristics (e.g. thermal stability, reactive inertness, and corrosion resistance) that may be similar to characteristic(s) of the processes associated with purification of silicon. The fluidized-bed reactor is useful in chemical vapor deposition (CVD) (Siemens) process or in thermal decomposition process.    ADVANTAGE - An ability to operate, e.g. silicon-producing reactions at relatively high temperatures to achieve effective reaction rates is achieved. An ability to operate, e.g. silicon deposition reactions not only at relatively high temperatures to achieve effective deposition rates but also to operate in highly corrosive conditions due to, e.g. presence of chlorine component of a silicon source gas is realized. The surface provides inertly-coated metal reactor that meets The American Society of Mechanical Engineers code requirements and that is manufactured using safer and more cost effective materials and methods. The surface is designed to withstand continuous fluctuations in temperatures to which they are exposed to (e.g. from room temperature to 1200 degrees C and from 100 to 850 degrees C) without significant loss of their desirable anticorrosion and other properties. The metal silicide coating once formed will maintain its integrity during normal operation of fluidized bed reactor utilized in CVD (Siemens) process or in thermal decomposition process. Chemical reactions above 200, preferably 200-2000 degrees C can be conducted.    DESCRIPTION OF DRAWING(S) - The drawing is a schematic view of surface.    Surface (200)    Base layer (210)    Silicide coating (220)    Silicide coating layer (221-224)