TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic layer is on the organic layer. The inorganic layer comprises at least one species selected from metal oxide, metal nitride, metal carbide, metal oxide-nitride, and metal oxide-carbide. The inorganic layer is formed by a sputtering method. At least two organic layers and at least two inorganic layers are laminated alternately.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Device: The device has a gas barrier film as a substrate and the gas barrier film has the barrier laminate on a substrate film. The device sealed up with a gas barrier film having the barrier laminate on a substrate film. The device sealed up with the barrier laminate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The compound (I) is an acrylate compound or a methacrylate compound; and has at least two polymerizable groups. The polymerizable composition comprises compound (I) of 1-50 wt.%. The organic layer is formed by a flash vapor deposition method. The polymerizable composition comprises a polymerizable compound other than the compound (I). Preferred Definitions:    R2 and R3=alkyl, aryl or alkoxy.    In R1, the substituent containing an ethylenic double bond contains an acryloyl group, methacryloyl or vinyl group.    SPECIFIC COMPOUNDS - 13 Compounds are disclosed as (I) e.g. acrylic acid diethoxy-phosphorylmethyl ester (I'), allyl-phosphonic acid diethyl ester, 2-(diethoxy-phosphorylmethyl)-acrylic acid ethyl ester, 2-methyl-acrylic acid diethoxy-phosphorylmethyl ester, vinyl-phosphonic acid diethyl ester.    EXAMPLE - 3-Acryloyloxymethyl-3-ethyl-heptanoic acid vinyl ester and 3-acryloyloxymethyl-3-ethyl-heptanoic acid vinyl ester (DEMMP) were mixed at a weight ratio of 5:1, and IRGACURE907 (RTM: polymerization initiator) was added to prepare a polymerizable composition. The above polymerizable composition was prepared by using methyl ethyl ketone, so that a film having a dry film thickness of 500 nm is formed on a Teonex Q65FA (RTM: a substrate having a thickness of 100 mu m), and then cured through irradiation with UV rays at a dose of 0.5 J/cm2 in atmosphere having 100 parts per million (ppm) of oxygen, thereby producing the organic layer. Aluminum oxide was deposited on the surface of the formed organic layer according to a vacuum sputtering method (reactive sputtering) to form a layer having thickness of 30 nm, thereby producing a gas barrier film (test). A comparative gas barrier film was obtained in similar manner as test film, but without using DEMMP. The obtained gas barrier films were tested and evaluated for water vapor permeability and adhesiveness. The barrier property (after just formed); barrier property (over time); yellow over time and adhesiveness for test/comparative films, were found to be ( not greater than 0.005)/(more than 0.005 to not greater than 0.01); ( not greater than 0.005)/(more than 0.005 to not greater than 0.01); ( not less than 70%)/( not less than 50% to less than 70%); and (91-100%)/(0-10%), respectively.