NOVELTY - The linear motion system (LSM) is provided with a linear synchronous motor including carrier units (10a,10b) movable in relation to a stator. The stator is provided with number of coil units (30a,30b) having number of coils (5) and sensors (7). The carrier units are provided with a magnetic units including array of alternate-pole magnets having regular magnet pole-pitch. A train is formed by arranging the carrier units relative to each other so that the mutual distance between the two identical poled magnets is an integer multiple of the pole-pitch.    USE - Method of controlling linear motion system during wafer coating process such as chemical vapor deposition (CVD), physical vapor deposition (PVD), sputtering process, plasma enhanced CVD and semiconductor depositing process (all claimed) for use in manufacture of solar cell, chip or LED. Can also be used in logistics and transport system.    ADVANTAGE - The train can be moved as a single carrier unit due to the correct distance of the magnets of adjacent carrier units. The accuracy of the process actions that are performed on the products placed on the product carriers is improved, since the product carriers are moved without any contact with coil units. The space needed for the process chamber can be reduced and the track inside the chamber can be covered by the carrier units forming a train and thus can be protected from being coated. The train formation of carrier units is used for moving the carriers through a process station which deposits material at high temperature. The production cost is reduced and the machine footprint is reduced, by reducing the size of the oven. Less chemicals are needed, since the carrier units cover larger areas. Running the carriers in train formation allows for a spray-paint-type of processing required for next generation of hard disks. The spray-paint-way of processing is faster, as the carrier is moved through the process chamber at continuous speed and is processed during the movement. The spray-paint-way of process is done without requiring any buffers when the train formation is available.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following:    (1) apparatus for controlling LSM;    (2) computer program for controlling LSM; and    (3) computer program product storing program for controlling LSM.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the LMS with two carriers forming the train.    Coils (5)    Sensors (7)    Carrier units (10a,10b)    Coil units (30a,30b)    Area (40)