NOVELTY - The substrate carrier (1) comprises a glass substrate (2) receiving a conductive electrode, which is transparent in the visible and near infrared region. The electrode is constituted of a micro grid (4) made of conductive material having openings of submillimeter sizes and aperiodic, random distribution in one direction. The micro grid is contacted with a coating, which is slightly conductive and anti-reflective with respect to that of functional elements (7) with which it is contacted. The grid is made of a metal or metal alloy. The grid comprises a stack of thin layers (5).    USE - The substrate carrier is useful to constitute a solar cell with functional elements.    ADVANTAGE - The substrate carrier can be simply and economically manufactured with less number of components, is able to optimize the light transmission and reduces the absorption of light in the visible and near infrared region, and has sufficient intrinsic conductivity to minimize the constraints present on the antireflection layer.    DETAILED DESCRIPTION - The substrate carrier (1) comprises a glass substrate (2) receiving a conductive electrode, which is transparent in the visible and near infrared region. The electrode is constituted of a micro grid (4) made of conductive material having openings of submillimeter sizes and aperiodic, random distribution in one direction. The micro grid is contacted with a coating, which is slightly conductive and anti-reflective with respect to that of functional elements (7) with which it is contacted. The grid is made of a metal or metal alloy. The grid comprises a stack of thin layers (5) comprising a first metal layer, two coatings made of dielectric material located one below and other and above the first metal layer and a protective metal layer placed immediately over and contacted with the first metal layer. The anti-reflection coating is constituted of a stack of three thin layers made of dielectric material of which the refraction index of one of the layers is contacted with the substrate and with the functional element having refraction indices same as refraction indices of the other layer. The refraction indices of the stack of the three thin layers are alternately strong and weak. An antireflection layer is present on outer surface of the substrate. The resistivity of layers of the antireflective coating is 0.1-50 mohm cm. The metal grid is covered with an overblocking element. The layer at the interface of functional element and anti-reflecting layer is lightly (non) doped to adjust its work function in a material of the functional element. The layer is constituted of a transparent conductive oxide having a thickness of 5-10 nm. An INDEPENDENT CLAIM is included for a process for fabricating a substrate carrier.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic cross-sectional view of a solar cell.    Substrate carrier (1)    Glass substrate (2)    Collision element (3)    Conductive micro grid (4)    Stack of layers (5)    Functional elements. (7)