NOVELTY - The method comprises coating (22) a photoresist on a silicon wafer, using (23) a mask over the photoresist with UV exposure to develop a desired pattern in the photoresist, anisotropic etching (24) the silicon wafer with a dry plasma and/or a wet chemical to produce microchannels in the silicon wafer, aligning a silicon wafer substrate and/or a glass substrate over the microchannels in the silicon wafer, anodic bonding and/or fusion bonding the silicon wafer and the substrate, and coating (27) the microchannels with a catalyst or catalyst coating and/or a nanostructured material.    USE - The method is useful for producing a microreactor, which is useful in a microelectro-mechanical system for producing a thin-film miniature solid oxide fuel cell to convert the hydrocarbon fuel to hydrogen and other byproducts.    ADVANTAGE - The method is capable of economically and reliably producing the microreactor with high power density, less requirement of labor intensive manual assembly and high efficiency thus reducing the cost of integration, packaging and manufacturing of the fuel cell with reduced size.    DETAILED DESCRIPTION - The method comprises coating (22) a photoresist on a silicon wafer, using (23) a mask over the photoresist with UV exposure to develop a desired pattern in the photoresist, anisotropic etching (24) the silicon wafer with a dry plasma and/or a wet chemical to produce microchannels in the silicon wafer, aligning a silicon wafer substrate and/or a glass substrate over the microchannels in the silicon wafer, anodic bonding and/or fusion bonding the silicon wafer and the substrate, and coating (27) the microchannels with a catalyst or catalyst coating, a nanostructured material, an aerogel catalyst, a solgel catalyst, a zeolite catalyst, carbon nanotubes and/or a coating having a combination of support material, catalyst material, binding material and adhesive material in a liquid solution and a chemical mixture. The microchannels comprise sidewalls, and individual microchannels, each of which has an end, an inlet and an outlet. The step of coating the microchannels with the catalyst comprises applying the coating to the sidewalls, applying a liquid catalyst solution to the end of the microchannel, and closing the end of the microchannel. The silicon wafer has a basic shape and a basic size of the microreactor. The method further includes processing the silicon wafer to strip any remnants of the photoresist and clean surfaces of the silicon wafer after anisotropic etching of the silicon wafer. The liquid catalyst solution is wetted onto the microchannel by surface tension providing uniform coating of the microchannel through capillary forces and subsequently baking the microchannel and the liquid catalyst solution. The step of coating the microchannels with the catalyst further includes applying the liquid catalyst solution to the inlet and allowing the liquid catalyst solution to flow to the outlet, and drying the microchannel and the liquid catalyst solution.    DESCRIPTION OF DRAWING(S) - The diagram shows a flow chart of a catalyst system of a microreactor.    Providing a silicon wafer (21)    Coating a photoresist on the silicon wafer (22)    Using a mask over the photoresist with UV exposure (23)    Anisotropic etching the silicon wafer (24)    Coating the microchannels with a catalyst. (27)