TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The electrolyte salt is lithium hexafluorophosphate, lithium hexafluoroarsenate, lithium hexafluoroantimonate, lithium tetrafluoroborate, lithium perchlorate, lithium trifluoromethane sulfonate, lithium bistrifluoromethylsulfonyl imide, lithium bisperfluoroethylsulfonyl imide, lithium perfluorobutylsulfonyl, lithium tris(trifluoromethanesulfonyl) methanide, lithium tetraphenyl borate, lithium bis(oxalato)borate and/or lithium trifluoromethane sulfonyl trifluoromethyl carbonyl imide. The electrolyte salt has a concentration of 0.5-3 M.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic electrolyte solution comprises electrolyte additives comprising solid electrolyte interface (SEI) forming additives, cathode protecting agents, salt stabilizers, overcharge protecting additives, lithium depositing additives, salvation enhancers, corrosion inhibitors or wetting agents. The organic electrolytic solution comprises additional solvents comprising organic carbonates, ionic liquids, silanes or sulfones. The SEI forming additives are vinylene carbonate, vinyl ethylene carbonate, ethylene carbonate, allyl ethyl carbonate, vinyl acetate, divinyl adipate, acrylic acid nitrile, 2-vinyl pyridine, maleic anhydride, maleimides, methyl cinnamate, phosphonate, vinyl containing silane-based compounds, furan derivatives that contain two double bonds in each molecule, sulfur-based compounds comprising sulfur dioxide, polysulfide, cyclic alkyl sulfites or aryl sulfites, nitrates, nitrites, halogenated ethylene carbonate, halogenated lactone, methyl chloroformate, carboxyl phenol, aromatic esters, anhydrides, succinimide, N-benzyloxy carbonyloxy succinimide, aromatic isocyanates, borontrioxide, organic borates, boroxine compounds, lithium salt-based boron compounds, halogenated organic compounds, polydimethylsiloxane, silanes, tris(pentafluorophenyl)borane or alkali metal salts. The cathode protecting agents are amine-based organic bases e.g. butylamine, carbodiimide based compounds e.g. N,N-dicyclohexylcarbodiimide or N,N-diethylamino trimethylsilane. The salt stabilizers are lithium fluoride, Lewis bases comprising tris(2,2,2-trifluoroethyl) phosphate, amide-based compounds comprising 1-methyl-2-pyrrolidinone, fluorinated carbamate or hexamethyl-phosphoramide. The overcharge protecting additives are metallocenes, tetracyanoethylene, tetramethylphenylenediamine, dihydrophenazine derivatives bearing either 2-hydroxypropyl or ethyl substituents on both N atoms, substituted aromatic or heterocyclic compounds and their alkali metal salts, anisole-family compounds, 2,5-di-tert-butyl-1,4-dimethoxybenzene, monomethoxy benzene class compounds, hexaethyl benzene, bipyridyl or biphenyl carbonates, difluoroanisoles, sulfur or nitrogen containing heterocyclic aromatic compounds e.g. thianthrene and 2,7-diacetyl-thianthrene, phenothiazine based compounds, lithium fluorododecaborates, xylene, cyclohexylbenzene, biphenyl, 2,2-diphenylpropane, phenyl-tert-butyl carbonate, phenyl-R-phenyl compounds, 3-thiopheneacetonitrile, heterocyclic compounds comprising furan, thiophene, N-methylpyrrole, 3,4-ethylenedioxythiophene or lithium bis(oxalato)borate. The lithium depositing additives are sulfur dioxide compounds, polysulfide, water, 2-methyltetrahydrofuran, 2-methylthiophene, nitromethane, tetraalkylammonium chlorides with a long alkyl chain, cetyltrimethylammonium chlorides, lithium and tetraethylammonium salts of perfluorooctanesulfonate, perfluoropolyethers, nitrile sucrose, nitrile cellulose, aluminum iodide, tin iodide, hydrogen fluoride or fluoroethylene carbonate. The salvation enhancers include borate, borane or borole compounds. The corrosion inhibitors and wetting agents are lithium bis(oxalato)borate, lithium oxalyldifluoroborate, ionic and nonionic surfactants, cyclohexane, trialkyl phosphate, linear eaters with high molecular weight comprising methyl decanoate and dodecyl acetate, tertiary carboxylic acids or phosphorus pentoxide. EXAMPLE - No suitable example given.