TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: In the method of making a photovoltaic cell, exposing the semiconductor junction to the CdCl2 treatment is controlled such that one of a treatment temperature and a treatment exposure time causes one of: (i) the second light transmission characteristic to be 90% of the first light transmission characteristic of 600-800 nm of light wavelength; and (ii) the second sheet resistance to increase at greater than a linear rate from the first sheet resistance characteristic. The treatment temperature is 350-400 degrees C. The treatment exposure time is 15-60 minutes. Providing the superstrate layer includes providing the polymer as a polyimide material and casting the polyimide material onto a glass fixture. Providing the superstrate layer includes providing the polymer as a polyimide material as a free-standing sheet material. Depositing the TCO layer includes forming the TCO layer from one or more of zinc oxide (ZnO), zinc sulfide (ZnS), cadmium oxide (CdO), tin dioxide (SnO2):fluorine (F), indium (III) oxide (In2O3):tin (Sn) (ITO), and stannate (CdSn2O4). Forming the TCO layer includes forming an HRT layer, where the HRT layer is formed by introducing an inert gas stream with an oxygen content that reacts with a TCO precursor, the TCO precursor including one of a zinc (Zn), aluminum (Al), and oxygen (O) element, forming a resistance layer on either or both sides of the TCO and deposited in a manner sufficient to substantially limit degradation of the TCO layer to the extent that the electrical sheet resistance of the TCO layer is 5-8 ohms, and the transparency is greater than 85% of visible light. The semiconductor junction is deposited with a sputtering process. Producing a photovoltaic cell comprises providing a polymer film; providing a magnetron sputtering gun having an unbalanced field; bombarding the film by way of an RF sputtering technique using the magnetron gun, the RF sputtering technique including an argon gas stream including oxygen; applying layers that include at least one of a TCO, an HRT, a p type layer and an n-type layer; and applying a back contact layer. The polymer film is a polyimide film. Providing a polymer film is a step of providing a polyimide film configured as a superstrate film layer. Providing a polyimide film includes providing a polyimide film cast onto a glass fixture. Bombarding the film includes adding oxygen of 0.05-0.5%. Bombarding the film includes adding oxygen in an amount less than or equal to 1%. Providing the polymer film is providing a polyimide film and further includes the step of exposing the polyimide film to a CdCl2 treatment. The step of the CdCl2 treatment includes raising the temperature of the film to less than 400 degrees C and less than 40 minutes exposure time to the CdCl2 vapors. Providing a TCO layer is providing a ZnO layer doped with at least one of an aluminum material or an aluminum oxide material as the TCO layer and the step of providing the CdCl2 treatment includes treating the TCO layer such that the TCO increases an electrical resistance characteristic. Providing at least one of a TCO, an HRT, a p-type layer and an n-type layer includes providing a TCO/HRT bilayer.