NOVELTY - The apparatus has a holder installed in film production chamber (4), to hold to-be-processed substrate (2). The plasma of source gas is produced by shower head (5) at film production chamber, to supply source gas to holder. The radical formation chamber (8) is installed at opposite surface of holder with respect to shower head, to generate radical of process gas containing hydrogen. The openable and closable shutter (9) is provided between shower head and the radical formation chamber. The size of radical formation chamber is larger than that of holder.    USE - Plasma chemical vapor deposition (CVD) apparatus for forming microcrystal silicon film used in silicon thin film solar cell (claimed).    ADVANTAGE - The radical formation chamber is installed at opposite surface of substrate holder with respect to the shower head, to generate radical of process gas containing hydrogen. Hence the radical of process gas containing hydrogen is uniformly supplied to the microcrystal silicon thin film surface formed at the to-be-processed substrate, so that the passivation process can be performed uniformly with respect to the surface of microcrystal silicon film. The damage and the defect of microcrystal silicon film can be avoided. The residue of the silicon film at film production chamber can be removed effectively by performing cleaning process of plasma CVD apparatus. The cleaning process is performed without exerting damage to silicon film by an ion bombardment to the inner wall of film production chamber including the shower head. The electrical properties of silicon thin film solar cell can be increased effectively.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following:    (1) manufacturing method for semiconductor film;    (2) manufacturing method for thin film solar cell; and    (3) cleaning method for plasma CVD apparatus.    DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of the plasma CVD apparatus.    To-be-processed substrate (2)    Film production chamber (4)    Shower head (5)    Radical formation chamber (8)    Shutter (9)