NOVELTY - The method comprises providing a mold (12) having an elongate imprint forming surface having a first region (14a, 14b, 14c) and a second region (16a, 16b, 16c, 16d), forming the elongate imprint on a first substrate (22) by contacting the substrate with the mold, and contacting the mold to a second substrate (30) to form an imprint on the second substrate to transfer the metal coating on the second region to the formed imprint on the second substrate. The first region is dimensioned to have a greater surface area relative to the second region.    USE - The method is useful for forming an imprint on a substrate, which is useful in a fuel cell, surface plasmon spectroscopy, organic electronics, micro-electro-mechanical system/nano electromechanical systems, a microfluidic device or a plasmonic device (claimed), where the metal capped imprint is useful in the reflection of light in sensors, and in surface plasmon resonance.    ADVANTAGE - The method is capable of economically and rapidly forming the metal capped substrate imprint on the substrate without the use of a photomask or a rigid shadow mask, and avoids the need for additional equipment or processes.    DETAILED DESCRIPTION - The method comprises providing a mold (12) having an elongate imprint forming surface having a first region (14a, 14b, 14c) and a second region (16a, 16b, 16c, 16d), forming the elongate imprint on a first substrate (22) by contacting the substrate with the mold, and contacting the mold to a second substrate (30) to form an imprint on the second substrate to transfer the metal coating on the second region to the formed imprint on the second substrate. The first region is dimensioned to have a greater surface area relative to the second region. A metal coating is provided on the first and second regions. The imprint forming conditions are selected such that the part of the metal coating on the first region of the mold is transferred onto the formed imprint while the metal coating on the second region remains on the mold. The elongate imprint has a longitudinal axis, a proximal end that is proximal to the substrate, and a distal end that is opposite to the proximal end. The part of the metal coating is transferred from the first region of the mold deposited onto the sidewall disposed between the distal and proximal end of the imprint. An adhesive layer is provided on the substrate before the mold is contacted to the substrate. The first substrate and the second substrate is a thermoplastic polymer. The temperature is 20 degrees C above the glass transition temperature of the thermoplastic polymer during the contacting step. The pressure is 10-50 bars, and a time period of 5-120 minutes during the contacting steps. The metal layer is from a Group IB and/or Group IIIA of the periodic table of elements. The surface area of the first region on the imprint forming surface is 95% greater than the area of the second region. A layer of a silane-containing compound is the adhesive layer. INDEPENDENT CLAIMS are included for:    (1) an imprinted substrate;    (2) a sensor chip having a substrate body; and    (3) a surface plasmon resonance system.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic view of a method for selectively depositing a metal layer on a first substrate.    Silicon mold (12)    First regions (14a, 14b, 14c)    Second regions (16a, 16b, 16c, 16d)    First substrate (22)    Second substrate (30)    Surface coating. (32)