NOVELTY - Supercritical vapor deposition method involves increasing the pressure of a fluid to a supercritical phase such that the fluid becomes a supercritical solvent; dissolving a coating substance in the supercritical solvent to form solubility equilibrium supercritical solution; providing a substrate (134) on a heating base, which is immersed in the supercritical solution; and heating up the heating base to have the solubility equilibrium supercritical solution generate a precipitation driving force, so that coating substance is precipitated out and deposited on the substrate as a film.    USE - As supercritical vapor deposition method (claimed) useful for fabricating optoelectronic devices such as small molecule organic light-emitting diode device (OLED), or organic solar cells.    ADVANTAGE - The system enables to enhance, the film-forming speed and the raw-material utilization, in order to replace the current vacuum evaporation process. The system and method can be used in the deposition process of forming organic conductor layers and water-oxygen barrier layers of flexible light-emitting elements, where the fabricating processes are more consistent and the possibility of causing damage by water and oxygen will be minimized. Since the supercritical carbon dioxide solvent is a green solvent and has low critical temperature and pressure, the system is environmentally friendly and cost-effective. After the pressure of the solubility equilibrium supercritical solution is relieved, the carbon dioxide gas is separated from the OLED film and thus no residual solvent is remained on the film. The method uses the high pressure of the water-free and oxygen-free supercritical phase to replace the vacuum condition. Thus the problems caused by vacuum evaporation or organic vapor deposition (e.g. reduced brightness value, increased driving voltage, dark spots or a short-circuited problem) will be overcome. In comparison with the OLED film fabricated by the inkjet process or the spin coating process, the film forming quality fabricated by the system and method is enhanced. Since carbon dioxide is water-free and oxygen-free, the OLED film can be protected from being invaded. Since the supercritical carbon dioxide solvent is non-toxic and reusable, the system is very environmentally friendly.    DETAILED DESCRIPTION - A supercritical vapor deposition method involves:(a) providing a fluid; (b) increasing the pressure of the fluid to a supercritical phase such that the fluid becomes a supercritical solvent; (c) dissolving a coating substance in the supercritical solvent, thereby preparing a solubility equilibrium supercritical solution; (d) providing a substrate (134) on a heating base, which is immersed in the solubility equilibrium supercritical solution; and (e) heating up the heating base to have the solubility equilibrium supercritical solution generate a precipitation driving force, so that the coating substance is precipitated out and deposited on the substrate as a film. An INDEPENDENT CLAIM is included for a supercritical vapor deposition system (1) comprising: a pressure-enhancing unit (11) including a high pressure pump (111) for increasing the pressure of a fluid to a supercritical phase such that the fluid becomes a supercritical solvent; optionally a dissolving unit (12) including a dissolving tank (121) in communication with the pressure-enhancing unit for receiving the supercritical solvent from the pressure-enhancing unit, where a coating substance is dissolved in the supercritical solvent, thereby preparing a solubility equilibrium supercritical solution; and a film-forming unit (13) including a film-forming tank in communication with the dissolving unit for receiving the solubility equilibrium supercritical solution, a heating base (132) being mounted within the film-forming tank, a substrate being provided on the heating base, where the heating base is heated to have the solubility equilibrium supercritical solution generate a precipitation driving force, so that the coating substance is precipitated out and deposited on the substrate as a film.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic diagram of a supercritical vapor deposition system.    Supercritical vapor deposition system (1)    Pressure-enhancing unit (11)    Dissolving unit (12)    Film-forming unit (13)    Pressure-relieving unit (14)    High pressure pump (111)    Dissolving tank (121)    Heating base (132)    External heater (133)    Substrate (134)    Pressure-relieving separation tank (141)    Recovery device (142)