NOVELTY - The method comprises directing an electron beam (7) on deposited layer material in a heating zone (21) during coating, and coating the heating zone by a suitable beam deflection in section-wise manner so that the layer material is heated, where the heating zone lies within the coating zone (19), i.e. the zone of a substrate (13) in which the vaporous material is precipitated, and/or a neighboring zone are directly connected to the heating zone within the process opening (17). The coating is carried out on a moving substrate.    USE - The method useful for coating substrates by vacuum deposition to produce thin solar cell, where the substrate is architecture glass and strip-like material.    ADVANTAGE - The method is capable of efficiently, homogenously and economically coating the substrates with long-term stability, less energy consumption and high deposition rates, reduces thermal pretreatment of the substrate before coating, and allows the modification of the layer in defined-dimensions and depths.    DETAILED DESCRIPTION - The method comprises directing an electron beam (7) on deposited layer material in a heating zone (21) during coating, and coating the heating zone by a suitable beam deflection in section-wise manner so that the layer material is heated, where the heating zone lies within the coating zone (19), i.e. the zone of a substrate (13) in which the vaporous material is precipitated, and/or a neighboring zone are directly connected to the heating zone within the process opening (17). The coating is carried out on a moving substrate. The deflection of the electron beam is carried out in the heating zone such that the electron beam coats two lines lying transverse to the substrate transport direction, where the lines lie adjacent to each other so that the heating of the first line superimposes with the heating of the second line as a result of the substrate movement. The coating of the electron beam is repeated and number and sequence of the repetition are calculated with the layer growth so that the produced layer is heated in part layers. The speed of the electron beam with which it coats a line or a surface is calculated according to heat propagation in the layer. The electron beam is directed on the layer by a magnetic deflection system. The deposition is carried out by electron beam evaporation. The deflection system is used for an electron beam of the evaporation process and an electron beam of the heating process. The electron beam sources are operated at high voltage for evaporation on one side and for heating on otherside. Surface alloying of the layer materials is carried out by heating. Amorphous or microcrystalline layer is deposited and crystallized by heating or particle size enlargement process is carried out. The amorphous or micro crystalline layer comprises silicon. An INDEPENDENT CLAIM is included for a device for coating substrates by vacuum deposition.    DESCRIPTION OF DRAWING(S) - The diagram shows schematic representation of a device in a vacuum coating chamber for coating substrates by vacuum deposition.    Electron beam (7)    Substrate (13)    Process opening (17)    Coating zone (19)    Heating zone. (21)