TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The composition further comprises complexing agent (s). The organic solvent includes a compound from sulfones, lactones, tetrahydrofurans, and/or dibasic esters. It further includes a compound from tetramethylene sulfone, dimethyl sulfone, diethyl sulfone, bis(2-hydroxyethyl) sulfone, methyl sulfolane, ethyl sulfolane, delta -valerolactone, epsilon -caprolactone, alpha -acetylbutyrolactone, tetrahydro-2-furanmethanol, tetrahydro-2-furoic acid, 3-hydroxytetrahydrofuran, tetrahydro-2-furanamine, dimethyl succinate, dimethyl adipate, dimethyl glutarate, diisobutyl succinate, diisobutyl adipate, diisobutyl glutarate, ethyl carbonate, propyl carbonate, butyl carbonate, glycerol, ethyl-3-ethoxypropionate, and/or their derivatives, preferably dimethylsulfoxide or gamma -butyrolactone. The polymer dissolution accelerator comprises a 5-membered heterocyclic ring having member(s) of the ring being a nitrogen atom. It further accelerator comprises compound(s) of formulae (I)-(IV). The polymer dissolution accelerator comprises a compound from 1-(3-aminopropyl)-imidazole, imidazole, 1,2-hydroxyethylimidazole, histamine, hydantoin, 1,3-dimethyl-2 -imidazolidinone, N-methylpyrrolidinone, 1-ethyl-3 -methylimidazolium salt, and/or 1-ethyl-2,3 -dimethylimidazolium salt. The polymer dissolution accelerator comprises 1 -(3-aminopropyl)-imidazole and/or 1,2-hydroxyethylimidazole. The complexing agent comprises aminocarboxylic acids, organic acids or their derivatives, and/or phosphonic acids or their derivatives. It further comprises salicylic acid, 5-sulfosalicylic acid, 1-hydroxyethylidene-1, and/or 1-diphosphonic acid. The composition is devoid of amines, with the proviso that the polymer dissolution accelerators, and species including both a carboxylic acid group and an amine group are not considered amines. The composition is devoid of at least one of: abrasive material; oxidants; vinyl imidazole; antibacterial additives; copper; mannanase enzymes; fluorinated solvents; and/or catalysts having imine linkage(s). The composition further comprises polymeric material and/or other organic material. The rinsing solution further comprises corrosion inhibitor(s).R=H, 1-6C alkyl, 1-6C alcohols, 1-6C primary amines, 1-6C secondary amines or carbonyl groups.Preferred Method: The method further comprises rinsing the surface with a rinsing solution following contact with the composition, where the rinsing solution comprises water. EXAMPLE - A removal composition was prepared from (wt.%) dimethylsulfoxide (20-80), 1-(3-aminopropyl)-imidazole (1-20), and water (10-70).