NOVELTY - A semiconductor manufacturing equipment (1) has fluorine-gas generator (2), path (103) which guides main raw gas, apparatus having a process chamber (3), and elimination apparatus (4). The fluorine-gas generator generates by-product gas containing hydrogen gas as main component at the cathode side (22) while generating main raw gas containing fluorine gas as main component at the anode side (21) by electrolyzing hydrogen fluoride. A path (104a) guides the by-product gas emitted from the fluorine-gas generator to the elimination apparatus.    USE - Semiconductor manufacturing equipment.    ADVANTAGE - The semiconductor manufacturing equipment enables effective usage of by-product gas as combustion agent without discharging to the outside. Thus resource efficiency and energy efficiency are improved.    DETAILED DESCRIPTION - A semiconductor manufacturing equipment consists of a fluorine-gas generator, a path which guides the main raw gas containing fluorine-type gas emitted from the generator, an apparatus having a process chamber connected with the path and which processes the main raw gas, and an elimination apparatus which burns waste gas containing the fluorine-type gas exhausted from the apparatus containing the process chamber. The fluorine-gas generator generates by-product gas containing hydrogen gas as main component at the cathode side while generating main raw gas containing fluorine gas as main component at the anode side by electrolyzing hydrogen fluoride in the electrolytic bath (23) of molten salt containing hydrogen fluoride. A path guides the by-product gas emitted from the fluorine-gas generator to the elimination apparatus. The elimination apparatus is equipped with a mechanism which uses the by-product gas sent to the elimination apparatus as a combustion agent. An INDEPENDENT CLAIM is included for elimination method of by-product gas of fluorine-gas generator.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the semiconductor manufacturing equipment. (Drawing includes non-English language text)    Semiconductor manufacturing equipment (1)    Fluorine-gas generator (2)    Process chamber (3)    Elimination apparatus (4)    Anode side (21)    Cathode side (22)    Electrolytic bath (23)    Path which guides main raw gas (103)    Path for guiding by-product gas to elimination apparatus (104a)