TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of nitrogen atom with respect to all atoms in nitrogen-rich region is 0.1-1, preferably 0.1-0.5, measured by X-ray photoelectron spectroscopy. The content of nitrogen atom in nitrogen-rich region is 1-57 atomic% measured by X-ray photoelectron spectroscopy. The nitrogen-rich region is formed on surface of silicon-containing film. The laminate further has vapor deposition film on upper surface of silicon-containing film or between silicon-containing film and base material. The vapor deposition film contains oxide, nitride or oxynitride of metal chosen from silicon, tantalum, niobium, aluminum, indium, tungsten, tin, zinc, titanium, copper, cerium, calcium, sodium, boron, lead, magnesium, phosphorus, barium, germanium, lithium, potassium, zirconium and antimony. Preferred Properties: The silicon-containing film has refractive index of 1.55 or more. The nitrogen-rich region has thickness of 0.01-0.2 mu m. The vapor deposition film has thickness of 1-1000 nm. The silicon-containing film has thickness of 0.1 mu m at 40 degrees C and humidity of 90%, and water vapor permeability of 0.01 g/m2.day or less based on JIS K7129. Preferred Process: The energy ray irradiation is performed by plasma exposure or ultraviolet irradiation in vacuum under normal pressure using nitrogen gas, argon gas, helium gas and/or hydrogen gas as irradiation gas. The vapor deposition film is obtained by physical vapor deposition method or chemical vapor deposition method.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polysilazane film is perhydro polysilazane, organo polysilazane and/or their derivatives. The base material is resin film, optical component and/or gas-barrier film. The resin film contains polyolefin, cyclic olefin polymer, polyvinyl alcohol, ethylene-vinyl alcohol copolymer, polystyrene, polyester, polyamide, polycarbonate, polyvinyl chloride, polyvinylidene chloride, polyimide, polyether sulfone, polyacryl, polyarylate and/or triacetyl cellulose.