NOVELTY - Producing a transparent conducting film, where the film comprises a doped zinc oxide where the dopant comprises silicon (Si), comprises: (a) disposing a composition which is a liquid composition or a gel composition onto a substrate, where the composition comprises zinc (Zn) and Si; and (b) heating the substrate.    USE - The method is useful for producing transparent conducting film, where the film is useful for producing transparent conducting coating. The film and coating are useful for producing organic light-emitting device, electroluminescent device, solid-state light, photovoltaic device, solar cell, photodiode, transparent electronic device, electrode, display, touch panel, sensor, window, flooring material, mirror, lens, Bragg reflector, strain gauge or RFID tag, where the display is a liquid crystal display, an electroluminescent display, an electrochromic display, a flat panel display, a plasma display, electronic paper or a field emission display. The film and coating can further be used for producing polymer or glass (all claimed).    ADVANTAGE - The invention provides improved process for producing transparent conducting film of a silicon-doped zinc oxide, where the films have temperature-stable electrical and optical properties which are comparable to those of indium tin oxide (ITO). The process is easy to handle, inexpensive, suitable for industrial use, and can be used to produce large-area thin films of the transparent conducting oxide.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are:    (1) a transparent conducting film obtainable by the process; or a transparent conducting film, where the film comprises a doped zinc oxide where the dopant comprises Si, and where the film covers a surface area equal to or greater than 0.01 m2;    (2) a coated substrate, where the substrate comprises a surface, where the surface is coated with a transparent conducting film, where the film comprises a doped zinc oxide where the dopant comprises Si, and where the area of the surface which is coated with the film is equal to or greater than 0.01 m2;    (3) a transparent conducting coating which comprises the transparent conducting film;    (4) an organic light-emitting device, an electroluminescent device, a solid-state light, a photovoltaic device, a solar cell, a photodiode, a transparent electronic device, an electrode, a display, a touch panel, a sensor, a window, flooring material, a mirror, a lens, a Bragg reflector, a strain gauge or a radio-frequency identification (RFID) tag which comprises the transparent conducting coating or the transparent conducting film; and    (5) a polymer or glass which is coated with the transparent conducting coating or with the transparent conducting film.