NOVELTY - The method for depositing a transparent conductive layer on a substrate (2) inside a vacuum chamber (1), where the transparent conductive layer has a host material and a doping material, comprises introducing oxygen and a precursor into the vacuum chamber using physical vapor deposition process during the deposition of the host material, and forming the concentration of the doping material in layer thickness progression with a gradient. The doping material comprises oxide of one of the metallic or semi-metallic element made of main groups III or IV.    USE - Method for depositing a transparent conductive layer on a substrate inside a vacuum chamber, where the transparent conductive layer is useful in many technical apparatuses such as flat display screens, thin layer solar cells, electronic paper and mobile apparatuses with video display unit input functions.    ADVANTAGE - The method ensures economical and easy deposition of the conductive layer on the substrate with less effort, less resistivity and high electrical conductivity.    DETAILED DESCRIPTION - The method for depositing a transparent conductive layer on a substrate (2) inside a vacuum chamber (1), where the transparent conductive layer has a host material and a doping material, comprises introducing oxygen and a precursor into the vacuum chamber using physical vapor deposition process during the deposition of the host material, and forming the concentration of the doping material in layer thickness progression with a gradient. The doping material comprises oxide of one of the metallic or semi-metallic element made of main groups III or IV. The precursor contains an element made of the main group III or IV. The gradient is formed, in which the inflow quantity of the precursor into the vacuum chamber and/or the deposition rate of the host material are changed in a time-dependent manner. The concentration gradient of the doping material is formed in the layer thickness progression with two maxima, which are formed with an interval of maximum 150 nm. The substrate is coated in a stationary state and/or in a movable state. An INDEPENDENT CLAIM is included for a transparent conductive layer.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of a device for depositing a transparent conductive layer on a substrate inside a vacuum chamber.    Vacuum chamber (1)    Substrate (2)    Inlet (3)    Magnetrons (4)    Zinc target. (5)