NOVELTY - A linear plasma system comprises troughs of a 1st electrode alternating with peaks of the 1st electrode forming a saw-tooth shape, where troughs have a 1st array of holes at a trough apex and peaks have a 2nd array of holes at a peak apex, reactive gas feed disposed on the 1st electrode and configured to continuously release reactive gas into 1st array of holes, precursor gas feed disposed on the 1st electrode and configured to continuously release precursor gas into 2nd array of holes, and power source configured to apply radio frequency power to the 1st electrode.    USE - A linear system for semiconductors, displays, solar cell, glass coating, and flexible substrate coating.    ADVANTAGE - Linear plasma system may operate for periods of time without stopping, making process substantially continuous, stable plasma is formed, and there is little to no deposition on the electrode, so the electrode does not need to be cleaned.    DETAILED DESCRIPTION - A linear plasma system comprises troughs of a 1st electrode alternating with peaks of the 1st electrode forming a saw-tooth shape, where troughs have a 1st array of holes at a trough apex and peaks have a 2nd array of holes at a peak apex, reactive gas feed disposed on the 1st electrode and configured to continuously release reactive gas into 1st array of holes, precursor gas feed disposed on the 1st electrode and configured to continuously release precursor gas into 2nd array of holes, and power source configured to apply radio frequency power to the 1st electrode to interact with 1st portion of reactive gas mixed with 1st portion of precursor gas to generate plasma and produce a product of activated precursor and reactive gas in the gap caused by an interaction between plasma, 2nd portion of precursor gas, and 2nd portion of reactive gas, where substrate deposits the product of activated precursor and reactive gas as substrate passes underneath the 1st electrode. An INDEPENDENT CLAIM is included for substrate processing method using linear plasma system.    DESCRIPTION OF DRAWING(S) - The drawing shows a portion of an electrode in a linear plasma system.    Electrode wall (202)    Trough hole 1 (204)    Peak hole (206)    Trough hole 2 (208)