NOVELTY - The unit solar cell has an active layer (130) that is formed on a bottom electrode (120). An interlayer (140) is formed on the active layer (130). An active layer (150) is formed on the interlayer. An top electrode (160) is provided on the active layer (150). The active area (AA) of the unit solar cell includes a portion where the interlayer is formed, and another portion where the interlayer is not formed.    USE - Thin film solar cell.    ADVANTAGE - Since the interlayer is formed by the sputtering and chemical vapor deposition process, the need for separate patterning process is eliminated, hence the manufacturing process of the thin film solar cell is simplified and the manufacturing cost of the thin film solar cell is reduced. The light absorbing efficiency can be improved. The efficiency of the thin film solar cell is improved.    DETAILED DESCRIPTION - The interlayer comprises the discrete openings that are formed in the active area of the unit solar cell. The non-active area (DA) of the unit solar cell includes the scribe lines penetrating the bottom and top electrodes, active layers and interlayer in perpendicular direction. The interlayer is formed in a shape of islands. The interlayer includes a selective light transmission material that transmits light of specific wavelength range and reflects light of different wavelength range. The active layers absorb light of different wavelength ranges. A specific active layer made of doped amorphous silicon is formed between the active layers (130,150) and interlayer. An INDEPENDENT CLAIM is included for method for manufacturing thin film solar cell, which involves forming a bottom electrode on a substrate. The interlayer in the active area of the unit solar cell is patterned using a laser. The bottom electrode provided in the non-active area is patterned after the bottom electrode is provided. The interlayer and the active layers (130,150) formed in the non-active area are patterned, after the formation of interlayer and active layers. The patterning of the interlayer formed in the active area is performed during the patterning of the interlayer and the active layer (130) formed in the non-active area. The interlayer is formed by the sputtering and chemical vapor deposition process.    DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view illustrating the manufacturing process of the thin film solar cell.    Bottom electrode (120)    Active layers (130,150)    Interlayer (140)    Top electrode (160)    Active area (AA)    Non-active area (DA)