NOVELTY - A coating liquid for transparent conductive film formation containing organometallic compound as main component is coated on a substrate (2) and dried to form a dry coating film (3). An energy beam is irradiated to heat the dry coating film in order to form inorganic membrane containing metal oxide, and a transparent conductive film is formed. The energy beam irradiation is performed by heating the coating film to 300 degrees C or less in oxygen containing atmosphere having dew point of -10 degrees C or less.    USE - Manufacture of transparent conductive film for element such as thin film transistor, transparent electroconductive substrate used as transparent electrode for devices e.g. light emitting device, electric power generation device, display device and input device (all claimed), electroluminescent element, field emission lamp, solar cell, liquid crystal element, electroluminescent display, plasma display, electronic paper element, input device e.g. touch panel.    ADVANTAGE - The transparent conductive film having excellent transparency and high electroconductivity is manufactured economically by a simple process. The transparent electroconductive substrate has excellent heat resistance and strength.    DETAILED DESCRIPTION - A coating liquid for transparent conductive film formation containing organometallic compound as main component is coated on a substrate and dried to form a dry coating film. An energy beam is irradiated to heat the dry coating film in order to form inorganic membrane containing metal oxide, and a transparent conductive film is formed. The energy beam irradiation is performed by heating the coating film to 300 degrees C or less in oxygen containing atmosphere having dew point of -10 degrees C or less. An electroconductive oxide fine particle layer is formed by removing the organic component in the dry coating film and filling with electroconductive oxide fine particles. The organic component is removed by decomposition and/or combustion. The organo metallic compound is organic indium compound, organic tin compound and/or organo zinc compound. The metal oxide is indium oxide, tin oxide and/or zinc oxide.    DESCRIPTION OF DRAWING(S) - The drawing shows the schematic view of the heating-energy beam irradiation process. (Drawing includes non-English language text)    Heating apparatus (1)    Substrate (2)    Dry coating film (3)    Energy beam irradiation lamp (4)    Ultraviolet irradiation window (5)