TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The element of group VIA is selenium or sulfur. The metal organic precursors containing selenium or sulfur include dimethyl selenide, dimethyl diselenide, or diethyl diselenide. The precursors include Cu(I) compounds, Cu(II) compounds, CuCl, copper iodide, or other copper halides, copper diketonates, Cu(II)-2,2,6,6-tetramethyl-3,5-heptanedionate (Cu(thd)2)), Cu (II) 2,4-pentanedionate, Cu(II) hexafluoroacetylacetonate (Cu(hfac)2), Cu(II) acetylacetonate (Cu(acac)2), Cu(II) dimethylaminoethoxide, copper ketoesters, organocopper precursors containing Si or Ge, and/or organocopper precursors; indium chloride, indium iodide, indium halides, dimethylindium chloride, trimethylindium, indium 2,4-pentanedionate (indium acetylacetonate), indium hexafluoropentanedionate, indium methoxyethoxide, indium methly(trimethylacetyl)acetate, indium trifluoropentanedionate, organoindium precursors containing Si or Ge, and/or organoindium precursors; diethylgallium chloride, gallium triiodide, gallium halides, Ga (III) 2,4-pentanedionate, Ga (III) ethoxide, Ga(III) 2,2,6,6-tetramethylheptanedionate, tris(dimethylaminogallium), gallium (I) salts, gallium chloride, gallium fluoride, gallium iodide, gallium acetate, gallium (I)-based organometallic precursors, organogallium precursors containing Si or Ge, and/or organogallium precursors; aluminum chloride, aluminum iodide, or other halides, dimethylaluminum chloride, aluminum butoxides, aluminum di-s-butoxide ethylacetoacetate, aluminum diisopropoxide ethylacetoacetate, aluminum ethoxide, aluminum isopropoxide, aluminum hexafluoropentanedionate, Al(III) 2,4,-pentanedionate, Al(III)2,2,6,6-tetramethyl-3,5-heptanedionate, aluminum trifluoroacetate, trisisobutylaluminum, aluminum silicate, organoaluminum or organometallic precursors containing Si or Ge, organoaluminum and/or organometallic precursors. The method further involves after exposing the substrate to organometallic precursors of copper, indium, and/or gallium, and/or aluminum, and/or selenium, and/or sulfur, exposing the substrate to reducing agents or proton-donor compounds. The reducing agents or proton donor compounds include water, hydrogen peroxide, methanol, ethanol, isopropyl alcohol, butyl alcohols, alcohols, carbon monoxide, Oxygen gas, and/or formalin.