NOVELTY - Delivering, condensing and curing materials within a deposition chamber comprises: condensing material from a gas phase into a liquid phase on a target surface within the deposition chamber; and solidifying the liquid phase of the material into a solid phase within the deposition chamber using a plasma (580).    USE - The method is useful for delivering, condensing and curing materials within a deposition chamber, which is useful for condensing a material from gas phase into a solid layer, and forming a smoothing layer and barrier coating on the target within the deposition chamber, where the target surface or the component comprises features of a glass, metal foil, plastic substrate, plastic substrate with barrier, optoelectronic device, organic LED, LCD, photovoltaic device, integrated circuit, sensor, electrochromic device or medical diagnostic device (all claimed). The method is also useful for producing an organic and/or inorganic material-based barrier coating to organic electronics and optoelectronic applications e.g. organic LEDs and solar cells.    ADVANTAGE - The method: maintains and improves barrier performance over severe surface topology while potentially lowering tact time and increasing throughput; provides physical flexibility, fine control over material being utilized and three dimensional curing by using plasma curing; and facilitates efficient preparation of both robust smoothing layer and the barrier coating on a substrate within the deposition chamber by saving equipment cost and reducing tact time and particle contamination.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for:    (1) a system comprising: a deposition chamber; an inlet system capable of supplying organic material as a vapor and an inert gas in the deposition chamber; a condensation control system capable of controlling condensation of the organic material into a liquid phase on a target surface within the deposition chamber; and a solidification feature capable of initiating curing and/or crosslinking of the liquid phase of the organic material into a solid phase within the deposition chamber;    (2) a method of condensing a material from gas phase into a solid layer within the deposition chamber comprising: flowing a precursor vapor (552) into a deposition chamber via a heated inlet system, where the precursor vapor comprises a material in a gas phase and an inert gas; condensing the material into a stable liquid phase on a target surface of a component positioned on an electrode within the deposition chamber; and solidifying the stable liquid phase of the material disposed on the target surface into a solid layer within the deposition chamber; and    (3) a method of forming a smoothing layer and barrier coating on the target within the deposition chamber comprising: condensing the material into a liquid phase on the target within the deposition chamber; solidifying the liquid phase of the material disposed on the target within the deposition chamber to form the smoothing layer; and forming a barrier coating on the target within the deposition chamber.    DESCRIPTION OF DRAWING(S) - The figure illustrates a series of conceptual cross-sectional views of a system, substrate and depositional components.    Precursor vapor (552)    Substrate (554)    Precursor inlet (558)    Precursor layer (562)    Plasma (580)