NOVELTY - The method for producing an optically transparent glass pane, comprises applying an optically transparent, electrically conductive layer (3) to a portion of the surface of a glass substrate (2) and generating an anti-reflection layer (1) on the non-coated surface of the glass substrate, in which a solution of an acid and/or base is applied to the surface of the glass substrate. The anti-reflection layer is produced in which the glass substrate containing the electrically conductive layer is immersed in the solution of acid and/or base.    USE - Method for producing an optically transparent glass pane useful in solar module, screens, vehicle glazing and/or construction glazing (claimed).    ADVANTAGE - The method ensures simple and economical production of an optically transparent glass pane with good scratch resistance.    DETAILED DESCRIPTION - The method for producing an optically transparent glass pane, comprises applying an optically transparent, electrically conductive layer (3) to a portion of the surface of a glass substrate (2) and generating an anti-reflection layer (1) on the non-coated surface of the glass substrate, in which a solution of an acid and/or base is applied to the surface of the glass substrate. The anti-reflection layer is produced in which the glass substrate containing the electrically conductive layer is immersed in the solution of acid and/or base and/or the solution of acid and/or base is sprayed on the surface of the glass substrate. The electrically conductive layer is applied through chemical vapor deposition, chemical liquid deposition, physical vapor deposition, spraying process, pyrolysis process, sputtering, magnetron sputtering, sol-gel-process, ion beam process, electron beam process and/or gas phase deposition. The electrically conductive layer has a sheet resistance of less than 10 Omega , a turbidity of less than 5% and/or a surface roughness of 5-20 nm after producing the anti-reflection layer and is applied with a layer thickness of 400-800 nm. The anti-reflection layer is produced with a thickness of 50-200 nm and the electrically conductive layer has a cover layer. The glass substrate is pre-stressed after producing the anti-reflection layer. The electrically conductive layer is produced through the application of tin-doped indium oxide, aluminum-doped zinc oxide, fluorine-doped tin oxide, antimony-doped tin oxide, silver, gold, tin, tungsten, copper, silicon, carbon nanotubes and/or optically transparent, electrically conductive polymer. An INDEPENDENT CLAIM is included for an optically transparent glass pane.    DESCRIPTION OF DRAWING(S) - The diagram shows a cross-sectional view of an optically transparent glass pane.    Anti-reflection layer (1)    Glass substrate (2)    Optically transparent electrically conductive layer. (3)