NOVELTY - A high transmittivity nano-sized silicon dioxide antireflection film comprises nano-sized silicon dioxide as substrate material, and resin comprising polyurethane resin and acrylic acid resin as film-forming agents. The substrates comprises common optical glass, indium tin oxide (ITO) glass and aluminum oxide glass; and dip-coating method or spin-coating method used for coating of this antireflection film.    USE - High transmittivity nano-sized silicon dioxide antireflection film used for manufacturing titanium dioxide (TiO2) film, solar cell glass plate, flat-panel display and optical lens (claimed).    ADVANTAGE - The film is non-toxic and convenient for long-time storage, and has stable chemical properties, simple manufacturing process and simple operations; and utilizes low cost and are easy to be obtained. In a reaction process, three industrial wastes do not exist basically; and is green, environment-friendly and efficient, less power consumption and is suitable for industrial production.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacturing antireflection film comprising weighing absolute ethyl alcohol and ethyl orthosilicate (TEOS), controlling concentration of ethyl orthosilicate to 0.1-2 M, heating at room temperature to 100 degrees C, and magnetically stirring; weighing deionized water, adding strong ammonia water to control concentration of ammonia water solution to 0.1-1 mol/L, dropwise adding strong ammonia water to mixed solution of ethanol and ethyl orthosilicate, and continuously stirring for 1-12 hours; mixing colloidal solutions with solid content of 0.5-20% with film-forming agent with solid content of 0.5-20% at volume ratio of 1-9:1, using glass as substrate, employing dip-coating method or spin-coating method to manufacture his film with 1-5 layer; and placing coated glass sheet at oven to be baked for 30 minutes at 120 degrees C, and placing coated glass sheet at muffle furnace for 4-60 minutes at 200-600 degrees C.