NOVELTY - System comprises: process chamber comprising first vapor source station to deposit one of group VIA material and group IA material, and second vapor source station to deposit other of group VIA material and group IA material onto surface of precursor layer and to form dopant structure on processed portions of continuous flexible workpiece; moving assembly to hold and move the continuous flexible workpiece within and through process chamber; and support assembly that supports by contacting backside of portion of workpiece that is disposed within process chamber.    USE - The system is useful for: forming a dopant structure on a frontside of a continuous flexible workpiece (claimed); fabricating solar cells; and forming high quality precursor layers which are processed into dense films useful in a variety of industries and applications including manufacture of photovoltaic devices and solar cells.    DETAILED DESCRIPTION - System for forming a dopant structure on a frontside of a continuous flexible workpiece, where the front side comprises a precursor layer and the dopant structure provides a dopant material that subsequently dopes a solar cell absorber formed by a reaction of the precursor layer and the dopant structure, comprises: a process chamber comprising a first vapor source station to deposit one of a group VIA material and group IA material, and a second vapor source station to deposit the other of the group VIA material and the group IA material onto the surface of the precursor layer and to form the dopant structure on processed portions of the continuous flexible workpiece, where the processed portions of the continuous flexible workpiece provide a protective top surface for the underlying precursor layer; a moving assembly to hold and move the continuous flexible workpiece within and through the process chamber, comprising a portion of the continuous flexible workpiece disposed within and being processed by the first and second vapor source stations, by feeding previously unrolled portions of the continuous flexible workpiece from an input end of the process chamber and taking up and wrapping the processed portions of the continuous flexible workpiece at an output end of the process chamber, where the protective top surface contacts the portions of a backside of the continuous flexible workpiece as the processed portions of the continuous flexible workpiece are wrapped, thus protecting the precursor layer below it; and a support assembly that supports by contacting the backside of the portion of the continuous flexible workpiece that is disposed within the process chamber, where the support assembly comprises components that remove the heat from the backside of the portion of the continuous flexible workpiece that is disposed within the process chamber and prevent any reaction from occurring on the processed portions of the continuous flexible workpiece and thus avoids formation of the absorber. INDEPENDENT CLAIMS are also included for:    (1) forming a dopant structure on a frontside of a continuous flexible workpiece using the system, comprising: (a) moving the continuous workpiece into and through the process chamber and over the vapor source stations using the moving assembly by feeding previously unrolled portions of the continuous flexible workpiece from an input end of the process chamber so that a portion of the continuous flexible workpiece is disposed within the first and second vapor source stations; (b) forming a dopant structure on the frontside of the continuous workpiece on the portion of the continuous flexible workpiece disposed within the process chamber to obtain a processed portion, where the processed portion of the continuous flexible workpiece provides a protective top surface for the precursor layer disposed below it, and the dopant structure comprises a first material layer formed by depositing one of a group VIA material and a group IA material from a first vapor source station and a second material layer that is different from the first material layer that is formed by depositing the other of the group VIA material and the group IA material from a second vapor source station; (c) supporting a backside of the continuous workpiece using the support assembly to cool and tension the portion of the continuous flexible workpiece disposed within the process chamber while forming the dopant structure; and (d) taking up and wrapping the processed portion of the continuous flexible workpiece at an output end of the process chamber, where the protective top surface contacts a backside of the continuous flexible workpiece as the processed portion of the continuous flexible workpiece is wrapped, thus protecting the precursor layer below it; and    (2) forming a dopant structure on a frontside of a continuous flexible workpiece using the system, comprising: step (a) as above per se; co-depositing one of a group VIA material and a group IA material from first vapor source station and the other of the group VIA material and the group IA material from second vapor source station to form, as a single layer, a processed portion as the dopant structure on a portion of the frontside of the continuous flexible workpiece disposed within the process chamber, where the layer comprises both the group VIA material and the group IA material, and the processed portion provides a protective top surface for the precursor layer disposed below it; and steps (c) and (d) as above per se.