TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Substrate: The substrate is single crystal silicon, polycrystalline silicon, amorphous silicon, silicon carbide, germanium, silicon-germanium, gallium arsenide, gallium-aluminum, indium gallium arsenide, indium phosphide, indium antimonide, copper indium selenide, copper indium gallium selenide, indium tin oxide, cadmium telluride, cadmium sulfide, zinc oxide, copper aluminum oxide, tin oxide, gallium nitride, aluminum nitride, zirconium oxide, hafnium oxide, tantalum oxide, aluminum oxide, titanium oxide, chromium oxide, their silicates, silicon oxide, silicon nitride or sapphire.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The organic compound having nitrogen-fluorine bonding has structural unit of formula (I), and is chosen from compounds of formulae (A1)-(A3).adjacent R1+R2, R2+R3, R3+R4 or R4+R5=-(CR6=CR7-CR8=CR9)-;or adjacent R1'+R2', R2'+R3', R3'+R4' or R4'+R5'=-(CR6'=CR7'-CR8'=CR9')-;R1-R9,R1'-R9'=H, halo, nitro, OH, cyano, carbamoyl, 1-15C alkyl (optionally substituted by halo, OH, 1-5C alkoxy, 6-10C aryloxy, 1-5C acyl, 1-5C acyloxy or 6-10C aryl), 1-15C alkenyl, 1-15C alkynyl, 2-15C alkoxy carbonyl, 1-15C alkyl sulfinyl, 1-15C alkoxy, 1-15C alkane sulfonyloxy, (all optionally substituted by halo or 6-10C aryl), 6-15C aryl, 7-15C aryloxy carbonyl, 6-15C arylsulfonyl, 6-15C arylsulfinyl, 6-15C aryloxy, 6-15C aryl sulfonyloxy (all optionally substituted by halo or 1-5C alkyl), 1-15C acyl, 1-15C acyloxy, 1-15C acylthio (all optionally substituted by halo), carbamoyl optionally substituted by 1-5C alkyl or 6-10C aryl, amino optionally substituted by halo or 1-5C acyl, 6-15C-N-alkyl pyridinium or 11-15C N-aryl pyridinium (both optionally substituted by halo, 6-10C aryl or 1-5C alkyl), or organic polymer chain;or R1-R9, R1'-R9'=ring structure without passing through heteroatom or single bond;andX-,X'-=conjugate base of Broensted acid, preferably perfluoroalkane sulfonate or tetrafluoroborate.The thin film further contains ionic liquid.