TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The coating device is JCP560 vacuum magnetron sputtering coating machine, where the sputtering target is formed by copper target (99.99at%) and copper target on zirconium sheet (99.9at%), and regulating content of zirconium film by varying the number of zirconium film. The substrate is monocrystalline silicon and sputtering of sheet is without heating. Preferred Method: The copper/copper-zirconium alloy film/silicon monocrystalline silicon composite membrane based system is by direct current magnetic-control sputtering different components of copper-zirconium alloy film. The sputtering process comprises: (i) vacuumizing in a vacuum chamber with 5x 104 vacuum degree; (ii) using high purity argon gas (99.9999 vol.%), where the vacuum chamber pressure is 0.3 Pa, reverse sputtering and cleaning the monocrystalline silicon sheet with 100 W reverse sputtering power for 15 minutes; (iii) pre-sputtering the composite target for 30 minutes, sputtering and depositing the alloy film on the monocrystalline silicon substrate and depositing a layer of pure copper film to obtain a copper/copper-zirconium alloy film/monocrystalline silicon composite structure. The step of quenching the composite membrane is to promote interdiffusion of alloy film copper atoms and silicon atoms of silicon substrate, growing the V shape copper-silicon compound on silicon substrate surface. The surface of the V-shaped groove structure is etched with an alkali solution, and repeating alkali solution etching, where the alkali solution for etching comprises sodium hydroxide or potassium hydroxide, water and isopropanol mixture, and in the absence of etching, the V-shaped groove form is a pyramid structure. The surface of the V-shaped groove structure is obtained by magnetron sputtering, vapor deposition, sol-gel or gel method, and deposition of variety of elemental metals, alloy, compound film or nano-materials on the silicon substrate of V-shaped groove to obtain monocrystalline silicon based composite material.