TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: The hydrophilic polymer has a free acid content of less than or equal to 1.0 meq/g of polymer. The hydrophilic polymer has a free acid content of equal to or less than 0.2 meq/g of polymer. Hydrophilic polymer satisfies both of the following tests: (a) it is soluble to at least 1% by weight in a solution containing at least 50 wt.% water as measured at 40 degrees C; and (b) it provides an inhibition power of at least 200 A to deposition of zinc oxide by an atomic layer deposition (ALD) process. Deposition inhibitor material is a hydrophilic polymer that is a neutralized acid having a pKa of 5 or less, where at least 90% of the acid groups are neutralized. A given area of the substrate is exposed to a gas flow in an elongated opening for less than 100 milliseconds. Preferred Components: The deposition inhibitor material is a hydrophilic polymer that has in its backbone, side chains, or both backbone and side chains, multiple secondary or tertiary amide groups that are represented by the following acetamide structure: -N-C(=O)-. Deposition inhibitor material is a hydrophilic poly(vinyl alcohol) having a degree of hydrolysis of less than 95%. Hydrophilic polymer has a degree of hydrolysis of less than 90%. Hydrophilic polymer has a degree of hydrolysis of at least 50% and less than 85%. At least some of the acetamide groups are recurring and form at least part of the hydrophilic polymer backbone through the nitrogen atom. At least some of the acetamide groups are on side chains of the hydrophilic polymer and are represented by the following structure: -N(R)-C(=O)-R', where R is hydrogen or an alkyl, cycloalkyl, or aryl group, and R' is an alkyl, cycloalkyl, or aryl group. Preferably, R is hydrogen or a substituted or unsubstituted alkyl having 1 to 4 carbon atoms and R' is a substituted or unsubstituted alkyl group having 1 to 3 carbon atoms. The hydrophilic polymer is poly( vinyl pyrrolidone), poly(N-vinyl acetamide), or poly(2-ethyl-2-oxazoline), or a mixture of two or more of these polymers. Hydrophilic polymer comprises neutralized carboxy, sulfo, phospho, sulfuric, or phosphinic acid groups. The hydrophilic polymer comprises neutralized carboxy or sulfo groups. Hydrophilic polymer comprises recurring units having neutralized carboxy, sulfo, phospho, sulfuric, or phosphinic acid groups that are pendant to the polymer backbone. Hydrophilic polymer is a neutralized homopolymer or copolymer derived from (meth)acrylic acid or styrenesulfonic acid. Deposition inhibitor material is a hydrophilic polymer that has in its backbone, side chains, or both backbone and side chains, multiple hydrophilic groups that are represented by the following structure: -C-O-C-. At least some of the hydrophilic groups are ether groups that are recurring and form at least part of the hydrophilic polymer backbone. At least some of hydrophilic groups are on side chains of the hydrophilic polymer and are represented by the following structure: -(O)x-(alkylene-O)- where alkylene is substituted or unsubstituted and has 1 to 4 carbon atoms and x is 0 or 1, preferably x is 0 and the ether groups are repeating on the side chains and alkylene has 1 to 3 carbon atoms. The hydrophilic polymer is poly(methyl vinyl ether), poly(ethylene glycol), poly(propylene glycol), a glycerol propoxylate, or a mixture of two or more of these polymers. The inorganic thin film is deposited on the substrate by atomic layer deposition. The inorganic thin film is either metal or metal-containing compound, where the metal-containing compound contains a group V or group VI anion, or it is an oxide, nitride, sulfide, or phosphide, or its combination. Inorganic thin film contains zinc, aluminum, hafnium, zirconium, or indium, or any combination of these metals. Inorganic thin film contains copper, tungsten, aluminum, nickel, ruthenium, or rhodium. Preferred Method: Step (a) is depositing a uniform layer or pattern of the composition comprising the deposition inhibitor material by inkjet printing, gravure, flexography, donor transfer, micro-contact printing, or offset lithography. EXAMPLE - No suitable example given.