NOVELTY - The apparatus comprises process gap (50) formed with rotary element (6) and rotary element separation/connection elements (1,2). The to-be-processed object is introduced into process gap by to-be-processed object introduction structures (8-10) connected with process gap and introduced to-be-processed object. The chemical and physical process of to-be-processed liquid is performed under the rotation of rotary element. The processed liquid is derived from process gap via to-be-processed object derivation structure (17) after chemical and physical process.    USE - Closed chemical and physical processing apparatus e.g. microreactor used in semiconductor field. Can also be used in high concentration compoundable synthesizing apparatus, Beckman transfer reaction apparatus, particle surface treatment apparatus, microcapsulation apparatus of micro-particle and nanoparticle, highly efficient emulsification apparatus, pharmaceutical production apparatus of drug delivery system, pulverization apparatus, mixing apparatus, creation-of-particles apparatus, and used for producing organic pigment and catalyst for fuel cell, electrode material for secondary battery.    ADVANTAGE - Mixing and thermal control of to-be-processed objects can be performed instantaneously and stably. The chemical and physical process can be performed stably in high speed reaction rate area.    DETAILED DESCRIPTION - The to-be-processed object derivation structure derives the to-be-processed liquid for to-be-processed object introduction structure which introduces to-be-processed object in process gap. The to-be-processed object flows in the process gap according to the centrifugal force derived by rotation of rotary element, or confronting the centrifugal force. The disc shaped rotary element has circular outer diameter portion without opening. The rotary element inclines with respect to the generation plane of centrifugal force. The process gap inside partial discharge mechanism, discharges the accumulated material which retains in the process gap outside. The process gap extended zone expands the gap distance of the process gap partially to portion of rotary elements that touch the process gap, or rotary element separation/connection elements. The to-be-processed object derivation structure derives the to-be-processed object through anchoring time expansion structure provided continuously in the process gap. A noncontact rotation provision structure rotates the rotation element. A temperature control structure in rotary element separation/connection element, controls the temperature of process gap. A separation/connection element reinforcement element reinforces the rotary element opposition separation/connection element. An INDEPENDENT CLAIM is included for chemical and physical processing method which involves supporting the catalyst on the surface of rotary element separation/connection element or rotary element, and performing chemical and physical process of to-be-processed object by catalyst in process gap. The chemical and physical processes are performed in respective partial limited areas of process gap one by one. The centrifugal force produced by rotation of the rotary element is utilized, and to-be-processed object is centrifuged. The ratio of product of maximum circumferential speed of rotary element and process gap dimension and dynamic viscosity of to-be-processed object, is set in the range of 200-2000.    DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the chemical and physical processing apparatus.    Rotary element separation/connection elements (1,2)    Rotary element (6)    To-be-processed object introduction structures (8-10)    To-be-processed object derivation structure (17)    Process gap (50)