TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The sum of the wt.% of components (a1)-(d1) totals 100 wt.%. The glass frit is lead oxide (40-60 wt.% or 44-65 wt.%), lead difluoride (5-15 wt.%), fluorine (0.5-2.5 wt.%), silicon dioxide (10-30 wt.%), aluminum oxide (0.1-5 wt.%), titanium dioxide (2-8 wt.%), bismuth oxide (0.3-10 wt.%) or boron trioxide (4-10 wt.%). The silver paste comprises inorganic components (58-95 wt.%) and organic vehicle (5-42 wt.%).    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Process: The printing in step (b) is screen printing. The front-side electrode takes the form of a grid pattern which comprises thin parallel finger lines and two or more parallel busbars intersecting the finger lines at right angle. EXAMPLE - Thick multicrystalline non-textured silicon wafer (area 243 cm2, p-type (boron) bulk silicon, with an n-type diffused phosphoryl chloride emitter, silicon nitride antireflective coating layer on the wafer's emitter applied by chemical vapor deposition) was provided. The average surface roughness of the wafer was 0.1172 mu m. On its back surface the wafer was provided with aluminum electrode (30 mu m thick) and two wide busbars (5 mm) and overlapping with the aluminum film for 1 mm at both edges to ensure electrical continuity. On the front face of the wafer front-side silver paste (prepared by mixing and roll-milling the silver powder (82.8 wt.%, average particle size 1.8 mu m), organic vehicle (organic polymeric resins and organic solvents (12 wt.%)), glass frit (1.5 wt.%) and zinc oxide (3.7 wt.%)), was screen-printed and dried in H pattern (two 1.5 mm wide and 25 mu m thick busbars at the edges of the wafer connected by 100 mu m wide and 20 mu m thick parallel finger lines having a distance of 2.2 mm between each other). All metal pastes were dried before cofiring. The printed and dried wafers were fired in Centrotherm 4-zone infrared furnace, to give front-side electrode of a silicon solar cell.