TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first gas further comprises: silicon or germanium; hydrogen, halogen or alkyl group; or boron, carbon, sulfur or phosphorus. The second gas comprises silicon or germanium. The second gas further comprises hydrogen or fluorine. The fluorine-containing ambient includes a fluorine-containing gas or a fluorine-containing liquid. The transparent conductive material comprises a transparent conductive oxide. The transparent conductive oxide comprises a transparent metal oxide, or tin, zinc or indium. The photovoltaic material is an intrinsic semiconductor. The n-type layer and p-type layer are formed from a gas phase precursor comprising silicon. The back reflector comprises a metal oxide or a metal. In the method of forming a photovoltaic module, each of the many photovoltaic devices includes a photovoltaic material comprising silicon, preferably amorphous silicon. The photovoltaic material further comprises fluorine. Each of the photovoltaic devices further comprises a transparent conductive material, which is formed at a temperature of at least 250 degrees C.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: The method of forming a photovoltaic device further comprises: forming negative (n)-type layer (45), which is disposed between the photovoltaic material and the transparent conductive material; forming a positive (p)-type layer (55), which is disposed between the photovoltaic material and the transparent conductive material; providing a substrate, where the photovoltaic material is formed over the substrate; forming a back reflector, which is disposed between the substrate and the photovoltaic material; patterning the back reflector (20) to form many electrically isolated regions of the back reflector; patterning the transparent conductive material to form many electrically isolated regions of the transparent conductive material, where the electrically isolated regions of the transparent conductive material defines many photovoltaic devices, and each of the photovoltaic devices includes an electrically isolated region of the back reflector, the photovoltaic material and an electrically isolated region of the transparent conductive material; connecting two or more of the photovoltaic devices in series; patterning the photovoltaic material to form many electrically isolated regions of the photovoltaic material, where the electrically isolated regions of the photovoltaic material defines many electrically isolated photovoltaic devices, and each of the electrically isolated photovoltaic devices includes an electrically isolated region of the back reflector, an electrically isolated region of the photovoltaic material and an electrically isolated region of the transparent conductive material; and connecting the electrically isolated photovoltaic devices in series. The step of connecting includes laser welding, or masking and etching. The step of forming photovoltaic material comprises: depositing the photovoltaic material from first gas comprising fluorine; exposing the photovoltaic material to a fluorine-containing ambient; and forming the photovoltaic material in a plasma process, which is plasma-enhanced chemical vapor deposition. The step of forming photovoltaic material further comprises depositing the photovoltaic material from a second gas. The fluorine-containing ambient is heated to a temperature of above room temperature. The transparent conductive material is formed: after the photovoltaic material; and at a temperature of at least 250 degrees C, preferably 500 degrees C. The transparent conductive material directly contacts the photovoltaic material.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The fluorine-containing liquid is acid or fluorinated organic compound. The fluorinated organic compound is fluorinated alkane. EXAMPLE - No suitable example given.