TECHNOLOGY FOCUS - ELECTRONICS - Preferred Process: The stabilized process comprises a light irradiating process or a thermal process, where a light ray used in the light irradiating process is visible light, natural light and/or simulated solar light. The thermal process comprises a high-temperature thermal annealing process or a high-temperature baking process. The thermal process is performed at substantially higher than or equal to 200 degrees C. The method further comprises: patterning the first conductive layer to expose the substrate; patterning the first photovoltaic layer and the second photovoltaic layer to simultaneously expose the first conductive layer; and patterning the second conductive layer, the first photovoltaic layer and the second photovoltaic layer to simultaneously expose the substrate. The first conductive layer, the first photovoltaic layer, the second photovoltaic layer and the second conductive layer are patterned through a laser process. The first photovoltaic layer and the second photovoltaic layer are formed through a radio frequency plasma enhanced chemical vapor deposition process, a very high frequency plasma enhanced chemical vapor deposition process or a microwave plasma enhanced chemical vapor deposition process. The first photovoltaic layer is made of an amorphous silicon material, and the second photovoltaic layer is made of a microcrystalline silicon material. In the method, each of the first photovoltaic layer and the second photovoltaic layer is made of a group IV element thin film, a group III-V compound semiconductor thin film, a group II-VI compound semiconductor thin film and/or an organic compound semiconductor thin film. The first conductive layer is made of a transparent conductive layer while the second conductive layer is made of at least one of a reflective layer and a transparent conductive layer, or the second conductive layer is made of a transparent conductive layer while the first conductive layer is made of at least one of a reflective layer and a transparent conductive layer. EXAMPLE - No suitable example given.