TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Substrate: In the oxidized metal matrix composite coated substrate, the chromia-forming substrate is selected from Fe, Ni, and Co based alloys. The substrate is a chromia-forming alloy containing 20-28 wt.% of Cr. The substrate is an oxide-dispersion strengthened Cr-based alloy comprising 94-95% Cr, 5% Fe and 1% yttrium oxide (Y2O3). The substrate is a Ni-based alloy comprising 57 wt.% Ni, 22 wt.% Cr, 14 wt.% W, 2 wt.% molybdenum (Mo), 3 wt.% Fe, 5 wt.% Ca, 0.5 wt.% Mn, 0.4 wt.% silicon (Si), 0.3 wt.% aluminum (Al), 0.1 wt.% oxygen (O), 0.02 wt.% La and 0.015 wt.% boron (B). The substrate is a ferritic stainless steel alloy comprising 22 wt.% Cr, 0.46 wt.% Mn, 0.34 wt.% Ni, 0.19 wt.% Zr, 0.08 wt.% Si, 0.05 wt.% Al, 0.05 wt.% La, 0.02 wt.% C and balance to 100 wt.% of Fe. The intermediate spinel layer comprises cobalt chromate (CoCr2O4). The intermediate layer additionally comprises a metal element diffused from the substrate, where the metal element is Mn, Fe or a mixture. The rare earth metal particles are gadolinia doped ceria (GDC), dispersed in the coating in all three layers. The composite coating comprises an inner chromia (containing GDC particles) layer, an intermediate CoCr2O4 spinel (containing GDC particles) layer, and an outer (Ni, Co)O solid solution layer. The particle size of the rare earth metal oxide particles is 0.05-50 mu m, preferably 0.5-1 mu m. Preferred Method: In making the oxidized metal matrix composite coated substrate, the source of depositing metals is selected from metal salts, including sulfates and/or chlorides and complexed metal ions, such as Ni sulfamates. The electrolyte includes an optional additive selected from a buffering compound, surfactants, brighteners, levelers and a mixture. The buffering compound is boric acid. The plating is conducted in an aqueous electrolyte containing Ni or Co sulfates and optionally chlorides and boric acid arid rare earth oxide particles using Ni or Co anodes. Moreover, in step (e), the elevated temperature is 500-1000 degrees C for at least 24 hours. The chromia-forming substrate is a material selected from a chromia-forming Fe, Ni or Co based alloy containing an amount of Cr ranging from 16-30 wt.%, and an oxide-dispersion strengthened Cr-based alloy and a plain Cr-based alloy. The intermediate layer additionally comprises a metal element diffused from the substrate. The metal element is Mn, Fe or a mixture. In step (b) the pre-treatment comprises the electrochemical and/or chemical etching of the substrate, where the chemical etching is conducted in an aqueous solution of compounds selected from hydrochloric acid, nitric acid, hydrofluoric acid, ferric chloride and eerie ammonium nitrate.