TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The substrate temperature during the providing and removing steps is above 350 degrees C. The substrate temperature during the pulses is 100-500 degrees C, preferably above 300 degrees C. The reaction mixture is stirred overnight. The ferric chloride, cycloheptatriene and THF are first combined and then the transition metal chloride is added. The transition metal chloride is added while warming the mixture. Preferred Components: The metal organic reactant/metal reactant comprises a Group IVB metal. The metal organic reactant comprises one or more of hafnium, titanium or zirconium. The metal organic reactant is an organometallic reactant. The metal organic reactant comprises two ligands, one of which is the cycloheptatrienyl (CHT, C7H7) ligand. The metal organic reactant comprises two CHT ligands. The metal organic reactant comprises one CHT ligand and one cyclopentadienyl (Cp) ligand. The metal organic reactant does not comprise a halide. The deposited thin film comprises zirconium oxide, titanium oxide or hafnium oxide. The metal reactant has a structure of formula (RxCp-M-CHT) (I), ((R1R2R3R4R5R6R7)CHT-M-Cp(R8R9R10R11R12)) (II), ((R1R2R3R4R5R6R7)CHT-M-CHT(R8R9R10R11R12R13R14)) (III), ((R1R2R3R4R5R6R7)CHT-M-L) (IV) or ((R1R2R3R4R5R6R7)CHT-M-CHD(R8R9R10R11R12R13R14R15R16)) (V). The second reactant/oxygen reactant is oxygen, ozone, water, nitrous oxide, nitric oxide, nitrogen dioxide or hydrogen peroxide. The metal precursor comprises hafnium, titanium or zirconium. The thin film comprises a metal oxide or a metal nitride. The second reactant is an oxygen source or a nitrogen source. The nitrogen source is ammonia, hydrazine or nitrogen containing plasma. The transition metal reactant is a transition metal chloride or a Group IVB metal chloride, preferably titanium tetrachloride. The CHT metal reactant comprises (C7H7)M(C7H9)/M(C7H8) (CHT-M-CHD).RxCp = optionally substituted cyclopentadienyl;CHT = cycloheptatrienyl;M = Ti, Zr or Hf;R1-R16 = H or alkyl;L = L = mono or bidentate alkyl, cycloalkyl, alkoxy, amide or imido group or acyclic or cyclic dienyl ligand; andX = cycloheptatriene (C7H8).