TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal of the volatile metal compound is copper, silver or gold. The metal-containing process gas precursor is a volatile metal compound having at least an oxygen-metal bond, preferably as carboxylate, beta -diketonate and alkoxide, or a carbon-metal bond, preferably as acetylide or cyclopentadienide. The metal-containing process gas precursor is a volatile metal compound of formula (M(A)n+Lm) (I).M = a metal that forms carboxylate, beta -diketonate, alkoxide, acetylide or cyclopentadienide, preferably Cu, Ag (both preferred), Au, Ni, Pd, Pt, Zn, Sn, Al, Fe, In, Ti, Zr, Hf or Ta;A = is a compound with oxygen-metal bond or carbon-metal bond, preferably carboxylate, beta -diketonate, alkoxide, acetylide or cyclopentadienide;L = an additional ligand or stabilizer, preferably a compound derived from acetylene or ethylene or a carboxylic acid;n = 1-4; andm = 0-4.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The process gases are alternatively supplied, where before the process gas exchange, the reaction zone is evacuated or rinsed with a gas that is unreactive under suitable conditions. The substrate surface is activated through the supply of ligand-forming process gas for layer formation, before supplying the metal-containing process gas. The temperature of the reaction zone is selected such that it lies at below the decomposition temperature of the metal complex formed from two process gases. An additional reactive gas is supplied to the reaction zone, where the reactive gas supports complex decomposition and comprises a compound comprising at least hydrogen, water, methanoic acid or ammonia or a residue formed from these compounds. A plasma is generated in the reaction zone. The substrate temperature is selected such that the complex decomposition takes place only with the addition of the reactive gas or in the generation of plasma. Preferred Components: The ligand-forming process gas precursor is a compound having at least an amino group, such as amine, diamine, polyamine or alkoxyamine, preferably N,N,2,2-tetramethyl-1,3-propanediamine, 4-amino-2,2,6,6-tetramethylpiperidine, a diamine having a primary, a tertiary or secondary amino group, where the distance between the two nitrogen atoms of amino groups is three or four atoms, or a polyamine, where one of the nitrogen atoms exhibit an overall reactivity and the distance to an another nitrogen atom of lower reactivity is at least three atoms. EXAMPLE - None given.