TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The ceramic oxide nanoparticle is alumina. The passivated nanoparticulate ceramic oxide has an average particle size of 20-100 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The monofucntional organosilane is an alkoxysilane compound of formula (RxSi(OR1)y), preferably phenyltrimethoxysilane.R = 5-19C aryl (optionally substituted) or substituted 1-20C alkyl, preferably phenyl, o-alkylphenyl, m-alkylphenyl and/or p-alkylphenyl;R1 = 1-8C alkyl, methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, and/or tert-butyl;x = 1-3; andy = 4-x.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The aromatic polyimide has a polymer matrix glass transition temperature (Tg) of 300 degrees C or greater based on dynamic mechanical analysis (DMA). The polyimide is formed from a polyimide aromatic precursor comprising pyromellitic dianhydride, tetracarboxylic dianhydride, 4,4'-methylenebisdianiline, 4,4'-oxydianiline, p-phenylenediamine, chloro-pphenylenediamine, m-phenylenediamine and/or 4,4'-sulfonedianiline. The polyimide is formed from a fluorinated polyimide aromatic precursor. The film is formed by casting, dip coating, spin coating, spray coating, or nozzle coating. EXAMPLE - Alumina (4 g) was added to a glass vial containing N-methyl-2-pyrrolidone solution (40 ml). The vial was tightly closed and left in a sonication water bath (42 kHz and 155 W) for sonication for 3-5 hours. A homogenous stable milky solution formed. The alumina solution (6 g, 9 wt.% solids and average particle size of 45 nm) was added to a glass vial immersed in a an ice bath and sonicated with a horn sonicator for 15 minutes using (10 seconds on-5 seconds off) pulsing profile at 66 W output while stirring with a magnetic stir bar. Pyre-ML RC-5019 (RTM: Aromatic polyimide) solution (30 g) with 10% solids by weight was added and sonicated for an additional 15 minutes using the same pulsing profile. The solution was warmed to 80 degrees C, degassed and cast on to a glass substrate with a film caster set at 10 mils under temperature of 80 degrees C.