NOVELTY - Photovoltaic glass plated with temperable antireflection film comprises low-iron ultra-white figured glass base, which has a textured surface and a figured surface; and antireflection film, which is plated on the textured surface. The antireflection film is a nano-silica film formed by coating antireflection coating film liquid on the textured surface of the low-iron ultra-white figured glass base; drying the surface; and heating for pre-curing and tempering sequentially, where film is 100-200 nm in thickness. The antireflection coating film liquid is silica sol.    USE - Photovoltaic glass plated with temperable antireflection film, useful for solar batteries.    ADVANTAGE - The photovoltaic glass plated with temperable antireflection film has high film rigidity, good acid resistance and alkali resistance, good weather resistance, and high film adhesive strength.    DETAILED DESCRIPTION - Photovoltaic glass plated with temperable antireflection film comprises low-iron ultra-white figured glass base, which has a textured surface and a figured surface; and antireflection film, which is plated on the textured surface. The antireflection film is a nano-silica film formed by coating antireflection coating film liquid on the textured surface of the low-iron ultra-white figured glass base; drying the surface; and heating for pre-curing and tempering sequentially, where film is 100-200 nm in thickness. The antireflection coating film liquid is silica sol made by using ethyl orthosilicate, ethanol, and water as raw materials, and ammonia water or hydrochloric acid as catalyst. It is obtained by diluting and adding stabilizing agent and binder. An INDEPENDENT CLAIM is included for manufacture of photovoltaic glass plated with temperable antireflection film comprising:    (A) using tetraethyl orthosilicate (TEOS), ethanol, and water as raw materials, and ammonia water or hydrochloric acid as catalyst for preparing silica sol, where mol ratio of TEOS, water, ethanol, and ammonia water is 1:2-4:30-80:1-5, and the diameter of silica particles in the prepared sol is 10-50 nm;    (B) diluting and adding stabilizing agent and binder into the silica sol to obtain antireflection coating film liquid, where stabilizing agent is polyvinylpyrrolidone, which is added at 1-5 g/L coating film liquid, the binder is resin organic compound, which is added at 5-15 g/L coating film liquid, solvent for dilution is ethanol, acetone, propionic acid, ethyl acetate, and/or deionized water, and after the step of dilution, the mass ratio of silica nanoparticles in the antireflection coating film liquid is 1-4%;    (C) coating the prepared coating film liquid to textured surface of the low-iron ultra-white figured glass base;    (D) pre-curing the glass plated with the antireflection coating film liquid at 100-200 degrees C for 20-300 seconds; and    (E) tempering the pre-cured glass at 680-730 degrees C; and obtaining the photovoltaic glass plated with temperable antireflection film.