TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catalyst layer is composed of nickel, cobalt, iron, platinum, gold, aluminum, chromium, copper, magnesium, manganese, molybdenum, rhodium, silicon, tantalum, titanium, tungsten, uranium, vanadium, zirconium, titanium carbide, rhenium, hafnium carbide, lanthanum hexaboride, silica, alumina and/or silicon carbide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The polycrystalline graphene film comprises 1 to 300 layers. The polycrystalline graphene film is 1-3000 mm in width and length respectively. The single crystal grain included in the polycrystalline graphene film is 1-1000 mm in size. The gas carbon source includes all carbon-containing gases comprising carbon monoxide, ethane, ethylene, ethanol, acetylene, propane, propylene, butane, butadiene, pentane, methane, amylene, cyclopentadiene, hexane, cyclohexane, benzene, toluene and the group composed of at least one of the gases. The liquid carbon source comprises all organic matter including carbon in solution form, the mixture of any combination of the inorganic matter and the matter including carbon. The solid carbon source is graphite, amorphous carbon, diamond, fullerene or carbon nano tube. The organic matter including carbon comprises alkanes, cycloalkanes, alkenes, alkynes, aromatics, alcohols, ethers, phenols, aldehydes, ketones, carboxylic phenols, phenol derivatives, unsaturated carboxylic acid and substituted carboxylic acid, amines, nitro compounds, diazo compounds, aromatic diazonium salt, azo compounds, azides, sulfur compounds, phosphorus compounds, organic silicon compounds, pyrrole, furan, thiophene, indole, five-membered heterocyclic including more than two hetero atoms, pyridine, quinoline, isoquinoline, six-membered heterocyclic including oxygen hetero atoms, six-membered heterocyclic including more than two nitrogen hetero atoms, monosaccharide, oligosaccharide, polysaccharide, ammonia stem acid, polypeptides, protein, nucleic acids, lipids, terpenoids and/or steroid compounds. Preferred Method: The environment air pressure for thermal treatment is 10-10 to 10-7 pa. The physical method is the thermal evaporation plating, sputtering, electron beam deposition, laser deposition or plasma deposition. The heating method is the infrared ray heating, electromagnetic heating, microwave heating, resistance furnace, induction heating, radiation heating, laser, plasma or surface plasma excimer. The thermal treatment temperature is 300-2000 degrees C and the treatment time is 0.001-1000 hours. The fast temperature reducing speed is 0.1-300 degrees C/minute. The heat source is directly guided out and the contact method is used for reducing the heat source temperature.