NOVELTY - Fabricating a solar cell comprises: doping a silicon substrate (10) having a first conductive type impurity with a second conductive type impurity to form an emitter layer at a front surface part of the silicon substrate; forming an antireflection film (50) on the emitter layer; forming a front electrode on the antireflection film; forming a rear electrode on a rear surface of the silicon substrate; and forming a back surface field layer (80) at a rear surface part of the silicon substrate.    USE - The method is useful for fabricating solar cells (claimed).    ADVANTAGE - The method: provides the solar cell, which is slim, and can be mass produced with reduced production cost and reduced production time; and allows for forming the selective emitter on the silicon substrate easily, in an ultra-thin form, with excellent photovoltaic efficiency, reliability and quality, and that does not hinder the efficiency of the solar cell.    DETAILED DESCRIPTION - Fabricating a solar cell comprises: doping a silicon substrate (10) having a first conductive type impurity with a second conductive type impurity (which is opposite to the first conductive type impurity), to form an emitter layer at a front surface part of the silicon substrate; forming an antireflection film (50) on the emitter layer; forming a front electrode on the antireflection film; forming a rear electrode on a rear surface of the silicon substrate; and forming a back surface field layer (80) at a rear surface part of the silicon substrate. The back surface field layer has: a concentration of the first conductive type impurity that is higher than that of the silicon substrate; and a different concentration of the second conductive type impurity from that of the emitter layer. An INDEPENDENT CLAIM is also included for a solar cell comprising the silicon substrate doped with first conductive type impurity, the emitter layer, the antireflection film, the front electrode, which penetrates through the antireflection film to contact the emitter layer, the back surface field layer, and the rear electrode.    DESCRIPTION OF DRAWING(S) - The figure shows a cross-sectional view of the fabrication method of a silicon solar cell having a selective emitter.    Silicon substrate (10)    Antireflection film (50)    Front electrode paste (60)    Back electrode (75)    Back surface field layer (80)