TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The cationic surfactant is quaternary ammonium compounds. The sol precursor compound is: silicon dioxide precursor compounds (preferred), zirconium oxide precursor compounds, titanium dioxide precursor compounds, cerium oxide precursor compounds, iron(III) oxide precursor compounds, magnesium oxide precursor compounds, aluminum oxide precursor compounds, iron(II,III) oxide precursor compounds, zinc oxide precursor compounds, chromium oxide precursor compounds, cobalt(III) oxide precursor compounds, molybdenum oxide precursor compounds, tungsten oxide precursor compounds, hafnium oxide precursor compounds, yttrium oxide precursor compounds or water-soluble crosslinkable polymers or their precursors; metal halides, metal nitrates, metal carboxylates, metal oxysulfates, metal acetylacetonates or metal alkoxides, where the metal is zinc, magnesium, aluminum, yttrium, iron, chromium, cobalt, silicon, zirconium, titanium, cerium, molybdenum, tungsten or hafnium; or waterglass for silicon, or silicon oxide compound of formula (Si(OR)4). The metal oxide precursor compounds and the metal precursor compounds in step (f) are metal halides, metal nitrates, metal alkoxides, metal sulfates, metal carboxylates or metal oxysulfates.R = H, CH3, C2H5, C2H4OH, n-C3H7, iso-C3H7, n-C4H9 or iso-C4H9.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The process comprises (f) impregnating the silicon dioxide-coated graphene oxide particles or, respectively, the silicon dioxide-coated graphene particles with at least one precursor compound comprising metal oxide precursor compounds, metal precursor compounds or carbon precursor compounds, (g) converting the precursor compound into the corresponding metal oxide, the corresponding metal or, respectively, carbon, and the step (h) as above per se. The steps (f), (g) and (h) are independently repeated one or more times singly or jointly. The converting of the precursor compound in step (g) is effected by heating the impregnated graphene oxide particles or, respectively, graphene particles. The silicon dioxide is removed in step (h) by dissolving an aqueous sodium hydroxide solution or hafnium. Preferred Components: The non-ionic surfactant is 2-4C-alkylene oxide block copolymers comprising ethylene oxide. The carbon precursor compounds in step (f) are sucrose, glucose or pitch. EXAMPLE - Graphene oxide (30 mg) was initially suspended in an aqueous solution comprising cetyltrimethylammonium bromide (1 g) and sodium hydroxide (40 mg) in demineralized water (500 ml) and ultrasonicated for 3 hours. The suspension was subsequently stirred at 40 degrees C with a magnetic stirrer-bar for 2 hours and tetraethyl orthosilicate (1 ml) was slowly added to the suspension. The mixture was allowed to react for 12 hours and the silicon dioxide-coated graphene oxide particles were subsequently washed with warm ethanol, separated off and dried at 80 degrees C for 6 hours.