TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: The amount of calcium oxide and magnesium oxide is 8.2-10.5 (preferably 9-10.65) wt.% and 3.5-6 (preferably 4.4-5.85) wt.%, respectively. The glass exhibits: an annealing point of less than 600 degrees C, preferably 554-585 degrees C; a solar transmittance of greater than 88%; and a surface compression of greater than 140 pounds per square inch (psi), or 260-380 psi or greater than 10000 psi. The calcium oxide and magnesium oxide are present in an amount of 13.5-15.8 wt.%. The glass is substantially free of zirconium, lithium, strontium, barium, antimony, boron, phosphorus, germanium or cerium. The amount of silica and sodium oxide is 70-75 wt.% and 10.9-13.6 wt.%, respectively. The glass is a planar sheet defining first and second major surfaces, and further comprises a transparent conductive oxide coating deposited on at least one of the first and second major surfaces of the planar sheet. The planar glass substrate comprises a first planar glass substrate, and further comprises a second planar glass substrate, where the first planar glass substrate is sealed to the second substrate so as to enclose the transparent conductive oxide coating deposited on the first planar glass substrate. Preferred Process: The first planar glass substrate is separated from the second planar glass substrate by a distance of less than 0.09 inches. The melting of the glass-forming ingredients comprises adding the glass-forming ingredients to a charge end of a float glass line, and depositing of the melted glass-forming ingredients comprises depositing a glass ribbon on a float bath of the float glass line, where the glass ribbon has a temperature of 1050-1150 degrees C as the glass ribbon exits the furnace and enters the float bath and cooling the melted glass-forming ingredients so that the planar sheet of soda-lime-silica-based glass is at least one of annealed or tempered. The method further comprises: subsequent to cooling the melted glass forming ingredients, exposing the planar sheet to 700-800 degrees C in a coating process for 1-3 minutes; and exposing the planar sheet to a high temperature processing step, where the planar sheet exhibits a center tension and/or surface compression value of greater than 90% of the value the planar sheet exhibits before being exposed to the high temperature processing step. The exposing of the planar sheet to 700-800 degrees C in a coating process comprises depositing a transparent conductive oxide coating on the planar sheet. The high temperature processing step includes exposing the planar sheet to 500-900 degrees C for at least 1 minute. The high temperature processing step includes a coating operation.