NOVELTY - A gas-barrier film is manufactured using a reactive ion etching processing apparatus provided with a metal roll electrode (1) and a ground electrode (2), a unit (4), and a unit for setting the pressure and generating plasma. An intermediate glue layer having a thickness of 3 nm or more is formed on the surface of base material (10) on the metal roll electrode by plasma chemical vapor deposition. A gas-barrier layer is formed on the surface of intermediate glue layer by vacuum evaporation, sputtering, or chemical vapor deposition.    USE - Manufacture of gas-barrier film used for packaging foodstuffs and pharmaceuticals, and protection sheets of solar cells.    ADVANTAGE - The method enables quick manufacture of gas-barrier films having excellent adhesiveness with respect to base material and gas-barrier layer even after retort sterilization, boiling process, and various environmental endurance tests, with high productivity, at a rate equivalent to vapor deposition, occupying less space.    DETAILED DESCRIPTION - A gas-barrier film is manufactured using a reactive ion etching processing apparatus provided with a metal roll electrode which is a high-frequency application electrode in which a base material travels, and a ground electrode which is circular arc shaped or multifaceted following the metal roll electrode, used as counter electrode, a unit for introducing gas containing gas for oxidation, and vaporized organic silicon compound between the metal roll electrode and ground electrode, and a unit for setting the pressure in the process space to 3-35 Pa and for generating a plasma for power supply frequency between the electrodes as high frequency of 30 kHz to 4 MHz. An intermediate glue layer having a thickness of 3 nm or more is formed on the surface of base material on the metal roll electrode by plasma chemical vapor deposition. A gas-barrier layer is formed on the surface of intermediate glue layer by vacuum evaporation, sputtering, or chemical vapor deposition.    DESCRIPTION OF DRAWING(S) - The drawing shows an explanatory view of the manufacturing apparatus of intermediate glue layer of the gas-barrier film.    Metal roll electrode (1)    Ground electrode (2)    High-frequency electric power (3)    Gas-introduction unit (4)    Base material (10)