TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electroconductive support agent is carbon black. The electroconductive support has surface layer contacting surface of the active material layer. The surface of the surface layer has corrugation. The surface layer is an electrolytic-etching aluminum layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The chalcogeno fulvalene structure is of formula (I). The content of electrode active material contained in the active material layer is 30 wt.% or more. The aprotic solvent is N-methyl pyrrolidone, 1,3-dimethyl-2-imidazolidinone, toluene, dimethylacetamide, dimethylformamide, dimethylsulfoxide, tetrahydrofuran or chloroform.X=oxygen, sulfur, selenium or tellurium;andone or more of R1-R4=principal chain of polymer compound (A) or polymer compound (B), or bond with the adjoining repeating unit, others are H, phenyl, hydroxy, cyano, amino, nitro, nitroso or alkylthio, or linear saturated hydrocarbyl, linear unsaturated-hydrocarbyl, cycloalkane or cyclic unsaturated hydrocarbyl (all containing carbon, oxygen, nitrogen, sulfur, silicon, phosphorus and boron).Preferred Property: The electroconductive support has specific surface area of 800 m2/g or more.    TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The polymer compound (A) and polymer compound (B) have polymerization degree of 4 or more. Preferred Component: The polymer compound (A) is bicyclopentylidene compound of formula (II) or (III), or copolymer including the bicyclopentylidene repeating unit of formula (IV) or (V). The polymer compound (B) contains ester group, ether group, carbonyl, cyano group, nitro group, nitroxyl group, alkyl group, phenyl group, alkylthio group, sulfone group or sulfoxide group in the unit (b). The polymer compound (B) has tetrachalcogeno fulvalene structure-containing compound of formula (VI).R5,R6=R1, preferably CH3, SC6H13, C10H21 or C6H5;R7,R8=R1;R9,R11,R12=linear unsaturated-hydrocarbyl or cyclic unsaturated hydrocarbyl having acetylene structure or thiophene structure (both containing carbon, oxygen, nitrogen, sulfur and/or silicon);R31,R32= H, trivalent residue, group containing carbon, oxygen, nitrogen and sulfur, 1-10C saturated aliphatic group or unsaturated aliphatic group;L1=ester, ether, carbonyl, cyano, nitro, nitroxyl, alkyl, phenyl, alkylthio, sulfone or sulfoxide bonded with R31, preferably ester, ether or carbonyl;M1=compound (I);R33=bivalent residue containing 1-4C optionally substituted alkylene, alkenylene, arylene, ester, amide, or ether bonded with R32 and M1;n,m=integer;andm/n=0-5. Preferred Definitions:    X=sulfur.