NOVELTY - Aluminosilicate glass composition comprises: e.g. 49-69 (preferably 49 to less than 59) wt.% of silicon dioxide (SiO2); 0-2 (preferably 0) wt.% of boron trioxide (B2O3); greater than 4.7 to 15 (preferably greater than 5 to 15) wt.% of aluminum oxide (Al2O3); 0-4 (preferably 0 to less than 0.3) wt.% of lithium oxide (Li2O); greater than 10 to 18 wt.% of sodium oxide (Na2O); greater than 0 to 8 (preferably greater than 0 to less than 4) wt.% of potassium oxide (K2O), where the sum of Li2O, Na2O and K2O is greater than 10 to 19 wt.%; and 0-6 wt.% of magnesium oxide (MgO).    USE - The aluminosilicate glass is useful: in electronic applications where a high temperature resistance of the glass is required; for blending with metals and alloys, where the metals or alloys exhibit a thermal heat coefficient of 8-10x 10-6/K, for gas discharge lamps (preferably fluorescence lamps) in the region of background illumination of thin-film transistor displays and lighting (general lighting); in the region of semiconductor technology as substrate glass, superstrate glass and/or cover glass, where layers, containing cadmium (Cd) and/or tellurium (Te), or copper, indium, gallium, sulfur and/or selenium, are present in metallic and/or oxidic form; and as substrate glass, superstrate glass and/or cover glass in solar technology, preferably solar cells (preferably thin film solar cells) and for Cd-Te- or copper indium selenide- and/or copper indium gallium selenide-photovoltaic applications, preferably thin film photovoltaic applications (all claimed).    ADVANTAGE - The aluminosilicate glass: exhibits high thermal resistance and low processing temperature; does not have any toxicological and economical problems due to the absence of boron; exhibits high deposition rates and produces layers having very good crystalline quality; and does not allow the semiconductor layers, upon cooling, to form flakes.    DETAILED DESCRIPTION - Aluminosilicate glass composition comprises: 49-69 (preferably 49 to less than 59) wt.% of silicon dioxide (SiO2); 0-2 (preferably 0) wt.% of boron trioxide (B2O3); greater than 4.7 to 15 (preferably greater than 5 to 15) wt.% of aluminum oxide (Al2O3); 0-4 (preferably 0 to less than 0.3) wt.% of lithium oxide (Li2O); greater than 10 to 18 wt.% of sodium oxide (Na2O); greater than 0 to 8 (preferably greater than 0 to less than 4) wt.% of potassium oxide (K2O), where the sum of Li2O, Na2O and K2O is greater than 10 to 19 wt.%; 0-6 wt.% of magnesium oxide (MgO); 5 to less than 12 wt.% of calcium oxide (CaO); 0-5 (preferably 0 to less than 0.5) wt.% of strontium oxide (SrO); 0-12 (preferably greater than 1 to less than 3.5) wt.% of barium oxide (BaO), where the sum of MgO, CaO, SrO and BaO is 5-19 wt.%; 0-3 wt.% of fluorine (F); 0-10 (preferably greater than 0.1 to 10) wt.% of titanium dioxide (TiO2); 0-0.5 wt.% of iron oxide (Fe2O3); greater than 0.5 to 9 wt.% of zirconium oxide (ZrO2); and 0-3 wt.% of cerium oxide (CeO2), tungsten oxide (WO3), bismuth oxide (Bi2O3) and 0-3 wt.% of molybdenum trioxide (MoO3). An INDEPENDENT CLAIM is included for a method for selecting an aluminosilicate glass exhibiting a thermal expansion coefficient of 8-10x 10-6/K at 20-300 degrees C, a glass transition temperature of 580-640 degrees C and a processing temperature of 1065-1140 degrees C, comprising selecting a glass composition such that the quotient (in wt.%) of Na2O/(MgO+CaO+ZrO2) is 0.5-0.9 (preferably 0.6-0.8).