NOVELTY - Depositing (M1) a solid zinc oxide film onto a substrate involves dispensing a controlled flow of the reagent solution containing a source of zinc, oxygen and at least two ligand maintained at a first temperature, from showerhead assembly; positioning the substrate to receive at least a portion of the reagent over a selected area of the substrate; providing a raised structure peripheral to the selected area; and heating the substrate and the controlled volume of the reagent solution upon the substrate to a second temperature, higher than the first temperature.    USE - For depositing a solid zinc oxide film onto a substrate from a reagent solution (claimed); and for a variety of electronic and optical devices (such as transparent conducting oxide for current collection in solar cells, light emitting diodes, and flat panel displays; zinc oxide based light emitting diodes; matrix material for soft magnets used in spintronics; and sensors and detectors).    ADVANTAGE - The method provides a bath deposition apparatus capable of depositing zinc oxide on a substrate while minimizing homogeneous nucleation of the same or similar phase within the bulk of the fluid bath; provides a bath deposition apparatus capable of depositing zinc oxide films having improved physical, chemical, optical, or electrical properties; provides a zinc oxide bath deposition process that is more easily controlled; provides a zinc oxide bath deposition process that uses reagents more efficiently; provides a zinc oxide bath deposition process that allows localized heating of a relatively small volume of the bath while maintaining the remainder of the bath at a relatively lower temperature; and also provides a zinc oxide film having a carrier concentration less than 1015 cm-3 and a resistivity greater than 600 Omega -cm.    DETAILED DESCRIPTION - Depositing (M1) a solid zinc oxide film onto a substrate from a reagent solution involves: providing a supply of reagent solution containing a source of zinc, a source of oxygen, and at least two ligands maintained at a first temperature at which homogeneous reactions are substantially inhibited within the reagent solution; dispensing a controlled flow of the reagent solution from a showerhead assembly; positioning the substrate to receive at least a portion of the controlled flow of the reagent over a selected area of the substrate; providing a raised structure peripheral to the selected area so that a controlled volume of the reagent solution may be maintained upon the substrate and replenished at a selected rate; and heating the substrate and the controlled volume of the reagent solution upon the substrate to a second temperature, higher than the first temperature, so that deposition of zinc oxide from the reagent solution may be initiated.