NOVELTY - Thin mesh pattern of metal thin film (5) is formed on surface of transparent resin base material (2). Then, pattern is formed on surface of base material, as negative shielding mask (8) for thin mesh pattern. Metal thin film is formed on base material. Then, shielding mask is removed and thin mesh pattern is exposed. Electroconductive resin layer (6) is formed on convex-shaped portion of pattern containing metal thin film and transparent electroconductive resin layer is formed on concave opening portion in which metal thin film is not formed.    USE - Manufacture of transparent conductive film (claimed). Uses include but are not limited to electrode component of electronic device, thin film solar cell, electroluminescent illumination, touch panel, light control and electromagnetic shielding material.    ADVANTAGE - The method economically provides conductive film having excellent transparency and surface smoothness, and reduced surface resistivity.    DETAILED DESCRIPTION - Thin mesh pattern of metal thin film is formed on single surface of transparent resin base material. Then, pattern formed by printing print material having solubility with respect to solvent is formed on single surface of transparent resin base material, as negative shielding mask for thin mesh pattern. A metal thin film is formed on transparent resin base material covered with shielding mask by sputter or vacuum deposition. Then, the shielding mask is removed by dissolving the base material in solvent and thin mesh pattern containing metal thin film is exposed. An electroconductive resin layer is formed on one portion or whole surface of convex-shaped portion of pattern containing metal thin film, such the surface elevation difference on surface coated by electroconductive resin layer is 50-400 nm, and transparent electroconductive resin layer is formed on concave opening portion in which the metal thin film is not formed, such that the convex-shaped portion is embedded, to obtain transparent conductive film.    DESCRIPTION OF DRAWING(S) - The drawing shows sectional view of manufacture of transparent conductive film.    Electroconductive film (1)    Transparent resin base material (2)    Metal thin film (5)    Electroconductive resin layer (6)    Shielding mask (8)