TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Method: The diffusion protective pattern is formed between the first and second areas. The method of doping impurities further comprises removing the diffusion protective pattern after the first and second doped patterns are formed. The forming of diffusion protective pattern is performed by screen printing method, an ink printing method or photolithograph method. The method of manufacturing the solar cell further comprises: doping the second dopant in a second surface of the substrate; forming a convex-concave pattern on the second surface of the substrate; forming a first passivation layer on the second surface of the substrate on which the convex-concave pattern is formed; forming a reflection protective layer on the second surface of the substrate on which the first passivation layer is formed; forming a second passivation layer on the first surface on which the first doped pattern and the second doped pattern are formed; and removing the second passivation layer to form a first contact hole contacting the first doped pattern and the first metal pattern, and a second contact hole contacting the second doped pattern and the second metal pattern. In the method of manufacturing the solar cell, the forming of diffusion protective pattern includes forming the diffusion protective pattern to have a second thickness thinner than the first thickness, and where the method further comprises forming a first low density pattern which has a lower concentration than the first doped pattern and a second low density pattern which has a lower concentration than the second doped pattern under the diffusion protective pattern between the first doped pattern and the second doped pattern during forming of the first doped pattern and the second doped pattern. Preferred Components: The substrate comprises group IV element, where one of the first and second dopants comprises group III element, and the other of the first and second dopants comprises group V element. The diffusion protective pattern comprises at least one of silicon oxide material or silicon nitride material. In the method of manufacturing the solar cell: an interval between two neighboring openings of the diffusion protective pattern is 1-300 mu m; and the substrate comprises a second dopant. The solar cell further comprises a reflection protective layer on the second surface of the substrate. In the solar cell the substrate further comprises a layer doped with the second dopant on a second surface of the substrate, where the second surface of the substrate has a convex-concave pattern. EXAMPLE - No suitable example given.