TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The method further comprises: removing an uncured portion of the first and second radiation sensitive materials following the exposing step; applying a third radiation sensitive material having a third sensitivity to the second radiation sensitive material, where the third radiation sensitive material forms a third construct following the step of exposing the third radiation sensitive material to the radiation beams, and the third construct cooperates with the first and second constructs to form the radiation cured structure; providing a substrate and applying the first radiation-sensitive material to the substrate; at least one of the steps of metalizing, carbonizing, or ceramicizing the radiation-cured structure; and applying a filter layer between the first radiation-sensitive material and the second radiation-sensitive material, where the filter layer militates against an exposure of one of the first and second radiation sensitive materials to at least a portion of the radiation beams. The forming step includes heating the first and second radiation sensitive materials following the exposing step, where the heating facilitates at least one of polymerization, a crosslinking, or a dissociation of the first and second radiation sensitive materials. Preferred Components: The first and second radiation sensitive materials are one of a radiation curable material or a radiation dissociable material. The first and second sensitivities are at least one of a curing rate, an initiation rate, a dissociation rate, a sensitivity to radiation frequency, a sensitivity to radiation amplitude or a sensitivity to radiation type. The third sensitivity is: substantially the same as the first sensitivity; or different from the first sensitivity and the second sensitivity. The radiation beams include many first and second radiation beams, where the first radiation beams is different from the second radiation beams in at least one of: frequency, amplitude or type; or cross sectional shape or angle of incidence relative to a surface of one of the first and second radiation sensitive materials. The first and radiation beams are provided by first and second radiation sources having a first mask and a second mask, respectively. The first or the second radiation sensitive material is: one of a negative resist or a positive resist; or a liquid photomonomer. EXAMPLE - No suitable example given.