TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of the nanoscale silicon particles that are functionalized by covalently bonded organic groups, comprises dispersing nanoscale silicon particles with organometallic compounds (A) in a solvent for reaction. Preferred Process: The excess organometallic compound is at least partially, preferably quenched by trifluoroacetic acid, after the reaction. Preferred Components: The covalently bonded organic group has a structure of formula (-X(-Y1-Z)n-Ar1) (I), (-X(-Z-Y1)n-Ar1) (II), (-Y1(-X-Z)n-Ar1) (III), (-Y1(-Z-X)n-Ar1) (IV), (-Z(-X-Y1)n-Ar1) (V) or (-Z(-Y1-X)n-Ar1) (VI). At least a part of the covalently bonded organic groups contains at least a single amino aryl residue, where the aryl residue is bonded directly or via a spacer on the silicon core, and the spacer group contains a conjugated system of multiple bonds. The covalently bonded organic groups are at least partially N1,N1,N4-tris(4-methoxyphenyl)-N4-phen-4-yl-1,4-phenylene diamine- (PDA) or N1-(4-(hexyloxy)phenyl)-N1,N4-bis(4-methoxyphenyl)-N4-phen-4-yl-1,4-phenylene diamine- (PDA-hexyl) groups. (A) have a structure of formula (M-X(-Y1-Z)n-Ar1) (a), (M-X(-Z-Y1)n-Ar1) (b), (M-Y1(-X-Z)n-Ar1) (c), (M-Y1(-Z-X)n-Ar1) (d), (M-Z(-X-Y1)n-Ar1) (e) or (M-Z(-Y1-X)n-Ar1) (f). The highest occupied molecular orbital (HOMO) energy of the hole-conducting organic group R0 corresponding H-saturated compound H-R0 is -5.8 eV to -3.8 eV. The functionalized silicon particles have a core of at least predominantly crystalline silicon. The core of the functionalized silicon particles has a defined average diameter D50 of less than 500 nm. The functionalized silicon particle has a first oxidation potential Eox1 of -5.8 eV to -3.8 eV, and optionally a second oxidation potential that is shifted by 0.1-1 eV compared to the first oxidation potential Eox1. The core of the silicon is doped. (A) are M-PDA or M-PDA-hexyl. The nanoscale silicon particles are at least predominantly crystalline and/or have an average diameter D50 of less than 500 nm. The nanoscale silicon particle is a silicon powder of aggregated crystalline hot-wall reactor- or microwave reactor-silicon particles. The silicon powder of aggregated crystalline hot-wall reactor-silicon particles exhibits a Brunauer-Emmett-Teller (BET) surface of 20-150 (preferably 40-120) m2/g. The silicon powder of aggregated crystalline microwave reactor-silicon particles exhibits a BET surface of greater than 50, preferably 100-700 m2/g. The nanoscale silicon particles are doped.X = (CR1)p;Y1 = (R2C=CR3)q;Z = (C?=C)r;R1-R3 = H or an organic residue;p = 0-3;q, r, n = 0 to infinity;Ar1 = optionally substituted aromatic residue, preferably at least N-, O-, S- or P-substituted benzylic residue; andM = Li, MgCl, MgBr or MgI.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The dispersion further comprises dispersion additives. Preferred Components: The solvent is an organic solvent comprising ether such as diethyl ether or tetrahydrofuran, chlorobenzene, halogenated or non-halogenated alkane such as chloroform, hexane or heptane, and/or aromatic solvent such as toluene, xylene or anisole. The liquid phase contains one or more organic solvents or their mixtures, which are non-polar. EXAMPLE - No suitable example given.