TECHNOLOGY FOCUS - POLYMERS - Preferred Graphene Sheet: The graphene sheet consists essentially of graphene. The wrinkles are determined by scanning electron microscopy at 30000 times magnification. The graphene sheet has a pattern corresponding to a pattern of the patterned layer. Preferred Graphene Base: In the graphene base, each of the first graphene sheet and the second graphene sheet has a pattern corresponding to the pattern of the metal layer, where the metal layer comprises a graphitizing catalyst. Preferred Method: The method of forming of the carbon incorporated metal layer involves: forming a first metal layer on at least one surface of the substrate; and carburizing the first metal layer to form the carbon incorporated metal layer. The forming of the carbon incorporated metal layer involves simultaneously disposing a metal and carbon on at least one surface of the substrate. The forming of the carbon incorporated metal layer comprises disposing carbide on at least one surface of the substrate. The method further involves forming a second metal layer on the carbon incorporated metal layer; and cooling the first and second graphene sheets at a rate of 0.1-50 degrees C per minute after the thermally treating. The thermally treating is performed at a temperature of 350-1300 degrees C for 0.01-1 hour. The method further involves dry etching the first and second graphene sheets using H2, plasma, or O2 to remove the second graphene sheet; treating the resulting metal layer with an acid after the cooling to remove the resulting metal layer, which remains after the thermally treating, to provide the first graphene sheet directly on the substrate, and the second graphene sheet separated from the substrate, where the first graphene sheet is bonded to the substrate; and transferring the separated second graphene sheet to another substrate. Preferred Components: The substrate comprises a patterned layer on at least one surface of it. EXAMPLE - Nickel was deposited by e-beam evaporation on a 5-2 cm silicon substrate, which was coated with a 100 nm-thick silica (SiO2) layer, to form a nickel (Ni) layer having a thickness of 300 nm on the silicon substrate. The substrate with the Ni layer was immersed in triethylene glycol (100 ml), maintained at 240 degrees C for 30 hours, and then cooled. The substrate was removed from the solution and ultrasonically washed with water, ethanol, and then acetone. The substrate was dried, placed in a reaction chamber under an argon atmosphere, heated at 100 degrees C per minute to 900 degrees C, maintained at 900 degrees C for 30 seconds, and then cooled at 20 degrees C per minute to form a graphene sheet of 0.23 having crystalline characteristics.