NOVELTY - The carbon electrode comprises a conical or pyramidal tip (2), which possesses a device for hard-soldering a filament rod and is surrounded at its flanks from a raised edge (3). The raised edge ends above, below or at equal height of the tip of the electrode, and is formed at its upper end in a pointed, rounded, oblique or flat manner. The tip of the electrode has a displacement of 0-20 mm related to the mid-point of the base surface of the electrode. The electrode consists of zones of different materials with different specific thermal conductivities.    USE - Carbon electrode useful in various applications such as aluminum and steel production, electrolysis of salt melts, electrolytic decomposition of chemical compounds, thermal separation reactions, arc welding and measuring devices, and for solar and electronics applications.    ADVANTAGE - The carbon electrode can be simply and economically produced with high efficiency.    DETAILED DESCRIPTION - The carbon electrode comprises a conical or pyramidal tip (2), which possesses a device for hard-soldering a filament rod and is surrounded at its flanks from a raised edge (3). The raised edge ends above, below or at equal height of the tip of the electrode, and is formed at its upper end in a pointed, rounded, oblique or flat manner. The tip of the electrode has a displacement of 0-20 mm related to the mid-point of the base surface of the electrode. The electrode consists of zones of different materials with different specific thermal conductivities, where the specific thermal conductivity of the materials increases from inside to outside. The inner zones are formed as removable or exchangeable insert. The inner zones are connected with the next outer zone using a plug connection. The zones have common thermal and electrical contact. The electrode is coupled with a cooling body at its base. The electrode consists of high or highly pure electro-graphite with different thermal conductivities. The used carbon material has a parameter such as specific thermal conductivity of 20-200 W/m.K, specific electrical resistivity of 30-5 mu Omega .m, an arithmetic average roughness value of the surface roughness (Ra) of 1-20 mu m with an overall height of the roughness profile of 10-200 mu m and an averaged roughness depth of 8-160 mu m, a compressibility of 40-250 MPa, a bending strength of 10-100 MPa, modulus of elasticity of 1-20 GPa, linear thermal expansion coefficient of 2x 10-6 to 10x 10-6 1/K at 20-1000 degrees C and open porosity of 5-25%. An INDEPENDENT CLAIM is included for a method for producing polycrystalline silicon by depositing highly pure elementary silicon from the gas phase on the surface of silicon rods.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of an electrode.    Base body (1)    Tip (2)    Raised edge (3)    Cavity (4)    Filament rods. (5)