NOVELTY - The buffer layer deposition system comprises a solution deposition apparatus, a heated processing bed, an assembly for holding a solution over a substrate (50), a substrate curling apparatus for curling a edge of the substrate to define a zone for containing a volume of the solution over the substrate, and depositing a component of the solution using a deposition station to clean the substrate before heating the solution to processing temperature. The assembly curls two edges of the substrate, has a depth of 1-5 mm, and is partially contained in a heating chamber.    USE - The vortex and wide-web system is useful for depositing a buffer layer material from a solution to an exposed surface of a solar cell absorber layer disposed on a continuous flexible substrate for manufacturing solar cells such as absorber solar cells, thin film solar cells, hybrid organic/inorganic solar cells and thin-film photovoltaic devices.    ADVANTAGE - The buffer layer deposition system can be efficiently and economically produced with high throughput and production yield and without bottle necking.    DETAILED DESCRIPTION - The buffer layer deposition system comprises a solution deposition apparatus, a heated processing bed, an assembly for holding a solution over a substrate (50), a substrate curling apparatus for curling a edge of the substrate to define a zone for containing a volume of the solution over the substrate, and depositing a component of the solution using a deposition station to clean the substrate before heating the solution to processing temperature. The assembly curls two edges of the substrate, has a depth of 1-5 mm, and is partially contained in a heating chamber. Each of the edges has a sealing member: present in contact with the edge and configured to extend into solution on the substrate; and to minimize loss of process gas above the substrate. The curling apparatus curls opposing edges of the substrate, and is configured to transition a planar substrate that curls along two edges. The transition occurs over a distance sufficient prevent permanent deformation of the substrate, when the substrate is uncurled. The solution comprises a precursor for forming a junction partner for a group IB-IIIA-VIA absorber layer and a group IIB-VIA junction partner, and has a pH of 11-12.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic view of a junction partner deposition system.    Substrate (50)    Spraying assembly (60)    Second deposition assembly (70)    Oven (80)    Cleaning system (90)    Stations. (92, 102)