TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In the method (I), the metal is provided in a form of an inorganic compound, an organic compound or an organometallic compound including 1-5C organometallics, 6-10C organometallics, 11-15C organometallics, 16-20C organometallics, 21-25C organometallics, 26-30C organometallics, 2-7C organometallics, 8-12C organometallics, 13-17C organometallics, 18-22C organometallics, 23-27C organometallics or 28-30C organometallics. The sufficient amount of the organic compound or inorganic compound is present in order to provide 100 parts per million by weight to 10 wt.%, preferably 0.25-4 wt.% of the metal. In the method (II) the combination of aluminum, glass frit and the organometallic compound is such that the sintering temperature of the paste is: at least 20 degrees C lower than it would otherwise be if the organometallic compound was not present; at least 10 degrees ?C, preferably 3 degrees C lower than it would otherwise be if the at least one inorganic oxide was not present. Preferred Components: The inorganic compound is salt, oxide, chloride, bromide, phosphate, nitrate, carbide, nitride and/or silicide. The organic compound: has 1-6 hydrocarbon residues having 1-30C; is an organometallic compound including at least one metal center and at least one hydrocarbon residue having at least one of 1-5C, 6-10C, 11-15C, 16-20C, 21-25C, 26-30C, 1-7C, 8-12C, 13-17C, 18-22C, 23-27C or 28-30C. The glass frit comprises: bismuth trioxide (15-55 mol.%), silicon dioxide (15-55 mol.%), boron oxide (1-15 mol.%), lithium oxide, sodium oxide and potassium oxide (5-35 mol.%); bismuth trioxide (20-55 mol%), potassium oxide (20-55 mol.%), phosphorus pentoxide (0.1-5 mol.%) and silicon dioxide (1-6 mol.%); boron oxide (10-25 mol.%), potassium oxide (0.5-30 mol%), sodium oxide (0.01-0.50 mol.%) and silicon dioxide (70-90 mol.%); or potassium oxide (5-15 mol.%), lithium oxide (1-8 mol.%), sodium oxide (16-28 mol.%), phosphorus pentoxide (0.2-4 mol.%), silicon dioxide (30-50 mol.%), titanium dioxide (15-35 mol%) and vanadium pentoxide (1-6 mol.%). EXAMPLE - Aluminum paste (comprised of organic vehicle (3 wt.%), glass (G1) (comprised of bismuth trioxide (35.8%), silicon dioxide (35.5%), boron oxide (7.2 %), potassium oxide (21.5%)) (0.2 wt.%), glass (G2) (comprised of silicon dioxide (81.5%), boron oxide (16.89%), potassium oxide (1.39%) and sodium oxide (0.2%)) (0.8 wt.%), glass (G3) (comprised of aluminum trioxide (1.86%), boron oxide (20.86%), potassium oxide (0.75%), sodium oxide (10.43%), silicon dioxide (21.02%), titanium dioxide (3.16%), zinc oxide (26.1%), zirconium oxide (2.56%) and fluorine (13.26%)) (0.8 wt.%), vanadium 2-ethylhexanoate (0.5 wt.%), solvent (16.95 wt.%), dispersant (0.25 wt.%), filler (1.5 wt.%) and aluminum powder (76 wt.%)) was applied on silicon monocrystalline wafer having a thickness of 200 mu . The resultant coated wafer was then fired in a Despatch furnace to obtain the aluminum back contacted silicon solar cell having improved electrical performance.