TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The process comprises providing a reflective polymeric substrate, which exhibits a reflectance at 540 nm of at least 80%. The conductive layer is applied to the surface of the binding layer of the substrate after the film manufacture process has been completed, where following deposition of the nanowires, the film is heated to temperature T1. The conductive layer is applied to the surface of the binding layer of the substrate prior to the heat-setting step. The conductive layer is applied to the surface of the binding layer of the substrate between the two stages (i.e. longitudinal and transverse) of a biaxial stretching operation. The heating temperature T1 is 50-240 degrees C. Preferred Components: The copolyester is a copolyester derived from terephthalic acid, isophthalic acid and ethylene glycol; a copolyester derived from terephthalic acid, an aliphatic dicarboxylic acid and a glycol; or a copolyester derived from terephthalic acid, ethylene glycol and 1,4-cyclohexanedimethanol, preferably derived from terephthalic acid, azeleic acid and ethylene glycol. The copolyester derived from ethylene glycol, terephthalic acid and isophthalic acid exhibits a molar ratio of the terephthalic acid component to the isophthalic acid component of 25:75-85:15, preferably 50:50-70:30. The nanowires are disposed on the exposed surface of the binding layer by dispersing the nanowires in a liquid vehicle and coating the nanowire-containing liquid onto the exposed surface of the binding layer. The reflective conductive film exhibits a reflectance at 540 nm of at least 60%, preferably at least 70%. The polymeric substrate is a polyester substrate, where the polymeric substrate is a biaxially oriented substrate. The polyester of the base layer is poly(ethylene terephthalate) and poly(ethylene 2,6-naphthalate). The binding layer is copolyester or a heat-sealable layer. The copolyester is derived azelaic acid. The binding layer and base layer are coextruded. The total thickness of the substrate is no more than 350 mu m. The polymeric substrate comprises: one or more reflecting agents comprising particulate inorganic fillers and/or incompatible resin fillers, where the amount of reflecting agent incorporated into the substrate is 5-60 wt.%; and a reflecting agent comprising titanium dioxide and/or barium sulfate. The sheet resistance of the transparent conductive film is less than 100000 ohms per square. The nanowires are metal nanowires, where the nanowires are silver nanowires. The nanowires are carbon nanotubes.