TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic filler is present in the form of particles. The inorganic filler is silica (silicon dioxide), montmorillonite, cerium oxide, titanium, titanium oxide, zirconium, zirconium oxide, silver, gold, iron, and/or platinum. The functionalized group comprises single sulfur atom present in the form of sulfur atom (-S-), thiol (-SH), -thione (C(=S)-), sulfur dioxide (-S(=O)2-), or sulfur oxide (-S(=O)-) groups. The functionalized group comprises at least two sulfur atom, each present in the form of (-S-), (-SH), (C(=S)-), (-S(=O)2-), (-S(=O)-), sulfonic acid ion (-S((=O)2)O-) or sulfonic acid (-S((=O)2)OH) group. The functionalized group is of formula (-X-S-Y1-S-Z1-) (I). The functionalized group is of formula (-R1-SH) (II), (-R2-SS-R3) (III), (-R4-SSSS-R5) (IV), and (-R6-N(H)-C(=S)-N(H)-R7) (V). The compound derived from silicon is bis(3-(triethoxysilyl)propyl) tetrasulfide, 1-phenyl-3-(3-triethoxysilylpropyl)thiourea, 4-(3-triethoxysilylpropylcarbamothioylamino)benzenesulfonic acid, 3-triethoxysilylpropane-1-thiol, and 3-(3-triethoxysilylpropyldisulfanyl)propane-1-sulfonic acid.X = alkylene, heteroalkylene, arylene, or heteroarylene (all optionally substituted);Y1 = alkylene, heteroalkylene, arylene, heteroarylene (all optionally substituted), or disulfide;Z1 = alkyl, heteroalkyl, aryl or heteroaryl (all optionally substituted);R1, R2, R4, R6 = (hetero)alkylene, or (hetero)arylene (both optionally substituted); andR3, R5, R7 = (hetero)alkyl or (hetero)aryl (both optionally substituted).Preferred Process: The step (a) is carried out using a compound derived from silicon compound of formula (SiRaRbRcRe).Ra, Rb, Rc = H, halo, amine, diamine, amide, acyl, vinyl, hydroxyl, epoxy, phosphonate, sulfonic acid, isocyanate, carboxyl, thiol, glycidoxy, acryloxy such as methacryloxy, (hetero)alkyl, (hetero)aryl (both optionally substituted), or alkoxyl group of formula (-ORd);Rd = optionally substituted (hetero)alkyl; andRe = functionalizing group.