TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: The substrate is a glass or a semiconductor material.    TECHNOLOGY FOCUS - IMAGING AND COMMUNICATION - Preferred Method: The precursor composition is prepared by mixing at least one first metal complex and the at least one second metal complex. The depositing step involves: drop casting, spin coating, ink jet printing, roll-to-roll, slot-die, gravure, microcontact printing, or flexographic printing (preferably ink jet printing). The depositing step is not carried out under a vacuum. Depositing step does not involve sputtering. The depositing step does not involve electrochemical deposition. The depositing step is carried out at least twice on the same position on the substrate. Treating step is a heating step or an exposure to radiation step. Treating step is a heating step at less than 250 (preferably less than 200) degrees C. The method further involves removing at least some of the first metal to leave a nanoporous material comprising at least the second metal. The removing step is a chemical removal. The removing is not an electrochemical removal. Removing is carried out with acid. At least a portion of the first metal which is removed is recovered. The nanoporous material is further subjected to a chemisorption step. The nanoporous material is further chemically modified. The nanoporous material is further used in a metal plasmon frequency monitoring process. The first and second metals are silver or gold, and the precursor composition further comprises at least one hydrocarbon solvent, the depositing step involves ink jet printing, and the treating step is a heating step at a temperature of less than 250 degrees C, and a removing step is carried out by chemical etching.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition (C1) has a viscosity adapted for use in ink jet printing. The composition (C1) comprises at least one first metal complex, where the first metal complex is a neutral, dissymmetrical complex comprising at least one first metal in an oxidation state of (I) or (II), and at least two ligands, where at least one first ligand is an amine and at least one second ligand is a carboxylate anion; at least one second metal complex, which is different from the first metal complex, where the second metal complex is a neutral, dissymmetrical complex comprising at least one second metal in an oxidation state of (I) or (II), and at least two ligands, where at least one first ligand is sulfur compound and at least one second ligand is the carboxylate anion of the first metal complex; and at least one organic solvent, where the atomic percent of the first metal is 20-80% and the atomic percent of the second metal is 20-80% relative to the total metal content. Preferred Components: The precursor composition is a homogeneous composition. The precursor composition is free of metallic nanoparticles. The precursor composition comprises metallic nanoparticles at a level of less than 0.1 wt.%. The first and second metal complexes are silver, gold, copper, nickel, platinum, iridium or rhodium complex. The first metal complex is a silver complex and the second metal complex is a gold complex. The precursor composition further comprises at least one third metal complex different from the first and second metal complexes and comprising at least one third metal different from the first and second metals. For the precursor composition the atomic percent of the first metal is 10-90 (preferably 20-80)% and the atomic percent of the second metal is 10-90 (preferably 20-80)% relative to the total metal content. The amount of the first complex and the second complex relative to the total amount of precursor composition is less than or equal to 500 (preferably less than or equal to 250) mg/ml. The precursor composition has a viscosity for use in ink jet printing for the depositing step. The precursor composition has a viscosity of less than or equal to 100 cps at 25 degrees C. The first metal complex and the second metal complex each comprise only one metal center. The first metal of the first metal complex and the second metal of the second metal complex each are in an oxidation state of (I) or (II). The first metal complex and the second metal complex are each neutral complexes. The first metal complex comprises at least one carboxylate ligand and/or at least one multidentate amino ligand. The second metal complex comprises at least one carboxylate ligand and/or at least one sulfur-containing ligand. The treated structure has a thickness less than or equal to 500 nm. The two elemental metals in the treated structure are in the form of an alloy or in the form of a solid solution; or are not in the form of a solid solution. The atomic ratio of metals in the precursor composition and in the treated deposit is same, or is within five or one percent of each other. The nanoporous material has an average pore size of less than or equal to 100 nm. The first and second metals are silver, gold, copper, nickel, platinum, iridium, or rhodium, and the precursor composition further comprises at least one solvent. The first and second metals are silver or gold, and the precursor composition further comprises at least one hydrocarbon solvent. The first metal complex is a silver complex and the second metal complex is a gold complex, or the first metal complex is a platinum complex and the second metal complex is a gold complex, or the first metal complex is a platinum complex and the second metal complex is an iridium complex, or the first metal complex is a platinum complex and the second metal complex is a rhodium complex (preferably the first metal complex is a silver complex and the second metal complex is a gold complex). The second ligand of the first metal complex is a carboxylate. The second ligand of the second metal complex is a carboxylate. The two second ligands of the two complexes are the same. The first metal complex and the second metal complex are each dissymmetrical complexes. The first and second metal complexes each comprise metal of at least 25 (preferably at least 50, especially at least 70) wt.%. The precursor composition has a viscosity of 1-20 cps. The first metal complex comprises at least one alkylcarboxylate ligand and/or at least one amino ligand. The second metal complex comprises at least one alkylcarboxylate ligand and/or at least one sulfur-containing ligand.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The precursor composition further comprises at least one solvent. The solvent is a hydrocarbon or polar protic solvent. The solvent is an aromatic hydrocarbon. The first metal complex comprises at least one carboxylate ligand and at least one amine ligand, and the second metal complex comprises at least one carboxylate ligand and at least one thioether ligand. The first metal complex and the second metal complex each comprise a carboxylate ligand which is the same for each complex. The first metal complex and the second metal complex each comprise a carboxylate ligand which has less than or equal to 8 carbon atoms.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The deposited structure is a line or a vertex-shared polygon. The substrate is a flexible or a rigid substrate. The substrate is a polymeric substrate. EXAMPLE - No suitable example given.