NOVELTY - The method comprises depositing a buffer layer (302) of a buffer layer material on a substrate material, where the buffer layer material is a silicon-containing material, adding a film layer over the buffer layer, annealing the film layer at a temperature of 200-1000 degrees C to form balled-up structures that are distributed in an array of balled-up islands over the buffer layer to produce an etch mask, and reactive ion etching the buffer layer partially into the substrate material using the etch mask to create an array of pillar structures of the buffer layer material and the substrate material.    USE - The method is useful for fabricating a material with a transparent pillar array surface such as anti-fingerprint surface coating structure, which is useful in a device having a display viewing screen for touch-sensitive screen of cell phone, smart phone, tablet and other display devices (all claimed), where the device is electronic, photonic and consumer devices and the material is useful: in photovoltaic solar cells, dye sensitized solar cells, thermoelectric energy conversion devices, sunlight focusing lens devices, waveguides and other optical devices; as a solar induced photocatalytic surface using UV or visible light exposure to create superoxide and other radical type active components for decomposing toxic chemicals or anti-bacterial effect for water treatment or environmental clean-up; on surfaces of vehicles and building; and to provide superhydrophobic coatings on boats, water sports vehicles and other water contact systems.    ADVANTAGE - The method is capable of rapidly, economically and efficiently fabricating the material with transparent pillar array surface with enhanced light transmission, optical properties and absorption characteristics, good superhydrophobic, superoleophobic or superomniphobic surface properties, increased wear resistance, improved anti-corrosion, mechanical strength and hardness thus reducing or eliminating the amount of sunlight-blocking dirt and other contaminants in the display screen.    DETAILED DESCRIPTION - The method comprises depositing a buffer layer (302) of a buffer layer material on a substrate material, where the buffer layer material is a silicon-containing material, adding a film layer over the buffer layer, annealing the film layer at a temperature of 200-1000 degrees C to form balled-up structures that are distributed in an array of balled-up islands over the buffer layer to produce an etch mask, reactive ion etching the buffer layer partially into the substrate material using the etch mask to create an array of pillar structures of the buffer layer material and the substrate material underneath the etch mask, removing the etch mask, and coating the array of pillar structures with a hydrophobic layer of a hydrophobic material. The pillar structures have a shape that includes straight cylinder, negatively tapered rod, and/or cone and are aligned vertical. The step of adding the film layer comprises depositing the film layer over the buffer layer in periodic patterns. The pillar structures are configured to a size and shape based on the time, power and gas pressure of the performing reactive ion etching. The coating step comprises dip coating the array of pillar structures into a thin layer of uncured polytetrafluoroethylene (PTFE), polydimethylsiloxane or poly(methyl methacrylate) to form a mushroom-shaped tip. The buffer layer has a thickness of 0.5 nm to 50 mu m. The film layer has a thickness of 0.5 nm to 1 mu m. The etching step comprises performing an anisotropic chemical etching process that uses a directional jet flow of an etchant solution, directional blow of nanoparticles or microparticles for sand blasting, and/or a mixture of liquid solution or etchant with nanoparticles or microparticles. INDEPENDENT CLAIMS are included for:    (1) a device comprising an enhanced nanostructure surface;    (2) a method of fabricating a superhydrophobic coating on a surface;    (3) a method of fabricating a superomniphobic coating on a surface of a solar cell panel;    (4) a method for fabricating a enhanced nanostructure surface with impregnated and trapped liquid to render a surface superhydrophobic, superoleophobic or superhydrophilic;    (5) a display screen comprising an enhanced nanostructure surface; and    (6) an anti-fingerprint surface structure.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic view of a process for preparation of superomniphobic surface.    Superomniphobic surface (300)    Substrate (301)    Buffer layer (302)    Nanostructure array (303)    Coating material. (304)