NOVELTY - A material with a pillar array surface is fabricated by depositing a buffer layer (302) of a buffer layer material on a substrate material, where the buffer layer material is a silicon (Si)-containing material. A film layer is added over the buffer layer. The film layer is annealed to form balled-up structures that are distributed in an array of balled-up islands over the buffer layer to produce an etch mask. The buffer layer is etched using the etch mask to create an array of pillar structures of the buffer layer material underneath the etch mask.    USE - Method of fabricating a material with a pillar array surface used for a display viewing screen for touch-sensitive screens of cell phone, smart phone, tablet, and other display devices (claimed).    ADVANTAGE - The method can fabricate materials having nanoscale and microscale structures that exhibit superhydrophobic or superomniphobic surface properties and mechanical and chemical durability. An enhanced nanostructure surface exhibits greater than or equal to 5% increased contact angle than the substrate alone. A superhydrophobic coating has properties including corrosion resistant, self-cleaning surface characteristics, water repellent, and water droplet contact angle of greater than or equal to 1500. A superomniphobic coating has properties including self-cleaning surface characteristics, strong light absorption, and optical transparency. Further, nanostructure surface repels fingerprints.    DETAILED DESCRIPTION - Fabrication of a material with a pillar array surface comprises depositing a buffer layer (302) of a buffer layer material on a substrate material, where the buffer layer material is a Si-containing material. A film layer is added over the buffer layer. The film layer is annealed to form balled-up structures that are distributed in an array of balled-up islands over the buffer layer to produce an etch mask. The buffer layer is etched using the etch mask to create an array of pillar structures of the buffer layer material underneath the etch mask. The pillar structures have a shape that includes at least straight cylinder, negatively tapered rod, or cone and are aligned vertical. INDEPENDENT CLAIMS are included for:    (1) a device comprising an enhanced nanostructure surface having an array of Si-containing nanopillars on a substrate (301) with enhanced superhydrophobic, superoleophobic or superomniphobic surface characteristics, where the nanopillars have diameter and height of 10 nm to 10 mu m;    (2) fabrication of a superhydrophobic coating on a surface, comprising depositing layer(s) of paint on the surface; performing a nano imprinting process comprising imprinting a stamp on the surface when the paint is partially dry, where the stamp has an arrangement of nanopillar tips on its surface, and releasing the stamp, where a nanostructure imprint in the shape of the nanopillar tips is imprinted on the surface; and depositing a thin layer of a coating material (304) over the surface;    (3) fabrication of a superomniphobic coating on a surface of a solar cell panel, comprising depositing a uniform layer of a paste or slurry on the surface of the solar cell panel, where the paste or slurry comprises nanoparticles mixed with a precursor, a binder, and a solvent; performing a nano imprinting process comprising imprinting a stamp into the uniform layer when the paste or slurry is partially dry, where the stamp includes an array of nanopillar structures that have nanopillar tips, and releasing the stamp, where a nanostructure imprint having a shape of the array of nanopillar tips is imprinted into the uniform layer; curing or drying the uniform layer; and depositing a thin layer of a coating material over the surface;    (4) fabrication of a nanostructure surface with impregnated and trapped liquid to render a surface superhydrophobic, superoleophobic or superhydrophilic, comprising coating a liquid on a surface with an arrangement of nanopores, applying a pressure that impregnates and traps the liquid into the nanopores, and releasing the pressure;    (5) a display screen comprising an enhanced nanostructure surface having an array of Si-containing nanopillars on a substrate with enhanced superhydrophobic, superoleophobic or superomniphobic surface characteristics, where the enhanced nanostructure surface is optically transparent and exhibits wear resistant and anti-fingerprint surface properties;    (6) fabrication of an anti-fingerprint surface coating structure, comprising depositing a transparent buffer layer of a buffer layer material on a transparent substrate material, where the transparent buffer layer material is a silicon-containing material; adding a mask layer of a mask layer material over the transparent buffer layer, where the adding includes patterning the mask layer material to form a patterned mask; and etching the transparent buffer layer using the patterned mask to create an array of pillar structures of the transparent buffer layer material underneath the patterned mask, where the pillar structures have a shape that includes straight cylinder, negatively tapered rod, or cone and are aligned vertical; and    (7) an anti-fingerprint surface structure, comprising an array of nanopillars within grids of crisscrossed grid lines of a line spacing and a line width on a transparent substrate, where the pillars have a shape that includes straight cylinder, negatively tapered rod, or cone and are aligned vertical to render the anti-fingerprint surface structure with superhydrophobic, superoleophobic, or superomniphobic surface properties.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram for preparation of omniphobic nanosurfaces.    Omniphobic surface (300)    Substrate (301)    Buffer layer (302)    Nanostructure array (303)    Coating material (304)