NOVELTY - The non-fluorine solar cell back film comprises a non-fluorine polyethylene naphthalate material layer (1), a substrate (2) and a polyolefin adhesion layer (3). A polymeric adhesive layer is placed between: the non-fluorine polyethylene naphthalate material layer and the substrate; and the substrate and the polyolefin adhesion layer. Both sides of the non-fluorine polyethylene naphthalate material layer have a fluorinated siloxane film-forming layer (11). Both sides of the substrate have a nitrogen siloxane film-forming layer (21).    USE - Used as a non-fluorine solar cell back film.    ADVANTAGE - The non-fluorine solar cell back film can be simply prepared with high productivity in a convenient manner.    DETAILED DESCRIPTION - The non-fluorine solar cell back film comprises a non-fluorine polyethylene naphthalate material layer (1), a substrate (2) and a polyolefin adhesion layer (3). A polymeric adhesive layer is placed between: the non-fluorine polyethylene naphthalate material layer and the substrate; and the substrate and the polyolefin adhesion layer. Both sides of the non-fluorine polyethylene naphthalate material layer have a fluorinated siloxane film-forming layer (11). Both sides of the substrate have a nitrogen siloxane film-forming layer (21). The substrate is a polyethylene terephthalate substrate or a polymeric alloy substrate formed by thermally melting and blending polyethylene terephthalate and polybutylene terephthalate. A content of the polybutylene terephthalate or polyethylene terephthalate is 1-50 parts by weight (pbw). The substrate has a thickness of 0.1-10 mm. The non-fluorine polyethylene naphthalate material layer is a film layer composed of high polymers of a polyethylene naphthalate resin system, contains 75-100 pbw of polyethylene naphthalate resin, and has a thickness of 0.01-0.1 mm. The polyolefin adhesion layer has a thickness of 0.01-0.1 mm. The polymeric adhesive layer has a thickness of 0.005-0.03 mm. The nitrogen siloxane film-forming layer is formed at both sides of the substrate by plasma nitrogen siloxane treatment, and has a thickness of 0.01-5 mu m. The fluorinated siloxane film-forming layer is formed at both sides of the non-fluorine polyethylene naphthalate material layer by plasma fluorinated siloxane treatment, and has a thickness of 0.01-5 mu m. An INDEPENDENT CLAIM is included for a method of processing non-fluorine solar cell back film.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic view of a non-fluorine solar cell back film.    Non-fluorine polyethylene naphthalate material layer (1)    Substrate (2)    Polyolefin adhesion layer (3)    Fluorinated siloxane film-forming layer (11)    Nitrogen siloxane film-forming layer. (21)