NOVELTY - A transparent gas barrier film comprises transparent gas barrier layer which is formed on resin substrate and is a laminated body consists of 1st inorganic layer containing metal, semi-metal, and/or nitrogen and 2nd inorganic layer which is formed by sputtering method using target (17) containing metal carbide and/or carbonized semi-metal and consists of metal, semi-metal, carbon, and/or hydrogen.    USE - A transparent gas barrier film for organic electroluminescent element, solar cell, thin film battery (all claimed), field emission display apparatus, LCD device, and electric double layer capacitor.    ADVANTAGE - Gas barrier property is excellent, and high transparency is achieved.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for:    (1) manufacturing method of transparent gas barrier film which involves forming 1st inorganic layer containing metal, semimetal, and/or nitrogen on resin substrate, performing sputtering method using hydrogen-containing gas as reactive gas on target containing metal carbide and carbonized semi-metal on 1st inorganic layer, and forming 2nd inorganic layer containing metal, semi-metal, carbon, and/or hydrogen;    (2) organic electroluminescent element containing anode layer, organic light emitting layer, and cathode layer which are laminated in this order on a substrate which is a transparent gas barrier film;    (3) solar cell containing photovoltaic cell which is covered with transparent gas barrier film; and    (4) thin film battery containing current collection layer, anode layer, solid electrolyte layer, cathode layer, and current collection layer which are laminated in this order to form laminated body covered with transparent gas barrier film.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of an apparatus for manufacturing transparent gas barrier film with a batch production system.    Cathode (16)    Target (17)    Gas supply part for sputtering (18)    Reactive-gas supply part (19)    Vacuum pump (20)