NOVELTY - Preparation of a multilayer transparent conductive thin film comprises washing a substrate (1) with acetone, ethanol, and deionized water, and drying using pure nitrogen; placing the substrate in a magnetic control sputtering reaction chamber, vacuumizing the chamber at greater than or equal to 3.8x 104 Pa, and inletting pure argon gas at 0.5-5 Pa; radio frequency sputtering depositing zinc sulfide (ZnS)-silicon dioxide (SiO2) film layer (2); direct current (DC) sputtering deposition silver (Ag) film layer (3) at 30-50 W; and radio frequency sputtering depositing ZnS-SiO2 film layer at 80-100 W.    USE - Method for the preparation of a multilayer transparent conductive thin film used for flat panel display, touch screen, gas sensor, light emitting diode, and solar battery.    ADVANTAGE - The method obtains high environmental stability transparent conductive film with more than 80% average transmission rate and less than 15 ohm/square surface resistance.    DETAILED DESCRIPTION - Preparation of a multilayer transparent conductive thin film comprises:    (A) washing a substrate (1) with acetone, ethanol, and deionized water, and drying using pure nitrogen;    (B) placing the substrate in a magnetic control sputtering reaction chamber, vacuumizing the chamber at greater than or equal to 3.8x 104 Pa, and inletting pure argon gas at 0.5-5 Pa as working gas;    (C) radio frequency sputtering depositing ZnS-SiO2 film layer (2) at 80-100 W, and adjusting the sputtering time to control the thickness of the film layer at 30-45 nm, where the ZnS-SiO2 target contains not greater than 20 wt.% SiO2;    (D) DC sputtering deposition Ag film layer (3) at 30-50 W, adjusting the sputtering time to control the thickness of the film layer at 5-18 nm; and    (E) radio frequency sputtering depositing ZnS-SiO2 film layer at 80-100 W, and controlling the ZnS-SiO2 thickness of the film layer at 30 to 45nm.    The multilayer film is annealed for 0.5-1 hour at 80-300 degrees C.    DESCRIPTION OF DRAWING(S) - The drawing is a schematic diagram of the multilayer transparent conductive thin film.    Substrate (1)    Zinc sulfide-silicon dioxide film layer (2)    Silver film layer (3)