NOVELTY - An article comprises: transparent support (12), color mask having colored pattern on transparent support, and patterned layer of functional material (40) on same side of transparent support as color pattern, where patterned layer of functional material is in register with colored pattern on transparent support. The patterned layer of functional material is conductive, dielectric, semiconductive, or passivating; and is not transparent.    USE - As article comprising color mask and patterned functional layer (preferably transistor) (claimed) such as thin film transistor (TFT), useful for forming electrical and optical components such as thin film semiconductors, dielectrics, conductors, resistors, capacitors, inductors, diodes, photodiodes, light emitting diodes, other electronic or optoelectronic components, and optically functional components; where optically functional components comprise waveguides, lenses, splitters, diffusers, brightness enhancing films, and other optical circuitry; electronic devices in which TFTs and other devices are useful include complex circuits e.g. shift registers, integrated circuits, logic circuits, smart cards, memory devices, radio-frequency identification tags, backplanes for active matrix displays, active-matrix displays (e.g. LCD or organic light emitting diode (OLED)), solar cells, ring oscillators, and complementary circuits such as inverter circuits e.g. in which combination of n-type and p-type transistors are used; and microelectronic device is e.g. active-matrix liquid-crystal display (AMLCD).    ADVANTAGE - The article, such as transistor can be prepared by colored masking technique, which facilitates highly accurate patterning of materials coated on various supports, is simple, and solves problems even when using flexible or other supports. The colored masking technique reproduces patterned features even across large areas while having precise control over feature dimensions, and registration and alignment of patterned features that are in different layers; and does not require expensive equipment or expensive processes. The method forms patterned layers without need for equipment and processes to compensate for substrate distortions. The color mask is prepared directly on support ensuring that correct mask is used. The color mask has advantage of being physically close to layer(s) to be pattern allowing for fine features to be patterned. Additionally, color mask may be used in conjunction with other masking and patterning techniques to form more complicated structures. Because color mask is prepared directly on support and is fully viewable, color mask serves to simplify critical alignments in fabrication, particularly for fabrication of transparent electronic structures.    DESCRIPTION OF DRAWING(S) - The figure shows process for selectively forming pattern of material registered with red color absorber pattern of color mask in article.    Transparent support (12)    Photopatternable material (40)