NOVELTY - Formation of metal alloys involves: depositing at least one precursor composition on at least one substrate to form at least one deposited structure, where the precursor composition comprises at least two metal complexes, including at least one first metal complex having at least one first metal and at least one second metal complex different from the first metal complex and having at least one second metal different from the first metal; and treating the deposited structure so that the first and second metals form elemental forms of the first and second metals in a treated structure.    USE - For formation of metal alloys useful in drop casting, spin coating, ink jet printing, roll-to-roll, slot-die, gravure, microcontact printing, and flexographic printing (claimed); also useful as structural material; as indium-tin-oxide (ITO) replacement; as magnetic material; as a framework for other materials; as a sensor such as glucose sensors; and in various applications including transparent conductors or waveguides; organic electronic devices such as organic photovoltaic devices and electroluminescent devices, electrodes, and interconnects; heterogeneous catalysis such as hydrogenation and oxidation; and bioanalyte detection; electrodes; fuel cells such as gas diffusion membranes; metal grids; and biodiagnostics.    ADVANTAGE - The composition is homogeneous and/or completely miscible composition. The method forms porous metal networks that display high conductivity and flexibility; provides high optical transparency including increased transparency upon etching; has ability to form homogeneous inks which allow for an intimate alloy to be formed; provides ease of controlling film stoichiometry; has ability to tune physical properties of the end product, such as work function, adhesion, for e.g. adhesion to the underlying substrate can be better controlled; has low temperature processing; does not use expensive and cumbersome vacuum conditions and equipment for processing; has ability to tune and control closely the atomic ratio of the metals in the alloy, and this can allow for e.g. tuning of work function, that can be important for, for e.g. lowering the overpotential for charge injection into organic semiconductive devices; lowers cost by using a less expensive metal as a filler component in an alloy; provides an excellent, high surface area, porous medium for detection of various analytes e.g. for carrying out metal plasmon frequency monitoring; and has ability to recycle metal which has been removed.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following:    (1) a composition (C1) comprising: at least one first metal complex, where the first metal complex comprises a first metal and at least one first ligand and at least one second ligand, different from the first ligand, for the first metal; at least one second metal complex, which is different from the first metal complex, and comprises a second metal and at least one first ligand and at least one second ligand, different from the first ligand, for the second metal; at least one solvent, where (i) the selection of the amount of the first metal complex and the amount of the second metal complex, (ii) the selection of the first ligands and the selection of the second ligands for the first and second metals, and (iii) the selection of the solvent are adapted to provide a homogeneous composition; and    (2) a method involving: combining at least one first precursor composition comprising at least one first metal complex and at least one first solvent, and at least one second precursor composition comprising at least one second metal complex different from the first and at least one second solvent, where the amounts of the first and second precursor compositions, the first and second solvent, and the ligands of the first and second metal complexes are selected to form a homogeneous composition.