NOVELTY - A transparent gas-barrier film consists of a transparent gas-barrier layer formed on a resin substrate (3). The gas-barrier layer is a laminate of an inorganic layer and a carbon-containing layer. The inorganic layer is formed by vapor deposition using arc discharge plasma, and contains metal and/or semimetal, and oxygen and/or nitrogen. The carbon-containing layer is formed by vapor deposition using arc discharge plasma, and contains metal and/or semimetal, and carbon.    USE - Transparent gas-barrier film is used for organic electroluminescent elements used for field emission displays and LCDs, solar cells e.g. copper-indium-gallium diselenide solar cells, and thin film batteries (all claimed) e.g. thin film lithium ion batteries. Can also be used for electrical double layer capacitors.    ADVANTAGE - The transparent gas-barrier film has excellent gas-barrier property and can be manufactured efficiently.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following:    (1) manufacture of transparent gas-barrier film, which involves generating arc discharge plasma (4), forming inorganic layer by vapor-depositing metal, semimetal, or nitride and/or oxide of metal or semimetal on a substrate in the presence of a reactive gas containing oxygen gas and/or nitrogen gas, generating arc discharge plasma, forming carbon-containing layer by vapor-depositing metal, semimetal, or nitride and/or oxide of metal or semimetal on the substrate in the presence of reactive gas containing hydrocarbon gas and/or oxygen gas;    (2) organic electroluminescent element consisting of an anode layer, an organic light-emitting layer, and a cathode layer provided sequentially on the transparent gas-barrier film used as substrate;    (3) solar cell consisting of a photovoltaic cell covered with the transparent gas-barrier film; and    (4) thin film battery consisting of a laminate of a current collection layer, an anode layer, a solid electrolyte layer, a cathode layer, and a current collection layer, covered with the transparent gas-barrier film.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the apparatus used for manufacturing transparent gas-barrier film.    Vacuum chamber (1)    Substrate (3)    Arc discharge plasma (4)    Vapor deposition material (8)    Manufacturing apparatus (100)