TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electroconductive layer contains conductive region and non-conductive region. The conductive region contains the metal nanowire. The metal nanowire is silver nanowire. Preferred Properties: The surface resistivity of protective layer is 108 ( Omega )/square or more, after immersing in the etching liquid. The difference between the haze value before immersing in etching liquid and haze value after immersing in etching liquid of electroconductive component is 0.4% or more. The weight average molecular weight of electroconductive component is 4000-90000. The ratio of surface resistivity of electroconductive layer before and after the abrasion process preformed using continuous load scratch-test machine is 100 or less. The ratio of surface resistivity of electroconductive layer before and after the bending process is 2 or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The protective layer contains alkoxide compound of formula: M2(OR1)4 (II) or M3(OR2)aR3 (III). The mass ratio of alkoxide compound (II) and alkoxide compound (III) is 0.01/1-100/1.M2=silicon, titanium or zirconium, preferably silicon;R1=H or hydrocarbyl;M3=M2;R2,R3=R1;anda=1-3.Preferred Process: The electroconductive component is immersed in an etching liquid at 25 degrees C for 120 seconds. The protective layer component is not removed after immersion. The matrix is sol-gel cured material obtained by hydrolyzing, polycondensing and photocuring a photopolymerizable composition containing alkoxide compound of element chosen from silicon, titanium, zirconium and aluminum. The protective layer is sol-gel cured material obtained by hydrolyzing and polycondensing alkoxide compound of element chosen from silicon, titanium, zirconium and aluminum. Preferred Composition: The etching liquid is aqueous solution containing (in %mass) ethylenediaminetetraacetic acid ferric ammonium salt (2.5), ammonium thiosulfate (7.5), ammonium sulfite (2.5) and ammonium bisulfite (2.5).