NOVELTY - Preparing inorganic features (M1) with patterned nanostructures, comprises: providing a block copolymer scaffold containing first and second polymers; selecting first metal precursor configured to be reactive with first polymer and non-reactive with second polymer; selecting second co-reactant precursor configured to react with first precursor; and performing at least one cycle with block copolymer scaffold, comprising exposing the block copolymer scaffold to first metal precursor for a first period, and exposing the block copolymer scaffold to second co-reactant precursor for a second period.    USE - The methods are useful for: preparing an inorganic ordered nanoscale domain within a block copolymer; and preparing inorganic features with patterned nanostructures (all claimed) that are useful in photovoltaic devices, structural supports for a separation membrane in a battery, a fluid filtration membrane, filtering and/or guiding selected wavelengths of light, as active channel material in a transistor, as an array emitter or a field emitter, a three-dimensional electrical contact, or a catalyst.    ADVANTAGE - The method provides desirable nanoscale structures at low cost, and offers a high degree of molecular level control while maintaining large-scale uniformity and tunable modularity of the nanostructures.    DETAILED DESCRIPTION - Preparing inorganic features (M1) with patterned nanostructures, comprises: providing a block copolymer scaffold containing at least a first polymer and a second polymer, where the block copolymer includes many self-assembled periodic polymer nanostructures; selecting a first metal precursor configured to be reactive with the first polymer and non-reactive with the second polymer; selecting a second co-reactant precursor configured to react with the first precursor; and performing at least one cycle with the block copolymer scaffold comprising exposing the block copolymer scaffold to the first metal precursor for a first period to bind the first metal precursor with the first polymer, and exposing the block copolymer scaffold to the second co-reactant precursor for a second period to react with the first metal precursor bound to the first polymer and forming the inorganic features on the first polymer. INDEPENDENT CLAIMS are also included for:    (1) preparing (M2) an inorganic ordered nanoscale domain within a block copolymer, comprising: providing a block copolymer containing many ordered polymer nanoscale domains characterized by a reactive functional group; selectively binding a first precursor to the reactive functional group in a self-limited reaction, where the first precursor includes a first metal; reacting a second precursor with the bound first precursor and forming an inorganic feature containing the first metal localized within the nanoscale domains within the block copolymer; removing the block copolymer to obtain many inorganic features having a structure defined by the configuration of the nanoscale domains within the block copolymer prior to removal, where the block copolymer is free of the reactive functional group outside of the ordered polymer nanoscale domains; and    (2) a nanocomposite organic/inorganic material, comprising: a block copolymer containing a first polymer and a second polymer covalently bonded to the first polymer, where the first polymer defines many self-assembled ordered microdomains disposed within the second polymer, and the first polymer includes at least one functional group absent from the second polymer; and an inorganic material disposed within each of the ordered microdomains, where the material comprises at least one metal oxide selectively bound to at least one functional group, and the metal oxide is not bound to the second polymer.