NOVELTY - The apparatus has a pump (42) operated for pumping gas from a sub-atmospheric pressure deposition chamber (4) through a vent (41) to create the pressure condition in the chamber. A roll-to-roll substrate conveyor (3) is located in the chamber for conveying a substrate such that a vertical section of the substrate travels past large area vertical planar atmospheric pressure plasma nitrogen activation electrode assemblies (1a, 1b) while another vertical section of the substrate travels past a large area vertical planar atmospheric pressure nitrogen plasma deposition electrode assembly.    USE - Large area atmospheric pressure plasma enhanced chemical vapor deposition apparatus. Uses include but are not limited to manufacture an anti-scratch plastic lens, an anti-reflection film of a display of a personal digital assistant (PDA), a cell phone or a digital camera, an anti-erosion film, an organic LED (OLED), a thin-film cell, an organic solar cell, an inorganic solar cell and an LED.    ADVANTAGE - The apparatus prevents the deposited film contaminations in the electrode assembly interior and the debris of the deposited films from exterior of the electrode assembly and the air aerosols in the deposition chamber, and achieves roll-to-roll uniform deposition to meet a roll-to-roll continuous production, thus achieving improved film quality, increased production throughput and reduced manufacturing cost. The apparatus allows a gap between electrode assemblies to be small, so that inexpensive nitrogen gas can be used as the plasma gas. The apparatus allows plasma to be sprayed horizontally from the plasma jets of the grounded electrode assembly, and the precursor for deposition is sprayed vertically to intersect the ejected plasma jets and is decomposed by the plasma outside the grounded electrode assembly, so that the interior of the nitrogen gas plasma deposition electrode assembly is not contaminated by the decomposed precursor. The plasma activation electrode assembly, the plasma deposition electrode assembly and the surface section of the substrate to be treated are positioned vertically to avoid peeled fragments of the deposition and aerosols in the deposition chamber from falling on the substrate. The apparatus allows a uniform plasma gas distributor, well overlapped plasma spraying orifices of the grounded electrode assembly and the plasma spraying orifices of a long-line uniform precursor distributor to provide excellent and uniform large area plasma deposition.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of an apparatus for large area atmospheric pressure nitrogen plasma enhanced chemical vapor deposition on a roll of substrate.    Large area vertical planar atmospheric pressure plasma nitrogen activation electrode assemblies (1a, 1b)    Roll-to-roll substrate conveyor (3)    Sub-atmospheric pressure deposition chamber (4)    Vent (41)    Pump (42)