NOVELTY - Manufacture of solar cell comprises forming microstructure including texturing on surface of semiconductor substrate (210); forming nanostructures (220) on surface of substrate; forming emitter layer (230) by implanting impurities in front face of substrate; forming anti-reflective coating (ARC) (240) on emitter layer; forming front electrode (250) passing through portion of ARC and being connected to emitter layer; and forming back electrode (260) on rear face of substrate such that rear face is opposite to face on which front electrode is formed.    USE - Manufacture of solar cell (claimed).    ADVANTAGE - The method provides solar cell that is capable of reducing reflectance of solar light regardless of wavelength region of solar light.    DETAILED DESCRIPTION - Manufacture of solar cell comprises forming microstructure including texturing on surface of first conductive type semiconductor substrate (210); forming nanostructures (220) on surface of substrate; forming emitter layer (230) by implanting impurities of second conductive type opposite to first conductive type in front face of substrate; forming anti-reflective coating (ARC) (240) on emitter layer; forming front electrode (250) passing through portion of ARC and being connected to emitter layer; and forming back electrode (260) on rear face of substrate such that rear face is opposite to face on which front electrode is formed. The nanostructures are formed by deep reactive ion etching (DRIE) to form nanotips, or by consecutively twice performing DRIE to form silicon nanotips. They are preferably formed by covering front face of semiconductor substrate with photosensitive layer and forming photosensitive layer on it; forming photosensitive layer in given shape by selectively exposing photosensitive layer to UV rays; and performing first DRIE and forming nanotips on one face of substrate via deposition gas and etching gas. It further comprises removing photosensitive layer; and performing second DRIE via deposition gas and etching gas; and forming nanotips on one face of substrate. The first DRIE is performed to form scallop of wave pattern on substrate. The second DRIE is performed to form nanotips on substrate. The front and back electrodes are formed by printing.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of solar cell.    Substrate (210)    Nanostructures (220)    Emitter layer (230)    Anti-reflective coating (240)    Front electrode (250)    Back electrode (260)