NOVELTY - The semiconductor processing system comprises a process chamber (102) for processing a substrate with a liquid reagent, a reagent source (104), a reagent recovery system (106), a conduit (110), and an abatement system (108). The reagent source is coupled to the process chamber to provide the liquid reagent to the process chamber. The reagent recovery system is configured to collect and purify or concentrate the reagent recovered from an effluent exhausted from the process chamber and to collect reagent removed from the process chamber.    USE - The semiconductor processing system is useful for processing substrates for recovering an unreacted reagent (claimed), where the substrate includes a liquid crystal display substrate, a plasma display substrate, an electro luminescence lamp display substrate, a solar cell array substrate and a LED substrate.    ADVANTAGE - The semiconductor processing system reduces a need for production, transportation, and/or storage of hazardous reagents on roads or shipping lanes, and efficiently recovers the used reagents from the effluent process chamber.    DETAILED DESCRIPTION - The semiconductor processing system comprises a process chamber (102) for processing a substrate with a liquid reagent, a reagent source (104), a reagent recovery system (106), a conduit (110), and an abatement system (108). The reagent source is coupled to the process chamber to provide the liquid reagent to the process chamber. The reagent recovery system: is configured to collect and purify or concentrate the reagent recovered from an effluent exhausted from the process chamber and to collect reagent removed from the process chamber and to purify and adjust a concentration of the collected reagent to the concentration and purity suitable for use in the process chamber; is coupled to the process chamber; is integrated with the abatement system; and comprises a scrubber, a vacuum distillation apparatus and a bubbler. The conduit is configured for providing the recovered reagent to the reagent source and/or to a second process system. The abatement system is coupled to the process chamber to abate the effluent exhausted from the process chamber, comprises a thermal combustion apparatus and/or a hydrogen injection apparatus for converting a portion of the exhaust effluent into an useable reagent, and is configured to abate a fluorine-containing effluent exhausted from the process chamber and to convert a portion of the fluorine-containing effluent into hydrogen fluoride. The scrubber is configured for separating an unreacted reagent from an insoluble portion of the exhausted effluent by solubilizing the unreacted reagent. The vacuum distillation apparatus is configured for separating the solubilized unreacted reagent from a remaining portion of the exhausted effluent. The remaining portion of the exhausted effluent includes water-soluble byproduct species. The bubbler is configured for adding water to the distilled unreacted reagent to the concentration suitable for use in the reagent source. An INDEPENDENT CLAIM is included for a method for recovering unreacted reagent.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic view of a semiconductor processing system.    Process chamber (102)    Reagent source (104)    Reagent recovery system (106)    Abatement system (108)    Conduit. (110)