NOVELTY - The method comprises attaching a first material container cartridge (12) containing a material to be processed to a processing chamber (14), heating the material in a reduced oxygen atmosphere in the processing chamber to produce gas, channeling the gas from the processing chamber to a treatment chamber in which the gas is heated to destroy volatile organic compounds, recirculating the gas from the treatment chamber back into the processing chamber, and modifying a moisture content of the gas recirculating from the treatment chamber to the processing chamber in a first mode of operation.    USE - The method is useful for processing a material such as organically coated waste and organic materials including biomass, industrial waste, municipal solid waste and sludge to produce syngas or other combustible gasses, where the syngas is useful in an engine.    ADVANTAGE - The method is capable of simply, economically, rapidly and efficiently processing the material with less energy consumption and without additional water consumption.    DETAILED DESCRIPTION - The method comprises attaching a first material container cartridge (12) containing a material to be processed to a processing chamber (14), heating the material in a reduced oxygen atmosphere in the processing chamber to produce gas, channeling the gas from the processing chamber to a treatment chamber in which the gas is heated to destroy volatile organic compounds, recirculating the gas from the treatment chamber back into the processing chamber, and modifying a moisture content of the gas recirculating from the treatment chamber to the processing chamber in a first mode of operation by passing the gas through a second material container cartridge containing material to be processed. The material present in the second material container cartridge is maintained at a temperature of 20-65 degrees C such that the moisture within the gasses condensates in the second material container cartridge to reduce the water vapor (H2O) content of the gas. The temperature of the material in the second material container cartridge is raised from its ambient temperature to a temperature of less than 65 degrees C by the recirculating gasses. Some of the material in the second material container cartridge is raised to a temperature of 100 degrees C to evaporate moisture from the material for increasing the H2O content of the gas. The method further comprises: increasing the H2O content of the gas in a second mode of operation by passing the gas recirculating from the treatment chamber to the processing chamber through a third material container cartridge; directly recirculating the gas from the treatment chamber to the processing chamber in a further mode of operation; monitoring the moisture content of the gas; selectively operating in one of the modes of the operation to maintain the moisture content in the gas; monitoring the gas produced in the processing chamber to identify when the material in the processing chamber is fully processed; removing the first material container cartridge from the processing chamber when the material in the processing chamber is fully processed; attaching the third material container cartridge to the processing chamber for processing the material, replacing the third material container cartridge with the second material container cartridge, and replacing the second material container cartridge with a fourth material container cartridge containing material to be processed at ambient temperature. The temperature of the material in the third material container cartridge is raised to a temperature of 100 degrees C by the recirculating gasses to evaporate moisture from the material. An INDEPENDENT CLAIM is included for an apparatus for processing a material.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic view of a system for processing a material.    Material container cartridge (12)    Processing chamber (14)    Thermal reactor (20)    Heat exchanger (24)    Scrubber. (26)