NOVELTY - Forming a dense film, comprises: formulating (352) an ink of particles, where greater than or equal to 50% of all the particles are microflakes, each containing at least one element of group IB, IIIA and/or VIA and having a non-spherical, planar shape with irregular, jagged circumferential outline, and overall amounts of the elements contained in the ink are such that the ink has a desired stoichiometric ratio of the elements; coating (354) a substrate with ink to form precursor layer; and processing precursor layer in a suitable atmosphere to form a dense film, where liquid group IIIA material is included in ink.    USE - The method is useful for forming a dense film which is useful in the formation of a semiconductor absorber for a photovoltaic device (all claimed) or a solar cell.    ADVANTAGE - The method provides higher yields of high quality precursor layers in a simple and cost effective manner.    DETAILED DESCRIPTION - Forming a dense film, comprises: formulating (352) an ink of particles, where greater than or equal to 50% of all the particles are microflakes, each containing at least one element of group IB, IIIA and/or VIA and having a non-spherical, planar shape with irregular, jagged circumferential outline, and overall amounts of the elements contained in the ink are such that the ink has a desired stoichiometric ratio of the elements; coating (354) a substrate with the ink to form a precursor layer; and processing the precursor layer in a suitable atmosphere to form a dense film, where at least one set of the particles in the ink are inter-metallic microflake particles containing at least one group IB-IIIA inter-metallic alloy phase, and liquid group IIIA material is included in the ink.    DESCRIPTION OF DRAWING(S) - The figure illustrates a flowchart of a method for forming a dense film.    Create microflakes (350)    Wash microfalkes (351)    Formulate ink containing microflakes (352)    Coat substrate to form precursor layer (354)    Removal step (355)