NOVELTY - The method comprises providing a substrate (105), providing a conductive composition comprising metal particles, a non-acid protic solvent and a high polarity solvent, and heating the composition to a temperature less than 200 degrees C to consolidate the metal particles and to form a conductive feature on the substrate having less than ten times the resistivity of bulk copper. The non-acid protic solvent and high polarity solvent are present in concentrations sufficient to ionize the non-acid protic solvent and remove oxides, when the solvents are heated.    USE - The method is useful for forming a conductive feature such as an electrode for the thin film photovoltaic cell and a crystalline silicon photovoltaic film (claimed).    ADVANTAGE - The method is capable of simply, rapidly, efficiently and economically forming the conductive feature at low temperatures with high electrical conductivity, durability, electro migration resistance and reliability, low self diffusivity and reduced energy consumption.    DETAILED DESCRIPTION - The method comprises providing a substrate (105), providing a conductive composition comprising metal particles, a non-acid protic solvent and a high polarity solvent, and heating the composition to a temperature less than 200 degrees C to consolidate the metal particles and to form a conductive feature on the substrate having less than ten times the resistivity of bulk copper. The non-acid protic solvent and high polarity solvent are present in concentrations sufficient to ionize the non-acid protic solvent and remove oxides, when the solvents are heated. The metal particles: include nanometer and/or micrometer-sized particles; have a diameter of 1 micrometer particles and 60 nanometer particles; and are copper powder. The conductive composition is devoid of metal precursor compounds. The substrate is a thin film photovoltaic cell having a transparent conductive oxide layer (103) and a film stack comprising an antireflective coating, and a crystalline silicon p-n junction-based solar cell, and comprises a crystalline silicon solar cell, and a patterned surface. The step of providing the conductive composition includes direct screen printing of the conductive composition onto the patterned surface. The patterned surface is formed by selective removal of portions of a dielectric film and deposition of a barrier layer in the removed positions. An INDEPENDENT CLAIM is included for a conductive composition.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of a thin film solar cell.    Silicon-based thin film solar cell device (100)    Light absorbing layer (101)    Transparent conductive oxide layer (103)    Electrically conductive substrate (105)    Charge collecting electrode. (107)