TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: The modification of the surface comprises the laser, which generates micro dislocations, microcracks, micro holes and/or micro depressions in the surface, and/or the modification of the surface with the laser comprises passing the material of the surface through a phase change. The phase change of a material of the surface takes place in a respective point with an extension of greater than or equal to 100 nm, preferably greater than or equal to 1 micro m, and/or less than or equal to 5 micro m, preferably lessthan or equal to 2 micro m in the direction parallel to the surface, with a respective pulse of the laser. The phase change takes place in many points. The modification of the surface comprises the laser, which generates micro dislocations, microcracks, micro holes and/or micro depressions in the surface, which are substantially arranged circularly, hexagonally, and/or randomly distributed and are not contiguous, where a displacement length is greaterthan or equal to 100 nm, preferably greaterthan or equal to 1 micro m, and/or lessthan or equal to 5 micro m, preferably lessthan or equal to 2 micro m. The surface is modified by the irradiation of the laser to a depth of lessthan or equal to 1micro m, preferably lessthan or equal to 10 nm. The laser is a pulsed laser, preferably with pulse duration of lessthan or equal to 1 micro s, preferably lessthan or equal to 100 fs. The irradiation of the surface with the laser does not altered the topography of the surface or alters a small area such that the deviations of the surface of its topography before irradiation with the laser is lessthan or equal to 0.5 micro m, preferably lessthan or equal to 100 nm. The etching process comprises dry-reactive etching, plasma etching and/or wet chemical etching. The etching process is carried out subsequent to the irradiation of the surface with the laser. The surface is occupied by at least in modified area with nanoparticles, preferably gold nanoparticles, before irradiation with the laser, and that the laser is an infrared laser. The irradiation of the surface with the laser is carried out in a corrosive medium, preferably in carbon tetrafluoride, in which etching effect is caused by a local field enhancement in sequence of surface plasmon formation on the nanoparticles. The laser scans the areas of the surface to be modified for the modification of the surface by a galvanometric scanner, preferably by a polygon scanner. The surface is a surface of a solar cell, the structuring of the surface results in a reduction in the reflection of light on the surface, the surface is a surface of a light-emitting diode, preferably an organic light-emitting diode, and improves structuring of the light coupling, or the surface is a surface of a light scattering structure or that causes a change in the structuring of a functional property of the surface, preferably the hydrophilicity or hydrophobicity. EXAMPLE - No suitable example given.