TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silica compound is chosen from silica powder, sodium silicate liquid, liquid potassium silicate, liquid lithium silicate, colloidal silica dispersion liquid stabilized by organic solvent chosen from ethyl alcohol, propyl alcohol, ethylene glycol, methyl ethyl ketone and methyl isobutyl ketone, colloidal silica dispersion liquid stabilized by sodium oxide, colloidal silica dispersion liquid stabilized by potassium oxide, colloidal silica dispersion liquid stabilized by acidic solution, and colloidal silica dispersion liquid stabilized by ammonia.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alkali compound is chosen from potassium hydroxide, sodium hydroxide, ammonium hydroxide, tetrahydroxymethyl ammonium chloride and tetrahydroxyethyl ammonium chloride. Preferred Properties: The cyclic compound has boiling point of 100 degrees C or more, and Hansen solubility parameter of 6-15.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polycarboxylic acid-type polymer has recurring unit of formula: -(C(-R2)(-R1)-C(-R3)-(CH2)m1COOM1)-. The content of polycarboxylic acid-type polymer is 0.1-20 wt.%, with respect to total weight of composition. The texture etchant composition further contains alkali compound, fluorosurfactant, silica compound and cyclic compound.R1-R3=H, 1-5C alkyl or -(CH2)m2COOM2;M1,M2=H, alkali metal, alkaline-earth metal, ammonium or hydroxy-substituted 1-10C alkylammonium;andm1,m2=0-2.Preferred Process: The polycarboxylic acid-type polymer is obtained by polymerizing monomer chosen from acrylic acid, methyl (meth)acrylic acid, ethyl (meth)acrylic acid, trimethyl acrylic acid, maleic acid, fumaric acid, itaconic acid, crotonic acid, citraconic acid, vinylacetic acid, 4-pentenoic acid and their salt. The texture etchant composition is obtained by copolymerizing polycarboxylic acid-type polymer with comonomer including monomer chosen from amide compound, aromatic vinyl compound, unsaturated carboxylic acid ester compound, unsaturation anhydrous carboxylic acid compound, unsaturation alcohol compound, unsaturated carboxylic acid ester compound having nonionic group, hydroxy group-containing (meth)acrylate-type compound, vinyl cyan compound, aliphatic diene-type compound, halogenated vinyl compound, sulfonic acid compound and phosphonic acid compound. Preferred Property: The polycarboxylic acid-type polymer has weight-average molecular weight of 10000-50000. Preferred Condition: During etching method, the etchant composition is sprayed at 50-100 degrees C for 30 seconds to 60 minutes, and the etchant composition is precipitated at 50-100 degrees C for 30 seconds to 60 minutes.