NOVELTY - The barrier assembly (10) comprises an electronic device, and a transparent, flexible multilayer film (22), which comprises a barrier stack (18) adjacent to the electronic device, a weatherable sheet (20) adjacent to the barrier stack and opposite to the electronic device, a heat stabilized substrate arranged between the electronic device and the barrier stack and a pressure sensitive adhesive layer arranged between the weatherable sheet and the barrier stack. The barrier stack comprises polymer layers, and inorganic barrier layers that are oxide layers.    USE - The barrier assembly is useful for an organic photovoltaic device and a thin film solar cell such as a copper indium gallium di-selenide cell.    ADVANTAGE - The transparent, flexible and light weight barrier assembly exhibits improved durability, UV stability, water resistance property and barrier properties thus improving the overall performance and service life of the solar devices.    DETAILED DESCRIPTION - The barrier assembly (10) comprises an electronic device, and a transparent, flexible multilayer film (22), which comprises a barrier stack (18) adjacent to the electronic device, a weatherable sheet (20) adjacent to the barrier stack and opposite to the electronic device, a heat stabilized substrate arranged between the electronic device and the barrier stack and a pressure sensitive adhesive layer arranged between the weatherable sheet and the barrier stack. The barrier stack comprises polymer layers, and inorganic barrier layers that are oxide layers. The electronic device comprises an encapsulant layer, an edge seal material, a backsheet and a roof, and is a photovoltaic cell that is a copper indium gallium selenide cell. The weatherable sheet is bonded to: the electronic device with a pressure sensitive adhesive; the edge seal material; the backsheet; the roof; and the encapsulant. The pressure sensitive adhesive comprises a UV stabilizer, a hindered amine light stabilizer, an antioxidant or a thermal stabilizer. The barrier stack oxide layer shares a siloxane bond with the barrier stack polymer layer. The barrier stack has: a water vapor transmission rate of less than 0.005 cc/m2 /day at 50 degrees C and 100% of relative humidity; and an oxygen transmission rate of less than 0.005 cc/m2/day at 23 degrees C and 90% of relative humidity.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic cross-sectional view of an assembly.    Assembly (10)    Barrier stack (18)    Weatherable sheet (20)    Multilayer film (22)    Locations. (24, 26)