TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The solution contains alkali hydroxide metal salt such as sodium hydroxide and potassium hydroxide, and pH is 11-15. Resist stripping solution contains organic alkali such as quat. ammonium hydroxide, and/or alkali metal carbonate such as sodium or potassium carbonate, and pH is 8-13.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: Solution provision process (b) involves forming resist layer on electroconductive layer surface using photosensitive resin composition (b-1), performing pattern exposure of formed resist layer (b-2), and providing the solution (b-3), or providing the solution in a pattern by printing (b-4) the solution. Electroconductive layer removal process (c) involves removing the resist layer and uncured electroconductive layer, and resist layer peeling process using resist stripping solution which contains organic alkali and/or alkali metal carbonate. Printing method is by inkjet printing, screen printing, and/or gravure. Resist layer formation process (b-1) is performed by transferring the photosensitive resist layer of dry film resist prepared previously on the base material surface. Preferred Components: The patterned electroconductive material has middle layer, between the base material and electroconductive layer, consisting of a compound which improves adhesiveness with the base material, and interaction with metal nanowire. Middle layer contains the binder with 3D crosslinked structure. Base material is resin base material consisting of polycarbonate, polyether sulfone, polyester resin, olefin resin, acrylic resin, vinyl chloride resin, polyamide resin, and/or cellulose resin. Preferred Parameters: The difference of haze value of the conductive region and non-conductive region is less than or equal to 0.4. The absolute value (|(Ra2-Ra1)|) of the difference of surface roughness of non-conductive region (Ra2) and surface roughness of the conductive region (Ra1) is greater than or equal to 1 nm. In the conductive region, the shortest distance (L) of electrically conductive area which is not electrically connected is 10-2000 mu m.