TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): Preparing hydrolysis-resistant sulfonated polyimide comprising dissolving sulfonated secondary amine and tertiary amine in the protection of nitrogen, and then adding naphthalene anhydride and catalytic agent, raising the temperature to 60-100 degrees C to react for 1-24 hours, then raising the temperature to 160-200 degrees C after reacting for 4-48 hours, cooling the solution into precipitator, collecting the deposition, washing, drying, to obtain the sulfonated polyimide homopolymer; where preparing the sulfonated polyimide block copolymer comprises: (a) dissolving the sulfonated secondary amine and tertiary amine in the protection of nitrogen, and then adding naphthalene anhydride, firstly raising the temperature to 60-100 degrees C to react for 1-24 hours, then raising the temperature to 160-200 degrees C and reacting for 4-48 hours, phenol solvent to obtain aminoterminated anhydride and the main chain having sulfonic acid groups is sulfonated polyamic acid oligomer; (b) the common-naphthalene diamine and dianhydride are dissolved in the protection of nitrogen, raising the temperature to 100-200 degrees C to react for 4-48 hours to obtain the anhydride or amine-terminated polyamic acid oligomer; and (c) adding catalytic agent, raising the temperature to 160-200 degrees C to react for 4-48 hours, after cooling the solution into precipitator, collecting the deposition, washing, drying, to obtain the sulfonated polyimide block copolymer, phenol solvent according to preparing the sulfonated polyimide random copolymer comprising the sulfonated secondary amine and tertiary amine are dissolved in the protection of nitrogen, and then adding water-naphthalene dianhydride, diamine and common catalyst, to 60-100 degrees C to react for 1-24 hours, then raising the temperature to 160-200 degrees C and reacting for 4-48 hours, after cooling the solution into precipitator, collecting the deposition, washing, and drying, to obtain the sulfonated polyimide random copolymer. Preferred Residue: The sulfonated diamine residue is one of the following groups comprising formulae 10-14; and the common diamine residue is any one of groups comprising formulae 15-19. Preferred Parameter: The contrast the inherent viscosity of the sulfonated polyimide is 0.30-2.00 dl/g. Preferred Components: The phenol solvent is phenol, m-cresol, mixed cresol, zinc chloride, benzoic acid, isoquinoline, quinoline, triethylene diamine, or benzyl trimethyl ammonium hydroxide in the chlorophenol. The precipitator is one or more of acetone, methanol, ethanol, and isopropyl alcohol. The tertiary amine is triethylamine, tri-n-propylamine, and tri-n-butylamine, where the sulfonated diamine substance amount ratio of the pyridine and pyrrole is 2-3. Preferred Method: Preparing sulfonated polyimide proton exchange film material comprises dissolving hydrolysis-resistant sulfonated polyimide in a solvent to obtain the polymer with solid content of solution, filtering for 2-30%, the obtained filtrate is by casting film forming at 60-120 degrees C for 10-24 hours, at 120-180 degrees C for 12-24 hours, then the film into ethanol and de-ionized water after fully washing, adding concentration is 0.54 mol/L, keeping for 1-7 days at 20-60 degrees C, and then washing with water, to obtain the sulfonated polyimide proton exchange membrane.