NOVELTY - The condensing type plasma reactor comprises: a vacuum chamber; a first electrode (5) that is arranged in the vacuum chamber and faces an interior of the vacuum chamber; a second electrode (6) arranged in the vacuum chamber, opposed to the first electrode and spaced from the first electrode by a spacing (D); and an radio frequency electric power supply for supplying power to one of the electrodes, where the other electrode is connected to ground. The electrodes include a central region in which the electrodes are parallely arranged so that the spacing is constant, and a bevel (18).    USE - The condensing type plasma reactor is useful for depositing a thin film such as amorphous silicon film, microcrystalline silicon film, silicon oxide (SiOx) film, silicon nitride film and microcrystalline carbon film on a plane substrate, a glass such as flat panel display and solar panel, a crystalline silicon substrate such as sensor and insulating layer, and a metal or polymeric flexible sheet using plasma enhanced chemical vapor deposition.    ADVANTAGE - The reactor uniformly and economically deposits the thin film on the substrate without consuming more radio frequency energy and reactive gases, reduces the effects of hot spots, and improves the removal of powder outside a region between the electrodes.    DETAILED DESCRIPTION - The condensing type plasma reactor comprises: a vacuum chamber; a first electrode (5) that is arranged in the vacuum chamber and faces an interior of the vacuum chamber; a second electrode (6) arranged in the vacuum chamber, opposed to the first electrode and spaced from the first electrode by a spacing (D); and an radio frequency electric power supply for supplying power to one of the electrodes, where the other electrode is connected to ground. The electrodes include a central region in which the electrodes are parallely arranged so that the spacing is constant, and a bevel (18) formed by the spacing between the first and second electrodes and gradually decreasing symmetrically relative to a median plane (21) and to the two electrodes. The bevel includes a separative space. The bevel and the separative space extend on a periphery part of the electrodes. An angle formed between each of the electrodes and the median plane on the separative space is 30-45 degrees . The two electrodes form the bevel converging towards the separative space in a peripheral region. Each of the electrodes includes a round profile converging towards the separative space in the peripheral region. The separative space has a width, which is twice a thickness of sheath, of 1-3 mm. The reactor further comprises: a discharge channel present in fluidic communication with the separative space and connected to a pumping device to allow the evacuation of reactive plasma gases towards an outside of the vacuum chamber; a substrate supported by one of the electrodes in the central region; and a unit for opening the reactor at the median plane and one of the electrodes supporting the substrate to introduce and remove the substrate when the reactor is opened and the electrode is lowered. The discharge channel is present in fluidic communication with an opening in a wall of the reactor. The opening is placed in comparison and in extension with the separative space. The discharge channel extends on the periphery part of the electrodes. The electrodes supporting the substrate include a mobile portion in the central area. The mobile portion is lowered to introduce and remove the substrate.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of a plasma reactor.    First electrode (5)    Second electrode (6)    Bevel (18)    Median plane (21)    Spacing. (D)