NOVELTY - A heteroaryl compound is manufactured by providing an optionally substituted precursor compound comprising 5- or 6-membered heteroaryl ring having halogen substituent at 1st position on heteroaryl ring, treating precursor compound with strongly basic compound to induce isomerization of precursor compound to produce intermediate compound in which halogen atom is bound to a different position on the heteroaryl ring, and treating the intermediate compound with oxidizing agent to form a carbon-carbon bond between two intermediate compounds and form a bishalo-bisheteroaryl compound.    USE - Manufacture of heteroaryl compound for composition used for device (all claimed) e.g. transistor, solar cells and LED.    DETAILED DESCRIPTION - A heteroaryl compound is manufactured by providing an optionally substituted precursor compound comprising 5- or 6-membered heteroaryl ring having halogen substituent at 1st position on heteroaryl ring, treating precursor compound with strongly basic compound to induce isomerization of precursor compound to produce intermediate compound in which halogen atom is bound to a different position on the heteroaryl ring, treating the intermediate compound with oxidizing agent to form a carbon-carbon bond between two intermediate compounds and form a bishalo-bisheteroaryl compound of formula Hal-HAr-HAr-Hal, optionally treating the bishalo-bisheteroaryl compound with organometallic compound to exchange a metal for the Hal substituents, and form bismetallo-bisheteroaryl compound, and reacting the bismetallo-bisheteroaryl compound with suitable electrophile, or reacting the bishalo-bisheteroaryl compound or bismetallo-bisheteroaryl compound with a nucleophile, to introduce a group, or precursor for forming fused tricyclic compound represented of formula (II), and reacting the compound to covalently bond to form oligomer consisting of 2, 3 or 4 coupled units.    Z=S, Se, NR5, C(O), C(O)C(O), Si(R5)2, SO, SO2, PR5, P(O)R5, BR5, C(R5)2 , -CC(CN)2, or -(CC(CN2))2-; and    R5=1-50C organic radical chosen from optionally substituted alkyl, perfluoroalkyl, aryl, and heteroaryl.    INDEPENDENT CLAIMS are included for:    (1) composition comprising oligomer compound of formula (III) or heteroaryl compounds of formulae (XI-XIV); and    (2) device comprising compound or composition.    x=2, 3 or 4;    HAr=thiophene, thiazole, selenophene or pyrrole;    a,a'=0 or 1;    R1,R2=alkyl, fluoroalkyl, aryl, fluoroaryl, heteroaryl, arylalkyl, or heteroarylalkyl;    W,W'= greater than or equal to 1 heteroarylene group;    b,b'=0, 1, 2, 3, or 4;    c=2, 3, or 4;    X,X'=O, S, Se, NR3, PR3, or Si(R3)2;    R3=alkyl, heteroalkyl, or alkylaryl;    Y,Y'=N, P, CH, CR4, or SiR4;    R4=H, alkyl, fluorinated alkyl, aryl, fluorinated aryl, or heteroaryl; and    R5=1-50C organic radical chosen from optionally substituted alkyl, perfluoroalkyl, aryl, and heteroaryl.