TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: At least one component system among component system (a) and component system (b), contains two or more components which form phase-separation structure of primary phase and secondary phase by polymerization. One component system among component system (a) and component system (b), comprises two or more non-aromatic components, and other comprises two or more aromatic components. One component system among component system (a) and component system (b), comprises two or more bifunctional components having two reactive sites, respectively, and other component system comprises two or more components having two or more reactive sites, respectively, and at least one component is polyfunctionality component having three or more reactive sites among two or more of other component-type components. Component systems (a) and (b) comprise two or more components respectively having two or more reactive sites, and at least 1 component contains polyfunctionality component having three or more reactive sites among two or more components of each component system. One component system among component system (a) and component system (b), is phase(s) chosen from low molecular weight compound, linear macromolecule, and polymer of three-dimensional crosslinked structure. One or more components (a) and (b) form an electrical insulator phase, a semiconductor phase, or a conductor phase. The other component system is at least one component system (a) chosen from aromatic carbonyl compound having two or more carbonyl groups, aromatic amine compound having two or more amino groups, and component system containing two or more components where number of carbonyl groups in 1 molecule of aromatic carbonyl compounds is 2 or more and number of amino groups in 1 molecule of aromatic amine compounds is 2 or more, and component system (b) chosen from aromatic aldehyde compound having formyl group(s), aromatic heterocyclic compound having two or more free ( alpha )-carbon adjacent to heterocyclic heteroatom, and component system containing two or more components where number of formyl groups in 1 molecule of aromatic aldehyde compounds is 2 or more and number of free ( alpha )- carbon in 1 molecule of aromatic heterocyclic compounds is 2 or more. One component system among component system (a) and component system (b) includes two or more components which react by heating, and other component system contains two or more components which react by heating under presence of a catalyst. One component system among component system (a) and component system (b) includes an aromatic carbonyl compound and an aromatic amine compound, and other component system includes an aromatic aldehyde compound, aromatic heterocyclic compound having at least two or more free ( alpha )-carbon adjacent to heterocyclic heteroatom, and acidic catalyst. The component systems (a) and (b) contain an aromatic aldehyde compound as common component. The other component system among component system (a) and component system (b), includes an acid generator chosen from thermal oxidation generating agent and photo-acid generator as catalyst. One phase among primary phase and secondary phase, forms insulator, semiconductor, or conductor. One phase among primary phase and secondary phase, is formed by at least one substance chosen from low molecular weight compound, linear macromolecule, and polymer of three-dimensional crosslinked structure. One phase among primary phase and secondary phase, forms n-type semiconductor having three-dimensional crosslinked structure, and other phase forms p-type semiconductor having three-dimensional crosslinked structure. One phase is thin film-type phase among primary phase and secondary phase. On the thin-film-type phase, other phase is formed with the form of the thin-film form or predetermined pattern. Preferred Compounds: The aromatic carbonyl compound is of formula (I) or (II). The aromatic heterocyclic compound is of formula (III) or (IV).A1,A2=aryl;L=linker;R1=carbonyl-containing group, preferably formyl;R2a-R2e=non-reactive group;n=0 or 1;k1=1, or 2 or more;k2=0, or 1 or more;p,p1,k3=1 or more;R3=H, amino, mercapto or hydroxy;k3x p=2 or more;ring Het,ring Het1,ring Het2=heteroaryl;X,X1,X2=heteroatom;andr,r1,r2=0-3.Preferred Condition: Pattern exposure is carried out and phase-separation structure having a pattern of negative-type or positive-type is formed.