TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Nano oxide particle consists of alumina, zinc oxide, titanium oxide, zirconium oxide, tin oxide, cerium oxide, and/or yttrium oxide. Catalyst is hydrochloric acid, acetic acid, sulfuric acid, nitric acid, phosphoric acid, lactic acid, ammonia water, sodium hydroxide, organic amine, and/or potassium hydroxide. Preferred Parameter: Particle size of nano oxide particle is 5-50 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: Solvent consists of water, methanol, ethanol, n-propanol, isopropyl alcohol, n-butyl alcohol, ethyl alcohol, methyl alcohol, tert.-butyl alcohol, tetrahydrofuran, cyclohexanol, ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol, glycol ether, ethylene glycol acetate, propylene glycol alpha -dimethyl-ethyl, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol monomethyl ether acetate, glycol monomethyl ether, glycol monoethyl ether, glycol monomethyl ether acetate, dioxane, dimethyl formamide, acetonitrile, acetone, methyl ethyl ketone, cyclohexanone, methylene dichloride, trichloromethane, tetrachloromethane, dichloroethane, toluene, benzene, and/or xylene.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: Polyhedral oligomeric silsequioxane (POSS) derivative has formula (SixOyR1nR2x-m-nR3m).x=8,10, or 12;y=1.5x;m and n=0-x in which m+x is less than or equal to x, y, n, or m and x, y, m, and n are integers;R1=vinyl, allyl, acryloxypropyl,methacryloxypropyl, methyl, methylacryloyl oxy, methacryloxy, 3-ene butyl, 2-ene butyl, or 1-butyl;R2=1-18C alkyl, methyl propyl, cyclopentane, methyl cyclopentane, ethyl cyclopentyl, cyclohexyl, methyl cyclohexyl, ethyl cyclohexyl, phenyl, acetoxypropyl, acetoxyethyl, acetoxymethyl, aminomethyl, beta -aminoethyl, gamma -aminopropyl, alkyl, N-( beta -aminoethyl) propyl, gamma -2,3-( beta )-ethyl, gamma -propyl, 4-butyl, N-phenyl-gas, N-phenyl, N-phenyl gamma -aminopropyl, (N-perfluoro octyl sulfonyl)-propyl, or fluorine-containing alkyl base;R3 and R1=hydrogen silane monomer of formula (HSiX3), (HsiMeX2), (HSiEtX2), (HSiPhX2), (HSiMe2X), (HSiEt2X), (HSiPh2X), (HSiMe2X), (HSiPh2X), (HSiMeEtX), (HSiMePhX), (HSiEtPhX); andX=Cl, Br, OR', or 1-18C alkyl.