TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The process further comprises: applying heat, light or radiation, or adding one or more chemical or crosslinking reagents to the ink before it is deposited; repeating the steps (b) and (c); and annealing the layers at 450-650 degrees C in the presence of selenium vapor. The heating step is a process comprising converting the layer at 100-450 degrees C. The step (b) is done by spraying, spray coating, spray deposition, spray pyrolysis, printing, screen printing, inkjet printing, aerosol jet printing, ink printing, jet printing, stamp printing, transfer printing, pad printing, flexographic printing, gravure printing, contact printing, reverse printing, thermal printing, lithography, electrophotographic printing, electrodepositing, electroplating, electroless plating, bath deposition, coating, wet coating, dip coating spin coating, knife coating, roller coating, rod coating, slot die coating, Meyer bar coating, lip direct coating, capillary coating, liquid deposition, solution deposition, layer-by-layer deposition, spin casting and/or solution casting. Preferred Components: The thickness of the layer made by one pass through steps (b) and (c), in which one deposition of ink is done, is 100-500 nm, preferably 150-300 nm. The polymeric precursor compounds are copper indium gallium diselenide polymeric precursor compounds. The polymeric precursor compounds have a ratio of atoms of group 11 to atoms of group 13 of 0.6-0.99. The substrate has a layer of an adhesion promoter material on the electrical contact layer, where the adhesion promoter material is a copper indium gallium diselenide material that is enriched in copper so that the ratio of atoms of copper to atoms of indium and gallium is 1:1.3, preferably 1:1.1. The inks contain 0.01-2 atom% of sodium ions. The substrate is a semiconductor, a doped semiconductor, silicon, gallium arsenide, insulators, glass, molybdenum glass, molybdenum coated glass, silicon dioxide, titanium dioxide, zinc oxide, silicon nitride, a metal, a metal foil, molybdenum, aluminum, beryllium, cadmium, cerium, chromium, cobalt, copper, gallium, gold, lead, manganese, molybdenum, nickel, palladium, platinum, rhenium, rhodium, silver, stainless steel, steel, iron, strontium, tin, titanium, tungsten, zinc, zirconium, a metal alloy, a metal silicide, a metal carbide, a polymer, a plastic, a conductive polymer, a copolymer, a polymer blend, a polyethylene terephthalate, a polycarbonate, a polyester, a polyester film, a Mylar (RTM: Polyester film), a polyvinyl fluoride, polyvinylidene fluoride, a polyethylene, a polyetherimide, a polyethersulfone, a polyetherketone, a polyimide, a polyvinylchloride, an acrylonitrile butadiene styrene polymer, a silicone, an epoxy, paper and/or a coated paper. The additive is a metal compound of formula (A(R1)4), ((R1)3A-A(R1)3), ((R1)2A-QA(R1)2) or (((R1)2AO)x1), preferably triethylsilane, a diorganosiloxane compound, siloxane fluid, hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, dodecamethylcyclohexasiloxane. The concentration of the additive is 0.1-15, preferably 0.1-5 vol./vol.%.A = Si, Ge, or Sn;Q = (CR12)n;R1 = H, alkyl, aryl, alkenyl or silyl; andx1 = 2-8.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvents are aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, isooctane, decane, cyclohexane, p-xylene, m-xylene, o-xylene, benzene, toluene, xylene, ethers, diethyl ether, tetrahydrofuran, 2-methyltetrahydrofuran, siloxanes, cyclosiloxanes, silicone fluids, acetonitrile, esters, acetates, ethyl acetate, butyl acetate, acrylates, isobornyl acrylate, ketones, acetone, methyl ethyl ketone, cyclohexanone, cyclopentanone, lactams, N-methylpyrrolidone, N-(2-hydroxyethyl)-pyrrolidone, cyclic acetals, cyclic ketals, aldehydes, alcohol, methanol, ethanol, isopropyl alcohol, thiols, butanol, butanediol, glycerols, alkoxyalcohols, glycols, 1-methoxy-2-propanol, acetone, ethylene glycol, propylene glycol, propylene glycol laurate, ethylene glycol ethers, diethylene glycol, triethylene glycol monobutylether, propylene glycol monomethylether and/or 1,2-hexanediol. Preferred Definitions:    R = n-butyl, sec-butyl, iso-butyl, tert-butyl, a mixture of n-butyl and tert-butyl groups, a mixture of n-butyl and iso-butyl groups, a mixture of n-butyl and sec-butyl, a mixture of n-butyl and tert-butyl groups, a mixture of n-butyl and sec-butyl and iso-butyl groups, a mixture of n-butyl and sec-butyl and tert-butyl groups, a mixture of n-butyl and iso-butyl and tert-butyl groups, or a mixture of sec-butyl and iso-butyl and tert-butyl groups, n-pentyl, isopentyl, sec-pentyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, 4-methylpentyl, 1-ethylbutyl, 2-ethylbutyl, tert-pentyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 1,3-dimethylbutyl, 2,3-dimethylbutyl, cyclopentyl, n-hexyl, 1-methylhexyl, 2-methyl-hexyl, 3-methylhexyl, 4-methylhexyl, 5-methylhexyl, 1-ethylpentyl, 2-ethylpentyl, 3-ethylpentyl, 1-n-propylbutyl, 1-iso-propylbutyl, 1-iso-propyl-2-methylpropyl, 1-methylheptyl, 2-methylheptyl, 3-methylheptyl, 4-methylheptyl, 5-methylheptyl, 6-methylheptyl, 1-ethylhexyl, 2-ethylhexyl, 3-ethylhexyl, 4-ethylhexyl, 1-n-propylpentyl, 2-n-propylpentyl, 1-iso-propylpentyl, 2-iso-propylpentyl, 1-n-butylbutyl, 1-iso-butylbutyl, 1-sec-butylbutyl, 1-tert-butylbutyl, 2-tert-butylbutyl, tert-butyl, 1-ethyl-2-methylpropyl, 1,1-dimethylpentyl, 1,2-dimethylpentyl, 1,3-dimethylpentyl, 1,4-dimethylpentyl, 2,2-dimethylpentyl, 2,3-dimethylpentyl, 2,4-dimethylpentyl, 3,3-dimethylpentyl, 3,4-dimethylpentyl, 1-ethyl-1-methylbutyl, 1-ethyl-2-methylbutyl, 1-ethyl-3-methylbutyl, 2-ethyl-1-methylbutyl, 2-ethyl-3-methylbutyl, 1,1-dimethylhexyl, 1,2-dimethylhexyl, 1,3-dimethylhexyl, 1,4-dimethylhexyl, 1,5-dimethylhexyl, 2,2-dimethylhexyl, 2,3-dimethylhexyl, 2,4-dimethylhexyl, 2,5-dimethylhexyl, 3,3-dimethylhexyl, 3,4-dimethylhexyl, 3,5-dimethylhexyl, 4,4-dimethylhexyl, 4,5-dimethylhexyl, 1-ethyl-2-methylpentyl, 1-ethyl-3-methylpentyl, 1-ethyl-4-methylpentyl, 2-ethyl-1-methylpentyl, 2-ethyl-2-methylpentyl, 2-ethyl-3-methylpentyl, 2-ethyl-4-methylpentyl, 3-ethyl-1-methylpentyl, 3-ethyl-2-methylpentyl, 1-n-propyl-1-methylbutyl, 1-n-propyl-2-methylbutyl, 1-n-propyl-3-methylbutyl, 1-iso-propyl-1-methylbutyl, 1-iso-propyl-2-methylbutyl, 1-iso-propyl-3-methylbutyl, 1,1-diethylbutyl, 1,2-diethylbutyl, 1,1,2-trimethylpropyl, 1,2,2-trimethylpropyl, 1,1,2-trimethylbutyl, 1,1,3-trimethylbutyl, 1,2,3-trimethylbutyl, 1,2,2-trimethylbutyl, 1,3,3-trimethylbutyl, 2,3,3-trimethylbutyl, 1,1,2-trimethylpentyl, 1,1,3-trimethylpentyl, 1,1,4-trimethylpentyl, 1,2,2-trimethylpentyl, 1,2,3-trimethylpentyl, 1,2,4-trimethylpentyl, 1,3,4-trimethylpentyl, 2,2,3-trimethylpentyl, 2,2,4-trimethylpentyl, 2,3,4-trimethylpentyl, 1,3,3-trimethylpentyl, 2,3,3-trimethylpentyl, 3,3,4-trimethylpentyl, 1,4,4-trimethylpentyl, 2,4,4-trimethylpentyl, 3,4,4-trimethylpentyl, 1-ethyl-1,2-dimethylbutyl, 1-ethyl-1,3-dimethylbutyl, 1-ethyl-2,3-dimethylbutyl, 2-ethyl-1,1-dimethylbutyl, 2-ethyl-1,2-dimethylbutyl, 2-ethyl-1,3-dimethylbutyl, 2-ethyl-2,3-dimethylbutyl, cyclohexyl, methylcyclopentyl, methylcyclohexyl, 1,2-dimethylcyclohexyl, 1,3- dimethylcyclohexyl, 1,4-dimethylcyclohexyl and/or ethylcyclohexyl;    x, t = 0;    y = 0-1 such that both In and Ga are present.