TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The conductive metal comprises aluminum (Al). It further comprises an Al-Si alloy, preferably an Al-Si eutectic alloy. The conductive metal further includes up to 20 wt.% of at least one selected from an Al-Si eutectic, zinc, tin, antimony, silicon, bismuth, indium, molybdenum, palladium, silver, platinum, gold, titanium, vanadium, nickel, copper, and combinations. The glass component comprises 5-65 mol% zinc oxide (ZnO), 5-55 mol% boron oxide (B2O3) + aluminum oxide (Al2O3), 10-65 mol% silicon dioxide (SiO2), 0.5-40 mol% lithium oxide (Li2O) + sodium oxide (Na2O) + potassium oxide (K2O) + rubidium oxide (Rb2O) + cesium oxide (Cs2O), 0.5-25 mol% titanium dioxide (TiO2) + zirconium dioxide (ZrO2), and 0-15 mol% fluorine (F); and/or 10-32 mol% ZnO, 22-58 mol% SiO2, 10-25 mol% B2O3 + Al2O3, 1-20 mol% Li2O + Na2O + K2O + Rb2O + Cs2O, 0-10 mol% magnesium oxide (MgO) + calcium oxide (CaO) + barium oxide (BaO) + strontium oxide (SrO), 0.5-15 mol% TiO2 + ZrO2, 0-5 mol% vanadium pentoxide (V2O5) + tantalum pentoxide (Ta2O5) + antimony pentoxide (Sb2O5) + phosphorus pentoxide (P2O5), 0-20 mol% tellurium dioxide (TeO2) + thallium oxide (Tl2O) + germanium dioxide (GeO2), and 0-15 mol% F; and/or 5-55 mol% lithium oxide (Li2O) + Na2O + K2O, 0.5-30 mol% TiO2 + ZrO2, 5-75 mol% B2O3 + SiO2, and 5-20 mol% V2O5 + Ta2O5 + Sb2O5 + P2O5; and/or 25-65 mol% bismuth oxide (Bi2O3), 3-60 mol% ZnO, and 4-65 mol% B2O3; and/or 25-65 mol% Bi2O3, 5-35 mol% SiO2, and 4-65 mol% B2O3; and/or 5-85 mol% Bi2O3, and 5-35 mol% B2O3 + SiO2; and/or 15-75 mol% lead oxide (PbO) and 5-38 mol% B2O3 + SiO2; and/or 60-70 mol% PbO and 5-15 mol% B2O3 + SiO2, 15-23 mol% Al2O3, 0-5 mol% ZnO, 0.1-3 mol% TiO2 + ZrO2 + hafnium dioxide (HfO2), 0.1-5 mol% V2O5 + Sb2O5 + P2O5 + Ta2O5 + Nb2O5, 0-8 mol% MgO + CaO + BaO + SrO, 0-10 mol% Li2O + Na2O + K2O + Rb2O + Cs2O, 0-20 mol% TeO2 + Tl2O + GeO2 and 0-6 mol% F; and/or 10-40 mol% SiO2, 15-39 mol% Li2O + Na2O + K2O + Rb2O + Cs2O, 7-22 mol% TiO2 + ZrO2, 1-9 mol% V2O5 + Ta2O5 + Sb2O5 + P2O5, 0-10 mol% MgO + CaO + BaO + SrO, 0-10 mol% TeO2 + Tl2O + GeO2 and 0-8 mol% F; and/or 30-40 mol% Li2O + Na2O + K2O, 1-5 mol% TiO2 + ZrO2, 30-52 mol% B2O3 + SiO2, 5-25 mol% V2O5 + Sb2O5 + P2O5 + Ta2O5, 0-10 mol% MgO + CaO + BaO + SrO, 0-5 mol% TeO2 + Tl2O + GeO2 and 5-13 mol% F. The conductive metal component comprises 40-80 wt.% of an aluminum source; where the glass component is present to an extent of 0.1-10 wt.%; and where the vehicle is present to an extent of 5-30 wt.%. The paste composition comprises, prior to firing: 40-80 wt.% of Al; 0.1-10 wt.% of the glass component; 5-30 wt.% of the vehicle; and 0.1-10 wt.% of the organic/inorganic additive compound. The glass component comprises one or more glasses. Preferred Parameters: The D50 particle size of the glass component is about 0.1 microns to about 20 microns. The aluminum is provided in powder form having a bimodal particle size distribution. The first D50 average aluminum particle size is in the range of 0.5-3 microns and a second D50 average aluminum particle size is 3-40 micron range, where no overlap is intended. The viscosity of the paste is in the range of 5-100 Pa.s. The metal component has both flake and spherical morphologies. Preferred Cell: In the photovoltaic cell, the back side paste further comprises, prior to firing, at least one at least one organometallic compound selected from metal boron, silicon, vanadium, antimony, phosphorus, yttrium, titanium, nickel, cobalt, zirconium, zinc, lithium or combinations. Preferred Method: In making the photovoltaic cell contact, the paste further comprises at least one organometallic additive compound, a phosphate glass and a phosphorus compound dispersed in the vehicle. The glass component is lead-free. The passivation layer comprises at least one selected from SiNx, Al2O3, SiO2, silicon carbide (SiC), amorphous Si, TiO2, Al2O3/SiNx, SiO2/SiNx, SiO2/Al2O3/SiNx in a combined thickness of 5-360 nm thick. The local openings are made by laser ablation or chemical etching to form dots or lines, where the dot diameter ranges from 20-200 microns and a trench is 100-700 microns wide, or the dot diameter ranges from 20-200 microns and a trench is 0.5-2.0 mm wide. The local openings are made by chemical etching using an etchant comprising phosphorus. Heating includes heating to a peak wafer temperature of 660-940 degrees C. The refractive index of SiNx ranges from 1.8-2.8.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The paste composition further comprises, prior to firing, at least one organometallic compound selected from metal boron, silicon, vanadium, antimony, phosphorus, yttrium, titanium, nickel, cobalt, zirconium, zinc, lithium and combinations. The organometallic compound includes at least one 1-50C organic moiety that is linear or branched, saturated or unsaturated, aliphatic, alicyclic, aromatic, araliphatic, halogenated or otherwise substituted, optionally having one or more heteroatoms such as oxygen (O), nitrogen (N), sulfur (S), or silicon (Si), and/or including hydrocarbon moieties such as alkyl, alkyloxy, alkoxide, alkylthio, or alkylsilyl moieties. The organometallic compounds are selected from metal ethoxides, metal acetonates, metal acetylacetonates, metal carboxylates, metal 2-methylhexanoates, metal 2-ethylhexanoates, and metal 2-propylhexanoates, metal acrylates, metal methacrylates, and combinations, where the metal is selected from titanium, zirconium, nickel, cobalt, zinc, vanadium, and combinations. EXAMPLE - No suitable example given.