NOVELTY - Making doped conductive titanium oxide involves providing heated glass ribbon in float glass process; providing precursor gas mixture of halogenated, inorganic titanium compound, halogenated, inorganic niobium/tantalum dopant compound, organic oxygen-containing compound and inert carrier gases; delivering precursor gas mixture at temperature below thermal decomposition temperature of gas mixture to location adjacent the heated glass ribbon to be coated; and contacting gas mixture with the ribbon. The doped coating exhibit electrical conductivity of greater than 1x 10-3 S/cm.    USE - For making doped conductive titanium oxide coating useful to form coated glass article which is used in solar cell (claimed).    ADVANTAGE - The method produces electrically conductive coating in large volume and at a cost sufficiently low to make it commercially viable in larger-scale solar cell manufacturing processes.    DETAILED DESCRIPTION - Making doped conductive titanium oxide coating by atmospheric chemical vapor deposition during a glass manufacturing process involves: providing a heated glass ribbon in a float glass process; providing a uniform precursor gas mixture comprising a halogenated, inorganic titanium compound, a halogenated, inorganic niobium or tantalum dopant compound, an organic oxygen-containing compound and at least one inert carrier gases, where the halogenated, inorganic niobium or tantalum dopant compound comprises not greater than 0.3 mol% of the precursor gas mixture; delivering the precursor gas mixture at a temperature below the thermal decomposition temperature of the precursor gas mixture to a location adjacent the heated glass ribbon to be coated, the float bath atmosphere surrounding the heated glass ribbon being at essentially atmospheric pressure; and bringing the precursor gas mixture into coating contact with the heated glass ribbon, where the temperature of heated glass ribbon is sufficient to cause reaction of the precursor gas mixture to deposit a doped titanium oxide coating at a deposition rate of greater than 35 Angstrom /second on the glass ribbon. The doped titanium oxide coating exhibits an electrical conductivity of greater than 1x 10-3 S/cm. INDEPENDENT CLAIMS are included for the following:    (1) coated glass article comprising glass substrate; coating deposited over the glass substrate comprising titanium oxide layer having thickness of 500-1500 Angstrom doped with halogenated niobium or tantalum compound, where the doped titanium oxide coating exhibits an electrical conductivity of greater than 1x 10-3 S/cm; and    (2) solar cell comprising the coated glass article.