NOVELTY - The fabrication method involves creating a nanoscale pattern of photoresist (12) on a first hardmask (10), etching through the first hardmask to create the nanoscale pattern (14) on a second hardmask (18), and etching through the second hardmask to create desired tapered nanoconed structures (20) in a glass (16). The hardmasks are deposited on the glass. The etching is reactive ion etching, preferably complementary metal oxide semiconductor (CMOS) plasma etching.    USE - Fabrication method for making high aspect ratio tapered nanocone structures used in manufacturing method (claimed) of nanostructured glass with micro/nanostructured surface texture for imprinting nanoscale patterns on glass that has multi-function properties, such as anti-glare, enhanced transmission, self-cleaning, and anti-fogging. Uses include but are not limited to solar power industry, car windshields, transparent windshields, eyeware and goggle. Can also be used in producing a protective glass for use with digital cameras.    ADVANTAGE - The fabrication method is versatile since it can be implemented with commonly used fusion process, embodied in existing manufacturing processes for flat glass and can be designed as a module component such that it can be added to existing production infrastructure already in place, allowing scalable, cost-effective manufacturing of micro/nanoscale textured flat glass. Combines high pressure robustness of superhydrophobicity with near-perfect transparency or anti-reflection property by texturing the subwavelength nanocones on both sides of glass and modifying surface energies. Nearly 100 percent of incident light with a wide angle can be collected without any loss, thus pictures with better quality may be taken even at night since interference affects are eliminated.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for manufacturing glass with micro/nanostructured surface texture.    DESCRIPTION OF DRAWING(S) - The drawing shows the schematic perspective view of making high aspect ratio nanocone structures.    First hardmask (10)    Photoresist (12)    Nanoscale pattern (14)    Glass (16)    Second hardmask (18)    Nanoconed structures (20)