NOVELTY - The pattern forming device (100) has a discharge mechanism unit (120) with a pair of discharge mechanisms (1) mounted in oppositely facing manner. A concave portion is formed at the corner of distal end of discharge mechanism so that edge section of concave portion on side opposite to edge section of concave portion which is brought into contact with the pattern forming mask (11) projects toward the side of mask and gap is formed between edge portion and mask. The discharge mechanism unit has a paste supply mechanism that supplies paste between pair of discharge mechanisms.    USE - Pattern forming device for forming pattern of e.g. solar cell.    ADVANTAGE - Reduces breaking of mask and wear of emulsion so that productivity of the device is enhanced and life time of the mask is extended since mask is not brought into contact with the pattern forming object. Allows stable forming of fine pattern with high accuracy and allows paste to be surely filled into fine through holes since portion of the distal end portion of discharge mechanism that is brought into contact with the pattern forming mask is formed into concave shape and surface of distal end portion of discharge mechanism including concave shaped portion is covered with film having liquid repellency. The fine pattern is formed with high accuracy and filling property of the paste to fine through holes is accelerated since rolling property of the paste is accelerated in region formed by the concave shaped portion formed on distal end portion of discharge mechanism which is covered with the film having liquid repellency and pattern forming mask to generate a region where force which pushes the paste to pattern forming mask side is generated. Eliminates possibility that partial defective applying of paste is generated so that pattern is surely formed since discharge property is improved. Ensures formation of uniform, extremely thin and fine pattern so that favorable pattern forming result is obtained by improving discharge property of the metal mesh. The pattern is formed in stable manner with high accuracy by using pattern forming device on which discharge mechanism provided with discharge portion is mounted irrespective of the size of opening area of pattern opening portion of the pattern forming mask. Enhances productivity since electrode wiring is formed favorably and tact time is shortened. The tact is shortened and high efficiency solar cells are obtained since paste is completely filled into the through holes having high aspect ratio by performing printing once. The tact time is shortened so that productivity is enhanced since pattern with high aspect ratio is formed by one-time pattern forming by moving the discharge mechanism in only one direction only once even when pattern forming is performed by setting only one substrate in one step. The conversion efficiency is increased by narrowing the line width of conductive line, thus increasing an area in which sunlight is irradiated. The effective solar light receiving area on the surface of solar cell wafer is increased so that conversion efficiency is enhanced.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a pattern forming method.    DESCRIPTION OF DRAWING(S) - The drawing shows a block diagram of the schematic constitution of a pattern forming apparatus.    Discharge mechanisms (1)    Pattern forming object (6)    Pattern forming mask (11)    Pattern forming device (100)    Discharge mechanism unit (120)