TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The metal oxide (A) is a hydrolysis-condensation product of compound (L) containing metal atom. The compound (L) is of formula: AlX1mR1(3-m), preferably aluminum triisopropoxide or aluminum tri s-butoxide. The phosphorus compound (B1) is chosen from phosphoric acid, polyphosphoric acid, phosphorous acid, phosphonic acid and their derivative.X1=F, Cl, Br, I, R2O-, R3C(=O)O-, (R4C(=O))2CH- or NO3;R1-R4=alkyl, aralkyl, aryl or alkenyl;andm=1-3.Preferred Process: Alternatively, the coating liquid is obtained by preparing liquid containing metal oxide, preparing solution containing phosphorus compound (B1), preparing solution containing phosphorus compound (B2), and mixing liquid containing metal oxide, solution containing phosphorus compound (B1), and solution containing phosphorus compound (B2). Preferred Properties: The layer (Y) has maximum absorption wavenumber (n1) of 800-1400 cm-1 deviated from maximum absorption wavenumber of 1080-1130 cm-1, and maximum absorption wavenumber (n2) based on stretching vibration of the hydroxyl group of 2500-4000 cm-1, measured by infrared absorption spectrum. The ratio of light absorbency (A2) in the wavenumber (n2) and light absorbency (A1) in the wavenumber (n1) is 0.2 or less. The multilayered structure has half value width of the absorption peak of the wavenumber (n1) is 200 cm-1 or less. The multilayered structure has oxygen permeability of 1 ml/(m2.day.atm) or less at 20 degrees C and relative humidity of 85%. The multilayered structure has oxygen permeability of 2 ml/(m2.day.atm) or less at 20 degrees C and relative humidity of 85%, after stretching 5% and maintaining at 23 degrees C and relative humidity of 5%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The phosphorus compound (B2) is homopolymer or copolymer containing phosphoric acid group of (meth)acrylate, preferably of formula: C(=CH2)(-R5)-C(=O)-O-(CH2-CH(-R6)-O)n-P(=O)(-OH)-OH, or homopolymer of acid phospho-oxyethyl methacrylate. The base material layer (X) is thermoplastic resin film layer, paper layer or inorganic vapor deposition layer.R5,R6=H, or alkyl chosen from methyl, ethyl, n-propyl and isopropyl, in which one portion of H contained in the alkyl is optionally substituted by another atom and functional group;andn=1-6.