NOVELTY - The apparatus (1) has electron cyclotron resonance (ECR) plasma generation apparatus (3,4) that modifies surface of base material (F) and film-forming apparatus (6). A rectangular waveguide transmits microwave. A slot antenna includes slot through which microwave passes. A dielectric material unitcovers slot and includes surface on plasma-generating-region side parallel to incident direction of microwave. A permanent magnet forms magnetic field in plasma production region. Plasma (P1) is generated by propagating microwave in magnetic field from dielectric material unit.    USE - Plasma modification film-forming apparatus for forming transparent conductive film used for organic electro luminescence device, touch panel, display, LED illumination, solar cell, mobile device such as portable information terminal such as mobile telephone, smart phone, personal handyphone system, tablet personal computer, mobile notebook personal computer, small game machine device and electronic paper.    ADVANTAGE - High-density plasma is stably generated under low pressure. Since the modification and film-forming is performed continuously within the same chamber, the adhering of the impurity to the surface of the base material is reduced and the thin film with few corrugations can be formed. Since the modification effect can be acquired, the roughening and deformation of base material is suppressed. Since the electric field concentration to the convex portion of anode can be suppressed, the deterioration of electron transport light emitting layer can be suppressed. Since the required supply of gas, discharging apparatus, the conveying apparatus of base material can be packed into one chamber, the installation expense can be reduced.    DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of the plasma modification film-forming apparatus. (Drawing includes non-English language text)    Plasma modification film-forming apparatus (1)    Electron cyclotron resonance plasma generation apparatus (3,4)    Film-forming apparatus (6)    Base material (F)    Plasma (P1)