NOVELTY - Making transparent, dimensionally stable, solvent resistant, aromatic polyamide film, comprises: (A1) reacting at least one aromatic diamine with at least one aromatic diacid dichloride to give polyamide and hydrochloric acid; (B1) removing free hydrochloric acid by reaction with acid trapping reagent; (C1) removing hydrogen chloride reaction product by volatilization or precipitation of polyamide in non-solvent; (D1) adding multifunctional epoxide to original polyamide solution or solution prepared from precipitated polyamide; (E1) casting resulting mixture into film; and (F1) heating film.    USE - The process is useful for making aromatic polyamide film (claimed), where the films are useful as flexible substrates for electronic displays and photovoltaic devices.    ADVANTAGE - The process provides aromatic polyamide film that: has transmittance of 400-750 nm (at greater than 80%), preferably 550 nm (greater than 85%), and average coefficient of thermal expansion of less than 20 ppm/ degrees C (preferably less than 10 ppm/ degrees C at 25-250 degrees C) (all claimed); and exhibits excellent mechanical properties (tensile strength of greater than 200 MPa), low moisture absorption and excellent solvent resistance.    DETAILED DESCRIPTION - Making a transparent, dimensionally stable, solvent resistant, aromatic polyamide film, comprises: (A1) reacting at least one aromatic diamine with at least one aromatic diacid dichloride in a polar organic solvent to give a polyamide and hydrochloric acid; (B1) removing free hydrochloric acid by reaction with an acid trapping reagent; (C1) removing a hydrogen chloride reaction product by volatilization or by precipitation of the polyamide in a non-solvent; (D1) adding a multifunctional epoxide to the original polyamide solution or to a solution prepared from the precipitated polyamide; (E1) casting the resulting mixture into a film; and (F1) heating the film until the film becomes solvent resistant. INDEPENDENT CLAIMS are also included for:    (1) a transparent aromatic polyamide film comprising (p1) an aromatic polyamide having aromatic amide repeating units of formula ((-C(=O)-Ar1-C(=O)-NH-Ar2-NH-)x) (I), where the polyamide is soluble in polar organic solvents, and (p2) a multifunctional epoxide comprising substituted oxiranylmethyl compounds of formula (II), substituted cyclic oxirane compounds of formula (III) and substituted cyclic oxirane compounds of formula (IV);    (2) making a transparent, dimensionally stable, solvent resistant, aromatic polyamide film, comprising reacting a mixture of at least two aromatic diamines, where one of the diamine contains at least one carboxy group with at least one aromatic diacid dichloride in a polar organic solvent to afford a copolyamide and hydrochloric acid, step (B1) as above per se, removing hydrogen chloride reaction product by volatilization or by precipitation of the copolyamide in a non-solvent, adding the multifunctional epoxide to the original copolyamide solution or to solution prepared from the precipitated copolyamide, and steps (E1)and (F1) as above per se;    (3) the transparent, solvent resistant, aromatic polyamide film produced by the process; and    (4) the transparent aromatic copolyamide film comprising (s1) an aromatic copolyamide having aromatic amide repeat units (I) and substituted aromatic amide containing carboxylic acid compounds of formula ((-C(=O)-Ar1-C(=O)-NH-Ar3((COOH)n)-NH-)y) (IV) and (p2) as above per se.    Ar1 = substituted toluene moiety of formula (13a), substituted naphthalene moiety of formula (13b) or substituted phenyl moiety of formula (13c);    p = 4;    q = 3;    R1-R11 = alkyl, alkoxy, aryl or alkyl ester (all optionally substituted), H, halo, CN and/or thioalkyl;    G1, G2 = covalent bond, -CH2-, C(CH3)2, C(CF3)2 or C(CX3)2;    X = halo, CO, O, S, SO2, Si(CH3)2, 9,9'-bisphenylenefluorene (optionally substituted) or OZO;    Z = aryl or 9,9'-bisphenylenefluorene (both optionally substituted), biphenyl or perfluorobiphenyl;    Ar2 = substituted toluene moiety of formula (13d) or substituted phenyl moiety of formula (13e);    x, y = greater than 1;    Ar3 = substituted toluene moiety of formula (4a) or substituted phenyl moiety of formula (4b);    t = 0-3;    u, s = 0-4;    R = cyclohexane-1,2-dicarboxylic acid dimethyl ester, 1,3,5-trimethyl-(1,3,5)triazinane-2,4,6-trione, 4-(4-(dimethylamino)benzyl)-N,N-dimethylbenzenamine, substituted 1,3-bis-(4-(1-(4-methoxy-phenyl)-1-methyl-ethyl)-phenoxy)-propan-2-ol moiety of formula (13g), substituted methoxy-benzene moiety of formula (13h), 7-oxa-bicyclo(4.1.0)heptane-3,4-dicarboxylic acid dimethyl ester, (4-methoxy-phenyl)-dimethyl-amine or (3-methoxy-phenyl)-dimethyl-amine;    cyclic structure = 3-ethyl-4-methyl-hexane, 2-ethyl-pentanoic acid 2-ethyl-pentyl ester, hexanedioic acid bis-(2-ethyl-pentyl) ester, 2-ethyl-1,3,4-trimethyl-cyclopentane or 2-ethyl-pentanoic acid 4-(2-ethyl-pentanoyloxymethyl)-cyclohexylmethyl ester;    n = greater than 1; and    R98 = alkyl or aromatic group.