NOVELTY - Manufacture of alloy (24) involves providing substrate in reaction zone, carrying out primary deposition process, then carrying out secondary deposition process, alternatively repeating primary and secondary deposition process for sufficient number of times which forms the alloy on the substrate in pre-selected thickness.    USE - Manufacture of alloy used for manufacturing barrier structure for constructing and packaging electronic device including photovoltaic cell, organic light-emitting diode (all claimed) and photoelectronic device.    ADVANTAGE - The method provides alloy having excellent mechanical strength. The photovoltaic cell comprising the alloy has excellent flexibility and crack resistance.    DETAILED DESCRIPTION - Manufacture of alloy involves providing substrate in a reaction zone, carrying out primary deposition process, then carrying out secondary deposition process, alternatively repeating primary and secondary deposition process for sufficient number of times which forms the alloy on the substrate in pre-selected thickness. The primary deposition process is carried out by admitting primary reactant precursor vapor which is capable of forming adsorbed layer on the substrate into reaction zone, purging the reaction zone to remove unadsorbed primary reactant precursor vapor, then admitting secondary reactant precursor vapor into reaction zone under thermal condition which promotes reaction of the secondary reactant precursor vapor and adsorbs primary reactant precursor vapor, and purging the reaction zone of volatile reactant and reaction product. The secondary deposition process is carried out by admitting tertiary reactant precursor vapor which capable of forming adsorbed layer on the substrate into the reaction zone, purging the reaction zone to remove unadsorbed tertiary reactant precursor vapor, admitting reactant precursor vapor (a) into the reaction zone under thermal condition which promotes and adsorbs tertiary reactant precursor vapor, and purging the reaction zone of volatile reactant and reaction product. INDEPENDENT CLAIMS are included for the following:    (1) manufacture of barrier structure (50); and    (2) construction of electronic device.    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the organic transistor.    Gate electrode (22)    Alloy (24)    Gate dielectric (25)    Drain electrode (27)    Barrier structure (50)