TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The apparatus (I) further comprises a heater head provided separately from the nozzle and including the heater, where the heater moving unit includes a heater head moving unit which moves the heater head. The heater head includes a lamp housing which is a bottomed container accommodating the lamp. The heater includes a bottom plate of the lamp housing, which is heated by the irradiation with the infrared radiation. The lamp housing is formed of quartz. The heater head further includes a lid which closes an opening of the lamp housing. The lid is formed of a resin material. The heater further includes an opposed member to be located between the major surface of the substrate and the lamp and heated by the irradiation with the infrared radiation. The infrared lamp has an annular shape defined about a center axis perpendicular to the major surface of the substrate. The substrate holding unit is adapted to horizontally hold the substrate, and the apparatus (I) further comprises a rotation unit which rotates the substrate about a predetermined vertical axis, and a control unit which performs the liquid film forming step, liquid film retaining step, liquid film heating step and heater moving step. The apparatus (II) further comprises: the retention head moving unit, where the lamp has a smaller diameter than the substrate; a cup (5) which accommodates the substrate holding unit and has an opening provided at a position to be opposed to the major surface of the substrate and having a size such that the substrate can be passed through the opening, where the gas outlet port is disposed in the opening and adapted to spout the gas toward an open end of the cup; a gas flow pipe through which the gas flows to be spouted from its outlet hole extending thickness-wise through a pipe wall; a gas supplying unit which supplies the gas to the gas flow pipe; and an upper baffle plate and a lower baffle plate which deflect the gas flowing through the gas flow pipe and spouted from the outlet hole to form a gas stream flowing along the major surface of the substrate, where the gas stream formed by deflecting the gas by the pair of baffle plates is supplied to the gas outlet port.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The chemical liquid is a resist lift-off liquid. Preferred Method: In method (M1), the supply of the chemical liquid onto the major surface of the substrate is stopped in the liquid film retaining step. The method (M1) further comprises, simultaneously with the liquid film retaining step, supplying the chemical liquid at a per-unit-time flow rate lower than the predetermined flow rate onto the major surface of the substrate. The chemical liquid supplying step includes supplying the chemical liquid at the predetermined flow rate to the substrate at start of the liquid film retaining step, and then reducing the flow rate of the chemical liquid to be supplied to the substrate as the liquid film retaining step proceeds. The chemical liquid supplying step includes intermittently supplying the chemical liquid to the substrate held by the substrate holding unit. The liquid film heating step and the heater moving step are performed simultaneously with the liquid film forming step. The method (M2) further comprises: an opposing step of, before the liquid film heating step, locating the heater in opposed relation to the major surface of the substrate; a heater moving step of, simultaneously with the liquid film heating step, moving the heater along the major surface of the substrate, where the heater moving step includes a keeping-still step of moving the heater along and over the major surface of the substrate and, after the movement of the heater, keeping the heater still above the major surface of the substrate. The heater moving step includes continuously moving the heater along and over the major surface of the substrate while changing a movement direction of the heater. The substrate is rotated at: the second rotation speed in the liquid film forming step; a third rotation speed that is higher than the second rotation speed and lower than the first rotation speed in the liquid film forming step; and at a fourth rotation speed that is lower than the second rotation speed in the liquid film forming step. The substrate is rotated at the first rotation speed in the liquid film forming step. The liquid film heating step is performed simultaneously with the liquid film forming or film thinning step. The outlet hole includes many separate outlet holes which are provided circumferentially of the gas flow pipe in circumferentially spaced relation. The outlet hole has an annular shape extending circumferentially of the gas flow pipe. The pipe wall of the gas flow pipe is heated by the irradiation with the infrared radiation to heat the gas flowing through the gas flow pipe. The pipe wall of the gas flow pipe is formed of quartz. The retention head includes the lamp housing which accommodates the infrared lamp, where the pipe wall of the gas flow pipe is formed integrally with the lamp housing and the lower baffle plate. The lower baffle plate is supported by the gas flow pipe. The apparatus (II) further comprises: a suction pipe having a suction port and inserted in the gas flow pipe; and a suction unit which sucks an inside of the suction pipe, where the gas flow pipe and the suction pipe are configured in a double pipe structure such that the suction pipe is inserted in the gas flow pipe, and a distal end portion of the suction pipe extends through the lower baffle plate to form the suction port. In apparatus (III): a pipe wall of the chemical liquid flow pipe is heated to a higher temperature by the irradiation with the infrared radiation to heat the chemical liquid. The chemical liquid flow pipe has a chemical liquid outlet port from which the chemical liquid is spouted onto the major surface of the substrate. The apparatus (III) further comprises an outer pipe surrounding the chemical liquid flow pipe and fixed to the chemical liquid flow pipe to define a gas flow passage between the chemical liquid flow pipe and the outer pipe and define a gas outlet port between the chemical liquid flow pipe and a distal end of the outer pipe so that a gas flows through the gas flow passage to be spouted from the gas outlet port, where the chemical liquid spouted from the chemical liquid outlet port and the gas spouted from the gas outlet port are mixed together to form droplets of the chemical liquid. The retention head includes a lamp housing which is a bottomed container accommodating the infrared lamp and has a bottom plate having horizontal upper and lower surfaces, where the chemical liquid flow pipe has an opening opposed to the upper surface of the bottom plate in the lamp housing, and the bottom plate has many chemical liquid outlet ports vertically extending through the bottom plate. The pipe wall of the chemical liquid flow pipe is formed: of quartz; and integrally with the lamp housing. The apparatus (III) further comprises the rotation unit and the control unit.