NOVELTY - Manufacturing a transparent substrate having a nano pattern, comprises: forming a resin layer made of a transparent material on the transparent substrate (S1); forming at least one unit pattern part composed of a first pattern area and a second pattern area in which many grid patterns are formed, and a protrusion pattern formed between the first pattern area and the second pattern area, on the resin layer (S2); and forming a nanoscale metal layer on the protrusion pattern (S3).    USE - The method is useful for manufacturing a transparent substrate (claimed) that is used in touch panel, LCD device and solar cell.    ADVANTAGE - The method: allows easy formation of nano pattern; provides nano pattern applicable to a large sized substrate; forms nano scale grid patterns uniformly throughout the substrate, thus forming the transparent substrate having electrical conductivity equal to indium titanium oxide at low cost; utilizes master mold that is recyclable until it is damaged, thus reducing raw material charge and production cost; and manufactures master mold separately thus securing flexible process.    DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for the transparent substrate comprising: the transparent substrate; a resin layer which is formed on the transparent substrate and is made of a transparent material; at least one unit pattern layer formed on the resin layer; a nanoscale metal layer which is formed on the unit pattern layers; and the protrusion pattern formed between the first pattern area and the second pattern area, where the metal layer is formed on the protrusion pattern.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of flow chart of manufacturing the transparent substrate having nano pattern.    Forming transparent resin layer on transparent substrate (S1)    Forming at least one unit pattern part composed of first and second pattern areas and protrusion pattern on resin layers (S3)    Forming nanoscale metal layer on protrusion pattern (S5)