TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The substrate includes silicon wafer material, quartz material, glass fabric or conductive substrate.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal oxide precursor is chosen from titanium dioxide precursor, zinc oxide precursor and tantalum oxide precursor. The metal oxide-carbonaceous hybrid film includes arranged metal oxide nanoparticles.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The acid solution includes water, alcohol, acid and chelating agent. The mole ratio of chelating agent and metal oxide precursor is 4-8.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The self-assembled block copolymer including amphiphilic self-assembled block copolymer is chosen from poly(styrene-block-ethylene oxide)(Poly(styrene-b-ethylene oxide)), poly(styrene-block-(4-vinylpyridine)), poly(styrene-block-(2-vinylpyridine)), poly(styrene-block-polyacetonitrile), poly(acrylonitrile-block-n-butylacrylate), poly(acrylonitrile-block-( epsilon )-carprolactone) and poly(ethylene oxide-propylene-ethylene oxide). The content of self-assembled block copolymer in the reversed micelle solution is 0.1-1 wt.%. The molar ratio of metal oxide precursor and hydrophobic block or amphiphilic block of self-assembled block copolymer is 0.5-4. Preferred Process: During preparation of solution (S1), only one type of blocks in the self-assembled block copolymer is selectively dissolved using the solvent chosen from toluene, chloroform, tetrahydrofuran, dimethylformamide, benzene, cyclohexane, hexane, ethyl acetate, heptane and xylene. Preferred Condition: The stabilization process is performed by ultraviolet irradiation or addition of crosslinking agent under vacuum. The heat-treating process is performed in presence of inactive gas at 500-800 degrees C. Preferred Arrangement: The metal oxide-carbonaceous hybrid film is formed on uppermost layer and/or lowermost layer of structure of dye-sensitized solar cell.