NOVELTY - A laminated film has at least one layer (Ha-Hc) of thin film layer (H) formed on surface of at least one side of base material (F) and base material. The thin film layer contains silicon atom, oxygen atom and carbon atom. The mean density of thin film layer is 2 g/cm3 or more.    USE - Laminated film is used for organic electroluminescent apparatus, photoelectric conversion apparatus and liquid crystal display device (all claimed).    ADVANTAGE - The laminated film has excellent gas-barrier property.    DETAILED DESCRIPTION - A laminated film has at least one layer of thin film layer formed on surface of at least one side of base material and base material. The thin film layer contains silicon atom, oxygen atom and carbon atom. At the distance from the surface of thin film layer along the film thickness direction of thin film layer, the atomic ratio of oxygen is more than the atomic ratio of silicon (ratio of silicon number of atoms with respect to total number of silicon atom, oxygen atom and carbon atom in thin film layer), which is more than the atomic ratio of carbon in 90% or more of region along the film thickness direction of thin film layer, carbon distribution curve has at least 1 extreme value and maximum value of carbon atomic ratio in carbon distribution curve and absolute value of difference of minimum value are 5 atomic% or more. The average values of carbon atomic ratio calculated from carbon distribution curve are 11 atomic% or more and 21 atomic% or less. The mean density of thin film layer is 2 g/cm3 or more. The silicon distribution curve, oxygen-content cloth curve, and carbon distribution curve which shows the relationship between silicon-atom number ratio (atomic ratio of silicon), oxygen-atom number ratio (atomic ratio of oxygen) and carbon-atom number ratio (carbon atomic ratio), respectively.    DESCRIPTION OF DRAWING(S) - The drawing shows the schematic view of the laminated film.    Base material (F)    Thin film layer (H)    Layers (Ha-Hc)