NOVELTY - The apparatus has an outlet section (140) communicated with a piping (130). An outlet port (141) is positioned on side surface and bottom surface of the outlet section, to blow out the cooling fluid towards the inner surface of the immersion section (110). The distance (L2) between an upper end position of an upper end outlet port and a lower end position of the immersion section is equal or shorter than the half of a distance (L1) between an upper end position of the immersion section and a lower end position of the immersion section.    USE - Apparatus for refining semiconductor or metal e.g. silicon (claimed) for poly crystalline-silicon solar cell used in industrial application. Can also be used in graphite, silica, quartz, silicon carbide, alumina, mullite, iron, stainless steel, and copper.    ADVANTAGE - The refinement of semiconductors or metals can be pulled up and recovered effectively. The formation of the wide unit and the thin unit can be suppressed by arranging the blower outlet in the blowing unit. The local thickness change and incidence rate of the fall phenomenon of the refinement silicon can be reduced.    DETAILED DESCRIPTION - A cooling unit (100) is provided with a hollow rotating shaft section (120) and a hollow immersion section which is communicated with the rotating shaft section, and immersed in a molten semiconductor or a molten metal. The piping is set to circulate a cooling fluid which cools the cooling unit. A crucible is set to melt a semiconductor or a metal. The bottom face of the immersion section is comprised by a spherical surface. The coolant is formed from graphite.    DESCRIPTION OF DRAWING(S) - The drawing shows the partial cross sectional view of the apparatus for refining semiconductor or metal.    Cooling unit (100)    Immersion section (110)    Hollow rotating shaft section (120)    Piping (130)    Outlet section (140)    Outlet port (141)    Distance between upper-end position of the immersion section and lower end position of the immersion section (L1)    Distance between upper end position of upper end outlet port and lower end position of the immersion section (L2)