TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): (I) is prepared by mixing carbazole-containing compound of formula (A) and phosphine oxide in anhydrous system and oxygen-free environment with organic solvent at - 78 degrees C to - 70 degrees C, reacting with n-butyllithium, adding diphenyl phosphorus chloride, raising temperature to 20-25 degrees C to obtain intermediate product; and adding oxidant to intermediate product and obtaining desired material. The mole ratio of n-butyllithium, compound (A) and diphenyl phosphorus chloride is 2:1:2-2.5:1:2.5. The compound (A) is reacted with n-butyllithium for 3 hours. The reaction process is carried out at 20-25 degrees C for 3-12 hours. The oxidant is hydrogen peroxide. The organic solvent is tetrahydrofuran, benzene, cyclohexane, and/or ether.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The indium gallium nitride semiconductor layer comprises indium gallium nitride (InzGa1-zN), where z is 0.06-0.08. The first base region and the second base region comprises indium gallium nitride (InxGa1-xN) and indium gallium nitride (InyGa1-yN), where x is 0.02-0.17 and y is 0.05. Each of the quantum well regions comprises indium gallium nitride (InxGa1-xN), where x is 0.12.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The second dielectric film is aluminum oxide that is formed by chemical reaction of an aluminum single-piece or an aluminum compound, and an oxidizing agent that is carbon dioxide and nitrous oxide. The aluminum compound is alkyl aluminum or aluminum chloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The chemical composition of the high resistance buffer layer comprises boron nitride. The chemical composition of the window layer comprises aluminum doped zinc oxide or boron doped zinc oxide. The chemical composition of the buffer layer comprises cadmium sulfide.
TECHNOLOGY FOCUS - METALLURGY - The antennas are made of nickel. The power lines are made of aluminum. The ground lines are made of gold.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentrations of copper sulfate, zinc sulfate, and tin sulfate cationic solution precursor are 0.05-0.2M, 0.025-0.1M, and 0.025-0.1M, respectively. The pH of cationic and anionic precursor solutions is 2-6. Preferred Properties: The film is annealed in air at 673 K for 3 hours. The film is polycrystalline and compact. The film has an electrical resistivity of 102-105 Omega .cm, a thickness of 0.52-0.98 mu m, and an optical absorption of 104 cm-1. The film is deposited at room temperature.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The additive comprises boron, sulfur and/or its mixtures. The adhesive layer is made of titanium, vanadium, chromium, zirconium, niobium, molybdenum, hafnium, tantalum, nickel or chromium nitride. The first intermediate layer is made of silicon carbide (SiCx), metal carbide (MECx) or tungsten carbide (WCx). The second intermediate layer comprises DLC, Si-DLC, Me-DLC, W-DLC, and metal pairs as given in the specification. The third intermediate layer comprises Me-DLC or DLC. The base body is made of a material consisting of steel, steel alloys, titanium and its alloy, aluminum and its alloy, magnesium and its alloy, copper and its alloy, ceramic material, hard metal, tungsten and its alloy, tantalum and its alloy, nickel and its alloy, silicon and its alloy, bronze, and/or plastics.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The intensity ratio (P314/P427) of lithium orthophosphate phase and lithium pyrophosphate phase in powder X-ray diffraction is 1.1 or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of components (A,B) is preferably 25-50 mol% and 50-75 mol%, respectively. The monomer component contains 9,9'-bis(3,4-dicarboxy phenyl) fluorene dianhydride as tetracarboxylic dianhydride containing 9,9'-diphenyl fluorene structure, and 9,9'-bis(4-aminophenyl) fluorene as diamine containing 9,9'-diphenyl fluorene structure. The tetracarboxylic-acid component contains more than 50 mol% tetracarboxylic dianhydride (I), and diamine component contains more than 50 mol% diamine containing 9,9'-diphenyl fluorene structure. Preferred Definitions:    R=groups of formulae (i)-(iv).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Unsaturated bond of unsaturated diepoxy compound (II) is hydrogenated, and saturated diepoxy compound is produced. Preferred Method: The hydrogenation reaction is carried out in hydrogen atmosphere using a palladium compound as a catalyst. Metathesis reaction of epoxy compound of formulae (IV) and (IV') is carried out to produce cyclic compound of formula (V). The resulting compound is epoxidized to produce unsaturated diepoxy compound (II). The unsaturated diepoxy compound is produced using ruthenium complex as a catalyst and peroxy acid as an epoxidation agent. EXAMPLE - 1 g 1,3-Bis(2,4,6-trimethylphenyl)-2-imidazolidinylidene dichloro-(3-phenyl-1H-inden-1-ylidene)(tricyclohexylphosphine)ruthenium was dissolved in 53.3 g of toluene. 52.3 g 1,2-Epoxy-4-vinyl cyclohexane was added under nitrogen atmosphere, and stirred at 40 degrees C for 48 hours. The reaction liquid was concentrated and purified to produce 11.2 g epoxy compound.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Conditions: The temperature is gradually increased to 250-400 degrees C at 3-10 degrees C/minute, heating is carried out for 0.5-2 hours, temperature is increased to 800-1200 degrees C, and carbonization is carried out for 0.5-2 hours. The content of amino acid is 0.04-0.1 g/mL in ethanol-water solution. The volume ratio of ethanol and water in the ethanol-water solution is 1:0.5-1:4.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The metal salt is chloride of iron, cobalt and/or nickel. The silicon dioxide nanospheres have a particle size of 30 plus minus 10 nm. The concentration of hydrofluoric acid solution is 20-40%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The amino acid is L-lysine, arginine or histidine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The semiconductor material comprises copper sulfide, silver sulfide, and copper indium sulfide. The hollow structure can be spherical, square, and other geometrical shape. The hollow structure has cavity size of 50-1000 nu m and thickness of 20-500 nu m. The hollow structural is assembled by nanoparticles. The mass of hollow structure is 0.01-10% conversion fluid.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The medium is water, ethylene glycol, and/or propylene glycol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Pure graphite powder is natural graphite powder with particle size lessthan or equal to 200 mesh, graphitization degree of greater than or equal to 95%, and non-carbon impurity content lessthan or equal to 30 ppm and metal catalyst is iron, nickel, manganese, and/or cobalt with particle size lessthan oe equal to 200 mesh. Mass ratio metal catalyst:iron is 7:3 and mass ratio nickel alloy:manganese alloy:cobalt alloy is 70:25:5. Preferred Parameter: Sintering pressure is 0.0001-0.1 Pa. Preferred Processes: Magnetic field orientation is generated by block in synthesis of core ends of conductive rims achieved through magnetic installation in which magnet is magnetic iron (N30-N35AH).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The reaction material (A) is obtained by reacting 6 mol or more, preferably 7 mol or more glycidyl group of triglycidyl isocyanurate with respect to 1 mol hydroxy group of polyhydroxy compound. Preferred Composition: The compound (I) is chosen from 9,9-bis(mono-1-4C alkylhydroxyphenyl)fluorene and 9,9-bis(mono-6-10C aryl- hydroxyphenyl)fluorene. The reaction material (A) contains fluorene compound of formula (III). The reaction material (B) contains carbonyl group-containing compound of formula (IV).X=group of formula (i);andY'=group of formula (ii). Preferred Definitions:    Z=benzene ring or naphthalene ring;    m=1-2;    n=0-2;    p=1-3;and    R2=alkyl or aryl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): organoselenide compound of formula: A-Se-H is reacted with metallic compound of formula: MLn, to obtain selenide complex (I). Preferred Compound: The selenide complex (I) is preferably of formula (II).R=H, 1-7C alkyl, halo, hydroxy, nitro, amino, or optionally substituted 1-7C alkoxy;p=1-4;andm=0-2.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Silicon compound is silica and tetraethyl orthosilicate. Additive comprises 35-50 wt.% zinc oxide, 25-40 wt.% lanthanum oxide and 20-35 wt.% alumina. Surface modifier is hexadecyltrimethoxysilane or hydrophobic radical-containing organic, alkyl, aryl or o-tolyl compounds.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The carboxylic acid compound: comprises monocarboxylic acid compound and/or polyvalent carboxylic acid compound, preferably polyvalent 2-carboxylic acid compounds; and is acetic acid, iminodiacetic acid, nitrilotriacetic acid, ethylene diamine tetraacetic acid, diethylenetriamine pentaacetic acid, ethylene glycoltetraacetic acid and 1,2-bis(o-aminophenoxy)ethane-N,N,N',N'-tetraacetate. The carboxylic acid compound is present in an amount of 0.1-10 wt.%. The buffer layer comprises zinc sulfide and/or and zinc oxide. Preferred Composition: The composition further comprises alkali compound, zinc salt compound and sulfur-containing compound. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The rare earth complex is europium element ternary complex europium (aspirin) (phen). The organic solvent is dichloromethane, chloroform or dimethyl formamide. Preferred Method: The rare earth complex is prepared by dissolving europium oxide into excess diluted hydrochloric acid, reacting, drying excess hydrochloric acid, and volatilizing to prepare europium chloride, dissolving europium chloride, acetylsalicylic acid and o-phenanthroline with mol ratio of 1:3:1 in ethanol, using triethylamine as complexing agent and catalytic agent, and adjusting pH of solution at 7-9, reacting for 2 hours, washing, filtering and drying to obtain white powder rare earth complex.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The high molecular material is polymethyl methacrylate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The lead-free glass powder comprises 55 pts. wt. bismuth trioxide, 10 pts. wt. boron trioxide, 2 pts. wt. zirconium oxide, 15 pts. wt. silicon dioxide, 12 pts. wt. zinc oxide, 3 pts. wt. titanium oxide, 13 pts. wt. aluminum oxide and 1 pt. wt.%. phosphorus pentoxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The source material used for depositing alumina layer and titania layer is trimethyl aluminum and titanium tetrachloride, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: A mass percent of the hydrofluoric acid solution is 3-30%. The alkaline solution is potassium hydroxide solution. A mass percent of the potassium hydroxide solution is 10-50%. The temperature of the alkaline solution is 25-70 degrees C during the etching step.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The fluoride is silicon tetrafluoride, sulfur hexafluoride, carbon fluoride, fluoroform, hexafluoroethane, octafluoropropane, hydrogen fluoride, calcium fluoride, magnesium fluoride and/or barium fluoride. The hydride is silane and/or disilane. The gas mixture used to form the first I-type sub-layer has a fluorine concentration of 1E15-1E21 cm-3.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The eutectic interlayer is less than 50 microns thick. The solar cell comprises an inverted metamorphic photovoltaic device.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The compound is an oxide within malonic acid mixed in an eutectic or near-eutectic ratio with deep eutectic solvents to suppress the freezing temperature. The eutectic interlayer/eutectic layer comprises at least one quaternary salt. The eutectic layer comprises an oxide. The gas comprises oxygen or water vapor. Preferred Method: In the method (M1) at least some of the compound of the eutectic layer bonds with a transparent covering, raising the melting temperature of the eutectic layer and causing the eutectic layer to solidify and bond with the solar cell and the transparent covering. The step of modifying the chemistry of the eutectic layer comprises introducing a gas to a process chamber that causes the eutectic layer to solidify. The solar cell is heated to not greater than 300 degrees C.
TECHNOLOGY FOCUS - METALLURGY - The electrode active material is made of lithium- transition metal composite oxide containing nickel, cobalt and manganese. The micro electrically conductive material is formed of acetylene black. The anisotropic electrically conductive material is made of graphite.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The zinc oxide layer is provided on buffer layer formed on the absorber layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In step (i) the preparation of ferric nitrate solution and calcium nitrate solution in the volumetric flask is set to constant volume. In step (iii) stirring is performed using magnetic force stirrer, and the stirring time is 10 minutes. In step (iv) the insulating time is 0-1 hour, the primary powder is initially heated to 300-700 degrees C, and the roasting time is 0.5-2 hours. In step (iv) the muffle furnace is heated to 300-700 degrees C, and the obtained dark brown fluffy powder is uniformly grinded. Preferred Components: The mol concentration of ferric nitrate solution and calcium nitrate solution is same.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: Preferably the method involves: providing a population of a semiconducting material and a population of a metal material; layering the population of the semiconducting material and the population of the metal material; and consolidating the layered materials to form at least two layers to create an electrical connection between at least two layers. A single junction is created between the two layers of the two populations of semiconducting materials. The junctions are created between the two layers of the two populations of semiconducting materials. The method further involves adding at least one other material between the two layers of the two populations of semiconducting materials; and post-processing the composition after the consolidating to form pillars. Prior to the consolidating, the method involves adding other material as a powder. Preferred Components: The two populations of semiconducting materials is selected from: semiconductor powders, semiconducting nanomaterials, and solid semiconductor materials; and include a population of a P type semiconductor material and a population of an N type semiconductor material.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The other material is selected from a metal, a conductor, an insulator, and a high bandgap semiconducting material. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The conductive glass material has a conductivity of greater than 1x 10-11 Scm-1. The conductive glass material comprises up to 85 (preferably 20-85) m.% silver (preferably silver oxide or silver halide). The 1-15 wt.% inorganic reaction system comprises silver halide matrix forming composition according to formula (AgHA)x-(AgO0.5)y-(MnOr)z (I). The 5-95 wt.% silver halide matrix forming composition comprises 0.5-95 wt.% silver halide, 0.5-60 wt.% Ag2O and 0.5-95 wt.% other oxides. The 50-95 wt.% metallic particles are selected from silver, gold, copper, and nickel (preferably silver).HA=halo;M=Pb, Bi, Li, Na, K, Mg, Sr, Ba, Zn, P, B, Si, Ag, Al, Ti, W, V, Cr, Mn, Co, Ni, Cu, Nb, Ta, Te, Th, Ge, Mo, La or Ce;n=greater than 0;x-z=0-1.Where x:y is 0:100 to 95:5 (preferably x:z 0:100 to 80:20). Preferred Composition: The composition according further comprises additional matrix forming composition comprising lead containing glass composition, and is free of intentionally added lead. The silver halide matrix forming composition further comprises at least one selected from alkaline oxides, alkaline earth metal oxides, rare earth metal oxides, and Pb, Bi, Al, Ga, Si, Ge, Sn, B, P, Sb, Te, Nb, Ta, V, Ti, Mo, or W oxides.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The 1-20 wt.% organic vehicle comprises a binder, a surfactant, an organic solvent, and a thixotropic agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The phosphorus compound is diphosphorus pentoxide and/or phosphate ester. The water is pure water.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent is alcohol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The surface roughness on a top of the inorganic layer is 1 nm or more. The surface roughness of the lower organic layer on the top of the inorganic layer is 2 nm or less. The thickness of the inorganic layer and organic layer is 15-200 nm and 0.5-5 mu m, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The negative photosensitive siloxane composition further contains adherence enhancer, polymerization inhibitor, antifoamer, surfactant, photosensitizer and additive chosen from stabilizers.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The silicon-containing compound contains carboxyl group, acid-anhydride group or phenolic hydroxyl group. The silicon compound is acid-anhydride group containing silicone. The amount of polymerization initiator is 0.001-10 pts. wt. with respect to 100 pts. wt. polysiloxane. The content of silicon compound is 0.5-8 pts. wt. with respect to 100 pts. wt. polysiloxane.    TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The weight average molecular weight of polysiloxane is 5000 or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The complex oxide black pigment has spinel structure containing copper-manganese-iron oxide (Cu(Mn,Fe)2O4), and having BET specific surface area of 30 m2/g or more. The infrared rays-shielding composition further contains tin-doped indium oxide, antimony-doped tin oxide, and/or electroconductive zinc oxide. Preferred Process: The 2-10 mol% bivalent metal chosen from calcium and magnesium are introduced with respect to copper. Preferred Property: The complex oxide black pigment has BET specific surface area of 40 m2/g or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The hydrophobic intermediate layer further contains hydrophobic material. The sum total content of metal compound particles and hydrophobic material is 100 %mass. The content of the metal compound particles and hydrophobic material is 65-99.9 %mass and 65-100 %mass, respectively. The metal compound particles are colloidal silica particles. The hydrophobic material is polyorganosiloxane particle or polyorganosilsesquioxane particles.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The process further comprises performing fractional distillation for separating monosilane, disilane, higher silanes and other volatile compounds. The reaction step is performed using an agitation unit, and is carried out in presence of 0.1-2 wt.% of calcium chloride. The grinding step is carried out under an inert or reducing atmosphere. Preferred Components: The particles of powder have a diameter of 50-200 mu m. An interior temperature of the reactor is 300-500 degrees C, preferably 350-400 degrees C, and an interior pressure of the reactor is 10.105-300.105 Pa, preferably 10.105-200.105 Pa. The hydrogen unreacted with the silicon alloy is recycled in the reactor using a recycling unit. The silicon alloy has a structure of formula (CaAl2Si2). The mixture of gases comprises 90% (preferably 80%) of monosilane, and 10% (preferably 20%) of disilane. M1 = Al; and    M2 = Ca or Mg.    EXAMPLE - Molten salt (lithium chloride, potassium chloride, magnesium or magnesium chloride) was reacted with hydrogen at a temperature of 500-1000 degrees C. Reaction of silicon powder with catalyst (platinum, palladium, nickel and silver) and hydrogen was performed at a temperature of 20-600 degrees C and a pressure of 50.105 to 105 Pa. Reaction of silicon powder with aluminum/aluminum chloride and hydrogen was performed at a pressure of less than 50.505 Pa. 3 molecules of silicon dioxide, 2 molecules of aluminum and 6 molecules of hydrogen were reacted to give 3 molecules of siliane and aluminum oxide in a molten salt bath to obtain disilane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The spherical particles are particles of metal oxide. The content of spherical particles is 5-80 volume%. The average of center to center distance of spherical particles dispersed in transparent sheet is 100-360 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The transparent resin is acrylic resin of formula (I) and epoxy resin of formula (II).R1=cyano, halo or alkyl;R2=alkyl;R3=alkylene;R4=H or methyl;x=0-4;y=2-4;andz=1 or more.Preferred Property: The difference of refractive index of transparent resin and spherical particles is 0.2 or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The vapor deposition layer is obtained by vacuum-depositing vapor deposition material containing metal silicon and silicon dioxide. Preferred Composition: The vapor deposition material comprises metal chosen from aluminum, zinc, tin, iron and manganese or its oxide. The content of vapor deposition material contained in vapor deposition layer is 1-20 atomic%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The gas-barrier laminate further comprises organosilicon compound (B) including silicon compound of formula: Si(OR1)4 (II) or R3-Si(OR2)3 (III). The coating liquid further comprises acrylic polyol (C) having 2 or more hydroxyl groups, and isocyanate compound (D) having 2 or more isocyanate groups in a molecule. The gas-barrier laminate further has anchor-coat layer formed from anchor-coat agent containing isocyanate compound having 2 or more isocyanate groups provided between resin base material and vapor deposition layer. The acrylic polyol has hydroxyl value of 50-250 mg potassium hydroxide/g. The equivalence ratio of isocyanate group of isocyanate compound to hydroxyl group of acrylic polyol in anchor-coat agent is 0.15-0.75.R1,R2=R;andR3=organic group having epoxy group or isocyanate group.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic fiber cloth is glass tissue. The gas barrier film further has an auxiliary barrier layer (3) containing inorganic compounds and laminated on the transparent composite base material.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The cyclic olefin resin has cyclic olefin copolymer as a main component. The cyclic olefin copolymer is copolymer of norbornene and ethylene. Preferred Properties: The copolymerization ratio of norbornene and ethylene based on mass conversion is 80:20-90:10. The melt volume rate of cyclic olefin copolymer at 280 degrees C and under load of 2.16 kg is 0.8-2 cm3/10 minutes measured based on ISO1133. Preferred Process: The resin layer is in film form. The resin layer is laminated on the inorganic fiber cloth in film form, and the transparent resin is dried after impregnation and lamination processes.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The polyoxyalkylene addition product (A) has number average molecular weight of 350-10000, and hydrophilic-lipophilic balance of more than 20 to 25.5. The cutting fluid has electrical conductivity of 1-200 mu siemen/cm at 25 degrees C. Preferred Composition: The polyoxyalkylene addition product (A) is polyoxyalkylene addition product of glycerol, trimethylol propane, pentaerythritol and sorbitol. The content of polyoxyalkylene addition product (A) in cutting fluid is 0.1-40 wt.%. Preferred Definitions:    -(A1O)m-=-(A2O)n/(A3O)k;    A2O=oxyethylene;    A3O=oxypropylene;    n=1-350;    k=0-10;and    n/(n+k)=0.7-1.    ethylene oxide and propylene oxide are arranged in random or block arrangement.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The methine-type compound (I) is chosen from 6 compounds e.g. (2E)-2-cyano-3-(5-(3-(9,9-dibutyl-9H-fluoren-2-yl)-5-(4-(diphenylamino)phenyl)thiophen-2-yl)thiophen-2-yl)prop-2-enoic acid of formula (Ia), (2E)-3-(5-(5-(4-(bis(9,9-dibutyl-9H-fluoren-2-yl)amino)phenyl)-3-(9,9-dibutyl-9H-fluoren-2-yl)thiophen-2-yl)thiophen-2-yl)-2-cyanoprop-2-enoic acid, (2E)-2-cyano-3-(5-(5-(3-(9,9-dibutyl-9H-fluoren-2-yl)-5-(4-(diphenylamino)phenyl)thiophen-2-yl)thiophen-2-yl)thiophen-2-yl)prop-2-enoic acid, (2E)-3-(5-(5-(5-(4-(bis(9,9-dibutyl-9H-fluoren-2-yl)amino)phenyl)-3-(9,9-dibutyl-9H-fluoren-2-yl)thiophen-2-yl)thiophen-2-yl)thiophen-2-yl)-2-cyanoprop-2-enoic acid and (2E)-3-(5-(5-(5-(4-(bis(9,9-dibutyl-9H-fluoren-2-yl)amino)phenyl)-3-(4-(diphenylamino)phenyl)thiophen-2-yl)thiophen-2-yl)thiophen-2-yl)-2-cyanoprop-2-enoic acid. Preferred Definitions:    m=1;    Z 1-Z 3=sulfur;    l,n,k=0;    A 1-A 10=H;    R 1=9,9-dibutyl-fluoren-2-yl or triphenylamino;and    R 2=bis-(9,9-dibutyl-9H-fluoren-2-yl)-phenylamino or triphenylamino.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: Polysiloxane is hydrolysis-condensed product of silane containing phenyl-group containing silane, or hydrolysis-condensed product of silane containing silane of formula: R2-Si(R1)3 (I). The content of hydrolysis-condensed product of silane containing silane (I) is 10-100 mol%. The hydrolysis-condensation product of silane containing silane compound (I), silane compound of formula: R4Si(R3)3 (II), and silane compound of formula: Si(R5)4 (III). The molar ratio of hydrolysis-condensation product of silane compound (I), silane compound (II) and silane compound (III) is 10-100:0-90:0-50. The underlayer film-forming composition further comprises acid, curing catalyst, and water.R1=alkoxy, acyloxy, or halo;R2=organic group containing optionally substituted benzene ring bonded with silicon atom by Si-C bond, preferably phenyl;R3=alkoxy, acyloxy or halo;andR4=organic group containing optionally substituted hydrocarbon bonded with silicon atom by Si-C bond, preferably methyl or vinyl.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The water contact angle of polysiloxane is a value between the water contact angle of organic polymer chain (A) of block polymer, and water contact angle of organic polymer chain (B). The self-assembled film has block polymer containing organic polymer chain (A) including organic monomer (a) as unit structure, and organic polymer chain (B) bonded with organic polymer chain (A) including the organic monomer (b) different from organic monomer (a) as a unit structure. The block polymer is block copolymer including polystyrene (A), and poly(methyl meth)acrylate (B), polystyrene (A) and polyisoprene (B), or polystyrene (A) and polybutadiene (B).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The compound (A) is of formula (A1),(A2),(A3),or(A4).The compound(B) is of formula (B1),(B2),(B3),or(B4).The mol ratio of compound (A), palladium salt, oxidizing agent, and compound (B) is 1-3:0.01-1:0.1-4:1-3.0. The palladium salt is PdM2, PdLnCl2, tetrakis(triphenylphosphine)palladium (Pd(PPh3)4), or Pd2(dibenzylideneacetone)3. The oxidizing agent comprises copper salt, benzoquinone or its derivative, or oxygen. The inert solvent comprises N-methylpyrrolidone, N,N-dimethylformamide, dimethylsulfoxide, 1,3-dimethyl-3,4,5,6-tetrahydro-2-pyrimidinone, 1,4-dioxane, and/or N,N-dimethylacetamide. The reaction is optionally carried out in the presence of an additive i.e. acid, base, and/or ligand. It is carried out at 40-140 degrees C.M=acetate, trifluoroacetic acid, trifluoromethyl sulfonic acid, methyl, or halo;L=ligand selected from allyl, monodentate or bidentate phosphine ligand, or monodentate or bidentate nitrogen-containing ligand; andn=1-2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The fluorinated cyclic carbonate is present in an amount of 5-30 vol.%, and comprises monofluoroethylen carbonate, difluoroethylene carbonate and fluoropropylene carbonate. The lithium salt is lithium hexafluorophosphate, lithium tetrafluoroborate, lithium hexafluoroantimonate, lithium hexafluoroarsenate, lithium bis(trifluoromethylsulfonyl)imide, lithium compound (LiN(SO3C2F5)2), lithium trifluoromethanesulfonyl amide, lithium perchlorate trihydrate, lithium aluminate, lithium aluminum tetrachloride, lithium compound of formula (LiN(CxF2x+1SO2)(CyF2y+1SO2)), lithium chloride, lithium iodide and lithium bisoxalatoborate. The cathode is exposed to the ambient air, and comprises cathode active material containing elemental sulfur and sulfur-containing compounds.x, y = natural number.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The 1,3,5-trioxane is present in an amount of 5-60 vol.%. The 1,3-dioxolane is present in an amount of 10-80 vol.%. The volume ratio of 1,3,5-trioxane and 1,3-dioxolane is 1:1-1:8.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The zwitterionic modified dendrimer is prepared by reacting polyamide-amine with sultone. Polybenzimidazole (PBI) is of formula (I) or (II), or their soluble derivatives. The sultone is 1,3-propanesultone or 1,4-butane sultone. The solvent is dimethyl sulfoxide, N,N-dimethylformamide, N-methylpyrrolidone or dimethylacetamide. Preferred Method: The two solutions are dispersed thoroughly by ultrasonic function to obtain transparent or translucent state.n = not defined.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The nanoparticle includes dielectric materials comprising titanium, silicon dioxide, aluminum oxide or silicon nitride.
TECHNOLOGY FOCUS - METALLURGY - A metal thin film is made of silver or chromium. A transparent electrically conductive barrier layer is made of zinc, indium or tin.
EXAMPLE - Sorghum vulgare seed heads ash was boiled with an acid mixture (60 ml) comprising distilled sulfuric acid (50%), concentrated hydrochloric acid (30 ml), concentrated nitric acid (10 ml) and hydrochloric acid (3%) to dissolve the inorganic metal ions. The mixture was heated for 30 minutes. Hydrochloric acid (3%) was added to the mixture and refluxed for 4 hours. Concentrated hydrochloric acid (10 ml) was added to the acid mixture and treated. The mixture was heated until the clear solution was obtained and then filtered the hot solution to give silicon compounds.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The system comprises 10-90 wt.% composition and 10-60 wt.% the tellurium oxide additive. The tellurium oxide additive: comprises at least one of tellurium dioxide, tellurium trioxide, and any tellurium compound that would convert to tellurium oxide at 200-1000 degrees C; and is of an average particle size of less than 10 mu M, preferably less than 1 mu M. The composition is a glass frit, and comprises 10-90 wt.%, preferably 25-85 wt.%, or 5-45 wt.%, preferably 10-15 wt.% lead oxide. The weight ratio of lead oxide and tellurium oxide additive is 95:5-5:95, preferably 5:1-1:5. The metallic particles are at least one of silver (preferred), gold, copper and nickel and present at 50-95 wt.%. The silicon wafer has sheet resistance above 70 Omega /square, preferably 95 Omega /square. The glass frit is at least partially crystalline. EXAMPLE - Typical system comprised of 3.1 wt.% leaded glass frit (43% lead oxide) and 1.5 wt.% tellurium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The heating is carried out at a temperature of 20-500 degrees C, preferably 20-210 degrees C, and at a pressure of 0.01-1 atm, preferably 0.2-0.9 atm. The metal or metal oxide precursor is in direct physical contact with the substrate. Preferred Components: The metal or metal oxide precursor comprises a transition metal or a post-transition metal. The metal or metal oxide precursor comprises at least one of platinum (preferred), palladium, ruthenium, iridium, , nickel, cobalt, iron, copper, vanadium, chromium, titanium, tantalum, manganese, molybdenum, niobium and tin. The substrate comprises metal, a carbon material, a metal oxide, a silica material, a polymeric material, a solid acid, a solid oxide, or a metal salt, preferably cesium dihydrogen phosphate. The substrate is a powder, a porous substrate or a solid substrate, preferably the porous substrate and the solid substrate such that the metal or metal oxide nanoparticles form a continuous network of particles on the surface of the substrate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The reaction mixture further comprises a solvent consisting of dichloromethane, chloroform and carbon tetrachloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The semiconductor solar cell of the second solar cell part is made of Ge or indium gallium arsenide (InGaAs) or aluminum indium gallium arsenide (AlInGaAs) compound. The semiconductor solar cell of the first solar cell part is made of gallium arsenide, aluminum gallium arsenide, AlInGaAs or indium aluminum gallium phosphide compound.
TECHNOLOGY FOCUS - METALLURGY - Preferred Components : The metal grid lines are nickel, copper, silver, chromium, lead, tin, indium, bismuth, zinc, cobalt or cadmium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component : The heat treatment atmosphere is oxygen, argon, helium, neon, nitrogen, hydrogen or air.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The filler of second step is calcium carbonate, clay, talcum powder, mica powder, limestone and/or silicon flour.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The main crosslinking agent is 2,5-dimethyl-2,5-bis(tert-butylperoxy)-3-hexyne or alpha , alpha '-di-tert-butylperoxy-1,4-diisopropylbenzene. The auxiliary crosslinking agent of second step is diene, triene and/or tetraene compounds having two C-C terminal double bonds; triallyl isocyanurate or a trimethylolpropane triacrylate. The UV absorber of second step is benzophenone UV absorber, benzotriazole UV absorber and/or hindered amine UV absorber. The antistatic agent of first step is ethoxy glycerol fatty acid ester derivative, phosphate ester derivative, aliphatic amine derivative and/or other alcohol derivatives. The lubricant of second step contains 40-70 wt.% external lubricant and 30-60 wt.% internal lubricant, based on the total weight of the lubricant. The external lubricant is 12-18C fatty acid-based lubricant and the internal lubricant is fatty acids higher than 20C or paraffin hydrocarbon-based lubricant. The antioxidant of second step is hindered phenol antioxidant and/or phosphite antioxidant.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polyolefin composition resin of second step includes at least two selected from polyethylene (PE), polypropylene (PP) and ethylene-vinyl acetate (EVA) copolymer having VA content of 18-33%. The main crosslinking agent of first step is a kind of organic peroxide whose decomposition temperature is 110-220 degrees C and whose half-life is 10 minutes. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: Each of the drawn carbon nanotube films is made by: providing a carbon nanotube array; selecting a carbon nanotube segment having a predetermined width from the carbon nanotube array; and pulling the carbon nanotube segment at a uniform speed to form at least one drawn carbon nanotube film which is uniform. In step (c1), the voltage is applied to the carbon nanotube structure by attaching two strip electrodes substantially parallel to each other and substantially perpendicular to carbon nanotube segments, and a temperature of carbon nanotube segments increases as the voltage is applied; the parts of the graphene film contacting carbon nanotube segments are heated by carbon nanotube segments; a heating device is provided to heat the substrate, and heat is transferred from the substrate to the graphene film. The parts of the graphene film contacting carbon nanotube segments absorb more heat than the parts of the graphene film exposed out of the strip-shaped gap. The parts of the graphene film contacting carbon nanotube segments are removed, and the parts of the graphene film exposed out of the strip-shaped gap are maintained. In step (d1), the carbon nanotube structure is separated with the strip shaped graphene layer by an ultrasonic treating process for 3-30 minutes. Preferred Substrate: The metal substrate is made of copper or nickel, and has thickness of 100 nanometers to 100 micrometers. The width of the strip-shaped gap is 20-80 nanometers. The drawn carbon nanotube films are stacked with each other. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal substrate is made of copper or nickel.
TECHNOLOGY FOCUS - METALLURGY - The selenium-rich layer is formed by depositing a film of molybdenum selenium compound, indium selenium compound, copper selenium compound or gallium selenium compound.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Organic solvent contains nitrile solvent e.g. acetonitrile, propionitrile, and/or butyronitrile. Mass of zinc oxide added with respect to 1 mass of copper iodide is 0.01-0.2, preferably 0.05-0.1. Preferred Parameters: Film thickness is greater than or equal to 200 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Impurity contains boron. Molten salt is lithium fluoride (LiF), sodium fluoride (NaF), potassium fluoride (KF), rubidium fluoride (RbF), cesium fluoride (CsF), sodium fluorosilicate (Na2SiF6), cryolite (Na3AlF6), mixture of NaF and barium fluoride (BaF2), and/or mixture of NaF, BaF2, and barium chloride (BaCl2). Amount of molten salt is 5-300 mass% with respect to molten silicon. Preferred Processes: Before or during discharge process, molten salt is added to liquid phase silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The total amount of aluminum oxide and gallium(III) oxide powder is 0.4-4.0 mol%. The amount of amorphous silicon dioxide powder is 25.6-34 mol%. Preferred Properties: The silicon oxide has particle size of 10 mu m or less. The average particle diameter of aluminum oxide or gallium oxide is 5 mu m or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The volume density of vapor deposition material is 0.9-1.5 g/cm3 or less. Preferred Component: The powder of silicon dioxide contains 20% or more crystal structure.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The nitride is silicon nitride. The molten salt bath contains sodium hydroxide and sodium silicate.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The iron alloy is stainless steel. The stainless steel is SUS430-type stainless steel. The iron alloy is 42 alloys.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Inorganic barrier layer contains silicon oxide, silicon nitride, silicon carbide or their mixture.    TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: Organic layer is adjacent to inorganic barrier layer. Number of (meth)acryloyl groups of polymeric compound (2) is 3 or 4 per molecule. Preferred Components: Organic layer precursor composition contains a silane coupling agent. The barriering laminated body has gas barrier film having plastic film, organic layer and inorganic barrier layer.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The filings or powder or nanopowder contain metal chosen from magnesium, magnesium-nickel, magnesium-aluminum and titanium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alicyclic epoxy compound (A) is 7-oxa-bicyclo(4.1.0)heptane-3-carboxylic acid 7-oxa-bicyclo(4.1.0)hept-3-ylmethyl ester compound having cyclohexene oxide group. The curable resin composition further comprises siloxane derivative having 2 or more epoxy groups in a molecule, alicyclic polyester resin, rubber particles, curing agent, hardening accelerator, and curing catalyst.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The process further comprises performing fractional distillation for separating monosilane, disilane, higher silanes and other volatile compounds. The reaction step is performed using an agitation unit, and is carried out in presence of 0.1-2 wt.% of calcium chloride. The grinding step is carried out under an inert or reducing atmosphere. Preferred Components: The particles of powder have a diameter of 50-200 mu m. An interior temperature of the reactor is 20-100 degrees C, preferably 50 degrees C. The silicon alloy has a structure of formula (CaAl2Si2). The mixture of gases comprises 90% (preferably 80%) of monosilane, and 10% (preferably 20%) of disilane. M1 = Al; and    M2 = Ca or Mg.    EXAMPLE - Molten salt (lithium chloride, potassium chloride, magnesium or magnesium chloride) was reacted with hydrogen at a temperature of 500-1000 degrees C. Reaction of silicon powder with catalyst (platinum, palladium, nickel and silver) and hydrogen was performed at a temperature of 20-600 degrees C and a pressure of 50.105 to 105 Pa. Reaction of silicon powder with aluminum/aluminum chloride and hydrogen was performed at a pressure of less than 50.505 Pa. 3 molecules of silicon dioxide, 2 molecules of aluminum and 6 molecules of hydrogen were reacted to give 3 molecules of siliane and aluminum oxide in a molten salt bath to obtain disilane.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The reaction step is performed in presence of 0.1-2 wt.% of calcium chloride, and is carried out at a temperature of 20-100 degrees C and a pressure of 1-10 bars. The mixing step is carried out under an inert atmosphere of hydrogen or nitrogen. Preferred Components: The solvent comprises water and a crown ether. The silicon alloy has a structure of formula (CaAl2Si2), and a grain size of 50 mu m to 0.9 mm, preferably 0.1-0.4 mm. The compound of silane, disilane and trisilane are condensed in liquid form and then separated by fractional evaporation, where each fraction is subjected to purification. The first fraction corresponding to monosilane is isolated by evaporation at -78 degrees C under a pressure of 3.104 Pa, and the second fraction corresponding to disilane is isolated by evaporation at 0 degrees C under a pressure of 5.104 Pa. The gaseous mixture comprises 90% (preferably 80%) of monosilane, and 10% (preferably 20%) of disilane. M1 = Al; and    M2 = Ca or Mg.    EXAMPLE - None given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The reaction step is carried out at a temperature of 20-100 degrees C and a pressure of 1-10 bar. Preferred Components: The silicon alloy has a structure of formula (CaAl2Si2), and a grain size of 50 mu m to 0.9 mm, preferably 0.1-0.4 mm. The compound of silane, disilane and trisilane and the germane compound are condensed in liquid form and then separated by fractional evaporation, where each fraction is subjected to purification. The hydrochloric acid (50%) is regenerated and then used again when the reaction step is reproduced. The mixture of alloy is injected in the reactor containing the hydrochloric acid via an airlock to prevent the entry of air into the reactor. M1 = Al; and    M2 = Ca or Mg.    EXAMPLE - None given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The process further comprises recycling the solvent, by heating, to a temperature of higher than 170 degrees C, mixing hydrochloric acid with a crown ether such as tetrahydrofuran, mixing the silicon alloy and obtained mixture, and performing distillation process at a pressure, which is close to an ambient pressure, to separate monosilane, disilane, higher silane and other volatile compounds. The reaction step is carried out at a temperature of 20-100 degrees C and a pressure of 1-10 bars. Preferred Components: The solvent is tetrahydrofuran. The silicon alloy has a grain size of 0.2-0.9 mm, preferably 0.2-0.5 mm. The gaseous mixture comprises 90% (preferably 80%) of monosilane, and 10% (preferably 20%) of disilane. EXAMPLE - None given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The reaction step is carried out at a temperature of 20-100 degrees C and a pressure of 1-10 bars. Preferred Components: The amount of calcium chloride is 0.1-2 wt.%. The silicon alloy has a structure of formula (CaAl2Si2), and a grain size of 50 mu m to 0.9 mm, preferably 0.1-0.4 mm. The compound of silane, disilane and trisilane are condensed in the form of liquid and then separated by fractional evaporation, where each fraction is subjected to purification. The first fraction corresponding to monosilane is isolated by evaporation at -78 degrees C under a pressure of 3.104 Pa, and the second fraction corresponding to disilane is isolated by evaporation at 0 degrees C under a pressure of 5.104 Pa. The gaseous mixture comprises 90% (preferably 80%) of monosilane, and 10% (preferably 20%) of disilane. M1 = Al; and    M2 = Ca or Mg.    EXAMPLE - None given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The mixing step is carried out in presence of 0.1-2 wt.% of calcium chloride. The grinding step is carried out under an inert atmosphere of hydrogen or nitrogen. The mixing step is carried out at a temperature of 20-100 degrees C and a pressure of 1-10 bars. Preferred Components: The silicon alloy has a structure of formula (CaAl2Si2), and a grain size of 50 mu m to 0.9 mm, preferably 0.1-0.4 mm. The compound of silane, disilane and trisilane are condensed in liquid form and then separated by fractional evaporation, where each fraction is subjected to purification. The first fraction corresponding to monosilane is isolated by evaporation at -78 degrees C under a pressure of 3.104 Pa, and the second fraction corresponding to disilane is isolated by evaporation at 0 degrees C under a pressure of 5.104 Pa. The gaseous mixture comprises 90% (preferably 80%) of monosilane, and 10% (preferably 20%) of disilane. M1 = Al; and    M2 = Ca or Mg.    EXAMPLE - None given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The catholyte comprises hydrazine, and the anolyte comprises potassium ferricyanide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catholyte includes hydrazine, and the anolyte includes potassium ferricyanide.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The thickness of the transfer layer is 0.01-10 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The heat dissipation filler comprises mica microparticles, forsterite microparticles, silicon oxide microparticles, metal fluoride crystalline microparticles and/or boron nitride microparticles. The color pigment comprises titanium oxide, carbon black and/or iron oxide. Preferred Properties: The average primary particle diameter of heat dissipation filler is 0.1-50 mu m. The average primary particle diameter of color pigment is 0.01-10% of average primary particle diameter of heat dissipation filler.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent is aromatic hydrocarbon solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The epoxy resin (a-2) is bisphenol-type epoxy resin. The amino resin (a-3) is melamine resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: Buffer layer (18) contains zinc-metal selenide of formula: (Zn1-aMa)Se, where M is calcium, magnesium, strontium, barium, iron and/or manganese, and a is 0-1. Buffer layer (20) contains zinc sulfide of formula: Zn(O1-xSx), where x is greater than 0 and 0.7 or less, zinc-magnesium oxide of formula: (Zn1-yMgy)O, where y is greater than 0 and 0.5 or less, and/or indium sulfoxide of formula: In(S1-zOz), where z is greater than 0 and 0.3 or less. The thickness of layer (18) is 10 nm or less and thickness of layer (20) is 50-200 nm.
TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Properties: The nonwoven fabric has fabric weight of 10-1000 g/m2, and thickness of 0.1-100 mm when no load is applied.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The at least one functional group of compound (A) is chosen from carboxyl group, hydroxyl group, ester group, and isocyanate group. The compound (A) is a compound having trifunctional or more than trifunctional carboxyl group, or its anhydride. The content of compound (A) is 1.2-10 wt.%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Property: When the polyester composition is heat-processed at 150-230 degrees C, the change rate ((( eta )1-( eta )2)/( eta )2) of complex viscosity coefficient is made to increase by 0.5 or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The active energy ray hardening-type adhesive composition further contains 0.1-20 wt.% radical photopolymerization initiator with respect to total amount of hardenable component. The urethane (meth)acrylate (A) is compound obtained by reacting hydroxyl-group-containing (meth)acrylate with reaction material of diol having polyether structure, polyester structure or polycarbonate structure, and organic diisocyanate. The compound (B) is compound having one hydroxyl group and one ethylenically unsaturated group, preferably hydroxyalkyl (meth)acrylate. The ethylenic unsaturated group-containing compound (C) is chosen from having acrylamide compound, (meth)acrylate having alicyclic structure and carbitol (meth)acrylate 1-12C alkyl group. Preferred Property: The urethane (meth)acrylate (A) has weight average molecular weight of 3000-40000.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: Plastic films or sheets obtained by attaching using the active energy ray hardening-type adhesive composition, are poor-adhesive plastics film or sheet. The plastics film or sheet contains polyolefin, polyester, cycloolefin polymer and ethylene-vinyl acetate copolymer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The curable composition further contains photosensitizer (C), compound (D) containing one or more active hydrogen portion in molecule, and compound (E) containing one or more radical polymerizable group is molecule. The anion salt (B) is of formula: (R10-B(-R9)(-R11)-R12).Z+ (II) or formula (III). The photosensitizer (C) is chosen from compound of formula (V)-(VIII), radical polymerization initiator chosen from benzyl ketal-type radical photopolymerization initiator, ( alpha )-hydroxy acetophenone-type radical photopolymerization initiator, benzoin-type radical photopolymerization initiator, aminoacetophenone-type photoinitiator, oxime ketone-type radical photopolymerization initiator, acyl phosphine-oxide-type radical photopolymerization initiator and initiator compound of formula (IX), aromatic hydrocarbon chosen from naphthalene derivative and anthracene derivative, and pigment chosen from riboflavin, Eosin (RTM: methylene blue), Erisys (RTM: pigment), methylene blue and new methylene blue rose.R5-R8,R13-R27=H, halo, hydroxy, linear or branched 1-20C alkyl, 3-20C cycloalkyl, or aryl, alkoxy, ester, carboxy, aldehyde, amino, imino, imide, nitrile, amide, cyano, sulfone, nitro, sulfide, thiol and/or isocyanate;Z+=quaternary ammonium cation chosen from 1,8-diazabicyclo(5.4.0)undec-7-ene, 1,5-diazabicyclo(4.3.0)non-5-ene, triazabicyclo decene, hexahydro-methyl pyrimidopyrimidine, tetraalkyl ammonium and imidazolium in a molecule, alkali-metal cation chosen from sodium cation, potassium cation and lithium cation, or phosphonium cation chosen from chosen from benzyltriphenyl phosphonium cation and compound of formula (IV);R9-R11=optionally substituted aryl;R12=1-20C alkyl;a-d=0-4;andn=1-12.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polar group is carboxyl group, carboxylic anhydride group, alkoxycarbonyl group and/or acyloxy group.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thermoplastic resin contains 25-75 wt.% polyethylene and 75-25 wt.% copolymer of ethylene and comonomer chosen from radically polymerizable acid comonomer, acrylic-ester comonomer, methacrylic-ester comonomer and carboxylic acid vinyl-ester comonomer and having ratio of insoluble solution component of 20-75% measured at 100 degrees C or more, by differential scanning calorimetry. The reinforcing material is reinforcing fiber material. Preferred Layer: The liner material comprises laminate having thermoplastic resin layer and barrier layer. Preferred Properties: The polyethylene has density of 0.9-0.97 g/cm3, and melt flow rate of 0.01-100 g/10 minutes at 190 degrees C and load of 2.16 kg. The copolymer has melt flow rate of 0.01-100 g/10 minutes at 190 degrees C and load of 2.16 kg and amount of the polar group of 5-40 wt.%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: Fluorene containing (meth)acrylate compound is of formula (I).Ar=aryl;A=alkylene;R1=H or methyl;R2=halo, alkyl, cycloalkyl, aryl, aralkyl, alkoxy, cycloalkyl oxy, aryloxy, aralkyloxy, acyl, nitro, cyano or substituted amino;R3=halo, cyano or alkyl;n=0 or 1-10;m=1-3;andq,r=0 or 1-3.The content of polyfunctional (meth)acrylate is 30-100 pts. wt. with respect to 100 pts. wt. fluorine containing (meth)acrylate. The content of monofunctional (meth)acrylate is 10-100 pts. wt. with respect to 100 pts. wt. fluorine containing (meth)acrylate. The monofunctional(meth)acrylate has one (meth)acryloyl group in molecule.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The polyfunctional (meth)acrylate comprises polyhydric alcohol nucleus and (meth)acrylate. The weight average molecular weight of polyfunctional (meth)acrylate is 10000-30000. Preferred Process: The polyfunctional (meth)acrylate is condensed using poly(meth)acrylate and polyhydric alcohol having 4-8 methylol groups, with crosslinking agent. The curing process is carried out after applying the hard coat resin composition on a light transmitting base material. Preferred Property: The hardened material has refractive index more than 1.57.
TECHNOLOGY FOCUS - POLYMERS - The element for test coating is a tape made up of resin films.
TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Fiber: The cellulose fiber is chosen from ground pulp, refiner ground pulp, mechanical pulp, thermo-mechanical pulp, chemi-thermo mechanical pulp, semi-chemical pulp and chemiground pulp. The cellulose fiber has average fiber diameter of 0.1-0.3 mu m, lignin content rate of 1-50 wt.% and dehydration time of 500-1000 seconds. The separator has average thickness of 25 mu m or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic compound dissolves dinaphtho thienothiophene with concentration of more than 0.05 %mass with respect to the composition. The organic compound is naphthalene, anthracene or their partial or fully hydrogenated, preferably 1,2,3,4-tetrahydronaphthalene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The load of nickel and rhodium of modification catalyst is 1-30 parts mass and 0.01-3 parts mass, respectively with respect to 100 parts mass alumina. The load of platinum group metal of modification catalyst is 0.01-3 parts mass in conversion of platinum group metal atom with respect to 100 parts mass alumina. The rare-earth metal oxide of modification catalyst is cerium oxide. The alkaline earth metal oxide is strontium oxide. The platinum group metal is rhodium and/or platinum.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The heat removal mechanism of directionally solidified cooling end surface side utilizes heat exchange by cooling fluid. The heat amount detector is equipped with warning mechanism which detects that the amount of increase exceeded 1 divide by 10 of the solidification latent-heat generation amounts per unit time, and emits a warning while the heat removal mechanism detects discontinuous increase of heat amount per unit time received from solidification body. Temperature control of the heater performs control of solidification advancing of the melt.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The photosensitizer is a ruthenium complex, quantum dot or other metallic nanostructure/multicomponent nanostructure. The ruthenium complex comprises a trisbidentate ligand complex. The composition further comprises a compound that acts as an electron acceptor. The electron acceptor is persulfate. The first electrode comprises a semiconductor metal oxide. The semiconductor metal oxide comprises titanium dioxide, iron(III) oxide, and tungsten oxide. The second electrode comprises a water reduction catalyst. Preferred Method: In the method, oxygen and hydrogen is formed. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The film thickness of silicon compound layer is preferably 10 nm or less. The film thickness of inorganic layer is 20 nm or more. The difference between the film thickness of inorganic layer and silicon compound layer is 10 nm or more, preferably 20 nm or more. Preferred Composition: The inorganic layer comprises silicon nitride or aluminum oxide. The silane coupling agent is silicon-containing compound of formula: R1-C(=CH2)-C(=O)-O-L-Si((-OR3)3-n)-(R2)n (I).R1=H or methyl;R2=halo or alkyl;R3=H or alkyl;L=bivalent coupling group;andn=0-2.Preferred Process: The silicon compound layer and inorganic layer are formed by vapor growth method.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polymeric compound is (meth)acrylate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic base is chosen from aliphatic tertiary amine, aromatic tertiary amine, alicyclic tertiary amine, complex alicyclic tertiary amine, pyridines, imidazole and triazoles, preferably trialkyl amine or pyridine. The content of organic base with respect to 1 mol of hydroxyl groups in the polyrotaxane is 0.1-1 mol. The cyclic ether (I) is chosen from oxirane, 3-24C monosubstituted oxirane and 4-24C disubstituted oxirane, preferably oxirane, methyl oxirane, ethyl oxirane, propyl oxirane, butyl oxirane, phenyl oxirane and glycidol. The cyclic molecule having hydroxyl group is ( alpha )-cyclodextrin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic compound (p) is tin oxide, indium oxide, zinc oxide, antimony-containing tin oxide, tin-containing indium oxide, phosphorus-containing tin oxide, fluorine-containing tin oxide, aluminum-containing zinc oxide and/or gallium-containing zinc oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The dispersing agent further has reactive functional group, isocyanate group blocked by blocking agent or isothiocyanate group blocked by block forming agent in a molecule. The electroconductive compound dispersion contains hardening agent. Preferred Property: The dispersing agent has weight average molecular weight of 5000-50000.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The layer (3) contains zinc compound and silicon oxide, or layer (b1) comprising zinc oxide, silicon dioxide and aluminum oxide and layer (b2) containing zinc sulfide and silicon dioxide. The gas-barrier film further has layer (c) comprising 5% or more crosslinked resin. Preferred Properties: The three-dimensional surface roughness of layer (2) is 1.5 nm or less. The gas-barrier film has thickness of 1-10 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The carbon carrier is carbon black, which is not chemically treated.    TECHNOLOGY FOCUS - METALLURGY - Preferred Material: The mass ratio of platinum and cobalt is 1:13-1:1. The mass ratio of cobalt-platinum and carbon carrier is 1:5-1:2. The grain diameter of cobalt-platinum is 4-10 nm.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Method: Preprocessing involves cleaning, drying, hydrophilic treatment and drying. The preprocessing involves providing ultra-white photovoltaic glass in aqueous solution containing a liquid soap at 60-100 degrees C, washing using acetone, alcohol and deionized water, hydrophilization treating using hydrofluoric acid hydrophilizing agent, and drying. Hydrophobization of porous substrate is performed by adding hydrophobic reagent into reaction container comprising ultra-white photovoltaic glass with silicon dioxide film, and reacting. The hydrophobic reagent is chosen from hexamethyldisilazane, trimethyl chlorosilane, methyl trimethoxysilane, and trifluoropropyl triethoxysilane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The frames are made of ceramic material or aluminum material. The straps are made of aluminum material, Inconel alloy, and hastelloy material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Halogenated triquinacene compound of formula (II) is reacted with boron compounds of formula: Ar11-N(-Ar'2)-M-B(OH)2 (III), Ar'1-N(-M-B(OH)2)2- (IV), and (HO)2B-M-N(-M-B(OH)2)2 (V) in presence of transition metal catalyst and base, to obtain arylamine compound (I).X=chloro, bromo, or iodo. Preferred Definitions:    n=1;    Rings A-C=benzene (optionally substituted by methyl, ethyl, methoxy, ethoxy, phenyl, or phenoxy);and    M=phenylene (optionally substituted by methyl, ethyl, methoxy, ethoxy, phenyl, or phenoxy).    SPECIFIC COMPOUNDS - 90 arylamine compounds are disclosed. e.g. N-(3-(hexacyclo(13.6.1.02,7.08,22.09,14.016,21)docosa-2(7),3,5,9(14),10,12,16,18,20-nonaen-4-yl)phenyl)-9,9-dimethyl-N-phenyl-9H-fluoren-2-amine of formula (Ia), 4-(4-(hexacyclo(13.6.1.02,7.08,22.09,14.016,21)docosa-2(7),3,5,9(14),10,12,16,18,20-nonaen-4-yl)phenyl)-N,N-diphenylaniline, 4-(4-(22-methylhexacyclo(13.6.1.02,7.08,22.09,14.016,21)docosa-2(7),3,5,9(14),10,12,16,18,20-nonaen-3-yl)phenyl)-N,N-diphenylaniline, N-(4-(4-(hexacyclo(13.6.1.02,7.08,22.09,14.016,21)docosa-2(7),3,5,9(14),10,12,16,18,20-nonaen-4-yl)phenyl)phenyl)-4-(hexacyclo(13.6.1.02,7.08,22.09,14.016,21)docosa-2(7),3,5,9,11,13,16(21),17,19-nonaen-4-yl)-N-phenylaniline, and 4-(hexacyclo(13.6.1.02,7.08,22.09,14.016,21)docosa-2(7),3,5,9,11,13,16(21),17,19-nonaen-3-yl)-N-(4-(hexacyclo(13.6.1.02,7.08,22.09,14.016,21)docosa-2,4,6,9(14),10,12,16(21),17,19-nonaen-3-yl)phenyl)-N-phenylaniline.    EXAMPLE - Phenyl-di-p-tolyl amine was reacted with bromobenzene, sodium t-butoxide was added, reacted in presence of palladium acetate and tri-t-butyl phosphine, and stirred. The organic layer was separated, concentrated and purified to obtain (4-bromo-phenyl)-di-p-tolyl-amine. The resulting compound was reacted with N-bromosuccinimide, solid-liquid separation was carried out, and recrystallized, to obtain 4-boranyl-N,N-bis(4-methylphenyl)aniline.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The tungsten wire coil is coated with linear single-crystal seed crystal using laser in horizontal direction.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The palladium salt is palladium chloride, palladium nitrate, palladium acetate, palladium(II)-ammonium chloride, or potassium chloropalladate. The tin salt is stannous chloride or stannous sulfate. The molybdenum salt is potassium chloromolybdate or ammonium molybdate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent in step F may be ethanol, methanol, benzene, toluene, acetone, tetrahydrofuran, dioxane, N,N-dimethylformamide, pyridine, dimethyl sulfoxide, dichloromethane, trichloromethane, and/or dichloroethane. SPECIFIC COMPOUNDS - 12 Compounds (I) are specifically claimed e.g. 3,4,5-trimethoxyphenyl-1-((3-amino-4-nitrophenyl) thio) benzene (A), 3,4,5-trimethoxyphenyl-1-((3-acetamido -4-nitrophenyl) thio) benzene, 3,4,5-trimethoxyphenyl-1-((3-nitro-4-methoxyphenyl) thio) benzene, 3,4,5-trimethoxyphenyl-1-((3-amino-4-methoxyphenyl) thio) benzene, and 3,4,5-trimethoxyphenyl-1-((3-fluoro-4-methoxyphenyl) thio) benzene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The combustion gas comprises oxygen and hydrogen. The reformer reforms hydrocarbon material to hydrogen and carbon dioxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The three-dimensional nano sandwich structure is formed by a graphene sheet layer and nano conductive carbon granules in an intermediate phase. The size of the interlamellar spacing depends on the particle sizes of the nano conductive carbon granules. The carbon source is graphite or nanosized conductive carbon. The nanosized conductive carbon is nanosized conductive carbon black, nano graphite sphere, carbon nano tube or carbon nano fiber. Nitrogen is mainly mixed in structures of graphene and the nano conductive carbon granules. Preferred Properties: The nano graphite sphere has particle diameter of 5-80 nm. The carbon nanotube has diameter of 2-80 nm.
TECHNOLOGY FOCUS - BIOLOGY - Preferred Components: The microorganism is Desulfovibrio salixigens.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The anode is graphite.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The device is equipped with a positive electrode and a negative electrode. The cathode is conductive carbon fiber. The anode is arranged in a microbial film. The microbial film has thickness of 2-100 mu m. The electricity generating device and method process high concentration organic wastewater having chemical oxygen demand 8000 mg/l.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The methods further comprise separating the carbon dioxide from the reaction (a) and returning the same to be used as a reaction source of the reforming, or producing steam using the water produced by the reaction (b) as cooling water for removing the reaction heat and returning the steam to be used in the reforming. The method (M1) comprises adjusting the composition of the synthetic gas required for the production of dimethyl ether via a water-gas shift reaction or a reverse water-gas shift reaction. The method (M2) comprises adjusting the composition of the synthetic gas via water-gas shift reaction, a reverse water-gas shift reaction or pressure swing adsorption. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: Each of the drawn carbon nanotube films is made by: providing a carbon nanotube array; selecting a carbon nanotube segment having a predetermined width from the carbon nanotube array; and pulling the carbon nanotube segment at a uniform speed to form one of the at least one drawn carbon nanotube films, which are uniform. The step of removing the graphene film further comprises: disposing the substrate in a reactive ion etching vacuum chamber; introducing reactive gas into the reactive ion etching vacuum chamber; and obtaining reactive ions by glow discharge of the reactive gas to etch away the carbon nanotube segments and the parts of the graphene film exposed out of the at least one strip-shaped gap. The reactive ions passed through the at least one strip-shaped gap reach the parts of the graphene film exposed out of the strip-shaped gaps to remove the parts of the graphene film exposed out of the at least one strip-shaped gap. Preferred Components: The metal substrate has a thickness of 100 nm to 100 mu m, and is made of copper or nickel. A width of the at least one strip-shaped gap is 20-80 nm. The drawn carbon nanotube film of the carbon nanotube structure comprises drawn carbon nanotube films stacked with each other. The carbon nanotube structure is separated with the strip shaped graphene layer by an ultrasonic treating process, which is carried out for 3-30 minutes.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The manufacture of polycrystalline silicon further involves annealing, cooling and removing impurities of obtained silicon ingot. Preferred Composition: The impurities comprise silicon nitride, silicon carbide and/or silicon oxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Equipment: The cyclohexasilane synthesis container consists of inner and outer double structured pipes (3, 4) and mesh component formed in inner cylinder. The pore diameter of mesh component is 3-100 mu m. The cyclohexasilane synthesis container and di-anion containing compound combination container are accommodated with explosion-protection booth. The explosion-protection booth controls inert gas atmosphere having 10 volume% or less oxygen and 10 ppm of moisture.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The water-containing cutting fluid further contains nonionic surfactant having hydrophilic-lipophilic balance of 8.3-14.1. The compound (a) is chosen from glycerol, trimethylolpropane, pentaerythritol and sorbitol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The number average molecular weight of the polyoxyalkylene addition product is 400-10000. The hydrophilic-lipophilic balance of the polyoxyalkylene addition product is 5-6. The content of the polyoxyalkylene addition product is 0.001-3 wt.%. The polyoxyalkylene addition product is preferably of formula: (A1O)m- or -(A2O)n/(A2O)k-.A2O=oxyethylene;A3O=oxypropylene;n=0-50;k=m;andn/(n+k)=0-0.1. Preferred Definitions:    A1O=oxypropylene.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The ethylene glycol solution of phosphoric acid alkali metal compound is mixed with terephthalic acid. The co-catalyst comprising manganese element, calcium element and magnesium element is added during manufacture of polyethylene-terephthalate composition.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The scattering particles have average particle diameter of 100 nm or more.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The substrate further comprises a leveling layer comprising binder chosen from polysiloxane, polyimide and polyamic acid and having refractive index of 2.5 or more in the upper portion of the diffraction layer, and an electrode layer formed on upper portion of the diffraction layer. The polyamic acid has repeating unit of formula (I), and has weight average molecular weight of 10000-100000 based on polystyrene conversion and light transmittance of 80% or more. The binder comprises polyamic acid and polyimide.L=-S-, - S(=O)-, - S(=O)2- or -S-S-;andn=integer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aromatic diamine compound includes bis(4-(4-aminophenoxy)phenyl)sulfone and diamine compound chosen from 26 diamine compounds e.g. 4-aminophenylamine, 3-aminophenylamine, 2,2'-dimethyl-1,1'-biphenyl-4,4'-diamine, 3,3'-dimethyl-1,1'-biphenyl-4,4'-diamine, and 4-(4-amino-2-(trifluoromethyl)phenyl)-3-(trifluoromethyl)aniline. An alicyclic diamine compound is further used during imidization polymerization reaction. The alicyclic diamine compound is alicyclic diamine compound chosen from 7 alicyclic diamine compounds e.g. ethanamine-bicyclo(2.2.1)heptan-2-ylmethanamine, 4-((4-aminocyclohexyl)methyl)cyclohexan-1-amine, (3-(aminomethyl)cyclohexyl)methenamine, 4-((4-amino-3-methylcyclohexyl)methyl)-2-methylcyclohexan-1-amine, and 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The polyimide molded product is in a form of film, or sheet.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The component (A) contains 50 %mass or more polybutylene terephthalate. The carbodiimide rings of cyclic carbodiimide compound are bonded through spiro-bond or bonding group. The cyclic carbodiimide compound is of formula (I). The component (C) contains partial ester of polyhydric alcohol and 12C or more fatty acid. The content of component (C) is 0.05-5 parts mass with respect to 100 parts mass of component (A). The content of terminal carboxyl group is 5 equivalent/ton or less. The content of component (B) is 0.1-3 parts mass with respect to 100 parts mass of component (A).X=tetravalent group of formula (i);andAr1-Ar4=o-phenylene group or 1,2-naphthalene-diyl group optionally substituted by substituent.Preferred Properties: The component (C) has hydroxyl value of 1000 or less. The resin composition has melt viscosity at 260 degrees C is 300 Pa.second or less. The resin composition has reduced-viscosity retention after 100 hour holding at 121 degrees C under relative humidity of 100% is 80% or more, measured using pressure cooker test.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The arithmetic mean roughness (Ra) of the surface of the near surface at which primer layer and gas barrier layer are laminated is 8 nm or less, and cross-section height (Rt) of largest roughness curve is less than 150 nm. The arithmetic mean roughness of other surface is 15 nm or more, and cross-section height (Rt) of largest roughness curve is 150 nm or more. Preferred Layer: The primer layer has layer consisting of resin obtained by hardening (meth)acrylate type ultraviolet curable resin, and has thickness of 0.5-3 mu m. The gas-barrier layer is a layer obtained by injecting ion into the layer of silicon type high molecular compound. The layer of silicon-type high molecular compound contains polysilazane compound or polyorganosiloxane compound. The laminate is elongate laminated film having one outermost layer as gas barrier layer, and other outermost layer as base material. The arithmetic mean roughness of surface of gas barrier layer is 8 nm or less, and cross-section height (Rt) of largest roughness curve is less than 150 nm. The arithmetic mean roughness of surface of base material is 15 nm or more, and cross-section height (Rt) of largest roughness curve is 150 nm or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The inorganic layer contains silicon oxide, silicon nitride, silicon oxynitride, silicon oxycarbide, silicon oxycarbonitride, aluminum oxide, aluminum nitride, aluminum oxynitride, and/or aluminum oxycarbide. The inorganic layer contains an inorganic layer formed by chemical vapor deposition (CVD) and layer formed by physical vapor deposition, sequentially. The carbon content in CVD inorganic layer is less than 20 at.%, and the film thickness is less than 20 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The gas-barrier film has a water-vapor permeation rate of less than 0.5 g/m2/24 hours/atm, preferably less than 0.3 g/m2/24 hours/atm at 60 degrees C and 90% relative humidity. An anchor-coat layer is provided in the surface(s) of the base film. The gas-barrier laminate has a glare-proof layer, a low-reflection layer, and/or a glare-proof low-reflection layer laminated on the surface(s).
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The weight decreasing rate of polythiol compound and polyene compound at 150-300 degrees C and temperature increase rate of 10 degrees C/minute under atmospheric pressure of nitrogen atmosphere is 10-25%, measured by differential-thermal thermogravimetry simultaneous measurement. The viscosity of curable resin composition at 25 degrees C and 2.5 rpm is 200 mPa.second or less, measured using E-type viscosity meter. Preferred Composition: The ratio of molecular weight of polythiol compound and polyene compound is 1:0.5-1:1.8. The polyene compound is polyene compound which has aromatic ring. Preferred Film: The organic optical device further has inorganic material film laminated on the resin protective film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The casting of polycrystalline silicon further involves adding carbon powder to the raw material for polycrystalline silicon. Preferred Composition: The nitrogen-containing mold-releasing agent contains silicon nitride, ethyl silicate, pure water and hydrochloric acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The alicyclic epoxy compound (A) is 7-oxabicyclo(4.1.0)hept-3-ylmethyl 7-oxabicyclo(4.1.0)heptane-3-carboxylate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The curable epoxy resin composition further contains siloxane derivative having two or more epoxy groups in a molecule, alicyclic polyester resin and rubber particles.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The reflection preventing article has haze of 0.5% or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Glass: The glass (S1), (S2) or (S3) has a coefficient of thermal expansion of 4.5-6.5 ppm/ degrees C (preferably 4.5-6 ppm/ degrees C) from 25-300 degrees C. The glass (S1) comprises: 0.1-8 mol.% M'2O. The glass (S1) comprises: 61-64 mol.% SiO2, 8-12 mol.% Al2O3, 9-15 mol.% B2O3, greater than 0-4 mol.% M'2O, and 12-15 mol.% RO; or 60-65 mol.% SiO2, 8 to less than 10 mol.% Al2O3, greater than 11-15 mol.% B2O3, greater than 0 to less than 1 mol.% M'2O, and 9-15 mol.% RO; or 60-65 mol.% SiO2, 10-12 mol.% Al2O3, 7-11 mol.% B2O3, 1-8 mol.% M'2O, and 9-15 mol.% RO. The glass (S1) comprises: 0.01-0.4 mol.% tin oxide (SnO2). The glass (S1) comprises: 62-65 mol.% SiO2, 10-12 mol.% Al2O3, 7-11 mol.% B2O3, 3-8 mol.% MgO, 3-10 mol.% CaO; 3-8 mol.% SrO; and 1-8 mol.% M'2O; where M' is an alkali metal selected from potassium K and/or sodium Na, where CaO/(CaO+SrO) is 0.4-1. The glass (S2) comprises: 57-68 mol.% SiO2, 5-12 mol.% Al2O3, 0-8 mol.% B2O3, 0-0.1 mol.% M'2O, 0-10 mol.% MgO, 8-28 mol.% CaO, 0-10 mol.% SrO, 0-9 mol.% BaO and 21-32 mol.% RO; where the glass has a coefficient of thermal expansion of 4-6 ppm/ degrees C from 25-300 degrees C. The glass substrate has a coefficient of thermal expansion that is within plus minus 2 ppm/ degrees C of the coefficient of thermal expansion of the CdTe solar cell material from 25-300 degrees C. Preferred Definitions:    M'=K or Na.    EXAMPLE - A glass comprising: 63.5 mol.% of silica (SiO2); 10.7 mol.% of alumina (Al2O3); 10.3 mol.% of boron trioxide (B2O3); 2.3 mol.% of potassium oxide (K2O); 4.4 mol.% magnesium oxide (MgO); 5.2 mol.% of calcium oxide (CaO); 3.5 mol.% of strontium oxide (SrO); and 0.1 mol.% tin oxide (SnO2), was prepared.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. SPECIFIC COMPOUNDS - Approximately 302 Compounds (I) are disclosed e.g. 2-((E)-5'-dicyanomethylene-5'H-(2,2')bipyridinyliden-5-ylidene)-malononitrile of formula (Ia), 2-(2,7-Bis-dicyanomethylene-10-oxo-2,10-dihydro-7H-phenanthren-9-ylidene)-malononitrile, 2-((E)-5'-dicyanomethylene-5'H-(2,2')bipyrazinyliden-5-ylidene)-malononitrile, 2-((E)-3'-dicyanomethylene-3'H-(6,6')bi((1,2,4)triazinylidene)-3-ylidene)-malononitrile, and 2-(8-dicyanomethylene-6,8-dihydro-5H-(4,7)phenanthrolin-3-ylidene)-malononitrile.    EXAMPLE - 1 mmol 5,5'-bis(dicyanomethyl)-2,2'-bipyridyl was mixed in aqueous solution with bromine water and then extracted, dried and concentrated to obtain tetracyano-2,2'-bipyridyl-5,5'-quinone-dimethane.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Disclosed): An organic silane compound having dithienyl diketopyrrolopyrrole structure is hydrolyzed and polycondensed, to obtain organic silica compound. Preferred Definitions:    R1,R4=group (II).    EXAMPLE - 198 mg 3,6-Bis(5-bromo-thiophen-2-yl)-2,5-bis(2-ethylhexyl)pyrrolo(3,4-c)pyrrole-1,4-dione, 420 mg 4-(3-(triisopropoxysilyl)propyl)-1-trimethylstannyl benzene, 13.3 mg tris(dibenzylidene acetone)dipalladium(0) and 14.6 mg tri(2-furyl)phosphine were mixed, dehydrated, 30 ml tetrahydrofuran was added to obtained mixture in argon atmosphere, obtained solution was stirred at 70 degrees C for 20 hours, solvent was distilled off under reduced pressure and purified, to obtain 289 mg 3,6-bis(5-(4-(triisopropoxy silyl)propyl)phenylthiophen-2-yl)-2,5-bis(2-ethylhexyl) pyrrolo(3,4-c)pyrrole-1,4-dione as dark blue color solid, with yield of 85%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further includes: coating the photoresist on a substrate, performing the lift-off process, forming the zinc oxide; heat-treating in oxygen or air atmosphere; preparing a zinc oxide nanostructure from the seed, where the nano pattern is in the form of straight line or dot; depositing the zinc in a substrate between an upper portion of C1 photoresist and a photo resister; and removing C2 photoresist.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The flux includes 95-97 wt. % of slag former including silicon dioxide, calcium carbonate, calcium fluoride and alumina, 1.5-2.5 wt.% of binder and 1.5-2.5 wt.% of lubricants. The through hole has diameter of 3-7 mm along cross section. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The heat-radiation material comprises polysilicon having diameter of 0.1-400 mu m. The additive is cobalt oxide, magnesium oxide, nickel oxide, copper oxide and/or aluminum nitride.    TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The substrate is made of copper, nickel, tin, aluminum, silver, chrome, copper-tungsten alloy, alumina, aluminum nitride, zinc oxide and/or silicon carbide, and has thickness of 5-2000 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The quantum dot sensitized solar cell is produced using quantum dot forming material containing cadmium sulfide, cadmium selenide, lead sulfide, silver sulfide and lead selenide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The titanium dioxide precursor is titanium tetraethoxide. The secondary solution is aqueous solution containing sodium chloride and ethanol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises weighing the reaction raw materials of black pearl 2000, melamine and ammonium fluoride, putting agate mortar or the agate ball milling tank, grinding the material for 1 hours and then placing into a tube furnace at 80-100 degrees C for 0.5-3 hours to obtain nitrogen-doped carbon black, adding obtained nitrogen-doped carbon black into ammonium fluoride solution, stirring the solution for 12-24 hours and then filtering, drying the solution and then putting the mixture into a tubular furnace at 80-100 degrees C for 0.5-3 hours to obtain fluorine-nitrogen co-doped carbon black catalyst, adding the black pearl 2000 into the aqueous solution of ammonium fluoride, stirring the solution for 12-24 hours, filtering, drying the solution and putting into a tube furnace at 80-100 degrees C for 0.5-3 hours to obtain fluorine-doped carbon black, mixing obtained fluorine-doped carbon black and melamine and then putting in agate mortar or agate ball mill for 1 hours and then placing into a tube furnace at 80-100 degrees C and then processing the 5-3 hours to obtain the fluorine-nitrogen co-doped carbon black catalyst, mixing black pearl 2000 and melamine and then putting in agate mortar or agate ball mill for 1 hours, and resulting mixed powder into the aqueous solution of ammonium fluoride, stirring the solution for 12-24 hours, filtering and drying the solution and then placing into a tube furnace at 80-100 degrees C for 0.5-3 hours. Preferred Method: The grinding step is carried out for 4 hours. The processing step is carried out at a temperature of 900 degrees C for 1 hours. Preferred Components: The weight ratio of carbon, nitrogen, and fluorine atoms are 10:1-5:0.5. The mass ratio of black pearl 2000, melamine and ammonium fluoride is 1:1-20:5-10. The tubular furnace is a single section sliding rail.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal substrate is made of copper or nickel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sheet: includes 0.002-0.02 wt.% of iron, 0.001-0.05 wt.%, preferably 0.012-0.05 wt.% of copper and 0.2 wt.% of sulfur trioxide; has an energy transmission of 90%, preferably 90.8% measured for the thickness of 3.85 mm, a luminous transmission of 90.3%, preferably 91% measured for thickness of 4 mm, a dominant wavelength of less than 510 nm, preferably less than 500 nm, and a redox value of less than 0.3, preferably less than 0.20; and is covered with a transparent and electricity conducting thin layer.
TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The ferritic stainless steel plate further comprises 0.005-0.8 %mass niobium, 0.005-0.5 %mass titanium, 0.2-5 %mass molybdenum, and/or 0.1-3 %mass copper.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The metal in metal oxide of group 14 is tin, aluminum, gallium and/or indium. The primary layer of base film layer is zinc-oxide-type thin film layer. The inorganic thin film layer is formed of oxides of aluminum, nitride, oxynitride and/or silica.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The raw material powder contains gallium oxide powder and aluminum oxide powder, titanium oxide powder, and mixed powder with zinc oxide powder. The titanium oxide powder is powder containing valence titanium oxide (TiO2-x, where x is 0.1-1).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The raw material powder further contains binder and gallium oxide powder, aluminum oxide powder, titanium oxide powder, and mixed powder with zinc oxide powder. The density of the molded product is 2.8 g/cm3 or more. The titanium oxide powder is a powder of formula: TiO2-X, where X is 0.1-1.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Conditions: The silicon nitride powder is stored under previously-measured conditions at which ratio (N/O) is 2 or more. The silicon nitride powder having a management parameter of 2.3 or more is preserved at 1-200 degrees C in a dry atmosphere whose dew point is -20 degrees C or less for 365 days. The powder is preserved in a bag containing a raw material having a water-vapor permeability of 0.1 g/m2.day or less. The preservation duration is 200 days or more.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The ferritic stainless steel material comprises 0.001-0.05 %mass carbon, 0.001-0.05 %mass nitrogen, 0.01-1 %mass nickel, 0.05-3 %mass manganese, 0.001-0.1 %mass phosphorus, 0.0005-0.01 %mass sulfur, 0-1 %mass nickel, 0-0.15 %mass vanadium, 0-2 %mass copper, 0-4 %mass molybdenum, 0-4 %mass tungsten, 0-1 %mass tungsten, 0-0.01 %mass boron, 18-35 %mass chromium, titanium and aluminum, and remainder of iron and unavoidable impurity. The total content of titanium and aluminum is 0-0.15 %mass.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The austenitic-stainless-steel material comprises 9-37 %mass chromium, 3-43 %mass nickel, 0.01-0.2 %mass carbon, 0.01-0.5 %mass nitrogen, 0.05-3 %mass manganese, 0.001-0.1 %mass phosphorus, 0.0005-0.01 %mass sulfur, 0-0.15 %mass vanadium, 0-4 %mass copper, 0-4 %mass molybdenum, 0-4 %mass tungsten, 0-1 %mass niobium, 0-0.06 %mass boron, 0.01-0.5 %mass silicon, and 0-0.15 %mass titanium and aluminum.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The process liquids are deionized water, isopropyl alcohol, hydrofluoro ether, or liquid mixture. The gas is a mixture of nitrogen gas or a dry air, and the vapor of organic solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The electrically conductive film comprises metal nanowire and a matrix component.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The metal nanowire contains silver. Preferred Method: The exposure process is performed under an inert gas such as nitrogen gas.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The passivation film contains carbon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The base material contains silicon and/or germanium. The semiconductor device has dopant injection layer obtained from dopant composition. The light-absorption particles contain silicon and/or germanium, and have average primary particle diameter of 100 nm or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The transparent layer contains organic compound, inorganic compound or organic-inorganic hybrid compound, preferably silicon compound, compound having siloxane bond, or silicon oxide, and has volume resistivity of 1012 ohm.cm or more and thickness of 50-1000 nm. Preferred Properties: The sintered silicon particle layer has film thickness of 50-500 nm. The light irradiation is performed using a laser with wavelength of 600 nm or less in non-oxidizing atmosphere.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The molar ratio of mayenite and calcium hydroxide is 1:9. The temperature of water is 50-100 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Conditions: The water temperature is performed at 50-100 degrees C. The calcination temperature of katoite in the regeneration step is maintained at 300-500 degrees C. Preferred Composition: The molar ratio of mayenite and the calcium hydroxide is 1:9.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The aluminum compound layer and inorganic layer are produced by vapor growth method. Preferred Properties: The film thickness of the aluminum compound layer is preferably less than 5 nm. The film thickness of inorganic layer is 20 nm or more.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The phosphoric acid compound is of formula: R1-O-P(=O)(-OH)-(O)n-R2 (I). The polymeric compound is (meth)acrylate.R1,R2=H or Ac-O-Y'-, in which R1 and R2 are not hydrogen atoms simultaneously;n=0 or 1;Ac=acryloyl or methacryloyl;andY'=alkylene, alkyleneoxy, alkyleneoxy carbonyl or alkylenecarbonyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The compound (a1) having basic nitrogen atom-containing group is polyalkylene imine having polyoxyalkylene structure or oxyethylene unit. The functional group (X) is keto, epoxy, acidic radical, N-alkylol group and/or isocyanate group. The compound (b1) is chosen from urethane resin, vinyl resin and urethane-vinyl composite resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The desulfurization catalyst further contains zinc, copper, iron and/or cobalt.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catalyst further comprises iron or cobalt, and platinum. The phosphorus compound is oligophosphate or polyphosphate. EXAMPLE - In 150 ml tetrahydrofuran (THF), 10 g butylated melamine resin, 2 g iron(II) sulfate, and 1 g triphenyl phosphine were heated and mixed. The THF was distilled and vacuum dried. The resulting residue was bruised in a mortar and sintered under argon for an hour at 800 degrees C to obtain 2.6 g oxygen reduction catalyst.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Mixture of silicon dioxide powder and active-metal powder is manufactured by mixing silicon dioxide powder and active-metal hydride powder, and thermally decomposing the active-metal hydride powder. Melted silicon and oxide of active metal is separated by liquid state, solidified and cooled. Preferred Components: The active metal is chosen from lithium, magnesium, calcium, and aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition further contains carbon black. The silver fine particles are manufactured by thermal plasma method.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The composition further contains acryl monomer and photoinitiator.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The component (B) is acryl type block copolymer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): 4-trialkyl or 4-triphenyl silylethynyl phthalonitrile of formula (II) and an organic solvent are thermally reacted in presence of a metal salt, to obtain the tetrakis-trialkyl or phenylsilyl ethynyl substituted phthalocyanine. The metal is nickel, copper, cobalt, zinc or ammonia. EXAMPLE - 4-Iodophthalonitrile (0.508 g, 20 mmol), copper iodide (3.8 mg, 0.02 mmol) and bis-triphenylphosphine palladium dichloride (14 mg and 0.02 mmol) were put into a flask and argon substitution was carried out. Further, trimethylsilyl acetylene (0.31 ml) and diethylamine (8.0 ml) were added, and freezing deaeration was carried out 3 times. The deaerated solution was suction filtered after reacting at room temperature for 3 hours and purified, to obtain 4-(2-trimethylsilylethynyl)phthalonitrile. 4-(2-Trimethylsilylethynyl)phthalonitrile (30 mg, 0.13 mmol), and nickel chloride hexahydrate (31 mg) were put into a flask, and argon substitution was carried out. Dimethylamino-ethanol (2.0 ml) was added, and heat-stirred at 100 degrees C for 6 hours. After completion of reaction, the reaction mixture was added into water and solid was deposited. The precipitated solid was suction-filtered and purified, to obtain 3.53 mg nickel (II) tetrakis-(trimethylsilylethynyl)phthalocyanine with yield of 11%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The titanyl phthalocyanine derivative mixture has diffraction peak at Bragg's angle (2( theta ) plus minus 0.2 degrees ) of 7.5 degrees , 7.8 degrees , 26.7 degrees and 27.2 degrees measured by X-ray diffraction spectrum using copper K( alpha ) ray. Preferred Process: The manufacture of titanyl phthalocyanine derivative mixture further involves performing crystal-conversion process of obtained mixture.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The gas is nitrogen, argon, carbon dioxide or carbon monoxide.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The air microbubbles are injected by a spray type nozzle. The reacted mixture is ejected by a vent. The graphene oxide particle is collected by a scraper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The zinc precursor is zinc-acetyl acetonate hydrate. The metal precursor comprises manganese acetylacetonate, steel acetylacetonate and cobalt acetylacetonate. Preferred Method: The method comprises mixing zinc precursor, metal precursor, the oleoylamine and the oleic acid to produce a reaction mixture, obtaining a suspension by heats the reaction mixture to 40-90 degrees C, heating and stirring the suspension to 300-360 degrees C, cooling the stirred liquid in a room temperature to precipitate, and centrifuging and washing the precipitate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The oleoylamine is used based on a total volume of sum of the oleic acid and the oleoylamine in excess of 75 vol. %.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal layer comprises a metal consisting of silver and tin. The barrier layer is made of a metal consisting of nickel, tungsten and titanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The single-crystalline material is single-crystalline silicon.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - The crucible part comprises a top surface, side surfaces extended from the top surface in a downward direction, a bottom surface extended from the side surfaces in a perpendicular direction and an inclined part having a slope of an acute angle with respect to one of the side surfaces.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The passivation layer is made of silicon, aluminum oxide, silicon nitride, silicon oxide and silicon carbide with amorphous and crystalline.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal nanowire contains silver nanowire or silver-alloy nanowire.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The binder is sol-gel cured product obtained by polycondensation of hydrosol liquid containing 90 wt% or more tetraalkoxysilane. The conductive layer is formed by using etching solution having a conductive region and a non-conductive region.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The base material contains polymeric resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The material containing boron is boron trifluoride or diboron tetrafluoride. The material containing arsenic is arsenic trihydride or arsenic trifluoride and the material containing phosphorus is phosphine or phosphorus trifluoride. The material containing boron has 90 vol.% total gas and the material containing phosphorus or arsenic has 10 vol.% total gas in ion source chamber.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Resistance lowering process is the process of irradiating an ultraviolet-ray with respect to the metal oxide film. Further, oxidation source (6) is sprayed on the substrate. The solution, oxidation source and dopant solution are respectively supplied to the substrate through flow paths (L1, L2, L3). Preferred Composition: The dopant contains 0.4% boron, 0.33% gallium, 0.4% indium and 0.4% aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: A portion of or the entire surface of oxidized surface of conductive layer comprises silver oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Silane gas and ammonia gas are used as source gas for forming the inorganic membrane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The high-fluorinated interhalogen gas is iodine heptafluoride, bromine pentafluoride and/or chlorine trifluoride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The sapphire substrate and seed layer comprises indium phosphide, indium arsenide, gallium antimonide, germanium. The base substrate is made of copper, molybdenum, tungsten, silicon and aluminum. The layer of solar cell is made of gallium indium arsenide, gallium indium arsenide phosphide, gallium arsenide and gallium indium phosphide.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Component: The battery cell with photoelectrode, counter electrode facing photoelectrode and electrolyte solution formed by dissolving sulfur or sulfurated compound.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The liquid mixture contains compound containing quantum dot constitutent elements other than selenium, semiconductor quantum dot, solvent and reaction mitigator comprising phosphine type-surfactant, or quantum dot constitutent element comprising semiconductor quantum dot and amine surfactant, or obtained by adding amine surfactant and thiol surfactant to liquid mixture containing semiconductor quantum dot and adsorbed to semiconductor quantum dot. Preferred Process: The semiconductor quantum dot containing copper-indium-selenium compound is formed by dissolving copper compound and indium compound in solvent containing oleyl amine and dodecyl amine, to obtain copper solution and indium solution and mixing copper solution and indium solution with addition of reaction mitigator, and dissolving selenourea in liquid mixture. The substrate with semiconductor quantum dot supported by oxide semiconductor layer is immersed in potassium cyanide aqueous solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The each non-dope layers are comprised of i-type amorphous silicon carbide, i-type amorphous silicon nitride, i-type amorphous-silicon carbon nitride, i-type amorphous silicon oxide, i-type amorphous silicon and i-type amorphous silicon-germanium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Disclosed): The fullerene compound is prepared by adding nickel (II)-5,10,15,20-tetraphenyl-(1,2-c)-21-(2'-cyano-3'-yl-ethylcarboxyl)-22-formylpyrrolo porphyrin, fullerene and sarcosine in a two-opening round bottom flask with stirrer, attaching a reflux condenser, performing argon substitution, adding and dissolving toluene, heat-refluxing, distilling off of the solvent, separating and refining using toluene and ethyl acetate mixed solution, collecting the fullerene of 1st fraction, collecting the 3rd green fractions, recrystallizing the obtained compound from methylene chloride and hexane, and drying in a desiccator. SPECIFIC COMPOUNDS - 3 of 3 Compounds (A) are specifically disclosed, e.g. nickel(II)-5,10,15,20-tetraphenyl-(1,2-c)-21-(2'-cyano-3'-yl-ethylcarboxyl)-22-(N-methyl-3',4'-fulleropyrrolidinyl)pyrroloporphyrin, zinc (II)-5,10,15,20-tetraphenyl-(1,2-c)-21-(2'-cyano-3'-yl-ethylcarboxyl)-22-(N-methyl-3',4'-fulleropyrrolidinyl)pyrroloporphyrin, and 5,10,15,20-tetraphenyl-(1,2-c)-21-(2'-cyano-3'-yl-ethylcarboxyl)-22-(N-methyl-3',4'-fulleropyrrolidinyl)pyrroloporphyrin.    EXAMPLE - Nickel (II)-5,10,15,20-tetraphenyl-(1,2-c)-21-(2'-cyano-3'-yl-ethylcarboxyl)-22-(N-methyl-3',4'-fulleropyrrolidinyl)pyrroloporphyrin was prepared by adding 10 mg nickel (II)-5,10,15,20-tetraphenyl-(1,2-c)-21-(2'-cyano-3'-yl-ethylcarboxyl)-22-formylpyrrolo porphyrin, 3 eq. fullerene (C60) and 30 eq. sarcosine in a two-opening round bottom flask with stirrer, attaching a reflux condenser, performing argon substitution, adding and dissolving toluene, heat-refluxing for 18 hours at 130 degrees C, distilling off of the solvent, separating and refining using toluene and ethyl acetate mixed solution (96:4 v/v), collecting the fullerene of 1st fraction, collecting the 3rd green fractions, recrystallizing the obtained compound from methylene chloride and hexane, drying in a desiccator and obtaining 6.16 mg of the compound.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation is given. Preferred Compounds: The mononuclear iridium complex (I) is of formulae (II)-(VII). Preferred Definitions:    Y'=water molecule, H, deuterium atom, alkoxide ion, hydroxide ion, halide ion, carbonate ion, trifluoromethanesulfonic acid ion, sulfate ion, nitrate ion, formic-acid ion or acetate ion.    EXAMPLE - 15 ml Anhydrous acetonitrile solution of 2,2',6,6'-tetramethoxy-4,4'-bipyrimidine and trimethylsilyliodide was heated, and cooled to room temperature. Methanol was added to the reaction solution, precipitated and filtrated using ether and methanol. 20 ml Isopropanol was added, stirred, washed using isopropanol, methanol and ether, and filtered. The filtrate was maintained, to obtain 0.31 g crude product. The crude product was dissolved in 15 ml water, stirred, precipitated, cleaned with cold water, and dried, to obtain 103 mg mononuclear iridium complex.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): A borole compound of formula (II) is reacted with cyclic compound of formula (III), to obtain boron-containing compound (I).Q=monovalent group.Preferred Property: The boron-containing compound has luminescent quantum yield of 20-100%. SPECIFIC COMPOUNDS - 2 Boron-containing compounds i.e. 3-oxa-1 -aza-2-boraspiro(tricyclo(6.3.1.04,12)dodecane-2,8'-tricyclo(7.4.0.02,7)tridecan)-1(11),1'(9'),2'(7'),3',4,5',6,8(12),9,10',12'-undecaene of formula (Ia) and 4,10-dibromo-3'-oxa-3,11-dithia-1' -aza-7 -boraspiro(tricyclo(6.3.0.02,6)undecane-7,2'-tricyclo(6.3.1.04,12)dodecane)-1(8),1'(11'),2(6),4,4',6',8'(12'),9,9'-nonaene, are disclosed.    EXAMPLE - 302 mg 8-Quinolinol was added and nitrogen-substituted to 100 ml round bottom flask. Then, 493 mg triethylamine and 15 ml toluene were added and nitrogen-substituted, stirred at room temperature for 5 minutes. Then, solution of 5-bromodibenzoborole dissolved in 5 ml toluene was added, heat-stirred at 110 degrees C for 24 hours, cooled to room temperature, water was added, and ethyl acetate was extracted thrice. The solvent was distilled off after drying and filtering organic layer using sodium sulfate. The crude product was purified using silica gel column chromatography, to obtain boron-containing compound (I).
TECHNOLOGY FOCUS - METALLURGY - The primary and secondary metal films are made of metal selected from cobalt, nickel, manganese, ruthenium, tungsten, molybdenum, tantalum, titanium, silver, platinum and gold.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The ceramic microparticles are chosen from silica, alumina, titania and boehmite.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The slurry in the metal microparticles-dispersed composite contains polyvinyl alcohol. The content of polyvinyl alcohol is 0.1-50 pts. wt. with respect to 1 pt. wt. of metallic compounds.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The molybdenum disulfide nanoparticle is prepared by crushing molybdenite or micro-molybdenum disulfide, mixing with ionic liquid and/or organic solvent at mass ratio of 1:0.01-100000, grinding for 0.1-200 hours and/or adding water and ultrasonically processing for 0.1-200 hours, and separating by filtration, centrifugation, column chromatography and/or gel electrophoresis.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The ionic liquid comprises cation which is imidazole compound and anion which is tetrafluoroborate or hexafluorophosphate. The organic solvent is dimethylformamide, dimethyl sulfoxide, N-methylpyrrolidone, chlorobenzene, nitrobenzene, cyanobenzene, N-methylformamide, dimethylacetamide, chloroform, ethanol, toluene, N-vinylpyrrolidone, N-octylpyrrolidone, benzyl benzoate, cyclohexanone or isopropanol.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass substrate contains borosilicate glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The quenching gas contains nitrogen and is substantially free from oxygen. The transparent conductive oxide contains cadmium tin oxide.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of component (B) is 3-50 parts mass with respect to 100 parts mass component (A) and component (B).
TECHNOLOGY FOCUS - METALLURGY - The reverse current absorption layer is made of elements selected from the group consisting of carbon, chromium, nickel, titanium, iron, cobalt, copper, aluminum, zirconium, ruthenium, rhodium, palladium, silver, tungsten, rhenium, osmium, iridium, platinum, gold, bismuth, cadmium, mercury, manganese, molybdenum, tin, zinc, lanthanum, cerium, praseodymium,neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium and lutetium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of silane-type compound is 0.05-9 pts. wt. with respect to 100 pts. wt. of resin (A). The adhesive composition contains platinum-based catalyst.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of olefin polymer is 10-100 pts. wt. with respect to 100 pts. wt. of resin (A). The content of resin (B) is 0.05-9 pts. wt. with respect to 100 pts. wt. of resin (A). Polyisobutylene-type resin (A) is polyisobutylene resin (A1) having weight average molecular weight of 27-800000, and polyisobutylene resin (A2) having weight average molecular weight of 2-250000. Preferred Properties: The adhesive sheet has visible ray transmittance of 90% or more at 550 nm wavelength, and water-vapor permeability of less than 10 g/m2/day at 90%-relative humidity.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The bottom electrode layer is selected from aluminium-doped zinc oxide (ZnO-Al), Indium-Tin-Oxide (ITO), Ga-modified zinc oxide (ZnO-Ga), boron doped zinc oxide (ZnO:B), tin-doped zinc oxide (SnO2:F).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Gallium Arsenide is used in flip-chip PN junction multi-junction battery.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The method utilizes organic solvent comprising acetone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Au compound is chloroauric acid and Pt-Au composition. Conductive carrier is carbon with large surface area e.g. carbon black, activated carbon, carbon nanotubes, and/or graphene. Pt compound is chloroplatinic acid, potassium platinum chloride, platinum chloride, sodium chloride, potassium and platinum alkylene, and/or platinum and sodium chloride alkylene. Preferred Parameter: Pt-Au@Pt fuel cell cathode catalyst particle size is 2-5 nu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The clay dispersion is obtained by dispersing a swelling clay in a liquid, which includes water as a main component, adding organic onium ions to the liquid to cause ion-exchange between the organic onium ions and hydrophilic cations existing on the surface of the swelling clay to obtain an organically modified clay, removing the ion-exchanged hydrophilic cation to obtain the organically modified clay, which is in a condition that water exists in the clay, and adding the organically modified clay from which the ion-exchanged hydrophilic cation is removed to a polar organic solvent. Preferred Components: The swelling clay is mica, vermiculite, montmorillonite, iron montmorillonite, beidellite, saponite, hectorite, stevensite, nontronite, magadiite, illite, kanemite, layered titanic acid, and smectite. The clay dispersion includes at least one of a fiber, which functions in a film for film reinforcement, or a fluid material, which functions in a film to add film flexibility.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The polar organic solvent includes at least one of dimethyl formamide, dimethyl acetamide, or 1-methyl-2-pyrolidone. The organic onium ions includes at least one of quaternary ammonium, quaternary phosphonium, or imidazolium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: Nanowire has average short axis diameter of less than or equal to 25 nm. Preferred Components: The 1st metal ion is silver ion. The amount of 2nd metal ions is 100-1000 mol per mol of 1st metal ion in seed particle dispersion liquid. The 2nd ligand is ion chosen from chloride ion, bromide ion, and iodide ion. Counter-ion of ion chosen from chloride ion, bromide ion and iodide ion is alkyl ammonium ion. Solvent used for the reaction solution contains greater than or equal to 50 mass% water. Oxygen concentration of metal-ion addition liquid containing 1st metal ion is greater than or equal to 0.5 mg/L and of metal-ion addition liquid containing 2nd metal ion is greater than or equal to 0.5 mg/L. Preferred Process: Seed particle dispersion liquid is prepared at the reduction of 1st metal ion and has quenching spectrum with half value width of less than or equal to 90 nm when the largest quenching degree in wavelength range (300-800 nm) measured by 1 cm of optical path lengths' optical cell is diluted or concentrated by the density used as 1. Metal-ion addition liquid of pH less than or equal to 7 containing 1st metal ion and reaction solution of pH greater than or equal to 7 containing reducing agent and ligand are mixed. Metal-ion addition liquid containing 2nd metal ion is added to reaction container in which temperature difference of solution to which metal ion addition liquid is added is greater than or equal to 25 degrees C. Reduction of 2nd metal ion uses reaction solution containing 2nd ligand and reducing agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic compound is boric acid. The solution, an oxidation source (6) and dopant solution are supplied to substrate through another systems (L1, L2 and L3), respectively. The oxidation source is water. The mol concentration of dopant supplied with respect to the mole concentration of metal alkyl is less than 1.8%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The electroconductive powder is silver powder. The content of electroconductive powder is 35-54 %mass. The content of titanium oxide particle and electroconductive powder having volume average particle diameter is 0.1-12 with respect to 100 pts. wt. electroconductive powder. Preferred Properties: The electroconductive powder has volume average particle diameter of 0.1-2.5 mu m and specific surface area of 0.3-2.5 m2/g. The softening point of glass frit is 450-700 degrees C. The film thickness of electrode is 0.1-2 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The metal nanowire dispersion liquid has electroconductivity of 1 mS/m or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Photocatalyst: In the photocatalyst architecture (A2), the titanium dioxide is formed by pulsed bi-polar electrolytic discharge oxidation of the titanium surface, exposing the growing oxide to an oxygen rich plasma at temperatures of over 3000 K for 1-100 microseconds, so as to yield a rough and highly porous oxide layer with a specific surface area of over 5 m2/g of oxide, and a low stiffness (less than 50 GPa). The titanium metal is of commercially pure grades (grades 1-4), so as to yield a high proportion of the anatase phase of TiO2 (titania) (greater than 90 wt.%) during pulsed bi-polar electrolytic discharge oxidation in a dilute alkaline electrolyte (comprising an alkaline metal phosphate at less than 10 g/l). The permeable sponge structure is used for fluid flow management. The electrically conductive substrate sponge structure is used to electrically integrate the photocatalyst into an electrolytic cell. In (A1), the macroporous architecture is formed from titanium wire configured as a sponge or mesh, or titanium wire woven into a sponge or mesh; or is formed from a perforated titanium sheet material. The sponge or mesh is open or reticulated. Preferred Components: The titanium dioxide is wholly or partly in an anatase phase. The titanium dioxide is formed by way of an anodizing process or electrolytic oxidation process (preferably plasma electrolytic oxidation process). The titanium dioxide has a microporous structure, at least at its surface. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The final base substrate is of copper, molybdenum, tungsten or silicon or aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: In oxide film, the atomic ratio of silver and nickel is 0.01-0.1:1. The oxide film has electroconductivity of 1 S/cm or more and forbidden band width of 3-4 eV. In a wavelength of 400-750 nm, the transmittance of light ray is 50% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The insulating film is made of silicon dioxide, silicon nitride or aluminum oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The bottom cell is made of indium gallium arsenide. The top cell is made of aluminum indium gallium phosphide and indium gallium arsenide.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: Gas containing oxygen, nitrogen, argon and helium or their mixture is introduced between high frequency application electrode and ground electrode. Activated gas such as noble gases, such as organic silane type materials, hexamethyl disiloxane, helium, argon, and oxygen, or their mixture is introduced between electrodes.
TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: The surface resistance of the transparent electroconductive film is less than or equal to 60 Omega /square. Preferred Process: The layer containing indium tin oxide is maintained at greater than or equal to 90 degrees C.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Property: The electrical resistivity of the heater is 5 Omega .cm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The oxide transparent conductive film contains zinc, element (M) which is aluminum and/or gallium, titanium, and oxygen. Preferred Properties: The atomic ratio of sum of element (M) and titanium with respect to total of zinc, element (M) and titanium is 0.01-0.055. The atomic ratio of element (M) with respect to total of zinc, element (M) and titanium is 0.002-0.025. The atomic ratio of titanium with respect to total of zinc, element (M) and titanium is 0.002-0.048. The mean diameter of a fine columnar convex portion is 10-80 nm. The height of the convex portion is 80 nm or less. Preferred Process: The oxide transparent conductive film is formed into a film by sputtering method. The base material temperature at the time of film-forming by sputtering method is 100-250 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The spherical particles are particles of metal oxide containing silicon.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The amount of spherical particle is 5-80 vol.% of the whole transparent sheet. The transparent resin is epoxy resin and acrylic resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The copper compound (a) is cuprous chloride, cupric chloride or copper oxide. The concentration of monovalant or bivalent copper compound in the aqueous solution is 0.1-2 wt.%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The basic compounds (e) added to manufacture copper nanowire are alkali hydroxide metallic compound, alkali hydroxide earth-metal compound, and compounds chosen from sodium hydroxide, potassium hydroxide, lithium hydroxide, magnesium hydroxide, calcium hydroxide, trimethylamine, triethylamine, tributhylamine, dimethylethanolamine and/or triethanolamine. The reducing agent is chosen from ascorbic acid or its sodium salt, hydroxy acetone, acetaldehyde and/or N,N-diethylhydroxylamine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The gallium concentration difference of center portion and edge portion is less than plus minus 2 wt.%. The alloy powder has porosity of 0.07% or less, gallium concentration of 15-45 %mass, compression of 0-25%, and ratio of tap density and volume density of 1-1.35.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polymer is a homopolymer. The polymer is selected from 7 compounds as given in the specification, e.g. compound of formula (IV).Ar'=an aromatic unit;a and b=mole fractions;ora+b=1.Preferred Components: The electroactive layer is a charge transport layer. The charge transport layer is hole transport layer. The electroactive layer is a photoactive layer. The photoactive layer further comprises a host material. The photoactive layer further comprises a photoactive material. Preferred Definitions:    Q'=O;    R1-R6=alkyl, aryl, or diarylamino.    SPECIFIC COMPOUNDS - 29 Compounds are specifically claimed as the compound (I), e.g. 3,7-diphenylbenzofuro(5,6-b)furan (Ia); 2,3,6,7-tetraphenylbenzofuro(5,6-b)furan; 4,8-bis(4-(naphthalen-1-yl)phenyl)-2,3,6,7-tetraphenylbenzofuro(5,6-b)furan; 4,8-bis(4-(naphthalen-1-yl)phenyl)-3,7-diphenylbenzofuro(5,6-b)furan; and 2,6-diisopropyl-3,7-diphenylbenzofuro(5,6-b)furan.    EXAMPLE - To 300 ml flask 180 g phosphorus pentaoxide (P2O5) was added, then slowly 85% of 100 ml H3PO4 was added. The mixture was heated at 118 degrees C for 2 hours. Then 18.7 g 2,2'-(1,4-phenylenebis(oxy))bis(1-phenylethanone) was added. The mixture was heated at 160 degrees C for 18 hours. The mixture was poured into 500 ml ice water and after centrifugation, 14.59 g off-white product was obtained. After work up, 11.05 g, yield 66% of 3,7-diphenylbenzofuro(5,6-b)furan as light yellow solid was obtained.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The fine catalytic metal particle contains copper, nickel, cobalt, iron, ruthenium, titanium, indium and platinum.
TECHNOLOGY FOCUS - POLYMERS - The frame is made from a material selected from a group consisting of PVC, polypropylene, PTFE, ethylene propylene diene monomer rubber, and dielectric polymer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The compound (B) is a calcium-silicate hydrate starting-material liquid. The content of component (D) with respect to total content of component (A) and component (B) is 10 %mass or less. The mass proportion of component (A) and component (B) is 3:7-8:2. The moldable heat insulator composition further comprises infrared-rays active substance (F). Preferred Property: The heat conductivity of heat insulating material is 50 mW/mK at 6000 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The ratio of the average longest side or longest diameter and average shortest side or shortest diameter of the silicon microparticles is 1.1-50. The average particle diameter and average porosity of the porous silicon particles is 0.1-1000 mu m and 15-93%, respectively. The ratio of the average particle diameter (Ds) of the silicon microparticles in 50% or more of surface near-field area (S) at the radial direction of the porous silicon particles, and average particle diameter (Di) of the silicon microparticles in less than 50% particles interior area (I) in the radial direction of the porous silicon particles is 0.5-1.5. The ratio of the porosity (Xs) in 50% or more of surface near-field area at the radial direction of the porous silicon particles and porosity (Xi) in less than 50% particles interior area in the radial direction of the porous silicon particles is 0.5-1.5. Preferred Composition: The silicon microparticles are in flat spherical shape, column shape or polygonal-prism shape. The silicon microparticles are solid silicon microparticles including 80 atomic% or more of silicon (excluding oxygen). The area of the junction portion between the silicon microparticles contains 30% or less of surface area of the silicon microparticles. The junction portion comprises crystalline silicon or silicon oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The material of semiconductor layer is selected from the group consisting of aluminum nitride, aluminum gallium nitride, boron nitride, 4H-phase silicon carbide, 6H-phase silicon carbide, amorphous silicon, silicon dioxide, and aluminum oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The amorphous film is made of amorphous silicon carbide, amorphous silicon nitride, amorphous-silicon carbon nitride, amorphous silicon oxide, amorphous silicon, amorphous germanium, or amorphous silicon-germanium. The semiconductor substrate is made of single crystal silicon.
TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The biaxially-stretched nylon film comprises coating agent (A) and crosslinking agent (B). The coating agent is aqueous-based polyurethane resin containing nonionic surfactant. The nonionic surfactant is acetylene glycol, in which two adjacent carbon atoms bonded through triple bond contains hydroxyl and methyl group as substituents, and/or addition products of ethylene oxide. The crosslinking agent is water-soluble poly-epoxy compound. The recessed portion is formed by deep-drawing the battery case wrapping material, to obtain sealant layer as inner surface, and the battery main portion is accommodated in the recess of battery case. Preferred Properties: The coating amount after stretching the aqueous coating agent containing components (A, B) in the weight ratio of 98-30/2-70, is 0.005-0.030 g/m2 in solid content. The average particle diameter of coating agent is 0.001-1.0 mu m with respect to solid content weight ratio (A/B/C), which is (98-30)/(2-70)/(0.1-10). The 50% modulus of sample having width of 15 mm, distance between zippers of 100 mm, tensile velocity of 200 mm/minute, at 0 degrees in machine direction, at 45 degrees and 90 degrees in transverse direction and 135 degrees in uniaxial tension test, is 120 MPa or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The low melting glass is silicon dioxide-boron trioxide-aluminum oxide-lead oxide-type glass and contains 1-10 %mass silicon dioxide, 5-15 %mass boron trioxide, 3-10 %mass aluminum oxide, 68-89 %mass lead oxide, 0-10 %mass copper oxide and 0-10 %mass titanium oxide. The composition of the low melting glass contains magnesium oxide, calcium oxide, strontium oxide, barium oxide, lithium oxide, sodium dioxide, potassium oxide, indium oxide, bismuth oxide, tin oxide or tellurium oxide.
TECHNOLOGY FOCUS - POLYMERS - Preparation (disclosed): Diethynyl arene compound (III) and low-valence titanium complex (IV) are reacted, to obtain polymer having titanacyclopentadiene frame of formula (V). The obtained compound (V) is reacted with halide compound of formula: M1rXs, to obtain organic heteropolymer (I).R4=alkyl;X=halo;M1=selenium or tellurium;andq=1 or less.Preferred Property: The average molecular weight of organic heteropolymer is 1x 103-1x 105. Preferred Component: The repeating unit (I) is preferably of formula: (Ia), (Ib) or (Ic). The polymer contains an aromatic ring (II).M2=sulfur, selenium or tellurium;R1a,R2a=halo;andR3a,R3b=linear or branched 4-12C alkyl, linear or branched 4-12C alkoxy and linear or branched 4-12C alkylthio. Preferred Definitions:    Ar'=benzene ring.    EXAMPLE - 0.1 g 1,4-Diethynyl 2,5-bis(2-ethylhexyloxy)benzene and 0.191 g tetraisopropoxy titanium were dissolved in 20 ml cyclopentyl methyl ether at argon atmosphere. 1.40 ml diethyl ether solution of isopropyl magnesium chloride was added, and the solution was stirred at -78 degrees C to -50 degrees C, heated and stirred for 12 hours. 0.203 g tellurium tetrachloride was added at -50 degrees C to the reaction solution at argon atmosphere, slowly heated at room temperature and stirred for 3 hours. The obtained solution was dissolved in methylene chloride after solvent distillation, and ethylenediaminetetraacetic acid was added and stirred for 2 hours, to remove the unreacted titanium. The organic layers were recovered, dried with magnesium sulfate, dissolved in small amount of methylene chloride after solvent distillation and reprecipitated with methanol, to obtain poly(2-(2,5-bis-(2-ethyl-hexyloxy)-phenyl)-2H-1-tellurophene) with yield of 49% and number average molecular weight of 2400.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The catalyst is transition metal compound. Preferred Definitions:    Y'=group of formula (VI);and    X=bromo.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The microparticles or hollow microparticles particles are transparent, and have particle size of 5 nm to 50 mu m. The organic solvent has moisture content of 100 ppm or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The processing agent further contains substance containing silanol condensation catalyst or chlorosilyl group, and microparticles or hollow microparticles, as main component. The silanol condensation catalyst is chosen from carboxylic acid metallic salt, carboxylate metal salt, carboxylic acid-metallic salt polymer, carboxylic acid-metallic salt chelate, titanate chelate, and titanium oxide. The ketimine compound or organic acid, aldimine compound, enamine compound, oxazolidine compound, and aminoalkyl alkoxysilane compound, are used to replace silanol condensation catalyst. The aqueous medium is used to replace organic solvent. The aqueous medium is water-containing alcohol or alcohol, water-containing surfactant or water-containing surfactant and alcohol. Preferred Composition: The substance (A) is of formula: CH3-(Si(CH3)2O)n-SiCl3, CH3-(Si(CH3)2O)n-Si(CH3)Cl2, CH3-(Si(CH3)2O) n-Si(CH3)2Cl, Cl3SiO-(Si(CH3)2O)n-SiCl3, Cl2Si(CH3)O-(Si(CH3)2O)n-Si(CH3)Cl2, or ClSi(CH3)2O-(Si(CH3)2O)n-Si(CH3)2Cl. The substance having chlorosilyl group is of formula: Cl3Si(-OSiCl2)m-Cl. The substance having alkoxysilyl group is of formula: AO3Si(OSi(OA)2)m(OA). The substance (D) is of formula: CF3-(CF2)n'-(R)m-SiXpCl3-p.n= 0 or 12 or less;m=0 or integer;n'=0 or 16 or less;p=0,1 or 2;A=alkyl;R=alkyl, phenyl, vinyl, ethynyl, or substituent containing Si or O;andX=H, alkyl, alkoxyl, fluorine-containing alkyl or fluorine-containing alkoxy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The mask pattern includes trapezoid or triangle shape of cross section which is made of silicon oxide (SiO), silicon nitride (SiNx). The substrate is sapphire substrate, silicon carbide (SiC) substrate or silicon (Si) substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal precursor comprises palladium, platinum, nickel, cobalt, and iron.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The foaming agent includes azodicarbonamide, oxybis-benzenesulfonylhydrazide, toluenesulfonyl-hydrazide, benzenesulfonyl hydrazide, toluenesulfonyl-semicarbazide, 5-phenyltetrazole, and 2,4-dinitrophenyl 2-thiophenecarboxylate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The Magneli-phase titanium oxide further has nano-porous carbon having average diameter of 10-20 nm, formed on titanium oxide. The titanium oxide includes tetratitanium heptaoxide and pentatitanium nonaoxide.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Component: The vapor separator has an elastic mobile separation film.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The chemical liquid is chemical hydride aqueous solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal oxide powder is aluminum oxide powder, carbon material powder or graphite powder.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The cobalt metal precursor is chosen from cobalt acetate or cobalt acetylacetonate. The solvent is amine and ether. The ether is chosen from dibenzyl ether and diphenyl ether. The amine is chosen from oleamide, lauryl amine and hexadecylamine. The organic solvent is chosen from n-hexane, toluene, ethanol and acetone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The hydrothermal synthesis reaction is the process of obtaining copper zinc tin sulfide particles by making zinc ion and tin ion, and the nucleus of copper disulfide to react. Preferred Composition: The sulfur ion sources are sodium sulfide nonahydride and thioacetamide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The nitride-based group III-V compound semiconductor layers are selected from a group consisting of gallium nitride layers, aluminum gallium nitride layers, aluminum gallium indium nitride layers and indium gallium nitride layers.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The reactant fuel material includes sodium silicide powder or sodium silica gel.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polysiloxane crosslinked structure contains (I) and the sum of siloxane units (II) and (III) at a molar ratio of 100/0-50/50. The organosiloxane particles are mixed together at a rate of 5-60 mass% with respect to the sum of the polyolefin resin and the organosiloxane particles.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Components: The electroactive layer is a charge transport layer, which is a hole transport layer, or a photoactive layer that further comprises a host material and a photoactive material.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polymer is a homopolymer comprising a 1H-cyclopenta(a)naphthalene compound of formula (IV) or (V).Ar1 = aryl unit comprising phenylene, naphthylene, biphenylene, binaphthylene, anthracenylene, fluorenylene and/or diarylamine; anda, b = mole fractions, whee a+b is 1. SPECIFIC COMPOUNDS - 38 Compounds (I) are specifically claimed e.g. 1,2,6,7-tetraphenylbenzofuro(7,6-g)benzofuran of formula (Ia), 1,6-diphenylbenzofuro(7,6-g)benzofuran, 2,7-bis(1-naphthyl)-1,6-diphenyl-benzofuro(7,6-g)benzofuran, 2,7-bis(4-tert-butylphenyl)-1,6-diphenyl-benzofuro(7,6-g)benzofuran and 4,9-bis(4-(1-naphthyl)phenyl)-1,2,6,7-tetraphenyl-benzofuro(7,6-g)benzofuran.    EXAMPLE - Potassium carbonate (45 g) powder was added to a mixture solution of 1,5-dihydroxynaphthalene (16 g) and bromoacetophenone (41.8 g) in acetone (400 ml). The mixture was heated to reflux for 18 hours. The white solid was formed during the reaction. The solids were filtered off and washed with water, diluted with hydrochloric acid (200 ml), water (300 ml) and acetone (200 ml) and then dried to give 2-((5-phenacyloxy-1-naphthyl)oxy)-1-phenyl-ethanone (A) (38.4 g). (A) (40 g) and dichloromethane (2300 ml) were added to a round bottom flask (500 ml) and then methanesulfonic acid (50 g) was added dropwise. The suspension mixture was refluxed for 1 hour, and run through a flash column to give 1,6-diphenylbenzofuro(7,6-g)benzofuran (28 g) with a yield of 78%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compound: The metal ions which are metal complex ions. The composition comprises aldehyde reducing agent, alkali which is a metal hydroxide and alcohol, preferably alkali hydroxide or metal carbonate, preferably metal citrate, metal borohydride, hydrazine or metal hypophosphite. The metal formed on the silicon surface is chosen from silver, copper, platinum and gold. The etching composition is an aqueous etching composition comprising fluoride ions which is hydrogen fluoride and an oxidant which is chosen from oxygen, ozone, hydrogen peroxide, acid or salt of nitrate, peroxysulfate, nitrite or tetraborate and/or perchlorate, alkali nitrates, and/or ammonium nitrate. The silicon to-be-etched is n- doped, and/or p-doped and in the form of bulk silicon, optionally a silicon wafer, preferably silicon powder. 50% of the total volume of the powder having face area per unit weight of more than 1 m/g is made up of starting material particles having particle size of not more than 25 microns. The purity of silicon is 90 wt.% or more, preferably 99.85 wt.% or more and comprises a non-silicon core and a silicon shell. Silicon contains 0.03 wt.% or less, preferably 0.02 wt.% or less iron and 0.08 wt.% or less, preferably 0.02 wt.% or less aluminum.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: Preferred Composition: The oil gelatinizer (B) is chosen from 19 compounds e.g. hydroxy fatty acid, dextrin fatty acid ester, n-lauroyl-L-glutamic acid-( alpha ),( beta )-dibutylamide, di-p-methylbenzylidene sorbitol glucitol and hydroxy aluminum bis(2-ethylhexanoate). The compound (A) has ethylenically unsaturated group. The photocurable resin composition further comprises photoinitiator (C), compound (D) which is liquid at 25 degrees C or more, and compound (E) which is solid at 25 degrees C or more. Alternatively, the image display apparatus has laminate structure including image display unit having image display portion, touch panel (2), transparent guard plate, and resin layer (5) provided between the touch panel and transparent guard plate. The transparent guard plate has level difference portion.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Flow-type catalytic reaction apparatus has structure comprising catalyst precursor containing gold alloy with gold as main component on entire structure or gold alloy in which surface has gold and by which surface is modified by sulfur element and structure by which surface is modified by sulfur element. Catalyst precursor which has catalyst metallic compound is supported by the structure. Preferred Parameters: Peak of sulfur 1 s orbital measured by photoelectron spectroscopy analysis of catalyst precursor in peak top position is 2470 plus minus 2 eV.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: Melting point of the reinforcing material is higher than melting point of low melting-point material. The porosity of the reinforcing material is 35-65%. Preferred Components: The molecular weight during a crosslinking point of the low melting-point material and reinforcing material is 200-5000. The refractory material is chosen from aluminum oxide, silicon dioxide, titanium oxide and aluminum nitride.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The low melting-point material is polyolefin resin. The reinforcing material is chosen from glass-type fiber and ceramic type fiber. The crosslinked structure of the reinforcing material has through-hole. The isolator further contains binder. A separator is arranged between isolator and greater than or equal to 1 electrode of positive and negative electrodes.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The transparent conductive layer is formed from indium oxide, tin oxide, zinc oxide, cadmium oxide, magnesium oxide or mixture. The barrier layer is formed from silicon dioxide, silicon nitride, tin oxide, titanium dioxide, aluminum oxide or mixture. The non-continuous, dispersed semiconductor layer is formed from cadmium sulfide, zinc sulfide, cadmium selenide, zinc selenide, or mixture. The semiconductor layer is formed from cadmium telluride, zinc telluride, copper sulfide, copper selenide, indium sulfide, indium selenide, gallium sulfide, gallium selenide, or mixture.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Heat-processed CZTS particle is produced by performing hydrothermal reaction.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The lower alcohol is chosen from methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol and 2-methyl-2-propanol. The raw material liquid contains ammonium fluoride aqueous solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: During manufacture of silicide, magnesium-aluminum alloy is added to silica ashes, pulverize-mixed with a ball mill, and heated at 350 degrees C to less than 800 degrees C under inert gas atmosphere, to obtain powdered magnesium silicide. The silica ash is obtained by heating silicic-acid plant under inert gas atmosphere, forming carbonized material, and carrying out heating combustion of obtained carbonized material under oxygen-containing atmosphere. Preferred Composition: The silicic-acid plant is chaff of rice plant or rice straw. The alloy is powder having average particle diameter of 150 mu m or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The anthanthrene-type compound (I) is manufactured by carrying out cyclization reaction of aldehyde group-containing compound of formula (II).X=leaving group which reacts with EH group and detaches, preferably iodo.Preferred Process: The cyclization reaction of aldehyde group-containing compound (II) is carried out in presence of base chosen from carboxylic acid metallic salt and metal hydroxide. Preferred Definitions:    R1,R4=halo;and    R2,R3=iodo.    SPECIFIC COMPOUNDS - 5,5',6,6',8,8'-hexa-iodo-3,3'-diformyl-2,2'-dihydroxy-1,1'-binaphthyl of formula (Ia) is disclosed as anthanthrene-type compound.    EXAMPLE - 75.5 mg Potassium acetate and 1.15 mg palladium acetate were added into two-necked flask under nitrogen atmosphere. 2.5 ml Ethyl methyl ketone was added to reaction mixture and stirred at 120 degrees C for 3 hours. The solvent was concentrated, and the mixture was washed using chloroform and water, to obtain 0.1 g 5,5',6,6',8,8'-hexa-iodo-3,3'-diformyl-2,2'-dihydroxy-1,1'-binaphthyl, with purity of 98%.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The composition comprises 27 wt.% PVC, 10 wt.% PAN, 40 wt.% PMA, 8 wt.% PAI, and 15 wt.% PBA; or 10 wt.% PVC, 20 wt.% PAN, 40 wt.% PMA, 10 wt.% PAI, and 20 wt.% PBA; or 35 wt.% PVC, 7 wt.% PAN, 50 wt.% PMA, 6 wt.% PAI, and 2 wt.% PBA; or 25 wt.% PVC, 8 wt.% PAN, 50 wt.% PMA, 7 wt.% PAI, and 10 wt.% PBA. The composition further comprises 15-35 wt.% polystyrene (PS) and 20-40 wt.% polybutadiene (PBD). The composition comprises 10 wt.% PVC, 7 wt.% PAN, 11 wt.% PMA, 13 wt.% PAI, 9 wt.% PBA, 24 wt.% PS and 26 wt.% PBD; or 10 wt.% PVC, 5 wt.% PAN, 10 wt.% PMA, 10 wt.% PAI, 10 wt.% PBA, 25 wt.% PS and 30 wt.% PBD; or 15 wt.% PVC, 2 wt.% PAN, 15 wt.% PMA, 6 wt.% PAI, 14 wt.% PBA, 22 wt.% PS and 26 wt.% PBD; 15 wt.% PVC, 2 wt.% PAN, 15 wt.% PMA, 5 wt.% PAI, 15 wt.% PBA, 20 wt.% PS and 28 wt.% PBD; or 8 wt.% PVC, 2 wt.% PAN, 15 wt.% PMA, 8 wt.% PAI, 15 wt.% PBA, 22 wt.% PS and 30 wt.% PBD; or 9 wt.% PVC, 3 wt.% PAN, 7 wt.% PMA, 8 wt.% PAI, 9 wt.% PBA, 27 wt.% PS and 37 wt.% PBD; or 8 wt.% PVC, 2 wt.% PAN, 15 wt.% PMA, 5 wt.% PAI, 15 wt.% PBA, 20 wt.% PS and 35 wt.% PBD; 8 wt.% PVC, 2 wt.% PAN, 10 wt.% PMA, 3 wt.% PAI, 10 wt.% PBA, 30 wt.% PS and 37 wt.% PBD; or 5 wt.% PVC, 8 wt.% PAN, 5 wt.% PMA, 15 wt.% PAI, 5 wt.% PBA, 30 wt.% PS and 32 wt.% PBD. Preferred Components: In the substrate (s1), the composition comprises 7 wt.% PAN, 13 wt.% PMA, 8 wt.% PAI, 18 wt.% PBA, 32 wt.% PS and 22 wt.% PBD; or 4 wt.% PAN, 10 wt.% PMA, 5 wt.% PAI, 20 wt.% PBA, 36 wt.% PS and 25 wt.% PBD; or 3 wt.% PAN, 4 wt.% PMA, 3 wt.% PAI, 8 wt.% PBA, 55 wt.% PS and 27 wt.% PBD; or 1 wt.% PAN, 6 wt.% PMA, 3 wt.% PAI, 12 wt.% PBA, 47 wt.% PS and 31 wt.% PBD. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The nanoclay is silicate layer. The content of dispersed solution is 1-15 wt.%. Preferred Properties: The solvent has refractive index of 1.4 or more. The solvent has refractive index of 1.4 or more.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic modifier comprises dimethyl benzyl hydrogenated tallow quaternary ammonium ion, bis(hydrogenated tallow)dimethyl quaternary ammonium ion, tallow methyl-bis-2-hydroxyethyl quaternary ammonium ion, hydrogenated tallow dimethyl 2-ethylhexyl quaternary ammonium ion or dimethyl dehydrogenated tallow quaternary ammonium ions. The solvent comprises n-propyl acetate, N-butyl acetate, cyclohexane, methylcyclohexane, benzene, toluene, ethylbenzene, xylene or 1,2,3-trimethylbenzene. The adhesive composition further contains multifunctional acrylate or epoxy compound and initiator. Preferred Properties: The adhesive film has optical transmittance rate of more than 90% in the visible light area and haze value of less than 3%. The volatile content of organic component is 1000 ppm at 150 degrees C for 1 hour.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The binder resin is polyisobutylene resin.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polyimide precursor is obtained by polycondensing diamine and an acid dianhydride. The diamine is 19-56 mol% diamine component (A) of formula (I), and/or 44-81 mol% diamine component (B) of formula (II) with respect to total amount of diamine. The acid dianhydride is 60-100 mol% acid dianhydride component (C) which is 5,11-dioxatricyclo(7.3.0.03,7)dodeca-1,3(7),8-triene-4,6,10,12-tetrone, and/or 0-40 mol% acid dianhydride component (D) of formula (IV) with respect to total amount of acid dianhydride. The total amount of diamine components (A) and (B) is 47.5-52.5 mol%. The total amount of acid dianhydride components (C) and (D) is 47.5-52.5 mol%. The diamine component (B) is 3-(4-(4-(3-aminophenoxy)phenyl)phenoxy)aniline. The diamine component (A) is 4-(4-aminophenoxy)aniline. The acid dianhydride component (D) is 5-(1,3-dioxo-1,3-dihydro-2-benzofuran-5-yl)-1,3-dihydro-2-benzofuran-1,3-dione.X=bivalent group of single bond, O, S, sulfone, carbonyl, methylene, isopropylidene or hexafluoro isopropylidene;andY?=bivalent group of single bond, O, S, sulfone, carbonyl, methylene, isopropylidene or hexafluoro isopropylidene.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyimide resin is used as insulation coating material covers a conductor.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The layered film further contains an epitaxially grown buffer layer containing zirconium oxide and yttrium oxide as an underlayer for heteroepitaxial PN junction oxide thin film, and an epitaxially grown metal thin film disposed between the heteroepitaxial PN junction oxide thin film and buffer layer. The metal thin film contains element chosen from platinum, iridium, palladium, ruthenium and rhodium. The P-type semiconductor oxide thin film contains material chosen from tin oxide, nickel oxide and copper oxide. The single crystal substrate contains material chosen from silica, magnesium oxide, strontium titanate and lithium niobium oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The N-type semiconductor oxide thin film contains doped perovskite-type compound of formula: R(Mx,Dy)O3 or (Rx,Dy)MO3 obtained by doping a perovskite-type compound of formula: RMO3 with a metal (D') other than R and M.R=Ba, Ca, Fe, K, La, Li, Mg, Mn, Na, Sr, or Zn;M=Co, Fe, Hf, La, Mn, Nb, Ni, Si, Sn, Ta, Ti, or Zr;andD'=Al, Ba, Ca, Ce, Co, Cr, Fe, Hf, K, La, Mg, Mn, Na, Nb, Ni, Sn, Sr, V, Y, Zn, or Zr.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step of providing the inorganic boron-comprising material comprises providing a material consisting of boron oxide, boric acid and/or borates of formula (B(OR)3) (I).R = alkyl.    TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The step of combining the inorganic boron-comprising material with the polar solvent comprises combining the inorganic boron-comprising material with a material consisting of iso-stearic acid, ethanol, propylene glycol butyl ether, ethylene glycol and/or triethylene glycol. The step of combining the inorganic boron-comprising material with the spread-minimizing additive comprises combining the inorganic boron-comprising material with a material consisting of iso-stearic acid, polypropylene oxide, vinylmethylsiloxane-dimethylsiloxane copolymer, polyether-modified polysiloxanes and/or organo-modified polysiloxanes. The method further comprises adding a functional additive to the inorganic boron-comprising material, where the functional additive comprises a material consisting of viscosity modifiers, dispersants, surfactants, polymerization inhibitors, wetting agents, antifoaming agents, detergents and surface-tension modifiers, flame retardants, pigments, plasticizers, thickeners and/or rheology modifiers. Providing the inorganic boron-comprising material comprises providing a polymeric borazole resin. EXAMPLE - 3.5 g Boric acid was dissolved in 46.5 g ethanol. The solution was spun onto a four-inch n-type wafer at 500 rpm with no baking. The coated wafer was heated at 1050 degrees C for 10 minutes in 2.5% oxygen. The wafer was deglazed using 20:1 diluted hydrofluoric acid to give a boron-comprising ink. Sheet resistance after deglazing, measured using a four-point probe test, was 75 ohms/square.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Film: The indium oxide type film is chosen from indium oxide film, indium-tin oxide film and indium-zinc oxide film. Metal coating film is chosen from copper, nickel, titanium, chromium, silver, molybdenum, aluminum, platinum and palladium. The alloy film contains two or more metals chosen from copper, nickel, titanium, chromium, silver, molybdenum, aluminum, platinum and palladium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The component (C) is chosen from 3-4C or oxygen-containing compound of formula: R1-O-(CH2-CH(-CH3)-O-)n-R3 (II). The compound (C) contains isopropanol or dipropylene-glycol monomethyl ether. The etching composition further comprises stabilizer, solubilizer of the components (A-C), antifoamer, pH adjusting agents, ratio superimposition ready agent, viscosity modifier, wetting improving agent, chelating agent, oxidizing agent, reducing agent, and surfactant, preferably reducing agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dopant sources are boron dope silicon glass film and phosphor-doped silicon glass film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The primary compound semiconductor layer is gallium arsenide layer. The arsenic raw material is arsenide (As2) molecule. The arsenic raw material is produced by carrying out cracking of arsenide (As4) molecule.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The method is performed in presence of solvent and fluorine-affinity compound. The fluorine affinity compound is lithium halide, magnesium halide or zinc halide, preferably lithium halide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The silane compound is of formula: XaY'bZcSiOd (I).X=organic skeleton containing imide bond;Y'=H, hydroxy, halo or OR;Z=organic group does not contain imide bond;R=alkyl, acyl, aryl group or unsaturated aliphatic residue, and optionally having substituent;a=3 or less (excluding 0);b,c=0 to less than 3;d=less than 2 (excluding 0);andor a+b+c+2d=4.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The curable resin composition further contains polyfunctional maleimide compound and imidazole compound. The curable resin composition contains benzoxazine compound, polyfunctional maleimide compound and imidazole compound. Preferred Process: The manufacture of curable resin composition is carried out by injecting one portion or all portions of raw material components other than the benzoxazine and imidazole compound to reaction container, and injecting benzoxazine compound and then imidazole compound into the reaction container.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method (m1) further comprises: drying the substrate after adsorbing the rod-like molecules; and washing the substrate after drying the substrate. In the method (m1), the pattern is formed on a resist film. The convex portion has a line-shape, and in adsorption of the rod-like molecules, the rod-like molecules are adsorbed as directed to be parallel to the width direction of the convex portion. Preferred Components: The molecular length (L1) is greater than or equal to 0.2 times the length L2. The convex portion has a line-shape. The rod-like molecule is a virus molecule or a carbon nanotube. A density of the rod-like molecule in the solution or the dispersion liquid is 1-10 mg/ml. The molecular length (L1) of the rod-like molecule is 0.2-2 times the width dimension (L3) of the convex portion.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The ampule is quartz glass. Preferred Process: The ampule is pulverized and coated with carbon, during method of fabricating alloy.    TECHNOLOGY FOCUS - METALLURGY - Preferred Process: The copper-indium-gallium alloy crystals are crushed, mixed with selenium, and transformed into quaternary alloy. The copper-indium-gallium-selenium quaternary system alloy is crystallized by heating at 100 degrees C or less for 1 hour, and maintaining the temperature at 1000-1100 degrees C for 6 hours or more, during method of fabricating alloy. The sputtering target is obtained by pulverizing the alloy, carrying out pressing process, and slicing.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The sum of the cross-sectional area of the sacrifice yarn and cross-sectional area of the void is more than 2000 mu m2 and less than 4000 mu m2. Preferred Composition: The sacrifice yarn contains polyethylene terephthalate, polybutylene terephthalate, polytrimethylene terephthalate, rayon and cellulose. The sacrifice yarn is polyethylene-terephthalate yarn, polytrimethylene terephthalate yarn or polybutylene-terephthalate yarn. The sacrifice yarn is yarn containing a mixture of polyethylene terephthalate and polybutylene terephthalate. A portion of sacrifice yarn is hydrolyzed, and contacted with the alkaline aqueous solution elute so that the relation (ii) is satisfied.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The carbon black (b) has a nitrogen adsorption specific surface area (N2SA) of 25-180 m2/g and a dibutyl phthalate (DBP) absorption of 40-180 ml/100 g.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The fluororubber composition contains 5-65 pts. wt. of the carbon black (b) relative to 100 pts. wt. of the fluororubber (a). The fluororubber composition further contains a crosslinking agent (c). EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The barrier is made of silicon dioxide, aluminum oxide and silicon nitride.    TECHNOLOGY FOCUS - METALLURGY - The ion implantation layer is made of sodium or potassium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The reaction gas includes hydrogen chloride.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The heat conductive layer is made of ceramic material.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The heat conductive layer is made of beryllium oxide, aluminum oxide, aluminum nitride, and silicon oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The molar ratio of selenium and solvent is 1:1-1:8.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The catalyst comprises 0.002-0.02 mol/L acetone solution of bismuth trichloride. The molar ratio of catalyst and bis(bis(trimethyl silicon alkyl)amino)tin (II) is 1:20-1:2000. The molar ratio of selenium precursor solution and reaction solvent is 1:25-1:150. The molar ratio of tin injectable solution and reaction solution is 1:25-1:150.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The ordered zinc oxide nanowire is electrochemically-deposited using zinc oxide seed layer thin film-coated organic flexible material as working electrode, molybdenum electrode as counter electrode, saturated calomel electrode as reference electrode, 1-5x 10-4 M zinc chloride solution and 0.1-3.4 M potassium chloride. The microspheres are placed into 1-2 M zinc chloride solution for predetermined time, such that polystyrene microspheres surface becomes electrochemically active. Preferred Composition: The urchin-shaped zinc oxide nanowire contains zinc oxide nanocrystal.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: During self-assembling method, the organic flexible material is ultrasonic cleaned using vinyl chloride, acetone and isopropanol, washed using ultrapure water, drying using nitrogen, depositing polystyrene microspheres, naturally drying, and processing using zinc chloride solution having concentration of 1-2 M.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic binder is 30-70 wt.% bismuth trioxide, 10-25 wt.% zinc oxide, 5-20 wt.% boron trioxide, 5-15 wt.% silicon oxide and 1-10 wt.% aluminum trioxide. Preferred Components: The inert component is aluminum oxide, silicon carbide, silicon nitride, zinc oxide and/or zirconia. Preferred Properties: The inorganic binder has grain diameter of less than 10 mu m. The inert component has particle diameter of 3-5 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic carrier is 5-15 wt.% turpentine oil, 3-10 wt.% benzyl alcohol, 10-30 wt.% glycol dibutyl ether, 20-40 wt.% glycol monobutyl ether acetate, 15-30 wt.% tributyl citrate and 2-7 wt.% cellulose. Preferred Components: The organic additive is Span-85 (RTM: Sorbitan trioleate), lecithin, boric acid ester coupling agent, silane coupling agent and/or a flatting agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The silicon wafer is monocrystalline silicon, polycrystalline silicon or a quasi-single crystal silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The silicon substrate is ultrasonically cleaned using ethanol and deionized water, and P-type polycrystalline silicon target with purity of 99.999% and conductivity of 0.02 Omega .cm is sputtered using argon gas with flow rate of 20 sccm as sputtering gas, to form layer of amorphous silicon. An aluminum target having purity of 99.999% is sputtered under nitrogen atmosphere on layer of amorphous silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The noble-metal catalyst is platinum, palladium, rhodium, ruthenium or iridium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The preparation of graphite nano-plate supported nano-noble metal catalyst comprises: performing ultrasonic dispersion of (I) or (II) and the graphite nano-plate in weight ratio of 10:0.5-1.5 in water and ethylene glycol solutions respectively, where volume ratio of water and glycol is 1:2, then mixing and performing ultrasonic dispersion on the two solutions and adsorbing (I) or (II) on the graphite nano-plate surface, (b) adding noble metal precursor with specified measurement to obtained mixed solution by impregnation-reduction method, where mass fraction of noble-metal in the catalyst is 10-30%, and (c) reacting, filtering the solution and drying filter cake; or uniformly performing ultrasonic dispersion on (I) or (II) and the graphite nano-plate in weight ratio of 10:0.5-1.5 in water and methanol solutions respectively, where volume ratio of water and methanol is 1:2, then mixing and performing ultrasonic dispersion on the two solutions and adsorbing (I) or (II) on the graphite nano-plate surface, (b) heating obtained mixed solution at 40 degrees C in water bath and adding noble-metal precursor, and then adding sodium borohydride aqueous solution in dropwise manner, where the mass ratio of sodium borohydride and noble-metal catalyst is 4:1 and molar fraction of noble-metal in the catalyst is 10-30%, and (c) reacting, filtering the solution and drying filter cake. Preferred Components: The thickness of graphite nano-plate is 3-20 nm, and dimensional thickness is 0.5-20 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nano oxide is spinel oxide, and/or perovskite-type oxide. The oxygen ionic conductivity material powder is doped zirconia-type electrolyte material, impure cerium oxide-type electrolyte material, and/or doped lanthanum gallate-type electrolyte material. The spinel oxide is of formula: (A,B')3O4, where A and B' are magnesium, aluminum, calcium, chromium, manganese, iron, cobalt, nickel, copper, zinc, yttrium and/or silver. The perovskite-type oxide is of formula: A"B"O3, where A" is barium, lanthanum, strontium, and/or samarium, and B" is titanium, chromium, manganese, cobalt, iron, nickel, and/or copper.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The organic solvent is absolute ethyl alcohol or glycol.
TECHNOLOGY FOCUS - ENVIRONMENT - Preferred Components: The high fluoride acidic water concentration is more than 5000 mg/l, and the low fluoride acidic water concentration is less than 100 mg/l. Preferred Method: The calcium carbonate powder is placed into bag package by plastic bag is water-soluble, and adding calcium carbonate in the reactor with spiral conveyor, or directly adding calcium carbonate powder in the reactor with spiral conveyor. The mixture of 5-50% of calcium carbonate and water in the liquid mixture feed is added to the reaction using a metering pump vessel. A decanter centrifuge, filter centrifuge, or filter press is used in solid-liquid and liquid-phase separation.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catalytic nanoparticles comprise pure metal or metal alloy containing nickel, platinum, iridium and palladium. The coating comprises aluminum oxide.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The coating comprises polytetrafluoroethylene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The barrier film comprises a mixture of a polymeric silicon and inorganic silicon. The mixture of polymeric silicon and inorganic silicon is uniform across the layer. The barrier film comprises a uniform material and a mixture of an oxide and polymeric silicone. The barrier film comprises 40% of inorganic silicon. A weight ratio of polymeric silicon to inorganic silicon is in a range of 95:5-5:95. The polymeric silicon and the inorganic silicon are created from the same precursor material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The moisture barrier layer has a layer thickness of 10 nm to 100 mu m. The multiple of layers are made of silicon nitride or silicon dioxide. The silicon nitride and silicon dioxide are present in amorphous-form. Preferred Method: The method includes supplying a volume of at least one inert gas including argon and/or helium.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The electronic component further comprises a carrier (102), where the layer to be protected from moisture is arranged on or above the carrier, and an encapsulation unit, which is arranged on or above the moisture-barrier layer.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The reactor comprises a copper-based cylindrical tube with constant cross-sectional area. The tube is helically coiled and has a surface-to-volume ratio of greater than 2000m-1 such that there is laminar flow of the feedstock and the HFPO through the reaction zone.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The process comprises pretreating the reactor by heating the reaction zone of the reactor to a pretreatment temperature of 180-230 degrees C, passing gaseous HFP and oxygen through the reaction zone at a first HFP:oxygen molar ratio for a period of time, while maintaining the pretreatment temperature in the reaction zone, and adjusting the HFP:oxygen molar ratio to a second value to achieve the HFPO production. The pretreatment temperature is 200 degrees C. The pressure in the reactor, during the pretreatment, is 3-6.5 bar. The gaseous residence time of the feedstock in the reaction zone, during the pretreatment and during the HFP conversion to HFPO, is 80-160 seconds. The HFP is converted by the epoxidation to HFPO. Preferred Components: The first molar ratio of HFP:oxygen is 1:1 and/or the second molar ratio of HFP:oxygen is 0.25:1-1.81:1. EXAMPLE - None given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: In the composition, a sub-composition comprises components (A)-(C), when cured, has an oxygen permeability of up to 1000 cm3/m2/24h/atm. Preferred Components: The organosilicon compound comprises an organohydrogenpolysiloxane of formula (R2aaHbSiO(4-a-b)/2). The component (D) comprises particles of a polyorganosilsesquioxane resin or silicone particles covered partially or entirely on their surface with a polyorganosilsesquioxane resin.R2a = silicon-bonded monovalent hydrocarbon (optionally substituted) other than aliphatic unsaturated radical; anda, b = positive numbers, where a is less than or equal to 0.7 or 2.1, the b is less than or equal to 0.001 or 1, and a+b is less than or equal to 0.8 or 3. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Component: The crucible is made of quartz or graphite.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic layer (14) and inorganic layer (20) contain metal oxide. Preferred Properties: The surface roughness of the inorganic layer (14) and inorganic layer (20) is 5 nm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: UV light is transmitted from light source to gas-hydrate without carrying out wavelength conversion. The light source contains excimer lamp or light emitting diode. Preferred Parameters: The wavelength of the UV ultraviolet light is 150-200 nm. The average particle diameter is less than or equal to 1 mm. Preferred Components: The gas-hydrate contains the microparticles prepared by grinding or mist formation of water.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The reaction product contains alcohol which is methanol, ethanol and propanol, and hydrogen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The smectite is synthetic compound chosen from stevensite, hectorite, saponite, montmorillonite and/or beidellite.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The liquid (B) contains water-soluble polymer. The electrolyte polymer fluid is chosen from salt of primary class, secondary class or tertiary amino group and/or quaternary amino group. The solid base material further comprises anti-reflective film on surface of smectite laminated film. Preferred Property: The solid weight ratio of water-soluble polymer is 95/5-50/50. The concentration of electrolyte polymer is 0.0003-3 %mass. The solid base material has uneven structure.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation is given. SPECIFIC COMPOUNDS - 3 Fully organic pigment compounds are specifically claimed, i.e. (2E)-3-(7-(5-(5-(4-(bis(4-(hexyloxy)phenyl)amino)phenyl)thiophen-2-yl)thiophen-2-yl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)-2-cyanoprop-2-enoic acid of formula (I), (2E)-3-(7-(5-(4-(bis(4-(hexyloxy)phenyl)amino)phenyl)thiophen-2-yl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)-2-cyanoprop-2-enoic acid and 2,2-dicyano-3-(7-(5-(4-(diphenylamino)phenyl)thiophen-2-yl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)prop-2-enoic acid hydrate.    EXAMPLE - 10 mL (4-(Bis(4-(hexyloxy)phenyl)amino)phenyl)boranediol reaction was dissolved in 10 mL tetrahydrofuran and 9.39 mmol anhydrous magnesium sulfate of pinacol, and catalyst was added. The obtained liquid mixture was filtered and concentrated after stirring at room temperature for 24 hour, purified by silica gel column chromatography, to obtain 5.16 mmol N,N-bis(4-(hexyloxy)phenyl)-4-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)aniline with yield of 55%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sputtering target has structure containing sodium fluoride, sodium sulfide and sodium selenide, each having average particle diameter of 5microns or less dispersed in a target substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The mold release material layer is provided in the base plate part upper surface. Preferred Components: The silicone casting mold has graphite or quartz (silica) as main component. The additive is chosen from silicon nitride, silicon carbide, silicon oxide and graphite as main component. Preferred Property: The additive has surface density of 0.2-8.5 piece/cm2.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The condensed polycyclic aromatic compound is condensed polycyclic aromatic hydrocarbon compound or condensed polycyclic heteroaromatic compound. The condensed polycyclic aromatic hydrocarbon compound is of formula: Ar1Ar2Ar3 (I), and its precursor is of formula: Ar1Ar4AR3 (II). The condensed polycyclic heteroaromatic compound is of formula: Ar11Ar12Ar13 (III) and its precursor is of formula: Ar11Ar14Ar13 (IV). The ionic liquid is fluorine-type ionic liquid having anions chosen from hexafluorophosphate anion, tris(pentafluoroethyl)trifluorophosphate anion, tetrafluoroborate anion, and tris(pentafluoroethyl)trifluoroborate anion. The condensed polycyclic aromatic compound is organic semiconductor compound.Ar1,Ar3=benzene ring having (un)substituted ring portion, or 2-5 condensed benzene rings having (un)substituted ring portion;Ar2,Ar12=benzene ring portion;or Ar2+Ar3=condensed ring;Ar4,Ar14=group of formula (i);A=group of formula: -CH2-C(=O)-CH2, -C(=O)-N(-R1)(-), -C(=O)-N(-OR2)(-), -CH2-CH2-, or group of formula (ii)-(v);R1,R2=optionally substituted 1-20C alkyl, 2-20C alkenyl, or 2-20C alkynyl;X1-X4=halo or cyano;R3=optionally substituted 1-20C alkyl, aralkyl, aryl, or cycloalkyl;andAr11,Ar13=benzene or heteroaromatic ring having optionally substituted ring portion.Ar1 and Ar4 condense 2 carbon atoms in the left side of ring; and Ar4 and Ar3 condense 2 carbon atoms in the right side of ring. Preferred Process: The precursor of ionic liquid solution is heated at 80-120 degrees C. The heating process is carried out by placing the droplet of ionic liquid in substrate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Naphthylene compound of formula (A) and leaving group-containing compound of formula: M-CC-L (B) are condensed, to obtain alkenyl group-containing compound (C). The obtained compound (C) is reacted with dihalo compound of formula: (X1)2, to obtain fused aromatic compound (D). The group (L) in the compound (D) is detached, to obtain dihaloaromatic compound (I).R2=optionally substituted alkyl;A=halo, or sulfonate group or phosphate group (both optionally substituted);E=sulfur, oxygen or selenium;L=-Si(R4)3, -C(R11)(OH)2 or -C(R12)3;R4=alkyl or aryl (both optionally substituted);R11=H, or alkyl or aryl (both optionally substituted);R12=optionally substituted alkyl;andM,M2=leaving group.Preferred Process: The dihaloaromatic compound (I) and leaving group-containing compound of formula: Rs-M2 are reacted, to obtain substituted aromatic compound (II). The dihaloaromatic compound (I) is reacted with alkenyl compound of formula: H-CC-R3, to obtain alkenyl group-containing aromatic compound of formula (E). The obtained compound (E) is reacted with hydrogen, to obtain aromatic compound of formula (F). The obtained compound (F) is reacted with halogenating agent, to obtain substituted aromatic compound of formula (G).R3=alkyl, trialkylsilyl, aryl or monovalent heteroaryl (all optionally substituted). EXAMPLE - 1 g (5,13-Diiodo-12-(trimethylsilyl)-3,11-dithiatetracyclo(7.7.0.02,6.010,14)hexadeca-1(9),2(6),4,7,10(14),12,15-heptaen-4-yl)trimethylsilane, 16 ml dry tetrahydrofuran, 4.7 ml tetrabutyl ammonium bifluoride tetrahydrofuran solution was dripped under ice bath, reacted, solid was filtered, washed with methanol and vacuum-dried, to obtain 0.57 g 5,13-diiodo-3,11-dithiatetracyclo(7.7.0.02,6.010,14)hexadeca-1(9),2(6),4,7,10(14),12,15-heptaene.
Preferred Definitions:    R = octyl, ethylhexyl, dodecyl or hexadecyl; and    Ar1 = thieno(3,2-b)thiophene, naphthalene or anthracene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of the titanium dioxide nanowire array layer is 1-20 mu m. Preferred Composition: The concentration of titanium ion in titanium dioxide nanowire array layer is 0.1-5%. The concentration of aqueous solution containing titanium compound is 0.001-0.5 mol/L.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The volume ratio of oxygen and phosphorus source gas in the diffusion furnace is 4:5:1. The phosphorus source gas is phosphorus oxychloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The N-type thin film semiconductor layer is made of trimethoxyboran or diborane.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The thin film solar cell is selected from one of silicon thin film solar cell, indium gallium arsenic phosphorus-junction and multi-section solar cell, and nitride series solar batteries.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The reducing gas comprises carbon monoxide, hydrogen, carbon dioxide, ozone and/or hydrogen sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The complex reducing agent is 5 wt.% of industrial grade phosphorus oxychloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The copper, indium, rare earth element and tellurium have purity of less than or equal to 99.9%. Preferred Process: Smelting in vacuum electric arc furnace is done at voltage of 220 V and current of less than or equal to 40 A. Ball milling is done for 6-14 hours at speed of 400-600 revolutions/minute.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The fluorescent dye is samarium, europium or terbium complex dye. The ligand of the complex is 2,4,6-tripyridyl-s-triazine or fluorescein. The electrolyte comprises iodine simple substance containing lithium iodide and 1,2-dimethyl-3-propylimidazolium iodide, 4-tert-butylphenol and guanidinium thiocyanate, and solvent containing acetonitrile.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkali washing solution is sodium hydroxide solution having concentration of 8%. The concentration of hydrofluoric acid and hydrochloric acid solution is 5-6% and 5%, respectively.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The nitric acid has concentration of 33-35%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkali is aqueous ammonia or sodium hydroxide. The acid is dilute sulfuric acid or dilute nitric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The etching step is done at 10-60 degrees C for 5-48 hours. The step of heating the mixture is done at 10-50 degrees C for 12-48 hours using centrifugal separation process. The catalyst carrier is placed in anode side of proton exchange membrane fuel cell using pore structure. Preferred Components: The mass concentration of the sodium hydroxide or hydrofluoric acid solution is 1-40%. The mole ratio of composite metal oxide to the silicon oxide is 0.01-1. The organic solvent is absolute ethyl alcohol. The molecular sieve is silicon oxide removing surfactant molecular sieve SBA-15 or KIT-6. The soluble tungsten precursor is silicotungstic acid.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The strain point temperature of glass plate is 560 degrees C. The thermal expansion coefficient of glass plate is 75-90x 10-7/ degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal silicide is selected from a group consisting of nickel silicide, cobalt silicide, chromium silicide, titanium silicide or iron silicide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first inorganic oxygen-containing compound is water, and the second inorganic oxygen-containing compound is oxygen.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The alkyl zinc compound is dimethyl zinc. The gaseous additive compound is acetyl acetone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of amount of sintered compact and sintering auxiliary agent is 0.01-0.1.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The second solution includes a polar organic solvent, N,N-dimethylformamide, N-methyl-2-pyrrolidone, tetrahydrofuran, ethylene glycol, and/or propylene carbonate. The second solution includes graphene oxide dispersed in dimethylformamide and/or chloroform. The first or second solution includes dextrose, polyethylene oxide and/or polyvinyl alcohol. The first solution includes hydrazine, alkyl hydrazine, toluene, dichloromethane, an alkyl borane, 9-borabicyclo(3.3.1)nonane, a hydroquinone, and/or a borohydride. The reducing agent includes chloroform, ethyl ether, ethyl acetate, toluene, hexane, and/or dichloromethane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The oxide is chosen from tin oxide, molybdenum trioxide, indium oxide, vanadium oxide, lead oxide, chromium oxide, manganese oxide, iron oxide, cobalt oxide, nickel oxide, copper oxide, zinc oxide, silicon dioxide, bismuth oxide, tungsten oxide, ruthenium oxide, titanium oxide, zirconium dioxide, neodymium oxide, cerium oxide, and lanthanum oxide, preferably tin oxide, molybdenum trioxide, and indium oxide. The platinum group metal is chosen from ruthenium, rhodium, palladium, osmium, iridium, and platinum or their alloys, preferably palladium or its alloy. Preferred Process: A platinum group metal, non-platinum group metal, or its alloy is attached to porous oxide support by reducing chemically or thermally a precursor of platinum group metal, non-platinum group metal, or its alloy onto the surface of porous oxide support and heat-treating the support on reductive atmosphere or inert atmosphere. Preferred Properties: The pores are spherical. The pores have diameter of 2-20 nm.
TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The gas barrier film consists of gas barrier layer (2a, 2b) and base film (1a, 1b). The gas barrier layer is adhered on both the surface of adhesive layer. The gas layer is formed by injecting ions into layer, and consists of polymeric silicon compound. The adhesive layer consists of acrylic adhesive having crosslinking agent, or urethane-type adhesive. The acrylic adhesive is acrylic-type copolymer having both the repeating units derived from acrylic-type monomer. The weight average molecular weight of acrylic-type copolymer is 100000-1000000. The thickness of adhesive layer is 0.5-100 mu m. The gas barrier film has water-vapor permeation rate of 0.00001-1 g/m2.day at 40 degrees C and 90% relative humidity.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: In the glass substrate, content of alumina, content of magnesium oxide, content of strontium oxide, content of calcium oxide and content of barium oxide is 11.5-16 wt.%, 0-2.5 wt.% (preferably 0-1.5 wt.%), 5.5-18 wt.% (preferably 7-15 wt.%), 4.5-8 wt.% and 0-4 wt.%, respectively. The weight ratio of sodium oxide and potassium oxide is 0.9-1.7, preferably 1-1.5. Preferred Properties: The glass substrate has glass transition temperature of 660-690 degrees C, average thermal expansion coefficient of 70x 10-7-95x 10-7/( degrees C), density of 2.6-2.8 g/cm3, temperature (T4) at which viscosity is 104 dPa.second of 1230 degrees C or less, and temperature (T2) at which viscosity is 102 dPa.second of 1620 degrees C or less. The difference in temperature (T4) and loss-of-clarity temperature (TL) is -30 degrees C or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The transition metal oxides (A) and (B) have BET specific surface area of 0.8-10 m2/g and 0.2-3.0 m2/g, respectively. The 50% passage particle size of transition metal oxides (A) and (B) are 20 mu m or less. The mass ratio of transition metal oxide (B) with respect to the sum of mass of (A) and (B) is 0.1-1.0 including 0.1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The method involves performing heat-removal process, holding process which holds the molten silicon within the casting container, stirring and forming silicon carbide adhesion layer having thickness of 20 mu m or more in the inner wall face of casting container. Preferred Composition: The high-purity silicon contains boron as dopant. The concentration of metal impurity in molten silicon is 1000 or less weight ppm. The concentration of carbon is 10x 1017 atoms/cm3 or less, measured by the Fourier transform infrared spectroscopy. The concentration of oxygen is 3x 1017 atoms/cm3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The catalytically active metal is chosen from platinum-type element, nickel and cobalt. The silicon is unevenly distributed in a surface of the cerium-zirconium-based oxide. The silicon source in the silicon-containing solution is tetraethyl orthosilicate. The solution (A) is aqueous ammonia.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The ratio of resin portion is 35-93 vol.% and the thickness of 100-200% of the thickness of fiber base material. Preferred Composition: The thermosetting resin composition comprises a liquid bisphenol-type epoxy resin, a solid-state polyfunctional epoxy resin having a softening point of 70 degrees C or less, an epoxy-resin curing agent, and 10-75 %mass inorganic filler. The mass ratio of liquid bisphenol-type epoxy resin and solid-state polyfunctional epoxy resin is 10/90-50/50. Preferred Condition: Heat-processing is carried out without pressurizing with respect to the coherently adhered component.    TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Material: The fiber base material consists of inorganic fiber base material and/or organic fiber base material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nitrogen fluoride bonding has structural unit of formula (I). The solid material is semiconductor material or insulator material. The semiconductor material is chosen from silicon, germanium, silicon carbide, silicon germanium, gallium arsenide, gallium aluminum-arsenide, indium phosphorus, indium antimonide, gallium nitride and aluminum nitride.X-=conjugate base of Broensted acid.Preferred Process: The voltage is applied between the material and the solid material, which is -200 V to 200 V.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic compound having nitrogen fluoride bonding is a compound of formula (II).R1+R2,R2+R3,R3+R4,R4+R5=-CR6=CR7-CR8=CR9-;andR1-R9=H, nitro, cyano, carbamoyl, halo, hydroxy, 1-5C alkoxy, 6-10C aryloxy, 1-15C alkyl optionally substituted by 1-5C acyl, 1-5C acyloxy or 6-10C aryl, or 1-15C alkenyl, 1-15C alkynyl, 2-15C alkoxycarbonyl, 1-15C alkylsulfonyl, 1-15C alkyl sulfinyl, 1-15C alkoxy or 1-15C alkane sulfonyloxy (all optionally substituted by halo or 6-10C aryl), 6-15C arylsulfonyloxy optionally substituted by halo or 1-5C alkyl, carbamoyl optionally substituted by 1-5C alkyl or 6-10C aryl, or 6-15C N-alkyl pyridinium base or 11-15C N-aryl pyridinium base (all optionally substituted by halo, 6-10C aryl or 1-5C alkyl), 1-15C acyl optionally substituted by halo, or 6-15C aryl, 7-15C aryloxy carbonyl, 6-15C arylsulfonyl, 6-15C aryl sulfinyl or 6-15C aryloxy (all optionally substituted by halo or 1-5C alkyl), amino group optionally substituted by 1-5C acyl or halo, or organic polymer chain, in which R1-R9 are combined to form ring structure optionally through hetero atom.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The metallic compound particles are colloidal silica particles, polyorganosiloxane particles or polyorgano silsesquioxane particles. The colloidal silica particles have strand shape or shape of bead string.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The glass is glass fiber, glass tissue, or nonwoven glass fabric, and has diameters of 50 nm to 20 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The alkyl of norbornene polymer is butyl, hexyl, or decyl.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The cellulose is cellulose fiber refined by at least one of chemical preparation and mechanical treatment of cellulose raw material, and has fiber diameter of 4-1000 nm. The hydroxyl groups of cellulose are substituted by aldehyde group or carboxyl group. The fibrous filler is cellulose or glass. The resin is water-soluble resin, thermoplastic resin, and/or curable resin, preferably copolymer of polyethyleneglycol, polyethyleneglycol diacrylate, polyethyleneglycol dimethacrylate, acrylic ester, acrylic ester, acrylate, polyvinyl alcohol and cross-linkable polyvinyl alcohol, and alkyl norbornene polymer. Preferred Properties: The composite material composition has linear expansion coefficient of 4-50 ppm, and total light transmittance of 60% or more measured at wavelength of 400-700 nm and thickness of 50 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The silicon small particles are pulverized using bead mill, ball mill, and jet mill. The silicon small particles are surface-treated using hydrofluoric acid before dispersing in solvent.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The tin sulfide precursor comprises tin compound of formula (I)-(IV). The tin sulfide precursor has asymmetric structure.R1-R14=H or 1-4C alkyl;andn=1-4.Preferred Property: The tin-sulfide thin film has thickness of 0.1-50 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The selenium and copper are added to mixture of copper, zinc sulfide, tin and sulfur. The crystallization of mixture of copper, zinc sulfide, tin and sulfur is carried out in ampule. Preferred Component: The ampule is carbon-coated quartz ampule.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal oxide is a copper oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The thiol is an alkyl thiol (preferably a fluorinated alkyl thiol). The surface modifying layer includes a silane on a surface of the nanostructures; and a fluorinated polymer. The silane is an alkyl silane (preferably a fluorinated alkyl silane).
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The elongated thermoplastic resin film comprises an olefin resin. The ion-exchange resin is formed by polymerizing a polymeric composition containing a monomer having an ion-exchange group or a functional group which introduces an ion-exchange group. The transparent line is extended in width direction central portion. The total light transmittance of the portion in which the transparent line is formed is 40% or more. The thickness (d) of the part in which the transparent line is formed is 100-200% of the thickness of another portion. The width (w) of the transparent line is 1-20 mm. The edge portion of two or more sheets of the thermoplastic porous film is overlapped, and the transparent line heat-welds the overlapped portion.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The component (C) is organic peroxide.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The component (B) is copolymer of ethylene-1-octene.
TECHNOLOGY FOCUS - POLYMERS - Preparation (disclosed): Tetracarboxylic dianhydride and diamine are dissolved in an organic solvent and imidation reaction is carried out in the presence of an acidic catalyst, to obtain polyimide. Preferred Properties: The printing ink composition has viscosity of 100-50000 mPa.second at 25 degrees C, and thixotropy coefficient of 1.5-10. Preferred Method: The polyimide membrane is formed by screen printing method, inkjet method or dispensing method. Preferred Definitions:    Ar1=group of formula (i);    E=single bond, -CC-, -O-, -C(CH3)2- or -C(CF3)2-, preferably -CC-;    Ar2=group of formulae (ii)-(iv);    W'=-C(CH3)2- or -C(CF3)2-;    X=-CC-, -C(=O)-, -SO2-, -O-, -S-, -(CH2)a-, -NHCO-, -C(CH3)2-, -C(CF3)2-, -C(=O)O- or single bond;    a=1-5;    R1,R2=H, hydroxy, carboxy, 1-4C alkyl, phenyl, F, Cl, or Br;    p1-p5=1-4;    Y',Z=X (excluding -CC-);and    R3-R5=H, hydroxy, carboxy, 1-4C alkyl, phenyl, F, Cl or Br, in which at least one of R3-R5 is 1-4C alkyl.    EXAMPLE - 12.73 g 4,4-(1,2-ethynyl)bis-phthalic acid anhydride, 9.29 g bisaniline-M, 8.21 g 2,2-bis(4-(4-amino phenoxy)phenyl)propane, 0.4 g gamma -valerolactone, 0.63 g pyridine, 77.7 g ( gamma )-butyrolactone, 77.7 g methyl benzoate and 28 g toluene were stirred at room temperature for 30 minutes with speed of 180 rpm under nitrogen atmosphere, heated at 180 degrees C for 3 hours and azeotropically distilled portion of toluene-water was remove during reaction, to obtain 28% polyimide solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The swelling mica is synthetic fluoro-mica.    TECHNOLOGY FOCUS - POLYMERS - Preferred Copolymer: The vinyl acetate content of the copolymer is 5-50 wt.%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The compound (1) is preferably of formula (4) or (5).E3,E4=alicyclic epoxy group, preferably epoxy cyclohexyl;andn=1-4. Preferred Definitions:    Ar=benzene ring;and    l+n=6.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkaline catalyst is chosen from potassium carbonate, sodium carbonate, sodium hydroxide, potassium hydroxide and sodium hydride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The trimethoxybenzenethiol derivative (I) is 3,4,5-trimethoxy-1-((3-amino-4-nitrophenyl)thio)benzene, 3,4,5-trimethoxy-1-((3-acetamido-4-nitrophenyl)thio)benzene, 3,4,5-trimethoxy-1-((3-nitro-4-methoxyphenyl)thio)benzene, 3,4,5-trimethoxy-1-((3-amino-4-methoxyphenyl)thio)benzene, 3,4,5-trimethoxy-l-((3-fluoro-4-methoxyphenyl)thio)benzene, 3,4,5-dimethoxy-1-((4-ethoxyphenyl)thio)benzene, 3,4,5-dimethoxy-1-((3-benzyloxy-4-methoxyphenyl)thio)benzene, 3-((3,4,5-trimethoxyphenyl)thio)benzothiophene-2-methyl formate, 2-fluorenyl methoxy-carboxamido-3-acetoxy-N-(2-methoxy-5-(3,4,5-trimethoxyphenyl)thio)propionamide, 2-amino-3-hydroxy-N-(2-methoxy-5-(3,4,5-trimethoxyphenyl)thio)-propionamide, or 3,4,5-dimethoxy-1-((3-hydroxyl-4-phenyl)thio)benzene. Preferred Process: Reduction reaction is carried out using reducing agent which is chosen from acetic acid, hydrochloric acid, palladium carbon/hydrazine hydrate, magnesium powder/hydrazine hydrate, iron powder/hydrazine hydrate and palladium carbon/hydrogen. Diazotization reaction is carried out using diazotization reagent which is chosen from sodium nitrite, potassium nitrite, succinic acid, hydrochloric acid, sulfuric acid, phosphoric acid and acetic acid. Preferred Composition: The iodination reaction is carried out using solvent which is chosen from ethanol, methanol, isopropyl alcohol, ethylene glycol, benzene, toluene, acetone, tetrahydrofuran, dioxane, N,N-dimethyl formamide, pyridine, dimethyl sulfoxide, and methylene.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Arrangement: The organic electric device has organic layer(s) containing compound (I), laminated between electrodes (I,II). The organic layer is formed by solution process. The organic layer is light-emitting layer, hole injection layer, or hole transport layer. SPECIFIC COMPOUNDS - 240 Compounds (I) are specifically claimed e.g. (4-carbazol-9-yl-phenyl)-phenyl-(4-(9-phenyl-9H-carbazol-3-yl)-phenyl)-amine of formula (IA), (4-carbazol-9-yl-phenyl)-naphthalen-1-yl-(4-(9-phenyl-9H-carbazol-3-yl)-phenyl)-amine, (4-carbazol-9-yl-phenyl)-naphthalen-2-yl-(4-(9-phenyl-9H-carbazol-3-yl)-phenyl)-amine, biphenyl-4-yl-(4-carbazol-9-yl-phenyl)-(4-(9-phenyl-9H-carbazol-3-yl)-phenyl)-amine, and (4-carbazol-9-yl-phenyl)-(4-(9-phenyl-9H-carbazol-3-yl)-phenyl)-(5-phenyl-thiophen-2-yl)-amine.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Bromine containing-compound of formula (II) is reacted with N-(9,9-dimethyl-9H-fluorene-2-yl)-9,9-dimethyl-N-(4-(4,4,5,5-tetramethyl-1,3,2-dioxoborolane-2-yl)phenyl)-9H-fluorene-2-amine in presence of bis(triphenylphosphine)palladium(II) dichloride and sodium carbonate-dimethoxyethane-water to obtain nitrogen-containing compound of formula (III). The compound (III) is reacted with cyanoacetic acid, piperidine and methyl cyanide to obtain dithiophene compound of formula (I). Preferred Definitions:    Ar'=N-(9,9-dimethyl-9H-fluorene-2-yl).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: A semiconductor layer (24i) is formed, after removing p-type-semiconductor layer. Preferred Composition: The concentration of boron in semiconductor layer (24i) is less than the concentration of boron in semiconductor layer (r2).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The starting material of the amorphous silicon is chosen from cyclopentasilane and cyclohexasilane. Preferred Property: The microcrystal silicon has transmittance of 20% or less at wavelength of 589 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: During formation of silicon small particles, silicon small particles having particle size of 100 nm or less which is obtained by pulverizing silicon saw dust by bead mill method, ball mill method, jet mill method and/or shock wave pulverizing method is dispersed in hydrofluoric acid, and light-irradiated.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent is chosen from alcohol, glycol, ester, ketone, and amine. The solvent polarity is 40-55 kcal/mol. The coloring agent contains self-dispersion type pigment dispersed in water. The inkjet composition further contains 0.05-3.05 wt.% surfactant chosen from carboxylate of polyoxyethylene alkyl ether, sulfate, phosphate or sulfosuccinate. The composition further contains 0.5-20 wt.% bis-hydroxy ethyl sulfone, 0.05-2.0 wt% ethylene oxide adducts of 2,4,7,9-tetramethyl-5-decyn-4,7-diol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The dopant is a transition metal, preferably titanium and/or manganese. The amount of dopant is 0.5-12 mole%, preferably 2-7 mole%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The reaction in the step (b1) is carried out in an aerosol reactor. The reaction in the step (b1) is a flame spray pyrolysis. The step (b2) is a plasma reaction. Preferred Components: The liquid is flammable and comprises toluene and xylene. EXAMPLE - Typical doped delta -bismuth oxide comprised of: 2.5 mole% titanium, 2.5 mole% manganese and 95 mole% bismuth.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The three-dimensional photonic crystal element or each of the three-dimensional photonic crystal elements comprises undoped silicon. The substrate comprises undoped silicon. The oriented graphene flakes are oriented in a direction normal to the three-dimensional photonic crystal element. The oriented graphene flakes are contained within a composite thin film, where the composite thin film comprises graphite oxide and linear monodisperse polystyrene. The three-dimensional photonic crystal element is coated with oriented graphene flakes.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The optical component is a waveguide. The system (S1) further comprises at least one photonic component contained between the three dimensional photonic crystal elements. The photonic component comprises a waveguide, modulator, sensor, or filter. The oriented graphene flakes are oriented in a direction normal to the respective three-dimensional photonic crystal element.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The coating solution has 50-90 wt.% solvent with dielectric constant of 10 or more. The solvent is chosen from alcohol, ethers, ester, ketones, amides, carbonates, aldehyde, glycols and/or carboxylic acid. The coating liquid further contains more than 0.001% and less than 1% water as solvent, more than 0.1 wt.% and less than 10 wt.% organic semiconductor material and more than 0.01 wt.% and less than 5 wt.% acid or ionic substances. Preferred Property: The coating liquid has viscosity of more than 0.5 mPa.second and less than 10 mPa.second and surface tension of 20-40 mN/m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The translucent porous electron transport material is selected from any one of titanium dioxide, tungsten trioxide, Zinc oxide, niobium pentoxide and strontium titanate. The translucent conductive layer is selected from any one of fluorine dope tin oxide, indium-tin oxide, gallium dope zinc oxide, aluminum dope zinc oxide and niobium dope titanium oxide. A positive hole transport layer is selected from any one of selenium, iodide, cobalt complex, iron complex, Copper(I) thiocyanate, molybdenum trioxide and nickel oxide.    TECHNOLOGY FOCUS - METALLURGY - The electrode layer is selected from any one of metal such as carbon, gold, tungsten, molybdenum and titanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The titanium oxide (II) is stored under vacuum or inert gas atmosphere containing nitrogen, argon, helium and/or carbon dioxide, after opening. The reducing environment for manufacturing sintered oxide is hydrogen atmosphere.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The raw material powder contains component (A) containing zinc oxide powder, titanium oxide powder and mixed powder chosen from gallium oxide and aluminum oxide, and component (B) containing zinc hydroxide powder, titanium oxide powder and mixed powder chosen from gallium oxide and aluminum oxide. The sintering process is carried out under atmosphere containing nitrogen, argon, helium and/or carbon dioxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The annealing step is performed at a temperature of 400-550 degrees C in chalcogenide atmosphere, and is performed in single step. The method further comprises injecting reducing agent, acid and amine into copper nanoparticles to form copper-based nanoparticles precursor and acid and amine-containing copper precursor. Preferred Components: The 12 group element is zinc. The 13th group element is indium and gallium. The 14th group element is tin, sulfur and selenium. The mole ratio of ink and copper is 1:0.7 to 1.2. The chalcogenide compound particle includes metal compounds of formulae: ((InxGa1-x)4(SySe1-y)3), ((InxGa1-x)(SySe1-y)), ((InxGa1-x)6(SySe1-y)7), ((InxGa1-x)9(SySe1-y)11), ((InxGa1-x)2(SySe1-y)3) and ((InxGa1-x)5(SySe1-y)7); Sn(SySe1-y), Sn2(SySe1-y)3 and Sn(SySe1-y)2; or (Zn(SySe1-y)).x, y = 0-1. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hydroxyl group-containing compound (I) is 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane.    TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The polyarylate resin has acid value of 7 equivalents/ton or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of acicular titanium oxide is 40-90 parts mass with respect to 100 parts mass of carboxyl group-containing photosensitive resin. Preferred Properties: The acicular titanium oxide has aspect-ratio of 10-30 and long axes of 1-10 mu m.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The stainless material contains 0.0001-0.15 %mass carbon, 0.001-4 %mass silicon, 0.001-2.5 %mass manganese, 0.001-0.045 %mass phosphorus, 0.0005-0.03 %mass sulfur, 6.0-28 %mass nickel, 15-26 %mass chromium, 0-7 %mass molybdenum, 0-3.5 %mass copper, 0-1 %mass niobium, 0-1 %mass titanium, :0-0.1 %mass aluminum, 0-0.3 %mass nitrogen, 0-0.01 %mass boron, 0-0.5 %mass vanadium, 0-0.3 %mass tungsten, 0-0.1 %mass mixture of calcium, magnesium, yttrium and rare earth metal, and remainder of iron and unavoidable impurities.
TECHNOLOGY FOCUS - METALLURGY - The selenium-alloy layer is selected from a group consisting of selenium-Germanium alloy, selenium-lead alloy, selenium-iron alloy, selenium-nickel alloy, selenium-copper alloy, selenium-platinum alloy, selenium-indium alloy, selenium-Palladium alloy, selenium-gallium alloy, selenium-silver alloy, selenium-titanium alloy, selenium-chromium alloy and selenium-zinc alloy. The sources are made by sodium salt and pure selenium. The sources are made of sodium-bearing material or selenium-bearing material. The stack of films is copper-bearing films, gallium-bearing films and indium-bearing films.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The semiconductor quantum dot is I group element, III group element and VI group element containing copper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The light-absorption layer comprises copper-indium-gallium selenide. The electrolyte solution used for forming light-absorption layer comprises copper(II) chloride, indium chloride, selenous acid, and gallium trichloride. The supporting electrolyte comprises lithium chloride. The buffer solution included in the electrolyte solution contains potassium diphthalate and has a pH of 2.5-3.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The layer (12) has layer (a) and layer (b) having elastic modulus different from each other. The layer (11) and layer (12) of cation exchange membrane are laminated. The cation exchange membrane has reinforced-core material and tubular communicating hole provided inside of film main component. Preferred Properties: The elastic modulus (e1) of layer (11) is 1000-1550 kgf/mm2. The elastic modulus (e2a) of layer (a) of layer (12) is 650-800 kgf/mm2, and the elastic modulus (e2b) of layer (b) of layer (12) is 600-750 kgf/mm2. The thickness (D1) of layer (11) is 10-30 mu m. The thickness (D2a) of layer (12) is 70-130 mu m, and the thickness (D2b) of layer (12) is 15-55 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The salt of metallic element is metal halide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The alkali-metal amide is of formula: N(-M2)(-R9)(-R10) (III).R9,R10=silyl or hydrocarbyl (both optionally substituted);andM2=alkali-metal atom.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The atomic ratio of metal elements in metal precursor salt and coordination compound in step (ii) is 1:1.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The polyol in step (i) is ethylene glycol, propylene glycol, glycerol, 1,3-butylene glycol or pentaerythritol. The polar solvent is benzene, toluene, xylene, carbon disulfide, ethyl ether and chloroform.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The peroxide is dialkyl peroxide, diacyl peroxide or peroxy ester. The crosslinking agent is triallyl isocyanurate, triallyl cyanurate or N,N'-metaphenylene bismaleimide. The unsaturated sulfonate metal salt is vinyl benzene sulfonate and/or sodium vinyl sulfonate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer matrix material is chosen from ethylene-octylene copolymer, styrene-butadiene-styrene block copolymer or polythene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises: before the applying the third load to the stack of the fuel cell, repeating (S5) the discontinuing the supply of the gas mixture and the resupplying of the gas mixture to the cathode; supplying (S7) only air to the cathode after the applying the third load to the stack of the fuel cell; and after the applying the third load to the stack of the fuel cell, repeating the applying the second load to the stack of the fuel cell, the discontinuing the supply of the gas mixture, the resupplying the gas mixture to the cathode when the voltage of the stack of the fuel cell is the predetermined voltage or less after the discontinuing the supply of the gas mixture, and the applying the third load to the stack of the fuel cell. The predetermined first load is less than or equal to 25% of a rated load of the stack of the fuel cell. The fuel gas is supplied from the anode or a fuel reformer. The discontinuing the supply of the gas mixture comprises: applying a pressurized air to the cathode; and discontinuing the supply of the gas mixture in a state where an internal pressure is maintained higher level than an atmospheric pressure by adjusting an outlet pressure of the cathode. The gas mixture is resupplied to the cathode when the voltage of the stack of the fuel cell is 0.1-0.4 volts, where the gas mixture comprises air and a fuel gas. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The second sub-cell consists of gallium indium arsenide (GaInAs), gallium indium arsenide phosphide (GaInAsP), aluminum gallium indium arsenide (AlGaInAs) and gallium arsenide antimonide (GaAsSb). The metamorphic buffer layer consists of gallium indium arsenide (GaInAs), aluminum gallium indium arsenide (AlGaInAs), gallium indium phosphide (GaInP), aluminum gallium indium phosphide (AlGaInP), gallium arsenide antimonide (GaAsSb), aluminum arsenide antimonide (AlAsSb), gallium phosphide antimonide (GaPSb) and aluminum phosphide antimonide (AlPSb). The sub-cell consists of gallium arsenide (GaAs) gallium indium arsenide (GaInAs), aluminum gallium indium arsenide (AlGaInAs), gallium indium phosphide (GaInP), aluminum gallium arsenide (AlGaAs) or aluminum gallium indium phosphide (AlGaInP).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Arrangements: The semiconductor thin film further has crystalline silicon thin film arranged in contact with crystalline germanium thin film. Preferred Composition: The base layer comprises nickel, platinum, cobalt, or palladium. The thin metal film comprises nickel, platinum, cobalt or palladium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The dialkyl amine is dibutyl amine, preferably di-n-butylamine. The content of dialkyl amine is 10-30 mol% with respect to the total amount of the octyl amine and dialkyl amine. The content of copper compound is 0.01-1 mol with respect to 1 mol of total amount of the octyl amine and dialkyl amine.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The weight ratio of linear 2-6C sulfone (S1) and sulfolane (SL) is 60:40-95:5. The linear 2-6C sulfone (S1) is dimethyl sulfone and/or ethylmethyl sulfone.
TECHNOLOGY FOCUS - METALLURGY - The inclusions contain metals selected from iron, chromium, nickel, silicon, aluminum, cobalt, or the oxides of these metals.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The mass ratio of potassium oxide and sodium oxide is 0-0.2. The glass composition further contains 0.01-6 %mass tin oxide.
TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The (meth)acrylic acid ester is monofunctional unsaturated (meth)acrylic acid ester and poly(meth)acrylic acid ester contains monofunctional unsaturated (meth)acrylic acid ester as structural unit.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content component (B) is 10-200 parts mass with respect to 100 parts mass component (A). The component (C) is linear siloxane compound of formula (iv). The component (F) is alumina.R13,R32=2-6C alkenyl, 1-6C alkyl, 2-10C epoxy group or trimethylsilyl;R14-R17,R21,R25,R29-R31=H or 1-6C alkyl;R18-R20=phenyl;R22-R24=2-6C alkenyl;R26-R28=2-10C epoxy group;p,q,r,v,w,x,y=0-3000;andor p+q+r+v+w+x+y=1 or more.(i) when R13,R32=1-6C alkyl, then v is 1 or v+w is 2 or more; (ii) when R14-R17,R21,R25,R29-R31 is H, then v,w are 1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Layer: The concentration of the carbon atom of the concentration layer of primary layer is less with respect to concentration of the carbon atom of 300-nm-deep primary layer from the interface of primary layer and secondary layer is 40% or more. The laminate has average surface roughness of 1 nm or less. The primary layer further contains a metallic compound having metallic element chosen from titanium, zirconium, aluminum, silicon, germanium, indium, tin, tantalum, zinc, tungsten and lead. The metal oxide thin film contains metallic element chosen from titanium, zirconium, aluminum, silicon, germanium, indium, tin, tantalum, zinc, tungsten and lead, preferably titanium and zirconium. The metal oxide thin film has refractive index of 1.6-2.1. The metal oxide thin film is an amorphous titanium oxide thin film. The metal oxide thin film is formed using thin film forming composition obtained by adding water of predetermined amount and metallic compound having hydrolysable group and/or hydroxyl group, to organic solvent solution containing at least 1 type chosen from metal chelate compound having a hydrolysable group and/or a hydroxyl group, metal organic acid salt, and their partial-hydrolyzed product. The thin film laminate has a tertiary layer whose refractive index is lesser than secondary layer and having thickness of 200 nm or less, on metal oxide thin film. The tertiary layer is a thin film containing silicon dioxide made of sol gel process. The gas barrier film is a thin film consisting of metal oxide, metal nitride and metal carbide of metallic element chosen from titanium, zirconium, aluminum, silicon, germanium, indium, tin, tantalum, zinc, tungsten, lead, or their composite. The laminate has water-vapor permeability of 1x 10-1 g/m2.day or less, preferably 1x 10-2 g/m2.day or less. Electromagnetic waves are irradiated after formation of secondary layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The vinyl-containing silicon resin is of formula: (R1R2R3SiO0.5)a(SiO2)b. The vinyl silicone oil is formula: R1R2R3SiO(R2R3SiO)c(R1R2SiO)dSiR3R2R1. The epoxy-containing tackifier is of formula: (H2R24R42SiO)3-6. The hydroxyl-containing silicon oil is of formula: R2R3R5SiO(R2R3SiO)e(R5R2SiO)fSiR5R3R2. The platinum complex catalyst is vinyl group-containing platinum complex catalyst prepared using 1-2 pts. wt. hydrated platinum compound, 30-50 pts. wt. siloxane (II) and 100-150 pts. wt. absolute ethyl alcohol. The addition reaction inhibiting agent is methyl butynol or ethynyl cyclohexanol.a=1.2-3;b=1-2;e=30-40;c=40-50;d=5-10;andf=10-20.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The perylene bisimide derivative is symmetrical pentadecylphenyl perylene bisimide or unsymmetrical pentadecylphenyl perylene bisimide. The unsymmetrical pentadecylphenyl perylene bisimide is ethyl-hexyl pentadecylphenyl perylene bisimide or alkyl or aryl methacrylate derivative of the pentadecylphenyl perylene bisimide. The perylene bisimide possesses linear or branched 6-20C alkyl chain at one end and the other end is an amino pyridine group. The OPV is unsymmetrical OPV with a hydrogen bonding group comprising hydroxy, carboxy at one or and a polymerizable group comprising acrylate or methacrylate group at the other end. The solvent is chloroform, dichloromethane, dimethylformamide or tetrahydrofuran. The photoinitiator is 2,2-diethoxyacetophenone. Mol ratio of perylene bisimide derivative and poly-4-vinyl pyridine or OPV is 1:0.25-1:1. Size of self-organized crosslinked perylene bisimide nanostructures is 5-15 nm. EXAMPLE - 2.8 mg N-(4-((E)-2-(4-((E)-2-(4-Hydroxy-phenyl)-vinyl)-phenyl)-vinyl)-benzyl)-2-methyl-acrylamide as oligophenylene vinylene (OPV) and 5.3 mg 2-(2-octyl-dodecyl)-9-pyridin-4-yl-anthra(2,1,9-def;6,5,10-d'e'f')diisoquinoline-1,3,8,10-tetraone as unsymmetrical octyl dodesyl aminopyridine (UODAp-PBI) were dried at 60 degrees C in vacuum oven for 2 days and stored in vacuum desiccator. UODAp-PBI and OPV were first dissolved in dimethylformamide (DMF) at 90 degrees C until a clear solution was obtained followed by two days stirring at 65 degrees C. DMF was then evaporated inside the vacuum desiccator at room temperature. The complexes were then dried at 60 degrees C in vacuum oven to remove traces of DMF and stored in desiccator. To the NMR tube containing complex (5 mg) in 1 ml deuterated chloroform, 5 wt.% 2,2-diethbxy acetophenone was added to give polymerized poly-4-vinyl pyridine-UODAp complex.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The coating membrane contains silicon, silicon carbide, titanium carbide, calcium carbide or chromium composite carbide. The coating membrane has an outer layer containing silicon, and an inner layer containing silicon carbide. The silicon carbide of the inner layer, and silicon of outer layer are reacted with carbon nanotube.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The passivation layer is made of aluminum oxide, silicon oxide, silicon nitride, aluminum nitride, silicon carbide or silicon oxynitride.    TECHNOLOGY FOCUS - METALLURGY - The dopant is selected from a group consisting of boron, phosphorus, gallium, arsenic or indium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: Liquid for dissolving thin film material in solvent is supersaturated solution having diamagnetic anisotropy. The thin film material is an organic material including fused polycyclic hydrogen-type organic substance, preferably chosen from 36 compounds e.g. pentalene, indene, naphthalene, azulene and heptalene. The thin film is semiconductor layer of thin-film transistor.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The reactant fuel material includes a stabilized alkali metal or one of sodium silicide or sodium silica gel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The aluminum-type plating layer comprises composition containing 3-15 %mass silicon, 0-0.2 %mass strontium, 0-0.1 %mass sodium, 0-0.1 %mass calcium, 0-0.6 %mass antimony, 0-0.2 %mass phosphorus, 0-5 %mass magnesium, 0-1 %mass chromium, 0-2 %mass manganese, 0-0.5 %mass titanium, 0-0.5 %mass zirconium, 0-0.5 %mass vanadium, 0-0.10 %mass boron, and remainder of aluminum and unavoidable impurities. The copper-indium selenide solar cell further has alkali metal-containing material layer (21) containing alkali silicate coating composition (M2O.nSiO2, where M is lithium, sodium or potassium, and n is 3-5). The fusion aluminum-type plating bath used during manufacture of copper-indium selenide solar cell contains composition containing aluminum-type plating layer composition.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The base-material steel plate (1) contains 0.002-0.020 %mass nitrogen. Preferred Process: An aluminum nitride is deposited between base material steel sheet and an aluminum-iron-silicon-type alloy layer (2), during heat processing of manufacture of copper-indium selenide solar cell.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The thickness of the inorganic film is less than 200 nm. The inorganic film contains a material selected from metal, metal oxide, metal nitride, metal carbide, metal fluoride, and composites of the metal, metal oxide, metal nitride, metal carbide, and metal fluoride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic film contains one of radiation-curing monomer and oligomer.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The Young's modulus of the second laminate film is less than Young's modulus of the first laminate film. The adhesion between the second laminate film and the top layer is 0.02-1 (N/25 mm), and the adhesion between the first laminate film and the substrate is 0.03-1.5 (N/25 mm). The center line average roughness of the second laminate film is 5-50 nm, and center line average roughness of the first laminate film is 5-80 nm. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Conditions: The flaky graphite powder is arranged vertically with application of magnetic field with a current magnetic flux density of 12.8-14 Gauss, a magnetic field coercive force of 12-14.9 KOe, a BH(max) of 20-40 MGOe, and a magnetic field density of 7-8. The composition is coated by dip coating, spin coating, and/or spray coating.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The average diameter of flaky graphite powder is 1-100 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The diluent is ketone, ester, alcohol, and/or aromatic hydrocarbon.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The weight ratio of flaky graphite powder and lacquer resin is 5-30:100. The weight ratio of flaky graphite powder and diluent is 20-110:100. The lacquer resin comprises nitrocellulose alkyd resin.
TECHNOLOGY FOCUS - POLYMERS - The coating material is resin or rubber.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate is gallium arsenide and germanium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The film forming composition has fluidity at normal temperature. The bivalent group-containing compound (Q) has number average molecular weight of 1000 or more based on polystyrene conversion measured by gel permeation chromatography. Preferred Composition: A compound having aromatic group-containing structural unit of formula: -(Ar)h-(Ar?a((CR12)b(-G-(CR12)j)k-Oe-Rx)i)m (II), in which the compound (Q) is contained in a principal chain.Ar=aryl optionally having (m+2) valent hetero atom;Ar'=aryl optionally having hetero atom of valence (i+1);Rx=H, 1-10C alkyl or cycloalkyl;a,b=0-5;e=0 or 1;h=3 or more;i=1-5;andm=1-10.When a is 0 and i is 1, Rx and R1 optionally forms single bond or alkylene unitedly.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of water, base, alkyl sulfonic acid anion (I), and aliphatic carboxylic acid anion (II) is 100 parts mass, 0.3-15 parts mass, 0.001-10 parts mass and 0.001-0.1 parts mass, respectively. Preferred Condition: The composition and silicon substrate surface are contacted at 50-100 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal cation (b1) is cation of metallic elements chosen from iron, tin and aluminum. The acid radical anion (b2) is sulfate radical anion, phosphate radical anion or nitrate radical anion. Preferred Properties: The metal-oxide nanosheet has thickness of 5-150 nm, size of 1 mu m to 5 mm along two-dimensional direction, and precise plate-shaped structure.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyamine skeleton-containing polymer is polyethylene imine.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The pyrromethene compound (I) is 2,2-difluoro-5,11-bis(2-methoxyphenyl)-8-phenyl-1,3-diaza-2-boratricyclo(7.3.0.03,7)dodeca-1(12),4,6,8,10-pentaene or 2,2-difluoro-8-phenyl-5-(5-(thiophen-2-yl)thiophen-2-yl)-1,3-diaza-2-boratricyclo(7.3.0.03,7)dodeca-1(12),4,6,8,10-pentaene. Preferred Composition: The organic thin-film solar cell has organic thin film layer chosen from p layers, i layers and n layers. The p layer and/or i layer contains pyrromethene compound (I). The n layer and/or i layer contain fullerene or its derivatives. Preferred Definitions:    X=fluoro.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The gas barrier layer has a surface layer (11) having thickness of 10-30 nm and containing silicon, oxygen and/or nitrogen. The content of carbon, silicon, oxygen and nitrogen is 15-30 mol%, 15-30 mol%, 45-70 mol% and 1.5-4 mol%, respectively. The gas barrier layer has elasticity modulus of 1-2.5 GPa.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The hydroxyl-containing polymer is polyvinyl alcohol, polyvinyl formal, polyvinyl butyral and/or ethylene-vinyl alcohol copolymer. The carboxyl group-containing polymer is ethylene-(meth)acrylic acid copolymer. The content of polar polymer is 1-50 wt.%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The metallic impurity is fired from unidirectional solidification refinement. Phosphorus and boron is removed in molten silicon using steam plasma torch.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic particles having a refractive index of less than 2.0, which are contained in polyester layer (B), are barium sulfate particles.    TECHNOLOGY FOCUS - POLYMERS - Preferred Film: The white laminated polyester film for a reflecting sheet comprises, on at least one surface, a coating layer that can absorb ultraviolet rays. Preferred Components: The thickness of the polyester layer (A) is 5 to 10 mu m, and further that of the polyester layer (B) is 200 to 400 mu m. The resin which is not soluble in polyester resin, which is contained in the polyester layer (B), is a polymethylpentene. The average particle size of the polymethylpentene in the polyester layer (B) is less than or equal to 3 mu m in the width direction and is less than or equal to 2 mu m in the thickness direction. The polyester layer (A) contains in it, a light resistant agent in an amount of 0.05 to 10 wt.% of the polyester layer (A). The polyester layer (A) side is used as a light reflecting surface. The copolymerized resin of polyalkylene glycol and a polyester resin made from 2-6C aliphatic diol component and terephthalic acid is a block copolymer of polyethylene glycol and polybutylene terephthalate. The light reflecting surface of the rear reflecting sheet is in the polyester layer (A) side of the film. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Compounds: The electronic or optoelectronic device comprises a first electrode, a second electrode and an active layer between the first and second electrode, where the active layer comprises the non-polymeric compound. In the electronic or optoelectronic device, one electrode is transparent. The electronic or optoelectronic device further comprises: an electron-blocking, exciton-blocking, or hole-transporting layer; a hole-blocking, exciton-blocking, or electron-transporting layer; a dielectric layer; and a third electrode. The active layer further comprises an electron acceptor i.e. a fullerene. The electron acceptor is a fullerene. The electronic or optoelectronic device further comprises a hole transporting layer between the first electrode and the active layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises contacting an electrophilic R9 donor with substituted azole groups of formula (B).X2, Y2 = N or C-R9a, provided that one of X2 and Y2 is N, and other is C-R9a; andR9a = H.Preferred Components: (A) are pyridothiadiazole group, pyridooxadizaole group, or pyridotriazole group. SPECIFIC COMPOUNDS - 2 Compounds (I) are specifically claimed i.e. azole compounds of formulae (Ia) and (Ib).    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The binder precursor is monoalkyl trialkoxysilane, dialkyl di-alkoxysilane, trialkyl monoalkoxy silane, monoallyl trialkoxysilane, diaryl dialkoxysilane or triaryl monoalkoxy silane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The porous carbon material has mesoporous structure of graphite, graphene, fullerene, glassy carbon or carbon nanotube and carbon nanohorn.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The nano fine particles contain phenyl azomethine dendrimer metal complex of formula (II).M=platinum compound or platinum compound and dissimilar-metal compound having transition metal different from platinum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further involves adding catalysts to the reactor to facilitate the formation of hydrogen; increasing pH in the reactor to increase a rate at which the solvent and the carbon dioxide react; and collecting and storing the hydrogen. The temperature in the reactor is limited to a calcination temperature of magnesium carbonate considering the steam pressure in the reactor (preferably the temperature in reactor is 200-500 degrees C). The steam pressure in the reactor is 100-1000 pounds per square inch. Preferred Components: The catalysts include magnetite, copper, and/or other commercially available water-gas shift catalysts. The acid is ortho-phosphoric acid.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred System: The system further comprises a pH control module in fluid communication with the carbonation reactor, where the pH control module includes a supply of basic material for increasing pH in the carbonation reactor to increase a rate that the solvent and the carbon dioxide react; and a hydrogen collection and storage module for collecting and storing hydrogen produced in the carbonation reactor. The temperature in the carbonation reactor is limited to a calcination temperature of magnesium carbonate considering the steam pressure in the reactor (preferably the temperature is 200-500 degrees C). The steam pressure in the carbonation reactor is 100-1000 pounds per square inch.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The acid(s) include EDTA, acetic acid, ascorbic acid, and/or oxalic acid; and the chelating agent(s) include catechol, guanidine, imidazole, histidine, and/or arginine. The gas is one of a syngas produced from the gasification of a carbonaceous fuel or solid wastes, and/or a flue gas produced from combusting a carbonaceous fuel or solid wastes. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Materials: The carrier is carbon black, active carbon, carbon nanotube, carbon fiber, graphite, or metal oxide.    TECHNOLOGY FOCUS - METALLURGY - Preferred Materials: The metal precursor is molybdenum compound, ruthenium compound, rhodium compound, palladium compound, silver compound, rhenium compound, osmium compound, iridium compound, gold compound, iron compound, cobalt compound, or nickel compound.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Materials: The surfactant is hexadecyl trimethyl ammonium bromide, hexadecyl trimethyl ammonium chloride, sodium dodecyl benzene sulfonate, hexadecyl stearate, or sodium lauryl sulfate. The hydrophobic solvent is toluene, xylene, n-hexane, cyclohexane, cyclohexanone, carbon tetrachloride, chloroform, methyl isobutyl ketone, or isopropyl acetate. The water soluble reducing agent is formaldehyde, formic acid, lithium borohydride, sodium borohydride, potassium borohydride, methanol, ethanol, glycol, hydrazine hydrate, malic acid, citric acid, glucose, sucrose, or ascorbic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The activating agent is potassium hydroxide, sodium hydroxide, phosphoric acid, and/or zinc chloride, preferably, preferably 45 wt.% potassium hydroxide aqueous solution. The activated gas is water vapor, and/or carbon dioxide in flue gas, preferably saturated steam not containing oxygen, where gas flow rate is 20-100 cm3/minute, preferably 80 cm3/minute. Preferred Composition: The graphene oxide and potassium hydroxide aqueous solution mass ratio is 1:(0-20), preferably 1:(1-12). The protective atmosphere is nitrogen, helium or argon gas preferably nitrogen at flow rate of 50-150 cm3/minute, preferably 100 cm3/minute. Preferred Method: The graphite oxidization method is Hummers, Brodie or Staudenmaier method. The high temperature activation is carried out at 500-1800 degrees C, preferably 700 degrees C, activating for 30-200 minutes, preferably 60 minutes.
TECHNOLOGY FOCUS - METALLURGY - The additional dopant includes additional material selected from a group consisting of potassium, calcium, chrome, manganese, iron, nickel or copper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The base of upper solar subcell is made of gallium indium phosphorus. The subcell is provided with germanium emitter layer and germanium base layer. The window layer is made of aluminum indium phosphorus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The molybdenum-containing layer is interposed between the substrate and a conductive layer (108) containing copper, aluminum, silver and/or gold. The molybdenum-containing layer is deposited in presence of inert gas. The layer of the sputter target is etched to remove an oxide layer. The molybdenum-containing layer is etched using ferricyanide. Preferred Composition: The substrate is a silicon substrate. The concentration of copper in the surface of the silicon-containing layer is less than 0.1 atomic% as measured by Auger spectroscopy. The concentration of molybdenum in the sputter target is 70 atomic% or more. Preferred Properties: The molybdenum-containing layer has thickness of 200 nm or less, average grain size of 20-500 nm, and etch rate of 65 nm/minute.
TECHNOLOGY FOCUS - METALLURGY - The buffer layer is selected from a group consisting of hydrogenated amorphous silicon germanium alloy, hydrogenated microcrystalline silicon-germanium alloy, hydrogenated amorphous germanium and hydrogenated microcrystalline germanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The semiconductor film comprises indium selenide (InxSe) or indium gallium selenide ((In,Ga)xSe). The In source comprises In, indium (III) selenide or (InxSe). The Ga source comprises Ga or gallium selenide (GaxSe).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compound: The base substrate comprises silicon, germanium, silicon carbide, gallium arsenide and/or indium phosphide. A dielectric layer (130) comprising silicon dioxide, silicon nitride and/or aluminum oxide, is provided between the layer (110) and substrate. A semi-insulating layer (120) comprising gallium arsenide doped with iron and/or chromium is provided between layer (110) and layer (130).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Alkaline solution is used during etching of silicon films.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanomaterial consists of metal and/or metallic compound. Preferred Property: The nanomaterial composition has fluidity in room temperature.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The transparent electroconductive substance is indium tin oxide. Preferred Layer: The transparent electroconductive film further has a transparent base layer containing silicon oxide of formula: SiOx.x=1-2.Preferred Property: The thickness of transparent conductive layer is 20-30 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition further comprises 0.1-10 parts mass silicate with respect to 100 parts mass water. The solution (A) or solution (B) further contains silicate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic filler comprises fumed silica having surface which is hydrophobilized. The compound containing donor element is compound containing phosphorus, or 1-80 %mass glass particles comprising phosphorus trioxide, phosphorus pentaoxide, silica, potassium oxide, sodium oxide, lithium oxide, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, vanadium pentaoxide, tin oxide, zirconia and/or molybdenum oxide, or glass particles containing boron oxide, alumina, silica, potassium oxide, sodium oxide, lithium oxide, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, vanadium pentaoxide, tin oxide, zirconia, molybdenum oxide, germanium oxide, yttrium oxide, cesium oxide and/or titania. The compound containing acceptor element is boron nitride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The fatty acid amide is of formula: R1CONH2 (I), R1CONH-R2-NHCOR1 (II), R1NHCO-R2-CONHR1 (III) or R1CONH-R2-N(R3)2 (IV), preferably stearamide, N,N'-methylene bisstearamide and/or dimethylaminopropylamide stearate. The composition further contains 0.01 %mass or more and 20 %mass or less inorganic filler.R1,R3=1-30C alkyl or alkenyl;andR2=1-10C alkylene.Preferred Property: The decomposition temperature of fatty acid amide is 400 degrees C or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sputtering target has oxygen content of 200-2000 ppm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The platinum-based electrocatalyst is platinum on carbon (Pt/C). The platinum-based electrocatalyst is a platinum-transition metal alloy. The platinum-based electrocatalyst is in nanoparticulate form with a physical dimension of 1-10 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Polymer: The PVP has an average molecular weight of at least 160000-1600000, preferably 360000-1600000, especially 360000 g per mole. The polymer coverage of PVP on the platinum-based electrocatalyst is 5-20 wt.% PVP/Pt. The PVP is desorbed from the surface of the platinum-based electrocatalyst during methanol oxidation at a potential of 0.0-0.80 V versus reversible hydrogen electrode (RHE) and where the PVP is re-adsorbed onto the surface of the platinum based electrocatalyst at a potential of 0.80-1.60 V versus RHE. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The organic filler has average particle diameter of 10 mu m or less, and decomposition temperature of 700 degrees C or less. The compound-containing donor element is chosen from phosphorus trioxide and phosphorus pentoxide. The n-type diffusion layer-forming composition further contains glass component substances chosen from silica, potassium oxide, sodium oxide, lithium oxide, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, vanadium pentoxide, tin oxide, zirconium dioxide and molybdenum trioxide. The content of the glass component substances and compound-containing donor element is 1-80 %mass and 0.01-10 %mass, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The ratio of D0 and D2 is 3 or more:1, preferably 3:1-5:1. Preferred Process: The pressed powder is sintered in hydrogen. During preparation of planar sputtering target, an additional powder is pressed with the molybdenum powder. Preferred Composition: The additional powder comprises tantalum, niobium, chromium, tungsten and/or vanadium. The amount of the additional powder relative to total amount of molybdenum powder and additional powder is 10-1000 ppm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: An intermediate layer containing amorphous silicon carbon or silicon carbide (Si1-xCx, where x is more than 0 and less than 1) or silicon nitride (SiNx) is formed, and the intermediate layer is optionally doped by boron, phosphorus, aluminum, antimony, arsenic or indium. The substrate contains stainless steel, iron, titanium, chromium, vanadium, nickel, molybdenum, tungsten or tantalum, or ceramic. Preferred Process: The surface of thin silicon-absorber layer is patterned by etching with potassium hydroxide/isopropanol solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The plasma which additionally contains silane is used. The formation of the dielectric passivation layer is carried out in a lock chamber upstream to the process chamber than the pre-process chamber. The oxygen partial pressure in the oxidizing gas is adjusted to at least 5 kPa. The substrate arranged on a support (12) is fed to the processing chamber, where the substrate arranged in the pre-process chamber on the support is suspended at a temperature of 400-800 degrees C, under the oxidizing gas preferably air for more than 2 seconds, preferably 2-60 seconds. The oxidizing gas comprises oxygen, dinitrogen monoxide and/or ozone. The substrate surface is provided with hydrophilic properties before forming the dielectric passivation layer. An alkaline or acidic solution is used with an oxidizing agent to produce the hydrophilic properties. The sodium hydroxide, potassium hydroxide, and tetraalkylammonium hydroxide, preferably tetramethylammonium hydroxide are used as components of the alkaline solution and/or methane sulfonic acid is used as component for the acidic solution.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: At least one means comprising percarbonate, perborate, peroxymonosulfate, peroxodisulfate or hypochlorite is used as oxidizing agent. The oxidizing agent is added with at least an additional component comprising stabilizers, complexing agents and surfactants. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The thermal conducting substrate further includes a material consisting of diamond thin film, aluminum nitride and aluminum oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The component (b) is tin component or indium component. The slag is material containing oxygen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The hybrid layer is located between the resin base material and functional inorganic layer. The functional inorganic layer is a gas-barrier inorganic layer. The functional film is formed using inorganic precursor containing polysilazane. Preferred Property: The ratio of the film thickness of functional inorganic layer with respect to the film thickness of hybrid layer is 0.001-10.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Silica colloid is removed from carbon nanotube film using aqueous alkali solution or hydrofluoric acid. Preferred Composition: The aqueous alkali solution is aqueous sodium hydroxide solution or aqueous potassium hydroxide solution. The concentration of silica colloid in the dispersion liquid is 0.001-5 wt.%. The concentration of carbon nanotube in the dispersion liquid is 1x 10-5 wt.% to 5 wt.%.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyester in the base material sheet is polyethylene terephthalate. Preferred Properties: The thickness of the base material sheet is 100-300 microm. The thickness of the lamination sheet is 100-1000 microm. The thermal contraction rate of longitudinal direction during heating the base material sheet before formation of the functional layer at 220microC for 5 minutes is 4.5-8percent. The ratio of thermal contraction rate of longitudinal direction and thermal contraction rate of width direction is 0.8-2, during heating the base material sheet at 220microC for 5 minutes before forming the functional layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The shaping tool and/or picking tool consists of inert material, graphite, silicon carbide, and/or silicon nitride. The metalloid is silicon, and the metalloid-containing compound comprises silicon dioxide.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The mechanical action is carried out at an angle of 0-70 degrees with respect to a gravitational vector and at a frequency of 100 kHz and 10-8 Hz, and is performed with a penetration depth of 0.01-3 m and a power of 10 N to 105 N. The mechanical action is effected with at least one elongated pin-like shaping tool and/or picking tool. The shaping tool and/or picking tool comprises a composite system having three regions, where the regions are considered as core to which other regions are coaxially arranged. The composite system includes a core comprising at least one metal that is configured to cool by a cooling area with gas, preferably argon. A tip and a sheath of the composite system are formed of the inert material. The mechanical action is further effected with a hydraulic power transmission, preferably by a chisel excavator. The tool is extended and retracted at an angle of 0-80 degrees measured with respect to a direction of movement of the burden in the region. EXAMPLE - None given.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The content of silica is preferably 55-72 %mass silica and the content of calcium oxide is 0-8 %mass. The mass ratio of alumina and sodium oxide is 0.5 or more. The mass ratio of total content of strontium oxide and barium oxide with respect to alumina is 1 or less when silica content is less than 55%. The mass ratio of alumina and silica is 0.25 or more. The content of zirconia is preferably 0.5-5 %mass. The total content of sodium oxide and potassium oxide is 1-19 %mass. The total content of magnesium oxide and calcium oxide is 2-16 %mass. The total content of silica and alumina is 64-82 %mass. The glass substrate is float plate glass. The glass substrate further contains 0.005-0.1 %mass ferric oxide. Preferred Properties: The glass substrate has a strain point of 550 degrees C or more, and an average coefficient of thermal expansion at 50-300 degrees C of 50x 10-7-105x 10-7/ degrees C.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Film: The transparent conductive film contains tin oxide as main component. The transparent conductive film has a mobility of 36 cm2/V.second at a film thickness of 250 nm. The transparent conductive film contains fluorine as dopant.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of epoxy resin hardener with respect to 100 parts mass all the epoxy resin components is 0.01-200 mass parts. The epoxy resin hardener is chosen from amine-type hardener, acid anhydride-type hardening agent and phenol-type hardening agent. The epoxy resin has softening point of 120 degrees C or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Compound is represented by formulae (3)-(6). Organic functional material is a matrix material e.g. ketones, phosphinoxides, sulfoxides, sulfones, triarylamines, carbazoles, indolocarbazoles, indenocarbazoles, azacarbazoles, bipolar matrix materials, silanes, azaborolenes, boronesters, triazines, zinc complexes, diaza- or tetraazasiloles, and/or diazaphospholes.L=X=X, R 1C=N, O, S, Se, or NR 1; andz4=0 or 1. Preferred Definitions:    M=Pt;    Q 1, Y 3, Y 4=N;    Y 1, Y 2=C;    W=formulae (72)-(77) or formula (52);    asteriskasterisk=position of binding between W and Z or M-bearing core; and    R 1=formulae -CH 3 (84), -CH 2CH 3 (85), -CH(CH 3) 2 (86), -C(CH 3) 3 (87), -(CH 2) 7CH 3 (88), -OCH 3 (89), or formulae (90)-(242h).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method comprises cooling the reaction product using water to deposit, and filtering the deposition to obtain a residue. The separating step comprises vacuum drying the material in chloroform using silica gel as fixed phase, after the solvent is removed, eluting trichloromethane eluent using a column to collect second purple layer, and condensing and drying the product to obtain a purple solid powder. The diluted pyrrole solution is obtained by dissolving the solution at 115 degrees C and storing. The adding step further comprises stirring the mixture at a stable temperature of 120-150 degrees C for 30-120 minutes, and dropping the raw material into a constant voltage dropping liquid funnel using a dropper. Preferred Components: The diluting volume ratio of propionic acid to pyrrole is 3:1-10:1. The metal acetate is zinc acetate, copper acetate or nickel acetate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The barrier layer comprises oxides of vanadium and molybdenum, nitrides of aluminum, tungsten nickel oxide, and boron doped diamond. A composition of the oxide of vanadium is described by an empirical formula of V2O5.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The coating material contains organic solvent, an organic compound and 0.01-10 wt.% silicon group surfactant. The thickness of the organic layer is 0.5-5 mu m.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Arrangement: The module consists of sealing material layer (I) at the light-receiving surface side of photovoltaic cell, a protective layer (3) containing fluorinated resin, partially fluorinated resin, and/or fluorinated resin copolymer, sealing material layer (II) comprising translucent inorganic fiber cloth, and sealing material layer (III) comprising fluorinated resin, partially fluorinated resin, and/or fluorinated resin copolymer. The protective layer has a thickness of 25 mu m or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The oxide layer is formed with less than 17 atom% hydrogen content and the nitride layer is formed with less than 5 atom% hydrogen content. The oxide layer is formed by a plasma enhanced chemical vapor deposition process or an atomic layer deposition process. The method further comprises densifying the oxide layer by subjecting the oxide layer to a plasma treatment using an oxygen-containing gas. The nitride layer is formed by a reactive sputtering process using a silicon-containing target in a nitrogen-containing atmosphere. Preferred Component: The oxide layer comprises silicon oxide or aluminum oxide, and the nitride layer comprises silicon nitride or aluminum nitrite.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The coating liquid (B) further contains organic solvent and/or water. Preferred Properties: The freezing point temperature of the surfactant is 35-100 degrees C. The surface free energy of the laminated film is 50-80 mN/m. The surfactant is soluble in an organic solvent and/or water in the coating liquid (B). The surface specific resistance of the conductive layer is 30 Omega 2 or less.
TECHNOLOGY FOCUS - METALLURGY - Preferred Process: The manufacture of silver-gold nanowire method further involves supplying gold vapor in flow rate of 100-250 sccm on substrate and promoting epitaxial to form gold nanowire on strontium titanate oxide (110) substrate, controlling composition of gold and silver vapors and controlling acceleration period. The gold nanowire having octahedral crystalline structure grows perpendicularly on substrate. The vapors are heated at 650-850 degrees C and supplied. The acceleration period of vapor is 5 minutes or greater. Preferred Properties: The silver-gold alloy nanowire has surface plasmon resonance phenomenon at wavelength of 420-520 nm and has single crystalline structure. Proffered Composition: The silver-gold alloy nanowire comprises 50 wt.% or more silver.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation of the rylene monoimide derivatives are given. SPECIFIC COMPOUNDS - 8 Compounds are disclosed as the rylene monoimide derivatives, e.g. compounds of formulae (A)-(E).    EXAMPLE - 110 mg of N-(2,6-diisopropylphenyl)-8,9-((b)-1-hexyl-1H-indole)-3,4-perylene-dicarboximide was dissolved in 10 ml of 2-methyl-2-butanol, 375 mg of potassium hydroxide (6.7 mmol) was added, and the mixture was degassed and boiled under reflux overnight. After cooling, the reaction solution was added to ice in diluted acetic acid (1:10 acetic acid:water). The precipitate was filtered off, washed with water and dissolved in dichloromethane. A few drops of acetic acid was added to the solution which was stirred overnight, and 80 mg, 96% of (N-(2,6-diisopropylphenyl)-8,9-((b)-1-hexyl-1H-indole)-3,4-dicarboxylic monoanhydride) as dark violet solid in crude anhydride form was obtained. 80 mg of the crude anhydride was introduced into a Schlenk tube with 1 g of glycine and 2 g of imidazole. After degassing, the mixture was stirred at 140 degrees C under argon overnight. After cooling, the crude product was dissolved by dilute hydrochloric acid (1:5 hydrochloric acid:water). The precipitate was filtered off and washed to neutrality. The crude product was purified and 50 mg, 56% of the compound (A) as a dark violet solid was obtained.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The graphite structure further comprises an antioxidant film on the coating layer. The coating layer: is formed over the front side and the back side of the graphite plate from interiors of the through holes; and contains one of nickel, cobalt, titanium, and an alloy composed of one of the elements. In the graphite structure, a continuous hole (4) is opened so as to increase in diameter toward an exterior. The graphite plate has: a layout area (where an electronic component is located) and a peripheral area (where the electronic component is not located), in which the peripheral area has a higher total area density of the through holes than the layout area; a specific gravity of not greater than 2.25 g/cm3, conductivity of at least 106 S/m, and a Young's modulus of at least 750 GPa; and a surface roughness of 1-4 mu m. In the layout area, the through holes of the graphite plate are smaller in diameter than in the peripheral area. The through holes have: a total area of not less than 0.1% and not greater than 10% relative to an area of the graphite plate; and a maximum pore size smaller than 3.3% relative to the area of the graphite plate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The Group IB material is copper, Group IIIA materials are indium and gallium, and at least one Group VIA material comprises selenium. The non-metallic phase comprises selenides and sulfides of copper, indium, gallium, copper indium, copper gallium, indium gallium, and copper indium gallium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkaline component is sodium hydroxide or potassium hydroxide. The concentration of alkaline component is 0.3- 25 %mass. The concentration of phosphonic acid derivative or its salt is 0.1-25 %mass. Preferred Property: The mass ratio of alkaline component (A) and phosphonic acid derivative, or its salt (B) is 0.1-10.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin is millable-type silicone rubber. The composite material contains 30-75 volume% magnetic powder.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thermoplastic resin layer comprises layer (L1) containing random polypropylene and/or thermoplastic elastomer, layer (L2) containing homo polypropylene stacked on layer (L1) and layer (L3) containing random polypropylene and/or thermoplastic elastomer stacked on layer (L2). The layer (L1) and/or layer (L3) further contains homo polypropylene. The layer (L2) further contains random polypropylene, pigment chosen from titanium oxide, talc, magnesium oxide, cerium oxide, barium sulfate, calcium carbonate and carbon black. The solar cell protective sheet further has base material (11), fluorine resin layer (F1) laminated on the base material, fluorine resin layer (F2) laminated on the layer (L2) and thermoplastic resin layer (T2) comprising copolymer of ethylene, (meth)acrylic acid, (meth)acrylate, glycidyl (meth)acrylate and vinyl acetate, and maleic anhydride. Preferred Property: The thermal contraction rate of thermoplastic resin layer when thermoplastic resin layer is heated at 150 degrees C for 30 minutes is 1% or less.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Component: The organic thin-film solar cell further has a pair of electrodes (10,16), an electron carrying layer (15) between one electrode and the photoelectric conversion layer, and a hole transport layer (11) between the other electrode and the photoelectric conversion layer.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sulfide of group-15 element of periodic table is antimony sulfide. The photoelectric conversion layer is a laminated material of a layer containing the sulfide of the periodic table 15-group element and a layer containing the organic semiconductor, or a composite film (14) formed by mixing and complexing the portions (a) and (b).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The additive material comprises oxide with dielectric constant of 8 or more, zirconium, tantalum, titanium, molybdenum, vanadium, yttrium, scandium and/or hafnium, preferably zirconium precursor. The thin film comprises alloy including additive material and elements of host oxide. The host oxide comprises tin oxide, indium oxide and/or zinc oxide. The method further involves doping thin film with fluorine or chlorine while depositing the thin film. The photovoltaic device has absorber layer containing layer of cadmium telluride or layer of copper indium gallium selenide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal oxide is selected from titanium oxide, tin oxide, zinc oxide, tungsten oxide, niobium oxide, tantalum oxide, zirconium oxide, barium titanate, strontium titanate, zinc titanate, copper titanate, and corresponding combinations.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The substance comprises silicone resin, epoxy resin and/or polyurethane resin and certain particles consisting of carbon black, carbon nanotubes, graphene, carbon fibers, aluminum steel, copper, metal powders and metal oxides.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The CI(G)S group nanoparticles contain copper-indium-selenium, copper-indium-sulfur, copper-gallium-sulfur, copper-gallium-selenium, copper-indium-gallium-selenium, copper-indium-aluminum-gallium, copper-zinc-tin and copper-indium-aluminum-gallium-selenium-sulfur.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The flux is chosen from sulfonamide, sodium selenite decahydrate and sulfonic acid salt of sodium selenite. The flux contains hydrazine solution comprising metal salt solution having copper, indium and gallium, preferably chloride, acetate, nitrate and sulfate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The generated electrolyte comprises phosphoric acid. The electrolyte precursor comprises phosphorus pentoxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The coating is dielectric optical antireflection layer of optical reflecting layer. The metal film pattern comprises chromium, silver, copper, nickel, titanium, aluminum, nickel-vanadium, nickel-niobium, nickel- titanium, nickel-zirconium, nickel-chromium, nickel-platinum, nickel-aluminum, nickel-tungsten, titanium-tungsten, cobalt-nickel, chromium-cobalt-nickel, chromium-aluminum, chromium-silicon, chromium-copper, aluminum-silicon-copper, aluminum-silicon or aluminum-chromium.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The glass substrate has amount of calcium, strontium and barium in surface layer of glass substrate in inner portion of 0.35 atomic% or less at depth of 5000 nm or more from the surface, ratio of sodium oxide content (%mass) measured by fluorescence X-rays from glass substrate surface and sodium oxide content (%mass) measured by fluorescence X-rays from surface at depth of 5000 nm from surface of 0.6-0.84, and ratio of sodium in glass-substrate surface layer before heat treatment and after heat treatment at 600 degrees C for 1 hour under nitrogen atmosphere of 2 or more at depth of 10-40 nm (from the glass-substrate surface). Preferred Composition: The glass substrate has sum total content of calcium oxide, strontium oxide and barium oxide of 3-15 %mass and sum total content of strontium oxide and barium oxide of 0-8 %mass.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The normal phase liquid chromatography is performed by high-speed liquid chromatograph. The column filler contains modification group chosen from hydroxyl group, cyano group and amino group. The eluent contains acids chosen from acetic acid, formic acid and trifluoroacetic acid, and their salts. The analysis of dye further involves fractionating dye based on detection result, and purifying dye.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of graphite oxide powder, surfactant and silicone salt with respect to 100 parts weight of meso hollow structure silicon oxide/graphene composite is 0.5-2 parts weight, 3-20 parts weight and 5-30 parts weight, respectively. The transition metal salt is chosen from ruthenium, vanadium, titanium, manganese, cobalt, iron, tin, nickel and tungsten.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The surfactant contains main portion surfactant chosen from cationic surfactant, and anionic surfactant or polymeric surfactant, and portion surfactant chosen selected from ethanol and butanol. The main portion surfactant is chosen from sodium dodecyl sulfate, dioctyl sodium sulfosuccinate, cetrimonium bromide, P123 (RTM: Poloxamer ), F127 (RTM: Poloxamer), Brij56 (RTM: Polyoxyethylene (10) cetyl ether) and Brij78 (RTM: polyoxyethylene (20) stearyl alcohol). The meso hollow structure silicon oxide/graphene composite further contains fine chemicals catalyst. The silicone salt is chosen from tetraethoxysilane, tetramethylorthosilicate, sodium silicate, lithium silicate and potassium silicate. Preferred Process: The obtained mixture is further mixed with strong acid chosen from sulfuric acid, hydrochloric acid, nitric acid and phosphoric acid. During manufacturing the meso hollow structure transition metal oxide/graphene composite, the transition metal salt is mixture with distilled water, or distilled water and alcohol, and silicon oxide is removed using sodium hydroxide solution and hydrofluoric acid. Preferred Property: The meso hollow structure has pore size of 1-10nm, specific surface area of 700 m2/g or more. The meso hollow structure silicon oxide/graphene composite has 3D pore structure.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises (1) protecting diol of formula (OH-(CH2)m1-(CH2)-OH) (a) by a protecting group to obtain a single end-protected diol of formula (PGO-(CH2)m1-(CH2)-OH) (b), (2) performing oxidation reaction to (b) to obtain carboxylic acid of formula (PGO-(CH2)m1-(C(=O))-OH) (c), (3) performing functional group transformation to (c), performing nucleophilic substitution reaction, and introducing R3 and R4 groups to obtain alcoholic hydroxyl compound of formula (PGO-(CH2)m1-(R3)(OH)(R4)) (e), (4) introducing R5 group to (e) to obtain a compound of formula (PGO-(CH2)m1-(R3)(R5)(R4)) (i), (5) removing the protecting group of (i) to generate alcohol compound of formula (OH-(CH2)m1-(R3)(R5)(R4)) (k), and (6) performing substitution reaction to (k) to obtain other functional groups to obtain (I) having R as the corresponding functional group when R in (I) is not hydroxyl group.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The electron emitter is made of lanthanum sulfide, cerium sulfide, neodymium sulfide, samarium sulfide, yttrium sulfide, lanthanum selenide, cerium selenide, neodymium selenide, samarium selenide, yttrium selenide, lanthanum telluride, cerium telluride, neodymium telluride, samarium telluride, yttrium telluride, cerium antimonide, lanthanum antimonide, samarium antimonide, neodymium antimonide, yttrium antimonide, yttrium bismuthide, neodymium bismuthide, lanthanum germanide, cerium germanide, cerium stannide, lanthanum stannide, samarium stannide, lanthanum plumbide, cerium plumbide, samarium plumbide, yttrium aluminide, lanthanum aluminide, cerium aluminide, gadolinium aluminide, samarium aluminide, neodymium aluminide, europium aluminide, lanthanum gallide, neodymium gallide, cerium gallide, samarium gallide, samarium indide, neodymium indide, lanthanum indide, cerium magneside, lanthanum magneside, neodymium magneside and/or samarium magneside.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Property: The predetermined direct current electricity bias is plus minus 1-500 V, plus minus 10-500 V or less than plus minus 30-200 V.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sputtering target (1-B) is oxide target formed using zinc oxide containing additive chosen from nitrogen, magnesium, aluminum, gallium, indium, lithium, manganese, vanadium and cobalt, or additive-free zinc oxide. The gas for sputtering is pure argon or mixed gas containing argon or oxygen. Preferred Properties: The zinc oxide layer has thickness of 1-20 nm. The sputtering target has cylindrical form or planar shape. The distance between substrate and sputtering target is 1-200 mm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The substrate is bulk oxide, bulk metal or bulk polymer. The substrate is covered using surface coating layer chosen from oxide layer, metal layer and nitride layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The impurities in silicon melt are boron and phosphorus having purity of less than 10 ppmw.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Heat processing is performed at 500-1000 degrees C in inert gas atmosphere.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The basic functional group is -NRR' group. The acidic functional group is either sulfonic acid group, carboxylic acid group or phosphoric-acid group.R,R'=H and optionally substituted alkyl group, alkenyl group, or aryl group which may contain N, O or S.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Template removal process involves performing gaseous phase reaction of template zeolite using BCl3, sucking and/or filtering liquid product generated using BCl3 or removing cold trap of gas product generated using BCl3, and washing and removing remaining solid product generated using BCl3 with water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Fuel reformer has layer (B) containing oxidation catalyst layer (B1) and modification catalyst layer (B2).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general method for preparation of the derivates is given. SPECIFIC COMPOUNDS - 8 Compounds are disclosed as the derivates, e.g. compound of formulae (I'a)-(I'e).    EXAMPLE - 160 mg crude anhydride were introduced together with 2 g glycine and 3 g imidazole into a Schlenk tube. After degassing, the mixture was stirred at 140 degrees C under argon overnight. After cooling, the crude product was dissolved from the flask by dilute hydrochloric acid (1:5 hydrochloric acid:water). The precipitate was filtered off and washed to neutrality, and 100 mg, 58% compound (Ib) as a blue solid was obtained.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polymer electrolyte membrane comprises protonsolvency such as poly(4-vinyl-imidazole).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The difference between the first and second average densities are 0.1-0.8 g/cm. The second region is free of substantially closed porosity. The material has a steel wool scratch test value of at least 1. The inhibiting gas has an oxygen content of 100-100000 ppm. The outer most submicrometer particles are covalently bonded to the polymeric matrix. Preferred Method: In the method: all actinic radiation curing is conducted in a single chamber; and a portion of the actinic radiation curing is conducted in a first chamber having a first inhibitor gas and a first actinic radiation level, and a portion of the actinic radiation curing is conducted in a second chamber having a second inhibitor gas and a second actinic radiation level, where the first inhibitor gas has a lower oxygen content than the second inhibitor gas, and the first actinic radiation level is higher than the second actinic radiation level.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Organic acid is a complexing organic acid which has carboxyl group (COOH) e.g. citric acid, acetic acid, malic acid, tartaric acid, ethylene diamine tetraacetate, glycine, and/or salicylic acid. Preferred Processes: Mixing aqueous solution is prepared by mixing ammonia aqueous solution which dissolves germanium dioxide and citric-acid aqueous solution which dissolves lanthanum nitrate. Mixing aqueous solution is prepared such that metal total molar quantity consisting of Ge and La with respect to molar quantity of organic acid is 1. Cloudy solution obtained from mixing ammonia aqueous solution and citric-acid aqueous solution is dissolved in diluted nitric acid, and metal molar total quantity is 1.25 times the carboxyl group molar quantity in citric acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The annular olefin unit (I) is chosen from 16 compounds e.g. norbornane carboxylic acid methyl ester, norbornane carboxylic acid ethyl ester, norbornane carboxylic acid n-propyl ester, norbornane carboxylic acid t-butyl ester and norbornane carboxylic acid iso-propyl ester. The hydroxyl group-containing olefin unit (II) is chosen from 15 compounds e.g. norbornane carboxylic acid hydroxyethyl ester, norbornane carboxylic acid hydroxy n-pentyl ester, norbornane carboxylic acid hydroxy cyclohexyl ester, norbornane carboxylic acid hydroxy palmityl ester and norbornane carboxylic acid hydroxy stearyl ester. The copolymer has weight average molecular weight of 1000-1000000.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The upper protective layer comprises ultra-white low-iron toughened glass. The lower protective layer comprises ordinary glass, fireproof glass or semi-toughened glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The flexible substrate is metal foil or nonmetal flexible substrate. The film solar cell layer is thin film solar cell layer.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The solar cell layer contains thin film polycrystalline silicon, amorphous silicon, micro-crystalline silicon, nanocrystalline titanium dioxide, cadmium sulfide, cadmium telluride, gallium arsenide, copper-indium selenide, copper-indium-gallium selenide, zinc phosphide and/or inorganic multi-compound material, or P-type phthalocyanine compound, porphyrin, phthalocyanine, polythiophene derivative, polyphenylene ethylene compound, polycarbonate, polyvinyl acetate, polyethylene carbazole, n-type imide derivative, naphthalimide derivative or pyrene compound. The upper film portion comprises polyvinyl butyral or ethylene vinyl acetate film.
SPECIFIC COMPOUNDS - 50 quinoline derivatives (I) e.g.2-(6-(4-(naphthalen-2-yl)phenyl)pyridin-2-yl)-4-phenylquinoline of formula (Ia), -(6-(4-(naphthalen-1-yl)phenyl)pyridin-2-yl)-4-phenylquinoline, 2-(6-(4-(phenanthren-9-yl)phenyl)pyridin-2-yl)-4-phenylquinoline, 2-(6-(4-(phenanthren-9-yl)phenyl)pyridin-2-yl)-4-phenylquinoline and 2-(6-(4-(10-(naphthalen-2-yl)anthracen-9-yl)phenyl)pyridin-2-yl)-4-phenylquinoline, are specifically claimed.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of mat agent is 1-30 %mass with respect to total mass of weather-resistance application layer. Preferred Property: The weather-resistance application layer has surface glossiness of 1-20.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Region: The gallium-containing region has one or more layer containing copper-gallium alloy phase. The thickness of layer of the copper-gallium alloy phase is 10 mu m or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The ester is an ester compound of cyclohexane polycarboxylic acid, preferably cyclohexanedicarboxylic acid, more preferably 1,2-cyclohexanedicarboxylic acid diester. The ester site is 1-18C alkylester. The ester is obtained by hydrogenation of phthalic-acid ester compound. The ester is diisononyl cyclohexane dicarboxylate. The sealing material further contains an aminosilane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The surface has thin layer containing metals other than silver. The metal other than silver is chosen from noble metal, iron, cobalt, copper and tin.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The copolymer has weight average molecular weight of 1000-3000000.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The inlet capillary has a diameter of 5-30 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic solvent is diethyl ether or nonane. The concentration of the organic suspension in an organic saturated solution is 10 mol/l.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The metal precursor compound is chosen from acetate, chloride, nitrate and acetic anhydride of metal. The metal is chosen from zinc, copper, aluminum, tin and magnesium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Solvent: The solvent is water or low-boiling solvent, preferably acetone, ethanol and methanol. The carrier gas is nitrogen or argon.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The graphene is formed on substrate made of transparent polyethylene naphthalate (PEN) or silicon dioxide substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: In the paste composition, the organometallic compound is fully dissolved in the vehicle system and the vehicle system is free of metal particles. The paste composition is free of solid particles that contain zinc. Preferred Composition: The paste composition comprises the organometallic compound comprising zinc at 0.05 wt.% or more and 30 wt.% or less of the paste composition. The glass binder comprises a glass frit comprising: 55-88 wt.% lead oxide (PbO), 0.5-15 wt.% silicon dioxide (SiO2), and 0.5-24 wt.% aluminum oxide (Al2O3) + boron oxide (B2O3). The glass frit further comprises 0.1-5 wt.% phosphorus pentoxide (P2O5) + tantalum pentoxide (Ta2O5). The glass binder comprises a glass frit comprising: 65-90 wt.% bismuth oxide (Bi2O3), 0.5-20 wt.% SiO2, and 0.5-24 wt.% B2O3 + Al2O3. The glass binder comprises a glass frit comprising: 30-62 wt.% B2O3 + SiO2, 2-22 wt.% titanium dioxide (TiO2), and 2-35 wt.% lithium oxide (Li2O) + sodium oxide (Na2O) + potassium oxide (K2O). The glass frit further comprises 0.1-13 wt.% vanadium oxide (V2O5) + antimony pentoxide (Sb2O5).
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The target substrate comprises an unpolished ceramic substrate, an unpolished polysilicon substrate, an unpolished metal substrate, a printed circuit board, and/or a plastic substrate.    TECHNOLOGY FOCUS - METALLURGY - The eutectic layer comprises a multilayer stack including at least two different layers. The first eutectic stack comprises metal alloy, and where the second eutectic stack comprises metal-semiconductor alloy.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The average value of carbon number between two portions originating in the unsaturated carboxylic acid and/or unsaturated dicarboxylic acid anhydride (B) to mutually adjacent in copolymer (C) are 11-80. The acid value of copolymer (C) is 5-470 mg potassium hydroxide/g.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: While covering a ring-shaped heat retention cover on peripheral portion of opening of the crucible at the top of the crucible, the opening portion of the crucible is covered through the ring-shaped periphery heat retention component having a central opening of an area less than the silicon-molten-metal surface in crucible. The decompression chamber has anteroom in which an exchangeable heat retention cover is accommodated through a gate valve. Preferred Properties: The pressure in the decompression chamber at the time of silicon refinement processes is 500 Pa or less. The pressure in the decompression chamber at the time of exchange is more than 500 Pa in heat retention cover in which the exchange is possible.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The glass substrate contains 58-62 %mass silicon dioxide, 10-13 %mass aluminum oxide, 0-0.5 %mass boron trioxide, 3-4.5 %mass magnesium oxide, 4-6 %mass calcium oxide, 0-3 %mass strontium oxide, 0-4 %mass barium oxide, 0.5-3 %mass zirconium oxide, 0-3 %mass titanium dioxide, 0-4 %mass lanthanum oxide, 5-7 %mass sodium oxide, 3-6 %mass potassium oxide, 10-13 %mass subtraction of sodium oxide and potassium oxide, and 43%-50 %mass subtraction of silicon dioxide and aluminum oxide, on oxide basis, and has ratio of potassium oxide and sodium oxide of 1.2 or less. Preferred Properties: The glass substrate has a density of 2.7 g/cm3 or less and a glass transition point temperature of 650degree C or more.
TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Composition: The carbon nanotube-containing component has dried carbon nanotube composite yarn including woven fabric or electroconductive thread.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The adsorption agent is activated alumina and zeolite-X in weight ratio of 5/95-30/70.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The etching mask is formed of silicon dioxide or silicon nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal layer comprises 0.1-15 weight%, more preferably 1.9-8.1 weight% titanium oxide. The dopant oxide is chosen from niobium, tantalum, tungsten, molybdenum, zirconium and hafnium. The content of niobium is 1-8 weight%, preferably 1.9-6.1 weight%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The substrate is made of silicon. Preferred Property: The plasma has density of more than 1x 1011 ions/cm3, preferably 1x 1012 ions/cm3 to 9x 1013 ions/cm3.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass-ceramic additive contains impurities including zinc oxide, lead oxide, bismuth oxide, titania, tellurium oxide, alkali metal and/or alkali metal oxides, and/or strontium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The adhesion promoter-additive and the strength-enhancing additive comprise silicon-powder. The adhesion promoter-additive or the strength-enhancing additive includes a powder having a particle size of 1-20 mu m, preferably 3-10 mu m. Preferred Method: The coatings are prepared using the screen printing paste and the conductive paste, before a single common sintering step, which is carried out at 700-850 degrees C. The method includes employing the above mentioned screen printing paste. EXAMPLE - Typical conductive paste comprised of 75 wt.% silver powder 10 wt.% binder, 0-3 wt.% glass borosilicate frit, 0-3 wt.% additive, and 9-15 wt.% silicon powder.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Components: The heating system includes top heater, side heaters, top heater and top cover. The top heater includes refractory layer within metal shell. The heating system controller is configured to operate within a range of 720-1100 degrees C. The silicon purification system further includes scoop system to remove precipitated silicon from within molten binary silicon alloy.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The formation of molten metal alloy in crucible includes forming silicon-aluminum alloy in crucible. The controlling temperature within crucible includes covering top of the crucible. The actively heating crucible includes heating a top surface of the crucible, heating sides of the crucible and heating a top surface of the crucible. Preferred Composition: The silicon-aluminum alloy contains 22-60 wt.% (preferably 30-50 wt.%) silicon and remainder of aluminum. Preferred Condition: The cooling temperature is maintained at 577-1100 degrees C, preferably 720-1100 degrees C, more preferably 650-960 degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The nanostructured and nanoporous portions have a size smaller than a wavelength of visible rays, preferably 0.5-300 nm. The nanostructured portions comprise at least one of silicon-based compounds, fluorine-based compounds, silicon dioxide, calcium fluoride or magnesium and at least one shape comprising nanorods, nanocolumns, nanowires, nanoplates or nanosprings or material having a light refractive index smaller than the light refractive index of the material forming the substrate. The nanostructured portions are formed obliquely to the substrate. The nanostructured layer has a thickness of 1 nm to 20 mu m. The hydrophobic coating film comprises a fluororesin and has a thickness of 0.1-50 nm. The hydrophobic material comprises the fluororesin. Preferred Method: The step of forming the nanostructured layer comprises depositing at least one of silicon-based compounds or fluorine-based compounds on the substrate and forming nanostructured portions obliquely to the substrate. The step of forming a hydrophobic coating film comprises coating a hydrophobic material on the nanostructured portions, and heat treating the coated hydrophobic material. The step of heat treatment is carried at 100-300 degrees C. EXAMPLE - 2 mm Transparent glass substrate was installed in an electron beam deposition system. Calcium fluoride was deposited as a nanostructured layer on glass substrate at an angle of 85 degrees and deposition was carried out so that calcium fluoride was deposited with a glancing angle in a nanowire shape. The resulting glass substrate was subjected to surface modification with a fluororesin. The glass substrate was dipped into a solution containing PTFE. After introducing coated substrate into an oven, the resulting substrate was heat treated at 200 degrees C to cure to obtain hydrophobic glass substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic compound is natural clay or synthetic clay. The natural clay or synthetic clay is chosen from montmorillonite, kaolin, smectite, saponite, silicide, mica, vermiculite, beidellite, hectorite, stevensite, magadiite, ilerite, kanemite, ilite and talc.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ionic liquid comprises cation chosen from imidazolium salt, imidazolinium salt, pyrrolidinium salt, pyridinium salt, piperidinium salt, morpholinium salt, ammonium salt, phosphonium salt, sulfonium salt and their derivatives. Preferred Property: The electroconductivity of the conjugated electroconductive material is 0.1-100 mS/cm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The overcharge reactive compound is chosen from branched alkylbenzene, cycloalkyl benzene, biphenyl, terphenyl, diphenylether, and dibenzofuran.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The overcharge reactive multimers contain decamer from the dimer of the overcharge reactive compound. The positive electrode contains polymerization initiator. The polymerization initiator is an azo-type polymerization initiator.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The silane comprises tetraethyl orthosilicate. The metal oxide comprises a silane. At least some of the porous nanoparticles have a pore size of less than 2 nm. The porous nanoparticles comprise at least one of mesoporous silica (preferred), mesoporous titanium oxide or mesoporous aluminum oxide, where at least some of the porous nanoparticles comprise the functional group.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent comprises ethanol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Method: In the method of making an anti-reflective coating, the heat treating is performed at a temperature of at least 560 degrees C. Preferred Components: The porosity of the anti-reflective coating is 20-45%, preferably 27.6-36%, the refractive index of the anti-reflective coating is 1.2-1.26, and a thickness of the anti-reflective coating is 120-160 nm. The mesoporous silica nanoparticles have an average pore size of 1-100 nm, preferably 2.4-10.3 nm. The functional group of the mesoporous silica nanoparticles comprises a hydroxy group. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The II-VI semiconductor material layer, multi-crystalline group II-VI semiconductor material base, or multi-crystalline group II-VI semiconductor material emitter are made of zinc telluride, zinc selenide, cadmium selenide, cadmium telluride, magnesium selenide, and magnesium telluride. The photovoltaic sub-cell is made of wafer or thin film of silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises circulating a heated fluid in the diffuser to heat the diffuser, and forming InGaN to obtain a defect density of at least substantially equal to or less than that of GaN. The step of decomposition of nitrogen comprises heating the precursor in a heated diffuser. The heating and decomposing the precursor comprises circulating the precursor, which contains nitrogen in a diffuser that comprises a heated metal. The circulating step comprises exposing the precursor containing at least one nitrogen and catalyst, and decomposition by catalyst precursor which contains nitrogen in the heated diffuser. The step of forming InGaN comprises forming gallium compound of formula (InxGayN), and developing InGaN on a substrate placed in the chamber at the growth rate of at least 5 Angstrom /second. The step of decomposition of the precursor further comprises: applying microwave energy on the precursor containing nitrogen, which forms nitrogen ions comprising the formation of nitrogen radicals; and without applying microwave energy to the precursor of group III. The application of microwave energy to the precursor comprises generating plasma in separate chamber using microwave energy, and passing the precursor containing nitrogen in an enclosure.either x+ y = 1; orx = 0.05-0.15.Preferred Components: The fluid is heated at a temperature of 60-215 degrees C and injecting the heated precursor containing nitrogen in the chamber. The precursor containing nitrogen comprises ammonia. The group III comprises a first precursor containing gallium and a second precursor containing indium. The layer InGaN has an average thickness of 0.5 microns. The formation of InGaN includes the formation of InGaN on GaN. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The emulsion is heated at ambient temperature or 20-60 degrees C for 0-8 hours. The glycol ether is added entirely during step (d), and is added 0-4 hours after the end of step (c), where glycol ether, added during step (b), comprises 5-25 wt.% of total materials. Preferred Components: The glycol ether comprises diethylene glycol monomethyl ether, propylene glycol monomethyl ether (all preferred), diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, dipropylene glycol methyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and/or ethylene glycol monopropyl ether. The monocarboxylic acid is 2-ethylhexanoic acid, heptanoic acid or octanoic acid or oleic acid. The amphiphilic material is a monocarboxylic acid having 6-22 carbon atoms. The amount of the carboxylic acid comprises 25-33 wt.% of the total amount of nonpolar solvent, amphiphilic material, and glycol ether added during steps (a) through (e). The nonpolar solvent is added entirely during step (d). The nonpolar solvent is added 0-1 hour after the end of step (c). The amount of the nonpolar solvent comprises 50-63 wt.% of the total amount of nonpolar solvent, amphiphilic material, and glycol ether added during steps (a) through (e). The cerium-containing oxide nanoparticles have a cerium alloy composition of formula, Ce(1-x) FexO(2- delta ). The aqueous colloidal dispersion of cerium-containing oxide nanoparticles has a pH of less than or equal to 7.x = 0.01-0.8. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The lead-free bismuth-type solder alloy further contains 0.5 %mass phosphorus, and silver and/or copper. The content of silver and copper in solder alloy is preferably 0.01-3 %mass and 0.01-1.8 %mass, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The catalyst is ammonium fluoride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Disclosed): Silane compound (I) is obtained by Michael-addition reaction of silane coupling agent and monofunctional methacrylate compound containing amino group. EXAMPLE - 5 g 3-aminopropyl triethoxysilane, 19.4 g methyl acrylate and 0.01 g 4-methoxy phenol were reacted at 80 degrees C for 48 hours and solvent was depressurizingly distilled to obtain silane compound (I). 0.44 g Obtained silane compound (I), 2.24 g 3-methacryloyl propyl triethoxysilane and 14.4 ml methanol were mixed. 0.492 ml ammonium fluoride aqueous solution was dripped to mixed solution, solvent was depressurizingly distilled and dried to obtain silsesquioxane compound. The obtained silsesquioxane compound was mixed with dipentaerythritol hexaacrylate, 1,6-hexanediol diacrylate, methyl ethyl ketone and Irgacure 500 (RTM: Liquid mixture of two photoinitiators) to obtain curable composition (C1). A laminated material (L1) was produced using the curable composition (C1). The cured material layer of laminated material had high transparency without defects such as crack and whitening, 6H pencil hardness according to JIS-K-5600, and difference of haze value (( delta )Hz) of less than 5%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of aluminum in the component composition is 1.5-6 atomic%. Preferred Property: The water-vapor permeation rate of transparent film in thickness of 100 nm is less than 0.03 g/(m2.day).
TECHNOLOGY FOCUS - METALLURGY - The layers comprise aluminum, tin, silicon or its alloy; or nanowires of silicon or its alloy (preferably porous silicon or its alloy).
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Device: The organic electronic device is transistor, where the transistor includes a gate electrode disposed on a substrate; a source electrode and a drain electrode facing each other and defining a channel region; an insulation layer electrically insulating the source electrode and drain electrode and the gate electrode; and an active layer including the organic semiconductor compound formed in the channel region. Preferred Definitions:    D'=65 groups as given in the specification, e.g. thiophen-2,5-diyl, furan-2,5-diyl, selenophen-2,5-diyl, (1,3,4)oxadiazol-2,5-diyl, pyrazin-2,5-diyl, thieno(2,3-b)thiophen-2,5-diyl, 4,5,6,7-tetrahydro-benzo(c)thiophen-4,7-diyl, dibenzothiophen-3,7-diyl, dibenzothiophen-3,7-diyl, thieno(3,4-b)pyrazin-5,7-diyl, 2,7a-dihydro-benzofuran-4,7-diyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The lead-free glass powder has softening point of 400-500 degrees C. The coefficient of linear expansion at 20-300 degrees C is 90-110x 10-7 degrees C-1. The maximum particle size and median size of lead-free glass powder is 5 mu m or less and 2 mu m or less, respectively.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The content of bismuth oxide in lead-free glass composition is less than content of silicon oxide. The redox-active additive comprises 1-10 wt.% antimony oxide and 0.5-5 wt.% tin oxide with respect to total amount of components. Preferred Properties: The median particle diameter and maximum particle diameter of lead-free glass powder is 2 mu m and 5 mu m, respectively. The softening temperature of the lead-free glass powder is 400-550 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The drying step is performed at a temperature of 80 degrees C for 12-24 hours, and comprises annealing the product under argon gas at a temperature of 750-850 degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Preparation of triphenylamine organic semiconductor material (I) comprises dissolving 9,9-Dimethyl-2,7-dibromofluorenone in organic solvent under anhydrous and anaerobic condition at 70-78 degrees C, stirring and reacting for 5 hours, adding diphenyl phosphoryl chloride, adjusting temperature to 10-30 degrees C, reacting for 3-12 hours, purifying, adding oxidizing agent and reacting for 12 hours. Preferred Component: Oxidizing agent is hydrogen peroxide, potassium chlorate, sodium chlorate, sodium hypochlorite or hypochlorous acid.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Method: The liquid-phase coating method is spraying method, sprinkling method, roller coating, and sol-liquid phase coating. Heat-treatment involves surface drying at 15-35 degrees C and 20-60% relative humidity for 30-120 seconds, procuring at 80-200 degrees C for 20-300 seconds, and tempering at 650-750 degrees C for 60-600 seconds.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The silicate is methyl silicate, tetraethylorthosilicate, and/or isopropyl silicate. The alcohol solvent is ethanol or isopropanol. The basic catalyst is ammonia, ethylenediamine or triethanolamine. The acidic catalyst is hydrochloric acid, nitric acid, acetic acid, or citric acid. The silane coupling agent is gamma -aminopropyltriethoxysilane, gamma -glycidoxypropyltrimethoxysilane or gamma -methacryloxypropyltrimethoxysilane. The alcohol-soluble salt is aluminum nitrate, titanium tetrachloride, titanium alkoxide, aluminum isopropoxide, and/or organic titanate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The film-forming fluxing agent is polyvinylpyrrolidone, alcohol-soluble acrylic resin, vinyl acetate, and/or ethyl cellulose, and is used in an amount of 0-10 g.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Dibromonaphthalene compound of formula (II) is reacted with fullerene chosen from in presence of iodide and solvent, to obtain naphthalene fullerene derivative (I). Preferred Composition: The iodide is potassium iodide or sodium iodide. The solvent is chosen from toluene, o-xylene, p-xylene, odichlorobenzene and chlorobenzene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The method involves using catalyst (1-80 wt.%) and solvent. Preferred Component: The catalyst is acetic acid, nitric acid, hydrochloric acid or sulfuric acid.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The titanium precursor is titanium ethoxide, titanium butoxide, titanium isopropoxide, titanium tetraisopropoxide, titanium chloride, titanium dichloride, titanium trichloride, titanium tetrachloride, titanium bromide and titanium oxysulfate. The concentration of the precursor solution is 0.1-10 wt.%. The solvent is ethanol, methanol, propanol, butanol, or isopropyl alcohol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The wire comprises gallium, aluminum, indium, arsenic, phosphorus, nitrogen, antimony, gallium arsenide, gallium phosphide, gallium nitride, gallium antimonide, aluminum phosphide, aluminum arsenide, aluminum nitride, aluminum antimonide, indium phosphide, indium arsenide, indium antimonide, semiconductor nanowires having width or diameter of less than 1 micron, and III-V semiconductor nanowires having a width or diameter of 2-500 nm. The seed particles comprise metal nanoparticles provided in a form of an aerosol, preferably gold nanoparticles.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Layer: In the gas diffusion layer, at least 80%, preferably at least 60% of the surface areas of the first and second major surfaces are not fluorinated. The gas diffusion layer contains less than or equal to 2 wt.% of fluorine. Preferred Components: The porous carbon substrate comprises a macroporous carbon substrate adjacent a microporous carbon substrate such that the gas diffusion layer is a bilayer having the first major surface comprised of the microporous carbon substrate and the second major surface comprised of the macroporous carbon substrate. The reactive gas is SF6. Preferred Method: The direct fluorinating step occurs at 300-400 degrees C for 30 minutes to 3 hours. The first major surface is protected by contacting the first major surface with a first protective layer and the second major surface is protected by contacting the second major surface with a second protective layer such that the porous carbon substrate is sandwiched between the first protective layer and the second protective layer. The protective layer comprised of the same material comprising the porous carbon substrate. The first and second protective layers are both comprised of the same material comprising the porous carbon substrate. The removing step is performed by sanding at least one major surface; by physical plasma etching at least one major surface with an argon plasma; by reaction ion etching at least one major surface using plasma and a reactive gas; or by ion beam etching the at least one major surface. The removing step involves removing outer carbon atomic layers of the carbon fibers forming both the first and second major surfaces such that the interior of the gas diffusion device is fluorinated and both the first and second major surfaces are not fluorinated.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The glass substrate is alkali free glass containing 50-66 %mass (preferably 58-66 %mass) silica, 10.5-24 %mass (preferably 15-22 %mass) alumina, 0-12 %mass (preferably 5-12 %mass) boron trioxide, 0-8 %mass magnesium oxide, 0-14.5 %mass (preferably 0-9 %mass) calcium oxide, 0-24 %mass (preferably 3-12.5 %mass) strontium oxide and 0-13.5 %mass (preferably 0-2 %mass) barium oxide. The total content of magnesium oxide, calcium oxide, strontium oxide and barium oxide is 9-29.5 %mass, preferably 9-18 %mass.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin of resin layer is silicone resin. The silicone resin is reaction hardened material of organo alkenyl polysiloxane and organo-hydrogenpolysiloxane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The solid bases comprise barium oxide or a coating with barium oxide.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The first filter body is made of a metal mesh, metal foam, or ceramic foam, and comprises a solid acid; the first filter body is made of a Bronsted acid, a Lewis acid, or tungsten, or is coated with a Bronsted acid, a Lewis acid or tungsten oxide; or the first filter body is made of zirconium coated with tungsten oxide or zirconium oxide. The filter comprises a second filter unit (2), which is connected downstream to the first filter unit in an exhaust gas stream. The second filter unit comprises a second filter body with a large specific surface having solid bases. The second filter body is made of a metal mesh, metal foam or ceramic foam. The second filter body is aluminum hexa-aluminate. A space (3) is provided below the second filter unit for receiving chromium flakes. The space is designed such that the gas stream flows in the direction of gravity or perpendicular to the gravity, and is deflected against gravity in the space. The power generating unit is a decentralized fuel cell, a decentralized burner, or a decentralized combustion engine. The power generating unit comprises an exhaust gas heat exchanger for using the exhaust gas heat. The filter is arranged before the exhaust gas heat exchanger in the flow direction of the exhaust gas. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The content of the carbon in the silica membrane is 1000 ppm or less. Preferred Definitions:    R=vinyl, acryloyl, methacryloyl or allyl.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Component: The image display unit is touch panel.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The liquid photocurable resin composition further comprises fluorescent substance (C). The fluorescent substance is pyrene, benzopyrene, perylene, anthracene, naphthalene, phenanthrene, or coumarin. The content of fluorescent substance with respect to 100 parts mass ethylenically-unsaturated bond-containing component (A) is 0.001-2 parts mass. Preferred Properties: The fluorescent substance (C) has excitation wavelength of 300-400 nm, and fluorescence wavelength of 350-450 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer (a) is urethane polymerized component having (meth)acryloyl group. The content of polymer (a) in ethylenically-unsaturated bond-containing component (A) is 60-95 %mass.
TECHNOLOGY FOCUS - BIOTECHNOLOGY - Preferred Method: The method involves utilizing 1 l base culture medium comprising 10 g peptone, 5 g beef extract and 5 g sodium chloride, where the culture medium has pH 7.6. The enrichment culture purification is carried out at 30 degrees C continuously for 2 days. The method involves processing the microbial liquid through UV rays for 1 minutes, 3 minutes, 5 minutes, 7 minutes, and 9 minutes, respectively. The method involves processing the microbial liquid through ultrasonic waves for 30 seconds, 60 seconds, 90 seconds, 120 seconds, 150 seconds, and 180 seconds, respectively and changing frequency of ultrasonic process with respect to time interval.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The nickel precursor powder is chosen from nickel citrate, nickel acetate, nickel acetylacetonate, nickel acrylate, nickel chloride, nickel nitrate, nickel fluoride, nickel methoxide, nickel ethoxide, nickel propoxide and nickel butoxide.
EXAMPLE - Expanded PTFE membrane was prepared with mass per area of 7 g/m thickness of 20 microns, and porosity of at least 85%, and a longitudinal matrix tensile strength of 67 MPa, and a transverse matrix tensile strength of 76 MPa. Concentrated catalyst ink consisting of platinum on a carbon support was then diluted with type 1 ion exchange material to give a concentration of 0.8 wt.% platinum based on dry ionomer solids. This ion exchange material solution was coated on a polyethylene naphthalate (PEN) film stretched onto a glass plate using a drawdown blade on which the coating gap can be adjusted at 1-10 mil. For this first coating, the gap was adjusted to 0.0038 inches (0.00965 cm). The expanded PTFE membrane was then stretched over the wet coating and allowed to infiltrate. After infiltration, it was dried for 20-60 seconds with a hair drier. Then, a second coating of the same ion exchange material solution was applied with a 0.0019 inch (0.00483 cm) gap set on the draw bar. The second coating was then also dried with a hair drier for 20-60 seconds. This membrane was placed in a 160 degrees C air furnace for 3 minutes and then removed to cool. The membrane was then removed from the PEN backer being careful not to stretch it severely. The measured platinum loading of the membrane was 0.015 mg/cm2 and the final thickness of the solid polymer electrolyte was 18 microns.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal oxide is made of type molybdenum oxide, vanadium pentoxide, tungsten oxide, indium tin oxide, gallium zinc oxide, indium zinc oxide, and aluminum zinc oxide.
Preferred Definitions:    R1-R3=methyl, ethyl, n-propyl or isopropyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The inorganic filler (D) is calcium carbonate, a titanium oxide and silica, preferably calcium carbonate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The titanium catalyst is of formula (I).R4=1-20C optionally substituted monovalent hydrocarbyl;R5=H or 1-8C optionally substituted monovalent hydrocarbyl;A1,A2=-R6 or -OR6;R6=1-8C optionally substituted monovalent hydrocarbyl;andn=0-3.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The room temperature-hardenable composition further contains silane coupling agent (E) having epoxy group. The weight ratio of(meth)acrylic ester type polymer (A) and polyoxyalkylene-type polymer (B) is 30/70-90/10. The (meth)acrylic-ester type polymer (A) has a alkyl (meth)acrylate monomeric unit (a-1) having 1-2C alkyl group and alkyl (meth)acrylate monomeric unit (a-2) which has 7-20C alkyl group in weight ratio of 60/40-90/10, and has glass transition temperature of 20-100 degrees C. Preferred Definitions:    X,Y'=methoxy;and    a=3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The sealing material contains silicate.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Components: The carbon concentration calculation portion measures carbon-containing gas concentration of the silicon molten-metal interface in the crucible, and calculated the carbon concentration of the silicon molten metal. The control portion of the apparatus reduces the addition amount of the silicon when change rate in the carbon concentration of the silicon molten metal is increased. The crucible has discharge port (11) which transfer at least one portion of the silicon molten metal.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The carbon concentration of the silicon molten metal is 1 ppma or more. The addition amount of the silicon is 91 ppma or less. Preferred Process: The silicon refining method further involves introducing remaining silicon molten metal to a solidification crucible (12).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The materials such as silicon and ceramics are used.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Components: The silicon manufacturing apparatus further has path for moving silicon between the closed space and the exterior space of the airtight container, gate valve (113) in path for allowing the gas to pass through, and gate valve (116) in the path for allowing the silicon to pass through.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The isolation component contains graphite, silicon oxide, silicon nitride, and/or silicon carbide as main component.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of inorganic fiber is 3-10 wt.%. The content of finer powder and coarse powder is 15-40 wt.% and 20-50 wt.%, respectively. The silicon carbide ceramics have mean pore diameter of 2-30 mu m and porosity of 20-70%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The imidazole is chosen from 1,2-dimethyl imidazole, 2-ethyl-4-methylimidazole, 4-ethyl-2-methylimidazole and 1-methyl-4-ethyl imidazole. The content of organic solvent is less than 5 %mass. The polyimide precursor aqueous solution composition substantially does not contain organic solvent. The usage amount of imidazole is 1.6 times mol or more with respect to tetracarboxylic dianhydride. Preferred Properties: The light transmittance of 400 nm in the polyimide film with a film thickness of 10 mu m is 60% or more. The total light transmittance in the polyimide with a film thickness of 10 mu m is 80% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The liquid catalyst contains ferric ions.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The photoactive structure contains photoanodic-based material chosen from titania, strontium titanate and or chemically-reduced strontium titanate coated with hydrogen reduction catalyst containing transition metal.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer mesh is polypropylene, polyethylene, and/or nylon-based material. The conducting polymer is ionomer of sulfonated tetrafluoroethylene-based fluoropolymer-copolymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The volume ratio of HNO3/HF/H2O is 1-3:3-8:3-5. Preferred Components: The mixed acid solution can be replaced by HF and oxidizing agent. The oxidant is nitric acid, hydrogen peroxide, potassium permanganate or chromic acid. The silicon solar cell is monocrystalline silicon solar battery or polycrystalline silicon solar battery.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of the nanoparticle comprises: (a) adding copper-zinc-tin-metal salt into alkyl mercaptan and organic solvent to obtain mixture, and heating the mixture to obtain solution A; (b) adding double organic selenium ether into organic solvent to obtain mixture, and heating the mixture to obtain solution B; and (c) mixing the solution A and the solution B to obtain mixed solution, and heat preservation of the mixed solution at 200-320 degrees C. Preferred Method: The step (a) and (b) are carried out at 50-150 degrees C for 1 minute to 1 hour. The step (c) is carried out at 5-15 degrees C per minute for 5 minutes to 2 hours. Preferred Components: The copper-zinc-tin- selenium-sulfur isotope nanoparticle is in form of a football shape, cylindrical or fusiform shape. The copper-zinc-tin- selenium-sulfur isotope nanoparticle has an average particle size of 10-80 nm. The copper salt is copper monovalent salt. The zinc salt is divalent zinc salt. The tin salt is bivalent tin salt. The volume ratio of the copper to zinc to tin to metal salt to alkyl mercaptan is 2.5-3.1:1.25-1.55:1.25-1.55:2-10. The molar ratio of the organic selenium ether to copper salt is 10-12.4:2.5-3.1. The alkyl mercaptan is of formula (CnH2n+1SH).n = 11-17.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic solvent is oleylamine, octadecene or triphenyl phosphine or tributyl phosphine.
SPECIFIC COMPOUNDS - 468 Carbazole derivatives (I) e.g. 4-(9-(9,9-diphenyl-9H-fluoren-2-yl)-9H-carbazol-3-yl)-N,N-diphenylaniline of formula (Ia), N-(4-(9-(9,9-diphenyl-9H-fluoren-2-yl)-9H-carbazol-3-yl)phenyl)-N-phenylnaphthalen-1-amine, N-(4-(9-(9,9-diphenyl-9H-fluoren-2-yl)-9H-carbazol-3-yl)phenyl)-N-phenylnaphthalen-2-amine, N-(4-(9-(9,9-diphenyl-9H-fluoren-2-yl)-9H-carbazol-3-yl)phenyl)-N,4-diphenylaniline and N-(4-(9-(9,9-diphenyl-9H-fluoren-2-yl)-9H-carbazol-3-yl)phenyl)-N,5-diphenylthiophen-2-amine are specifically claimed.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The basic raw material is selected from a group consisting of silicon, germanium, sapphire, silicon nitride and diamond.    TECHNOLOGY FOCUS - METALLURGY - The method utilizes a sacrificial layer that is made of aluminum, titanium and/or zirconium based sol.    TECHNOLOGY FOCUS - POLYMERS - The viscous-liquid two-component material is polydimethylsiloxane (PDMS).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The liquid metal or metals comprises an indium-gallium mixture. The solid metal is copper in a form of powder. The liquid metal comprises gallium. The mixture comprises liquid gallium, copper in the form of powder, shot, granules or pieces, indium in a form of powder, shot, granules or pieces, a liquid gallium-indium alloy, selenium in a form of powder, shot, granules or pieces, selenide compounds of copper, indium and/or gallium in a form of powder, shot, granules or pieces, materials including sodium, sulfur or aluminum in element or compound form contributing to the efficiency of CIGS solar cells when incorporated in the composition of a CIGS absorber layer, sulfur-containing compounds of copper, indium and/or gallium in a form of powder, shot, granules or pieces, where sulfur-containing compounds are added to a sulfur content of the sputtering target comprised of a CIG alloy or a CIGS composition for contributing to the sulfur content of a thin layer sputtered from the sputtering target, and aluminum-containing alloys or compounds of copper, indium, gallium, sulfur and/or selenium in a form of powder, shot, granules or pieces, where aluminum-containing alloys or compounds are added to an aluminum content of the sputtering target comprised of the CIG alloy or the CIGS composition for contributing to the aluminum content of a thin layer sputtered from the sputtering target. The flat tray structure is made of copper or aluminum alloy or stainless steel.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The poly Schiff base is of formula: =(=N-R1-N=CH-R2-CH=)n=. The organic solvent is chosen from tetrahydrofuran, chloroform N,N-dimethyl bisamide, or N-methyl pyrrolidone.n=1-100;R1=group chosen from 10 groups e.g. o-xylene, m-xylene, p-xylene, N-(4-methylphenyl)-N-(4-(4-((4-methylphenyl)(naphthalen-1-yl)amino)phenyl)phenyl)naphthalen-1-amine, or 4-(4-(cyclohexa-1,3-dien-1-yl(4-methylphenyl)amino)phenyl)-N-(4-methylphenyl)-N-phenylaniline;andR2=group chosen from 10 groups e.g. N,N,N-triphenylamine, 2,5-dimethylthiophene, o-xylene, m-xylene or p-xylene.
TECHNOLOGY FOCUS - METALLURGY - Preferred Properties: The copper-gallium alloy sputtering target has average grain size of 1-20 microm, porosity of 1% or less and 3-point bending strength of 200 MPa or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Arrangement: 50% Or more (preferably 70% or more, more preferably 90%) of total weight of the graphene is perpendicularly or incliningly arranged on the layer containing the polymer. Preferred Composition: The graphene is p types-doped graphene. Preferred Process: The p types-doped graphene is doped with dopant(s) chosen from nitric acid, hydrochloric acid, phosphoric acid, acetic acid and sulfuric acid.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer is polymer which is tinged with a negative charge, preferably poly(styrene sulfonate), poly(methacrylic acid), polymethyl (meth)acrylate, polymaleic acid, poly(ethylene oxide), poly(vinyl sulfate), poly(vinyl sulfonate), poly(3-sulfopropyl methacrylate), poly(acrylamide 2-methyl- propane sulfonate) and polyvinyl alcohol, more preferably poly(styrene sulfonate). Preferred Process: During manufacture of composite component, conductive substrate after coated with layer containing polymer is immersed in dispersion liquid. Preferred Condition: The voltage of (-1) V to (-5V) (preferably (-1.5) V to (-4) V, most preferably (-2) V to (-4) V) is applied using a constant voltage anodizing process. Preferred Property: The ratio electrostatic capacitance of composite component on which voltage is applied is 2-100 times ratio electrostatic capacitance of composite component on which does not apply voltage.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises fabricating nano-sized particles of the transparent conductive oxide powders into a transparent conductive oxide sputtering target after the step (h). The precipitate cake is dried with a spray drying process or a heat drying process at lower than 80 degrees C. The co-precipitation precursor hydroxide powders is calcined at 500-1200 degrees C for 2-10 hours. The first pH value is 0-4.5, and the first aging process is undertaken for 3-24 hours. The second pH value is 6-9.5, and the second aging process is undertaken for 6-72 hours. The second precipitation solution is filtered with a centrifugal filtering process or a pressure filtering process. Preferred Components: The first metal and second metal are indium, zinc, gallium, aluminum, tin, antimony or metal salts including indium nitrate, zinc nitrate, gallium nitrate, aluminum nitrate, tin nitrate, indium chloride, zinc chloride, gallium chloride, aluminum chloride or tin chloride. The solvent is nitric acid, hydrochloric acid, a nitric acid aqueous solution, a hydrochloric acid aqueous solution or water. The precipitant is ammonium hydroxide, sodium hydroxide or potassium hydroxide. In the precipitate cake, nitrate anion has a concentration of lower than 500 parts per million (ppm), and chloride anion has a concentration of lower than 500 ppm. EXAMPLE - None given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The carbonization process is performed by interposing laminated component between graphite sheets. The content of carbonaceous filler with respect to solid content which removed the volatile substance from the mixed solution is 1-11 %mass. Preferred Properties: The carbon thin plate has nitrogen gas permeability of 2x 10-12-4x 10-7 cc/cm2.second, when thickness of plate is 0.5-2.4 mm. The carbon thin plate has nitrogen gas permeability of 2x 10-11-8x 10-7 cc/cm2.second, when thickness of plate is 0.4-2.3 mm.    TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Composition: A paper containing 2-12 %mass carbonaceous filler is used for impregnation process.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The CZTS-type compound semiconductor substituted by bivalent ion element.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of cadmium metal powder and tellurium metal powder is 1:2-2:1. The powder mixture has size of 100 meshes or less. Both the cadmium metal and tellurium metal has purity of 99.99% or more. The cadmium telluride compound is undoped polycrystalline cadmium telluride. The evaporation source substrate is graphite plate or quartz plate.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The high molecular polymer is polyethylene, polypropylene, polytetrafluoroethylene or polyimide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The size of magnesium powder and nickel powder is 200 meshes, each respectively. Preferred Composition: The ratio of content of magnesium powder to nickel powder is 2:1. Preferred Process: The ball-milling is carried out in alcohol medium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: After adding lead-containing inorganic salt and tellurium-containing compound, concentration of lead element and concentration of tellurium element is 0.01-0.1 molL-1 and 0.01-0.1 molL-1 respectively, and atomic ratio of lead and tellurium is 1:1. The lead-containing inorganic salt is chosen from lead nitrate or lead acetate. The tellurium-containing compound is chosen from tellurium dioxide, sodium tellurite and potassium tellurite. The alkali is sodium hydroxide, potassium hydroxide or rubidium hydroxide. The alkali concentration in solution (S1) is 0.1-0.5 mol/L. The concentration of graphite is 0.1-1.5 gL-1. The reducing agent is chosen from potassium borohydride or sodium borohydride. The molar ratio of tetraborohydride anion and divalent lead ion is 12-16.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Component: The heat-preservation device is water bath or oil bath.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The bismuth-containing inorganic substance is chosen from bismuth chloride, bismuth nitrate and bismuth acetate. The strong acid is chosen from hydrochloric acid, sulfuric acid, nitric acid and perchloric acid. The addition amount of graphite oxide is 0.2-1.5 gL-1.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The atomic ratio of bismuth in bismuth-containing inorganic substance and sulfur in sulfur-containing compound is 2:3. Bismuth element concentration in the sol-gel is 0.01-0.04 molL-1. The sulfur-containing compound is chosen from sodium thiosulfate, thiourea and thiacetamide. The sulfur element concentration in the sol-gel is 0.015-0.06 molL-1. The concentration of the strong acid in the sol-gel is 0.5-2 molL-1. The reducing aqueous solution is water solution containing 0.2-2 molL-1 potassium borohydride or sodium borohydride, or 50-85% hydrazine hydrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The centrifuging step is carried out at a speed of 8000-10000 revolutions per minute. The drying step is carried out at a temperature of 20-60 degrees C. Preferred Components: The copper, zinc and tin are hydrochloride, sulfate, nitrate, acetate or acetylacetone salt.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alkanolamine is triethanolamine, diethanolamine, diethylene glycol amine, dimethylethanolamine, N-methylethanolamine or dimethylethanolamine.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polyol is polyethylene glycol, poly alcohol or glycol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of nitric acid and hydrofluoric acid contained in the cleaning solution is 40 %mass and 0.05 %mass, respectively.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): The soluble polyaryletherketone is prepared by:(A) adding solvent diphenyl sulfone and sulfolane in container, raising temperature, and adding 4,4'-difluorobenzophenone, biphenyl diphenol and phenolphthalein;(B) adding sodium carbonate and potassium carbonate into reaction system, continuously stirring for 20-40 minutes at 100-150 degrees C to produce sodium salt and potassium salt, increasing reaction system temperature to 160-180 degrees C, reacting for 20-40 minutes, and raising the temperature to 220-240 degrees C for 15 minutes;(C) adding chain extender diphenol into the reaction system; and(D) polymerizing, adding acetone, ethanol and distilled water to wash, and drying to obtain product.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The first fluororesin layer comprises 5-45 wt.% of the first fluororesin material and 55-95 wt.% of the first adhesive material, the second fluororesin layer comprises 55-95 wt.% of the second fluororesin material, and the second fluororesin layer comprises 5-45 wt.% of the second adhesive material. The weight ratio of the second fluororesin material related to the first fluororesin material is 1.2-19, preferably 1.3-12. The weight ratio of the second adhesive material related to the first adhesive material is 0.05-0.9, preferably 0.4-0.9. The multilayer fluororesin film further comprises a third fluororesin layer formed on the second fluororesin layer, where the third fluororesin layer comprises a third fluororesin material and a third adhesive material, and the weight ratio of the third fluororesin material related to the third adhesive material is 2-19. The weight ratio of the first fluororesin material related to the first adhesive material is 0.05-0.5, and the weight ratio of the second fluororesin material related to the second adhesive material is 0.6-1.5. The weight ratio of the third fluororesin material related to the second fluororesin material is 1.1-2.4. The weight ratio of the third adhesive material related to the second adhesive material is 0.08-0.75. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The lanthanum hexaboride film is obtained by forming 0.5 %mass or less oxygen elemental content, nitrogen element content 0.1-3 %mass and 0.1 %mass or less carbon elemental content into a film using lanthanum hexaboride sintered compact as target. The impurity contained in the lanthanum hexaboride sintered compact is chosen from lanthanum carbide, boron carbide, lanthanum oxide, boron oxide, lanthanum boron composite carbide, and lanthanum boron complex oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The working fluid comprises ammonia and hydrogen.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is diether glycol, dimethyl ether, or diethyl ether.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polar ionic groups attached to nonpolar chains are sulfonated perfluorinated polymer or sulfonated polymer. The ion exchange membrane contains copolymer of tetrafluoroethylene and perfluoro-3,6-dioxa-4-methyl-7-octene-sulfonic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aliphatic hydrocarbon monoamine (a) is 6-12C alkyl monoamine. The aliphatic hydrocarbon monoamine (b) is 2-5C alkyl monoamine, preferably butylamine. The silver compound is silver oxalate. The content of aliphatic hydrocarbon monoamine (a) is 10-65 mol% with respect to total content of amine mixed solution. The content of aliphatic hydrocarbon monoamine (b) is 5-50 mol% with respect to total content of amine mixed solution. The content of aliphatic hydrocarbon monoamine (c) is 15-50 mol% with respect to total content of amine mixed solution. The amine mixed solution further contains aliphatic carboxylic acid (d). The total content of monoamine (a), monoamine (b) and diamine (c) is 1-20 mol with respect to 1 mol of silver atoms of the silver compound.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Processes: Solvent is removed by heating solution or liquid dispersion. Pressure in electrochemical device structure containing solution or liquid dispersion is changed.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Solvent is solvent which has boiling point of less than or equal to 200 degrees C, such as linear carbonate solvent and/or nitrile solvent. Solution or liquid dispersion is gel-like liquid which contains electrolyte, gelatinizer, and solvent or slurry-like liquid which contains electrolyte dissolved in solvent and gelatinizer dispersed in solvent. Gelatinizer is gelatinizer with low molecular weight.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The lithium cation is present in an amount of 1-55 (preferably 46) mole%. The sodium cation is present in an amount of 0.1-10 (preferably 4) mole%. The potassium cation is present in an amount of 15-30 (preferably 22) mole%. The cesium cation is present in an amount of 10-35 (preferably 25) mole%. The strontium cation is present in an amount of 0.1-5 (preferably 3) mole%. The chloride anion is present in an amount of 100 mole%. Preferred Composition: The composition has a melting point of less than 300 degrees C and thermal stability limit of greater than 700 degrees C. EXAMPLE - No suitable example given.
EXAMPLE - 89.1 Parts mass N-monoethyl ethanolamine was dripped in 186.2 parts mass Taycatox 110 (RTM: xylene sulfonic acid) and reacted for 1 hour to obtain 275.3 parts mass monoethyl monoethanol ammonium xylene sulfonate liquid at 25 degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The chemical method utilizes sulfuric acid, nitric acid, potassium hydroxide or sodium hydroxide solution, and hydrochloric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The oxygen source is a mixed gas containing oxygen and nitrogen, and phosphorus oxychloride, where the volume ratio of oxygen and nitrogen mixed gas and phosphorus oxychloride is 3:13. The concentration of phosphorus impurities in the solar cell is less than 1021 pts./cc. Preferred Method: The heating rate in the steps (b) and (c) are respectively 5-10 degrees C/minute. The gas flow rate of nitrogen with phosphorus oxychloride in the steps (a) and (c) is 800-1200 sccm, preferably 1000 sccm. The process of phosphorus diffusion in the step (a) is carried out for 5-10 minutes. The oxygen flow rate in the step (a) is 300-800 sccm. The process of increasing the temperature is carried out for 5-10 minutes. The diffusion in the step (a) is carried out at 750-800 degrees C, introducing oxygen at a flow rate of 500-800sccm, forming silicon dioxide layer on the surface of the silicon chip for 5 minutes until the thickness of silicon dioxide layer is 50-60 nm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The ethanol solution is dissolved in absolute ethyl alcohol to prepare solution of biomass derived carbon. The drying step is carried out at room temperature to 100 degrees C. The heat treatment is carried out at 600-1000 degrees C for 6 hours. Preferred Components: The ethanol solution has concentration of 0.01-5 wt.%. The atmosphere containing hydrogen is pure hydrogen, mixed gas of hydrogen and nitrogen or helium or argon gases, where the hydrogen has volume percentage of greater than 75%. The alcohol solvent is ethanol (preferred), methanol, n-propanol, isopropyl alcohol, n-butyl alcohol, or n-amyl alcohol or ethylene glycol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The substrate material is sheet-shaped or powder of single crystal silicon, polysilicon, mica or quartz.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The first dielectric layer, the second dielectric layer and the interlayer are fabricated from a material selected from a group consisting of silicon oxide, silicon nitride, silicon nitride hydride, silicon oxynitride, silicon oxycarbonnitride, silicon oxycarbide, titanium oxide, tantalum oxide, lanthanum oxide, Hafnium oxide, titanium nitride, tantalum nitride, hafnium nitride, hafnium oxynitride, lanthanum nitride, lanthanum oxynitride, chlorinated silicon nitride, chlorinated silicon oxide, amorphous silicon, amorphous silicon carbide, aluminum oxide, aluminum nitrite or aluminum oxynitride.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The total solid content of the ceramic particles is 15-40 %mass. The content of the ceramic particles is 25-100 parts mass with respect to 100 parts mass binder. The ceramic particles are zinc oxide particles having volume average particle diameter of 0.1-1 mu m. Preferred Properties: The volume average particle diameter of the secondary particles is 0.4-50 mu m. The coating film formed by spray-coating thermal-radiation coating material has thermal emissivity of 0.93 or more in wavelength of 2-22 mu m.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thermal-radiation coating material further contains water and organic solvent chosen from polyalkylene glycol, polyalkylene glycol alkyl ether and polyalkylene glycol ester. The content of the organic solvent is 20 mass % or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dielectric layer is selected from silicon oxide layer, silicon nitride layer, silicon oxynitride layer, etc.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The chemical passivation layer comprising aluminum dioxide is situated on surface of silicon wafer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The superacid has a pKa value of -3 to -15. The superacid is disulfuric acid, fluorosulfuric acid, trifluoromethanesulfonic acid or fluoroantimonic acid. The solvent is water or a fluorinated oil. The weight ratio between the superacid and solvent is 25:75-95:05.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The step (b) is carried out for a period of 1-30 (preferably 5-30) minutes. Preferred Components: The polymer membrane comprises: a polymer having groups of azoles, polyazoles, oxazoles or thiazoles; polybenzimidazole (PBI) polymers containing at least one monomer of tetrafluoroethylene (TFE), hexafluoropropene (HFP) or vinylidene fluoride (VDF); polymers of poly (co-VDF-HFP) (polyVDF-HFP), perfluoroalkoxy (PFA), poly(ethylene-co-tetrafluoroethylene) (polyETFE); poly perfluoro(ethylene-propylene) (polyFEP); aromatic polyether copolymer; copolymers containing pyridine units; polyimides having a structure of formula (I); polybenzoxazoles having a structure of formula (II); and/or aromatic polyamides having a structure of formula (III). The proton exchange membrane has a conductivity of 20-180 mS/cm. N.B. R and n are not defined.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aliphatic hydrocarbon-monoamine (A) is 6-12C alkyl monoamine. The aliphatic hydrocarbon-monoamine (B) is 2-5C alkyl monoamine, preferably butyl amine. The silver compound is silver oxalate. The total content of component (A) and component (B) with respect to 1 mol of silver atoms of silver compound is 1-72 mol.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The organic layer (L2) has film thickness of 1-10 nm. Preferred Layer: The organic layer (L1) is light-emitting layer of organic electroluminescent element. The light-emitting layer (L2) is a positive hole transport layer or an electron carrying layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal compound further contains magnesium, calcium, sodium, potassium, lithium, a rubidium, a cesium, beryllium, strontium, barium, and/or radium as a metallic element. The content of the metal compound is 5-100 %mass.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metallic compound is a compound containing magnesium, calcium, sodium, potassium, lithium, rubidium, cesium, beryllium, strontium, barium and/or radium. The content rate of metallic compound in n-type diffused layer formation composition, is 0.01-50 %mass. The metallic compounds are solid particles at normal temperature, and have volume average particle diameter of 0.01-30 mu m. The compound containing donor element, contains glass particle, phosphorus trioxide or phosphorus pentoxide, and glass component substance(s) chosen from silica, potassium oxide, sodium oxide, lithium oxide, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, vanadium pentoxide, tin oxide, zirconium oxide, and/or molybdenum oxide. The content of glass particles is 1-80 %mass. The total content of phosphorus trioxide and phosphorus pentoxide in the glass particles is 0.01-10 %mass. The n-type diffused layer formation composition further contains an organic binder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content rate of halide in the light-emitting element material e.g. 4,4',4''-(benzene-1,3,5-tolyl)tri-dibenzothiophene is set to 2% or less. The content rate of halide in the light-emitting element material after the sublimation purification process is 0.1% or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catalyst composition comprises the metal oxide according to high-resolution transmission electron microscopy. The catalyst composition is free from metal oxide measured according to X-ray diffraction. The mass activity of the catalyst composition is greater than 200 A/g platinum. The metal is niobium. The metal oxide is niobium pentoxide. The catalyst composition comprises platinum-cobalt-niobium alloy and niobium pentoxide. The metal oxide precursor is a niobium oxide of formula (NbOx).x = 2-5.Preferred Method: The method further comprises depositing a co-precursor on the metal oxide precursor-carbon hybrid support, or on the carbon support.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The carbon in the carbon support is a carbon black, acetylene black, activated carbon, natural graphite or synthetic graphite. EXAMPLE - Niobium oxide precursor of formula (NbO2.5) (I) was deposited on carbon support and was heated. The platinum was deposited on compound (I)-carbon hybrid support and was then heated. A niobium oxide sol solution was prepared using niobium ethoxide precursor in a mixture of 2-propanol with a strong acid as catalyst. The niobium oxide was deposited on Cabot BP 2000 (RTM: Carbon black). The sample was heated in argon atmosphere at 400 degrees C for 1 hour, to obtain amorphous compound (I). The amorphous compound (I)-carbon hybrid was covered with a sol-gel deposition of platinum(II) acetylacetonate. The obtained product was then heated in a hydrogen atmosphere at 800 degrees C for 1 hour to produce platinum- niobium alloy comprising catalyst composition.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - N-sub and P-type silicon single crystal or polycrystalline layer form silicone PN junction. The conductive material is made of aluminum, gallium, boron and arsenic.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The D-fructose solution is prepared by weighing D-fructose, then pouring into a container, and adding super-pure water to the D-fructose and then dissolving to obtain colorless clear and transparent solution. The sodium hydroxide is prepared by weighing sodium hydroxide and then pouring into a container, and adding super pure water and then dissolving to obtain colorless clear and transparent. The sodium hydroxide solution and fructose solution are present in a molar ratio of greater than 1:50. The standing step is carried out at a time period of dozens of minutes to obtain a yellow clear and transparent carbon quantum dot solution that is filtered to obtain a pure carbon quantum dot solution. The carbon quantum dot solution is dialyzed for 24 hours. The container is cleaned by ultra pure water for 30 minutes and then dried.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: The substrate is glass, ceramic, plastic and/or paper.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The chemical vapor deposition is plasma-enhanced chemical vapor deposition or atmospheric pressure chemical vapor deposition. Preferred Process: The phosphorus source to silicon source ratio is 1:100-20:100 and the silicon source to oxygen source ratio is 1:1-1:6. Preferred Components: The silicon source is trichlorosilane, silicon tetrachloride, disilane and/or silane. The phosphorus source is phosphorus oxychloride and/or phosphine. The oxygen source is nitrogen or argon with gaseous deionized water and/or oxygen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The modified carbon carrier: is obtained by two-step liquid phase oxidation and provided with oxygen-containing functional groups; and has pore size of 5-30 nm, and specific surface area of 50-600 m2 g-1. The oxidant in the step (i) is potassium persulfate, sodium persulfate, ammonium persulfate, potassium chlorate, hydrogen peroxide or nitric acid. The oxidant in the step (ii) is potassium permanganate, potassium dichromate, potassium chlorate, nitric acid or hydrogen peroxide. The mass ratio of carbon carrier, water-absorbing agent, oxidant in the step (i) and oxidant in the step (ii) is 1:1.2-1.8:0.5-2:1.5-10, where the water-absorbing agent is phosphorus pentoxide. The amount of the sulfuric acid or phosphoric acid solution in the step (i) is 12-15 times the mass of carbon carrier. The amount of the sulfuric acid or phosphoric acid solution in the step (ii) is 50-80 times the mass of carbon carrier. The mass percentage of the sulfuric acid or phosphoric acid solution is 95-98%. In the step (iii), the complexing agent is EDTA, sodium citrate, cyclohexanediamine tetraacetate, acetylacetone or sodium tartrate. The reducing agent is sodium borohydride, ethylene glycol, citric acid or formic acid. In the step (iii), the molar ratio of palladium chloride and complexing agent is 1:1. In the step (iii), the amount of modified carbon carrier added is 0.067-5.4 times the mass of palladium chloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The organic palladium catalyst is present in an amount of 1-20%. The organic palladium catalyst is tetra triphenylphosphine palladium, palladium acetate, tris dibenzylideneacetone palladium, and/or bis triphenylphosphine palladium chloride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises carrying out Suzuki coupling reaction of 9-(4-bromophenyl)-9-(3-(9-(4-bromophenyl)fluoren-9-yl)phenyl)fluorene compound of formula (A) and (10-phenyl-9-anthryl)boronic acid (B) and then neutralizing using organic palladium catalyst in a presence of alkaline solution and organic solvent. Preferred Method: The Suzuki coupling reaction is carried out at 80-110 degrees C for 36-60 hours. (A) is obtained by dissolving 2-bromo-biphenyl compound of formula (D) in organic solvent and then dropping n-butyllithium to react at -78 degrees C to -70 degrees C and adding (3-(4-bromo-benzoyl)-phenyl)-(4-bromo-phenyl)-methanone (C) to react. Preferred Components: The mole ratio of (A) and (B) is 1:2.1-1:3. The organic solvent is benzene, toluene, tetrahydrofuran or ethyl acetate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The organic palladium catalyst is tetra-triphenyl phosphine palladium, palladium acetate, tris (dibenzylideneacetone) palladium and/or bis-triphenyl phosphine palladium chloride. The alkaline solution is sodium hydroxide solution, potassium hydroxide solution, sodium carbonate solution, potassium carbonate solution, potassium bicarbonate solution, sodium bicarbonate solution or aqueous ammonia.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises carrying out Suzuki coupling reaction of 9-(4-bromophenyl)-9-(3-(9-(4-bromophenyl)fluoren-9-yl)phenyl)fluorene compound of formula (A) and (10-phenyl-9-anthryl)boronic acid (B) and then neutralizing using organic palladium catalyst in a presence of alkaline solution and organic solvent at a temperature of 80-110 degrees C for 36-60 minutes. Preferred Components: The mole ratio of (A) and (B) is 1:2.1-1:3. The organic palladium catalyst is present in an amount of 1-20%. The organic solvent is benzene, toluene, tetrahydrofuran or ethyl acetate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Titanium wire net is anatase and rutile crystal phase structure. Nanorod has average diameter of 50-120 nm and length of 400-600 nm.
Preferred Definitions:    R1=n-hexyl-N-hydroxyethyl, n-hexyl-dimethylamino, n-hexyl-N-oxide-dimethylamino, n-hexyl-quaternary ammonium group, alkoxy, or n-hexyl phosphate group;and    R2=n-hexyl.
TECHNOLOGY FOCUS - POLYMERS - The packaging includes a film made of polyamide, polyurethane and/or polystyrene. The packaging is made from plastic.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The electroconductive film is pyrolytic chemical-vapor deposited film or fluorine-doped tin-oxide film (36). Co-dopant of fluorine-doped tin-oxide film is chosen from phosphorus, boron and mixtures of phosphorus and boron.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ion-exchange membrane is waste ion-exchange membrane (preferably, fluoropolymer cation exchange membrane), and has ion exchange capacity of 0.3 meq/g or more. The ion-exchange membrane is supported with metal oxide chosen from oxide of manganese, element of group IB and element of group 8B.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The climate protection layer (KS) is formed by sputtering boron-doped silicon target containing 5-100 ppm, preferably 20-100 ppm boron. Preferred Composition: The reactive gas used during preparation of transparent climate protection layer comprises carbon dioxide, compressed dry air, oxygen and/or nitrogen.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The fluoromonomer (A) is of formula: CH2=C(-Cl)-C(=O)-Y'-Z-Rf. The monomer (B) is of formula: CH2=CHCOOA1. The monomer (C) is of formula: CH2=C(CH3)COOA2. The aromatic olefin in monomer (C) is of formula: CH2=C(G1)-Ar'(G2)r. The fluorine-containing composition further comprises aqueous medium. The fluorine-containing composition is aqueous dispersion liquid.Y'=-O-, or -NH-;Z=direct bond or bivalent organic group;Rf=1-20C fluoroalkyl;A1=alkyl group of formula: CnH2n+1;n=12-30;A2=linear, branched or cyclic hydrocarbyl;Ar'=aryl;G1,G2=1-10C alkyl, or halo;andr=0-5.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The fluoromonomer (A) is of formula: CH2=C(-X)-C(=O)-Y'-Z-Rf. The monomer (B) is of formula: CH2=CHCOOA1. The monomer (C) is of formula: CH=C(R11)-C(=O)O-R12. The fluorine-containing composition further comprises aqueous medium. The fluorine-containing composition is aqueous dispersion liquid.X=H, monovalent organic group or halo, preferably chloro;Y'=-O-, or -NH-;Z=direct bond or bivalent organic group;Rf=1-20C fluoroalkyl;A1=alkyl group of formula: CnH2n+1;n=12-30;R11=H, 1-4C alkyl, or halo;andR12=linear, branched or cyclic 1-30C alkyl, 6-20C aryl, or 7-25C aralkyl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Monomer: The non-fluorine monomer (b) is chosen from 36 monomers e.g. lauryl acrylate, myristyl acrylate, cetyl acrylate, stearyl acrylate and behenyl acrylate. Preferred Composition: The surface treating agent further contains block forming polyisocyanate and aqueous medium. The cationic surfactant is ammonium salt of formula: (R51)pN+(R52)4-pX-.R51=12C linear and/or branched aliphatic group;R52=H, 1-4C alkyl, benzyl or polyoxyethylene, and number of oxyethylene groups is 1-50;X=group which forms an anion;andp=1 or 2.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The molar ratio of repeating units (a,b) is 0.01/1-10/1. The fluoromonomer (a) is of formula: CH2=C(-Cl)-C(=O)-Y-Z-Rf. The non-fluorine monomer (b) is acrylate ester compound of formula: CH=CR1-C(=O)O-R2, preferably chosen from acrylate (b1) having 12-30C linear or branched hydrocarbon group and (meth)acrylate (b2) having glass transition temperature of 50 degrees C or more. The acrylate (b1) is of formula: CH2=CHCOOA1. The (meth)acrylate (b2) is of formula: CH=CR11-C(=O)O-R12. The fluoropolymer further contains repeating unit derived from a monomer containing a reactive group, preferably hydroxyl group in a molecule as a copolymerizable monomer.Y'=-O- or -NH-;Z=single bond or bivalent organic group;Rf=1-20C fluoroalkyl;R1,R11=halo or 1-4C alkyl;R2=1-30C aliphatic group, 1-30C aromatic group or 1-30C aliphatic-aromatic group;A1=alkyl (CnH2n+1);n=12-30, preferably 12-22;andR12=1-30C linear, branched or cyclic aliphatic group, 6-20C aromatic group or 7-25C aromatic or aliphatic group.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Apparatus: The carbon dioxide recovery system has pure oxygen feeder for supplying pure oxygen, carbon dioxide separation apparatus and high temperature gas unit. The catalyst oxidizer has a catalyst layer and cold gas portion. The flow rate of exhaust gas supplied from catalyst oxidizer is uniformly maintained and distributed with pressure difference, and hot spotting is minimized.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Production of silicon block is continued when conductivity type of silicon block is the same as the preset conductivity type and specific resistance value is in the range of reference value. Production of silicon block is discontinued when conductivity type of silicon block is different from the preset conductivity type and specific resistance value is not in the range of reference value. Preparation of silicon block is performed using crucible. Crucible with silicon raw material is replenished. Silicon block is deposited on surface of substrate which is cooled by inserting substrate for cooling in silicon melt solution by which silicon raw material is melted. Preferred Parameters: Reference value is 0.5-5 Omega .cm. Preferred Compositions: Silicon raw material contains less than or equal to 0.5 ppm boron and less than or equal to 0.5 ppm phosphorus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compound: The modification-catalyst layer contains a copper-zinc based catalyst.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The secondary structure of carbon nanostructure is tangled structure in which several carbon nanostructures are entangled, and has inside diameter of 0.1-30 mu m, and contrast ratio of 90% measured by electron micrograph. The secondary structure of carbon nanostructure has excellent diameter of 1-100 mu m. The length of tube shape is 5-10000 mu m. The particle diameter (D50) of supporter during milling process, is 0.1-1.5 mu m. Preferred Component: Carbon nanostructure is carbon nanotubes, carbon nano load, carbon nano hair or carbon nanofiber, preferably carbon nanotubes, and has diameter of 0.1-200 nm and length of 1 mu m to 10 mm. The secondary structure of carbon nano structure is made of single-walled carbon nanotubes, double-walled carbon nanotubes and/or less than 10 wt.% multi-walled carbon nanotubes. The three-dimensional shape of aggregate of secondary structure of carbon nanostructure, is spherical shape, ellipsoid shape, cylindrical shape or frusto-conical shape. The supporter is aluminum-based supporter. The catalyst metal is cobalt or molybdenum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The carbon material is selected from one of active carbon, carbon nano tube, carbon, and active carbon fiber or carbon aerogel. The lithium ion material is selected from one of lithium iron phosphate, lithium-nickelcobalt-manganese-oxygen, lithium cobalt oxide, lithium manganese oxide, lithium cobalt, lithium manganese phosphate, lithium titanate, lithium vanadate, lithium nickel manganese oxide, lithium nickel cobalt oxygen, lithium vanadium oxide or lithium iron silicate.    TECHNOLOGY FOCUS - METALLURGY - The silicon alloy nano-particles are selected from one of graphene composite material, cobalt alloy nano-particles, silicon-chromium alloy nanometer particle, silicon manganese alloy nano-particles, silicon-nickel alloy nano-particles, silicon alloy nano-particles, alloy nanoparticles, silicon, alloy nanoparticles and SnBeta alloy nano-particles. The positive plate is made of positive electrode active material that is made of carbon material and lithium ion material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compound: The compound semiconductor is of formula: Cu2ZnSnS4. The heat processing is carried out at 250 degrees C or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of the fatty amine in the mixed solvent is 1.3-22 vol.%, preferably 2.5-7 vol.%. The fatty amine is oleyl amine. The aliphatic thiol is dodecane thiol. The alkyl group contained in the dialkyl dithiocarbamic acid compound is ethyl group.
TECHNOLOGY FOCUS - METALLURGY - Preferred Method: The ultrasonic cleaning is performed using cleaning agent for 5-10 minutes. The natural oxide film is removed using mixed solution of hydrogen fluoride, nitric acid, and deionized water at volume ratio of 1:4:5. The secondary anode oxidation comprises first anode oxidation to remove primary oxide layer and secondary anode oxidation. The primary anode oxidation is performed using electrolyte consisting of 0.5 wt.% ammonium fluoride and 3.0 vol.% deionized water glycol solution under oxidation voltage of 60 V at room temperature for 1 hour; taking out titanium layer containing titania film; exposing titania plate to deionized water for intense ultrasonic cleaning; and removing first oxide film. The secondary anode oxidation involves oxidizing titanium oxide layer in electrolyte consisting of 0.5 wt.% ammonium fluoride and 3.0 vol.% deionized water glycol solution at oxidation voltage of 60 V at room temperature for 3 hours. The titania plate is calcined at 450-550 degrees C. The coupling step involves immersing titania nanotubes into 0.30 M coupling solution for 30 minutes; removing and rinsing with deionized water; and drying in oven at 60 degrees C for 10 hours. The coupling agent-treated titania nanotube is then immersed to 0.20 M solution of silver nitrate for 5-10 minutes; washed with deionized water; further immersed in solution of 0.15 M sodium borohydride for 5-10 minutes; rinsed with deionized water; and dried. Preferred Component: The titanium plate has purity of greater than or equal to 99.5% and thickness of 0.2-0.3 mm, preferably 0.25 mm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The cleaning agent is acetone, methanol, or isopropanol. The coupling agent is thioglycolic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkali solution is potassium hydroxide or sodium hydroxide. The foreign material comprises silicon oxide, porous silicon or metal ion.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The palladium nanorod has diameter of 50 nm and length of 20-500 nm.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The multi-nozzle pipe and a nozzle are arranged on a delivery roller and arranged between the pipe bodies to adjust a height of the liquid nozzles of a limiting channel. Spraying liquid is directly used to spray on the delivery roller and not directly to a silicon wafer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mass ratio of polyvinylpyrrolidone, sodium palladium chloride, potassium bromide and ethanol during preparation of fuel cell anode is 1:2:20:50. The average spacing between the palladium nanorods is 50-200 nm. Preferred Properties: The palladium nanorods have diameter of 5-20 nm and length of 20-500 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The height and width of the heat insulation strip are 100-250 mm and 80-120 mm, respectively. The heat insulating strip is made of high temperature resistant carbon felt. The electro active doping agent is boron, phosphorus or gallium nitride. In step (3), the silicon material and the electric active doping agent are melted at 1500-1560 degrees C using a heater power supply, and the heat insulating bottom plate is closed until the raw materials are completely melted. In step (e), heat-insulating bottom plate is opened at speed of 8 mm/hour, the twin area in the silicon sheet of the silicon wafer is present at 80%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The volume ratio of the mixed acid of concentrated sulfuric acid and concentrated nitric acid is 3:1. Preferred Component: The reducing agent is sodium borohydride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of silver fine particles in the silver fine particles dispersion liquid is 40-65 %mass. The aqueous dispersion medium is solvent containing 50 %mass or more water. The ratio of chloride in chloride compound with respect to silver is 0.05-0.3 %mass. The chloride compound is chosen from sodium chloride, ammonium chloride, potassium chloride and calcium chloride. Preferred Property: The average particle diameter of the silver fine particles is 1-100 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mixed gas containing hydrogen gas and nitrogen gas are used in the formation of the quantum dot structure. The nitride type semiconductor in the structure is indium gallium nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The semiconductor consists of silicon.
TECHNOLOGY FOCUS - POLYMERS - The negative connector jig and the positive connector jig are made of a non-conducting material, which is a plastic.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The energy storage device further has intercalation material layer on the carbon nanofibers. The intercalation material layer has feather-like structure. The carbon nanofibers contain stacked-cone structure. The intercalation material layer includes nanofiber/intercalation material complexes, and silicon having nominal thickness of 1-40 mu m. Preferred Properties: The intercalation material has nominal thickness of 0.1-25 mu m. The length of carbon nanofibers are 3-200 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The second diffusion layer are made of silicon. The crystalline phase is made of a polycrystalline material. The impurities of phosphorus, nitrogen, or arsenic are introduced into the first diffusion layer.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Property: The ratio of specific surface area of coated metal powder measured by Brunauer-Emmett-Teller method and specific surface area of coated metal powder measured by laser diffractometry is more than 0.1 and less than 0.3. Preferred Composition: The glass contains bismuth oxide, tin oxide or silica. The content of metal powder before coating glass is 30-70 %mass. The metal powder contains metal having melting point of 250 degrees C or less or its alloy, preferably tin, tin alloy, indium or indium alloy, or tin-bismuth alloy having bismuth content of 15-70 atomic%. The to-be-sealed region of component contains glass, metal or ceramic.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The compound by which the epoxy resin (B) which has aliphatic cyclic structure in a molecule is compound of formula (2). The epoxy resin composition further contains aromatic polyfunctional epoxy resin (C) of formula (3) which has greater than or equal to 3 epoxy group in a molecule, epoxy resins (D) other than aromatic polyfunctional epoxy resin, and curing agent.R3=alkoxy group;m=1-20; andn=1-10 or 1-2. Preferred Definitions:    R2=H.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic fine particles are inorganic fluorescent substance fineparticles.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alicyclic epoxy compound is of formula (I), preferably 7-oxabicyclo(4.1.0)heptan-3-ylmethyl 7-oxabicyclo(4.1.0)heptane-3-carboxylate. The curable epoxy resin composition further contains triazinane-type compound of formula (II), a hardening agent and a hardening accelerator, or a curing catalyst.X=monovalent organic group;andR1,R2=H or 1-8C alkyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The etching agent is aqueous alkali solution-type etching agent. The aqueous alkali solution-type etching agent further contains thio compound and nitrate ion. The content of thio compound of aqueous alkali solution-type etching agent is 0.05-25 weight%. The thio compound is chosen from thiosulfate ion and 1-7C thio compound. Preferred Process: A roughening surface is cleaned in the one or more types of aqueous solution chosen from nitric acid aqueous solution, sulfuric acid aqueous solution and aqueous solution containing sulfuric acid and hydrogen peroxide, and alkaline aqueous solution containing metal hydroxides chosen from hydrohalic acid, alkali metal and alkaline-earth metal. Preferred Property: The average etching amount of roughening process of surface of current collection base material containing aluminum is 0.1-3 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Inorganic membrane contains 5-95 vol.% inorganic laminar compound with respect to total 100 vol.% resin and inorganic membrane. Inorganic laminar compound contains ion e.g. hydrogen ion, ammonium ion, and/or lithium ion which becomes an interlayer.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyolefin microporous film comprises 5-50 pts. wt. polyolefin resin having a weight average molecular weight of more than 1x 106, and 50-95 wt.% polyolefin resin having a weight average molecular weight of less than 1x 106. The polyolefin is polyethylene.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The copolymer has a weight-average molecular weight of greater than or equal to 5 kilo Daltons (kDa), an onset decomposition temperature of greater than or equal to 250 degrees C, an ionization potential of greater than or equal to 4.5 electron volts, an optical band gap of less than or equal to 1.2 electron volts and an electrochemical band gap of less than or equal to 1.7 electron volts. SPECIFIC COMPOUNDS - 4 Compounds (I) are specifically claimed i.e. poly(4,6-bis(3-ethylhexyl-2-thienyl)thieno(3,4-c)(1,2,5)thiadiazole-alt-vinylene) of formula (Ia), poly(4,6-bis(3-ethylhexyl-2-thienyl)thieno(3,4-c)(1,2,5)thiadiazole-alt-phenylene), poly(4,6-bis(3-ethylhexyl-2-thienyl)thieno(3,4-c)(1,2,5)thiadiazole-alt-4,8-bis(2-ethylhexyloxy)benzo(1,2-b:4,5-b')dithiophene) and poly(4,6-bis(3-ethylhexyl-2-thienyl)thieno(3,4-c)(1,2,5)thiadiazole-alt-N-(1-hexyldecyl)dithieno(3,2-b:2',3'-d)pyrrole).    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The gas composition comprises greater than or equal to 1 Group II precursor or their mixture, and greater than or equal to 1 Group VI precursor or their mixture; or gas composition comprises greater than or equal to 1 Group III precursor or their mixture, and greater than or equal to 1 Group V precursor or their mixture.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In the method, the growth of the film occurs at 25-800 degrees C, preferably 500-800 degrees C. The exposure dosage of the precursor gas in each of step (b)-(d) is influenced by the rotation speed of a rotating substrate support. The method further comprises: exposing the substrate to hydrogen plasma before step (d); exposing the substrate to a hydrogen plasma after step (d); measuring at least one film property of the thin film formed on the substrate in a fourth reaction region; and measuring at least one film property of the surfactant layer formed on the substrate in a fourth reaction region. In the method, exposure to at least one surfactant precursor forms a surfactant layer with thickness greater than or equal to to one monolayer. The first reaction region and the second reaction region are the same reaction region. Preferred Components: The surfactant precursor comprises indium, antimony (both preferred), hydrogen, chlorine, bromine, iodine, arsenic, phosphorus, bismuth, lead, tin, germanium, selenium, tellurium, magnesium, cadmium, zinc and/or mercury. The group III precursor gases include at least one of aluminum-containing gases, gallium-containing and/or indium-containing gases. The group V precursor comprises a nitrogen-containing species, where the nitrogen-containing species comprises active neutral species of nitrogen. The active neutral species of nitrogen comprises nitrogen species having the lowest excited state of molecular nitrogen. The film is aluminum nitride, gallium nitride, indium nitride, aluminum gallium nitride, aluminum indium nitride, indium gallium nitride or indium gallium aluminum nitride. The thickness of the film after a single sequence of steps (b)-(d) is less than one monolayer or greater than or equal to to one monolayer. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The backside passivation layer comprises of deposited oxide, silicon nitride, silicon oxynitride, aluminum oxide, or atomic layer deposited aluminum oxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Solvents: The organic solvent is selected from dichloromethane, chloroform, acetone, methanol or N-methylpyrrolidone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metallic salt comprises copper sulfate, stannous chloride, stannic chloride, zinc sulfate, or zinc chloride. The chalcogen comprises selenium, sulfur, telluride, or polonium. The ionic compound comprises sodium sulfate, sodium fluoride, potassium fluoride, potassium bifluoride, sodium bifluoride, sodium chloride, zinc chloride, potassium chloride, choline chloride, or sulfonate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent comprises ethylene glycol mixed with the ionic compound, water, hydrochloric acid, or boric acid. The sulfonate comprises mesylate, triflate, tosylate, or besylate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The monomers (a), (b) and (c) have a carbon-carbon double bond. The fluoromonomer (a) is of formula: CH2=C(-Cl)-C(=O)-Y'-Z-Rf (I). The linear or branched hydrocarbon group of monomer (b) is 1-30C saturated aliphatic hydrocarbon group. The cyclic hydrocarbon group of monomer (c) is 4-20C saturated cyclic hydrocarbon group. The carbon atom in the ring of cyclic hydrocarbon group is directly bonded to an ester group in (meth)acrylate group of monomer (c). The cyclic hydrocarbon group is chosen from cyclohexyl group, t-butylcyclohexyl group, isobornyl group, dicyclopentanyl group and dicyclopentenyl group. The cyclic hydrocarbon group-containing monomer (c) is chosen from cyclohexyl methacrylate, t-butylcyclohexyl methacrylate, benzyl methacrylate, isobornyl methacrylate, isobornyl acrylate, dicyclopentanyl methacrylate, dicyclopentanyl acrylate, dicyclopentenyl acrylate, adamantyl acrylate and adamantyl methacrylate. The fluorine-containing composition further contains an aqueous medium.Y'=-O- or -NH-;Z=direct bond or bivalent organic group;andRf=1-20C fluoroalkyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The molar ratio of vinyl alcohol unit and tetrafluoroethylene unit is 25-75/75-25. Preferred Composition: The copolymer (A) further contains vinylidene fluoride resin. Preferred Method: The polymeric porous membrane is produced by a nonsolvent induction phase-separating method and/or heat-induced phase separation method.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The semiconductor substrate is made of silicon. The passivation layer is made of aluminum oxide, hafnium oxide, and zirconium oxide. The reflection prevention layer is made of silicon oxide or silicon nitride.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The fluorine-containing copolymer further has repeating unit (a-4) derived from monomer having 1-10C alkyl group and free of hydroxy, carboxy, alkoxy silyl or oxetanyl group. The content of compounds (B-D) is 5-40 parts mass, 5-40 parts mass and 0.05-10 parts mass, respectively with respect to 100 parts mass of fluorine-containing copolymer (A). The content of units (a-1 to a-4) in copolymer is 20-80 mol%, 5-50 mol%, 5-50 mol% and 0.1-40 mol%, respectively. The copolymer has fluorine content of 10-35 %mass. The transparent base material is a glass board material, an acrylic resin base material or polycarbonate resin base material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkali compound is chosen from potassium hydroxide, sodium hydroxide, ammonium hydroxide, tetramethylammonium hydroxide and tetraethylammonium hydroxide. The silica-containing compound is chosen from silica powder, colloidal silica solution stabilized with sodium oxide, colloidal silica solution stabilized with potassium oxide, colloidal silica solution stabilized with acid, colloidal silica solution stabilized with ammonia, colloidal silica solution stabilized with organic solvent chosen from ethyl alcohol, isopropyl alcohol, ethylene glycol, methyl ethyl ketone and methyl isobutyl ketone, liquid sodium silicate, liquid potassium silicate and liquid lithium silicate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The texture etchant composition further contains 0.1-50 wt.% cyclic compound having a boiling point of 100 degrees C or more, 0.000001-1 wt.% fluorosurfactant, and silica-containing compound. The surfactant is chosen from 41 compounds e.g. polyethylene glycol, polyethylene glycol methyl ether, polyoxyethylene mono allyl ether, polyoxyethylene cetyl ether and polyoxyethylene lauryl ether. The cyclic compound is chosen from 68 compounds e.g. N-(2-aminoethyl)piperazine, piperazine, N-methylpiperazine, N-ethylpiperazine and N,N'-dimethylpiperazine. The fluorosurfactant chosen from 10 compounds e.g. perfluoroalkyl sulfonate, perfluoroalkyl phosphate, perfluoroalkyl quaternary ammonium salt, perfluoroalkyl carboxybetaine and perfluoroalkyl sulfobetaine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The porous substrate capable of supplying silicone is porous amorphous substance, preferably porous silica. The seed crystals are zeolite or analogous molecule, or ordered porous material. The zeolite or analogous molecule is mordenite framework inverted (MFI) structure, preferably chosen from ZSM-5, silicalite, TS-1, AZ-1, bor-C, vora light C, encinitas light, FZ-1, LZ-105, monoclinic H-ZSM-5, NU-4, NU-5, TSZ, TSZ-III, TZ-01, USC-4, USI-108, ZBH and ZKQ-1B. Preferred Process: During manufacture of thin film of thick film, the coating process, and film forming and growing process are repeated for 2 times. The porous substrate is swollen with water. The film is grown with a thickness of 100-500 nm. The size of the seed crystals is more than the pore of the porous substrate. The a-axis, b-axis and/or c-axis of the seed crystals are aligned to fixed regulation on the porous substrate in parallel or perpendicular to the base. The a-axis, b-axis and/or c-axis of the orientated seed crystals form a monolayer on the porous substrate. During growing process, the seed crystals are connected with each other in two-dimensionally and three-dimensionally to the vertical growth. The structure-directing agent is induced from the surface of the seed crystals of secondary growth, so that crystal nucleation reaction does not carry out on surface of the seed crystals.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The structure-directing agent is tetrapropyl ammonium hydroxide, tetraethyl ammonium hydroxide, tetramethylammonium and/or tetrabutylammonium.
TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: M/P satisfies equations M/P=0.8-1.5 (iii) and M/P=0.8-1.1 (iv). Polyester composition contains less than or equal to 1000 ppm metallic elements other than Mn, Ca, and Al with respect to polyester whole composition. A part of component (a1) is 0.025-1.5 mol.% carboxylic component (a11) which has greater than or equal to 3 carboxylic acid groups with respect to total of component (a1) and (a2), and a part of component (a2) is 0.025-1.5 mol.% alcohol component (a21) which has greater than or equal to 3 hydroxyl groups with respect to total of components (a1) and (a2). Preferred Parameters: The difference ( Delta Tcg) of cold crystallization temperature (Tc) and glass transition temperature (Tg) of polyester composition is 45-70 degrees C. Polyester film has optical density of greater than or equal to 4. Preferred Processes: Biaxial orientation is performed on polyester film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Gas: The inert gas is nitrogen or noble gas.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal impurities of the surface of the semiconductor substrate are calcium, manganese, chromium, iron, cobalt, nickel, copper, zinc, titanium, silver, indium, tin, cadmium, molybdenum, aluminum, magnesium, gold, platinum and palladium. The semiconductor substrate is processed by using ozone water, hydrogen-peroxide solution, hydrofluoric acid, pure water, oxidizing agent and hydrochloric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The silica coated inorganic particles is prepared by water glass method, surface fusion processing method or laser ablation method. Preferred Component: The metal oxide is preferably chosen from alumina, magnesium oxide, titanium dioxide and aluminum nitride. Preferred Property: The thickness of silica coating film is 5-20 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The thermosetting resin is an epoxy resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal catalyst comprises nickel and iron. The InGaN comprises InxGayN, where x+y is 1, and x is 0.05-0.15.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): (I) is prepared by dissolving reaction monomer diphenyl acetylene derivative in o-dichlorobenzene solvent in reaction container, adding click reagent in argon gas atmosphere and reacting at 30-200 degrees C for 1-10 hours, stopping reaction, decompressing and distilling to remove solvent o-dichlorobenzene, using column chromatography purification, where eluent is ethyl acetate:petroleum ether, rotary steaming and drying to obtain solid monomer; adding fullerene C60 and sarcosine into reaction container and dissolving with o-dichlorobenzene, adding water in argon gas atmosphere and 50-2000C degrees C and refluxing reacting for 8-15 hours; stopping reaction, decompressing and distilling to remove solvent o-dichlorobenzene, using column chromatography purification, where eluent is ethyl acetate: petroleum ether, distilling and drying to obtain solid intermediate. Preferred Definitions:    R1=alkenyl or cyclohexane bialkenyl; and    R2=fluorinated hexamethylene alkenyl, alkoxy, benzene alkyl, benzene alkoxy, benzenyl, or biphenyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In the method, a polymeric material, the carbon-based filler and the hydrolyzable silane are heated together preferably at 120-200 degrees C, where the polymeric material is crosslinked. Preferred Definitions:    R2 = H; and    R = ethoxy group.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The vanadium precipitating agent is ammonium nitrate, ammonium chloride, ammonium carbonate, ammonium hydrogen carbonate, ammonium sulfate, ammonium bisulfate, ammonium fluoride, ammonium bromide, ammonium iodide and/or ammonia.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic reducing agent comprises carboxylic acids, aldehydes, alcohols, unsaturated hydrocarbon, formic acid, acetic acid, formaldehyde, methanol, ethanol, glycerol and/or propylene.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The polyhydric alcohol is ethylene glycol, propylene glycol, glycerol, 1,3-butylene glycol or pentaerythritol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The cleaning process is carried out using hydrofluoric acid having concentration of 9-11 %mass.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The epitaxial aluminum nitride film is aluminum nitride single crystal epitaxial thin film or epitaxial aluminum nitride polycrystalline thin film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The oxidizing agent is hydrogen peroxide, potassium chlorate, sodium chlorate, sodium hypochlorite or hypochlorous acid.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): (I) is prepared by providing 9,9-bis(triphenyl amine)-2,7-dibromo-fluorene of formula (II), adding lithium alkyl derivative to dissolve in the absence of water and oxygen at - 78 degrees C to -70 degrees C and dissolving into organic solvent; stirring and reacting for 3 hours, adding diphenyl phosphoric chloride to reaction system, adjusting temperature to 10-30 degrees C, and reacting for 3-12 hours; and collecting reaction product and purifying, dissolving purifying reaction product in organic solvent, adding into oxidizing agent, and reacting for 3-12 hours to obtain desired semiconductor material (I). Preferred Method: The lithium alkyl derivative is n-butyllithium, isobutyl lithium, methyl lithium or phenyl lithium. The mole ratio of lithium alkyl derivative to diphenyl phosphoric chloride is 1:1. The mole ratio of lithium alkyl derivative to compound (II) is 2-3:1. The mole ratio of oxidizing agent to purified reaction product is 100-160:1. Preferred Definitions:    R=1-6C alkyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The oxidizing agent is hydrogen peroxide, potassium chlorate, sodium chlorate, sodium hypochlorite or hypochlorous acid.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): (I) is prepared by providing 9,9-di(triphenylamine)-2,7-dibromofluorene, adding lithium alkyl derivative in anhydrous oxygen-free condition at - 78 degrees C to - 70 degrees C, dissolving in organic solvent, stirring and reacting for 3 hours; adding diphenyl phosphorus pentachloride, adjusting temperature of reaction system to 10-30 degrees C, reacting for 3-12 hours, collecting the reaction product and purifying; and dissolving purified reaction product in organic solvent, adding into oxidizing agent, and reacting for 3-12 hours to obtain desired semiconductor material (I). The mole ratio of lithium alkyl derivative to compound (II) is 2-2.1:1. The mole ratio of alkyl derivative to diphenyl phosphorus pentachloride is 1:1. The lithium alkyl derivative is n-butyllithium, isobutyl lithium, methyl lithium or phenyl lithium. The mole ratio of oxidizing agent to purified reaction product is 100-160:1.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Oxidant is hydrogen peroxide. Organic solvent is at least one of tetrahydrofuran, benzene, cyclohexane or ether. Preferred Method: Reaction of spirofluorene derivative, n-Butyllithium, diethyl(diphenyl)phosphonium iodide and organic solvent is carried out for 5 hours.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I), comprises adding dibromo or di(trialkyltin)-substituted (A1) or (A2) compounds (III), or dibromo or di(trialkyltin)-substituted (R1 and R2-substituted thiophene)-(A2)-(R1 and R2-substituted thiophene) compounds (IV) along with trialkyltin-substituted oligothiophene-(R2 and R6-substituted triphenylamine) compounds (V), (R2 and R6-substituted triphenylamine)-boric acid compounds (VI) or bromo-(R2 and R6-substituted triphenylamine) compounds (VII) into a reaction container, where molar ratio between (III) or (IV) and (V) or (VI) or (VII) is 1:2-5, then adding toluene or mixed solvent of toluene and aqueous potassium carbonate solution in a volume ratio of 2:1, feeding an inert gas to remove air in the reaction container, adding catalytic amount of tetrakis(triphenylphosphine)palladium catalyst and reacting at reflux temperature, then extracting organic phase, drying the organic phase, filtering, drying the filtrate to obtain solid product, and purifying the solid product by column chromatography. Preferred Method: Molar ratio between tetrakis(triphenylphosphine)palladium catalyst and (V), (VI) or (VII) is 1:10-100; molar concentration of aqueous potassium carbonate solution is 2 M; the reaction time is 12-48 hours; and the reflux temperature is 100-120 degrees C. Preferred Definitions:    n = 1-3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of tellurium nanowire dispersion liquid and noble metal precursor solution is 0.5-10 mmol/L and 10-40 mmol/L, respectively. The noble metal precursor is sodium chloroplatinite, potassium chloroplatinite, platinum chloride, sodium palladium tetrachloride, potassium palladium tetrachloride, auric chloride or hydrogen tetrachloroaurate. The mass ratio of palladium nanowire with respect to noble metal precursor is 0.5-20:1.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent used for dissolving noble metal precursor is glycol, ethanol, isopropyl alcohol, glycerol and/or water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The flow rate of the carbon dioxide gas is 180-600 ml/minute, preferably 200-500 ml/minute. The heating process is carried out in a corundum crucible, ceramic crucible and/or nickel crucible. The protective gas is chosen from helium gas, neon gas, argon gas and nitrogen, more preferably nitrogen. The graphene has 80% pore aperture of 3-6 nm, specific surface area of 1500-2200 m2/g or more and specific capacitance of 120-150 F/g.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: Strong electron withdrawing group of fluoro or trifluoromethyl group is located at the periphery of benzene ring. The substituents are at meta and para positions, and the number of substituents is 1, 2, 3, 4 or 5.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate comprises molybdenum, silver and/or aluminum. The atmosphere comprises inert gas, gas containing sulfur and/or gas containing selenium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The solar cell (s1) further comprises: a second transparent conducting oxide layer (18) positioned adjacently to the semiconducting layer on an opposing side from the intrinsic oxide buffer layer; a superstrate (22) positioned adjacently to the first transparent conducting oxide layer; a metal layer (20) positioned adjacently to the first transparent conducting oxide layer; a substrate positioned adjacently to the metal layer on an opposing side from the first transparent conducting oxide layer; and a metal layer positioned adjacently to the transparent conducting oxide layer. In the solar cell (s1), a metal layer is positioned adjacently to the second transparent conducting oxide layer. The intrinsic oxide buffer layer comprises a compound comprising an undoped oxide, a compensated oxide having compensating dopants to reduce conductivity of the compensated oxide, or a passivated oxide having a compound in it which improves electronic properties. The compound comprises hydrogen. The intrinsic oxide buffer layer is greater than 50 nm in thickness, and comprises zinc oxide compensated with hydrogen. The solar cell (s2) further comprises: a substrate positioned adjacently to the metal layer on an opposing side from the intrinsic oxide buffer layer; a transparent conducting oxide layer positioned adjacently to the semiconducting layer and the intrinsic oxide buffer layer; and a superstrate positioned adjacently to the transparent conducting oxide layer on an opposing side from the semiconducting layer.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The molten glass comprises potassium oxide, barium oxide and strontium oxide. The total content of potassium oxide, barium oxide and strontium oxide is 1 %mass or more. The iron concentration in molten melting tin is 100 ppm or more. The glass substrate has a layer of transparent conductive oxide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The molar ratio sum total of calcium oxide, strontium oxide and barium oxide with respect to alumina is 0.6-0.9. The alkali-free glass further contains 0.001-0.3 mol% tin(II) oxide and less than 0.2 mol% zirconium dioxide. The molar ratio of sum total of silica and magnesium oxide with respect to boron(III) oxide is less than 18.5. Preferred Properties: The alkali-free glass has strain point of more than 670 degrees C, Young's modulus of more than 75 GPa, low-density of more than 2.59 g/cm3, liquidus temperature of less than 1210 degrees C, average coefficient of thermal expansion of 30x 10-7-50x 10-7/ degrees C, measured at 30-380 degrees C, viscosity in liquidus temperature of more than 10-4.8 poise and thickness of less than 0.5 mm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Ortho-oriented aromatic dicarboxylic acid (anhydride) is ortho phthalic acid (anhydride), naphthalene-2,3-dicarboxylic acid (anhydride), naphthalene-1,2-dicarboxylic acid (anhydride), anthraquinone-2,3-dicarboxylic acid (anhydride), and/or anthracene-2,3-dicarboxylic acid (anhydride). Component (a2) contains 70-100 mass% ortho-oriented aromatic dicarboxylic acid (anhydride) with respect to total polycarboxylic acid components. Preferred Processes: Gas barrier coating agent is obtained by dissolving component (A) in mixed solvent containing ketone system solvent and/or ester system solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Component (B) contains polyisocyanate which has aromatic ring or aliphatic ring. Polyisocyanate which has aromatic ring is a reaction product of metaxylene diisocyanate and alcohol which has greater than or equal to 2 hydroxyl groups or a reaction product of toluene diisocyanate and alcohol which has greater than or equal to 2 hydroxyl groups. Gas barrier coating agent contains plate-shaped inorganic compound (C) as nonionic interlayer which has non-swelling property with respect to water. Gas barrier coating agent contains 5-50 mass% component (C) with respect to total 100 mass% of components (A)-(C). Gas-barrier multilayer film contains base film layer or sealant layer other than gas barrier coating agent layer. Preferred Parameters: Oxygen permeability in 90% humidity and 23 degrees C of cured coating film is less than or equal to 50 cc/m2.day.atm when application quantity of cured coating film obtained from components (A) and (B) is 5 g/m2. Particle size of component (C) is greater than or equal to 0.1 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The aqueous solution further contains fluorine compound, antimony compound, and/or tantalum compound. The fluorine compound is ammonium fluoride, hydrogen fluoride, and/or trifluoroacetic acid. The antimony compound is antimony chloride, antimony acetate, and/or antimony acetylacetonate. The tantalum compound is tantalum chloride, tantalum acetate, and/or tantalum acetylacetonate.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Cell: In the fuel cell, the anode electrocatalyst comprises a further element, preferably palladium and iridium. The anode electrocatalyst does not contain platinum. The palladium and iridium are present in the catalyst as an alloy and/or in finely-divided form. The anode electrode is a diffusion electrode. The cathode electrocatalyst does not contain a combination of palladium and iridium. The fuel cell is a hydrogen or methanol fuel cell, preferably a hydrogen fuel cell. Preferred Method: In generating electricity, the fuel comprises hydrogen. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The primary liquid is toluene, chloroform, dichlorobenzene, chlorobenzene, xylene, ethylbenzene, and/or phenetole, preferably toluene and xylene. The secondary liquid is tetrahydrofuran, dimethoxymethane, 1,2-dioxane, 1,3-dioxane, 1,4-dioxane, 1,3,5-trioxane, methanol, 2-pentanone, ethanol, tetrahydropyran, diethylene glycol dimethyl ether, ethylene glycol dimethyl ether, propylene glycol n-butyl ether, propylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, ethylene glycol monoisobutyl ether, ethylene glycol monoallyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, dipropylene glycol dimethyl ether, propylene glycol diacetate, methyl acetate, ethyl acetate, n-propyl alcohol, 3-methoxybutanol, 3-methoxybutyl acetate, and/or ethylene glycol monomethyl ether acetate, preferably tetrahydrofuran and dimethoxymethane.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The binder resin is a binder resin soluble in primary liquid. The secondary liquid is a liquid having solubility of 20 %mass or more in water at 25 degrees C. The ratio of content of water in emulsion with respect to total content of primary liquid and secondary liquid in emulsion is 5/5-7/3. The ratio of content of primary liquid in emulsion with respect to content of secondary liquid in emulsion is 97/3-30/70.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The glass fiber composite resin substrate is obtained by impregnating glass fiber in curable resin composition, and hardening the curable resin composition. Preferred Composition: The cage silsesquioxane resin (A) is of formula: (R3SiO3/2)n(R4SiO3/2)m (III). The ratio of n and m in formula (III) is 10:0-4:6. The content of cage silsesquioxane resin is 50 %mass or more. The unsaturated functional group of unsaturated compound (B) is chosen from acryloyl group, methacryloyl group, allyl group, and vinyl group. The number of unsaturated functional groups in unsaturated compound (B) is 2-10 per molecule of compound. The mass ratio of cured material of curable resin composition to glass fiber is 20:80-70:30.R3=organic group chosen from (meth)acryloyl, glycidyl, and vinyl;R4=H, 1-20C hydrocarbyl, 1-20C alkoxy, or 1-20C alkyl siloxy;n=1 or more;m=0 or more;n+m=h;andh=8, 10, 12 and 14.Preferred Property: The glass fiber composite resin substrate has thickness of 0.03-0.5 mm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is chosen from sulfolane and dimethyl sulfone.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The sulfonating agent is chosen from chlorosulfonic acid, sulfuric anhydride, sulfuric acid, fuming sulfuric acid and polyalkyl benzenesulfonic acid.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The aromatic polymer is chosen from aromatic polyamide, aromatic polyimide, aromatic polyether ketone, aromatic polyetheretherketone, aromatic polycarbonate, aromatic polysulfone, aromatic poly sulfoxide, aromatic polysulfide, aromatic polyether sulfone, aromatic polyether ethersulfone, aromatic polyester and polystyrene, preferably aromatic polyether sulfone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The height of the deposited metal is more than a pitch value of the grid patterns. The metal layer includes any one of aluminum, chromium, silver, copper, nickel, cobalt, molybdenum or their alloys.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: The step of forming at least one unit pattern part comprises: producing a master mold which has a first mold pattern area and a second mold pattern area in which many grid mold patterns are formed, respectively, and at least one unit mold pattern part composed of a concave mold pattern formed between the first mold pattern area and the second mold pattern area; forming the unit pattern parts, corresponding to the unit mold pattern parts formed at the master mold, on the resin layer through an imprint process; hardening the resin layer; and releasing the master mold from the transparent substrate. The step of forming the grid mold patterns is performed by a space lithography and the step of forming the concave mold pattern is performed by electron beam lithography. The step of forming the metal layer comprises: depositing a metal on the grid patterns and the protrusion pattern; and removing the metals deposited on grid patterns through wet etching. The depositing of the metal is performed by at least one of sputtering, chemical vapor deposition or evaporation. Preferred Components: The height of the protrusion pattern is higher than a height of the grid patterns. The width of the protrusion pattern is wider than a width of the first pattern area or the second pattern area. The width of the first mold pattern area or the second mold pattern area is 50-100 nm. The width of the concave mold pattern is 200-1000 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The resin layer is composed of a thermosetting polymer or a photo curable polymer. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The platinum-N binary alloy catalyst is composed of iron, cobalt, ruthenium, nickel, tungsten, chromium, manganese, tin, lead, gold, silver, iridium, vanadium molybdenum or osmium.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Conditions: D-Fructose is weighed in a container and dissolved by addition of ultrapure water to obtain a colorless, clear and transparent solution. Sodium hydroxide, sodium bicarbonate, or potassium dihydrogen phosphate is weighed in a container and dissolved by addition of ultrapure water to obtain a colorless, clear and transparent solution. The molar ratio of sodium hydroxide and fructose is 1:100. The mixed solution is placed on a test platform, helium gas flow is set to 25 sccm, the output current is set to 3-10 mA, and the discharge voltage is set to 2000-3000 V, and the tube negative electrode is gradually dropped close to liquid level for a period of time until discharge. The distance between two discharging electrodes is 2 cm. The discharge time is 15 minutes. After discharge is completed, the obtained carbon quantum dot solution is dialyzed for 24 hours to obtain higher concentration. The container is ultrasonically cleaned using ultrapure water for 30 minutes, and dried.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: The substrate is sapphire, silicon carbide, silicon or glass.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The second sub-grid line is doped in rinsing solution mixed with citric acid of 0.1-0.5 mu m.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Component: The photovoltaic conversion device has a stacked structure of glass, molybdenum, light absorbing layer, cadmium sulfide, gallium-doped zinc oxide and aluminum grid electrode.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The copper-based precursor is copper-germanium based precursor, copper-tin based precursor having copper/tin ratio of less than 1.6, or copper-germanium-tin based precursor. The ratio of copper to total content of germanium and tin is less than 1.6 and the ratio of tin to total content of germanium and tin is less than 0.7. The sulfur source is sulfur powder. The germanium source is powder or thin film of germanium, germanium sulfide and/or germanium disulfide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polyisocyanate (A) has an aromatic ring or an aliphatic ring. The ortho-oriented aromatic dicarboxylic acid or its anhydride is ortho phthalic acid or its anhydride, naphthalene 2, 3- dicarboxylic acid or its anhydride, naphthalene 1,2-dicarboxylic acid or its anhydride, anthraquinone 2,3-dicarboxylic acid or its anhydride and 2,3-anthracene dicarboxylic acid or its anhydride. The polyisocyanate has metaxylene diisocyanate or toluene-diisocyanate structure.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive agent further contains polyester polyol (B) obtained by polycondensing polyvalent carboxylic acid compound containing ortho-oriented aromatic dicarboxylic acid or its anhydride, and polyhydric alcohol component chosen from ethylene glycol, propylene glycol, butylene glycol, neopentylglycol and/or cyclohexane dimethanol. The oxygen permeability of the cured coating film obtained by coating in an amount of 5 g/m2, at 90% humidity and 23 degrees C, is less than 50 cc/m2.day.atmosphere. The multilayer film further contains a base film layer or a sealant layer other than the adhesive bond layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The vapor deposition material further comprises granular microsome having average-particle diameter of 1-10 mm, by which granulation is carried out, and press-molded pellet having diameter of 5-30 mm and thickness of 1-20 mm.
TECHNOLOGY FOCUS - METALLURGY - The reinforcing outer layer is formed of carbon-carbon composite. The inner core and support pedestals are formed of graphite.
TECHNOLOGY FOCUS - METALLURGY - The doped polysilicon layer is made of boron and phosphorus.
TECHNOLOGY FOCUS - METALLURGY - The disilicide phase is selected from the group consisting of chromium silicide, vanadium silicide, niobium silicide, tantalum silicide, molybdenum silicide, tungsten silicide, cobalt silicide, titanium silicide, zirconium silicide, and hafnium silicide. The metallic elements are selected from the group consisting of chromium, vanadium, niobium, tantalum, molybdenum, tungsten, cobalt, titanium, zirconium and hafnium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The filler comprises a metal oxide, a manganese-based compound, a cerium-based compound, and/or inorganic filler grafted with at least one functional moiety.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The co-extruding is accomplished by blown film extruding or melt-blowing. The removing of the layer of incompatible polymer from the layer of ion exchange precursor resin is accomplished by peeling the layer of incompatible polymer from the layer of ion exchange precursor resin. The method of converting the ion exchange precursor resin membrane involves hydrolyzing the ion exchange precursor resin membrane. The hydrolyzing is accomplished with a base, and the ion exchange resin membrane produced is further converted to a protonated form using an acid. Preferred Components: The ion exchange precursor resin comprises a non-ionic form of a perfluorosulfonic acid (PFSA) resin. The PFSA resin comprises a sulfonated tetrafluoroethylene-based fluoropolymer-copolymer or a perfluorosulfonic acid-polytetrafluoroethylene copolymer of formula (I). The non-ionic form of the PFSA resin comprises sulfonyl halide protected acid groups. The ion exchange precursor resin comprises a polymer composite comprising a polymer and filler. The incompatible polymer comprises a polyolefin.x, y and z=0-1;orx + y + z=1.Preferred Film: The multilayer film comprises two layers, a first layer of the ion exchange precursor resin and a second layer of the incompatible polymer; or three layers, a first layer of the ion exchange precursor resin sandwiched between the second and third layers of the incompatible polymer. The second and third layers comprise the same incompatible polymer. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - Preferred Material: The collectors are aluminum foils.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The cyclic olefin-type polymer is cyclic olefin-type random copolymer containing linear olefin component and cyclic olefin component. Preferred Properties: The sealing material has thickness of 0.3 mm and water vapor permeation rate of 1 g/(m2.day), measured at 40 degrees C in humidity of 90%.
TECHNOLOGY FOCUS - METALLURGY - The metallic layer of the coating is made from aluminum or aluminum alloy.    TECHNOLOGY FOCUS - POLYMERS - The heat shrink sleeve is made from polypropylene or polyethylene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of aluminum is 2-3.5 ppmw. The silicon composition further contains 1 ppmw or less iron. The content of phosphorus with respect to content of boron is 1.33 or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The process further comprises: maintaining the viscosity in the range during the electrochemical charging step by adding expanded HLM to the slurry; forming the electrode from a metal cage configured to contain the HLM rock; employing multiple electrodes (100), where each electrode includes at least one HLM rock; conveying the first stage charged HLM from the slurry to a storage container (40); and agitating the slurry during the electrochemical charging step. The process includes forming the slurry to have the composition Preferred Components: The HLM is graphite, molybdenum disulfide, tungsten disulfide (diselenide), hexagonal boron nitride, vanadium pentoxide or vanadium X oxides (e.g. vanadium selenium oxide). The expanding force includes at least one of heat, sonication or pressure. The slurry has a viscosity of 0.05-50 Pa.s. The metal ions include lithium ions, and the organic solvent comprises propylene carbonate. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The battery comprises an electrically conductive substrate. The electrically conductive substrate comprises aluminum. The housing comprises aluminum. The dry processed particles comprise dry carbon particles. The dry carbon particles comprise conductive carbon particles, graphite particles, and carbon black particles. The dry processed particles comprise lithium compound particles. The lithium compound particles comprise lithium metal oxide particles. The lithium metal oxide particles comprise at least one of lithium cobalt oxide particles and lithium manganese oxide particles and lithium iron phosphate.    TECHNOLOGY FOCUS - POLYMERS - The binder consists essentially of fluoropolymer particles. The binder consists essentially of polytetrafluoroethylene (PTFE).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The colloidal silica is rod-shaped colloidal silica having length of 5-100 nm, and particle size of 5 nm or more, or spherical colloidal silica having particle size of 50 nm or less, measured under scanning electron microscope. The mass ratio of colloidal silica and tungsten compound is 20:80-80:20. The low-reflection film has refractive index of 1.20-1.40. Preferred Process: The tungsten compound is of formula: W(OR2)5Cl (I), and is obtained by reacting tungsten hexachloride and sodium-containing compound of formula: 5Na(OR)2, in presence of isopropyl alcohol solvent, and obtaining tungsten compound (I) and sodium chloride.R2=methyl, ethyl, n-propyl, i-propyl, n-butyl, s-butyl, i-butyl, t-butyl, n-amyl, i-amyl or s-amyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of phosphorus oxychloride, nitrogen and oxygen is 6:1-1:3. Preferred Properties: The shallow-junction solar cell has diffusion sheet resistance of 80-120 Omega /square, junction depth of 0.1-0.25 mu m and surface concentration of phosphorus of 1x 1020-10x 1020 cm--3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Sulfates are not limited to n-sulfate or sulfite. Rare earth elements include yttrium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium and lutetium. Cationic elements include manganese, copper, lead and bismuth.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The release agent includes methyl silyl radical, fluoro alkyl radical, silicone oil or the fluorine group compound. The resin layer includes a silicone resin, cured product phosphorus, alkenyl group of organo alkenyl polysiloxane and organo-hydrogen polysiloxane with hydrogen atom uniting with the silicon atom. The mole ratio of the hydrogen atom uniting with the silicon atom of the alkenyl group of the organo alkenyl polysiloxane or the organo-hydrogen polysiloxane is 0.5-2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The outer edge portion of the impregnated member is made of phosphorus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Layers: The primary layer film is a barrier layer which suppresses the alkali metal ion transfer from glass substrate, and contains silica. The secondary layer film is a transparent conductive film containing fluorine-doped tin oxide. An underlayer is formed on the glass substrate using a solution containing underlayer precursor as solute, before forming of primary layer film. The underlayer contains titania.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The alkaline earth metal element comprises barium. Preferred Composition: A content of the alkaline earth metal element is 1-15 mass% in terms of oxide. Preferred Parameter: The composite oxide has a specific surface area of not smaller than 50 m2/g as measured by the BET method after calcination at 800 degrees C for 2 hours. Preferred Method: In producing composite oxide, in step (C) , a precursor of an oxide of at least one element selected from rare earth metal elements other than cerium and including yttrium, zirconium, and silicon, is further added to the cerium suspension obtained from step (B), preferably the precursor of an alkaline earth metal oxide comprises a precursor of barium oxide. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In step (C), a precursor of an oxide of at least one element selected from rare earth metal elements other than cerium and including yttrium, zirconium, and aluminum, is further added to the cerium suspension obtained from step (B), where the precursor of an alkaline earth metal oxide comprises a precursor of barium oxide. Preferred Components: The alkaline earth metal element comprises barium. The content of the alkaline earth metal element is 1-20 mass% in terms of oxide. EXAMPLE - Cerium oxide (CeO2) (100 g) of a ceric nitrate solution not less than 90 mole% of which cerium ions were tetravalent was measured out, and the total volume was adjusted to pure water (2 liter). The obtained solution was heated to 100 degrees C, held at this temperature for 30 minutes, and allowed to cool down to the room temperature, to thereby obtain a cerium suspension. After the mother liquor was removed from the cerium suspension thus obtained, barium nitrate (8.9 g) and colloidal silica (25.4 g) were added, and the total volume was adjusted to pure water (2 liter). Then the cerium suspension containing the precursors of barium oxide and silicon oxide was held at 120 degrees C for 2 hours, allowed to cool, and neutralized to pH 8.5 with aqueous ammonia to confirm precipitation. Further, ammonium bicarbonate (10.8 g) was added, so that a precipitate was formed. The obtained slurry was subjected to solid-liquid separation to obtain a filter cake, which was calcined at 500 degrees C for 10 hours in the atmosphere to obtain a composite oxide powder. This composite oxide powder was subjected to quantitative analysis by ICP to determine its composition, which was cerium oxide, barium oxide, and silicon oxide at 90:5:5 mass%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: A Ga composition as given by Ga/(In+Ga) in the second metal precursor film is 0.3-1. The first metal precursor film, the second metal precursor film, or the third metal precursor film further comprises sodium. The Cu composition as given by (Cu+Ag)/(In+Ga) is 0.75-0.98 in the final semiconductor material. A Ga composition as given by Ga/(In+Ga+Al) is 0.2-0.5 in the final semiconductor material. A composition of Cu/(In+Ga) is greater than 1. A composition of In/(In+Ga) is less than 0.5. The second metal precursor film further comprises copper-(indium, gallium)-selenium material or (indium, gallium)-selenium material, Group VIA element, and aluminum, where a composition of Ga/(Ga+VIA) is greater than 0.25. A composition of (Cu+Ag)/(In+Ga+Al) is less than 1. A Ga composition as given by Ga/(In+Ga+Al) is 0.30-1 in the second metal precursor film. The third metal precursor film comprises Cu, In, and Ga.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The lithium absorbent is nickel oxide, fluorocarbon and/or manganese dioxide. The inorganic filler is alumina, magnesia and/or titanium oxide. The negative electrode active material layer comprises carbon material which has graphite structure in portion at least as negative electrode active material. The positive electrode active material layer contains lithium transition metal oxide which has a layer structure as positive electrode active material. The content of lithium absorbent is 0.5-20 parts mass per 100 parts mass positive electrode active materials.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The insulating reinforcement component is silver nanoparticles. The metallic nanowire is silver nanowire, and has average diameter of 100 nm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of strontium in fluorescent substance is 0.01-9 mol%, preferably 0.8-4 mol%. The concentration of manganese is 35 mol%. The fluorescent substance has average particle diameter of 10 nm to 20 mu m. The average particle diameter (A) of fluorescent substance and addition amount (B) of fluorescent substance satisfy relation given by: 0.004A less than or equal to B less than or equal to 8.7A or 0.008A less than or equal to B less than or equal to 4.3A.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The phosphorus thermostabilizer is tetrakis(2,4-di-t-butylphenyl)-4,4'-biphenylene phosphonite and/or tetrakis(2, 6-di-t-butyl-4-methylphenyl)-4,4'-biphenylene phosphonite. The hindered phenol-type thermostabilizer is 3,9-bis(2-(3-(3-t-butyl-4-hydroxy-5-methylphenyl)propionyloxy)-1,1-dimethylethyl)-2,4,8,10-tetraoxaspiro(5.5)undecane. The semiaromatic polyamide resin composition further contains bifunctional-type thermostabilizer.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The heat-welding resin is thermoplastic resin chosen from polyethylene-vinyl acetate copolymer, non-crystalline polyethylene terephthalate and polyvinyl butyral. The transparent resin base material is chosen from polyethylene resin, polypropylene resin, an acrylic resin, polyester resin, norbornene resin and olefin maleimide resin. The fiber woven fabric is chosen from polyethylene resin, polypropylene resin, acrylic resin, polyester resin, norbornene resin, olefin maleimide resin and glass fiber. Preferred Properties: The thickness of the transparent resin base material and transparent layer is 10-5000 mu m and 1-5000 mu m, respectively. The fiber diameter of the fiber which forms the fiber woven fabric is 0.1-500 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The aqueous alkali solution is formed of tetramethylammonium hydride. The acid compound is formed of persulfated compound. The oxide film is formed of tungsten oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The gas blowing mechanism is provided so that the surroundings of one or more portions of the flux supply structure may be surrounded.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The sulfate-containing glass powder further contains 15-35 wt.% phosphorus oxide, 30-55 wt.% zinc oxide, 0-10 wt.% alumina, 0-25 wt.% alkaline-earth metal oxide, 5-30 wt.% alkali metal oxide, silver oxide, nickel oxide, antimony oxide, titania, molybdenum oxide, vanadium pentoxide, boric oxide, tungsten oxide, cerium oxide, manganese oxide, copper oxide, cobalt oxide and chromium oxide. The flux further contains solvent or bonding agent.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The flux contains 0.1 wt.% or less lead. The metallic powder is chosen from silver, aluminum, platinum, palladium, nickel and copper.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The mixed composition further contains 0.05-10 parts mass polyfunctional epoxy compound having 2-10000 functional groups.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The plasma etching process is performed using nitrogen (N) series gas, hydrogen (H) series gas, oxygen (O) series gas, fluorine (F) series gas. The byproduct layer removal process is performed using chlorine gas.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The layer containing hardened material of gas-barrier resin composition contains group B element, metal oxide and/or metal nitride. The inorganic thin film layer comprises metal oxynitride, metal fluoride, group IIA element, transition element, group IIB element, group IIIB element, metal oxide, metal nitride, and/or metal fluoride. The metal contained in inorganic thin film layer is silicon, aluminum, titanium, zirconium and magnesium.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The gas-barrier resin composition further contains 45-95 wt.% aqueous polyester-based resin (C) containing 0.5-2 mmol/g carboxyl group content. The number-of-moles (x mmol) of oxazoline group of component (A) and number-of-moles (y mmol) of carboxyl group of component (C), satisfy a relation: (x/y)x 100 (mol%)=65-420 mol%. The content of components (A)-(C) in gas-barrier resin composition is preferably 10-55 wt.%, 10-80 wt.% and 10-80 wt.%, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The volume ratio of oxygen gas with respect chlorine trifluoride gas used during etching of exposed surface of the silicon substrate is set to preset value.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Method: The complex and hydride are put into a ball-milling tank and rotated at 100-600 rpm for 30-300 minutes. Liquid water is mixed in stoichiometric ratio or in excess and reacted. The complex is dissolved in liquid water to obtain a saturated solution or supersaturated solution of 10 mol/L, mixed with the hydride, and then reacted with liquid water after reaction with the other hydride. The usage amount of borane-ammonia complex is 40-75 %mass and the usage amount of hydride is 60-25 %mass. The mixing ratio of complex and other hydride is 25-50%:75-50%.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The hydride is of formula: M(BH4)x, where M is lithium, sodium, potassium or magnesium, and x is not defined. A hydride of formula: MHx is further used.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The graphene sheets have a surface area of at least 300 m2/g. The graphene sheets have a carbon to oxygen molar ratio of at least 25:1, preferably at least 75:1.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The catalyst is a sulfonic acid. The catalyst is p-toluenesulfonic acid. The aromatic compound is functionalized. The aromatic compound is hydroxybenzoic acid, benzoix acid, hydroxybenzaldehydes, formylbenzoic acid, terephthaldehyde, isophthaldehyde, phthaldialdehyde, terephthalic acid, dimethyl terephthalate, isophthalic acid, dimethyl isophthalate, phthalic acid, dimethyl phthalate, phthalic anhydride, bisphenols, 4,4'-biphenol, 3,3'-biphenol, 2,2'-biphenol, hydroxybiphenyl, dihydroxynaphthalene, hydroquinone, catechol, and resorcinol. The aromatic compound is a benzene derivative, and a biphenyl derivative.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The composition further comprises at least one polymer; at least one catalyst; graphite; and at least one binder. Preferred Components: The polymer is selected from poly(vinyl butyral), poly(vinyl formal), and polyacrylates. EXAMPLE - A composition comprising 78.2 wt.% graphene sheets and graphite, 17.2 wt.% poly(vinyl butyral), 8.6 wt.% p-toluenesulfonic acid, and 9.5 wt.% 4-hydroxybenaldehyde was prepared.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inert atmosphere is nitrogen or argon gas. The nanopowder is nano silicon dioxide, nano titanium dioxide, and/or nano zirconium oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The organic solvent is dimethylformamide, dimethylacetamide, 1,2-dichloroethane, acetonitrile, dimethyl sulfoxide, diphenyl sulfone, sulfolane, and/or N-methylpyrrolidone. The active component is 1-vinylimidazole or 1-allylimidazole. The crosslinking catalyst is benzoyl peroxide, cyclohexanone peroxide, azobisisobutyronitrile, and/or azobisisoheptonitrile.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sulfonating agent is concentrated sulfuric acid having concentration of 95-98%, chlorosulfonic acid, fuming sulfuric acid and sulfite.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: Polyvinylidene fluoride dialkene are dissolved in an organic solvent at 20-100 degrees C and fully stirred for 0.5-10 hours. The volatile solvent (0-50 weight%) is added, to obtain mixed solvent. The obtained mixed solution is poured on the nonwoven fabric substrate or directly poured on the glass plate, solvent is volatilized for 0-60 seconds, and dipped into resin, to obtain porous membrane. The obtained porous membrane is added into dialcohol solution of potassium hydroxide for 10 hours, temperature is controlled at -10 degrees C to 80 degrees C, and film is prepared in tetrahydrofuran solution of dibenzene for 0.5-10 hours. The film is prepared into the sulfonating agent, and temperature is controlled at 0-100 degrees C, to obtain amino group grafted polyvinylidene fluoride di-olefinic porous membrane. The concentration of polyvinylidene fluoride resin is 5-70 wt.%. Preferred Composition: The ion exchange group is sulfonated polyphenylene dialkenyl group or aminated polyphenylene dialkenyl group. The amount of ion exchange group is 0.1-30 wt.% with respect to total content of composite film. The chloromethylation reagent is chloromethyl ether, dichloro methyl ether or chloromethyl alkyl ether. The amination reagent is trimethylamine, tertiary diamine, methylamine, or diamine. The organic solvent is dimethyl sulfoxide, dimethyl acetamide, N-methyl-2-pyrrolidone or dimethyl formamide. The volatile nonsolvent is methanol, tetrahydrofuran or n-hexane. The poor solvent of resin is water, methanol, ethanol, propanol or isopropyl alcohol. Preferred Properties: The composite film has thickness of 20-500 mu m, aperture size of 0.05-100 nm and porosity of 5-90%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: At least one of the first precursor film, the second precursor film (s1) and the second precursor film (s2) further comprises sodium. The copper composition (copper/(indium+gallium)) for the chalcogenide material is 0.75-0.98. The gallium composition (gallium/(indium+gallium)) for the chalcogenide material is 0.2-0.5. The second precursor film (s2) further comprises aluminum. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first metal precursor film further comprises silver (Ag). A composition of (Cu+Ag) in the first layer as given by (Cu+Ag)/ (In+Ga) is less than 1. The composition of Cu in the first layer as given by Cu/(In+Ga) is less than 1. The composition of Ga in the first layer as given by Ga/(Ga+In) is 0.1-0.5. The second layer is formed from an Al chemical vapor deposition (CVD) precursor comprising trimethylaluminum, triethylaluminum, triisobutylaluminum, diethylaluminum chloride, dimethylaluminum hydride, trimethylamine alane, triethylamine alane, or trimethylamine aluminaborane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The methods (M1), (M2) and (M3) further comprise annealing the substrate after the heating step. Preferred Components: A composition of: copper (copper/(indium+gallium)) in the first layers (L1) and (L3) is 0.7-0.95; gallium (gallium/(gallium+indium)) in the first layers (L1) and (L3) is 0.1-0.4; copper (copper/(indium+gallium+aluminum)) in the first layer (L2) is 0.7-0.95; gallium (gallium/(gallium+indium+aluminum)) in the first layer (L2) is 0.0-0.4; aluminum (aluminum/(gallium+indium+aluminum)) in the first layer (L2) is 0.1-0.4, where the composition of aluminum is higher at a back surface of the first layer (L2) than at a front surface of the first layer (L2); and X in the first layer (L3) is 0-2 atomic.%. The second layer has a thickness of 10-100 nm. The first layers (L2) and (L3) have a thickness of is 200-1000 nm. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The semiconductor layer is made of silicon carbide, silicon oxide, silicon nitride or silicon. The support substrate is a ceramic substrate, fine-crystalline or amorphous silicon carbide substrate, silicon-based substrate, mono-crystalline or multi-crystalline silicon substrate. The intermediate layers are comprised of silicon oxide layer, silicon carbide layer or silicon nitride layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The second hydrogen source is steam reformer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The ternary III-nitride material comprises indium gallium nitride (InxGa1-xN), where x is 0.12. The ternary III-nitride material of the first barrier region and the second barrier region comprises InyGa1-yN, where y is 0.05. The binary III-nitride material of the first barrier region and the second barrier region comprises gallium nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The volume average particle diameter of primary particles of nickel metal particles or manganese metal particles is 1-1000 nm. The electroconductive adhesive material layer has average thickness of 1-1000 nm. The volume resistivity of laminate of the electroconductive adhesive material layer and the copper layer is 1.5x 10-8-1x 10-6 omega .m. Preferred Composition: The electroconductive adhesive material further contains dispersion medium. Preferred Process: The copper layer is obtained by processing the copper ink layer with gaseous formic acid and heating at 120 degrees C or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The surface roughness of the side which has silicon oxynitride film of the base film is pre 4-15 nm. The film thickness of silicon oxynitride film is 1-500 nm. The gas-barrier film has water-vapor permeability at 40 degrees C and 90%RH conditions of 0.3 g/m2/day or less. The adhesion strength of the laminate after hydrothermal-processing at 120 degrees C for 30 minute(s) is 500 g/15 mm or more. Preferred Process: The surface of the side which has silicon oxynitride film of the base film is surface-treated by atomic hydrogen. The atomic hydrogen is obtained by carrying out contact thermal decomposition of hydrogen molecule using heating catalyst component. The silicon oxynitride film is formed by catalyst chemical vapor growth method using hydrogen, ammonia, oxygen and/or gas containing silicon compound which is hexamethyldisilazane. The base film is not corona-discharge-treated or plasma-processed. Preferred Composition: The base film consists of at least 1 type of resin chosen from polyester, polycarbonate, acrylic resin, polyether sulfone, and cyclic polyolefin, and has thickness of 5-200 mu m.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Protective material contains base material and hard-coat layer. Foam contains hydrophilic polyurethane base polymer. Preferred Parameters: Foam has 180 degrees peel test force of less than or equal to 1 N/25 mm. Foam has 60 degrees C retention strength of less than or equal to 0.5 mm. Impact-absorbing rate in pendulum test of foam is greater than or equal to 20% in 5% of compression rate. Foam has 50% compressive load of less than or equal to 50 N/cm2. Surface carbon element ratio increase amount ( Delta C(%)) in silicon mirror wafer surface during peeling after affixing surface of foam on silicon mirror wafer surface and preserving at normal temperature for 24 hours is less than or equal to 50%. Foam has 50% compressive-strain recovery factor of greater than or equal to 70% when cooling to 23 degrees C after preserving at 80 degrees C in 50% compression state for 22 hours which is dispelled after 30 minutes pass.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Material: The material is solar cell sputtering target. Preferred Composition: The gas flow consists of air, oxygen and/or ozone.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The radical polymerization initiator having one-minute half-life temperature of 130 degrees C or more. The compression-bonding temperature of electronic component (c1) and electronic component (c2) is 160 degrees C or more. Preferred Composition: The compounding quantity of (meth)acrylate is 5x 10-4 mol or more per g of binder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The salicylate is in the form of sodium, potassium or lithium salt. The texturing chemical further comprises 2-3 wt.% sodium or potassium hydroxide. The silicon wafer is rinsed in an aqueous solution of hydrochloric acid and deionized water. The silicon wafer is then cleaned in acetone and alcohol and rinsed with deionized water. The cleaning and rinsing are carried out in an ultrasonic cleaner.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The base material has thermal expansion coefficient of 100 ppm/ degrees C or less, and glass transition temperature of 120 degrees C or more. Preferred Composition: The protective layer includes material having siloxane bond. Preferred Process: The modification process involves irradiating vacuum ultraviolet with wavelength of less than 180 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Layer: The gas barrier layer is formed by irradiating ultraviolet light having wavelength of 400 nm or less to a coating film containing polysilazane.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The biphenyl structure further contains bis((meth)acrylolylmethyl)biphenyl. The biphenyl structure contains 30-95 parts mass phenyl benzyl(meth)acrylate, 5-70 parts mass bis((meth)acrylolylmethyl)biphenyl and 0.5-15 parts mass methylene with respect to 100 parts mass biphenyl compound. The composition contains 50-95 parts mass biphenyl compound with respect to 100 parts mass phenyl benzyl (meth)acrylate and bis((meth)acrylolylmethyl)biphenyl. The radically polymerizable composition is obtained by reacting acrylic acid or its alkali metal salt with biphenyl, hydrohalide and formaldehyde derivative. The composition further contains 15-80 parts mass (meth)acrylate compound with respect to 100 parts mass of the composition. The (meth)acrylate compound has fluorene structure.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The subjecting the aerogel to a metallothermic process involves heating to greater than 400 degrees C for more than 2 hours and subsequently, optionally heating to greater than 600 degrees C for more than 2 hours. The removing reaction by-products involves acid etching the aerometal. EXAMPLE - Silica aerometals from silica aeroels were formed as follows. Mg turnings (99.8% pure) were put at bottom of graphite crucible with lid made of graphite plate. Silica aerogel was put into crucible. The crucible was put into oven under argon atmosphere at 660 degrees C to keep temperature below strain point of glass and to avoid stress to samples, for 2 hours, and then cooled. The Mg gas reacted with silica to produce porous silicon (Si) (gray in color) and MgO byproduct which appeared as brown color stain on material's surface. A second by-product of this reaction was appearance of Mg2Si that was formed from secondary reaction of formed Si with more Mg due to non-balanced amount of Mg used in reaction (more Mg than Si atoms). Subsequently, sample was heated again under controlled inert atmosphere (argon) at 660 degrees C with no Mg present. The Mg2Si was evaporated leaving only Si and MgO. As final step, sample was subjected to acid etching in 1 M HCl solution (molar HCl:H2O:EtoH ratio=0.66:4.72:8.88). The aerogel was put into glass container and etched anywhere from few minutes to dozens of hours, which allowed for full removal of MgO. The final result was porous Si and potentially some residual silica in powder form that could be further etched.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The silver is in the form of spherical silver particles having a d50 of 1.7-1.9 microm and d10 of greater than or equal to 1micro m and d90 of less than or equal to 3.8microm. The spherical silver particles have a surface coating of diethylene glycol surfactant. The silver is in the form of irregular particles having a d50 of 5.4-11 micro m. The lead-tellurium-lithium-titanium-oxide comprises lead oxide (PbO) (20-65, preferably 20-29 wt.%), tellurium dioxide (TeO2) (25-75, preferably 50-75 wt.%), lithium oxide (Li2O) (0.1-4 wt.%) and titanium oxide (TiO2) (0.25-5 wt.%); and P2O5 (3-12 wt.%); or PbO (20-29 wt.%), TeO2 (45-65 wt.%), Li2O (0.1-4 wt.%), TiO2 (0.25-5 wt.%) and vanadium pentoxide (V2O5) (10-25 wt.%). The conductive silver paste comprises silver (80-90 wt.%), lead-tellurium-lithium-titanium-oxide (0.2-2 wt.%), and titanium resinate (0.1-1 wt.%). EXAMPLE - A Pb-Te-Li-Ti-O composition comprising lead oxide (PbO) (33.77 wt.%), lithium oxide (Li2O) (2.39 wt.%), titanium oxide (TiO2) (2.13), tellurium dioxide (TeO2) (61.71 wt.%), was prepared. A conductive silver paste comprising ethyl cellulose (6.50 parts); Eastman TEXANOL (RTM: ester alcohol) (5.05 parts); thixotrol (0.50 parts); octylene glycol titanate (0.20 part), the Pb-Te-Li-Ti-O composition (0.25 part); and silver (Ag) powder (87.50 parts)(having spherical silver particles with d50 of 1.8 micro m, a d10 of 1.1 micro m and d90 of 3.5 micro m), was prepared.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Component: The polycrystal silicon ingot manufacturing apparatus further has shielding component which shields heat, interposed between the side surface of the crucible supporting unit and heater, and storage container (21) which accommodates the crucible such that the heat insulation unit is provided between the crucible and storage container. The storage container contains graphite. 50% or more of the side portion or whole surface of the side portion of the crucible is covered with heat-insulation unit in which the unidirectional solidification of the silicon is carried out within the crucible. The movement of the heat-insulation unit is enabled with respect to the side portion. The heat insulation unit which melts silicon within the crucible is provided such that at least one portion of the side portion of the crucible is opened.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The heat-insulation unit contains alumina, silica, mullite, zirconia or carbon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The separation layer consists of nitride or oxynitride of silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The gallium phthalocyanine to be subjected to the milling treatment after the gallium phthalocyanine and (I) are added to the solvent comprising a low-crystalline hydroxygallium phthalocyanine treated by an acid pasting method. Preferred Components: The hydroxygallium phthalocyanine crystal comprises a hydroxygallium phthalocyanine crystal having peaks at Bragg angles of 26 plus minus 0.2 degrees of 7.4 degrees and 28.3 degrees in copper potassium- alpha X-ray diffraction. The solvent comprises at least one of an amide-based solvent, preferably N,N-dimethylformamide or a sulfoxide-based solvent, preferably dimethyl sulfoxide. SPECIFIC COMPOUNDS - Use of 2 compounds (I) are specifically claimed i.e. (4-morpholin-4-yl-phenyl)-phenyl-methanone of formula (Ia) and bis-(4-diethylamino-phenyl)-methanone.    EXAMPLE - Hydroxygallium phthalocyanine (0.5 pts. wt.), (4-morpholin-4-yl-phenyl)-phenyl-methanone (1 pts. wt.), and N,N-dimethylformamide (10 pts. wt.) were subjected to a milling treatment in a ball mill together with glass beads (20 pts. wt.) each having a diameter of 0.8 mm at room temperature (23 degrees C) for 40 hours. A gallium phthalocyanine crystal was taken out of the dispersion with N,N-dimethylformamide and filtered, and then the residue on the filter was sufficiently washed with tetrahydrofuran. The filter residue was vacuum-dried to yield a hydroxygallium phthalocyanine crystal (0.5 pts. wt.).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The pre-cleaning steps are carried out using a mixed solution of ammonium hydroxide (3-6 mass%), hydrogen peroxide (2-5 mass%) and deionized water (89-95 mass%). In the method, the alkaline solution is 1-10 mass% of sodium hydroxide or potassium hydroxide and the etching solution is sodium hydroxide/potassium hydroxide (1-10 mass%), additive (0.1-1.0 mass%) and deionized water (89-98.9%). The additive is mixed solution of methanol/ethanol/water containing surfactant. The cleaning step is carried out using cleaning liquid including hydrochloric acid (1-10 mass%), hydrogen peroxide (1-5 mass%) and deionized water (85-98 mass%).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal in metal oxide is lithium, magnesium, aluminum and/or transition metal or combination of 2 or 5 metals. The electrolyte of the fuel cell is alkaline solution or alkaline membrane, where the pH of the alkali is greater than or equal to 8.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The refractive index of high-refractive-index film layer is more than the refractive index of the self-cleaning function film layer. Preferred Composition: The high-refractive index composite sol-gel contains silicic acid ester, solvent, water-soluble metal salt as raw material, and alcohol substance as catalyst. The silicic acid ester is n-silicic, ethyl orthosilicate or isopropyl alcohol. The solvent is chosen from hydrochloric acid, nitric acid, acetic acid, citric acid, ethanol, isopropanol and acid catalyst. The soluble metal salt is chosen from zinc chloride, zinc acetate, zirconium oxychloride, zirconium, titanium tetrachloride, butyl titanate, tantalum fluoride and tantalum precursor.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Condition: The Suzuki coupling reaction is carried out at 60-130 degrees C for 20-40 hours. Preferred Composition: The molar ratio of 3,7-dibromo-dibenzothiophene-5,5-dioxide and boron group-containing compound is 1:2-3. The addition amount of organic metal catalyst is 0.001-0.1 times than the content of 3,7-dibromo-dibenzothiophene-5,5-dioxide. The organic metal catalyst is organic palladium catalyst, or a mixture of organic palladium catalyst and organic phosphine ligand. The organic palladium catalyst is chosen from tris(dibenzylideneacetone)dipalladium(0), tetrakis(triphenylphosphine)palladium(0) and bis(triphenylphosphine)palladium(II) dichloride. The organic phosphine ligand is tri(o-tolyl)phosphine. The organic solvent is chosen from tetrahydrofuran, ethylene glycol dimethyl ether, benzene, chlorobenzene and toluene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The divalent copper salt is copper chloride, copper sulfate, copper nitrate, and/or copper acetate. The divalent zinc salt is zinc chloride, zinc sulfate, zinc nitrate, and/or zinc acetate. The stannous salt is stannic chloride, stannous octoate, stannous bromide, and/or tin acetylacetonate. The sulfur source is thioacetamide, sodium thiosulfate, thiourea, sodium sulfide, and/or sulfur powder.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The organic solvent is ethanol, ethylene glycol, or olelylamine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The aluminum has a purity of 99.5-99.9%. The iron content in the mixture is not greater than 0.8%. The weight ratio of silicon and aluminum is 20-30:80-70, preferably 25:75. Preferred Method: Cooling is carried out to 585 degrees C at 2 degrees C/minute. Aluminum is discharged from crystallization bed. The temperature of the bed is kept at 585 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate is IV group semiconductor substrate containing germanium, silicon and/or carbon. The group III element is gallium, indium and/or aluminum. The group V element is arsenic and/or phosphorus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The gas barrier layer comprises silicon oxynitride of formula: SiOxNy, where x is 0.9-1.3 and y is 0.4-0.6. The modification process is carried out at 150-200 degrees C for 0.1-1000 minutes. A polysiloxane main layer is provided on surface(s) of base material. The polysiloxane composition is of formula: SiOmCn, where m is 1.3-1.7 and n is 0.4-0.6.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The crystal is silicon. The particles, atoms, ions and radicals contain hydrogen.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The tempered glass substrate contains 40-70 %mass silica, 10-16.5 %mass alumina, 0.01-6 %mass boron trioxide, 0-4 %mass lithium oxide, 10-20 %mass sodium oxide, 0-6 %mass magnesium oxide, 0-4 %mass calcium oxide, total of 0-7 %mass strontium oxide and barium oxide, 0-10 %mass phosphorus pentoxide, 0-10 %mass titania, and 0-10 %mass zirconia. The mass ratio of sodium oxide and alumina is 0.8-2, preferably 0.8-1.5. The amount of tin oxide in substrate is 0.01-6 %mass. The total amount of titania and zirconia is 0.1-15 %mass. The total amount of magnesium oxide, calcium oxide, strontium oxide and barium oxide is 0.1-10 %mass. The substrate is chemically strengthened and has polished surface. The compressive-stress layer has surface compressive stress of 300 MPa or more, thickness of 10 mu m or more and tensile stress of 200 MPa or less. The glass has liquidus temperature of 1200 degrees C or less and liquid phase viscosity of 104 dPa.second or more.
TECHNOLOGY FOCUS - METALLURGY - The strip conductors are made of material that is selected from a group consisting of silver, nickel, zinc, copper alloy and/or molybdenum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nano multilayer structure further has sublayers (A) containing high gallium content. Preferred Property: The copper-indium-selenium absorber layer has thickness of 50-200 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic materials are phosphoric acid, water glass, cement, ceramic, colloidal silica, fumed silica, oxide sol, and/or bentonite. The crucible consists of alumina or material which essentially consists of mullite. Preferred Material: Stamping materials (3) are arranged between crucible and sensor.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The component (B1) is aluminum oxide.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The fatty acid ester of polyhydric-alcohol polymer is liquid at 10-40 degrees C, and has number average molecular weight of 1000-10000. The fatty acid ester of polyhydric-alcohol polymer is preferably polyglyceryl fatty acid ester. The component (A) comprises 5-49.9 %mass component (A1), 50-94.9 %mass component (A2) and 0.1-15 %mass component (D).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The shell precursor aqueous solution is a solution in which a platinum precursor is dissolved. The carbon support comprises one or more complex support materials comprising carbon black, carbon nanotube, carbon nanofiber, carbon nanocoil and carbon nanocage. The stabilizer is sodium dodecyl sulfate (SDS). The core precursor comprises a precursor of a transition metal comprising palladium, cobalt, iron, and nickel. EXAMPLE - De-ionized water (300 g) was mixed with 300 g acetylene black and the mixture solution was repeatedly subjected to stirring, homogenization, and ultrasonication so as to disperse the acetylene black. Then, the resultant solution was combined with 0.5 wt.% of sodium dodecyl sulfate with carbon and 200 mg of palladium nitrate was added to the solution and then stirred for 6 hours at 600-800 rpm. The reducing agent was added and then a high stirring speed was maintained for 30-60 minutes. A washing/filtering step using ethanol was repeated to completely remove residual sodium dodecyl sulfate. The catalyst core particle obtained after filtering was dried in a vacuum oven for 6 hours and then collected in a powder state.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The fabric is provided with layers made of woven glass and matte glass.    TECHNOLOGY FOCUS - POLYMERS - The fabric is provided with layers made of polyester.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Component: Lid (2) of silicon refining apparatus is provided on the opposite side of the crucible with respect to the lid (L1). The lid (L2) has opening-closing mechanism which can open and close the opening of the through-hole portion. The Lid (L2) covering opening of the through-hole portion and surface of the lid (L2) which opposing crucible consist of graphite material. The surface of the lid (L1) opposing the crucible, and side surface of the through-hole portion consist of graphite material. The lid (L1) is provided such that the opening of the through-hole portion is exposed and covers the opening of the through-hole portion. Preferred Process: A noble gas is supplied in the crucible and the deposit is melted during refining of silicon. The opening of the through-hole portion is covered with lid (L2) before melting the deposit.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The thiophene derivative is 3,4-ethylene dioxythiophene. The hydrophobic solvent is aromatic hydrocarbon. The surfactant is cationic surfactant. The hydrophobic solvent residual amount after process of removing hydrophobic solvent is 10 weight% or less with respect to polystyrene sulfonate or its salt. The water-soluble high boiling point solvent is dimethylsulfoxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The CIS type thin film solar cell which laminated successively the transparent conductive film provided with zinc oxide on the substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of nickel catalyst with respect to aryl carbamate compound is 0.1-20 mol%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The decarboxylation reaction of aryl carbamate compound (I) or (II) is performed in presence of nickel catalyst, and ligand which is coordinated to nickel. Preferred Composition: The content of ligand with respect to aryl carbamate compound is 0.1-20 mol%.
TECHNOLOGY FOCUS - POLYMERS - Preferred Conditions: Plasma-processing is carried out by injecting ion into the layer containing silicon-type high-molecular compound by plasma ion implantation. Preferred Components: The base material comprises an amorphous polymer having a glass transition temperature of 100 degrees C or more. The silicon type high-molecular compound is polysilazane compound, polycarbosilane compound, polysilane compound, and/or polyorganosiloxane compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The compound semiconductor is silver-zinc-tin-sulfide (Ag2ZnSnS4). Preferred Process: The heat processing method is carried out at 280 degrees C or more.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The tertiary sulfur-containing metallic compound content with measured so that it is 6 times or less than the stoichiometry composition ratio of compound semiconductor. The primary, secondary and tertiary sulfur-containing metallic compounds are dialkyl dithio carbamic acid compound containing silver, zinc and tin, respectively. The alkyl group contained in dialkyl dithio carbamic acid compound is ethyl group. The fatty amine is oleyl amine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The first output gas component, before introducing into the downstream reactor, is preferably enriched with the input gas to an amount of the input gas of the upstream reactor, where the enrichment amount is determined as a function of a measured gas composition of the first output gas component. In the method, further in each case downstream reactors are provided to the output gas of the upstream reactor after removing at least one portion of the respective second output gas component. The separated bodies are silicon thin-rods produced in Siemens reactor, or silicon pellets produced in a fluidized bed reactor. The second output gas component: is separated by condensation using a heat exchanger (4); and is at least partially recycled. In the method, at least one portion of the second output gas component is converted through at least one chemical reaction. The second output gas component is converted to silica, where at least one portion of the second output gas component is converted into the input gas. Preferred Components: The input gas of at least one of the downstream reactor is enriched in each case with the input gas. The input gas at least partly consists of trichlorosilane. The second output gas component at least partly consists of silicon tetrachloride.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: In the device, additionally a gas inlet (8) at at least one of the downstream reactors is provided for additionally feeding the input gas; and an exhaust gas reprocessing plant is provided for the preparation of the deposited gas. The exhaust gas reprocessing plant is a chemical reactor for chemical converting at least one deposited gas component. EXAMPLE - None given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The urethane (meth)acrylate is of formula (II) and has (meth)acryloyl group in both terminals. The fluorene structure-containing compound (I) is chosen from 9,9-bis(hydroxy(poly) 2-4C alkoxy phenyl)fluorene, 9,9-bis(mono- or di-1-4C alkyl hydroxy(poly)2-4C alkoxy phenyl)fluorene, 9,9-bis(mono- or di-6-8C arylhydroxy(poly) 2-4C alkoxy phenyl)fluorene and 9,9-bis(hydroxy(poly) 2-4C alkoxy naphthyl)fluorene. The diol compound is alkanediol or polyether-based diol compound having number average molecular weight of 200-5000, preferably 2-10C alkanediol or polyoxy-2-6C alkylene glycol having number average molecular weight of 250-2000. The polyisocyanate compound (A) is polyisocyanate compound including 1-20 wt.% isocyanate group with respect to the whole polyisocyanate compound (A). The (meth)acrylic-type compound is hydroxyl-group containing mono(meth)acrylate.J=H or (CH2=CR4-CO-X)q-(E)q-Y'-CO-NH-A-NH-CO-, at least two of J is (CH2=CR4-CO-X)-;R4=H or methyl;A=residue of polyisocyanate compound;X,Y'=ether group;E=coupling group;p=0 or 1;andq=1 or more. Preferred Definitions:    ring Z1,ring Z2=naphthalene ring;and    n=1-10.    EXAMPLE - 4.81 g 9,9-Bis(4-(2-hydroxyethoxy)phenyl)fluorene was dissolved in 24.65 g 1,4-dioxane, 24.1 g prepolymer of polytetramethylene ether glycol and diphenylmethane diisocyanate and 0.17 g di-n-butyltindilaurate were added to the reaction mixture, reacted at 80 degrees C for 20 hours, stirred in argon atmosphere, 2.72 g 2-hydroxyethyl acrylate and 0.55 g di-n-butyltindilaurate were added to the reaction liquid, reacted at room temperature for 24 hours, 18.1 mg hydroquinone was added to the liquid after completion of reaction, to obtain urethane (meth)acrylate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The compound A has cyclic structure or cage-like structure containing silicon-oxygen-silicon bond. The compound (A) has structure of formula: -O-Si(-R)(-X)-O- (I).R=6C or less organic group, preferably methyl, ethyl, or phenyl;andX=H, or hydroxy.Preferred Properties: The surface roughness of base material is 200-500 nm in Rz. The surface roughness of intermediate layer (12) provided between base material and gas barrier layer is 200-500 nm in Rz. The gas barrier layer has film thickness of 250 nm or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): An aromatic compound having predetermined substituent or its precursor structure, and fullerene are reacted in the presence of a Grignard reagent or metal halide to obtain fullerene derivative (I). The fullerene derivative has fullerene skeleton chosen from C60, C70, C76, C82, C84 and C90. Preferred Method: Fullerene and Grignard reagent having group of formula: A-(B'-O-R3) are reacted in the presence of a halogen compound of formula: R2-X to obtain fullerene derivative.X=halo. Preferred Definitions:    A=phenylene;and    B'=methylene.    R1 is coupled with at least one of carbon atom in partial structure of formula (III).    EXAMPLE - 75 mL Tetrahydrofuran suspension of 7.32 g copper bromide (I) was cooled to 5 degrees C. Tetrahydropyranyl methoxide-bromo(4-fluorophenyl)magnesium/tetrahydrofuran solution of Grignard reagent was added and heated at 25 degrees C. O-dichloro benzene solution of 3 g C60 was added and stirred for 2 hours. 3.9 mL Methyl iodide was added and stirred for 8 hours. The reaction liquid was filtered, tetrahydrofuran was removed, and product was diluted with toluene. The solution was concentrated, crystallized with 2-propanol, and vacuum-dried at 100 degrees C to obtain 6.01 g fullerene derivative at yield of 84.5%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Gas: The reactive gas is chosen from ammonia, methylamine, ethylamine, propylamine, isopropylamine, tertiary butylamine, n-butylamine, dimethylamine, diethylamine, hydrazine, monomethylhydrazine, dimethylhydrazine, diphenyl hydrazine and ethyleneimine.
TECHNOLOGY FOCUS - METALLURGY - The solar cell consists of material made from zinc oxidate, with the first or second transparent conductivity layer doped with indium tin oxide, aluminum-doped zinc oxide, aluminum-doped indium oxide, magnesium oxide, strontium titanate, gallium-doped zinc or aluminum-doped tin oxide, aluminum-doped tin oxide, lanthanum strontium cobalt oxide, lanthanum strontium manganite, strontium oxide, and iron or niobium-doped strontium ruthenate oxides.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The substrate is made of sapphire, silicon carbide, silicon or glass.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: In the second step, the compound containing two aldehyde group is glutaraldehyde or terephthalaldehyde.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The solvent is water. The initiator is ammonium persulfate. The reducing agent is sodium borohydride. The mass ratio of nitrogen-doped carbon hollow ball and chloropalladic acid solution is 1:0.3-4. The concentration of the chloropalladic acid solution is 25 mM to 0.2 M. The content of nitrogen in hollow carbon ball is 10.4-22.4 %mass. Preferred Process: During formation of palladium-based catalyst, chloropalladic acid solution and mixed solution containing chloroauric acid, chloroplatinic acid, aluminum chloride, cobalt chloride and/or manganese chloride are added at same time. In addition to palladium metal, 0-15 %mass of other metals are added.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Condition: The Suzuki coupling reaction is carried out at 70-130 degrees C for 20-48 hours. Preferred Composition: The molar ratio of 3,7-dibromo-dibenzothiophene-5,5-dioxide and boron group-containing compound is 1:2-1:4. The addition amount of organic metal catalyst is 0.001-0.1 times than the content of 3,7-dibromo-dibenzothiophene-5,5-dioxide. The organic metal catalyst is organic palladium catalyst, or a mixture of organic palladium catalyst and organic phosphine ligand in a molar ratio of 1:4-6. The organic palladium catalyst is chosen from tris(dibenzylideneacetone)dipalladium(0), tetrakis(triphenylphosphine)palladium(0) and bis(triphenylphosphine)palladium(II) dichloride. The organic phosphine ligand is tri(o-tolyl)phosphine. The organic solvent is chosen from tetrahydrofuran, ethylene glycol dimethyl ether, benzene, chlorobenzene and toluene.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent comprises hydrazine, hydrous hydrazine, ethanolamine, ethylenediamine (EDA), propylenediamine (PDA), and/or dimethyl sulfoxide (DMSO).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The chloride compound is chosen from sodium chloride, ammonium chloride, potassium chloride and calcium chloride. The silver fine particles dispersion liquid contains 40-65 mass% silver fine particles. The water-type dispersion medium is a solvent containing greater than or equal to 50 mass% water. Preferred Parameters: The average particle diameter of the silver fine particles is 1-100 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Alkaline solution of palladium and platinum are mixed during manufacture of precursor. Alternatively, palladium-acetate and platinum-acetate are reacted at high temperature and platinum reacted with organic amine. Then, palladium-acetate and platinum acetate are mixed, to obtain platinum amide, to obtain precursor.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The substrate comprises silicon substrate, gallium arsenide, gallium antimonide, indium phosphide and/or gallium nitride, preferably multicyrstalline silicon. Preferred Properties: The silica particles have diameter of 100-300 nm. The antireflective layer has total specular reflection of less than 5%.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The crystalline polyester is poly(ethylene-2,6-naphthalate) copolymerized of dimethyl-2,6-naphthalene dicarboxylate, ethylene glycol, and tricyclodecane dimethanol. The amorphous polyester is cyclohexane dimethanol-modified poly(ethylene-terephthalate) copolymerized of terephthalic acid, ethylene glycol, and cyclohexane dimethanol, where the ethylene glycol and the cyclohexane dimethanol have a molar ratio of 50:50-80:20, and the cyclohexane dimethanol comprises 1,3-cyclohexanedimethanol and/or 1,4-cyclohexanedimethanol. Preferred Method: The step of biaxial stretching the sheet is performed by a stretching speed of 1-40%/second, with a stretching ratio greater than 3.5x 3.5 and at 120-160 degrees C. EXAMPLE - Poly(ethylene-2,6-naphthalate)(PEN) pellets were vibrating sieved. The PEN pellets were dried at 100 degrees C for 48 hours. Poly(ethylene-terephthalate) copolymerized of terephthalic acid (PETG) pellets were vibrating sieved. The PETG pellets were dried at 80 degrees C for 8 hours. Then 85 pts. wt. dried PEN and 15 pts. wt dried PETG were weighed and homogeneously mixed. The resulting blend was melt extruded on twin screw extruder at 255-310 degrees C to form a transparent sheet by casting at 70 degrees C. The sheet was cut to a size of 117 mmx 117 mm, and put in a biaxial stretching machine. The sheet was pre-heated at 140 degrees C for 60 seconds and biaxially stretched at stretching speed of 10%/second, and stretching ratio of 5x 5 to form a film. The film was heat-set at 230 degrees C for 60 seconds.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of element (A) is 1.65 atomic% more than solid solubility limit of element (A) in the aluminum. The element (A) has solid solubility limit in the aluminum of 0.1-99.9 atomic% or more. The element (A) is chosen from silicon, beryllium, manganese, germanium, copper, gallium, lithium, magnesium, silver and zinc. The metallic glass further contains element (B) chosen from transition element, and element (C) chosen from rare earth element. The element (B) is nickel. The element (C) is yttrium. The content of silicon with respect to total amount of metallic glass is 1.5-3 atomic%. The conductive powder is chosen from silver, aluminum, copper and nickel. The content of conductive powder and metallic glass is 30-99 weight% and 0.1-20 weight%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Shielding body contains heat insulating materials e.g. carbon-type felt or oxide-type felt.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The particles are inorganic particles having average particle diameter of 10-100 nm. The inorganic particles are chosen from silica, alumina and titania. The aggregate of particles has shear fracture strength of 3 MPa or less, total void volume of 50% or more and void diameter of 10 nm or more.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The resin is a thermosetting resin. The thermosetting resin is a phenol resin.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The functional group contains electron withdrawing group(s).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The upper surface offcut purified substance, side surface offcuts, and bottom face offcuts are used as raw material silicon, during recycling method. The purification process involves immersing purification lump support component in silicon melt solution which is obtained by melting upper surface offcuts, and depositing purification lumps as upper surface offcuts purified substance on surface of purification lump support component. Recycling of silicon offcuts further involves performing unidirectional solidification process by unidirectional solidifying upper surface offcuts, and producing polycrystalline-silicon lump, performing condensed portion removal process which removes condensed portion of impurity from the polycrystalline-silicon lump, and manufactures the upper surface offcuts purified substance, cleaning and/or cutting off the surface of bottom face offcuts and/or side surface offcuts. The cutting process further includes cutting the upper surface of upper surface offcuts.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The nonflammable component is a silica wool. The silica wool is inserted such that the density is set to 0.2-0.6 g/cm3.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Process: Surface temperature of base plate or bell-jar of reactor when the reaction starts, is controlled at 40 degrees C or more.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The silicon rod temperature fall is set to 50-350 degrees C. The increase of supply amount ratio of the hydrogen gas with respect to the chlorosilane gas is performed before setting diameter of the silicon rod to 40 mm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The upper surface side of bottom face portion has a flat surface, and convex portion in the center portion.
TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Electrically conductive paste contains 0.1-10 mass% alkyl-modified polyvinyl alcohol. Water-based solvent contains greater than or equal to 60 mass% water. Alkyl group in alkyl-modified polyvinyl alcohol is alkyl group with 15-26 carbon atoms. Monomeric unit is N-alkyl methacrylamide unit of formula -CH2-C((R2)(C(=O)(NH-R1))) (I).R1=5-29C alkyl group; andR2=H or Me.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The substrate is low-alkali glass substrate containing 3-14 wt.% sodium oxide and potassium oxide. Preferred Properties: The average grain size of the light-absorption layer is 0.3 mu m or more. The conversion efficiency of the photoelectric element is 7% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The bottom subcell is formed of germanium. The p-type-semiconductor layer, n-type-semiconductor layer and quantum layer are formed of indium gallium arsenide. The barrier layer is formed of gallium nitrogen arsenide. The subcell located in light incidence side is formed of indium gallium phosphide, aluminum gallium arsenide and aluminum gallium indium phosphide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The photoelectric conversion element comprises n-type amorphous silicon-germanium, n-type amorphous silicon, n-type amorphous silicon nitride, n-type amorphous silicon carbide, n-type amorphous-silicon carbon nitride, p-type amorphous silicon-germanium, p-type amorphous silicon, p-type amorphous silicon nitride, p-type amorphous silicon carbide and a p-type amorphous-silicon carbon nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: Layer (40) contains indium-gallium arsenide of formula: InxGa1-xAs, where x is 0.25-0.3. Layer (14) contains indium-gallium phosphide of formula: InyGa1-yP, where y is 0.48-0.8. The grading buffer layer has 8 or more layers.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In the method (M1): the step of forming a molten area of each treatment zone further comprises exposing the surface of each treatment zone to a second laser pulse, where a duration between the first laser pulse and the second laser pulse is less than a time necessary for a portion of the molten area to refreeze; the first laser pulse and the second laser pulse have the same duration and intensity; and each pulse of the laser pulses has the same duration and intensity as the first laser pulse, or each pulse of the laser pulses has a duration or an intensity that is different from the first laser pulse. In the method (M2): each pulse of the first laser pulses overlaps with adjacent pulses; a duration between each pulse of the first laser pulses and adjacent pulses of the first laser pulses is the same; a duration between each pulse of the second laser pulses and adjacent pulses of the second laser pulses is the same; and an intensity of each pulse of the first laser pulses and of each pulse of the second laser pulses is the same. Preferred Components: The second treatment zone and the first treatment zone share a boundary. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The hydrogen-peroxide solution and foamable cleaning liquid contain sodium carbonate as alkali. The concentration of hydrogen peroxide and alkali in the aqueous medium is 0.1-35 weight% and 0.1-20 weight%, respectively. The alkaline components of etching liquid are sodium hydroxide and/or potassium hydroxide. The concentration of alkali is 0.1-50 weight%. The silicate compound is sodium silicate or potassium silicate. The cleaning liquid comprises hydrogen fluoride and 0.1-90 wt.% hydrochloric acid as mineral acid. The concentration of the hydrofluoric acid in aqueous medium is 0.01-20 weight%. Preferred Property: The size of pyramid-like corrugation is 2-4 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The etching inhibitor is chosen from polyethylene oxide, carboxylic acid or its salt, optionally substituted benzene carboxylic acid or its salt, optionally substituted benzenesulfonic acid or its salt, optionally substituted benzenesulfonate or its salt, alkyl sulfonic acid, or its salt, alkyl sulfonate or its salt, optionally substituted benzenesulfonate or its salt, etching inhibitor of formula: R-O(CH2-CH2-O)n-H, R1-X1 and of formula (I). The concentration of the etching inhibitor is 0.0001-30 weight%. The etching liquid contains a 10 wt.% or less silicate compound.R=branched 8-20C alkyl;n=3-20;R1=4-15C alkyl, alkenyl, or alkynyl;X1,X2=sulfonic acid group or its alkali salt;andR2,R3=H, alkyl, alkenyl, or alkynyl.The total number of carbon in R2 and R3 is 0-2.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of N-methyl formamide is 50-100 wt.% with respect to total content of dispersing agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of graphene oxide is 0.001-10 wt.%. The photocatalyst composition further contains metal compound chosen from molybdenum, bismuth, cobalt, vanadium, silver, copper, zinc, ruthenium, strontium, the potassium, gallium, tantalum, thulium, niobium, platinum, iron, silicon, zirconium, aluminum, cadmium, tin, tungsten, nickel, germanium, antimony, phosphorus, cesium, barium, lanthanum, actinium and arsenic.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mass concentration of hydrofluoric acid, mass concentration of nitric acid and mass concentration of sodium hydroxide solution is 49%, 68% and 5%, respectively. The volume ratio of hydrofluoric acid and nitric acid is 3: 14. The strong acid solution is mixed solution of hydrofluoric acid, nitric acid and sulfuric acid in volume ratio of 1:10:7. In the mixed solution of hydrofluoric acid, nitric acid and sulfuric acid, mass concentration of hydrofluoric acid, mass concentration of nitric acid and mass concentration of sulfuric acid is 49%, 68% and 98%, respectively. The hydrofluoric acid solution has mass concentration of 8%.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The substrate comprises borosilicate glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The TCO layer comprises tin oxide.
TECHNOLOGY FOCUS - METALLURGY - A backing tube contains molybdenum alloy or copper indium gallium alloy sputtering material on the outer surface.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The deposited layer contains zinc oxide-aluminum, tin oxide (SnO3/x) or indium oxide (In2O3/x), where x is metallic element.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The electrode material is selected from C, Mg, Zn, Li4Ti5O12, SnO, SnO2, SiSnO3, Li2SnO3, SnP2O7, LiSn2(PO4)3, Sn3(PO4)2, Sn2(BPO)6 glass, CaSnO3, SrSnO3, BaSnO3, CaSnO4, CaFe2O4, NaFeSnO4, FeBO3, Fe3BO6, MnV2O6, and/or MnMoO4. The separator material is selected from MgO, CaO, SiO2, Al2O3, ZrO2, Ce2O3, Y2O3, ThO2, and/or BN.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The resin composition in the form of pellet is injected into melt indexer of cylinder having orifice-diameter of 1 mm at 330 degrees C, and 10 kg load is applied, the melt flow rate of resin composition measured after pre-heating for 5 minutes is 3-20 g/10 minutes. A polyhalo aromatic compound (a), alkali-metal sulfhydrate (b) and organic acid alkali metal salt (c) are reacted in presence of solid alkali-metal sulfide and aprotic polar organic solvent, to obtain crude polyarylene sulfide resin having carboxyl group. The resulting crude product is subjected to deionization process, to obtain polyarylene sulfide resin. Preferred Composition: The content of carboxyl group of alkali metal salt contained in polyarylene sulfide resin (A) is 2-20 mu mol/g. The polyarylene sulfide resin composition further comprises filler and silane coupling agent. The content of filler and silane coupling agent with respect to 100 parts mass of polyarylene sulfide in addition to polyarylene sulfide resin (A) and polyolefin (B) is 0.1-50 parts mass, and 0.01-1 parts mass, respectively. The moisture content of organic acid alkali metal salt (c) with respect to total content of 1 mol of solid alkali-metal sulfide and alkali-metal sulfhydrate (b) is 0.01-0.9 mol. The content of organic acid alkali metal salt (c) is 0.02 mol or less with respect to 1 mol aprotic polar organic solvent.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The resin composition in the form of pellet is injected into melt indexer of cylinder having orifice-diameter of 1 mm at 330 degrees C, and 10 kg load is applied, the melt flow rate of resin composition measured after pre-heating for 5 minutes, is 3-20 g/10 minutes. Polyhalo aromatic compound (a), alkali-metal sulfhydrate (b) and organic acid alkali metal salt (c) are reacted in presence of solid alkali-metal sulfide and aprotic polar organic solvent, to obtain crude polyarylene sulfide resin having carboxyl group. The resulting crude product is subjected to deionization process, to obtain polyarylene sulfide resin. Preferred Composition: The content of carboxyl group of alkali metal salt contained in polyarylene sulfide resin (A) is 2-20 mu mol/g. The moisture content of organic acid alkali metal salt (c) with respect to total content of 1 mol of solid alkali-metal sulfide and alkali-metal sulfhydrate (b) is 0.01-0.9 mol. The content of organic acid alkali metal salt (c) is 0.02 mol or less with respect to 1 mol aprotic polar organic solvent. The polyarylene sulfide resin composition further comprises filler and silane coupling agent. The content of filler and silane coupling agent with respect to 100 parts mass of polyarylene sulfide in addition to polyarylene sulfide resin (A) and polyolefin (B) is 0.1-50 parts mass, and 0.01-1 parts mass, respectively.
TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Electrically conductive paste contains 0.1-10 mass% polyoxyalkylene-modified vinyl alcohol polymer. Water-based solvent contains greater than or equal to 60 mass% water. Polyoxyalkylene group is polyoxyethylene group, polyoxypropylene group, and/or polyoxybutylene group. Number of units of polyoxyalkylene group is 2-50. Polyoxyalkylene group is represented by formula -(CH2-CH(R1)-O-)m-(CH2-CH(C2H5)-O-)n-R2 (I).R1=H or Me;R2=H or 1-8C alkyl group;m=1-30; andn=1-20.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Composition contains 0.01-5 wt.% solid. Mole ratio titanium/silicon is 0.001-0.08. Composition contains 1-60 mol.% silicon derived from silica particle. Preferred Parameters: Average particle diameter of silica particle in colloidal silica-sol measured with transmission electron microscope is 5-200 nm. The pH of composition is 6.5-8. Preferred Processes: Heating process is performed at 60-250 degrees C.
TECHNOLOGY FOCUS - POLYMERS - Preferred Conditions: Ethylenically-unsaturated-group-containing compound does not react with epoxy resin. Preferred Compositions: Epoxy resin contains greater than or equal to 50 mass% silsesquioxane of formulae (A-1)-(A-3). Epoxy resin contains cycloaliphatic epoxy resin with water group. Cycloaliphatic epoxy resin contains greater than or equal to 50 mass% ester group. Flexibility imparting agent is polymer obtained by polymerizing greater than or equal to 1 types of ethylenically-unsaturated-group-containing compound.R=alicyclic epoxy group.Preferred Processes: Composition for composite resin sheets is obtained by polymerizing ethylenically-unsaturated-group-containing compound by heating and adding 100 mass parts epoxy resin, 5-25 mass parts flexibility imparting agent, and glass fiber.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The plasma is inductively coupled plasma. Material gas contains silane compound, and oxygen and hydrogen.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The silane compound is an organosilicon compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Nanocarbon filler is carbon nanohorn. Nanocarbon filler is mixture of carbon nanohorn and carbon nanotube. Metal oxide base is crystalline oxide of aluminum, silicon, magnesium, titanium, zirconium, yttrium, and/or cerium. Metal oxide base is amorphous oxide of aluminum, silicon, magnesium, boron, calcium, barium, lithium, sodium, and/or potassium. Nanocomposite material contains 0.1-80 wt.%, preferably 0.3-60 wt.% nanocarbon filler and 20-99.9 wt.%, preferably 40-99.7 wt.% metal oxide base. Preferred Processes: Mixing process involves adding surfactant-containing water to mixed solvent of alcohol and/or acetone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The composition comprises 5-30 mass%, preferably 5-15 mass%, 30-95 mass%, or 5-95% silicon, based on the sum of the mass proportions of silicon and aluminum. The composition is a paste having viscosity of 10-500 Pas. The composition comprises 25 wt.% etchant and solvent. The silicon and aluminum are in the form of particles having an average particle size of 0.5-20 mu m.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: The method comprises: coating region of the solar cell with solar cell-screen printing-composition by a screen printing method; coating another region of the solar cell, which is adjacent to the coated region, with solar cell-screen printing-composition that is free of silicon, prior to heating the solar cell; and applying an additional layer comprising a solderable material over the solar cell-screen printing-composition, after heating the solar cell. The solderable material is applied by vapor deposition, sputtering, galvanizing, chemical vapor deposition or thermal spraying. The solar cell is heated to 700-900 degrees C, preferably 800 degrees C, during heating. The solar cell has an n-type emitter, where the solar cell-screen printing-composition is applied on the back side of the solar cell, or a p-type emitter, where the solar cell-screen printing-composition is applied on the front side of the solar cell. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The layer of fine-grained raw material with an average particle size of 0.1-3 mm serves as a substrate, which is provided directly on a floor of the container and has a thickness of 1-5 cm. The substrate has the temperature of not greater than 1200 degrees C, preferably not greater than 1000 degrees C during bringing in contact with the liquid silicon. The substrate is at least partially made of a material including silicon, silicon carbide, silicon nitride or graphite. The number of grains decreases from a base to a cap towards the ingot. The number of grains decreases at least 20%, preferably at least 30% from the base to the cap. A defect portion is constant from a certain height. The height is at least 50 cm, preferably at least 100 cm. Preferred Method: The method comprises generating the fine-grained silicon layer. The liquid silicon rapidly solidifies to produce the fine-grained silicon layer. The liquid silicon is brought in contact with a substrate at a temperature below the melting temperature of silicon for producing the fine-grained silicon layer. The temperature is maintained in the range of the fine-grained silicon layer during the solidification of the silicon melt at the temperature below the melting temperature of silicon. The solidification of the silicon melt is carried out at near-equilibrium.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The substrate is at least one panel (4), a layer of fine grain, or a bottom (9) of the container. The fine-grained silicon layer is generated in the same container, in which the silicon melt is solidified. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The weight ratio of fine particulate and transition metal-based catalyst is 2-5:1. The transition metal-based catalyst is chosen from chromium compound and iron compound. The weight ratio of chromium compound and fine particulate is 1:2. The chromium compound is chromium nitrate. The weight ratio of iron compound and particulate is 1:4-5. The iron compound is chosen from ferrocene and ferric chloride.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The tire is waste tire. Preferred Process: The tire is shredded and cut into pieces to the size of 1-4 cm2, before thermal decomposition. The method further involves pretreating the tire by immersing in 30% (weight/weight) solution of zinc chloride, refluxing for 24 hours and drying, before thermal decomposition. Alternately, the carbon nanomaterial (graphene/carbon nanoparticles) is prepared by mixing waste tire pieces with ferric chloride in a weight ratio of 5:1, and heating the mixture at 800-1200 degrees C for 30-90 minutes.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The 1st layer is tin oxide (SnO2), aluminum-doped tin oxide (Al:SnOx), magnesium-doped tin oxide (Mg:SnOx), tin-doped zinc oxide (SnZnO4), tin-doped aluminum oxide (Sn:AlOx), tin-doped magnesium oxide (Sn:MgOx), indium tin oxide (ITO), titanium oxide (TiOx), silicon titanium oxide (SiTiOx), or silicon nitride (SixNy). Preferred Parameters: Thickness of 1st layer is 0.5-100 nm, preferably 10 nm. Thickness of bismuth oxide layer is 10-1000 nm, preferably 100 nm. Preferred Processes: Bismuth oxide film is subjected to anneal treatment at 650 degrees C for 8 minutes in air.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The high surface area material comprises: metal oxides consisting of oxides of cerium, zirconium, lanthanum, yttrium, praseodymium, neodymium, samarium, tungsten, barium, strontium and/or molybdenum; and a transitional phase, high surface area promoted alumina, which is promoted with oxides of cerium, zirconium, lanthanum, yttrium, praseodymium, neodymium, samarium, tungsten, barium, strontium and/or molybdenum. The support for the catalyst comprises: praseodymium oxide and/or neodymium oxide; and an alkali or alkaline earth metal dopant (0.1-10 wt.%), which consists of oxides of sodium, potassium, cesium and/or rubidium, and gallium, neodymium, praseodymium, tungsten, germanium, iron and/or their oxides.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The solar photovoltaic cell component is made of gallium arsenide (GaAs).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compound: The reactive gas is chosen from ammonia, hydrazine, monomethylhydrazine, dimethylhydrazine and diphenylhydrazine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The sodium compound grain is anhydrous sodium sulfate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The bypass diode is made of silicon, germanium or III-V semiconductors.    TECHNOLOGY FOCUS - METALLURGY - The module comprises diode carriers with the surface metallization part for the soldering or sticking contact, made of nickel, gold, palladium, silver and alloys e.g. nickel palladium and a contact of gold or nickel. The diode carriers are made of aluminum, copper and brass. The module comprises a frame made of aluminum, copper and alloys.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The iron-nickel alloy metallic foil substrate contains iron-45 wt.% nickel alloy and iron-55 wt.% nickel alloy. Preferred Property: The iron-nickel alloy metallic foil substrate has thickness of 1-100 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The electrolyte-1 is lithium hexafluorophosphate. The non-aqueous electrolyte further comprises cyclic carbonate having carbon double bond, and electrolyte different from the compound (I). The sulfur dioxide compound (I) is lithium bis (fluorosulfonyl) imide. Preferred Composition: The concentration of the compound (I) is 00.1 mol/l or more. The 100 mass% solvent comprises 40 mass% or more ethylene carbonate content. Preferred Properties: The freezing point of the solvent is 30 degrees C or more. The freezing point of the non-aqueous electrolyte is less than that of the non-aqueous electrolyte containing electrolyte (1) of the mole concentration same as sum of total mole concentration (mol/l) of the compound represented by electrolyte-1 and the compound (I). The viscosity of the non-aqueous electrolyte is less than that of the non-aqueous electrolyte comprising the electrolyte-1 of the mole concentration same as sum of total mole concentration (mol/L) of the compound represented by the electrolyte-1 and compound (I).
SPECIFIC COMPOUNDS - Use of 15 compounds are disclosed as the derivative (I), e.g. N4,N4'-diphenyl-N4,N4'-bis-(1,1';2',1'')terphenyl-4'-yl-(1,1')binaphthalenyl-4,4'-diamine (Ia); N4,N4'-bis-biphenyl-3-yl-N4,N4'-diphenyl-(1,1')binaphthalenyl-4,4'-diamine; N4-phenanthren-9-yl-N4,N4'-diphenyl-N4'-(1,1';2',1'')terphenyl-4'-yl-(1,1')binaphthalenyl-4,4'-diamine; N4,N4'-bis-(4-naphthalen-1-yl-phenyl)-N4,N4'-diphenyl-(1,1')binaphthalenyl-4,4'-diamine; and N4,N4'-bis-(3-naphthalen-1-yl-phenyl)-N4,N4'-diphenyl-(1,1')binaphthalenyl-4,4'-diamine.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The complexing agent further comprises sodium tartrate, sodium salicylate or ethylenediamine. The molasses is soybean molasses, beet molasses or glucose honey. The surfactant is perfluoro polyoxyethylene, potassium perfluorooctyl sulfonate, perfluoro octyl sulfonyl fluoride, perfluoroalkyl ether carboxylic acid ester.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Method: The raw materials are pre-mixed for 60-80 minutes. The raw materials are dried for 1-3 hours. The smelting is carried out for 60-90 minutes. The water quenching is carried out at 25 plus minus 10 degrees C. The block is dried for 8-24 hours.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The time of standing is 20 hours. The product obtained by centrifuging, washing by ethanol and roasting for 1 hour at 600 degrees C to obtain mesoporous ball.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The oxidant is hydrogen peroxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - A passivating film is made of aluminum oxide. The laser etching apparatus is made of indium tin oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The raw materials in the step (a) comprises (in parts by wt.) tungsten source, molybdenum source or vanadium source (3), expandable graphite (1), surfactant (0.3) and solvent (60). Preferred Method: The step (b) comprises increasing the temperature to 800-1000 degrees C, and heat treating at 900 degrees C for 3-8 minutes, preferably 5minutes. The step (d) comprises dripping the precursor at a dripping speed of 4 ml/minutes under vacuum degree of -0.03 MPa to inject into expanded graphite. The step (d) comprises stirring at 100 degrees C under rotation speed of 1600 rotations/minute for 5 hours to evaporate the solvent. In the step (e), the pulse opening time is 12 seconds, pulse closing time is 12 second and the pulse frequency is 10 times. The step (f) comprises carrying out nitriding treatment at the speed of 150 ml/minute.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The carbon type reducing agent is chosen from petroleum coke, graphite grains and carbon black.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Particles: The electroconductive fine particles are silver or its alloy.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compound: The thermosetting compound is a compound having an epoxy group, preferably epoxy compound having bisphenol A type structure, bisphenol F type structure, or alkyl-diphenol type structure. The hardening agent is addition polymerization type hardening agent or ionic polymerization type hardening agent, preferably ionic-polymerization type hardening agent. The weight ratio of thermosetting compound and hardening agent in binder resin is 100/0.1-100/10. The sintering temperature is temperature less than curing temperature of hardening process by 10 degrees C or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The raw material solution of transparent conductive film contains water and methanol as solvent, and fluorine atom at the concentration of 22 atomic% or more with respect to tin. Preferred Process: The manufacture of transparent conductive film involves continuing heat processing method during formation of transparent conductive film, and annealing in the temperature gradient of -20 degrees C/minute or less.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The conductive substrate is non-porous. The voltage of the electroplating is less than 0.2 Volts and greater than -1 Volts versus silver/silver chloride reference electrode. Preferred Method: The step of electroplating the surface of the conductive substrate is at a rate such that the particles form on the conductive substrate faster than necessary to form shiny platinum and slower than necessary to form platinum black. The step of electroplating is accomplished at a rate of more than 0.05 mu /minute to less than 1 mu /minute, or at a rate of 1 mu /minute to less than 10 mu /minute. The electroplating is controlled by the electrode voltage, where the voltage is a constant voltage. The controlled voltage causes at least a partially diffusion limited plating reaction.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The electroplating solution is at least 3 mM but less than 30 mM of ammonium hexachloroplatinate in 0.4 M disodium hydrogen phosphate.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The non-metallized substrate contains liquid crystal polymer, polyimide, polyethylene terephthalate, filled polytetrafluoroethylene, unfilled polytetrafluoroethylene, polytetrafluoroethylene woven glass, polytetrafiuoroethylene non woven glass, low temperature cofired ceramic and/or high temperature cofired ceramic. The non-metallized substrate contains liquid crystal polymer, KAPTON (RTM: Polyimide tape), SPEED BOARD C (RTM: Prepreg), polyethylene terephthalate, ULTRALAM (RTM: microwave laminate), and DUROID (RTM: microwave laminate). A photosensitive chemical used to coat non-metallized surface contains silver nitrate based liquid, silver chloride based with citric acid and photosensitive gelatin, iron based material, chrome copper based material, and/or chrome nickel based material. Preferred Property: The printed circuit comprises fine line images down to 0.00025 inches.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The zinc oxide film layer is formed on the upper N-type crystalline silicon layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The silica raw material has median particle size of 110-150 mu m. The mass ratio of particles having particle size of less than 45 mu m and particles having particle size of 250 mu m in the silica raw material is 1:15. The glass-making feedstock is prepared using the glass composition containing 50-80 %mass silica, 5-25 %mass alumina, 3-20 %mass boron trioxide, 3-25 %mass alkaline earth metal oxide, 0-10 %mass zinc oxide, 0-10 %mass zirconium dioxide, 0-15 %mass magnesium oxide, 3-15 %mass calcium oxide, 0-15 %mass stronium oxide and 0-15 %mass barium oxide, and does not contain alkali metal.
TECHNOLOGY FOCUS - POLYMERS - The coating is made of PTFE.
TECHNOLOGY FOCUS - IMAGING AND COMMUNICATION - Preferred Composition: The electroconductive ink composition further comprises copper fine particles. Preferred Process: The electroconductive ink composition is obtained by mixing formic acid and copper fine particles, and copper fine particles and ethanolamine.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The average particle diameter of copper fine particles is 5 mu m or less. The quantity of copper formate is 1-50 wt.%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ethanolamine is monoethanolamine, N-methyl ethanolamine, N,N-dimethylethanolamine, diethanolamine, triethanolamine, N-methyldiethanolamine, aminoethylethanolamine, N,N,N'-trimethyl aminoethylethanolamine, N-(2-hydroxyethyl)morpholine, N-(2-hydroxyethyl)piperazine and/or N-methyl-N'-(2-hydroxyethyl)piperazine. The total amount of ethanolamine is 10-95 wt.%.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Property: The resistance of Negative type and positive type float-zone single crystal silicon is 300-500 Omega cm and 500-2000 Omega cm, respectively. The diameter of float-zone single crystal silicon is 2-12 inch( phi ).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The additive is made of lithium bisoxalate borate or a difluoro lithium phosphate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The additive is made of vinylene carbonate, vinyl ethylene carbonate, and fluoroethylene carbonate.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polymer comprises 3,4-ethylenedioxy thiophene or its derivative. The composition further comprises polyacid preferably polystyrene sulfonic acid. The electro-conductive substrate comprises resin substrate comprising polyester resin, polyamide resin, polyimide resin, polyurethane resin, polystyrene resin, polyolefin resin, acrylic resin, vinylester resin, styrene resin and/or halogen atom-containing vinyl resin.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Definitions:    Ar1-Ar2 = 65 divalent group of formula e.g. (a)-(t).    EXAMPLE - N-(6-Chlorobenzo(c)(1,2,5)thiadiazol-5-yl)nonanthioamide was dissolved in acetonitrile (500 ml). Then cesium carbonate (3 equivalent) was added to the solution, and the resultant solution was agitated at 70 degrees C for 2 hours. After completion of the reaction, the reactant was cooled down to a room temperature of 24 degrees C, condensed under reduced pressure, concentrated, and worked up to give 2-octylthiazolo(5,6-q)benzo-2',1',3'-thiadiazole (II) (6.6 g). (II) (1 g) was dissolved in chloroform (10 ml), and then N-bromosuccinimide (1.3 g) was added to the resulting solution. The resultant solution was agitated at 45 degrees C for 30 minutes and at 50 degrees C for 90 minutes. The reactant was condensed under reduced pressure, and passed through silica column to give 2'-octylthiazolo(5,6-q)benzo-2,1,3-thiazole-4,7-dibromide.
TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Properties: The fiber of winged type comprises a middle region having 16-32 projections extending from the middle region and around the periphery of the middle region. The cloth is nonwoven, knit or woven. The web includes both winged and non-winged fibers. Fibers (II) are flat, ribbon-shaped fibers. Fibers (II) are densely packed along the outer surface to provide wind resistance such that the fabric has a cubic feet per minute per m2 (CFM) of less than 5. Fibers (II) are lobes from fibers (I). The fabric is treated to create the outer surface of fibers (II) from fibers (I).
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Apparatus: The solid-liquid separator has a distillation apparatus for distilling vaporized liquid component, and hot blast generator (50) for generating hot air by heating the heating surface. The solid-liquid separator further has a cylindrical cooling bath for cooling separated solid component, several group blades, and a chiller pressed on the cooling surface of a cooling bath inner periphery.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Disclosed): The silicon-containing compound (I) is obtained by reacting primary compound having silyl group and secondary amine. EXAMPLE - 0.10 mmol Alkyl-functionalized carbazole dye, 0.11 mmol oxalyl chloride, 0.01 ml dimethylformamide and 2 ml chloroform were stirred at 25 degrees C for 1 hour and cooled at 10 degrees C. 0.20 mmol N,N-diisopropylethylamine and 0.10 mmol (triethoxysilylmethyl)hexylamine were added and stirred for 1 hour. 2 ml Water was added to reaction liquid, and oil-and-water liquid-separated. The reaction mixture was purified, 108 mg (2E)-2-cyano-3-(5-(5-(5-(5-(9-ethyl-9H-carbazol-3-yl)-3-hexylthiophen-2-yl)-3-hexylthiophen-2-yl)-3-hexylthiophen-2-yl)-3-hexylthiophen-2-yl)-N-hexyl-N-((triethoxysilyl)methyl)prop-2-enamide, with yield of 89%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent is N-methylpyrrolidinone and/or tetrahydrofuran.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polyimide polymer comprises Matrimid 9725 (RTM: Polyimide). Preferred Method: The step of milling is performed for 6 minutes in 30 second intervals. The step (c) is performed for 24 hours. The annealing step is carried out in a vacuum oven at 30 in mercury vacuum at 60-150 degrees C for 24 hours.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The boiling point is 70-400 degrees F. The hydrotreating comprises hydrodeoxygenation. The hydrotreated product is a middle distillate fraction. The biorenewable feedstock is: monoglycerides, diglycerides, triglycerides and/or fatty acids; and animal fats, animal oils, poultry fat, poultry oil, plant fats and oils, vegetable fats, vegetable oils, rendered fats, rendered oils, restaurant grease, brown grease, yellow grease, floatation grease, waste industrial frying oils, fish oils and/or tall oil. EXAMPLE - A 100 cc isothermal tubular reactor was filled with 80 cc of a commercial nickel-molybdenum catalyst and 70-100 mesh glass beads. The catalyst was sulfided with dimethyl disulfide. The sulfiding procedure included step-wise temperature increase to 650 degrees F. After sulfiding, the reactor was cooled to 400 degrees F. Next a triglyceride/fatty acid feed was introduced to the isothermal reactor. The reactor was slowly heated to 650 degrees F to achieve full conversion of the triglyceride/fatty acid feed to n-paraffins. The reactor temperature was further increased to 700 degrees F to maintain good catalyst activity at 80 cc/hour feed rate. Gas chromatogram of the liquid hydrocarbon product confirmed that under the hydrotreater conditions the tallow feed was converted 15-18C n-paraffins with no detectable oxygenates.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal foil layer is layer containing soft aluminum foil. The corrosion-prevention-processed layer is a layer formed by coating-type chromate treatment.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The biaxially-stretched film is biaxially-stretched polyimide film and biaxially-stretched polyester film. The biaxially-stretched films are laminated through adhesive agent. The inner side contact-bonding layer contains maleic anhydride-modified polypropylene. The sealant layer contains polypropylene film.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): 3,4-Dihydroxy-2,5-dicarboxylic acid thiophene is decarboxylated in a basic inert solvent, and reacted with sulfonyl chloride of formula: R-S(=O)(-X)=O in the presence of a tertiary alkylamine catalyst to obtain thiophene sulfonic acid ester (I).R=R1;andX=halo.Preferred Compound: The thiophene sulfonic acid ester is chosen from 3,4-bis(methanesulfonyl oxy)thiophene, 3,4-bis(propane sulfonyloxy)thiophene or 3,4-bis(toluene sulfonyloxy)thiophene. The basic inert solvent is chosen from pyridine, quinoline, N,N-dimethylformamide, and N,N-dimethylacetamide. The tertiary alkylamine catalyst is chosen from trimethylamine, triethylamine, tripropylamine, tributylamine, N,N-dimethyl cyclohexylamine, and N,N-dicyclohexyl methylamine. EXAMPLE - 0.5 g 3,4-Dihydroxy-2,5-dicarboxylic acid thiophene and 4.8 g pyridine were added to a 100 ml four neck flask under nitrogen atmosphere, and maintained at 100 degrees C in an oil bath. Decarboxylation reaction was performed, the reaction solution was cooled to 8 degrees C, and 0.8 g methanesulfonyl chloride was added. 0.8 g Triethylamine was added at 12 degrees C or less, and stirred at 8-12 degrees C for 3 hours. The reaction solution was stirred for 15 hours and returned to 25 degrees C. After adding diethyl ether, the solution was filtered, concentrated, extracted with diethyl ether ethyl acetate, and washed with water. 4.6 g Anhydrous magnesium sulfate was added and concentrated at 55 degrees C after spin-drying, and 0.7 g 3,4-bis(methanesulfonyl oxy)thiophene was obtained in the form of light brown solid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Disclosed): 2 Equivalents styryl amine derivative of formula (II) and stilbene derivative (III) are subjected to coupling reaction, to obtain stilbene derivative (I). Preferred Composition: The stilbene derivative (I) is preferably of formula (I-a) or (I-b). SPECIFIC COMPOUNDS - 2 Stilbene derivatives are specifically claimed e.g. E-3,3'-bis(N-(4-(4-tert-butylstyryl)phenyl)-N-phenylamino)stilbene of formula (Ia) and (E,E)-4,4'-bis(N-(4-(4-tert-butylstyryl)phenyl)-N-phenylamino)stilbene.    EXAMPLE - In 100 mL three-necked flask, 3.19 g (E)-4-(4-tert-butylstyryl)diphenylamine, 1.5 g (E)-3,3'-dibromostilbene, 0.020 g palladium acetate, and 4.04 g potassium carbonate were added, 40 mL xylene and 0.54 g tri(tert-butyl)phosphine were added, heated at 110 degrees C for 10 hours, obtained solution was extracted with water, water layer was extracted with toluene, dried with magnesium sulfate, concentrated and recrystallized with methanol, to obtain 1.73 g E-3,3'-bis(N-(4-(4-tert-butylstyryl)phenyl)-N-phenylamino)stilbene as pale yellow solid with yield of 47%.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The substrate is made of glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate is made of sapphire, silicon carbide, silicon or glass. The nitrogen source is ammonia.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The indium source is trimethyl indium. The gallium source is trimethyl gallium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The square resistance of the silicon chip is 60-100 Ohm/square, the concentration of the junction surface is 2x 1020-1x 1021 atom/cm3, and the junction depth is 0.5-1.2 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Materials: The membrane comprises compound of formula (PrxLa1-x)2NiyCuzGa1-x-yO4+sigma.x, y, z=0-1.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Materials: The polyfunctional organic acid is citric acid, glycine and EDTA.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Vanadium crystallized complex oxide contains silica and alumina. Preferred Parameters: Band gap energy of powder vanadium crystallized complex oxide measured by photoacoustic spectroscopy is 1-2.5 eV. Average particle diameter of complex oxide is less than or equal to 3 mu m. Preferred Processes: Powder manufacturing process involves dry processing and wet processing.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The core contains group II-VI compounds or group III-V compounds. The primary barrier layer, primary quantum-well layer, secondary barrier layer, and secondary quantum-well layer are sequentially laminated on the core. The band gap of secondary quantum-well layer is more than the band gap of primary quantum-well layer. The core is lead sulfide. The primary barrier layer and secondary barrier layer are zinc sulfide. The primary quantum-well layer is cadmium selenide. The secondary quantum-well layer is cadmium sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The acceptor impurity is antimony, arsenic, bismuth, phosphorus, nitrogen, lithium, potassium, sodium, rubidium, copper, silver, gold, their metallic compounds, and/or their organometallic compounds. The average particle diameter of cadmium telluride crystal grains in the film is 5 mu m or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The reaction gas includes oxygen consumed as a result of power generation.
TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The polymeric liquid crystal compound is a rod-shaped polymeric liquid crystal compound or a cholesteric liquid crystal component. The orientation controlling agent is a horizontal aligning agent capable of carrying out horizontal orientation of polymeric liquid crystal compound. The substrate is a polyethylene terephthalate film. The coated film is dried by winding process. The surface tension is controlled to 24.5-28 mN/m or less after forming gas-liquid interface of polymeric liquid crystal composition. The type of component and at least one addition amount in the liquid crystal composition are changed on polymer layer (14b) formed by drying the coating film, and coating process and drying process are repeated at least once. Two or more layers of polymer layer are laminated. Heat is applied after coating, and liquid crystal compound is made to orientate and made into state of cholesteric liquid crystal phase. Actinic radiation is irradiated to the liquid crystal composition, and cholesteric liquid crystal phase is fixed. A chiral agent is added to the liquid crystal composition. The polymer layer is an infrared light reflection layer which reflects infrared light having wavelength of more than 800 nm. The polymer layer reflects circularly polarized light.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The porous membrane is product made of a fluorine resin. The diaphragm further contains porous support component membrane (20) for supporting the porous membrane. Preferred Property: The average stream flow hole diameter of porous membrane is 30 nm or less. Preferred Process: The surface of the porous membrane is processed by ion exchange resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: Layer (I) contains tin oxide, aluminum-doped tin oxide, magnesium-doped tin oxide, tin zincate, tin-doped aluminum oxide, tin-doped magnesium oxide, indium-tin oxide, titanium oxide, silicon titanate, and/or silicon nitride, preferably titanium oxide. Layer (I) has a thickness of 0.5-100 nm, preferably 10 nm. The bismuth oxide layer has a thickness of 10-1000 nm, preferably 100 nm. The substrate comprises silicon, alkali metal, or alkaline earth metal, or glass. The dielectric layer comprises titanium oxide, silicon titanate, and/or silicon nitride, preferably titanium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The rods comprise an oxide or nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - A release layer is made of aluminum arsenide antimony (AlAsSb) layer and aluminum phosphide antimony (AlPSb) layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The 1st buffer layer is gallium arsenide or aluminum-gallium arsenide. The i-type nitride semiconductor layer contains the nitride semiconductor crystal of formula Alx1Iny1Gaz1N. The n-type nitride semiconductor layer contains nitride semiconductor crystal of formula Alx2Iny2Gaz2N.x1,y1,z1,x2,y2,z2=0-1;x1+y1+z1=0; andx2+y2+z2=0.Preferred Process: The manufacture of photoelectric conversion element includes forming metal film containing silver in surface of 2nd substrate.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The optoelectronic component comprises organic light-emitting components, light-emitting electrochemical cells, organic light-emitting diode-based sensors, preferably non-hermetically and outwardly shielded gas- and vapor sensors, organic solar cells, organic field effect transistors, organic lasers and down-conversion elements. The proportion of (I) in the emitter or absorber is 100% or 1-99%. The concentration of (I), which is present as an emitter in the optical light-emitting devices, preferably organic light-emitting diodes, is 1-10%. Preferred Method: The production of the optoelectronic component, comprises applying (I) on a carrier by wet-chemical method using colloidal suspension, or by sublimation.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I), comprises reacting bidentate ligand containing compounds of formula (N1T2E) (III) with copper(I) complexes of formula (Cu(I)X) (IV). Preferred Method: The reaction is carried out in dichloromethane. The preparation method further comprises: adding diethyl ether or pentane for recovering (I) in the form of solid; substituting at least one ligand T1 and/or at least one ligand L with at least one substituent for increasing solubility, preferably (a) long-chain and optionally branched or cyclic 1-30C alkyl, (b) long-chain and optionally branched or cyclic 1-30C alkoxy, (c) optionally branched or cyclic 1-30C perfluoroalkyl or (d) short-chain polyethers, and with at least one functional group for improving charge carrier transport, preferably electron conductor or hole conductor. SPECIFIC COMPOUNDS - 26 Compounds (I) are disclosed e.g. copper(I) complexes of formula (Ia)-(Ie).    EXAMPLE - 2-Diphenylphosphanyl-4-methyl-pyridine was reacted with 2 moles copper(I) iodide and 2 moles triphenyl phosphine at room temperature to obtain (Ia).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The molding material further contains an amine compound.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The cyclic silane intermediate component is manufactured in presence of basic compound. During reduction process, aluminum-type reducing agent and/or boron-type reducing agent are used as a reducing agent. Preferred Composition: The ammonium salt is of formula: R4-N+(-R1)(-R3)-R2.X- (I).R1-R4=H, alkyl or aryl;andX-=monovalent anion.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The component (D) is phosphorus base flame retarder or fluorine-containing organometallic salt.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin composition further contains 0.01-2 pts.wt. ultraviolet absorber (C), 0.005-25 pts.wt. flame retarder (D), 0.01-1 pts.wt. fluorine-containing dripping inhibiting agent (E), and 0.1-30 pts.wt. styrene resin (F) with respect to 100 pts.wt. of components (A,B). The resin composition has flame retardance of 1.8 mmV-0 in UL94 test.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mass ratio of the first electron donor material and electron acceptor material is 0.8-1.5:1.0. Preferred Method: The first mixed solution is obtained after stirring at 40-70 degrees C below. Preferred Components: The hole injection layer is provided with poly(3,4-ethylenedioxythiophene), and the transparent conductive layer is provided with indium tin oxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I) comprises taking 5H-tribenzo(a,f,k)trindene compound of formula (II) and 7-(anthracen-9-yl)benzo(c)(1,2,5)thiadiazol-4-ylboronic acid or 4-(anthracen-9-yl)-7-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)benzo(c)(1,2,5)thiadiazole in a molar ratio of 1:3-4.5 under inert atmosphere, dissolving in an organic solvent, performing Suzuki reaction to obtain 2,7,12-tri(4-(anthracen-9-yl)benzo(c)(1,2,5)thiadiazol-7-yl)-5H-tribenzo(a,f,k)trindene compound of formula (III) as organic semiconductor material precursor, dissolving (III) in an organic solvent at -78 to 180 degrees C under inert atmosphere, adding cuprous cyanide or phosphorus oxychloride, reacting for 6-48 hours and extracting to obtain the organic semiconductor material.X = Br or I.Preferred Components: In Suzuki reaction, the reaction temperature is 60-130 degrees C, the reaction time is 20-40 hours, the catalyst used is organopalladium or a mixture of organopalladium and organophosphorus ligand in a molar ratio of 1:1-20, the molar amount of organopalladium is 0.001-0.1 times the molar amount of (II). The molar ratio of (III) and cuprous cyanide or phosphorus oxychloride is 1:1-20.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The number average molecular weight of the polyester resin is 8000-25000. The acid value of the polyester resin is 3 mgKOH/g or less. The polyester adhesive further comprises catalyst for catalyzing epoxide reaction. The dissociation temperature of the enclosed-type isocyanate is 90-200 degrees C. The film layer comprises one or more thin polymer film, metal foil, metallic film, metal plate and ceramic film. The thin polymer film comprises polyester film, polycarbonate film, fluororesin film, acrylic acid resin film, polyolefin film, and copolymer resin film of olefin and oxygen-containing monomer. The metal foil is copper foil or aluminum foil. The metal plate is copper plate, aluminum plate, or steel plate. The ceramic film is minox film or alumina film.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The crosslinking agent is divinylbenzene. The initiator is diphenyliodonium boron tetrafluorate, diphenyliodonium hexafluorophosphate or diphenyliodonium trifluoromethyl sulfate. Preferred Method: The in-situ polymerization is carried out by heat, UV light or gamma -ray.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: (I) is present in an organic material layer between the anode and the cathode of organic electronic device. The organic layer comprises a light emitting material, a hole transporting material, an electron transporting material, a hole injection material, an electron injecting material, hole blocking material and electron-blocking material.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation comprises adding 110 mmole of aryl boric acid compound of formula (II) with 100 mmole of aryl compound of formula (A-Br) into a reaction system under the protection of nitrogen, adding 440 mmole of anhydrous sodium carbonate with 220 ml of water in the reaction system and adding 45 mmole of tetrakis(triphenylphosphine)palladium(0) under the protection of nitrogen at 90 degrees C for 8 hours and at constant temperature for 12 hours, cooling the reaction mixture and filtering, washing the filtrate and concentrating using dichloromethane as a solvent and silica gel for column chromatography to obtain final product with the yield of more than 85% and a HPLC purity of more than 98%. SPECIFIC COMPOUNDS - 32 Compounds (I) are specifically claimed e.g. 10-phenyl-10H-phenanthro(9,10-b)carbazole of formula (Ia)-(Ie).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compound: The surface layer contains inorganic material chosen from silicon compound containing oxygen atom and nitrogen atom.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compound: The transparent composite substrate has intermediate layer between composite layer and surface layer (5). The intermediate layer contains resin material. The resin material is cycloaliphatic epoxy resin or alicyclic acrylic resin.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The two phase-type steel in side (A) comprises 0.0001-0.15 %mass carbon, 0.001-1 %mass silicon, 0.001-1 %mass manganese, 0.05-2.5 %mass nickel, 13-18.5 %mass chromium, 0-0.2 %mass copper, 0-0.5 %mass molybdenum, 0-0.05 %mass aluminum, 0-0.2 %mass titanium, 0-0.2 %mass niobium, 0-0.2 %mass vanadium, 0-0.01 %mass boron, 0.005-0.1 %mass nitrogen and remainder of iron and unavoidable impurities. The two phase-type steel in side (B) comprises 0.0001-0.15 %mass carbon, 0.001-4 %mass silicon, 0.001-2.5 %mass manganese, 0.001-0.045 %mass phosphorus, 0.0005-0.03 %mass sulfur, 6-28 %mass nickel, 15-26 %mass chromium, 0-7 %mass molybdenum, 0-3.5 %mass copper, 0-1 %mass niobium, 0-1 %mass titanium, 0-0.1 %mass aluminum, 0-0.3 %mass nitrogen, 0-0.01 %mass boron, 0-0.5 %mass vanadium, 0-0.3 %mass tungsten, 0-0.1 %mass total of calcium, magnesium, yttrium and rare-earth element, remainder of iron and unavoidable impurities.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The copolymer is polyacrylic acid block (b2)-polypropylene block (b1)-polyacrylic acid block (b2) triblock copolymer. The base material layer comprises polyolefin, metal and/or glass, or base material layer is oriented polypropylene film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The amount of oxygen flow volume with respect to oxygen flow volume and noble-gas flow volume is adjusted to 0.8 vol.%.
TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The amount of addition metal is less than or equal to 2 at.%. The addition metal is chosen from calcium, magnesium, aluminum, titanium, zirconium, nickel, vanadium, niobium, tantalum, molybdenum, tungsten, manganese, indium, tin, zinc, lanthanum, cerium, neodymium, terbium and dysprosium. The reflecting film has 1st electroconductive oxide thin film and 2nd electroconductive oxide thin film with main body substrate.
TECHNOLOGY FOCUS - POLYMERS - Preparation (Disclosed): Atom transfer radical polymerization reaction of both terminal halogenated polyolefin and vinyl-type monomer is carried out and obtained triblock copolymer is hydrolyzed, to obtain ionomer. Preferred Composition: The block (B) is olefin-type (co)polymer block chosen from polyethylene block, polypropylene block, poly 1-butene block, polyisobutylene block, propylene ethylene copolymer block, propylene 1-butene copolymer block and ethylene 1-butene copolymer block. EXAMPLE - 100 g Polyacrylic acid t-butyl-polypropylene-polyacrylic acid t-butyl was added into flask. 200 mL Trifluoroacetic acid and 600 ml dehydrated chloroform were added to the resultant mixture and stirred at room temperature for 24 hours. A solvent, trifluoroacetic acid, and t-butyl alcohol were removed from resultant mixture by distillation. 700 mL Methanol dispersion liquid of 100 g obtained polyacrylic acid-polypropylene-polyacrylic acid was added dropwise to 1-N sodium hydroxide aqueous solution and stirred, to obtain polyacrylic acid-sodium polypropylene-sodium polyacrylate ionomer as precipitate.
TECHNOLOGY FOCUS - POLYMERS - The coupling layer includes polyurethane, urethane, epoxy, polyamide, polyester, pressure sensitive adhesive, acrylic, cyanoacrylate, or combinations thereof.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The cell level communications is provided through WiFi.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The liquid hydrocarbon is hydrocarbon produced by the Fischer-Tropsch reaction, dimethyl ether produced by a reaction of the reaction formula as given in the specification, or methanol produced by a reaction of the reaction formula as given in the specification. The method involves adjusting the composition of the synthetic gas suitable for the production of the liquid hydrocarbon by the water-gas shift reaction or the reverse water-gas shift reaction; and separating the upgraded hydrocarbon and returning hydrocarbons with 1-4C to the reforming reactor and stabilizing and storing hydrocarbons with greater than or equal to 5 carbon atoms in a fuel storage of the FPSO facility. The liquefied petroleum gas components with 3-4C are separated from the hydrocarbons with 1-4C and only hydrocarbons with 1-2C atoms are recycled to the reforming reactor. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The solution of metal ions is provided with ions of nickel, copper, silver, and tin. The material of secondary electrode is provided with conductive carbon-based material and graphite. The tunnel oxide layer is formed over the n-type semiconductor region.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of metal oxide particles and resin is respectively 10-99 %mass and 0.05-10 %mass, in non-volatile component. The resin is fluororesin. The resin-made mold is formed using silicone rubber.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Condition: The furnace pressure at the time of initial stage heating process is 0.05-0.001 MPa. The output of the carbon heater for a heating at the time of the initial stage heating process is 80-100 kW. The applied voltage at the time of the energization start to the silicon core wire is 1500-1900 V.
TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): The fluorine-containing polyether compound (I) is obtained by reacting ( omega )-iodoperfluoroalkyl-substituted aniline derivative of formula (II) and fluorine-containing dicarboxylic acid compound of formula: F-C(=O)-CF(-CF3)-(OCF2CF(-CF3))l-OCF2CF2O-(CF(-CF3)CF2O)m-CF(-CF3)-C(=O)-F (III).R2=H or trimethylsilyl.Preferred Process: ( omega )-Iodoperfluoroalkyl-substitued aniline derivative (II) and fluorine-containing dicarboxylic acid compound (III) are reacted in presence of pyridine or tertiary amine compound. Preferred Component: The substituted position on the benzene ring of ( omega )-iodoperfluoroalkyl group (I(CF2)n-) in ( omega )-iodoperfluoroalkyl-substitued aniline derivative (II) is para position. Preferred Definitions:    R1=methyl;and    l+m=50-150.    EXAMPLE - Fluorine-containing dicarboxylic acid compound (III) (l+m=80) containing small amount of cesium fluoride and tetra-glymes, was dissolved in fluorine-containing solvent (50 ml), and triethyl amine (0.4 g) and diethyl ether (10 ml) were added. 4-(6-Iodo dodecafluorohexyl)-N-methyl aniline (1.8 g) was added to resultant mixture, reacted at room temperature for 4 hours, and the organic phase was washed, dried and filtered with anhydrous magnesium sulfate. Fluorine-containing solvent and diethyl ether were distilled from the obtained filtrate under reduced pressure, and washed to obtain fluorine-containing polyether compound (15 g) as transparent liquid which was slightly tinged with yellowishness.
TECHNOLOGY FOCUS - POLYMERS - Preparation: No general preparation given. Preferred Properties: The silicone copolymer has peak obtained by measurement of gel permeation chromatography of 3 or more, and weight average molecular weight of 1000-20000. Preferred Definitions:    n=1;    A=CH2;and    B'=CH3.    EXAMPLE - 2.6 g Aqueous solution of tetramethylammonium hydroxide and 9.4 g water were mixed, and 60 mL 2-propanol and 30 mL toluene were added. 30 mL Toluene solution of 59.2 g 4-methoxybenzyl trimethoxysilane was dripped at 35-45 degrees C and stirred. The reaction mixture was cured for 2 hours, cooled, extracted, washed, filtered and distilled to obtain 46.8 g cage-shaped 4-methoxybenzyl silsesquioxane having weight average molecular weight of 2320, number average molecular weight of 2050 and polystyrene conversion of 1.13.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The ratio of isocyanate group of unsaturated isocyanate and hydroxyl group of fluorine-containing random copolymer is 0.10-1.05. The fluorine-containing random copolymer further contains polymer units chosen from fluoroalkyl group-containing unsaturated monomer, unsaturated carboxylic acid, alkylvinyl ether, alkylallyl ether, acrylic ester, and methacrylic ester.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The urethane (meth)acrylate has (meth)acryloyl groups. The compound having fluorene structure (I) is chosen from 9,9-bis(di(hydroxy(poly)2-4Calkoxy)phenyl) fluorene and 9,9-bis(tri(hydroxy(poly)2-4Calkoxy)phenyl)fluorene. The (meth)acrylic-type compound is hydroxyl-group containing (meth)acrylic-type compound. The diisocyanate compound (a) is chosen from aliphatic diisocyanate, alicyclic diisocyanate, aroma aliphatic diisocyanate and aromatic diisocyanate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyisocyanate compound is diisocyanate compound or urethane prepolymer having isocyanate group in both terminal obtained by reacting diol compound and diisocyanate compound (a). The diol compound is chosen from alkane diol compound, polymer diol compound, polyether-based diol compound with number average molecular weight of 200-5000, 2-10C alkanediol and polyoxy 2-6C alkylene glycol with number average molecular weight of 250-2000. The content of polyisocyanate compound with respect to whole content of polyisocyanate compound is 1-20 wt.%. Preferred Definitions:    rings Z1,Z2=benzene ring or naphthalene ring;    R2=alkyl or aryl;    m=0-2;    R3=2-4C alkylene;    n=1-10;and    r1,r2=2 or 3.    EXAMPLE - 5.56 g 9,9-bis(3,4-di(2-hydroxyethoxy) phenyl) fluorene and 50.68 g 1,4-dioxane were added to 200 mL flask provided with cooling pipe and stirrer, heated, synthetic process was performed, dissolves in 1.54 g di-n-butyltindi laurate, diluted with 1 weight% 1,4-dioxane, reacted, 10.6 mg hydroquinone was added, solvent removal process was performed, solvent-removed, to obtain liquid with high viscosity, and solvent with residual percentage of 15.7%.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The photosensitive agent contains photoinitiator, and photopolymerizable compound having unsaturated double bond in a molecule in which at least 2 or more photopolymerization is possible. The photopolymerizable compound contains compound having two double bonds, and compound having 3 or more double bonds. The photosensitive resin composition further contains phosphorus compound chosen from phosphoric acid ester compound and/or phosphazene compound, and reactive compound and/or thermosetting resin having reactivity with polyimide precursor or polyimide. The photosensitive film further has cover film provided on the photosensitive resin composition.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thermoplastic polymer composition preferably comprises 10-70 parts mass component (B), 10-70 parts mass component (C) and 1-200 parts mass component (D). The component (B) is polyvinyl butyral. The component (C) is olefin-type copolymer which is obtained by polymerizing olefin-type comonomer and polar group-containing comonomer. The ratio of structural unit derived from polar group-containing monomer of component (C) is 1-50 %mass. The component (C) is olefin (meth)acrylic acid ester copolymer. Preferred Process: The polyvinyl acetal resin (B) is obtained by acetalizing polyvinyl alcohol having average polymerization degree of 100-4000. Preferred Properties: The polyvinyl acetal resin (B) has acetalization degree of 55-88 mol%. The component (C) has melt flow rate of 0.1-100 g/10 minutes, at 190 degrees C under load of 2.16 kg. The Vicat softening point of component (C) is 40-100 degrees C. Preferred Components: The insert component is chosen from at least one of metal and ceramics. The temperature of the insert component is controlled by heat generating component chosen from electric heater, electromagnetic heating heater or thermal medium. Hot runner is used at the time of insert molding.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The eddy current gas consists of air, oxygen, nitrogen, and argon gas.
TECHNOLOGY FOCUS - METALLURGY - The niobium alloy film consists of 30-50 mol% niobium, 20-40 mol% nickel, and 20-40 mol% titanium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation given. EXAMPLE - 1.1 g 5'-Hexyl-2,2'-bithiophene-5-boronic acid pinacol ester, 0.69 g 4-iodo pyridine, and 70 mg tetrakis(triphenyl phosphine) palladium (0) were added to flask. 15 mL Tetrahydrofuran and 10 mL potassium carbonate aqueous solution were added in nitrogen atmosphere and stirred at 70 ?o C for 20 hours. 50 mL water was added to reaction liquid and extracted with 100 mL chloroform. The organic layer was spun-dried and recrystallized to obtain 0.51 g 2-hexyl-5,5'-(4-pyridyl)-bithiophene at yield of 52% and melting point of 93 ?o C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The thixotropic agent is gas-phase silica. The filler is calcium carbonate, talc powder, and/or silicon micropowder.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The diluting agent is 1,4-butanediol diglycidyl ether, butyl glycidyl ether, and/or neopentyl glycol diglycidyl ether. The straight-chain aliphatic amine is diethylenetriamine, triethylenetetramine, tetraethylenepentamine, and/or hydroxyethyl ethylenediamine. The cycloaliphatic amine is N-aminoethyl piperazine, hydroxyethyl piperazine, isophorone diamine, bis(4-amino-3-methylcyclohexyl)methane, and/or bis(4-aminocyclohexyl)methane.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The epoxy resin is E51 and/or E44. The toughening agent is liquid nitrile rubber, carboxy-terminated liquid nitrile rubber, and/or epoxy acrylate. The additive is dispersant 202, defoaming agent A530, and/or ethylene glycol antifreezing agent. The polyether amine is polyether amine T-31. The low-molecular-weight polyamide is low molecular weight polyamide 65.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal organic salt is copper acetate or zinc acetate. The inorganic salt is stannous chloride. The basic organic solvent is oil. A precursor in the ultrasonic dispersion step has an amount of 0.001-100 mmole. The certain atmosphere is inert atmosphere including nitrogen or argon gas.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The heating step is carried out at a pressure of 0.02 MPa and a temperature of 150-250 degrees C for 5-24 hours. The washing step is carried out for 3-6 times using absolute ethyl alcohol (10-50 ml or 200-500 ml). The dispersing step is carried out using solvent (5-10 ml) at 8000-10000 rpm. The centrifuging step is carried out at 3000-6000 rpm for 3-10 minutes. The deposit washing step is carried out using 1-5 ml of chlorobenzene or toluene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The water-soluble chloride salt is sodium chloride, tin(II) chloride or potassium chloride. The diameter of the nanowire is adjustable.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The component (c) is a formic acid. The component (d) is copper formate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The particle diameter of aluminum oxynitride in the aluminum oxynitride film is 150 nm or less. The surface roughness of aluminum oxynitride film is 3 nm or less in arithmetic mean roughness, and is 30 nm or less in largest height. Preferred Composition: The aluminum oxynitride film is film component positioned at the front-back both sides of base material. The base material contains polyethylene naphthalate film or polyethylene terephthalate film.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The film component contains intermediate layer including silane coupling agent, metal alkoxide, chlorosilane, silazane, hydrocarbon, acrylic resin and/or isocyanate, formed between base material and aluminum oxynitride film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The material of the porous material is nickel-chromium alloy or aluminum.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: At least one portion of the case contains composite material containing insulated resin and porous material. The void of the porous material is filled with the insulated resin. The volume ratio of the porous material to the case is 10-70 vol.%. An outer core portion (32) of case contains a mixture containing magnetic powder and resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The adjacent subcell is selected from Ga1-xInxNyAs1-y-zSbz subcell, Ge subcell, GaAs subcell, (Al)InGaP subcell, and (In)GaAs subcell.
TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The metal layer comprises titanium, nickel, molybdenum, cobalt, tungsten, manganese, silicon, chromium or their alloys. The fastener comprises a washer including metal layer and metal oxide layer. The metal oxide layer is an oxide of the metal of the metal layer.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The solid-oxide-fuel-cell stack further comprises silica-based glass or glass ceramic seal located between interconnect and cathode of adjacent solid-oxide fuel cell. The barrier layer comprises clay, ceramic, alkali earth silicate and/or glass ceramic, preferably alumina, zirconia, zirconium-strontium oxide, calcium-barium-magnesium silicate and/or feldspar. The electroconductive metal oxide layer comprises lanthanum strontium manganate, lanthanum strontium cobaltite, lanthanum strontium manganate-cobaltite, or manganese-cobalt complex oxide (MnxCo3-xO4) spinel, where x is 1-2, preferably lanthanum strontium manganate. Preferred Layer: The electroconductive metal oxide layer comprises perovskite layer or spinel layer. Preferred Component: The solid-oxide fuel cell comprises zirconia-based electrolyte.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The group IB element comprises copper, silver and/or gold. The group IIIA element comprises boron, aluminum, gallium, indium and/or thallium. The group VIA element comprises oxygen, sulfur, selenium, tellurium and/or polonium. The atmosphere comprises oxygen, nitrogen, hydrogen, argon, hydrogen selenide, hydrogen sulfide, selenium steam, sulfur steam and/or tellurium steam.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The first material is silicon. The second material is a dielectric material (preferably silicon, silicon oxide, or silicon nitride).
TECHNOLOGY FOCUS - BIOLOGY - Preferred Component: The functional molecule (s1) is bacteriorhodopsin and functional molecule (s2) is combination of proton channel or channel rhodopsin, or functional molecule (s1) is combination of proton channel or channel rhodopsin and functional molecule (s2) is bacteriorhodopsin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The flow channels consist of or coated with catalytically active material containing cerium, nickel, palladium, platinum, osmium, rhodium, iridium, gold and/or silver. The flow channels further consist of metal foil containing zirconia-containing metal foil, iron, chromium, aluminum-containing metal foil, ceramic zirconium oxide, silicon carbide, aluminum titanate and/or mullite.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of the metal oxide precursor is 5-95 %mass in a nonvolatile component. The metal oxide precursor is chosen from metal alkoxide, metal salt, metal halide and metal chelate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of the resin is 0.05-10 %mass in a nonvolatile component. The resin contains a fluoro resin. The resin-type mold is formed by silicone rubber.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The shrinkage percentage along machine direction is 10-95%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The electroconductive laminate further has a crosslinking layer in the opposite surface of the conductive layer on the base material. Preferred Property: The electroconductive laminate has transmitted-light color tone basterisk value measured using Lasteriskaasteriskbasterisk display color system is 1 or less based on JIS Z8729 (2004), when injected from the crosslinking layer side.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The inorganic P-type semiconductor compound particle comprises chalcopyrite type compound or copper-zinc-tin-sulfide compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The light guide unit is made of borosilicate crown glass. The light source is halogen lamp.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Before performing impregnation process, molding is dried or baked. During manufacture of desulfurizing agent, molding is subjected to hydrogen-reduction process. Preferred Composition: The content of iron and/or nickel in the molding is 1-10 wt.%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The Se-containing gas comprises one of hydroselenic acid, selenium vapor, or diethylselenide (DESe).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - One of the subcell is formed of gallium arsenide. Another subcell is formed of indium gallium. The lattice mismatch layers are formed of carbon doped aluminum gallium arsenide. The compound semiconductor layers are formed of indium gallium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Alkaline earth metal oxide comprises magnesium oxide, calcium oxide, strontium oxide and/or barium oxide. Alkali metal oxide comprises at least one of dilithium oxide, disodium oxide and dipotassium oxide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: The content of TeO2 is 15-40 wt.%.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The glass board material is glass fiber aggregate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The reactive resin precursor (a) is of formula (I) or (II). The reactive resin precursor (b) is of formula (III) or (IV). The content of reactive resin precursor (b) is 0.1-10 pts. wt. with respect to 100 pts. wt. of reactive resin precursor (a).at least 1 of R1-R5,R6-R10,R11-R15,R16-R20,R21-R24,R25-R28=reactive functional group;X=-O-, -S-, -SO-, -SO2-, -CH2-, -CH(CH3)- or -C(CH3)2-;andY'=-O-, -S-, -SO-, -SO2-, -CH2-, -CH(CH3)-, -C(CH3)2- or single bond.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The hardenable monomer (B) is a polyfunctional (meth)acrylic-acid derivative.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thermoplastic resin (A) is a non-crystalline thermoplastic resin having an aromatic-ring structure or an alicyclic structure. The thermoplastic resin (A) is chosen from polysulfone-based resin, polyarylate-type resin, polycarbonate-type resin and alicyclic hydrocarbon-type resin. The mass ratio of thermoplastic resin (A) and hardenable monomer (B) in the curable resin composition is 30:70-90:10. The gel fraction of the cured resin layer is 90% or more. The gas barrier layer contains a silicon-containing high molecular compound. The silicon-containing high molecular compound is polysilazane. The thickness of the cured resin layer of the gas barrier film of 2 or more sheets is 0.5-10 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): The fluorene-type compound is prepared by performing organometallic coupling reaction of carbazole derivative and fluorene derivative. Preferred Composition: The fluorene-type compound (I) is chosen from 12 compounds e.g. compounds of formula (II)-(VII).X1-X12=-CRA and CH, in at least one X1-X12 is CRA. EXAMPLE - 191 Mg 1,1'-bis(diphenylphosphino)ferrocene, 77 mg palladium acetate and 2.9 g sodium tert-butoxide were added to solution of 12.4 g (9,9-dimethyl-9H-fluoren-2-yl)-(2-methyl-4-(9-phenyl-9H-carbazol-3-yl)phenyl)amine and 5.4 g 4-bromobiphenyl in 50 ml degassed toluene, and heated for 20 hours. The resultant reaction mixture was cooled to room temperature, diluted with toluene and filtered. The resultant crude product was subsequently recrystallized and purified, to obtain 3.3 g biphenyl-4-yl-(9,9-dimethyl-9H-fluoren-2-yl)-(2-methyl-4-(9-phenyl-9H-carbazol-3-yl)phenyl)amine having purity of more than 99.9%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The desulfurizing agent contains manganese metal oxide as active component and zirconia as carrier. Yttrium nitrate hexahydrate (1%) is used as stabilizing agent in crystal form.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The diamine compound is an aromatic diamine compound such as 4,4'-oxydianiline. The dianhydride compound is pyromellitic dianhydride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catalyst composition comprises mixed oxides of nickel, aluminum and zirconium as component (a). The catalyst composition comprises gamma aluminum oxide, delta aluminum oxide and/or theta aluminum oxide as component (b). The component (b) is present in an amount of 1-60 wt.%, based on the total amount of the catalyst composition. The components (a) and (b) are present as powder form particles. The particles of component (a) have a particle size of 0.5-1500 mu m and the particles of component (b) have the particle size of 0.3-500 mu m. The Brunauer Emmet Teller (BET) surface area of the component (a) is of 20-300 m2/g and the BET surface area of the component (b) is of 20-400 m2/g. The catalyst material in tablet form, which except from binders, lubricants and other processing agents, is produced from (a) mixed oxides of nickel, aluminum and zirconium, and (b) gamma aluminum oxide, delta alumina and/or theta aluminum oxide. Preferred Method: The method makes use of eccentric- or rotary presses for producing the tablets. EXAMPLE - 420g calcined powder comprised of a homogeneous mixture of 72 wt.% nickel oxide, 19 wt.% aluminum oxide and 9 wt.% zirconium dioxide, which was used as a component (a), and were added into 180 g aluminum oxide powder comprised of gamma aluminum oxide, delta alumina and theta aluminum oxide, which was used as a component (b), and the powder was mixed with 3 wt.% graphite and thoroughly mixed. The mixture was compacted in a compactor and then processed on a hydraulic eccentric press in to solid tablets.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The heat-resistant insulating layer has porosity of 45% or more, preferably 55% or more. Preferred Composition: The heat-resistant insulating layer contains 90-96 %mass inorganic particles.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The weight ratio of sulfuric acid and hydrogen peroxide is 22:1-36:1. Preferred Process: Before wet etching process, the semiconductor substrate is subjected to secondary pre-processing using 1-10 wt.% hydrofluoric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The ratio of moisture content per binder mass with respect to BET specific surface area of the inorganic particles is 0.75-1.9, preferably 1-1.8. The heat-resistant insulating layer has fabric weight of 5-15 g/m2. Preferred Composition: The inorganic particles are chosen from oxide of silicon, aluminum, zirconium and titanium, hydroxide and/or nitride.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The binder is water-soluble polymer, preferably carboxymethyl cellulose and/or its salt.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: They content of radically polymerizable unsaturated monomer (I)-(III) is 0.01-20 %mass. The radically polymerizable unsaturated monomer which does not have hydroxyl group is styrene monomer. The urethane (meth)acryl compound is obtained by reacting isocyanate compound having 2 or more isocyanate group in a molecule(s), and polyol chosen from polyethylene glycol, polyether polyol and adipate-based polyester polyol. The organic peroxide is chosen from cumene hydroperoxide, methyl-ethyl-ketone peroxide and t-butyl peroxy benzoate. The organometallic salt is chosen from cobalt naphthenate, cobalt octoate and manganese naphthenate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The hollow container is formed from liner material made of thermoplastic resin. The textile material is glass fiber.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic-semiconductor material is dispersed using ultrasonic wave. The organic-semiconductor material is polymer of polythiophene and thiophene-type compound, fullerene or fullerene derivative. The organic solvent is chosen from tetrahydrofuran, chloroform and ethanol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The material is selected from a group consisting of oxides, nitrides, sulfide, phosphide, arsenide, carbide, titanium dioxide, lithium oxide, magnesium oxide, diamond, zinc oxide, potassium niobate, silicon carbide, mercury sulfide, glyceraldehyde 3-phosphate and gallium arsenide or tin(II) oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal oxide film is comprised from alumina, silica, zirconia, titania, niobium pentoxide, magnesium oxide, vanadium pentoxide, tantalum pentoxide and/or chromium oxide. The methyl group-containing silica-type film is of formula: (SiO2)x-(CH3SiO3/2)(1-x), where x is more than 0 to less than 1, preferably 0.2-0.8. Preferred Property: The weight decreasing rate at the time of heating the insulation film at 650 degree C with respect to the time of heating the insulation film at 100 degree C is less than 1%.
TECHNOLOGY FOCUS - POLYMERS - The molding die consists of polyetheretherketone, polyether-sulfone, polyester and polyether imide. The workpiece is comprised by non-crystalline resin.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: At least one of the pair of transparent substrates is glass plate.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The pressure-reduced atmosphere has pressure of 100 Pa or less. Preferred Composition: The atmosphere (A2) is atmospheric pressure atmosphere.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of phosphorus atom in curable resin composition is 0.01-0.5 %mass. The unsaturated hydroxy compound (A3) is of formula: P(O)(R11)(R12)(R13). The content of unsaturated hydroxy compound (A3) is 1.5-12 parts mass with respect to 100 parts mass unsaturated urethane oligomer (A). The curable resin composition further contains monomer (C) of formula: CH2=C(R)C(O)O-R2, photoinitiator (D) and unsaturated urethane oligomer (B). The unsaturated urethane oligomer (B) has average of 2-4 hardenable functional groups (I) per molecule, and does not have phosphorus atom. The unsaturated hydroxy compound (B3) has hardenable functional group (I) and hydroxyl group.R2=3-4C hydroxyalkyl having 1-2 hydroxy;R11=group of formula: CH2=C(R)C(O)O-(R1O)m- (a);R12,R13=hydroxy, 8C or less alkoxy or group (a);m=1-8;R=H or methyl;andR1=2-8C alkylene.Preferred Process: During manufacture of transparent laminate, light is irradiated to the lamination precursor and the curable resin composition is hardened.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The unsaturated urethane oligomer is reaction product of polyol component (B1), polyisocyanate compound (B2) and unsaturated hydroxy compound (B3). The polyol (B1) has 2-3 hydroxyl groups per molecule and hydroxyl value of 35-150 mg potassium hydroxide/g, and does not have phosphorus atom in molecule.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hydrocarbon group which bonded the organopolysiloxane with silicon atom is methyl group. The groups other than the methyl group which bonded the organopolysiloxane with the silicon atom are hydroxyl group or hydrolyzable group. The component (A) is silicon-containing compound containing silane compound (I) or (II), or its condensate. The component (A) and component (B) contains 6-18 silicone-containing units (D-units). The aryl group is phenyl group. 95% or more hydrocarbon groups are bonded with the silicon atom contained in the bifunctional linear polydiorganosiloxane, in which the hydrocarbon group is phenyl group or methyl group. The D-unit is of formula: MePhSiO2/2, Me2PhSiO2/2 or Ph2SiO2/2. The ratio of number-of-moles of the methyl group bonded with the silicon atom and number-of-moles of the phenyl group bonded with the silicon atom contained in the bifunctional linear polydiorganosiloxane is 10 or less, preferably 1 or more. The hardenable polysiloxane composition is 1-liquid curable-type hardenable polysiloxane composition or 2-liquid curable-type hardenable polysiloxane composition. Preferred Property: The refractive index of the hardenable polysiloxane composition during hardening without adding filler is 1.45 or more.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The manufacture of hardenable polysiloxane composition further involves condensing obtained condensate, and silane compound of formula: SiXnR4-n (I) or SiX3Me (II), or its condensate or condensing obtained condensate and organopolysiloxane having hydroxyl groups or hydrolyzable groups bonded with the silicon atom in a molecule.X=hydroxy or hydrolyzable group;R=hydrocarbyl which does not contain aromatic ring;andn=3 or 4.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The high-melting-point metal is molybdenum. The copper-gallium alloy contains 10 atomic% or more gallium and 50 atomic% or less copper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The impurity is boron. The processing agent is salt of alkali metal and halogen, salt of alkaline-earth metal and halogen, and composite salt containing alkali metal and halogen, or composite salt containing alkaline-earth metal and halogen, preferably lithium fluoride, sodium fluoride, potassium fluoride, rubidium fluoride, cesium fluoride, silicofluoride, cryolite, mixture of sodium fluoride and barium fluoride, mixture of sodium fluoride or barium fluoride and barium chloride. The content of processing agent is 5 %mass or more with respect to 300 %mass or less of molten silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: During introductory process, the processing agent is blown or pours in the molten silicon from the downward direction rather than the liquid level of molten silicon. Preferred Composition: Boron is contained in the impurity. The processing agent is salt chosen from salt of alkali metal and halogen, salt of alkaline-earth metal and halogen, composite salt containing alkali metal and halogen, and composite salt containing alkaline-earth metal and halogen, preferably lithium fluoride, sodium fluoride, potassium fluoride, rubidium fluoride, cesium fluoride, silicofluoride soda, cryolite, mixture of sodium fluoride and barium fluoride, and mixture of sodium fluoride, barium fluoride and barium chloride. The content of processing agent is 5-300 %mass with respect to molten silicon. The introduction means is a distribution means inserted in the liquid from the level upper portion, or side portion or bottom portion of the container.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The catalyst composition comprises: mixed oxides of nickel, aluminum and zirconium as component (a); and gamma -aluminum oxide, delta -aluminum oxide and/or theta -aluminum oxide as component (b), where the component (b) is present at 1-60 wt.%. Preferred Components: The components (a) and (b) are present as pulverulent particles, where the particles of the component (a) have a particle size (d50) of 0.5-1500 mu m, and the particle of the component (b) have a particle size (d50) of 0.3-500 mu m. The Brunauer-Emmett-Teller surface area of: the component (a) is 20-300 m2/g; and the component (b) is 20-400 m2/g. The catalyst material in pellet form, which is, apart from binders, lubricants and other processing aids, made up essentially of mixed oxides of nickel, aluminum and zirconium, and gamma -aluminum oxide, delta -aluminum oxide and/or theta -aluminum oxide. The catalyst pellet has a diameter of 0.8-5 mm and a height of 1-10 mm. Preferred Process: In the process of producing the catalyst material, eccentric or rotary presses are used for producing the pellets. EXAMPLE - 420 g of Calcined powder (comprised of a homogeneous mixture of 72 wt.% nickel oxide, 19 wt.% of aluminum oxide, and 9 wt.% of zirconium oxide) was added to 180 g of aluminum oxide powder (comprised of gamma -aluminum oxide, delta -aluminum oxide and/or theta -aluminum oxide). The resultant powder mixture was subsequently admixed with 3 wt.% of graphite and intimately mixed by means of a drum hoop mixer. The obtained mixture was then compacted on a compactor and subsequently processed on a hydraulic eccentric press to give solid pellets.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Manufacture of catalyst involves performing 1st heating process at 400-700 degrees C and greater than or equal to 6 degrees C/minute for 1-10 hours.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The titanyl porphyrazine derivative mixture exhibits diffraction peak strong against Bragg angle of (2( theta ) greater than or equal to 0.2( degrees ))9.4( degrees ), 9.6( degrees ), 14.9( degrees ), 24 ( degrees ) and/or 27.2 ( degrees ), measured using X-ray-diffraction spectrum by Cu K- alpha ray.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The strong base is solid sodium hydroxide and/or solid potassium hydroxide. The mass ratio of graphene to strong base is 1:1-10, preferably 1:3-7, more preferably 1:4-6. Preferred Property: The graphene has specific surface area of 1600-3100 m2/g.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The internal power generator is a polymer electrolyte membrane fuel cell, a solid oxide fuel cell or a molten carbonate fuel cell.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The reforming reactor is at least one reactor comprising a steam reforming reactor, a partial oxidation reactor, an auto thermal reforming reactor, a carbon dioxide reforming reactor, a steam carbon dioxide reforming reactor or a tri-reforming reactor, where the reactor is made compact as a fixed bed. The water separator is coupled to the methanol reactor.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The method (M1) and (M2) each further comprises separating the carbon dioxide and returning the same to be used as a reaction source of the reforming, or producing steam using the water as cooling water for removing the reaction heat and returning the steam to be used in the reforming. The method (M1) comprises adjusting the composition of the synthetic gas required for the production of DME via a water-gas shift reaction or a reverse water-gas shift reaction. The method (M2) comprises adjusting the composition of the synthetic gas required for the production of DME via the water-gas shift reaction, the reverse water-gas shift reaction or a pressure swing adsorption process.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The optical catalyst is titanium oxide. The solution (a) includes methanol and ammonia solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal center is copper (Cu2). The MOF in a composition comprises at least one of a binder, an organic viscosity-enhancing agent, and a liquid. The solvent is absent. The MOF comprises a sorbed gas that is hydrogen, oxygen, nitrogen, the noble gases, acetylene, methane, ethane, propane, natural gases (preferred), synthesis gases, carbon monoxide, carbon dioxide, arsine and/or hydrogen selenide.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The ligand is 5,5'-(4,4'-(5-(3-(3,5-dicarboxyphenyl)-3H-pyrazol-5-yl)-1,3-phenylene)bis(1H-1,2,3-triazole-4,1-diyl))diisophthalic acid, naphthalene-2,6-dicarboxylic acid and/or 1,2-di(pyridin-4-yl)ethyne. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The capacitance of the negative electrode is more than 0.09 (mF/cm2). Preferred Composition: The anhydride compound (I) is preferably lithium(1+) ion 2,3,7,8-tetraoxo-1,4,6,9-tetraoxa-5-boraspiro(4.4)nonan-5-uide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal is metal foil, and has thickness of 5-100 mu m. The metal foil is aluminum foil and/or copper foil.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin is a resin film chosen from polyester film, polyimide film and polypropylene film, and has thickness of 2-200 mu m. The liquid (B) containing ethylene-vinyl acetate-type copolymer is a liquid (B) containing saponification ethylene-vinyl acetate copolymer.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The solar cell comprises an anti-reflective layer and that the combination layer forms the antireflection layer. The solar cell comprises backside passivation layer and that the combination layer forms the backside passivation layer. The base film is made of amorphous silicon nitride, having a higher density than with pure PECVD deposition processes producible silicon nitride films or that the base film is made of amorphous silicon oxynitride and has higher density than with pure PECVD deposition processes producible silicon oxynitride films. The base film has a thickness of 5-15 nm. The base film comprises hydrogen, preferably diffused hydrogen. Preferred Method: The method comprises diffusion of hydrogen into the base film at the time when the combination layer is already formed. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The primary layer is a methyl group-containing silica-type film containing a silane compound of formula: (SiO2)x-y(CH3SiO3/2)(1-x) (II). The primary layer is a metal oxide film. The metal oxide is chosen from aluminum oxide, silicon dioxide, zirconium dioxide, titanium dioxide, niobium pentoxide, magnesium oxide, vanadium pentoxide, tantalum pentoxide and chromium trioxide.x=0.2-0.8.The thickness of the methyl group-containing silica-type film is 0.5-2 mu m. The thickness of the metal oxide film is 0.1-0.4 mu m. The weight decreasing rate at the time of heating at 350 degrees C with respect to the time of heating at 100 degrees C of the insulation film is less than 1%. The increase in the leakage current after leaving the stainless steel foil with insulation film to stand at constant temperature of 85 degrees C and humidity of 85% for 100 hours is 5% or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The contact angle of hydrophilized resin base-material surface is 45 degrees or less. Preferred Composition: The water-soluble organic polymer is carboxyl group-containing compound chosen from at least one of polyacrylic acid, polymethacrylic acid, polyglutamic acid, poly ascorbic acid, and/or water-soluble protein.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The infrared reflectiveness film is clear coating film having dry film thickness of 15-60 mu m, average infrared reflectance at wavelength of 780-2500 nm of more than 7.54%, and average visible ray transmittance at wavelength of 380-780 nm of 60% or more. Preferred Property: The water contact angle of surface coating film is 60 degrees C or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal oxide comprises transition metal in which dopant is added. The controlled targeting angle in the process is 32.5-72.5 degrees .
TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Composition: The blade contains 65-95 %mass diamond microparticles having average particle diameter of 0.1-10 mu m, and 5-35 %mass binding material, and further contains 3-20 %mass ultrafine particle carbide material.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of binding material is 5 %mass or less at surface side.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Manufacture of silicon involves fixing 5-300 mass% processing agent in aggregated form to rod-shaped body, inserting rod-shaped body in system, and contacting massive processing agent and molten silicon by pushing processing agent below liquid level of molten silicon, wherein pushing unit is utilized during pushing process. Preferred Components: Impurity is boron. Processing agent is salt of alkali metal and halogen e.g. lithium fluoride (LiF), sodium fluoride (NaF), potassium fluoride (KF), rubidium fluoride (RbF), and/or cesium fluoride (CsF), salt of alkaline earth metal and halogen e.g. barium fluoride (BaF2) and/or barium chloride (BaCl2), composite salt containing alkali metal and halogen e.g. disodium silicon hexafluoride (Na2SiF6) and/or cryolite (Na3AlF6), and/or composite salt containing alkaline earth metal and halogen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The addition process is performed by pouring in the liquid processing agent. Preferred Components: The impurity contains boron. Processing agent is salt of alkali metal and halogen, salt of alkaline-earth metal and halogen, compound chosen from the composite salt containing alkali metal and halogen, and composite salt containing alkaline-earth metal and halogen. Processing agent is mixture of sodium fluoride and barium fluoride and the mixture of sodium fluoride, barium fluoride, and barium chloride, and compound chosen from lithium fluoride (LiF), sodium fluoride (NaF), potassium fluoride (KF), rubidium fluoride (RbF), cesium fluoride (CsF), silicofluoride soda (Na2SiF6), and cryolite (Na3AlF6). Amount of processing agent is 5-300 mass% with respect to molten silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The etching liquid further contains silicate compound which is a silicate of sodium or potassium. The aromatic compound is a compound having substituent in 4th-position. The alkali hydroxide is sodium hydroxide and/or potassium hydroxide. The content of the aromatic compound, alkali hydroxide and silicate compound is 0.01-30 wt.%, 0.1-50 wt.% and 10 wt.% or less (based on silicon conversion), respectively. The average size of the pyramid-like unevenness is 2-4 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The total content of indium content and selenium content in the indium selenide particle powder is 95 %mass or more. The oxygen content in indium selenide particle powder is 2 %mass or less. The content of chlorine and iodine in indium selenide particle powder is each 100 ppm or less. The content of sodium and phosphorus in indium selenide particle powder is each 1000 ppm or less. The molar ratio of selenium and indium in indium selenide particle powder is 1.3-1.8. Preferred Property: The indium compound has average particle diameter of 10-400 nm. Preferred Condition: The heating process is carried out at 140-280 degrees C.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The reducing agent is hydrazine or hydrazine compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The gas barrier film further has stress relaxation layer (b). The relative etching rate of the stress relaxation layer (a) and stress relaxation layer (b) is 1.0-1.4.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The barrier film further has protective layer (3).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The calcium carbonate (C) is heavy calcium carbonate. The silicon group (I) is a difluoromethylsilyl group or a trifluorosilyl group. The reactive silicon group (II) is trimethoxysilyl group. The average particle diameter of calcium carbonate is 0.5 mu m or more.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The organic polymers (A) and (B) are polyoxyalkylene-type polymer and/or (meth)acrylic-ester-type polymer. The polyoxyalkylene-type polymer is polyoxypropylene-type polymer. The curable composition further contains an amine compound as a curing catalyst. Preferred Definitions:    a=2 or 3.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent is chosen from amide-type solvent, ketone solvent, ester solvent and ether solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyimide solution contains 50 mol.% or more polyimide (I). Preferred Process: The polyimide membrane is obtained by coating the polyimide solution to support which is glass substrate. Preferred Properties: The polyimide membrane has light transmittance at wavelength of 400 nm of 50% or more, and linear thermal expansion coefficient of 20 ppm/K or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The hydrogenated silicon nitride film layer contains 5-15% of hydrogen, mass density is 2.6-2.8 g/cm3 and refractive index is 2.0-2.2.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Component: The product or defect of impurity content in lump is tested by comparing protrusion number density of surface of lump outer peripheral surface with standard protrusion number density, or comparing crystal grain diameter of surface of metal purification lump outer peripheral surface with standard crystal grain diameter. The standard protrusion number density is 3 per cm2 or less. The crystal grain diameter is 1 mm or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The palladium layer is abraded to a mean surface roughness (Sa) up to 2.5 microns prior to contacting with the solution. The gold is deposited on the palladium layer by electroless plating employing a plating solution consisting of chloroauric acid and hydrogen peroxide. The palladium layer is abraded with an abrasion media having a particle size of 1-10 microns. The gold layer deposited on the palladium layer has a thickness of 0.1-7 microns. The gold layer is 1-20 wt.% (preferably 5-20 wt.%) of the total palladium layers. The palladium layer is abraded to a mean surface roughness (Sa) of 0.85-1.5 microns prior to contacting with the solution. The gold layer deposited on the palladium layer has a thickness of 0.25-7 microns.    TECHNOLOGY FOCUS - METALLURGY - After deposition of the gold layer on the palladium layer, the combined layers are annealed to produce a palladium- gold alloy. The combined gold and palladium layers are annealed at a temperature of 400-800 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The etching agent with additive comprises 10-25 wt.%, preferably 15-20 wt.% sorbitol, 8-30 wt.%, preferably 8-20 wt.% phosphoric acid, 20-30 wt.%, preferably 20-30 wt.% sodium citrate and the rest is deionized water.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The base material is made of aluminum, aluminum alloy, carbon-carbon composite, graphite, glass and NEO ceramics, yttrium oxide, aluminum oxide, aluminum nitride and aluminum oxide.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The base layer is provided with an oxide film or a nitride film.    TECHNOLOGY FOCUS - METALLURGY - The base material is made of aluminum, aluminum alloy, carbon-carbon composite, graphite, glass and NEO ceramics, yttrium oxide, aluminum oxide, aluminum nitride and aluminum oxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I), comprises carrying out Suzuki coupling reaction on 3,7-dibromo-dibenzothiophen-5,5-dioxide (II) with 10-(naphthalen-2-yl)anthracen-9-ylboronic acid compounds of formula (III) or 4,4,5,5-tetramethyl-2-(10-(naphthalen-2-yl)anthracen-9-yl)-1,3,2-dioxaborolane compounds of formula (IV) in an organic solvent in presence of organic metal catalyst under oxygen-free environment. Preferred Method: The Suzuki coupling reaction temperature is 60-130 degrees C, and the reaction time is 20-40 hours. Molar ratio between (II) and (III) or (IV) is 1:2-3. Adding amount of the organic metal catalyst is 0.001-0.1 times the amount of (II). Preferred Components: The organic metal catalyst is an organic palladium catalyst, or mixture of organic palladium catalyst and an organic phosphine ligand. The organic palladium catalyst is tris(dibenzylideneacetone)dipalladium(0), tetrakis(triphenylphosphine)palladium(0) or bis(triphenylphosphine)palladium(II) dichloride. The organic phosphine ligand is tris(o-tolyl)phosphine. The organic solvent is tetrahydrofuran, ethylene glycol dimethyl ether, benzene, chlorobenzene or toluene.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises reacting benzo(b)(1,4)dioxepin-3-one compounds of formula (II) with aldehyde compounds of formula (X-C(=O)-H) (IIIa) and/or (Y1-C(=O)-H) (IIIb). Preferred Composition: The preparation contains the carrier, and at least one further organic functional material comprising a host material, matrix material, electron-transporting material, electron-injection material, hole transport material, hole injection material, electron blocking material, hole-blocking material, exciton blocking material and/or an emitter. SPECIFIC COMPOUNDS - 25 Compounds (I) are disclosed e.g. 7-methyl-2,4-bis-(1-(2,4,5-trimethoxyphenyl)meth-(Z)-yliden)-benzo(b)(1,4)dioxepin-3-one of formula (Ia), 2,4-bis-(1-(4-methoxy-phenyl)-meth-(Z)-yliden)-7-methyl-benzo(b)(1,4)dioxepin-3-one, 2,4-bis-(1-(3,4-dimethoxy-phenyl)-meth-(Z)-yliden)-7-methyl-benzo(b)(1,4)dioxepin-3-one, 2,4-bis-(1-(2,4-dimethoxy-phenyl)-meth-(Z)-yliden)-7-methyl-benzo(b)(1,4)dioxepin-3-one and 7-methyl-2,4-bis-(1-(3,4,5-trimethoxy-phenyl)-meth-(Z)-yliden)-benzo(b)(1,4)dioxepin-3-one.    EXAMPLE - Potassium hydroxide (12.8 mmole) was added in ethanol (8 ml). Then calone (5.6 mmole) was dissolved in ethanol (3 ml) was added to the above solution. Then 2,4,5-trimethoxybenzaldehyde (12.2 mmole) was added and heated to 40 degrees C for 2 hours. Then the obtained mixture was cooled, filtered and worked up to obtain 7-methyl-2,4-bis-(1-(2,4,5-trimethoxyphenyl)meth-(Z)-yliden)-benzo(b)(1,4)dioxepin-3-one (1.45 g) as orange crystals.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The rare earth element is lanthanum, praseodymium, neodymium, europium, gadolinium, dysprosium, ytterbium or lutetium; or oxide of rare earth element selected from lanthanum, cerium, praseodymium, neodymium, europium, terbium, dysprosium, ytterbium or lutetium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The ultrasonic step is carried out at 20-40 degrees C for 1-3 hours, and concentration of the obtained graphite oxide dispersion is 0.1-10 g/L. In the step (B), the reaction is carried out at 20-200 degrees C for 1-72 hours. Mass ratio of the transition metal oxide and graphite is 1: 10-10: 1. In step (E), the reaction time is carried out at 60-200 degrees C for 1-36 hours. Preferred Components: The transition metal oxide is manganese dioxide, titanium dioxide, cobaltosic oxide, or copper oxide. Volume ratio of the water and the ethylene glycol is 1:7-7:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The cadmium source is cadmium acetate. The selenium source is selenium powder.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - The solar cell further comprises a dopant (0.01-6 wt.%) having the form of metal, alloy, organometallic compound, silicide, boride, and/or nitride oxide, where the dopant includes at least one trivalent element. The solar cell comprises: an n-type silicon wafer; a p-type emitter; and a contact comprising a paste.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The trivalent dopant is a silicide of an element selected from chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), ruthenium (Ru), rhodium (Rh), iridium (Ir), osmonium (Os), scandium (Sc), ytterbium (Y), and lanthanum (La). The trivalent dopant is a boride of an element selected from Cr, Mn, Fe, Co, Ni, Ru, Rh, Ir, Os, Sc, Y, and La. The trivalent dopant is a nitride of an element selected from Cr, Mn, Fe, Co, Ni, Ru, Rh, Ir, Os, Sc, Y, and La. The trivalent dopant is an oxide of an element selected from Cr, Mn, Fe, Co, Ni, Ru, Rh, Ir, Os, Sc, Y, and La. The trivalent dopant is selected from rare earth elements having atomic number 58(Ce) to atomic number 71(Lu).    TECHNOLOGY FOCUS - METALLURGY - The trivalent dopant is a metal or alloy of boron (B), aluminum (Al), indium (In), gallium (Ga), and tantalum (Tl). The trivalent dopant is aluminum or aluminum alloy powder.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Method: Graphene oxide is obtained by stirring crystalline flaky graphite under ice water bath at 150-200 rpm, adding concentrated sulfuric acid and phosphoric acid mixed solution, continuously stirring for 15-30 minutes at 10 degrees C or less, adding potassium permanganate, continuously stirring for 1.5-2.5 hours, completing reaction, stirring at 33-37 degrees C and 120-150 rpm mechanically stirring for 20-30 hours, adding deionized water, continuously stirring for 15-30 minutes, adding 20-30 %mass hydrogen peroxide and concentrated hydrochloric acid, terminating reaction, allowing the solution to stand for layering, pouring the upper layer solution to obtain solid, and washing the obtained graphene oxide solid. The volume ratio of concentrated sulfuric acid and phosphoric acid is (8-10):1. The volume ratio of mixed solution of concentrated sulfuric acid and phosphoric acid with respect to flaky graphite is (50-60 mL):1 g. The mass ratio of potassium permanganate and flaky graphite is (4-6):1. The ratio of flaky graphite and deionized water is (200-300 mL):1 g. The ratio of hydrogen peroxide and flaky graphite is (20-30 mL):1 g. The ratio of concentrated hydrochloric acid and flaky graphite is (6-8 mL):1 g. The volume ratio of concentrated sulfuric acid and phosphoric acid is 9:1. Heating is carried out at 80-85 degrees C to obtain the graphene oxide aqueous dispersion.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The mercapto acid is mercaptoacetic acid or mercaptopropionic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): A sulfonated diphenol monomer is reacted with an aromatic nitrile monomer and a bisphenol-type monomer of formula: HO-Ar'-OH in presence of potassium carbonate. The molar feed ratio of sulfonated diphenol monomer and bisphenol type monomer is varied to provide sulfonic acid group content (SC) of 0.5-1. The sulfonate groups of sulfonated diphenol monomer are in acid or salt form. The sulfonated diphenol monomer is sodium 4,6-dihydroxynaphthalene-2-sulfonate, sodium 6,7-dihydroxynaphthalene-2-sulfonate, 2,7-disodium 3,6-dihydroxynaphthalene-2,7-disulfonate or potassium 2,5-dihydroxybenzene-1-sulfonate. Preferred Composition: The aromatic nitrile monomer is 2,6-dihalo benzonitrile, preferably 2,6-difluoro benzonitrile. The sulfonated diphenol monomer is preferably sodium 4,6-dihydroxynaphthalene-2-sulfonate or potassium 2,5-dihydroxybenzene-1-sulfonate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer has sulfonic acid group content (SC) of 0.6. The amount of potassium 2,5-dihydroxybenzene-1-sulfonate is 6 mmol and has sulfonic acid group content (SC) of 0.6. Preferred Definitions:    Ar'=diphenyl.    EXAMPLE - 2,6-Difluorobenzonitrile (10 mmol), sodium 2,8-dihydroxynaphthalene-6-sulfonate (5 mmol), 4,4'-biphenol (5 mmol) and potassium carbonate (15 mmol) were added, argon gas was passed, then, dimethylsulfoxide (10 mL) and chlorobenzene (10 mL) were added, heated, dehydrated, chlorobenzene was removed, cooled and coagulated, to obtain sulfonated aromatic nitrile-containing polymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The sputtering target has average grain size of less than 5 mu m, and relative density of 99% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The magnesium oxide sintered compact has purity of more preferably 99.999% or more and average crystal grain size of more preferably 1 mu m or less.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The content of water is preferably 5-25 %mass. The blend mass ratio of solvent and water is 95:5-30:70. The ceramic powder has an average particle diameter of 50-200 mu m as measured using laser scattering method. The ceramic powder comprises alumina or silica.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The organic solvent is alcohol solvent and the surfactant is anionic surfactant.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The glass substrate is a soda glass containing an alkaline component.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal ceramic is selected from a group consisting of metal nitride, mixed metal nitride, titanium nitride, titanium aluminum nitride, tantalum silicon nitride, titanium aluminum silicon nitride and tantalum aluminum silicon nitride.    TECHNOLOGY FOCUS - METALLURGY - The layers of the laminate are metal e.g. titanium, tantalum and vanadium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The fluorinated phosphorus compound has oxidation state of +5. The metal anode contains lithium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The fluorinated phosphorus compound has a functional group selected from trifluoromethyl, trichloromethyl, 2,2,2-trifluoromethyl, 1,2,2-trifluoroethyl, perfluoroethyl, perfluoro-iso-propyl, 1,1,1,3,3,3-hexafluoro-2-propyl, perfluoro-tert-butyl and perfluorododecayl. The fluorinated phosphorus compound is at least one of tris(2,2,2-trifluoromethyl)phosphate, tris(1,1,1,3,3,3-hexafluoro-2-propyl)phosphate, tris(perfluoroethyl)phosphate, tris(perfluoro-iso-propyl), (2,2,2-trifluoroethyl)-difluorophosphate), tris(1,2,2-trifluoroethyl)phosphate (TTFP), hexakis(2,2,2-trifluoroethoxy)phosphazene and tris(2,2,2-trifluoroethoxy)trifluorophosphazene. The non-aqueous electrolyte is co-solvent having a first solvent and a second solvent, the first solvent selected from cyclic carbonates, acyclic carbonates, carboxylic esters, cyclic ethers, acyclic ethers, cyclic sulfones, acyclic sulfones, cyclic sulfites, acyclic sulfites, cyclic nitriles, and/or acyclic nitriles. The first solvent is selected from EC (ethylene carbonate), PC (propylene carbonate), VC (vinylene carbonate), DMC (dimethyl carbonate), DEC (diethyl carbonate), EMC (ethyl methyl carbonate), FEC (fluoro ethylene carbonate), gamma -butyrolactone, methyl butyrate, ethyl butyrate, diethylether, dimethyl ethoxyglycol, tetrahydrofuran, tetramethylene sulfone, ethylene sulfite, ethylmethyl sulfone, acetonitrile, and/or thoxypropionitrile. The second solvent contains the fluorinated phosphorus compound.
TECHNOLOGY FOCUS - METALLURGY - The passivation layer is formed of aluminum oxide or aluminum nitride.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The anion exchange membrane further comprises one or more tricyclic azaphosphatrane cations covalently bonded to one or more sulfonyl groups of the sulfonated fluoropolymer support, where the sulfonyl group is bonded to any one of the three equatorial nitrogen atoms of the azaphosphatrane cation. The phosphatrane cation is a bicyclic proazaphosphatrane cation, where the sulfonated fluoropolymer support is covalently bonded to the phosphorus atom of the proazaphosphatrane cations. The bicyclic proazaphosphatrane cations have a structure of formula (I), where the cations are covalently bonded to the sulfonyl groups of the sulfonated fluoropolymer support, where a positive charge resides at the phosphorus atom or at any of the three equatorial nitrogen atoms bonded to the phosphorus atom. The tricyclic phosphatrane cations have a structure of formula (II), where the cations are covalently bonded to a sulfonyl group of the sulfonated fluoropolymer support, and a positive charge resides at the basal nitrogen atom. The sulfonated fluoropolymer support comprises sulfonated fluoroalkyl groups of formula (-(CF2-CF2)x-(CF2((O-CF2-CF(CF3))z-O-CF2-CF2-S((=O)2)-CH3)-CF2)y-) (IV). The sulfonated fluoropolymer support is Nafion (RTM: Sulfonated tetrafluoroethylene based fluoropolymer-copolymer).R1-R3 = H, 1-5C-alkyl (preferably CH3), benzyl, 5-9C-aryl, 1-4C-alkyl-6-9C-aryl, ((1-4C)alkyl)3Si, CH(CH3)(C6H5), Si(CH3)3, or 2,2-dimethylpropyl;R4, R5 = H, 1-5C-alkyl, 5-9C-aryl group or benzyl group, where at least one of R1-R5 is H;R6 = H, 1-5C-alkyl (preferably CH3), benzyl group or a halo (preferably F or Cl);R7, R8 = H, 1-5C-alkyl (preferably CH3), benzyl, 5-9C-aryl, 1-4C-alkyl-6-9C-aryl, ((1-4C)alkyl)3Si, CH(CH3)(C6H5), Si(CH3)3, or 2,2-dimethylpropyl;R9, R10 = H, 1-5C-alkyl (preferably CH3), 5-8C-aryl or benzyl, where at least one of R6-R10 is H or CH3;x = greater than 1;y = 1; andz = an integer between 1 and 2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The ultrasonic time is 1-3 hours, with ultrasonic temperature at 20-40 degrees C, and the concentration of obtained graphite oxide dispersion of 0.1-10 g/L. The reaction time is 1-72 hours, reaction temperature at 20-200 degrees C, and mass ratio of transition metal oxide and graphite obtained 1:10-10:1. Preferred Components: The transition metal oxide is manganese dioxide, titanium dioxide, zinc oxide and copper oxide. The transition metal oxide-complex dispersion binary graphene concentration is 0.1-10 g/L. The mass ratio of metal molybdenum and transition metal oxide graphene oxide binary compound is 1:40-40:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method involves dispersing the metallic material in water in the presence of a sacrificial reagent and exposing the resultant mixture to sunlight. When the sacrificial reagent is a reducing sacrificial reagent, then the method serves to produce hydrogen; or when the sacrificial reagent is an oxidizing sacrificial reagent, then the method serves to produce oxygen. Preferred Components: The metallic material comprises material having formula (A)1-x(B1)O3-a (I) or (Y1)y(Z1)O3 (II). The reactant is water or an organic reactant.x=0 to less than 0.25 (preferably 0.1-0.2);A=strontium (Sr), barium (Ba), calcium (Ca) and/or cadmium (Cd) (preferably strontium);B1=niobium (Nb), vanadium (V), tantalum (Ta), titanium (Ti), chromium (Cr), molybdenum (Mo) and/or tungsten (W) (preferably niobium);a(which is dependent upon the value of x)=0 or a positive number of less than 1;y=greater than 0 to 1 (preferably greater than 0.3-0.95);Y1=hydrogen (H), lithium (Li), sodium (Na), potassium (K), rubidium (Rb), cesium (Cs), calcium (Ca), strontium (Sr), barium (Ba), lanthanum (La), aluminum (Al), copper (Cu), zinc (Zn), gallium (Ga), silver (Ag), cadmium (Cd), indium (In), thallium (Tl), lead (Pb), cerium (Ce), praseodymium (Pr), neodymium (Nd), europium (Eu), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm), ytterbium (Yb) and/or lutetium (Lu) (preferably Sr);Z1=niobium (Nb), tungsten (W), molybdenum (Mo), Vanadium (V), nickel (Ni) and/or titanium (Ti) (preferably Nb).When x is greater than 0, then A is Sr and B1 is Nb. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The dopant is gallium, indium, arsenic and/or antimony.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The transition metal consists of manganese and molybdenum. The transition metal compound is a transition metal oxide such as molybdenum oxide, and a salt of oxyacid of the transition metal. The salt is potassium permanganate. The sulfur-containing compounds are zinc oxide, zeolite, and silver-doped zeolite.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The reaction for changing color of the adsorber material is caused by the sulfur-containing compounds comprising hydrogen sulfide, tetrahydrothiophene, dimethyl sulfide, ethyl mercaptan and tert-butyl mercaptan.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The silicon wafer is chosen from silicon single crystal, silicon polycrystal, silicon amorphous layer and silicon containing mixing solid layer.
TECHNOLOGY FOCUS - METALLURGY - The semiconductor substrate is selected from semiconductor substrates of amorphous germanium, semiconductor substrates of amorphous silicon, semiconductor substrates of undoped crystalline germanium, semiconductor substrates of p-doped crystalline germanium, semiconductor substrates of undoped crystalline germanium-silicon alloy, semiconductor substrates of p-doped crystalline germanium-silicon alloy, semiconductor substrates of undoped crystalline silicon, or semiconductor substrates of p-doped crystalline silicon. The p-type solar cell wafer is selected from p-type crystalline germanium solar cell wafers, p-type crystalline germanium-silicon alloy solar cell wafers and p-type crystalline silicon solar cell wafers. The glass frit is an aluminosilicate glass or a borosilicate glass.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: The glass frit is an aluminosilicate glass or a borosilicate glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The n-type semiconductor substrate is made of n-doped: crystalline germanium; crystalline germanium silicon alloy; and crystalline silicon. The n-type solar cell wafer comprises n-type crystalline: germanium solar cell wafers; germanium-silicon alloy solar cell wafers; and silicon solar cell wafers.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of active carbon, ultra-pure water, iron salt aqueous solution and palladium salt aqueous solution is (10-15) mg:(6-10) ml:(2-3) ml:( 58-0.68) mL. The iron salt is ferrous chloride or ferrous sulfate. The palladium salt is palladium chloride or chloro palladic acid. The concentration of the iron salt aqueous solution is 0.09M. The concentration of the palladium salt aqueous solution is 1 g/100 mL. The catalyst is manufactured under protective gas such as argon or nitrogen. The reducing agent is sodium borohydride or ethylene glycol. The catalyst product is washed using ultra-pure water and dried at 50-70 degrees C under vacuum for 2-4 hours.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Heat conductive filler (B) is aluminum hydroxide and/or aluminum oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The heat-conductive pressure-sensitive adhesive composition (F) further contains 45-190 parts mass phosphate ester and 0.01-10 parts mass polymerization initiator, with respect to 100 mass parts (meth)acrylic resin composition (A).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Nitrogen or erbium is doped with spherical porous titanium oxide nanoparticles.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The method further involves adding benzamide, and erbium acetate tetrahydrate in supercritical fluid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The hydrogen-containing region and the hydrogen diffusion suppression region are comprised with indium oxide film containing tin oxide. The hydrogen diffusion suppression region is comprised with transparent conductive oxide film which has either zinc oxide or an indium tin oxide as main component.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanoparticles contain tungsten oxide or doped tungsten oxide in which 1-40 wt.% of tungsten oxide is replaced by one or more transition metals. Preferred Properties: The nanoparticles have mean primary particle size of 2-60 nm and/or hydrodynamic size of less than 100 nm. Preferred Process: The nanoparticles are synthesized by gas phase process.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The composition contains 0.1-10 wt.% nanoparticles and homogeneous solvent composition comprising 0.1-18 wt.% water, 30-98 wt.% low-boiling alcohol and 1-50 wt.% high-boiling alcohol. The composition does not contain surfactant or dispersing agent and/or has residual organic carbon content of less than 2.5 wt.% after drying at 150 degrees C for l hour. The high-boiling alcohol is of formula: R1-O-R2-OH (I).R1,R2=linear or branched 1-6C alkyl, where total number of carbon atoms is 3-7.Preferred Properties: The high-boiling alcohol has boiling point of 200 degrees C or less. The film has thickness of 5-100 nm and/or mean surface roughness of 100 nm or less.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The substrate is polymer substrate with surface free energy of 40 mJ/m2 or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The curable composition is cured by radical polymerization reaction. The curable composition is preserved at 10 degrees C or less even after using for pattern formation at room temperature. The curable composition is applied by inkjet method on a base material. Preferred Composition: The curable composition further contains polar group-containing nonpolymerizable compound (C) and does not contain solvent. The compound (C) has hydroxyl group. Preferred Property: The curable composition has viscosity of 5-30 mPa.second.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The fluorine-containing composition further comprises repeating unit (b) derived from non-fluorine non-crosslinkable monomer, repeating unit (c) derived from non-fluorine crosslinkable monomer, fluid medium, water-and-oil repellant, antifoulant or mold release agent. Preferred Definitions:    Y'1,Y'2=-O-;    Rf1=1-6C perfluoroalkyl;and    Rf2=12C or more perfluoroalkyl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The carboxylate ester is separated and removed from trifluorooxirane-containing compound (I) and mixture by distilling method. The carbonyl compound is reacted with trifluorooxirane-containing compound (I) to obtain product containing fluorine-containing compound of formula: FOC-C(=O)-QSO2F (IV) or (V), after separation of carboxylate ester. The product containing fluorine-containing compound (IV) or (V) is reacted with hexafluoropropylene oxide, to obtain fluorocarbon-containing compound of formula (VI). The carbonyl group-containing compound (VI) is isomerized, to obtain fluorocarbon-containing compound of formula (VII). The fluorocarbon-containing compound (VII) is subjected to thermolysis reaction to obtain fluorocarbon-containing compound of formula (VIII).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: A compound (m) having a hydroxyl group in the mixture (M) is reacted with acid fluoride compound of formula: C(-F)(=O)-QSO2F, esterified and converted into a carboxylate ester. The carboxylate ester is separated and removed from the mixture containing compound (a) and carboxylate ester. Hexafluoropropylene oxide is reacted with compound (d1) and/or (d2) at -50 degrees C to 50 degrees C for 0.5-24 hours and heated at 105-135 degrees C for 0.5-24 hours to obtain compound (g). The fluoride ion catalyst is a metal fluoride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The pure water is deionized pure water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The silane and ammonia are deposited on the anti-reflecting film layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The metal acetate is cobalt acetate, copper acetate, acetic acid, zinc acetate, or ferrous manganese acetate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: An acid solution chosen from sulfuric acid solution and nitric acid solution, is used in the manufacture of the composite.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The type IV semiconductor material comprises silicon. The type III-V semiconductor material comprises gallium nitride, indium gallium nitride, gallium phosphide, indium phosphide, and/or gallium phosphide nitride. The first dopant includes phosphorus, antimony, arsenic, boron, gallium, and/or aluminum. The second dopant includes magnesium, zinc, carbon, iron, silicon, germanium, and/or oxygen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The carbon dioxide selective absorber contains a mesoporous material and/or zeolite.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The outside air supplying member has an outside air shutoff mechanism cutting off contact of the carbon dioxide selective absorber with the outside air upon neither discharging nor recycling of the carbon dioxide selective absorber. The purified air supplying member has a purified air shutoff mechanism cutting off contact of the cathode with the purified air upon recycling of the carbon dioxide selective absorber. Preferred Method: The method further comprises a charging step of charging, where the recycling step is carried out during the charging step. The method comprises a pause step of cutting off contact of the carbon dioxide selective absorber with outside air upon neither discharging electricity nor recycling of the carbon dioxide selective absorber. The cathode does not contact with the purified air upon recycling of the carbon dioxide selective absorber in the recycling step.
TECHNOLOGY FOCUS - METALLURGY - The thin film of active material comprises silicon, for example amorphous, microcrystalline and single crystalline silicon, or cadmium telluride or copper indium gallium selenide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The ceramic frame is formed of alumina.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The particle diameter of 50% of accumulation height point of abrasive grain is 6 mu m or less by electrical resistance test method according to JIS R6002. The mass concentration of abrasive grain is 50% or more. The slurry has viscosity of 100-200 mPa.second.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aqueous alkali solution contains 0.01-1 wt.% alkylamine having hydroxyl group and 0.05-0.8 wt.% compound having amino group and carboxyl group. The aqueous alkali solution further contains alcoholic additive of formula: X-(OH)n or surfactant having hydrophilic-lipophilic balance of 10 or more.X=(un)saturated 4-7C hydrocarbyl;andn=1 or more, in which n is less than the carbon number of X.
TECHNOLOGY FOCUS - METALLURGY - The back metal layer in the openings formed in the passivation layer is selected from a group consisting of aluminum, silver, tin, cobalt, nickel, zinc, lead, tungsten, titanium and/or tantalum and nickel vanadium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: A mixed metallic material containing aluminum, molybdenum, tungsten, tantalum, chromium, nickel and/or copper is formed on substrate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solar cell further comprises an antireflective coating situated on top of the first layer, where the antireflective coating comprises magnesium peroxide and titanium dioxide and indium oxide and tin oxide. The first layer comprises an n+ aluminum gallium indium phosphide emitter, a p-type aluminum gallium indium phosphide base, and p+ type aluminum gallium indium phosphide back-surface-field layer. The second layer comprises an n+ indium gallium arsenide emitter, a p-type indium gallium arsenide base, and a back-surface-field layer. The third layer comprises an n+ gallium antimonide emitter, a p-type gallium antimonide base, and a p type gallium antimonide back-surface-field layer. The fourth layer comprises an n+ indium gallium antimonide emitter, indium gallium antimonide base, and a p-type indium gallium antimonide substrate layer, the emitter and the base formed on the substrate layer. The first tunnel junction comprises a p++ aluminum gallium arsenide tunnel junction, and n++ aluminum gallium indium phosphide tunnel junction. The second tunnel junction comprises p++ aluminum gallium arsenide tunnel junction, and n++ indium gallium arsenide tunnel junction. The third tunnel junction comprises a p++ aluminum gallium arsenide tunnel junction, and n++ gallium antimonide tunnel junction.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The in-plane concentration distribution difference of gallium is plus minus 0.4%. Preferred Composition: The highly purified carbon crucible is used as crucible for casting.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The weight ratio of silicon-containing monomer and nitrogen-containing monomer is 3/97-95/5. The monomer component further contains monomer (a) copolymerizable with nitrogen-containing monomer and silicon-containing monomer. The monomer (a) is chosen from styrene-type monomer, carboxylate ester-type monomer and amide-type monomer. The content of monomer (a) is 100 pts. wt. with respect to 100 pts. wt. of total content of nitrogen-containing monomer and silicon-containing monomer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method treats heat exchanger parts formed by a process including casting, rolling, forming and/or brazing. Preferred Components: The heat exchange system comprises components containing aluminum and/or its alloy. The metal surface is brazed with a fluorine-containing flux. The fluorine-containing fluxing material is potassium fluoroborate, potassium fluoroaluminate, cesium fluoroaluminate, potassium fluorozincate and/or cesium fluorozincate. The phosphate ions in the phosphate-containing solution are derived from at least one of alkali metal phosphates, ammonium phosphates, polyphosphates, pyrophosphates and/or phosphoric acid. The phosphate-containing solution comprises 1-2 wt.% of dipotassium phosphate in solution. The composition has a pH of 6.5-11.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The crosslinked silicone resin further contains organosiloxy unit (A2) of formula (III) and organosiloxy unit (B2) of formula: R6-SiO3/2 (IV). The ratio of total content of organosiloxy units (A1) and (B2) with respect to total content of organosiloxy units (A1), (A2), (B1) and (B2) is 15-50 mol%. The ratio of phenyl groups in organosiloxy units of crosslinked silicone resin with respect to total content of alkyl groups and phenyl groups in organosiloxy units of crosslinked silicone resin is 10-40 mol%. The total content of organosiloxy units (A1), (A2), (B1) and (B2) is 95-100 mol%. The organosiloxy units (A1), (A2), (B1) and (B2) are derived from organoalkoxy silane compound. The curable silicone resin consists of partial hydrolysis-condensation product of mixture of organoalkoxy silane compound.R2=1-4C alkyl.Preferred Properties: The thickness of resin layer is 1-5 mu m. The support plate is glass plate. The difference of mean coefficient of linear expansion of support plate and glass substrate is 0-500x 10-7/ degrees C at 25-300 degrees C. The weight average molecular weight of partial hydrolysis-condensation product of mixture of organoalkoxy silane compound, is 10000-100000. Preferred Process: The cleaning process is carried out using a solvent having solvent having solubility parameter is 7-15.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The flame retardant is bromine-containing flame retardant.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The mass ratio of content of polycarbonate with respect to content of polybutylene terephthalate is 6:4 or more and 9:1 or less. The content of polycarbonate in the resin composition is 10 mass or more.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The vinyl polymer has repeating unit derived from glycidyl (meth)acrylate. The flame retardant is bromine containing epoxy resin.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The (meth)acrylate compound (A) is obtained by reacting polyester polyol (a1) having number average molecular weight of 500-6000, polyisocyanate compound (a2) and hydroxyl-containing (meth)acrylate compound (a3). The compound (A) has (meth)acryloyl-group concentration of 0.05-0.5 mmol/g. Alternately, the composition contains (meth)acrylate compound (C). The ratio of the compound (A) and compound (C) is 50/50-98/2.    TECHNOLOGY FOCUS - POLYMERS - Preferred Resin: The polyester resin (B) has weight average molecular weight of 3000-20000. The mass ratio of the compound (A) and resin (B) is 98/2-20/80.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal oxide (A) is hydrolysis-condensation product of compound (L) containing metal atom (M) having characteristic group which is hydrolyzed bonded. The sulfur compound is sulfuric acid and/or its derivative.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The compound (L) is of formula: M1X1mR1(n-m) (I), preferably aluminum triisopropoxide and/or aluminum tri-s-butoxide. The sulfur compound in which halogen atom is directly bonded to sulfur atom, and oxygen atom is directly bonded to sulfur atom by single bond.M1=Al, Ti or Zr;X1=F, Cl, Br, I, R2O-, R3C(=O)O-, (R4C(=O))2CH- or NO3;R1-R4=alkyl, aralkyl, aryl or alkenyl;n=valence of M1;andm=1-n.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The layer (y) further contains 10 %mass or less polymer having functional group chosen from hydroxyl group, carboxyl group, carboxylic anhydride group and salt of carboxyl group, and the polymer is chosen from polyvinyl alcohol, ethylene-vinyl alcohol copolymer, polysaccharide, polyacrylic acid, polyacrylic acid, polymethacrylic acid and/or polymethacrylic acid. Preferred Layer: The base material (x) is stratified base material having layer chosen from thermoplastic resin film layer, paper layer and inorganic vapor deposition layer. Preferred Property: The composite structure has oxygen permeability of 1 ml/(m2/day.atm) at 20 degrees C and 0%RH.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal layer is made of aluminum, copper, silver, indium tin oxide and transparent conductive oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The multiple protrusions is in form of a ceramic material or a green or sintered body of graphite. The ceramic material is selected from silicon mononitride, silicon nitride, silicon dioxide, silicon carbide, or aluminum oxide.
TECHNOLOGY FOCUS - METALLURGY - The metal nanoparticles consist of silver, gold, aluminum and copper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The ternary catalyst is prepared by heating at 40 degrees C for 1 hour, heating at 330 degrees C in air atmosphere for 40 minutes, grinding to obtain Pt in face-centered cubic (FCC) structure, Sn in tetragonal structure, SnO2, and Ir, where Pt and Ir are in the form of solid solution. Ethanol catalytic reaction of catalyst comprises weighing 42.00 mg of Pt-Ir-SnO2/C, adding 366 mg of 5% naphthol solution at 40 degrees C, adding 560 mg isopropanol, performing ultrasonic treatment for 10 minutes, uniformly coating the gold metal, drying for 1 hour in nitrogen atmosphere at 130 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mixed acid solution comprises concentrated nitric acid and concentrated hydrofluoric acid in the volume ratio of 2:1-5:1. The content of concentrated nitric acid and concentrated hydrofluoric acid in the mixed acid solution is 400 ml and 100 ml, respectively.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent is terpineol (800 g), ethanol or acetone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicon wafer is cleaned using sodium hydroxide, isopropyl alcohol, etching additive and deionized water. The etchant is hydrofluoric acid or nitric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicon wafer is knurled using mixture of carbon tetrafluoride and oxygen.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The substrate is a semiconductor device comprising an organic solar cell, an organic LED, an organic thermoelectric generator, an organic laser, an organic photodetector or an organic FET.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The alkali metal is dissolved in pyridine or ammonia and added into the semiconductor solution. The applying step is carried out by a printing or a coating method.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The semiconductor is 4,7-diphenyl-1,10-phenanthroline, 2,2',2''-(1,3,5-benzenetriyl)tris-1-phenyl-1H-benzimidazole, 3-(4-biphenylene)-4-phenyl-5-tert-butylphenyl-1,2,4-triazole or 2-(biphenyl-4-yl)-5-phenyl-1,3,4-oxadiazole. The molar ratio of the semiconductor to alkali metal is 100:1-1:10. The thin layer from the organic semiconductor material has a layer thickness from 1-1000 nm. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: The depositing the target on a substrate by sputtering it at room temperature is performed at a pressure of 1-10 mTorr. Preferred Definitions:    x=0.042-0.055.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The materials are titanium, niobium, zinc, chromium, silver, aluminum, gold, cobalt, palladium and copper or platinum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Support: In the support catalyst, the M is iron (Fe). The MOx is iron oxide (Fe2O3), where the Fe2O3 is between 0.4-2% w/w. Preferred Catalyst: The gold catalyst is of formula: Au/CeO2-MOx/Al2O3. The catalyst comprises: 1-3.5% w/w gold (Au), and 13-17.6% w/w CeO2/MOx. The catalyst is selected from: Au/CeO2-Fe2O3 (0.5)/Al2O3, Au/CeO2-Fe2O3 (1)/Al2O3, Au/CeO2-Fe2O3 (1.5)/Al2O3, and Au/CeO2-Fe2O3 (2)/Al2O3. The catalyst comprises a medium pore size of 68-76 Angstrom and a pore volume between 0.39-0.57 cm3/g. Preferred Process: The process is conducted at a temperature between 140-350 degrees C and a space velocity of 4000/hour. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The intermediate is metal amide. The metal and/or metal-containing compound contains group I metal, group II metal, transition metal, p-block metal, lanthanide metal and/or their alloy. The group I metal is chosen from sodium, lithium, potassium, rubidium, cesium and their alloy, preferably sodium. The group II metal is chosen from beryllium, magnesium, calcium, strontium, barium and their alloy. The transition metal is chosen from scandium, yttrium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, silver, cadmium, hafnium, tantalum, tungsten, rhenium, osmium, iridium, platinum, gold, mercury and their alloy. The lanthanide metal is chosen from lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium and their alloy. The metal-containing compound is chosen from metal hydride, metal nitride and/or metal imide. At least some of the ammonia is reacted with metal and/or metal containing compound in presence of a catalyst. The catalyst contains transition metal and/or lanthanide metal. The catalyst is chosen from transition metal calogenide, lanthanide metal calogenide, transition metal halide, lanthanide metal halide, transition metal pnictide, lanthanide metal pnictide, transition metal tetrel and/or lanthanide metal tetrels. The molar ratio of ammonia and metal and/or metal-containing compound is 1:1-1:2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first sheet has the general formula (M'X'n)p; and second sheet has the general formula (M''X'm)q.p=1-5 (preferably 1);q=1-5 (preferably 2).Preferred Nanostructure: The nanostructure is of formula ((M'X'n)p(M''X'm)q)r. The sheets of inorganic layered compounds are closed sheets.r=1-100.Preferred Process: The vaporization of the inorganic compound is performed in the presence of at least one second catalyst, where the inorganic compound is tin sulfide (SnS2). In the process, Ta1 is 700-850 degrees C, and Tb1 is 300-100 degrees C. Ta1 in step (b) is maintained for more than 1 hour. The vaporized inorganic compound is maintained in temperature gradient of step (c) for 30 minutes to 1.5 hours. Preferred Catalyst: The first catalyst is bismuth (Bi). The second catalyst is selected from antimony sulfide (Sb2S3) or antimony selenide (Sb2Se3). Preferred Definitions:    n=1;    m=2;    M' and M''=Nb, Sn or Pb;    X'=S or Se.    EXAMPLE - Quartz ampoules of 10 mm inner and 12 mm outer diameters were filled with tin sulfide (SnS2) and bismuth (Bi) powders. Small amount of antimony sulfide (Sb2S3) powder was also added to the ampoules. The molar ratio between SnS2, Bi, Sb2S3 was approximately 5:1:0.8, respectively. The ampoules were sealed in a vacuum of 2x l0-5 torr and after sealing their length was approximately 14 cm. The ampoules were inserted into a horizontal 2-zone reactor furnace. The performed high-temperature annealing procedure involved two main steps. Step 1: almost constant temperature profile of 800 degrees C (with small deviations between the edges of the ampoule of not greater than 50 degrees ) which was applied for 2 hours. Step 2: the ampoule was moved inside the furnace and was subjected to a temperature gradient of 740-190 degrees C for 1.5 hours, and was then cooled at plain air. The product accumulated in the cold zone of the ampoule.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The ratio of linseed oil absorption amount (B) (mL/100 g) of the negative electrode active material with respect to dibutyl phthalate oil absorption amount (A) (mL/100 g) of the positive electrode active material is 1.53-1.73. The dibutyl phthalate oil absorption amount (A) (mL/100 g) of the positive electrode active material is 25 mL/100 g or more. The linseed oil absorption amount (B) (mL/100 g) of the negative electrode active material is 45 mL/100 g or more. The sum of linseed oil absorption amount (B) (mL/100 g) of the negative electrode active material and dibutyl phthalate oil absorption amount (A) (mL/100 g) of the positive electrode active material is more than 87 (mL/200 g). Preferred Composition: The positive electrode active material includes lithium transition metal oxide containing nickel, cobalt and/or manganese as constituent element. The negative electrode active material includes graphite.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first and second layers consist of aluminum oxide, aluminum nitride, aluminum oxynitride, silicon oxide, silicon nitride, amorphous silicon, and amorphous silicon carbide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The etchant is a dilute alkaline solution comprising potassium hydroxide having a concentration of 1-40 vol.%, sodium hydroxide, ammonium hydroxide, hydrazine ethylene diamine pyrocatechol, tetra methyl ammonium hydroxide, tetra ethyl ammonium hydroxide and/or tetra propyl ammonium hydroxide, and polyethylene glycol, polyoxyethylene, glycerol, aluminum phosphate, aluminum chloride or aluminum sulfate, and has an etch selectivity of aluminum oxide relative to silicon nitride of 10:1-100:1. The dilute acid solution comprises hydrofluoric acid having a concentration of 0.1-5 vol.%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The step of exposing and ultrasonic treatment are provided by a solvent that consists of aliphatic polyol or methylphenylsiloxane. The ultrasonic treatment is conducted in the presence of terminal 2-6C diols. The ultrasonic treatment is conducted in the presence of substituted methylphenylsiloxane compounds of formula ((Si(CH3)(phenyl)O)n). The ultrasonic energy delivery is applied for 1-4 hours at 120-600 W. Preferred Components: The alkaline reactant is a solid alkali metal hydroxide or alkaline earth metal hydroxide. The mixture comprising the alkaline reactant contains an inorganic salt oxidant that is a alkali metal permanganates, persulfates or perchlorates. The alkaline reactant is substituted tetra alkylammonium hydroxide compounds of formula (R1R2R3R4NOH) (Ia).R1-R4 = 1-8C alkyl; andn = 4-10. EXAMPLE - Mixture of thermally expanded graphite ((TEG) having a bulk density 4.5 kg/m3)) (1 g) and potassium hydroxide (5 g) was charged into a cylinder vessel (225 ml). Mechanical/chemical activation was provided by using a planetary ball mill at 650 revolutions per minute. After milling for 3 hours, the vessel was opened, water (50 ml) was added and treatment was continued for 10 minutes at 500 revolutions per minute. Water was added up to a volume of 1 liter, and neutralized by hydrochloric acid, filtrated on a glass filter and dried at 130 degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Acid component containing component (A) is 3,3',4,4'-biphenyl tetracarboxylic acid, 2,3,3',4'-biphenyl tetracarboxylic dianhydride, and/or pyromellitic acid.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Component (A) is p-phenylenediamine, diamino diphenylether, and/or 1,3-bis(4-aminophenoxy)benzene. Solvent interposed between solvent solutions of support body and component (A) is solvent compatible with component (A). Solvent solution contains 5-50 mass% component (A). Solvent solution contains 0.1-20 mass% component (B). Preferred Processes: Component (B) is interposed and casted by 5-100 g/m2 between solvent solutions of support body and component (A). Preferred Parameters: Solvent solution containing component (A) has viscosity of 500-5000 poises. Solvent solution containing component (B) has viscosity of 5-100 centipoises. Polyimide film thickness is 5-15 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The average transmittance of the transparent composite with respect to the visible ray is 75% or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The terminal group is hydroxyl group. The weight ratio of polyester segment (A) and polycarbodiimide segment (B) is 100:0.5-15. The polyester segment (A) contains aliphatic glycol having 4C or more linear alkylene structure and/or aliphatic dibasic acid having 4C or more linear alkylene structure, as copolymerization component. The amount of aliphatic glycol having 4C or more linear alkylene structure and/or aliphatic dibasic acid having 4C or more linear alkylene structure is 5-60 mol%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The resin composition further contains polyester polyol, polyurethane polyol and carbodiimide compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The alkali metal is potassium element and/or sodium element.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyethylene terephthalate composition further contains 0.01-0.05 mol% copolymerizable component having three or more functional groups with respect to the total of acid component of polyester.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electrolyte composition does not contain tin ion. The content of metal ion in electrolyte composition is 5-20 g/l, preferably 10-20 g/l. The fluoride-containing nickel and/or cobalt electrolyte composition is ammonium hydrogen difluoride. The content of fluoride in electrolyte composition is 5-20 g/l, preferably 8-20 g/l.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The electrolyte composition contains wetting agent. The wetting agent is tetraethylammonium perfluoroalkyl sulfonate and/or sulfopropylated alkylalkoxylate. The electrolyte composition further contains 10-20 g/l nickel ion or 10-20 g/l cobalt ion, 5-20 g/l fluoride ion, 5-20 ml/l ammonia and/or ethanolamine or tetramethylammonium hydroxide and 0.5-5 ml/l wetting agent.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The base film of the film (7) and film (9) is biaxially-stretched polyester film or unextended polypropylene film. The aromatic crosslinked resin (4) in the adhesive bond layer (8) is aromatic polyepoxy resin or aromatic urethane resin.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The compression element comprises a cross-section that covers, preferably uniformly flows through the entire flow cross-section of the ion exchange medium. The compression element is arranged in a pre-stressed state in the container. The compression element is pre-stressed in a radial and/or axial direction relative to the flow path. The container and the compression element exhibit a cylindrical or a conical shape. At least one compression element is arranged between the inlet and the ion exchange medium and/or at least one foam element is arranged between the ion exchanger medium and the outlet. The compression element is supported immediately at the ion exchange medium.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The compression element is made of polyurethane, a further polymer made of thermoplastic, or a thermosetting base.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The semiconducting properties of tungsten disulfide are chosen from electron or mobility of a hole, a band gap, and work function. The semiconductor layer has a band gap of 0.5-4.8 eV. Preferred Composition: The sputtering target contains 0.1-10 wt.% sulfide, and hafnium, rhenium, tantalum, tungsten, niobium, zirconium, vanadium, aluminum, indium, tin, gallium, zinc, silicon, germanium, manganese, nickel, iron, cobalt, copper, silver, yttrium, scandium, magnesium and/or calcium, remainder of tungsten disulfide and unavoidable impurity. The transistor has a single layer containing titanium oxide, niobium oxide, tantalum oxide, vanadium oxide, hafnium oxide, aluminum oxide, molybdenum oxide, tungsten oxide, zirconium oxide, silicon oxide, nitridation silicon and/or aluminum nitride as main component. The sputtering target consists of sintered compact.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Substrate: The metal substrate contains aluminum, iron, zirconium, titanium, magnesium, copper, niobium and/or tantalum.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The hydrophobic treatment is carried out using a compound having silicon and carbon, preferably silane coupling agent having hydrophobic group.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal alkoxide is an alkoxide of aluminum, silicon, magnesium, calcium, iron, gallium and hafnium. The rare-earth-metal complexes are europium complex, cerium complex, iridium complex and ruthenium. The fluorescent particles are filled or filmed in bead, preferably a porous bead.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polymerizable functional group is chosen from (meth)acryl group, epoxy group, isocyanate group and amino group.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The atom-encapsulated fullerene is lithium-encapsulated fullerene (C60), preferably antimony hexafluoride lithium-encapsulated fullerene or phosphorus hexafluoride lithium-encapsulated fullerene.
TECHNOLOGY FOCUS - POLYMERS - The composition for electroconductive intermediate layer is prepared using polyvinylidene fluoride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The base particles are carbon particles, and bulky group with fluorine atom at terminal is perfluorocarbon or pentafluorobenzene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The solder powder (B) has average particle diameter of 1-10 mu m. The silver coat metal powder (a) has average particle diameter of 1.5-20 mu m. Preferred Composition: The silver coat metal powder (a) contains silver coat nickel powder containing 5-30 parts mass silver coat with respect to 100 parts mass of nickel powder.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The electroconductive composition further contains organic acid silver salt (D). The content of organic acid silver salt (D) is 1-100 parts mass, with respect to 100 parts mass of electroconductive particles (A).
TECHNOLOGY FOCUS - POLYMERS - Preferred (disclosed): Diol monomer component (HO-T-A-T-OH) and itaconic acid are polymerized in presence of acidic catalyst, to obtain polyester resin. Preferred Definitions:    X=1,4-phenylene, 3,3'-biphenylene, terphenylene, 1,6-pyrene diyl, 9,9-dimethyl fluorenyl, (2-phenyl ethyl)phenyl, 1,5-naphthyl, phenoxy phenyl or 1,4-bis-(1-methyl-1-phenyl-ethyl)-phenyl.    EXAMPLE - 20 g 3-(4-(Biphenyl-4-yl-(4-(3-hydroxy-propyl)-phenyl)-amino)-phenyl)-propan-1-ol, 5.94 g itaconic acid, 0.5 g 4-nitro benzene sulfonic acid hydrate and 200 ml toluene were mixed, heated, refluxed for 10 hours, water was removed, washed using potassium carbonate aqueous solution and distilled water, 2000 ml methanol was dripped to the reaction mixture, polymer was deposited, washed using methanol and dried, to obtain 15.4 g polyester resin having molecular weight of 15000.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The plasma chemical vapor deposition further involves using mixed gas of oxygen, ozone, water, hydrogen peroxide, ammonia, nitrogen, nitrous oxide, carbon dioxide, carbon monoxide, hydrogen, argon and/or helium. Preferred Components: The gas-barrier layer is inorganic membrane comprising aluminum oxide, silicon oxide, silicon nitride and/or silicon oxynitride. A protective layer (4) obtained by heat-drying mixed solution comprising metal alkoxide and water-soluble, is formed on the gas-barrier layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of gas barrier layer (3) and gas barrier layer (6) is 0.2 mu m or more and 2 mu m or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The silicon compound (II) is 1,3,5-tris(3-trialkoxysilyl alkyl)isocyanurate of trimer of formula: (NCO-R4Si(OR3)3)3, preferably 1,3,5-tris(3-trimethoxysilyl propyl)isocyanurate.R4=(CH2)n;andn=one or more. Preferred Definitions:    R1=C2H5.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Arrangement: The gas-barrier layer is provided in arrangement which covers the ion-barrier layer which is provided in arrangement which covers the gas-barrier layer. The gas-barrier layer is provided in the arrangement interposed in the ion-barrier layer. The ion-barrier layer is provided in the arrangement interposed in the gas-barrier layer. Preferred Component: The base material is heat-resistant base material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of molded material (25) is 0.2-10 mm.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Composition: The polycrystalline-silicon manufacturing apparatus has heater (13) which heats surface of silicon core wire by radiation. Preferred Condition: During manufacture of polycrystalline silicon, increasing amount of electric current value flowed to the bypass circuit is restrained to 20 A or less, from preheating to completion of electroheating process.    TECHNOLOGY FOCUS - ELECTRONICS - Preferred Arrangement: Switch (16) of the bypass circuit is provided, such that number of silicon core wires made into the serial connection state is increased by order of 1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Silicon nitride powder contains 10-90 mass% beta phase and less than or equal to 100 ppm iron (Fe), aluminum (Al), and calcium (Ca) as impurities.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The silicon sludge (1 kg) is mixed with calcium hydroxide (in g) (20-100) and iron powder (20-100). Water glass (10-60) and starch (10-60) are mixed with mixed silicon sludge (1 kg).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The zinc molar ratio with respect to silicon tetrachloride in the 2nd process is 0-1.5. The silicon carbide rod is a silicon impregnation silicon carbide rod with which the silicon is impregnated at porous silicon carbide. The mass ratio of the silicon carbide with respect to impregnated silicon is 80:20-95:5. Preferred Process: The 1st process is performed by supplying silicon tetrachloride vapor and zinc vapor.    TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Components: The reactor is a vertical reactor which supplies silicon-tetrachloride vapor and zinc vapor from upper part, and discharges exhaust gas from the lower part. The precipitation rod (preferably silicon carbide rod) is installed in the reactor. The center and concentric form of the reactor are provided with section wall of supply space of silicon tetrachloride vapor and section wall of supply space of zinc vapor. Inner side is supply space of silicon-tetrachloride vapor and outer side has supply unit of silicon tetrachloride vapor and zinc vapor supply unit. The reactor has discharge pipe of exhaust gas in the lower part of reactor. The insertion container is installed in the reactor.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Parameters: Polyhedral structure polysiloxane modified body is liquefied at 20 degrees C. Preferred Components: Organosilicon compound (a') which has an alkenyl group is an organosilicon compound which has greater than or equal to 1 aryl groups. Compound (b) which has hydrosilyl group is cyclosiloxane of linear siloxane which has a hydrosilyl group. Polyhedral structure polysiloxane compound (a) has an alkenyl group with siloxane unit of formula (AR12SiO-SiO3/2)a(R23SiO-SiO3/2)b. Organopolysiloxane (B) which has greater than or equal to 2 alkenyl groups has greater than or equal to 1 aryl group. The composition contains hydrosilylation catalyst, and curing retarder.a+b=6-24;a= greater than or equal to 1;b=0-1;A=alkenyl;R1=alkyl group or aryl group; andR2=H, alkyl group, aryl group, or group bonded to other polyhedral frame polysiloxane.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of structural unit of polyvinyl alcohol-type resin (A) is 2-15 mol%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The weight ratio of polyvinyl alcohol-type resin (A) and polyamide resin (B) is 90/10-75/25. Preferred Property: They melt viscosity of the polyamide resin (B) is 200-2500 Pa.second.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first transparent dielectric comprises tin oxide. The transparent conductive oxide film comprises zinc oxide doped with 0.5-4% of aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The quantum dot is chosen from indium arsenide, gallium arsenide, germanium, silicon germanide, cadmium sulfide, indium phosphide, lead selenide or gallium nitride. The quantum dot material is indium arsenide, indium-gallium arsenide or indium-gallium phosphide. The capping material is aluminum-gallium arsenide or aluminum-gallium phosphide. The quantum dots are individual quantum dots and/or quantum dot clusters. The quantum dot clusters are comprised from 2-15 quantum dots. The thickness of each quantum dot layer is 2-10 nm. The thickness of each spacer layer is 15-50 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The layer comprises a material consisting of fluorine-doped tin oxide, indium tin oxide, aluminum doped zinc oxide, gallium doped zinc oxide, cadmium oxide, indium doped cadmium oxide and antimony doped tin oxide. The wide-band gap semiconductor comprises zinc oxide, titanium dioxide, tungsten trioxide, tantalum pentoxide, niobium pentoxide, gallium nitride, strontium titanate, barium titanate, iron titanate, potassium titanate, tin dioxide, bismuth Oxide, iron trioxide, gallium trioxide and bismuth vanadate. The impurity is nickel, cobalt, nitrogen, manganese, iron, sulfur, selenium, carbon, boron, chromium and vanadium. The second impurity is aluminum, gallium and antimony.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Solution: The concentration of the dissolved silicon is 20-40 g/l. Preferred Method: The temperature of texturing solution is maintained at 80-90 degrees C. The method further involves rinsing the silicon wafer in an aqueous solution of hydrochloric acid followed by rinsing it in deionized water. The method is preceded by: cleaning the silicon wafer in acetone followed by rinsing it in deionized water. The cleaning in acetone is followed by cleaning in an alcohol. The cleaning and rinsing are carried out in an ultrasonic cleaner. Preferred Components: The hydroxide is sodium or potassium hydroxide. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The catalyst materials include at least one of gold, gold-containing alloy, platinum, platinum-containing alloy, palladium, palladium-containing alloy, silver, or silver-containing alloy. The magnetic material includes at least one of iron, iron-containing alloy, cobalt, cobalt-containing alloy, nickel, or nickel-containing alloy, and includes at least one of a cobalt-platinum intermetallic compound, iron-platinum intermetallic compound, cobalt-palladium intermetallic compound, samarium-cobalt permanent magnet alloy, neodymium-iron-boron permanent magnet alloy, or ferrite oxide magnet.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The method comprises controlling thermal field in polycrystalline silicon ingot growing furnace, crystallizing liquid layer to form crystal layer to make solid-liquid interface move appropriate distance in direction far away from bottom of container, proceeding to meltback and crystallization, and obtaining polycrystalline silicon ingots. The meltback and crystallization comprises controlling thermal field in polycrystalline silicon ingot growing furnace, conducting meltback to crystal layer to move solid-liquid interface towards direction close to bottom of container, controlling field of polycrystalline silicon ingot growing furnace, and crystallizing liquid layer such that the solid-liquid interface to move towards direction away from bottom of the container towards. The temperature at bottom of base below container is controlled at 1320-1420 degrees C, and the upper part of the container is controlled at 1450-1600 degrees C, and perpendicular temperature gradient in the container is formed. The paving of the seed layer comprises paving whole large single-crystal seed crystal of which size and shape are the same as those of the bottom of the container, or splicing small single-crystal seed crystals, or paving blocky plate blanks cut from polycrystalline silicon main bodies; and the polycrystalline silicon ingot comprising large-size monocrystalline silicon area having crystallographic orientation with seed crystal under monocrystalline silicon area. The seed layer is formed by paving whole blocky plate blank cut from polycrystalline silicon ingot main bodies. The seed crystal comprises at least one monocrystalline silicon of crystallographic orient. Preferred Components: Thickness of seed crystal layer is 10-100 mm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The reaction is performed in presence of (in)organic anion. Preferred Definitions:    Y'=CO.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The photoresist is mixture of a carboxyl group-containing photoresist and an acryl group containing photoresist.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The hardening resin comprises polyorgano silsesquioxane comprising silicone elastomer particles of formula: RSiO3/2, and further comprises photoinitiator (C) and/or thermal radical initiator (D), reactive diluent (E) and/or epoxy compound (F), and titanium oxide (G). The thermosetting resin is carboxyl group-containing thermosetting resin.R=(un)substituted 1-20C monovalent hydrocarbyl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of component (B) is 60 parts mass or more, with respect to 100 parts mass of component (A). The component (B) is of formula (I). The component (C) is diethylene-glycol-monoethyl-ether acetate, dipropylene-glycol monomethyl ether and/or aromatic hydrocarbon.R1-R4=H, methyl or t-butyl.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The component (A) has an aromatic ring. The photosensitive resin composition further contains titanium oxide (F).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises raising the temperature of the mesophase such that the surfactant is present in a disordered state before applying the magnetic field to the mesophase, and controlling the rate of cooling of the mesophase as the surfactant returns to an ordered state while the magnetic field is applied. The nanomaterial is mixed in a solution comprising a dispersing agent before adding the nanomaterial to the mesophase. Preferred Components: The nanomaterial is a single walled carbon nanotube. The partial alignment of the surfactant and nanomaterial is directed by a magnetic field strength of less than 6 Tesla.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The mesophase further comprises a crosslinker and a photoinitiator. The surfactant is DTAB. The photoinitiator is Darocur TPO (RTM: 2,4,6-Trimethylbenzoyl-diphenylphosphine oxide). The dispersing agent is sodium taurodeoxycholate (TDOC). The DTAB is present in an amount of 30-60%. The HEMA is present in an amount of 10-30%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The monomer is polymerized by exposing the mesophase to UV light. The monomer is HEMA. The crosslinker is polyethylene glycol-400 dimethacrylate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent contains acetone, acetonitrile, 2-methoxy propionitrile, N,N-dimethylformamide, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and/or propylene glycol mono butyl ether. The alkoxysilane compound is chosen from methyl trimethoxysilane, phenyl trimethoxysilane, tetramethoxysilane, tridecafluorooctyl trimethoxysilane and/or their oligomers. The hydrolytic condensation catalyst is sulfonic acid compound. The composition further contains water.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The fluoroolefin/vinyl alcohol copolymer includes repeating units of formula: -(CF2CFX1)- (X) and -(CH2CH(OH))- (XI) in molar ratio of 40/60-60/40.X1=fluoro, chloro, trifluoromethyl or -OCaF2a+1;anda=1-3.Preferred Properties: The weight average molecular weight of fluoroolefin/vinyl alcohol copolymer is 50000-1000000. The alternating-copolymerization rate of repeating unit (X) and repeating unit (XI) is 95% or more. Preferred Definitions:    R6=H.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The fluorescent dye is an organic fluorescent substance or a rare-earth-metal complex.    TECHNOLOGY FOCUS - POLYMERS - Preferred Material: The transparent material is transparent resin, preferably transparent vinyl resin. The spherical fluorescent substance is spherical resin particles formed by dissolving or dispersing fluorescent dye in vinyl monomer and performing emulsion polymerization or suspension polymerization.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation (M1) of the compound (I) involves: reacting phenyl derivative of formula (i) with a formaldehyde source in the presence of bromine ions. The reacting compound (i) step involves: reacting phenyl derivative (i) with paraformaldehyde and HBr in acetic acid. The reaction of compound (i) with a formaldehyde source in the presence of bromine ions produces phenyl derivative of formula (ia). The method (M1) further involves: reacting the compound (ia) under acidic or basic hydrolysis conditions to produce the compound (I) (where Y1 is NH2, OH, or -SH); producing the compound (i) by reacting p-anisidine with compound (C(X)3CO)2O. Preparation (M2) of the compound (II) involves: reacting p-xylene derivative of formula (ii) with bromine radicals. The reacting compound (ii) step involves: reacting the compound (ii) with N-bromosuccinimide and a radical initiator; reacting the compound (ii) with N-bromosuccinimide and benzoyl peroxide. The reaction of compound (ii) with bromine radicals produces 1,4-bis-bromomethyl-benzene derivative of formula (iia). The method (M2) further involves: reacting the compound (iia) under acidic or basic hydrolysis conditions to produce the compound (II) (where Y1 is NH2, OH, or -SH).Z1=NH, O, or S. Preferred Definitions:    Y1=NH-C(O)CF3, NH-C(O)CCl3 or NH2;    R1=methyl;    R2=P(O)(OEt)2.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The raw material is carbon nanotube or graphite.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The weight ratio of tetra((3,4)phenoxy)phenyl porphyrin, Phthalocyanine, zinc acetate and dimethyl sulfoxide is 1:1-2:0.1-2, preferably 1:1.5:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicone support substrate contains aluminum-gallium-arsenide or aluminum-gallium-indium-phosphate. The tunnel junction (b3) contains aluminum-gallium-arsenide or aluminum-gallium-indium-phosphate. The gallium indium phosphate-subcell contains gallium-indium-phosphate or aluminum-gallium-indium-phosphate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The gradual transition layers contains aluminum gallium indium arsenide (AlyGa1-x-yInxAs, where x is 0-0.27 and y is 0-0.4) or gallium indium arsenide (Ga1-mInmAs, where m is 0.48-0.78). The tunnel junction (a3) contains aluminum-gallium-arsenide and indium-gallium-phosphide. The tunnel junction (a2) contains gallium-indium-phosphide or indium-gallium-arsenide. The gallium-indium-phosphide subcell contains gallium indium phosphide or aluminum indium phosphide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The germanium sub battery (b2) contains transmission of germanium and aluminum. The tunnel junction (a1) contains indium-gallium-arsenide or aluminum-gallium-arsenide. The tunnel junction (a3) contains gallium-arsenide or aluminum-gallium-indium-phosphide. The gallium-indium-phosphide subcell contains gallium indium phosphide or aluminum gallium indium phosphide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alcohol is anhydrous methanol or anhydrous ethanol. The sulfur source is thiourea or thioacetamide. The inorganic copper salt is copper acetate or copper sulfate.
TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The tank body is a wall of stainless steel pressure-proof tank body, and sprayed with a nylon insulating layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The molecular sieve exhibits a pore diameter of 2-30 nm, and a specific surface area of more than 300 m2/g.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The tank is a stainless steel pressure-resistant tank, and the tank wall comprises a thermal spray of nylon insulation layer. Preferred Method: The industrial clay with a particle diameter of 2 mu m is dispersed in water to form a suspension.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The particle size of the silica sol is 10-20 nm, the density is 1.15 g/cm3, the content of the silicon dioxide is 25%, the pH value is 8-10, and the silica sol is dispersed in water for forming a suspension. The specific surface area of the carbon fiber is more than 700 m2/g.    TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Components: The tank body is a stainless steel pressure-resistant tank body, the inner wall of the tank body is thermally coated with a nylon heat-insulating layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sputtering target contains 0.1-10 wt.% of sulfide of element chosen from hafnium, rhenium, tantalum, tungsten, niobium, zirconium, vanadium, aluminum, indium, tin, gallium, zinc, silicon, germanium, manganese, nickel, iron, cobalt, copper, silver, yttrium, scandium, magnesium and calcium, and remainder of molybdenum sulfide and unavoidable impurities. Preferred Layer: The transistor has semiconductor layer containing molybdenum disulfide as main component and having band gap of 0.5-4.8 eV, and gate insulating film comprising titanium oxide, niobium oxide, tantalum oxide, vanadium oxide, hafnium oxide, aluminum oxide, molybdenum oxide, tungsten oxide, zirconium oxide, silicon oxide, silicon nitride and/or aluminum nitride.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The ceramic product comprises 99 wt.% or more, preferably 99.9 wt.% or more material including 99.5 wt.% or more, preferably more than 99.99 wt.% zinc oxide, less than 100 ppm, preferably less than 5 ppm alumina, titanium oxide, zirconium dioxide, silicon dioxide or spinel. The layer is electrically-conductive, electrically-nonconductive and/or low-conductive layer. Preferred Process: During heat-treatment, the ceramic product is surrounded by atmosphere containing dry or moist protective gas containing helium, argon, neon, krypton, xenon and/or radon, and nitrogen, chlorine and/or fluorine. During preparation of intrinsically-conductive ceramic product, fine-grained graphite semolina is used as oxygen getter. Preferred Property: The layer has transmission of more than 60%, preferably more than 95%.
TECHNOLOGY FOCUS - METALLURGY - The filling material is made of aluminum, copper, and brass.    TECHNOLOGY FOCUS - POLYMERS - The filling material is made of polydimethylsiloxane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The germanium-containing layer comprises crystalline germanium film. The semiconductor material comprises III-V semiconductor, II-VI semiconductor, I-III-VI2 semiconductor and/or II-IV-V2 semiconductor, preferably aluminum-gallium-indium-phosphorus alloy (AlxGayIn1-x-yP), aluminum-gallium-indium-arsenic alloy (AlxGayIn1-x-yAs) and/or aluminum-gallium-nitrogen-phosphorus alloy (AlxGa1-xNyP1-y), zinc-cadmium-sulfur-selenium-tellurium alloy (ZnxCd1-xSySezTe1-y-z), copper-aluminum-gallium-indium-sulfur-selenium alloy (Cu(AlxGayIn1-y)(SzSe1-z)2) or zinc-silicon-germanium-phosphorus alloy (Zn(SixGe1-x)P2), where x-z are 0-1.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The germanium-containing material contains germanium and/or silicon-germanium alloy.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The fluororesin (B) contains (in %mass) copolymer containing vinylidene fluoride units (40-90) and tetrafluoroethylene units (10-60), or copolymer containing vinylidene fluoride units (25-75, preferably 28-70), tetrafluoroethylene units (24-70, preferably 25-69) and hexafluoropropylene units (1-6, preferably 3-6). Preferred Properties: The mass ratio of fluororubber (A) and fluororesin (B) is 60/40-95/5. The area occupation rate of the fluororesin (B) is 5-100%. The fluorine rubber molding product has water-oil repellency on the surface.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic layer contains crosslinked alkylene oxide modified fluorene acrylate (excluding hydroxyl group in a structure). The organic layer and inorganic layer are also in contact with other side of the plastics base material.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The electroconductive film contains silver fiber and conductor chosen from polythiophene, polythiophene derivative, polyaniline and polyaniline derivatives. The photosensitive resin layer contains photopolymerizable compound and photoinitiator having binder polymer and ethylenically unsaturated bond.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The metal oxide layer (70) has layer thickness of 0.5-20 nm, preferably 2-5 nm. Preferred Composition: The metal oxide layer (L2) comprises zinc oxide, gallium oxide, hafnium oxide, silica, silicon gallium oxide or silicon hafnium oxide. The metal oxide layer (70) contains indium oxide or indium gallium oxide. The liquid phases (P1) and (P2) comprise anhydrous organic solvent(s), metal oxide(s) in form of metal oxide particles, and aqueous phase. Preferred Process: The metal oxide precursors (MP1) and (MP2) are obtained from metal alkoxide and/or metal oxo-alkoxide. The metal oxide layers (70) and/or (L2) are formed under oxygen-containing atmosphere, preferably air atmosphere.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic substance is formed by the sol-gel method. The mass ratio of para-orientation aromatic polyamide and precursor of inorganic substance is 1:99-99:1. The film has tolerance with respect to propylene glycol-monomethyl-ether acetate. The inorganic substance contains organic substance, inorganic substance and hydrolyzate of organic metal or organic semimetal. Preferred Properties: The organic-inorganic composite component is in the form of film having average coefficient of thermal expansion of 100-200 degrees C, measured in at least one direction(s) of film at (-20)-20 ppm/ degrees C, light transmittance of 70% or more in 400 nm, and haze of 2% or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Mole ratio of dichloroethane and ethyl chloroacetate is 1-2:1. Phase transfer catalyst is tetrabutyl ammonium bromide. Amount of phase transfer catalyst is 5-20% of the amount of ethyl chloroacetate. Volume ratio of dimethyl sulfoxide and water in mixed solvent is 5:1. Decarboxylation agent is sodium chloride. Mole ratio of decarboxylation reagent and ethyl chloroacetate is 1.2-3:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of nitrogen atom in intrinsic semiconductor layer is more than 2.9x 1017 pieces/cm3 and less than 1.5x 1019 pieces/cm3, preferably 1.6x 1018 pieces/cm3 and less than 5.4x 1018 pieces/cm3. The concentration of oxygen atom in intrinsic semiconductor layer is more than 3x 1017 pieces/cm3 and less than 7.2x 1018 pieces/cm3. Preferred Property: The crystallization rate of intrinsic semiconductor layer is 3.5 or more. Preferred Process: A source gas containing silane, germane and/or nitrogen is introduced during manufacture of photoelectric conversion apparatus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The zinc source is zinc sulfate heptahydrate. The substrate is glass substrate, gallium substrate, silicon substrate or metal substrate. The usage amount of zinc sulfate heptahydrate, hydrazine hydrate and ammonia is 10 ml, 5 ml and 5-7 ml, respectively. The concentration of zinc sulfate, hydrazine hydrate and ammonia is 0.5 mol/L, 80 %mass and 25 %mass, respectively. Preferred Process: The sodium selenothiosulfate solution is prepared by dissolving 5 g selenium powder and 15 g sodium sulfite in 160 ml deionized water, stirring at 75 degrees C for 8 hours, and filtering.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The additive comprises aromatic compound having oxidation potential of 4.6 V or more, preferably cyclohexylbenzene or 4-alkyl cyclohexylbenzene of formula (I). The addition amount of additive is 0.1 %mass or more and 5 %mass or less with respect to content of electrolyte.R=H, or linear, branched or cyclic 1-6C alkyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The acrylic acid ester resin (C) is produced by suspension polymerization method.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Reduction of silica is performed in argon gas, nitrogen gas or helium gas.    TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Composition: The microwave reducing furnace further has microwave window which surrounds circumference of reactor, melting furnace top plate which is supported by microwave window and covers the container (12), such that dispersion of generated gas is prevented, microwave unit arranged on inner surface of peripheral surface which surrounds the container (12) and radiates a microwave beam toward specific point in container (12) through the microwave window, and main reflective mirror arranged on the container (12). The main reflective mirror is a reflective surface of a microwave has paraboloid containing the specific point as a focus point. Preferred Process: The supply portion supplies raw material in container (12) through melting furnace top plate.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The substrate comprises glass, crystal, glass wafer, silicon wafer and/or plastic.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The one-dimension conductivity nanomaterial layer is formed on substrate using one-dimension conductivity nanomaterial solution containing one-dimension conductivity nanomaterial dispersed in solvent. Preferred Composition: The two dimensional nanomaterial is oxidized graphene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The polymeric composition further contains inorganic filler.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The organic strong base salt (C) has dissociation temperature in a DCS measurement of 50 degrees C or more. Preferred Composition: The organic strong base salt (C) is a tertiary amine salt, preferably salt of 1,8-diazabicyclo(5.4.0)undecene-7 or salt of 1,5-diazabicyclo(4.3.0)nonene-5. The isocyanate compound (A) is chosen from phenylene diisocyanate, hexamethylene diisocyanate, heptamethylene diisocyanate, octamethylene diisocyanate, m-xylylene-diisocyanate, tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 2,5-bis(isocyanato methyl)-bicyclo(2.2.1)heptane and 2,6-bis(isocyanato methyl)-bicyclo(2.2.1)heptane.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The copolymer is obtained in presence of an acid and basic compound. The molar ratio of repeating unit based on vinyl ether (II) and repeating unit based on fluoroolefin (I) is 40/60-60/40. The copolymer further includes vinyl ether of formula: CH2=CHOR6 (III). The emulsifier is compound of formula: R7-(CH2)n-COOX2.R6=1-6C primary or secondary alkyl optionally substituted having hydroxy or fluoro, or 6-12C cycloalkyl;n=0-2;R7=1-9C perfluoro alkyl optionally having ether oxygen;andX2=H, NH4 or alkali-metal atom.Preferred Property: The weight average molecular weight of fluoroolefin/vinyl alcohol copolymer is 50000-1000000. Preferred Definitions:    R1=t-butyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Material: The optical imprint material further contains a surfactant and a solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Condition: The isotropic etching is performed under acidic environment. Preferred Composition: Etching solution used during isotropic etching contains 40-90 parts mass, preferably 40-80 parts mass 65% nitric acid, 5-35 parts mass, preferably 20-35 parts mass 49% hydrofluoric acid and 5-35 parts mass, preferably 15-30 parts mass water. Preferred Process: During isotropic etching, 0.03-3 mg, preferably 0.05-2 mg semiconductor wafer material/cm2 is removed from surface. The semiconductor wafer is treated using alkaline solution, preferably alcoholic-aqueous potassium hydroxide solution.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The layer containing (I) is doped. The layer containing (I), comprises at least one doped region and at least one region, which is less doped than the doped region, or is undoped. The layer containing (I) is a hole transport layer or an emitting layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Disclosed): The preparation of (I), comprises reacting secondary amine compounds of formula (Ar1-NH-Ar2) (II) with 4,4''-dibromo-p-terphenyl in presence of bis(dibenzylideneacetone)palladium, tri-tert-butylphosphine and potassium tert-butoxide to obtain (I).Ar1, Ar2 = not defined. Preferred Definitions:    R1 = beta -naphthyl or 1,1'-biphenyl-4-yl;    R2 = CH3, isopropyl, tert-butyl or phenoxy; and    R3 = H or CH3.    SPECIFIC COMPOUNDS - 20 Compounds (I) are specifically claimed e.g. N-(4-methylphenyl)-N-(4-(4-(4-((4-methylphenyl)(naphthalen-1-yl)amino)phenyl)phenyl)phenyl)naphthalen-1-amine of formula (I), N-(4-methylphenyl)-N-(4-(4-(4-((4-methylphenyl)(naphthalen-2-yl)amino)phenyl)phenyl)phenyl)naphthalen-2-amine, N-(4-methylphenyl)-4-(4-(4-((4-methylphenyl)(4-phenylphenyl)amino)phenyl)phenyl)-N-(4-phenylphenyl)aniline, N-(4-(4-(4-(naphthalen-2-yl(4-(propan-2-yl)phenyl)amino)phenyl)phenyl)phenyl)-N-(4-(propan-2-yl)phenyl)naphthalen-2-amine, and N-(4-tert-butylphenyl)-N-(4-(4-(4-((4-tert-butylphenyl)(naphthalen-2-yl)amino)phenyl)phenyl)phenyl)naphthalen-2-amine.    EXAMPLE - Mixture of N-(p-tolyl)-naphthalen-1-amine (3.97 g), 4,4''-dibromo-p-terphenyl (3 g), tri-tert-butylphosphine (47 mg), bis(dibenzylideneacetone)palladium (89 mg) and potassium tert-butoxide (2.6 g) dissolved in toluene (75 ml) were stirred at 80 degrees C for overnight. Then the reaction mixture was worked up to obtain (Ia).
TECHNOLOGY FOCUS - IMAGING AND COMMUNICATION - Preferred Process: The printing is formed by inkjet printing method, screen printing method, relief-printing reverse printing method or gravure offset printing.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The vinyl resin (A) has a crosslinkable functional group chosen from methylol amide group and alkoxy methylamide group. The crosslinking agent (D) is heat-crosslinking agent(s) chosen from melamine-type compound containing heat-crosslinking agents, epoxy-type-compound-containing heat-crosslinking agents, oxazoline compound-containing heat-crosslinking agents, carbodiimide compound-containing heat-crosslinking agents and/or isocyanate compound-containing heat-crosslinking agents. The fluid (A) containing the electroconductive substance is an electroconductive ink containing electroconductive substance or a metal-plating nucleating agent containing electroconductive substance.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The vinyl resin (A) is obtained by polymerizing a vinyl monomer mixture comprising 0.2-15 %mass of vinyl monomers having an acidic radical, 5-60 %mass of (meth)acrylic acid alkylester having 2-12C alkyl and 0.01-80 %mass of methyl methacrylate. The resin composition further comprises crosslinking agent (D). Preferred Process: The crosslinking agent (D) crosslinking-react by heating at 100 degrees C or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The addition amount of the bivalent iron ion with respect to 1 mol of copper ions in the copper-ion containing solution is 0.00001 mol or more. The reducing agent is reducing sugar. The copper powder contains iron (30 ppm or more). Preferred Properties: The average primary particle diameter of cuprous-oxide powder is 0.5 micrometer or less, measured by a scanning electron microscope. The 50-% particle diameter of cuprous-oxide powder is 0.8 micrometer or less, measured by laser-diffraction-type particle size distribution measurement. The BET specific surface area of copper powder is 0.4 m2/g or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred: The inorganic barrier layer contains silica, silicon nitride and/or silicon carbide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Layer: The organic layer is a layer formed using the polymer composition containing silane coupling agent. Preferred Laminate: The barrier laminate is formed by alternately laminating at least two organic layers and at least two inorganic barrier layers.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): The dye of formula: MX3Lt' is synthesized using terpyridine compound (II') as a ligand.Lt'=group (II'). Preferred Definitions:    La=single bond;and    R3=group (iv).    EXAMPLE - Ethyl 2-(5-bromopyridin-2-yl)-6-(4-(ethoxycarbonyl)pyridin-2-yl)pyridine-4-carboxylate (in g) (1.5), 2-(4-hexylphenyl)-4,4,5,5-tetramethyl-1,3,2-dioxaborolane (0.95), tetrakis triphenylphosphine palladium (110 mg), potassium carbonate (0.69), water (2.8 ml), toluene (3 ml) and tetrahydrofuran (5 ml) were mixed, heated and refluxed for 12 hours. The resulting compound (0.56) and ruthenium chloride were mixed and heated in ethanol for 3 hours. The mixture was stirred at 130 degrees C for 4 hours. Ammonium thiocyanate (1.87) and mixed solvent of dimethyl formamide and water were added. Triethylamine (13.2) was added and stirred at 130 degrees C for 24 hours. Tetrabutyl ammonium thiocyanate (0.25) was added, and stirred to obtain dye (536 mg) at yield of 72%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The indium phosphide solution is manufactured using indium phosphide/zinc sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Silicon material is single crystal silicon material, multi-crystal silicon material, or non-crystal silicon material. A layer of heat conducting block is provided at the bottom of the crucible. Heat-conducting block is silicon block or graphite block, which is 1-2 cm thick. Preferred Parameters: Size of silicon material is 0.1-10 cm, and thickness is 0.5-5 cm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The photovoltaic coating is cadmium telluride or cadmium sulfide.    TECHNOLOGY FOCUS - METALLURGY - The conductive material in the hole comprises metal or metal alloy, which is nickel or zinc.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The particle is an oxide containing yttrium by which europium is activated.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The second wavelength conversion layer is organic fluorescent dye or organic fluorescent complex. The flat inorganic oxide fluorescence fine particle is orientating to surface direction.
TECHNOLOGY FOCUS - POLYMERS - The plastic substrate is made of acryl, polyethylene, polypropylene, polyimide, parylene, polyethylene naphthalene (PEN), polyether sulfone (PES), polyethylene terephthalate (PET), polycarbonate, polyester, polyurethane, polystyrene, polyacetyl or mylar. The sacrificial layer includes polyvinylbutyral (PVB), polyethylene (PE), acryl resin, carbon nano-tube (CNT) or epoxy resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of hydrogen peroxide solution is 25-50% with respect to hydrochloric acid. Preferred Process: Manufacture of solar cell further involves immersing silicon substrate having porous layer in an aqueous solution containing hydrofluoric acid and nitric acid, etching, and immersing in alkali chemical solution and further etching.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The active material contains graphite.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of alkyl modified vinyl alcohol type polymer is 0.5-7 mass%.
TECHNOLOGY FOCUS - POLYMERS - The first polymer block component is selected from one among polystyrene component, polyisoprene component, and polybutadiene component, and the second polymer block component is selected from one among polymethylmethacrylate component, polyethylene-oxide component, polyvinyl-pyridine component, and polyacrylic acid component. The first inorganic precursor is selected from one among phenyl group, long-chain hydrocarbon chain, cyclooctatetraene ring, cyclopentadienyl ring, and amino groups. The second inorganic precursor is selected from one among acetylacetonate complex of C1-C4 alkoxide and metal, and semimetal containing salt of metal or semimetal.
TECHNOLOGY FOCUS - METALLURGY - The target material comprises a titanium (Ti), tantalum (Ta), tungsten (W), or aluminum (Al) and the backside gas comprises argon (Ar).
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: The respective edges of the microcracks and fissures are equivalent in their height to the thickness of the glass film after bonding. The first and second surfaces of the glass film comprise a fire-polished surface. The glass film has a thickness of not greater than 200 mu m, preferably not greater than 15 mu m. The glass film has an alkali metal oxide content of not greater than 2 wt.%, preferably not greater than 0.03 wt.%. The adhesive has a viscosity of 0.5-600 mPas, preferably 1-80 mPas. Preferred Composition: The glass film comprises a glass (2) comprising (in wt.%, based on oxide) silicon dioxide (40-75, preferably 45-70), aluminum oxide (1-25, preferably 5-25), boron trioxide (0-16), alkaline earth oxides (0-30) and alkali oxides (0-2, preferably 0-1). Preferred Method: The edges are produced before wetting with the adhesive by mechanical scribing and/or by treatment with a laser beam with subsequent targeted cooling produces a voltage in the glass film along a predetermined break line and then the glass is broken along the breaking line. The adhesive is cured by ultraviolet radiation or by a thermal treatment.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The adhesive comprises an acrylate, preferably an UV-acrylate or a cyanoacrylate. The adhesive comprises an epoxy resin, preferably an UV-curing epoxy resin. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of zirconium dioxide and boron trioxide is preferably 3.1-8 %mass and 0-0.5 %mass. The molar fraction of alumina and barium oxide is 0.1-2. The molar fraction of sodium oxide and potassium oxide is 0-2. Preferred Properties: The glass substrate have liquid temperature of 1200 degrees C or less, liquid phase viscosity of 104.5 dPa.second or more, density of 3.7 g/cm3 or less, strain point of 590 degrees C or more, and temperature at high-temperature viscosity of 102.5dPa.second of 1650 degrees C or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method involves processing fibrous carbon slurry by mechanical and/or chemical process. The mechanical process uses bead mill, vibration mill, ball mill, lot mill, disc mill, or mixer. The chemical process is dispersing agent process and/or acid treatment. The non-fibrous carbon is acetylene black. The diameter of fibrous carbon is 200 nm or less. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The platinum skin comprises three or less atomic layers of platinum. Preferred Method: The step of depleting a surface of the platinum-nickel nanoparticle is achieved by exposing the platinum-nickel nanoparticle to an acidic environment. The acidic environment comprises a pH of at least 1. The step of exposing the platinum-nickel nanoparticle to the acidic environment is performed before the step of annealing the platinum-nickel nanoparticle. The step of annealing is conducted at approximately 400 degrees C for at least 30 minutes. The method-1 further comprises the step of incorporating the platinum-nickel nanoparticle on high surface area carbon by colloidal deposition, where the incorporation of the platinum-nickel nanoparticle on high surface area carbon comprises an electrocatalyst. The synthesizing step further comprises heating the platinum-nickel nanoparticle to remove organic surfactants.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The smoothing layer further comprises zinc oxide:aluminum having a thickness of less than or equal to 100 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The carbon support material loses 20% or less of its mass in an accelerated test which is performed at 80 degrees C for 24 hours under potential of 1.2 V. The carbon support material has a specific corrosion rate of less than 65%. The primary metal is chosen from platinum group metals (such as platinum, palladium, rhodium, ruthenium, iridium and osmium), gold/silver, or a base metal or their oxide. The primary metal has a gas phase metal area of at least 30 m2/g. The loading of primary metal particles on the carbon support material is 5-95 wt.%.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The primary and secondary monomers contain fluoromonomer. The secondary monomer is free of non-fluorine non-crosslinkable monomer. The primary polymer further contains non-fluorine crosslinkable monomer in addition to fluoromonomer. The secondary polymer contains only halogenated olefin monomer or mixture of halogenated olefin monomer and fluoromonomer and/or non-fluorine crosslinkable monomer. The fluoromonomer is of formula: CH2=C(-X)-C(=O)-Y'-Z-Rf.X=H, 1-21C linear or branched alkyl, fluoro, chloro, bromo, iodo, CFX1X2, cyano, 1-21C fluoroalkyl, optionally substituted benzyl or optionally substituted phenyl;X1,X2=H, fluoro, chloro, bromo or iodo;Y'=-O- or -NH-;Z=1-10C aliphatic group, 6-18C aromatic group, cycloaliphatic group, -CH2CH2NR1SO2, -CH2CH(OZ1)CH2 or -(CH2)m-SO2-(CH2)n-;R1=1-4C alkyl;Z1=H or acetyl;n=1-10;andRf=1-20C linear or branched fluoroalkyl.The fluoromonomer has 6C or less fluoroalkyl. The halogenated olefin monomer is 2-20C olefin substituted by chloro, bromo or iodo, and is preferably vinyl chloride, vinyl bromide, vinyl iodide, vinylidene chloride, vinylidene bromide or vinylidene iodide. The non-fluorine non-crosslinkable monomer is of formula: CH2=CA-T or CH2=CA1COOA2. The non-fluorine crosslinkable monomer is a compound does not containing fluorine and having two or more reactive groups and/or carbon-carbon double bond.A,A1=H, methyl or halo excluding fluoro;T=H, 1-30C hydrocarbyl or 1-20C organic group having ester bond;A2=alkyl of formula: CnH2n+1;andm=1-30.Preferred Method: The polymerization of secondary polymer is carried out during or after completion of polymerization of primary polymer. The polymerization of secondary polymer is started after the completion of polymerization of primary monomer by 10% or more, preferably 70% or more. The water and oil repellent contains an aqueous medium, and is aqueous dispersion liquid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The ceramic material of the first solid phase includes alumina. The conductive materials include graphene, and carbon and graphitic nanostructures including nanofibers, nanotubes and nanoribbons. The non-conductive material includes ceramic fibers, zirconia fibers, alumina fibers, alumino-silica fibers, alumino-borosilicate fibers, ceramic nanostructures, and silicon carbide fibers. The ceramic fibers include ceramic nanostructures and silicon carbide fibers. The methanol reforming catalyst contains copper and zinc oxide.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The continuous mixer comprises an extruder.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The second peroxide curing agent is provided in an amount of less than 0.1 phr or greater than 0.01 parts per hundred (phr), preferably 0.05-0.3 phr. The first peroxide curing agent is provided in an amount of 0.1-3 (preferably 0.1) phr. The first or second peroxide curing agent comprises 2,5 dimethyl-2,5-di-(tert-butylperoxy)hexyne-3, di-tert-butyl peroxide, 2,5-dimethyl-2, 5-di(tert-butylperoxy)hexane, tert-butyl cumyl peroxide, di-(2-tert-butylperoxy isopropyl)benzene, dicumyl peroxide, butyl 4,4-di-(tert-butylperoxy) valerate, 1,1-di-(tert-butylperoxy)-3,3,5-trimethylcyclohexane, tert-butyl peroxybenzoate, tert-butyl peroxy 3,5,5-trimethylhexanoate, dibenzyl peroxide, di(4-methylbenzoyl) peroxide, and/or di-2,4-dichlorobenzoyl peroxide. The carboxylic acid derivative comprises maleic anhydride, chloromaleic anhydride, itaconic anhydride, or hemic anhydride.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: In the step (e), the curing system comprises a first peroxide curing agent, where mixing in the second stage is conducted at a temperature of 100-260 degrees C. The process further comprises mixing a second peroxide curing agent with the thermoplastic resin, the elastomer and the carboxylic acid derivative in the first stage at a temperature of 100-260 degrees C. Preferred Components: The thermoplastic resin comprises a polyamide. The isomonoolefin monomer comprises isobutene and the multiolefin monomer comprises isoprene (at least 5 (preferably at least 7) mole%).The elastomer is provided in a palletized form. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Resin: The acrylic resin is obtained by polymerizing silicone of formula: R1-Si(-R2)(-R2)-O-(Si(-R2)(-R2)-O)-Si(-R2)(-R2)-R1.R1=1-10C alkyl, amino, hydroxy, methoxy, ethoxy, 1-10C alkylamino, 1-10C aminoalkyl, 1-10C hydroxyalkyl, 1-10C alkoxy, 1-10C methoxyalkyl, 1-10C ethoxy alkyl, 1-10C alkyl methacrylate or 1-10C alkyl acrylate;R2=methyl, phenyl or ethyl;andR3=1-10C alkyl methacrylate or 1-10C alkyl acrylate.The number of groups of formula: -(Si(R2)2-O)- is 3-1000.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Material: The base material contains inorganic glass, fluoride, oxide or organic flexible plastics.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: Bus tape is fixed on solar energy set barium zirconium oxide film by fixing bus bar on an ultrasonic die head, installing amorphous silicon thin-film solar module on a horizontal transmission device having ultrasonic die head controlled at 0.01-0.5 MPa and speed of 0.01-1 m/second, forming barium zirconium oxide film layer on zinc oxide crystal lattice at an ultrasonic frequency of 20-60 kHz and power of 100-5000 W, forming a gap between the crystal lattice, and tampering the gap of the crystal lattice under a certain pressure and speed while preventing damage due to ultrasonic vibration. Preferred Components: The zirconium oxide film has a thickness of 1100-2500 nm. The amorphous silicon thin-film solar module comprises amorphous silicon, amorphous silicon/amorphous silicon, amorphous silicon/amorphous silicon-germanium, amorphous silicon/amorphous silicon-germanium, amorphous silicon-germanium, amorphous silicon/microcrystalline silicon, amorphous silicon/microcrystalline silicon/microcrystalline silicon, cadmium sulfide, cadmium telluride, copper indium tin oxide, copper indium sulfate, and/or copper indium gallium tin. The bus bar is tin silver coated alloy aluminum strip.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic acid or inorganic base is Broensted acid or base.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic itinerant magnet compound has an ammonium portion in which a hydrogen bond is formed. The organic itinerant magnet compound is ammonium salt of tetrathiafulvalene 2-carboxylic acid. The organic itinerant magnet compound has pseudo closed-shell arrangement, and bonds which are protonated in an electronic donor molecule or an electronic acceptor molecule. Preferred Process: The organic itinerant magnet compound is obtained by inducing a bicyclopentylidene compound having tetrathiafulvalene analog portion in its skeleton and a proton-acid functional group to a salt with ammonia, or a salt with a hydroxy amine. During salt formation, 0.1% or more of radical species are generated. Preferred Compounds: The bicyclopentylidene compound is of formula (I), (II), (III), (IV), (V), (VI), (VII), (VIII), (IX), (X), (XI), (XII) or (XIII). The proton-acid functional group is primary amine. The salt is inorganic acid salt.X1-X4=S or Se;R1=-COO-.NH4+, -COO-.NH3OH+, -CH(-CH3)-NH3+.BF4-, -CH(-CH3)-NH3+.Br-, -CH(-CH3)-NH3+.I-, -CH(-CH2CH3)-NH3+.BF4-,-CH(-CH2CH3)-NH3+.Br-, -CH(-CH2CH3)-NH3+.I-, -CH(-CH2CH3)(-CH3)-NH3+.BF4-, -CH(-CH2CH3)(-CH3)-NH3+.Br-, or -CH(-CH2CH3)(-CH3)-NH3+.I-;n,q=5-10;m=3-8;p=7-12;andX5-X8,R2-R8=not defined.N.B: X5-X8 and R2-R8 are not defined. Preferred Composition: The bicyclopentylidene compound is 1-(2,2'-bi-1,3-benzodithiol-5-yl)ethanamine borontetrafluoride, 1-(2,2'-bi-1,3-benzodithiol-5-yl)ethanamine bromide, 4-methyl-2,2'-bi-1,3-dithiole ammonium compound, or 4-methyl-2,2'-bi-1,3-dithiole ammonium hydroxide. The organic molecule is organic compound having molecular weight of 20000 or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of the copper-zinc-tin-sulfur-selenium film is 1500-2500 nm. Preferred Composition: The molar ratio of sulfur to selenium in light incidence surface is 2:3-1:1. The molar ratio of sulfur to selenium in backlight surface is 3:2.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): A 2-benzoylphenol compound of formula (II) is melted in an organic solvent, and reacted with carbonyl group-containing compound of formula: R3-CH2-C(=O)-O-C(=O)-CH2-R3 (III) or chlorine-containing compound of formula: R3-CH2-C(=O)-Cl (IV), in presence of base, to obtain 4-aryl coumarin derivative compound (I). Preferred Composition: The base is 1,8-diazabicyclo(5.4.0)-undec-7-ene, 1 1,5-diazabicyclo-(4.3.0)non-5-ene, 1,4-diazabicyclo(2.2.2)octane, triethylamine or pyridine. Preferred Definitions:    R1,R2=H, methyl, ethyl, fluoro, bromo or chloro;and    R3=H, methyl, ethyl, butyl, phenyl, benzyl, methoxy carbonyl or ethoxy carbonyl.    ACTIVITY - Uropathic. No biological data given.    MECHANISM OF ACTION - None given.    SPECIFIC COMPOUNDS - 21 4-Aryl coumarin derivative compounds are specifically claimed e.g. 4-phenyl coumarin of formula (I-a), 4-phenyl-6-methyl coumarine, 4-phenyl-6-bromocoumarin, 4-(4-methyl phenyl)-7-bromocoumarin and 4-(4-chlorophenyl)-6-fluorocoumarin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The precipitator comprises iron hydroxide, aluminum hydroxide, and hydrate manganese dioxide. The surfactant comprises stearic acid and sodium dodecylbenzenesulfonate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Material: The base material sheet is P-type and the amorphous silicon layer is N-type layer. The transparent conductive oxide film is indium tin oxide film.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: In the method, the distance between the hot wire and the monocrystalline silicon wafer surface is 4-6 cm; the P-type boron-doped silicon thin film energy band width is 1.16-1.25 eV, the electric conductivity is 0.008-0.05 S/cm, and the conductivity activation energy is 0.0.08-2 eV.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The carbon source is ethanol. The nitrogen source is pyridine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The silica sol has grain diameter of 10-20 nm, density of 1.15 g/cm3 and pH of 8-10. Preferred Components: The pot is stainless steel pressure-proof pot, and the inner wall of the pot is coated by nylon insulating layer. Preferred Composition: The activated carbon is carbon fiber having specific surface area of more than 700 m2/g. The content of silicon dioxide in the silica sol is 25% and silica sol is dispersed in water to form suspension.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The industrial ball clay with a particle size of less than 2 mu m is dispersed in water to form a suspension. Preferred Components: The carbon fiber exhibits a specific surface area of more than 700 m2/g.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The tank is a stainless steel pressure-resistant tank, and the tank wall has a thermal spraying of nylon insulation layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The diameter of the molecular sieve is 2-50 nm with a specific surface area of more than 300 m2/g. The diameter of the industrial clay ball is less than 2 microns. The clay ball is diffused in the suspension of water. The tank is a stainless steel pressure resistant tank. An inner wall of the tank has polyamide insulating layer.
TECHNOLOGY FOCUS - METALLURGY - The intrinsic I-type layer of the upper sub-cell is formed as an amorphous silicon layer that is alloyed with germanium, and consists of microcrystalline germanium or amorphous germanium or amorphous silicon germanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: (In %mass of an oxide basis) silicon oxide (50-80), aluminum oxide (5-25, preferably 12-30), boric acid (0.1-20), manganese oxide (0-15, preferably 1-6), calcium oxide (3-15), strontium oxide (0-15), barium oxide (0-15, preferably 0-10), RO (0-25) (where RO is total amount of manganese oxide, calcium oxide, strontium oxide and barium oxide), zinc oxide (0-10), zirconium oxide (0-10, preferably 0-7), potassium oxide (0-10), sodium oxide (0-5), titanium oxide (0-8), phosphorus pentaoxide (0-10) and tin oxide (0.01-1.5) and does not contain an alkali metal, are used, during the manufacture of silicate glass.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The protective film is formed by spraying sulfurous acid gas.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal conductive fiber is silver nanowire. The electroconductive layer contains conductive region and non-conductive region. Preferred Property: The surface resistance of electroconductive layer is 1000 or less (~o)/square.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The monosaccharide and its derivative is oxide of monosaccharide. The monosaccharide is glucose.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: A glass substrate comprises (in mole%) silica (62-73), alumina (1.5-7), boron trioxide (0-1), magnesium oxide (9-12.5), calcium oxide (1.5-6.5), strontium oxide (0-3), barium oxide (less than 2.5), zirconium oxide (0.5-3), sodium oxide (1-7.5) and potassium oxide (2-10) as matrix composition. The total content of magnesium oxide, calcium oxide, strontium oxide and barium oxide is 11-22 mole%. The total content of sodium oxide and potassium oxide is 6-13 mole%. The ratio of magnesium oxide content to alumina content is 1.4 or more. The ratio of total content of sodium oxide, potassium oxide, strontium oxide and barium oxide to total content of alumina and zirconium is 0.5-3. The ratio of sodium oxide content to potassium oxide content is 0.4-1.5. The content of alumina satisfies the relation: aluminum content greater than or equal to (-0.94x magnesium content)+12. The content of calcium oxide greater than or equal to (-0.48x magnesium content)+7. The glass substrate has glass transition temperature of 645 degrees C or more, average thermal expansion coefficient of 70x 10-7-85x -7/ degrees C at 50-350 degrees C and density of 2.6 g/cm3 or less. The viscosity of glass substrate at 1220 degrees C or less and 1630 degrees C or less is 104 dPa.second and 102 dPa.second, respectively. The difference of temperatures when viscosity reaches 104 dPa.second and 102 dPa.second is -20 degrees C or more. The content of iron as iron oxide is 0.06 parts mass or less with respect to 100 parts mass of matrix composition. The ratio of magnesium oxide content with respect to total content of magnesium oxide, calcium oxide, strontium oxide and barium oxide is more than 0.4.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The lithium-ion electrolyte sheet is chosen from lithium metal phosphate (LMP) electrolyte sheet, or lithium aluminum titanium phosphate (LATP) electrolyte sheet (preferably LATP electrolyte sheet). The ablative laser comprises Nd:YVO4 laser.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The elastomeric material is polydimethylsiloxanes.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal catalyst is vanadium, molybdenum, iron, nickel, cobalt, palladium, platinum, rhodium, ruthenium and/or tungsten. The oxygen ion conductivity oxide is high-temperature-oxygen ion-conductive oxide which is capable of conducting oxygen ion at high temperature of 500 degrees C or more. Preferred Process: Manufacture of carbon nanofiber structure involves heating the carbon nanofiber formation structure at 500 degrees C or more. Gas containing oxygen molecule is supplied from the surface on the opposite side to the metal catalyst with respect to base material of carbon nanofiber formation structure.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The base material contains oxygen ion conductivity oxide. The metal catalyst is vanadium, molybdenum, iron, nickel, cobalt, palladium, platinum, rhodium, ruthenium and/or tungsten. The oxygen ion conductivity oxide is high-temperature-oxygen ion-conductive oxide which is capable of conducting oxygen ion at high temperature of 500 degrees C or more. Preferred Process: Manufacture of carbon nanofiber structure involves heating the carbon nanofiber formation structure at 500 degrees C or more. Gas containing oxygen molecule is supplied from the surface on the opposite side to the metal catalyst with respect to base material of carbon nanofiber formation structure. Preferred Property: The thickness of at least one portion of metal oxide layer is 1-8 nm. Preferred Structure: The carbon nanofiber formation structure has several thin portions provided so that a portion of metal oxide layer optionally has thickness of 0.5-10 nm, and it mutually space apart, and thick portions which has thickness of more than 10 nm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The catalyst material is activated carbon black, acetylene black, and/or carbon nanotube. The prepared electrochemical oxygen reduction catalyst of controllable crystalline form is oxide of manganese. The environment of the hydrothermal reaction is hydrochloric acid, sulfuric acid or nitric acid solution to form acid environment, or formed to be dilute solution of sodium hydroxide or potassium hydroxide alkaline environment.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ink composition (c1) comprises the lithium salt in an amount of up to 5 wt.%; the high boiling point solvent in an amount of up to 30 wt.%; and the conductive polymer in an amount of 30-99 wt.%. The composition (c1) comprises carbon nanotubes in an amount of up to 30 wt.%. The ink composition (c2) comprises the carbon nanotubes in an amount of 5-99 wt.%. Preferred Components: The lithium salt is an alkali metal salt (preferably lithium perchlorate). The carbon nanotubes are selected from single-walled carbon nanotubes, and/or multi-walled carbon nanotubes.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The high boiling point solvent is selected from N-methylpyrrolidone, dimethylsulfoxide, dimethylformamide, and/or polyol. The polyol is selected from sorbitol, ethylene glycol, and propylene glycol. The transparent carrier is selected from an aqueous medium and an organic solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The conductive polymer is selected from the group consisting of polyacetylenes, polyanilines, polypyrroles, polythiophenes, polyphenylenes, poly(3,4-ethylenedioxythiophene), poly(p-phenylene vinylene), and their copolymers or dispersions (preferably a dispersion of poly(3,4-ethylenedioxythiophene) and poly(styrene sulfonate)). Preferred Method: The depositing step involves brushing, spin-coating, gravure coating, spray coating, printing, or ink jet printing. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Insulation layer is made from native oxide, thermal oxide, and aluminium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The etching stop layers are formed of aluminum arsenide, gallium arsenide and indium gallium phosphide. The contact layer is formed of gallium arsenide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The etching stop layers are etched using hydrofluoric acid, citric acid and hydrochloric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The dopant comprises a group V element, and the material comprises boron or a boron based compound.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: The method (M1) further comprises processing the workpiece after the implanting step, where the processing step does not include removing or cutting the edge. The workpiece is processed to form a solar cell. Preferred Components: The component comprises a cladding (310) around the workpiece. The first species has an opposite conductivity of the second species. In the method (M2) a component made of a material containing the first species is located near the workpiece. The second species is implanted using an ion implanter, and the first species is created when the second species strikes the component. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass plate preferably comprises silica (69-74), alumina (0.3-2.3), calcium oxide (3-12), magnesium oxide (1-10), sodium oxide (7-17), potassium oxide (1-4.5), strontium oxide (0.1-0.8), barium oxide (0.1-0.8), and total iron (0-0.05). The total content of potassium oxide, strontium oxide, and barium oxide is 1.5-6 %mass.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electrolyte comprises scandium-doped barium-cerium-zirconium-yttrium alloy of formula: BaZr0.1Ce0.7Y0.1Sc0.1O3-d. The composite solid electrolyte has scandium-doped proton-type electrolyte structure. The proton-type electrolyte is chosen from yttrium-doped barium zirconate, yttrium-doped barium zirconate cerate, yttrium-doped barium cerate and yttrium-and-ytterbium-doped barium zirconate cerate. Preferred Property: The electrolyte has ionic conductivity of 0.05 S/cm or more in wet hydrogen at 600 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In preparing the homologous phase BZCYYb, step (a) further comprises mixing stoichiometric amounts of nickel oxide (NiO) or lanthanum strontium cobalt ferrite (LSCF) to the mixture. The mixing is done in ethanol. The mixing step is carried out by ball milling in ethanol. The calcining step is carried out at approximately 1100 degrees C in air for approximately 10 hours. The average diameter of the zirconium oxide powder is between 50 nm and 200 nm, and the average diameter of the cerium oxide powder is 1-20 mu m. Preferred Material: In the BZCYYb electrolyte material, the BZCYYb has a single-phase perovskite structure. The BZCYYb has an ionic conductivity of about 0.03 S.cm-1 at about 600 degrees C, and about 0.09 S.cm-1 at about 800 degrees C.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The water-binding layer is arranged: between the cover substrate and the adhesive layer; between the adhesive layer and the layer structure which forms the solar cells; or between two adhesive layers connecting the two substrates together. The water-binding layer forms: a continuous layer; or a discontinuous, preferably powdery layer. The water-binding layer is made of: a gaseous or liquid phase; or a solid phase, and is present in powdery form. Preferred Method: The water-binding layer is applied: on top substrate; on the layer structure forming the solar cells, which are connected with each other in series; or on at least one laminating film, which forms the adhesive layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate comprises silicon, the first doped region comprises n-type dopants for silicon, and the second doped region comprises p-type dopants for silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The first layer comprises Ta, TaN, WN, TaSi, TaSiN, WSiN, MoSiN, WBN, TiZrN, BaZrN2, TiN, TiOx, CrOx, AlOx, and SiOxNy (where x and y are not defined). The bulk current transport layer comprises one of Al, Cu, Mo, W, Ta, Nb, Cr, Ti, Ni, stainless steel, and transparent conductive oxide materials. The ohmic contact layer comprises one of Mo, MoS2, MoSe2, and ZnSnO3. The optical reflector layer comprises one of Ag, Al, Cu, TiN, or transparent conductive oxide materials. The diffusion barrier layers including optical reflector layer comprises one of TaN, WN, TaSi, TaSiN, WSiN, MoSiN, WBN, TiZrN, BaZrN2, TiN, TiOx', CrOx', AlOx', SiOx'Ny', SnO2, TiN, or transparent conductive oxide materials (where x' and y' are not defined). The diffusion barrier layer between bulk current transport layer and ohmic contact layer comprises one of Ta, TaN, WN, TaSi, TaSiN, WSiN, MoSiN, WBN, TiZrN, BaZrN2, or TiN.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The HF and HNO3 mixed solution is 5-10 mass%, and mixing proportion is 5:2. The processing time in mixing solution of HF and HNO3 is 10 minutes. The KOH solution is 3-8 mass%, and processing time is 5 minutes.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The electrically active impurities are chosen from phosphorus, boron, arsenic, antimony and gallium nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The concentrated ammonia aqueous solution is added so that pH of the acid ammonia aqueous solution of nitrate formation dysfunction metal and metal which can be nitrate, is adjusted to 8.5 or more. The ammonia aqueous solution of nitrate formation dysfunction metal and acid aqueous solution of metal which can be nitrated are mixed to form acid ammonia aqueous solution of nitrate formation dysfunction metal and metal which can be nitrated. When mixing ammonia aqueous solution of nitrate formation dysfunction metal, and acid aqueous solution of metal which can be nitrated, a diluted nitric acid is added. The oxide of nitrate formation dysfunction metal is dissolved in ammonia aqueous solution, and ammonia aqueous solution of nitrate formation dysfunction metal is created. The oxide of metal which can be nitrated is dissolved in diluted nitric acid, and the acid aqueous solution of metal which can be nitrate is created. Nitrate of metal which can be nitrated is dissolved in aqueous solution, and acid aqueous solution of metal which can be nitrated is formed. The deposit is filtered, cleaned and dried, during manufacture of oxide of germanium or metal which can be nitrated. The deposit is heated at the heating temperature of less than crystallization temperature to form an amorphous component, during manufacturing of oxide of germanium or metal which can be nitrated. The deposit is heated with the heating temperature of more than crystallization temperature to form polycrystals. Preferred Composition: The metal that can be nitrated, is beryllium, magnesium, calcium, strontium, barium, scandium, yttrium, lanthanum, zirconium, hafnium, manganese, iron, cobalt, nickel, copper, zinc, cadmium, aluminum, indium or bismuth. The metal that can be nitrated, contains another metal(s).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The coating volume of carbon material with respect to 100 %mass high electric potential lithium containing compound is 1-8 %mass The high electric potential lithium containing compound is lithium-nickel-manganese oxide (LiNi0.5Mn1.5O4). The carbon material is acetylene black having average particle diameter of 30-40 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - A sputtering gas is selected from any one type of gas or two or multiple types of mixed gas among argon, helium, neon, krypton and xenon. A cation is injected into the metal oxide film, where the cation is provided as argon ion, helium ion, neon ion, krypton ion, xenon ion, hydrogen ion or nitrogen ion. A tin doped indium oxide, zinc doped indium oxide, aluminum-doped indium oxide, gallium doped zinc oxide, zinc oxide, tin oxide, indium oxide, a titanium oxide, a tungsten oxide, tantalum oxide and molybdenum oxide are utilized in manufacturing of transparent conductive film.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The fluorine-containing polymeric porous body is a porous film which consists of fluorine-containing polymeric material or a nonwoven fabric ( less than or equal to 10 mu m average fiber diameter). The fluorine-containing polymeric material is perfluorocarbon type-polymer material containing ionic group. The fluorine-containing polymeric material contains polytetrafluoroethylene frame. The aromatic hydrocarbon type material has ionic group ( greater than or equal to 2 mmol/g). The aromatic hydrocarbon type polymeric material containing ionic group is chosen from polyether ketone, polyetheretherketone, polyether sulfone and polyphenylene sulfide. The fluorine-containing polymeric precursor material is material which contains polyvinylidene fluoride. Preferred Process: The nonwoven fabric with average fiber diameter of less than or equal to 10 mu m is manufactured by dissolving fluorine-containing polymeric precursor material in solvent, carrying out electrospinning of fluorine-containing polymeric precursor material solution, collecting fiber which carries out electrospinning and uses as fluorine-containing polymeric precursor material nonwoven fabric, and making gas containing fluorine-containing polymeric precursor material nonwoven fabric and fluorine gas to contact.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The phosphorus source is phosphorus oxychloride, phosphorus tribromide or phosphorus pentoxide. The silicon substrate is pre-cleaned to remove the damage layer. The reagent used for pre-cleaning is hydrofluoric acid, hydrogen peroxide, hydrochloric acid or iron. The content of reagent is 10-40 %mass. The phosphorus diffusion layer is removed using chemical solution. The chemical solution is mixed aqueous solution of nitric acid and hydrofluoric acid. The content of nitric acid and hydrofluoric acid is each of 10-40 %mass, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred components: The n-type crystalline silicon substrate is n-125 monocrystalline silicon wafer or n-156 polycrystalline silicon wafer. Preferred Properties: The n-type crystalline silicon substrate has thickness of 180-250 mu m, and resistivity of 0.1-100 Omega .cm. The thickness of silicon nitride protective layer is 20-1000 nm. Preferred Process: The boron-doped amorphous silicon layer is removed by dry etching or wet etching. The wet etching is carried out using wet etching solution chosen from hydrofluoric acid solution, nitric acid solution and potassium hydroxide solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The carbon base material is one or more of active carbon, carbon nanotube or graphene. Mass ratio of the carbon base material to the potassium permanganate is 80:(0.5-8). The water is de-ionized having water resistivity of not less than 18.2M Omega .cm. The active material precursor is noble metal ion, preferably molybdenum ion, gold ion, ruthenium ion or silver ion. Mass ratio of the catalyst carrier and the active material precursor is 1: 1-10. Preferred Method: The redox reaction time is 1-10 hours. The carbon-based catalyst carrier and active material precursor solution are mixed to obtain mixed solution, and then added into reducing agent.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The molar ratio of compound (A) and compound (B) is 1:1. The catalyst is organopalladium or mixture of organopalladium compound and organic phosphorus ligand. The organopalladium compound is chosen from bis(triphenylphosphine) palladium(II) chloride, tetrakis(triphenylphosphine)palladium and palladium acetate. The organic phosphorus ligand is tris(2-methylphenyl)phosphine. The molar ratio of the organopalladium and compound (A) is 1:20-1:100. The organic solvent is chosen from toluene, N,N- dimethyl formamide and tetrahydrofuran.    TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): Triphenylamine compound of formula (A) and difluorobenzotriazole compound of formula (B) are subjected to Heck coupling reaction under oxygen-free environment in organic solvent in presence of catalyst70-130 degrees C for 24-96 hours, and purifying, to obtain amine-containing difluorobenzotriazolyl polymer. Preferred Definitions:    n=30-40.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The polystyrene sulfonate copolymer has weight average molecular weight of 2000-200000, measured by gel permeation chromatography.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Method: The desulfurization and dust collection process are carried out at 450-600 degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The compound (B) has mean molecular weight of 2000 or less. The polyhedral structure polysiloxane modified component (A) has 3 or more hydrosilyl groups, and is liquefied at 20 degrees C. The compound (b) having hydrosilyl group is a cyclosiloxane containing hydrosilyl group or linear siloxane having hydrosilyl group in molecule terminal. The polysiloxane-type compound (a) is an alkenyl group-containing polyhedral structure polysiloxane-type compound having siloxane unit of formula: (AR12SiO-SiO3/2)a(R23SiO-SiO3/2)b. Excessive amount of compound (b) is added to polysiloxane compound (a) such that number of hydrogen atoms coupled directly to silicon atom per alkenyl group is 2.5-20, and modified. The compound (b) having unreacted groups is then removed by distillation. The modified component (A) has compositional formula: (XR32SiO-SiO3/2)a(R43SiO-SiO3/2)b.a+b=6-24;a=1 or more;b=0 or more;A=alkenyl;R1,R3=alkyl or aryl;R2=H, alkyl, aryl or group connecting with other polyhedral structure polysiloxane;R4=H, alkyl, aryl or group connecting with alkenyl group;X=-(CH2)l-(Si(-R)2-O)m-Si(-R)2-Y' or group of formula (I);l,n=2 or more;m=0 or more;Y',Z=H, alkenyl, alkyl, aryl or group coupled with polysiloxane through alkaline chain, and at least one of Y' and Z is H;andR=alkyl or aryl.The organopolysiloxane type composition further contains a hydrosilylation catalyst, a curing retarder, an adhesiveness imparting agent and inorganic filler. Preferred Property: The hardened material of composition has water vapor transmission rate of less than 30/g/m2/24 hours. Preferred Definitions:    R4=groups of formulae (i)-(v).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The azulene-containing compound (I) is of formula (II)-(VI). EXAMPLE - Toluene (6 ml), 2-iodoazulene (in mg) (800), 4,4,5,5-tetramethyl-2-(5-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)-3H-1,4-thieno(3,2-b)(1)thiophen-2-yl)-1,3,2-dioxaborolane (590) or 2M aqueous solution (3 ml) of sodium carbonate, ethanol (1.5 ml) and tetrakis(triphenylphosphine)palladium(0) (107) were mixed under nitrogen atmosphere, and heat-refluxed for 45 minutes. Water (100 ml) was added. The reaction solution was filtered, deposited and washed with water, ethanol, hexane and chloroform, and purified to obtain 5-azulen-2-yl-2-((E)-2-(7-eth-(Z)-ylidene-cyclohepta-1,3,5-trienyl)-vinyl)-3H-1-thieno(3,2-b)thiophene (233), with yield of 40%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The precursor layer comprises a Group IB material film including Cu, a Group IIIA material film including at least one of In and Ga, a Group VIA material film including Se and a dopant material film that includes at least one of Na, K and Li. The liquid further comprise surfactants in the form of anionic, cationic, zwitterionic and/or non-anionic surfactants.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The liquid comprise complexing agents selected from tartaric acid, citric acid, acetic acid, malonic acid, malic acid, succinic acid, ethylenediamine, ethylenediaminetetraacetic acid, nitrilotriacetic acid, and hydroxyethylethylenediaminetriacetic acid. The liquid further comprise organic ingredients selected from ethanol, methanol and isopropyl alcohol.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The compound having a nonplanar structure is of formula (I).Z1 = atomic group necessary for forming a 5- or 6-membered ring;L1-L3 = methine (optionally substituted);D1 = atomic group; andn = 0 or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation given. Preferred Component: The boron-containing compound is of formula (II).Y'2=aromatic ring;andn2=2-10. SPECIFIC COMPOUNDS - 2-(2-(8-boratricyclo(7.4.0.02,7)trideca-1(9),2(7),3,5,10,12-hexaen-8-yl)phenyl)-5-(7-(6-(2-(8-boratricyclo(7.4.0.02,7)trideca-1(9),2(7),3,5,10,12-hexaen-8-yl)phenyl)pyridin-3-yl)-9,9'-spirobi(fluorene)-2-yl)pyridine of formula (A) and 5-(6-(2-(8-boratricyclo(7.4.0.02,7)trideca-1(9),2(7),3,5,10,12-hexaen-8-yl)phenyl)pyridin-3-yl)-2-(2-(8-boratricyclo(7.4.0.02,7)trideca-1(9),2,4,6,10,12-hexaen-8-yl)phenyl)pyridine are disclosed as boron-containing compounds.    EXAMPLE - 2-(Dibenzoborolylphenyl)-5-bromopyridine (1.2 g), 2-(dibenzoborolylphenyl)-5-pinacolatoboryl pyridine (1.07 g) and palladium-platinum complex of formula: Pd(PtBu3)2 (70 mg) were added in a reactor and reacted under nitrogen atmosphere. Tetrahydrofuran (27 mL) was added to the resultant reaction solution, stirred, tribasic potassium phosphate aqueous solution (4.1 mL) was added, and refluxed at 70 degrees C. The resultant solution was cooled under room temperature, then placed into a separating funnel, water was added, and ethyl acetate was extracted. The resultant organic layer was washed by hydrochloric acid, water, and saturated salt solution, and dried with magnesium sulfate, to obtain 5-(6-(2-(8-boratricyclo(7.4.0.02,7)trideca-1(9),2(7),3,5,10,12-hexaen-8-yl)phenyl)pyridin-3-yl)-2-(2-(8-boratricyclo(7.4.0.02,7)trideca-1(9),2,4,6,10,12-hexaen-8-yl)phenyl)pyridine having yield of 89%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): Diethynyl naphthalene of a precursor is hydrolyzed, to obtain heterocyclic compound (I). Preferred Composition: The unsubstituted aryl group is 1-3C lower alkyl group. The aryl group is an aromatic hydrocarbon group which is a phenyl group. SPECIFIC COMPOUNDS - 13 Heterocyclic compounds are disclosed. E.g. 5,13-diphenyl-4,12-dioxatetracyclo(7.7.0.03,7.011,15)hexadeca-1,5,8,10,13,15-hexaene of formula (I), 5,13-bis(4-methylphenyl)-4,12-dioxatetracyclo(7.7.0.03,7.011,15)hexadeca-1,5,8,10,13,15-hexaene, 5,13-bis(2,4-dimethylphenyl)-4,12-dioxatetracyclo(7.7.0.03,7.011,15)hexadeca-1,5,8,10,13,15-hexaene, 5,13-bis(2,4,6-trimethylphenyl)-4,12-dioxatetracyclo(7.7.0.03,7.011,15)hexadeca-1,5,8,10,13,15-hexaene and 5,13-bis(2-methylphenyl)-4,12-dioxatetracyclo(7.7.0.03,7.011,15)hexadeca-1,3(7),5,8,10,13,15-heptaene.    EXAMPLE - 2,6-Dibromo-3,7-dihydroxy naphthalene (31.8 g) and pyridine (0.21 mol) were mixed in a methylene chloride (300 mL) at room temperature under nitrogen atmosphere. Acetic anhydride (50 mL) was added in the obtained solution, stirred at room temperature for 15 hours, and diluted hydrochloric acid (100 mL) was added. The obtained mixture was liquid-separated. Water layer was extracted by methylene chloride (100mL), dried, concentrated using organic layer under reduced pressure with anhydrous magnesium sulfate, purified by silica gel column chromatography with a methylene chloride, to obtain 2,6-diacetoxy 3,7-dibromo naphthalene (39.2 g) with yield of 97% as white solid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The industrial clay has a particle diameter of less than 2 mu m, and the clay is dispersed in water to obtain the suspension. The expanded graphite exhibits an expansion coefficient of 250-380 ml/g, and a particle diameter of not greater than 15 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The molecular sieve has pore diameter of 2-30 nm and specific surface area of 300 m2/g or more. Preferred Component: The tank is stainless steel pressure-proof tank with nylon insulating layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Gases: The reaction gas is fluorine or mixture of argon, nitrogen, oxygen and helium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The glass powder comprises (in wt.%) bismuth(III) oxide (40-65), boron trioxide (5-10), silicon dioxide (10-30), aluminum oxide (5-15) and zinc oxide (5-10). The particle diameter of the glass powder is 1-20 mu m, preferably 1-15 mu m. The amount of glass powder in silver paste, is 1-8 wt.%, preferably 3-5 wt.%. Preferred Method: In the step (ii) the preheating temperature is 200 degrees C, and the melting temperature is 1200-1300 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The oxide sinter has specific resistance of 5x 10-3 Omega .cm or less. The oxide transparent conductive film has average transmittance of 98% or more in film thickness of 15-40 nm, measured in wavelength 400-800 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The connection layer comprises aluminum zinc oxide (AZO), indium zinc oxide (IZO), gallium oxide doped zinc oxide (GZO), indium gallium oxide (IGO), indium gallium zinc oxide (IGZO), and indium tin oxide (ITO).    TECHNOLOGY FOCUS - METALLURGY - The connection layer contains titanium, aluminum, a zirconium, hafnium, tungsten, tantalum, molybdenum, niobium, or vanadium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The quartz powder, lump comprising (ppm by weight) boron (less than 0.2), phosphorus (less than 0.1) and metallic impurities (30 or less), carbon black comprising boron (less than 0.1), phosphorus (less than 0.1) and metallic impurities (30 or less), organic binder from group of saccharose and woodchips are selected as raw material. The quartz powder, carbon black and organic binder are weighed and mixed with distilled water in specific ratio, to form mixed material. The mixed material is briquetted and briquettes with size of 2.54 comprising or more is obtained. The obtained briquette are dried by heating to 180 degrees C in a tunnel furnace by combusting methane gas. The briquette, quartz, and purified woodchip are subjected to carbon reduction in submerged arc furnace at 200-300 KVA, to form melt. The silicon melt-purification by tapping process and oxidation refining, and settling and skimming processes are carried out in the inducted ladle.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hydrolytic condensed compound is of formula: R1qX3-qSi-(CH2)p-SiX3-rR1r.R1=organic group;X=hydrolyzable group;p=1-10;q=0-2;andr=0-2.
TECHNOLOGY FOCUS - BIOTECHNOLOGY - Preferred Components: The anode enzyme is a glucose-responsive enzyme which is glucose oxidase or glucose dehydrogenase. The glucose-responsive enzyme further comprises an enzyme cofactor which is pyrroloquinoline quinone.    TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: The method further comprises: electrooxidizing a biochemical reductant on the anode in the presence of the anode enzyme; and electroreducing a biochemical oxidant on the cathode in the presence of the cathode enzyme. Preferred Components: The redox potential of the anode enzyme is -0.4V to -0.5V. The cathode comprises platinum. The cathode further comprises a cathode enzyme which is laccase or cytochrome C. The redox potential of the cathode enzyme is +0.3V to +0.6V.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The mediator comprises a transition metal complex. The transition metal complex comprises ruthenium or osmium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The ligand comprise optionally substituted heterocyclic nitrogen-containing moiety.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polymer comprises at least one heterocyclic nitrogen-containing moiety consisting of pyridine, imidazole, oxazole, thiazole, pyrazole or its derivative. In the method, mediator is covalently bonded to the polymer. The mediator forms at least one carbon-carbon, carbon-nitrogen, or metal-carbon covalent bonds with polymer. The mediator is covalently bonded to the polymer through at least one ligand of the mediator. In the method, the polymer is crosslinked. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The zeolite Y adsorbent comprises a zeolite Y ion exchanged with a cation selected from Cu, Ag, Mn, Mg, Fe, Ca, Ce, La, Sr, Pr, and/or Nd ,(preferably copper exchanged zeolite Y). The copper exchanged zeolite Y is further exchanged with metal ions selected from zinc, cadmium, cobalt, nickel, copper, iron, manganese, silver, gold, scandium, lithium, cerium, lanthanum, and/or magnesium. The selective sulfur adsorbent comprises copper oxide and at least one manganese compound; at least one manganese compound and an iron compound, such as iron oxide; and copper oxide, an iron compound and at least one manganese compound.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The process involves delivering the desulfurized hydrocarbon feed stream to a fuel cell processing train; and further involves controlling the temperature of the feed stream while passing through the zeolite Y adsorbent and the selective sulfur adsorbent to below 60 degrees C. The sulfur containing hydrocarbon feed stream is desulfurized to less than or equal to 50 parts per billion (ppb). The hydrocarbon feed stream further comprises water. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The barrier layer includes silicon nitride, silicon oxide, silicon carbide, aluminum nitride, aluminum oxide, indium tin oxide and/or indium zirconium oxide. The reinforcing material (2) includes glass fiber, glass fiber cloth, glass cloth, glass nonwoven fabric, glass mesh, glass bead, glass flake, silica particles and/or colloidal silica.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The ratio of elastic modulus of coating layer at 25 degrees C with respect to elastic modulus of reinforcement-impregnated matrix at 25 degrees C, is preferably 10-5x 104. The coating layer has more than 2 layers having different elastic modulus at 25 degrees C. The reinforcement-impregnated matrix has elastic modulus of less than 0.1 GPa at 25 degrees C. The coating layer has elastic modulus of 0.1-10 GPa at 25 degrees C. The barrier layer has elastic modulus of 10 GPa or less at 25 degrees C. The ratio of thickness of coating layer with respect to thickness of reinforcement-impregnated matrix is 1\10-3-5x 10-1. Preferred Structure: The coating layer has slope composition elastic modulus structure. Preferred Process: The coating layer is manufactured using sol/gel prepared by hydrolyzing organic/inorganic hybrid solution, and plasma-processing. Preferred Composition: The coating layer contains acrylic resin, epoxy-based resin, silicone resin, urethane resin and/or unsaturated polyester resin. The reinforcement-impregnated matrix includes silicone resin, styrene-butadiene rubber, butadiene-based rubber, isoprene-based rubber, chloroprene, neoprene rubber, ethylene-propylene-diene copolymer, hydrogenated styrene-ethylene-butylene-styrene block copolymer, styrene-ethylene-propylene-styrene block copolymer, acrylonitrile-butadiene rubber, hydrogenated nitrile rubber, fluorinated rubber, and/or plasticized polyvinyl chloride.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: In the transparent protective film, the self-repairability develops at 10-100 degrees C. EXAMPLE - A monomer solution containing hydroxyethyl methacrylate (182 parts), 2-(perfluorohexyl)ethyl methacrylate (151 parts), butyl (3-methacryloxypropyl) polydimethylsiloxane (100 parts), lactone-modified methacrylate (165 parts), benzoyl peroxide (27 parts) and butyl acetate (60 parts) was fed into a dropping funnel, and dripped into 300 parts of butyl acetate that was heated to 110 degrees C under nitrogen reflux for 3 hours while being stirred so as to be polymerized. Then, a liquid composed of 135 parts of butyl acetate and 3 parts of benzoyl peroxide was added dropwise over one hour, and the reaction was completed. Then, the solution was constantly held at 110 degrees C and continuously stirred, to obtain acryl resin prepolymer. Then 153 parts of a liquid containing acryl resin prepolymer and 76 parts of a liquid containing DURANATE X1040 (RTM: Polyisocyanurate based on hexamethylene diisocyanate) were mixed together, defoamed under reduced pressure for 10 minutes, and then casted on to glass platen to obtain the transparent protective film.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The epoxy group-containing alkoxysilane compound is a mixture of alkoxysilane compound of formula: RERF(4-m-n)Si(ORG)n (II) or its oligomer, and silane compound of formula: HO(-Si(RH)(RI)-O-)qH (III). The molar ratio of basic compound with respect to acidic compound is 1.05-5.RE=epoxy group-containing hydrocarbyl;RF,RG,RH,RI=1-10C hydrocarbyl;m=1 or 2;n=2 or 3;(4-m-n)=0, 1, or 2;andq=1-500.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: Silicon-containing component of formula: R1R2SiO2/2 in the polysiloxane (I) is an oligomer having mass mean molecular weight of 400 or more. Preferred Process: The polysiloxane is manufactured by hydrolyzing alkoxysilane compound in presence of acidic compound, and then, condensation-reacting by adding basic compound. Preferred Properties: The thermosetting resin composition has peak temperature of 270-470 K and peak half value width of 50-75 K in loss tangent.
TECHNOLOGY FOCUS - BIOTECHNOLOGY - Preferred Method: The cultivation is performed at 20-32 degrees C. The cultivation is performed under light irradiation conditions of 20-500 photosynthetic photon flux density (ppfd) and for optical period of 8L:16D-24L:0D (Light:Dark). The culture solution comprises 100-700 mu mol of nitrogen which is an ammonia nitrogen and 2-40 mu mol of phosphorus. The cultivation process is continuous spinner culture, where stirring is machine stirring or stirring under ventilation. ACTIVITY - Cytostatic. No biological data given.    MECHANISM OF ACTION - None given.    EXAMPLE - Filamentous seed of Codium intricatum was cultivated under light irradiation conditions of 60 photosynthetic photon flux density (ppfd) and optical period of 12L:12D (Light:Dark) at 25 degrees C for one week. The cultured filaments were lyophilized. The lyophilized filament (100 mg) was taken in falcon tube and 0.3 M ammonium acetate containing methanol (10 ml) was added as organic solvent. The mixture was vortexed and extracted in refrigerator for 3 hours. The extracted mixture was centrifuged at 4 degrees C and 15000 revolutions per minute (rpm) for 10 minutes. The supernatant was collected and analyzed by HPLC. The content rate with respect to dry mass was calculated. The content rate of siphonaxanthin and siphonein was respectively 8 times and 5 times higher than the normal rate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The inorganic precursor is chosen from ferrous chloride and ferrous chloride tetrahydrate. The molar ratio of thiophene monomer to oxidant is 1:0.25-1:10, preferably, 1:25-1:7.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The solvent is chosen from water, alcohol, ketone, or their mixed solvent, preferably water. The volume ratio of thiophene monomer and solvent is 1:60-1:2000, more preferably 1:100-1:1200. The molar ratio of inorganic precursor and thiophene monomer is 0.015:1-2:1, more preferably 0.06:1-0.4:1. The oxidant is hydrogen peroxide.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The particle size of polythiophene microsphere is 50-2000 nm. Separation involves filtering, washing and drying.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The base comprises silicon and aluminum, and the substrate comprises silicon carbide and aluminum oxide. The buffer layer comprises gallium nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The vapor deposition material has a volume density of 0.9-1.5 g/cm3. Silicon dioxide powder includes 20% or more of crystal structure.
TECHNOLOGY FOCUS - METALLURGY - The precursors of the solid and flexible substrates consists of a group comprising copper in combination with another group comprising indium, gallium, or a combination of both.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The nitride solar cell includes a p-n junction formed by respective p-type and n-type layers of a dilute group III-V nitride material. The p-type and n-type layers comprise gallium nitride arsenide, gallium indium nitride arsenide or gallium nitride antimony arsenide with nitrogen concentration of 0.5-5%. At least one of the p-type or n-type layer has a compositionally graded nitrogen concentrations to provide an electric field for more efficient charge collection. At least one of the contact blocking layers is lattice matched to corresponding band gaps of the p-type or n-type layers. A conduction band of the contact blocking layers is aligned with a corresponding sub-band of an adjacent one of the p-type or n-type layers. The contact blocking layers comprise at least one of aluminum gallium arsenide, indium gallium phosphide or another group III-V ternary alloy. The nitride solar cell is current matched to the other many p-n junction solar cells of the multi-junction solar cell, so that each of the p-n junction solar cells connected in series produces substantially the same current when exposed to solar radiation. Nitrogen composition in the nitride solar cell can be tuned to a bandgap of 0.8-1.4 eV so that it can be used as part of a multi-junction cell with various numbers of junctions. The nitride solar cell further includes a protective layer formed on one of the contact blocking layers to provide a protective covering and further provide a low resistance electrical contact.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The solar cell panel is made of inorganic materials such as silicon, Copper indium gallium selenide and Cadmium telluride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The barium coating layer contains barium hydroxide having average particle diameter of 0.01-0.1 mu m or barium carbonate. The barium concentration in silicon-nitride coating layer and inner silica layer is more than the barium concentration in barium coating-layer side. The inner silica layer has inner stucco layer (30) containing fine fused-silica sand (31) of 50-300 mu m bonded by silica substrate (6). Preferred Property: The barium coating layer has thickness of 1-10 mu m. Preferred Process: From the barium coating layer, the barium spreads in portion(s) of silicon-nitride coating layer and inner-layer silica layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Any one of the inner layer stucco layers other than the outermost surface of the silicon-nitride coating layer and inner layer silica layer contains barium hydroxide and/or barium carbonate. During the process of forming mixed substrate layers other than the outermost surface of mixed substrate layer, silicon nitride slurry is replaced with barium-containing silicon nitride slurry. Barium-containing slurry contains barium hydroxide powder or barium carbonate powder with an average particle diameter of 0.01-0.1 mu m.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Method: In altering the surface composition of alloy, the alloy is a bimetallic or trimetallic alloy. It comprises at least one catalytic metal. It comprises Pt and/or Pd. The alloy is selected from Pd-Rh, Pt-Ru, Pd-Ru, Pd-Pt, Pd-iridium (Ir), Pt-Ir, Pt-cobalt (Co), Pd-Co, Rh-Ru, Pt-Pd-Rh, Pt-Pd-Ru, Pt-Rh-Ru and Pd-Rh-Ru. It is provided in nanoparticulate form. In step (b), two metal oxides are formed. The oxidizing agent is gaseous, preferably oxygen gas (O2) or nitrogen oxide (NO).The reducing agent is gaseous, preferably hydrogen gas (H2). The oxidizing agent is provided at a pressure of from 5 mbar to 5 bars. Preferably, the reducing agent is provided at a pressure of from 5 mbar to 5 bars. At least one of the oxidizing and the reducing agent is gaseous and provided at a flow rate of from 1 to 100 cm3/minute; or at least one of the oxidizing and the reducing agent is gaseous and provided at a flow rate of from 10 to 50 cm3/minute. Step (c) is performed at a lower temperature than step (b). Step (b) is performed at a temperature of up to 1500 K; or step (b) is performed at a temperature of from 600 K to 1200 K. Step (c) is performed at a temperature of up to 1000 K; or step (c) is performed at a temperature of from 450 K to 750 K. Step (b) is carried out for a period of from 5 minutes to 8 hours; or step (b) is carried out for a period of from 5 minutes to 5 hours. Step (c) is carried out for a period of from 30 minutes to 4 hours; or step (c) is carried out for a period of from 45 minutes to 2.5 hours. Preferred Alloy: The surface-modified alloy has at least one surface comprising island structures of at least one metal. The island structures comprise at least one metal selected from Pt, Pd, Rh and Ru. The surface-modified alloy is a nanoparticle. Preferred Cell: The fuel cell is a low-temperature fuel cell. The surface-modified alloy forms an electrode of the fuel cell. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The molybdenum-tungsten target has oxygen concentration of 100 ppm or less, relative density of 97% or more, and average grain size of 20 micro m or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The molar ratio of number of moles of copper hydroxide to the total number of moles of copper atoms in the island portion is 0.25-0.30. The ratio of total of the area of the island portion with respect to the area of the antiviral thin film is 0.01-0.20 when the antiviral thin film is observed from the upper direction of the island portion. The diameter which computed the mean area of the island portion when observed along the thickness direction of the antiviral thin film by having converted into circular form is 1-20 nm, preferably 2-5 nm. The diameter which computed the mean area of the island portion when observed along the thickness direction of the antiviral thin film by having converted into circular form is 1-20 nm, preferably 2-5 nm. The substrate is transparent substrate. The base material has haze rate of 0.5% or less at 380-760 nm wavelength. The metal copper equivalent amount of the weight of copper hydroxide in the island part is 1 ng/cm2 or more, preferably 4 ng/cm2 or more. The molar ratio of number of moles of copper oxide to the number of moles of copper atoms in the island portion is 0.70-0.95. The ratio of total of the area of the island portion with respect to the area of the antiviral thin film is 0.01-0.20 when the antiviral thin film is observed from the thickness direction of the island portion. The metal copper equivalent amount of the weight of copper oxide in the island portion is 3 ng/cm2 or more, preferably 10 ng/cm2 or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The low index of refraction coating layer comprises a metal oxide. The metal oxide comprises zirconia, titania, hafnia, silica, and/or alumina. The second low index of refraction coating layer has an optical thickness of 0.7-1.5 quarter waves.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The high index of refraction coating layer comprises a metal alloy oxide. The metal alloy oxide comprises zinc stannate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: In the method, the substrate has a visible light transmittance of less than 70% before depositing step and a visible light transmittance of at least 70% after the depositing step. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aromatic carbonyl compound is of formula (I) or (II). The aromatic heterocyclic compound is of formula (III) or (IV). The aromatic heterocyclic compound includes 5-membered aromatic heterocycle having sulfur atom, oxygen atom, and hetero atom chosen from nitrogen atom as a heterocyclic hetero atom. The aromatic aldehyde compound has 2-4 formyl groups as reactive site in 1 molecule.L=linker;A1,A2=aromatic ring;R1=carbonyl-containing group;R2a,R2b,R2c,R2d =non-reactive group;R3=H, amino, hydroxy or mercapto;n=0 or 1;k1,p,p1=1 or 2 or more;k2=0 or 1 or more;k3=1 or more;ring Het,Het1,Het2=heteroaryl;X,X1,X2=heteroatom;andr,r1,r2=0-3.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The conductive polymer obtained by heat-processing the composition, and has three-dimensional network structure containing ( pi )-conjugated system, and is insoluble or slightly soluble to organic solvent. The conductive polymer has a structure in which unit chosen from carbon-nitrogen double bond, imidazole ring, oxazole ring, thiazole ring, carbon-carbon single bond, and carbon-carbon double bond, aromatic ring unit and aromatic ring unit derived from aromatic reaction component derived from aromatic carbonyl compound are connected. The composition further includes acidic catalyst, acid generator and electron-accepting dopant. The dopant is a polyanion having sulfo groups or its salt.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The heterocyclic ring-containing compound of formula (I) is boron-containing compound of formula (II) or (III). The boron-containing compound of formula (III) is boron-containing heterocyclic compounds of formulae (IIIa)-(IIIc). The active layer of organic thin-film solar cell is p-layer or i-layer.R1-R16=H, or 1-20C alkyl, 2-30C alkenyl, aryl containing 6-30 ring-forming carbon atoms, arylamino containing 6-30 ring-forming carbon atoms, or heterocyclyl containing 5-40 ring-forming carbon atoms (all optionally substituted), or halo;X1-X6=oxygen, sulfur or C-R;R13+R14,R15+R16=not isoindole;R=R1;X=oxygen or sulfur;andR13-R16=ring. Preferred Definitions:    M=boron, aluminum, silicon, magnesium, iron, copper or zinc.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The complex (I) is of formula (II) or (VII). The film forming material is dissolved in alcohol containing two or more oxygen atoms in a molecule, and heated. The alcohol is cellosolve, preferably ethylene glycol monomethyl ether. The film forming material is formed by dissolving compound containing titanium atom or zirconium atom crosslinked with crosslinking oxygen atom in alcohol, and heating. The organic solvent is alcohol, preferably ethylene glycol monomethyl ether. The vinylene diamide complex is obtained by reacting bis(dialkyl amide)titanium complex of formula (V) and alcohol of formula: R10QOH, reacting metal tetraalkoxide of formula: M4(OR5)4, vinylene diamide alkali metal salt of formula (X) and metal tetrachloride of formula: M4Cl4, or reacting tetrachloro bis(tetrahydrofuran)zirconium, alkali metal salt (X) and metal alkoxide of formula: M6OR5.R11=1-6C alkyl;M4=zirconium atom or hafnium atom, preferably zirconium atom;R5'=R5 or OR10;andM5,M6=alkali metal atom. Preferred Definitions:    M2=titanium atom;    R1,R4,R5=tert-butyl or tert pentyl;and    R2,R3=H.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The silica sol has grain diameter of 10-20 mm and density of 1.15 g.cm3. The silicon dioxide is silicon dioxide aqueous dispersion having a concentration of 25%. The expanded graphite has expansion ratio of 250-380 ml/g and particle diameter of not less than 15 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The industrial ball clay has grain size of 2 mu m or less and forms suspension in water. The expanded graphite has expanding rate of 250-380 ml/g and grain size of 15 mu m or less. Preferred Component: The tank is made of pressure proof stainless steel with nylon sprayed insulating layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solution comprises (in wt.%): emulsifying agent (2-5), osmotic agent (1-4), detergent (1-3), chelating agent (0.1-1), lower alcohol (0-10) and ultrapure water (remaining quantity). Preferred Components: The emulsifying agent is 8-14C alkyl glucoside. The lower alcohol is monohydric alcohol. The chelating agent is amino acid, or phosphonic acid or its salt. The chelating agent is polyaspartic acid or polyepoxysuccinic acid. The phosphonic acid is one or mixture of components chosen from diethylenetriaminepenta(methylene-phosphonic acid), amino trimethylene phosphonic acid, hydroxyethylidene diphosphonic acid and their salts. The osmotic agent is chosen from 12-16C linear chain polyoxyethylene ether, 12-16C fatty alcohol polyethenoxy ether, 12-16C block polyoxyethylene polyoxypropylene ether and nonylphenol polyoxyethylene ether and their phosphates. The detergent is 12-16C linear or branched ether ammonium salt, 12-16C alcohol ether sulfate ammonium salt or 12-16C alcohol ether sulfonic acid ammonium salt.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The porosity oxide supporter is selected from the group consisting of the magnesium oxide, aluminum oxide, silicon dioxide, titanium oxide, calcium oxide or zinc oxide.    TECHNOLOGY FOCUS - METALLURGY - The metal precursor is selected from the group consisting of iron, cobalt, nickel, copper, ruthenium, rhodium, palladium, silver, cadmium, indium, antimony, platinum, gold, bismuth or molybdenum. The support precursor is selected from the group consisting of magnesium, aluminum, silicon, titanium, calcium or zinc.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The liquid complex contains 1-ethyl-2-methyl pyridinium bromide, 1-ethyl-3-methyl pyridinium bromide or 1-butyl-3-methyl imidazolium bromide combined with bromine molecule(s), preferably 1-ethyl-2-methyl pyridinium bromide or 1-ethyl-3-methyl pyridinium bromide combined with bromine molecule(s). The 1-alkyl-2-alkyl pyridinium halide is 1-ethyl-2-methyl pyridinium bromide. The 1-alkyl-3-alkyl pyridinium halide is 1-ethyl-3-methyl pyridinium bromide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The aluminum oxide substrate comprises grain boundary having crystals with single orientation. The solar cell further has buffer layer (32) containing gallium nitride. The III-nitride layer comprises indium nitride (InN) layer (33A), indium gallium nitride (InGaN) layer (33B), indium aluminum gallium nitride (InAlGaN) layer (33C) and aluminum nitride (AlN) layer (33D) orderly deposited in a direction away from the aluminum oxide substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compound: The cobalt compound is cobalt sulfate. Preferred Process: The cobalt compound solution is prepared by dissolving lithium cobalt oxide with sulfuric acid solution. Preferred Component: The metallic interconnect is made of ferrite stainless steel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicon of the secondary form factor is spherical silicon having diameter of less than 5 mm, which is the product of a fluidized bed reactor process. The silicon of the primary form factor comprises silicon chunks or silicon rods, and is a product of Siemens process or is recycled from silicon ingot production process. The peripheral region has width of 5 mm or more, preferably less than 15 mm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The mixture of indium-tin oxide powder, and chloride ion including indium chloride and tin chloride are baked at 800-1200 degrees C, preferably 900 degrees C. The mixture is obtained by precipitating indium oxide and tin oxide in chloride media, filtering precipitate and washing the precipitate such that all chloride ions are not removed from the precipitate. The production of granulated indium-tin oxide powder further involves forming granulated indium-tin oxide into slurry which is aqueous slurry including phosphorus compound (0.001-1 wt.%), and binder and/or dispersing agent, providing porous mold of gypsum or plaster of paris, coating the mold with layer of sealing and/or chelating agent, injecting the slurry into mold, producing green material by leaving slurry in the mold for predetermined period of time, and firing green material at 1000-1750 degrees C under high-purity oxygen. Preferred Composition: The phosphorus compound is phosphoric acid, phosphorus oxide, indium(III) phosphate and/or tin(IV) phosphate, preferably phosphorus pentoxide. The granulated indium-tin oxide powder comprises indium(III) and tin(IV) oxides (75 wt.% or more) having surface area of 4.5-5.5 m2/g.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The sealing or chelating agent contains sugar compound including sucrose or glucose, and ethylene glycol tetraacetic acid, 1,2-bis(o-aminophenoxy)ethane-N,N,N',N'-tetraacetic acid or ethylenediaminetetraacetic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The chalcopyrite-type compound contains group I-III-VI compound including indium and gallium as group III-B element, selenium as group VI-B element and copper as group I-B element, and oxygen element. Preferred Process: During manufacture of photoelectric conversion apparatus, atmosphere containing chalcogenated hydrogen is used.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The boric acid ester is of formula: B(OR1)3. The amount of boric acid ester is 5 mol times or less amount of polyhydric alcohol. The alkoxy silane compound is a reaction product obtained by hydrolyzing alkoxy silane of formula: R6nSi(OR7)4-n. The dispersing agent composition further contains organic solvent other than polyhydric alcohol.R1=1-10C alkyl or 6-10C aryl;R6=H or organic group;R7=organic group;andn=0-2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The inert gas is chosen from nitrogen and noble gas.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alkyl compound is chosen from diethyl zinc, dimethyl zinc, dimethyl magnesium, diethyl magnesium, bis-cyclo pentadienyl magnesium, trimethylaluminum, triethylaluminum, trimethyl gallium, triethyl gallium, trimethyl indium, triethyl indium, tetramethylsilane, tetraethyl silane, trimethylsilane, triethyl silane, dimethylsilane and diethylsilane. The oxidizing agent is chosen from water, oxygen, hydrogen peroxide, ozone, nitrogen monoxide, nitrous oxide and nitrogen dioxide. The oxide-film film-forming apparatus further has inert gas jet nozzle (4), ultrasonic atomization device (25), and supply adjustment portion (50) which adjusts supply amount of the oxidizing agent. Inert gas is ejected with respect to raw material solution of mist form. The raw material solution is in mist form by ultrasonic atomization process. The raw material mist jet nozzle, oxidizing agent supply port, and inert gas jet nozzle are formed in the same nozzle (1) in oxide-film film-forming apparatus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The saw-waste is homogenized with acetone in the ratio of 1:0.25-1:3, subjected to a sedimentation time of several hours and then filtered, and is repeated for several times. The obtained fraction of silicon is subjected to leaching with dilute hydrochloric acid. The filter cake enriched with silicon is formed into pellets. The pyrometallurgical separation takes place in silicon nitride coated crucibles. The obtained silicon is re-crystallized after removing the technologically related impurities, by known methods to obtain solar grade silicon. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The organic-inorganic composite semiconductor contains inorganic semiconductor including element of groups 2B, 3B, and 4B, or their metal oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aromatic aldehyde compound is of formula (I). The aromatic heterocyclic compound is of formula (IIa) or (IIb). The ratio of ( alpha )-carbon sites of aromatic heterocyclic compound with respect to 1 equivalent of formyl groups of aromatic aldehyde compound is 0.5-5 equivalent. The acid generator is photo-acid generator.L=linker;A1=aromatic ring;R1=formyl or formyl-group-containing group;R2a,R2b,R2c-R2d=non-reactive group;n=0 or 1;k1,p,p1=1 or more;k2=0 or 1 or more;ring Het,Het1,Het2=heteroaryl;X,X1,X2=heteroatom;andr,r1,r2=0-3.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The resin layer (b) has total light transmittance of 80% or more. Preferred Composition: The resin layer (b) further contains acrylic resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The weight ratio of components (A,B) is preferably 70/30-5/95.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic particles of photocatalytic activity inorganic particle are amorphous oxide particles which consist of metal chosen from titanium, zirconium, and cerium.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polymer by which organosilicon compound which the protective layer contains is polymerized is organopolysiloxane. The compound, chosen from the group which the polymer by which the organosilicon compound is polymerized, is hydrolyzate of organosilane and organosilane, and the condensate of organosilane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process After generating hydrogen gas, iron(III) oxide is changed into goethite and the hydrogen gas is repeatedly generated for multiple times under non-oxidizing atmosphere. Preferred Composition: The raw material including ferrous material is in form of powder.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: In the chamber, where: a minor outlet area is a cross sectional area of a primary gas exhaust opening connected to the outlet; a minor inlet area is the cross sectional area of a primary gas delivery opening connected to the inlet; and a minor outlet to minor inlet area ratio is greater than 2. At least one station further comprises a heater configured to heat chamber materials around the outlet to at least 100 degrees C. The chamber materials comprise a baffle. The chamber materials include chamber walls, a baffle and an exhaust. The outlet comprises flame polished quartz. The outlet has a surface polish Ra of 4-63 angstroms. The chamber materials surrounding the outlet is coated with UV absorbing material. The chamber includes four stations and the outlet to inlet surface area ratio is greater than 4 for three stations. The chamber is further configured to heat the outlet.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - A layer of poly-crystalline silicon is formed above the single-crystalline silicon substrate. The stack of dielectric materials such as silicon nitride layer is formed on silicon dioxide layer which is formed over the poly-crystalline material layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The plate-shaped particle is clay, graphene, graphite oxide, a graphite nanoplatelet, and/or a metal flake. The clay comprises pyrophyllite-talc, montmorillonite, fluorine hectorite, kaolinite, vermiculite, illite, mica, and/or brittle mica.    TECHNOLOGY FOCUS - POLYMERS - The sealant is a cured resin. The resin is an epoxy resin, and/or thiol-ene resin. The epoxy resin is a polymerization product of a polyhydric phenol or a polyhydric alcohol, and an epihalohydrin. The thiol-ene resin is a polymer of a first monomer comprising at least one thiol group at a terminal end and a second monomer comprising at least one carbon-carbon unsaturated bond at a terminal end. The sealant further comprises a plate-shaped particle comprising an inorganic oxide, a carbon-containing material, and/or a metal-containing material. The polymer is a silicone resin; a polysiloxane resin; an epoxy resin; a poly(methyl(meth)acrylate) resin; a polymer of a first monomer comprising at least one thiol group at a terminal end and a siloxane second monomer or oligomer comprising at least one carbon-carbon unsaturated bond; and/or a polymer of a first monomer comprising at least one thiol group at a terminal end and a second monomer including at least one carbon-carbon unsaturated bond at a terminal end.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of electroconductive carbon in the conductive resin molding is 50 %mass or less.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The electroconductive polyaniline is obtained by dopping polyaniline with a dopant containing acid having more than 6C alkyl group, preferably dodecylbenzenesulfonic acid. The manufacture of conductive resin molding involves melt-kneading acid having more than 6C alkyl group and electroconductive polyaniline, melt-kneading thermoplastic resin, electroconductive carbon and solvent or dispersing agent, and mixing melt-kneaded mixtures. Preferred Composition: The electroconductive carbon contains electroconductive carbon fiber having diameter of 100 nm or less. Preferred Property: The conductive resin molding has thickness of 1 mm or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The crosslinkable functional group is chosen from methylol amide group and alkoxy methylamide group. The crosslinking agent (E) is reacted by heating at 100 degrees C or more. The crosslinking agent (E) is heat-crosslinking agent(s) chosen from melamine compound, epoxy compound, oxazoline compound, carbodiimide compound, and isocyanate compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin composition forms the layer which accepts fluid containing electroconductive substance or pigment chosen from electroconductive ink containing electroconductive substance, metal-plating nucleating agent containing electroconductive substance, or pigmented ink containing pigment. The resin composition further contains composite resin particles (D) and crosslinking agent (E). The mass ratio of urethane resin (A) to vinyl polymer (B) is 70/30-10/90. The vinyl resin (B) has crosslinkable functional group. Preferred Process: The vinyl polymer (B) is obtained by polymerizing 10-50 %mass of vinyl monomer mixture and 10-70 %mass of (meth)acrylic acid alkyl ester with 2-12C alkyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive agent is further laminated on the layer (Y). The content of the vinyl alcohol polymer (b) in the layer (Y) is 2-40 %mass with respect to total content of 100 %mass of polymer (a) of metal salt of unsaturated carboxylic acid compound and vinyl alcohol polymer (b). The vinyl alcohol polymer (b) in the layer (Y) is modified-vinyl alcohol polymer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organosilicon compound is disiloxane compound of formula: CH(-R1)(R2)-Si(-R3)(-R4)-O-Si(-R3)(-R4)-HC(-R1)(-R2), silane compound of formula: R7-(Si(-CH(-R5)(-R6))(-R9))m-R8, or cyclic silane compound of formula (I), preferably chosen from 1,3-diisopropyl disiloxane, 1,3-diisopropyl-1,3-dimethyl disiloxane, 1,3-diisopropyl-1,1,3,3-tetramethyl disiloxane, 1,3-di-sec-butyl disiloxane, 1,3-di-sec-butyl-1,3-dimethyl disiloxane, 1,3-di-sec-butyl-1,1,3,3-tetramethyl disiloxane, isopropylsilane, isopropyl methylsilane, isopropyl dimethylsilane, diisopropylsilane, diisopropyl methylsilane, triisopropylsilane, sec-butyl-silane, sec-butyl methylsilane, sec-butyl dimethylsilane, di-sec-butyl silane, di-sec-butyl methylsilane, tri-sec-butyl silane, 1,2,3,4-tetra-isopropyl cyclotetra silane, 1,2,3,4,5-penta-isopropyl cyclopentasilane, 1,2,3,4,5,6-hexa-isopropyl cyclohexasilane, 1,1,2,2,3,3,4,4-octa-isopropyl cyclotetrasilane, 1,1,2,2,3,3,4,4,5,5-deca-isopropyl cyclopentasilane and 1,1,2,2,3,3,4,4,5,5,6,6-undeca-isopropyl cyclohexasilane.R1,R2,R5,R6,R10,R11=1-20C hydrocarbyl, preferably methyl or ethyl;R3,R4,R7,R8,R9,R12=1-20C hydrocarbyl or H;or R1+R2,R5+R6,R10+R11=cyclic structure;m=1-20;andn=4-40.Preferred Method: The chemical vapor deposition method is plasma excitation chemical vapor deposition method, preferably catalyst chemical vapor growth method. The sealing film is obtained by carrying out electron beam, ultraviolet-irradiating or heat-processing film-forming material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The layers (2) and (3) have zinc compound as main component. The layer (4) contains silicon, aluminum, titanium, zirconium and/or chromium, preferably aluminum, titanium, zirconium and chromium as main component. The layer (2) contains layers (A1) and (A2). The layer (A1) comprises (in atomic%) zinc, silicon, aluminum and oxygen as measured by inductively coupled plasma emission spectrochemical analysis. The layer (A2) has molar fraction of zinc sulfide and zinc sulfide with respect to the sum total of silicon dioxide of 0.7-0.9.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Process: When the flow volume of oxygen-enriched air is varied, the supply pressure of the air to the air separator is adjusted, and the flow volume of oxygen-enriched air is adjusted. The flow volume of nitrogen-enriched air is adjusted to maintain constant oxygen concentration in oxygen-enriched air. The supply pressure of the air to the air separator is controlled in the range of 0.02-1 MPaG. The oxygen-enriched air discharge side of the air separator is pressure-reduced to less than atmospheric pressure. Preferred Components: The air separator has gas separation membrane. The system has a structure in which air separation membrane apparatus can supply purge air to the gas separation membrane. Preferred Property: The atmospheric pressure dew point of the nitrogen-enriched air is -20 degrees C or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The needle-shaped or rod-shaped boehmite or pseudoboehmite alumina particles have average upper limit cross section of 2-20 nm, average length of 4-200 nm, and aspect ratio (length/average upper limit cross section) of 2-100. The content of alumina particles in transparent composite material is 5-90 %mass.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The transparent composite material containing curable composition further contains polymerizable monomers (C) other than methyl methacrylate, and does not contain polymerizable components other than polymerizable phosphate ester monomer (A).    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The transparent film has mean line expansion coefficient at 50-200 degrees C in surface direction of 50 ppm/ degrees C or less, and total light transmittance per 100 mu m thickness of 85% or more and double-refraction (Rth) in vertical direction of transparent film per 100 mu m thickness of 20 nm or less. Preferred Process: The curable composition is hardened by UV irradiation and/or heating. Preferred Process: The curable composition containing solvent is coated on a plane, and then the solvent is dried. After drying the obtained product is interposed with sheet and then is hardened.
TECHNOLOGY FOCUS - IMAGING AND COMMUNICATION - Preferred properties: The optical component has thermal linear expansion coefficient of 70x 10-6 K-1 at 35-50 degrees C and total light transmittance of 70% or more.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The filler has particulate shape. The average particle diameter of filler particles is 200 nm or less.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin component is acrylic resin, preferably poly(methyl methacrylate) resin. Preferred Property: The ratio of difference of refractive indices of filler and resin component with respect to refractive index of filler is 0.05 or less. Preferred Definitions:    R1,R2=methyl methacrylate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The foaming agent is inorganic gas chosen from nitrogen gas or carbon dioxide gas.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The structural unit derived from dihydroxy compound (A) becomes from cyclohexane dimethanol, tricyclodecane dimethanol, and hexanediol. The content of structural unit (a1) derived from the dihydroxy compound (A) in the polycarbonate copolymer is 30-99 mol%. The foam-molded component has foaming ratio of 1.1-100 times. The structural unit derived from dihydroxy compound (B) is of formulae: HO-R1-OH, HO-CH2-R2-CH2-OH, H-(O-R3)p-OH or HO-R4-OH.R1,R2=4-20C optionally substituted cycloalkylene;R3=2-10C optionally substituted alkylene;p=2-50;andR4=2-20C alkylene or acetal ring (both optionally substituted).Preferred Property: The resin composition has Henry's constant with respect to carbon dioxide in 200 degrees C is 2.5x 10-3-4x 10-3g (carbon dioxide)/g(resin composition).MPa. Preferred Process: The foam-molded component is obtained by foam-molding resin composition by injection foaming with expansion of cavity using foaming agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The transition metal catalyst is nickel, cobalt or palladium. The catalyst fine particles are platinum, metal microparticles or metal oxide fine particles. Preferred Process: The length and/or number of edge of graphene sheet contained in carbon nano filament are controlled by controlling the reaction temperature. Hydrocarbons are methane and/or ethane. The reaction is performed in gaseous phase by fluid bed or fixed bed.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The copper-containing compound is copper chloride dehydrate. The zinc-containing compound is zinc chloride. The tin-containing compound is tin sulfate tetrahydrate. The sulfur-containing compound is thiourea. The divalent copper ion concentration in the precursor solution is 0.1-0.32 mol/L. The vulcanization or selenization process is carried out using sulfur powder or selenium powder. The molar ratio of copper-containing compound, zinc-containing compound, tin-containing compound and sulfur-containing compound is 2:1:1:10. The thickness of precursor film is 300-1000 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The contact layer (a1) contains gallium-arsenide. The contact layer (a2) contains germanium or indium-gallium-arsenide. The tunnel junction (b2) contains gallium indium phosphide or aluminum gallium arsenide. The gallium-arsenide sub cell contains gallium arsenide, gallium indium phosphide or aluminum gallium arsenide. The tunnel junction (b1) contains gallium indium phosphide or gallium arsenide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The gas component in the reaction gas is silicon hydride and ammonia in volume ratio of 1:1.2-1:2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The silver nitrate is added to the mixture at a molar proportion of 0.6-1:2 of silver nitrate to zeolite. The method further involves allowing the reaction to cool at room temperature; and filtering and washing a resulting precipitate. Preferred Components: The zeolite comprises sodium aluminosilicate, and zeolite. The zeolite comprises zeolite powder. EXAMPLE - No suitable example given. The present method is a one-pot procedure rendered uniform size distributions of quasi-spherical silver clusters synthesized on the surfaces of cubic-like zeolite.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The anode material is graphite rod, carbon rod, carbon cloth or carbon fiber.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The electrolytic solution comprises citric acid having a concentration of 1-4 wt.% and ethylene glycol.
TECHNOLOGY FOCUS - METALLURGY - The former metal layer is made of aluminum. The barrier metal layer is made of titanium tungsten and copper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The absorber layer is made of cadmium telluride, copper indium gallium selenide and/or copper zinc tin sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method (M1) involves: maintaining the reaction mixture at a temperature of at least 200 (preferably at least 250) degrees C in first step. Preferred Components: The reaction mixture further comprises a second metal-containing precursor; ligand precursor. The second nitrogen-containing precursor is different from the first nitrogen-containing precursor. The second nitrogen-containing precursor is the first nitrogen-containing precursor. The solvent is a high-boiling point solvent. EXAMPLE - In a 50 ml flask, aluminum iodide (0.25 mmole), zinc-stearate (0.75 mmole), sodium dicyanamide (5.00 mmole), hexadecanethiol (2 mmole), and octadecene (25 ml) were stirred and heated at 255 degrees C for 1 hour and 15 minutes. At this time, sodium amide (10 mmole) was added quickly in powder form. The reaction was then allowed to proceed with small aliquots being taken at various times and diluted with toluene. The resulting solutions were analyzed by a Flouromax-4 spectrofluorometer and these solutions showed a change in the peak emission over the course of the reaction. The resulting nanocrystals were then be purified by a multi-step centrifugation process of the reaction mixture. Initially, the nanocrystal mixture was centrifuged and the resulting liquid decanted into new centrifuge tubes leaving the side-products as a pellet. This solution was mixed with acetonitrile and toluene to flocculate the nanocrystals, prior to further centrifugation. The liquid was decanted off and the pellet dried under reduced pressure. The nanocrystals were then suspended in toluene and centrifuged to remove any remaining contaminants. A repeat of the flocculation/suspension steps were then be performed or the nanocrystals used in this form. The photoluminescent quantum yield of the nanocrystals was measured as compared to a Nile red solution in 1,4-dioxane.
TECHNOLOGY FOCUS - METALLURGY - Each respective titanium dioxide dielectric layer includes at least one dopant selected from the group including phosphorus, vanadium, niobium, tantalum, molybdenum, tungsten and combinations thereof, or from the group including cobalt, nickel, iron, manganese, magnesium and combinations thereof.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The barrier layer includes a bottom most layer comprising a metal semiconductor alloy. The n-type semiconductor portion overlies the p-type semiconductor portion. The barrier layer comprises a nickel layer or cobalt layer. The nickel layer or cobalt layer is in direct contact with the exposed portions of the front side surface of the semiconductor substrate or separated at least in part from the exposed portions of the front side surface of the semiconductor substrate by a nickel silicide layer. The semiconductor substrate is a component of a solar cell.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The copper containing layer comprises copper (preferred) or its alloy and/or at least an impurity. The impurity comprises carbon (60-10000 ppm), oxygen (10-10000 ppm), chloride (60-10000 ppm) and/or sulfur (10-10000 ppm).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Layer: The semiconductor (S1) or metallic element (M1) of amorphous layer (A) is diffused in amorphous layer (B). Semiconductor contained in layer (B) is oxidized. The electronegativity of semiconductor (S1) or metallic element (M1) is more than electronegativity of semiconductor (S2) or metallic element (M2). The melting point of semiconductor (S1) or metallic element (M1) is more than melting point of semiconductor (S2) or metallic element (M2). The amorphous layer (A) has silicon germanium oxide layer (SixGeyO(1-x-y)) (16).x,y=not defined.N.B. Not defined. The dielectric material layer consists of silicon dioxide layer (14). The amorphous layer (B) consists of silicon oxide layer (18). The silicon oxide layer is formed by carrying out reactive sputtering of silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The manufacture of intermediate reflector layer further involves feeding phosphine gas as dopant gas, and argon into the process atmosphere. The flux ratio of hydrogen and silicon hydride is 300 or more. The total content of oxygen in the layer is 50% or more. The tandem solar cell comprises a-silicon and mu c-silicon p-i-n junction. Preferred Properties: The intermediate reflector layer has thickness of 60-80 nm, and index of refraction for light with wavelength of 600 nm of 1.7.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass substrate with alkali barrier layer is alkali glass containing an alkali metal oxide. The glass substrate with alkali barrier layer further comprising laminated multilayer film of titanium dioxide layer, or titanium dioxide layer and silicon dioxide layer is provided between the alkali barrier layers. The glass substrate with transparent conductive oxide film has laminated tin oxide film and fluorine dope tin oxide film as transparent conductive oxide film on the alkali barrier layer.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Layers: The silicon dioxide layer is provided between the alkali barrier layers, or the surface of the alkali barrier layer. Preferred Properties: The alkali barrier layer has film thickness of 2-50 nm. The local minimum of the molar ratio of tin with respect to sum total of silicon and tin in mixed oxide is 0.1 or less. The maximum value of the molar ratio of tin with respect to sum total of silicon and tin in mixed oxide is 0.05-0.7.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The absorption layer (120) is made of either cadmium selenide (CdSe), zinc oxide (ZnO), zinc sulfide (ZnS), cadmium sulfide (CdS), cadmium telluride (CdTe) or lead selenide (PbSe).
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass contains magnesium oxide (0-20), calcium oxide (0-20), strontium oxide (0-20), barium oxide (0-20), zinc oxide (0-20) and/or titanium dioxide (0-10). The total amount of bismuth oxide, lanthanum oxide, gadolinium oxide, tantalum oxide, titanium oxide, niobium pentoxide and tungsten oxide in glass is 0-20 %mass. The total amount of cerium oxide, praseodymium oxide, neodymium oxide, europium oxide, terbium oxide, erbium oxide, yttrium oxide, and ytterbium oxide in glass is 0-5 %mass. The glass has iron oxide content of 1000 ppm or less. The glass does not contain lead component, arsenic component and fluorine component. The glass has thickness of 10 mm and internal transmittance of 90% or more at wavelength of 400 nm and 60% or less at wavelength of 300 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicon surface is hydrogen-terminated surface. The silicon base material contains mono crystal, polycrystals or amorphous silicon. The reducing environment used in the manufacture of optical induction charge-separation element is atmosphere containing reducing agent, preferably hydrazine and plasma-type substance, preferably hydrogen-argon plasma.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent contained in the graphene oxide is methanol or methanol aqueous solution. The graphene oxide layer contains graphene oxide with oxygen content of 5 %mass or more, preferably 5-50 %mass. Preferred Property: The graphene oxide layer has thickness of 0.3-20 nm.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The hydrocarbon-type copolymer has glass transition temperature of 250-400 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal oxide (F) contains manganese oxide, iron oxide, copper oxide and cobalt oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The perylene-type black coloring agent (E) has light permeability of 3% or more with wavelength of 300-400 nm, and 20% or less with wavelength of 400-700 nm. The perylene-type black coloring agent (E) has infrared rays absorption peak in absorption position of 1587-1592 cm-1 and 805-810 cm-1.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The hardened material of black hardening resin has Lasterisk value of 25 or less. The hardened material has light permeability of 2.8% or more with wavelength of 400 nm in film thickness of 20 mu m.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive layer is formed using adhesive composition containing an acryl-type polymer as a base polymer. Preferred Process: When the electroconductive adhesive tape is subjected to thermo-cycle test, the maximum resistance value measured in first cycle is 1 omega or less and the maximum resistance value measured in two-hundredth cycle is 5 times or less of maximum resistance value measured in the first cycle. The thermo-cycle test is carried out by sticking electroconductive adhesive tape to silver plating, in which the area of a sticking portion is 30 mm2, providing constant current of 2A through the electroconductive adhesive tape and silver plating containing the sticking portion, maintaining the temperature at -40 degrees C for 10 minutes after temperature-falling in a tank from 25 degrees C to -40 degrees C, heating until 85 degrees C, maintaining the temperature for 10 minutes, reaching the temperature fall to 25 degrees C by setting thermostat set, cooling, heating and measuring the resistance value of the sticking portion. Preferred Properties: A terminal portion of the adhesive layer has total area of 0.15-5 mm2. The adhesive layer has thickness of 10-100 mu m. The surface exposure rate of the electroconductive filler in the adhesive layer surface is 2-5%. Preferred Composition: The content of the electroconductive filler in the adhesive tape is 25-250 parts mass with respect to the total solid (100 parts weight) of the adhesive layer (excluding electroconductive filler).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic layer is formed with silicon nitride, silica, silicon oxynitride or aluminum oxide. The surface of the support has 10 or more foreign material (16) per 1 cm2.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The coating material contains 0.005-7 wt.% of surfactant and organic solvent. The organic compound of organic layer and intermediate layer coating material is (meth)acrylate-type organic compound, which is crosslinked by photopolymerization reaction. Preferred Property: The viscosity of the coating material coated on the support is 0.8-10 cP.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The coating material is coated on the support by die-coat method. The support is derived from the support roll formed by winding the elongate support in roll shape. The derived support is conveyed in longitudinal direction and then coated with organic coating material, dried and hardened to form organic layer. The support having organic layer is wound in roll shape to obtain support/organic layer roll. The support having the organic layer is conveyed in longitudinal direction and then coated with inorganic layer to form the functional film. Then the support having the inorganic layer is wound in roll shape. The functional film has a protection organic layer (24) on uppermost layer. Alternately, the functional film has one or more intermediate organic layer-intermediate inorganic layer laminated structure on inorganic layer.
TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The acyl group is propionyl group. The substitution degree of propionyl group is 0.5-2.5, and the crystallinity degree is 30-90%. The cellulose nanofibers are a mixture of fibers having differing substitution degree of propionyl group and crystallinity degree. Preferred Method: The film is stretched or subjected to heating-calender process and stretching after extrusion.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The carbon double bond content in solid content of coating liquid obtained by removing solvent from the coating liquid is 1.8-50. The total amount of protons contained in the solid content of coating liquid is 0.1-8 ppm, when the total spectrum area of the proton is observed. The coating liquid further contains toluene.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The tackifying resin has number average molecular weight of 800-1600. The adhesive sealing film has storage elastic modulus minimum value of 1x 109 Pa at -20 degrees C to 50 degrees C. The polyisobutylene has number average molecular weight of 10000 or more and 1 million or less. Preferred Composition: The tackifying resin is chosen from rosin-type resin, terpene type-resin, alicyclic-type petroleum resin and/or aromatic petroleum resin. The total amount of protons contained in the adhesive sealing film is 0.1-8 ppm, when the total spectrum area of the proton is observed. The adhesive sealing film has carbon double bond content of 1.8-50 calculated by ratio of amount of protons bonded with carbon which is double bonded with respect to total amount of protons, when the 1H- nuclear magnetic resonance measurement of the adhesive sealing film is carried out.
TECHNOLOGY FOCUS - BIOTECHNOLOGY - Preparation (Disclosed): The isolated or recombinant nanowire peptide is prepared by standard recombinant method. Preferred Peptide: The nanowire peptide assembles into an electrically conductive pilus. The nanowire peptide is fused to fusion partner peptide, which contains chitin-binding domain (CBD). The nanowire peptide is interfaced with a substrate, preferably gold. Preferred Gene: The isolated host cell comprises a pilin polymerase (pil)T gene and/or a pilB gene from a geobacteraceae bacterium, where the cell is a geobacteraceae bacterium. The host cell does not have a pilT gene. The host cell is Escherichia coli. Preferred Component: The pilin within each of the one or more conductive pili comprises the above peptide. The conductive pili are expressed in biofilms.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Device: The device is chosen from antenna, attenuator, battery, brush, capacitor, condenser, conductor, circuit, electrode, fuel cell, generator, filter circuit breaker (fuse), inductor, coil, nanowire array, particle collector, precipitator, reactor, rectifier, relay, resistor, solar energy collector, spark generator, suppressor, and terminal. The device is adapted for soluble metal removal. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Metal or metal oxide contains aluminum, nickel, copper, silver, gold and/or palladium. The inorganic acid is nitric acid, hydrochloric acid, and/or sulfuric acid. Preferred Process: The bamboo charcoal is subjected to high-temperature process at 1200 degrees C or more, during manufacture of metal or metal oxide-coated carbon material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The wide-band gap semiconductor is silicon carbide, gallium nitride group material, or diamond.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method comprises preparing platinum (Pt) salt solution and cocatalyst salt solution into a mixture solution; adding carbon carrier and nano-titania material into the mixture solution by stirring at 0-25 degrees C; stirring for 0.3-2 hours and slowly dropping 0.5 mol/L sodium carbonate (NaCO3) solution into the mixture solution after stirring for 0.3-2 hours to adjust the pH at 7-12; stirring for 0.5-1 hour; maintaining the mixture solution for 0.5-4 hours under nitrogen protection and UV or visible light irradiation; filtering; washing for 3-4 times with deionized water; and drying the product for 2 hours in vacuum at 60 degrees C. The direct methanol fuel cell platinum-based anode electrocatalyst has an average particle size of 2-10 nm and main active component comprising Pt0 and Pt2+. The mass ratio of molybdenum, titanium dioxide, and carbon carrier in the catalyst is 2:3:100, 4:3:100, 6:3:100, 8:3:100, and 10:3:100. The Pt salt solution concentration is 0.005-0.05 mol/L. The cocatalyst salt solution concentration is 0.005-0.01 mol/L. The volume ratio of Pt salt solution to cocatalyst salt solution is 5:1-1:1. The UV wavelength is 225, 300, or 375 nm. The visible light wavelength is 400-700 nm. The molybdenum salt of the catalyst is molybdenum chloride hexahydrate. The titanium dioxide is anatase titanium dioxide nanopowder, rutile titanium dioxide nanopowder, mixed titanium dioxide nanopowder of anatase and rutile, titanium dioxide nanorod, or titanium dioxide nanotube. The carbon carrier material is active carbon XC-72 or carbon nanotube. The titanium dioxide nanomaterial is doped and non-doped titanium dioxide, where doping element is iron, zinc, tin, cerium, manganese, nitrogen, sulfur, carbon, and chlorine.
TECHNOLOGY FOCUS - POLYMERS - Preferred Method: In the step (d), the dipping solution comprises salt type perfluorinated sulfonic resin solution and the heating is carried out at 120 degrees C for 60 seconds. Preferred Components: The polyimide substrate film has a thickness of 20 mu m, hole diameter of 5-200 mu m, and porosity factor of 1-50%.The impregnated resin film has a thickness of 25 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal diffusion barrier layer comprises nickel (Ni) cobalt (Co), phosphorus, and/or sulfur. The diffusion barrier layer includes nickel-cobalt alloy, Co, and Ni. The multi-metal semiconductor alloy layer comprises Ni and Co as the first elemental metal and iron, platinum, palladium, tungsten, molybdenum, silver, tin, zinc or ruthenium as the second elemental metal.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Component B is ammonia of supercritical fluid state. Chalcopyrite-type compound semiconductor is represented by formula LMX2 (i), formula (L1)(M1)(X1)2 (ii), or formula (L2)(M2)(X2)2 (ii). Compound semiconductor particles are copper-indium-gallium-selenide (Cu(In,Ga)Se2) or copper-indium-selenide (CuInSe2). Elemental metals and/or component A are copper halide, halogenated indium, gallium halide, and/or selenium unit or selenium compound. Compound semiconductor contains chalcogenide consisting of cadmium (Cd), zinc (Zn), lead (Pb), silver (Ag), antimony (Sb), and/or bismuth (Bi) and sulfur (S), selenium (Se), and/or tellurium (Te). Compound semiconductor contains Zn, Ga, In, and/or Cd and phosphorus (P) and/or arsenic (As).L=group IB element;M=group IIIB element;X=group VIB element;L1=Cu, Ag, and/or Au;M1=Al, Ga, and/or In;X1=S, Se, and/or Te;L2=Cu;M2=Ga and/or In;X2=Se.Preferred Processes: Component A is made to react by heating and under-pressurized in atmosphere containing ammonia gas.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of sulfur in the unavoidable impurities contained in the conductor is 0.003 %mass or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The nitrogen containing atmosphere is N2 or NH3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The amount of magnesium oxide and aluminum oxide is 5-90 %mass with respect to 100 %mass of inorganic compound thin film. Preferred Property: The film thickness of inorganic compound thin film is 5-500 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of nitrogen-containing compound, acidic solvent and fluorine compound is 0.1-10 wt.%, 30-96 wt.% and 0.1-11 wt.%. The nitrogen-containing compound is chosen from nitric acid, nitrous acid, over nitrate, ammonium nitrate and potassium nitrite, preferably nitric acid, ammonium nitrate and potassium nitrite. The acidic solvent is chosen from phosphoric acid, sulfuric acid and methanesulfonic acid. The fluorine compound is chosen from hydrofluoric acid, ammonium fluoride and alkali-metal fluoride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The etching liquid further contains an acetic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nonlead glass composition further contains alumina (less than 5), 5 wt.% or less of magnesium oxide, calcium oxide, strontium oxide and barium oxide, and solvent and/or binder. The alkali metal oxide is preferably lithium oxide (10 or less), sodium oxide (20 or less) or potassium oxide (20 or less). Preferred Property: The thermal expansion coefficient of nonlead glass composition at 50-350 degrees C is (70-100)asterisk10-7 divide by ( degrees C), and softening point of 500-650 degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The anti-reflection film and passivation film are formed into multi-layered thin film made of semiconductor oxide, semiconductor nitride, alumina, and titanium.
TECHNOLOGY FOCUS - METALLURGY - The fuel droplets consist of xenon (Xe), lithium (Li) or tin (Sn).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The connector is provided with radiation reflective material e.g. dialuminum dioxide, aluminum oxide and titanium oxide.    TECHNOLOGY FOCUS - METALLURGY - The connector comprises a film strip made of copper and aluminum. The connector is provided with silver and aluminum foil.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The stroke cords and rollers in continuous furnace are made of aluminum oxide, silicon oxide, ceramic, glass or glass fiber, carbon fiber material, or composite materials.    TECHNOLOGY FOCUS - METALLURGY - The front and rear contact structures are produced by applying the alloys from titanium, palladium, silver, chrome, vanadium, nickel, aluminum or copper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameter: The crystallography direction of monocrystalline silicon area is same as crystallography direction of lower seed crystal. The crystallography direction of seed crystal is monocrystalline silicon (100), (110) or (111). Preferred Process: The process of loading solid-state silicon raw material above seed crystal layer involves loading small particle silicon raw material above seed crystal layer to fill gap of seed crystal and gap between seed crystal layer and side wall of container, and loading large volume silicon raw material above small particle silicon raw material. Preferred Component: The container is quartz crucible, silicon carbide crucible or silicon nitride crucible.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polysilicon ingot contains successive large-sized monocrystalline silicon area.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method given. Preferred Compound: The compound (I) is compound of formula (II).Ar1-Ar4=aryl (optionally substituted);Ar5=aryl or arylene group (both optionally substituted);D'=group of formula (III);k=0 or 1;andc1-c5=0-2.Provided that: all c1-c5 are not 0 at the same time.    TECHNOLOGY FOCUS - POLYMERS - Preferred Film: The charge transporting film further comprises thermal radical generator or its derivative. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Metal nanoparticles are noble metal nanoparticles. Metal nanoparticles are gold, platinum, palladium, nickel, cobalt, manganese, chromium, silver, copper, iron, ruthenium, rhodium and/or zinc, or their oxide. The gas is hydrogen and nitrogen. Metal nanoparticles are iron-type catalyst, and whose product is ammonia. Preferred Property: The size of composite complex is 1-500 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The average thickness of polymer coordination polymer layer until it reaches metal nanoparticles from the surface, is 1-200 nm. Preferred Component: The porous coordination polymer is a nitrogen-containing aromatic compound which can be coordinated through metal ion, ligand having carboxyl group and nitrogen atom in the ring. Preferred Process: A gaseous reaction material and 95% or more of metal nanoparticles are contacted with the composite complex through porous coordination polymer layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The alcohol reductant is ethylene glycol, propylene glycol or glycerol. The organic solvent is ethylene glycol, propylene glycol glycerol or acetone. The volume ratio of the alcohol reductant and acetone is 3:1-1:3.
TECHNOLOGY FOCUS - METALLURGY - The catalyst is decomposition catalyst such as platinum catalyst, silver catalyst, palladium catalyst, gold catalyst, rhodium catalyst, ruthenium catalyst and iridium catalyst.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The multi-junction photovoltaic device further comprises light-absorbing layer (53) of gallium arsenide material including photocarrier separating p-n junction, light-absorbing layer (54) of indium-gallium phosphide including photocarrier separating p-n junction, light-absorbing layer (55) of aluminum-gallium arsenide or aluminum-indium-gallium phosphide including photocarrier separating p-n junction. The set of layers are provided on a substrate (50).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The group IV semiconductor material layer comprises germanium. The group IV semiconductor material layer comprises silicon-germanium or silicon-germanium-tin. The first group III-V semiconductor material comprises group III atoms that are aluminum (Al), gallium (Ga) and indium (In), and the group V atoms that are phosphorus (P), arsenic (As), antimony (Sb) and bismuth (Bi). The first group III-V material comprises indium gallium arsenide phosphide, aluminum gallium arsenide, aluminum gallium arsenide phosphide, gallium arsenide, gallium arsenide phosphide, aluminum arsenide, indium gallium phosphide, indium gallium arsenide, aluminum indium gallium arsenide and aluminum indium gallium phosphide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The particulate aluminum is present in a proportion of 50-80 wt.%, based on total aluminum paste composition. The glass frit is selected from lead-containing glass frits with a softening point temperature of 571-636 degrees C and containing (wt.%) PbO (53-57), SiO2 (25-29), Al2O3 (2-6) and B2O3 (6-9), lead-free glass frits with a softening point temperature of 550-611 degrees C and containing SiO2, Al2O3 (greater than 0-7 wt.%) and B2O3 (2-10 wt.%), lead-free glass frits containing SiO2 (0.5-15 wt.%), Al2O3 (0.3-10 wt.%) and/or Bi2O3 (67-75 wt.%). The antimony oxide is Sb2O3.
TECHNOLOGY FOCUS - POLYMERS - The sacrificial layer is polymer-based high molecular weight material. The stamp is elastomeric polymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The carbon-silicon compound is manufactured from silica-containing material and carbon-containing material. Preferred Composition: The silica-containing material contains plant-derived silica or silica-alumina. The carbon-silicon compound is silicon carbide. Preferred Properties: The specific surface area of the silica-containing material and carbon-silicon compound is 10 m3/g or more and 5 m3/g or more, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metallic oxide, metal nitride, semiconductor oxide, semiconductor nitride, silica, silicon oxide, silicon nitride, silicon oxynitride, amorphous silicon, microcrystalline silicon and diamond are formed on substrate using atomic layer deposition process.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The gas openings are arranged on the substrate plane equidistantly along an oval, an ellipse, a circle, or a circumference of the reaction chamber. The thin layer solar cell substrate exhibits a maximum extension along the substrate surface, which is greater than 80 cm, 100 cm, 140 cm, 200 cm or 300 cm. A rectangular thin layer solar cell substrate is used. The separating device exhibits gas openings of at least 10, 15, 50 or 100. An opening polygon is stretched by the gas openings, which completely surrounds the thin layer solar cell substrate and exhibits a polygonal surface, which is at least 10%, 15%, 20% or 30% greater than the surface of the substrate. A chamber wall element (4) is arranged in the reaction chamber adjacent to a substrate edge of the thin layer solar cell substrate such that a wall surface of the chamber wall element lies in the substrate plane. The chamber wall element is removable from the reaction chamber. Preferred Method: The reaction gas is eliminated from the reaction chamber through the gas openings serving as outlet openings before carrying out the deposition reaction, and a further reaction gas is taken into the reaction chamber through the gas openings serving as inlet openings so that a further reactant gas from the further reaction reacts with the reactant to form the deposition layer on the substrate surface as a reaction product during the deposition reaction. The deposition process comprises an atomic layer deposition, preferably a plasma assisted atomic layer deposition. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electroconductive particles contain copper, silver, nickel, gold and/or tin. The surface polar-leading distribution line has thickness of 0.01-150 micro m, and contains silver. The tab wire contains copper. The photovoltaic cell substrate is silicon, glass, copper-indium-gallium selenide, aluminum nitride, and/or sapphire substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The zirconium product has thickness of less than 10 mm, preferably less than 2 mm, and porosity of more than 25 volume%. Preferred Composition: The zirconium product preferably contains more than 94 %mass of zirconium silicate, and further contains zirconium oxide and silicon oxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polybasic acid is terephthalic acid. The resin composition further contains solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The polyester has hydroxyl value of 30 or less, and weight average molecular weight of 600-4000. Preferred Composition: The resin is polycarbonate resin, polyester resin or polyarylate resin.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The cellulose nanofibers are in the form of a mixture with differing propionyl-group substitution degree and crystallinity degree. Preferred Method: After film-formation, heating-calender process and stretching process are carried out.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The amount of polyaluminum chloride is 2-20 mass% with respect to adsorption agent.
TECHNOLOGY FOCUS - METALLURGY - The device is provided with a reflecting surface formed of silver, aluminium, stainless steel, titanium, nickel, cadmium, chromium, manganese, copper, zinc, germanium, tin, magnesium, gallium, gold, platinum or palladium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The composite oxide comprises an apatite-type compound, where the composition ratio of the element A1 to the element B1 in the apatite-type compound is 4/3-5/3. The apatite-type compound is in the form of a polycrystal, and a c-axis of each crystal grain in the polycrystal is parallel to a thickness direction of the composite oxide film. Preferred Method: The stack is prepared in the second process in such a manner that the composite oxide film produced in the third process has a thickness of 50-500 nm. The repetition number ratio between the step of supplying the first material and the step of supplying the second material in the first process is selected in such a manner that the composite oxide is an apatite-type compound, and a composition ratio of the element A1 to the element B1 in the apatite-type compound is 4/3-5/3. The heat treatment is carried out at 800-1200 degrees C in the third process. The substrate comprises an silicon(100) substrate (12), a cermet substrate containing nickel and a ceramic, or a ceramic substrate containing a perovskite-type composite oxide. The first material, the second material, and the oxidant are flowed only in one direction parallel to an upper outer surface of the substrate. The cermet substrate contains a cermet of nickel and yttria-stabilized zirconia, nickel and scandia-stabilized zirconia, nickel and yttrium-doped ceria, nickel and gadolinium-doped ceria, or nickel and samarium-doped ceria, and the perovskite-type composite oxide is of formula (BaySr1-yCozFe1-zO3), (LaySr1-yCoO3), or (LaySr1-yCozFe1-zO3).y, z = not defined. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The molar ratio of (III) to (II) is 0.5-20. The polymer having (I) is a perfluoropolymer, where hydrogen atoms bonded to carbon atoms in the main chain and side chains are all substituted by fluorine atoms. EXAMPLE - A polymer containing 1.1 mmole/g of a sulfonyl group of formula (-SO2F), obtained by polymerizing tetrafluoroethylene with 2-(bis(difluoromethyl)-fluorosulfonyl-4-oxidanyl)-1,1,1,2,3,3-hexafluoro-3-(1,2,2-trifluorovinyloxy)propane, was contacted with fluorine gas and fluorinated to obtain a stabilized polymer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ester-bonded alicyclic hydrocarbon group of the component (B) is chosen from adamantyl group, norbornyl group, isobornyl group, dicyclopentanyl group, and cyclohexyl group. The polar group of the (meth)acrylate compound contained in the component (C) is chosen from a hydroxyl group, epoxy group, glycidyl-ether group, tetrahydrofurfuryl group, isocyanate group, carboxyl group, alkoxy silyl group, phosphate ester group, lactone group, oxetane group, tetrahydropyranyl group, and amino group. The content of component (A), (B) and (C) is 10-90 %mass, 5-89.5 %mass and 0.5-50 %mass, respectively. The content of the component (D) is 0.01-10 parts mass with respect to 100 parts mass of component (A), (B) and (C).    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The component (A) contains alkyl (meth)acrylate having more than 12C alkyl group chosen from hydrogenated polybutadiene dimethacrylate and hydrogenated polyisoprene dimethacrylate, and/or polyalkylene glycol (meth)acrylate having number average molecular weight of 400 or more.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass preferably comprises silica (50-70), alumina (5-11), boria (0-1), lithia (0-1), sodium oxide (10-18), potassium oxide (1-6), magnesium oxide (0-12), calcium oxide (0-2.5), and phosphorus pentoxide (0-10). The total content of magnesium oxide and calcium oxide is 5-12 mol%. The molar ratio of total content of alumina, sodium oxide, and phosphorus pentoxide with respect to silica content is 0.2-0.5. The molar ratio of total content of boria and sodium oxide with respect to silica content is 0.15-0.27. The molar ratio of phosphorus pentoxide and silica is 0-0.1. The molar ratio of alumina and silica is 0.07-0.2. The molar ratio of sodium oxide and alumina is 1-2.3. Preferred Properties: The tempered glass has a surface roughness of 1 nm or less with respect to etched surface. The compressive-stress value of the stress layer is 200 MPa or more and the thickness is 10 micro m or more. The tempered glass has an internal tensile stress of 1-200 MPa, a liquidus temperature of 1250degree C or less, a liquid-phase viscosity of 104 dPa.second or more at 1280degree C and 102.5 dPa.second at 1620degree C, and a density of 2.6 g/cm3 or less.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The etching liquid contains hydrofluoric acid, hydrochloric acid, sulfuric acid, nitric acid, ammonium fluoride, sodium hydroxide, and/or ammonium hydrogen fluoride.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent is fluorine-containing organic solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The perfluoropolyether-type-gel hardened material is gel-like hardened material of hardenable perfluoropolyether-type-gel composition containing linear perfluoropolyether compound (a1) having perfluoropolyether structure including repeating unit of formula: -CaF2aO- in principal chain and at least two alkenyl groups in a molecule, polyfluoromonoalkenyl compound (a2) having an alkenyl group in a molecule, and perfluoropolyether structure in principal chain, organosilicon compound (a3) having at least two hydrogen atoms bonded with silicon atom in a molecule and hydrosilylation reaction catalyst (a4), and the hardenable perfluoropolyether-type-gel composition further contains fluorocarbon-containing compound of formula: A-O-(CF2CF2CF2O)d-A (I), A-O-(CF2O)f-(CF2CF2O)g-A (II) or A-O-(CF2O)h-(C(-CF3)CF2O)l-A (III) (0.1-50 parts mass) with respect to 100 parts mass of linear perfluoropolyether compound (a1) and polyfluoromonoalkenyl compound (a2). The content of organosilicon compound (a3) is 1-300 parts mass with respect to 100 parts mass of linear perfluoropolyether compound (a1) and polyfluoromonoalkenyl compound (a2). The molar quantity of sum total of hydrosilyl group (SiH) in organosilicon compound (a3) is 0.2-2 mol with respect to 1 mol of alkenyl group of linear perfluoropolyether compound (a1) and polyfluoromonoalkenyl compound (a2).a=1-6;A=CeF2e+1;e=1-3;d=1-500;andf-h,i=1-300.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The hardenable perfluoropolyether-type-gel composition is dissolved in organic solvent, and crosslinked by hydrosilylation addition reaction to form hardened material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I) comprises stirring metal salt (0.05-5 mmol) in deionized water (2-40 ml) until it is completely dissolved, adding magnetite nanoclusters (0.02-1 g), stirring to uniformly mix, adding 5-25 ml of aqueous solution of strong base and/or weak acid (0.2-3 mol/l), stirring to mix uniformly to obtain solution A, heat processing solution A at 140-220 degrees C for 4-60 hours, naturally cooling to room temperature, separating solid, and cleaning to obtain the nanocomposite material. Preferred Components: The metal salt is nitrate, sulfate and/or chloride. The metal ion in metal salt is nickel (II) ion, bismuth (III) ion, lanthanum (III) ion, cadmium ion, cupric ion, and/or ferric ion. The strong base solution is an alkali metal solution and/or alkaline earth metal hydroxide solution. The strong base weak acid salt is a mixed solution of acetate and/or carbonate. Preferred Method: The heat treatment reaction is carried out in an automatic pressure relief stainless steel high pressure digestion tank. The separation process utilizes magnetic separation or centrifugal separation.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The composite oxide is perovskite, spinel and/or fluorite. The single oxide is oxides of scandium, titanium, vanadium, manganese, iron, cobalt, nickel, copper and/or zinc.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The grain size of the silica sol is 10-20 nm, where the density is 1.15 g/cu.cm, the content of silicon dioxide is 25%, the pH value is 8-10. The distribution range of the activated carbon is 2-50 nm, and the specific surface of the carbon fiber is 800 square/meter/g. The tank is the stainless steel pressure-proof tank body and the interior wall in the tank is thermally sprayed with nylon thermal insulating layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dielectric layer is made of silicon oxynitride.    TECHNOLOGY FOCUS - METALLURGY - The metal contact grids are made of aluminum and silver and silver-aluminum alloy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The graded buffer layer composition comprises graded silicon germanium. The second solar subcell comprises gallium arsenide phosphide or other III-V material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The lower panel is mounted with solar cells selected from the group consisting of crystalline silicon, polycrystalline silicon, copper indium gallium diselenide, germanium, gallium indium nitride, and gallium indium arsenide nitride.    TECHNOLOGY FOCUS - METALLURGY - The upper panel is mounted with the solar cells made from a group of gallium arsenide, indium gallium phosphide, gallium arsenide phosphide, amorphous silicon, cadmium telluride and cadmium zinc telluride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The n-type dopant of the first doped domain comprises palladium, arsenic and/or antimony. The p-type dopant consists of boron, aluminum, gallium and/or indium. The dielectric layer present in contact with the front surface comprises silicon oxide, silicon nitride and/or silicon oxynitride.
TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Cell: In the solar energy cell, the conductive paste comprises silver powders, glass frits and organic vehicles. The pigments comprise organic pigments, inorganic pigments, synthetic pigments or any combinations. The organic pigments comprise monazo, diazo, anthraquinone, indigoid phthalocyanine or any combinations. The inorganic pigments comprise titanium dioxide, limonite, malachite, zinc oxide, manganese dioxide or any combinations. The anti-reflection layer comprises a set of different color sections, and where each electrical conductive channel comprises a conductive paste and pigments to enable a color of the electrical conductive channel to be substantially the same as a color of a corresponding one of the different color sections within which each electrical conductive channel is disposed.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The target is obtained from zinc oxide powder having average particle diameter of 0.1-5 mu m, tin oxide powder and binder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The target is obtained from zinc oxide powder having average particle diameter of 0.1-5 mu m, alumina powder and binder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The target is obtained from zinc oxide powder having average particle diameter of 0.1-5 mu m, silicon dioxide powder and binder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The target is obtained from zinc oxide powder having average particle diameter of 0.1-5 mu m, silicon monoxide powder and binder.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The tempered glass board has polished surface. Preferred Composition: The tempered glass board does not contain alkali metal oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: Average particle diameter of titanium oxide particle is 200-800 (400-600) nm. Preferred Processes: Manufacture of spherical titanium oxide particle involves controlling size of particle by changing wavelength, laser fluence, and irradiation time of pulsed laser light. Particle size is controlled by using aqueous solvent, organic solvent, ionic liquid, or supercritical fluid as liquid phase and changing raw material concentration in liquid phase.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The component in the composition has a columnar intermediate phase. The composition contains 2 or more components having same chemical structure and different alkyl chain length. A ligand and its metal complex which can form the discotic liquid crystal are contained in the composition. The composition contains 2 or more components with different absorption in visible light region. The composition contains a phthalocyanine compound and porphyrin compound. The compound shows carrier mobility of more than 10-1 cm2V-1/second.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The UV transmittance material comprises a glass material selected from a group of quartz glass, high silicic acid glass, borosilicate glass, amino silicic-acid glass, alkali free glass, lead glass, barium glass, phosphorus silica glass, fluoride glass, lanthanum glass, transparent glass ceramics, heat-absorbing glass, and spin-on glass.    TECHNOLOGY FOCUS - METALLURGY - The UV absorption layer is formed from a material selected from a group consisting of magnesium, aluminum, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, Yttrium, molybdenum, Rhodium, tin, and hafnium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The plasma film contains silicon, and boron, aluminum, phosphorus or arsenic. Preferred Process: The plasma is obtained by electrodissociating gas containing hydrogen.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred : The temperature-responsive electrolyte is used in the state of aqueous solution or solid-phase. The system contains aqueous solution of temperature-responsive electrolyte. The system includes portion (A) of system having temperature less than the phase transition temperature of temperature-responsive electrolyte, and portion (B) of system having temperature more than the phase transition temperature of temperature-responsive electrolyte. The system having temperature less than the phase transition temperature of temperature-responsive electrolyte, and temperature more than the phase transition temperature of temperature-responsive electrolyte, are mutually connected such that ion is movable. The temperature-responsive electrolyte has a basic group.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The median particle diameter of the silicon carbide particles is preferably 6-10 mu m. The silicon carbide particles have average sphericity of 0.8-0.94 mu m, preferably 0.8-0.92 mu m. The substrate is prepared using silicon substrate raw plate having thickness of 120-200 mu m, preferably 160-190 mu m. The silicon substrate has mechanical damage layer having thickness of 3-10 mu m, preferably 4-8 mu m. The substrate has ten point height of irregularities of 2-4 mu m, preferably 2-2.5 mu m. Preferred Composition: The silicon carbide particles comprise 70-100% of 6H silicon carbide particles.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The corroding process is taken place by acidic etching solution comprising hydrofluoric acid, nitric acid or surfactants i.e. particular acetic acid. The masking process is eliminated by alkaline solution e.g. potassium hydroxide, sodium hydroxide or organic solvent e.g. acetone or diethylether.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The polyimide film is prepared by spreading a solution obtained by mixing dehydrating agent and imidation agent with the polyamic acid on a support. Preferred Composition: The number-of-moles of dehydrating agent and imidation agent with respect to number-of-moles of amide group in the polyamic acid is 0.01-10, respectively. Preferred Condition: The annealing process is carried at 180-330 degrees C. The annealing time is calculated by relation: annealing time (in minutes) greater than or equal to annealing temperaturex (-0.22)+59. Preferred Definitions:    R2=divalent organic group of formulae (vi) or (xiii);    R3=trifluoromethyl;and    R1=tetravalent organic group of formulae (i) or (iv).
TECHNOLOGY FOCUS - ELECTRONICS - Preferred properties: The organic-semiconductor material shows liquid crystallinity. The organic-semiconductor material is liquid-crystal material showing a liquid crystal phase of higher level than a nematic phase. The liquid crystal phases of higher level than the nematic phase of the organic-semiconductor material are phases other than N phase, SmA phase and SmC phase, preferably chosen from SmB, SmBcryst, SmI, SmF, SmE, SmJ, SmG, SmK and SmH. The side chain (S) is bonded with the charge transporting molecule unit (A) and/or cyclic-structure unit (B). When the organic semiconductor material is heated from crystal phase, phases other than N phase, SmA phase, and SmC phase appears adjacent to crystal phase. The electrode is arranged in sandwich mold in planar direction, in such a way that the charge-transporting molecule unit (A) of the organic-semiconductor material carries out a horizontal orientation or vertical orientation on electrode surface. Preferred Component: The organic-semiconductor material further has cyclic-structure unit (B), which is bonded with the charge-transporting molecule unit (A), and has pi -electronic conjugated system in a core portion. The liquid crystal cell has an indium-titanium oxide electrode and the organic semiconductor material showing liquid crystal phase.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The volatile gas comprises carbon dioxide, water and nitrous oxide and/or sulfur dioxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The grain diameter of zinc oxide, oxide of metal (M) and titanium oxide is each of 10-300 nm. The conductive film has visible light transmission of more than 80%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The volume ratio of the concentrated sulfuric acid to the concentrated nitric acid in the mixed acid is 3:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In epitaxial growing of at least one III-V group material on top of substrate or wafer of non III-V group material, the first deposited nucleation layer is formed by aluminum antimonide (AlSb) on a surface of a silicon (Si) wafer, and the second deposited bulk layer is formed by gallium antimonide (GaSb). The first deposited nucleation AlSb layer is provided for with a thickness in a range of 5 Angstrom to 50 Angstrom . The second deposited bulk GaSb layer is provided for with a thickness in a range of 5 Angstrom to 5000 Angstrom . The first deposited nucleation layer is formed by aluminum (Al). Temperature range is controlled by a thermal controller being ramped down to lower the temperature if any material being processed is sensitive to a certain temperature level. The second bulk layer is formed by aluminum antimonide (AlGaSb) and at least one III-V group material is formed by aluminum gallium arsenide (AIGaAs). The second bulk layer and at least one III-V group material comprises respective compounds of at least one of the materials from the group of materials gallium (Ga), Al and indium (In). First nucleation layer is formed by Al and other materials used in the method is a combination of materials from group III-V materials, II-VI materials, I-VIII materials, I-VI materials, VI materials, II-V materials on top of a silicon (Si) wafer. The first deposited nucleation layer is formed by AlSb with a thickness of 25 Angstrom , the second bulk layer is formed by GaSb with a thickness of 500 Angstrom , the treatment is provided for by a pressure of 3x10-8 torr at a temperature of 497 degrees C for a time interval of 20 seconds.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The substrate comprises GaAs, InP, InAs, or GaSb.    TECHNOLOGY FOCUS - METALLURGY - The top cell comprises or is composed of In1-xAlxAs1-ySby alloy (where x and y are adjusted to achieve lattice-matching with InP (preferably y is 0.15-0.3, and x is (0.4748+1.0602y) divide by (1 minus 0.1342y)). The middle cell(s) is composed of In1-a-bGaaAlbAs alloy (where a and b are adjusted to achieve lattice-matching with InP (preferably b is 0.3-0.36, and a is (0.4656-0.9806b))) when middle cell(s) is configured to have band gap of 1.14-1.35 eV; or comprises In1-a'-b'Gaa'Alb'As alloy (where b' is 0.23, and a' is (0.4656-0.9806b')) when middle cell is configured to have band gap of 1.05 eV. The bottom cell is composed of In1-d-cGadAlcAs alloy (where c and d are adjusted to achieve lattice-matching with InP (preferably c is 0-0.1, and d is (0.4656-0.9806c))). The bottom cell comprises several InGaAs quantum wells embedded into In1-d'-c'Gad'Alc'As bottom layer material (where c' is 0.05-0.1, and d' is (0.4656-0.9806c')).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The optically transparent material consists of silicon dioxide, silicon mononitride and titanium dioxide.
TECHNOLOGY FOCUS - POLYMERS - Preferred Processes: Non-hardened coating material is applied to surface of main hardened body to obtain liquid film. Preferred Compositions: Coating layer covers surface of composite layer. End surface of glass fiber is covered by resin material and coating layer. Coating layer occupies greater than or equal to 70% of end surface of glass fiber.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The parent substrate consists of gallium arsenide or aluminum gallium arsenide, indium gallium phosphorus, indium aluminum phosphorus and indium gallium aluminum phosphorus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The semiconductor substrate is treated using acid including hydrochloric acid, sulfuric acid or nitric acid, and sodium hydroxide solution, caustic potash, ammonia solution or tetramethylammonium hydroxide, and peroxide including hydrogen peroxide. The wetting agent is surfactant chosen from fluorosurfactant, Dynol (RTM: surfactant), and Zonyl (RTM: fluorosurfactant). The dopant source is aqueous solution of phosphorus acid. The content of aqueous solution of phosphorus acid is 0.04-0.2 mg/cm2, preferably 0.05-0.13 mg/cm2. The n-doped wafer contains aqueous boric acid solution. Preferred Process: The semiconductor substrate is exposed under oxidizing atmosphere containing air or oxygen. The semiconductor substrate is treated with hydrofluoric acid.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyamic acid contains 10-50% of structural unit of formula (XXXVI). The polyimide and polyimide oxazole contain 10-50% of structural unit of formula (XXXVII). Preferred Property: The in-plane/out-plane birefringence of film formed by heat processing of resin composition is 0.01 or less. Preferred Definitions:    R1=groups of formulae (IV)-(X);    R4-R79=H, halo or 1-3C monovalent organic group, in which H is optionally substituted by halo;    X3=1-3C bivalent organic group forming crosslinked structure and in which H is optionally substituted by oxygen, sulfur, halo or sulfonyl;    X4=single bond or 1-3C bivalent organic group or arylene in which H is optionally substituted by oxygen, sulfur, halo or sulfonyl;and    R2=group of formula (XIV).
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Process: A container is provided to holding solid-state silicon from the crucible. A molten metal pouring unit is provided in the crucible for pouring the molten silicon to the container. Preferred Component: The outer side of the refrigeration unit comprises the crystalline-silicon layer provided on the base material.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The crystalline-silicon layer is formed by contacting molten silicon on the surface of the base material by immersing the surface of the base material in molten silicon, spraying molten silicon on the surface of base material, heating at temperature below melting point, providing solid-state silicon in surface of base material under oxygen-containing atmosphere and nitrogen-containing atmosphere.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The device has a charge mobility of 1x 10-4 cm2/Vs.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: (II) is (IIa). The organometallic compound is: an alkyl lithium compound or lithium diorganoamide; or transition metal compound. (I) is of formula (Ia).R5 = H, halo or 1-30C organic radial (comprising alkyl, alkynyl, heteroaryl, -Sn(R6)3, -Si(R6)3, Si(OR6)3 or -B(OR7)3);R6 = alkyl or aryl; eitherR7 = alkyl or aryl; or2R7 = alkylenyl (optionally substituted) bridging the O;X1 = O, S, Se or NR8;R8 = 1-8C alkyl, perfluoroalkyl, aryl or heteroaryl;Y1 = CH, CR9 or N; andR9 = 1-18C alkyl, aryl or heteroaryl. EXAMPLE - 3,3'-Dibromo-5,5'-bis-trimethylsilanyl-2,2'-bithiophene (12 g) was dissolved in anhydrous tetrahydrofuran (THF) (100 ml) under nitrogen atmosphere and the colorless solution was cooled in acetone/dry ice bath. To this, butyllithium (20.5 ml) was added and the colorless reaction mixture became bright yellow in color. After stirring for 15 minutes N,N-dimethylcarbamoyl chloride (2.76 g) in anhydrous THF (20 ml) was added dropwise and the deep-yellow mixture was allowed to warm up. The mixture was stirred for 2.5 hours and ammonium chloride (10 g) in water (75 ml) was added carefully, and the dark orange-brown solution became intense red (almost black red). The dark red organic phase was removed, the aqueous phase was extracted with hexanes several times, and the combined organic extracts were dried over magnesium sulfate. The solvents were removed by rotary evaporation and the crude product (11 g) was purified by Kugelrohr distillation to collect bright red oil at 190 degrees C/0.25 mm mercury and some brown-orange matter was left in the original distillation flask. The product (2,6-bis-trimethylsilanyl-cyclopenta(1,2-b:5,4-b')dithiophen-4-one) was obtained as bright red solid (yield 85.8%).
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: To-be-adhered material includes silicone, sapphire, resin and glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic filler is chosen from silica, quartz, alumina, and talc. The water is warm water.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The monomer and/or oligomer having (meth)acryloyl group is formed using methacrylic acid monomer (A1) having bisphenol structure, methacrylate (A2) having an aromatic group, hydroxyalkyl methacrylate (A3) and alkyl methacrylate (A4). Preferred Composition: The mass ratio of methacrylic acid monomer having bisphenol structure, methacrylate having aromatic group and hydroxyalkyl methacrylate is 1-20:20-60:30-70, with respect to total of 100 parts mass of methacrylic acid monomer having bisphenol structure, methacrylate having aromatic group and hydroxyalkyl methacrylate. The mass ratio of alkyl methacrylate, methacrylic acid monomer having bisphenol structure, methacrylate having aromatic group and hydroxyalkyl methacrylate is 5-35:1-30:20-50:15-45, with respect to total of 100 parts mass of alkyl methacrylate, methacrylic acid monomer having bisphenol structure, methacrylate having aromatic group and hydroxyalkyl methacrylate. The ( beta )-diketone chelate and/or ( beta )-ketoester is chosen from vanadium acetylacetonate, copper naphthenate and cobalt octoate. The agent (S1) contains polymerization initiator (B). The agent (S2) contains ( beta )-diketone chelate and/or ( beta )-ketoester (C).    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive composition further contains elastomer (E). Preferred Process: Adhesive composition is formed using paraffin, polymerization inhibitor and phosphate. The adhesive composition is divided into agent (S1) and agent (S2), to obtain double component-type temporarily fixing adhesive composition.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: (I) is used in electronic devices in combination with at least one matrix material comprising ketones, phosphine oxides, sulfoxides, sulfones, triarylamines, carbazole derivatives, indolocarbazole derivatives, indenocarbazole derivatives, azacarbazoles, bipolar matrix materials, silanes, azaboroles, boronic esters, diazasilole derivatives, diazaphosphole derivatives, triazine derivatives, zinc complexes, dibenzofuran derivatives or bridged carbazole derivatives.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I), comprises reacting appropriate ligand with a metal reactant. SPECIFIC COMPOUNDS - 102 Compounds (I) are disclosed e.g. platinum complexes of formula (Ia)-(Ie).    EXAMPLE - Mixture comprising potassium tetrachloroplatinate (10 mmol), 6,6'-(9,10-dihydroanthracene-9,9-diyl)bis(2-phenylpyridine) (10 mmol), glass beads of diameter 3 mm (150 g) and glacial acetic acid (300 ml), was heated for 48-60 hours under reflux. Then the reaction mixture was worked up to obtain platinum complex of formula (Ie).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The (110) grain orientation fraction is greater than or equal to 30%. The content of chromium is 20-30 wt.%. In the oxidation-resistant ferritic stainless steel, an average grain size of grains of the surface of the ferritic stainless steel is 5-100 mm. The chromium oxide layer formed on grains having the (110) grain orientation of the surface of the ferritic stainless steel have the same grain orientation. The grain orientation of the chromium oxide layer formed on grains having the (110) grain orientation of the surface of the ferritic stainless steel is (00.1). The chromium oxide layer is chromium(III) oxide layer, where a thickness of the chromium oxide layer is 1-10 mm. The oxidation-resistant ferritic stainless steel further comprises a spinel oxide layer formed on the chromium oxide layer formed on grains having the (110) grain orientation of the surface of the ferritic stainless steel. The spinel oxide layer has a (111) grain orientation. The spinel oxide layer is chromium manganese oxide layer. EXAMPLE - Ferritic stainless steel was vacuum induction melted, and homogenized at 1200 degrees C for 24 hours by heat-treatment, forged at 1200 degrees C to a thickness of 37 mm, and hot-rolled at 1150 degrees C to prepare a sample (ferritic stainless steel including large amount of chromium), where the (110), (100) and (111) grain orientation fractions of the prepared sample (panel) were measured using electron back scattered diffraction pattern, and the mass gain over time was measured while heat-treating the sample at 800 degrees C for 500 hours.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Properties: The fine concavo-convex structure has pitch of 100-1000 nm adjoined between convex portions. The aspect-ratio of recessed portion or convex portion of fine concavo-convex structure is 0.1-2.5. The recessed portion or convex portion of fine concavo-convex structure is arranged in the shape of a hexagonal lattice in planar view. The total reflectance ((reflectance before reflectance-scratch test/reflectance after reflectance-scratch test)x 100) of resin cured material in the visible region is 60% or less.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin cured material contains at least one silicone-type additive and fluorine-type additive. The resin cured material contains 2 or less polymerizable functional groups. The cured resin contains 10-500 parts mass of urethane dimethacrylate with respect to 100 parts mass of poly(ethylene glycol) dimethacrylate. The resin cured material further contains 0-500 parts mass of N-vinyl pyrrolidone with respect to 100 parts mass of poly(ethylene glycol) dimethacrylate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The reducing agent is sodium borohydride, oxalic acid or formaldehyde.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The method comprises transferring the mixture into an oil bath after ultrasonically dispersing the carrier and the precursor and then heating up to 40-80 degrees C, dripping reduction reagent for 30 minutes and then stirring at 80-150 degrees C, refluxing the stirred mixture for 1-6 hours, adding another metal chloride precursor after cooling to 40-80 degrees C, stirring the cooled mixture and then heating to 80-150 degrees C and refluxing the mixture for 1-6 hours, cooling to room temperature, and continuously stirring the mixture for 2-12 hours. The baking step is carried out at a temperature of 200-600 degrees C for 2-6 hours. Preferred Components: The metal chloride is chloroplatinic acid, chloroauric acid, ruthenium chloride or rhodium chloride. The alcohol is ethanol, isopropanol, propyl alcohol or ethylene glycol. The volume ratio of alcohol to water is 1-5:1. The mass ratio of silicon carbide to alcohol solution is 1:50-200. The mass ratio of metal to carrier is 0.01-0.5:1, preferably 0.05-0.2:1.
TECHNOLOGY FOCUS - METALLURGY - The refractory metal layer comprises materials selected from molybdenum, tungsten, tantalum and titanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The flow path consists of cylindrical pipes made from SUS304, SUS316, SUS316L or carbon and are coated with diamond-like carbon, silicone dioxide or silicone carbide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The Si-containing gases include silane and/or disilane. The Ge-containing gases include germane and/or digermane. The film is made of Si, Ge, and/or Si-Ge alloy. The chlorine source includes hydrochloric acid and/or chlorine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The adsorbed metal ions are Pb2+. The carbon nanostructures are selected from fullerenes, single-Walled carbon nanotubes, multi-walled carbon nanotubes, and carbon nanohorns. The noble metal consists of ruthenium. The metal thin film is one of a contiguous noble metal atom monolayer and a contiguous noble metal atom bilayer. The metal thin film is one of a contiguous ruthenium atom monolayer and a contiguous ruthenium atom bilayer. The oxidizing a surface of the carbon nanostructures comprises at least one of thermal oxidation, acid solution oxidation, electrochemical oxidation, and peroxide oxidation. The adsorbed metal ions comprises at least one of Pb2+, Zn2+, Cu2+, Bi3+, Tl+, Cd2+, Ag+, Sn2+, Hg+, Sb3+, Se4+, and Te4+.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Formation of the composite anode, comprises printing electrode ink on an electrolyte surface, where the electrode ink comprises the layered perovskite ceramic and the bimetallic alloy. Preferred Method: The method further comprises oxidizing the anode to form a cubic perovskite. Preferred Components: The layered perovskite comprises praseodymium-strontium-cobalt-iron-niobium oxide composite (Pr0.8Sr1.2(Co,Fe)0.8Nb0.2O4+a), where a is delta . The bimetallic alloy comprises cobalt-iron. The anode is configured to be oxidized and comprises a cubic perovskite. The cubic perovskite comprises praseodymium-strontium-cobalt-iron-niobium oxide composite (Pr0.4Sr0.6Co0.2Fe0.7Nb0.1O3-a). The layered perovskite ceramic has a lattice spacing of less than 0.5 nm, preferably less than 0.3 nm. The cathode comprises barium-cobalt-iron-niobium-oxide composite (Ba0.9Co0.7Fe0.2Nb0.1O3-a). The electrolyte comprises lanthanum-strontium-gallium-magnesium-oxide composite (La0.8Sr0.2Ga0.83Mg0.17O3-a). EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Method: A monomer having a substituent convertible into a quaternary ammonium group is graft-polymerizing in the irradiated polymer film, and the substituent is converted into quaternary ammonium group. The substituent convertible into quaternary ammonium group is pyridyl group, imidazolyl group, primary amino group, secondary amino group, tertiary amino group, and/or haloalkyl group. The graft ratio is 15-130 wt.%. Preferred Components: The polymer film is polystyrene, polyetheretherketone, polyether ketone, polysulfone, polyether sulfone, polyphenylene sulfide, polyarylate, polyether imide, aromatic polyimide, polyamidoimide, polyethylene, polypropylene, polyvinylidene fluoride, polyvinyl fluoride, ethylene-tetrafluoroethylene copolymer, vinylidene fluoride-hexafluoropropylene copolymer, crosslinked PTFE, tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer, and/or tetrafluoroethylene-hexafluoropropylene-vinylidene fluoride copolymer. The graft ratio of the graft side chain is 20-200 wt.%.
TECHNOLOGY FOCUS - METALLURGY - The processing agent contains a metal ion that is chosen from a group of nickel ion, ferrite ion, silver ion, palladium ion. The catalyst materials selected form one of platinum (Pt), silver (Ag), copper (Cu), nickel (Ni), palladium (Pd), gold (Au) and rhodium (Rh).    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The processing agent is selected from a group of mixed solution of hydrogen-peroxide solution and hydrofluoric acid, mixed solution of nitric acid and hydrofluoric acid, mixed solution of hydrogen-peroxide solution and ammonium fluoride, and mixed solution of nitric acid and ammonium fluoride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of indium in solder layer is 1 %mass or less. The solder layer in solder adhesive material is adhered at temperature more than solidus line temperature and below liquidus temperature. The difference of liquidus temperature and solidus line temperature of the solder layer is 2 degrees C or more. The oxide adherend is chosen from oxide, metal coated with oxide layer, glass, and oxide ceramics. The ratio of liquid phase in whole solder layer is 30-100 %mass. The electrode in element further contains tin. The semiconductor substrate has impurity diffused layer, pn junction and electrode on the impurity diffused layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The semiconductor is made of silicon (Si), germanium (Ge) or gallium arsenide (GaAs). The metal oxide is silicon dioxide (SiO2).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The gas permeability of gas-permeable heat-emitting component is more than 0.07 slpm.cm/torr.cm2. Preferred Process: The carbonaceous powder (20-60 wt.%) is mixed with respect to silicon dioxide powder.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: Acrylic-resin-type spherical microparticles with average particle diameter of 80-150 microns is mixed with silicon-carbide raw material powder, molded and baked.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polymeric compound is (meth)acrylic-type compound. The photoinitiator is radical photopolymerization initiator.    TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The absolute value of refractive index difference with non-hardened material containing microparticles-not-containing composition is less than 0.01 or more. Preferred Composition: The microparticles are (meth)acrylic resin-type microparticles.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The optionally substituted precursor compound is of formula (II)-(V). The bishalo-bisheteroaryl compound (A) is preferably of formula (VI)-(X).R1=halo, 1-30C organic group chosen from optionally substituted alkyl, alkynyl, aryl, and heteroaryl, -Sn(R2)3, -Si(R2)3, -Si(OR2)3 or -B(-OR21)2;R2,R21=alkyl or aryl;or two or more of R21=optionally substituted alkylene group bridging oxygen;X=O, S, Se, or NR3;R3=1-18C alkyl, perfluoroalkyl, aryl, or heteroaryl;Y'=CH, CR4, or N;andR4=1-18C alkyl, aryl, or heteroaryl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The P+ type diffusion region is doped with silicon dioxide. phosphorus-containing silicon dioxide is deposited on the silicon substrate after forming the P+ type diffusion region. The silicon substrate comprises phosphorus oxychloride in a furnace pipe. The structure has a bottom cover made of boron-containing silicon dioxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The buffer system comprises alkali metal carbonates, alkali metal carbonates/ammonia, alkali metal acetates, alkali metal acetates/ammonia, ammonium acetate, ammonium acetate/ammonia, ammonium carbonate or ammonium carbonate/ammonia.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The composition contains: at least one acid comprising inorganic mineral acids or water soluble carboxylic acids; at least one base comprising volatile inorganic and organic bases containing at least one nitrogen atom; at least one oxidizing agent comprising water soluble organic and inorganic peroxides; and at least one metal chelating agent. The composition has a pH of 8-13. Preferred Method: The major surface of the silicon substrate is contacted at least twice with the aqueous alkaline composition. The aqueous alkaline composition is used for the modification of the surface of the silicon substrates by etching and oxidation, the removal of silicate glass and dead layers generated by the emitter doping, the removal of porous silicon generated by the wet edge isolation and/or the removal of debris, which has re-contaminated the surface of the silicon substrates. In the manufacturing method, the wet edge isolation step is carried out before the step (f), and the method of treating the surface of a silicon substrate is carried out after the wet edge isolation step. Preferred Components: The metal chelating agent comprises amino acid diacetates or hydroxyamino acid diacetates and their salts. The quaternary ammonium hydroxide comprises tetra-1-4C-alkylammonium hydroxides. EXAMPLE - Typical composition comprised (in wt.%): water (63.7); tetraethylammonium hydroxide (25); acetic acid (1); hydrochloric acid (3.7); ammonia (2); sodium carbonate (2.5); sulfonic acid (0.6); and metal chelating agent (1.5).
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The primary seal: includes an inner wall of the sleeve and provides primary containment of a reaction through approximately direct contact with the substrate; and is formed from a groove in the bottom of the sleeve, where the groove includes a dove tail groove. The secondary seal includes an O-ring coupled to a lower region of the sleeve. The tertiary seal includes a vacuum system. The vacuum system is provided via a series of vacuum channels in or through the reactor block. In the system: an upper region of the sleeve includes a protrusion and a surface, where the protrusion and the surface are operable as the compliance device; a plenum area external to the SIRs is pressurized prevent leakage of materials outside of each SIRs or to minimize the chance of release or uncontrolled venting of potentially toxic compounds from the SIRs; and a performance of the sealing system is measured by pressurizing the plenum area and measuring the pressure drop over time. The protrusion of the sleeve couples with a recess in the reactor block and in cooperation with an O-ring coupled to an upper region of the sleeve controls a degree the sleeve floats in the SIR over a pre-specified range of motion. The compliance device includes a flexure device integrated in a top portion of the sleeve, where the flexure device includes a set of grooves or notches in an upper portion of a wall of the sleeve. The set of grooves include opposing grooves so that an aperture of a first groove faces the reactor block and an aperture of a second groove faces the reactor. The opposing grooves form a compliant flange which allows an upper portion of the sleeve to flex so that a lower surface of the sleeve complies with a position of the substrate. The thickness of the compliant flange can be varied to provide a predetermined stiffness and resulting force on a primary sealing surface.
Preferred Definitions:    R1-R6 = H; and    R7 = hexyl.    SPECIFIC COMPOUNDS - Use of 2 compounds (I) is specifically claimed i.e. 4,7-bis-(2,2')bithiophenyl-5-yl-benzo(1,2,5)thiadiazole of formula (Ia) and 4,7-di(5"-n-hexyl-2~,2"-bithien-5~-yl)-2,1,3-benzothiadiazole.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic particles are amorphous oxide particles which consist of metal chosen from titanium, zirconium, and cerium.
TECHNOLOGY FOCUS - METALLURGY - The impurity acting on the emitter or the front surface field is selected from phosphorus, arsenic or antimony.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The zinc oxide sintered compact with the aluminum is used as a raw material of transparent conductive film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Part of coating of active material is removed by etching using etchant. The electrodeposited active material is silicon and the etchant is hydrogen fluoride. The active material is chosen from silicon, tin and aluminum. The source of active material is silicon tetrahalide. The active material-containing particles have at least one dimension of 0.5 nm to 1 micron. Electrolytic reduction of silicon halide is carried out during electrodeposition of silicon. Silicon halide is silicon trihalide or tetrahalide, and halide is optionally a bromide or chloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Sintered silicon powder in container is pressurized. Pulse current is supplied to container. Preferred Conditions: Sintering process is performed under non-oxidizing atmosphere. Preferred Components: Graphite mold serves as container.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sintered component further contains additional element chosen from gallium, aluminum, titanium, niobium, tantalum, tungsten, molybdenum and antimony. The atomic ratio of additional element with respect to total content of zinc, tin and additional element is 0.01 or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Paste: In the conductive metal paste, the lead-free glass frit contains also at least one of the following: not greater than 0 to 12 wt.% boron oxide (B2O3), not greater than 0 to 16 wt.% zinc oxide (ZnO), not greater than 0 to 6 wt.% barium oxide (BaO). The conductive metal paste comprises no glass frit other than the lead-free glass frit. The total content of the lead-free glass frit in the conductive metal paste is 0.25-8 wt.%, and the organic vehicle content is 10-39.75 wt.%. In using the conductive metal paste, the conductive metallization are selected from electrodes, parts of electrodes and other metal contacts. The semiconductor substrates are solar cells. Preferred Method: In manufacturing the conductive metallization on the surface of the semiconductor substrate, the conductive metallization is selected from electrodes, parts of electrodes and other metal contacts. The semiconductor substrate is a solar cell.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The alloy-system active material is selected from the group of silicon, silicon base alloy, and silicon compound. The metal component of the electrode lead is made of copper or copper alloy. The fusion portion is made of alloy of silicon and copper and copper silicide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of component (B) with respect to 100 parts mass of component (A) is 10-200 parts mass. The linear siloxane compound (C) is of formula (X).R13,R32=2-6C alkenyl, 1-6C alkyl, 2-10C epoxy or trimethyl silyl;R14-R17,R21,R25,R29-R31=H or 1-6C alkyl;R18-R20=phenyl;R22-R24=2-6C alkenyl;R26-R28=2-10C epoxy;p,q,r,v,w,x and y=0-3000;andp+q+r+v+w+x+y=1 or more.(i) When at least 1 of R13 and R32 are 1-6C alkyl, v is 1 or more, or v+w is 2 or more; and (ii) When at least 1 of R14-R17,R21,R25,R29-R31 are H, v is 1 or more, or w is 1 or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Sn, Zn, and Cu, Sn+Zn and Cu, or Sn, Cu, and Zn are deposited in this order. Preferred Components: Zn source is Zn, ZnSe, or ZnS. CZT(S,Se)-based thin film is Cu2ZnSnS4, Cu2ZnSnSe4, or Cu2ZnSn(S,Se)4. Preferred Conditions: Substrate temperature is 15-200 degrees C during depositing process. Substrate temperature is 350-550 degrees C during selenization or sulfurization.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The aluminum paste further comprises a metal selected from magnesium, nickel, titanium, potassium, vanadium, and/or copper; or metal selected from palladium, silver, platinum, and/or gold; or metal selected from boron, gallium, and/or indium; and/or metal selected from zinc, tin, indium, and/or antimony. The aluminum paste comprises aluminum (40-80 wt.%) and nickel (1-50 wt.%); or aluminum (40-80 wt.%) and magnesium (1-50 wt.%); or aluminum (40-80 wt.%) and silver (0.1-50 wt.%); or aluminum (40-80 wt.%) and boron (0.5-50 wt.%).
SPECIFIC COMPOUNDS - 4 Compounds (1) are disclosed, e.g. formula (15)-(18).    EXAMPLE - Bis-imidazole derivative (2 g), potassium-ferrocyanide aqueous solution (150 ml, 20 wt.%), potassium hydroxide aqueous solution (150 ml, 2 N), and dichloromethane (300 ml) were mixed and stirred at room temperature for 7 hours. Dichloromethane was added to reaction liquid, and organic layer was washed 5 times in saturated salt solution and dried with magnesium sulfate. Filtrate was concentrated under pressure reduction after filtering magnesium sulfate. The obtained dark green solid was recrystallized in toluene/ethanol, and bis-diaza pentadiene derivative (1.2 g, 59% yield) of formula (15) was obtained.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Stress relaxation component contains nonionic functional group e.g. epoxy group, (meth)acryloyl group, and/or vinyl group. Stress relaxation component is organosilicon compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: Ignition loss of glass cloth measured according to JIS R 3420 is 0.01-5%. Preferred Compositions: Stress relaxation component is provided so that surface of glass filament in glass cloth may be covered. Resin material contains cycloaliphatic epoxy resin and glycidyl-type epoxy resin. Amount of glycidyl-type epoxy resin is 0.5-10 mass parts with respect to 100 mass parts of cycloaliphatic epoxy resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal component is a metal or a metal alloy. At least one of the electrically conductive filler is metallic filler. The electrically conductive filler is magnetic filler.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The electrically conductive filler is a carbon modified or a carbon-containing chemical compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The pressure sensitive adhesive mass is a polyacrylate pressure-sensitive adhesive mass. The pressure sensitive adhesive mass is a rubber pressure sensitive adhesive mass. The pressure sensitive adhesive mass has a layer thickness of 50 mu m, a water vapor permeation of less than 50 at 38 degrees C g/m2d and 50% of relative humidity. The pressure-sensitive adhesive has a water content of less than 5000 ppm, preferably less than 1000 ppm and 50% relative humidity, which is determined after 72 hours conditioning at 23 degrees C by Karl Fischer titration. The pressure sensitive adhesive tape further comprises a layer of a carrier material, preferably an electrically conductive carrier material. Preferred Method: The method comprises bonding two substrate surfaces together by the pressure sensitive adhesive composition or by the pressure sensitive adhesive tape. The bonding site is subjected to a temperature above the melting temperature of the metal component during or after the bonding process. EXAMPLE - Typical pressure-sensitive adhesive composition comprised of (in wt.%) acrylate pressure sensitive adhesive mass (prepared by ethylhexyl acrylate (30), butyl acrylate (67) and acrylic acid (3), which were polymerized in a mixture of gasoline and acetone and the solvent was removed from the resulting acrylic polymer mass using a vented extruder) (40), copper fiber (0.8 mm long, 60 mu m thick) (20) and MCP 200 (metal alloy) (40).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The carbon-dioxide carrier is chosen from alkali-metal carbonate, alkali-metal bicarbonate, and alkali-metal hydroxide. Preferred Properties: The pH of the absorption side surface is 8 or more. The pH of the diffusion side surface is 4-8. The total thickness of the gel membrane is 10-100 mu m.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The second volume (23) comprises a liquid collecting area (35) for collecting an intermediate, partially reacted solution. The exhaust product outlet (32) downstream of the second volume (23) of the reaction chamber (7) is connected to an exhaust outlet valve (33) controlled by a control unit (37). The liquid collecting area (35) contains a liquid level sensor (36) coupled to the control unit (37) for controlling the exhaust outlet valve (33). The orientation determined reaction chamber (7), the gas outlet (34) is positioned above the liquid level sensor (36). The generator comprises pump (5) for pumping the aqueous solution (2) from the container (1) to the first volume (21) of the reaction chamber (7). The generator comprises a container (1) for containing an aqueous solution (2) of at least one metal hydride, a reaction chamber (7) containing a catalyst arrangement (22, 24), an exhaust products outlet (32) exiting from the reaction chamber and a gas outlet (34) for extracting the gaseous products and a flow conduit (6) connecting the container with the reaction chamber, where the container (1) for containing the aqueous solution (2) comprises first outlet (3) communication with the flow conduit (6) for liquid output to the reaction chamber (7), comprises a second outlet (12) for gaseous output, and the second outlet being connected to a valve (13). The gas outlet (34) of the reaction chamber (7) and the second outlet (12) of the container (1) are connected to a respective fuel cell. The second outlet (12) of the container (1) is coupled with the gas outlet (34) of the reaction chamber (7). The second outlet (12) of the container (7) opens into the surrounding. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Method: In synthesizing nitrogen-enriched carbon material, the carbide is enriched by nitrogen atoms in the way that nitrogen atoms substitute a part of carbon atoms in the crystal lattice of carbide. The nitrogen-enriched titanium carbide is treated with chlorine gas at the temperature between 300 degrees C to 1100 degrees C and is subsequently post-treated with reducing agent such as hydrogen at a temperature between 500 degrees C to 1000 degrees C. The elemental content of nitrogen-enriched titanium carbide, noted as C/N ratio, and chlorination temperature together are controlled to provide a desired porosity and nitrogen content in the nitrogen-enriched carbon material. Oxygen reduction potential of the nitrogen-enriched carbon material in acidic electrolyte is shifted by at least 0.3 volt (V) to positive potential values compared to non-enriched carbon material. Oxygen reduction potential of the nitrogen-enriched carbon material in alkaline electrolyte is shifted by at least 0,1V to positive potential values compared to non-enriched carbon material. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The etching is performed using a fluorosilicic acid etchant. The etched glass has transmittance of more than 97%, density of 2.4-2.6 and thermal expansion coefficient of 87-90.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The porous layer further contains (in wt.%) additive chosen from aluminum oxide (more than 0 and 0.54 or less), magnesium oxide (more than 0 and 4.31 or less), calcium oxide (more than 0 and 8.86 or less), sodium oxide (more than 0 and 13.23 or less), potassium oxide (more than 0 and 0.38 or less) and antimony oxide (more than 0 and 0.16 or less). The content of silicon oxide and boron oxide contained in the porous layer is more than 57 wt.% and 72 wt.% or less and more than 1 wt.% and 15 wt.% or less, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The relatively thin layer of material is a ceramic material selected from a group consisting of silicon oxide, aluminum oxide, silicon nitride, boron nitride and silicon oxynitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The base material comprises (in ppm) oxygen (0-500) and phosphorus (0-150) as impurity.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The absorber layer is made of copper indium diselenide, copper gallium telluride, copper indium telluride, copper indium gallium selenide, copper indium gallium selenide sulfide, copper indium aluminum selenide, copper indium aluminum selenide sulfide, copper gallium selenide, copper aluminum tin selenide, zinc indium telluride, cadmium germanium phosphide and zinc tin phosphide. The buffer layer is made of cadmium sulfide, zinc oxide, zinc selenide, zinc sulfide, zinc indium selenide, zinc magnesium oxide, indium selenium component, indium sulfur component and zinc sulfur component.    TECHNOLOGY FOCUS - METALLURGY - The rear contact layer is made of molybdenum, platinum, gold, copper, chromium, aluminum, calcium and silver. The absorber layer is formed by deposition of precursor metal films comprising copper, indium, gallium or selenium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The low melting point metal is a bismuth alloy having a bismuth content of 30-80 mass%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The buffer system is alkali metal carbonates, alkali metal carbonates/ammonia, alkali metal acetates, alkali metal acetates/ammonia, ammonium acetate, ammonium acetate/ammonia, ammonium carbonate or ammonium carbonate/ammonia. The composition contains at least one component that consists of acids, bases, oxidizing agents or metal chelating agents.Preferred Method: In (M1), the aqueous alkaline composition is used for the modification of the surface of the silicon substrates by etching and oxidation, the removal of silicate glass and dead layers generated by the emitter doping, the removal of porous silicon generated by the wet edge isolation and/or the removal of debris which has re-contaminated the surface of the silicon substrates. In (M2): the wet edge isolation step is carried out before the process step (a6); and (M1) is carried out after the wet edge isolation step. EXAMPLE - Water (63.7 wt.%), tetraethylammonium hydroxide (20% in water, 25 wt.%), acetic acid (1 wt.%), hydrochloric acid (36% in water) (3.7 wt.%), ammonia (28% in water) (2 wt.%), sodium carbonate (2.5 wt.%), sulfuric acid (0.6 wt.%) and metal chelating agent (1.5 wt.%) were dissolved in ultra-pure water to give aqueous alkaline composition.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal component is a metal or a metal alloy. At least one of the electrically conductive fillers is metallic, or magnetic, and is a carbon modified or a carbon-containing chemical compound. Preferred Method: The filler is aligned before or during the activation by a magnetic field.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The heat-activated bondable adhesive mass is a heat- activated thermoplastic adhesive, or a heat-activated reactive adhesive. Preferred Method: Two substrate surfaces are bonded together by the heat-activated bondable adhesive film. The activation of the heat-activated bondable adhesive film is carried out at a temperature above the melting temperature of the metal component. The method further comprises producing a prefixing of the adhesive film on one of the substrate surfaces, by activating the adhesive film at a temperature below the melting temperature of the metal component, and producing the final fixing, by activating the adhesive film on the substrate surface or in its final present arrangement between the two substrate surfaces at a temperature above the melting temperature of the metal component. EXAMPLE - Grilltex 1365 (RTM: Copolyester) (40 wt.%), and MCP 200 (RTM: Low melting-point metal alloy) (40 wt.%) were mixed. Then copper fiber (20 wt.%) was added to the mixture and extruded to obtain flat film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The carbon-based electrode catalyst is metal catalyst or metal oxide catalyst. The metal catalyst is chosen from platinum, iridium, ruthenium, silver and palladium. The metal oxide catalyst is chosen from titanium oxide, zirconium oxide, niobium oxide, tin oxide, tungsten oxide and tantalum oxide. The atomic ratio of carbon and nitrogen in carbon-based electrode catalyst is 0.004-0.07.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (Q) comprises coupling a fluorenyl or spirobifluorenyl derivative with an arylamino compound and reacting the obtained product with a triarylamino or carbazole compound. Preferred Components: (Q) can not be displayed in a mirror-symmetrical structure. SPECIFIC COMPOUNDS - 18 Compounds (Q) are disclosed e.g. N4,N4-bis-biphenyl-4-yl-N4'-(9,9-dimethyl-9H-fluoren-3-yl)-N4'-phenyl-biphenyl-4,4'-diamine of formula (Qa), (4-tert-butyl-phenyl)-(4'-carbazol-9-yl-biphenyl-4-yl)-(9,9-dimethyl-9H-fluoren-3-yl)-amine, biphenyl-4-yl-(4-(9-biphenyl-4-yl-9H-carbazol-3-yl)-phenyl)-(9,9-dimethyl-9H-fluoren-3-yl)-amine, biphenyl-4-yl-(9,9-dimethyl-9H-fluoren-3-yl)-(4-(9-phenyl-9H-carbazol-3-yl)-phenyl)-amine and N4-(9,9-Dimethyl-9H-fluoren-3-yl)-N4',N4'-di-m-tolyl-N4-p-tolyl-biphenyl-4,4'-diamine.    EXAMPLE - A degassed solution of bis-biphenyl-4-yl-(4'-bromobiphenyl-4-yl)-amine (48 g) and (9,9-dimethyl-9H-fluoren-3-yl)-phenylamine (23 g) in dioxane (1000 ml) was saturated with nitrogen for 1 hour. Further, tri-tert-butylphosphine (0.9 ml) and palladium(II)acetate (0.48 g) were added. Then sodium tert-butoxide (12.6 g) was added in the solid state and refluxed for 18 hours. After cooling to room temperature, water (1000 ml) was added. The organic phase was washed with water (200 ml) and dried over magnesium sulfate. The pure product was recrystallized to obtain N4,N4-bis-biphenyl-4-yl-N4'-(9,9-dimethyl-9H-fluoren-3-yl)-N4'-phenyl-biphenyl-4,4'-diamine (46 g) with a purity of 99.9%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The gallium phthalocyanine compound (I) is of formula (II).Y'=aryl optionally substituted by alkoxy, alkylthio, alkyl, halo, nitro, amino, aryl, carboxy or cyano. SPECIFIC COMPOUNDS - 4 Gallium phthalocyanine compounds are specifically claimed e.g. 3-(trifluoromethyl)benzoate gallium phthalocyanine of formula (Ia), pentafluorobenzoate gallium phthalocyanine, 4-(dimethylamino)benzoate gallium phthalocyanine and benzenetricarboxylate tris(gallium phthalocyanine).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The copper-gallium-sodium sputtering target has average resistance value of 42 micro milli ohms.cm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The copper-gallium-sodium sputtering target has average resistance value of 42 micro milliohms.cm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Compound thin film contains 0.4-10 mol.% Group 2 element. Group 13 element (A) and Group 16 element (B) are contained in ratio of empirical formula A2B3 (1). Solar cell has semiconductor layer of p-type consisting of Group 11 element, Group 13 element, and Group 16 element. Preferred Parameters: Compound thin film has semiconducting properties of n-type. Compound thin film has resistivity of 102-106 Omega cm. Compound thin film has carrier concentration of 108-1016 cm3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The donor element is at least one type selected from phosphorus and antimony. The glass powder containing donor element is selected from phosphorus oxide, phosphorus pentoxide, and antimony oxide. The glass component substance is selected from silicon dioxide, potassium oxide, sodium oxide, lithium oxide, boron oxide, strontium oxide, calcium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, vanadium pentoxide, zirconium dioxide and molybdenum trioxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: An increasing rate of the defect density of the crystalline silicon block in the vertical direction is 0.01-10%/mm. The nucleation promotion layer is composed of a variety of irregularly shaped crystal particles (22), which comprise a particle size in each case of less than 50 mm. The multiple of crystal particles include a polysilicon particle, mono-silicon particle or a single crystal silicon carbide. The nucleation promotion layer is a plate from a material having a melting point of more than 1400 degrees C, and the surface of the silicon melt with in contact plate has a roughness of 300-1000 mu m, thus provides multiple of nucleation rates for the multiple of silicon grains. The predominant crystal orientations in the silicon grains lie between (001) and (111) as figure 1 of specification, and a volume percent of the silicon grains with the predominant crystal orientations is greater than 50%, preferably 70%. The silicon wafer is produced from the crystalline silicon block. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The liquid carrier is a liquid amine of formula (NR23) (II), preferably ethylene diamine, diethylenetriamine, triethylenetetramine, n-butylamine, n-hexylamine, octylamine, 2-ethyl-1-hexylamine, 3-amino-1-propanol, pyridine, pyrrolidine or tetramethylguanidine.R2 = H, 1-10C alkyl, 5-10C aryl or 1-10C alkylamino. Preferred Definitions:    Z, Z1 = S; and    R, R1 = phenyl, methyl, ethyl, propyl, butyl, isopropyl or tert-butyl.    EXAMPLE - Selenium powder (0.127 g) and dibutyl sulfide (0.048 g) were weighed into a reaction vessel. The reaction vessel was then purged with nitrogen. Ethylene diamine was then added without agitation to the reaction vessel. The contents were heated at 120 degrees C for 6.5 hours. The temperature was raised to 130 degrees C and continued for 2 more hours to obtain brown solution. The resulting solution was heated at 80 degrees C for 2 hours, 125 degrees C for 2.3 hours, 135 degrees C for 3.2 hours and worked up to give selenium ink. Copper foil substrate was preheated at 100 degrees C. The selenium ink was deposited on the preheated copper foil substrate. The temperature was raised to 220 degrees C and held for 5 minutes. The temperature was then raised to 298 degrees C for 5 minutes. The resulting substrate was cooled to obtain a copper selenide film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal oxide precursor comprises at least two compound selected from zinc compound, indium compound, hafnium compound, gallium compound, titanium compound, zirconium compound, aluminum compound, silicon compound, germanium compound, tin compound, magnesium compound, yttrium compound, vanadium compound, lithium compound, cerium compound, calcium compound, potassium compound, scandium compound, tantalum compound, tungsten compound, copper compound, molybdenum compound, ruthenium compound, antimony compound, tellurium compound, iodine compound, iridium compound, lead compound and bismuth compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal contact layer comprises a sequence of layers selected from of a group of palladium/germanium/gold, palladium/germanium/silver, palladium/germanium/platinum/gold, palladium/germanium/platinum/silver, palladium/germanium/platinum/silver/gold, gold/germanium/palladium/gold, palladium/germanium/titanium/palladium/gold and palladium/germanium/titanium/palladium/silver/gold. The semiconductor body includes a middle second solar subcell that is made of gallium arsenide, gallium indium phosphate, gallium indium arsenide, gallium arsenic antimonide, or gallium indium arsenide nitride emitter region.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The electrolytes are sodium chloride, potassium chloride, sodium nitrate, potassium nitrate, potassium bromide, potassium iodide, potassium sulfate, ammonium chloride and/or lead nitrate. The silane-based binder is tetraethylorthosilicate, tetramethylorthosilicate, 3-glycidoxypropyltrimethoxysilane, n-hexyltriethoxysilane and/or cyclohexyltrimethoxysilane. The silica-based nanoparticles have a spherical shape, pearl-shaped shape, disk-shaped shape and/or elongated shape. Preferred Method: The method further comprises annealing the coated substrate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The sol-formulation comprises: 0.01-20 wt.% of the silane-based binder; 0.01-20 wt.% of silica-based nanoparticles; 0.001-1 wt.% of the interparticle interaction modifier; 80-95 wt.% of an alcohol containing solvent; and 0.001-0.1 wt.% of an acid or base containing catalyst. Preferred Components: The silane-based binder is tetraethylorthosilicate, the alcohol containing solvent is n-propyl alcohol, the inter-particle interaction modifier is potassium chloride, and the acid or base containing catalyst is acetic acid.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The inter-particle interaction modifier is polymer that adsorbs onto the silica-based nanoparticles, soluble polymer that causes depletion attraction forces between the silica-based nanoparticles and/or electrolytes. The polymer that adsorbs onto the silica-based nanoparticles is polymethylmethacrylate, dextrin, cationic surfactants and/or anionic surfactants. The soluble polymer that causes depletion attraction forces between the silica-based nanoparticles is sodium poly(styrenesulfonate), polyvinylalcohol, sodium carboxymethyl cellulose and/or sodium polystyrene sulfonate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Condition: The silicon film is formed at the speed of 0.55 nm/second or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The light-absorption layer contains sodium, copper or selenium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The ratio of surface average thickness of matrix of the conductive layer with respect to mean diameter of the metal-type linear structure is 1.8-10. Preferred Component: The metal-type linear structure is silver nanowire.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The base material further has a polyethylene-terephthalate layer, and a mixed layer of polyethylene naphthalate and polyethylene terephthalate. The mass ratio of acrylic polyol and isocyanate-type compound is 0.01-0.5.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The coating material forms the organic layer containing organic compound having a glass transition temperature higher than temperature which is higher than the azeotropic point or temperature with the boiling point of byproduct, and higher boiling point of organic solvent. Preferred Composition: The coating material contains trifunctional or more than trifunctional monomer and oligomer of (meth)acrylate, as an organic compound. The organic layer has concentration of 50 wt.% or more. Preferred Process: The organic layer is formed by polymerizing component (50 wt.% or more) of trifunctional or more than trifunctional monomer and oligomer of (meth)acrylate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The method further involves passing the generated silicon fluoride and gaseous compound-containing water through a sulfuric acid scrubber. Preferred Component: The silica source material is chosen from silica sand, silica fume, glass frit, diatomite, kaolin, fumed silica, fly ash, slag, vitality soil, silica gel and quartz.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - Preferred Components: The photovoltaic module exhibits: an insulation resistance value of greater than 4000 M Omega .m2 when the wet leakage current is tested under the IEC 61215 measurement guidelines; less than 5% of output power degradation when exposed to 2500 hours of 85 degrees C/85% humidity per the IEC 61215 damp heat standard and -1 kV bias stressing; less than 5% of fill factor degradation when exposed to 2500 hours of 85 degrees C/85% humidity per the IEC 61215 damp heat standard and -1 kV bias stressing; and less than 5% of series resistance when exposed to 2500 hours of 85 degrees C/85% humidity per the IEC 61215 damp heat standard and -1 kV bias stressing.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The glass sheet further includes 57-85 wt.% of a mixture of silicon dioxide, boron oxide and calcium oxide, 7-35 wt.% of a mixture of sodium oxide, potassium oxide, boron oxide, magnesium oxide, calcium oxide and strontium oxide, 0-25 wt.% of a mixture of magnesium oxide, calcium oxide and strontium oxide, -11 to 9 wt.% a mixture of sodium oxide, barium oxide and aluminum oxide and 0-1 wt.% of a mixture of cerium oxide, iron oxide or titanium oxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I), comprises fusing a spirobifluorene group of (I) that is substituted with an electron-deficient group, with a heteroaryl group, or carrying out cyclization reaction to obtain a modified spirobifluorene group. Preferred Components: (I) do not contain condensed aryl groups having greater than 16 aromatic ring atoms. SPECIFIC COMPOUNDS - 76 Compounds (I) or (II) are disclosed e.g. 2-((3,5-diphenylphenyl)carbonyl)-7'-phenyl-7'H-spiro(fluorene-9,5'-indeno(2,1-b)carbazole) of formula (Ia), 2-benzoyl-7'-phenyl-7'H-spiro(fluorene-9,5'-indeno(2,1-b)carbazole), 3-benzoyl-7'-phenyl-7'H-spiro(fluorene-9,5'-indeno(2,1-b)carbazole), 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-1'-phenyl-1'H-spiro(fluorene-9,3'-indeno(2,1-b)carbazole), and 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-7'-(3,5-diphenylphenyl)-7'H-spiro(fluorene-9,5'-indeno(2,1-b)carbazole).    EXAMPLE - 12-(2-(4,6-diphenyl-(1,3,5)triazin-2-yl)-9H-fluorene-9-yl)-10,12-dihydro-10-aza-indeno(2,1-b)fluorene (69 g), bromobenzene (17.8 g) and sodium tert-butoxide (30.5 g) were suspended in p-xylene (1.5 liters). Then palladium(II) acetate (0.5 g) and 1M tri-tert-butylphosphine solution (1.6 ml) were added to this suspension. Then the reaction mixture was heated for 16 hours under reflux. After cooling, the reaction mixture was worked up to obtain 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-1'-phenyl-1'H-spiro(fluorene-9,3'-indeno(2,1-b)carbazole).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The benzoazole dye includes benzoazole derivative of formula (I).R1-R8=1-20C aliphatic hydrocarbyl, 1-20C aryl (both optionally substituted), H, cyano, nitro, halo, aldehyde, carboxy, -NRR' or hydroxy;X1,X2=O, S or NR";R,R',R"=1-20C aliphatic hydrocarbyl, 1-20C aryl (both optionally substituted) or H;Z,Z'=bivalent coupling group or single bond, preferably 1-4C alkanediyl, divalent 3-20C cyclic hydrocarbyl (both optionally substituted by halo), -O-, -S-, -SO2-, -SS-, -SO-, -CO- or -OCO-;andn=0-2, preferably 0.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The particles comprise iron nitride, preferably cubic-iron nitride. The component includes nanostructure having confinement space, or comprises fullerene or carbon nanotube and the particles are confined in nanotube. The composition further includes particles outside confinement space, and the majority of particles of composition are confined inside confinement spaces, or component including at least one nano-sized confinement space, and particles comprising metal nitride, metal carbide or metal phosphide confined within confinement space. At least 50% of particles containing metal nitride are confined in the component. Preferred Properties: The confinement space has dimension of 100 nm or less, preferably 0.1-100 nm. The particles have average particle size of less than 50 nm, preferably less than 20 nm. Preferred Process: The composition including metal-containing compound is introduced to confinement space, and nitriding treatment is carried out to form metal nitride in confinement space. The nitriding treatment is carried out using ammonia or nitrogen at 400 degrees C or more, preferably 500 degrees C or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The average particle diameter of the plate-shaped inorganic compound is 0.5-5 mu m, measured by microtrack method. The average value ratio of length and thickness of plate-shaped inorganic compound is 1.3-50, preferably 1.3-25. The total intensity of the peak in surface (00c) is Ip, and total intensity of the peak at surface (abc) is Inp, in which a or b is not 0.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The matrix polymer is chosen from epoxy resin, modified epoxy resin, polyurethane resin, polycarbonate resin, polyacrylate resin, modified olefin resin and polyester resin. Preferred Process: The sealing material is obtained by interposing the sealing material composition between base materials facing each other in parallel, and crosslinking-reacting. Preferred Property: The total intensity (Inp) of the diffraction peak of sealing material film currently orientated along direction which is not parallel to base material to the total intensity (Ip) of diffraction peak of sealing material film currently orientated along direction in which a plate-shaped inorganic compound is parallel to base material having non-parallel orientation rate ( alpha ) of 0.001-0.1, measured by X-ray-diffraction pattern.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The difference of refractive index of hardened material with wavelength of 589 nm and refractive index of glass fiber with wavelength of 589 nm is 0.01 or less. The in-plane phase difference of transparent composite sheet in which the polymer is subjected to uniaxial orientation along glass fiber at wavelength of 550 nm is 5 nm or less. The transparent composite sheet has light transmittance at wavelength of 550 nm of 85% or more, mean coefficient of linear expansion at 50-200 degrees C of 20 ppm/ degrees C or less and thickness of 25-200 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The microparticles are graphite microparticles, graphene, oxidation graphene or metal oxide. The solvent is monohydric alcohol and/or polyhydric alcohol. The monohydric alcohol is methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol and/or 2-methyl-2-propanol. The polyhydric alcohol is ethylene glycol, propylene glycol and/or glycerol. Preferred Process: The surface layer oxidation of the graphite microparticles is carried out. The heat exchanger exchanges heat between a fluid which is circulated in an engine, and the heat transfer fluid, and cool the engine. The heat transfer apparatus has heat generating component gives heat with respect to the heat transfer fluid, and warming-up component apparatus for circulating the heat transfer fluid. The heat transfer fluid receives heat from the heat generating component and circulates to the warming-up component apparatus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Metallic silicon porous body is sintered compact of metallic silicon powder. Plasma is direct current arc plasma. Gas for plasma generation contains hydrogen, water vapor, carbon dioxide, and/or oxygen. Preferred Parameters: Filling rate of metallic silicon porous body is greater than or equal to 60%. Maximum particle size of metallic silicon powder is less than or equal to 3 mm. Preferred Processes: Metallic silicon porous body is prepared by sintering metallic silicon powder under reducing atmosphere. Metallic silicon porous body is prepared by sintering metallic silicon powder at greater than or equal to 800 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The water vapor, carbon dioxide, and oxygen are supplied to the mid stream of jet flow formed by plasmifying the mixed gas of hydrogen and an inert gas. The molten silicon is recovered. Preferred Components: The main component of the container is silica.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkaline etching composition comprises niobium pentoxide and niobium pentoxide/silica, silica/titanium dioxide, fluorine-doped tin oxide and/or indium-tin oxide. The etching composition contains (30-45 wt.%, preferably 35-37 wt%) alkaline etchant, and further contains solvent (30-70 wt.%, preferably 53-62 wt.%), and thickener (1-20 wt.%, preferably 1-10 wt.%). Preferred Property: The alkaline etching composition has viscosity of 5-100 pa.second, (preferably 5-50 pa.second) at shear rate of 25 s-1. Preferred Process: The alkaline etching composition is applied on the to-be-treated surface by dispensing process or screen printing. Preferred Condition: The antistatic coating, anti-reflection coating and their stacked layers are etched at 80-270 degrees C, preferably 100-250 degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): Unsaturated aldehyde as raw material is subjected to Wittig reaction to obtain conjugated diene. Preferred Property: The chemical shift of 13C-NMR of alpha -carbon bonded with R1 and R2 is 130 ppm or less.    TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The weight average molecular weight of sulfonyl-group containing polymer is 3000 or more. EXAMPLE - delta -valerolactone was added to glass-made flask, methanol was added, sulfuric acid was dropped, heated and stirred at room temperature. The resulting mixture was refluxed at room temperature for 10 hours, sodium bicarbonate was added, dried and purified by column-chromatography. Methyl-5 hydroxypentanoate was dropped to resulting solution dissolved in methylene chloride, stirred, chloro chromic acid pyridinium was dropped, and stirred at room temperature for 2 hours. The insoluble material in the resulting mixture was filtered, and the filtrate was concentrated, to obtain 5-oxo-methyl pentanoate. Triphenyl allyl-bromide was added to diethyl ether, and n-butyllithium was dropped slowly, and stirred for 1 hour. Diethyl ether and 5-oxo-methyl pentanoate were mixed, stirred at room temperature for 1 hour, and diethyl ether was removed to obtain methoxy-5,7-octadiene.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The nitrile-group-containing highly saturated copolymer rubber composition further contains alpha , beta -ethylenic unsaturated carboxylic acid metallic salt (D). The content of nitrile-group-containing highly saturated copolymer rubber (B) is 5-75 wt.% with respect to total of 100 wt.% of nitrile-group-containing highly saturated copolymer rubber (A) and nitrile-group-containing highly saturated copolymer rubber (B). The content of short fiber (C) is 0.1-50 parts weight with respect to total of 100 parts weight of the nitrile-group-containing highly saturated copolymer rubber (A) and the nitrile-group-containing highly saturated copolymer rubber (B). Preferred Property: The nitrile-group-containing highly saturated copolymer rubber (A) and the nitrile-group-containing highly saturated copolymer rubber (B) have iodine number of 120 or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The coating components contain composition containing (in wt.%) monomers chosen from organofunctional silane (30), amine having pH of more than 8 (3), base solution containing single-walled carbon nanotube (6), water (51), surfactant (0.1) and solvent (9.9). The amount of carbon nanotube in the base solution is 10 wt.%. Preferred Property: The coating components have thickness of 12-20 mu m. Preferred Process: The single-walled carbon nanotube (99.99%) are purified at low voltage in liquid solution at constant temperature and for pre-set time, and sonicated at high frequency in liquid solution for giving grain size and constant distribution on the film of the coating exposed to solar radiation. The composition is deposited using ink-jet technology in a pressurized environment with controlled temperature and humidity to obtain a film having thickness of 12-20 mu m. The coating is applied on a single-cell photovoltaic panel. Preferred Composition: The monomer is chosen from aminoalkyl-functional silane, diamino-functional silane and epoxy-functional silane.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Processes: Fluoridization is performed after developing photoresist layer of irradiated part, and bonding of C=C to CH-COH by adding water according to reverse Markovnikov principle is performed after removing photoresist layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dielectric material is selected from a group consisting of a silicon dioxide and silicon nitride. The semiconductor material is gallium nitride.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The solvent/solvent composition further contains dipropylene-glycol methyl-cyclopentyl ether.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The silver fine particles have average particle diameter of 100 nm or more and less than 1 mu m, crystalline diameter (DX (111)) in Miller index (111) of 20 nm or less and crystalline diameter (DX (200)) in Miller index (200) of 14 nm or less.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The surface of silver fine particles is coated by macromolecular-type dispersing agent having number average molecular weight of 1000 or more.
TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: The average thickness of coating layer is 5-150 nm. Preferred Components: The amount of oxazoline groups of resin which has oxazoline group is 5.1-9 mmol/g. Urethane resin, having carboxylic acid group with acid value of 10-40 mgKOH/g and acrylic resin carboxylic acid group with acid value of less than or equal to 40 mgKOH/g, is included in coating layer. The coating layer hardens resin mixture containing 20-70 wt.% of resin, 10-60 wt.% of acrylic resins, and 10-60 wt.% of urethane resins which have oxazoline group. The inorganic thin film layer is a complex oxide layer of alumina and silica.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Metallic silicon powder is prepared by atomizing metallic silicon containing boron in non-oxidizing atmosphere. Surface of metallic silicon powder is oxidized at greater than or equal to 1300 degrees C. Surface of metallic silicon is oxidized by atomizing metallic silicon in oxidative atmosphere e.g. oxygen-containing atmosphere. Metallic silicon is atomized in oxidizing or non-oxidizing atmosphere. Heat processing is performed at movable hearth furnace under reducing atmosphere. Preferred Conditions: Heat processing temperature in reducing atmosphere is less than or equal to 1414 degrees C. Highest achievable heat processing temperature in oxygen-containing atmosphere is greater than or equal to 1414 degrees C. Preferred Parameters: Maximum particle size of metallic silicon powder is less than or equal to 3 mm. Preferred Compositions: Non-oxidizing atmosphere is inert gas. Reducing atmosphere is mixed gas of inert gas and 1-10 vol.% hydrogen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dielectric layers are made of silicon dioxide, aluminum oxide, silicon nitride, or aluminum nitride. The anti-reflection layers are made of silicon nitride, magnesium oxide, manganese oxide, titanium oxide, zirconium dioxide or molybdenum disilicide. The doping layers are made of phosphorus-doping material, boron-doping material and germanium-doping material.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The olefin alkyl (meth)acrylate-glycidyl (meth)acrylate copolymer comprises (in wt.%) olefin monomer unit (50), (meth)acrylic-acid alkyl monomer unit (10-30) and glycidyl (meth)acrylate monomer unit (2-20).
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass component contains silica, potassium oxide, sodium oxide, lithium oxide, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, vanadium oxide, tin oxide, zirconia or molybdenum oxide.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The etching is performed using hydrofluoric acid.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The acceptor element is boron, aluminum and/or gallium. The acceptor-element-containing material is boria, alumina, and/or gallium oxide. The glass component is silver oxide, silica, potassium oxide, sodium oxide, Lithia, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, thulium oxide, vanadium pentoxide, tin oxide, zirconia, and/or molybdic oxide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The donor element is phosphorus and/or antimony. The donor-element-containing material is phosphorus pentoxide, phosphorus trioxide, and/or antimony trioxide. The glass component is silica, potassium oxide, sodium oxide, Lithia, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, vanadium pentoxide, tin oxide, zirconia, and/or molybdic oxide.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The nickel alloy is of formula: Ni1-xTix, where x is 0.09 or more and less than 1, or Ni1-x'Crx', where x' is 0.08 or more and less than 1, or Ni1-x'Mox', or Ni1-x"Mnx", where x" is 0.05 or more and less than 1, or Ni1-x'"Alx'", where x'" is 0.13 or more and less than 1, or Ni1-x""Znx"", where x"" is 0.17 or more an less than 1.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass component contains silica, potassium oxide, sodium oxide, lithium oxide, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, vanadium oxide, tin oxide, zirconia or molybdenum oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The donor element of glass powder is selected from diphosphorus trioxide, phosphorus pentaoxide and antimony trioxide. The glass component substance is selected from silicon dioxide, potassium oxide,sodium oxide, lithium oxide, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, vanadium oxide, tin oxide, zirconium oxide and molybdenum oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The acceptor element containing material as which the glass powder is selected from boron trioxide (B2O3), aluminum oxide (Al2O3) and Gallium oxide (Ga2O3). The glass component substance is selected from Silicon dioxide (SiO2), potassium oxide (K2O), sodium oxide (Na2O), lithium oxide (Li2O), Barium oxide (BaO), Strontium oxide (SrO), Calcium oxide (CaO), Magnesium oxide (MgO), Beryllium oxide (BeO), Zinc oxide (ZnO), lead(II) oxide (PbO), Cadmium oxide (CdO), Vanadium oxide (V2O5), Tin(II) oxide (SnO), Zirconium oxide (ZrO2) and Molybdenum oxide (MoO3).    TECHNOLOGY FOCUS - METALLURGY - The acceptor element is selected from boron (B), aluminum (Al) and gallium (Ga).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The non-eutectic solder material contains metal chosen from tin, copper, silver, bismuth, lead, aluminum, titanium and silicon, and having content rate of zinc and indium of 1 %mass or less, difference of solidus line temperature and liquidus temperature of 2 degrees C or more, and melting point of 450 degrees C or less. The electroconductive material contains copper, silver, gold and/or aluminum, preferably highly-pure copper having purity of more than 99.99%. The to-be-adhered material contains oxide, oxide layer-coated metal, glass and/or oxide-type ceramic. Preferred Property: The average thickness of electroconductive material is 0.001 mm or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The crosslinking is carried out by heating at 100 degrees C or more. Preferred Components: The cross-linkable functional group is chosen from methylol amide group and alkoxy methylamide group. The crosslinking agent (b2) is chosen from melamine-type compound, epoxy-type compound, block isocyanate compound, oxazoline compound and carbodiimide compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The vinyl resin (b1) has a cross-linkable functional group. The resin layer (B1) contains the vinyl resin (b1) and crosslinking agent (b2).
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The plastic film is transparent plastic film. The rubber-based adhesive agent composition further contains benzotriazole-type ultraviolet absorber. The rubber-type compound is polyisobutylene type-resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first reactant comprises sodium borohydride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The pellet further comprises malic, citric, succinic and tartaric acids.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal particles are silver, platinum, copper, gold, platinum, titanium, aluminum, nickel, zirconium, iron or manganese. The metal precursor particles are silver nitrate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The coating composition is dispersed in an organic solvent chosen from volatile solvent and aqueous solvent. The surface of the metal particles is modified with thiol, amino or iodo. The composition further contains surfactant and/or organic dispersing agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The 2nd n-type-semiconductor film contains n-type amorphous silicon carbide, n-type amorphous silicon oxide, n-type amorphous silicon nitride, n-type amorphous silicon, n-type amorphous silicon tin, n-type amorphous silicon germanium, n-type amorphous germanium, n-type microcrystal silicon carbide, n-type microcrystalline silicon, n-type microcrystalline silicon germanium, and/or n-type microcrystalline germanium. The p-type-semiconductor film contains p-type amorphous silicon carbide, p-type amorphous silicon oxide, p-type amorphous silicon nitride, p-type amorphous silicon, p-type amorphous silicon tin, p-type amorphous silicon germanium, p-type amorphous germanium, p-type microcrystalline silicon carbide, p-type microcrystalline silicon, p-type microcrystalline silicon germanium, and/or p-type microcrystalline germanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The carbonate of the alkali metal is eluted from the float glass substrate, which is formed by supplying the water content and the carbon dioxide gas to the air surface.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Fullerene chloride (C60C16) and organic phosphite are subjected to Arbuzov reaction, to form phosphorus-containing fullerene derivative (I).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The gas for forming plasma is argon.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The laminated substrate is manufactures by using sodium tert-butoxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composite or composition is capable of catalyzing oxygen reduction, catalyzing hydrogen oxidation, or catalyzing oxygen reduction and catalyzing hydrogen oxidation in the presence of 10 parts per million (ppm) carbon monoxide. The composite or composition is capable of catalyzing methanol oxidation. The composite or composition is capable of: catalyzing oxygen reduction on a cathodic electrode side; hydrogen oxidation on the anodic electrode side; or catalyzing oxygen reduction on a cathodic electrode side and catalyzing hydrogen oxidation on the anodic electrode side of a fuel cell including a proton conducting membrane. The composite or composition is capable of: catalyzing oxygen reduction on a cathodic electrode side; methanol oxidation on the anodic electrode side; or catalyzing oxygen reduction on a cathodic electrode side and catalyzing methanol oxidation on the anodic electrode side of the methanol fuel cell with a proton conducting membrane. Preferred Method: The metallization involves: palladization, copperization, platinization, and/or rutheniumization. Preferred Components: The nanoparticles or alloy exhibits resistance to de-alloying in an acidic media. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The ratio of sodium concentration in a depth of 0.01 mu m with respect to total amount of concentration of calcium, strontium and barium is 5 or more, at a depth of 0.01 mu m. Preferred Property: The glass board material has strain point of 520 degrees C or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The carbon-carbon composite is carbon fiber reinforced composite material. The tray further contains ceramic coating layer with thickness of 100-400 mu m formed on the primary surface of main frame and guide portion and surface processing layer containing ceramic bonding ash portion containing aluminum oxide. The ceramic coating layer comprises aluminum oxide (AlOx), yttrium oxide (YOx), aluminum nitride (AlNx) and/or silicon carbide (SiCx). The main frame further contains laminated fabrics. The guide unit further contains ejection pins containing ceramics, graphite, carbon-carbon composite, metal and material in which ceramics is coated.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The lubricative element is formed of raw material containing highly purified carbon, pyrolytic carbon or boron nitride. The rectangle plate is formed of raw material containing highly purified carbon, silicon carbide film, triacetate film or pyrolytic carbon.    TECHNOLOGY FOCUS - METALLURGY - The rectangle plate is formed of raw material containing molybdenum or tungsten.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent is chosen from glycerol, 1,3-propanediol, 1,4-butanediol and 1,5-pentanediol. The precursor of the metal particle is at least one sort (s) chosen from metal chloride, nitrate, acetate, and group containing chloro complexes.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The moisture-curable prepolymer consists of aliphatic isocyanate-terminated prepolymer, and/or silanated-terminated prepolymer. The radiation curable component consists of monomers, oligomers, and/or polymers of (meth)acrylate. The moisture curable functionality on the moisture curable radiation curable prepolymer consists of an isocyanate, and/or a silane. The radiation curable functionality on the moisture curable radiation curable prepolymer consists of monomers, oligomers, and/or polymers of (meth)acrylate. The first and second substrates consist of polyethylene, polyethylene terephthalate, polyethylene, and/or naphthalate. An INDEPENDENT CLAIM is included for an electronic assembly.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The glass ribbon is at a temperature of 1050 degrees F (566 degrees C) to 1350 degrees F (732 degrees C). The deposition rate of the doped titanium oxide is greater than 75 A/sec. The conductivity exhibited by the doped titanium oxide coating is more than 3.54E-2 S/cm. Preferred Components: The halogenated inorganic titanium compound comprises TiCl4. The halogenated inorganic dopant compound comprises one chosen from NbF5, NbCl5, TaF5, and TaCl5 (preferably NbF5). The organic oxygen containing compound comprises an organic ester (preferably ethyl acetate). The precursor mixture comprises not greater than 0.3 mol% NbF5. The inert carrier gas is comprised of at least one He, N and/or H2. Preferred Article: The coated glass article comprises glass substrate; color suppression coating deposited over the glass substrate comprising: an undoped tin oxide layer having thickness of 250-600 Angstrom ; a silica layer having thickness of 250-350 Angstrom ; a doped tin oxide layer; a doped titanium oxide layer having thickness of 500-1500 Angstrom , where the dopant comprises not greater than 0.3 mol% of a halogenated niobium or tantalum compound, which coating exhibits an electrical conductivity greater than 1x 10-3 S/cm; and at least one amorphous silicon layer. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The reducing gas is silane gas. The flow volume of reducing gas is 1000-100000 sccm.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass further contains (in %mass) calcium oxide (0-20), strontium oxide (0-20), barium oxide (0-20), magnesium oxide (0-20), magnesium oxide (0-20), zinc oxide (0-20), sodium oxide (0-20), potassium oxide (0-20) and/or titanium oxide (0-20), iron oxide (0.1 or less), mixture (0-20) of bismuth oxide, gadolinium oxide, lanthanum oxide, tantalum oxide, titanium oxide, niobium oxide and tungsten oxide, and mixture (0-5) of cerium oxide, praseodymium oxide, neodymium oxide, terbium oxide, europium oxide, erbium oxide, yttrium oxide and ytterbium oxide. The glass does not contain lead component, arsenic component, and fluorine component. Preferred Property: The mean linear thermal expansion coefficient of glass is 120x 10-7/ degrees C or less at 30-300 degrees C. The glass has temperature of 1300 degrees C or less at viscosity of 102 Pa.second and softening point of 750 degrees C or less. The glass has thickness of 10 mm and internal permeability of 90% or more at wavelength of 400 nm, and thickness of 10 mm and internal permeability 40% or less at wavelength of 300 nm.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The ethylene oxide ratio (ratio of oxyethylene unit in polyoxyalkylene) in the polyether-based polyol is 50 mol% or more. The content of castor oil-type polyol and polyether-based polyol is 40-70 parts weight and 30-60 parts weight, respectively. Preferred Properties: The urethane foam has thickness of 0.1-15 mm, 25%-compressive load of 0.02-0.40 MPa, average cell diameter of 50-300 mu m, and compression residual strain of 10% or less at 100 degrees C.
TECHNOLOGY FOCUS - POLYMERS - Preferred Copolymer: In the copolymer, the HOMO of the hole transport unit is lower than that of unit A. The lowest unoccupied molecular orbital (LUMO) of unit A is higher than the LUMO of the electron transport unit. Unit A is itself an emissive unit. The ratio of the unit A is in the range from 0.01 to 10 mol.% with respect to the copolymer. The ratio of the hole transport group A(h) is in the range from 5 to 30 mol.% with respect to the copolymer. The molar amount of the electron transport group A(e) is in the range from 10 to 95 mol.%, preferably from 20 to 90 mol.%, and particularly preferably from 50 to 90 mol.% with respect to the copolymer. The copolymer comprises at least one additional emitter unit, which has a smaller band gap than unit A. Additional emissive unit has a higher HOMO than the unit A. The additional emissive units emit blue, green and/or red light. The ratio of the additional emissive group A(em) is in the range from 0.01 to 10 mol.% with respect to the copolymer. Hole transport unit is bonded to the backbone of the copolymer by a non-conjugated spacer. The backbone of the copolymer comprises at least one of the electron transport unit. Copolymer comprises one or more identical or different electron transport unit(s) selected from naphthyl, pyridine, anthracene, benzanthracene, binaphthylanthracene, phenanthroline, dihydrophenanthrene, fluorene, phosphine, indenofluorene, phenanthrene, phosphinoxide, furan, imidazole, triazine, pyrazine, ketone and their derivatives and its combinations. It comprises one or more identical or different hole transport unit(s) selected from amines, triarylamines, thiophenes, carbazoles, phthalocyanines, porphyrines and their derivatives. Preferred Device: The device comprises a conductive polymer layer and/or a hole transporting layer, where the copolymer is coated directly onto the conductive polymer and/or hole transport layer.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The substrate is soda lime glass substrate.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of content of gallium and indium in the alloy target is 1:99-99:1. Preferred Process: The method further involves forming a molybdenum electrode on surface of the substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The conductive filler comprises a metal, preferably silver. The diffusion-inhibiting layer comprises a metal oxide, preferably aluminum oxide or zinc oxide. The conductive filler has a diameter of 1-10 mu m. The thickness of diffusion-inhibiting layer is 10-100 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The highly porous coating of the metallic support structure is made of zeolite materials, silicon dioxide, titanium dioxide, aluminum oxide, zirconium oxide, and/or carbon. The highly porous coating of the metallic support structure has a layer thickness of less than 3 mm, and an average pore diameter of smaller than 100 mu m, where the majority of the pores are greater than 4x 10-10 m. The metal support structure is formed cellular-structured using an electron beam furnace by site-selective layer-wise melting of metal powder under a high vacuum. Preferred Method: Hydrogen is released from the hydrogen carrying compound by catalytic dehydrogenation during high temperature and low pressure. The catalytic sites incorporated in the highly porous coating, consists of platinum palladium, nickel, iridium, rhodium, cobalt, ruthenium, copper, gold, and/or rhenium.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The reactor includes at least one heat exchanger located outside and/or inside of the reactor vessel, which at least partly serves for heating the hydrogen carrying compound. The heat exchanger is incorporated in the metallic support structure such that the metallic support structure forms the heat exchanger. The metallic support structure is formed as an electrical resistance heating system of the heat exchanger.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The former dielectric layer includes a material that is selected from a group consisting of aluminum oxide and endowed silicon oxide. The latter dielectric layer includes a material that is selected from a group consisting of silicon nitride, silicon oxide or silicon oxy-nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The low-temperature selective epitaxial growth of silicon further involves depositing transparent conductive layer above n+-type hydrogenated amorphous silicon layer. Preferred Composition: The substrate layer comprises gallium-arsenic. The transparent conductive layer contains transparent conductive oxide. The solar cell structure has intrinsic epitaxial semiconductor layer (A) comprising silicon-germanium compound of formula: SixGe1-x, intrinsic amorphous semiconductor layer (B) comprising silicon-germanium compound of formula: Six'Ge1-x:H, intrinsic amorphous semiconductor layer (C), and amorphous back surface field layer (D) comprising silicon-germanium compound of formula: SizGe1-z:H, where x, x, and z are 0-1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The tunnel junction layer is selected from the group including indium gallium phosphide, aluminum indium gallium phosphide, gallium arsenide and indium gallium arsenide. The buffer layer is selected from the group including aluminum indium gallium arsenide and indium gallium arsenide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The content of vinyl alcohol type polymer (b) in layer (Y) is 2-40 mass% and of silane coupling agent in layer (Y) is 0.1-20 mass% with respect to total amount (100 mass%) of polymer (a) of unsaturated carboxylic compound polyvalent metallic salt, and vinyl alcohol type polymer (b). The vinyl alcohol type polymer in layer (Y) is modified vinyl alcohol polymer.
TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: Urea and urethane of polyurethane has joint concentration of 500-3500 eq/ton. Preferred Components: Biaxially-oriented polyester film contains lens layer through application layer on 1 surface. Biaxially-oriented polyester film contains hot laminated layer of ethylene-vinyl acetate resin through application layer on 1 surface.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The (meth)acrylate (b) has 2-6 ethylenically unsaturated groups, and is chosen from trimethylol-propane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate and trimethylolpropane triethoxy(meth)acrylate. The (meth)acrylate (c) is chosen from cyclohexane dimethanol (meth)acrylate, 4-butylcyclohexyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentadienyl (meth)acrylate, bornyl (meth)acrylate, isobornyl (meth)acrylate, tricyclodecanyl (meth)acrylate, tricyclodecane dimethanol (meth)acrylate, and adamantyl (meth)acrylate. The content of silane compound (e), silane compound (f) and silane compound (g) with respect to 100 parts mass of silica particles is 5-99 parts mass, 1-95 parts mass and 1-50 parts mass, respectively. The silica particles (a) are surface-treated with silane compound (g) of formula: Y'-(CH2)f-SiR6g(OR7)3-g (III).Y'=6-12C aromatic group, preferably phenyl;R6=optionally substituted phenyl or 1-3C alkyl, preferably methyl;R7=H or 1-12C hydrocarbyl, preferably methyl or ethyl;f=0-6;andg=0-2. Preferred Definitions:    R2,R4=methyl;    R3,R5=methyl or ethyl;    a,d,d+e=2 or 3;    b,c,e=0 or 1;and    X=phenyl or naphthyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The amount of repeating unit (I) with respect to amount of cellulose fiber is 0.2-2.2 mmol/g. The cellulose fiber is obtained by reacting azo compound of formula: X2-N=N-X3 or peroxide of formula: X4-O-O-X5 and compound including repeating unit of formula (II). The resin is thermosetting resin, phenol resin or epoxy resin. The amount of polymer-containing cellulose fiber with respect to 100 parts weight of resin is 5-100 parts weight. The molded product has total light transmittance of 70% or more in thickness of 30 mu m, and bending strength of 50 N or more.R=hydroxy or halo;m=1 or more;X2=organic group including carboxyl group and reactive functional group, preferably amino, epoxy, hydroxy, thio or isocyanate;X3=H, hydroxy, organic group including carboxyl and reactive functional group, or organic group including one or more carbon atoms;X4=organic group having reactive functional group and carboxyl group;andX5=H, organic group containing one or more carbon atoms, or organic group containing carboxyl group and reactive functional group. Preferred Definitions:    X1=organic group containing azo and/or peroxy.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alicyclic epoxy compound (A) is alicyclic epoxy compound having cyclohexane oxide group. The alicyclic epoxy compound (A) is 3-hydroxy-4-methyl-cyclohexanecarboxylic acid-7-oxa-bicyclo(4.1.0)hept-3-ylmethyl. The amount of the isomer of bicyclohexyl 3,3'-diene is less than 20% with respect to total amount of bicyclohexyl 3,3'-diene and its isomer, as a ratio of peak area by gas chromatography. Preferred Process: The (3,3')bi(7-oxa-bicyclo(4.1.0)heptyl) (C) is obtained by epoxidizing the bicyclohexyl 3,3'-diene which is produced by performing dehydration reaction of 4,4'-dihydroxy bicyclohexyl. The (3,3')bi(7-oxa-bicyclo(4.1.0)heptyl) (C) distills off the water byproduced in presence of dehydration catalyst in an organic solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The curable epoxy resin composition further contains hardening accelerator (F).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: A zinc ion source used during formation of zinc oxide membrane is zinc nitrate. Preferred Property: The zinc ion-containing aqueous solution has liquid temperature of 30-90 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The europium chalcogenide has n-type which is formed by doping gadolinium and excess europium or other dopants, and p-type which is formed by doping excess chalcogen elements chosen from oxygen, selenium, tellurium and sulfur, or other dopants.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The method enables depositing a measure of a composite mixture into an interior cavity of a boat that is fabricated from a material selected from a group consisting of boron nitride and titanium diboride. The mixing operation includes mixing a component selected from a group consisting of silver, copper, germanium, gallium and gallium arsenide with granular aluminum and granular silica.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The wet etching is carried out using potassium hydroxide solution (1-5%). Preferred Component: The porous mask layer has silicon oxide layer or organic thin film.
TECHNOLOGY FOCUS - POLYMERS - Preparation (Disclosed): Formaldehyde, and hydrohalide or hydrohalic acid e.g. hydrogen chloride and hydrobromic acid are reacted with fluorene, dibenzofuran or dibenzothiophene in the presence of an acidic catalyst e.g. hydrochloric acid and acetic acid, to obtain halomethyl intermediate. The obtained intermediate is reacted with acrylic acid derivative or methacrylic acid derivative under alkaline condition in the presence of polymerization inhibitor e.g. hydroquinone and phenothiazine in solvent e.g. toluene to obtain (meth)acrylate compound. Preferred Compound: The initiator is phenylbenzyl (meth)acrylate. EXAMPLE - Reaction product containing (in parts mass) 4,4'-dibromo methyl-2- diphenylenemethane was added to flask. Dimethylformamide (90), potassium carbonate (7.4), and hydroquinone monomethyl ether (15.7) were added. Acrylic acid (3.86) was dropped into reaction solution after heating reaction solution at 40 degrees C. The reaction solution was heated and heat-stirred at 95 degrees C for 3 hours. Dichloromethane (165) was added and insoluble portion was filter-separated. Magnesium sulfate was added to organic layer after washing with water, and soluble portion was stirred at room temperature for 1 hour. After filter-separating magnesium sulfate, organic layer was concentrated and viscous materials were recovered. The obtained viscous material was dissolved in toluene and liquid was purified to obtain 4,4'-diacryloxy methyl-2-diphenylenemethane (2.4) at yield of 17%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The esterification process of the hydroxyl group of the binder resin is carried out by (un)substituted carboxylic acid or sulfonic-acid halide. The carboxylic acid is lower carboxylic acid.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin containing structural unit with hydroxyl group is resin containing structural unit of formula: -(CH2-C(-R)(-Q-A-OH))- (I).R=H or methyl;Q=-C(=O)O- or -C(=O)NRa-;Ra=H or optionally substituted alkyl;A=optionally substituted alkylene, -(CH2CHRbO)x-(CH2CHRb)-;Rb=H or alkyl;andx=1-100.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Semiconductor nanocrystal is chalcogen semiconductor nanocrystal. Semiconductor nanocrystal is cadmium telluride (CdTe) nanocrystal, cadmium selenide (CdSe) nanocrystal, cadmium sulfide (CdS) nanocrystal, or zinc oxide (ZnO) nanocrystal.
TECHNOLOGY FOCUS - METALLURGY - The semiconductor film is a gallium arsenide epitaxial lift-off (ELO) semiconductor film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The hydrogenated amorphous silicon-containing material is deposited using plasma enhanced chemical vapor deposition process, which is carried out using precursor gases containing silane-containing gas and hydrogen-containing gas. Preferred Composition: The hydrogenated amorphous silicon-containing material is chosen from hydrogenated amorphous silicon, hydrogenated amorphous silicon-germanium and hydrogenated amorphous silicon carbide. The deuterium-containing gas comprises deuterium in combination with helium, argon, krypton and/or nitrogen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of the portion having diameter of 4 mm or more in the high purity silicon is 10 %mass or more. The content of the zinc, phosphorus and boron is 10-10000 mass ppb, 20 mass ppb or less and 20 mass ppb or less, respectively. Preferred Property: The surface oxidation index and volume density of the high purity silicon is 500-2200 and 0.8-1.2 g/cm3, respectively. The blowing linear velocity of the zinc vapor is 0.5-2 times the blowing linear velocity of a silicon-tetrachloride vapor. Preferred Process: The precipitation rod is provided in the center of the supply space of the silicon-tetrachloride vapor. The zinc vapor having blowing linear velocity of 25 cm/second or more is supplied from the supply port of each zinc vapor.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The metal film is formed by electroless-plating or electroplating using nickel plating bath containing polyoxyethylene octadecyl amine, polyoxyethylene dodecyl amine and polyoxyethylene alkylamine as nonionic surfactant and trimethylcetyl ammonium as cationic surfactant.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The porous metal film is formed by electroless-plating or electroplating using aliphatic alkyl quaternary ammonium salt, chlorinated trimethyllauryl ammonium and alkylchloride as cationic surfactant.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of the anti-reflective film is 100-200 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The anode material is carbonaceous material, preferably carbon cloth, carbon paper or carbon rod. The inert atmosphere is argon gas, helium gas or air.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The concentration of the polytetrafluoroethylene latex is 0.0.5-5 %mass.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The outer solar cells are made up of amorphous silicon, nitrogen-doped gallium arsenide phosphide, cadmium selenide, aluminum gallium arsenide, indium gallium phosphide or copper indium gallium selenide.    TECHNOLOGY FOCUS - POLYMERS - The inner solar cells are made up of mono-crystalline silicon, poly-crystalline silicon or micro-crystalline silicon.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin sheet contains transparent polyamide resin or transparent polyimide resin, and glass temperature of 250 degrees C or more, and 5 weight%-reduction temperature of 250 degrees C or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Amount of potassium compound used as reaction catalyst in tetrachlorosilane manufacture is 0.1-20 mass parts with respect to 100 mass parts of silica in decomposition process residue. Preferred Processes: Mixture of decomposition process residue and silicon is granulated using binder, and granulated material having size of 1-8 mm is produced. Granulated material of decomposition process residue and silicon is supplied to reactor to continue reaction. Reaction residue is extracted from lower part of reactor.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The up-conversion doping of glass or glass ceramic is in the form of nanoparticles containing erbium, rare-earth element, lanthanide, yttrium fluoride, lanthanum fluoride, lead compound (Pb1-x, where x is not defined), cadmium fluoride, barium bromide, barium chloride, europium ion, terbium ion, ytterbium ion, neodymium ion, holmium ion and thulium ion. The back contact is made of indium tin oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The processing tank has base material (101) whihc is a metal, preferably aluminum-type metal.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The perfluoroalkoxy alkane film is provided on film (103) chosen from film containing nickel or nickel fluoride, and film containing alumina.
TECHNOLOGY FOCUS - POLYMERS - Preferred Film: The channels have a cross sectional shape selected from circular, rectangular, oval, star, diamond, triangular and/or square. The phase change materials are selected from gas, liquid and/or solid; and have a viscosity less than the viscosity of the thermoplastic material. Preferred Components: The thermoplastic material is selected from polyolefin; polyamide; polyvinylidene chloride; polyvinylidene fluoride; polycarbonate; polystyrene; polyethylene vinyl alcohol (PVOH), polyvinyl chloride (PVC), polylactic acid (PLA) and polyethylene terephthalate (preferably polyethylene or polypropylene). The polyamide is nylon 6. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises: disposing a second particle in the reactor, where the second particle is not a magnetic particle and is not influenced by the magnetic field and/or the electrical field; and disposing the monolithic solid in a reactive atmosphere and growing nanorods, nanotubes, whiskers or nanoparticles in a pore of the monolithic solid. In the method, the step of elevating the temperature of the reactor, promotes the fusing of the first and second particles to form the monolithic solid. The fluidizing step is carried out using steam at a flow rate of 0.01-5 standard liters per minute. The elevating step comprises raising the temperature to 300-2000 degrees C. The first particle is: disposed on the second particle to form a composite particle; and disposed on the second particle via a chemical vapor deposition process. Preferred Components: The first particle comprises iron, cobalt or nickel, and/or a combination comprising at least one of iron, cobalt or nickel. The first particles are in the form of aligned chains after fusing step. The second particle comprises a metal, an inorganic oxide, an inorganic carbide, an inorganic oxycarbide, an inorganic nitride, an inorganic oxynitride and/or a polymer. The second particle comprises silica, or carbon, where the carbon is converted to carbon dioxide. The second particle is: an inorganic oxide; and silica, alumina, zirconia, titania, ceria or iron oxide and/or a combination comprising at least one of the inorganic oxides.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The block polyisocyanate compound is a reaction material of block forming agent obtained from cresol derivative having one or two 1-3 alkyl, and polyisocyanate compound. The curing catalyst is chosen from diazadicyclo undecene type catalyst, organic titanium-type catalyst, organic acid amine salt type catalyst, and amine catalyst. The molar ratio of isocyanate group block polyisocyanate compound with respect to hydroxyl group of the fluorine-containing copolymer is 0.05-2.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: Patterning process involves coupling agent process to form coupling process layer, and inactivation process to a part of coupling process layer to form a predetermined pattern. The process involves blasting, vacuum plasma processing, atmospheric pressure plasma processing, corona treatment, actinic radiation irradiation treatment, activated gas process, UV irradiation process, and/or chemical solution process as inactivation process. Pressure heating process is performed in atmospheric pressure using a roll. Pressure heating process is separated into pressurization process and heating process, where heating is at greater than or equal to 120 degrees C in low pressure or normal pressure after pressurizing at less than or equal to 120 degrees C. Polyimide film is acid-treated after plasma processing. Preferred Parameters: The 180 degrees peeling strength between the support body and polyimide film in the easy separation part is less than or equal to 1/2 of the 180 degrees peeling strength between the support body and polyimide film in the favorable adhesion part.
TECHNOLOGY FOCUS - METALLURGY - The packing material includes a set of metallic rods with portions of wire made of copper, aluminum, iron and steel. The frame comprises sections made of copper clad metal such as copper-clad stainless steel and copper-clad carbon steel.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: The preparation of the optoelectronic device further comprises applying a third emitter complex dissolved in the first solvent or in a third solvent on the carrier, where the third emitter complex is (Q). The optoelectronic device is prepared by wet-chemical method, which comprises applying a first emitter complex dissolved in a first solvent on a carrier and applying a second emitter complex dissolved in a second solvent on a carrier, where: the first emitter complex is not soluble in the second solvent, and the second emitter complex is not soluble in the first solvent; and the first emitter complex and/or the second emitter complex is (Q). Preferred Components: The optoelectronic device is a white light-organic LED, where the first emitter complex is a red light emitter, the second emitter complex is a green light emitter and the third emitter complexes is a blue light emitter. The amount of (Q) in the device is 2-100, preferably 4-30 wt.%.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation: No preparation method is given. SPECIFIC COMPOUNDS - 20 Compounds (Q) are disclosed e.g. copper(I) complex of formula (Qa)-(Qe).    EXAMPLE - 2-Pyridin-2-yl-1H-benzoimidazole (1 mmole) was dissolved in tetrahydrofuran (5 ml) at 0 degrees C under nitrogen, deprotonated with n-butyl lithium (0.4 ml) and stirred for 30 minutes at room temperature. A second solution of tetrakis(acetonitrile)copper(I) hexafluorophosphate (1 mmole) and (2-(2-diphenylphosphanylphenoxy)phenyl)-diphenyl-phosphane (1 mmole) in tetrahydrofuran (5 ml) was added and stirred under nitrogen for 30 minutes. The above two solutions were stirred for 4 hours, purified by precipitation in diethyl ether, filtered and washed with diethyl ether to obtain copper(I) complex (Qa).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: At least one portion of non-covered region (Du) is contacted with composition (A) comprising an organic compound which is capable of releasing chlorine, bromine or iodine. Preferred Composition: The covering layer comprises less than 20 wt.% of photo lacquer. The composition (A) further contains cyanuric acid. The covering phase is a solution or dispersion comprising polymer (P2) and a solvent. The solvent is water, alcohols, ketones and/or esters.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer (P2) comprises monomer (a1) comprising carboxylic acid group or its salt, monomer (a2) comprising ester of carboxylic acid group with linear or branched 1-20C alcohol, and comonomer (a3) comprising aryl group substituted by ethylenically unsaturated group(s). The polymer (P2) is copolymer of methacrylic acid, butyl acrylate and styrene recurring units. The electroconductive layer further comprises polyanion, and complex of poly(3,4-ethylenedioxythiophene) and poly-styrene sulfonic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal is calcium, magnesium, nickel, copper, silver, silicon, titanium and zinc. The metal oxide is zinc oxide. Preferred Property: The metal oxide particles have average particle diameter of 30 mu m or less, preferably 3 mu m or less, and more preferably 50 nm or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The metal oxide is coated with compound chosen from silane, thiophene and citrate. The compound is silane compound, preferably alkoxysilane compound. The conductive or semiconductive layer is organic layer.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyolefin is polyethylene or polypropylene. The content of polyolefin and metal oxide is 80 wt.% and 0.01-10 wt.%, with respect to total weight of composition. The additional layer is a film. Preferred Property: The film has a thickness of 1 mu m to 0.5 mm, preferably 4-150 mu m, more preferably 30-50 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The nonaqueous electrolyte further contains linear carbonate ester. The content of solvent (I) in nonaqueous electrolyte is 0.8-1.5 mol with respect to 1 mol of lithium salt. The lithium salt is imide salt. The content of linear carbonate ester in nonaqueous electrolyte is 3-10 mol with respect to 1 mol of lithium salt. The solvent (I) is contained as solvent component in the nonaqueous electrolyte. The organic compound is high molecular compound. The quinone structure is orthoquinone structure. The organic compound is high molecular compound having 9,10-phenanthrene quinone structure in principal chain or side chain, 9,10-phenanthrene quinone, and/or 9,10-phenanthrene quinone derivative, or high molecular compound having 4,5,9,10-pyrene tetra-one structure in principal chain or side chain, 4,5,9,10-pyrene tetra-one, and/or 4,5,9,10-pyrene tetra-one derivative. Preferred Definitions:    n=3 or 4.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The compound semiconductor layer has selenide of group-III metal covered with compound containing group-I metal, group-III metal, and selenium. The compound semiconductor layer includes copper, indium or gallium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The lattice constant of the subcell is 0.5% of the lattice constant of the substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catalytic electrode is made of noble metal consisting of platinum, palladium or ruthenium.
TECHNOLOGY FOCUS - POLYMERS - Preferred Compound: The organosilicon compound further has 1 or more silicon atomic union CF3-(CF2)m-(CH2)n- group in one molecule. The silicone composition is hardened and hardened material has light transmittance of 80% or more at 25 degrees C and 300-800 nm in thickness of 2 mm, and refractive index of 1.4 or less in visible light (589 nm) at 25 degrees C.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The sum total content of silver oxide and vanadium pentoxide is 40-80 %mass. The oxide filler is silica, zirconia, alumina, niobium pentoxide, zirconium silicate, zirconium-tungstate-phosphate, cordierite, mullite, and/or eucryptite.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The metal particles contain silver (alloy), aluminum (alloy), and/or copper (alloy). The metal particles have an average particle diameter of 0.5-10 mu m, and are spherical and/or flaky.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Solvent: The solvent is butylcarbitol acetate or alpha -terpineol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The glass paste further contains cellulose nitrate as resin binder (33).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal element in the silicon-oxygen-metal element cluster is chosen from titanium, zirconium or aluminum. The content of silicon-oxygen-silicon cluster and content of silicon-oxygen-metal element cluster is 30-60% and 2-20%, respectively. The silicon-oxygen-metal element cluster includes silicon-oxygen-titanium cluster containing titanium content of 2-20%, silicon-oxygen-zirconium cluster containing zirconium content of 2-8%, or silicon-oxygen-aluminum cluster containing aluminum content of 2-10%. The inorganic cluster includes metal element-oxygen-metal element cluster. The metal element-oxygen-metal element cluster is titanium-oxygen-titanium cluster containing titanium content of 2-20%, aluminum-oxygen-aluminum cluster containing aluminum content of 2-10%, and zirconium-oxygen-zirconium cluster containing zirconium content of 2-8%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The inorganic-organic mixed resin has thermo-optic coefficient of (-5)x 10-5/(power(o))C-(+10)-5/(power(o))C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The carbon nanotube is multi-walls carbon nanotube or double-wall carbon nanotube, and has conductivity of 10-2 S/cm to 104 S/cm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The heteroaryl group is a polyazole. The nitrogen-containing precursor is chosen from 1H-benzotriazole, 1H-1,2,3-triazolo(4,5-b)pyridine, 5-(2-pyridyl)-1H-tetrazole and (1,2,3)triazolo(1,5-a)pyridine. The weight ratio of nitrogen-containing precursor relative to carbon nanotube is 1511-311, preferably 211. The solvent is alcohol, preferably ethanol or butanol. Preferred Method: The impregnation is performed under reflux conditions. The impregnated nanotube is recovered by evaporating the solvent under reduced pressure. The recovered nanotube is annealed at 600-800 degrees C, preferably 700 degrees C.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The optoelectronic component comprises organic light-emitting components, light-emitting electrochemical cells, organic light-emitting diode-based sensors, preferably non-hermetically and outwardly shielded gas- and vapor sensors, organic solar cells, organic field effect transistors, organic lasers and down-conversion elements. The concentration of (I) in the optical light-emitting components, preferably in organic light-emitting diodes, is 1-80%.Preferred Method: The production of the optoelectronic component, comprises applying (I) on a carrier by wet-chemical method using colloidal suspension, or by sublimation.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I), comprises reacting bidentate ligand containing compounds of formula (N1T2E) (III) with copper(I) complexes of formula (Cu(I)X) (IV).Preferred Method: The reaction is carried out in dichloromethane, acetonitrile, tetrahydrofuran, dimethylsulfoxide or ethanol. The preparation method further comprises: adding diethyl ether, pentane, methyl-butyl ether, hexane, methanol, ethanol and/or water for recovering (I) in the form of solid; and substituting at least one ligand T1 with at least one substituent comprising long-chain and optionally branched or cyclic 1-30C alkyl, long-chain and optionally branched or cyclic 1-30C alkoxy, optionally branched or cyclic 1-30C perfluoroalkyl or short-chain polyethers. SPECIFIC COMPOUNDS - 15 Compounds (I) are disclosed e.g. copper(I) complexes of formula (Ia)-(Ie).    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Arrangement: The optical path-conversion panel comprises multiple optical path-conversion unit cells having aspect ratio of 10 or more.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The quantum dot is chosen from II-VI group compound, III-V group compound and I-III-VI group compound, preferably cadmium sulfide, magnesium selenide, magnesium oxide, cadmium oxide, cadmium selenide, indium phosphide, indium arsenide, zinc sulfide, zinc selenide, zinc telluride, mercury telluride, gallium nitride, gallium phosphide, gallium arsenide, gallium antimonate, indium antimonate, silicon, germanium, aluminum arsenide, aluminum antimonate, lead selenide, lead sulfide or lead telluride.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The forward osmosis membrane at least partially surrounds and defines the anode chamber. The anode chamber is at least partially surrounded by the saline solution chamber. The saline solution chamber is a cathode chamber (8) and the cathode is at least partially positioned within the cathode chamber. The draw solution is a catholyte solution, and comprises sodium chloride or a salt solution having a salt concentration of at least or greater than 20 g/l. The cathode is: separated from the saline solution chamber by a cation exchange membrane; and directly exposed to air. The bioelectrochemical system further comprises a cathode chamber. Preferred Process: The process further comprises: recycling the draw solution via a recycling means to remove water from the draw solution, where the recycling means is reverse osmosis; delivering the diluted draw solution to a microbial desalination cell; and increasing current generation by the diffusion of protons across the forward osmosis membrane from the aqueous reaction mixture to the draw solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The bond layer is an adhesive layer (124). The carrier is germanium, gallium arsenide or silicon. The carrier is electrically insulating and the solar cell structure is eutectically bonded to the carrier. The discrete conductor is one of wire bonds or film traces. The solar cell structure further comprises layers forming a bypass diode. The discrete solar cells and the bypass diode are connected in parallel by welds, solder, or wire bonds. The upper first solar subcell: is composed of indium gallium (aluminum) phosphide; and has a band gap of 1.8-2.1 eV. The middle second solar subcell: is composed of a gallium arsenide, gallium indium phosphide, gallium indium arsenide, gallium arsenide antimonide, gallium indium arsenide nitride emitter region and a gallium arsenide, gallium arsenide antimonide, or gallium indium arsenide nitride base region; and has a band gap of 1.2-1.8 eV. The lower third solar subcell: is composed of an indium gallium arsenide base and emitter layer, or indium gallium arsenide base layer and a molybdenum oxide emitter layer; and has a band gap of 0.7-1.2 eV. The graded interlayer: has a band gap of 1.5 eV throughout its thickness; and is composed of at least nine steps of layers of semiconductor material with monotonically changing lattice constant and constant band gap. The graded interlayer: is composed of any of the arsenic, nitrogen, antimony based III-V compound semiconductors subject to the constraints of having the in-plane lattice parameter greater than or equal to that of the middle second solar subcell and less than or equal to that of the lower third solar subcell; and has a band gap energy greater than that of the middle second solar subcell. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The semiconductor substrate comprises silicon. Each patterned antireflective coating layer comprises silicon nitride. The metal layers comprise copper, nickel, cobalt, iron, molybdenum, chromium, titanium, tantalum, gold, aluminum, indium, gallium, silver, platinum, palladium, rhodium, or their alloys.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The charge transport compound includes a triarylamine moiety.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The average interlayer spacing of nanosheet in the dispersion liquid measured by small-angle-X-ray scattering method is 30-120 nm. Preferred Composition: The main interlayer ion of layered inorganic compound is ammonium ion. The layered inorganic compound contains clay mineral having smectite group or mica group.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The chlorination rate of the rubber is 70% or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: DSC peak II of composition before heat processing exists at less than or equal to 120 degrees C. Preferred Conditions: Temperature during heat processing is greater than or equal to 30 degrees C. Preferred Compositions: Component b has structure derived from glycidyl amine compound. Component b contains greater than or equal to 2 functional groups. Masterbatch mold curing agent composition contains trifunctional or tetrafunctional epoxy resin as component b. Masterbatch mold curing agent composition contains microcapsule-type imidazole curing agent and microcapsule-type amine curing agent as core of component a.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The reaction heat produced by reaction of chlorosilane and metal zinc is used for molten salt temperature maintenance of zinc chloride electrolysis. The electrolysis bath salt heated by reaction heat produced by reaction of chlorosilane and metal zinc is supplied in electrolysis chamber through the flow path separated by the electrolysis chamber. The bubble of tetrachlorosilane is avoided when metal zinc produced by electrolysis of zinc chloride from electrolysis chamber located in upper portion is moved in the inside of bath salt. Electrolysis is carried out using electrode set comprising an anode and cathode. The molten metal zinc is cathode, and insoluble material is anode. Polycrystalline silicon is collected in molten metal zinc, and zinc chloride is collected in electrolytic bath salt. The molten zinc containing polycrystalline silicon is extracted continuously or intermittently. Silicon grain or silicon material exists in molten metal zinc, and chlorosilane is fed to molten metal zinc. The particle size of silicon particle is enlarged. A heat exchanger is further provided for carrying out removal of heat from molten salt in inside of molten metal zinc. Preferred Composition: The molten salt is zinc chloride or mixture of alkali metal chloride and alkaline earth metal chloride, and zinc chloride. The molten metal zinc in reductive reaction portion contains alloy of zinc and metal chosen from tin, bismuth and antimony. Chlorosilane is silicon tetrachloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The alkali metal oxides consist of sodium oxide, potassium oxide and lithium oxide. The aqueous acidic solution comprises hydrogen fluoride with a molar concentration of 1.5-4 M, hydrogen chloride with a molar concentration of 4-7 M, and sulfuric acid.
TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The extrusion temperature in the extruder is 232-280 degrees C. The endcap is introduced using an injection port. The melt-mixing of compound (I),(II) and endcap is performed using an evacuation port. The extruded product is further pelletized. The endcap competes and denies reaction sites at the aromatic diamine for reaction by the dianhydride. The establishment of delay in introduction of the endcap of the extruder permits dianhydride and the diamine to commence reaction followed by exposure to permit endcap to compete and deny reaction sites at diamine for reaction by the dianhydride. The endcap is introduced after sufficient time has passed at a given melting temperature to have permitted dianhydride and the diamine to have begun reacting during melt-mixing. The endcap is a solid or a liquid. The introduction of endcap does not cause immediate cessation of reaction of the dianhydride and the diamine which have begun reacting during melt-mixing. The imide oligomer further comprises optional additives chosen from 4-phenylethynyldiphenyl methane and diphenylacetylene. The imide oligomer is re-melted in an extruder, the re-melted imide oligomer is extruded in the form of a film and the film is fed into a machine for impregnation into a tape or fabric. The tape or fabric comprises carbon fibers, fiberglass and/or polymers. The imide oligomer is further reacted or cured in the presence of a fiber preform at 343-371 degrees C to form a thermosetting polyimide matrix-composite having glass transition temperature of 310-380 degrees C. The preform contains carbon, glass, or a synthetic fiber.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The reactor comprises: a cathode compartment in which a working electrode material containing the silicon alloy is inserted; and an anode compartment in which a cross electrode is inserted and both the electrodes are immersed in the acid solution and connected to a source of voltage or current. The reactor further comprises a reference electrode, where the three electrodes are immersed in the acid solution and connected to a source of voltage or current. The silicon alloy has calcium aluminum silicide. The acid solution is hydrochloric acid. The concentration of the acid solution is 0.6-3.7 (preferably 2.5-3.7) mole/l. The anode material is of the same nature as the cathode material. Preferred Process: The reaction temperature is kept constant at a value of 30-85 degrees C, preferably 70-85 degrees C. The reaction is electrochemically assisted by cathodic polarization of the alloy in the acid solution by applying: a current density, where the current density applied to the cathode is -10 mA/cm2 to -250 mA/cm2, preferably -100 mA/cm2 to -250 mA/cm2; and a voltage, where the voltage applied to the cathode is -0.55 High Enable Voltage (V/ENH) to -2.5 V/ENH (-0.795 Emitter collector voltage (V/ECS) to -2.745 V/ECS), preferably -1 V/ENH to -2 V/ENH (-1.245 V/ECS to -2.245 V/ECS). The process comprises a step prior to the above step during which a purging and blanketing the reactor are established prior to any contact between the acid solution and the silicon alloy. Preferred Definitions:    M1 = aluminum; and    M2 = calcium or magnesium.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hardening agent is isocyanate compound. The isocyanate compound is reaction product of meta-xylene diisocyanate or meta-xylene diisocyanate and polyhydric alcohol having at least 3 hydroxyl groups in a molecule. The polyester polyol (a) having polymerizable carbon-carbon double bond in molecule of oxygen-barrier adhesive-agent resin composition (c2) is maleic acid, maleic anhydride or fumaric acid. The content of monomer component having polymerizable carbon-carbon double bond is 5-60 parts mass with respect to 100 parts mass of monomer components of polyester polyol (a). The polyisocyanate having aromatic ring is reaction product of meta-xylene diisocyanate or meta-xylene diisocyanate, and alcohol having 2 or more hydroxyl groups. The polyisocyanate (d) having aromatic ring is reaction product of meta-xylene diisocyanate or meta-xylene diisocyanate, and alcohol having 2 or more hydroxyl groups.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyester resin composition (c1) contains glycerol residue (5 %mass or more) of polyester polyol. The polyisocyanate (b) and polyisocyanate (d) have an aromatic ring. The oxygen-barrier adhesive-agent resin composition (c2) further contains oxidation-polymerization catalyst. The polyester polyol (c) has an aromatic ring. Preferred Properties: The polyester polyol (c) has hydroxyl value of 20-250, and acid value of 20-200. Preferred Process: The gas-barrier coating material is formed by dissolving polyester polyol (a) or polyester polyol (c) with mixed solvent containing ketone-type solvent and/or ester solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The interlayer comprises a material comprising samarium-doped ceria (SDC), gadolinium-doped ceria (GDC), scandium oxide stabilized zirconium dioxide (ScSZ), yttrium-doped barium zirconate (BZY), lanthanum-strontium-gallium-magnesium oxide (La0.9Sr0.1Ga0.8Mg0.2O3-a) (LSGM) (where a is delta ), samarium-neodymium-cerium oxide (Sm0.075Nd0.075Ce0.85O2-a) (SNDC) or yttrium oxide stabilized zirconium dioxide (YSZ). The catalyst layer comprises a catalyst material which is ruthenium and platinum. The cathode layer: comprises a material comprising barium-strontium-cobalt-iron oxide (Ba0.5Sr0.5Co0.8Fe0.2O3-a), strontium-doped lanthanum manganite, lanthanum-strontium-iron oxide (La0.6Sr0.4FeO3), samarium-strontium-cobalt oxide (Sm0.2Sr0.8CoO3-a), barium-lanthanum-cobalt oxide (Ba0.5La0.5CoO3-a), lanthanum-strontium-cobalt oxide (La0.6Sr0.4CoO3-a), lanthanum-strontium-cobalt-iron oxide (La0.6Sr0.4Co0.2Fe0.8O3-a), lanthanum-strontium-chromium-manganese oxide (La0.7Sr0.3Cr0.5Mn0.5O3-a) (LSCM), lanthanum-nickel-iron oxide (LaNi0.6Fe0.4O3-a) or lanthanum-nickel-copper oxide (La2Ni0.6Cu0.4O4-a); and further comprises a ratio of a cathode material to an electrolyte material taken in wt/wt.%, is 50:50-90:10. The electrolyte layer comprises a material comprising SDC, GDC, ScSZ, BZY, LSGM, SNDC or YSZ. The anode layer: comprises a material comprising nickel(II) oxide, copper plus cerium(IV) oxide, or LSCM; and further comprises a ratio of an anode material to an electrolyte material taken in wt/wt.%, is 50:50-90:10. The fuel cell utilizes a hydrocarbon and air mixture as a fuel source.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The hydrocarbon comprises: gaseous fuels, liquid fuels, solid fuels or biofuels; and hydrogen, methane, butane, propane, gasoline, diesel, jet fuel, ethanol, methanol, wood or coal.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first charge-transfer material includes titanium oxide or zinc oxide.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: The step (a) includes anodizing a layer of metal. The step (b) includes depositing the second charge transfer material on the walls of the nanostructured template. The step (c) includes depositing the third charge transfer material. In the method, the third charge-transfer material includes at least one elongated structure that interdigitates with the second charge-transfer material. The steps of depositing the second charge-transfer material on the walls of the nanostructured template and depositing the third charge transfer material are carried out by a technique comprising electrochemical deposition, electroless (chemical bath) deposition, layer-by-layer deposition, evaporation, sputtering, plating, ion-plating, molecular beam epitaxy, and sol-gel based deposition, spray pyrolysis, vapor-phase deposition, solvent vapor deposition, atomic layer deposition, plasma-enhanced atomic layer deposition, atomic vapor deposition, metal-organic vapor phase deposition, metal-organic-vapor-phase epitaxy, chemical vapor deposition, metal-organic chemical vapor deposition, plasma enhanced chemical vapor deposition, self-assembly, electro-static self-assembly, melt-filling/coating electro-deposition, electroplating, ion-plating or liquid phase deposition. The method further comprises disposing an interfacial layer between the second and third charge-transfer materials; and capping at least one tip of the elongated structures with a short-proofing material. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Components: The group VIA element supply unit (520) has group VIA element container (524) for storing group VIA elements (526) of solid state, temperature control unit (522) and carrier gas supply unit (528). The apparatus further has X-ray analysis unit, and VIA group element supply unit (540). The group VIA element supply unit (540) has group VIA element container (544) for storing group VIA elements (546) of solid state, temperature control unit (542) and carrier gas supply apparatus (548). The reaction chamber contains stainless steel or high-temperature standing metal materials. The temperature control unit (522) is a resistance-type heating unit or a halogen-type heating unit.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The tin oxide-containing glass powder contains 35-70 mol% of tin oxide and 10-30 mol% of phosphorus pentoxide, and has maximum particle size (D99) of 5 mu m or less. The inorganic powder further contains fire-resistant filler and pigment. The pigment is amorphous carbon or graphite. Preferred Properties: The primary particles of the pigment have average particle diameter (D50) of 1-100 nm. The surface roughness of sealing-material layer is 1.1 mu m or less. The average thickness of sealing-material layer is 2.2-8 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is N,N'-dimethylformamide, ethylene glycol, dimethyl sulfoxide, dimethyl carbonate, propylene carbonate, butyrolactone, caprolactone, N-methyl-2-pyrrolidone, phenyl diglycol (PhDG), dibutyl phthalate, benzyl glycol, benzyl diglycol and/or phenyl glycol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The vehicle contains several resin binders having different molecular weight. The resin binder is aliphatic polyolefin-type carbonate having number average molecular weight of 50000-500000.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The drying oil(s) is chosen from poppy oil, tung oil and linseed oil. The content of drying oil is 1-15 parts mass with respect to 1 part mass of hindered amine light stabilizer. Preferred Process: The polymer at 10-80 degrees C is mixed with optical stabilizer at 30-100 degrees C.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The circuit component connection structure has a circuit connection component (10) formed using a cured material of circuit connection material, and circuit component (a) (20) and a circuit component (b) (30), where at least one portion of the adherence surface of circuit component (a) or circuit component (b) comprises an inorganic material. The circuit component (a) has a circuit electrode (22) formed on the main surface of circuit board (21) and the circuit component (b) has a circuit electrode (32) formed on the main surface of circuit board (31).    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organoaluminum complex is of formula (I). The silane coupling agent (B) is a methacryl group-containing silane coupling agent or an acryl group-containing silane coupling agent. The adhesive composition further contains a film-forming material. The circuit connection material further contains electroconductive particles.L1-L3=alkoxy anion, conjugated anion of ( beta )-diketone, or conjugated anion of ( beta )-ketoester.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises reacting free ligands with a metal alkoxide compound of formula M(OR8) p(III) with a metal ketoketonate compound of formula (IV) or with metal halide compound of formula (MHal) p(V).Hal=F, Cl, Br or I; andp=1-3.Preferred Components: In the electronic device, (I) combines with a matrix material, which is a ketone, phosphine oxide, sulfoxide, sulfone, triarylamine, carbazole derivative, indolocarbazole derivative, indenocarbazole derivative, azacarbazole, bipolar matrix material, azaborolene, boronic ester, diazasilol derivative, diazaphospho derivative, triazine derivative, zinc complex, dibenzofuran derivative or bridged carbazole derivative. SPECIFIC COMPOUNDS - 54 Compounds (I) are disclosed e.g. platinum complexes of formula (Ia)-(Ie).    EXAMPLE - A mixture of bis(benzonitrile)dichloro-platinum(II) (10 mmole) and 2-bromo-3-methyl-6-(2,4,6-trimethyl-phenyl)-imidazo(2,1-a)isoquinoline (10 mmole) in benzonitrile (100 ml) was heated for 16 hours under reflux. After drop wise addition of methanol (100 ml), solid substances were extracted form the cooled reaction mixture and five times washed with methanol (25 ml) and dried. The solid was suspended in glacial acetic acid (100 ml) and mixed with pyridine (20 ml). Further zinc dust (1.5 g) was added and stirred for 5 hours at 90 degrees C. After cooling, the solid was filtered off, washed three times with methanol (25 ml), dried in vacuum and extracted. After completion of the extraction, the extractant was concentrated in vacuum and crystallized using methanol (200 ml). The solids of the suspensions was washed with methanol (50 ml) and dried to obtain platinum complex with a purity of 99.5-99.9%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The particle size ratio of aluminum metal and calcium hydroxide is 10/1-200/1. Preferred Process: The hydrogen is produced by immersing hydrogen-producing agent in water by forming katoite composition of formula: Ca3Al2(OH)12.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass powder has a d90 of 20 mu m or less. The glass component substance is silica, potassium oxide, sodium oxide, lithia, barium oxide, strontium oxide, calcium oxide, magnesium oxide, beryllium oxide, zinc oxide, lead oxide, cadmium oxide, tin oxide, zirconia, and/or molybdic oxide.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The donor element is phosphorus and/or antimony. The donor-element-containing material is phosphorus trioxide, phosphorus pentoxide, and/or antimony trioxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Conditions: The coating process is electron beam evaporation, physical vapor deposition, chemical vapor deposition, or sputtering. The preset thickness is 5-50 nm. The silicon etching rate is proportional to the temperature of etching solution, and the length of silicon nanowires is proportional to the etching time at preset temperature. The smaller an area of the metal layer on the silicon material is, the larger a difference between a length of the silicon nanowires and a total etching depth is, and a etching rate of forming the silicon nano wires also decreases. Preferred Components: The substrate is silicon substrate, silicon substrate whose surface has thin silicon film, or a substrate whose surface has thin silicon film. The silicon material is monocrystalline silicon, polycrystalline silicon or amorphous silicon. The silicon material is intrinsic silicon or doped silicon. The metal layer is silver. The etching solution is an aqueous solution of hydrogen fluoride (0.7-0.99) and hydrogen peroxide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The composition has: a redox of 0.01-0.4, preferably 0.1-0.3; and at least 89 (preferably 91)% of an energy transmission, measured at a thickness of 4 mm. The composition is coated with: at least one transparent thin layer and electrically conductive; at least an antifouling layer; at least one antireflective layer; and at least one mirror layer.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The antimony is present in an amount of 0.03-0.06 wt.%. The iron oxide is present in an amount of 0.001-0.02 wt.%. EXAMPLE - Typical composition comprised (in wt.%) of: calcium oxide (9); potassium oxide (0.015); sodium oxide (14); iron oxide (0.01); sulfur trioxide (0.3); titanium dioxide (0.015); aluminum oxide (0.7); magnesium oxide (4.5); and antimony trioxide (0-0.5).
Preferred Definitions:    R1-R5=H.    SPECIFIC COMPOUNDS - 1 Compound i.e. 4,7-di-(thien-2'-yl)-2,1,3-benzoselenadiazole (Ia) is specified as (I).    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The base comprises silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Film: The compound semiconductor film consists of copper indium selenide, copper indium gallium selenide, copper indium aluminum selenide, copper gallium aluminum selenide, copper indium sulfide, copper indium gallium sulfide, copper indium aluminum sulfide, copper gallium aluminum sulfide, cadmium sulfide, cadmium selenide, cadmium telluride, indium nitride, gallium nitride, indium gallium nitride, indium arsenide, gallium arsenide or indium gallium arsenide. The precursor metal film contains copper indium, copper indium gallium, copper indium aluminum, copper gallium aluminum, cadmium, indium, gallium, indium gallium or their oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Fluid: The supercritical fluid is alcohol or water. The additional element source contains at least one organic compound chosen from organic selenium, organic sulfur, organic nitrogen, organic arsenic and organic tellurium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Graphene or graphene oxide is adhered to be wound around the carbon nanotubes.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The usage amount of carboxylic acid solvent is 2-10 times the amount of polyimide resin and the usage amount of alcohol solvent is 2-20 times the amount of polyimide resin. The residual solvent in the resin is 1 wt.% with respect to resin.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyimide resin is of formula (I).Af=divalent organic fluorine atom-containing aromatic ring of formula (II);B'=divalent organic group;D'=single bond, CR2, CO, SO2, SiR2, oxygen, or sulfur;R=H, F, or 1-20C alkyl or 6-20C aryl (both optionally substituted by F);E=F or organic group containing F;andm,l=0-4..
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred components: The upstream portion is an oxidation catalyst selected from hexaluminates, spinels, perovskites, and garnets. The contiguous substrate is a metallic foam defining channels extending throughout the substrate to facilitate fluid exchange from an exterior of the substrate to an interior of the substrate.
TECHNOLOGY FOCUS - METALLURGY - The electro conductivity of the n-type layer is produced by introducing the impurity of phosphorus (P), nitrogen (N),and arsenic(As), aluminum (Al) and boron(B).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alcohol solvent is benzyl alcohol or phenoxyethanol. The glycol type solvent is benzyl glycol, benzyl diglycol or benzyl triglycol. The anionic surfactant is sodium salt or potassium salt of xylene sulfonic acid, toluene sulfonic acid, cumene sulfonic acid and alkylbenzene sulfonic acid.
SPECIFIC COMPOUNDS - 38 Compounds specified as the compound (I), e.g. compounds of formulae (Ia)-(Ie).    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The gas barrier film having thickness direction of 40-100 nm satisfies silicon oxynitride composition of SiOwNx. The gas barrier film having thickness directions of 100 nm or more and 1 mu m or less satisfies silicon oxynitride composition of SiOyNz.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The gas barrier layer is obtained by applying vacuum ultraviolet ray irradiation to layer containing polysilazane.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hydrogenated petroleum resin is C5-type-petroleum resin obtained by copolymerizing C5-fraction of hydrogenated petroleum resin, C9-type-petroleum resin obtained by copolymerizing C9-fraction of hydrogenated petroleum resin, and C5-and-C9-type-petroleun resin obtained by copolymerizing C5-fraction of petroleum resin and C9-fraction of petroleum resin. The adhesive sheet has a structure which clamped the adhesive layer by 2 peeling materials (13) without using base material (11). Preferred Properties: The probe tack of adhesive layer measured at a peel rate of 600 mm/minute, based on JIS-Z0237 (1991), has two maximum values, at which initially detected maximum value (P1) is 4N or more. The ratio of finally detected maximum value (P2) to initially detected maximum value (P1) is 0.25-1.50. The adhesive layer with a thickness of 50 mu m of adhesive sheet has visible ray-transmittance of 90% or more, at wavelength of 550nm. The adhesive layer with a thickness of 50 mu m of adhesive sheet has water-vapor-permeation rate of 40 degrees C and relative humidity of 90%, at 10 g/m2/day or less.
TECHNOLOGY FOCUS - POLYMERS - The soft mask material is a polymer e.g. radiation setting polymer such as polyketone, and thermally sensitive polymer.
TECHNOLOGY FOCUS - POLYMERS - The adapter is made of molded polypropylene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises reacting NarcE with copper(I)X. Preferred Process: The reacting step takes place in the presence of dichloromethane. The preparation of (I) further comprises adding diethyl ether or pentane to obtain (A) in the form of solid and replacing at least one NarcE ligand with (Q). Preferred Method: In the preparation of the optoelectronic component. (A) are applied on the support by a wet-chemical, a colloidal suspension or sublimation process. SPECIFIC COMPOUNDS - 11 Compounds (A) are disclosed e.g. copper(I)complexes of formula (Aa)-(Ae).    EXAMPLE - 3 Moles of 1-butyl-5-diphenylphosphanyl-1H-(1,2,4)triazole was reacted with 2 moles of copper(I)iodide in the presence of dicholormethane at room temperature to obtain copper(I)complex (Aa).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The fluorine-containing compound (I) is hexafluoro-3-sulfolene. The fluorine-containing (II) is (Z)-perfluoro-4,7-dihydro-(1,3,2)-dioxathiepine. The fluorine-containing (III) is hexafluoro-3,4-dihydrosulfolane. The fluorine-containing (IV) is 4,4,5,6,7,7-hexafluoro-(1,3,2)-dioxathiepane. Preferred Process: The etching is carried out using gases chosen from nitrogen, xenon, helium and argon. Preferred Definitions:    at least four of A1,A2,B1,B2,C1,C2,D1,D2=F.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Condition: The heat processing (B) is preformed under vacuum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The purification process further includes removal of silicon carbide, aluminum oxide and calcium oxide in metal silicon. The unidirectional solidification is carried out after filtering a molten metal silicon with a heat resistant filter medium which is carbon/carbon composite, carbon felt, or porous heat resistant nonmetallic material. Preferred Parameters: The unidirectional solidification speed is 1-30 mm/hr.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The oxide film is obtained by forming an indium-containing oxide into a film by a sputtering method in a layer containing gallium compound at sputter power density of 1-5 W/cm2 at the time of film-formation. The laminate is obtained by sequentially laminating gallium compound layer, oxide film and indium-containing oxide layer. Preferred Composition: The oxide further contains zinc and/or tin. The gallium compounds are gallium nitride, gallium oxide and/or gallium-nitrogen-containing complex oxide (GaNxOy, where x is 0-1 and y is 0-1.5). The indium-containing oxide is indium oxide, indium oxide-zinc oxide, indium oxide-tin oxide or indium oxide-tin oxide-zinc oxide. Preferred Properties: The film thickness of indium-containing oxide is 200 nm or less. The oxide film has specific resistance of 300 mu ( Omega )-cm or less.
TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The rare-earth element is yttrium, lanthanum, scandium, gadolinium, ytterbium and/or lutetium. The sintered alloy has a density ratio of 85% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The insulation components are made of aluminum nitride.    TECHNOLOGY FOCUS - METALLURGY - The conductor components and connection conductors are formed by metal material which is aluminum or aluminum alloy.
TECHNOLOGY FOCUS - POLYMERS - Preferred Product: The resin molded product has Charpy impact value of 5 kJ/m2 or more at -40 degrees C. The thermoplastic resin is polybutylene terephthalate. The thermoplastic resin composition contains (in %mass) polybutylene terephthalate (25-70), polycarbonate (10-50), elastomer (5-20), and flame retardant (10-15). The flame retardant is a bromine-containing acrylic resin. The thermoplastic resin composition further contains antimony trioxide (2-10). The elastomer is a core-shell type elastomer. The thermoplastic resin composition has melt viscosity of 0.2-0.4 kPa.second at 260 degrees C and shear rate of 1000 second-1. The comparative tracking index of thermoplastic resin composition measured using 0.1% ammonium chloride aqueous solution and platinum electrode based on IEC112 3rd edition is 0 or 1, preferably 0.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The second reactant comprises a chemical hydride, preferably a metal hydride, especially sodium borohydride. The second reactant is a solid. The solid pellet comprises the second reactant. The solid pellet further comprises a binder. The accelerant comprises an acid.    TECHNOLOGY FOCUS - POLYMERS - The byproduct container material is an elastic material, capable of stretching and contracting. The byproduct container material comprises a fluoropolymer. The fluoropolymer comprises an expanded fluoropolymer. The fluoropolymer comprises polytetrafluoroethylene or a polytetrafluoroethylene derivative. The hydrogen containment container material comprises a metallized polymer film or a metal-polymer composite film.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: The multi-layer article further comprises: c) a conductive layer disposed on at least a portion of the glass layer. The conductive layer comprises material selected from metals, oxide-doped metals, metal oxides, and/or organic conductors. The conductive layer comprises molybdenum. The multilayer article further comprises: d) a photoactive layer disposed on the conductive layer; e) a cadmium sulfide (CdS) layer disposed on the photoactive layer; and f) a transparent conductive oxide disposed on the CdS layer. The photoactive layer comprises Cu(In,Ga)Se2 (CIGS), cadmium-indium-selenide (CIS) or Cu2ZnSn(S,Se)4 (CZTS-Se). The transparent conductive oxide is selected from doped zinc oxide and indium tin oxide. The glass layer comprises silica (greater than 70 wt.%), alumina (less than 10 wt.%), a boron oxide (5-15 wt.%), and oxides (less than 10 wt.%) of sodium and/or potassium. The glass layer comprises SiO2 (81 wt.%), B2O3 (13 wt.%), Na2O (1-4), and Al2O3 (2). The glass layer further comprises an oxide of lithium. The glass layer has a thickness of 1 nm to several microns.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The fiber, ribbon or microplate is formed by melt spinning. The fiber is formed by encapsulation within the silica sheath and etching the sheath. The fiber or ribbon is formed by drawing a template material through molten silicon or by extrusion through coaxial nozzles to form the silicon core in glass. The fiber is drawn from silicon within the silica sheath. The oxidation step takes place at 800-1100 degrees C. The metal oxide, sulfide and/or nitride are: mixed with the silicon within the sheath; and used as an interface layer between the silica sheath and the silicon present within the sheath. The annealing step is carried out at 1400-1500 degrees C. The etching step takes place using hydrofluoric acid. Preferred Components: The silicon dioxide skin has a thickness of 0.2-3 microns.
TECHNOLOGY FOCUS - METALLURGY - The half conductor layer of the thin film solar cell is made of copper, gallium, indium, selenium and sulfur.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The mean linear expansion coefficient of carbon fiber-reinforced carbon composite material at the time of heating from normal temperature to 800 degrees C is 0.5x 10-6/ degrees C or less. The pitch-based-carbon fiber woven fabric has fabric weight of 200-600 g/m2. The carbon fiber-reinforced carbon composite material has bulk density of 1.3-1.8 g/cm3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The alkali cleaning liquid comprises (mass%) liquid or solid oxidant (4-15, preferably 5-8), alkali (0.5-2.5, preferably 0.8-1.3), and ultrapure water (balance). The liquid oxidant concentrated hydrogen peroxide aqueous solution. The alkali is sodium hydroxide or potassium hydroxide. The solid oxidant is ammonium persulfate, potassium persulfate or sodium persulfate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkaline solution is mixed solution of sodium hydroxide, potassium hydroxide tetramethylammonium hydroxide (0.5-3 weight%) or isopropyl alcohol (0.5-10 weight%). The content of hydrogen fluoride, nitric acid and acetic acid in the mixed solution is 0.5-5 weight%, 45-70 weight%, and 20-50 weight%, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The volume ratio of nitric acid and hydrofluoric acid is 3:1-5:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The solar battery cell is gallium arsenide solar energy battery. The transparent protection material is formed by silica gel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal salt is nitrate or chlorate of iron, cobalt or nickel. Preferred Process: The acid treatment is carried out using 0.1-5 mol/L of nitric acid, sulfuric acid or hydrochloric acid solution.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The protic solvent is water, methanol or ethanol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The silicon substrate is made of monocrystalline silicon, polycrystalline silicon, doped silicon, amorphous silicon, silicon carbide, silicon-germanium (SixGex) and silicon nitride (SixN1-x), where x is 0-1. The metal alloy layer is made of nickel, cobalt, platinum, palladium, tantalum, titanium, niobium, vanadium, hafnium, zirconium, molybdenum, tungsten and their alloys. The metal layer includes copper, nickel (Ni), cobalt, silver, gold, tungsten (W), or a composition gradient of Ni and W.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The substrate is preheated by supplying water, and forms hydroxyl group before forming film. Preferred Composition: The substrate is polycrystalline silicon substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The insulating material comprises silicon dioxide, silicon nitride and quartz.    TECHNOLOGY FOCUS - METALLURGY - The first conductive material comprises aluminum or gold.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The electroactive layer is a photoactive layer. The photoactive layer further comprises a host material. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The stem portion and the brush portion are independently made of a metal material selected from a group consisting of copper, nickel, cobalt, iron, tungsten, molybdenum, tantalum, niobium, silver, gold and platinum. The cell has an interconnect portion made of a material selected from a group consisting of gold, platinum, palladium, noble metal, and alloys of iron, nickel or cobalt. The cell has an anode made of nickel alloy and a cathode is made of silver alloy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of boron-doped p+-type emitter on silicon wafer is 0.8-1.2 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The boron-containing compound is boric acid, boron trioxide, boron trichloride, borane, boron trifluoride, trimethylboron and/or triethylboron.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic substance is an oxide or nitride of an element of groups IVB, VB, VIB, IIIA and/or IVA. The inorganic substance is alumina, silicon dioxide, titanium dioxide, zirconium dioxide and/or silicon nitride. The molar fraction is graded through the thickness of the barrier coating. The carrier substrate comprises at least one of glass, rigid polymer or flexible polymer. The barrier coating has a total thickness of at most 25 nm and a water vapor transmission rate less than 0.0005 g-water/m2-day, when measured at 38 degrees C and 85% relative humidity. The metallocene is an alucone (preferred), zincone, titanicone or zircone. The alloy: comprises essentially of a molar fraction of 0.1-0.9 the inorganic substance, metallocene and incidental impurities; and has a water vapor transmission rate of less than 0.0005 g-water/m2-day through a thickness of 25 nm, when measured at 38 degrees C and 85% humidity. The barrier coating further comprises an adhesion layer interposed between the first major surface of the carrier substrate and the alloy, has a thickness of 2-100 nm, and is disposed on both major surfaces of the carrier substrate. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The photovoltaic device comprises at least one of cadmium telluride, cadmium indium gallium selenide, copper indium sulfide, amorphous silicon, monocrystalline silicon, multicrystalline silicon, amorphous siliconlpolysilicon micromorph, cadmium selenide, aluminum antimonide, indium phosphide, aluminum arsenide, gallium phosphide, and gallium antimonide, gallium arsenide, gallium indium phosphide, germanium, and inorganic nanocrystal.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The dye layer comprises at least one component selected from the group of phthalocyanine, porphyrin, rhodamine, organic laser dye, perylene and its derivatives, cyanine, coumarin, dioxazine, naphthalimide, thiazine and stilbene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The gas comprises ozone or oxygen plasma.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The liquid material is a diluted photoresist liquid material or a diluted polydimethylsiloxane (PDMS) material. The interface hydrophilic modified polymer layer and the liquid material comprise an epoxy-based negative photoresist material or a PDMS material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The photovoltaically active absorber layer comprises semiconducting organic polymers or oligomers, and copper indium gallium selenide. The outer panel is made of glass, preferred sheet glass, float glass, quartz glass, borosilicate glass, or soda-lime glass.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The substrate comprises polyvinyl fluoride, polyvinylidene fluoride, ethylene-tetrafluoroethylene, polytetrafluoroethylene, polycarbonate, and/or polymethylmethacrylate. The outer panel is made of polymer comprising polycarbonate and/or polymethylmethacrylate. The thermoplastic layer comprises ethylene-vinyl acetate, polyvinyl butyral, polyurethane, polyethylene and/or polyethylene terephthalate.
TECHNOLOGY FOCUS - METALLURGY - The metal electrode layer is made of silver, copper and platinum.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: Each of the areas includes a first reflection surface and a second reflection surface adjacent to the first reflection surface in which a reflection direction of light perpendicular to the light receiving surfaces is different from the reflection direction in the first reflection surface by 180 degrees in a plane view. An angle between the first reflection surface and the second reflection surface is less than or equal to 138.5 degrees . The directions in which a convex portion composed of the first reflection surface and the second reflection surface extends are different from each other in adjacent ones of the areas. The areas include first to fourth areas divided by two intersecting virtual lines. The first to fourth areas are provided so that reflection directions of light perpendicular to the light receiving surfaces are perpendicular to each other in adjacent areas among the first to fourth areas, where the adjacent areas are adjacent to each other across the virtual lines. Each of the first to fourth areas is provided so that a reflection direction of light perpendicular to the light receiving surfaces is parallel to either of the two virtual lines in a plan view. The reflection surface is configured so that normal incident light from the light receiving surface side is reflected by the reflection surface and then totally reflected by a surface of the protection member, where the surface faces the solar cells.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The pyro-electric material comprises a crystal boron silicate mineral or tourmaline, triglycine sulfate crystal, and perowskit-oxide crystal. The heat-exchanging structure comprises aluminum or copper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The piezoelectric material in the first and second piezoelectric sheet comprises mixture of lead-zirconium-titanium (Pb(Zr,Ti)O3) and lead-zinc-niobium oxide (Pb(Zn,Nb)O3), mixture of lead-zirconium-titanium (Pb(Zr,Ti)O3) and lead-nickel-niobium oxide (Pb(Ni,Nb)O3), mixture of lead-zirconium-titanium (Pb(Zr,Ti)O3) and lead-zinc-nickel-niobium oxide (Pb((Zn,Ni)1/3Nb2/3)O3), mixture of lead-zirconium-titanium (Pb(Zr,Ti)O3), lead-zinc-nickel-niobium oxide (Pb((Zn,Ni)1/3Nb2/3)O3) and copper(II) oxide, mixture of lead-zirconium-titanium (Pb(Zr,Ti)O3), lead-zinc-nickel-niobium oxide (Pb((Zn,Ni)1/3Nb2/3)O3) and manganese oxide, mixture of lead-zirconium-titanium (Pb(Zr,Ti)O3) and polyvinylidene fluoride polymer, mixture of lead-zirconium-titanium (Pb(Zr,Ti)O3) and silicone polymer, mixture of lead-zirconium-titanium (Pb(Zr,Ti)O3) and epoxy polymer, sodium-potassium niobate ((Na,K)NbO3), sodium-potassium-lithium niobate ((Na,K,Li)NbO3), and bismuth-sodium titanate ((Bi,Na)TiO3).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The exhaust gases include at least one uncombusted hydrocarbon, nitrogen monoxide (NO), nitrogen dioxide (NO2), and carbon monoxide (CO).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate comprises a copper foil, tinned copper foil, tin lead copper foil, zinc plated with copper/nickel clad copper foil.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The back electrode layer is metal composite layer containing nickel, aluminum, chromium, titanium or gold. The etching solution contains bromine and methanol, and volume concentration of bromine is 15-5%. The key layer contains molybdenum-nitrogen alloy (MoN0.46, MoN0.506, MoN, MoN0.82, Mo0.93N, Mo0.98N, Mo2N, Mo2N0.92, Mo3N2 or Mo5N6).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal solvent comprises indium, tin and its alloys. The liquid composition comprises aluminum, gallium, indium, boron, antimony, arsenic, phosphorus and its mixtures. The liquid composition incorporates solid silicon. An amount of the silicon in the liquid composition is 0-2 wt.%. The silicon layer in the providing step is made of amorphous and/or polycrystalline silicon having grains with an average size of 0-2 mu m.
TECHNOLOGY FOCUS - METALLURGY - The reflective unit is formed from metal particles including aluminum, copper, nickel, cobalt, and titanium, silver, gold and platinum.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The oxygen-free copper strip tin coating process, involves copper strip unwinding, cleaning through a cleaning system, welding aid through a welding aid system, preheating and air-drying, tin coating, coating thickness adjustment, material receiving, and cutting and packaging.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The measuring device is provided for measuring the level of hydrogen to the weir plate of the power generation device.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal component (A) is chosen from titanium, tungsten, zirconium, niobium and tantalum. The metal component (B) is chosen from copper, nickel, cobalt and iron. The metal component (C) is chosen from magnesium, calcium and bismuth. Preferred Properties: The porous metal sheet in the dye-sensitized solar cell has porosity of 20-90%, and thickness of 50 nm to 100microns.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The passivating film is made of nitride or silicon carbide.
TECHNOLOGY FOCUS - POLYMERS - The copolymer is selected from polyvinylidene fluoride, vinylidene fluoride, copolymerizable monomer or their mixture.
TECHNOLOGY FOCUS - POLYMERS - The cord is made of polyester, polyamide, polypropylene, and polyethylene.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The thin film solar cell comprises an active region (93) that conforms to the elongate nanostructures and further comprises a first electrode (91) that conforms to a surface of the active region and a second electrode that is an electrically conductive film between the active region and the substrate. A separation of opposing outer surfaces of the first electrode extending along adjacent elongate nanostructures is greater than zero and less than the vacuum wavelength of the light corresponding to the band gap of the active region. The substrate is the second electrode made of an electrically conductive material. The average separation between coated nearest neighbor elongate nanostructures is greater than 10 nm, preferably greater than 100 nm. A length of the elongate nanostructures is greater than an absorption depth of the active region. The arrangement of the two-dimensional array of elongate nanostructures is periodic, quasi-periodic or random. The substrate and the elongate nanostructures are transparent over the spectral response range of the device. The elongate nanostructures are electrically conductive and form part of a semiconductor junction of the active region. The active region is a multi-junction active region and includes amorphous silicon. A medium between the coated nearest neighbor nanostructures has a refractive index lower than the active region of the solar cell. The elongate nanostructures are formed integrally with the substrate. Preferred Method: The thin film solar cell is formed by forming the active region that conforms to the elongate nanostructures and further formed by forming the first electrode that conforms to a surface of the active region and forming the second electrode that is an electrically conductive film between the active region and the substrate. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: In the CSP device: multiple tiers of flat reflectors are added, where the reflectors or tiered reflectors are positioned around a solar cell or cell combination of any shape, whether triangular, hexagonal, circular, or freeform; concave or convex reflectors, preferably tiered concave or convex reflectors are utilized exclusively or in combination with flat reflectors; flat, concave, or convex reflectors are exclusively or in combination with peripheral reflectors, preferably tiered peripheral reflectors are positioned directly overhead, parallel to or angled toward a solar cell or cell combination; concave or convex lenses (7) are utilized to amplify photonic access by a solar cell or cells; and a protective transparent cover is attached to the reflector's periphery or completely encloses both reflectors and a solar cell or cells.
TECHNOLOGY FOCUS - METALLURGY - The fin structures include fins made of stainless steel.
TECHNOLOGY FOCUS - METALLURGY - The metal fiber is made of gold or silver.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The piezoelectric sheet is made of composite of lead zirconium titanate and lead zinc niobate, composite of lead zirconium titanate and Lead nickel niobate, composite of lead zirconium titanate and lead zinc nickel niobate. The piezoelectric energy harvesting apparatus is made of composite of Lead zirconium titanate and lead zinc nickel niobate and copper (II)oxide, composite of lead zirconium titanate and lead zinc nickel niobate and manganese (II)oxide, composite of lead zirconium titanate and polyvinylidene difluoride polymer, composite of lead zirconium titanate and silicone polymer, composite of lead zirconium titanate and epoxy polymer, sodium potassium niobate, sodium potassium lithium niobate and bismuth sodium titanate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The method epitaxially grows a semiconductor material on the lamina, where the material is selected from a group consisting of gallium nitride, aluminum gallium nitride and aluminum nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The spectral response structures comprise germanium. The semiconductor layer comprises silicon.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Process: The piezoelectricity harvesting system is formed using material(s) chosen from lead-free piezoelectric element, polyvinylidene fluoride, poly((vinylidenefluoride-co-trifluoroethylene)) and mixture of polymeric material and ceramic. Preferred Composition: The piezoelectric element comprises ceramic material, lead zirconate titanate, lead zirconium titanate, sodium potassium niobate, barium zirconate-titanate/barium calcium-titanate, bismuth sodium titanate and/or barium strontium sodium niobate.
TECHNOLOGY FOCUS - POLYMERS - The clamp of the polymer installation bracket forms angle with respect to the receiving portion of installation bracket.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The lacquer comprises particles with silicon carbide.    TECHNOLOGY FOCUS - POLYMERS - The lacquer on the basis is formed by alkyd resin.
TECHNOLOGY FOCUS - POLYMERS - The cell includes a material selected from a group including silicon germanium and poly-silicon.
TECHNOLOGY FOCUS - METALLURGY - The heat conductive layer arranged between lower glass plate and heat exchanging plate is made of graphite.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The mechanical switch and the semiconductor switch are coupled together such that the semiconductor switch switches to a current conducting state before opening the mechanical switch, and the semiconductor switch switches into a current-blocking state after opening of the mechanical switch. The semiconductor switch switches from current conducting state to a current blocking state after the end of limited time period. A drive circuit for the semiconductor switch, at its energy supply is connected with the photovoltaic generator. The driving circuit comprises an energy storage device which is charged by the photovoltaic generator. The semiconductor switch is designed such that it is driven without any control by a driving circuit in the current conducting state and is driven with a control by the driving circuit in a current blocking state. The mechanical switch is constructed as a circuit breaker (separator). The semiconductor switch is insulated-gate bipolar transistor-semiconductor switch.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The heat-dissipating device contains inorganic and organic gases, inorganic and organic liquids, and inorganic and organic sublimable solids. The inorganic and organic gases are air, nitrogen, fluoridated oxygen, noble gases, carbon dioxide, gaseous ammonia, sulfur hexafluoride, hydrocarbons, chlorinated and/or brominated hydrocarbons or amines. The inorganic and organic liquids are water, brine, salt melt, ionic liquid, liquid ammonia, liquid metal and metal alloys, liquid hydrocarbons or liquid fluoridated, chlorinated and/or brominated hydrocarbons. The inorganic and organic sublimable solids are corrosive sublimate, carbon dioxide, p-dichlorobenzene, naphthalene or camphor.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The aluminum alloy back plate comprises 1.3-1.5 wt.%, preferably 1.3 wt.% or 1.5 wt.% iron, 0.5-1 wt.%, preferably 0.5 wt.% or 1 wt.% nickel, 0.001-0.003 wt.%, preferably 0.001 wt.% or 0.003 wt.% vanadium, and remainder of aluminum.
TECHNOLOGY FOCUS - METALLURGY - The lamp is provided with a metal film layer made of silver or aluminum.
TECHNOLOGY FOCUS - METALLURGY - The structure is made of aluminum.
TECHNOLOGY FOCUS - METALLURGY - The electrically conducting element is composed of copper and/or galvanized copper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The rutile type titanium dioxide nanowire has average length of 10 nm to 1.5 mu m, and colorless and transparent color. The volume ratio of concentrated hydrochloric acid to deionized water is 0-10:1. The concentrated hydrochloric acid has a concentration of 36-38%. The titanium source aqueous solution is titanyl sulfate and/or titanium sulfate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The surfactant is a cationic surfactant, an anionic surfactant or a nonionic surfactant having a concentration of 1 g/l. The cationic surfactant is cetyl trimethyl ammonium bromide. The anionic surfactant is sodium dodecyl sulfate. The nonionic surfactant is Triton products.
TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Article: In the article, the flexible photovoltaic cell assembly has a cell height and the body portion has a body height, where the ratio of the cell height to the body height is at least 0.3. One or more reinforcement features are disposed on the body portion in an area adjacent to the photovoltaic cell assembly, where the reinforcement features comprise ribs. The ribs have a ratio of lateral spacing to rib height of at least 3.8. The ribs have a lateral spacing of less than 30.0 mm. The ribs have a rib draft of 1-4 degrees /side. The photovoltaic cell assembly has a modulus between 15 KPa and 20 KPa. The CTE range of the body material composition when the modulus is above 1800 MPa and up to 9000 MPa is determined by a formula: CTE=a plus minus (b+cxwarpage)1/2, where the acceptable warpage value is set to an upper value and then to a lower value and solving for CTE for each respective value and including a set of constants: a, b, and c, further where constant a ranges in value from 25-87; constant b ranges in value from -365 to 255, and constant c ranges in value from 35-45.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The heat-receiving section is made using the sunlight absorbing material or which is surface-treated using the sunlight absorbing material of the carbon dioxide. The sunlight absorbing material is chosen from iron oxide, chrome oxide, zirconium oxide, fluorine polymeric composition, graphene, graphene oxide, carbon nanotube, and/or graphite. The optical catalyst contains metal particles and metal compound is chosen from metal oxide, metal carbide, and/or metal oxycarbide. The metal oxide contains is chosen from transition metal and non-transition metal, preferably titanium oxide, zinc oxide, tantalum oxide, zirconium oxide, tungsten oxide, iron oxides, manganese oxide, copper oxide, cobalt Oxide, nickel oxide, chrome oxide, molybdenum oxide, vanadium oxide, indium oxide, lead oxide, zinc chromate, zinc ferrite, manganese titanate, calcium titanate, barium titanate, strontium titanate, bismuth vanadate, lead titanium, cadmium indium oxide, iron titanium oxide, chromium niobium oxide, carbon dioxide and chromium titanium oxide which is doped with nitrogen, phosphorus, arsenic, carbon, yttrium, vanadium, molybdenum, chromium copper, aluminum, tantalum, boron, ruthenium, manganese, iron, lithium, niobium, indium, lead, germanium, sulfur and antimony. The metal carbide is transition metal carbide and/or silicon carbide. The metal oxycarbide is transition metal oxycarbide and/or silicon oxycarbide. The metal particles are chosen from iron, ruthenium, rhodium, cobalt, iridium, osmium, platinum, palladium nickel, gold, silver, copper, cobalt, zinc, titanium, vanadium, manganese, tin, indium, lead, cadmium, and gallium.
TECHNOLOGY FOCUS - METALLURGY - The metal foil arranged between the cooling structure and photovoltaic layer is formed of aluminum.
TECHNOLOGY FOCUS - METALLURGY - The outer sleeve is formed of aluminum. The inner sleeve is formed of steel or titanium.
TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The porous sintered-metal sheet is a 10-30 micrometers thick non-foaming porous sintered-metal sheet. Metal seed of the porous sintered-metal sheet is included alloy chosen from titanium (Ti), tungsten (W), molybdenum (Mo), rhodium (Rh), platinum (Pt), and tantalum (Ta). The metal powder which is a raw material of porous sintered-metal sheet is titanium powder manufactured by hydrogenation dehydrogenation process. Base material is alloy containing iron or iron. Metal is chosen from titanium, zirconium and hafnium. Substrate metal is titanium or titanium alloy. Medium metal is chosen from iron, iron chromium alloy, copper, magnesium, selenium, calcium, zinc, cadmium, bismuth, lead, and lead- tin alloy.
TECHNOLOGY FOCUS - POLYMERS - The water reservoir is formed of plastic.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The aluminum base material photovoltaic solder strip comprises base material, aluminum base layer, a coating applied on the peripheral surface of the aluminum base layer and having a thickness of 1.1-20 mm, a strike plating layer having a thickness of 10-50 mu m, a conductive plating layer having a thickness of 10-50 mu m, and a weldability clad layer having a thickness of 3-15 mu m. The strike plating layer comprises 40-60 g/l sodium tin oxide trihydrate or potassium tin oxide trihydrate, 1-3 g/l copper sulfate pentahydrate, 3-5 g/l nickel sulfate heptahydrate, and 7-9 g/l zinc oxide; 40-60 g/l copper cyanide, 300-500 g/l nickel ammonium sulfate tetrahydrate, 40-60 g/l methyl sulfonic acid, 40-60 g/l methyl sulfonate and 1-5 ml/l copper methyl; or 40-50 g/l sulfonic acid tin, 0.8-1.2 g/l silver methylsulfonic acid, 10-20g/l lead methyl sulfonic acid, 0.01-0.5 g/l copper methylsulfonic, 3-7 g/l bismuth sulfate, and 0.01-0.5 g/l gallium oxide.    TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The tin-based alloy is tin-silver alloy, tin-lead alloy, tin-copper alloy, tin-bismuth alloy or tin-gallium-bismuth alloy.
TECHNOLOGY FOCUS - METALLURGY - The locking unit is made of metal i.e. gold 6060.
TECHNOLOGY FOCUS - METALLURGY - The device is made of aluminum or aluminum alloy.
TECHNOLOGY FOCUS - METALLURGY - The base profile includes metal or metallic alloy.    TECHNOLOGY FOCUS - POLYMERS - The grafts are manufactured from plastic, and the carrying leg includes ethylene propylene diene monomer strip.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The contact pad material comprises silver grains. The connection strip is made of aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: The 1st band gap formed when multiple light is irradiated to 1st quantum dot is smaller than 2nd band gap formed when multiple light is irradiated to 2nd quantum dot. Diameter of 1st quantum dot and 2nd quantum dot is 2-20 nm. Diameter of space with particle which adjoins 1st quantum dot and 2nd quantum dot is lessthan or equal to 20 nm. Effective refractive index n of wavelength converter at 533 nm is 1.7-3. Preferred Processes: The 2nd quantum dot with large electronegativity is selectively oxidized by time-dependent change to promote core-shell structuring or reduce particle size of 2nd quantum dot. Preferred Components: Band gap contains oxide-type dielectric material or organic substance of greater than or equal to 3 eV. The 1st quantum dot contains silicon germanium (SixGe(1-x)), and 2nd quantum dot contains SixGe(1-y). The 1st quantum dot has Ge. The 2nd quantum dot has Si or Si/silicon dioxide (SiO2) core-shell structure. Matrix layer contains SiO2. Photoelectric conversion apparatus comprises light absorption layer provided with quantum dot structure, N-type semiconductor layer, and P-type semiconductor layer.x=lessthan or equal to 0.7; andy=greater than or equal to 0.7.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The method enables using a controller area network (CAN) communication protocol.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The maximum allowable range of voltage and frequencies generated by the variable-frequency generator is defined in accordance with MIL-STD-704F standards.
TECHNOLOGY FOCUS - METALLURGY - The surge conduit is comprised of carbon-steel having low friction internal coating to reduce traction.    TECHNOLOGY FOCUS - POLYMERS - The low friction internal coating is made of synthetic polymer. The drag reducing agent is long chain polymer.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Device: In the photovoltaic device kit, one or more interface members include an upper flashing portion adapted to cover a portion of a building sheathing member. The upper flashing portion comprises a flexible ledge portion disposed forward of the photovoltaic device nesting portion and above the building sheathing nesting portion. One or more interface members comprise a flexible sheet that can be roiled out as applied to the structure. The upper flashing portion comprises a removable flashing member. One or more interface members include one or more photovoltaic device retention features. The retention features comprise a mechanical fastening device, an adhesive, or both. The upper flashing portion has a sufficient length to cover fasteners disposed on the sheathing member. The building sheathing nesting portion includes a tower tip adapted to receive one or more fasteners that holds the sheathing member to the structure. The photovoltaic device kit further includes one or more sheathing members. The photovoltaic device kit further includes one or more snow/ice guards. Preferred Method: Constructing photovoltaic device assembly on surface of structure further comprises providing a sheathing member, placing the sheathing member into the building sheathing nesting portion, and attaching the sheathing member to the structure.
TECHNOLOGY FOCUS - METALLURGY - The magnetic flux conveyor is made of iron type, ferromagnetic alloy such as iron or iron-phosphorus or iron-silicon or nickel/iron 45/55, and the switches are made of gadolinium-silicon-germanium.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The elementary modules are containers conforming to ISO 668 standard and ISO 1496-1 standard.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The communications port is specified by RS232, RS422 and RS485 standards.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The photoactive layer contains the aromatic compound as electron acceptor, and electron donor. Preferred Definitions:    Ar1=cyano;    Ar2=benzo thiazol;and    Ar3=H or cyano.    SPECIFIC COMPOUNDS - 16 Aromatic compounds are specifically claimed e.g. 2-(naphthalen-2-yl(pyren-1-yl)methylidene)propanedinitrile of formula (Ia), 2-(naphthalen-1-yl(pyren-1-yl)methylidene)propanedinitrile, 2-(bis(6-(naphthalen-2-yl)naphthalen-2-yl)methylidene)propanedinitrile, 2-(bis(naphthalen-2-yl)methylidene)propanedinitrile and 2-(bis(perylen-2-yl)methylidene)propanedinitrile.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The monomer (C) is chosen from ethylene, propylene, butylene, isobutylene, eicosene, maleic anhydride, acrylamide, methacrylamide, maleic acid, acrolein, cyclohexene, ethyl vinyl ether, and methyl vinyl ether, preferably acrylamide. The alkyl portions of the monomers (A and B) are chosen from 1-5C alkyl group, preferably 1-2C alkyl group. At least one of monomer (A) and monomer (B) is quaternized with 1-8C alkyl group. The molar ratio of monomer (A) and monomer (B) is 99:5-15:85, preferably 75:25-85:15. The monomer (B) is methyl-quaternized dimethylaminoethyl methacrylate. The ratio of monomer (B) and monomer (C) is 45:55-55:45. The polyacrylate is polyquaternium 32. The alkanol is methanol. The fluid further comprises surfactant, and gas which is carbon dioxide or nitrogen. Preferred Property: The subterranean formation has in-situ matrix permeability to gas of 0.5 mD or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The aramid fiber and heat-conducting graphite powder are subjected to surface treatment by plasma irradiation instrument for pre-activation. The heat-conducting graphite powder is dispersed in acetone and subjected to dehydration treatment by silane for 1-2 hours. The carbon fiber of high heat conductivity, heat-conducting graphite powder are dispersed in acetone and subjected to dehydration treatment by silane for 1-2 hours. The melting, extruding and cutting processes are carried out in double-screw extruder. Preferred Properties: The inner layer has a thickness of 8-10 mu m. The outer layer has thickness of 2-4 mu m. The double-layered composite polymer-based wear-resisting bearing has inner diameter of 40 mu m or 45 mu m.
Preferred Definitions:    A=carboxy, phosphorus acid, sulfonic acid, phosphinic acid, hydroxy, oxycarboxylic acid and/or acid amide;and    Z1,Z2=single bond, or Vinylene, polyvinylene, phenylene, naphthylene, anthracenylene, fluorenylene, biphenylene, thiophenylene or carbazolylene.
Preferred Definitions:    Ar=benzene, naphthalene, anthracene, imidazole, pyridine, oxazole, thiazol, quinoline or 3,4-ethylenedioxythiophene;and    R1-R4=H, methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, heptyloxy, butoxymethyl, butoxyethyl, hexyloxymethyl, heptyloxy methyl, 2-ethylhexyloxy, 2-ethylheptyl oxy, 3-ethylheptyl oxy, 2-methylbutoxy, 2-ethylpentyl oxy, 3-ethylpentyl oxy, 3-methoxypentyl oxy, 3-ethoxypentyl oxy, 3-propoxypentyl oxy, 2-methoxyhexyl oxy, 2-ethoxyhexyl oxy, 2-propoxy hexyloxy, phenyl, naphthyl, thiophenyl, anthryl, imidazolyl, pyridyl, oxazolyl, thiazolyl or quinolyl.    SPECIFIC COMPOUNDS - 4 Carbazol derivatives e.g. 4-(3,6-bis((2-ethylhexyl)oxy)-9H-carbazol-9-yl)benzoic acid of formula (Ia), 4-(4-(3,6-bis((2-ethylhexyl)oxy)-9H-carbazol-9-yl)phenyl)benzoic acid, 4-(3,6-dihexyl-9H-carbazol-9-yl)benzoic acid, and 4-(4-(3,6-dihexyl-9H-carbazol-9-yl)phenyl)benzoic acid, are specifically claimed.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The heterocyclic derivative is preferably of formula (II) or (III).R1,R'=1-20C alkyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The titania transparent conductive electrode material coating layer is formed using mixture containing titania nanoparticles having size of 15-30 nm, polymer (a) chosen from polyethylene oxide and polyethylene glycol, distilled water and acetyl acetone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The copper indium selenide/sulfide-based thin film contains copper indium selenide/sulfide (Cu(A1-xB'x)(Se1-ySy)2, where A and B' are chosen from indium, gallium, zinc, tin and aluminum, x is 0 or more, and y is 1 or less). The copper indium selenide/sulfide-based thin film is copper indium gallium selenide/sulfide-based thin film or copper zinc tin selenide/sulfide thin film. The electrolyte solution further includes supporting electrolyte and complexing agent. The precursor is chloride, sulfate, nitrate, acetate or hydroxide of metal chosen from indium, gallium, zinc, tin, aluminum and its alloy, selenium dioxide, selenous acid or selenium tetrachloride. The atomic ratio of copper, indium and selenium in electrolyte solution is 0.8-1.2:1-5:1.8-2.2, preferably 1:4:2. The supporting electrolyte is potassium chloride or lithium chloride. Preferred Property: The electrolyte solution has pH of 1.5-3.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The complexing agent is triethanolammine, citric acid, tartaric acid, sulfamic acid, sodium citrate, potassium hydrogen phthalate and/or potassium thiocyanate. The solvent is water and/or alcohol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The solid fuel comprises surfactant and synthetic resin particulate or synthetic rubber. The sludge contains activated sludge and latex. Preferred Properties: The solid fuel has lower explosive limit of 100 g/m3 or more and minimum ignition energy of 200 mJ or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal layer includes gold, aluminum, silver and copper. The semiconductor layers include titanium dioxide, cerium oxide, zinc oxide, silicone, germanium, silicon carbide, cadmium selenide, gallium phosphate and gallium nitride.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The solar cell further comprises a recombination barrier layer and an optical scattering layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The carbazol derivatives has a structure of formula (I), and is (Z)-2-cyano-3-(4-(3-(9-(4-((Z)-2-cyano-3-hydroxy-3-oxo-prop-1-enyl)phenyl)carbazol-3-yl)carbazol-9-yl)phenyl)prop-2-enoic acid.X1, X2 = H, 2-20C-alkenyl, 2-20C-alkynyl, optionally substituted aromatic hydrocarbyl or optionally substituted aromatic heterocyclic group, preferably phenyl, naphthalene, anthracene, thiophene or furans;n = 0-5;m = 1-5;R1, R2 = H, 1-20C-alkyl, 2-20C-alkenyl, optionally substituted aromatic hydrocarbyl or optionally substituted aromatic heterocyclic group; andA1, A2 = H, 1-20C-optionally substituted aromatic hydrocarbyl or electron withdrawing group.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The number-average molecular weight of aromatic fused ring compound (I) is 500-1000000 g/mol. Preferred Composition: The photoactive layer further includes electron donor and electron acceptor. The electron donor is heterocyclic fused ring compound. The electron acceptor is fullerene, or its derivative.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The glass powder contains 15-35 mol% phosphorus pentoxide, 15-25 mol% zinc oxide, 3-20 mol% bismuth(III) oxide, 1-5 mol% barium oxide and 1-3 mol% titanium oxide.
TECHNOLOGY FOCUS - METALLURGY - The thermoelectric conversion material is selected from a group consisting of a bismuth, antimony, tellurium, lead, selenium, zinc, cobalt, manganese, magnesium, germanium and iron.
TECHNOLOGY FOCUS - METALLURGY - The substrate is made of gallium arsenide material.
TECHNOLOGY FOCUS - BIOLOGY - Preferred Components: The vegetation mat includes Russian iris, duckweed, Typha angustata, water hyacinth, Phragmites communis, and Oenanthe javanica.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The solar cell is etched using etchant. Preferred Composition: The light absorption layer comprises foreign particles. The etchant comprises potassium cyanide.
TECHNOLOGY FOCUS - BIOLOGY - Preferred Composition: The yeast culture is Saccharomyces cerevisiae culture. The fermentation supernatant product comprises bionutrients chosen from biotin, folic acid, niacin, inositol, pantothenic acid, pyrodoxine hydrochloride, riboflavin, thiamine, calcium, chromium, copper, iron, magnesium, phosphorus, potassium, sodium, zinc, alanine, arginine, aspartic acid, cystine, glutamic acid, glycine, lysine, methionine, phenylalanine, proline, serine and threonine.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The composition comprises 1-15 wt.% nonionic surfactant and 5-35 wt.% fermentation supernatant product. The nonionic surfactant is ethoxylated alkylphenol or 12-20C aliphatic alcohol and ethoxylated dodecyl or tridecyl secondary alcohol. Nonionic surfactant of the anaerobic digestion process is chosen from ethoxylated nonylphenol and ethoxylated octyl phenol. The organic material of biocatalytic composition comprises animal waste, hydrocarbon and waste material from meat rooms, slaughter houses or food processors having high levels of fats, oils, and greases.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The coolant comprises one of compounds including an alkane, an olefinic hydrocarbon, an alcohol, a molecule comprising an amine, a molecule comprising a thiol, a molecule comprising a chlorine.
TECHNOLOGY FOCUS - METALLURGY - Preferred Properties: The back electrode has thickness of 10-20 mm and 2-3 mm, respectively. The aluminum-silver film has thickness of 15-20 mm. The antireflection film is silicon nitride or silicon oxide, and has thickness of 70 nm. The positive electrode has main thickness of 10-20 mm and width of 2-3 mm. Preferred Components: The P-type crystalline silicon layer is boron-doped single crystal silicon or polycrystalline silicon. The N-type crystalline silicon layer is mono-crystalline or polycrystalline silicon doped with phosphorus.
TECHNOLOGY FOCUS - METALLURGY - The non-ferromagnetic skin is aluminum metal.
Preferred Definitions:    X=fluoro or trifluoro methyl;    A=2-cyano-acrylate, rhodanine-3-acetic acid or 5-oxo-1-phenyl-2-pyrazol-1-acetic acid;and    B'=thiophenyl, furanyl or pyrrolyl.    SPECIFIC COMPOUNDS - Two organic dye compounds i.e. (2Z)-3-(4-(3,7-bis(thiophen-2-yl)-10H-phenothiazin-10-yl)-2-fluorophenyl)-2-cyanoprop-2-enoic acid of formula (Ia) and (2Z)-3-(4-(3,7-bis(thiophen-2-yl)-10H-phenothiazin-10-yl)-2-(trifluoromethyl)phenyl)-2-cyanoprop-2-enoic acid are specifically claimed.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The iodine-based redox pair contains iodide chosen from lithium iodide, sodium iodide, potassium iodide, magnesium iodide, copper iodide, iodide silicon, iodide manganese, barium iodide, molybdenum iodide, calcium iodide, iron iodide, cesium iodine, zinc iodide, mercury iodide, ammonium iodide, methyl iodide, methylene iodide, ethyl iodide, ethylene iodide, isopropyl iodide, isobutyl iodide, benzyl iodide, benzoyl iodide and allyl iodide. The amount of iodide is 0.05-10 M.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hole transport material contains heterocyclic compound of formula (I) or (II), preferably 4-(2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)-N,N-bis(4-(2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)aniline, 4-(7-phenyl-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)-N,N-bis(4-(7-phenyl-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)aniline, 4-(7-(2-phenylphenyl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)-N,N-bis((4-(7-(2-phenylphenyl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl))aniline, 4-(7-tert-butyl-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)-N,N-bis(4-(7-tert-butyl-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)aniline, N-phenyl-4-(4-(phenyl(4-(2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)amino)phenyl)-N-(4-(2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)aniline, N-phenyl-4-(4-(phenyl(4-(7-phenyl-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)amino)phenyl)-N-(4-(7-phenyl-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)aniline, and N-(4-(7-(naphthalen-1-yl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)-4-(4-((4-(7-(naphthalen-1-yl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)(phenyl)amino)phenyl)-N-phenylaniline. The amount of hole transfer material is 0.05-10 M. The ionic liquid comprises 1-methyl-3-ethyl imidazolium dicyanamide and/or (1-ethyl-3-methylimidazolium bis (trifluoromethane sulfone) amide). The electrolyte further comprises iodine-based redox pair.R1-R3=H, 6-12C aryl, 1-10C alkenyl or 1-10C alkyl;andR4-R7=R1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The iron (II) salt comprises iron (II) chloride. The base includes calcium oxide or calcium hydroxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The method further involves adding an alkaline-earth halide salt to the sealing agent to form alkaline-earth carbonate precipitate from decomposition of carbonyl compound in presence of alkaline-earth halide salt. Preferred Composition: The alkaline-earth halide salt contains calcium chloride, magnesium chloride, calcium bromide, calcium iodide, magnesium bromide and/or magnesium iodide. The molar concentration of alkaline-earth halide salt is 0.01-100 M.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The carbonyl compound is urea. The carbonyl compound is dimethyl carbonate. The molar concentration of carbonyl compound is 0.01-100 M. The molar ratio of carbonyl compound to alkaline-earth halide salt is 100:1-1:100. The acid solution contains hydrochloric acid, acetic acid, formic acid, citric acid, oxalic acid, nitrilotriacetic acid, ethylenediamine tetraacetic acid and diethylenetriamine pentaacetic acid. The sealing agent further contains flow control additive, catalyst, nucleation enhancer, viscosity flow modifier and filler.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Components: (I) are compounds of formulae (III), (IV), (V) and (VI).E1, E2 = H, D, F, 1-40C alkyl, 5-40C aryl, 3-40C heteroaryl, 5-40C aryloxy, 1-40C alkoxy, 5-40C arylamino, 5-40C diarylamino, silyl, 6-40C arylalkyl, 3-40C cycloalkyl, 3-40C heterocycloalkyl, fused aliphatic ring, fused aromatic ring, fused heterocyclic aliphatic ring or fused heterocyclic aromatic ring. SPECIFIC COMPOUNDS - 183 Compounds (A) are specifically claimed, e.g. 6,6'-diphenyl-4,4'-bidibenzo(b,d)thiophene (Ia), 6,6'-di(naphthalen-1-yl)-4,4'-bidibenzo(b,d)thiophene, 6,6'-di(naphthalen-2-yl)-4,4'-bidibenzo(b,d)thiophene, 6,6'-di(phenanthren-9-yl)-4,4'-bidibenzo(b,d)thiophene and 6,6'-bis(9,9-dimethyl-9H-fluoren-2-yl)-4,4'-bidibenzo(b,d)thiophene.    EXAMPLE - 4.5 g 4-Bromo-6-phenyldibenzo(b,d)thiophene, 4.03 g 6-phenyldibenzo(b,d)thiophen-4-ylboronic acid, 306 mg tetrakis(triphenylphosphine)palladium(0), 2.75 g potassium carbonate, 200 ml 1,4-dioxane and 20 ml purified water were reacted to obtain 5.1 g 6,6'-diphenyl-4,4'-bidibenzo(b,d)thiophene (Ia).
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The organic electroluminescent device further comprises an electron layer and a hole layer including the fluorine derivative. The organic layer comprises a hole injection layer, a hole-transport layer, a hole blocking layer, and an electron-transport layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The reactive ion used in plasma-ion etching process is chosen from argon, nitrogen, oxygen, hydrogen, methane, ethane, ethylene, carbon dioxide, carbon monoxide, water, fluorine and fluorocarbon.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer is membrane polymer material chosen from hydrogen-ion conductive ionomer and nonionic conductive polymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The upper electrode is transparent conductive oxide electrode containing tin oxide, doped by fluorine antimony or arsenic, indium-doped tin oxide, or zinc oxide-doped aluminum. The lower electrode is transparent electrode comprising indium tin oxide, fluorine tin oxide, antimony tin-oxide, zinc oxide, tin oxide, zinc oxide-gallium oxide, zinc oxide-alumina and metallic catalyst.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The chromene-type dye is(2E)-3-(2H-chromen-3-yl)-2-cyanoacrylic acid, (2E)-2-cyano-3-(6-methoxy-2H-chromen-3-yl)acrylic acid, (2E)-2-cyano-3-(6-methoxy-2,2-dimethyl-2H-chromen-3-yl)acrylic acid, (2E)-2-cyano-3-(6-methoxy-2-phenyl-2H-chromen-3-yl)acrylic acid or (2E)-2-cyano-3-(4-methoxy-2-phenyl-2H-chromen-3-yl)acrylic acid. The electrolyte is halogen redox-type electrolyte, ferrocene-type electrolyte, metal oxide reducing electrolyte, alkylthiol-alkyldisulfide and/or organic acid reduction-type electrolyte.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The light absorption layer evaporates copper, indium, gallium or selenium.
TECHNOLOGY FOCUS - METALLURGY - The prolonged part of the web is made of flexible impermeable material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The silicon nitride medium layer is covered on the coplanar waveguide transmission line of the substrate. The gold germanium nickel/gold metals are sputtered on the thermocouple arm. The tantalum nitride on the thermocouple arm is removed. A polyimide sacrificial layer is filled on the transmission line. The titanium or gold is evaporated on the sacrificial layer of the substrate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The absolute ethyl alcohol is made to flow in the polyimide sacrificial layer of the substrate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Components: (Q) comprises carbazole compounds of formulae (III) to (VIII). In fromulae (III) to (IV),n = 0-5; andm = 0-11.In fromulae (V) to (VIII),n, m = 0-5. Preferred Definitions:    Y1, Y2 = optionally substituted phenylene, naphthylene, antracenylene, thiophene or furyl; and    A1, A2 = carboxylic acid, phosphorous acid, sulfonic acid, phosphinic acid, hydroxy acid or oxycarboxylic acid.    SPECIFIC COMPOUNDS - 4 compounds (Q) are specifically claimed: (Z)-2-cyano-3-(9-ethyl-6-(9-ethylcarbazol-3-yl)carbazol-3-yl)prop-2-enoic acid of formula (Ia), (Z)-2-cyano-3-(6-(6-((Z)-2-cyano-3-hydroxy-3-oxo-prop-1-enyl)-9-ethyl-carbazol-3-yl)-9-ethyl-carbazol-3-yl)prop-2-enoic acid, (Z)-2-cyano-3-(5-(9-ethyl-6-(9-ethyl-6-(2-thienyl)carbazol-3-yl)carbazol-3-yl)-2-thienyl)prop-2-enoic acid and (Z)-2-cyano-3-(5-(6-(6-(5-((Z)-2-cyano-3-hydroxy-3-oxo-prop-1-enyl)-2-thienyl)-9-ethyl-carbazol-3-yl)-9-ethyl-carbazol-3-yl)-2-thienyl)prop-2-enoic acid.    EXAMPLE - Cyanoacetic acid (0.0043 mol) and piperidine (0.0043 mol) were successively added to 9,9'-diethyl-3,3'-carbazole-6- carboaldehyde (0.0015 mol) and were dissolved in chloroform (20 ml). The reaction mixture was refluxed and stirred for 24 hours to worked upto give (Z)-2-cyano-3-(9-ethyl-6-(9-ethylcarbazol-3-yl)carbazol-3-yl)prop-2-enoic acid (0.59 mmole).
TECHNOLOGY FOCUS - METALLURGY - The metal plate is formed as a steel tile, a zinc plating plate and an aluminum profile.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The apparatus for increasing the efficiency of a power plant includes an organic motive fluid with iso-pentane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The conductor assemblies and the metallic shield comprise lead.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The conductor assemblies comprise ethylene propylene diene monomer (EPDM), polyetheretherketone (PEEK), and PETE. The member of jacket consists of EPDM, nitriles, hydrogenated nitrile butadiene rubber (HNBR), fluoropolymers, and chloroprene. The insulation comprises PEEK or EPDM.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The impurity comprises indium. The buffer layer comprises cadmium sulfide. A resistor buffer layer comprising i-zinc oxide is formed on the buffer layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): The 6,6'-diamino-2,2'-bipyridine-4,4'-dicarboxylic acid compound is prepared by heat-processing carboxylic acid group-containing compound of formula (II) in ammonia aqueous solution, obtaining 2-amino-6-halo isonicotinic acid, esterifying the obtained 2-amino-6-halo isonicotinic acid, obtaining amino group-containing compound of formula (III), acylamino-izing the obtained amino group-containing compound using carboxylic acid halide or carboxylic anhydride, obtaining pyridine-type compound of formula (IV), performing coupling reaction of the obtained pyridine-type compound, obtaining bipyridine-type compound of formula (V), hydrolyzing the obtained compound (V) and esterifying.X=chloro, bromo or iodo;R'=R;R1=1-10C alkyl;andR2=aryl or 1-10C alkyl (both optionally substituted). SPECIFIC COMPOUNDS - 2 6,6'-Diamino-2,2'-bipyridine-4,4'-dicarboxylic acid compounds are disclosed e.g. 6,6'-amino-2,2'-bipyridine-4,4'-dicarboxylic acid dimethyl ester of formula (A), and 6,6'-diamino-2,2'-bipyridine-4,4'-dicarboxylic acid diethylester.    EXAMPLE - 60.0 mg 6,6'-amino-2,2'-bipyridine-4,4'-dicarboxylic acid was suspended in 20 ml methanol, 0.3 ml concentrated sulfuric acid was added heated and refluxed for 12 hours. The resultant solution was filtered, 1 M sodium hydroxide aqueous solution was added to the resultant residue, filtered to remove insoluble solid, washed with water and ether, and dried, to obtain 32 mg 6,6'-amino-2,2'-bipyridine-4,4'-dicarboxylic acid dimethyl ester compound having yield of 48.4%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The buffer layers comprise: a first buffer layer; and a second buffer layer on the first buffer layer. The first buffer layer and second buffer layer have zinc selenide. The first buffer layer has a band gap of 1.5-2.6 eV, and the second buffer layer has a band gap of 2.7-3.7 eV. The second buffer layer is thicker than the first buffer layer. The first buffer layer has a thickness of 2-10 nm and the second buffer layer has a thickness of 5-50 nm. Preferred Method: The step of forming buffer layers comprises: forming the first buffer layer on the light absorbing layer using zinc solution and selenide solution as a base and forming a second buffer layer on the first buffer layer using zinc solution and selenide solution as a base; or growing zinc sulfide after forming an selenide-rich layer on the light absorbing layer.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The Zigbee protocol is operated based on IEEE 802.15.4.
TECHNOLOGY FOCUS - METALLURGY - The collection region layers are made of germanium, gallium-antimony alloy, gallium indium antimony alloy, gallium indium arsenide alloy, gallium indium arsenide antimony alloy and indium gallium arsenide alloy. The undoped substrate is made of semi-insulating gallium arsenide alloy, silicon and indium phosphide alloy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The p-doped semiconductor layer comprises p-doped microcrystalline silicon sub-layer and p-doped amorphous silicon sub-layer. The n-doped semiconductor layer comprises n-doped microcrystalline silicon sub-layer and n-doped amorphous silicon sub layer. The wide optical band gap interface film is free of carbon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The glass frit comprises 55-65 pts. wt. of lead oxide, 8-18 pts. wt. of silicon dioxide, 10-20 pts. wt. of boron trioxide, 5-15 pts. wt. of aluminum oxide and 0.9-2.9 pts. wt. of titanium dioxide. The amount of glass frit in the paste composition is 1-3 pts. wt. The amount of conductive powder is 50-90 pts. wt. The amount of the organic vehicle is 10-50 pts. wt. The conductive powder comprises aluminum.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The paste composition further comprises 0.1-10 pts. wt. of an additive. Preferred Components: The additive consists of dispersing agent, thixotropic agent, leveling agent or antifoaming agent. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The high-resistance buffer layer is made of zinc oxide. The impurity doping layer is made of molybdenum.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The transparent protective plate has a level difference part.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The oil gelling agent is at least one member of a hydroxy fatty acid, n-lauroyl-L-glutamic acid- alpha , beta -dibutylamide, di-para-methybenzylidene sorbitol glucitol, 1,3:2,4-bis-O-benzylidene-D-glucitol, 1,3:2,4-bis-O-(4-methylbenzylidene)-D-sorbitol, bis(2-ethylhexanoato)hydroxyaluminum or compounds substituted methoxy benzene trifluoromethyl alkyl compounds of formula (I), substituted methoxy benzene carbonyl methyl chromene compounds of formula (II), substituted methoxy benzene carbonyl methyl chroman compounds of formula (III), substituted cyclohexyl crhomene compounds of formula (IV), 1,1'-(4,4'-methylenebis(4,1-phenylene))bis(3-octylurea), cyclohexyl amino carbonyl compounds of formula (VI), substituted benzyloxy amide compounds of formula (VII), substituted benzyloxy amide compounds of formula (VIII), ((2S,5S)-5-benzyl-3,6-dioxo-piperazin-2-yl)-acetic acid 3,7-dimethyl-octyl ester, substituted cyclohexyl diamino compounds of formula (X), 2-(2-ethyl-hexanoylamino)-pentanedioic acid bis-butylamide or 2-dodecanoylamino-pentanedioic acid bis-butylamide. (A) includes a compound having an ethylenically unsaturated group. The photocurable resin composition further contains: a photopolymerization initiator; a compound (D) which is liquid at 25 degrees C; and a compound (E), which is solid at 25 degrees C.m = 3-10;n = 2-6;R1-R10 = 1-20C saturated hydrocarbon;X = S or O; andY1, Y2 = bond or benzene. EXAMPLE - 98 mass% of ortho-phenylphenoxyethyl acrylate, 1 mass% of n-lauroyl-L-glutamic acid- alpha , beta -dibutylamide (oil gelling agent) and 1% by mass of 1-hydroxycyclohexyl phenyl ketone were charged in a screw tube and the screw tube was heated in a water bat at 90 degrees C to dissolve the oil gelling agent to obtain the photocurable resin composition.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: A functional group containing silicon is present in modified polymer (A1). The modified polymer (A1) comprises an olefin based modified polymer. The modified polymer (A1) comprises a modified polymer based on a copolymer of ethylene with at least one other olefin. The polyolefin (B1) has a chemical structure derived from propylene. The adhesive layer is bonded to an adherend through an adhesive auxiliary layer. EXAMPLE - 25 pts. wt. VESTOPLAST EP2412 (RTM: Modified amorphous poly- alpha -olefin to which functional group containing silicon is present), 25 pts. wt. Vistamaxx 6202 (RTM: Polypropylene base elastomer), 25 pts. wt. LICOCENE PP2602 (RTM: Crystalline propylene-ethylene wax) and 15 pts. wt. Hi-WAX NP105 (RTM: Crystalline polypropylene wax) were added, melted and mixed at 170 degrees C over 1 hour to produce hot-melt adhesive. The hot-melt adhesive was formed into sheets to produce adhesive sheet.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The zinc oxide precursor is zinc acetate hydrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The thermal barrier coating layer is made from aluminum oxide, zirconium dioxide and yttrium oxide materials.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The weight ratio of oxidized graphene precursor and nanosilver particles is 1:0.2-1:3.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The silver halide of compound is chosen from hexafluoroacetylacetone, acetylacetonate, 2,2,6,6-tetramethyl-3,5-heptanedionate, 1,1,1-trifluoro-2,4-pentanedionate, 2,2,7-trimethyl-3,5-octanedionate, and 1,1,1-trifluoro-5,5-dimethyl-2,4-pentanedionate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (Q) comprises: dissolving 4,4'-dibromo-2,2'-bipyridine in hydrophobic groups containing hexyl, octyl or thiol groups and in a solvent and base, and refluxing the dissolved mixture; removing impurities from the hydrophobic group using ultra pure water and recrystallizing to prepare a ligand; reacting ligand with dichloromethane and dichloro(p-cymene)ruthenium(II) at 60-100 degrees C; adding 2,2'-bipyridine-4,4'-dicarboxylic acid to the reaction mixture and raising the temperature to 130-170 degrees C; and adding ammonium thiocyanate to the reaction mixture. Preferred Process: The removing step comprises adding 2-3 equivalents of sodium hydroxide to the fixed position of mixture and introducing carboxylic acid and sodium acetate to the mixture and purifying to remove impurities; performing pH titration steps using pH meter to obtain a solution; and filtering and drying the solution. Preferred Components: The thiol is 1-hexanethiol or 1-octanethiol. The base is potassium hydroxide. The solvent is dimethylformamide. EXAMPLE - 4,4'-Dibromo-2,2'-bipyridine (3.81 g), 1-octane thiol (4.25 g) and potassium hydoxide (4.07 g) were dissolved in dimethylformamide (100 ml) and the mixture was refluxed overnight. The mixture was recrystallized in the ultra-pure water and impurities were removed from the mixture to obtain 4,4'bis(methylsulfanyl)-2,2'-bipyridine as a ligand. Dichloromethane (0.688 g) and dichloro(p-cymene)ruthenium(II) (1 g) were added to the ligand and reacted for 4 hours. Then ammonium thiosulfate was added to the reaction mixture to obtain (Q).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The sun gear contains chromium-nickel molybdate (18CrNiMo6). The hollow shaft contains chromium molybdate (42CrMo4).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The sodium, potassium, nickel, calcium, magnesium, cobalt, lithium, copper, zinc, aluminum, iron, nitrate, sulphate or aqueous solution of phosphate is used as mediator. The electrodes are made of graphite, doped graphite alkene, diamond-like carbon film, indium tin oxide glass, graphite or metal.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The zinc oxide layer of the thin film solar cell is formed using zinc oxide derived from zinc oxide aluminum alloy or zinc oxide gallium alloy. The zinc sulfide buffer layer is grown using ammonia reacting solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition comprises a conductive powder that includes aluminum, 5-15 pts. wt. of an organic vehicle, and 1-3 pts. wt. of glass frit. Preferred Components: The first powder is present in an amount of 35.42-45.42 pts. wt., preferably 36.1-42.1 pts. wt. The second powder is present in an amount of 24.54-34.54 pts. wt., preferably 9.9-31.1 pts. wt. The third powder is present in an amount of 1-11 pts. wt., preferably 1.8-7.8 pts. wt. The first to third powders are spherical or non-spherical powder. The first and third powders are spherical powder. The second powder is non-spherical powder. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The etching solution comprises methanol and deionized water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The solar cell further has insulator containing molybdenum oxide.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The test ports are formed with a RS232 port, a RS485 test port and a CAN test port.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Process: In dye-sensitized solar cell, phenothiazine derivative is used for optical absorption. The cathode includes fluorine-doped tin oxide glass. The counter-electrode has fluorine-doped tin oxide glass having thermally-evaporated platinum.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanocrystalline metal oxide further comprises nanocrystalline titania. Preferred Definitions:    x=3.
TECHNOLOGY FOCUS - POLYMERS - The conducting composition comprises at least one conducting polymer and at least one polyelectrolyte, or at least one conjugated polyelectrolyte.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The abrasive article comprises substrate having upper surface, and an abrasive layer which is formed on the upper surface of the substrate. The filler material comprises iso-polyoxometalate. Preferred Process: The filler material is obtained by preparing a precursor filler material containing powder material. The precursor filler material is obtained by forming colloidal suspension including filler material, and passivation agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dielectric layer is made of tantalum oxide, oxidation titanium, molybdenum trioxide, nickel oxide, tungsten oxide, zinc sulfide, cupric oxide, zirconium oxide, magnesium oxide, nickel oxide, vanadium oxide, manganese oxide and tin oxide. The metal thin film layer is made of silver, gold, copper, aluminum, nickel and platinum. The photoactive layer is made of vanadium oxide and cupric oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: (I) is in the form of salt having a structure of formula (RX).R = H, alkyl, cycloalkyl, or arylalkyl; andX = halo, NO3, N(CN)2, BF4, ClO4, PF6, (CF3)2PF4, (CF3)3PF3, (CF3)4PF2, (CF3) 5PF, (CF3)6P, CF3SO3, CF3CF2SO3, (CF3SO2)2N, (FSO2)2N, CF3CF2(CF3)2CO, (CF3SO2)2CH, (SF5)3C, (CF3SO2)3C, CF3(CF2)7SO3, CF3CO2, CH3CO2, SCN or (CF3CF2SO2)2N.Preparation: No preparation method is given.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The electrolyte further comprises oxidation-reduction pair including halogen containment oxidation-reduction pair comprising halogen ion and polyhalogen ion. The photoelectric conversion element has: a photocurrent density of 12-5 mA/cm2; open circuit photo voltage of 0.5-1 V; fill factor of 0.5-0.7%; and a phosphor conversion efficiency of 5-7%. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The metal wire braided armored layer is formed by a tinned copper wire.    TECHNOLOGY FOCUS - POLYMERS - The inner insulating layer is made of PVC material. The outer insulating layer is made of nylon material.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - A power distribution unit is connected with an USBpower supply unit and an external USBdevice.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The anti-reflective layer is made of zinc oxide, titanium dioxide, zinc sulfide, barium sulfate or basic lead carbonate. The insulation layer is made of pigment such as lead chromate, iron oxide and lead oxide.
TECHNOLOGY FOCUS - POLYMERS - The vacuum insulation assembly includes housing material made of polyethylene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises: supplying heat generated from the generating of the secondary hydrogen in the second gasification unit to the first gasification unit; generating a metal oxide by reacting the metal fuel in the second gasification unit, and reducing and reusing the metal oxide as the metal fuel; removing impurities from the generated carbon monoxide and hydrogen in a gas cleaning unit; adding an alkaline material along with the metal fuel to the first gasification unit; and generating heat from the generating the secondary hydrogen by reacting the metal fuel with the water and the catalyst. The step of generating carbon monoxide and hydrogen comprises: generating the carbon monoxide and primary hydrogen by gasifying the coal in the first gasification unit, generating secondary hydrogen by reacting the metal fuel in the second gasification unit, and supplying the secondary hydrogen generated in the second gasification unit to the first gasification unit; and gasifying both the coal and the metal fuel in the first gasification unit. The step of gasifying both carbon monoxide and hydrogen comprises: generating the carbon monoxide and primary hydrogen by reacting the coal with water and oxygen; and generating secondary hydrogen by reacting the metal fuel with water and a catalyst. Preferred Components: The metal fuel comprises aluminum powder or magnesium powder. The alkaline material is sodium hydroxide, potassium hydroxide or gallium. The second gasification unit supplies heat generated from the generating of the secondary hydrogen in the second gasification unit to the first gasification unit. The first gasification unit generates the carbon monoxide and primary hydrogen by reacting the coal with water and oxygen. The second gasification generates secondary hydrogen by reacting the metal fuel with water and a catalyst. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The component (b) is an alkali metal carbonate. The amount of component (b) is 0.2-5 wt.%. The component (a) is an alkali metal nitrite and is present in an amount of 0-50 wt.%. The alkali metal nitrate component of the component (a) comprises (a1) 20-55 wt.% potassium nitrate, and (a2) 45-80 wt.% sodium nitrate. The alkali metal carbonate is sodium carbonate (preferred) or potassium carbonate. The nitrate salt composition is in molten form. EXAMPLE - Solar Salt 500 g was mixed with 5 g sodium carbonate and heated in a stainless steel container at 300 degrees C. Subsequently, during an hour, 6 g nitric oxide mixed with 5 l water and carbon dioxide-free air, was introduced into the melt and the nitrate salt composition was obtained.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal nanoparticle consists of platinum, palladium, rhodium, ruthenium, iridium, osmium, titanium, zirconium, vanadium, molybdenum, copper, silver and gold.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The bonding bottom layer contains chromium aluminum alloy (MCrAlY, M is nickel and/or cobalt), chromium aluminum hydroxide (McrAH) containing 15-30 %mass chromium, 8-15 %mass aluminum and 0.1-3 %mass yttrium. The ceramic surface layer is zirconium oxide, yttrium oxide, cerium oxide, alumina or silicon carbide. Preferred Properties: The bonding bottom layer has thickness of 50-150 mu m. The gradient transition layer has thickness of 50-150 mu m. The ceramic surface layer has thickness of 200-400 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I) comprises: (a) respectively adding antimony, manganese and tellurium into an ampoule under vacuum condition and melting; (b) manufacturing ingots by quickly cooling the molten materials; (c) manufacturing powder of (I) by crushing the ingot; and (d) sintering the powder by hot press or electric discharge plasma sintering process and carrying out wire cutting. Preferred Method: The step (a) is carried out at 450-600 degrees C for 5-10 hours. The quick cooling process in the step (b) includes immersing the ampoule in water. The hot press or electric discharge plasma sintering process of step (d) is carried out at 300-600 degrees C for 5 minutes to 3 hours under 30-300 MPa pressure condition. EXAMPLE - Antimony, manganese and tellurium having purity of more than 99.999% were washed with hydrochloric acid, nitric acid, acetone and ethanol, and then antimony, manganese and tellurium were weighed in the ratio of 0.02:0.98:1. The raw materials were loaded into a quartz tube ampoule with 10-5 Torr internal pressure, argon was filled in the ampoule and then sealed. The raw materials in the ampoule were processed by high frequency induction melting at 450 degrees C for 5 hours under vacuum condition into a liquid state, then the ampoule was immersed in water to cool, then crushed into powder, and sintered at 550 degrees C for 5 minutes under 30 MPa pressure condition into bars. Then wire cutting was processed on the sintered bars to obtain the antimony-doped manganese-tellurium-based thermoelectric material of formula (Mn0.98Sb0.02Te), of predetermined shape.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nitrate salt composition is in molten form. Preferred Components: The component (B) is an alkali metal carbonate, and comprised in an amount of 0.2-5 wt.%. The component (A) comprises alkali metal nitrite is present in a total amount of 0-50 wt.% based on the component (A). The alkali metal nitrate component of the component (A) is composed of A1) 20-55 wt.% potassium nitrate and A2) 45-80 wt.% sodium nitrate. The alkali metal carbonate is selected from sodium carbonate (Na2CO3) and potassium carbonate (K2CO3) (preferably Na2CO3). EXAMPLE - 500 g of Solar salt (300 g of NaNO3, 200 g of KNO3) were mixed with 5 g of sodium carbonate (corresponding to 0.11 mass% of carbon) and heated to 300 degrees C in stainless steel vessel. 6 g of NO mixed with 5 l of water- and carbon dioxide-free air were subsequently introduced into the melt over a period of one hour. Analysis of the melt after the end of the experiment gave a total carbon content of 0.031 mass%. In this experiment, 2 g of NO equivalents were able to be bound by conversion of the carbonate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Scale remover contains hydrochloric acid, sulfuric acid, and/or nitric acid. Preferred Process: The pH of scale remover is adjusted to 1-2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The transparent conductor electrode is made of indium tin oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metallic sulfate of the solar cell is selected from lithium sulfate, sodium sulfate, potassium sulfate, rubidium sulfate, cesium sulfate, beryllium sulfate, magnesium sulfate, calcium sulfate, strontium sulfate, barium sulfate, radium sulfate, chrome sulfate, cobalt sulfate, tin sulfate, manganese sulfate, silver sulfate, mercury sulfate, lead sulfate and mixture of above sulfates.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method comprises cooling the mixture for 1-15 minutes after ultrasonically dispersing the mixture dispersing the mixture for 5- 15 times. The dispersion step is carried out for 3-7 hours, and further comprises forming the titanium dioxide layer and plasticizing 100-140 degrees C. The method comprises absorbing the dye in the titanium dioxide layer, and coating the titanium dioxide paste on a substrate arranged on an upper portion of an electrode. Preferred Components: The titanium dioxide nanoparticle has an additive content of 7-13 wt.%. The titanium dioxide precursor is titanium alkoxide, titanium chloride or titanium phosphorus. The titanium alkoxide is titanium isopropoxide (TIPP), titanium methoxide, titanium ethoxide, titanium tetrabutoxide, titanium tetra iso butoxide, titanium(IV) tert-butoxide or titanium phosphorus. The titanium dioxide precursor has additive content of 0.05-0.2 mole. The water has an additive content of 2-4 mole based on the titanium dioxide precursor of 1 mole.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alcohol is ethanol, methanol, propanol or butanol and phosphoric acid. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: The method further comprises immersing the substrate in phosphoric acid solution to broaden the multiple holes after the step (d). The step (b) is performed in 0.3 M aqueous oxalic acid solution at 15 degrees C for 12 hours by applying a voltage of 40 V. The step (d) is performed in 0.3 M aqueous oxalic acid solution at 15 degrees C for 3 minutes by applying a voltage of 40 V. The step (c) is processed in an aqueous solution dissolved with phosphoric acid and chromic acid at 60 degrees C for 6 hours. The deposition and distribution of the metal on the aluminum structure layer comprises coating gold film on the surface of the aluminum structure layer using a thermal evaporator, and then heating at 600 degrees C for 3 hours to carry out chemical vapor deposition. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I) comprises (a) reacting aminoalkyl imidazole and saturated fatty acid to obtain corresponding imidazolyl alkanamide compound, and (b) dissolving iodide salt in ethyl acetate and then reacting with imidazolyl alkanamide compounds obtained in the step (a). Preferred Components: (I) have basic structure of N-(hexanamidopropyl)alkylimidazolium iodide and is formed by substituting iodide as inorganic anion to organic imidazolium cation. (I) exist in solid or liquid state. The aminoalkyl imidazole is 1-(3-aminopropyl)imidazole. The saturated fatty acid is n-hexanoic acid. The iodide salt is methyl iodide, benzyl iodide or allyl iodide. The electrolyte is in a liquid or a semi-solid form (gel type composite) at room temperature, where the semi-solid form has more iodide content. EXAMPLE - 1 g N-(3-(1H-Imidazol-1-yl)propyl)hexanamide (prepared by dissolving 2 g 1-(3-aminopropyl)imidazole and 2 g hexanoic acid in 50 ml dichloromethane, adding 4 g N,N-dicyclohexylcarbodiimide, reacting at 50 degrees C for 36 hours, removing water and dichloromethane, stratifying, concentrating organic layer and purifying by column chromatography) and 1.9 g iodomethane were dissolved in 5 ml ethyl acetate and were placed in well-sealed tube and reacted at 60 degrees C for 24 hours, and then washed the obtained crude product with ethyl acetate and dried under vacuum to obtain 1.3 g N-(3-hexanamidopropyl)-1-methylimidazol-1-ium iodide.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The shell is embedded with a cylinder joint or USB joint.
SPECIFIC COMPOUNDS - (2E)-3-(5-(5-((7-((5-(5-((1E)-2-carboxy-2-cyanoeth-1-en-1-yl)thiophen-2-yl)thiophen-2-yl)(4-(hexyloxy)phenyl)amino)-10-hexyl-10H-phenothiazin-3-yl)(4-(hexyloxy)phenyl)amino)thiophen-2-yl)thiophen-2-yl)-2-cyanoprop-2-enoic acid of formula (A) is specifically claimed as the derivative (I).
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Composition: The dye-sensitized solar cell has electrode (E1), light absorption layer formed on one side of the electrode (E1), electrode (E2) facing electrode (E1), electrolyte positioned in space between the electrodes (E2) and (E1) and conductive transparent substrate. SPECIFIC COMPOUNDS - 4 Dual-channel-type amine-based derivatives are specifically claimed i.e. (2E)-3-(5-(5-(4-((3-((4-(5-(5-((1E)-2-carboxy-2-cyanoeth-1-en-1-yl)thiophen-2-yl)thiophen-2-yl)phenyl)(phenyl)amino)phenyl)(phenyl)amino)phenyl)thiophen-2-yl)thiophen-2-yl)-2-cyanoprop-2-enoic acid of formula (Ia), (2E)-3-(5-(5-(4-((3-((4-(5-(5-((1E)-2-carboxy-2-cyanoeth-1-en-1-yl)thiophen-2-yl)thiophen-2-yl)phenyl)(4-(hexyloxy)phenyl)amino)phenyl)(4-(pentyloxy)phenyl)amino)phenyl)thiophen-2-yl)thiophen-2-yl)-2-cyanoprop-2-enoic acid, (2E)-3-(5-(5-(4-((3-(bis(4-(pentyloxy)phenyl)amino)-5-((4-(5-(5-((1E)-2-carboxy-2-cyanoeth-1-en-1-yl)thiophen-2-yl)thiophen-2-yl)phenyl)(4-(hexyloxy)phenyl)amino)phenyl)(4-(hexyloxy)phenyl)amino)phenyl)thiophen-2-yl)thiophen-2-yl)-2-cyanoprop-2-enoic acid and (2E)-3-(5-(5-(4-((7-((4-(5-(5-((1E)-2-carboxy-2-cyanoeth-1-en-1-yl)thiophen-2-yl)thiophen-2-yl)phenyl)(4-(hexyloxy)phenyl)amino)-9,9-dihexyl-9H-fluoren-2-yl)(4-(hexyloxy)phenyl)amino)phenyl)thiophen-2-yl)thiophen-2-yl)-2-cyanoprop-2-enoic acid.
Preferred Definitions:    R1,R2=methyl, hexyl, octyl, 1-methoxy-2-methoxyethyl, isopentyl, 3-methylheptyl, 2,7-dimethyloctyl, methoxy, ethoxy, butoxy, hexoxy, heptoxy, octoxy, 3-methylpentoxy, isopentoxy, 3-ethylheptoxy, methylphenyl, p-dimethylphenyl, t-butylphenyl, trimethylsilylphenyl, methoxyphenyl, isobutoxyphenyl, (2-methylbutoxy)phenyl, hexyloxyphenyl, (2-ethylhexyloxy)phenyl, octyloxyphenyl, (2-(2-methoxyethoxy)ethoxy)phenyl, 1,2-dimethoxyphenyl, 1,2-bis(2-methylbutoxy)phenyl, or 1,2-bis(hexyloxy)phenyl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Carbonyl group-containing compound of formula (II) is reacted with sulfur-containing compound of formula (III), to obtain organic dye.X=halo, OTs, OMs or N2BF4;M=B(OR)2, SnR3, SiOR3, ZnR2 or MgX1;R=H or 1-10C alkyl;andX1=halo. Preferred Definitions:    R14,R15=2-methylundecane or ethyl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises reacting triphenylamine-4-boronic acid and 5- bromosalicylic acid in the presence of platinum acetate. Preferred Method: The reaction of triphenylamine-4-boronic acid and 5- bromosalicylic acid is performed at a temperature of 60-80 degrees C for 5~11 hour. Preferred Components: The ligand solution has a concentration of 0.3-1 mM. The organic solvent is ethanol, methanol, propanol, isopropanol or acetonitrile. EXAMPLE - The reflux condenser was set up in the center of 250 round bottom flask. Ethanol and distilled water were mixed in a ratio of 1:1. The mixture was put into triphenylamine-4-boronic acid (28.9 g), 5- bromosalicylic acid (32.5 g) and platinum acetate (0.67 g) for 8 hours. The mixture was stirred and reacted to extract using ether. The extracted product was dry. Then, it was refined using the silica gel column chromatography which uses ether and triphenylamine salicylic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Hydroxyl group-containing compound of formula (II), carbonyl group-containing compound of formula: R1-C=C-C(=O), and 2H-chromene compound of formula (III) are reacted in the presence of organic solvent, to obtain chromene dye. Preferred Components: The organic solvent is alcohol chosen from methanol, ethanol, n-propanol, isopropanol, butanol and glycol, nitrile chosen from acetonitrile and propionitrile, acetone, sulfoxide chosen from N-methylpyrolidone and dimethylsulfoxide, amide chosen from dimethylformamide, dimethylacetamide and N- methylpyridine, dioxane, and tetrahydrofuran. SPECIFIC COMPOUNDS - 11 Chromene dyes e.g. (2E)-3-(2H-chromen-3-yl)-2-cyanoprop-2-enoic acid of formula (Ia), (2E)-2-cyano-3-(6-methoxy-2H-chromen-3-yl)prop-2-enoic acid, (2E)-2-cyano-3-(6-methoxy-2,2-dimethyl-2H-chromen-3-yl)prop-2-enoic acid, (2E)-2-cyano-3-(6-methoxy-2-phenyl-2H-chromen-3-yl)prop-2-enoic acid and (2E)-2-cyano-3-(4-methoxy-2-phenyl-2H-chromen-3-yl)prop-2-enoic acid are specifically claimed.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Definitions:    X = benzene, naphthalene, anthracene, thiophene or furan; and    A1, A2 = carboxylic acid, phosphorous acid, sulfonic acid, phosphinic acid, hydroxy acid or oxycarboxylic acid.    SPECIFIC COMPOUNDS - 2 Compounds (I) are specifically claimed, e.g. (Z)-2-Cyano-3-(5-(3-(1-thiophen-2-yl-meth-(Z)-ylidene)-3H-thieno(3,4-b)quinoxalin-(1Z)-ylidenemethyl)-thiophen-2-yl)-acrylic acid of formula (Ia); and (Z)-3-(5-(3-(1-(5-((Z)-2-Carboxy-2-cyano-vinyl)-thiophen-2-yl)-meth-(Z)-ylidene)-3H-thieno(3,4-b)quinoxalin-(1Z)-ylidenemethyl)-thiophen-2-yl)-2-cyano-acrylic acid.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The work function of the graphene is greater than 4.5 eV, preferably 4.6-5.0 eV. The graphene has optical transmittance rate in visible light area is 80% or greater. The transition metal salt comprises an iridium potassium chloride, molybdenum chloride, osmium chloride, rhodium chloride, auric chloride and palladium chloride. The concentration of the transition metal salt solution coated on the graphene is 5-50 mM. The transition metal solution includes solvent comprising ethanol, methanol, hydroxyl group, nitromethane, acetonitrile, tetrahydrofuran and diethyl ether. The coating is performed by spin coating the transition metal salt solution over the graphene surface under 10-100 degrees C at a speed of 1500-3500 revolutions per minute for 30-150 seconds. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - An electron substrate is made of indium-tin oxide glass, fluorine-doped tin oxide glass, and zinc oxide glass.
TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Process: Forging is done using hydraulic press at 3150 tesla (T), 4000 T or 5000 T, preferably 5000 T.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The acid chosen from nitric acid, sulfuric acid, hydrochloric acid, carboxylic acid and formic acid is added in the solution in which the alcohol solution, titanium precursor and base additive are mixed, and pH of the solution is controlled to 1-7. The alcohol solution is chosen from methanol, ethanol, 1-propanol, isopropanol and butanol. The base additive is tetramethyl ammonium hydroxide or tetrabuthyl ammonium hydroxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alcohol solution is methanol, ethanol, 1-propanol, isopropanol and/or butanol. The base additive is tetrabutylammonium hydroxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step of controlling the size of the titanium dioxide aggregate comprises controlling amount of the water molecule and controlling the concentration of the supplied second solution. The size of the titanium dioxide aggregate is controlled by lowering the concentration of the second solution and increasing the time of hydrolysis reaction or by increasing the concentration of the second solution and cutting down the time of hydrolysis reaction. In the mesopore formation step, the amorphous titanium dioxide powder is dipped into the solution of water and ethanol in a pre-set temperature environment for a pre-set time. Preferred Components: The titanium dioxide precursor is titanium tetraethoxide. The first solution is a solution formed by attenuating titanium tetraethoxide in ethanol. The second solution is a solution formed by diluting the aqueous solution of sodium chloride in ethanol. The thickness of the crystalline titanium dioxide electrode layer is 10-20 mu m. The thickness of the porous titanium dioxide electrode layer is 5-10 mu m. The crystalline titanium dioxide electrode layer performs the function of optical absorption, and the porous titanium dioxide electrode layer performs the function of light scattering and optical absorption.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The interdigitated back-contact solar cell structure comprises semiconductor absorber frontside (12) passivation and antireflection coating layer, which contains combination of amorphous silicon compound with hydrogen, oxygen and carbon atoms, amorphous silicon nitride compound and/or amorphous silicon dioxide compound.
TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The steel material is melted zinc-plated steel plate in which the steel plate is normal-steel plate as base material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The iron precursor is ferrous sulfate, ferric chloride, iron nitrate and ferrous sulfamate. The nickel precursor is nickel sulfate, nickel chloride, nickel nitrate and nickel sulfamate.    TECHNOLOGY FOCUS - METALLURGY - Preferred Property: The iron-nickel alloy substrate has surface roughness of 0.05-0.1 mu m. Preferred Composition: The iron-nickel alloy substrate comprises 34-62 wt.% nickel and remainder of iron and unavoidable impurities.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The iron precursor is ferrous sulfate, ferric chloride, iron nitrate and ferrous sulfamate.    TECHNOLOGY FOCUS - METALLURGY - Preferred Properties: The iron/zinc-nickel alloy substrate has surface roughness of 0.05-0.1 mu m. The alloy layer of nickel and zinc has thickness of 0.1-20 mu m. Preferred Composition: The iron/zinc-nickel alloy substrate comprises 10-18 wt.% nickel and remainder of zinc and unavoidable impurities.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The large-scale wind power slewing bearing forging preferably comprises 0.6 wt.% carbon, 0.7 wt.% silicon, 0.6 wt.% manganese, 0.2 wt.% nickel, 3 wt.% chromium, 0.2 wt.% niobium, 0.07 wt.% copper, 0.08 wt.% nitrogen, 0.18 wt.% molybdenum, 0.2 wt.% aluminum, 0.08 wt.% sulfur, 0.03 wt.% titanium, 0.8 wt.% vanadium, 0.008 wt.% boron and 1 wt.% composite rare-earth. The composite rare-earth comprises 12-15 %mass lanthanum, 15-18 %mass cerium, 16-19 %mass scandium, 9-11 %mass yttrium, 7-9 %mass samarium, 11-13 %mass neodymium, 7-9 %mass gadolinium, 1-3 %mass praseodymium, 8-15 %mass dysprosium and 1-3 %mass other lanthanides. The total amount of components in composite rare-earth is 100%. The composite rare-earth preferably comprises 13 %mass lanthanum, 16 %mass cerium, 17 %mass scandium, 10 %mass yttrium, 9 %mass samarium, 12 %mass neodymium, 9 %mass gadolinium, 3 %mass praseodymium, 8 %mass dysprosium and 3 %mass other lanthanides.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The texture layer is formed by depositing metal and heating under atmosphere containing oxygen gas, nitrogen gas, inactive gas or atmosphere gas. A metal oxide particle layer or metal nitride abrasive layer is formed by coating metal nanoparticle dispersion solution. Preferred Composition: The light absorption layer contains copper-indium sulfide, copper-gallium sulfide, copper-indium selenide, copper-gallium selenide, copper-aluminum selenide, copper-indium telluride, copper-gallium telluride, copper-indium-gallium sulfide, copper-indium-gallium selenide or copper-zinc-tin sulfide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The inorganic binder comprises a glass frit having transition point of 300-600 degrees C and softening point of 330-650 degrees C and containing oxide of bismuth, silicon, aluminum, sodium, zinc, barium, magnesium, lead, thallium, copper, chromium, cobalt, boron, cerium, thallium and/or calcium.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electrode paste composition further contains 0.01-0.1 wt.% additive including oxide of titanium, zinc, ruthenium, magnesium, palladium, zirconia and/or silicon. The average particle diameter of the conductive filler is 0.1-30 mu m. The content of coating powder is 62.5-87.5 wt.%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent is chosen from aromatic hydrocarbon, ether, ketone, lactone, ether alcohol, ester and diester.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The inorganic binder comprises a glass frit having transition point of 300-600 degrees C and softening point of 330-650 degrees C and containing boron trioxide, zinc oxide, silicon dioxide, aluminum oxide, calcium oxide, bismuth oxide, lead oxide, sodium oxide, cerium oxide, copper oxide, barium, magnesium, chromium oxide, cobalt oxide and/or iron oxide.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The oxide powder comprises boron trioxide, zinc oxide, silicon dioxide, aluminum oxide, calcium oxide, bismuth oxide, lead oxide, sodium oxide, cerium oxide, copper oxide, barium, magnesium, chromium oxide, cobalt oxide and/or iron oxide. The metal powder comprises silver powder, nickel powder, tin powder, copper powder, iron powder, palladium powder, aluminum powder, gold powder, zinc powder and/or platinum powder. The average particle diameter of the conductive filler is 0.1-30 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The metal oxide precursor comprises metal chosen from titanium, zirconium, strontium, zinc, indium, lanthanum, vanadium, molybdenum, tungsten, tin, niobium, magnesium, aluminum, yttrium, scandium, samarium and gallium.
TECHNOLOGY FOCUS - POLYMERS - The elastic unit is mounted on the upper support plate corresponding to the opposed rudder side.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The alloy substance is a highly concentrated chromium powder applied on the mold surface.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The back contact electrode is made of copper-aluminum alloy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The photoelectric transformation layer is made of aluminum zinc oxide or boron-zinc-oxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Materials: The zinc precursor is diethyl zinc.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The mixed-refrigerant further comprises propane (preferably 31-33%) and methylene fluoride (preferably 67-69%). Preferred Components: The refrigerant has ozone depletion index of 0.5, global warming potential within Refrigerant-410A of 20.84-27.7%, and volume capacity (VC) of 12.8-16.7%. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - FOOD - Preferred Components: The weight ratio of water and corn grain is 10:2. Preferred Method: The temperature of warm water is 30-50 degrees C. The water soaking time is 4-12 hours. The method comprises before puffing, preheating the puffing machine for 30-40 minutes.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The negative electrode is made of magnesium alloy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The gallium selenide, indium selenide, copper selenide and ceramic sheet are respectively processed into fan-shape portion.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The inverter comprises switches designed as silicon carbide semiconductor switches.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The photopolymerizable component is monofunctional acrylate. The thermally-polymerizable component is glycidyl-ether epoxy resin. The thermoplastic resin is rubbery polymer and/or polyimide resin. The resin composition further contains 0.01-20 parts mass thermal radical generating agent, and has viscosity of 1-80 Pa.second at 25 degrees C and thixotropy factor of 1-8.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic powder further contains a flame-retardant filler having maximum particle size (D99) of 3 mu m or less. The mass ratio of inorganic powder and vehicle is 0.7-1.1. The glass powder contains 35-70 mol% tin oxide and 10-30 mol% phosphorus pentoxide, and has maximum particle size (D99) of 10 mu m or less. The pigment is amorphous carbon or graphite, and has primary average particle diameter (D50) of 1 nm-5 mu m. The average thickness of the sealing-material layer in the wet state immediately after coating the sealing-material paste to the glass substrate is 20 ~ mm or less.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin binder is an aliphatic polyolefin-type carbonate, and has number average molecular weight of 50000-500000.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The thickness of the p-type nanocrystal silicon layer and intrinsic semiconductor layer is 0.5-1000 mu m, each respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Precipitates of zinc and manganese are dissolved to produce Zn- and Mn-containing solution which is extracted with extraction solvent to produce 1st liquid phase containing extraction solvent and Zn and 2nd liquid phase containing Mn. The 1st and 2nd liquid phases are separated, and Zn is electrochemically recovered from 1st liquid phase. Zn is contacted with hydrochloric acid to produce zinc chloride. Zn is contacted with sulfuric acid to produce zinc sulfate. During separation of 1st and 2nd liquid phases, 2nd liquid phase is reduced to form Mn(II) ion (Mn2+) which is supplied to electrochemical cell, and Mn is recovered electrochemically. Precipitates of Zn and Mn are dissolved in acid. Precipitates of Zn and Mn are dissolved in ammonium sulfate. During removal of silica and iron from geothermal brine, iron(III) is provided at pH of 4.5-6, and silica and iron are precipitated from brine. Zn and Mn are precipitated by adding sufficient base to adjust pH to 6-8 and providing air oxidant to silica-free brine. Precipitates of Zn and Mn are dissolved to produce ZnMn solution, Mn is oxidized to form Mn precipitate and Zn solution, and Mn precipitate is separated from Zn solution. Zn is recovered electrochemically by plating electrode with Zn metal from Zn solution. Precipitate is dissolved in acidic solution to recover manganese salt by adding reducing agent to ensure dissolution of greater than or equal to 95% Mn. Preferred Compositions: Mn precipitate contains less than or equal to 0.15% Zn, 4% calcium, and 4% magnesium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The back side electrode is made of molybdenum. The light absorption layer comprises copper-indium-gallium-selenide composite, copper-indium-selenide composite, copper-gallium-selenide composite, copper-indium-gallium-selenium-sulfur composite and copper-indium-selenium-sulfur composite. The transparent electrode is made of zinc oxide and indium tin oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The drying agent is chosen from activated carbon, zeolite, magnesium sulfate, sodium sulfate, calcium chloride and silica gel, preferably zeolite. The sealing layer is glass plate, metal plate, metal foil or gas-barrier film.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive agent is chosen from acrylic resin, epoxy resin, fluororesin, silicone resin, chloroprene-type resin, butyl rubber-type resin, and styrene-butadiene rubber type-resin, preferably epoxy resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The fiber layer is formed using silica, titanium dioxide or zirconium dioxide, and has diameter of 100-900 nm, and thickness of 10-900 mu m. The counter electrode layer is prepared using platinum, and has thickness of 50-500 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The electrolyte is acetonitrile.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The sealing component is polyethylene terephthalate or polyethylene, and has thickness of 10-500 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The active layer comprises poly(3-hexyithiophene) (P3HT) layer while the hole blocking layer comprises 2,2',2''(1,3,5-benzinetriyl)-tris(1-phenyI-1H-benzimidazo1e) (TPBi), acceptor layer comprises fullerene (C60), donor layer comprises choloro(subphthalocyaninato) boron (III) (SubPC), hole injecting layer comprises molybdenum tri-oxide (MoO3) and the dielectric and top layers comprise indium tin oxide (ITO) layers.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The anti-reflective layer which is formed on emitter layer is made of silicon nitride material or oxidation silicon material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The crushing step is carried out using high speed rotation milling. The sintering step is carried out at a pressure of 30-70 Mpa. The melting step is carried out at a temperature of 900-1000 degrees C for 9-12 hours. The cooling rate of quenching step is 0.1 to 1000 degrees C/second. The sintering temperature is less than 300 degrees C, preferably less than 500 degrees C. Preferred Components: The doped materials comprise titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, palladium, silver, platinum, gold and/or mercury. The thermal conduction material comprises bismuth (0.5%), antimony (1.5%), tellurium (3%), bismuth telluride, antimony telluride, bismuth selenide, lead telluride, germanium telluride and/or tin telluride. The tellurium-based thermoelectric materials have an impurity level of weight ratio of 0.01-0.1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The indium tin oxide (ITO), aluminum zinc oxide (AZO), fluorine tin oxide (FTO) and gallium zinc oxide (GZO) are coated on the glass substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The IB-IIIB-VIB compound semiconductor contains IIIB group element chosen from boron, aluminum, gallium, indium and tantalum, VIB group chosen from oxygen, sulfur, selenium, tellurium and polonium and IB group element chosen from copper, silver and gold, and is chosen from copper-indium sulfide, copper-indium selenide, copper-indium-selenium sulfide, copper-gallium sulfide, copper-gallium selenide, copper-indium-gallium sulfide, copper-indium-gallium selenide and copper-indium-gallium-selenide sulfur. The electrolyzer contains copper chloride, indium(III) chloride, gallium trichloride, selenous acid and lithium chloride, and includes copper electrolyzer, gallium electrolyzer and indium electrolyzer. The working electrode contains molybdenum. The copper electrolyzer contains copper sulfate, sodium sulfate and sulfuric acid. The gallium electrolyzer includes gallium trichloride and sodium chloride. The indium electrolyzer includes indium (III) chloride, gallium trichloride and sodium chloride. The precursor contains molybdenum/copper indium gallium selenide/copper/indium, molybdenum/copper indium gallium selenide/copper/(indium,gallium), molybdenum/copper indium gallium selenide/copper/indium/gallium or molybdenum/copper indium gallium selenide/copper/gallium/indium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The dye is chosen from xanthene dye, eosin, erythrosine, ruthenium dye, chlorophyll, thiosine, methylene blue, crypto cyanine, zinc porphyrin, magnesium porphyrin, azo-based dye and anthraquinone dye.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The solar energy heat collecting system is a slot-type solar heat collecting system or a tower-type solar energy heat collecting system. The heat carrier is a heat-conducting oil or a molten salt. Preferred Method: The method further comprises condensing the steam discharged from the steam generating system in a condenser, pressurizing and conveying the pressurized steam into the high-pressure steam generator via a condensed water feeding pump, pressurizing part of the fresh water produced by the first-effect of the low-temperature multi-effect distilling desalting device via a fresh water pump and conveying to the low-pressure steam generator. In the method, the pressure of the high-pressure steam is maintained at 60-120 bar and the temperature is maintained at 320-400 degrees C, the pressure of the steam discharged from the steam generating system is reduced to 0.08-0.12 bar, and the temperature of the steam conveyed to the first effect of the low-temperature multi-effect distilling-desalting device is 70-80 degrees C. The pressure of the steam-condensed water, which is pressurized via a water pump is 50-100 bar. The temperature of the fresh water conveyed to the low-pressure steam generator from the first effect of the low-temperature multi-effect distilling-desalting device is 65-75 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The n-type semiconductor powder has an aluminum plate, and a cathode made of a copper plate.
TECHNOLOGY FOCUS - METALLURGY - The wind turbine is made of aluminum or steel. The device is made of aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The porous oxide semiconductor layer is formed by plasticizing a semiconductor oxide paste on a conductive transparent substrate after coating. The diameter of the metal oxide particle on the porous oxide semiconductor layer is 10-200 nm. The preprocessing is performed for 1-30 minutes.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic solvent comprises methanol, ethanol, tertiary-butanol, acetonitrile, dimethylformamide, acetone, chloroform, dichloromethane and acetylacetonate. The pH value is adjusted to 3-7 during the preprocessing process. The dye is dissolved in the organic solvent at pressure of 1-10 bar. The acid additive is added to the organic solvent, where the acid additive includes 3-phenylpropionic acid, deoxycholic acid, and bis-(3,3',-dimethyl butyl)-phosphinic acid. The acid additive is added to the concentration of 1-50 mM. The spray is an electrostatic spray.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The amount of tantalum in aluminum oxide thin film is 30 atomic% or less. The thin-film transistor has semiconductor layer comprising oxide of indium, gallium zinc and tin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The carbide layer, nitride layer, carbonitride layer, oxycarbide layer, and oxycarbonitride layer are provided.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dielectric layer is made of silicon nitride, silicon oxide, and hafnium dioxide, aluminum oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal cation is potassium, lithium, cesium and/or rubidium. Potassium nitrate solution is used in the manufacture of solar cell. The glass substrate contains silicon dioxide, boron trioxide, aluminum oxide, sodium oxide, calcium oxide, barium oxide and iron oxide. Preferred Properties: The coefficient of thermal expansion of the primary glass substrate contained in the glass substrate is 7x 10-6-11x 10-6/K. The coefficient of thermal expansion of the secondary glass substrate contained in the glass substrate is 3x 10-6-5x 10-6/K. The glass substrate has a glass transition temperature of 550-600 degrees C.
TECHNOLOGY FOCUS - METALLURGY - The portion of the interior of the perimeter wall is alloyed with the anti-corrosive material e.g. duplex stainless steel, higher alloyed duplex stainless steel, high performance nickel rich alloy, nickel-chromium-molybdenum alloy, and Titanium alloy.
TECHNOLOGY FOCUS - METALLURGY - The solar cell is of copper, titanium, nickel, zirconium, iron, magnesium, calcium, cobalt, palladium, platinum, gold, cerium, lanthanum, yttrium, gadolinium, beryllium, tantalum, gallium, aluminum, hafnium, niobium, lead, platinum, silver, phosphorus, boron, silicon, carbon, tin, zinc, molybdenum, tungsten, manganese, erbium, chrome, praseodymium and thulium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The molten salt is nitrate salt consisting of 5-10 wt.% of sodium nitrite, 40-90 wt.%, preferably 30-70 wt.% of sodium nitrate and 10-60 wt.%, preferably 20-65 wt.% of potassium nitrate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: Compound (I) is chosen from 60 compounds e.g. 11-phenyl-11H-benzo(a)carbazole, 11-pyridin-2-yl-11H-benzo(a)carbazole, 11-naphthalen-2-yl-11H-benzo(a)carbazole, 11-p-tolyl-11H-benzo(a)carbazole, 11-(4-t-butyl-phenyl)-11H-benzo(a)carbazole, 11-biphenyl-4-yl-11H-benzo(a)carbazole, 11-biphenyl-3-yl-11H-benzo(a)carbazole, 11-biphenyl-2-yl-11H-benzo(a)carbazole, 11-(9,9-dimethyl-9H-fluoren-2-yl)-11H-benzo(a)carbazole, and 11-(1,1';4',1")terphenyl-2-yl-11H-benzo(a)carbazole.
TECHNOLOGY FOCUS - METALLURGY - The thermoelectric material is an n-type or p-type crystalline bismuth telluride and the semi-insulating material is gallium arsenide. The thermoelectric material includes at least one of bismuth telluride, antimony telluride, bismuth selenide, and combinations. The semi-insulating material has substrates having at least one of gallium arsenide, indium phosphide, cadmium telluride or magnesium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The anti-reflecting layer is magnesium fluoride, silicon dioxide, silicon nitride, zinc sulfide or titanium dioxide. The absorbing layer is made of titanium nitride, niobium or black silicon material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The thickness of the core is 5-15 nm. The nanorods are prepared using a wet solution method. Preferred Process: The method further comprises synthesizing telluride and selenium mixture by heating and adding bismuth precursor into the heated mixture and again adding selenium precursor, surfactant and solvent to the heated mixture. The method further comprises performing a first electric discharge plasma sintering process for sintering the mixture in a sinter at 20-30 degrees C for 2-4 minutes, and performing a second sintering process at 250-350 degrees C and a pressure of 30-60 MPa for 3-7 minutes in argon atmosphere. The first pre-discharge plasma sintering process minimizes the thickness variance of the nanorods in the sinter due to the notable contraction of the heated mixture in Z-axis direction. The second electric discharge plasma sintering process is used to regularly maintain the structure and size of the nanorods and minimize the contraction change of the sinter at the Z-axis direction.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The communication channel is selected from a group consisting of Zigbee, Wireless Fidelity (WiFi) and Bluetooth.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The semiconductor layer is made of the amorphous silicon carbide. The amorphous layer is made of the amorphous silicon carbide. The micro-crystalline layer is made of the micro-crystalline silicon carbide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The etching gas containing fluorine and chlorine are used in the dry etching process of the solar cell. The inert gas is used during the plasma formation of the solar cell. The inorganic acid such as hydrochloric acid and nitric acid are used during wet etching process of the solar cell.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - A device is provided for wireless Internet access using radio frequency technology or Wireless fidelity.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The P-type oxide electrode is transparent electrode, and comprises p-dopant-doped zinc oxide. The p-dopant includes nitrogen or phosphorus. Preferred Property: The band gap energy of the P-type oxide electrode is 2.2-3.4.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The wind power regulation system for generating wind electric field in an air quenching cooler (AQC) to adopt an international universal Ethernet network communication protocol for monitoring systems.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Component: The dye-sensitized solar cell has transparent substrate, primary electrode, light absorption layer formed on one side of the primary electrode, secondary electrode arranged to face primary electrode, and electrolyte provided between secondary electrode and primary electrode. Preferred Definitions:    m1,m2=1;and    Ar'-Ar'3=phenyl, naphthyl, thiophenyl, anthracyl, imidazole, pyridine, oxazole, thiazole, quinoline or ethylene dioxythiophene.    SPECIFIC COMPOUNDS - 3 Heteroaryl fused ring-containing compounds are specifically claimed e.g. 4-(3,7-bis((4-((2-ethylhexyl)oxy)phenyl))-10H-phenothiazin-10-yl)benzoic acid of formula (Ia), 4-(3,7-bis((4-((2-ethylhexyl)oxy)phenyl))-10H-phenoxazin-10-yl)benzoic acid and 4-(4-(3,7-bis((4-((2-ethylhexyl)oxy)phenyl))-10H-phenothiazin-10-yl)phenyl)benzoic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electrode forming material contains metal powder chosen from silver or its alloy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal precursors are copper, gallium, indium, zinc and tin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The inorganic additive contains granule having an average particle diameter of 10-40 mu m. The weight ratio of lead-based organic powder and sintering inhibitor is 1:9-9:1. The mixed powder of the sintering inhibitor and lead-based organic powder has a particle distribution (D50) of 0.5-1 mu m. The silicon solar cell is high surface-resistance silicon solar cell exhibiting a surface resistance of more than 80( Omega )/sq. Preferred Composition: The lead-based organic powder contains 50-90 pts. wt. lead oxide, 10-20 pts. wt. silicon dioxide and 5-15 pts. wt. aluminum oxide. The inorganic additive further contains inorganic oxide chosen from the b boron trioxide, zinc oxide, calcium oxide, zirconium oxide, titanium dioxide, sodium oxide, potassium oxide and lithium oxide. Solvent used in the manufacture of inorganic additive is chosen from water and alcohol. The content of the inorganic additive in the composition is 1-10 wt.%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hydrophobic abrasive layer contains hydrophobic particles and oxide particles, octadecyltrichlorosilane, octadecyltriethoxysilane, or (heptadecafluoro-1,1,2,2-tetrahydrodecyl)triethoxysilane, and has thickness of 1-10 nm. Preferred Property: The average diameter of hydrophobic particles is 1-10 nm.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The hyperbranched polyester amide comprises the carboxylate counter ion(s) obtained and/or obtainable from citric acid and/or its acid salt. The hyperbranched polyester amide comprises a core obtained and/or obtainable from hexahydrophthalic anhydride. The hyperbranched polyester amide has cloud point of at least 75 degrees C, preferably at least 100 degrees C in brine and the one end group comprises tertiary amine group that is protonated and/or quaternary ammonium cation(s) (QAC) (preferred) group. The cationic end group is protonated amine(s) and/or QAC group, and at least one citrate counter anion. EXAMPLE - Double walled glass reactor was heated by means of thermal oil, fitted with a mechanical stirrer, a distillation head, vacuum and nitrogen connection to 70 degrees C. The reactor was charged with 190.9 g 30 wt.% N,N-bis(N'N'-dimethylaminopropyl) amine and 91.3 g diisopropanolamine and 220.2 g hexahydrophthalic anhydride. The reaction mixture was stirred for 2 hours. The temperature was increased to 160 degrees C and pressure was gradually reduced to a final pressure of less than 10 mbar to distil off reaction water. Heating and vacuum was maintained until the residual carboxylic acid content was less than 0.3 meq/g to give precursor-A. 20 g Precursor-A was dissolved in 20 g water. 8.4 g Succinic acid was added to the reaction mixture and stirred for 0.5 hour to obtain quaternary ammonium functional polyester amide.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Component: The solar cell apparatus further has buffer layer formed on light absorption layer.
TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The metglass is aluminum based metallurgy glass, cerium-based metglass, strontium-based metglass, gold-based metglass, ytterbium-based metglass, zinc-based metglass, calcium-based metglass, magnesium-based metglass and/or platinum-based metglass. The metal nanoparticle comprises metal chosen from silver, gold, platinum, palladium, lead, aluminum, copper, nickel, tin and zinc. The conductive paste further comprises yttrium, cobalt, lanthanum, zirconium, iron, titanium, calcium, beryllium, magnesium, sodium, molybdenum, tungsten, potassium, lithium, phosphorus, rubidium, chromium, strontium, cerium, praseodymium, samarium, lutetium, neodymium, niobium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, thorium, scandium, barium, ytterbium, europium, hafnium, arsenic, plutonium, gallium, germanium, antimony, silicon, cadmium, indium, niobium, osmium, vanadium and mercury.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The carrier transport material is electrolyte solution. The porous semiconductor layer contains semiconductor fine particles containing titanium oxide. The counter electrode contains catalyst layer containing platinum. The conductive layer contains titanium, nickel, molybdenum, tin oxide, fluorine-doped tin oxide, indium oxide, tin-doped indium oxide and/or zinc oxide. Preferred Properties: The movement resistance (RL) of electrolyte solution is less than 10 ohm .cm2, obtained by alternating current impedance method. The average particle diameter of semiconductor fine particles contained in the layer located in the counter-electrode side among the layers contained in porous semiconductor layer is 380 nm or less.
TECHNOLOGY FOCUS - METALLURGY - The electroconductive particle is formed of silver, nickel, copper or aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: A cadmium sulfide layer is formed by preparing metal complex compound through reaction between zinc ion source and complex compound. A reaction solution is prepared by mixing metal complex compound with sulfur source, and dipping support substrate having light absorbing layer to reaction solution. Preferred Composition: The buffer layer includes zinc sulfide. The content of cubic crystal structure is 80% or more. The front electrode layer has cubic crystal structure. The zinc ion source is zinc acetate solution. The complex compound is disodium salt of ethylenediaminetetraacetic acid. The sulfur source is thioacetamide or thiourea. Preferred Property: The buffer layer has band gap energy of 3.4-3.5 eV. Preferred Layer: A high-resistant buffer layer (500) having zinc oxide layer without impurities, is formed between buffer layer and front electrode layer.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The poly(aryl ether sulfone) (A) polymer and poly(aryl ether sulfone) (B) polymer has more than 50 weight% independently recurring units (R) of formula (I)-(III). The polymer (A) further comprises functional groups different from amine functional groups. The ratio of amine functional groups and functional groups different from amine functional groups is 10:1-1:1. The polymer (B) comprises functional groups different from amine functional groups, preferably more than 10 mu equivalent/g phenol hydroxyl group.R'=halo, alkyl, alkenyl, alkynyl, aryl, ether, thioether, carboxylic acid, ester, amide, imide, alkali or alkaline earth metal sulfonate, alkyl sulfonate, alkali or alkaline earth metal phosphonate, alkyl phosphonate, amine or quaternary ammonium;j'=0-4;T=bond, -CH2-, -O-, -SO2-, -S-, -C(O)-, -C(CH3)2-, -C(CF3)2-, -C(=CCl2)-, -C(CH3)(CH2CH2COOH)-, -N=N-, or -RaC=CRb-;Ra,Rb=H, 1-12C alkyl, 1-12C alkoxy, 6-18C aryl, -(CH2)n-, -(CF2)n-, or linear or branched 6C aliphatic divalent group;andn=1-6.Preferred Properties: The polymer (A) has amine functional groups of 200-800 mu equivalent/g, weight average molecular weight of 3000-40000 g/mol and glass transition temperature of 180-270 degrees C. The polymer (B) has weight average molecular weight of 10000-55000 g/mol and glass transition temperature of 100-220 degrees C. Preferred Process: The polymer composition is further processed by resin transfer molding, continuous resin transfer molding, vacuum assisted, vacuum assisted injection molding, vacuum assisted processing, vacuum infusion molding, vacuum bag curing, press molding, resin film infusion, resin infusion under flexible tooling, automated fiber placement, filament winding, pultrusion or thermal expansion molding.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The lead oxide is present in an amount of 60-80 wt.%, and the zinc oxide is present in an amount of 5-15 wt.%. The glass frit is present in an amount of 1-10 wt.%, has an average particle diameter (D50) of 0.1-5 mu m, and further comprises silicon dioxide (1-15 wt.%), aluminum oxide (1-5 wt.%), tantalum oxide (0.1-2 wt.%) and phosphorus oxide (0.1-6 wt.%) (all preferred), zirconium oxide, bismuth oxide, barium oxide, iron oxide, chromium oxide, cobalt oxide, lithium oxide, lithium carbonate, magnesium oxide and manganese oxide. The conductive powder is present in an amount of 60-90 wt.%, and is silver, gold, palladium, platinum, copper, chromium, cobalt, aluminum, tin, lead, zinc, iron, iridium, osmium, rhodium, tungsten, molybdenum, nickel and indium-tin-oxide. The organic vehicle is present in an amount of 5-30 wt.%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The paste composition further comprises additive consisting of dispersing agent, thixotropic agent, plasticizer, viscosity stabilizer, antifoaming agent, pigment, UV stabilizer, antioxidant and coupling agent. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The electrode contact portion makes contact with the back electrode layer disposed beside the light absorbing layer. The substrate contact portion extends from the top surface of the substrate to the bottom surface of the substrate through a side surface (100c) of the substrate. The substrate contact portion makes direct contact with the substrate. The electrode contact portion makes direct contact with the back electrode layer. Preferred Method: The substrate contact portion extends from the electrode contact portion and is connected to the connecting member. The substrate contact portion extends from the electrode contact portion to the bottom surface of the substrate through a side surface of the substrate. The step of forming of the back electrode layer comprises depositing the back electrode layer after forming a mask on a portion at which the substrate contact portion is placed. The step of forming of the bus bar includes removing the back electrode layer from a portion at which the substrate contact portion is placed. The step of removing the back electrode layer includes: sandblasting the back electrode layer; etching the back electrode layer and grinding the back electrode layer.