NOVELTY - The method comprises providing a surface, a surface energy neutralization layer copolymer, a block copolymer and a top coat composition comprising maleic anhydride, treating the surface with the surface energy neutralization layer copolymer under conditions such that a first layer on the surface is created and comprises a crosslinked polymer, coating the first layer with block copolymer under conditions such that a second layer on the surface is created and comprises a block copolymer film, and coating the second layer with the top coat composition to create a third layer on the surface.    USE - The method is useful for applying a top coat to a block copolymer film to create a layered structure (claimed) that is useful in hard disk drives, fuel cells, batteries, and data storage and optoelectronic devices.    ADVANTAGE - The method is capable of efficiently spin coating the top coats onto the block copolymer thin films to control an interfacial energy of the top coat-block copolymer interface and allow for a facile orientation control of block copolymers, and creating an imprint template with desired structural alignment of nanostructures that can be etched with good oxygen etch.    DETAILED DESCRIPTION - The method comprises providing a surface, a surface energy neutralization layer copolymer, a block copolymer and a top coat composition comprising maleic anhydride, treating the surface with the surface energy neutralization layer copolymer under conditions such that a first layer on the surface is created and comprises a crosslinked polymer, coating the first layer with block copolymer under conditions such that a second layer on the surface is created and comprises a block copolymer film, and coating the second layer with the top coat composition to create a third layer on the surface, where the third layer comprises a top coat on a block copolymer film surface, and the first, second and third layers comprise a layered structure. The top coat composition is dissolved in an aqueous weak base prior to the second layer coating step to create a casting solvent. The block-co-polymer is not soluble in the casting solvent. The method further comprises: treating the layered structure under conditions such that nanostructures form; and etching the layered structure under conditions such that the top coat and a part of the block copolymer are removed revealing the nanostructures. The treating step comprises annealing. The annealing step comprises heating. The etching comprises oxygen etching. The surface is on a silicon wafer. The surface energy neutralization layer polymer is composed of a set of polymer components one of which is maleic anhydride. The surface energy neutralization layer polymer components are soluble in aqueous weak base. Proportions of the components are varied such that the surface energy of the surface energy neutralization layer polymer layer is varied. A surface energy of the surface energy neutralization layer polymer layer switches as the surface energy neutralization layer polymer is baked. The treating step comprises: dissolving the surface energy neutralization layer polymer in a solvent; spin coating the surface energy neutralization layer upon the surface; cross-linking by exposure to 250 degrees C for 5 minutes; and washing with solvent. The nanostructures comprise cylindrical structures that are vertically aligned with respect to a plane of the surface. INDEPENDENT CLAIMS are included for:    (1) a layered structure; and    (2) a method for achieving block copolymer domain orientation.