NOVELTY - A thin film laminate is obtained by forming a primary layer and a secondary layer on a resin substrate in order. The primary layer is an organic inorganic composite thin film containing a condensate of organosilicon compound and an organic polymer compound. The secondary layer is a metal oxide thin film formed by sol gel process, and having thickness of 200 nm or less and thickness variation of less than 10%, or gas barrier film having thickness of 500 nm or less.    USE - Thin film laminate is used as substrate for transparent conductive film formation (claimed) for touch panel, image display apparatus, base film for coating photocatalyst, scattering prevention film, base film for heat ray, substrate for electronic display element and substrate for solar cell.    ADVANTAGE - The thin film laminate has uniform, wettable and smooth surface, excellent durability and optical characteristics, e.g. no interference fringe, improved adhesiveness and gas-barrier property, and high transparency.    DETAILED DESCRIPTION - A thin film laminate is obtained by forming a primary layer and a secondary layer on a resin substrate in order. The primary layer is an organic inorganic composite thin film with thickness of 500 nm or more, and containing a condensate of organosilicon compound of formula: RnSiX4-n and an organic polymer compound. The secondary layer is a metal oxide thin film formed by sol gel process, and having thickness of 200 nm or less and thickness variation of less than 10%, or gas barrier film having thickness of 500 nm or less. The thickness variation is derived from relation: 100x (standard deviation of film thickness)/(average value of film thickness). The primary layer has a layer in which the condensate of the organic silicon compound is concentrated on the side of the interface with the secondary layer. The concentration of carbon atoms in the concentrated layer is 20% or more or less than the concentration of carbon atoms in the primary layer at a depth of 300 nm from the interface between the primary layer and the secondary layer.    R=organic group in which carbon atom is directly coupled to silicon atom;    X=hydroxy or hydrolyzable group;and    n=1 or 2.    An INDEPENDENT CLAIM is included for manufacture of thin film laminate, which involves forming organic inorganic composite thin film containing condensate of organosilicon compound and organic polymer compound, on resin substrate, plasma-processing or ultraviolet ozonizing the surface of the layer, and forming secondary layer by forming metal oxide thin film by sol gel process, and forming gas barrier film by sputtering method, vacuum evaporation method, ion-plating method, or plasma chemical vapor deposition.