TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The materials of the inorganic gas barrier layers comprise at least one of aluminum oxide, zinc oxide, zirconium oxide, hafnium oxide and/or indium nitride. The material of the desiccant comprises at least one of calcium oxide, calcium hydroxide, calcium chloride, calcium sulfate and/or magnesium sulfate. The material of the desiccant comprises a masterbatch which is formed by mixing at least one of calcium oxide, calcium hydroxide, calcium chloride, calcium sulfate and/or magnesium sulfate in polyethylene, polypropylene or ethylene-vinyl acetate copolymer. Preferred Method: The inorganic gas barrier layers are formed on the hydrophilic polymer layers by a thermal evaporation process, a sputtering process, chemical vapor deposition, or atomic layer deposition (ALD). The manufacturing method further involves disposing the composite film as a substrate material or a package film in a flexible electronic apparatus, a thin film solar cell, or an organic solar cell.    TECHNOLOGY FOCUS - POLYMERS - Preferred Film: The hydrophobic polymer layer is in direct contact with the hydrophilic polymer layers. The inorganic gas barrier layers are in direct contact with the hydrophilic polymer layers, respectively. The composite film further comprises two protection layers formed on the two inorganic gas barrier layers; desiccant mixed in the hydrophobic polymer layer. Preferred Components: The material of the hydrophobic polymer layer comprises a grafted hydrophobic polymer. The grafting ratio of the grafted hydrophobic polymer is 0.5-8%. The material of the hydrophobic polymer layer comprises at least one of maleic anhydride grafted polypropylene (PP-g-MA), glycidyl methacrylate grafted polypropylene (PP-g-GMA), maleic anhydride grafted ethylene-propylene copolymer and/or glycidyl methacrylate grafted ethylene-propylene copolymer. The material of the hydrophilic polymer layers comprises at least one of ethylene copolymer, propylene copolymer, ethylene vinyl alcohol (EVOH), polyamide, acrylonitrile-methyl methacrylate copolymer and/or styrene-acrylonitrile copolymer. The materials of the protection layers comprise at least one of urethane acrylate, epoxy acrylate, polyacrylate and/or polyester. EXAMPLE - An organic multilayer film comprising hydrophobic polymer layer formed of maleic anhydride grafted polypropylene (PP-g-MA), and two hydrophilic polymer layers formed of ethylene vinyl alcohol (EVOH) was prepared. The thickness of the hydrophilic polymer layers was 15 mu m, and the molar ratio of ethylene was 38 mol.% in EVOH. The thickness of the hydrophobic polymer layer (PP-g-MA) was 110 mu m. Next, trimethyl aluminum and water were used as precursors in the atomic layer deposition process, and atomic layers of aluminum oxide were deposited by an atomic layer deposition machine at an operating temperature of 120 degrees C to form the inorganic gas barrier layers. Then, an acrylic photo-curable coating as the protection layer was applied on the top surface of each inorganic gas barrier layer by a coating machine, and the photo-curable coating was irradiated with a UV light to be cured to form protection layers. After the composite film was formed, its water vapor transmission rate (WVTR), oxygen transmission rate (OTR), and full wavelength light transmittance were obtained which were found to be 0.088 g/m2-day, less than 0.01 cc/m2-day-atm and 92.21at least one respectively.