TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate comprises a transparent glass or a transparent plastic substrate. The transparent electrode layer comprises aluminum-doped zinc oxide, indium tin oxide, zinc oxide, aluminum tin oxide, fluorine-containing tin oxide, nanosilver wire, graphene, carbon nanotubes or poly(3,4-ethylenedioxythiophene) polystyrene sulfonate (PEDOT: PSS). The hole transport layer comprises indium tin oxide (preferred), aluminum-doped zinc oxide, aluminum oxide tin, graphene, metal nano wire or carbon nanotubes. The electron transporting layer comprises zinc oxide (preferred), titanium oxide, zirconium oxide, strontium oxide, indium oxide, lanthanum oxide, vanadium oxide, molybdenum oxide, tungsten oxide, tin oxide, niobium oxide, magnesium oxide, aluminum oxide, yttrium oxide, scandium oxide, samarium oxide, gallium oxide or strontium-titanium oxide. The organic photoactive layer comprises (poly(4,8-bis-alkyloxybenzo (1,2-b:4,5-b') dithiophene-2,6-diyl-alt-(alkylthieno(3,4-b) thiophene-2-carboxylate)-2,6-diyl), (poly((4,8-bis((2-ethylhexyl)oxy)benzo(1,2-b:4,5-b')dithiophene-2,6-diyl)(3-fluoro-2-((2ethylhexyl)carbonyl)thieno(3,4-b)thiophenediyl))) (PBDTTT-C: PCBM), (poly(2,6-(4,4-bis-(2-ethylhexyl)-4H-cyclopenta (2,1-b;3,4-b') dithiophene)-alt-4,7-(2,1,3-benzothiadiazole))), (6,6)-phenyl-C61-butyric acid methyl ester or (6,6)-phenyl-C71-butyric acid methyl ester. EXAMPLE - Aluminum-doped zinc oxide was laminated on glass substrate, washed by using acetone or isopropyl alcohol and surface was treated by using UV irradiation under oxygen atmosphere to obtain aluminum-doped zinc oxide layer. The inorganic photoactive layer made of n-type amorphous silicon layer (comprised mixture of phosphine and borohydride)/i-type amorphous silicon layer (comprised mixture of silane and hydrogen)/p-type amorphous silicon layer (comprised mixture of phosphine and borohydride) were respectively laminated on the obtained aluminum doped zinc oxide layer using plasma-enhanced chemical vapor deposition. The hole transport layer (comprised of indium tin oxide) were laminated on the p-type amorphous silicon layer by using magnetron sputtering. The electron transport layer comprised zinc oxide was laminated on the hole transport layer using magnetron sputtering. The mixed solution of (poly(4,8-bis-alkyloxybenzo (1,2-b:4,5-b') dithiophene-2,6-diyl-alt-(alkylthieno(3,4-b) thiophene-2-carboxylate)-2,6-diyl), (poly((4,8-bis((2-ethylhexyl)oxy)benzo(1,2-b:4,5-b')dithiophene-2,6-diyl)(3-fluoro-2-((2ethylhexyl)carbonyl)thieno(3,4-b)thiophenediyl))) (PBDTTT-C:PCBM) and 2 wt.% dichlorobenzene solution in a weight ratio of 1:2 were laminated on the electron transport layer by using spin coating method and dried for 10 minutes at room temperature. The back surface electrode layer was laminated on the PBDTTT-C:PCBM using heat deposition method to obtain the solar cell.