TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The thin-film processing system further comprises a solution covering-transport unit (2), which is arranged in front of the solution delivery unit and downstream to the solution outflow unit. The solution covering touches the disuse zone of the substrate, prior to contacting with the substrate at the solution delivery unit so that the hermetic closure structure comprising the closure space is formed between the solution covering and the substrate. The solution outflow unit leaves from the substrate, and the closure structure is dissolved in the substrate and the solution covering. The solution covering is transported prior to the solution delivery unit for formation of further closure structures with substrates. The solution covering-transport unit comprises a solution covering-transporting device (21), rails (23), a solution covering attachment portion (2a) and a solution covering detachment portion. The rails are connected at the two ends with the solution covering attachment portion and the solution covering detachment portion. The solution covering attachment portion and the solution covering detachment portion are respectively connected with the solution delivery unit and the solution outflow unit. The solution covering-transporting device is arranged between the two ends of the rails and moves back and forth between the two ends. The solution covering-transporting device touches the solution covering at the disuse zone of the substrate, when the substrate is present on the solution covering attachment portion so that the hermetic closure structure is formed between the solution covering and the substrate. The solution covering-transporting device dissolves the closure structure into the solution covering and the substrate, and the solution covering is transported from the solution covering detachment portion on the solution covering attachment portion, when the substrate is present on the solution covering detachment portion. The solution covering detachment portion and the solution covering attachment portion respectively receives transported substrates. A solution covering washing tank and a solution covering cleaning tank are arranged between the solution covering detachment portion and the solution covering attachment portion. The solution covering washing tank is a hydrochloric acid bath, and the solution cleaning tank is a clear water bath. The solution covering-transporting device immerses the solution covering sequentially first in the solution covering washing tank and then in the solution cleaning tank so that the solution covering is first separated from the adhering solution by hydrochloric acid and is thoroughly rinsed in the clear water bath. The solution covering-transporting device is robotic and vacuum robotic. The solution covering-transport unit comprises a substrate rinsing device, which is arranged at the solution covering detachment portion. The substrate rinsing device, which is present after the solution covering-transporting device, removes the solution covering from the substrate. The substrate is rinsed thoroughly for removing the remaining solution from the substrate. The solution covering-transport unit has rails. The two rails are arranged parallely, and the solution covering-transporting device is present on the rails. A substrate pre-washing unit (1) is present prior to the solution delivery unit for pre-washing and drying the substrate and a substrate final washing unit is present downstream to the solution outflow unit for cleaning and drying the substrate. The pre-washing unit comprises at least one cleaning device comprising air curtain, air intake unit, rolling brush with sprayer, spray nozzle for spraying distilled water, air-knife or other suitable cleaning devices. The unit for chemical bath deposition comprises a conveying device and a hot water tank. The conveying device is arranged in the hot water tank. The hot water tank comprises hot water bath for heating the closure structure during transport of the closure structure. The hot water tank is designed in a looped form. The solution tank comprises at least a solution inflow and at least one solution outflow so that the solution is decanted through the solution outflow, when the closure structure is present on the solution outflow unit. The lateral side wall, which is present on the solution outflow and the solution container, has a curved shape. The solution outflow unit has a roller transport platform, an attaching rotational axis and a lifting device. A fixed rotational axis is arranged in the center below the transport platform. An attachment rod is provided at the transport platform for attaching the attaching rotational axis. The lifting device is arranged below the transport platform laterally at the bottom of the solution outflow. A recycling container is provided in the immediate vicinity of the solvent outflow unit. The recycling containers drain the chemical solution through the solution outflow. Preferred Method: The method further comprises cleaning and drying substrates, placing the solution covering on the disuse zone of the substrate and producing the firm closure structure between the solution covering and the substrate, heating the solution introduced into the closure structure so that the thin film is deposited, dissolving the contact between the solution covering and the substrate, transporting the solution covering so that the solution covering is present for processing the substrate, and rinsing and drying the substrate, which is separated from the solution covering. The transported solution covering is first immersed in the solution covering washing tank so that the solution adhering to the solution covering is removed and then the solution covering is rinsed in the solution covering cleaning tank.