TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic barrier layer comprises metal, metal oxide, metal nitride, metal carbide, metal oxynitride and/or metal oxyboride. The metal is silicon, aluminum, selenium, zinc, antimony, indium, germanium, tin, bismuth, transition metal and/or lanthanides. Preferred Property: The inorganic barrier layer has thickness of 5-500 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The photocurable monomer (B) is cyclized single bond or double bond-having containing monomer. The photocurable monomer is carboxylic acid group-containing photocurable monomer of formula: OH-C(=O)-R3-X-C(=O)-NH-R2-O-C(=O)-C(R1)=CH2 (I), preferably 2-(((2-((2-methylprop-2-enoyl)oxy)ethyl)carbamoyl)oxy)propanoic acid, 2-((((4-acetylcyclohexyl)oxy)carbonyl)amino)ethyl 2-methylprop-2-enoate, 2-(((2-((2-methylprop-2-enoyl)oxy)ethyl)carbamoyl)oxy)benzoic acid, 4-(((2-((2-methylprop-2-enoyl)oxy)ethyl)carbamoyl)oxy)-3-nitrobenzoic acid and 2-(((2-((2-methylprop-2-enoyl)oxy)ethyl)carbamoyl)amino)acetic acid. The encapsulating composition further comprises photopolymerization initiator (C). The encapsulating composition comprises 20-95 wt.% photocurable monomer (A), 1-60 wt.% photocurable monomer (B) and 0.1-20 wt.% photopolymerization initiator (C). The photocurable monomer comprises substituted or unsubstituted vinyl group, acrylate group and 1-30C methacrylate group, preferably comprises alkyl of 1-20C (meth)acrylate, diol of 2-20C di(meth)acrylate, triol of 3-20C tri(meth)acrylate, tetra-ol of 4-20C tetra(meth)acrylate, and di(meth)acrylate having -(-Y'O-)n- group.R1=H, or 1-20C optionally substituted alkyl;R2=1-30C alkylene, 6-30C arylene or 5-20C cycloalkylene (all optionally substituted);R3=5-20C cycloalkylene, or 1-30C alkylene, 6-30C arylene or 6-30C arylene having hetero atom (all optionally substituted);X=-O-, -S- or -NR-;R=H or 1-10C alkyl;Y'=1-5C linear or branched alkylene;andn=1-5.Preferred Property: The organic barrier layer has thickness of 0.1-20 mu m.