NOVELTY - Manufacturing conductive film comprises forming a metal mesh pattern (20) on upper part of a transparent substrate (10), and (ii) forming a transparent insulation material layer (30) between the metal mesh patterns using a negative photoresist; or forming the transparent conductive material layer on the transparent substrate, forming the metal mesh pattern on the transparent conductive material layer and forming the transparent insulation material layer between the metal mesh patterns using negative photoresist.    USE - The conductive film is useful in manufacturing organic solar cell (claimed).    ADVANTAGE - The conductive film has good conductivity, is provided with flat surface and solves the breaking or bubble trap problems; and has good step coverage property and produces less void. The method ensures preparation of flat surface conductive film with out exposure to separate photomask, is simple and reduces manufacturing time; and ensures the formation of the metal mesh pattern with uniform size and produces thin conductive film with small resistance.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for:    (1) manufacturing an organic solar cell, comprising preparing a substrate, forming a first electrode on one side of the substrate, forming an organic layer on the upper part of the first electrode and forming a second electrode at the upper part of the organic layer, where the first electrode and the second electrode are the conductive film;    (2) a conductive film prepared by the above method; and    (3) organic solar cell, comprising a first electrode, a second electrode provided opposite to the first electrode, and a photoactive layer (comprising at least one organic layer) located between the first electrode and the second electrode    DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the conductive film.    Transparent substrate (10)    Metal mesh pattern (20)    Transparent insulation material layer (30)    Pattern layer (40)    Transparent conductive material layer (50)