NOVELTY - Single source supply for a dopant gas mixture comprises: at least one carbon-containing dopant source gas premixed at a predetermined concentration with a diluent gas mixture, where the carbon-containing sources comprise at least carbon monoxide, and the diluent gas mixture comprises an inert gas and a hydrogen-containing gas; and a sub-atmospheric delivery and storage device (100) for maintaining the dopant gas mixture in a pressurized state within an interior volume of the device, where the delivery device is in fluid communication with a discharge flow path.    USE - The single source supply is useful for delivering a dopant gas composition for ion implantation (claimed).    ADVANTAGE - The single source supply safely stores and delivers carbon-based dopant gas, thus achieving extended ion source life and increasing carbon beam current in comparison to carbon monoxide and hydrogen.    DETAILED DESCRIPTION - Single source supply for a dopant gas mixture comprises: at least one carbon-containing dopant source gas premixed at a predetermined concentration with a diluent gas mixture, where the carbon-containing sources comprise at least carbon monoxide, and the diluent gas mixture comprises an inert gas and a hydrogen-containing gas; and a sub-atmospheric delivery and storage device for maintaining the dopant gas mixture in a pressurized state within an interior volume of the device, where the delivery device is in fluid communication with a discharge flow path, and the delivery device is actuated to allow a controlled flow of the dopant composition from the interior volume of the device in response to a sub-atmospheric condition achieved along the discharge flow path. INDEPENDENT CLAIMS are also included for:    (1) delivering (M1) a dopant gas composition for ion implantation, comprising providing the carbon-containing dopant gases comprising the carbon monoxide, providing a diluent gas composition comprising an inert gas and a hydrogen-containing gas, actuating controlled flow of the carbon-containing dopant gases in response to a predetermined vacuum condition, actuating controlled flow of the diluent gas composition in response to the predetermined vacuum condition, introducing the carbon-containing dopant gases into an ion source chamber, introducing the diluent gas composition into the ion source chamber, ionizing the carbon-containing dopant gas sources to produce carbon ions, and implanting the carbon ions into a substrate, where the carbon-containing dopant gas sources interacts with the diluents gas composition to reduce deposits along the carbon ion source without producing a substantial reduction in carbon ion beam current in comparison to pure carbon monoxide; and    (2) a gas composition comprising a carbon-based material comprising carbon monoxide, an inert diluent gas mixture comprising xenon and hydrogen, where the xenon and hydrogen are contained in a volume ratio of 0.02-0.2, and the (xenon and hydrogen): carbon monoxide is contained in a volume ratio of 0.1-0.3.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of a sub-atmospheric delivery and storage device for dispensing carbon monoxide-containing dopant composition.    Sub-atmospheric delivery and storage device (100)    Cylinder (101)    Valve element (102)    Port body (104)    Capillaries (108)