TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic barrier layer comprises metal, metal oxide, metal nitride, metal carbide, metal oxynitride and/or metal oxyboride. The metal is chosen from silicon, aluminum, selenium, zinc, antimony, indium, germanium, tin, bismuth, transition metal and lanthanide metal.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The apparatus consists of obstacle stack (30) containing inorganic barrier layer (30) and organic barrier layer (32). Preferred Composition: The carboxy group-containing monomer (B) comprises glycidyl methacrylate, (3-ethyl-3-oxetanyl)methyl methacrylate, and 3,4-epoxycyclohexylmethyl methacrylate. The photocurable monomer (A) comprises monomer having optionally substituted vinyl group, acrylate or 1-30C methacrylate group, preferably methacrylate having 1-20C alkyl, 2-20C diol dimethacrylate, 3-20C triol trimethacrylate or 4-20C tetraol tetramethacrylate. The solid content of photocurable monomer (A) and carboxy group-containing monomer or oligomer (B) is 1-99 pts. wt., respectively, with respect to 100 pts. wt. photocurable monomer (A) and carboxy group-containing monomer or oligomer (B). The photocurable composition further comprises initiator (C) comprising photopolymerization initiator and/or photoacid generator. The solid content of initiator (C) is 0.1-20 pts. wt. with respect to 100 pts. wt. photocurable monomer (A) and carboxy group-containing monomer or oligomer (B). The amount of photopolymerization initiator and photoacid generator in the photocurable composition is 0.05-19 pts. wt. and 0.001-10 pts. wt., respectively with respect to 100 pts. wt. photocurable monomer (A) and carboxy group-containing monomer or oligomer (B). The amount of gas emitted out of organic barrier layer is less than 2000 ppm. The organic barrier comprises cured product containing photocurable composition. Preferred Property: The organic barrier layer has thickness of 0.1-20 mu m and inorganic barrier layer has thickness of 5-500 nm.