NOVELTY - A transparent conductive base material consists of a transparent conductive film. The transparent conductive film is obtained by forming a transparent conductive film laminated material and heat-processing the laminated material. The total weight ratio of oxides of bivalent to hexavalent metallic elements in a primary amorphous transparent conductive film of laminated material is different from the total weight ratio of oxides of bivalent to hexavalent metallic elements in a secondary amorphous transparent electroconductive film, and satisfies a specific relation (I).    USE - Transparent conductive base material is used for manufacture of electrostatic capacitance-type touchscreen used for flat panel display of smart phone and tablet personal computer, and electrode of solar cells.    ADVANTAGE - The transparent conductive base material has excellent crystallinity and flexibility, and desired surface resistance value.    DETAILED DESCRIPTION - A transparent conductive base material consists of a crystalline transparent conductive film. The transparent conductive film is obtained by laminating monolayer made from indium oxide, or indium oxide and oxide of bivalent to hexavalent metallic element on one or both surfaces of a transparent base material, forming a transparent conductive film laminated material containing primary amorphous transparent conductive film and secondary amorphous transparent conductive film, and heat-processing the transparent conductive film laminated material. The total weight ratio of oxides of bivalent to hexavalent metallic elements in the primary amorphous transparent conductive film of laminated material is different from the total weight ratio of oxides of bivalent to hexavalent metallic elements in the secondary amorphous transparent electroconductive film, and satisfies the relation of formula: (total weight of oxides of divalent to hexavalent metal elements/(weight of indium oxide+total weight of oxides of divalent to hexavalent metal elements))x 100 (I). The total weight ratio of oxides of bivalent to hexavalent metallic elements in crystalline transparent conductive film is 16 wt.% or less. An INDEPENDENT CLAIM is included for manufacture of transparent conductive base material.