NOVELTY - Manufacturing (M1) thin films, comprises: providing a substrate member comprising a surface region; subjecting the substrate member to a thermal process; vaporizing a precursor material from a liquid source to form droplets of 10-20 microns; then subjecting the droplets of 10-20 microns to an mega-sonic energy source to cause formation of many smaller droplets of size 0.25-5 microns to cause formation of a film of material overlying the surface region; releasing any volatile byproducts from the film of material; and heating film of material using thermal energy.    USE - The method is useful for manufacturing thin films for a battery device including an electrolyte device, where the electrolyte device is a solid state material comprising lithium, aluminum and/or gallium, sulfur and phosphate entities (all claimed).    ADVANTAGE - The method provides high quality film of material.    DETAILED DESCRIPTION - Manufacturing (M1) thin films, comprises: providing a substrate member comprising a surface region; subjecting the substrate member to a thermal process to increase a temperature of the substrate from a first temperature to a second temperature; vaporizing a precursor material from a liquid source to form droplets of 10-20 microns; then subjecting the droplets of 10-20 microns to an mega-sonic energy source to cause formation of many smaller droplets of size 0.25-5 microns to cause formation of a film of material overlying the surface region; releasing any volatile byproducts from the film of material to substantially free the film of material from any of the volatile byproducts; and heating the film of material using a thermal energy to process the film to cause a recrystallization of the film to form larger sized crystalline materials. INDEPENDENT CLAIMS are also included for:    (1) manufacturing (M2) thin films, comprising: providing the substrate member; subjecting the substrate member to the thermal process; subjecting the substrate member to movement about a center region of the substrate in a variable or constant manner; injecting a vaporized precursor material from a liquid source to form droplets of size 10-20 microns to a megasonic source; subjecting the droplets to the megasonic source to cause formation of many smaller droplets of size 0.25-5 microns to cause formation of a mist comprising the smaller droplets; subjecting the mist comprising the smaller droplets to a convective force to the mist to the surface region of the substrate member; causing formation of a film of material overlying the surface region; ceasing the formation of the film material; releasing any volatile byproducts from the film of material to substantially free the film of material from any of the volatile byproducts; irradiating the film of material using electromagnetic radiation to process the film to cause a recrystallization of the film to form larger sized crystalline materials; and sequentially performing the vaporizing, releasing, and irradiating to build up a thickness of the film of material; and    (2) an apparatus for formation of a film of material, comprising: a chamber having an interior region; a susceptor configured within the interior region of the chamber; a workpiece provided on the susceptor; a megasonic energy source configured within the chamber; a nozzle configured within the chamber to vaporize the precursor material from the liquid source to form the droplets; and an irradiation source configured within the chamber to irradiate the film of material using electromagnetic radiation to process the film to cause a recrystallization of the film to form larger sized crystalline materials.