NOVELTY - A composition comprises metal alkoxide (I), acidic group-containing polymerizable monomer having (meth)acryl group, acidic group-not-containing polymerizable monomer having (meth)acryl group, and a photoinitiator.    USE - Composition is used for formation of pattern for manufacture of surface-treated sapphire substrate for replica metal mold (all claimed) for nanoimprint for semiconductor integrated circuit. Uses include but are not limited to light-emitting diode board, secondary battery, solar cell, fuel cell and biotechnology application.    ADVANTAGE - The composition has excellent adhesiveness with respect to substrate, transferability, etching tolerance and storage stability for long period of time. The laminated material obtained using composition has excellent mold release property, dispersed state of inorganic component and hardness. By processing the surface of sapphire substrate, light extraction efficiency of light-emitting diode is excellent and gallium nitride crystal is homogeneously grown with reduced crystal transitions and generation of crack.    DETAILED DESCRIPTION - A composition comprises metal alkoxide of formula (I), acidic group-containing polymerizable monomer having (meth)acryl group, acidic group-not-containing polymerizable monomer having (meth)acryl group, and a photoinitiator.    M=tungsten, tin, indium, antimony, molybdenum, niobium, zirconium or hafnium;and    R1=1-10C alkyl.    (i) When M is tungsten, then p is 6 or 5; (ii) When M is molybdenum or niobium, then p is 5; (iii) When M is tin, hafnium or zirconium, then p is 4; and (iv) When M is indium or antimony, then p is 3. INDEPENDENT CLAIMS are included for the following:    (1) formation of pattern, which involves forming a coating film by coating the composition on a substrate, forming a pattern-forming surface of metal mold, contacting the coating film and pattern-forming surface of metal mold, hardening the coating film by irradiating light, separating the metal mold from the hardened coating film, and forming a pattern with respect to pattern-forming surface of the metal mold on the substrate;    (2) manufacture of surface-treated sapphire substrate, which involves setting the pattern as a mask and dry-etching the substrate surface using chlorine gas; and    (3) replica metal mold, which has a hardening component of the composition.