TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Molecular catalyst is solid heterogeneous catalyst. Aqueous medium is buffer solution. Molecular catalyst contains cobalt, rhodium, ruthenium, and/or iridium. Molecular catalyst contains triangular structure of formula (1) in which catalyst is cluster complex whose structure is capped with 2 sulfur ions in axis of triangular plane and metal ion of triangular cluster is coordinated to cyclopentadienyl ligand. Molecular catalyst is ruthenium complex of formula (3) containing 2 bipyridyl ligands and 2 carbonyl ligands and/or ruthenium complex of formula (2) containing carbonyl ligand, bipyridyl ligand, and terpyridyl ligand.M=Co, Rh, or Ir;R=Me, Et, propyl, butyl, or acetyl;a-c=1-5;n=- 1, 0, 1, or 2;m=1 or 2;X=counter cation when m is 1 and n is - 1 or counteranion when n is 1 or 2 and m is 1 or 2; andR1-R15=H, halo, alkyl, aryl, or acetyl.Preferred Processes: Electron is electrochemically injected. Molecular catalyst is activated by application of electric potential to positive side of catalyst. Hydrogen is produced from water by applying voltage that allows one-electron reduction of mediator and does not allow two-electron reduction of mediator in reaction system and producing two-electron reduction body by disproportionation reaction of mediator in one-electron reduction form in which overvoltage for production of hydrogen from water is less than or equal to 0.1 V. Carbon monoxide is produced from carbon dioxide by applying voltage that allows one-electron reduction of mediator and does not allow two-electron reduction of mediator in reaction system and producing two-electron reduction body by disproportionation reaction of mediator in one-electron reduction form. After formation of coordination complex of carbon dioxide, hydroxycarbonyl complex is formed. Electron is photochemically injected by photosensitizer in reaction system. Preferred Conditions: Reaction temperature is 0-80 degrees C.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Hydrophobic compound is polyethylene, polypropylene, polystyrene, polyvinyl chloride, poly(meth)acrylic acid ester, poly(meth)acrylamide, or porous coordination polymer with metal-organic framework.