NOVELTY - A substrate processing apparatus has an induction heating unit (300) that heats a substrate seating body (200) set in a reaction space of a chamber (100) to seat a substrate (10). At least one altitude adjusting unit selectively adjusts the altitude of the induction heating unit at the outside of the chamber according to a temperature adjusting region of the substrate seating body, with the altitude adjusting unit penetrating the chamber and connected to the induction heating unit disposed under a susceptor.    USE - Substrate processing apparatus for fabricating semiconductor device, organic device and solar cell device.    ADVANTAGE - Enable substrate processing apparatus to uniformly heat the substrate seating body within the vacuum chamber and reduce the power consumption of the induction heating unit used to heat the substrate seating body. Prevents heat loss of the substrate seating body by disposing a separate heat insulating unit between the substrate seating body and the induction heating unit, and maximizes substrate heating efficiency by reducing the power loss of the induction heating unit. Reduces generation of particles or dust due to a heat insulator by disposing the heat insulator in the heat insulating unit to prevent the heat insulator from being exposed to the reaction space of the chamber so to enable to prolong the replacement time of the heat insulator. Uniformly control the temperature of the substrate seating body by adjusting the distance between the substrate seating body and the induction heating unit at the outside of the chamber, and increase the efficiency of the equipment uptime. Enable to readily secure a uniform temperature distribution of the substrate seating body without the disassembly of the processing chamber by adjusting the altitude of the induction coil disposed under the substrate seating body at the outside of the processing chamber, and since the disassembly of the chamber is omitted when adjusting the distance between the substrate seating body and the coil, the disassembling and assembling time of the chamber is not necessary and the effectiveness of the equipment operation is improved. Reduces frequency of the inside of the chamber exposed to the air so to extend longevity of the chamber. Enhances heat insulating effect of the substrate seating body by forming the heat insulating body including the heat insulator sealed with the material such as quartz, and the heat insulator is inexpensive and has an outstanding heat insulating effect usable within the chamber.    DESCRIPTION OF DRAWING(S) - The drawing shows the cross sectional view of the substrate processing apparatus.    Substrate (10)    Chamber (100)    Substrate seating body (200)    Induction heating unit (300)    Heat insulating body (400)