TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The oxide layer contains oxides, nitrides, carbides, or borides of atomic elements chosen from group-IIA elements, group-IIIA elements, group-IVA elements, group-VA elements, group-VIA elements, group-VIIA elements, group-IB elements, or group-IIB elements, metals of group-IIIB elements, group-IVB elements, or group-VB elements, and/or rare-earth metals. The oxide layer preferably contains silicon aluminum oxide or indium tin oxide.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The base (co)polymer layer is formed by evaporating a base (co)polymer precursor, condensing the evaporated base (co)polymer precursor onto the substrate, and curing the evaporated base (co)polymer precursor. The manufacture of barrier film further involves co-evaporating the (meth)acryl-silane compound with the (meth)acryloyl compound from a liquid mixture containing less than 10 wt.% (meth)acryl-silane, or sequentially-evaporating the (meth)acryl-silane compound and the (meth)acryloyl compound from separate liquid sources, and co-condensing or sequentially condensing the (meth)acryl-silane compound and the (meth)acryloyl compound on the oxide layer. The oxide layer is formed by depositing an oxide on the base (co)polymer layer. The oxide deposition process is carried out using sputter deposition, reactive sputtering, and/or chemical vapor deposition. Preferred Components: The base (co)polymer precursor contains a (meth)acrylate monomer. The primary and secondary (meth)acryloyl compounds are chosen from tricyclodecane dimethanol di(meth)acrylate, 3-(acryloxy)-2-hydroxy-propylmeth(meth)acrylate, triacryloxyethyl isocyanurate, glycerol di(meth)acrylate, ethoxylated trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, propoxylated-3-glyceryl di(meth)acrylate, propoxylated-5,5-glyceryl di(meth)acrylate, propoxylated-3-trimethylolpropane di(meth)acrylate, propoxylated-6-trimethylolpropane di(meth)acrylate, trimethylolpropane di(meth)acrylate, di-trimethylolpropane tetra(meth)acrylate, and dipentaerythritol penta(meth)acrylate. The substrate consists of a flexible transparent polymeric film, and the base (co)polymer layer consists of a (meth)acrylate smoothing layer. The substrate is made from polyethylene terephthalate, polyethylene napthalate, heat-stabilized polyethylene terephthalate, heat-stabilized polyethylene napthalate, polyoxymethylene, polyvinyl naphthalene, polyetheretherketone, fluoropolymer, polycarbonate, polymethyl meth(meth)acrylate, polymethyl styrene, polysulfone, polyphenylene oxide, polyetherimide, polyethersulfone, polyamideimide, polyimide, and/or polyphthalamide. The barrier film consists of several alternating layers of oxide layer and protective (co)polymer layer, which are formed on the base (co)polymer layer. The (meth)acryloyl compound is of formula (I), and the (meth)acryl-silane compound is of formula: ((Rm)x)-R1-(R2)y (II). The (meth)acryl-silane compound is preferably chosen from group of formulae (III)-(VII).x,y=1 or more;Rm=(meth)acryl group of formula: -X2-C(O)C(R3)=CH2;X2=oxygen, sulfur, or NR3;R3=H, or 1-4C alkyl;R1=covalent bond, (poly)cyclo-alkylene, heterocyclic group, arylene, or polyvalent alkylene, in which alkylene is optionally substituted by catenary oxygen, nitrogen atom, or pendant hydroxy;R2=silane-containing group derived from aminosilane and acryloyl group of formula: -X2-C(O)CH2CH2-N(R4)-R5-Si(Yp)(R6)3-p;R4=1-6C alkyl or cycloalkyl, -R5-Si(Yp)(R6)3-p, or (Rm)x-R1-X2-C(O)-CH2CH2-;R5=divalent alkylene;Y=hydrolysable group chosen from alkoxy, acetate, aryloxy, or halogen;R6=monovalent alkyl or aryl;andp=1, 2, or 3.