NOVELTY - A gas-barrier film comprises base material, barrier layer and inorganic-organic hybrid polymer layer. The inorganic-organic hybrid polymer layer is formed using material containing polymethoxy siloxane. The atomic ratio of silicon, carbon and oxygen are in sequentially decreasing order when observed in region of more than 90% of the thickness of the barrier layer. The carbon distribution curve has at least 2 extreme values. The absolute value of difference of maximum value of carbon atomic ratio and minimum value in carbon distribution curve is 3 atomic% or more.    USE - Gas-barrier film is used as optical component and sealing film. Uses include but are not limited to solar cell element, liquid crystal display element, organic electroluminescent element, thin-film transistor, touchscreen and electronic paper.    ADVANTAGE - The gas-barrier film has reduced water vapor permeation rate.    DETAILED DESCRIPTION - A gas-barrier film comprises a base material, a barrier layer and an inorganic-organic hybrid polymer layer containing silicon, oxygen and carbon which are formed on surface(s) of the base material. The inorganic-organic hybrid polymer layer is of formula (I) and formed using material containing 20-40 mol% polymethoxy siloxane with respect to total number of moles of the material which comprises inorganic-organic hybrid polymer layer. A silicon distribution curve showing the relationship between ratio of the amount of silicon atoms to the total amount of silicon atom, oxygen atom and carbon atoms, and distance (L) of the barrier layer in the thickness direction from the surface of the barrier layer is observed. An oxygen distribution curve showing the relationship between distance (L) and ratio of the amount of oxygen atoms to the total amount of carbon atoms, silicon atom and oxygen atom is observed. A carbon distribution curve showing the relationship between distance (L) and ratio of the amount of carbon atoms to the total amount of carbon atoms, silicon atom and oxygen atom is observed. The atomic ratio of silicon, carbon and oxygen are in sequentially decreasing order when observed in region of more than 90% of the thickness of the barrier layer. The carbon distribution curve has at least 2 extreme values. The absolute value of difference of maximum value of carbon atomic ratio and minimum value in carbon distribution curve is 3 atomic% or more.    n=2-20.