TECHNOLOGY FOCUS - POLYMERS - Preferred Method: In the method: the exposure temperature is 40-60 degrees C, preferably 50 degrees C plus minus 2 degrees C; the exposure time is 30-60 minutes; and the first layer has a thickness of 1-5 nm before the monomer source polymerizes the first layer. The method further comprises: depositing a coating solution to form the first layer on the substrate, where the coating solution has a composition that comprises the oxidant at less than or equal to 0.15 M, preferably 0.07-0.15 M; and applying a cleaning solution to the substrate after polymerization, where the cleaning solution comprises isopropanol, and the first process protocol defines a cleaning time of less than or equal to 3 minutes. Preferred Components: The composition comprises less than or equal to 0.08 M of a quenching agent that neutralizes the acid that develops during polymerization without inhibiting the polymerization of the poly(3,4-ethylenedioxythiophene) film. The oxidant comprises: iron(III) oxidant, in which the counter ion comprises at least one of chloride, bromide or para-toluenesulfonate, preferably iron(III) para-toluenesulfonate; or copper(II) oxidant, in which the counter ion comprise at least one of chloride, bromide, para-toluenesulfonate or (trifluoromethyl)sulfonate. The film comprises the crystalline structure. The crystalline structure or the film: has a conductivity of greater than or equal to 300 S/cm; has a first region comprising the oxidant; is configured to exhibit a resistivity that varies by plus minus less than or equal to 10% less during flexure of the crystalline structure from a first flexure dimension to a second flexure dimension that is smaller than the first flexure dimension, over at least 10 cycles between the first and second flexure dimensions; and is configured to transmit greater than or equal to 85% of light having a wavelength of 400-1100 nm. EXAMPLE - Solution of iron(III) para-toluenesulfonate hexahydrate in butanol was spin-coated onto a clean polyethylene naphthalate or polyethylene terephthalate substrates. The coated substrate was then heated at 75 degrees C for 3 minutes to evaporate excess butanol. The substrates were suspended liquid 3,4-ethylenedioxythiophene monomer in a polymerization chamber held at a constant temperature of 50 degrees C, and the polymerization reaction was performed for 45 minutes to obtain poly(3,4-ethylenedioxythiophene) films. The polymerized films were then rinsed with ethanol and dried under a stream of nitrogen gas.