TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The non-oxidizing gas is nitrogen, argon, helium, hydrogen, hydrogen sulfide and/or hydrogen selenide. The I-III-VI group or I-II-IV-VI group compound semiconductor is copper-indium-sulfide, copper-indium-selenide, copper-indium-gallium-sulfide, copper-indium-gallium-selenide, copper-zinc-tin-sulfide and/or copper-zinc-tin-selenide, and has average grain size of 200 nm to 5 mu m. The crystal structure of compound semiconductor is a chalcopyrite-type compound semiconductor or kesterite-type compound semiconductor.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The low-molecular weight compound comprises flavin derivative containing 10-dodecyl-7,8-dimethyl-10H-benzo(g)pteridine-2,4-dione and/or 10-octadecyl-7,8-dimethyl-10H-benzo(g)pteridine-2,4-dione. Preferred Process: Dispersion process is carried out by stirring, shaking, ball milling and ultrasonically irradiating the nanotubes. The separation process is carried out using filtration, membrane separation, centrifugation, and ultra-centrifugation process. The method further involves recovering semiconductive single-walled carbon nanotubes from the solution portion, and/or recovering metallic single-walled carbon nanotubes from the solid component.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step of forming Cu-silicide is conducted under mixed gas atmosphere containing hydrogen. The step of forming Cu-silicide and the step of conducting hydrochlorination reaction are continuously conducted. The step of conducting a hydrochlorination reaction is conducted without introduction of a catalyst. The Cu-silicide is formed on a surface of the silicon. The heat treating is conducted at a temperature of 300-800 degrees C. The step of conducting a hydrochlorination reaction is conducted at a temperature of 300-800 degrees C and a pressure of 1-50 bar. Preferred Components: The mixed gas includes 10 wt.% or less of hydrogen, and the remaining content of inert gas. The copper compound includes at least one of copper(I) chloride, copper(II) chloride, copper(I) oxide, copper(II) oxide, or copper. The silicon is metallurgical silicon (MG-Si) having an average particle diameter of 10-500 mu m. EXAMPLE - 170 g of Metallurgical silicon (MG-Si) having purity of 99% or more and an average particle size of 250 mu m was mixed with copper(II) chloride (CuCl2) in the content of 1.4 wt.% of MG-Si based on the weight of copper (Cu) in CuCl2, and the temperature was elevated to 700 degrees C at 4 degrees C/minutes under mixed gas atmosphere containing hydrogen and nitrogen in the weight ratio of 1:9. The mixture was maintained at 700 degrees C for 1 hour, and then, cooled to room temperature to obtain MG-Si where Cu-silicide is formed. In a fixed bed reactor, 170 g of the MG-Si where Cu-silicide is formed was filled, and then, a hydrochlorination reaction was progressed at a temperature of 525 degrees C and a pressure of 20 barG, for 2-10 hours with a molar ratio of hydrogen (H2):silicon tetrachloride (SiCl4) of 2:1 to prepare trichlorosilane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The TCO film is made of composition consisting of aluminum-doped zinc oxide, gallium-doped zinc oxide, aluminum- and gallium-doped zinc oxide, boron-doped zinc oxide, indium-doped cadmium oxide, indium tin oxide, and/or fluorine-doped tin oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate is made of indium phosphide (preferred), gallium arsenide, gallium antimonide, indium arsenide, silicon or germanium. The n-type quantum well layer is 80 Angstrom n-type indium gallium arsenide (In(0.65)Ga(0.35)As) quantum well layer. The n-type barrier layers are 50 Angstrom first n-type indium aluminum arsenide (In(0.41)Al(0.59)As) and 20 Angstrom second n-type indium aluminum arsenide (In(0.41)Al(0.59)As) barrier layer. The p-type quantum well layer is 80 Angstrom p-type indium gallium arsenide (In(0.65)Ga(0.35)As) quantum well layer, and the p-type barrier layers are 20 Angstrom first p-type indium aluminum arsenide (In(0.41)Al(0.59)As) and 50 Angstrom second p-type indium aluminum arsenide (In(0.41)Al(0.59)As) barrier layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The cut waste does not contain abrasive grain of silicon carbide. Preferred Condition: The melting process is performed under reduced pressure. Preferred Process: Before the melting process, the cut waste is washed using a acidic aqueous solution having pH value of 0-5, or mixed aqueous solution of acidic aqueous solution and 1-90 wt.% metal fluoride aqueous solution. The melting of cut waste is carried out in presence of an alkali-metal fluoride or an alkaline-earth metal fluoride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: In manufacture process, the waste tetrachlorosilane (13, 14) are recycled. During manufacture process, obtaining zinc gas (16) and chlorine gas (30) by electrolyzing the liquid material (26) by using the molten salt electrolysis apparatus (27), obtaining liquid containing zinc and zinc chloride by cooling exhaust gas, converting the gaseous chlorine into hydrogen chloride using hydrogen chloride synthesis apparatus (51). The zinc reductive reaction is performed within the zinc reductive reaction device (17) of vertical or cylindrical shape. The zinc reductive reaction device has the tetrachlorosilane gas introduction pipe to which the ejection opening protruded in zinc reductive reaction device. The tubular polycrystalline silicon of needle shape or dendritic shape is grown non-contactedly downward with the ejection opening as starting point with zinc reductive reaction device structural component except ejection opening in zinc reductive reaction.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The transparent particles ate granular quartz glass. Preferred Property: The granular quartz glass has size of 0.5-4 mm, preferably 1-4 mm.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The granular material is polycrystalline silicon having needle shape or dendritic shape. Preferred Property: The size of granular material and transparent particles is 0.5-10 mm, respectively. The polycrystalline silicon has size of 0.5-4 mm, preferably 1-4 mm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The said transparent plate is plastic plate. The plastic plate is acrylic board or polycarbonate plate. The light source is lamp box (4) provided with dispersing plate (6). Preferred Process: The lower portion of transparent plate is equipped with linear polarizing plate, and granular material dispersed from upper direction of transparent plate is visually observed through linear polarizing plate, and to recognize foreign material. The suction removal of transparent particles is carried out using vacuum pincette. The vacuum pincette is product formed using polyetheretherketone resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Fluoride is a fluoride containing groups 11-15 elements and/or elements from 4th-6th period.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The method uses a reaction solvent which has moisture content of less than or equal to 1x 103 ppm and is an aprotic solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The moisture content which remains on the adhesive sealing film is 500 ppm or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The coating liquid further contains toluene.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The tackifying resin is rosin-type resin, terpene-type resin, alicyclic-type petroleum resin, and/or aromatic petroleum resin. The carbon double bond content of tackifying resin is preferably 1.8-50%. The solid content of coating solution is obtained by removing the solvent from the coating solution. Preferred Properties: The tackifying resin has number average molecular weight of 800-1600. The polyisobutylene has number average molecular weight of 10000-1000000. The minimum value of the storage elastic modulus of the adhesive sealing film is 1x 109 Pa or less at 20-50 degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: A silane coupling agent (C) is further contained in the composition. The ratio of silsesquioxane and silane coupling agent is 0.75-1.00 when the solid content of polyethylene dioxythiophene/polystyrene sulfonate aqueous solution is 1. The content ratio of components (B:C) is 1:1-4:3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises preparing a second solution from a first solution containing the mixture, and heating the solution at 50-200 degrees C. Preferred Components: The halogen catalyst includes silver chloride, potassium bromide, and tin chloride. The silver halide is present in an amount of 0.01-0.2 M. The capping reagent is present in an amount of 0.01-1 M. The halogen catalyst is present in an amount of 0.001-0.5 M. A mole ratio of the silver halide and the halogen catalyst is 0.1-30%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The polyol solvent includes ethylene glycol, 1,2-propylene glycol, 1,3-propylene glycol, and glycerol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The capping reagent includes polyvinylpyrrolidone K 90 powder, and polyvinylpyrrolidone K 30 powder.
Preferred Definitions:    R1-R7=hydrogen atom.    SPECIFIC COMPOUNDS - The disubstituted naphthothiadiazole compound (I) is 4,9-bis-(thien-2'-yl)-naphtho(2,3-c)(1,2,5)thiadiazole (DTN) (Ia).
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The alkali-free glass is obtained using silicon dioxide raw material as silicon source, and magnesium oxide, calcium oxide, strontium oxide and barium oxide as alkaline-earth metal source.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicon dioxide raw material is silica sand. The silica sand has average particle size of 20-27 mu m. The content of particles having particle size of 2 mu m or less in silica sand is 0.3 vol.% or less. The content of particles having particle size of 100 mu m or more in silica sand is 2.5 vol.% or less. The content of alkaline-earth metal source is 5-100 %mass based on oxide conversion.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): The 2-(2-hydroxyphenyl)imidazole derivative is prepared by heating ( alpha )-diketone compound, salicylaldehyde derivative, and ammonium acetate in the presence of a solvent e.g. acetic acid, and reacting. Preferred Definitions:    R1,R2=tertiary alkyl.    EXAMPLE - 6.2 g 2,2,5,5-Tetramethyl-3,4-hexanedione, 8.53 g 3,5-di-t-butyl-salicylaldehyde, 56.1 g ammonium acetate, and 87.4 g acetic acid were added to a flask of microwave reaction apparatus, to obtain a mixture. The obtained mixture was heated and reacted at a temperature of 130-140 degrees C. The reacted mixture was extracted using 200 mL hexane. The extracted liquid was washed using water and saturated sodium hydrogen carbonate aqueous solution, and dried using anhydrous magnesium sulfate. The solvent was distilled off from the organic layer of liquid, and purified using column chromatography and recrystallized, to obtain 2,4-di-tert-butyl-6-(4,5-di-tert-butyl-1H-imidazol-2-yl)phenol, with yield of 22%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The polyester composition comprises 0.59-11.15 mol/t metal element containing manganese, calcium and/or aluminum. The metal content (M) in the polyester composition is calculated using preset relation: M=0.5x (M1)+M2+1.5x M3, where M1 is the content of alkali metal with respect to the polyester composition, M2 is the content of aluminum with respect to the polyester composition and M3 is the total content of manganese and calcium with respect to the polyester composition. The ratio of metal content and phosphorus content in the polyester composition is 0.8-2, preferably 0.8-1.1 (excluding 1.1).    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyester composition further comprises incompatible thermoplastic resin in the form of dispersion, and 0.1-5 %mass particles having particle size of 2 mu m or more. Preferred Properties: The brightness of the surface of the polyester film is 10 or more. The optical density of the polyester film is 4 or more. The surface of the polyester film has peak count (SPc) (2000 nm) of 100 peaks/mm2. The dispersion diameter of the incompatible thermoplastic resin is 500-3000 nm. The difference of the crystallization temperature and glass transition temperature of the polyester composition is 45-70 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The intermetallic sodium-containing phase comprises: intermetallic gallium-sodium-containing phases, intermetallic indium-sodium-containing phase, and intermetallic gallium-indium-sodium containing phase; or sodium-gallium (NaGa4), sodium-gallium (Na5Ga8), sodium-gallium (Na22Ga39), sodium indium, sodium indium (Na2In), sodium indium (Na7In12), sodium indium (Na15In27) and sodium-gallium-indium (Na17Ga29In12). The intermetallic sodium-containing phase is homogeneously dispersed in a matrix consisting of copper, gallium and indium. The amount of copper is more than 30 atm.%. The amount of element including gallium and indium is 20-65 atm.%. A ratio of gallium/gallium and indium is 0.15-0.35 atm.%. The amount of sodium is 1-5 atm.%. The sputtering target is present in the form of a plate, a disk, a rod, a pipe or other complex shaped body. The sputtering target manufacturing method further comprises preparing a powder mixture containing the alloy, filling the powder mixture into a mold, compacting the powder mixture by applying pressure to form a blank, heat treating the blank, machining the blank, and spraying gallium-sodium, indium-sodium and gallium-indium-sodium melt on the alloy. The blank is formed by extrusion, forging or rolling process.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The organic thin film layer further comprises dopant compound, and is interposed between a first electrode and a second electrode. The organic electroluminescent device emits blue, red, green or white color.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. SPECIFIC COMPOUNDS - 253 Compounds (Q) are specifically claimed e.g. 6-(4-(4,6-diphenylpyrimidin-2-yl)phenyl)-11,11-dimethyl-1-((1E)-1-((Z)-prop-1-enyl)buta-1,3-dienyl)-2,3-dihydro-(1,4)oxazino(3,2-b)acridine of formula (Ia), 6-(3-(4,6-diphenylpyrimidin-2-yl)phenyl)-11,11-dimethyl-1-((1E)-1-((Z)-prop-1-enyl)buta-1,3-dienyl)-2,3-dihydro-(1,4)oxazino(3,2-b)acridine, 6-(4,6-diphenyl-1,3,5-triazin-2-yl)-11,11-dimethyl-1-((1E)-1-((Z)-prop-1-enyl)buta-1,3-dienyl)-2,3-dihydro-(1,4)oxazino(3,2-b)acridine, 6-(4-(4,6-diphenyl-1,3,5-triazin-2-yl)phenyl)-11,11-dimethyl-1-((1E)-1-((Z)-prop-1-enyl)buta-1,3-dienyl)-2,3-dihydro-(1,4)oxazino(3,2-b)acridine and 6-(3-(4,6-diphenyl-1,3,5-triazin-2-yl)phenyl)-11,11-dimethyl-1-((1E)-1-((Z)-prop-1-enyl)buta-1,3-dienyl)-2,3-dihydro-(1,4)oxazino(3,2-b)acridine.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: Oxidation is carried out using 1 mol/L sulfuric acid with applied voltage of 20 V, 0.5 mol/L oxalic acid with applied voltage of 40 V and 0.8 mol/L phosphoric acid with applied voltage of 120 V. Preferred Component: Strong acid is 20% hydrochloric acid and strong alkali is 10% sodium hydroxide. Chloride is stannous chloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The oxide film formed in the crystalline silicon substrate surface is removed by hydrofluoric-acid aqueous solution. The crystalline silicon substrate is etched using the alkaline aqueous solution containing sodium hydroxide or potassium hydroxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The halide is a chlorine compound including sodium chloride, ammonium chloride, potassium chloride and calcium chloride.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The compartment comprises an anode compartment having the wastewater inlet with the anode and a cathode compartment having the electron receptor inlet with the cathode. The cathode compartment is separated from the anode compartment by a cation specific membrane. The compartment consists of a single compartment, with an electrolyte between the anode and the cathode providing free exchange of cations and anions flow-through. The polymeric foam substrate comprises a hydrophobic polymeric foam. The hydrophobic polymeric foam comprises an open-reticulated hydrophobic PUF. The polymeric foam substrate has the electrically conductive material interspersed within. The polymeric foam substrate has the electrically conductive material attached by the binder or chemical bonds. The electrically conductive material comprises an electrically conductive polymer. The electrically conductive material provides a 25 degrees C electrical conductivity of at least 10-1 second/cm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The anionic surfactant comprises fatty acid compound of formula: RCOO-M+ (I), monoalkyl sulfonic acid compound of formula: RSO3-M+ (II), and monoalkyl acid compound of formula: RPO(OH)O-M+ (III). The ion-exchange membrane is cation-exchange membrane or anion-exchange membrane.R=linear or branched 6-12C alkyl, H or fluoro;andM=H, Na or K.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The first compound comprises 2-(4-chlorobenzoyl)benzoic acid.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The water soluble polymer comprises gelatin and/or polyvinyl alcohol. The additional water soluble polymers comprise a polyacrylic polymer, an organic solvent soluble polymer, or cellulose ester polymer. The organic solvent soluble polymer binder comprises cellulose acetate, cellulose acetate butyrate, and/or cellulose acetate propionate. The organic solvent soluble polymers comprise a polyester polymer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The pyridine-ketone compound comprises 2,6-diacetylpyridine or di(2-pyridyl)ketone.    TECHNOLOGY FOCUS - POLYMERS - The polymer binder comprises at least one water soluble polymer, and an organic solvent soluble polymer. The water soluble polymer comprises gelatin, and/or polyvinyl alcohol. The organic solvent soluble polymer binder comprises at least one cellulose ester polymer. The organic solvent soluble polymer binder comprises cellulose acetate, cellulose acetate butyrate, or cellulose acetate propionate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The processing liquid is deionized water.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The processing liquid is isopropyl alcohol or hydrofluoro ether.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The substrate is soda-lime glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: During method of growing crystalline, oriented films, the base pressure is more than 1x 10-7 Torr, and oxygen pressure is more than 10-4 Torr. Preferred Composition: The evaporation source is magnesium oxide crystals. Preferred Process: The constant temperature of 300-600 degrees C is maintained during method of growing crystalline, oriented films.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The niobium oxide sintered compact consists of niobium oxide of formula: Nb2O5-x, where x is 0.005-0.1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The semiconductor region is formed of nitride semiconductor material comprising gallium nitride semiconductor material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Phthalocyanine compound with fullerene structure is obtained by preparing intermediate compound by reacting compound containing metal source, sulfur-containing compound, and nitrogen-containing compound, reacting p-formyl benzoic acid and intermediate compound, and reacting 60 carbon fullerene and N-methylglycine. Preferred Definitions:    R1-R6= greater than or equal to 6C alkyl; and    M=Zn or Cu.    SPECIFIC COMPOUNDS - 2 Compounds (1) are disclosed, e.g. compound of formula (C16S)6PcCu-C60 (e-1) and compound of formula (C16S)6PcZn-C60 (e-2).    EXAMPLE - Under nitrogen stream, intermediate compound of formula (C16S)6PcCu-OFBA (d-1) (55 mg), 60C fullerene (32.6 mg), distilled toluene (20 ml), and N-methylglycine were added in flask in order. Refluxing process was performed in oil bath for 14 hours at 120 degrees C. Reaction liquid was cooled and distilled. After reaction completion, mirabilite drying was performed and extraction using chloroform was carried out. Mirabilite was removed by filtration, distillation was performed, and vacuum-drying process was carried out. Solid-liquid extraction of product was carried out using ethyl acetate, distillation was performed, and vacuum-drying process was carried out. Silica gel column chromatography was performed for purification. Dark green solid compound (e-1) (85.7% yield) was obtained.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The semiconductor layer is obtained by converting compound (II) to tetrabenzoporphyrin compound (I). Preferred Definitions:    X=phenylene.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The crystalline alloy target further includes element(s) chosen from chromium, molybdenum, silicon, niobium, cobalt, tin, indium, bismuth, zinc, vanadium, hafnium, silver, titanium and iron. The crystalline alloy target contains 5-20 atomic% aluminum, 15-40 atomic% total content of copper and nickel, and remainder of zirconium, such that total content of aluminum, copper, nickel and zirconium is 100 atomic%, or more than 5% to more than 20% aluminum, 15-40% copper and nickel, more than 0% to less than 8% chromium, molybdenum, silicon, niobium, cobalt, tin, indium, bismuth, zinc, vanadium, hafnium, silver, titanium and iron, and remainder of zirconium. The substrate comprises iron, steel and non-ferrous metal.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The primary precursor layer and secondary precursor layer contain indium selenide/copper selenide, indium(III) selenide/copper(I) selenide, indium(III) selenide/copper selenide, indium-gallium selenide/copper(I) selenide, indium-gallium selenide/copper selenide, copper-indium selenide, or copper-gallium selenide. The sodium thin film layer contains sodium fluoride, sodium selenide, sodium-doped copper, sodium-doped indium, or sodium-doped copper-gallium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The crystallization promoter content layer contains group (IIa) element chosen from magnesium, strontium, calcium and barium. The raw material contains 80 %mass or more polycrystalline silicon having particle size of 0.1-4 mm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The gas barrier layers are formed of silicon oxide, aluminium oxide and titanium oxide.    TECHNOLOGY FOCUS - POLYMERS - The organic layers are formed of polyurethane resin, polyester resin and acrylic resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The complex oxide has composition of formula: LiaNibMncCodMxO2, where a is 0.9-1.2, b is between 0 and 1, c, d are 0-0.5 (excluding 0), x is 0-0.3, b+c+d is 1, M is chosen from titanium, zirconium, niobium, tungsten, phosphorus, aluminum, magnesium, vanadium, calcium, strontium and chromium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The compound (I) is preferably 2,7-disodium-3-hydroxynaphthalene-2,7-disulfonate, sodium-7-hydroxy-3-methanesulfonylnaphthalene-1-sulfonate or 2,7-disodium-3,6-dihydroxynaphthalene-2,7-disulfonate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: A preliminary conductive layer is further formed on the electroconductive polymeric layer, using a solution containing a conductive polymer. Preferred Component: Conductive polymer is polyaniline or its derivative.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: Preparation of the phosphorylated mesoporous hollow silica sub-micron spherical granule comprises (a) using Stober synthesis process to prepare monodispersed silica sub-micron spherical granule as core; (b) covering the resulting granule with hexadecyl trimethyl ammonium bromide template, carrying out tetraethyl orthosilicate hydrolytic polycondensation to obtain mesoporous shell layer; (c) using aqueous sodium carbonate solution for etching the granule core; (d) using methanol hydrochloric acid solution to remove hexadecyl trimethyl ammonium bromide template from the granule, and preparing mesoporous hollow silica granule; (e) using epoxy-coupling agent (3-glycidoxypropyl trimethoxysilane) in anhydrous toluene, and then subjecting the granule to epoxy modification; and (vi) using phosphorus oxychloride for carrying out phosphorylation.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is xylene, toluene and/or benzene.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The ethylene vinyl acetate resin is a chlorinated ethylene vinyl acetate, europium ethylene vinyl acetate, fluoride ethylene vinyl acetate or nano-modified ethylene-vinyl acetate copolymer having vinyl acetate content of 28-36%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inert atmosphere is nitrogen or argon atmosphere.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The silver nitrate has concentration of 1.8-2.5 mM, and pH control of 10-12.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Conditions: Microwave reaction is carried out for 50 seconds, stopped for 30 seconds, continued for 60 seconds, stopped for 40 seconds, and again continued for 60 seconds. The final pH is controlled to 7.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The concentration of hydrogen peroxide solution is 30 %mass. The concentration of hydrochloric acid is 10 vol.%. The mass ratio of graphite oxide and ethylene glycol is 1:5.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The first high boiling point organic solvent is oleamide, oleic acid, dibenzyl amine, dibenzyl ether, diiso-octyl-octadecene, or amines. The concentration of front drive source of A in a second solution is 0.01-1 mol/l, and the concentration of a second solution R in front of driving source is 0.02-2 mol/l. The second high boiling point organic solvent is oleamide, oleic acid, dibenzyl amine, dibenzyl ether, or dioctyl amine.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: Ceramic powder is metal oxide, metal nitride, hydroxyapatite, tricalcium phosphate, clay, silicon carbide, emery and/or cordierite. Dispersant is sodium polyacrylate, methylenebisnaphthalenesulfonate, sodium lauryl sulfate and/or sodium dodecylbenzenesulfonate. Adhesive is polyvinyl alcohol or carboxymethyl cellulose. Liquid cooling source is methanol, ethanol and/or liquid nitrogen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The first heater and the second heater are formed from graphite, carbon composite, silicon carbide, molybdenum, pyrolytic boron nitride, tungsten, or nichrome.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The matrix material is made of gallium arsenide, gallium nitride, indium gallium nitride, indium gallium arsenide.    TECHNOLOGY FOCUS - METALLURGY - The nanoparticle is made of silver and aluminum. The matrix material is made of germanium and silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Layer: The base material layer has an inorganic compound layer formed on at least one surface of the base material layer.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The polymerized coating is further heat-processed at 60-350 degrees C for 1 minute-5 hours.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The seed crystal is arranged on the bottom face portion of the casting mold, such that inner peripheral side portion of casting mold and outer peripheral portion of seed crystal are separated. The arrangement of seed crystal in the casting mold satisfies the relations: 0.21 less than or equal to Sb/Sa less than 1 (I) and Sb1/2/d less than or equal to 9.8 (II), where Sa (mm2) is area of bottom face portion of the casting mold, Sb (mm2) is area of upper surface of the seed crystal, and d (mm) is thickness of the seed crystal. Manufacture of silicon ingot further involves performing precipitation process by depositing carbon contained in the primary silicon melt solution by starting cooling of primary silicon melt solution in the casting mold, before starting the pouring of secondary silicon melt solution into the casting mold with silicon carbide, and carrying out pouring process by pouring secondary silicon melt solution into casting mold and reducing the carbon concentration of primary silicon melt solution in the casting mold. The primary cooling rate in the lower surface side of the casting mold is higher than the secondary cooling rate in the side surface of casting mold. The reduction of primary temperature in the lower surface side of the casting mold is higher than the reduction of secondary temperature in the surface side of the casting mold. The seed crystals are arranged across a gap enclosed in the bottom face portion of the casting mold.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The charge-transporting thin film comprises positive hole-injection layer or positive hole-transport layer. Preferred Definitions:    R1-R18=H, fluoro or 1-20C alkyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The particle size of iron-aluminum alloy particles spaced apart and dispersed from the steel layer contained in aluminum-containing metal layer is 0.1-5 mu m. The surface roughness of the surface of aluminum layer is 10-25 nm. Preferred Composition: The aluminum-containing metal layer contains 1-15 %mass silicon and remainder of aluminum, and unavoidable impurities. The iron-aluminum particles contain intermetallic compound(s) chosen from iron-aluminum (FeAl3), iron-aluminum-silicon (Fe2Al8Si), and iron-aluminum-silicon (FeAl5Si). The aluminum layer contains 99 %mass or more aluminum and unavoidable impurities. Preferred Layers: The surface of aluminum layer further has layer(s) chosen from aluminum nitride layer and alumina layer, or layer(s) chosen from sol-gel layer and lamination layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The complex oxide is lithium-nickel-manganese complex oxide (LiaNibMncCodMxO2, where a is 0.9-1.2, b more than 0 and less than 1 (preferably 0.44-0.51), c is 0-0.5 (excluding 0) (preferably 0.27-0.31), d is 0-0.5 (excluding 0) (preferably 0.19-0.26), x is 0-0.3, b+c+d is 1, and M is element(s) chosen from titanium, zirconium, niobium, tungsten, phosphorus, aluminum, manganese, vanadium, calcium, strontium and chromium). The positive electrode material contains the positive electrode active material and spinel-type manganese positive electrode active material in a weight ratio of 50:50-90:10. Preferred Properties: The positive electrode active material has a crystalline diameter of 0.4 mu m or less, a tap density of 2 g/cm3 or more, and a BET specific surface area of 0.1-1 m2/g. The positive electrode active material has a diffraction peak integrated intensity ratio ((003)/(104)) of diffraction peak of (104) plane and diffraction peak of (003) plane of 1.05 or more. The positive electrode active material has a diffraction peak intensity ratio ((003)/(104)) of diffraction peak of (104) plane and diffraction peak of (003) plane of 1.28 or more measured by powder X-ray diffraction measurement. The aspect-ratio of the positive electrode measured as an aspect ratio of a rectangular-shaped positive electrode active material layer is 1-3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The substrate and the patterned transparent layer are made of gallium nitride, silicon carbide or silicon dioxide.
TECHNOLOGY FOCUS - BIOLOGY - Preferred Composition: The Shewanella strain ANA-3 includes arsenate reductase and arsenate respiratory reductase gene.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The production process further involves inoculating Shewanella strain ANA-3 with carbon and energy source, sulfur source and arsenic source, growing Shewanella strain ANA-3, and harvesting resulting Shewanella strain ANA-3 nanofibers after 18-72 hours. Preferred Composition: The nanofibers include amorphous arsenic trisulfide. The sulfur source is thiosulfate. The arsenic source is arsenate. The nanofibers include nanofibers having crystalline structure containing ( beta )-tetra-arsenic tetra-sulfide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The carbon and energy source is acetate, lactate or pyruvate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The semiconductor quantum dots are chosen from indium phosphide/zinc sulfide quantum dots, copper indium disulfide/zinc sulfide wavelength conversion and zinc sulfide/silver indium disulfide solid solution/zinc sulfide quantum dots, which are core-shell structure-type semiconductor quantum dots, and silver indium disulfide quantum dots and zinc-doped silver indium disulfide quantum dots, which are uniform structure-type semiconductor quantum dots. Preferred Properties: The semiconductor quantum dots are material (A) having maximum fluorescence at wavelength of 500-600 nm and/or material (B) having maximum fluorescence at 600-700 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin is chosen from cyclic polyolefin resin, aromatic polyether-based resin, polyimide resin, fluorene polycarbonate resin, fluorene polyester resin, polycarbonate resin, polyamide resin, polyarylate resin, polysulfone resin, polyether sulfone resin, polyparaphenylene-based resin, polyamidoimide resin, polyethylene naphthalate-based resin, fluorinated aromatic polymer resin, (modified)acrylic resin, epoxy resin, allyl ester curable resin and silsesquioxane-based UV-curable resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The primary compound semiconductor layer further contains crystals of gallium arsenide, gallium antimonide, indium arsenide, or indium antimonide. The primary compound semiconductor layer is a layer containing gallium-arsenic-antimony-containing compound of formula: GaAs1-zSbz (II), where z is 0-0.3 (including 0.3). The secondary compound semiconductor layer further contains indium-arsenic-antimony-containing compound of formula: InAs1-ySby (III), where y is 0-0.3 (including 0.3). The arsenic raw material is arsenic molecules. Preferred Properties: The half width value of X-ray diffraction peak in the surface orientation of secondary compound semiconductor layer in the silicon substrate is 1-450 second. The root mean square value of surface roughness in the secondary compound semiconductor layer is 0.1-3 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The transition metal is chosen from nickel and palladium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organosilicon compound is of formula: R-SiY'3 (I). The R of the organosilicon compound is substituted with fluorine atom bonded with the sp2-hybridized carbon atom of the fluoro olefin. The organic transition metal catalyst is an organic palladium complex. The fluoro olefin substituted by organic group is of formula: C(-F)(-R)=C(-F)(-F).R=optionally substituted aryl, optionally substituted heteroaryl bonded through carbon, optionally substituted cycloalkyl, optionally substituted alkyl, optionally substituted alkenyl, or optionally substituted alkynyl;andY'=hydroxy, hydroxide, alkoxy, alkyl or fluoro, in which 2 or 3 alkoxy or alkyl optionally forms ring with the silicon atom which mutually connects and adjoins.Preferred Process: The manufacture of fluoro olefin is carried out in presence of base. Preferred Definitions:    R=optionally substituted monocyclic, bicyclic system, or tricyclic aryl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of organic peroxide is 0.1-10 parts mass with respect to 100 parts mass cyclic olefin resin.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The boron nitride contained in the filler (B) is surface-treated using an organic silicon-type coupling agent or an organic phosphorus acid-type coupling agent. Preferred Composition: The solvent (C) is an organic polar solvent chosen from N-methyl-2-pyrrolidone, N,N-dimethylformamide, N,N-diethyl formamide, N,N-dimethylacetamide, dimethyl sulfoxide, ( gamma )-butyrolactone, hexamethylphosphoramides, and 1,3-dimethyl-2-imidazolidinone. The amount of filler (B) contained in the composition is preferably 35-50 volume%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The insulating thermally-conductive filler dispersion composition has a viscosity of 0.5-35 Pa.second at 25 degrees C, when measured using a rotational viscometer.
TECHNOLOGY FOCUS - METALLURGY - The conducting layer includes copper or copper alloy or aluminum or aluminum alloy. The adhesive layer includes nickel chrome or nickel vanadium alloy. The metallic layer includes a covering layer made of nickel, nickel silver, nickel chrome, nickel vanadium alloy or tin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The balancing mole amount of reducible redox couple added in negative electrolyte solution is composed of divalent/trivalent vanadium and trivalent/tetravalent cerium. The positive electrolyte solution further comprises low amount of antimony, borax or tellurium, in order to increase oxygen discharge overvoltage. The electrolyte solutions are sulfuric acid solutions and/or methanesulfonic acid solutions. The electrolyte solutions further contain methane-sulfuric acid.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The redox flow battery system further contains anticoagulant agent in positive electrolyte solution and/or magnetic unit adapted to subject streaming positive electrolyte solution to magnetic field. The anticoagulant agent is an electron donor Lewis base compound soluble in acid electrolyte solution, preferably pyridine, bi-pyridine and/or benzene.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Process: The electronic apparatus has boron-containing transparent conductive film and photoelectric conversion film in which an electron absorbs light, excites and generates electron flow.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The molar ratio of alkyl zinc (a), borazine (b) and water (c) is a+3b less than or equal to c. The molar ratio of alkyl zinc and borazine is 10:1-1000:1. Preferred Condition: The chemical vapor deposition is the low pressure deposition method and forms film at 150-250 degrees C and 1 Pa-1 KPa.
TECHNOLOGY FOCUS - METALLURGY - The collector element material is comprised of polysilicon, germanium silicon, gallium nitride or gallium arsenide.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Property: The filtering is performed using filter having diameter of 50-2000 nm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: Fullerene molecule is composed of carbon atoms, which are derivatives of fullerene molecule that is endohedral fullerene. Preferred Composition: Organic solar cell is prepared by using carbon thin wire, where organic solar cell comprises transparent substrate, two electrode layers, a photoelectric converting layer. Photoelectric converting layer is composed of carbon thin wire. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The photovoltaic coating is cadmium telluride or cadmium sulfide.    TECHNOLOGY FOCUS - METALLURGY - The conductive core material is nickel or zinc.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Metal of metal layer is silver. The surface roughness of silver reflection layer is 6 nm or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: Compound containing sulfur atom and/or nitrogen atom is sulfur atom-containing compound chosen from thiourea derivative, thiosulfate, thiocyanate, sulfonate, sulfate, sulfite and their salts. Sulfur atom-containing compound is preferably thiourea derivative. Thiourea derivative is thiourea. Salt of sulfur atom-containing compound is preferably sodium thiosulfate.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The conjugated diene compound of polymer block (a2) is butadiene and/or isoprene. The content of 1,4-bond in the block chain of block (a2) is 50 mol% or less. The block copolymer comprises block copolymer (A1) in which block (a2) contains polymer block (a2-1) having 1,4-bond content of 50 mol% or less in block chain, and block copolymer (A2) in which block (a2) contains polymer block (a2-2) having 1,4-bond content of 70 mol% or more. 70% or more of unsaturated double bond in the block copolymer is hydrogenated. The content of polyvinyl acetal resin is 1-100 parts mass. The polyvinyl acetal resin is polyvinyl butyral. The compatibilizer is polar-group-containing polyolefin, preferably carboxylic-acid-modified polypropylene type resin.    TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Properties: The cloth is a nonwoven fabric having an average fiber diameter of 1-30 mu m and a fabric weight of 5-150 g/m2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic barrier layer contains metallic compound chosen from metal oxide, metal nitride, metal carbide, metal oxynitride and metal oxynitro-carbide. The inorganic barrier layer contains silicon compound.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The coating liquid contains water and 1-3C alkyl alcohol. Preferred Components: The organic layer and the inorganic barrier layer are adjoined. The support component is adjacent to the organic layer. The support component and inorganic barrier layer are adjoined, and the inorganic barrier layer and organic layer are adjoined.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The amount of polymeric compound is 60 %mass or more with respect to the total amount of polymeric compounds in the polymeric composition. The support component contains polycarbonate resin or resin which is formed of polymer or copolymer which contains cyclic olefin in a repeating unit.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The protective mask is made of silicon dioxide. The additional gas is a silicon tetrachloride. The plasma is based on dichlorine and dioxygen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step (b) is carried out at: 0-8 degrees C when formic acid is used as the reducing agent; at 0-2 degrees C when hydrazine is used as the reducing agent; and at -19 degrees C to 0 degrees C when formaldehyde is used as the reducing agent. The step (a1) is carried out in the presence of carbon black particles, metal oxide, metal nitride or metal carbide. The amount of the reducing agent is greater than or equal to the amount required to be proceed with the chemical reduction of all salts or complexes of platinum and of the second metal. The step (a) is carried out in the presence of an additional energy source, preferably UV radiation source to accelerate operation of chemical reduction, where the UV radiation source has a wavelength of 200-300 nm. Preferred Components: The second metal is tin, ruthenium, molybdenum or cobalt. The gas mixture comprises carbon monoxide, carbon dioxide and methane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The silicon powder is supplied on stationary plate (10) containing flat components, area at which the silicon powder is supplied on the stationary plate is covered, a movement board (16) is positioned, and shear load is added by displacing the movement board with respect to the stationary plate. Then, compressive load is applied to the silicon powder. When supplying silicon powder on the stationary plate, setting die in which set hole is provided on stationary plate is set. Then, the set hole is filled with the silicon powder, the setting die is removed and supply region of silicon powder on the stationary plate is ensured.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Components: The hydrogen separation component is formed in cylindrical shape, in order to permeate hydrogen form outer peripheral side to inner peripheral side. The air permeable case consists of mesh or perforated panel. The catalyst container is arranged in axial center direction of the hydrogen separation component. In each air permeable case, the adjacent catalyst containers are engaged using engaging portion. The air permeable case has inner peripheral wall in alignment with outer peripheral surface of the hydrogen separation component. The catalyst container is formed by accommodating modification catalyst in the air permeable case which is externally fitted to the hydrogen separation component. Preferred Property: The length of axial center direction of the air permeable case is smaller than length of axial center direction of the hydrogen separation component. The inner peripheral wall and coaxial outer peripheral wall, and end wall (1) of axial center direction of one end side of outer peripheral wall and inner peripheral wall are continuous in row.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Property: The frequency of irradiated electromagnetic wave is 0.003-3000 GHz.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The standard deviation of diameter of carbon nanotube is 0.5-15 nm and particle size of metal oxide nanoparticles is 1.5 nm or less. Preferred Composition: The content of metal oxide nanoparticles is 1-30000 parts mass per 100 parts mass carbon nanotubes (A). The mixture contains 0.01-5 %mass water (D).
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Property: The frequency of irradiated electromagnetic waves is 0.003-3000 GHz.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The standard deviation of diameter of carbon nanotube is 0.5-15 nm and particle size of metal nanoparticles is 1.5 nm or less. Preferred Composition: The content of metal nanoparticles is 1-30000 parts mass per 100 parts mass carbon nanotubes (A).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal is zinc. The molar ratio of metal oxide particles in the composite particles with respect to the total of polycrystal-type particles of zeolite-like imidazolate structure is 9:1-2:8. The composite component consists of composite particles and metal oxide particles. The metal oxide is zinc oxide. The zeolite-like imidazolate structure is zeolite imidazolate framework-8.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: Imidazole or its derivative(s) is 2-methylimidazole.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The hardenable functional group is acryloyloxy group or methacryloyloxy group.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The curable resin composition further contains non-hardening oligomer (D) having molecular weight of 400-8000 per hydroxyl group, which is not hardened with oligomers (A and C) and monomer (B), and photoinitiator (E1). The content of oligomer (C) is 50-100 %mass with respect to 100 %mass oligomer (C) and non-hardening oligomer (D). The oligomer (A) is a urethane acrylate oligomer obtained by reacting monomer (a1) with isocyanate group of prepolymer obtained by reacting polyol and polyisocyanate. The oligomer (C) is obtained by reacting monomer (c1) with isocyanate group of prepolymer obtained by reacting monool and polyisocyanate group. The monomers (a1 and c1) have acryloyloxy group(s), and reacts with isocyanate group having molecular weight of 125-600. The composition contains 6-80 %mass oligomer (A), 3-70 %mass monomer (B) and 10-70 %mass oligomer (C) with respect to sum total of 100 %mass oligomers (A and C) and monomer (B).
TECHNOLOGY FOCUS - POLYMERS - The resin is selected from a group consisting of epoxy resin, phenol resin and silicone resin.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The surface-treating agent is chosen from methacryl silane coupling agent, vinyl silane-type coupling agent and phenyl silane-type coupling agent. The content of fine particles is 60-75 vol.% based on amount of hardened layer. Preferred Component: The hardened layer is a hardening application layer formed by coating and curing solution of the curable composition containing 30 %mass or more polyfunctional acrylate monomer (A) and 0.1-10 %mass photoinitiator (B) with respect to total composition of base film.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The base film contains one or more resin chosen from polyethylene terephthalate resin, polyetherimide resin, polyphenylene sulfide resin, polyethersulfone resin, polyethylene naphthalate resin and transparent polyimide resin. Preferred Property: The thermal contraction rate in at least one direction of transparent laminated film at the time of heating at 200 degrees C for 10 minutes is 70% or less of the thermal contraction rate of the base film when heating under same conditions along same condition.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The total light transmittance in 400 nm of the polyimide resin layer is 70% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: When molding, the vapor deposition material has volume density of 0.9-1.5 g/cm3. Preferred Composition: The powder of silicon dioxide includes 20% or more crystal structure.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The particles are metal or metal oxide, and are contained in the ratio of 20-70 vol.% of the whole resin sheet.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin is epoxy resin or (meth)acrylic resin. The acrylic resin is obtained by reacting compound chosen from (meth)acrylate-containing compound of formulae (I), (II) and H2C=CH-C(=O)-O-(CH2CH2O)n-C(=O)-CH=CH2 (III).R1-R4=H or methyl;a=1 or 2;b,p=0 or 1;X=H, methyl, -CH2OH, NH2, H2C-O-C(=O)-C(=CH2)-CH3 or H2C-O-C(=O)-CH=CH2;andn=1-20.Preferred Property: The absolute value of difference of refractive index between refractive index of the particles and refractive index of the resin, is 0.005-0.1. The resin sheet has average thickness of 50-2000 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The curable resin composition further comprises spherical inorganic fillers.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polymerization initiator is cationic polymerization initiator.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymeric group is chosen from epoxy group, oxetanyl group and vinyl ether group.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The monomer (a3) contains (meth)acrylate which has alicyclic group. The (meth)acrylate having alicyclic group which is cyclonhexyl (meth)acrylate or/and isobornyl (meth)acrylate. The content of component (a1), component (a2) and component (a3) is 20-98 wt.%, 2-80 wt.% and 0-70 wt.%, respectively. The content of component (B) is 10-90 wt.%. Preferred Process: The component (B) is evaporated by heating and/or ventilating. The heating process is carried out at 30-120 degrees C.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The plastic in the plastic film is chosen from polyolefin, polyester, cycloolefin polymer and ethylene-vinyl acetate copolymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The film further comprises layer (C) comprising indium, gallium, and selenium. During manufacture of copper-indium-gallium-selenide film, selenium vapor or hydrogen selenide is supplied on surface of laminated material.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The adhesive bond layer has storage elastic modulus at 60 degree C of 1x 107-1x 109 Pa. The water vapor permeation rate of gas-barrier film is 0.5 g/m2/day or less at 40 degree C under relative humidity of 90%. Preferred Composition: The adhesive composition comprises a polymer unsaturated group of energy ray hardenability as a main component or a mixture of polymer which does not have energy ray hardenability and energy ray-curable compound. The polymer which does not have energy ray hardenability is (meth)acrylate-type copolymer. The polymer which has unsaturated group is (meth)acrylate copolymer which has an unsaturated group in a side chain. The (meth)acrylate-type copolymer is carboxyl group-containing (meth)acrylate-type copolymer. Preferred Layer: The gas-barrier film laminate has gas-barrier film having gas-barrier layers (b1, b2) on base material (a1, a2) containing synthetic resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal of trifluoromethanesulfonic acid metal salt is chosen from scandium, yttrium, and lanthanoid.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: Radically-polymerizable vinylic monomer is (meth)acrylic-type monomer. The mass ratio of glycidyl ester and trifluoromethanesulfonic acid metal salt is 2-9. The glycidyl ester is glycidyl methacrylate. The trifluoromethanesulfonic acid metal salt is trifluoromethanesulfonic acid ytterbium hydrate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: Radically-polymerizable polyether is of formula (II).m1=1-7000;m2=0-7000;n=1-14000;R1=methyl or H;R2,R3=H or 1-20C hydrocarbyl;andm1/m1+m2+n=0.0005-0.20, preferably 0.001-0.10.Preferred Properties: The film has thickness of 0.1-3000 mu m, breaking elongation of 500 mm/minute, and tensile velocity of 10% or more. The film has haze of 5% or less when thickness of film is 0.5 mm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first composition is a composition consisting of gallium phosphide, gallium arsenide phosphide (GaAsyP1-y), indium gallium phosphide (InxGa1-xP), gallium phosphide nitride (GaPyN1-y), aluminum gallium phosphide (AlxGa1-xP), indium gallium phosphide nitride (InxGa1-xPyN1-y), aluminum gallium phosphide nitride (AlxGa1-xPyN1-y), gallium phosphide arsenide nitride (GaP1-xAsyN1-x-y), and their alloys.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The composition of the oxide of vanadium is has an empirical formula VxOy, where (x/(x+y)) is 0.13-0.6, preferably has an empirical formula of vanadium pentoxide (V2O5). The thickness of the barrier layer is at least 1 nm to 10 nm. The bifacial solar cell comprises: a passivation layer, where the passivation layer is coupled to the first side of the n-type semiconductor layer, and is disposed between the first metal conductivity lines.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The reducing agent (B) is hydrazine. The salt mixture (A) comprises copper, indium, gallium and selenium, as metal nanoparticles.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: Complexing agent (C) is further introduced into the vertical laminar flow reactor. Preferred Composition: The complexing agent (C) is organic acid containing citric acid and/or ascorbic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The high-pure polycrystalline silicon of opaque quartz or transparent quartz of semiconductor grade is charged, and rapid dissolution of silicon is carried out at 1420 degrees C in argon or helium atmosphere. A tube of same material as crucible with internal diameter of 10-30 mu m is inserted into the melt, and the melt is drawn under vacuum from the front tip. During manufacture process, the inside of crucible is pressurized to 0-1000 mmAq, in order reduce the molding time of silicon melt solution.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): 4-(pentacene 6-yl) benzaldehyde and 1,3-diamino-1,3-dimethyl urea are reacted to obtain 2,4-dimethyl-6-(4-(pentacene-6-yl)phenyl)-1,2,4,5- tetrazine-3-one. 2,4-Dimethyl-6-(4-(pentacene-6-yl)phenyl)-1,2,4,5- tetrazine-3-one is processed by cerite-supported silver carbonate, to obtain 2,4-dimethyl-3-oxo-6-(4-(pentacen-6-yl)phenyl)-1,2,3,4-tetrahydro-1,2,4,5-tetrazin-1-yl. Preferred Composition: The pentacene radical derivative (I) is an organic semiconductor material. Preferred Process: 2,3-bis(hydroxyamino)-2,3-dimethylbutane-sulfate and 4-(pentacene-6-yl) benzaldehyde are reacted in presence of an alkali, to obtain 4,4,5,5-tetramethyl-2-(4-(pentacene-6-yl)phenyl)imidazolidine-1,3-diol. 4,4,5,5-Tetramethyl-2-(4-(pentacene-6-yl)phenyl)imidazolidine-1,3-diol is processed by an oxidizing agent to obtain 4,4,5,5-tetramethyl-2-(4-pentacene-6-yl)phenyl imidazolidine-1,3-dioxyl. Preferred Definitions:    X=phenylene group of formula (c).    SPECIFIC COMPOUNDS - 2 pentacene radical derivatives i.e 2,4-dimethyl-3-oxo-6-(4-(pentacen-6-yl)phenyl)-1,2,3,4-tetrahydro-1,2,4,5-tetrazin-1-yl and 4,4,5,5-tetramethyl-2-(4-pentacene-6-yl)phenyl imdazolidine-1,3-dioxyl of formula (Ia) are specifically claimed.    EXAMPLE - 50 mL Dichloromethane solution and 2,4-dimethyl-6-(4-(pentacene-6-yl) phenyl)-1,2,4,5-tetrazine-3-one and 0.30 g cerite-supported silver carbonate were added, stirred at 52 degrees C for 3 hours in argon atmosphere and cooled to room temperature. Hexane was added to the resultant solution. The resultant solution was concentrated under reduced pressure, and crystals of 2,4-dimethyl-3-oxo-6-(4-(pentacen-6-yl)phenyl)-1,2,3,4-tetrahydro-1,2,4,5-tetrazin-1-yl was obtained with yield of 33%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The weight ratio of organic solvent and water is 100:0. The electroconductive composition further contains organic solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The electroconductive composition further contains soluble resin. The component (a) has repeating unit chosen from polypyrrole, polythiophene, polyacetylene, polyphenylene, polyphenylene vinylene, polyaniline, polyacene, polythiophene vinylene and their copolymers, and is poly(3,4-ethylene dioxythiophene) or polypyrrole. The component (b) is mixture of sulfonic acid group, phosphoric acid group and/or carboxyl group, and contains polystyrene sulfonate, polyvinyl sulfonic acid, polyacrylic acid alkylene sulfonic acid, poly(2-acrylamide-2-methyl-1-propanesulfonic acid) and/or their copolymerization structure.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The surface hardness of anchor layers (A and B) and barrier layer satisfy: (SHa) is less than (SHb) is less than (SHc), (SHa) less than 0.5x (SHb), and (SHb) less than 0.5x (SHc), where (SHa), (SHb) and (SHc) are surface hardness of anchor layers (A and B) and barrier layer, respectively. The thickness of anchor layer (B) is smaller than the thickness of anchor layer (A). Preferred Components: The resin substrate is stretched triacetyl cellulose film. The barrier layer consists of a layer formed by vacuum coating method, and layer containing polysilazane formed by modification process.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The amount of monomer and photoinitiator contained in the photocurable elastomer composition is 40-80 wt.% and 0.1-10 %mass, respectively, with respect to the total amount of primary polymer, secondary polymer, and monomer. The primary polymer has the (meth)acryloyl group in both terminals, and the secondary polymer has the (meth)acryloyl group in mono-terminals. The photocurable functional group of the monomer is (meth)acryloyl group. The monomer is isobornyl acrylate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The mass ratio of primary polymer with respect to secondary polymer is 20:80-80:20. The primary polymer and secondary polymer are butadiene skeletons, in which hydrogenation of the main structure is carried out.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Composition: The electronic apparatus has photoelectric conversion film (3) provided on the boron-containing transparent conductive film. The photoelectric conversion film has an electron which absorbs light, excites and produces electron flow.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The borazine compound is of formula (I). The molar ratio of the alkyl zinc compound and borazine compound is 10:1-1000:1.R1-R3=1-6C alkyl.Preferred Process: The chemical vapor deposition method is a low pressure chemical vapor deposition method which is carried out at 150-250 degrees C under 1-1000 Pa.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The density of the gas barrier layer is larger than the density of the base layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The multiple layers comprises 2, 3, 4 or 5 layers. The base material comprises glass, silica/ silicon or transmission electron microscopy grid. The conductor has a sheet resistance of 8.8 Omega /square and an optical transmittance of greater than or equal to 84% in the visible spectrum. Preferred Method: The temperature in vacuum is increased by 10 degrees C/minute. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation given. SPECIFIC COMPOUNDS - 81 heterocyclic compounds are disclosed e.g. 5-methyl-8-thia-16-azatetracyclo(7.7.0.02,7.010,15)hexadeca-1(9),2,4,6,10(15),11,13-heptaene of formula (A), 5-methyl-8-thia-16-azatetracyclo(7.7.0.02,7.010,15)hexadeca-1(9),2(7),3,5,10,12,14-heptaene, 5-methyl-8-oxa-16-azatetracyclo(7.7.0.02,7.010,15)hexadeca-1(9),2(7),3,5,10,12,14-heptaene, 5-octyl-8-oxa-16-azatetracyclo(7.7.0.02,7.010,15)hexadeca-1(9),2(7),3,5,10,12,14-heptaene and 5-methyl-8-thia-16-azatetracyclo(7.7.0.02,7.010,15)hexadeca-1(9),2(7),3,5,10,12,14-heptaene.    EXAMPLE - 0.8 g 6-methyl-2-(2-nitrophenyl)-1-benzothiophene and 6.1 g triphenylphosphine were stirred at 180 degrees C under nitrogen atmosphere for 4 hours and silica gel column-chromatography purification process was performed for resultant reactant mixture, to obtain 0.54 g 5-methyl-8-thia-16-azatetracyclo(7.7.0.02.7.010.15)hexadeca-1(9),2,4,6,10(15),11,13-heptaene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The organic-semiconductor thin film is produced by solution coating method.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Disclosed): Ring formation reaction of structure having thiazole or oxazole ring on both sides of center ring naphthalene is performed in the presence of solvent, to obtain naphthalene derivatives (I) or (II).    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The coating solution further contains polymer binder. SPECIFIC COMPOUNDS - 81 Naphthalene derivatives e.g. 5,13-bis(4-(octyloxy)phenyl)-4,12-dioxa-6,14-diazatetracyclo(7.7.0.03,7.011,15)hexadeca-1,3(7),5,8,10,13,15-heptaene of formula (Ia), 5-(2-ethylhexyl)-13-phenyl-4,12-dithia-6,14-diazatetracyclo(7.7.0.03,7.011,15)hexadeca-1,3(7),5,8,10,13,15-heptaene, 13-(4-(2-ethylhexyl)phenyl)-5-methyl-4,12-dithia-6,14-diazatetracyclo(7.7.0.03,7.011,15)hexadeca-1,3(7),5,8,10,13,15-heptaene, 5-(2-ethylhexyl)-13-phenyl-4,12-dioxa-6,14-diazatetracyclo(7.7.0.03,7.011,15)hexadeca-1,3(7),5,8,10,13,15-heptaene and 13-(4-(2-ethylhexyl)phenyl)-5-methyl-4,12-dioxa-6,14-diazatetracyclo(7.7.0.03,7.011,15)hexadeca-1,3(7),5,8,10,13,15-heptaene are disclosed.    EXAMPLE - 50 ml Dimethylacetamide was added to 2.3 g cesium carbonate, and stirred at 120 degrees C for 10 hours. The reaction liquid was added in 1-N hydrochloric acid water, and solid was filtered. The naphthalene derivatives were obtained by recrystallizing filter cake 3 times.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Properties: The transistor has extracted mobility of 0.015-0.06 cm2/Vs, preferably 0.03-0.05 cm2/Vs, and threshold voltage of 4-11 V, preferably 6-9 V.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The plate (p) comprises metal. The substrate comprises silicon or doped silicon. The substrate contains source and drain contacts.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The temperature gradient is established on the substrate by establishing a temperature gradient on a plate (p) such that the plate has a lower-temperature end and a higher-temperature end, and placing the substrate on the plate such that a portion (P) of the substrate is on the low-temperature end of the plate and a portion (Q) of the substrate is on the high-temperature end of the plate for a set time to produce a heated substrate. The temperature gradient is established on the plate by heating the plate to the temperature (A), and applying increased heat to the end (a) of the plate to create the higher temperature end. The temperature (A) is 22-30 degrees C, preferably 26 degrees C. The temperature (B) is greater than the temperature (A) by 2-28 degrees C. The temperature (B) is 28 degrees C. The solution is supplied to the substrate by drop casting. Preferred Composition: The solution further comprises toluene and/or high boiling point solvent. The concentration of 6,13-bis(triisopropylsilylethynyl)pentacene is 5 mg/mL. The content of toluene and high boiling-point solvent is 75-85 vol.% and 15-25 vol.%. The high boiling-point solvent is dimethylformamide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Ratio Y/X of mass Y of sintered compact with respect to mass X of germanium compound is 0.02-0.2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The faces are capped with surfactant. The surfactant is tetradecyl trimethyl ammonium bromide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The cyclohexasilane has a dimer content of 2 mass% or less. In the cyclohexasilane, a content of metal element is 0.01-100 ppb. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I), comprises reacting a free ligand (L or L1) with iridium alkoxide compounds of formula (Ir(OR1)n) (IV), iridium ketoketonate compounds of formula (V), iridium halide compounds of formula (Ir(Hal)n) (VI) or dimeric iridium complexes of formula (VII) or (VIII) or with iridium compounds carrying alkoxide-, halide- and/or hydroxy- and ketoketonate groups. Preferred Definitions:    R = 119 hydrocarbyl moieties e.g. -CH2-C(CH3)2, -CH2-C(CH3)2-CH2-CH3, -CH2-C(CH2-CH3)3, 2-cyclohexyl-2-methylpropyl, -CH(CH3)2, -CH(CH2-CH3)-CH3, -CH(CH2-CH3)2, -CH(CH2-CH3)-(CH2)2-CH3, -CH(CH2-CH3)-CH(CH3)-CH2-CH3 and -CH(CH(CH3)2)-CH(CH3)2.    SPECIFIC COMPOUNDS - Approximately 113 compounds (I) are disclosed e.g. iridium complexes of formula (Ia)-(Ie).    EXAMPLE - 10 mmol Sodium-bis-acetylacetonato-dichloro-iridate(III) and 22 mmol isoquino(2,1-a)quinazolin-6-one were heated under heating. Then the obtained reaction mixture was held at a final temperature for further 20 hours. Then the mixture was worked up to obtain (Ia).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): bromine-containing phenyl carbazole compound of formula (II) is reacted with amine compound of formula: Ar3-NH-Ar2 in presence of tris(dibenzylideneacetone)dipalladium/tri-tert-butylphosphine and sodium tert-butoxide in toluene solution, to obtain phenylcarbazole compound of formula (III). Preferred Composition: The organic electroluminescent element comprises primary electrode (120), organic compound layer and secondary electrode (180), in order. The organic compound layer is hole injection layer (130), hole transporting layer (140), primary light emitting layer and/or secondary light emitting layer. SPECIFIC COMPOUNDS - 308 phenylcarbazole compounds are specifically claimed e.g. 9,9-dimethyl-N-(naphthalen-2-yl)-N-(2-(3-(9-(8-oxatricyclo(7.4.0.02.7)trideca-1(9),2(7),3,5,10,12-hexaen-5-yl)-9H-carbazol-3-yl)phenyl)phenyl)-9H-fluoren-3-amine of formula (A), 9,9-dimethyl-N-(naphthalen-1-yl)-N-(4-(3-(9-(4-phenylphenyl)-9H-carbazol-3-yl)phenyl)phenyl)-9H-fluoren-2-amine, 9,9-dimethyl-N-phenyl-N-(4-(3-(9-phenyl-9H-carbazol-3-yl)phenyl)phenyl)-9H-fluoren-2-amine, 9,9-dimethyl-N-phenyl-N-(4-(3-(9-(4-phenylphenyl)-9H-carbazol-3-yl)phenyl)phenyl)-9H-fluoren-2-amine and 9,9-dimethyl-N-(4-(2,3,4,5,6-pentahydrogeniophenyl)phenyl)-N-(4-(3-(9-phenyl-9H-carbazol-3-yl)phenyl)phenyl)-9H-fluoren-2-amine.    EXAMPLE - 8.44 g 3-(3-(2-bromophenyl)phenyl)-9-(8-oxatricyclo(7.4.0.02,7)trideca-1(9),2(7),3,5,10,12-hexaen-5-yl)-9H-carbazole was reacted with 4.18 g 9,9-dimethyl-N-(naphthalen-2-yl)-9H-fluoren-3-amine in presence of 0.34 g tris(dibenzylideneacetone)dipalladium, 0.5 ml 50% tri-tert-butylphosphine and 3.59 g sodium tert-butoxide in toluene solution, to obtain 9,9-dimethyl-N-(naphthalen-2-yl)-N-(2-(3-(9-(8-oxatricyclo(7.4.0.02,7)trideca-1(9),2(7),3,5,10,12-hexaen-5-yl)-9H-carbazol-3-yl)phenyl)phenyl)-9H-fluoren-3-amine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal particle dispersion further comprises water. Preferred Components: In the metal particle dispersion: the average diameter of the metal nanowires is 16.3-23.8 nm; the cross-section of each of the metal nanowire has round corners; and the metal nanowires contain silver. EXAMPLE - 0.5 g Hexadecyltrimethylammonium bromide powder was dissolved in 27.5 ml of pure water to obtain an additive liquid H. 0.5 g Glucose powder was dissolved in 140 ml of pure water to obtain an additive liquid G. 0.51 g Silver nitrate powder was dissolved in 50 ml of pure water, and 1 N ammonia water was added until the mixture became transparent, and then pure water was added such that the total volume reached 100 ml. Then 410 ml pure water, 82.5 ml of the obtained additive liquid H, and 206 ml of the obtained additive liquid G were added, using a funnel, into a flask at 20 degrees C while stirring, to obtain the reaction mixture. Into the react mixture, 206 ml of the obtained additive liquid A was added at a flow rate of 2 ml/minute and at a stirrer rotational speed of 800 rpm. Ten minutes after, 82.5 ml of the additive liquid H was added, the temperature of the reaction mixture was increased to an internal temperature of 75 degrees C at an increasing rate of 3 degrees C/minute and the stirrer rotational speed was decreased to 200 rpm and the mixture was heated for 5 hours. After the obtained water dispersion was cooled, an ultrafiltration apparatus was assembled by connecting an ultrafiltration module, magnetic pump, and a stainless cup by means of silicon tubes. The silver nanowire dispersion (aqueous solution) was poured into the stainless cup, and subjected to ultrafiltration.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The primary protective region comprises organic solvent containing mineral oil and surfactant. The etching solution comprises methanol solution containing bromine additive.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The mold comprises agarose.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The water-vapor-permeation change rate (( Delta )WVTR) after processing the gas-barrier film at 40 degrees C under 90% relative humidity for 50 hours is 50% or less, and the content of magnesium oxide is 5-25 %mass or 70-90 %mass with respect to 100 %mass aluminum oxide and magnesium oxide.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The thickness of plastic film is 50 mu m or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The sputtering target has theoretical density ratio of 95% or more, flexural strength of 200 MPa or more and oxygen content of 800 weight ppm or less. A metal phase containing the metallic elements has average particle diameter of 500 mu m or less. The method for manufacturing sputtering target involves production of raw material powder having average particle diameter of 1-500 mu m. Preferred Composition: The sputtering target further contains 0.01-10 atomic% elements chosen from lithium, sodium and/or potassium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The semiconductor film is formed of gallium arsenide material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The total content of silicon atom and oxygen atom is 10-90 atomic% or less, with respect to atoms excluding hydrogen contained in joining film. The abundance ratio of silicon atom and oxygen atom in the joining film is 3:7 or more and 7:3 or less. The crystallinity degree of silicon frame in the conjugate is 45% or less. The joining film contains silicon-hydrogen bond. Preferred Properties: The peak intensity which belongs to siloxane bond is set to 1 and the peak intensity belongs to silicon-hydrogen bond is set to 0.001-0.2, when the joining film containing silicon-hydrogen bond is subjected to infrared-light absorption measurement. The average thickness of joining film is 1-1000 nm.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Process: The photocatalyst glass is obtained by heat-processing photocatalyst glass precursor obtained by heat-melting at 600-1200 degrees C and cooling, at high temperature of 1000-1400 degrees C.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkali metal oxide is sodium oxide. The alkaline-earth metal oxide is calcium oxide. The transition metal oxide is iron(III) oxide.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The glass transition temperature of acrylic polyol (A) is -20 degrees C to 30 degrees C. Preferred Components: The polyurethane adhesive further contains at least 1 additive chosen from silane coupling agent (C), and phosphoric acid or phosphate compound (D). The outer layer-side resin film layer is polyamide film or polyester film, and heat-sealing layer is polyolefin-type film.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The alloy further comprises 0.005-0.3 wt.% aluminum and 0.0005-0.03 wt.% titanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composite electrolyte further consists of ionic liquid solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The telechelic precursor polymers have azide functional groups. The precursor is blended from polymeric materials having distinct molecular weights.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The modified crystalline cyclic olefin ring-opened polymer hydrogenated product is obtained by graft modifying the crystalline cyclic olefin ring-opened polymer hydrogenated product by unsaturated carboxylic acid or silicone derivative. Preferred Property: The crystalline cyclic olefin ring-opened polymer hydrogenated product has a syndiotactic stereoregularity.
TECHNOLOGY FOCUS - POLYMERS - The boron nitride thin film is polycrystalline.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The substrate material comprises copper oxide. The nanostructures are formed from pure tin, zinc, lead, antimony, bismuth, silver, or gold, binary mixture of tin-zinc, tin-gold, tin-antimony, tin-lead, zinc-silver, antimony-silver, gold-antimony, antimony-zinc, zinc-bismuth, or zinc-gold, ternary mixture of tin-zinc-antimony, tin-zinc-bismuth, tin-zinc-silver, tin-antimony-bismuth, antimony-zinc-silver, antimony-zinc-gold, or antimony-lead-bismuth, quaternary mixture of antimony-zinc-lead-bismuth, or intermetallic compounds of lead-copper, tin-cobalt, tin-iron, tin-nickel, tin-manganese, tin-indium, antimony-indium, antimony-cobalt, antimony-nickel, antimony-copper, zinc-cobalt, zinc-copper or zinc-nickel.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Component: The fuel cell is solid oxide fuel cell, phosphoric acid fuel cell, molten carbonate fuel cell, or protein exchange membrane fuel cell.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The storage metal material is iron, manganese, cobalt, chromium, aluminum, zirconium, selenium, yttrium, lanthanum, titanium, hafnium, cerium, nickel, copper, niobium, tantalum, vanadium, molybdenum, palladium, tungsten, and/or their alloys or oxides, halides, sulfates, sulfites, and carbonates, preferably iron or iron oxides.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catholyte comprises vanadium dioxide chloride 2-hydrate. The cations and protons include hydrogen ions, vanadium ions and/or vanadium oxide ions.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of compound (C) is 0.05-5 parts mass with respect to 100 parts mass epoxy resin and polysiloxane compound. The content of compound (D) having hindered amine group is 0.05-5 parts mass with respect to 100 parts mass epoxy resin and polysiloxane compound. The compound which has hindered amine group in a molecule has hindered amine group by 2 portions in a molecule.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The epoxy resin (A) contains a cycloaliphatic epoxy resin.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of each of organoaluminum compound (C) and compound (D) with respect to 100 parts mass epoxy resin (A) and organosilicon compound (B), is 0.05-5 mass parts, respectively.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The epoxy resin (A) contains 5 parts mass or more cycloaliphatic with respect to 100 parts mass epoxy resin.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aromatic tetracarboxylic dianhydride is chosen from pyromellitic dianhydride, biphenyl tetracarboxylic dianhydride, and benzophenone tetracarboxylic dianhydride. The aromatic diamine compound is chosen from phenylenediamine and diaminodiphenyl ether. The aliphatic cyclic amine compound is a compound chosen from morpholine, piperidine, piperazine, pyrrolidine, and pyrazolidine, preferably morpholine, or tertiary amine compound. The aliphatic cyclic amine compound contains 50-500 mol% carboxyl groups with respect to resin.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin has amino group at terminal. The resin is obtained from aromatic tetracarboxylic dianhydride and an aromatic diamine compound. Preferred Property: The resin has number average molecular weight of 1000-100000.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: At least 1 set of the base material (X), the layer (Y) and the layer (Z) have the structure laminated in order of the base material (X)/layer (Y)/layer (Z). The layer (Y) is a layer (YA) including a reaction product (R), vapor deposition layer (YB) of aluminum, or a vapor deposition layer (YC) of aluminum oxide. Preferred Process: The reaction product (R) is formed by reacting metal oxide (A) containing aluminum, and phosphorus compound (B). Preferred Property: The maximum absorption wave number (n1) of the layer (YA) is 1080-1130 cm-1 at a wavelength of 800-1400 cm-1 based on infrared absorption spectrum.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer (E) is a homopolymer or copolymer of (meth)acrylic acid ester having a phosphoric acid group at the terminal of a side chain, preferably homopolymer of phosphooxyethyl (meth)acrylate. The polymer (E) has a dihydroxy group-containing repeating unit of formula (I). The base material (X) contains layer comprising thermoplastic resin film layer, paper layer and inorganic vapor deposition layer.n=1 or more.Preferred Properties: The protection sheet has oxygen permeability of 2 ml/(m2.day.atmosphere) or less at 20 degrees C under relative humidity of 85%. The protection sheet has flexibility. The oxygen permeability of protection sheet measured at 20 degrees C under relative humidity of 85% is 4 ml/(m2.day.atmosphere) or less after maintaining the protection sheet in the 5% stretched state to one direction at 23 degrees C for 5 minutes under relative humidity of 50%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The deposited material is exposed to the nanoscale wire as a gas, prior to deposition. The material is deposited on (111) facet and optionally deposited on (011) facet and (113) facet. The method further involves depositing a second material on a portion of the deposited material (M1); removing portion of the deposited material; etching portion of the deposited material (preferably germanium) to produce a vacant region; exposing the deposited material to an etchant or a peroxide (preferably peroxide); and delivering a species in the vacant region. The method involves depositing germanium on a faceted silicon nanoscale wire, where the germanium is deposited preferably on a first facet relative to a second facet of the nanoscale wire. The nanoscale wire comprises a core and a shell at least partially or completely surrounding the core prior to deposition. Preferred Components: The nanoscale wire is a semiconductor nanoscale wire (preferably silicon wire). The deposited material is semiconductive and comprises silicon or germanium. The deposited material is identical to material forming the nanoscale wire. The faceted nanoscale wire comprises (011) facet, (111) facet or (113) facet. The nanoscale wire is crystalline. The deposited material is crystalline. The gas is PH3 or argon. The first facet is a (011) facet and the second facet is a (113) facet. The nanoscale wire has a diameter less than 1 mu m and a variation in average diameter less than 20%. The compositions of the core and the shell are identical. The species is a gas or a nanoparticle. The gas passivates the second facet by adsorbing to the second facet. The gas enhances deposition on the first facet relative to the second facet.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The average particle diameter of microparticles is 1-200 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The application layer contains polymer and crosslinking agent.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Method: The method further comprises planarizing and preheating the glass substrate before carrying out ion exchange process and then performing annealing process and washing and drying steps, and cutting the dried glass with predetermined size. The ion exchange process is carried out at 400-500 degrees C.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The potassium solution is potassium nitrate, potassium hydrogen phosphate, potassium chloride or potassium phosphate. The sodium solution is sodium nitrate, disodium hydrogen phosphate, sodium chloride or disodium phosphate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The oxide and sulfide buffer layer is prepared by atomic layer deposition comprising growing buffer layer with the thickness of 20-25 nm having high band gap energy for spike-shaped conduction band structure near the junction of a copper-indium-gallium-selenium light absorbing layer by controlling the composition during the preparation process, and preparing buffer layer of 20-25 nm thickness having relatively low band gap energy to finally prepare double layered buffer layer with the thickness of 40-50 nm. Preferred Components: The band gap energy of the oxide and sulfide buffer layer is 3.2-4 eV. The oxide and sulfide comprise zinc oxide, zinc sulfide, indium oxide, indium sulfide, magnesium oxide and/or tin oxide. The deposition temperature during deposition of the double layered buffer layer by atomic layer deposition is less than or equal to 120 degrees C. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic barrier layer is made of a metal, metal oxide, metal nitride, metal carbide, and metal boride, and has a thickness of 10-5000 Angstrom . The metal includes silicon, aluminum, selenium, zinc, antimony, indium, germanium, tin, bismuth, transition metals and/or lanthanide metals.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The composition further comprises an initiator, preferably a photopolymerization initiator. Preferred Components: The monomer is: 3-(tris(trimethylsiloxy)silyl)propyl methacrylate and 3-(meth) acrylate hydroxypropyl bis (trimethylsiloxy) methylsilane; optionally substituted 1-30C vinyl, acrylate or methacrylate monomer; or 1-20C alkyl methacrylate, 2-20C diol-dimethacrylate, 3-20C triol tri(meth)acrylate and 4-20C tetra(meth)acrylate. The amount of photocurable monomer and silicone is 1-99 pts. wt. The amount of initiator is 0.1-20 pts. wt. The organic barrier layer has: a thickness (100-1000000 Angstrom ) with respect to the direction of film thickness at 37.8 degrees C; 100% of relative humidity; and water vapor transmission rate. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The surface layer is made of resin composition comprising 1-20 wt.% nanoclay. The cavity-containing layer comprises polyester resins, immiscible and amorphous cyclic olefin copolymer resin and inorganic particles including barium sulfate particles or titanium dioxide particles. The cavity-containing layer is made of resin composition comprising 1.1- 30.8 wt.% inorganic particles and 3.5-35 wt.% amorphous cyclic olefin copolymer resin. The amorphous cyclic olefin copolymer resin has glass transition temperature of 120-200 degrees C, and particle size of 0.5-5 mu m. The thickness of the cavity-containing layer is less than 100% and greater than or equal to 80% of the film total thickness. The total thickness of the film is 50-500 mu m. EXAMPLE - 10-20 pts. wt. A layer (comprised of 99 wt.% polyester resin and 1 wt.% nanoclay) and 80 pts. wt. B layer (comprised of 73 wt.% polyester resin, 9 wt.% ethylene and norbornene of the copolymer resin, 18 wt.% barium sulfate particles with particle size 1 mu m) were heated, extruded to obtain a molded sheet of the ABA-type 3 layered structure with thickness ratio of 1:8:1. The molded sheet was cooled and solidified at surface temperature of 20 degrees C, heated, stretched to 3.7 times in longitudinal direction, tentered and cooled at room temperature to obtain the film.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The thickness of thin glass sheet is 10-150 mu m. The exposed portion of the thin glass sheet is 1 mm or more. The width of the protective film is 50% or more with respect to the width of the thin glass sheet. The protective film has an adhesion layer (22). The adhesive force of the adhesion layer is 0.005-2 N/25mm, with respect to the thin glass sheet. The thickness of protective film is 3-250 mu m. Preferred Process: The roll side surface of the thin glass laminate is protected by the protective material. The protective material further protects the width direction edge portion of a roll surface.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The ligand is a derivative of compounds chosen from glycolic acid, glyceric acid, and lactic acid. The primary ligand has linear 6C or more atoms. Preferred Definitions:    A=H or substituent containing hydroxy.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): A compound of formula (II) is subjected polymerization reaction with Grignard reagent in presence of nickel catalyst, to obtain electron donor compound (I). Preferred Properties: The electron donor compound has number average molecular weight of 10-20 kg/mol and polydispersity index of 1.7-2. Preferred Composition: The nickel catalyst is chosen from (1,3-bis(diphenylphosphino)propane) dichloronickel (II), (1,2-bis(diphenylphosphino)ethane) dichloronickel (II), and (1,1'-bis(diphenylphosphino)ferrocene) dichloronickel (II). SPECIFIC COMPOUNDS - 2 Electron donor compounds are specifically claimed i.e. phenyl-C61-butyric acid methyl ester of formula (III) and 1',1",4',4"-tetrahydro-di(1,4)methanonaphthaleno(1,2:2',3',56,60:2",3")(5,6)fullerene-C60.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): 3,3'-Disulfonated-4,4'-dichlorodiphenyl sulfone is dissolved in tetrahydrofuran under nitrogen atmosphere, adding organic metal lithium compound, zinc chloride and/or organic zinc compound, and copper catalyst, and reacted at -30 degrees C to -20 degrees C, adding acyl chloride, heating to room temperature, to form crude wholly-aromatic side-chain-type dichloromonomer. The crude product is washed with water, alkali and ethanol, and re-crystallized, to obtain wholly-aromatic side-chain-type dichloromonomer. The wholly-aromatic side-chain-type dichloromonomer is sulfonated using sulfonating agent which is concentrated sulfuric acid, chlorosulfonic acid or fuming sulfuric acid, the reaction mixture is poured into ice water, product is separated using sodium chloride, filtered, and neutralized. Preferred Composition:    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic lithium is n-butyl lithium, t-butyl lithium. The copper catalyst is cuprous iodide or cuprous oxide. The acyl chloride is benzoyl chloride, 4-benzoyl chloride or 4-phenoxy benzoyl chloride.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The method includes carrying out Suzuki reaction using benzothiadiazole boron acid ester and thiophenebenzothiadiazole derivative.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of the catalyst (C1) involves a) preparing M2/C dispersion: adding deionized water or 1-3C alcohol or acetone into M2/C catalyst, and stirring to obtain M2/C dispersion; b) preparing M1 impregnated salt solution: taking water solution having pH value of 3-7, than adding into it Pb(CH3COO)2, Pb(CH3COO)4, Pb(NO3)2 or PbSO4 or mixture of at least two of its, or adding SnCl4 and/or SnSO4, or adding BiCl3 and/or Bi(NO3)3, or adding 6Co.Cl4Ru2 and/or RuCl3, stirring and mixing uniformly, to obtain solution of lead or bismuth or tin or ruthenium ions; c) preparation of M1+M2/C catalyst: mixing the M2/C dispersion obtained in step a) and solution obtained in step b), filtering, washing, and then drying to obtain M1+M2/C catalyst.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of concentrated sulfuric acid is 50-100 %mass. The concentration of sulfur trioxide in fuming sulfuric acid is 0-50 %mass. The brominating agent includes bromine, metal bromide and bromine-containing organic material. The metal active element includes copper, rhodium and/or palladium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent includes dimethyl sulfoxide, N,N-dimethyl acetamide, N-methyl pyrrolidone, dimethyl formamide, triethyl phosphate, acetonitrile, acetone, ethyl acetate, chloroform, dichloromethane, methyl ethyl ketone, tetrahydrofuran and/or methanol.    TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): The fluorine sulfonic acid side chain-containing polyether ether ketone resin (I) is prepared by using concentrated sulfuric acid or fuming sulfuric acid as solvent, modifying polyether ether ketone resin on bromide using brominating agent, obtaining brominated polyether ether ketone resin, dissolving brominated polyether ether ketone resin in organic solvent solution in presence of metal active element, and modifying fluorine-containing sulfonic acid groups of reactive intermediates on side chain of brominated polyether ether ketone resin by coupling reaction. The fluorine-containing sulfonic acid groups of active intermediates are of formula: XRfSO3M (i).X=iodo or bromo.Preferred Process: A active element is added to brominated polyether ether ketone resin after dissolving in organic solvent solution in presence of metal active element, reacted at 20-200 degrees C for 0-10 hours, active sulfonic acid group in the fluorine-containing intermediates is added and modified on side chain of brominated polyether ether ketone resin by coupling reaction, to obtain fluorine sulfonic acid group-containing polyetheretherketone resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step (1) is carried out by dissolving the 4-vinylpyridine in toluene, stirring, freezing with liquid nitrogen, then adding azobisisobutyronitrile under nitrogen protection and magnetic stirring, heating the mixture at 70 degrees C and reacting to obtain a light yellow precipitate of random copolymer of P(VP-co-AN) crude product, cleaning the crude product with toluene and diethyl ether, filtering and vacuum drying to obtain the random P(VP-co-AN). The vacuum drying process is carried out at temperature of 50 degrees C under a vacuum degree of 100 kPa for 48 plus minus 2 hours. The electrostatic spinning process is carried out under an electrostatic spinning voltage of 15 kV, accepted distance of 15 cm and environmental humidity of less than or equal to 50%. Preferred Components: The mole ratio of the 4-vinylpyridine, toluene, and azobisisobutyronitrile is 7.54 ml:4.2 ml:0.032 g. The mass ratio of P(VP-co-AN) and N,N-dimethylformamide is 7-9.5:100. The concentration of H2PtCl6 is 20 mmole.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The functional group which shows the electron withdrawal is chosen from ketone group, ester group, aldehyde group, cyano group, nitro group, amino group, hydroxyl group, and ether group. The Lewis' acid is chosen from dichloride zinc, ferric trichloride, gallium trichloride, and tin tetrachloride.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The electroconductive polymer solution contains a water-soluble polyhydric alcohol. The conductive polymer is a polymer including repeating unit of 3, 4-ethylene dioxythiophene, pyrrole, aniline, or its derivative(s). The dopant is polystyrene sulfonate. The thickener has a polymeric main chain structure containing the carboxyl group and the functional group which shows electron withdrawal. The content of the thickener is 0.1-10 %mass with respect to 100 %mass of total of electroconductive polymer solution. Preferred Properties: The dopant has weight average molecular weight of 2000-500000. The electroconductive polymer solution has viscosity of 40-500 mPa. Preferred Process: The manufacture of electroconductive polymer solution involves preparing thickener by polymerizing compound having a carboxyl group and a compound having functional group which shows electron withdrawal in water and/or water-miscible organic solvent, before dispersing thickener in electroconductive polymer solution. The functional group which shows electron withdrawal and the carboxyl group are adjoined in the polymeric main chain structure. The functional group which shows electron withdrawal and the carboxyl group are alternately-copolymerized.
TECHNOLOGY FOCUS - BIOLOGY - Preferred Property: The particle diameter of pulverized rice plant or Equisetaceae plant is 0.1-5 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composite Material: The acidic gas is exposed transiently to the salt component of the composite material creating a very fine layer of the salt on the composite material particles. Preferred Method: In the method (M1), the monolayer is a water soluble protective layer that forms around the sodium carbonate during the blending process. Preferred Components: The salt is sodium hydroxide. The acidic gas is at least one of carbon dioxide, hydrogen chloride or sulfur dioxide (preferably carbon dioxide).    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Unit: A thermal engine is used as a part of a refrigeration cycle to generate cooling and electricity for providing associated refrigeration. The fuel cell is operable to generate clean water by way of a chemical reaction within the fuel cell, where generator unit is adapted so that water is recirculated for use in the extraction chemical process for generating low-pressure hydrogen. A cartridge-based system, which contains the composite material, is operable to receive replaceable cartridges for providing reactants for the extraction chemical process.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The powdered metal of the composite material is aluminum, calcium, magnesium, sodium, potassium, zinc or gallium (preferably aluminum). EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The dimension of the total structure is 10 mu m to 10 cm. The structure has: a hollow sphere structure having a maximum thickness of 100 nm, preferably 2-50 nm, a diameter to thickness ratio of at least 5; a fiber structure having a thickness of at most 1000 nm, preferably 50-500 nm, and an aspect ratio of at least 50, preferably at least 100; a platelet having a thickness of less than 100 nm, a diameter to thickness ratio of at least 5, preferably at least 10; agglomeration/particle size having a diameter of at most 100 nm, preferably 2-80 nm; and a volume fraction of the inorganic material is 1-20 vol.%. The inorganic material is present in an amount of 90-100 wt.% and metal oxides and semi metal oxides and has a Mohs hardness of greater than 4, preferably 4.5-9.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic liquid has a boiling point atmospheric pressure of 10-100 degrees C, a critical temperature of 110-300 degrees C. The organic liquid, the reactive substance, or a solution of the reactive substance is in an inert organic solvent. The reactive substance is 1-6C alkanols, 1-6C-alkane carboxylic acids, 2-6C-alkane polycarboxylic acids, 2-6C-alkane polyols, 2-4C alkylene carbonates, and/or 2-6C-alkane polycarboxylic acids. Preferred Method: The method comprises introducing the organic liquid into a reaction vessel under subcritical conditions while heating the liquid under pressure on supercritical conditions such that the boiling temperature exceeds the prevailing pressure in the reaction vessel at no time of the treatment. The treatment step is carried out under supercritical conditions at a temperature of at most 30 degrees C above the critical temperature of the organic liquid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The silanes of formulae SiR'4 and SiR'nR''(4-n).R'=hydrolysable alkoxy group;R''=non-hydrolysable group (preferably alkyl, vinyl, alkenyl, aryl or alkyl with functional group such as epoxy, amino, isocyanate or acrylate group containing non-hydrolysable group).    TECHNOLOGY FOCUS - METALLURGY - Preferred Substrate: The substrate is selected from metallic and non-metallic group preferably stainless steel having chrome interlayer particularly for reducing the emittance.    TECHNOLOGY FOCUS - POLYMERS - Preferred composition: The thickness of Ti/chrome interlayer is 10-80 nm, first absorber layer is 30-70 nm, second absorber layer is 20-40 nm, antireflection layer is 30-55 nm and barrier layer is 50-200 nm. The thickness of chrome interlayer is 3-7 mu m. The composition of the first absorber layer is: Al of 25-55 at.%, Ti of 10-25 at.% and N of 30-50 at.%, second absorber layer is: Al of 15-30 at.%, Ti of 10-15 at.%, N of 10-20 at.%, anti-reflection layer is Al of 15-30 at.%, Ti of 5-15 at.% and O of 40-80 at.%, and organically modified sol-gel silica layer (ormosil) is Si of 16-30 at.%, C of 3-15 at.%, O of 25-59 at.% and H of 8-44 at.%. Preferred Process: The ormosil layer is prepared by sol gel method using sol prepared by two precursor silanes. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The carboxyl group-containing compound (B) is preferably of formula (II)-(VII). The photocurable monomer includes monomer having 1-30 optionally substituted vinyl group, acrylate group or methacrylate group. The radiation curable composition further contains initiator (C) including photopolymerizable initiator. The radiation curable composition comprises 20-90 wt.% component (A), 1-60 wt.% component (B) and 0.1-20 wt.% component (C).
TECHNOLOGY FOCUS - POLYMERS - No general preparation given. Preferred Composition: The reactive compound is preferably of formula (II)-(VI).R"'=H or substituent. Preferred Definitions:    Ar1,Ar2=trivalent heterocyclyl;and    Y'=group of formulae (i)-(iii).    EXAMPLE - 10.62 g 8,8-dimethyl-7-oxa-3,12-dithiatricyclo(7.3.0.02.v6)dodeca-1(9),2(6),4,10-tetraene and 100 mL diethyl ether were added into a four-necked flask and reacted at 25 degrees C for 30 minutes, to obtain reaction liquid. The obtained reaction liquid was cooled at (-70) degrees C, 29.3 mL n-butyllithium solution and 1.64 mol/L hexane solution were added, reacted at room temperature for 2 hours, cooled at -70 degrees C, 5.20 g trimethoxyborane was added, stirred and reacted at (-70) degrees C for 2 hours, to obtain (11-(dihydroxyboranyl)-8,8-dimethyl-7-oxa-3,12-dithiatricyclo(7.3.0.02.6)dodeca-1(9),2(6),4,10-tetraen-4-yl)boranediol. 100 mL Acetic acid aqueous solution was added to the resultant reaction liquid, liquid separation operation was performed using 100 mL ethyl acetate, and the resultant organic layer was extracted. 100 mL Toluene and 4.81 g 2-hydroxymethylene-2-methyl-1,3-propanediol were added, with respect to the obtained organic layer and spin-drying was performed for 30 minutes. The resultant material was subjected to liquid chromatography and recrystallized using cyclohexane-toluene, to obtain 5.5 g (2-(8,8-didodecyl-11-(5-(hydroxymethyl)-5-methyl-1,3,2-dioxaborinan-2-yl)-7-oxa-3,12-dithiatricyclo(7.3.0.02.v6)dodeca-1(9),2(6),4,10-tetraen-4-yl)-5-methyl-1,3,2-dioxaborinan-5-yl)methanol as pale yellow compound having of 99.8%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Organic solvent is terpineol.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Carbon black, naflon, isopropanol are utilized for synthesis of mesoporous platinum.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Method: The method further comprises passing modulation gas, preferably fluoroform into the chamber. The pulse frequency is less than 50 khz. The duty ratio of pulse bias radio frequency voltage is 10-90%. The radio frequency power source frequency in plasma processing chamber is 10-120 mhz. The pulse bias radio frequency voltage comprises multi-power level, preferably two power levels.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The reactant gas includes sulfur hexafluoride, tetrafluoromethane, nitrogen trifluoride, silicon tetrafluoride, bromotrifluoromethane or chlorine gas. The side wall protective gas includes oxygen, nitrous oxide or ozone.
TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The nanofiber is spunlace nonwoven surface-coated polyvinyl acetate-polyethylene copolymer (PVA-co-PE) nanofiber, acupuncture nonwoven surface-coated PVA-co-PE nanofiber, spunbonded nonwoven fabric surface-coated PVA-co-PE nanofiber, meltblown nonwoven fabric surface is coated PVA-co-PE nanofiber, heated nonwoven surface-coated PVA-co-PE nanofiber or stitchbonded nonwoven fabric surface-coated PVA-co-PE nanofiber.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The volume ratio of polyvinylpyrrolidone solution and silver nitrate solution is 1:15-1:100, and chloromolybdate and silver nitrate solution in the ethylene glycol solution, is 1:30-1:100. In the step (ii), the amount of chloromolybdate and polyvinylpyrrolidone added, is 15-40 times, added at time interval of 20-60 seconds. Preferred Method: The step (ii) comprises adding carbon powder, namely Vulcan XC-72R (RTM: Industry standard pigment black for electrical conductivity) of Cabot Corporation company, where the mass ratio of carbon powder and molybdenum nano-catalyst, is 1:1-50:1. In the step (iv), the mass ratio of molybdenum nano-catalyst and water is 1:50-1:1000, the concentration of Nafion (RTM: Sulfonated tetrafluoroethylene based fluoropolymer-copolymer) solution is 2-80%,and the volume ratio of Nafion solution and water is 1: 18-22, and the sulfuric acid solution concentration is 0.05-0.5 mol/l, and cyclic voltammetry scanning process includes scanning potential range (E) is -0.194 V to 0.7 V or -0.194 V to 1.2 V, and the scanning time is 1-200 times.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The weight content of gold is 0.1-35. The weight ratio of LaMO3 and MxOy is 1:99-1. Preferred Method: The catalyst is prepared by preparing composite carrier by soaking MxOy into La precursor salt solution, uniformly stirring, standing for 2-12 hours, drying at 100-150 degrees C for 2-24 hours, calcining at 700-1000 degrees C for 2-12 hours; or uniformly mixing La and M precursor salt solution, adding to alkali solution or dropping alkali solution to precursor salt solution, stirring for 2-5 hours, aging for 2-12 hours, drying at 100-150 degrees C for 2-24 hours, calcining at 700-1000 degrees C for 2-12 hours; adjusting pH value of chloroauric acid solution to 6-11, pouring composite carrier into solution, standing and aging for 2-12 hours, water washing, drying at 50-110 degrees C for 2-24 hours, roasting or hydrogen streaming at 100-500 degrees C for 2-6 hours, deposition-precipitating composite carrier into chloroauric acid in solution, regulating pH at 5-10, reacting at 40-80 degrees C for 6 hours, filtering or centrifuging, washing with deionized water, drying, roasting or performing anion reduction dipping method, obtaining catalyst, regulating pH with alkali solution including sodium hydroxide, sodium carbonate, potassium hydroxide, potassium carbonate, ammonium carbonate, and/or water; where the La precursor salt solution is lanthanum nitrate, lanthanum chloride, lanthanum oxalate or solution of sulfuric acid lanthanum; and the M metal salt solution contains nitrate, chloride, oxalate and/or sulfate solution. Preferred Components: MxOy is alpha -aluminum oxide, gamma -aluminum oxide, alpha -ferric oxide, gamma -ferric oxide, manganese dioxide, cobalt(II,III) oxide, nickel oxide, alpha -gallium oxide, and/or gamma -gallium oxide. LaMO3 is lanthanum aluminate, lanthanum ferrate, lanthanum manganite, lanthanum cobalt oxide, lanthanum nickel oxide, and/or lanthanum gallate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The calcining step is carried out at 300-500 degrees C for 2-8 hours. Preferred Components: The iron salt is ferric nitrate, ferric chloride, ferric sulfate, ferric acetylacetonate or iron nitrate. The tin salt is tin tetrachloride, stannous chloride or stannous oxalate. The concentration of the hydrogen peroxide solution is 3-30 wt.%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The titanium precursor is tetraisopropyl titanate, tetra-isobutyl titanate or titanium tetrachloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Alkaline catalyst is triethylamine, potassium carbonate, sodium carbonate, pyridine, sodium hydroxide, or cesium fluoride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Diamine monomer is N,N-dimethyl ethylene diamine, N,N-dimethyl propane diamine, or N,N-dimethyl p-phenylene diamine. Organic solvent is chloroform, 1,2-dichloroethane, dimethyl sulfoxide, dimethylformamide, N-methyl pyrrolidone, N,N-dimethylacetamide, and/or dichloromethane. Halogenated alkyl is alkyl fluoride, methyl chloride, methyl iodide, or alkyl bromide.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Aromatic polymer is poly-biphenyl, polysulfone, polybenzimidazole, polyaryletherketone, polyether sulfone, polyarylsulfone, polyether ketone, polyether-ether-ketone, polyphenylene oxide, polyphenylene sulfide, polyaromatic amide, or polyaromatic imide and their derivatives. Substance ratio sulfonyl chloride aromatic polymer:diamine monomer is 1:3:1:1. Substance ratio side chain polymer:halogenated alkyl is 1:3-1:1. Preferred Conditions: Temperature of sulfonyl chloride aromatic polymer and diamine monomer reaction is 40-100 degrees C. Temperature of side chain polymer and halogenated alkyl monomer reaction is 40-100 degrees C. Preferred Definitions:    X=F, Cl, Br, or I.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of aluminum and magnesium is each 0-98 wt.%, respectively. The total content of aluminum and/or magnesium is 90-95 wt.%. The content of sodium chloride and anhydrous sodium phosphate is 0-6 wt.% and 0-13 wt.%, respectively. The total content of sodium chloride and/or anhydrous sodium phosphate is 4-6 wt.%. The content of bentonite is 0.05-2 wt.%.
TECHNOLOGY FOCUS - BIOLOGY - Preferred Process: The bark is carbonized by heating under hypoxic condition or anaerobic condition. Preferred Property: The cut material of bark has length of 1-100 mm.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The soil modified material is made into an alkaline state by adding alkaline aqueous solution to the installation portion.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The sulfide solid electrolyte material comprises crystals and non-crystals, and bivalent sulfur.
TECHNOLOGY FOCUS - METALLURGY - The quantum dot layer is made of gallium antimonide (GaSb) and the spacer layer is fabricated from graded aluminum gallium arsenide (AlxGa1-xAs).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The powder composition further contains additive(s) chosen from magnetite magnetic nanoparticles and resorcinol. The total content of solute including emeraldine base and protic acid dopant is 2-5 wt.% with respect to metacresol. The organic solvent is acetone, alcohol, chloroform, hexane, ethyl acetate, acetonitrile, tetrahydrofuran, ether and/or dichloromethane.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The polyaniline emeraldine base is prepared by obtaining solid by cooling a mixture of hydrochloric acid and ammonium persulfate in water, dissolving the solid in chloroform containing aniline monomer, maintaining at 0-5 degrees C for 10-15 hours to obtain polyaniline emeraldine salt, and undoping the polyaniline emeraldine salt with ammonia solution. Preferred Composition: During manufacture of powder composition, the usage amount of camphorsulfonic acid is 0.3-1 mol with respect to 1 mol of polyaniline emeraldine base.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Process: The manufacture of photovoltaic cell involves forming resist film (5) on surface (S) of silicon substrate, removing the boron diffusion layer and boron silicate glass layer (4) which are formed in back surface (BS) of the silicon substrate after forming resist film, carrying out phosphorus diffusion process after removing the resist film, and forming a silver grid electrode on both surfaces of the silicon substrate.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The heat-diffusion process is carried out in atmosphere of nitrogen and oxygen. A boron diffusion source is obtained by coating the material containing boron compound on a silicon substrate. Preferred Composition: The diffusion source is boron tribromide or boron trichloride. The flow ratio of nitrogen and oxygen in heat-diffusion process is 99.5:0.5-95:5.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The gas or liquid is hydrogen fluoride.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Composition: The solar cell module further has a buffer layer. The primary and secondary bypass diode contains primary layer having indium-gallium phosphide, secondary layer having gallium arsenide and tertiary layer containing indium-gallium phosphide.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nucleation layer contains indium-gallium phosphide. Preferred Property: The nucleation layer has thickness of 350 Angstrom or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The low concentration diffusion source layer and the high concentration diffusion source layer are formed using diborane and silane as source gas.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alcohol used is selected from lower densities of 1 g/ml and with viscosities that slow the reaction. The alcohol used is selected from alcohols having a boiling point exceeding 65 degrees C to prevent excessive vapor formation. It is isopropanol, ethanol, or ethanol. Preferred Process: Generating hydrogen involves filling the reactor with aluminum or aluminum alloys whether in rod, pellets, chips, briquettes, pressed powders or foils, adding to the reactor that is completely filled with alcohol to remove air inside, later part of alcohol is emptied; dosing hydroxide solution depending on the demand for hydrogen; generating hydrogen and steam distilled alcohol in an exchanger; recycling distilled alcohol to the reactor; and filtering and storing hydrogen.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The multifunctional synthetic organic substrate comprises: at least two reactive moieties including a moiety comprising an indole, a pyrrole, a catechol, tyrosyl and/or a catecholamine; a metal; and 3-(3,5-bis(6-hydroxy-1H-indol-3-yl)phenyl)-1H-indol-6-ol. The reactive moieties comprise at least two reactive sites. The reactive moieties are: joined by a linker that is optionally conjugated.    TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The method further comprises: co-polymerizing a natural organic substrate and the multifunctional synthetic organic substrate with the oxidase; and reacting the organic polymer with the oxidizing agent and optionally an organic substrate. The multifunctional organic substrate is reacted with serotonin and ammonium persulfate. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of metal atom of metal salt to the total metal atom of metal alkoxide is 0.01-0.7.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The metal alkoxide comprises silicon alkoxide or all silicon-containing alkoxide or titanium alkoxide, or mixture of silicon alkoxide or titanium alkoxide. The precipitation inhibiting agents are N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexylene glycol, or their derivatives. The metal salt is chosen from metal nitrate, metal sulfate, metal acetate, metal chloride, metal oxalate, metal sulfamate, metal sulfonate, metal acetoacetate, metal acetylacetonate, and basic salts. The organic solvent contains alkylene glycol or its monoether derivative. Preferred Definitions:    R2=1-20C hydrocarbyl optionally having hetero atom and optionally substituted with hydrogen or halogen, vinyl, methacryloxy, acryloxy, styryl, phenyl, or cyclohexyl;and    M3= aluminum, indium, zinc, zirconium, bismuth, lanthanum, tantalum, yttrium, or cerium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The average particle diameter of silicon oxide (S1), silicon oxide (S2), and silicon nitride is determined by a particle size distribution measuring method, and the peak which shows the average particle diameter of the silicon nitride exists between the peak which shows the average particle diameter of silicon oxide (S1), and the peak which shows the average particle diameter of silicon oxide (S2). The casting mold is a product made from graphite. The average particle diameter of the silicon oxide (S1) is 10-50 mu m, and the average particle diameter of silicon oxide (S2) is 0.3 mu m or less. The content of silicon oxide (S1) in the mold release material layer is 1-10 parts mass and the content of silicon nitride is 100-300 parts mass with respect to 100 parts mass total silicon oxide in the mold release material layer. Preferred Properties: The silicon oxide (S1) is amorphous. The specific surface area of silicon oxide (S1) is 10-300 m2/g.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The grafted ion exchange radical is sulfonic acid group, hydroxyl group, carbonyl group, carboxylic acid group or amine group. The additive is polyvinylpyrrolidone, polyethylene glycol or polyethylene alcohol. The organic polymer resin is polysulfone or polyether sulfone. The vinyl-based monomer is N-vinyl pyrrolidone, methyl acrylic acid hydroxyl ethyl ester, acrylic acid, acrylamide and sodium styrene sulfonate. The organic solvent is dimethyl sulfoxide, dimethylacetamide, N-methylpyrrolidone and/or dimethylformamide. The poor solvent is water, methanol, ethanol, propanol and isopropyl alcohol. The photo-initiator is benzophenone or an aryl azide compound reagent. The organic solvent is water or methanol. Preferred Method: The porous membrane is prepared by preparing a polymerization photoinitiator by dissolving 25-35 wt.% organic polymer resin and 5-15 wt.% additive in an organic solvent by stirring at 50-100 degrees C for 2-10 hours to obtain a mixture, followed by pouring the mixture in a plate with volatile solvent at an air relative humidity of less than 60% for 0-10 seconds, dipping the resultant mixture in poor solvent at 20-100 degrees C for 5-600 seconds to prepare a porous film with thickness of 100-150 mu m, immersing the porous film in photo-initiator solution and monomer solution in dark environment for 2-10 hours, placing the porous film in monomer solution for 0.5-2 hours to remove oxygen-containing ion-exchange groups, placing the film in UV irradiation, controlling illumination time for 0.5-2 hours under nitrogen gas protection to obtain a finished product, where the monomer solution comprises monomer that is vinyl monomer and water as solvent, the concentration of the monomer solution is 0.1-1 mol/l, and the dissolved oxygen of the monomer solution is 0.25 mg/l.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic oxide particles are colloidal silica having pH of 2-5 and primary particle diameter of 1-100 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polysiloxane resin portion (b) and acrylic resin portion (c) are chemically bonded together by radical polymerization. The polysiloxane resin or its precursor (B) contains 8-48 wt.% reactive group chosen from alkoxy silyl group and silanol group in a molecule. The component (C) has an ethylenically unsaturated bond which can be radically polymerized as functional group and crosslinked with the molecule of polysiloxane resin or its precursor (B). Preferred Process: When the polysiloxane resin or its precursor (B) is used as component having ethylenically unsaturated bond which can be radically polymerized, the unsaturated coupling of polysiloxane resin portion (b1) is attached to the acryl portion of monomer mixture or its partial polymer, during radical polymerization.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The material comprises 1.3-15.8 atomic% of titanium. The catalyst comprises at least 1 ml (monolayer) or at least 6.5-9.3 ml of platinum or platinum alloy. Preferred Method: The material is formed of tantalum oxide doped with titanium. The catalyst support is formed as a core particle and a layer. The catalyst is applied as a shell on the core particle.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The average diameter of the primary stage stalk is 145-450 nm. The average diameter of secondary stage bundle is 25-60 nm. The average diameter of tertiary stage nanotube is 5-25 nm. The total length from primary stage base to tertiary stage top is 4-6 mu m. The thickness of the substrate is 30 nm. Preferred Composition: The substrate is high-purity silicon-comprising oxide layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The carbon/nitrogen feedstock is acetonitrile. The iron catalyst is ferrocene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Alkali electrolyte is also used in preparation of the oxidation-reduction catalyst. Alkali electrolyte is sulfuric acid, perchloric acid, potassium hydroxide or sodium hydroxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The carbon material is a graphene, carbon nanotubes, mesoporous carbon, carbon black, fullerene, or activated carbon. The source of hetero-phase material comprises at least one element comprising nitrogen, sulfur, boron, phosphorus, or fluorine.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The method comprises dispersing carbon material in water/ethanol and then adding source of hetero-phase material and subjecting the mixture to ultrasonic waves for 0.5-6 hours. Preferred Components: The source of hetero-phase material comprises at least one of ammonia, sodium sulfide, ammonium sulfide, boric acid, phosphoric acid, ammonium fluoride, or ammonium bicarbonate. The mass ratio of the carbon material and the source of hetero-phase material is 1:0.01-100, preferably 1:5. The concentration of the carbon material in the mixed solution is 2-10 g/l.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electrolyte solution contains a lithium hexafluorophosphate as supporting electrolyte. The positive electrode further contains nitrogen.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The positive electrode further contains polycarboxylic acid and polycarboxylic acid metal salt. The polycarboxylic acid is chosen from polyacrylic acid, polymethacrylic acid, polyvinyl benzoic acid, polyallyl benzoic acid, poly methallyl benzoic acid, polymaleic acid, poly fumaric acid, poly(aspartic acid) and poly glutamic acid. The polycarboxylic acid metal salt is polycarboxylic acid alkali metal salt and/or polycarboxylic acid alkaline-earth metal salt. The negative electrode film formation agent is fluoroethylene carbonate or vinylene carbonate. The content of negative electrode film formation agent is 0.1-30 pts. wt. with respect to 100 pts. wt. electrolyte solution.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The conductive polymer is chosen from polyaniline and its derivative, and polypyrrole and its derivatives.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): Bis-boron acid pinacol ester derivative is reacted with 1,3-diiodo-5,5-dimethylhydantoin, to obtain intermediate (D). The intermediate (D) is quenched, to obtain anthraquinone derivative. Preferred Composition: The anthraquinone derivative further comprises structural unit (Y) chosen from group of formula: -CH 2=CH 2- (y-1), -CC- (y-2), and group of formulae (y-3) and (y-4). The anthraquinone derivative is of formula (II), preferably of formula (IV).X 6=S, O, or NR 3;R 3=optionally substituted hydrocarbyl;R 1,R 2=H, fluoro, chloro, bromo, or iodo, or hydrocarbyl or heterocyclyl (optionally substituted);or Y' 1+Y' 2=single bond or group of formulae: (y-1)-(y-4);Z 1,Z 2=single bond, or (i)-(xxv), in which at least 1 of Z 1 and Z 2 is not single bond;n=1-1000;R 17-R 24=H, fluoro, chloro, bromo, iodo, or hydrocarbyl or heterocyclyl (optionally substituted), in which at least 2 of R 17-R 24 is -Y'-R;andR=H, fluoro, chloro, bromo, or iodo.Hydrogen atom in structural units (y-1) and (y-2) is optionally substituted by fluorine, chlorine, bromine, iodine, cyano, nitro, hydroxyl, thiol, -NR 4R 5, optionally substituted hydrocarbon, or optionally substituted heterocyclic group. EXAMPLE - 2,6-Bis(3-hexyl-5-iodothiophen-2-yl)-9,10-dihydroanthracene-9,10-dione was added to reactor, aqueous solution of 9-(9-heptadecanyl)-9H-carbazole-2,7-diboronic acid bis pinacol ester in sodium carbonate and toluene were added to reactor, and reacted at 110 degrees C for 16 hours. Tetrakis(triphenylphosphine) palladium was added to resulting mixture, reacted, and the resulting mixture was cooled to room temperature. The residue obtained by adding methanol was washed in methanol and pure water, filtered, concentrated under reduced pressure, and vacuum-dried, to obtain anthraquinone derivative.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The platinum precursor has amine ligand, and includes dichloro tetraamine platinum, dichloro tetraamine platinum hydrate, tetraamine platinum(II) hydroxide hydrate, tetraamine platinum(II) nitrate and/or bis(ethylenediamine)platinum(II) chloride. The metal precursor includes nickel precursor, or nickel precursor, iridium precursor, palladium precursor, ruthenium precursor, cobalt precursor, copper precursor and/or iron precursor, where the nickel precursor includes nickel chloride, nickel chloride hydrate, nickel nitrate, nickel nitrate, nickel sulfate and/or nickel sulfate hydrate. The suspension comprises 1-300 pts. wt. metal precursor and 100 pts. wt. platinum precursor. The catalyst has 5-60 pts. wt. metal alloy and platinum precursor, based on 100 pts. wt. catalyst. The hollow nanoparticles have a surface layer containing platinum, and non-porous shell with internal layer of platinum and metal alloy. The surface layer containing platinum has platinum and metal alloy in molar ratio of 0.5-10:1, measured by energy dispersive X-ray microanalysis or X-ray photoelectron spectroscopy. The hollow nanoparticles have 1-300 pts. wt. metal and 100 pts. wt. platinum. Preferred Method: The reduction reaction is performed using a reducing agent including sodium borohydride, sodium cyanoborohydride, lithium borohydride, hydrazine, aluminum borohydride (AlBH4), and/or lithium aluminum hydride. The post-processing of the reduced solution comprises acid treating by adjusting pH to 0.01-4.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The carrier is carbon based carrier, preferably carbon black, Ketjenblack (RTM: Electroconductive carbon black), carbon nanotube, carbon nanofiber, graphene and/or graphene oxide. The dispersion medium is water or alcohol solution containing 1-50 vol.% alcohol, based on 100 vol.% water. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The Pb oxide or its corresponding salt is selected from PbO, PbCO3 or Pb(NO3). The Mo oxide or its corresponding salt is selected from sulfur trioxide MoO3. The W oxide or its corresponding salt is selected from tungsten trioxide (WO3), phosphotungstic acid or H2WO4. The Yb oxide or its corresponding salt is selected from Yb2O3 or Yb2(NO3). The Li oxide or its corresponding salt is selected from lithium oxide Li2O or lithium carbonate Li2CO3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The noble metal is noble metal alloy or noble metal substance. The noble metal or its salt or acid is chloroplatinic acid, chloroauric acid, ruthenium chloride, palladium chloride, silver nitrate, ferric nitrate, cobalt nitrate, nickel chloride, manganese chloride or copper chloride. The oxidant utilized in the graphene-polypyrrole composite material preparation is ferric trichloride, ammonium sulfate, potassium persulfate, sodium persulfate, hydrogen peroxide, sodium dichromate, ammonium dichromate or potassium dichromate.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The noble metal is chosen from platinum, palladium, gold, silver, ruthenium, iron, cobalt, nickel, manganese and copper. The noble metal alloy is MxNy, where M and N are platinum, palladium, gold, silver, ruthenium, iron, cobalt, nickel, manganese or copper, x and y are 10-90 and x+y is 100.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The dispersant utilized in the graphene-polypyrrole composite material preparation is 1-8C-alcohol, 2-8C alcohol and/or 3-8C trihydric alcohol, and water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Metal is platinum, palladium, gold, silver, copper, ruthenium, rhodium, and/or mercury. Nanoparticles are particles from greater than or equal to 2 types of metal alloy or solid solution.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Hydrogenated silicon compound is trialkoxysilane which has alkoxy group e.g. methoxy group, ethoxy group, and/or propoxy group. Solution system contains alcohol and is weakly acidic. Mesopore contains nanoparticle made of metal or nickel whose normal electrode potential is larger than hydrogen. Macroporous monolith contains a compound from which a color changes with specific gas and is arranged inside the mesopore.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The substrate is made of polyethylene terephthalate, polyethylene naphthalate, polyimide, glass, ceramic, metal, silicon, cellulose, and laminate.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The acrylic resin component has an average molecular weight of 20-210 kilodalton and is present in an amount of 0.1-50 wt.%, preferably 20-35 wt.%. The acrylic resin component comprises a mixture of at least two acrylic resins, where one acrylic resin is an n-butyl methacrylate resin having an average molecular weight of about 20-40 kilodalton and a glass transition temperature of 40-60 degrees C, and the other acrylic resin is an isobutyl methacrylate resin having an average molecular weight of 125-155 kilodalton and a glass transition temperature of 15-25 degrees C. One acrylic resin is an isobutyl methacrylate resin having an average molecular weight of about 175-205 kilodalton and a glass transition temperature of 40-60 degrees C, and the other acrylic resin is an isobutyl methacrylate resin having an average molecular weight of 125-155 kilodalton and a glass transition temperature of 15-25 degrees C. The solvent is present in an amount of 30-99 wt.%, preferably 40-70 wt.%, and is texanol or terpineol. Preferred Composition: The sealing glass composition further comprises a thixotropic agent and a plasticizer. Preferred Method: The step of depositing the sealing glass composition onto the front surface of the supporting sheet is performed by screen printing. The method of applying a sealing glass composition to a substrate further comprises forming an alternating assembly of metal substrates and sealing glass compositions, and compressing the assembly. EXAMPLE - Typical composition comprised of: 21 wt.% of organic vehicle including 3.7 wt.% of isobutyl methacrylate polymer resin and 3.7 wt.% of n-butyl methacrylate polymer resin; 23 wt.% of ball-milled fibrous oxide filler; 52 wt.% of glass frit; 1 wt.% of Thixatrol max(RTM: Polyamide); and 3 wt.% of plasticizer (mixture of propanol, oxybis-dibenzoate).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The semiconductor material comprises a chalcogenide. The chalcogen-rich region is a tellurium-rich region. The chalcogen is sulfur.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The process is carried out for 1-10 times. The washing step is carried out using an ultrasonic cleaning device at a temperature of 40-80 degrees C for 10-120 minutes and using warm water at 40-80 degrees C. Preferred Components: The acid solution comprises nitric acid. The acid and base solutions have concentration of 0.5-5 M. The base solution comprises sodium hydroxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The inorganic layer is laminated on at least one surface of a plastic film, and the organic layer is laminated on the surface of the inorganic layer. The 1,3,5-triazine derivative is triazine trithiol or a triazine dithiol, preferably triazine trithiol. Preferred Process: The inorganic layer and organic layer are vapor-deposited by the vacuum evaporation method.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mass ratio of zinc chloride and sintered compact is 0-0.12 (excluding 0 and 0.12).
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The aluminum-magnesium alloy comprises 0.15 %mass or less iron and 0.15 %mass or less silicon, as impurities. The aluminum-magnesium alloy further contains 0.02-8 %mass manganese, 0.01-0.2 %mass chromium, 0.01-0.3 %mass zirconium, 0.01-0.5 %mass scandium, 0.01-0.3 %mass vanadium, 0.02-0.3 %mass nickel and/or 0.03-1 %mass copper. Preferred Property: The aluminum-magnesium alloy has distribution density of crystallization particles with equivalent circular diameter of 1 mu m or more 4000 piece/mm2 or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The adhesive resin layer (11A), water vapor barrier resin layer (12), and adhesive resin layer (11B) are laminated in order. Preferred Composition: The acid-modified polyolefin-based resin is maleic anhydride-modified polyolefin type-resin. The silane modified polyolefin resin is silane modified polyethylene resin or silane modified ethylene-vinyl acetate copolymer. The mass ratio of acid-modified polyolefin-based resin and silane modified polyolefin resin is 10:90-90:10. Preferred Properties: The ratio of thickness of adhesive resin layer is 5-60% of thickness of film-form sealing material. The thickness of film-form sealing material is 50 mu m, the water-vapor-permeation rate of film-form sealing material at 90% relative humidity and 40 degrees C is 15 g/m2.day or less, preferably 10 g/m2.day or less. The film-form sealing material has total light transmittance of 85% or more, in visible region. The acid-modified polyolefin-based resin has vicat softening point of 60 degrees C or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The rubber-type resin is polyisobutylene-type resin. The primary adhesive resin layer and/or secondary adhesive layer comprises polyolefin-based resin and silane-modified polyolefin resin. Preferred Properties: The ratio of thickness of water vapor-barriering resin layer constitute 10-99% the thickness of the film-forming material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The azapentacyclo-type derivative (I) is preferably of formula (2-1) or (2-2).La-Ld=divalent linking groups (L-1)-(L-12);andRa-Rd=3-12C linear alkyl.Preferred Method: The organic semiconductor thin film is produced by solution coating method.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The coating solution or organic semiconductor thin film further contains a polymer binder. Preferred Definitions:    Z=H, 2C or less (un)substituted alkyl, 2C or less (un)substituted alkynyl, 2C or less (un)substituted alkenyl or 2C or less (un)substituted acyl.
TECHNOLOGY FOCUS - METALLURGY - The second metal is selected from copper and aluminum.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The thickness of inorganic-organic hybrid polymer layer is 0.03-7 mu m. The film thickness ratio of barrier layer and inorganic-organic hybrid polymer layer is 1:0.01-60. Preferred Layer: The gas-barrier film further comprises a base layer which contains a carbon-containing polymer between base material and barrier layer.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The aromatic-polyamide porous membrane has porosity of 50-80% and Gurley air permeability of 1-200 seconds/100 ml. The propylene carbonate liquid wicking property along longitudinal direction (MD) and transverse direction is 10-100 mm/minute.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal alkoxide compound is aluminum alkoxide compound, niobium alkoxide compound or tantalum alkoxide compound.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aluminum alkoxide compound is aluminum secondary butoxide. The niobium alkoxide compound is niobium pentaethoxide. The tantalum alkoxide compound is tantalum pentaethoxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The thickness of the cylindrical capsule is 1-3.5 mm. The packaging density of copper-gallium alloy powder is 60% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The passivation layer includes a film stack having two dielectric layers that are made of silicon nitride and aluminum oxide.    TECHNOLOGY FOCUS - METALLURGY - The back metal is selected from a group consisting of aluminum, silver, tin, cobalt, nickel, zinc, lead, tungsten, titanium or tantalum and nickel-vanadium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aliphatic cyclic amine compound is morpholine, piperidine, piperazine, pyrrolidine and/or pyrazolidine, preferably morpholine. The aliphatic cyclic amine compound is tertiary amine compound. The content of the aliphatic cyclic amine compound is 50-500 mol%, preferably 100-300 mol% with respect to carboxyl group contained in the resin. The aromatic tetracarboxylic dianhydride is pyromellitic dianhydride, biphenyltetracarboxylic dianhydride and/or benzophenone tetracarboxylic dianhydride. The aromatic diamine compound is phenylenediamine and/or diaminodiphenylether.    TECHNOLOGY FOCUS - POLYMERS - Preferred Resin: The resin includes resin having amino group on terminal. Preferred Properties: The number average molecular weight of the resin is 1000-100000. The resin has preferable imidization rate of 0.10 or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The organic solvent is acetone.    TECHNOLOGY FOCUS - POLYMERS - The adhesive is a synthetic polymer and/or an epoxy (preferably silicone, bisphenol A epoxy resin, bisphenol F epoxy resin, a novolac epoxy resin, an aliphatic epoxy resin, and/or a glycidylamine epoxy resin). The positively charged electrode or the negatively charged electrode comprises a polymer onto which the graphene layer is deposited or coupled, where the polymer is an organic polymer selected from polypropylene, polyvinyl chloride, and/or polyethylene, or polystyrene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The carbon composite structure has a BET specific surface area of 50-200 m2/g, a specific capacity of 1000-1600 mAhour/g at first cycle and 400-800 mAhour/g after 50 cycles.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The heteroatom is phosphorus, oxygen, nitrogen and/or sulfur. The carbon group solvent is triphenylphosphine, acetonitrile and/or thiophene. Preferred Condition: Flame pyrolysis synthesis is carried out at 400-2000 degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The block isocyanate (A) has number average molecular weight of 1000-5000, and aromatic structure. Preferred Composition: The block isocyanate (A) has 350-600 g/mol functional group (a1) by which isocyanate group is blocked by blocking agent. The blocking agent dissociates and the functional group (a1) produces an isocyanate group by heating to 70-200 degrees C. Te composition further contains aqueous medium (B). The block isocyanate (A) is a block isocyanate having hydrophilic group. The composition forms the layer, which accepts the fluid containing an electroconductive substance or pigment.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The boron carbide is B4C. The late transition metal is Ni, Co, Rh or Pd. The late transition metal is 0.5-2 atomic.%. The late transition metal is Ni at 1 atomic.%. Preferred Method: The sintering chamber is evacuated to less than or equal to 40 Pa. The heating temperature is 1000-2000 degrees C. The maximum pressure is 100 GPa. EXAMPLE - No suitable example is given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The triaryl isocyanurate is obtained by reacting cyanic acid soda or isocyanuric acid, and allyl chloride. The content of 1,3-dichloro propene in allyl chloride is 200 ppm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal particles are electronegative particles which include silicon, copper or nickel particles, where the electronegative particles are coated with amorphous carbon. Preferred Method: The method further comprises: crushing metal under dry condition before crushing the metal particles under inert gas atmosphere; and irradiating ultrasonic waves after the step of crushing and dispersing. EXAMPLE - Polycrystalline silicon powder having purity of 99.9999% and particle diameter of 500 mu m was placed in a dry type bead mill, pulverized to an average particle size of 3 mu m, and then crushed using zirconia beads of 5 mm diameter under nitrogen gas atmosphere. 2 wt.% Coal tar pitch dissolved in a cyclohexane solution was mixed with the obtained powder using a solid-liquid mixing tank to prepare a pulverized product mixed solution with a concentration of 10 wt.%. The obtained mixed solution was supplied into a wed bed mill filled with zirconia beads, pulverized until average particles size of polycrystalline silicon powder reached up to 0.5 mu m, and purified to obtain a slurry. The obtained slurry was vacuum dried to remove cyclohexane to obtain silicon-graphite-coal tar pitch mixture. The obtained mixture was heated at 800 degrees C under argon gas atmosphere to obtain the silicon-carbon composite ink composition.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The nano inorganic particle is silicate, silica powder, boron powder, metal oxide, calcium carbonate, glass bulb, whisker, fiber, metal sulfide, barium compound and flaking filler. The nano inorganic particle is aluminum silicate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The polymer resin is a thermoplastic resin or thermosetting resin. The flame retardant is halogenated flame retardant, phosphate flame retardant, nitrogen-based flame retardant, inorganic flame retardant, halogen-nitrogen flame retardant and halogen-phosphorus flame-retardant. Acid anhydride copolymer is tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydro-phthalic anhydride, methylhexahydrophthalic anhydride, nadic methyl anhydride, hydrolyzed nadic methyl anhydride, phthalic anhydride and maleic anhydride. The polymer resin is graft-polymerized polyethylene, polypropylene, ethylene propylene, polyolefin or polystyrene. EXAMPLE - 100 g high density polyethylene (0200B, Honam Petrochemical) and 10 phr (parts per hundred resin) kaolin having average particle size of 50 nm was added in a twin screw extruder, then it is extruded at 160 degrees C at 50 revolutions/minute, and stirred for 15 minutes.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Medium: In the medium, the catalyst support is formed as a core particle; and the catalyst is applied as a shell on the core particle; or the mixed metal oxide material is formed as a layer. Preferred Material: The mixed metal oxide material of tin and titanium comprises tin (at least approximately 15, up to 40 or 24-28 atomic %), based on metal content. The metal oxide material comprises an oxide of titanium doped with tin. Preferred Method: The method (M1) involves forming a catalytic layer of at least approximately 3 monolayers (ML) (preferably less than or equal to 5 ML) of catalyst. Preferred Components: The titanium oxide is the crystalline form. The catalyst comprises platinum or platinum alloy (preferably approximately 1 monolayers (ML), especially 1 ML to less than approximately 20 ML, particularly less than or equal to 5 ML). EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Curable epoxy resin composition contains monoallyl diglycidyl isocyanurate compound of formula (1). Leveling agent has silicone type polymer which has a structural unit of formula -(Si(R3)(R4)-O)-, fluorine-containing acrylic polymer which has structural unit of formula -(C(R5)(C(=O)-O-R6)-CH2)- and fluorine-containing polyether polymer which has structural unit of formula -(R19((-CH2)z-OR20)-O)-. Alicyclic epoxy compound (A) is compound which has cyclohexene oxide group or compound of formula (I-1). Curable epoxy resin composition contains rubber particle, curing agent and hardening accelerator, or curing catalyst.R1,R2=H or 1-8C alkyl;R3=alkyl which may have substituent;R4=aralkyl which may have linear or branched alkyl which may have substituent, and substituent, organic group containing polyether chain, or organic group containing polyester chain;R5=1-4C alkyl by which one part or all part of H, F or H may be substituted with F;R6=fluorinated alkyl;R19=trivalent hydrocarbon group;R20=fluorinated alkyl; andz=1-30.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The gas filter comprises carbon monoxidee, and nonaromatic anhydride selected from carbon dioxide or carbonyl sulfide. The gas filter comprises methyl ether, hydrogen sulfide, nitrous oxide, nitric oxide, sulfur dioxide, ozone gas, pentafluoroethane, deuterium oxide, phosphine, silane, tetrafluoro, boron trifluoride or diborane.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The gas filter comprises non-aromatic hydrocarbon selected from methane, ethane, propane, butane, 2-Methylpropane, ethyene, propene, 1-Butene, cis-2-Butene, trans-2-Butene, allene, 2-methylpropene, or Cyclopropane. The gas filter comprises nonaromatic halogenated hydrocarbon selected from hydrogen chloride, hydrogen bromide, chloromethane, bromomethane, 1,1-Difluoroethane, trifluoromethane, chlorodifluoromethane, carbon tetrafluoride, dichlorodifluoromethane, bromotrifluoromethane, hexafluoroethane or Chlorotrifluoroethylene. The gas filter comprises ammonia and nonaromatic amine selected from dimethylamine or trimethylamine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Content of graphene oxide suspension is 0.5-5 wt.%. Volume ratio of graphene oxide suspension and microbial fuel cell anolyte is 1:1-20. Microbial fuel cell anolyte is made of 2 g/L glucose, 3.13 g/L sodium bicarbonate, 0.31 g/L ammonium chloride, 4.97 g/L monosodium phosphate, 0.56 g/L ammonium sulfate, 0.13 g/L chlorine, 15 mg/L calcium chloride, 20 mg/L manganese sulfate monohydrate, 1 mg/L ferric chloride, 6.93 g/L anhydrous disodium phosphate and 0.2 g/L magnesium sulfate. Microbial fuel cell catholyte is composed of 16.5 g/L potassium ferricyanide, 0.4 g/L sodium dihydrogen phosphate dihydrate and 6.0 g/L sodium dihydrogen phosphate dodecahydrate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: Concentration of dilute hydrochloric acid is 0.l-5 mol/L. Preferred Method: Nitrogen is infused at 25-35 degrees C for greater than or equal to 20 minutes. Drying is carried out by vacuum drying at 25-100 degrees C for 2-48 hours or freeze-drying at - 20-80 degrees C for 8-10 hours with vacuum degree of less than or equal to 160 Pa.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The cathode is stainless steel, iron, aluminum, copper, lead metal conductive material, or conductive ceramics. The anode uses carbon felt, carbon paper, carbon cloth, amorphous carbon fiber, or activated carbon.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: A medium is fed into the reactor and then removed again during opening the reactor. The supply of the medium is carried out via a sight glass, and the medium is discharged again through exhaust ports or a second sight glass. Preferred Components: The reactor is opened by raising a reactor dome over a base plate. The reactor is opened such that the sight glass is opened. The reactor is opened by opening flange, supply gas and exhaust pipes. Air or individual components, nitrogen, moisture, argon and helium are fed to the medium singly or in combination. The fed and discharged gases are monitored for discharging the components resulting from abreaction of bells covering.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Melting treatment is performed by melting at 1550-1570 degrees C, preferably 1560 degrees C with heat insulation cage lifting rate of 5-7 cm/hour, preferably 6 cm/hour for 0.5-1.5 hours, preferably 1 hour and melting at constant temperature while heat insulation cage position for 9.5-10.5 hours, preferably 10 hours. Crystal-growth processing is performed at 1450-1470 degrees C, preferably 1460 degrees C with heat insulation cage lifting rate of 16-20 cm/hour, preferably 18 cm/hour for 15-25 minutes, preferably 20 minutes.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Graphite sheet has rectangular shape, and graphite carbon felt. Preferred Parameters: Graphite sheet has thickness of 5 mm. Outer edge of outermost graphite sheet is flush with edge of graphite bottom plate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The titanium boride particles have maximum length of 5-50 nm in short axis direction, and 30-100 nm in major axis direction. The average aspect ratio of rod-shaped titanium boride particles is 1.5-6. Standard deviation of maximum length of rod-shaped titanium boride particles in short axis direction is 10 nm or less, and in major axis direction is 25 nm or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Definitions:    R41-R46 = 25-50C alkyl.    SPECIFIC COMPOUNDS - 18 Compounds of (I) are specifically claimed e.g. 1-(5-methyl-2-thienyl)-4-(5-(5-(2-(5-methyl-2-thienyl)ethynyl)-2-thienyl)-2-thienyl)-2,5-bis(2-pentadecylnonadecyl)pyrrolo(3,4-c)pyrrole-3,6-dione of formula (Ia), 1-(5-methyl-2-thienyl)-2,5-bis(2-pentadecylnonadecyl)-4-(5-(4-(2-(p-tolyl)ethynyl)phenyl)-2-thienyl)pyrrolo(3,4-c)pyrrole-3,6-dione, 1-(5-methyl-2-thienyl)-4-(5-(5-(2-(5-methyl-3-tridecyl-2-thienyl)ethynyl)-4-tridecyl-2-thienyl)-2-thienyl)-2,5-bis(2-pentadecylnonadecyl)pyrrolo(3,4-c)pyrrole-3,6-dione, 1-(5-methyl-2-thienyl)-2-(2-pentadecylnonadecyl)-4-(5-(5-(2-(p-tolyl)ethynyl)-2-thienyl)-2-thienyl)-5-(2-undecylheptadecyl)pyrrolo(3,4-c)pyrrole-3,6-dione, and 1-(5-methyl-2-thienyl)-4-(5-(5-(2-(5-methyl-2-thienyl)ethynyl)-2-thienyl)-2-thienyl)-5-(2-undecylheptadecyl)-2-(7-undecylicosyl)pyrrolo(3,4-c)pyrrole-3,6-dione.    n = 1-1000.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Disclosed): 2-Hydroxyalkyl imidazole compound of formula (IV) and halogenated (meth)acryloyl compound of formula (V) are reacted under coexistence of a base in a solvent to obtain intermediate imidazole compound of formula (VI). Then the intermediate imidazole compound of formula (VI) is reacted with a base in a solvent to obtain imidazole (meth)acrylate compound of formula (I).X=F, Cl, Br or I. EXAMPLE - 3.92 g 2-Hydroxymethyl imidazole, 8.91 g triethylamine and 80 ml tetrahydrofuran were taken in a 100 ml round bottom flask and reaction liquid was prepared. Then the reaction liquid was cooled to 0 degrees C. Then 9.20 g methacryloyl chloride was dripped in the reaction liquid and stirred for 2 hours. Then triethylamine hydrochloride was precipitated at room temperature, which was filtered off. Then filtrate was concentrated and mixed with 80 ml water. Then 7.39g sodium bicarbonate was added and stirred at room temperature for 15 hours. Then extraction process was carried out by adding 50 ml ethyl acetate 3 times, mixing and concentrating extracts to obtain 2.31 g (yield 35%) white crystals of 2-methacryloyloxy methylimidazole.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The surface roughness of the carbonaceous base material is adjusted to 0.5-7 mu m, where the average roughness is calculated by JIS B 0601-2001. The peak intensity ratios I (002)/I (100) calculated from peak intensity I (002) to which the pyrolytic boron nitride coating membrane originates in a crystal plane (002), and peak intensity I (100) derived from a crystal plane (100), are 10-500. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The element (A) is chosen from silver and copper and element (B') is chosen from gallium, aluminum and indium. The AB'O2-type complex oxide is silver-gallium oxide (AgGaO2), preferably ( beta )-AgGaO2 having ( beta )-NaFeO2 type structure. The wavelength conversion material contains core particles of compound formula (I), in which shell particles are formed by LiGaO2. Preferred Properties: The band gap of semiconductor material is 2.5-3.3 eV. The wavelength conversion material has excitation end wavelength of 380-500 nm, and luminescence peak wavelength of 400-1100 nm. Preferred Structure: The wavelength conversion material has wurtzite type superstructure in stable phase or metastable phase.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent comprises methanol, carbon tetrachloride, chloroform, tetrahydrofuran, dichloromethane, 1,2-dichloroethane, toluene, 1,4-dioxane, hexane, heptane and isopropanol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The method further comprises drying the grafted polymer film. The reaction is carried out at 50-70 degrees C for 1-48 hours. The sulfonated reaction step comprises reacting the grafted polymer membrane with thiourea solution and oxidizing the polymer membrane. Preferred Components: The radiation is an electronic beam, an ion beam or a gamma -ray. A total exposure of radiation is 1-300 kGy. The polymer membrane comprises tetrafluoroethylene-hexafluoropropylene, perfluoroalkyl vinyl ether, ethylene tetrafloroethylene, polyvinylidene fluoride, PTFE, polyethylene, polypropylene, polyether-ether-ketone, polysulfone, polyethersulfone, polyimide, or polybenzyl imidazole. The polyvinyl chloride benzyl monomer or polyvinyl chloride benzyl monomer solution comprises 20-90 vol.% of solvent and 0.01-0.5 vol.% of acrylamide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The protective film is acid resistance. The etching liquid contains 10-35% hydrofluoric acid. The barrier layer comprises nickel, chromium, titanium, tungsten, nickel, chromium, nickel tungsten, titanium tungsten, nickel molybdenum and cobalt.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The variation of distance between the adjacent extreme values in a carbon distribution curve of barrier layer is preferably 0.4-0.7.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The semiconductor quantum dot contains lead sulfide, lead selenide, indium nitride, indium arsenide, indium antimonite and/or indium phosphide, preferably lead sulfide or indium phosphide. Preferred Property: The semiconductor quantum dot has average particle diameter of 2-15 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ligand is chosen from 3-mercapto-1-propanol, thioglycolic acid and their derivative. The carbon number of principal chain in primary ligand is 6 or more. Preferred Process: The ligand (I) or (III) combines with metal atom in the semiconductor quantum dot to form 5-membered ring chelate. During formation of aggregate of semiconductor quantum dot, ligand-exchange process is performed for 2 times or more. Preferred Property: The complex stability constant (log ( beta )1) between ligand and metal atom of the semiconductor quantum dot is eight or more based on complex stability law. Preferred Definitions:    A1,B1,A2,B2,A3=H.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Conditions: The processes (S1-S3) are performed under inert gas atmosphere. The processes (S1 and S2) use a pH control substance.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Components: The microwave heating device further has a metal mesh-shaped filter (110) between the gas detection apparatus and the exhaust port of the container, and a gas analyzing apparatus (100) which controls the flow-volume of oxygen-containing-type gas based on signal. The sample stand comprises a component coated by quartz or a silicon oxide film. The sample stand has fin for stirring the silicon mixed powder. Preferred Process: The concentration of carbon-containing gas from the emitted gas is measured using the gas analyzing apparatus by infrared rays absorption. The gas emitted by heating the silicon mixed powder is detected and end point of a process is decided. The flow volume of the gas is measured based on signal by infrared rays absorption, in impurity removal method.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The surface of the substrate is smooth. Average height of surface convex portion which is surface of the substrate having texture containing corrugation is 100 nm or more. Preferred Composition: The number of dust having particle size of 0.5 mu m or more in the substrate under ambient environment is 0.1 dust/ft3 or more.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The silane compound is low-molecular weight compound(s) chosen from cyclopentasilane, cyclohexasilane, silyl cyclopentasilane and neopenta silane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of metal oxide particles is 20-70 %mass, with respect to total solid content of composition. The metal oxide particles contain silica, titania or alumina. The coating composition further contains dispersion aid(s), and compound(s) (C2) of element (E) chosen from silicon, aluminum, germanium, boron, antimony, bismuth, phosphorus and arsenic in dissolved or dispersed form. The content of element (E) with respect to total solid content of the coating composition is 0.1-20 %mass. Preferred Property: The metal oxide particles have particle size of 20 nm or more, or 1 mu m or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The compound (C2) contains oxide, chloride, nitrate, acetylacetonate, salt or naphtenate of fatty acid.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The oxygen-reducing catalyst coating is comprised of nanoparticles, where each nanoparticle is comprised of the oxygen reducing catalyst. The calcium doped lanthanum cerate has a structure of formula (La(1.95)Ca(0.05)Ce2O7). The pores have an average pore size of greater than 0.3 mu m. The oxygen-reducing catalyst coating is a discontinuous film. The cathode has a first interfacial resistance less than or equal to 0.45 Omega cm2 at 650 degrees C and has a second interfacial resistance less than or equal to 0.074 Omega cm2 at 750 degrees C. The value of x and y is less than 0, such that the mixed ionic-electronic conductor is lanthanum strontium cobalt ferrite. The oxygen reducing catalyst is lanthanum strontium manganite.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The wavelength conversion nanoparticles are wavelength conversion nanoparticles which doped the metal ion used as the luminescent center which generates the light of a specific wavelength to the inorganic nanoparticles.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The network structure comprises organic substance. The organic substance is a photopolymerizable monomer. The photopolymerizable monomer is an acrylate monomer. The organic substance has a disulfide structure. The organic substance having disulfide structure is an octadecyl disulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The insulating layer is selected from layers of silicon dioxide, silicon nitride, silicon oxynitride, tantalum pentoxide and aluminum oxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The resin which forms the primer layer (6) and an insulating layer (9), has a crosslinkable functional group. The crosslinkable functional group is chosen from methylol amide group and alkoxy methylamide group.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The insulating layer (8) contains resin chosen from urethane resin (d1), vinyl resin (d2) and urethane-vinyl composite resin (d3). The urethane-vinyl composite resin (d3) is composite resin comprises shell layer which is urethane resin (d3-1), and core layer which is vinyl resin (d3-2). The primer layer (B) contains urethane resin (b1), vinyl resin (b2), and urethane-vinyl composite resin (b3). The urethane resins (d3-1) and (b3-1) contain 2000-5500 mmol/kg aliphatic cyclic structure.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The surface pressure shrinkage-stress value of main surface is preferably 550-800 MPa. The thickness of plate thickness direction of compressive-stress layer in main surface is preferably 20-45 mu m. The concentric-circle bending strength of cover plate is preferably 70 kgf or more. The glass plate has internal tensile-stress value of 10-60 MPa. The area of main surface of cover glass is 1 m2 or more. The plate thickness of cover plate is preferably less than 1 mm. Preferred Composition: The glass plate comprises 5-20 mol% silica, 56-75 mol% alumina, 0-14 mol% magnesium oxide, 0-5 mol% zirconia, 0-5 mol% calcium oxide, 8-22 mol% sodium oxide and 0-10 mol% potassium oxide, based on oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of nano electrocatalyst comprises (1) adding multi-walled carbon nanotube (MWCNT), concentrated sulfuric acid and concentrated nitric acid to form a mixture, heating the mixture at 60 degrees C to reflux, centrifuging the obtained product and then washing with pure water to neutralize, drying the neutralized product at 60 degrees C under vacuum condition and then acidification, (2) mixing 8.9 pts. wt. palladium(II) chloride, 0-2.8 pts. wt. tin(II) chloride dihydrate and 0-3 pts. wt. nickel(II) chloride hexahydrate in ethylene glycol and water mixed solution, stirring the mixture, dissolving 30 pts. wt. acidified MWCNT, carrying out ultrasonic treatment for 30 minutes to obtain a black mixture, where the ethylene glycol and water are mixed in the ratio of 3:1, and (3) mixing sodium borohydride and ethylene in the ratio of 0.5:12 and then dissolving in ethylene glycol, adding the mixture solution to the black mixture by dropwise, stirring the mixture for 4 hours, filtering the obtained product and then washing with ultrapure water to neutralize, drying the neutralized product at 40 degrees C under vacuum for 10 hours.
TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): An unsaturated compound of formula (II) or (III) is reacted with epoxidation agent, to obtain epoxy resin (I). EXAMPLE - 134 g Trimethylol-propane, 1863 g 4-vinyl cyclohexene-1-oxide and 31 g of boron trifluoride etherate were mixed at 60 degrees C, and reacted until the conversion ratio of 4-vinyl cyclohexene-1-oxide becomes 98% or more. 550 g Obtained product having hydroxyl value of 79.3 mg potassium hydroxide/g and 101 g acetic anhydride were mixed at 110 degrees C, reacted until the quantity of acetic anhydride becomes less than 1%, and terminal modification was carried out. 575 g Obtained reaction product and 370 g peracetic acid were reacted in 1700 g ethyl acetate at 60-65 degrees C for 6 hours, and solvent was removed at 120 degrees C, to obtain epoxy resin in the form of viscous transparent liquid having epoxy equivalent of 177.3, and softening point of 59 degrees C.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The negative electrode comprises silicon and silicon-based alloy which are silicon oxide (SiOa, where a is more than 0-less than 2), and does not contain binder and electroconductive material.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The compound having isocyanate group is hexamethylene diisocyanate. The nonaqueous electrolyte further contains compound having nitrile group which is adiponitrile. The nonaqueous electrolyte comprises ethylene carbonate, propylene carbonate, dimethyl carbonate, diethyl carbonate and/or methyl ethyl carbonate, and lithium hexafluorophosphate, lithium tetrafluoroborate, lithium bis(trifluoromethane sulfonyl)imide, lithium bis(perfluoroethyl sulfonyl)imide and/or lithium bis(oxalate)borate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The amine salt is organic acid amine salt, and carbonic acid amine salt, and comprises amino compound having 2 or more amino groups. The solvent is water. Preferred Condition: The heating process is carried out at 180 degrees C or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred System: The substrate comprises dielectric material layer and/or semiconductive material layer; or silicon oxide layer; or wafer of monocrystalline silicon. The lithography system further comprises reactive ion etch plasma chamber.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The additive is selected for an ability to selectively swell the organosilicon block or organic block, thus increasing or decreasing size of feature formed by the method. The etching process involves oxygen reactive ion etching. The structures comprise pores, channels, columns or wires.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The composition (C1) comprises 5-40 wt.% (preferably 10-40 wt.%) of additive. The organic block of block copolymer comprises at least one moiety having hydrogen bond acceptor and organic additive comprising at least one moiety having hydrogen bond donor. The composition (C1) further comprises silicon oxide composition, where the block copolymer forms discrete layer over the silicon oxide composition. Preferred Components: The additive comprises monosaccharide, polyphenol, aromatic polyacid or 2,3-dihydroxybutanedioic acid. The block copolymer comprises poly(ethylene oxide) block, poly(methyl methacrylate) (PMMA) block, poly(4-vinylpyridine) (P4VP) block or P4VP-r-PMMA; and/or polydimethylsiloxane block; or polyol block and siloxane block (preferably polydimethylsiloxane block); and has molecular weight less than 4 kg/mol. EXAMPLE - No suitable example is given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The anionic surfactant is sodium dodecyl sulfate, sodium dodecyl sulfonate and/or sodium dodecyl benzene sulfonate. The water-soluble initiator is 4,4'-azobis(4-cyanovaleric acid), potassium persulfate, ammonium persulfate or sodium persulfate. The obtained polymer emulsion is demulsified by adding into solvent. The solvent is anhydrous methanol, aqueous sodium chloride solution with concentration of 10-20%, or aqueous hydrochloric acid solution with concentration of 0.5-10%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The organic acid is citric acid, oxalic acid, lactic acid, malonic acid or acetic acid. The organic amine is ethylene diamine or propylene diamine. Preferred Composition: The mole ratio of nitrogen source and carbon source is 1-3:1-3. Preferred Method: Dissolution in water is done at 50-100 degrees C. Precipitation is done by allowing to stand at 0-15 degrees C. Calcination is done under inert atmosphere and heating rate of 2-10 degrees C/minute at 300-1000 degrees C for 0.5-4 hours.
TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): The copolymer (I) is prepared by:(A) in inert gas atmosphere, adding 4,4'-dibromo-6,6'-diiodo-2,1,3-benzothiadiazole, an alkyne compound, a catalyst 1, and alkali into solvent 1, and reacting at 130 degrees C for 4 hours to obtain reaction product 1;(B) adding dibromo-tetrahydrobenzo-difuran compound into solvent 2 at - 78 degrees C, adding butyllithium and reacting for 2 hours, then adding tributyltin chloride and reacting at - 78 degrees C for 1 hour, raising temperature to room temperature and continuously reacting for 6 hours, and then purifying by neutral alumina column chromatography to obtain reaction product 2; and(C) in inert gas atmosphere, adding reaction product 1, reaction product 2 and catalyst 2 into solvent 2, and reacting at 50-120 degrees C for 6-100 hours to obtain the copolymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The electrolyte film of the battery comprises cerium-samarium oxide of formula: Ce1-xSmxO2-e, cerium-gadolinium oxide of formula: Ce1-xGdxO2-e, zirconium-yttrium oxide of formula: Zr1-xYxO2-e, and/or zirconium-scandium oxide of formula: Zr1-xScxO2-e, where e is greater than -0.5 and less than 0.5.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compounds: The electrode layer is formed using the complex oxide and an organic compound chosen from ethanol, terpineol, n-propanol, acetone, polymethylmethacrylate, polyvinyl alcohol, polyvinyl butyral, ethyl cellulose, and starch.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Water-soluble organic solvent is an aprotic polar solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Film forming stock solution contains less than or equal to 50 wt.% water-soluble polyalkylene glycol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The membrane reactor comprises serially or parallely arranged separation films. The membrane reactor further comprises another separation film for separating other chemical species including silane tetrachloride. The silane tetrachloride separation film is a ceramic membrane made of silica or zirconia. The membrane reactor is operated at a temperature of 40-120 degrees C, and at a pressure of 1-100 bar. A vacuum system is connected with the membrane reactor to generate the monosilane. The monosilane moved to an outlet part of the membrane reactor is transferred to a purifying column or a storage tank.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The separation film is a polymer film made of polysulfone, polysulfide, polyimide, polypropylene, polyester, polyvinyl, PTFE and polydimethylsiloxane. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The conductive polymer has proton-acid anion chosen from inorganic acid anion, aliphatic sulfonate anion, aromatic sulfonate anion, polymer sulfonate anion, and polyvinyl sulphate anion, as a dopant. The polymer contained in the conductive polymer is chosen from polyaniline, polyaniline derivative, polypyrrole, and polypyrrole derivative. The phosphorus-containing polymer is chosen from polyphosphone acid, polyphosphoric acid, and their metal salts. The polyphosphone acid is chosen from polyvinyl phosphonic acid, aromatic phosphonic acid polymer, and copolymer containing 2 or more repeating units of polyvinyl phosphonic acid, aromatic phosphonic acid polymer. The polyphosphone acid metal salt is polyphosphone acid alkali metal salt and/or polyphosphone acid alkaline-earth metal salt.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The conductive polymer has proton-acid anion chosen from inorganic acid anion, aliphatic sulfonate anion, aromatic sulfonate anion, polymer sulfonate anion, and polyvinyl sulphate anion, as a dopant. The polymer contained in the conductive polymer is polyaniline or its derivative. The polysulfonic acid is chosen from polystyrene sulfonate, polyvinyl sulfonic acid, polyallyl sulfonic acid, phenolsulfonic-acid novolak resin, poly-2-acrylamide- 2-methylpropanesulfonic acid, polyvinyl sulfuric acid, polymethacryl sulfonic acid, and copolymer containing 2 or more repeating units of polystyrene sulfonate, polyvinyl sulfonic acid, polyallyl sulfonic acid, phenolsulfonic-acid novolak resin, poly-2-acrylamide-2-methylpropanesulfonic acid, polyvinyl sulfuric acid, polymethacryl sulfonic acid. The polysulfonic acid metal salt is polysulfonic acid alkali metal salt and/or polysulfonic acid alkaline-earth metal salt.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive resin layers (A and B')comprise thermoplastic resin. The thermoplastic resin is polyolefin resin or polyester-based resin. The polyolefin resin comprises acid-modified polyolefin-based resin and silane modification polyolefin resin. The cycloolefin-type resin is chosen from cycloolefin polymers of formulae (I)-(IV).R1,R2=H or alkyl;or R1+R2=ring;andm,n=1 or more.Preferred Properties: The cycloolefin-type resin has glass transition temperature of 20-150 degrees C, and does not have a hydrophilic group. An adhesive force during adhesion of adhesive resin layer (A) in the film-form sealing material or a adhesive resin layer (B') to a glass plate is 1 N/25 mm or more at 120 degrees C. The film-form sealing material has water vapor permeation rate of 7 g/m2x day or less at 40 degrees C with relative humidity of 90% when thickness of the film-form sealing material is 50 mu m. The water vapor barrier resin layer has thickness ratio of 10-99% with respect to thickness of film-form sealing material. The adhesive resin layers are directly laminated on the water vapor barrier resin layer having 3 layer structure.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The surfactant is a reactive surface active agent which does not contain oxyalkylene repeating unit. The content of surfactant is 0.1-30 pts. wt. with respect to 100 pts. wt. monomer components comprising (meth)acrylic-type polymer. The monomer component further contains 1-8 pts. wt. carboxyl group-containing monomer with respect to 100 pts. wt. alkyl (meth)acrylate. The carboxyl group-containing monomer has 4-14C alkyl group. The aqueous dispersion-type adhesive composition further contains water-soluble basic component and phosphate ester type compound. The water-soluble basic component is ammonia. The phosphate ester type compound is non-polymerizable compound. The content of phosphate ester type compound is 0.005-5 pts. wt. with respect to 100 pts. wt. monomer components comprising (meth)acrylic-type polymer. The content of water-soluble basic-component is 1000 ng or less per cm2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The polyester resin composition further contains layered inorganic compound having non-swelling property with respect to water. The layered inorganic compound contains particles with average particle diameter of 0.1 mu m or more. The content of layered inorganic compound is 5-50 parts mass with respect to 100 parts mass total content of polyester polyol, hardening agent and inorganic compound.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of glycerol residue of polyester polyol (I) in resin composition is 5 %mass or more. The hardening agent is isocyanate compound. The isocyanate compound is toluene diisocyanate, xylene diisocyanate, diphenylmethane diisocyanate, polymethylene polyphenyl polyisocyanate, reaction product of polyhydric alcohol having 2 or more hydroxyl groups and toluene diisocyanate or xylene diisocyanate, or isocyanate compound obtained by hydrogenation reaction of toluene diisocyanate, xylene diisocyanate, diphenylmethane diisocyanate or polymethylene polyphenyl polyisocyanate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The thickness of the porous film is 55-300 mu m. Preferred Components: The conductive polymer is a polymer having proton-acid anion including inorganic acid anion, aliphatic sulfonate anion, aromatic sulfonate anion, polymer sulfonate anion, and polyvinyl sulfate anion, as dopant. The conductive polymer is a conductive polymer of dopant state. The conductive polymer is at least one of polyaniline and polyaniline derivative. The polycarboxylic acid is chosen from polyacrylic acid, polymethacrylic acid, polyvinyl benzoic acid, polyallyl benzoic acid, poly methallyl benzoic acid, polymaleic acid, poly fumaric acid, poly glutamic acid, poly(aspartic acid), alginic acid, carboxymethylcellulose, and copolymer containing at least one of repeating unit of these polymers. The polycarboxylic acid metal salt is at least one of polycarboxylic acid alkali metal salt and polycarboxylic acid alkaline-earth metal salt.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The nitrogen source is organic nitrogen compound.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The hydrocarbon is acetylene. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The imide-silicone copolymer is of formulae (I)-(IV), and has imide group of formulae (-(Si((R21)(R22))-(O-Si((R23)(R24)))n)-) (V) attached to the main chain of silicone prepolymer. The reinforcing material is glass fiber, glass fiber cloth, glass fabric, glass nonwoven fabric or fiber glass mesh. Difference of the refractive index of the imide-silicone copolymer composition and the reinforcing material is less than or equal to 0.01. The reinforcing material is present in an amount of 70-95 wt.%. The imide-silicone copolymer composition is present in an amount of 5-30 wt.%. The composite sheet has transmittance haze of more than 85%, wavelength of 550 nm and thermal decomposition temperature of greater than or equal to 350 degrees C.R21-R24 = H, 1-5C alkyl or 6-20C aryl;n = 1-30; andR1 = tetravalent group of formulae (a)-(c), preferably 1,2,4,5-tetramethylbenzene moiety, bis(3,4-dimethylphenyl)methanone moiety, 4-(3,4-dimethylphenyl)-1,2-dimethyl-benzene moiety, 4-(3,4-dimethylphenoxy)-1,2-dimethyl-benzene moiety, 4-(3,4-dimethylphenyl)sulfonyl-1,2-dimethyl-benzene moiety or 4-(1-(3,4-dimethylphenyl)-2,2,2-trifluoro-1-(trifluoromethyl)ethyl)-1,2-dimethyl-benzene moiety;R2, R3 = linear or branched 1-10C alkylene group or 6-20C monocyclic heterocyclic ring or cycloalkylene group;R2 = 1-3C alkylene, preferably 1,3-dimethyl-cyclohexane, 1,4-dimethyl-cyclohexane, 2,6-dimethyl-bicyclo(2.2.1)heptane, 2,5-dimethyl-bicyclo(2.2.1)heptane or 2,5,7-Trimethyl-bicyclo(2.2.1)heptane;Z = single bond, -O-, -S-, -SO2-, -(C=O)-, linear or branched 1-10C alkylene or halo;R11, R14 = halo or linear or branched 1-10C alkyl; andm1, m2 = 1-5.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The ratio of the tricyclo alkane structure in resin composition is 10-50 %mass. The polyol is polyester polyol with which tricyclo alkane and polyhydric carboxylic acid which have hydroxyl group or its acid anhydride, and polyhydric alcohol are made to react. The hardening agent is isocyanate compound. The isocyanate compound is reaction product of meta xylene diisocyanate or meta xylene diisocyanate. The polyhydric alcohol has at least 2 or more hydroxyl group in molecule. The isocyanate compound is a reaction product of the polyester polyol and isocyanate which comprise tricyclo alkane or tricyclo alkane which has at least 2 or more hydroxyl group in molecule. The tricyclo alkane is tricyclodecane. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alicyclic diamine compound is chosen from 4-((4-aminocyclohexyl)methyl)cyclohexan-1-amine, (3-(aminomethyl)cyclohexyl)methanamine, 4-((4-amino-3-methylcyclohexyl)methyl)-2-methylcyclohexan-1-amine, 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine and diamine compounds of formulae (II) or (III).    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The polyimide molded product is in a form of film or sheet, and has glass transition temperature of 250 degrees C or more, total light transmittance of 85% or more and linear expansion coefficient of 60 ppm/K or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The oxygen absorbing/desorbing material comprises a tetraphenylporphyrin-metal complex, tetrapivaloyl phenylporphyrin-cobalt complex or a diisophthalimide tetraphenylporphyrin-cobalt complex. The ligand having an electron donating property comprises: an amine, imine, imidazole, or ether; or nitrogen-containing organic ligand. The electrolytic solution further comprises a support salt, where the support salt comprises at least one of lithium bis(trifluoromethanesulfonyl)imide or lithium bis(pentafluoroethanesulfonyl)imide. The negative active material is lithium metal.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The oxygen absorbing/desorbing material is a tetraphenylporphyrin derivative comprising a first axial position and a second axial position, and further comprises a ligand having an electron donating property, coordinated at the first axial position and a pivaloyl group bonded in a direction toward the second axial position. The oxygen absorbing/desorbing material is a tetraphenylporphyrin derivative to which an oxygen molecule is coordinated at the second axial position. The oxygen absorbing/desorbing material is present at 0.1-3 pts. wt. based on 100 pts. wt. of the solvent. The solvent is a non-aqueous organic solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inert gas is nitrogen or argon.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The phenol solvent is m-cresol, phenol, cresol and/or chlorophenol. The protonated protection agent is triethylamine, tributylamine, pyridine or pyrrole. The catalyst is benzoic acid, quinoline or isoquinoline. The organic solvent is m-cresol, phenol, mixed cresol, chlorophenol and/or N-methylpyrrolidone. The sulfonated diamine is chosen from 16 compounds e.g. 3-4-diaminobenzenesulfonamide, 4,4'-diaminodiphenyl-2,2'-disulfonic acid, 4,4'-diaminodiphenyl ether-2,2'-disulfonic acid, 3,4'-diaminodiphenyl ether-2,3'-disulfonic acid and 4,4'-diamino-2,2"-dimethyldiphenyl-2,2'-disulfonic acid. The non-sulfonated diamine is chosen from 16 compounds e.g. 4'-diaminodiphenyl methane, 4,4'-diamino-3,3'-dimethyldiphenyl methane, 4,4'-diamino-2,2',3,3'-dimethyldiphenyl methane, M-phenylenediamine and 2,6-diamino-1,5-xylene. The dianhydride is chosen from 15 compounds e.g. 1,3,5,8-naphthalene tetracarboxylic dianhydride, pyromellitic dianhydride, 3,4,9,10-perylene tetracarboxylic acid dianhydride, 4,4'-(hexafluoro propylene)diphthalic anhydride and 3,3',4,4'-biphenyl tetracarboxylic acid dianhydride. The tetramine is chosen from 3,3'-diaminobenzidine, 3,3,4,4'-tetraamino diphenylether, 3,3,4,4'-diaminodiphenyl sulfone, 3,3',4,4'-diaminobenzophenone, 3,3',4,4'-diamino benzophenone, 1,2,4,5-tetraamino benzene and 1,2,5,6-tetraamino naphthalene. The acid is chosen from 14 acids e.g. m-phthalic acid, terephthalic acid, adipic acid, suberic acid and sebacic acid. The blocking agent is para-aminobenzoic acid, amino acid, 3-fluoro-4-aminobenzoic acid, 3-nitropropionic-4-amino acid or aminosalicylate.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The barrier layer (b2) further contains compound chosen from polysilazane, alcohol compound, phenolic compound, metal alkoxide compound, alkylamine compound, alcohol modified polysiloxane, alkoxy modified polysiloxane and alkylamino modified polysiloxane. Preferred Property: In barrier layer (b2), the difference of average value of abundance ratio of oxygen atoms to silicon atoms in region where depth is 10 nm or more from outermost surface, and average value of abundance ratio of oxygen atoms to silicon atoms in region where depth is 10 nm or less from outermost surface is 0.4 or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The microparticles comprise silica. The weight ratio of silicon oxide component contained in the binder with respect to silicon oxide component contained in the microparticles is 3:10-97:90 based on silica. The low-reflection coating further comprises 2-6 pts. wt. zirconium oxide, 3-8 wt.% titanium oxide and 0-7 pts. wt. zinc oxide. The sum of content of zirconium oxide, titanium oxide and zinc oxide is 5-17 pts. wt. with respect to 100 pts. wt. of total content of silicon oxide component contained in the microparticles and silicon oxide component contained in the binder.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The organic solvent (D) has blanket-swelling ratio of 5-20%. The electroconductive paste has viscosity of 2-5 Pa.second at shear rate 1 second-1, and viscosity of 100 Pa.second or less at share rate of 100 second-1. Preferred Composition: The electroconductive paste further comprises organic compound containing at least 1 functional group chosen from phosphoric acid group, phosphate radical, and phosphate ester group. The organic compound (B) does not contain inorganic binder, which is melted at decomposition temperature and less than melting point of the electroconductive metal particles which binds the electroconductive metal particles and to-be-printed material.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The organic compound (B) comprises thermoplastic resin containing hydroxyl group. The organic compound (C) contains block polyisocyanate compound and polyfunctional epoxy-compound, and/or polymeric polyol compound. The to-be-printed material is transparent conductive film formed using polyethylene terephthalate film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanoparticles are silica, zinc iodide, alumina, titania, magnesium oxide and/or calcium oxide nanoparticles. The molten salt system is nitrate molten salt system or carbonate molten salt system. The nitrate molten salt system is binary nitrate molten salt system, ternary nitrate molten salt system or multi-component nitrate molten salt system. The content of nanoparticles in the heat-transfer and heat-storage medium is 1-5 wt.%. The binary nitrate molten salt system is potassium nitrate-sodium nitrate system containing 20-40 pts. wt. potassium nitrate and 60-80 pts. wt. sodium nitrate, or potassium nitrate-sodium nitrite system containing 30-60 pts. wt. potassium nitrate and 40-70 pts. wt. sodium nitrite. The nitrate molten salt system is ternary nitrate molten salt system containing 20-60 pts. wt. potassium nitrate, 8-20 pts. wt. sodium nitrate and 1-5 pts. wt. sodium nitrite. The nitrate molten salt system is a multi-component nitrate molten salt system containing 20-60 %mass potassium nitrate, 10-20 %mass sodium nitrate, 10-50 %mass sodium nitrite and 5-10 %mass cesium nitrate. The molten salt system is the carbonate molten salt system containing 30-60 pts. wt. potassium carbonate, 20-50 pts. wt. sodium carbonate, 10-30 pts. wt. lithium carbonate and 3-10 pts. wt. sodium chloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of copper nanoparticles is 5-50 wt.% with respect to total weight. The content of copper particles having size of 20-100 nm is 0.1-40 wt.%. The content of copper particles having size of 10-30 nm is 10-60 mol%. The fluorine salt is chosen from sodium fluoride, iron fluoride, potassium fluoride or zinc fluoride. The chlorine salt is chosen from sodium chloride, ferric chloride, potassium chloride, or zinc chloride.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The thermoplastic resin is chosen from polyethylene terephthalate, polylactic acid, polyethylene, polypropylene, polycarbonate, polyamide, polymethylmethacrylate and polyvinylchloride. Preferred Definitions:    M=S, F, or Cl.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Components: The average sodium concentration in surface of the glass board material in a depth of 10-40 nm is 0.3 or more relative value with respect to the sodium concentration in a depth of 4000 nm. The strain point of a glass board material is 520 degrees C or more.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The organic electroluminescent device contains cathode, anode and at least one organic layer comprising (I) or their oligomers, polymers or dendrimers.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) by at least one metal catalyzed coupling reaction and at least one ring-closure reaction. Preferred Definitions:    Ar2 = phenyl (optionally substituted with at least one R2);    Ar1 = phenyl or naphthyl (both optionally substituted with at least one R1); and    R2 = H or D.    SPECIFIC COMPOUNDS - 392 Compounds (I) are disclosed e.g. substituted benzindenofluorene compounds of formulae (Ia)-(Ie).    EXAMPLE - 1.3 mmole of Benzindenofluorene compound of formula (AA), 3 mmole of benzene boronic acid and 4.7 mmole of tripotassium phosphate monohydrate were suspended in a 6 ml solvent mixture of water, toluene and dioxane in a ratio of 1:1:1 and the solution was degassed and saturated with argon. Then 0.14 mmole of tri(o-tolyl) phosphine and 0.05 mmole of palladium(II) acetate were added and the reaction mixture was stirred overnight under protective gas atmosphere and heated to boiling. Then phases were separated, and the aqueous phase was washed with toluene. The organic phase was dried over sodium sulfate and evaporated and the obtained mixture was filtered with toluene and evaporated, and recrystallized to obtain 675 mg (73% yield) of benzindenofluorene compound (Ia) as yellow solid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The carboxylic acid anion is 1-20C saturated aliphatic monocarboxylic-acid anion, 3-20C unsaturated aliphatic monocarboxylic-acid anion, 6-14C saturated alicyclic monocarboxylic-acid anion, 6-14C aromatic monocarboxylic-acid anion, 2-10C saturated hydroxy monocarboxylic-acid anion containing 1-2 hydroxyl groups, 2-20C alkyl ether carboxylic acid anion containing 1-2 ether groups, 3-10C saturated carbonyl monocarboxylic-acid anion containing 1-2 carbonyl groups, 6-14C hydroxy aromatic monocarboxylic-acid anion containing 1-2 hydroxyl groups, 2-10C saturated dicarboxylic acid anion, and/or 4-10C saturated hydroxy di- or tri carboxylic acid anion containing 1-2 hydroxyl groups.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Components: The organic thin film layer further includes a dopant compound, and is interposed between a first electrode and a second electrode in the device. The organic thin film layer includes a light-emitting layer, a hole injection layer, a hole-transport layer, a hole blocking layer, an electron-transport layer, an electron injection layer, and an electron blocking layer. The light-emitting layer emits blue, red, white or green light. SPECIFIC COMPOUNDS - 243 Compounds (Q) are specifically claimed e.g. 3-(4b,8a-dimethyl-9-phenyl-5,6,7,8-tetrahydrocarbazol-3-yl)-9-(3-(4,6-bis(4-(trifluoromethyl)phenyl)-1,3,5-triazin-2-yl)phenyl)carbazole compound of formula (III), 3-(4b,8a-dimethyl-9-(2,3,4,5,6-pentadeuteriophenyl)-5,6,7,8-tetrahydrocarbazol-3-yl)-9-(3-(4,6-bis(4-(trifluoromethyl)phenyl)-1,3,5-triazin-2-yl)phenyl)carbazole, 3-(4b,8a-dimethyl-9-(2-naphthyl)-5,6,7,8-tetrahydrocarbazol-3-yl)-9-(3-(4,6-bis(4-tert-butylphenyl)-1,3,5-triazin-2-yl)phenyl)carbazole, 3-(4b,8a-dimethyl-9-(1-naphthyl)-5,6,7,8-tetrahydrocarbazol-3-yl)-9-(3-(4,6-bis(4-tert-butylphenyl)-1,3,5-triazin-2-yl)phenyl)carbazole, and 3-(4b,8a-dimethyl-9-(9-phenanthryl)-5,6,7,8-tetrahydrocarbazol-3-yl)-9-(3-(4,6-diphenyl-1,3,5-triazin-2-yl)phenyl)carbazole.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The plasma polymer thin film is laminated on upper portion or lower portion of inorganic thin layer. The plasma polymer thin film is manufactured using plasma enhanced chemical vapor deposition. The inorganic thin layer is manufactured using atomic layer deposition using alumina, silica and/or titania.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The zinc oxide is doped with aluminum, boron, gallium (all preferred), indium, yttrium, scandium, fluorine, vanadium, silicon, germanium, titanium, zirconium or hafnium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The diethylzinc is present at 95-99.9 wt.%, preferably 99.5 wt.%. (X) is present at 0.1-5 wt.%, preferably 0.5 wt.%. (X) is acenaphthene. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The used solvent for pitch solution is tetrahydrofuran or tetrahydrofurfuryl alcohol, quinoline or pyridine. The vacuum heating temperature of the pitch-graphite paste is 70-100 degrees C. The step (d) is carried out at 1000-2000 degrees C. The carbon coating layer is formed by carbonization of the pitch. The particle size of the carbon coating layer is less than 2 mu m and porosity is less than 0.1 ml/g. EXAMPLE - 100 g Pitch was stirred with 100 ml tetrahydrofuran at 70 degrees C for 30 minute to obtain pitch solution. The obtained pitch solution was stirred for 30 minute with 1 kg spheroidizing natural graphite powder at vacuum condition to obtain pitch-graphite paste. The obtained pitch-graphite paste was heated at 70 degrees C for 2 hours in a vacuum condition to volatilize solvent. The obtained pitch-graphite paste was dried, and carbonized at 1100 degrees C for 1 hour to obtain the cathode material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The in-situ cleaning process involves exposing the crystalline silicon substrate to hydrogen-containing plasma, oxygen-containing gas, plasma comprising a halogen-containing gas, and argon containing plasma. Preferred Composition: The hydrogen-containing plasma comprises inert gas, and hydrogen-containing gas. The inert gas is argon and/or helium. The hydrogen-containing gas is hydrogen, ammonia and/or methane. The oxygen-containing gas is oxygen, ozone, nitrous oxide, carbon dioxide and/or carbon monoxide. The halogen-containing gas is fluorine, hydrogen fluoride, nitrogen trifluoride, chlorine and/or hydrogen chloride. The hydrogen-containing plasma is capacitively coupled plasma.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The catalyst contains complex oxide, catalytically active component containing zirconium, co-catalyst component including alkali metal, alkaline-earth metal element and/or lanthanoid. The complex oxide contains alkaline-earth metal element and/or rare-earth element. The electroconductivity of the complex oxide is 10-7-10-3 S.cm-1 measured using mixed gas of hydrogen and nitrogen in volume ratio of 3:1 at 200 degrees C. The catalytically active component contains element of group 6-10 in periodic table. The molar ratio of co-catalyst component with respect to catalytically active component is 0.05-3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Production of hydrogen further involves irradiating ultraviolet rays with respect to the hydrogen-substituted mayenite and obtaining conductive mayenite of formula: Ca24Al28O644+x 4e- (III), and reacting the conductive mayenite with water.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Multifunctional compound contains greater than or equal to 3 functional groups selected from hydroxyl group, amino group, thiol group, carboxyl group, and/or silanol group. Preferred Parameters: Average particle diameter of the composite layered double hydroxide is a particulate-form shape of less than or equal to 50 nm. Preferred Definitions:    M=Mg, Ca, Sr, Ba, Mn, Co, Ni, Cu, and/or Zn; and    L=Sc, Y, La, Ce, Pr, Nd, Cr, Fe, Al, Ga, and/or In.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The reaction of hydroxyl group-containing compound (I) and epihalohydrin is carried out in a mixed solution containing epihalohydrin and 1-5C alcohol. The epoxy resin is post-processed in a metal hydroxide aqueous solution containing solution of toluene or ketone compound having carbon number of 4-7. Preferred Component: The epoxy resin composition further contains acid anhydride or polyhydric carboxylic acid as curing agent, transition metal salt, quaternary phosphonium salt, and non-halogen quaternary ammonium salt.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The shape of the copper particles is spherical, flat, or plate shape. Preferred Properties: The mean diameter (D50) of submicron-sized copper particles having median weight in the particle size distribution based on the weight of copper particles is 350-380 nm. The mean diameter (D50) of nano-sized silver particles having median weight in the particle size distribution based on the weight of silver particles is 100 nm or less. The conductive ink composition has a thixotropic index of 4-6. The electrode has a thickness of 10-25 mu m and a linear resistance of 4x 10-5 Omega cm or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The copper particles are surface-treated using a surface treatment agent chosen from triazole compounds, saturated fatty acids, unsaturated fatty acids, inorganic metal compound salts, organic metal compound salts, polyaniline-based resins, and metal alkoxides. Preferred Composition: The organic solvent is hydrocarbon solvents, chlorinated hydrocarbon solvents, cyclic ether solvents, amide solvents, ketone solvents, alcohol or polyhydric alcohol solvents, acetate solvents, polyhydric alcohol ether solvents, and/or terpene solvents. The organic solvent contains butyl acetate and ( alpha )-terpineol, which are mixed in the ratio of 5:5-8:2. The conductive ink composition further contains phosphorus-containing compound, flux, plasticizer, dispersing agent, surfactant, inorganic binder, metal oxide, ceramic material, and/or organic metal compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The binder is cellulose-based resin, polyvinyl chloride resin or its copolymer, polyvinyl alcohol-based resin, polyvinyl pyrrolidone-based resin, acrylic resin, vinyl acetate-acrylate copolymer, butyral resin, alkyd resin, epoxy resin, phenol resin, rosin ester resin, and/or polyester resin, preferably polyester resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mixed metal oxide material comprises less than approximately 15 atomic-% tungsten, preferably between 6 and 11 atomic-% tungsten, more preferably between 7 and 9 atomic-% tungsten. The catalyst comprises between 1 and 20 monolayers (ML) of platinum or platinum alloy. It comprises fewer than about 14 ML of platinum or platinum alloy. Preferred Components: The mixed metal oxide comprises an oxide of titanium doped with tungsten. The titanium oxide is in a crystalline form, preferably the anatase form. The catalyst support is formed as a core particle. The catalyst is applied as a shell on the core particle. Catalyst support is formed as a layer. The catalyst comprises platinum or platinum alloy. Preferred Process: Producing catalytic medium involves forming a catalytic layer of between 1 and 20 ML of platinum or platinum alloy, preferably fewer than about 6 ML. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The vessel comprises a tank (136). In the method: each jet flow agitator comprises an impeller disposed within a shroud; and at least 10%, preferably at least 30% solids of the lignocellulosic material is placed in the vessel.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The method further comprises: distillation of the product, where distillation comprises vacuum distillation; monitoring the glucose level of a mixture (138) of the feedstock, liquid medium and saccharifying agent during saccharification; adding additional feedstock and saccharifying agent during saccharification; monitoring oxygen level in the vessel during fermentation; converting xylose to xylitol; and causing at least one of the jet flow agitator to up pump and at least one other of the jet flow agitators to down pump. The distillation is performed at a vacuum of less than 70 Torr. The distillation is performed at ambient temperature. The step of converting comprises fermentation of the sugar solution, where the sugar solution further comprises xylose. Preferred Components: The feedstock has a bulk density of less than 0.75 g/cm3. The liquid medium contains a saccharifying agent that comprises an enzyme. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The material further comprises 10 wt.% chromium oxide. Sintering of the interconnect materials is performed in ambient environment at temperature below 1000 degrees C. Preferred Properties: The interconnect materials are electrically conducting and magnetic, and produce a distinct rainbow coloration for proving electrical conductivity, where the rainbow coloration arises from the addition of chromium and after subjected to a reducing flame. Surface properties of the materials are also metallic, magnetic and oxidation resistant. The materials are of a low energy gap ranging from 0.1 eV at 600 degrees C to 0.6 eV at 100 degrees C, and are found to be magnetic in a butane flame at 600 degrees C causing the materials to be attracted to cathode and anode which are also magnetic for enhanced contacts and performance of solid oxide fuel cells.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The inert gas atmosphere of UV lamp device is nitrogen atmosphere, argon atmosphere or helium atmosphere.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - One electrically conductive layer is made of copper cyanide sulfide, and the other electrically conductive layer is made of copper cobalt cyanide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Film: The silicon-containing film contains polysilazane.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): An aromatic compound of formula (i) is reacted with hydroxylamine hydrochloride and chloral hydrate, to obtain oxime compound of formula (ii). The oxime compound (ii) is reacted with concentrated hydrochloric acid, to obtain indole derivative of formula (iii). Isatin compound of formula (iiia) is subjected to reduction reaction by reducing ketone carbonyl group to methylene group, to obtain indole derivative of formula (iv). The indole derivative (iii) and indole derivative (iv) are subjected to condensation reaction under acidic or basic conditions, and resultant product is reacted with halo-containing group of formula: R1X (a), or halo-containing group of formula: R1X (a) and R2X (b), to obtain indigo dye (I), or the indole derivative (iii) is reacted with halo-containing group (b) to obtain 1H-indole-2,3-dione of formula (v). The indole derivative (iv) is reacted with halo-containing group (a), 1H-indole-2,3-dione of formula (vi) is obtained, and carbonyl group of resultant product is reduced, to obtain 1,3-dihydro-indol-2-one of formula (vii). The 1H-indole-2,3-dione (v) and 1,3-dihydro-indol-2-one (vii) are subjected to condensation reaction under alkali conditions, to obtain indigo dye (I).X=halo, triflate or tosylate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer (II) is of formula (III)-(VIII). SPECIFIC COMPOUNDS - 3 Indigo dyes i.e. 6-bromo-3-((3E)-6-bromo-7-fluoro-2-oxo-1-(4-tetradecyloctadecyl)-2,3-dihydro-1H-indol-3-ylidene)-7-fluoro-1-(4-tetradecyloctadecyl)-2,3-dihydro-1H-indol-2-one of formula (Ia), 6-bromo-3-((3E)-6-bromo-1-(4-dodecylhexadecyl)-7-fluoro-2-oxo-2,3-dihydro-1H-indol-3-ylidene)-1-(4-dodecylhexadecyl)-7-fluoro-2,3-dihydro-1H-indol-2-one, and 6-bromo-3-((3E)-6-bromo-5-chloro-2-oxo-1-(4-tetradecyloctadecyl)-2,3-dihydro-1H-indol-3-ylidene)-5-chloro-1-(4-tetradecyloctadecyl)-2,3-dihydro-1H-indol-2-one are specifically claimed.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: (I) are included in at least one organic layer comprising a hole transport layer, a hole injection layer, an electron blocking layer and an emitting layer. Preferred Definitions:    Ar1=phenyl, naphthyl, biphenyl, terphenyl, fluorenyl, monobenzofluorenyl, dibenzofluorenyl, spirobifluorenyl, indenofluorenyl, dibenzofuranyl, dibenzothiophenyl or carbazolyl (which are optionally substituted with one or more radicals R1).    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: A substrate is disposed on one side of the transparent thin film, where the substrate is a transparent substrate or an opaque substrate. The material of the transparent substrate is glass, ceramic or polymer-like materials. The material of the opaque substrate is metal or tungsten carbide. The oxide is tin oxide, indium oxide, zirconium oxide, silicon oxide, copper oxide, lead oxide, titanium dioxide, mercury oxide, zinc oxide or barium oxide. The fluoride is a compound containing fluorine, oxygen, and carbon. The atomic percentage of the fluorine atoms of the fluoride in the transparent thin film is 0.2-20 at.%. The oxide is a metal oxide or a nonmetal oxide. The atomic percentage of the metal or the nonmetal atoms of the oxide in the transparent thin film is 0.5-25 at.%. The atomic percentage of the other oxygen or carbon atoms in the transparent thin film is 25-55 at.%. The anti-adhesion transparent thin film further comprises an oxide layer disposed between the transparent thin film and the substrate. The oxide layer is any one of the above oxides. A material of the target is tin, indium, zirconium, silicon, copper, lead, titanium, mercury, zinc or barium. The fluoride gas is trifluoromethane, tetrafluoromethane, tetrafluoroethane, hexafluoroethane, hexafluoropropane, heptafluoropropane, octafluoropropane or octafluorocyclobutane. Preferred Method: After the step of providing the substrate in the vacuum environment the method further comprises repeating the steps of providing a target in the vacuum environment, aerating oxygen into the vacuum environment and mixing with many ions formed by plasma ionization of the target, where the ions and oxygen react and produce an oxide, and depositing an oxide layer on the surface of the substrate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: (I) is 6-(5-(4-(1-phenyl-1H-benzoimidazol-2-yl)-phenyl)-benzooxazol-2-yl)-quinoline, 6-(5-(9,9-dimethyl-9H-fluoren-2-yl)-benzooxazol-2-yl)-quinoline or 6-(5-(4-(9,9-dimethyl-9H-fluoren-2-yl)-naphthalen-1-yl)-benzooxazol-2-yl)-quinoline. (IV) is 1,3-bis(2-(quinolin-6-yl)benzo(d)oxazol-5-yl)benzene or 1-(2-quinolin-6-yl-benzooxazol-6-yl)-3-(2-quinolin-6-yl-benzooxazol-5-yl)-imidazolidin-2-one. (C1) has a CLogP (logarithm of partition coefficient) value of greater than 6.4 and triplet energy level of 1.9-4 eV. Preferred Definitions:    R5-R10 = H; and    R1-R10 = H, 4-(1-phenyl-1H-benzoimidazol-2-yl)-phenyl, 9,9-dimethyl-9H-fluoren-2-yl, 9,9-diphenyl-9H-fluoren-2-yl, (1,1')binaphthalenyl-6-yl, (2,2')binaphthalenyl-6-yl, 4-(9,9-dimethyl-9H-fluoren-2-yl)-naphthalen-1-yl, 9,9-dimethyl-9H-indeno(2,1-c)pyridine-7-yl, 4-(4,6-diphenyl-(1,3,5)triazene-2-yl)-phenyl, 4,6-diphenyl-(1,3,5)triazene-2-yl, 9,9,9',9'-tetramethyl-9H,9'H-(2,2')bifluorenyl-7-yl, 9-phenyl-9H-fluoren-3-yl, phenanthren-3-yl, 9,10-dimethyl-phenanthren-3-yl, 9-methyl-phenanthren-3-yl, 10-methyl-phenanthren-3-yl, 7,7-dimethyl-7H-benzo(c)fluoren-9-yl, dibenzofuran-2-yl, 4-(9,9-dimethyl-9H-fluoren-2-yl)-phenyl, (1,1';4',1'')terphenyl-4-yl, 9,9-dimethyl-9H-xanthen-2-yl or (1,1',2';1'')terphenyl-4''-yl.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (Q) comprises (a) reacting nanoclusters to obtain a first solution, (b) mixing the doping agent and shell and then reacting at 110-180 degrees C to obtain a second solution, and (c) mixing the first solution and the second solution with precursor and then reacting at 110-180 degrees C. Preferred Components: The nanoclusters have an average particle diameter of 2-8 mu m. The shell has average particle diameter of 2.1-9 mu m and thickness of 0.2-5 mu m. The shell further includes zinc selenide shell layer or trialkylphosphine of formula (R3-P(R1a)(R2)). (Q) has a wavelength of 440-680 Angstrom . The doping agent is an organic solvent. The nanocluster is precursor, capping reagent or a surfactant. The precursor is silver nitrate, silver stearate or silver acetate. The indium is indium hydroxide, indium nitrate hydrate, indium acetate hydrate, indium acetylacetonate and indium acetate. The capping reagent has a structural of formula (I). The surfactant is 10-16C alkyl thiol. The sulfur precursor comprises a primary amine of formula (II). The organic solvent is 12-20C alkene and 8-20C carboxylic acid. The mole ratio of the: silver precursor and indium precursor to 1:3-10; silver, indium and sulfur is 1:3-8:5-12; precursor and doping agent is 1:0.008-0.1; and zinc and selenium is 1:0.9-1.1.R1, R2 = 5-20C alkyl; andR1a, R3 = 5-12C alkyl. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The anion group is functional group chosen from sulfo group, carboxyl group and phosphoric acid group. The dopant has weight average molecular weight of 1000-5000000 and a main chain comprising an amide bond. The dopant is a copolymer of monomers comprising multivalent amine or its derivative and multivalent carboxylic acid or its derivative. The multivalent amine or its derivative is 1,3-diaminopropane, 1,4-diaminobutane, 1,5-diaminopentane, 1,6-diaminohexane, 1,7-diaminoheptane, 1,8-diaminooctane, 1,9-diaminononane, p-phenylenediamine, m-phenylenediamine and/or o-phenylenediamine. The multivalent carboxylic acid or its derivative is oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, terephthalic acid, isophthalic acid and/or o-phthalic acid. The dopant has a main chain comprising an aromatic ring, whose at least one portion, preferably 5% or more is substituted with an anion group. The polymer solution further contains polystyrene sulfonic acid, aprotic polar solvent and binder.
TECHNOLOGY FOCUS - POLYMERS - The porous base material is selected from the group consisting of polyolefin, polyethylene terephthalate, polybutylene terephthalate, polyacetal, polyamide, polycarbonate, polyimide, polyether-ether-ketone, polyethersulfone, polyphenylene oxide, polyphenylenesulfide and polyethylenenaphthalete. The porous inorganic material coating layer is provided with the binder polymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The acid includes sulfuric acid, hydrochloric acid, nitric acid or hypochlorous acid. The concentration of the acid is 1-3 M. The concentration of hydrazine or ammonia solution is 0.33-3.34 mM. Preferred Method: In the step (a) heating is carried out at 60-90 degrees C for 3-10 hours. The step (a) further comprises adding ethanol and/or acetone and centrifuging at 2000-3000 revolutions per minute for 10-20 minutes to remove the upper layer. EXAMPLE - 10 mg Platinum/nitrogen-doped carbon catalyst (2 M) was dispersed in 25 ml sulfuric acid solution for 30 minutes using a ultrasonic crusher, and heated at 80 degrees C for 5 hours. Then the reaction temperature was reduced to room temperature, 10 ml ethanol and 10 ml acetone were added, centrifuged at 3000 revolutions/minute for 10 minutes, resulting supernatant was discarded and repeated for three times. The supernatant was completely removed and was air dried to obtain platinum/nitrogen-doped carbon catalyst.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The carbon material of diffusion layer is carbon paper or carbon cloth. The leveling layer layer is formed by carbon material and hydrophobic adhesive in weight ratio of 2:8-8:2. The carbon material of leveling layer is activated carbon, graphite carbon or high conductive carbon black. The hydrophobic adhesive is polytetrafluoroethylene or polyvinylidene fluoride. The electrocatalyst is hydrogen storage alloy, nickel-based catalyst, carbon supported platinum-based catalyst and their alloy catalyst. The hydrogen evolution inhibitor is carbon-supported gold and/or carbon-supported palladium, in which carbon is activated carbon or graphite carbon.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The binder is polymer electrolyte. The polymer electrolyte is erfluorosulfonic acid resin, sulfonated ion conductive polymer or chitosan hydrogel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The material is made of silicon or silicon and germanium.
TECHNOLOGY FOCUS - POLYMERS - The membrane is made of polymeric material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The supported copper catalyst comprises 0.1-65 wt.% copper and remainder of the support. The supported copper catalyst comprises 0.1-55 wt.% combination of copper and gold and/or magnesium, and remainder of the support. The supported copper catalyst is free of carbon. The hydrogen and silicon tetrahalide has mol ratio of 1:1-11:1. Preferred Process: The supported copper catalyst is contacted with hydrogen and silicon tetrahalide at 500-950 degrees C and pressure of 0-415 kPag. The method produces the trihalosilane for at least 30 minutes to 3 hours. The method further involves purging the supported copper catalyst before contacting the supported copper catalyst with hydrogen and silicon tetrahalide, and recovering the trihalosilane after obtaining the trihalosilane. The method further involves making high purity polycrystalline silicon, polysiloxane resin and organosilane by using trihalosilane as a reactant. Preferred Compound: The trihalosilane is of formula: HSiX3, where X is fluoro, chloro, bromo or iodo. The hydrogen halide is hydrogen chloride. The silicon tetrahalide is silicon tetrachloride. The trihalosilane is trichlorosilane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The binding agent comprises metal oxide compound chosen from silicon dioxide, barium oxide, calcium oxide, strontium oxide, magnesium oxide, titanium dioxide, chromium(III) oxide and/or manganese(III) oxide. The rechargeable electrical energy memory further has a porous coating (11) formed using metal oxide compound chosen from zirconium dioxide, cerium dioxide, and/or gadolinium(III) oxide. The content of binding agent in the Rechargeable electrical energy memory is 0.5-10 vol.%, preferably 1-5 vol.%. The memory material formed from redox-active material, preferably iron and/or its compound.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The alkali control layer is provided between a glass substrate and an electrode layer. The glass substrate is made of silicon dioxide, aluminum oxide, strontium oxide, barium oxide, oxygen, magnesium oxide, calcium oxide, zirconium dioxide, sodium oxide and potassium oxide.
TECHNOLOGY FOCUS - POLYMERS - Preparation: No general preparation given. Preferred Properties: The aromatic polyamide film has a light transmittance of 50% or more at 400 nm with respect to a thickness of 10 mu m, a Young's modulus of 4 GPa or more in at least one direction, a glass transition temperature of 230 degrees C or more, and a thermal expansion coefficient of 0-50 ppm/ degrees C at 100-200 degrees C in at least one direction. EXAMPLE - 5.2 g 2,2'-Dimethyl-biphenyl-4,4'-diamine, 2.61 g 4-((4-aminobenzene)sulfonyl)aniline, and 106 ml N-methyl-2-pyrrolidone were stirred in nitrogen atmosphere and dissolved. After leaving to cool to 30 degrees C, the contents were cooled to 0 degrees C. 4.97 g isophthaloyl dichloride was added over 30 minutes and stirred for 30 minutes. 2.13 g Terephthaloyl dichloride was added in 5 steps over 30 minutes and stirred for 60 minutes. The generated hydrogen chloride was neutralized with lithium carbonate and a polyamide polymer solution was obtained. A film of thickness 10 mu m formed using the solution had a light transmittance of 70.2% at 400 nm, excellent acetone tolerance as measured by JIS K5600-6-1:1999, a Young's modulus of 6.2 GPa as measured by JIS-K7127-1999, a glass transition temperature of 280 degrees C, and an average thermal expansion coefficient of 32.8 ppm/ degrees C as measured by JIS K7197-1991.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic solvent is 1-4C alkanol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition further contains 0.3-30 parts mass metal oxide colloidal particles with respect to 100 parts mass electroconductive particles. The metal oxide colloidal particles are chosen from titanium, zirconium, and hafnium. The electroconductive particles contain conductive carbon, carbonized material, nitride, silicide, boride, sulfide, oxide, phosphate, conductive resin, ion exchange resin, or metal. Preferred Process: The metal oxide colloidal particles are surface-modified using the agent (A). Preferred Property: The average particle diameter of the electroconductive particles is 0.1-100 mu m.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: Formation of conductive film further involves impregnating binding liquid containing water soluble and/or water-dispersible resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The manufacture of semiconductor thin film further involves injecting ionic species (b). Preferred Composition: The ionic species (a and b) are chosen from silicon, carbon, oxygen, nitrogen and noble-gas element.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The molar ratio of total number-of-moles of copper(I) oxide and number-of-moles of copper hydroxide to number-of-moles of all copper atoms in the island portion is 0.7-0.95. The loading amount of copper hydroxide is 4 ng/cm2 or more, preferably 70 ng/cm2 or more computed by dividing area of surface of layer by quantity of copper hydroxide in island portion in terms of metal copper. Preferred Properties: The ratio of total area of the island portion with respect to area of the antiviral thin film when the antiviral thin film is observed from upper direction of the island portion is 0.01-0.2. The diameter computed in terms of circle in mean area of the island portion when observed along thickness direction of antiviral thin film is 1-20 nm. The base material is transparent and has haze rate of 1% or less at wavelength of 380-760 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The laminated film consists of silicon-oxide layer, and tin-oxide layer to which fluorine-doping is not carried out further.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The curable resin composition further contains transition metal salt, quaternary phosphonium salt, and non-halogen quaternary ammonium salt. The hardening agent is acid anhydride and/or polyhydric carboxylic acid. Preferred Process: The epoxy resin is obtained by post-processing the resultant material obtained after reacting 4-(2-(4-(1,1-bis(4-hydroxyphenyl)ethyl)phenyl)propan-2-yl)phenol and epihalohydrin with metal hydroxide aqueous solution and solution of toluene or 4-7C ketone. Preferred Property: The epoxy resin has softening point of 60-80 degrees C, and epoxy equivalent of 215-250 g/eq.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step of preparation of allotropes involves providing seed templates, each seed template comprising carbon allotrope containing crystalline seeds; reacting the seed templates in metallic solution with polymeric passivating reagent to form zero valent metallic nanowire from each crystalline seed; and additionally controlling diameter or density of metal nanowires by controlling diameter or density of crystalline seeds respectively. Preferred Components: The carbon allotrope is selected from buckminsterfullerene, carbon nanotube, graphite and exfoliated graphite. The seeds are selected from silver, gold, platinum, palladium and nickel. EXAMPLE - No suitable example is given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The at least one first layer comprises the first phenolic compound. The first phenolic compound comprises at least one of bis(4-hydroxyphenyl) sulfone, 2-6-di-tert-butylphenol or resorcinol.    TECHNOLOGY FOCUS - POLYMERS - The article further comprises at least one second layer disposed adjacent to the first layer, where the second layer comprises the phenolic compound. The polymer binder comprises gelatin and/or polyvinyl alcohol, or comprises cellulose acetate, cellulose acetate butyrate and/or cellulose acetate propionate.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The carbon short fiber is a polyacrylonitrile-type carbon short fiber which removes surface sizing agent. Preferred Properties: The porous carbon material has specific resistance rate of 100-100000 mu Omega .m, and heat conductivity of 0.2-3.0 W/m.K.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The glass plate comprises glass composition containing 1-15 %mass sodium oxide, 0-9 %mass potassium oxide, 45-65 %mass silicon dioxide, 1-20 %mass aluminum oxide and 1-40 %mass of magnesium oxide, calcium oxide, strontium oxide and barium oxide. The total content of sodium oxide and potassium oxide is 1-20 %mass.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The barrier layer contains silicon, oxygen and/or carbon.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: A curable resin layer containing electron beam-curable resin material is provided on the substrate, and an organic layer is formed by irradiating an electron beam to the curable resin layer. The surface of base material is wound around, in order to form barrier layer with convex surface.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The composition further comprises a solvent, a binder and an active material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The peroxide decomposition agent (C) is phosphorus antioxidant and/or sulfur-type antioxidant.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alicyclic epoxy compound (A) is a compound having cyclohexene oxide group. The alicyclic epoxy compound (A) is 7-oxabicyclo(4.1.0)heptan-3-ylmethyl 7-oxabicyclo(4.1.0)heptane-3-carboxylate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The curable epoxy resin composition further contains rubber particles, a hardening agent, a hardening accelerator, and a curing catalyst.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The soaking process involves mixing the catalyst particles in a liquid, and adding the citric acid to the liquid. The liquid comprises water. The soaking process involves mixing the catalyst particles in a first portion of the water, dissolving citric acid in a second portion of the water, and mixing the first and second portions of water. The method involves including a first amount of the catalyst particles, and including a second amount of the citric acid, where the second amount is greater than the first amount, preferably the second amount is approximately 5 times greater than the first amount. The rinsing process involves filtering the catalyst particles, and rinsing the filtered catalyst particles with water. The method involves repeating the filtering process and rinsing process with water for several times. The method involves drying the rinsed catalyst particles, and preparing a catalyst ink using the dried catalyst particles. The drying process involves heating the catalyst particles at approximately 50 degrees C for approximately 3 days. The method involves preparing a mixture of the catalyst particles, the citric acid and water, stirring the mixture, removing the catalyst particles from the mixture, rinsing the removed catalyst particles, and drying the rinsed catalyst particles. EXAMPLE - None given.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Parameters: Cell temperature during operation is - 35-60 degrees C, preferably greater than or equal to 40 degrees C. The system has a state-of-charge condition of 0-100% during operation. Preferred Components: The system does not contain a thermal management device actively regulating the cell temperature.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Aqueous supporting solution contains mixture of sulfate ion (SO42-) and chloride ion (Cl-). Concentration ratio Cl-:SO42- is 1:100-100:1, preferably 1:3-3:1. Catholyte contains VO2Cl(H2O)2. Vanadium cation concentration is greater than or equal to 0.5 M, preferably greater than or equal to 2.5 M.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The buffer layer comprises stepped regions (5,7,9,11,13,15,17) containing aluminum gallium nitride of formula: AlxGa(1-x)N, and heterogeneous regions containing aluminum indium gallium nitride of formula: AlxInyGa(1-x-y)N, where x is different from each other. The seed layer and stepped regions comprise aluminum. The difference of content of aluminum in stepped regions and seed layer is 30-60%. The seed layer comprises aluminum gallium nitride of formula: Alx1Ga(1-x1)N, where x is 0.7-1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic layer (A2) contains coexistence phase comprising silicon dioxide and zinc sulfide. The inorganic layer (A1) comprises coexistence phase containing zinc oxide, silicon dioxide and aluminum oxide. The inorganic layer (A1) comprises 20-40 atomic% zinc, 5-20 atomic% silicon, 0.5-5 atomic% aluminum, and 35-70 atomic% oxygen atom measured by inductively coupled plasma emission spectrochemical analysis. The molar fraction of zinc sulfide with respect to total content of silicon dioxide is 0.7-0.9. In silicon-compound layer (B), the atomic composition ratio of oxygen atom is 0.1-2 with respect to silicon atom, and the atomic composition ratio of nitrogen atom is 0.1-1 with respect to silicon atom, measured by element distribution by X-ray photoelectron spectroscopy.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The undercoat layer (C) contains an organosilicon compound and/or an inorganic silicon compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The gas-barrier film contains undercoat layer (C) containing structure obtained by crosslinking polyurethane compound (C1) which has an aromatic-ring structure.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The dry film thickness of the layer (B) is 10-500 nm. Preferred Components: The compound (b) is metallic compound of formula: (R5)-(M(R4)m1-Ym2)n1-R6 (II), primary amine compound, secondary amine compound, tertiary amine compound, or diamine compound having structural unit of formula: R8-N(-R7)-X-N(-R9)-R10 (III). The metallic compound is alkoxide of metal oxide and alkali metal. The metallic compound contains perhydro-silsesquioxane or silicon oxide.M=barium, magnesium, silicon, aluminum, boron, iron, cobalt, titanium, zirconium, nickel, copper, zinc, indium, chromium, manganese, ruthenium, rhodium, palladium, iridium, or platinum;Y=single bond or oxygen atom;R4-R6=H, halo, cyano, nitro, mercapto, epoxy, hydroxy, amino, or 1-10C alkyl, 3-10C cycloalkyl, 2-10C alkenyl, 2-10C alkynyl, 1-10C alkoxy, acetylacetonate, 4-25C alkyl acetoacetate, 6-30C aryl, or heterocyclyl (all optionally substituted);n1,m1,m2=1 or more;R7-R10=1-10C alkyl, 3-10C cycloalkyl, 2-10C alkenyl, 2-10C alkynyl, 1-10C alkoxy, 6-30C aryl, or heterocyclyl (all optionally substituted);andX=optionally substituted 1-10C alkylene or imino. Preferred Definitions:    M=silicon, aluminum, or boron;and    R4-R6=1-10C alkyl or 1-10C alkoxy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The film containing sulfur atom and electric charge carrier is derived from fluorine-containing sulfonic acid compound included in the non-aqueous electrolyte as sulfur-containing film formation agent. The fluorine-containing sulfonic acid compound is lithium fluorosulfonate (FSO3Li). The acidic functional group is hydroxy group.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (A) comprises conducting a reaction of EK1D1 with M(I)X. Preferred Method: The reaction is carried out in the presence of dichloromethane, acetonitrile, tetrahydrofuran, dimethyl sulfoxide or ethanol. The method further comprises: adding diethyl ether, pentane, hexane, methyl-tert-butyl ether, methanol, ethanol and/or water for the production of the metal(I) complexes in the form of a solid; and substituting at least ligand (EK1D1) with at least one substituent to increase the solubility and with a functional group for improving the charge carrier transport. The method of producing the optoelectronic component comprises applying (A) on a support. The application of wet-chemical is carried out by colloidal suspension or sublimation. Preferred Components: (A) comprises structural units of formulae (I)-(IX). The substituent for increasing the solubility comprises: branched, unbranched or cyclic long-chain alkyl having a length of 1-30C, branched, unbranched or cyclic long-chain alkoxy having a length of 1-30C, branched, unbranched or cyclic long-chain perfluoroalkyl having a length 1-30C, and short-chain polyethers having a chain length of 3-50 repeat units. The substituent for improving the charge carrier transport comprises an electron conductor and a hole conductor. The proportion of (A) at the emitter or absorber is 100%, preferably 1-99%. The proportion of (A) as emitter in optical light-emitting components, preferably OLEDs is 1-80%. SPECIFIC COMPOUNDS - 58 Compounds (I) are specifically claimed, e.g. copper complexes of formulae (a)-(d).    EXAMPLE - (2-Diphenylphosphanyl-benzyl)-dimethyl-amine was reacted with copper(I) halide in the presence of dichloromethane at room temperature to give copper(I) complex.
TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: Nitrogen containing ratio (N1) of nitrogen bonded with silicon of surface side of silicon oxynitride layer is less than the nitrogen containing ratio of base material side.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The cerium oxide is prepared by dropwisely adding the aqueous ammonia into cerium(iii) nitrate hexahydrate solution to react, regulating the pH value reacted solution to 10-12, stirring the pH regulated solution, heating the stirred solution at 60-100 degrees C to react for 4-6 hours, carrying out hydro-thermal reaction at 160-240 degrees C for 6-8 hours, aging the reacted product, then filtering, washing the filtered material, and then drying. The dispersing step further comprises adding the graphene into a beaker, then ultrasonically oscillating for 30-60 minutes, adding the cerium oxide into the beaker, then adding ethanediol and isopropyl alcohol, then ultrasonically oscillating for 30-60 minutes. The microwave heating step is carried out at 120-145 degrees C for 45-80 seconds. The drying step is carried out for 4-10 hours. Preferred Components: The molar ratio of ethanediol and isopropanol is 1-10:1. The loading amount of platinum is 20 wt.%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Graphene airgel is prepared by mixing graphite oxide with deionized water in a container. The mixed material is dispersed ultrasonically for 4 hours. The container is sealed at 85-100 degrees C for 48 hours. The obtained material is put in a soxhlet extraction apparatus with acetone. The obtained material is dried by carbon dioxide supercritical, and then oxidized at 800 degrees C to obtain graphene airgel. Preferred Conditions: Mol ratio of ethanediol and isopropanol is 1-10. Microwave heating time is 45-80 seconds and heating temperature is 120-145 degrees C. Drying time is 4-10 hours.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of aqueous solution of alkali-stabilized sodium borohydride or potassium borohydride is 1-3M. The alkali in the fuel is sodium hydroxide or potassium hydroxide. The concentration of alkali in the fuel is 2-5M. The concentration of hydrogen peroxide aqueous solution is 1-4M. The concentration of hydrogen peroxide in the hydrogen peroxide aqueous solution is 1-3M. Preferred Process: The hydrogen peroxide is stabilized using sulfuric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The articles further comprise another layer containing a low-reflection film, different from the alkali barrier layer on the alkali barrier layer. Preferred Properties: The film thickness of the alkali barrier layer is 40-200 nm. The thickness of the glass substrate is 15 mm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alkoxysilane is of formula: SiXmY4-m. The scale-like silica particle (B) has an average aspect-ratio of 50-650, and the average particle diameter of 0.08-0.42 mu m. In the scale-like silica particle (B), a several sheets of flaky silica primary particle having silica primary particle of 0.001-0.1 mu m thick flaky shape or 0.001-3 mu m thickness, orientates mutually in-between parallel surfaces and is formed by overlapping. The liquid medium (C) is chosen from water, alcohol, ketone, ether, cellulose, ester, glycol ether, nitrogen compound, and a sulfur-containing compound. The content of a matrix precursor (A) is 0.03-6.3 %mass with respect to total mass of the coating liquid, in silicon dioxide (SiO2) conversion. The total content of a matrix precursor (A) and a scale-like silica particle (B) is 0.3-7 %mass with respect to total solid concentration of coating liquid, in silicon dioxide (SiO2) conversion.m=2-4;X=alkoxy;andY=non-hydrolytic group.Preferred Process: The coating liquid is manufactured by acid-treating the silica powder material using acid with pH of 2 or less, in which the scale-like silica particle (B) contains the silica aggregate, treating the acid-treated silica powder material with alkali having pH of 8 or more, and peptizing the silica aggregate, and carrying out wet pulverization of the silica powder material treated with alkali. During manufacture of articles, after forming the alkali barrier layer, the article is baked at 100-700 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - A silicon dioxide layer is formed on the poly-crystalline material layer, and a silicon nitride layer is formed on the silicon dioxide layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The ceramics base member is formed of one of silicon carbide, aluminum nitride, alumina, silicon nitride and zirconia oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred components: The percentage of the area of the second phase relative to the total area of the matrix phase and the second phase is 5.5-16%. The boron-doped zinc oxide sputtering target: further comprises 0.25-0.5 atomic % of at least one dopant consisting of aluminum, gallium, indium, germanium, silicon and tin; and has an absolute density more than 5.2 g/cm3. The second phase comprises a composition of zinc-boron-oxide compound of formula (Zn(3+y)B(2+x)O6). The matrix phase comprises a composition of zinc oxide.x = 0-0.5; andy = 0-1.5 or 3/2x.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The deposition of a thin film involves one of roll-to-roll coating, spraying and spins coating. The annealing involves annealing the thin film at 200-600 degrees C for several hours to convert the molecular species to crystalline iron pyrite (preferably annealing is conducted in an environment containing a sulfur based gas). The step of creating a solution involves adding sulfur and iron powders in a predetermined ratio to one part ethanolamine in 6.5 parts dimethyl sulfoxide (DMSO), and stirring the sulfur, iron powders, and DMSO as a solution for 24 hours at room temperature. The spin coating involves using spin conditions that yield a thin film having 150 nm thick layer. The annealing involves annealing the thin film in a sulfur atmosphere. The annealing converts the molecular film into a pure polycrystalline iron pyrite film. The method further involves heating the thin film; cooling the thin film, where the thin film has layers spin coated to achieve a desired film thickness; adding sulfur and iron (III) acetylacetonate in a predetermined ratio of pyridine to form a solution; and spin coating the solution onto various substrates to make individual solid layers, where the individual solid layers are 200 nm thick; and pre-baking the thin film prior to annealing the thin film. Preferred Components: The sulfur based gas is one of S2 and H2S. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method is conducted within an operational atmosphere at a pressure of 0.1-100 mTorr. The first temperature is 540-620 degrees C. The second temperature is 350-520 degrees C. The third temperature is 300-550 degrees C. The first flux is controlled by manipulating the first temperature of the first heated pocket and the second flux is controlled by manipulating the second temperature of the second heated pocket. The second flux is further controlled by a flux control element operatively connected to the manifold, and the flux control element is: an adjustable shutter plate situated across each conduit cross section of the of conduits, where the shutter plate occludes the conduits when adjusted to a closed shutter position and opens the conduits when adjusted to an open shutter position; and a set of adjustable valves operatively connected to the conduits of the manifold, where the valves occlude the conduits when adjusted to a closed valve position and open the conduits when adjusted to an open valve position. The rate of deposition of the complex thin-film alloy on the substrate is controlled by manipulating the first flux and the composition of the complex thin-film alloy deposited on the substrate is controlled by manipulating the second flux. Preferred Components: The first source material is a compound including telluride compounds (preferred), sulfide compounds, chloride compounds, or selenide compounds. The second source material is a metal or a compound including telluride compounds, sulfide compounds, chloride compounds, or selenide compounds. The metal is magnesium (preferred), zinc, manganese, copper, mercury, bismuth, lead or cadmium. The telluride compounds are cadmium-tellurium. The sulfide compounds are cadmium-sulfur. The chloride compounds are cadmium-chlorine, copper-chlorine, and magnesium-chlorine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of material in the target is 0.05-30 atomic%. The absorber layer comprises selenium. The back contact layer comprises molybdenum, and copper, indium, gallium, aluminum, selenium material of formula: CuIn(1-x-y)GaxAlySe2, where y is less than x and x is 0.2-0.35.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The base material is heat-resistant boron nitride, thermally decomposed boron nitride, graphite, carbon fiber reinforced carbon composite, silicon carbide, aluminum nitride, alumina, sialon, quartz, tungsten, molybdenum or tantalum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The bonding material comprises 35-50 mole% of silicon dioxide, 0.5-15 mole% of boron trioxide, 0-1.7 mole% of aluminum oxide, 5-25 mole% of barium oxide, 10-40 mole% of calcium oxide, 0-9 mole% of magnesium oxide, 0-2 mole% of alkaline metal oxide and/or a mixture of alkali metal oxides comprising lithium oxide, sodium oxide and/or potassium oxide, 1-4 mole% of yttrium(III) oxide, and less than 1 of lanthanum oxide. The sum of magnesium oxide, calcium oxide and barium oxide is 35-45 mole%. The bonding material further comprises up to 30 wt.% of inorganic fillers, preferably aluminum oxide, stabilized zirconium dioxide and/or magnesium oxide in the form of particles or fibers. The bonding material is present in an amorphous state or at least in a partially-crystallized state. The crystalline phase contains tridymite.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The conductive powder comprises a metal core (34a) and a metal plating layer (34b) plated on the core surface, where the electrical conductivity of the metal plating layer is greater than the electrical conductivity of the metal core.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The average composition of three-dimensional net-shaped organopolysiloxane (A) of formula: (R13SiO1/2a)(R12SiO)b(SiO2)c (III). The average composition of linear organopolysiloxane (B) is of formula: (R23SiO1/2)d(R22SiO)e (IV). The average composition of organopolysiloxane (C) is of formula: (R33SiO1/2)f(R32SiO)g(R3SiO3/2)h (V). The mass ratio of linear organopolysiloxane (B) with respect to three-dimensional net-shaped organopolysiloxane (A) is 0.01-100. The mass ratio of organopolysiloxane (C) with respect to total amount of linear organopolysiloxane (B) and three-dimensional net-shaped organopolysiloxane (A) is 0.01-100.R1=organic group, in which at least 1 mol% of all R1 is alkenyl and at least 10 mol% of all R1 is aryl;a=0 or positive number;b,c=positive number;b/(a+b+c)=0.1-0.8;c/(a+b+c)=0.2-0.8;R2=organic group, in which at least 1 mol% of all R2 is alkenyl and at least 10 mol% of all R2 is aryl;d,e=positive number;d/(d+e)=0.001-0.7;R3=H or organic group other than alkenyl, in which 0.1-50 mol% of all R3 is H and 10 mol% or more of all R3 is aryl;f=positive number;g,h=0 or positive number;f/g=0.01-2 (when g is positive number);f/h=0.1-3 (when h is positive number);andf/(f+g+h)=0.01-0.75.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The bonding is provided with applied silicon dioxide film and aluminum nitride film.    TECHNOLOGY FOCUS - METALLURGY - A reflecting layer is provided with silver, gold and aluminum. A thermo-compression bond layer is provided with copper.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of alicyclic epoxy compound (A) is 65-95 wt.%. The alicyclic epoxy compound (A) is a compound of formula (I) having cyclohexene oxide group. The curable epoxy resin composition further comprises antioxidant (C), ultraviolet absorber (D), curing agent (E), hardening accelerator (F), and curing catalyst (G). Preferred Process: The optical-semiconductor element is adhered on an electrode by the hardened material of the curable epoxy resin composition.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of acrylic resin (B) is 5-35 wt.%.
TECHNOLOGY FOCUS - POLYMERS - The synthetic resin is made of polyetheretherketone, polyethylene sulfide, aromatic polyimide, polyether imide or MC nylon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The step (1-iv) is conducted at a temperature of 100 degrees C for a time period of 24 hours. The step (1-v) is: conducted at a temperature of 50-400 degrees C (preferably 250 degrees C) for a time period of 1-10 hours; and carried out in a reactor for the production of hydrogen. The step (2) is carried out by introducing 15 mole% of a gaseous mixture comprising nitrogen, water and alcohol in a reactor at a temperature of at least 130 degrees C, preferably 160 degrees C, introducing oxygen into the reactor and maintaining the temperature for a period of at least 3 minutes and then decreasing the temperature to less than 60 degrees C, preferably 50 degrees C, where the flow rate of the gaseous mixture is 10-100 ml/minute. Preferred Components: The cerium precursor is a salt of cerium(III) nitrate, cerium(III) acetate or cerium(III) chloride. The nickel precursor is a salt of nickel(II) nitrate, nickel(II) chloride or nickel(II) sulfate. The concentration of the cerium precursor and the nickel precursor in the aqueous solution is 0.1-1 mole/l. The precipitating agent comprises triethylamine, ammonium hydroxide, potassium hydroxide, sodium hydroxide or sodium carbonate. In the oxyhydride material M1, the molar ratio of M/cerium is 0, and nickel/cerium is 0.3-1.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alcohol comprises methanol, ethanol (preferred), propan-1-ol, butan-1-ol, pentan-1-ol or bioethanol. The molar ratio of water and alcohol in the gaseous mixture is 1/2-13/1. The molar ratio of alcohol/water/oxygen/nitrogen is 1/3/1.6/1.3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic fine particle is silica, alumina, zirconia oxide or clay.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The thickness of the first cured resin layer and the second cured resin layer is 0.5-5 mu m. The coefficient static friction of the transparent conductive layer and second cured resin layer is less than 0.3 mu m. The arithmetic average roughness (Ra) of transparent conductive layer and the second cured resin layer is less then 3.5-50 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The first cured resin layer and the second cured resin layer include 90-99.9 wt.% ionizing radiation-curing resin and 0.1-10 wt.% photopolymerization initiator, where the solid content of the resin composition is 100 pts. wt.; and the ionizing radiation-curing resin is obtained by dissolving 0.4-2.0 pts. wt. inorganic fine particles having average particle-diameter of 50-250 nm in an organic solvent. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The phenylmethyl silicone (A) is linear silicone or diphenyldimethyl silicone in which hydroxyl group is bonded with silicon atom at both terminals. The content of silane or siloxane compound is 0.1-10 pts. wt. with respect to 100 pts. wt. phenylmethyl silicone. The phenylmethyl silicone (A) and silane or siloxane compound (B) contain condensate. The gallium compound contains gallium(III) acetylacetonate. The zirconium compound contains zirconium(IV) acetylacetonate or zirconium bis(2-ethylhexanoate)oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Alkali solution is sodium carbonate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Compound (I) is prepared by dissolving compound (II) and compound (III) at mole ratio of 1-1.5:1-1.5 in organic solvent, adding alkali solution and catalyst and performing Suzuki reaction at 50-120 degrees C for 6-108 hours. Preferred Component: Catalyst is tris(dibenzylideneacetone)dipalladium, tetrakis(triphenylphosphine)palladium or bis(triphenylphosphine)palladium(II) chloride. Preferred Method: Suzuki reaction involves mixing reaction liquid, deionized water and toluene, separating organic phase, distilling, adding anhydrous alcohol, precipitating, filtering, drying, dissolving in chloroform, separating, distilling, settling, filtering, extracting, depositing and filtering.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass frit is formed using lead glass comprising 1-7 mol% lead oxide, 38-53 mol% silica and 46-57 mol% boron trioxide in conversion of an oxide. The lead glass preferably comprises 10-29 mol% bismuth trioxide, 15-30 mol% zinc oxide, 20-33 mol% boron trioxide?0-20 mol% silica, and 8-21 mol% total of lithium oxide, sodium oxide and potassium oxide.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The perovskite-type oxide is mixed conductor having oxygen-ion conductivity. The amount of perovskite-type oxide is 0.01-0.5 pt. wt. with respect to 100 pts. wt. electroconductive powder and glass frit. The perovskite-type oxide is lanthanum-strontium-cobalt-iron-containing oxide of formula: (LaxSr1-x)(CoyFe1-y)O3-(~d) (I), lanthanum-nickel-iron-containing oxide of formula: La(NiwFe1-w)O3-(~b) (II), and lanthanum-strontium-manganese-containing oxide of formula: (LazSr1-z)MnO3-(~c) (III).x,y=0-1;delta , beta , gamma =0-0.6;andw,z=0-1 (excluding 0 and 1).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is chosen from acetone, methylethylketone, methylene chloride/methanol mixtures, tetrahydrofuran, methylene chloride, chloroform, dimethylformamide, N-methyl-2-pyrrolidone, cyclohexane, and/or water. The salt (I) is chosen from lithium bis(trifluoromethanesulfonyl)imide and lithium bis(fluorosulfonyl)imide. The content of salt (I) is 25-250 wt.%, preferably 50-150 wt.%, more preferably 100-200 wt.%, with respect to weight of polymer in the coating composition.    TECHNOLOGY FOCUS - POLYMERS - Preferred composition: The coating composition further comprises a solvent. The coating in the separator is solvent-free. The separator is a porous separator. Preferred Property: The coating has weight of 5-100%, preferably 10-50% of weight of un-coated separator. Preferred Process: The coated separator is dried by volatilization of solvent. Preferred Definitions:    A+=ion chosen from Li+, Na+, K+ and/or Cs+;    B-=ion chosen from PF6-, ClO4-, AsF6-, BF4-, AlCl4-, SbF6-, SCN-, C(CF3SO2)-, CF3CO2-, AsF6-, B10Cl10-, Rg0SO3-, (Rg1SO2) (Rg2SO2)N-, B(3,5-(CF3)2C6H3)4-, B(C6F5)4-, Al(OC(CF3)3)4-, difluoro(oxalate)borate, bis(oxalate)borate, tris(oxalate)phosphate, tetrafluoro(oxalate)phosphate, (C2F5)3PF3-, B(CN)4-, and/or 4,5-dicyano-(2-trifluoromethyl)imidazolide;    Rg0=1-12C perfluoroalkyl;and    Rg1,Rg2=linear or branched 1-3C perfluoroalkyl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Materials: The protective ligand is lithium, sodium or potassium fatty acid. The fatty acid is myristic, laurate, stearate, or oleate. The alcohol is 12-28C alkyl alcohol. The amine is 12-30C alkylamine. The precipitator is methanol, ethanol, ethyl acetate or acetone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The surfactant is sodium dodecyl benzene sulfonate. The tungsten source is ammonium metatungstate. The volume ratio of ethanol, deionized water, concentrated aqueous ammonia and formaldehyde is 4-5:10:0.05:0.1-0.2, preferably 4:10:0.05:0.175. The amount of tungsten source to the volume dosage of deionized water is 0.001-0.002 g/ml, preferably 0.001 g/ml. The amount of surfactant to the volume dosage of deionized water is 0.0005 g/ml. The amount of resorcinol to the volume dosage of deionized water is 0.01-0.0125 g/ml. Preferred Method: The hydrothermal reaction is carried out at 80-100 degrees C, preferably 100 degrees C for 12-15 hours, preferably 12 hours. In the step (iii), adding polymer into a tubular furnace, carrying out high-temperature carbonization initially at 400 degrees C for 1 hour at a rate of 1-5 degrees C/minute, preferably 2.5 degrees C/minute then at 900 degrees C for 2-6 hours, preferably 4 hours and naturally cooling to room temperature.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The conductive substrate is conductive glass or metal.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The tin sulfide precursor solution containing stannous chloride, triethanolamine, acetone, aqueous ammonia, sodium citrate solution, thiacetamide and water/glycol solvent. The volume ratio of triethanolamine, acetone, aqueous ammonia and sodium citrate is 2.5:2:2:2:2.5.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The scan velocity determining step involves determining the moving velocity according to a supply time for supplying the etching liquid toward the substrate under the state that the liquid application position is positioned at the center portion of the principal face of the substrate. The scan velocity determining step involves determining the moving velocity of the liquid application position according to a table indicating relationship between the supply time of the etching liquid under the state that the liquid application position is positioned at the center portion of the principal face of the substrate and the moving velocity of the liquid application position. The scan velocity determining step involves determining the moving velocity of the liquid application position according to a table indicating relationship between the supply time of the etching liquid under the state that the liquid application position is positioned at the center portion of the principal face of the substrate and a moving time of the liquid application position. The scan velocity determining step involves determining the moving velocity of the liquid application position for each of a several intervals between the edge portion of the principal face of the substrate and the center portion of the principal face of the substrate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The tri-halo aromatic compound comprises 2-(tribromomethyl sulfonyl)pyridine. The polymer binder comprises gelatin, polyvinyl alcohol, cellulose acetate, cellulose acetate butyrate, and/or cellulose acetate propionate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first insulating layer includes one of silicon oxide and silicon dioxide. The second insulating layer includes one of silicon oxide, silicon dioxide, silicon oxynitride and silicon carbon nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The copper-ion concentration in the living-polymerization component is 5 ppm or less with respect to the living-polymerization component.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The base is metal base. The metal is copper.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The monomer containing composition contains a polymerizable rod-shaped liquid crystal compound as monomer component. The monomer component containing the 2-20C alkylene chain is polymerizable rod-shaped liquid crystal compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The living polymerization is a living radical polymerization, reversible addition cleavage chain-transfer polymerization or atom transfer radical polymerization. The monomer consumption rate is controlled to 10-100%. The method involves coating a monomer-containing composition comprising monomer component which contains polymer component containing alkylene oxide chain and 2-20C alkylene chain and a polymer component containing monomer component containing alkylene oxide chain and 2-20C alkylene chain, on a base, subjecting monomer containing composition to living polymerization and forming polymer component containing alkylene oxide chain and polymer component containing 2-20C alkylene chain and obtaining block copolymer connected by covalent bond. Preferred Property: The number average molecular weight of living-polymerization component is 1000-100000. Preferred Component: The living-polymerization component is a block copolymer. Preferred Property: The thickness of the micro phase-separation structure film is 1-2000 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The inert gas is nitrogen or helium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The catalyst 1 is palladium(II) acetate. The alkali 1 is tributylamine. The catalyst 2 is tetrakis(triphenylphosphine)palladium(0). The solvent 1 is dimethylformamide. The solvent 2 is tetrahydrofuran. The solvent 3 is tetrahydrofuran, ethylene glycol dimethyl ether, benzene or toluene.    TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): The copolymer (I) is prepared by:(A) in an inert gas environment, adding 4,4'- dibromo-6,6'-diiodo-2,1,3-benzothiadiazole, an alkyne compound, a catalyst 1, and alkali 1 into solvent 2, and reacting at 130 degrees C for 4 hours to obtain reaction product 1;(B) adding dibromo-diselenophene compound into solvent 2 at - 78 degrees C, adding butyllithium and reacting for 2 hours, then adding tributyltin chloride and reacting at - 78 degrees C for 1 hour, raising temperature to room temperature and continuously reacting for 6 hours, and then sending to neutral alumina column chromatography to obtain reaction product 2; and(C) adding the reaction product 1, reaction product 2, catalyst 2 and alkali 2 into solvent 3, and reacting at 50-120 degrees C for 6-108 hours to obtain the copolymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The semiconductor quantum dot is lead sulfide, lead selenide, indium nitride, indium arsenide, indium antimonide and indium phosphide, preferably lead sulfide. The semiconductor quantum dot has an average particle diameter of 2-15 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The ligand is amine derivative of formula (X3-(CH2)r-N(((CH2)p-X1)-(CH2)q-X2), preferably tris(2-amino ethyl)amine.X1-X3 = SH, NH2 or OH;p, q, r = 1-4.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Synthesis of microwave assisted alkyne-modified ruthenium(II) complex involves reacting compound of formula (cis-Ru(L)2Cl2) and X-BrPIP of formula (II), heating under argon gas, cooling at room temperature, diluting with water, filtering to remove insoluble substances, adding filtrate and Y' acid or salt ion, standing to obtain compound of formula ((Ru(L)2(X-BrPIP))Y'n), adding in microwave reactor, dissolving in solvent under protection of gas, adding compound of formula (HR) and copper catalyst, heating to react, filtering to remove insoluble substances and obtain reaction solution, purifying in column chromatography, adding acetonitrile, collecting brownish red substance, performing spin drying, and drying under vacuum state..R=H, trimethylsilyl, 1-6C alkyl, 1-6C substituted alkyl, Ph, substituted Ph, pyridyl, substituted pyridyl, furyl, substituted furyl, pyrrolyl, substituted pyrrolyl, thiazole, substituted thiazole, N, halo, amino, carboxyl, cyano, mercapto, 3-8C cycloalkyl, SO3H, 2-6C alkenyl, 2-6C alkynyl, hydroxy 1-6C alkyl, amino 1-6C alkyl, CO2R', CONR'R', COR', SO2R'R', 1-6C alkoxy, 1-6C alkylthio, N=NR', NR'R', trifluoromethyl 1-6C alkyl, ortho-ethinyl-substituted phenyl, or meta-ethinyl-substituted phenyl;R'=H, 1-6C alkyl, or phenyl;L=ruthenium complex nitrogen containing atom heterocyclic compound, bipyridine and its optical isomer, or phenanthroline and its optical isomer;Y'=radical ion e.g. perchlorate, hexafluorophosphate, or chlorate; andn=positive integer as electrical neutral ion of optical isomer.Preferred Conditions: Heating temperature in microwave reactor is 110-150 degrees C. Heating time in microwave reactor is 10-40 minutes. Preferred Components: Solvent is acetonitrile. Column chromatography is neutral alumina column chromatography. ACTIVITY - Cytostatic.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - A thermochromic material is made of vanadium dioxide among niobium, tungsten, fluorine, chromium, molybdenum, aluminum or tantalum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic barrier layer comprises metal, metal oxide, metal nitride, metal carbide, metal oxynitride and/or metal oxyboride. The metal includes silicone, aluminum, selenium, zinc, antimony, indium, germanium, tin, bismuth, transition metal and lanthanide series metal. The thickness of inorganic barrier layer is 5-500 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The monomer (B) is chosen from 2-((((2-oxooxolan-3-yl)oxy)carbonyl)amino)ethyl 2-methylprop-2-enoate, 2-(((2-(2-oxopyrrolidin-1-yl)ethoxy)carbonyl)amino)ethyl 2-methylprop-2-enoate, 2-(((2-(morpholin-4-yl)ethoxy)carbonyl)amino)ethyl 2-methylprop-2-enoate, 2-(((2-(1,3-dioxo-2,3-dihydro-1H-isoindol-2-yl)ethoxy)carbonyl)amino)ethyl 2-methylprop-2-enoate, and 2-(((2-(2,5-dioxopyrrolidin-1-yl)ethoxy)carbonyl)amino)ethyl 2-methylprop-2-enoate. The photocurable monomer (A) includes monomer containing 1-30 vinyl group, acrylate group or methacrylate group. The photocurable monomer (A) includes (meth)acrylate having 1-20C alkyl group, di(meth)acrylate having 2-20C alkyl group, tri(meth)acrylate having 3-20C alkyl group, and tetra(meth)acrylate having 4-20C alkyl group. The radiation curable composition further contains initiator (C). The initiator (C) is photopolymerization initiator. The radiation curable composition comprises 20-90 wt.% photocurable monomer (A), 1-60 wt.% monomer (B) and 0.1-20 wt.% initiator (C), based on solid content. Preferred Properties: The adhesive force between organic barrier layer and inorganic barrier layer is 20-100 kgf/(mm)2. The thickness of organic barrier layer is 0.1-20 mm. Preferred Definitions:    X=lactone, morpholin, pyrrolidone, phthalimide or succinimide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic particle comprises metal oxide including silica, alumina and zirconium oxide and clay.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The first cured resin layer and the second cured resin layer are formed with a micro cavity by a radiation-curing resin composite containing inorganic particle having average particle diameter of 50-250 nm. The radiation-curing resin composite is obtained by dissolving 0.4-2 pts. wt. inorganic particle, 100 pts. wt. resin composition, 90-99.9 wt.% of ionizing radiation-curable resin and 0.1-10 wt.% of photopolymerization initiator in organic solvent. The organic solvent has a total solid concentration of 10-60 wt.%. The first cured resin layer and the second cured resin layer have thickness of 0.5-5 mu m. The anti-static layer has a thickness of 30-150 nm and a surface resistance of 1011 Omega . The ionizing radiation-curable resin comprises conductive polymer resin, polyurethane resin, crosslinked resin and surfactant. A static friction coefficient between the anti-static layer and the transparent conductive layer is less than 0.3 mu m. The anti-static layer and the transparent conductive layer have an arithmetic average roughness of 5-50 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The porous metal oxide photoelectrode film is formed on a fluorine-doped tin oxide substrate. The porous metal oxide film comprises titania, zinc oxide, zirconium oxide, strontium oxide, indium oxide, lanthanum oxide, vanadium oxide, and/or molybdenum oxide. The amorphous protective layer comprises gallium oxide, titania, zirconium oxide, strontium oxide, zinc oxide, indium oxide, lanthanum oxide, and/or vanadium oxide. The amorphous protective layer has a thickness of 1 nm to 1 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The dye is di-tetrabutylammonium cis-bis(isothiocyanato)bis(2,2'-bipyridyl-4,4'-dicarboxylato)ruthenium(II), cis-bis(isothiocyanato)bis(2,2'-bipyridyl-4,4'-dicarboxylato)ruthenium(II), and/or cis-bis(isothiocyanato)(2,2'-bipyridyl-4,4'-dicarboxylato)(4,4'-di-nonyl-2'-bipyridyl)ruthenium(II).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The phenoxaphosphine compounds (I) and/or (II) are preferably 4-(2,8-dimethyl-10H-phenoxaphosphinin-10-yl)-N,N-diphenylaniline, 10-(4-(diphenylamino)phenyl)-2,8-dimethyl-10H-5,10-phenoxaphosphinin-10-one, 4-((2,8-dimethyl-10H-phenoxaphosphinin-10-yl)oxy)-N,N-diphenylaniline, 10-(4-(diphenylamino)phenoxy)-2,8-dimethyl-10H-5,10-phenoxaphosphinin-10-one and 2,8-bis(diphenylamino)-10-phenyl-10H-5,10-phenoxaphosphinin-10-one. Preferred Definitions:    R2,R4-R7,R9=H.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The triallyl isocyanurate is obtained by reacting cyanic acid soda or an isocyanuric acid, and an allyl chloride. Preferred Component: The content of 3-dichloro propene in an allyl chloride is 200 ppm or less. EXAMPLE - Components comprising (100 g) cyanic acid soda, 14 g calcium chloride, 13 g potassium bromide, and solution that consists of dimethylformamide (DMF) 500 g was maintained at 120 degrees C, and 98 g allyl chlorides (1, 3-dichloro propene: 140 ppm of cis-isomers and 140 ppm of trans-isomers were included) were dripped. The solvent was distilled off and the oily substance was obtained, after carrying out reaction ageing. The organic layer was obtained by carrying out water washing the oily substance and vacuum distillated to obtain 90% triallyl isocyanurate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (Q) comprises (a) reacting nanoclusters to obtain a first solution, (b) mixing the doping agent with the nanoclusters and then reacting at 110-180 degrees C to obtain a second solution, and (c) adding the first solution and the second solution and then mixing with precursor and reacting at 110-180 degrees C. Preferred Components: The nanoclusters have an average particle diameter of 2-8 mu m. The doping agent is an organic solvent. The nanocluster is precursor, capping agent or a surfactant. The precursor is silver nitrate, silver stearate or silver acetate. The indium is indium hydroxide, indium nitrate hydrate, indium acetate hydrate, indium acetylacetonate and indium acetate. The capping reagent has a structural of formula (I). The surfactant is 10-16C alkyl thiol. The sulfur precursor comprises a primary amine of formula (II). The organic solvent is 12-20C alkene and 8-20C carboxylic acid. The mole ratio of the: silver precursor and indium precursor to 1:3-10; silver, indium and sulfur is 1:10-20:100-140; and precursor and doping agent is 1:0.008-0.1. (Q) has a wavelength of 500-680 Angstrom .R1, R2 = 5-20C alkyl. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises (a) reacting nanoclusters to obtain a first solution, (b) placing the doping agent and shell in the solution and then reacting at 110-180 degrees C to obtain a second solution, and (c) mixing the obtained first and second solutions with precursor and then reacting at 110-180 degrees C. Preferred Components: The nanocluster has an average particle diameter of 2-8 mu m. The shell has average particle diameter of 2.1-9 mu m and thickness of 0.2-5 mu m. The shell further includes a zinc selenide shell layer or trialkylphosphine of formula (R3-P(R1a)(R2)). (Q) has a wavelength of 440-680 Angstrom . The doping agent is an organic solvent. The nanoclusters further comprise a precursor, a capping agent or a surfactant. The precursor is silver nitrate, silver stearate or silver acetate. The indium is indium hydroxide, indium nitrate hydrate, indium acetate hydrate, indium acetylacetonate or indium acetate. The capping reagent has a structural of formula (I). The surfactant is 10-16C alkyl thiol. The sulfur precursor comprises a primary amine of formula (II). The organic solvent is alkene having 12-20 carbon numbers and carboxylic acid having 8-20 carbon numbers. The mole ratio of the: silver precursor and indium precursor to 1:3-10; silver, indium and sulfur is 1:3-8:5-12; precursor and doping agent is 1:0.008-0.1; and zinc and selenium is 1:0.9-1.1.R1, R2 = 5-20C alkyl; andR1a, R3 = 5-12C alkyl. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nano-silicon dioxide hydrosol (A) is prepared by carrying out ion exchange of sodium silicate aqueous solution. The nano-silicon dioxide hydrosol (B) is obtained by carrying out acidic hydrolysis of ethyl silicate in an aqueous solution of ethanol. The latent light conversion component is silicon dioxide, zirconium oxide, lanthanum nitrate, yttrium nitrate and terbium nitrate. The film enhancening agent is aluminum dihydrogen phosphate, ammonium dihydrogen phosphate and phosphoric acid. The coating regulator is surfactant and coupling agent.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The surfactant is lauric acid diethanol amide and/or sodium lauryl sulfate. The coupling agent is organic silicon coupling agent, KH550-type coupling agent, KH560-type coupling agent, KH570-type coupling agent or methyl triethoxysilane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The copper salt is cuprous chloride, cupric chloride, copper sulfate, copper acetate, and/or copper nitrate. The molar concentration of copper salt in the aqueous phase is 4-20 mmol/L. The inert gas is nitrogen and/or argon. The molar ratio of selenium sodium hydride aqueous solution and precursor solution is 0.5-1:1. Preferred Method: The method comprises dissolving copper salt solution as water phase, dissolved long-chain ligand in organic solvent as oil phase, magnetically stirring under protection of inert gas at 100-300 revolutions/minute (rpm), reacting for 1-20 hours, and heating in oil bath at 30-100 degrees C to form precursor solution; adding selenium sodium hydride aqueous solution, heating for 1-20 hours, and sampling in different time to obtain quantum dot solution; and depositing ethanol, dispersing, centrifuging at 3000-15000 rpm for 10-30 minutes, and removing unreacted raw material.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The long-chain ligand is oleic acid, undecylenic acid, stearic acid, tri-n-octyl phosphine, dodecyl amine, hexadecyl amine, octadecyl amine, or oleyl amine. The organic solvent is n-hexane, toluene, chloroform, or octadecene. The volume ratio of organic solvent and water is 1:0.5-2. The molar ratio of long-chain ligand and copper salt is 1-10:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Silica liquid precursor is compound of formula RuOvSim, preferably tetraethyl orthosilicate or methyl silicate, zinc oxide liquid precursor is zinc acetate, zinc sulfate, or zinc chloride, aluminum liquid precursor is aluminum nitrate or aluminum chloride, preferably replaced by fluorine precursor which is trifluoroacetic acid, hydrofluoric acid, phosphorus trichloride, or ammonium fluoride, and solvent liquid precursor is water and/or alcohol.R=alkyl;u=3-8;v=0-4; andm=1-4.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The frosting agent comprises calcium chloride, barium chloride, calcium sulfate or barium sulfate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The crystalline silicon solar cell is selected from monocrystalline silicon solar cell or polycrystalline silicon solar cell. Monocrystalline silicon solar cell is selected from P-type silicon, P-type quasimonocrystalline silicon sheet or N-type monocrystalline silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The perovskite type oxide is Ba(0.5)Sr(0.5)Co(0.8)Fe(0.2)O(3- delta ), La(0.6)Sr(0.4)Co(0.2)Fe(0.8)O(3- delta ), La(0.6)Sr(0.4)CoO(3- delta ), SrNb(0.1)Co(0.9)O(3- delta ), PrBaCo2O(5+ delta ), GdBaCo2O(5+ delta ) or La2Ni4O(4+ delta ).    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The noble metal is platinum, palladium, gold or silver.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The microbial fuel cell comprises Pseudomonas aeruginosa. The fuel cell comprises cathode and anode. The anode is carbon paper, carbon felt, carbon cloth, carbon nanotubes, graphite or plate in metal foam. The cathode is a carbon paper, carbon felt, carbon cloth, carbon nanotubes, plate-like graphite, activated carbon, metal foam or gas diffusion electrode. The cathode comprises platinum catalyst.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The biological surfactant is 30-50 mg/l sophorose lipids.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The inert gas is nitrogen or helium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The alkali 1 is tributylamine. The catalyst 1 is palladium(II) acetate. The catalyst 2 is tetrakis(triphenylphosphine)palladium(0). The solvent 1 is dimethylformamide. The solvent 2 is tetrahydrofuran. The solvent 3 is tetrahydrofuran, ethylene glycol dimethyl ether, benzene or toluene.    TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): The copolymer (I) is prepared by:(A) in inert gas atmosphere, adding 4,4'-dibromo-6,6'-diiodo-2,1,3-benzothiadiazole, an alkyne compound, a catalyst 1, and alkali 1 into solvent 1, and reacting at 130 degrees C for 4 hours to obtain reaction product 1;(B) in inert gas atmosphere, adding dibromo-selenophene compound into solvent 2 at - 78 degrees C, adding butyllithium and reacting for 2 hours, then adding 2-isopropoxy-4,4,5,5-tetramethyl-1,3,2-dioxaborolane and reacting at - 78 degrees C for 1 hour, raising temperature to room temperature and continuously reacting for 6 hours, and then purifying by silica gel column chromatography to obtain reaction product 2; and(C) under protection of inert gas, adding reaction product 1, reaction product 2, catalyst 2 and alkali 2 into solvent 3, and reacting at 50-120 degrees C for 6-108 hours to obtain the copolymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The strong base is sodium hydroxide and/or potassium hydroxide. The concentration of strong base in mixed liquid is 6-12 mol/L. The zinc salt is zinc nitrate, zinc chloride and/or zinc acetate. The zinc ion concentration in aqueous solution of zinc salt is 0.1-0.5 mol/L.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The titanium-containing organic precursor is tetrabutyl titanate or isopropyl titanate. The concentration of titanium element in mixed liquid is 0.05-0.1 mol/L.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The semiconductors of the adjacent buffer layers comprise aluminum. The buffer layer in the regions comprises silicon, antimony, tellurium, zinc, selenium, and/or carbon. The substrate comprises silicon, germanium, gallium arsenide (GaAs), gallium phodphide, indium phodphide (InP) and/or gallium antimonide. The semiconductors comprises silicon-germanium (Si-Ge), aluminum gallium indium arsenide (AlGaInAs), gallium indium arsenide (GaInAs), indium gallium arsenic phosphide (InGaAsP), gallium arsenide antimonide (GaAsSb), aluminum gallium indium phosphide (AlGaInP), aluminum gallium indium arsenide antimonide (AlGaInAsSb) and/or gallium indium phosphide (GaInP). The front-side semiconductor layer is made of silicon, germanium, Si-Ge, GaAs, AlGaInAs, GaInAs, InGaAsP, GaAsSb, AlGaInAsSb, InP, AlGaInP and / or GaInP.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The conductive polymer is complex of substituted or unsubstituted polyaniline, which is complex of sulfosuccinic acid derivative of formula (II). The electroconductive polymer composition comprises phenolic hydroxyl group-containing compound of formula (III), which is para-tert-amyl phenol. The hydroxy group-containing solvent (I) has tert-butyl group. The solvents are 3-methoxy-1-butanol and ethylene glycol mono-tert-butyl ether.M=H, organic free radical or inorganic free radical;m=valence of M;R13,R14= hydrocarbyl or (R15O)r-R16, preferably 2-ethylhexy;R15=hydrocarbyl or silylene;R16=H, hydrocarbyl or R173Si;R17=hydrocarbyl;r=1 or more;n=1-5, preferably 1;andR=1-20C alkyl, 1-20C alkenyl, 1-20C alkylthio, 3-10C cycloalkyl, 6-20C aryl, 7-20C alkylaryl or 7-20C arylalkyl, preferably 1-8C alkyl. Preferred Definitions:    R1=linear or branched 8C or less alkyl;and    R2=linear or branched 8C or less alkylene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The pulverulent starting material contains 20-30 wt.% chromium, 70-80 wt.% iron, and 0.5-0.8 wt.% at least one rare earth metal. The rare earth metal is yttrium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The fuel cell is a solid oxide fuel cell (SOFC).    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The fuel cell uses a liquid hydrocarbon fuel. The fuel is butane.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The novolak-type epoxy compound is of formula: (II) or (III).X=single bond or methylene;ring A=aliphatic polycyclyl hydrocarbyl;andm=0-10.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The nano-particles are made of metal, doped oxide, graphene, and matrix material comprises group IV, group II-VI, and group III-V semiconductor material.
TECHNOLOGY FOCUS - METALLURGY - The second metal layer is made of material selected one of aluminum, silver, gold, copper, platinum, nickel, cobalt, chromium and titanium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic layer contains (meth)acryl compound having a glass transition temperature of 105 degrees C or more, and has 50-500 nm. The film thickness ratio of film thickness of barrier layer (in nm) with respect to film thickness of organic layer (in nm) is 1:0.1-10.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The gas-barrier film further has a base layer containing carbon-containing polymer between the base material and barrier layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alkoxysilane and/or alkoxyalkylsilane comprises optionally saturated, optionally branched, aliphatic, alicyclic and aromatic groups, in which the alkoxide and/or alkyl group is functionalized by hetero atoms chosen from oxygen, nitrogen, sulfur, chlorine and bromine. The boron-containing compounds are chosen from boron oxide, boric acid and boric ester. The phosphorus-containing compounds are chosen from phosphorus (V) oxide, phosphoric acid, polyphosphoric acid, phosphoric acid esters and phosphonic acid with ( alpha ) and ( beta )-position siloxane functionalized groups. The carboxylic anhydride is chosen from acetic anhydride, ethyl formate, propionic anhydride, succinic anhydride, maleic anhydride, sorbic anhydride, phthalic anhydride and benzoic anhydride. The solvent is chosen from isopropanol, butanol, butyl acetate, ethyl acetate, ethylene glycol monobutyl ether, diethylene glycol, diethylene glycol, diethylene glycol monobutyl ether, and/or dipropylene glycol monomethyl ether. The capping agent is chosen from acetoxytrialkylsilane, alkoxytrialkylsilane, halogentrialkylsilane and their derivatives. Preferred Process: The media is prepared based on hybrid sol and/or gel such as silicon dioxide-phosphorus pentoxide-boron trioxide and silicon trioxide-aluminum oxide-boron trioxide, using alkoxide/ester, hydroxide or oxide of aluminum, gallium, germanium, zinc, tin, titanium, zirconium, and/or lead.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The phenol-based heat resistant agent has structure of formula (I).R1=methyl;andR2,R3=1-5C alkyl.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The relative viscosity of polyamide resin is 2-3.5. The polypropylene resin has melt index of 3-50 g/10 minutes, measured based on ASTM D1268. The resin composition has tensile strength of 1100 kg/cm2 or more, measured according to ASTM D638, flexural strength of 1700 kg/cm2 or more, measured according to ASTM D790, and thermal deformation temperature of 150 degrees C or more at load of 4.6 kg/cm2, measured according to ASTM D64. Preferred Composition: The polyamide resin is chosen from polyamide 6, polyamide 12, polyamide 66, polyamide 6/66, polyamide 6/12, polyamide 6/6T, polyamide 6/6I and their copolymers. The polyamide resin composition further contains additive chosen from antioxidant, flame retardant, fluorescent brightener, plasticizer, thickening agent, antistatic agent, release agent, pigment and nucleating agent.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The component (A) is a compound having 2 (meth)acryloyl groups, and has number average molecular weight of 600-3000. The compound (c) in component (A) is 4-7 membered ring lactone adduct of hydroxyl group-containing (meth)acrylate (c-1) and/or 4-7 membered ring lactone which does not contain hydroxyl group-containing (meth)acrylate (c-2). The component (c-1) is ( epsilon )-caprolactone. The component (A) is mixture containing polyurethane (Ac1) obtained using compound (c-1) as compound (c) and polyurethane (Ac2) obtained using compound (c-2) as compound (c), in the weight ratio of 99/1-1/99. The component (B) contains compound having 2 or more (meth)acryloyl groups. The component (C) is a compound having 2 or more thiol groups. The active energy ray hardening-type composition further contains organic solvent. Electron beam is irradiated as active energy ray.
Preferred Definitions:    A = -C(O)N=CH-CH= or -NCH-CH=;    CFXY = CF3, CHF2 or CClF2; and    M = cations of Li, Na or Zn    EXAMPLE - Sample of 2-oxo-6-(trifluoromethyl)pyrimidine-2-one was dissolved in toluene and 1 equivalent dry lithium hydroxide was added as a solid. The resulting mixture was heated using a Dean-Stark apparatus. After no more water was removed from the mixture, the toluene was distilled off at 60 degrees C and a pressure of 100 mbar to obtain lithium salt of 2-oxo-6-(trifluoromethyl)pyrimidone which was kept under argon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The reducing agent comprises hydrazine.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic acid includes citric acid or ascorbic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: During fabrication of solar cell, cutting damage is removed using sodium hypochlorite or cyanuric acid chloride, and sodium hydroxide solution. Preferred Composition: The basic material is chosen from potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate and tetramethylammonium hydroxide. The etchant contains 3-12 wt.% compound having one hydroxy group, 10-50 wt.% silicate glass and 0.5-5 wt.% basic material. The content of sodium hypochlorite solution and content of sodium hydroxide is 12 wt.% and 40 wt.%, respectively.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The compound having one hydroxy group is chosen from isopropyl alcohol, 1-propanol, 1-butanol, 2-butanol, tert-butanol and isobutanol.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): The compound (I) is prepared by reacting organic compound of formula (II) and brominated compound (III) in presence of tetrakis(triphenyl phosphine)palladium (caltalyst) and an organic solvent. Preferred Composition: The molar ratio of compound (II) and compound (III) is 1:2-2.1, preferably 1:2. The molar ratio of tetrakis(triphenyl phosphine)palladium and compound (III) is 0.02-0.05:1, preferably 0.02:1. The organic solvent is toluene, chlorobenzene or xylene. Preferred Process: The compound (III) is prepared by reacting indane-1,3-dione, aldehyde compound of formula (IV), piperidine and acetonitrile at 70-90 degrees C for 12-24 hours under protection of nitrogen, cooling to room temperature, dissolving reacting liquid in dichloromethane, washing using salt water and anhydrous magnesium sulfate, evaporating solvent, and purifying using column chromatography in which methylene dichloride and petroleum ether in a volume ratio of 1:5 is used.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The copper-ion solution contains water as solvent. The copper oxide thin film contains p-type dopant containing element chosen from lithium, sodium, potassium and silver and/or nitrogen, phosphorus, arsenic and antimony, and n-type dopant containing element chosen from boron, aluminum, gallium and indium and/or fluorine, chlorine, bromine and iodine. Preferred Properties: The copper oxide thin film has band gap value of 1.2-1.56 eV and light absorption coefficient of 1x 104cm-1-2x 105cm-1, in light energy of 2 eV.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: 65-250 mol Alcohol (B) is preferably added with respect to 1 mol of metal alkoxide (A). The alcohol is 2-10C which has hydroxyl group in 1 molecule. The metal alkoxide (A) is chosen from titanium alkoxide and zirconium alkoxide. The salt (D) is obtained by reacting nitrogen compound, hydrogen chloride as strong acid and weak base. The nitrogen compound is chosen from hydrazine, acetamidine, hydroxylamine, phenylhydrazine, o-phenetidine, m-phenetidine, p-phenetidine, diethylmalonylurea, 1,10-phenanthroline, benzidine, and ammonia. Preferred Properties: The viscosity of composition with shear rate of 383 second-1 is 1-20 mPa.second at 25 degrees C. The laminated material consists of transparent film in the patterned upper layer or lower layer. The refractive index of the transparent film in the wavelength of 550 nm is 1.7 or more. The difference of reflectance in the wavelength of 550 nm in the area where the transparent film exists and area where the transparent film does not exist is 1% or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The nitrogen-containing organic compound is pyrrole, imidazole, pyrazole, pyridine, pyrazine, pyrimidine, pyridazine, indole, quinoline, benzoquinoline, benzimidazole, triazine, and carbazole, which are substituted by deuterium, halogen atom, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group and t-butyl group, preferably at least one of imidazole and benzimidazole (both substituted by deuterium, methyl group and ethyl group). The oxidant is hydrogen peroxide, ammonium persulfate, hypochlorous acid, and/or perchloric acid. The acid is sulfuric acid, nitric acid, phosphoric acid, hydrochloric acid and/or acetic acid. The composition for producing graphene, contains 0.2-10 wt.% nitrogen-containing organic compound, 1-10 wt.% oxidizing agent, 2-30 wt.% acid, and remainder of solvent. Preferred Process: Manufacture of graphene involves coupling a carrier film (120) to one surface of graphene, laminating, and transferring graphene film to a target (140). A catalytic film is further used during manufacture of graphene.
TECHNOLOGY FOCUS - METALLURGY - The Group-IVA element is silicon or germanium, and the Group-VIA element is sulfur, selenium or tellurium. The optical absorber comprises compound of formula Fex(CaSibGecSndPbe)(SfSegTeh)y or Fex'(Sib'Ge1-b')(Sf'Se1-f')y'.x=1.8-2.2;y=3.5-4.5;a+b+c+d+e=1;f+g+h=1;x'=2;y'=4;b'=0-l;f'=0-1.
TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The step of forming the first coating comprises: applying a matrix precursor solution to the substrate, applying particles to the matrix precursor solution, and curing the matrix precursor coating; and suspending the particles in a matrix precursor solution, applying the matrix precursor solution and suspended particles to the substrate, and curing the matrix precursor solution. The step of forming the second coating comprises applying a sol-gel precursor solution, and curing the sol-gel precursor solution to form a xerogel. The method further comprises: curing the first coating and the second coating after both coatings are formed; and applying a hydrophobic coating on the second coating. The substrate is present at a temperature of 400-700 degrees C when the matrix precursor solution is applied to the substrate. Preferred Components: The support matrix comprises a xerogel and a polymer. The second coating has a thickness of 100-200 nm, preferably 120-160 nm. The sol-gel precursor solution comprises a porogen. The article further comprises a hydrophobic coating. The coating further comprises an additive such that the cured coating has a hydrophobic surface. The coating is disposed on only one side of the article. The uncoated side of the float glass is textured.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The window layer comprises zinc sulfide and indium sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The manufacturing method of the colloid quantum dot thin film comprises cadmium sulfate, cadmium selenide, cadmium telluride, zinc sulfide, zinc selenide, zinc telluride, mercury sulfate, mercury selenide, mercury telluride, lead sulfate, lead selenide, lead telluride, aluminum nitride, aluminum phosphide, aluminum arsenide, gallium nitride, gallium phosphide, gallium arsenide, indium nitride, indium phophide and indium arsenide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The volume of the fastening component is changed according to the temperature of the negative thermal expansion (NTE) material formed of cubic zirconium tungstate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The inert gas is selected from argon, helium, neon, and nitrogen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The polysilicon seeds have particle size of 50-600 mu m. The polysilicon seed product has particle size of 600-2000 mu m.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Composition: The positive electrode comprises 0.2-15 wt.% plasticizer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The conductive polymer is at least one chosen from polyaniline and its derivative. The plasticizers are polyoxyalkylene and at least one of its derivative(s) or polypropylene glycol and at least one of its derivative(s). The plasticizer has 90-2000 molecular weight. The polyanion acid is at least one chosen from polyacrylic acid, poly(methacrylic acid), polyvinyl benzoic acid, poly alkyl benzoic acid, poly methallyl benzoic acid, polymaleic acid, poly fumaric acid, and poly glutamic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The aromatic dihydroxy compound is of formula (III).A1=single bond, CO, S, CO2, or 1-5C alkylene, 1-5C alkylidene, 3-6C cycloalkyl, or 5-6C cycloalkylidene (all optionally substituted);R3,R4=1-30C alkyl or 6-30C aryl (both optionally substituted);anda,b=0-4.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polysiloxane-polycarbonate copolymer comprises a polysiloxane unit of formula (I) included in the main chain in an amount of 0.1-20 wt.%. The polymerization weight ratio of polysiloxane and polycarbonate is 1:0.1-1:5. The content of copolymer in the composite sheet is 5-40 wt.%. The copolymer is a copolymer of formula (II) of polysiloxane, aromatic dihydroxy compound, and phosgene compound.R1,R2=1-10C alkyl or 6-18C aryl (both optionally substituted by halo or 1-10C alkoxycarbonyl);A,B'=optionally substituted 2-20C hydrocarbyl optionally having -O- or -S-;Z=optionally substituted 1-24C hydrocarbyl optionally having ester bond or urethane bond;Y'=H, halo, 1-18C (halo)alkyl, cyano, or 1-18C ester group;andm,n=4-100.Preferred Properties: The post-cure refractive index of copolymer is 1.5-1.6. The copolymer has a glass transition temperature of 100-150 degrees C. The composite sheet has a pencil hardness of HB or 1B as measured by electric-powered pencil hardness meter.    TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Material: The reinforcing material has a refractive index of 1.5-1.57 and a thickness of 100-200 mu m. The reinforcing material is glass fiber, glass fiber cloth, glass fabric, glass nonwoven fabric, and/or glass fiber mesh.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The encapsulatant film satisfies the relation: P=a1(TL-100)+b1 (i), where P is the peeling angle of 90 degrees , and is peeling force is measured at peeling rate of 50 mm/minute with respect to glass substrate, TL is the lamination temperature of the glass substrate, a1 is 1 or more and b1 is 40 or more. The encapsulant film has yellowing index (YI) of 0.5-2.5, preferably 1-1.5, measured using the relation: YI=(100(1.28Xc- 1.06Zc))/Yc (ii), where YI is the calculated value of color difference analyzed by ultraviolet-visible-near infrared spectrometer, and Xc,Yc and Zc are the co-ordinates of red, green and blue color. Preferred Composition: The encapsulant film comprises olefinic monomer comprising polymerized units in main chain, and branched copolymer of formula: -SiR1lR2(2-i)R3 (I) coupled with main chain.R1,R2=halo, or amino bonded to silicon atom, -R4R5, or R5;R4,R9=O, or S;R5,R10=H, alkyl, aryl, aralkyl or acyl;i=1 or 2;R3=-OSiR6mR7(2-m)R8;R6,R7=halo, or amino bonded to silicon atom, -R9R10, or -R10;R8=- (CH2)nNR11R12a;R11,R12=H bonded to nitrogen, or R13NH2;R13=alkylene;m=1 or 2;andn=0 or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Non-aqueous electrolyte is an oxalate complex compound which contains phosphorus and/or boron as a constituent element, preferably lithium difluorobis(oxalato)phosphate (LiPF2(C2O4)2), and non-aqueous solvent. Positive electrode active material is a lithium transition metal composite oxide, and negative electrode active material is a carbon material which has graphite structure in part at least. Preferred Parameters: Concentration of LiPF2(C2O4)2 in the non-aqueous electrolyte is 0.02-0.04 mol/L.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Load of the copper(I) chloride-pyridine complex is greater than or equal to 1 g per 1 mmol of separator.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The half-shells and the substrate carrier are made of corrosion resistant material e.g. ceramics or carbon.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The additive is made of vinylene carbonate and fluoroethylene carbonate.    TECHNOLOGY FOCUS - POLYMERS - The alkali metal salt of the polymer anion provided with polyacrylic acid lithium, sodium polyacrylate, polystyrene sulfonate lithium and polystyrene sulfonate sodium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The ceramic powder is nickel oxide-yttria stabilized zirconia, beta -alumina, and silicon carbide. The cylinder porous ceramic supporter comprises 1-2 pts. wt. of ceramic powder, 5-30 pts. wt. of dispersant, 20-30 pts. wt. of pore forming agent and balance amount of water. The pore-forming agent is graphite or carbon black.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Obtaining derivatives of highly symmetric tris-imidazolium salts of formula (I) involves using compound of formula IV in the presence of trisalkyl orthoformate and an acid of formula HX. Preferred Compound: Derivatives of highly symmetric tris-imidazolium salts of formula (I) comprise formulae (I)-1, (I)-2, (I)-3, (I)-4, and (I)-5. The trisalkyl orthoformate is HC(OEt)3. The organometallic polymer is selected from formulae (A) and (B). Preferred Definitions:    R1=1-10C alkyl selected from tert-4-10C alkyl, tert-pentyl, tert-butyl, ethyl, phenyl substituted by one or more CH3 groups or optionally substituted by one or more R2, a group of formula II, or tert-butyl;    R2=Cl, or -OCH3;    X=Cl, I, B(R2 )4, P(R2)6, B(R3)4, or P(R3)6; and    R2 and R3=F.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first element is nickel. The second element is iron. The sulfide composition MxSy is selected from FeS, FeS2, CoS2 or Co3S4 (preferably FeS). The first alkali metal halide comprises sodium, potassium and/or lithium. The electrolyte salt comprises at least one halogen selected from chlorine, iodine, bromine and fluorine; comprises sodium chloride and aluminum chloride in a molar ratio of 0.53:0.48 to 0.45:0.55. The molar ratio of the first element to the sulfur of the sulfide composition is 5:1 to 25:1 (preferably 5:1 to 10:1). The first alkali metal halide comprises at least one of NaCl, NaF, NaBr and NaI; and the electrolyte salt is NaAlCl4. The molar ratio of the total amount of the first alkali metal to the sulfur of the sulfide composition is 1.75:1 to 10:1. The first alkali metal halide comprises at least one of NaCl, NaF, and NaI. The solid separator comprises beta -alumina, beta ''-alumina, gamma alumina, micromolecular sieve, silicon nitride, silicophosphate, or nasicon; comprises a shape which is flat, undulate, domed or dimpled, or comprises a shape with a cross-sectional profile that is an ellipse, triangle, cross, star, circle, cloverleaf, rectangular, square, or multi-lobal.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aromatic vinyl compound contains optionally substituted vinylnaphthylene, acenaphthylene or vinylcarbazole, and an optionally substituted styrene. The polycyclic aromatic vinyl compound is vinylnaphthlylene, acenaphthylene, or vinylcarbazole.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The formation of pattern structure involves forming an underlayer on a base material before coating the lower layer film formation composition of self-organizing film and forming lower layer film. The lower layer film is formed by coating the lower layer film formation composition of self-organizing film on a substrate, and baking. Preferred Composition: The polymer has 20 mol% or more unit structure of aromatic vinyl compound with respect to total unit structure of polymer, and 1 mol% or more unit structure of polycyclic aromatic vinyl compound with respect to total unit structure of aromatic vinyl compound. The lower layer film formation composition of self-organizing film further contains a crosslinking agent, an acid or acid generator, and a block polymer obtained by bonding polymer chain (A) containing organic monomer (a) as a unit structure and polymer chain (B) containing organic monomer (b) different from organic monomer (a) as a unit structure. The content of unit structure of aromatic vinyl compound with respect to total unit structure of polymer is 60-95 mol%. The polymer further has a unit structure having a crosslinking group chosen from hydroxyl group, epoxy group, protected hydroxyl group, and protected carboxyl group. The block polymer comprises polystyrene (A) and polymethyl methacrylate (B), polystyrene (A) and polyisoprene (B), polystyrene (A) and polybutadiene (B), polystyrene (A) and polydimethylsiloxane (B), polystyrene (A) and polyethylene oxide (B), or polystyrene (A) and polyvinyl pyridine (B). The underlayer is an anti-reflective film or hard mask.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The crosslinking group is hydroxyl group, epoxy group, carboxyl group, amino group, isocyanate group, protected hydroxyl group, protected carboxyl group, protected amino group or protected isocyanate group. The crosslinking group-containing compound is hydroxyethyl methacrylate, hydroxyethyl acrylate, hydroxylpropyl methacrylate, hydroxypropyl acrylate, hydroxy styrene, acrylic acid, methacrylic acid, glycidyl methacrylate or glycidyl acrylate. The lower layer film formation composition further comprises a crosslinking agent, an acid or an acid generator. The self-organizing film is formed using composition comprises block polymer containing a organic polymer chain (A) containing an organic monomer (a) as a unit structure, and a polymer chain (B) which bonds with organic polymer chain (A)and contains a monomer (b) other than organic monomer (a) as a unit structure. The block copolymer is polystyrene block polymer and polymethyl methacrylate, polystyrene and polyisoprene, polystyrene and polybutadiene, polystyrene and polydimethyl siloxane, polystyrene and polyethylene oxide, or polystyrene and polyvinyl pyridine. Preferred Process: The formation of pattern structure further involves forming an anti-reflective film or a hard mask as an underlayer before forming the lower layer film. Before coating self-organizing film formation composition, the lower layer film is contacted with a solvent, and the surface layer of the lower layer film is removed.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The weight average molecular weights (Mw) of thermoplastic polyimide 10000-500000, complex shear viscosity eta asterisk is 1x 102-5x 105 Pa.second at 310 degrees C and the change rate in complex shear viscosity in progress back and front is 300% or less, for 60 minutes at 310 degrees C. Preferred Structure: The alicyclic structure is cyclohexane ring structure or imide ring structure in which two carbon atoms are adjoined. The alicyclic structure unit is of formula (I), formula (II) or (III).R1-R8=H, 1-4C alkyl, 1-4C fluoroalkyl or hydroxy;X=direct bond, O, S, 1-4C alkylene, sulfonyl, sulfinyl, sulfide, carbonyl, amide, ester, or secondary amino;andn=0-4.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The conductive carbon layer comprises graphene, and singe wall carbon nanotube subjected to acid treatment. Preferred Properties: The ultraviolet light has wavelength of 10-400 nm, preferably 150-180 nm. The irradiation accumulated light quantity of the ultraviolet-ray is 50-500000 mJ/cm2, preferably 500-30000 mJ/cm2. The atmosphere has oxygen pressure 101-21273 Pa, preferably 1013-10130 Pa. Preferred Process: The formation of film further involves removing the resin layer after irradiating ultraviolet light.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The overcoat layer comprises hydrolyzate of hydrolyzable organosilane, and has thickness of 1 nm to 1 microns.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The resin layer having predetermined pattern is provided by printing process, and does not transmit ultraviolet-ray.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The semiconductor substrate further has buffer layer (3) and conductive-type semiconductor layer (17). At least one of the nitride semiconductor layer comprises aluminum nitride. The control layer includes nitride semiconductor layer (B) includes aluminum nitride, nitride semiconductor layer (C) includes aluminum gallium nitride. The semiconductor substrate nitride semiconductor layer (A) comprises gallium nitride. The nitride semiconductor layer (B) comprises a dopant with a concentration of 0.5x 1018/cm3 to 5x 1019/cm3. The nitride semiconductor layers comprise aluminum gallium nitride of formula: Al(1-x)GaxN, where x is 0-1. The control layer comprises aluminum nitride layer and aluminum gallium nitride layer. Preferred Composition: The dopant is silicon. During manufacture of semiconductor device, the content of dopant is 0.1 mu mol. Preferred Property: The thickness of conductive semiconductor layer is 2-6 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The component (A) further comprises an organopolysiloxane having two or more aliphatic unsaturated groups bonded to a silicon atom and one or more fluorine containing compound of formula (CF3-(CF2)m-(CH2)n-) (II) group bonded to a silicon atom in one molecule, and a branched structure of a siloxane compound of formula (SiO(4/2)) and/or (RSiO(3/2)). The component (B) is an organohydrogen polysiloxane compound of formula (R3a1HbSiO(4-a1-b)/2) (III).R = monovalent hydrocarbyl (optionally substituted), where a plural number of siloxane units have R, and then R may be the same or different groups from each other;R3 = silicon atom-bonded monovalent hydrocarbyl other than an aliphatic unsaturated group (optionally substituted);a1 = 0.7-2.1; andb = 0.001-1, where the sum of a1+b is 0.8-3.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The component (D) is silicone powder containing a polyorganosilsesquioxane resin. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The carbonaceous material further has face distances of 3.3-3.5 Angstrom measured by plane of X-ray diffraction of hexagonal crystal graphite layer. The carbonaceous material is graphite. Preferred Device: The device comprises positive electrode comprising carbonaceous material, negative electrode comprising carbonaceous material in which cations can be inserted and released in between the layers, and nonaqueous electrolyte solution. The nonaqueous electrolyte solution is electrolyte solution which dissolves lithium ion. The negative electrode comprises the carbonaceous material which occludes lithium ion and may detach in which lithium ion is occluded previously. The negative electrode is obtained by electrochemically reacting negative electrode and lithium metal. The negative electrode has metallic lithium having electric potentials of 0.01-0.25 V. The negative electrode also includes graphite or difficultly-graphitizing carbon. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The austenitic stainless steel has aperture of at least 70% or more when measured by tensile test in air at room temperature.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The 1st metal layer is derived from gold, silver, copper, and/or aluminum. The 2nd metal layer is derived from gold, silver, copper, and/or aluminum. Dielectric material layer comprises compound containing magnesium, aluminum, silicon, titanium, zinc, niobium, molybdenum, indium, tin, hafnium, tantalum, and/or tungsten and oxygen, nitrogen, and/or fluorine. Light emitting element comprises 2nd semiconductor layer positioned between 2nd metal layer and organic semiconductor layer. Preferred Parameters: Thickness of 1st metal layer is 50-500 nm. Resonance wavelength of dielectric material layer is 200-900 nm. Thickness of 2nd metal layer is 5-50 nm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - An organic material is provided from poly ethylene, poly propylene, poly vinyl chloride, poly styrene, poly vinyl alcohol, poly methyl methacrylate, and poly acrylonitrile.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The inorganic barrier comprises metal including silicone, aluminum, selenium, zinc, antimony, indium, germanium, tin, bismuth, transition metal and lanthanide series metal, metal oxide, metal nitride, metal carbide, metal oxynitride, and/or metal oxygen boride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The photocurable monomer (B) is (2Z)-4-(2-((2-methyl prop-2-enoyl)oxy)ethoxy)-4-oxobut-2-enoic acid, and (2Z)-4-oxo-4-(4-(prop-2-enoyloxy)butoxy)but-2-enoic acid. The photocurable monomer (A) is substituted or unsubstituted vinyl group, acrylate group, or methacrylate monomer, and 1-20C alkyl group (meth)acrylate, 2-20C diol of di(meth)acrylate, 3-20C triol tri(meth)acrylate, and 4-20C tetra(meth)acrylate. The content of photocurable monomers (A and B') is 1-99 wt.%, respectively. The photocurable composition further comprises photoinitiator. Preferred Properties: The organic barrier layer has gas production rate of 1000 ppm or less. The organic barrier layer has water permeability of 4.5 g/m2 measured with thickness of 5 mu m and 100% relative humidity for 24 hours. The organic barrier layer has thickness of 0.1-20 mu m. The inorganic barrier layer has thickness of 5-500 nm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The wet-anisotropic etching substance used during the peeing process contains tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide, potassium hydroxide-isopropyl alcohol, ethylenediamine pyrocatechol, potassium hydroxide, and/or amine gallate.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The rear substrate comprises glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The selenium blocking layer comprises oxide of copper and/or copper, oxygen, nitrogen, copper oxide, cuprous oxide, cupric oxide, copper nitride, copper (II) nitrate and/or molybdenum nitride. The semiconductor absorber film comprises copper indium gallium selenide. The photovoltaic device further has layer comprising copper oxide (44) located between rear substrate (22) and layer (24), ohmic contact layer (52) formed between semiconductor absorber and layer (26), and substantially transparent conductive front contact comprising substantially transparent metal oxide. The ohmic contact layer comprises molybdenum diselenide. The layer (c1) preferably contains copper. The layer (c2) preferably contains molybdenum. Preferred Properties: The selenium blocking layer has an enthalpy of formation smaller than that of copper selenide. The thickness of selenium blocking layer is 5-200 nm, preferably 15-75 nm. The thickness of conductive layer (c1) and (c2) is 10-300 nm, preferably 20-100 nm and 20-200 nm, respectively.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Arrangement: A mesh is provided between the catalysts for preventing mixing of catalysts. Temperature (I) is 700 degrees C or more and temperature (II) is 500 degrees C or less. The amount of catalyst at inlet side is determined according to the temperature distribution form the inlet port to vent.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Catalysts: The catalyst at inlet side is a noble-metal-based catalyst or a nickel-based catalyst coated with an oxide. The catalyst at vent side is a nickel-based catalyst.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The solar cell preferably has efficiency of converting solar spectral irradiance on the surface of the indium-doped monocrystalline silicon wafer 30% of under absolute air mass of 1.5. The indium-doped monocrystalline silicon wafer has average bulk resistivity of less than 10 ( Omega )cm, preferably less than 0.5 ( Omega )cm, and absorbs light having wavelength 830-1400 nm. Preferred Composition: The monocrystalline silicon segment and monocrystalline silicon wafer comprise indium having concentration of 1x 1015-1x 1017 atoms/cm3, 2 ppm or less carbon and 11-20 ppm oxygen.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Composition: The cable has the aluminum group electroconductive material for conductor strand having wire diameter of 0.05-0.5 mm.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The crystal grains are aluminum-based alloy crystal grains. The aluminum-based alloy contains 0.1-0.2 %mass zirconium. The content of crystal grains having average grain diameter of 1 mu m or less in the metallic structure is 15% or more, preferably 20% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The transparent material of the cell is transparent glass such as silica, quartz, alumina, titania, or their mixtures.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The aqueous microemulsion comprises: 20-90 wt.%, preferably 50-70 wt.% of water with respect to the total weight of a mixture of a surfactant, a co-surfactant, and water; 3-25 wt.%, preferably 10-15 wt.% of surfactant with respect to the total weight of the mixture of surfactant, co-surfactant and water; 6-50 wt.%, preferably 20-30 wt.% of co-surfactant with respect to the total weight of the mixture of surfactant, co-surfactant and water; 1-90 wt.%, preferably 5-20 wt.% of organic solvent immiscible with water with respect to the total weight of a mixture of organic solvent immiscible with water and water; and 0.02-2 wt.%, preferably 0.1-0.5 wt.% of photoluminescent compound with respect to the total weight of a mixture of photoluminescent compound and the organic solvent immiscible with water. The photoluminescent compound is benzothiadiazole compound, acene compound, or their mixtures. The surfactant is anionic surfactants such as sodium dodecyl sulfate, sodium octadecyl sulfate, nonylphenol ether sulfate, or their mixtures. The co-surfactant is alcohol such as 1-butanol, 1-pentanol, 1-hexanol, 1-octanol, or their mixtures. The organic solvent immiscible with water is toluene, cyclohexane, heptane, or their mixtures.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The semiconductor quantum dot contains lead selenide, lead sulfide, indium nitride, indium arsenide, indium antimonide, and indium phosphide, preferably lead sulfide. Preferred Properties: The semiconductor quantum dots have average particle diameter of 2-15 nm. The several log of complex stability law (( beta )1) between the ligand and the metal atom of the semiconductor quantum dot is 5 or more. Preferred Process: The semiconductor quantum dot aggregate formation process and ligand-exchange process are carried out twice or more, respectively, during manufacture of semiconductor film.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ligand is chosen from diethanolamine, diethylenetriamine, 2-(2-amino ethylamino) ethanol, and their derivatives. Preferred Process: The ligand carries out a tridentate coordination with respect to the metal atom in the semiconductor quantum dot. Preferred Definitions:    X1=NH.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The manufacturing method involves using second ligand agent. Preferred Components: The metal ion is alkali metal ion. The alkali metal ion is potassium ion or lithium ion. The semiconductor quantum dots comprise at least one chosen from lead sulfide, lead selenide, indium nitride, indium arsenide, indium antimonide and indium phosphide, and preferably lead sulfide. The average particle diameter of the semiconductor quantum dot is 2-15 nm. The average shortest (minimum) distance between the semiconductor quantum dots is 0.45 nm or less. The second ligand agent is alkali metal salt of thiocyanic acid. The second ligand agent is at least one of potassium thiocyanate and lithium thiocyanate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The threshold negative imbalance of flow battery is between 0.01M and -0.05M. Preferred Composition: The charged reactant species in the negative electrolyte is chromium ion (Cr2+) and the charged reactant species in the positive electrolyte is ferric ion (Fe3+).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The iron oxide is iron(II) oxide or iron(II,III) oxide. The silicon dioxide includes 20% or more crystal structure. Preferred Property: The volume density of the vapor deposition material is 0.9-1.4 g/cm3.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The alloy containing iron is ferrosilicon.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of smectite is 5-50 pts. wt. with 100 pts. wt. of total content of compound (a), smectite and silane coupling agent. The molar ratio of smectite and silane coupling agent is 2/1-10/1. The functional group of (C) is (meth)acryloyl group, mercapto group, epoxy, and acid-anhydride group. The compound (a) contains organic-inorganic composite component having (meth)acryloyl group coupled with a surface through -O-Si-X-coupling. The resin composition further contains urethane acrylate having two or more (meth)acryloyl groups in one molecule and/or (meth)acrylate compound having cyanurate structure with 2 or more (meth)acryloyl groups in one molecule.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The aromatic-polyester stretched film is stretched film of aromatic polyester containing polyethylene terephthalate or polyethylene naphthalate as main component. The thickness of base film is 10-300 micron.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: When the total content of components (A)-(C) is 100 pts. wt., the content of component (B) is 5-50 pts. wt., and the weight ratio of component (B) with respect to component (C) is 2/1-10/1. The functional group contained in component (C) is chosen from (meth)acryloyl group, mercapto group, epoxy group and acid-anhydride group. The active-energy-ray-curable resin composition further contains ultraviolet curable acrylate compound (E) having 3 or more (meth)acryloyl groups in a molecule, and not having urethane structure and isocyanurate structure, and/or (meth)acrylate compound (F) having isocyanurate structure containing 2 or more (meth)acryloyl groups in a molecule and/or urethane structure containing 2 or more (meth)acryloyl groups in a molecule. The polymer base material is optically transparent film or sheet obtained from aromatic polyester resin having polyethylene terephthalate or polyethylene naphthalate as main component, triacetyl cellulose, (meth)acrylic resin having polymethylmethacrylate as main component, or polycarbonate resin, and has thickness of 10 mu m to 5 mm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The crosslinking agent has functional group chosen from epoxy group, oxazoline group, double bond, triple bond, amino group and hydroxyl group.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The weight average molecular weight of the polyimide is 160000 or less. 20 mu m Thick-polyimide film produced using the polyimide resin solution has thermal expansion coefficient of 20 ppm/K, measured at 100-300 degrees C. The moisture content of polyimide resin solution is 1000 ppm or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The synthetic amorphous silica is dry-type silica. The dry-type silica is hydrophilic dry-type silica.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The silane compounds are 3,3,3-trifluoro propyltrimethoxysilane or 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluoro-octyltriethoxysilane. The fluorine-containing elastomer composition further contains 1-100 parts mass, preferably 3-50 parts mass synthetic amorphous silica, 0.3-3 parts mass, preferably 0.5-3 parts mass organic peroxides and 2-10 parts mass, preferably 3-8 parts mass crosslinking agent with respect to 100 parts mass crosslinkable fluorine-containing elastomer. The organic peroxide is 1,3-bis(t-butylperoxyisopropyl)benzene. The crosslinking agent is triarylisocyanurate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The crosslinkable fluorine-containing elastomer contains tetrafluoroethylene-propylene-type copolymer and hexafluoropropylene vinylidene fluoride tetrafluoroethylene-type copolymer. The crosslinkable fluorine-containing elastomer is fluorine-containing elastomer in which peroxide is crosslinked. Preferred Definitions:    R1=trifluoropropyl, nonafluoro hexyl or tridecafluoro octyl;and    alkoxy=methoxy or ethoxy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal material is aluminum, chromium, cobalt, nickel, nickel alloys, stainless steel alloys, stainless steel or titanium. The support material contains alumina, zinc oxide, cerium oxide, lanthanum oxide, ferric oxide, manganese oxide, calcium oxide or silicon oxide. The active phase of the catalyst comprises nickel, platinum, rhodium, cobalt, copper, chromium, sodium, iron, magnesium, zinc, niobium, molybdenum, rhodium, silver, palladium, gold, titanium, vanadium, silicon or gallium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: At least one process gas is temporarily supplied during heat treatment. The process gas contains chalcogen chosen from sulfur and selenium, and/or chalcogen compound chosen from sulfur-containing compound and selenium-containing compound.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Component: The electrochemical device further includes a catalyst supported on catalyst promoter and including noble metal, such that the catalyst promoter is disposed between the catalyst and the base, and a proton exchange membrane disposed adjacent to the catalyst such that the catalyst is positioned between the catalyst promoter and the proton exchange membrane.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The catalyst contacts at least one of the amorphous metal oxide and graphene. The amorphous metal oxide contacts graphene. The amorphous metal oxide is of formula: MOx, where x is sub-stoichiometric relative to O such that MOx is oxygen deficient. The total contacting surface between the substrate and the catalyst promoter is 25-75% of the external surface of the base. The catalyst promoter includes a number of spaced apart discontinuities of the amorphous metal oxide. The amorphous metal oxide is formed by sputtering with a source of metal oxide (MOy, where y is x) and source of inert gas separately provided from the source of metal oxide, or by sputtering with source of metal (M) and a source of a mixed gas separately provided from the source of metal (M). The mixed gas includes oxygen and inert gas. Preferred Property: The average diameter of number of spaced apart discontinuities is 2-3 nm. Preferred Process: The sputtering is carried out at temperature less than the crystallization temperature of metal oxide (MOx), in oxygen-to-argon volume ratio of 10-30%.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The density of tempered glass is 2.45 g/cm3 or less. The compressive-stress value of compressive-stress layer having thickness of 10 mu m or more is 300 MPa or more. The liquidus temperature of tempered glass is 1200 degrees C or less. The liquid phase viscosity of tempered glass is 104 dPa.second or more. The temperature of tempered glass in liquid phase viscosity of 104 dPa.second is 1300 degrees C or less. The thermal expansion coefficient of tempered glass at 30-380 degrees C is 90x 10-7/ degrees C or less. The tempered glass board has length of 500 mm or more, width of 300 mm or more, and thickness of 0.1-2 mm.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The glass composition preferably comprises 50-77 mol% silica, 6.5-12.4 mol% alumina, 1-10 mol% boron trioxide, 0-1 mol% lithium oxide, 9-15.5 mol% sodium oxide, 0-3.5 mol% potassium oxide, 0.1-2.5 mol% magnesium oxide, 9-16.5 mol% total of lithium oxide, sodium oxide and potassium oxide, 0.1-2.5 mol% total of magnesium oxide, calcium oxide, strontium oxide and barium oxide, and 13-18.5 mol% total of lithium oxide, sodium oxide, potassium oxide, magnesium oxide, calcium oxide, strontium oxide and barium oxide. The molar ratio magnesium oxide with respect to total amount of lithium oxide, sodium oxide, potassium oxide, magnesium oxide, calcium oxide, strontium oxide and barium oxide is 0.01-0.2. The molar ratio of total amount of alumina and barium trioxide with respect to silica is 0.15-0.3.
TECHNOLOGY FOCUS - METALLURGY - The silicon material is polycrystalline silicon and N-type monocrystalline silicon substrate. The P-type doped oxide comprises boron-doped oxide and borosilicate glass.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The method further involves forming anti-reflective coating layer (404) on the silicon nitride-containing layer. Preferred Composition: The anti-reflective coating layer comprises silicon dioxide, silicon oxynitride, aluminum oxide and/or aluminum oxynitride. The process gas mixture (A) preferably comprises nitrogen and silane. The passivation/anti-reflective coating layer comprises a dielectric layer including silicon nitride layer, silicon carbide layer or carbon layer. The silicon nitride layer comprises 60-65 volume% silicon elements, 10-25 volume% hydrogen elements and 10-25 volume% nitrogen elements. Preferred Properties: The silicon nitride-containing layer formed on the substrate has a refractive index of 2-2.8 at wavelength of 633 nm, and an extinction coefficient of less than 0.1 at wavelength of 400 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The solid state sintered material further contains calcium oxide, and doped ceramic metal oxide ionic conductor. The inclusions further comprise a pore-forming particulate material. The pore-forming particulate material comprises carbon black, flour, starch and/or poly(methyl methacrylate). The inclusions are derived from agglomerates comprising calcium carbonate which is subjected to partial thermal decomposition to calcium oxide. The agglomerates further comprise pore-forming material. The doped ceramic metal oxide is doped with yttrium oxide, gadolinium oxide, neodymium (III) oxide, samarium oxide or ytterbium oxide, and is preferably of formula: Ce0.8Sm0.2O3.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The electroluminescent device has a primary electrode (120), a secondary electrode (180) and organic compound layer interposed between electrodes and containing heterocyclic compound. The organic compound layer is a hole injection layer, a hole transporting layer or a light emitting layer (150). SPECIFIC COMPOUNDS - 426 nitrogen-containing heterocyclic compounds e.g. (9,9-dimethyl-9H-fluoren-2-yl)-phenyl-(3'-(9-phenyl-9H-carbazol-2-yl)-biphenyl-4-yl)-amine of formula (Ia), biphenyl-4-yl-(9,9-dimethyl-9H-fluoren-2-yl)-(3'-(9-phenyl-9H-carbazol-2-yl)-biphenyl-4-yl)-amine, biphenyl-4-yl-(3'-(9-biphenyl-4-yl-9H-carbazol-2-yl)-biphenyl-4-yl)-(9,9-dimethyl-9H-fluoren-2-yl)-amine, (9,9-dimethyl-9H-fluoren-2-yl)-naphthalen-1-yl-(3'-(9-phenyl-9H-carbazol-2-yl)-biphenyl-4-yl)-amine and (3'-(9-biphenyl-4-yl-9H-carbazol-2-yl)-biphenyl-4-yl)-(9,9-dimethyl-9H-fluoren-2-yl)-naphthalen-1-yl-amine are specifically claimed.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The bismuth ferrite thin film layer is located between the substrate and titanium dioxide thin film layer. The bismuth ferrite has rhombohedral perovskite structure. The titanium dioxide has anatase structure. The bismuth ferrite/titanium dioxide composite thin film has iron-oxidizing layer between bismuth ferrite thin film layer and titanium dioxide thin film layer. Preferred Properties: The thickness of bismuth ferrite thin film layer is 100 nm to 1 mu m. The thickness of titanium dioxide thin film layer is 100 nm to 1 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Preparation of potassium manganese nanowire comprises mixing soluble manganese salt and soluble cobalt salt and/or soluble nickel salt with potassium permanganate at ratio of 3:1, where potassium permanganate molar concentration is more than 0 and soluble salt of bivalent manganese salt molar concentration is greater than or equal to 0; and autoclaving at 150-220 degrees C and at 3-3 MPa for 10-24 hours, cooling, centrifuging, washing and drying. Preferred Method: The first step further comprises adding 0-3 mol/l potassium nitrate. The washing process is done by alternately washing with water and ethanol. Preferred Components: The concentration of potassium permanganate is 0-2 mol/l. The soluble cobalt salt is cobalt nitrate, cobalt sulfate, and/or cobalt acetate. The soluble nickel salt is nickel nitrate, nickel sulfate, and/or nickel acetate. The soluble manganese salt is manganese nitrate, manganese sulfate, and/or manganese acetate. Preferred Process: The drying temperature is 70-120 degrees C for 5-10 hours.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The additive is elementary substance, oxide or other compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The molar ratio of copper acetate monohydrate, selenium powder and sodium hydroxide is 1:1:60.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The volume ratio of glycerol and ethanol in the mixture of glycerol and ethanol is 0.67:1.
TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The base material of thin film is made of polypropylene, polyethylene, polyethylene terephthalate, polyethylene naphthalate, polyvinyl chloride, polycarbonate, polyimide, polyvinylidene fluoride, Teflon (RTM: PTFE), polystyrene, polyvinyl alcohol or polyamide. The adhesive glue layer is made of styrene-butadiene rubber, styrene-isoprene-styrene block copolymer, organic silicon adhesive, silicon adhesive, styrene-butadiene-styrene block copolymer, acrylic ester copolymer, polyurethane glue, acrylic adhesive, phenolic resin, epoxy resin, nitrile rubber, urea-formaldehyde resin, unsaturated polyester or chloroprene rubber. The elastic seal glue layer is made of rubber, silicone adhesive, polyurethane or polyurea. The ion type thin film layer is made of polyethylene terephthalate, fluorine-containing material, a low pressure polyethylene, high pressure polyethylene, oriented polypropylene or polyethylene. The fluorine-containing material is Teflon (RTM: PTFE).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The inorganic substance is removed by performing acid treatment using hydrofluoric acid, hydrochloric acid or phosphoric acid. Preferred Composition: The residual sludge is sewage sludge or sludge-rich metal elements.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The weight ratio of polyaniline and tungsten carbide is (95-80):(5-20).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sodium compound is a water-soluble inorganic compound, preferably sodium sulfate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of total number of titanium atoms, gallium atoms and aluminum atoms per the total number of zinc atoms, titanium atoms, gallium atoms, and aluminum atoms is preferably 1.3-1.9. The light absorption layer in compound-type solar cell contains copper indiumselenide, copper indiumsulfide, copper gallium selenide, copper gallium sulfide and cadmium telluride, or copper zinc selenide, copper zinc sulfide, copper tin selenide and copper tin sulfide. Preferred Property: The sheet resistance of zinc oxide-type transparent conductive film in the film thickness of 500 nm is 10 ohms/square or less.
TECHNOLOGY FOCUS - METALLURGY - The solid-phase vapor source contains tin while the absorbing layer precursor contains copper, zinc and tin.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The number average molecular weight of organic heteropolymer is 1x 103-1x 105. Preferred Definitions:    R2=linear or branched 1-4C alkyl, linear or branched 1-4C alkylthio, or linear or branched 1-4C alkylseleno;    R3=R3aSO3 or R3b(X)q;    R3a=halo or linear or branched 1-6C alkyl;    R3b=element of group 12-15;    X=halo;    q=2-5;    ring Ar'=group of formula (i)-(iii);    R4a-R4e=linear or branched 4-12C alkyl, linear or branched 4-12C alkoxy, or linear or branched 4-12C alkylthio;    Z"=O, S or NR4f;and    R4f=H, linear or branched 1-6C alkyl, or linear or branched 1-6C alkyl carbonyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The electrode active material from which electroconductivity changes with insertion and detachment of the ion is doped by polyvinyl sulfonic acid and/or polyvinyl sulfuric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The doped silicon nanoparticles have average particles size of 5-100 nm and porosity of 10-50%. The thickness of the doped silicon nanoparticles region is 0.2-3 mu . The silicon layer has absolute thickness of 200-2000 Angstrom . Preferred Components: The silicon layer contains amorphous silicon obtained from silane. The component used during the heating of substrate in the fabrication process is oxygen, nitrous oxide, or water vapor. The doped silicon nanoparticles are p-type doped silicon nanoparticles or n-type doped silicon nanoparticles. The doped polycrystalline silicon layer is p-type doped polycrystalline silicon layer or n-type doped polycrystalline silicon layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method (M1) further comprises: forming a fourth layer above a second surface of the substrate, where the fourth layer comprises a negative-doped amorphous silicon layer (308); forming a fifth layer above the fourth layer, where the fifth layer comprises a resistive metal oxide layer and the fifth layer forms an ohmic contact to the fourth layer; and forming a sixth layer above the fifth layer, where the sixth layer comprises a transparent conductive oxide layer. The method (M2) further comprises: forming a fourth layer above a second surface of the substrate, where the fourth layer comprises negative-doped amorphous silicon layer; and forming a fifth layer above the fourth layer, where the fifth layer comprises a transparent conductive oxide layer and the fourth layer is amorphous. The method (M3) further comprises forming an ohmic contact layer between the first layer and the second layer, where the ohmic contact layer comprises antimony-zinc-oxide, and/or zinc-magnesium-oxide. Preferred Components: In the method (M1): the thickness of the second layer is 10-50 nm; the third layer comprises gallium-tin-zinc-oxide; the fifth layer comprises antimony-zinc-oxide and/or zinc-magnesium-oxide; the thickness of the fifth layer is 10-50 nm; and the sixth layer comprises gallium-tin-zinc-oxide. In the method (M2) the fifth layer comprises gallium-tin-zinc-oxide. In the method (M3) the third layer comprises titanium-oxide. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The silicon oxynitride dielectric layer comprises boron atoms.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Process: The mixing of P-type dopant-containing layer with the regions of N-type doped silicon nanoparticles involves formation of regions (106) of borophosphosilicate glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The P-type dopant-containing layer is obtained by forming a layer of boron oxide or borosilicate glass on the regions of N-type doped silicon nanoparticles and on the surface of the substrate between the regions of N-type doped silicon nanoparticles. The fabrication process further involves forming etch-resistant layer on the P-type dopant-containing layer. Preferred Composition: The boron oxide layer contains deposition of boron tribromide and oxygen. The N-type doped silicon nanoparticles are phosphorus-doped silicon nanoparticles, and the P-type dopant-containing layer is a boron-containing layer. Etch-resistant layer comprises silicon nitride layer.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The substrate comprises soda lime glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The absorber material layer includes at least one of a copper indium gallium selenide (CIGS) material or cadmium-tellurium (CdTe) material. The material layer comprises at least one of MoSe2, MoS2, ZnSnO3, MoOx, ZnTe, CuxTe, MoTe, or Sb2Te3. The back contact metal layer comprises at least one of molybdenum, platinum, or gold. The transparent conductive oxide material comprises at least one of ZnO or SnO2F. The second metal layer comprises aluminum and nickel. The absorber materials layer is an ungraded material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic compound is 2,2,6,6-tetramethylpiperidine 1-oxyl, 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl, 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl-benzoate, anthraquinone, 1,4-naphthoquinone, 9,12-phenanthrenequinone or 5,12-naphthacenequinone. The solvent is non-aqueous solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The conductive coating comprises a material selected from a group consisting of aluminum-doped zinc oxide, indium tin oxide, fluorine-doped tin oxide, indium oxygen titanium, copper zinc sulphur and Cadmium stannate, and photovoltaic absorber that comprises multiple materials selected from the group consisting of silicon, copper indium gallium selenide, cadmium telluride, copper zinc tin sulfide, cuprous oxide and tin sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The pitch and depth of the fine concavo-convex structure is 80-250 nm and 100-400 nm, respectively.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The acids are sulfuric acids, phosphoric acids, oxalic acid, malonic acid, tartaric acid, succinic acid, malic acid and/or citric acid, preferably oxalic acid and phosphoric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The chemical resistant dielectric material is selected from a group consisting of silicon nitride, silicon oxide, thermal silicon oxide, silicon oxynitride, aluminium oxide, aluminium nitride, aluminium oxynitride, aluminium fluoride and amorphous silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The first semiconductor layer comprises cadmium sulfide, oxygenated cadmium sulfide, zinc sulfide, cadmium zinc sulfide, cadmium selenide, indium selenide, indium sulfide, or their combinations.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The conductive layer contains binder and frit with remainder of aluminum/silicon particles. The binder contains zinc oxide and/or tin oxide, and frit contains glass particles. The solar cell further consists of electroless plated nickel layer (332) and electroless plated copper layer (334), provided in order on the conductive layer. The emitter region contains polycrystalline silicon region (420). The substrate is bulk crystalline silicon substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The reactive source comprises a chalcogen. The chalcogenide material comprises copper, silver, indium, gallium, zinc, and/or tin. The source comprising a chalcogen is a: gas comprising oxygen, hydrogen sulfide, hydrogen selenide, and/or hydrogen telluride; and a vapor comprising sulfur, selenium, and/or tellurium. The metal sputtering targets comprise copper, silver, indium, or gallium, zinc and/or tin, alloy of copper-indium, alloy of copper-gallium, and alloy of copper-indium-gallium. A composition of the chalcogenide material comprising silver, indium, gallium, or selenium varies throughout a thickness of the chalcogenide material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The doped particles comprise doped silicon particles. The silicon nanoparticles have an average primary particle diameter of 1-75 nm. Preferred Method: The method further comprises the performance of an initial heating step to cure the glass/ceramic precursor composition prior to performing the dopant drive in heating step, and etching the silicon substrate after performing the dopant drive-in to substantially remove remaining depleted dopant source composition. The initial heating step is performed at a temperature of 300-800 degrees C. The depositing comprises screen printing and inkjet printing. The heating to drive-in dopant atoms into the silicon substrate is performed at a temperature of 650-1300 degrees C. The doped substrate after heating has dopant driven into the silicon substrate to depth of 0.5-2.5 microns at a dopant concentration of 1x 1019 atoms/cm3. The heating to perform dopant drive in is performed in an oxygen free atmosphere. The heating step is performed in an oven. The silicon sheet after performing to drive in dopant has a sheet resistance of less than 120 ohms/square.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The glass/ceramic precursor composition comprises a spin-on glass composition, and a sol-gel that thermally converts to a metal/metalloid oxide. The dopant source composition comprises 0.1-20 wt.% of silicon nanoparticles, a blend of doped silicon nanoparticles and doped silica nanoparticles. The dopant source composition further comprises N-methyl pyrrolidone, terpineol, 2-(2-ethoxyethoxy)ethanol (Carbitol), and/or butyl cellosolve. Preferred Components: The solvent comprises an alcohol. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The platinum precursor is an ammonia ligand-containing platinum compound i.e. tetraammineplatinum(II) nitrate. The palladium precursor is palladium or palladium nitrate. The support element comprises carbon black, Ketjen black (RTM: Electroconductive carbon black), carbon nanotube, carbon nanofiber, graphitic carbon or graphene. The reducing agent is sodium borohydride, lithium borohydride or lithium aluminum hydride. EXAMPLE - 0.25 mmole Tetraammineplatinum(II) nitrate and 0.25 mmole palladium(II) nitrate were mixed with 150 ml distilled water, stirred with 0.3 g Vulcan XC-72R (RTM: Carbon black) at speed of 100 revolutions/minute for 1 hour and ultrasonically dispersed at 50 kHz to obtain a suspension. Then 0.003 mole sodium borohydride was dissolved in tertiary distilled water and drop wise added into the suspension to perform reduction reaction. The obtained solution was filtered and dried at 100 degrees C for 24 hours to obtain catalyst powder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The layer further comprises silver (Ag) and aluminum (Al). A concentration of Ag as given by Ag/(Cu+Ag) is larger at the front surface of the layer than at the back surface of the layer. A composition of Al varies in concentration between the back surface of the layer and the front surface of the layer, and is larger at the front surface of the layer than at the back surface of the layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The solution used during the primary wet-etching process contains hydrofluoric acid, nitric acid, and water in the volume ratio of 1:2-4:1-3. The gas used during the reactive ion-etching process contains chlorine, sulfur hexafluoride, and oxygen. The solution used during the secondary wet-etching process contains hydrofluoric acid, nitric acid, and water in the volume ratio of 1:13-17:15-19. Preferred Property: The ratio of height with respect to width of pyramidal structure formed during the surface treatment process is 0.75-1.1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of titanium powder is 0-90%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanostructures are based on zinc oxide. The seed layer is heated in the presence of zinc oxide growth solution. The growth solution contains zinc nitrate hexahydrate (ZnO(NO3)2.6H2O) and hexamethylene tetramine dissolved in an aqueous solution. A silicon nitride layer is deposited in the nanowires in the nanostructures.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Metal complex with iron porphyrin is of formula (III).Ar=optionally substituted aromatic or heterocyclic aromatic compound.Preferred Processes: Compound (carrier-(linker-ligand)m) is prepared by reacting surface modified carbon-based carrier with coupling agent to obtain lanthanum-modified carbon-based carrier, and carrying out in-situ formation with nitrogen-containing 5-membered or 6-membered heterocyclic coordination ligand.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Carrier is single-walled carbon nanotube, multi-walled carbon nanotube, or graphene, preferably multi-walled carbon nanotube. Ligand is imidazolyl, pyridyl, or multi-pyridyl. Linker is optionally substituted 1-5 carbon-containing alkyl, aryl, or aromatic compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: During synthesis of carbon nanoparticles, carbon material including carbon cloth carbon paper and carbon nanotubes is used.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The passivation film contains silicon dioxide, aluminum oxide, hafnium oxide, a zirconium oxide, and a silicon nitride.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The content of the alloy in the negative electrode active material is 3-70%, preferably 50-70%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The molar ratio of ethylene with respect to monosilane is 0.2-3.2, preferably 0.5-3.2. The process gas (A) is mixed gas of monosilane, ethylene and inert gas. The concentration of monosilane in the process gas (A) is 0.2-2 mol%, preferably 0.6-1.5 mol%. The molar ratio of oxygen in process gas (B) and monosilane in the process gas (A) is 5 or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The nanoparticles have a composition of formula: CuaInbGacSedSe or CuaZnbSncSedSe, where a, b and c are greater than 0 and 1 or less, and d and e are 0-2.5. The nanoparticles preferably comprise SbxSy, SbxSey, CdxSy, CdxSey, ZnxSy, InxSey, GaxSey, ZnxSey, SnxSey, InaGabSec, ZnaSnbSec, InxSy, GaxSy, SnxSy, and/or ZnaSnbSc, where x:y is 0.5-2, and (a+b):c is 0.5-2.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The sulfur-containing amine compound(s) is thiourea, N-phenylthiourea, N-(2-methoxyphenyl)thiourea, N-(4-methoxyphenyl)thiourea, N-(6-methoxyphenyl)thiourea, N-(3-hydroxyphenyl)thiourea, N-(4-hydroxyphenyl)thiourea, N-acetylthiourea, N-amidinothiourea, N-(t-butyl)thiourea, N-(2-methylphenyl)thiourea, N-(4-methylphenyl)thiourea, N-(3-methyl-2-pyridyl)thiourea, N-(4-methyl-2-pyridyl)thiourea, N-(5-methyl-2-pyridyl)thiourea, N-(6-methyl-2-pyridyl)thiourea, thiosemicarbazide, and/or 4-methyl-3-thiosemicarbazide. The solvent is amine compound and/or thiol compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The method further comprises: removing impurities from an inner portion of the furnace in a vacuum condition; and positioning a first material and a second material within the furnace, where the first material and the second material are located in-line and are horizontally located with a plate. The deposition process is performed at 60-90 degrees C for 1-7 hours. The nanorod has: a length of 1-100 mu m; and a diameter or 500 nm to 1 mu m, and the nanowire has a diameter of 10-500 nm, and a length of 1-100 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The carrier gas is hydrogen, nitrogen and/or inert gas.
TECHNOLOGY FOCUS - METALLURGY - o?=The material of the epitaxial stack is made of aluminum, gallium, indium, arsenic, phosphorus, and nitrogen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: A unit of the pattern is defined by a closed curve. A length of the unit of the pattern is 10-1000 mu m. An area of the unit of the pattern is 10-10000 mu m2. Adjacent units of the pattern are spaced at an interval of 0.1-5 mu m. The cathode has a thickness of 1-100 mm and a resistance of less than 0.35 Omega cm2 when determined by complex impedance spectroscopy after a 400 degrees C thermal shock from 800 degrees C at 10 degrees C/minute. The mixed ionic-electronic conductor comprises a perovskite metal oxide of formula (AMO(3 plus minus Q)) (I).A = La, Ba, Sr, Sm, Gd, or Ca;M = Mn, Fe, Co, Ni, Cu, Ti, Nb, Cr, or Sc; andQ = status of oxygen excess or oxygen deficiency (0-0.3).    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The slurry composition further comprises a dispersant. Preferred Method: The heat treating step is performed at a temperature of 800-1300 degrees C for 0.1-10 hours.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The resin comprises polyvinyl butyral, polyvinyl alcohol, polyvinyl pyrrolidone, and cellulose, and is present in an amount of 5-20 pts. wt.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The solid-phase vapor source is stannic sulfide, stannous sulfide, stannic selenide, and stannous selenide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition comprises 10-30 mole%, preferably 15 mole% a lithium cation; 25-45 mole%, preferably 40 mole% a potassium cation; at least two members selected from 0-15 mole%, preferably 10 mole% a sodium cation, 5-20 mole%, preferably 15 mole% a calcium cation, and 15-35 mole%, preferably 18 mole% a cesium cation; 96-100 mole%, preferably 15-35 mole% a nitrate anion and optionally 1-4 mole%, preferably 1-3 mole% chloride and 65-85 mole%, preferably 53 mole% nitrite. EXAMPLE - A composition comprising 15% a lithium; 30% a potassium; at least two members selected from 10% a sodium, 15% a calcium, and 30% a cesium; and 100% a nitrate anion was prepared.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The inorganic filler (C) contains calcium carbonate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The melting point of the amine compound (B) is 200 degrees C or more.The amine compound (B) has guanamine structure.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of the component (A) is 90 %mass or more with respect to total content of the resin component. The content of the resin component (A), amine compound (B) and inorganic filler (C) is 99-80 parts mass, 1-20 parts mass and 20-100 parts mass, respectively with respect to 100 parts mass of total content of the resin component (A) and the amine compound (B).
TECHNOLOGY FOCUS - METALLURGY - The thin film layer is made of material selected from a group consisting of carbon, beryllium, gold, silver, silicon, aluminum and tungsten. The conductive layer is made of material selected from a group consisting of gold, platinum, copper and alloy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step of providing the carbon precursor and the filling material is carried out by mixing, ball milling, planetary rotation mixing, or high speed homogenous mixing. The forming process is oil pressing, mold pressing, hot pressing, squeezing, extrusion, injection, spinning, and melt spinning forming process. The heat treatment is performed at a temperature of 150-3200 degrees C. Preferred Components: The carbon precursor is made of a polymer material comprising a collection of petroleum pitch, coke-base pitch, mesophase pitch, phenolic resin, furan resin, epoxy resin, and/or polyimide. The filling material is the collection of petroleum coke, coal coke, natural graphite, thermally cracked graphite, mesophase carbon microsphere, carbon nanotube, vapor grown carbon fiber, carbon fiber, graphite fiber, and/or artificial graphite powder. The carbon precursor and the filling material have a ratio of 1:1-19 wt.%. The gas is a collection of nitrogen and argon.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The electrolytic solution includes a sulfuric acid, and a peroxide. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mole ratio of metal and metal trichloride is 1:0.01-1:0.25. The mole ratio of metal and haloalkane is 1:3-1:10. The reducing reagent comprises group 1 metal, group 2 metal, or group 12 element. The reducing agent is sodium metal. Preferred Process: The process is carried out at 25-250 degrees C.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The haloalkane comprises iodomethane, bromomethane or chloromethane. The solvent is toluene, xylene, mesitylene, octane, hexadecane, or squalane. Preferred Definitions:    R=methyl;    X=chloro;and    M=gallium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is chosen from water, mixture of water and organic solvent(s), a single organic solvent and a mixture of two or more organic solvents. The conductive metal composition further comprises one or more 0-2 wt.% additives.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of silver particles, poly(2-ethyl-2-oxazoline) resin and solvent is preferably 65-80 wt.%, 5-15 wt.% and 10-40 wt.%, respectively, with respect to the composition. The substrate comprises temperature-sensitive substrate(s). Preferred Process: The conductive metal composition is applied by printing or pen-writing method. The applied conductive metal composition is dried before performing photonic sintering process. The photonic sintering process is performed within less than 1 second.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sodium-containing compound and metallic compound are mixed at molar ratio of 0.6-0.7:1.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solution comprising sodium ions is a reduction solution. The reduction comprises ethereal solvent in which aromatic compound is dissolved. The aromatic compound is chosen from compound in which 2 or more benzene rings are condensed, a compound in which 2 or more benzene rings are bonded by a single bond, and a carbonyl compound, and a sodium metal and an organic compound which forms a complex. The ethereal solvent is chosen from tetrahydrofuran, 2-methyl-tetrahydrofuran, 1,2-dimethyl tetrahydrofuran, and dimethoxyethane. Preferred Definitions:    Me= FeaMnb;    a,b=0-0.5;    a+b=0.95-1.05;and    x=1.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: Film-forming solution is prepared by acidifying distilled water with acetic acid, adding zinc to prevent hydrolysis, stirring, adding zinc acetate dihydrate, aluminum acetate, manganese acetate tetrahydrate and copper acetate monohydrate and stirring. Cleaning substrate is done by washing glass, ceramics, silicon carbide, enamel and other hard substrate with tap water, wiping water vapor and drying. Pyrolysis deposition is done by calcining substrate at 250-300 degrees C, injecting liquid atomization film in furnace and reacting. Gate wiring is done by drying calcined substrate at 100 degrees C and placing in reduction furnace at 250-300 degrees C for 20-30 minutes.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): The pyrazoline compound (I) is obtained by reacting aryl (or heteroaryl) carboaldehyde and aryl (or heteroaryl) ethanone in ethanol at room temperature, adding sodium hydroxide aqueous solution, precipitating, filtering to obtain chalcone of formula (III), reacting chalcone (III) with aryl (or heteroaryl) hydrazine of formula (II) or hydrazine hydrochloride, and recrystallizing. SPECIFIC COMPOUNDS - 47 Pyrazoline compounds are disclosed, e.g. 1-(4-(benzoxazol 2-yl)phenyl)-3-(4-carbostyril)-5-(4-carbophenyl)-2-pyrazoline of formula (IA), 1-(4-(7-diethylamino coumarin-3-yl) phenyl)-3-(4-carbostyril)-5-(4-carbophenyl)-2-pyrazoline, 2-cyano-1-(5-(1-(4-(benzoxazol-2-yl)phenyl)-5-phenyl-pyrazolin-3-yl)thiophen-2-yl)acrylic acid, 2-cyano-1-(5-(1-(4-(benzoxazol-2-yl)phenyl)-5-(4-n-butoxyphenyl)pyrazolin-3-yl)thiophen-2-yl)acrylic acid and 2-cyano-1-(5-(1-(4-(benzoxazol-2-yl)phenyl)-5-(4-diethylamino phenyl)pyrazolin-3-yl)thiophen-2-yl)acrylic acid.    EXAMPLE - 14.7 g 4-(benzoxazol-2-yl)phenylhydrazine, 24.2 g di-benzal acetone-4,4'-dicarboxylic acid and 100 g glacial acetic acid were added, and stirred for 4 hours. The resultant product was cooled, precipitated, and filtered to obtain 6.8 g 1-(4-(benzoxazol-2-yl)phenyl)-3-(4-carbostyril)-5-(4-carbophenyl)-2-pyrazoline.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The second catalyst comprises maleic anhydride, second dihydroxybenzene and/or resorcinol. The phenolic monomer comprises phenol, resorcinol and/or first dihydroxybenzene. The first catalyst comprises ammonia, dimethylethanolamine, ethylenediamine, triethylamine, trimethylamine, tripropylamine, diethylethanolamine, hexamethylenetetramine and/or lithium carbonate. The aldehyde monomer comprises formaldehyde. The carrier fluid comprises mineral oil and/or vegetable oil; and has a viscosity of 0.5-400 cP at 25 degrees C. The first reaction mixture and emulsion or suspension further comprises acetic acid, formic acid, nitric acid, citric acid, and/or methane sulfonic acid, and where the first reaction mixture has a pH of 1-5. The carrier fluid comprises mineral oil, and/or vegetable oil, where the prepolymer has a molar ratio of the phenolic monomer to the aldehyde monomer of 0.1:1 to 1.5:1, where the prepolymer is polymerized in the emulsion to form the polymer particles in gel form, and where the emulsion is an inverse emulsion.    TECHNOLOGY FOCUS - POLYMERS - Preferred Method: In method (M1), the emulsion or suspension polymerization comprises less than 1 wt.% of any surfactant, based on the total weight of the carrier fluid. The polymer particles in gel form are made via the emulsion process (preferably inverse emulsion process). The first reaction mixture is reacted at 40-200 degrees C to produce the prepolymer, and where the prepolymer is polymerized in the emulsion or suspension at 40-200 degrees C. In method (M2), the polymer particles in gel form are dried by supercritical extraction, freeze drying, and/or air drying. Preferred Component: The polymer particles in gel form have molar ratio of phenol to the first dihydroxybenzene of 50:1 to 5:1. The prepolymer has molar ratio of the phenolic monomer to the aldehyde monomer of 0.1:1-1.5:1. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The method utilizes inorganic solvent comprising water, deionized water and/or distilled water.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The method utilizes organic solvent comprising anhydrous ethanol, anhydrous methanol, anhydrous isopropyl, glacial acetic acid, ethylene glycol and/or triethylene glycol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The molar ratio of copper, gallium and indium in the precursor is 1:0.5-2:0-2. Preferred Process: A metal-organic precursor and complex are further formed using chelating agent. A copper-indium or copper-indium-gallium thin film is further formed during heat treatment under hydrogen, sulfide or selenide gas atmosphere.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is ketone-containing compound. The precursor of indium or gallium is acetylacetonate compound, preferably copper acetylacetonate, indium acetylacetonate, or gallium acetylacetonate. The ketone compound is chosen from acetylacetone, acetone, acetyl methyl acetate, tert-butyl acetoacetate, and ethyl-2-methyl acetoacetate. The chelating agent is chosen from monoalkylamine compound of forumla: RNH2, dialkyl amine compound of formula: R1R2NH, trialkyl amine compound of formual: R1R2R3N, diamine compound of formula: R1R2N-R'-NR3R4, monoalcohol amine compound of formula: RNH2OH, dialcohol amine compound of formula: (R1OH)(R2OH)NH, and trialcohol amine of formula: ((R1OH)(R2OH)(R3OH)).R,R1,R2=1-8C alkyl;andR',R1-R4=H or 1-8C alkyl.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Components: The heater portion comprises the heater portion (220a) arranged in the side (S1) of the catalyst metal thin film and heater portion (220b) which is arranged in the side (S2) of the catalyst metal thin film, in order. The susceptor portion comprises several multi-stage portions disposed between several metal thin film passing through the catalyst graphene synthesizer. The graphene synthesizer further comprises the raw material suction portion (250) which is installed at the other side of the catalyst metal thin film in order to be faced with the raw material supply unit and inhales the raw material, tension maintenance roller which maintains the tension of the catalyst metal thin film while it transfers the catalyst metal thin film, and an exterior portion, inner chamber comprising raw material supply unit, susceptor unit and heater unit, vacuum pump which controls the pressure of the inside of chamber, and installed at the chamber, and the raw material injection nozzle (241) in raw material supply unit for spraying raw material to the catalyst metal thin film, raw material supply tube is connected to the raw material storage unit. The raw material storage stores the raw material installed outside the chamber in order to pass through the chamber. Preferred Process: The heater portion transmits heat in both sides of the catalyst metal thin film. The raw material is supplied to the side opposite to the suction phase. The catalytic metal film is conveyed in a state where tension is maintained. The graphene is synthesized in the vacuum environment.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The number average molecular weight of conjugated polymer is 10-15 kg/mol.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The shrinkage percentage of the inorganic-polymer layer is preferably 15-20%. The film thickness of the resin base material is 15-150 mm.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The glass substrate is processed using a release agent containing silicone oil, silylating agent or fluorine-type compound. The resin layer contains a silicone resin.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The silane crosslinkable resin is very low-density polyethylene grafted with silane compound. The non-silane crosslinkable resin is very low-density polyethylene, ethylene-vinyl acetate copolymer and/or ethylene-ethyl acrylate copolymer. The content of metal hydroxide with respect to total of 100 parts mass silane crosslinkable resin and non-silane crosslinkable resin is 100-250 parts mass. The melt flow rate of the non-silane crosslinkable resin is 1-10 g/minutes. The sheath layer has gel fraction of 50-80%.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Conditions: The reaction temperature is 30-150 degrees C and time is 1-7 hours. Reaction is carried out in two stages, for 0.5-3 hours at 20-50 degrees C and for 0.5-4 hours at 80-150 degrees C. Reducing agent is added at normal temperature, deionized water is added for dilution until the pH is neutral, and the solution is dialyzed to obtain blue fluorescent graphene quantum dots. Reduction reaction is carried out for 2-24 hours at normal temperature. High-temperature annealing involves placing graphene oxide quantum dots in an inert gas environment at 200-600 degrees C and annealing for 5-60 minutes. Preferred Component: The microporous filter membrane is PTFE membrane, polycarbonate membrane, nitrocellulose membrane, polyvinylidene fluoride membrane, cellulose acetate membrane, regenerated cellulose membrane, and/or polyamide membrane.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The carbon material is graphite, graphene oxide, graphene, graphene nanobelt, graphene nanogranules, nano graphite, single-walled carbon nanotubes, and/or multiwalled carbon nanotubes. The usage amount of concentrated sulfuric acid is 80-1600 wt.% with respect to carbon material. The usage amount of potassium permanganate is 10-80 wt.% with respect to sulfuric acid. The usage amount of hydrogen peroxide is 10-80 wt.% with respect to potassium permanganate. The usage amount of reducing agent is 60-200 wt.% with respect to quantum dots. The reducing agent is hydrazine hydrate, sodium borohydride, hydriodic acid, and/or phenylhydrazine. The average size of obtained quantum dots is 1-12 nm, preferably 2-10 nm.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Conditions: The carbon nanotubes are transferred several times. A resin is permeated from the surface opposite to that where carbon nanotubes are adhered, and the carbon nanotubes are adhered to the electroconductive substrate with the resin.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The electroconductive substrate is carbon fiber sheet, metal fiber sheet, or sheet containing carbon fiber and metal fiber.    TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The electroconductive substrate is a metal foil surface-treated by etching, polishing or sputtering.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The process involves: subjecting a composition comprising formic acid and levulinic acid to a solid-liquid separation to yield a solid fraction and a liquid fraction and recovering the liquid fraction; concentrating the liquid fraction by a vapor removal step to yield a concentrate and a vapor, and condensing the vapor to a condensate; subjecting the concentrate to solvent-solvent extraction by adding an organic solvent to yield an organic phase comprising levulinic acid and/or formic acid and an aqueous phase and recovering the organic phase; and isolating the levulinic acid and/or the formic acid from the organic phase e.g. by distillation, where the condensate and/or the aqueous phase is used to wash the solid fraction. The process involves: concentrating a composition comprising formic acid and levulinic acid to a vapor removal step to yield a concentrate and a vapor, and condensing the vapor to a condensate; subjecting the concentrate to a solid-liquid separation to yield a solid fraction and a liquid fraction and recovering the liquid fraction; subjecting the liquid fraction to solvent-solvent extraction by adding an organic solvent to yield an organic phase comprising levulinic acid and/or formic acid and an aqueous phase and recovering the organic phase; and isolating the levulinic acid and/or the formic acid from the organic phase e.g. by distillation, where the condensate and/or the aqueous phase is used to wash the solid fraction. The composition is a biomass hydrolysate, where the biomass hydrolysate is made by acid hydrolysis of lignocellulosic biomass. The composition is made by acid hydrolysis of fructose and/or glucose. The solid fraction washed first with the aqueous phase, and is subsequently washed with the condensate. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The mineral acid is H2SO4 and the temperature (K), the residence time (T, in minutes), and the H2SO4 concentration ((H2SO4), in wt.%) are selected such that the outcome of the given equation is as given in the specification. The hydrolysis is carried out in a plug-flow type reactor system. The concentration of the biomass in the slurried biomass is 15-50 wt.% based on total weight of the slurried biomass. The process further involves, prior to the hydrolysis step, an impregnation step. Preferred Components: The biomass is a lignocellulosic biomass. The biomass comprises glucose and/or fructose. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The blocked isocyanate contains malonic diester, dialkyl ketoxime, pyrazole derivative and alcohol, or blocking group.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The cationic ( pi ) conjugation electroconductive high molecular compound is polythiophene. The conductive layer (12) consists of metal material formed on base material in pattern shape. The layer (13) is electrically connected with layer (12).
TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): A thiol-containing compound of formula (II) and pyrrole-containing compound of formula (III) is introduced into solvent and refluxed at 60-120 degrees C for 12-72 hours in presence of catalyst under aerobic environment. The molar ratio of thiol-containing compound and pyrrole-containing compound is 1:1-1.5:1. The solvent is chosen from methylbenzene, tetrahydrofuran, benzene, N,N-dimethyl formamide. The catalyst is organic palladium catalyst or a mixture of organic palladium catalyst and organic phosphine ligand. The content of catalyst is 0.01-5 mol% with respect to pyrrole-containing compound. The mole ratio of organic palladium catalyst and organic phosphine ligand is 1:2-1:20. The organic palladium catalyst is tris(dibenzylideneacetone)dipalladium(0), tetrakis(triphenylphosphine)palladium, or bis(triphenylphosphine)palladium(II) dichloride. The organic phosphine ligand contains tris(o-tolyl)phosphine or tricyclohexyl phosphine. Preferred Definitions:    n=8-60;    R 1=H, ethyl, propyl, butyl, hexyl, hexadecyl, or methyl;    R 2=H, amyl, propyl, dodecyl, or methyl;    R 3=H, methyl, 3-methyl thineyl, dodecyl, 14-alkoxy, octyloxy, 2-methyl thienyl, methoxyl, 16-alkoxyl, or hexyl;    R 4=methyl, H, 3-methyl thienyl, ethoxy, or octyl;and    R 5=n-butyl, methyl, 2-methyl butyl, 2,4-dimethyl-3-ethyl heptyl, 2,2,4-trimethyl amyl, hexadecyl, actyl, methyl, or butyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The cross-linking agent is an epoxy-type cross-linking agent. The adhesive composition further contains a rubber-type polymer (C), which does not have carbonic-acid-type functional group, and a tackifier (D). The rubber-type polymer (C) is an isobutylene-type rubber. The diene-based rubber (A) is a polyisoprene rubber having carbonic-acid-type functional group, or polymer having unsaturated group-containing repeating units of formulae: (I) and (II).R1,R2=H or 1-5C alkyl;X=group of formula (ia) or (ib);andR3=R1.Preferred Properties: The number average molecular weight of diene-based rubber is 1000-100000. The average value of carbonic-acid-type functional group number per molecule of diene-based rubber is 1.5-20.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive composition further contains rubber-type polymer (B) which does not have a radiation-hardenable functional group, photoinitiator, and tackifier. The diene-based rubber (A) is a polyisoprene rubber which has (meth)acryloyl group or polymer having repeating unit of formula (I) and repeating unit of formula (II), and has number average molecular weight of 1000-100000.R1-R3=H or 1-5C alkyl;X=group of formula (a);andm=1-5.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The coating composition comprises nanoparticles, and binder chosen from condensation hardening-type compound, thermoplastic compound, radical curable compound and cation curable compound. The barrier layer comprises silicon dioxide, aluminum oxide, zinc oxide, zinc sulfide, hafnium oxide, hafnium oxynitride, aluminum nitride, silicon nitride, silicon oxynitride, or tin oxide. The nano particles are silica particles or alumina particles. The content of nano particles is 40-70 wt.% with respect to total weight of the binder and nano particles. Preferred Properties: The barrier layer has thickness of 5-20 nm. The nanoparticles have average diameter of 1-100 nm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The polyimide composition varnish further comprises the organic solvent including at least one of gamma -butyrolactone, N-methylpyrrolidone or N, N-dimethylacetamide. In the polyimide composition varnish, a sum of amounts of the polyimide or the polyimide precursor and the organically modified layered silicate are 3-40 pts. wt. The organically modified layered silicate is present in an amount of 1-100 pts. wt.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The film has: a light transmittance at 400 nm of greater than or equal to 80%; a haze value of less than or equal to 5%; a linear thermal expansion coefficient at a temperature of 100-300 degrees C of less than or equal to 30 ppm/k; and a heating weight loss at 350 degrees C of less than or equal to 0.5%, based on an original weight measured at 150 degrees C. EXAMPLE - Typical polyimide composition varnish comprised of: 21.14 g of 4,4-diaminocyclohexylmethane; 54.54 g of N-methyl-2-pyrrolidone; and 13.60 g of N,N-dimethylacetamide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The evaporation source comprises the VIA group element formed of material selected from a group consisting of sulfur, selenium and tellurium. The sample is formed of copper, zinc, tin, indium, gallium, cadmium, germanium, silicone, antimony and bismuth. The carrier gas is argon gas or nitrogen gas.
TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): The preparation of intrinsic microporosity polyethersulfone copolymer comprises: reacting 1,2-difluorobenzene with chlorine compound of formula (Cl-S(=O)2-OH) (III) to prepare 3,4-difluorobenzenesulfonyl chloride; reacting 3,4-difluorobenzenesulfonyl chloride with 1,2-difluorobenzene and carrying out friedel-craft sulfonation to prepare 4-(3,4-difluorophenyl)sulfonyl-1,2-difluoro-benzene; and reacting 4-(3,4-difluorophenyl)sulfonyl-1,2-difluoro-benzene with hydoxyl group containing compound to obtain polyethersulfone copolymer. Preferred Components: The membrane is made of film or fiber. The pores of the membrane have a diameter of 0.5-0.8 nm. The thermal curing step is carried out at 50-70 degrees C. The gas separation membrane has a thickness of 10-100 mu m. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The reaction is performed in presence of catalyst including concentrated sulfuric acid, concentrated hydrochloric acid, methanesulfonic, acetic acid and/or trifluoromethane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The heating step is carried out at temperature of 60-80 degrees C for 3-8 minutes. Preferred Components: The mixing ratio of the cesium iodide solution and tin chloride solution is 1/10 to 1/3. The thickness of the thin film is 30-50 mu m. The cesium iodide solution is dissolved in organic solvent. The inorganic solvent is water, deionized water or distilled water. The tin chloride is dissolved in inorganic solvent.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic solvent is anhydrous ethanol, anhydrous methanol, anhydrous isopropyl, glacial acetic acid, ethylene glycol or triethylene glycol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mixture of oxides further comprises: at least one oxide consisting of 1-25 mole% of calcium oxide, 1-10 mole% of bismuth oxide, and 1-5 mole% of copper oxide; and at least one fluoride consisting of 1-25 mole% of potassium fluoride, and 1-25 mole% of calcium fluoride. The mixture of oxides comprises: 25-75 mole% (preferably 45 mole%) of phosphorus oxide, 25-50 mole% (preferably 39 mole%) of lithium oxide, and 1-25 mole% (preferably 16 mole%) of potassium oxide; and/or 25-75 mole% (preferably 30-70 mole%) of phosphorus oxide, 5-75 mole% (preferably 10-55 mole%) of sodium oxide, and 5-60 mole% (preferably 10-50 mole%) of potassium oxide. The mixture of oxides comprises: at least three oxides consisting of 1-50 mole% of lithium oxide, 1-75 mole% of sodium oxide, 1-75 mole% of potassium oxide, and 1-50 mole% of boron oxide; 1-50 mole% of lithium oxide, 1-75 mole% of sodium oxide, 1-75 mole% of potassium oxide, and 1-50 mole% of boron oxide; and/or 25-90 mole% of phosphorus oxide, and 1-10 mole% of boron oxide. The mixture of oxides comprises 50-90 mole% (preferably 72 mole%) of phosphorus oxide, 1-25 mole% (preferably 8.5 mole%) of lithium oxide, 1-25 mole% (preferably 8.5 mole%) of sodium oxide, 1-25 mole% (preferably 8.5 mole%) of potassium oxide, and 1-10 mole% (preferably 2.5 mole%) of boron oxide; Preferred Components: The phosphorus oxide precursor comprises ammonium dihydrogen phosphate. The potassium oxide precursor comprises potassium sulfate. EXAMPLE - Typical composition comprised of: 44.6 mole% of phosphorus pentoxide; 39.3 mole % of lithium oxide; and 16.1 mole% of potassium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicon dioxide solid content concentration of the water repellent is 1-9 %mass. The ratio of silicon dioxide solid content concentration of component (a) with respect to component (b) is 95/5-10/90.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The component (a) is tetramethoxysilane or tetraethoxysilane. The component (b) is trimethoxy methyl silane. The medium is chosen from water, alcohol, ketones, ethers, cellosolves, ester, glycol ethers, nitrogen compound, and sulfur-containing compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The weight average molecular weight of the polymer (A) and polymer (B) is 300-2500 and 500-4000, respectively. The film thickness of the water-repellent film is 10-300 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first material set comprises aluminum, antimony, arsenic, bismuth, cadmium, cesium, chromium, cobalt, copper, gallium, germanium, gold, indium, iridium, iron, lead, lithium, manganese, mercury, molybdenum, nickel, niobium, osmium, palladium, platinum, potassium, rhodium, ruthenium, silver, sodium, tantalum, tin, titanium, tungsten, vanadium, zinc, and/or zirconium. The conductive substrate is made of aluminum, chromium, cobalt, copper, gallium, germanium, gold, indium, iron, lead, molybdenum, nickel, niobium, palladium, platinum, silicon, silver, tantalum, tin, titanium, tungsten, vanadium, zinc, zirconium, stainless steel, indium tin oxide, and/or fluorine-doped tin oxide.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Component: The semiconductor device is a thin-film transistor. The flexible device is a polysilicon semiconductor or a metal oxide semiconductor drive-type flexible display.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic substrate is a glass substrate. Preferred Process: During manufacture of flexible device, the laminated material is heated at 250 degrees C or more.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The component (b) comprises 2-1000 silicon-oxygen bond in a molecule as non-polar portion, and is silicone-type surfactant which has 1-100 polyether group, hydroxyl group, carboxyl group, or sulfo group in a molecule as a polar portion, 3-100 carbon-fluoride group bonding in a molecule as a non-polar portion, and is fluorochemical surfactant which has 1-100 polyether group, hydroxyl group, carboxyl group, or sulfo group in a molecule as a polar portion. The content of component (b) is 0.001-10 parts mass with respect to 100 parts mass component (a). The component (c) in resin composition is an alkoxysilane compound having functional group chosen from carbamate group, a carboxyl group, an amide group, and an aryl group. The resin composition further contains solvent (d). The component (d) is an aprotic polar solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyimide resin layer comprises silicone surfactant or fluoro chemical surfactant (C), and alkoxysilane compound (C) containing functional group chosen from amide group, amino group, carbamate group, carboxyl group, aryl group, acid-anhydride group, and polymerizable cyclic ether group.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The conducting polymer of the core-shell structure is formed by polymerizing heterocyclic compound or its derivatives of formula (II) of the aromatic family. The precursor of conductive polymer is formed by the action of reducing agent. The precursor solution comprises 4-18C alkyl and/or amine, and polar solvent (BB). The content of precursor is 100-200 pts. wt. with respect to total content of conductive polymer.X'=O, N or S;andY'=COOH.Preferred Properties: The conducting polymer of the core is in nanowire (NW) form (CC). Preferred Process: The precursor of conductive polymer is made to solution form using non-polar solvent (AA) for injection. The reaction temperature for manufacturing of conductive polymer is room temperature to 40 degrees C.
Preferred Definitions:    A=methylamine, or cesium formamidine;    B'=lead, tin, copper or germanium;    M=R1-R-R2;    R1=-NH2, -NH-C(NH2)=NH or -N=CH-NH2;    R2=-COOH, -OSiOH, -O3POH or -O2SOH;    R=1-30C linear or branched halogenated alkyl, 3-12C cycloalkyl, 1-12C heterocyclyl, 2-8C alkenyl, 2-8C alkynyl, 6-12C aryl, 6-30C aryl, 6-30C alkyl aryl, 1-12C aryl, 6-30C alkyl aryl or 6-30C alkyl heterocyclyl;and    X=chloro, bromo or iodo.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The fuels comprise a fuel comprising carbon and hydrogen, and consist of methane, natural gas, propane, alcohol, or syngas derived from coal or natural gas reformation. The fuel mixture comprises two or more fuels with distinct carbon contents, hydrogen contents, and/or oxygen contents.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The conductive polymer (A) is coated on the porous surface of porous carbon material (C).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises forming a passivation layer in contact with the absorber layer, where the passivation layer includes an atomic layer deposition layer having a thickness of less than 25 Angstrom . The passivation layer includes aluminum oxide and the thickness of the passivation layer is 8-15 Angstrom , and is formed between the conductive layer and the absorber layer, where the method further comprises forming a wetting layer on the passivation layer to aid in forming the absorber layer. Preferred Components: The emitter layer includes one of cadmium sulfide and cadmium telluride. The buffer layer includes aluminum oxide and the thickness of the buffer layer is 8-25 Angstrom . The conductive layer includes molybdenum and the substrate includes a glass substrate. The aluminum oxide includes buffer layer includes aluminum oxide and the thickness of the buffer layer is 5-20 Angstrom . The copper-zinc-tin containing chalcogenide material is a compound with a kesterite structure of formula (Cu2-xZn1+ySn(Si1-zSez)4+q).x, y and z = 0-1; andq = -1 to 1. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The ratio of cobalt chloride, nickel chloride, and sodium citrate is 4:5:6.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - An anode oxidation process of aluminum film is performed using sulfuric acid solution.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The conductive substrate is conductive glass or metal.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The antimony salt is antimony nitrate, antimony sulfate or antimony chloride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The titanium salt is anhydrous titanium chloride or organic titanium salt. The surfactant is F127-type surfactant and/or P123-type surfactant.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The high transmission glass comprises (on oxide basis) 60-78 %mass silicon dioxide, 0-3 %mass aluminum oxide, 0-15 %mass calcium oxide, 0-12 %mass magnesium oxide, and 5-20% mass sodium oxide. The volume resistivity (rho) of glass at 150 degrees C is more than 8.8 Ohmx cm. Preferred Component: In the high transmission glass, transparent conductive film is formed in its surface.
TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): The benzodithiophene copolymer (I) is prepared by mixing dithiatetracyclic compound of formula (II) and pyrrole-containing compound of formula (III) in the molar ratio of 1:1-1.5:1 in a solvent (A) and performing reflux reaction under anaerobic environment in the presence of a catalyst at 60-120 degrees C for 12-72 hours. Preferred Definitions:    n=9-60;and    R 1,R 2=H, ethyl, amyl, propyl, butyl, dodecyl, methyl, or hexadecyl.    When R 1 and R 2 is H, then R 3 and R 4 is methyl, and R 5 is n-butyl. When R 1, R 2, R 3 and R 4 is H, then R 5 is methyl. When R 1 is ethyl and R 2 is amyl, then R 4 is 3-methyl thienyl and R 5 is 2-methyl butyl. When R 1 and R 2 is propyl, then R 4 is ethoxy and R 5 is 2,4-dimethyl-3-ethylheptyl. When R 1 is butyl and R 2 is dodecyl, then R 3 is 14-alkoxy, R 4 is octyl and R 5 is 2,2,4-trimethyl amyl. When R 1 is hexyl and R 2 is H, then R 3 is 2-methyl thienyl, R 4 is H, and R 5 is octyl group. When R 1 is hexadecyl and R 2 is H, then R 3 is methoxyl, R 4 is H, and R 5 is methyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The solution containing conductive polymer (A) of reduced state, further contains polycarboxylic acid (B) and conductive support agent (C).
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive composition comprises 5-100 parts mass tackifier with respect to 100 parts mass isobutylene-isoprene copolymer. The tackifier is an aliphatic petroleum resin. The content rate of repeating unit derived from isoprene of isobutylene-isoprene copolymer is 0.1-99 mol%. Preferred Properties: The adhesive bond layer is formed on a gas-barrier film having a water-vapor permeation rate in an environment of 40 degrees C and 90% relative humidity is 0.1 g/m2/day or less and a total light transmittance of 80% or more. When the adhesive bond layer has a thickness of 60 mu m, the water-vapor permeation rate in an environment if 40 degrees C and 90% relative humidity is 10 g/m2/day or less. The storage elastic modulus of the adhesive bond layer is 105-106 Pa at 20-60 degrees C. The adhesive force of the adhesive bond layer with respect to a glass substrate is 3 N/25 mm or more. The product of water-vapor permeation rate and thickness ( mu m) of the adhesive bond layer is less than 300.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanoparticles are spherical shaped nanoparticles having average diameter of 100 nm or less. The nanoparticles are silica particles, alumina particles, titania particles, zirconia particles, antimony oxide particles or zinc oxide particle. The protective layer has thickness of 0.2-2 mu m. The barrier layer comprises silicon oxide, aluminum oxide, zinc oxide, zinc sulfide, hafnium oxide, hafnium oxynitride, aluminum nitride or silicon nitride. The barrier layer is atomic layer deposition layer having thickness of 2-100 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The binder comprises radical curable compound or cation curable compound. The protective layer further comprises radical initiator or cationic initiator.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The crystalline and noncrystalline transparent conductive layers contain indium oxide, zinc oxide, indium-tin oxide, indium-zinc oxide, and/or transparent conductive polymer.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The substrate has metallic layer containing aluminum, copper, neodymium, molybdenum, and/or their alloys.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: Patterning is carried out using etchant comprising oxalic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alkylsiloxane chemicals are provided at substantially equal weight percentages; and are selected from octyltrimethoxysiloxane (OTMOS), pentyltriethoxysiloxane (PTEOS), 3,3,3-trifluoropropyl trimethoxysiloxane (TFTMOS) and/or tetraethyl orthosilicate (TEOS). Preferred Method: The sol is aged for less than or equal to 1 (preferably not greater than 5) month prior to the wet-applying. The coating has a root mean square roughness of 3-6.5 (preferably 4-5) nm. The alkylsiloxane chains protrude outwardly from a surface of the coating. The alkylsiloxane groups are hydrolyzed using an acid catalysis process. The hydrolyzed alkylsiloxane groups are partially condensed to form a tetra-cyclic siloxane, providing nucleation sites for further growths to become three-dimensional particles on the coating. The three-dimensional particles grow to 1-5 nm in major distance, with a precursor solution pH of 1-8. The coating has a refractive index below 1.3 and a thickness of 60-100 nm. The coating is cured for less than 25 minutes. A water contact angle theta of the coating is greater than 100 degrees . In the method (m2), TEOS and OTMOS are provided in weight percentages in the sol that differ from one another by not greater than 5%. The coating has a refractive index of less than 1.3; is provided at a thickness of 70-90 nm; and is cured for less than 15 minutes. The reflection from the mirror is not greater than 0.15% lower than the reflection would be if no anti-soiling coating were present.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The nonaqueous medium is an organic solvent having boiling point of 40-250 degrees C.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of dispersion stabilizer and fluoropolymer is 0.01-50 %mass and 1-60 %mass, respectively. The nonaqueous dispersion liquid has moisture content of 1% or less. The nonionic polymer is of formula: R8O(CH2CH2O)w'H.R8=10-15C alkyl;andw'=1-15.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The negative electrode consists of electrical power collector (11) and electrode layer containing negative electrode active material, conductive support agent and binder containing resin, arranged on the surface of electrical power collector. The negative electrode active material is of formula: SixSnyMzAa.A=unavoidable impurity;x=31-50 (when M is Al), or 27-100 (excluding 100) (when M is V) or 29-100 (excluding 100) (when M is C);y=0-45 (excluding 100) (when M is Al), 0-73 (excluding 0) (when M is V) or 0-100 (excluding 0 and 100) (when M is C);z=0-43 (excluding 0) (when M is Al), 0-73 (excluding 0) (when M is V) or 0-100 (excluding 0 and 100) (when M is C);a=0-0.5 (excluding 0.5);andx+y+z+a=100.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin is chosen from polyimide, polyamidoimide and polyamide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The vapor-phase initiator species comprises acrylate group and ethylene glycol diacrylate. The vapor-phase monomer species comprises vinyl group and ethynyl group. The vapor-phase monomer is decadiene, meta diethynyl benzene, or para diethynyl benzene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The zinc-oxide type powder is chosen from gallium oxide powder, aluminum oxide powder and aluminum-carbide powder. The ratio of number of atoms of gallium or aluminum is 0.1-2.5%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The reaction occurs in a pressurized vessel at a pressure greater than 1 atmosphere. The reaction is conducted at atmospheric pressure and the temperature of the reaction is at least 30 degrees C up to and including the boiling point of the halomethane. The reaction step is carried out under an inert atmosphere. Preferred Components: The halomethane comprises methyl iodide, methyl bromide, and/or methyl chloride. At least 8 equivalents, preferably 10 equivalents of halomethane are used. Preferred Definitions:    (R)3M = Et3M, which is formed by reacting metal hydride and ethylene.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Disclosed): An alkyl imide halide oxo molybdenum compound is reacted with triphenylphosphine, to obtain molybdenum imide compound. EXAMPLE - 30.7 %mass Tetrahydrofuran solution of 81.4 g t-butylimido dichlorooxomolybdenum and 26.9 mass % tetrahydrofuran solution of 76.9 g triphenylphosphine were reacted at room temperature for 16 hours under dry argon gas atmosphere, tetrahydrofuran solution of cyclopentadienyl sodium was dripped at obtained molybdenum solution, refluxed for 6 hours, solvent was concentrated by depressurizing distillation, refluxed by adding hexane for 3 hours, temperature was reduced to room temperature, filtered, obtained filtrate was concentrated by depressurizing distillation, sublimated at 120 degrees C, cooled and recrystallized, to obtain molybdenum imide compound as dark red purple solid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The bubble number of component is less than 5 piece/kg. The glass plate has strain point of 540-650 degrees C, and thermal expansion coefficient of 70-100x 10-7/ degrees C. Preferred Composition: The content of aluminum oxide and zirconium oxide is 5.1-30 %mass. The content of zirconium oxide and sulfur trioxide (ZrO2+SO3) is 0.1-20 %mass. The mass ratio of sodium oxide and sulfur trioxide is 10-1000.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The glass plate comprises glass composition containing 45-60 %mass silicon dioxide, 8-18 %mass aluminum oxide, 0-15 %mass boron trioxide, 15-40 %mass magnesium oxide, calcium oxide, strontium oxide, and barium oxide, 1-30 %mass sodium oxide and potassium oxide, 28-50 %mass silicon dioxide and aluminum oxide, 0-10 %mass magnesium oxide and calcium oxide, 0-30 %mass calcium oxide and strontium oxide. The mass ratio of calcium oxide and magnesium oxide is 1 or more. The glass composition comprises 0.001-0.06 %mass iron oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The bending strength of the sintered compact is 80 N/mm2 or more. Preferred Composition: The metallic element further contains 0.08 wt.% or less boron with respect to the conversion of boron oxide. The amount of boron contained in the metallic element is preferably 0.005-0.08 wt.%.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Components: The gas discharge pipe which discharges the reaction waste gas discharged from the lower opening portion of the vertical reaction tube is positioned higher than the acceptance container.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The molecular weight of the slightly-soluble inert gas is larger than the average molecular weight of the reaction gas. Preferred Composition: The slightly-soluble inert gas is argon. The proportion of slightly-soluble inert gas is 70 vol.% or more with respect to the atmospheric gas in the acceptance container.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The total content of iron, manganese, tungsten, gold, chromium, and nickel is 1 mass % or less, preferably. The metallic compound is chosen from magnesium, calcium, sodium, potassium, lithium, rubidium, cesium, beryllium, strontium, barium, and radium as a metallic element, preferably magnesium oxide, calcium oxide, potassium oxide, magnesium carbonate, calcium carbonate, magnesium sulfate, calcium sulfate, calcium nitrate, magnesium hydroxide, and calcium hydroxide. The metallic compound is chosen from calcium carbonate, calcium oxide, and magnesium carbonate. The total content of the metallic compound is 0.1-80 %mass.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The dispersion medium comprises water, alcohol solvent, glycol monoether-type solvent, and terpene series solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The silicon substrate is a single crystal silicon substrate by which the main surface is along (100) plane. Preferred Layers: The semiconductor layer is a layer on which authentic amorphous silicon thin-film layer and the conductivity-type amorphous silicon thin film layer opposite to the silicon substrate are laminated.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The compound semiconductor layer is provided on the plane of p-type gallium-arsenic substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The plasma-excited species of nitrogen comprises nitrogen and hydrogen-containing species formed by providing energy to mixture of nitrogen (N2) and hydrogen (H2) gases, ammonia (NH3), a mixture of N2 and NH3, hydrazine (N2H4), a mixture of N2 and N2H4, amine, amidogen (NH2) and NH3, or ions and radicals of such species. The first layer comprises: epitaxial layers of gallium nitride, aluminum nitride (AlN), aluminum gallium nitride or aluminum indium gallium nitride; indium gallium nitride (InxGa1-xN) (x =0-1); and an AlN layer deposited by the first method. The second layer is aluminum gallium nitride (AlGaN), undoped gallium nitride (GaN), n-type doped GaN, or indium gallium nitride (InGaN). The first neutral plasma comprises a plasma-excited species of nitrogen and is an inert plasma comprising argon, krypton, helium, neon, or xenon. The second plasma comprises hydrogen, oxygen, sulfur, selenium, argon, krypton, helium, neon or xenon. The additional layer is AlGaN, InGaN, or undoped GaN. A first MOCVD environment provides a mixture of trimethylgallium and ammonia to deposit a layer of GaN. A second MOCVD environment provides a mixture of trimethylindium, trimethylgallium and ammonia to deposit a layer of InGaN.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The first neutral plasma is reactive plasma comprising halogen, oxygen, water, nitrogen, hydrogen, ammonia, hydrazine, methane, ethane or hydrogen chloride. Preferred Components: The group V precursors comprise phosphate, ammonia, hydrazine, triphenylarsine, triphenylantimony (III), tris(dimethylamido) antimony (III) or triphenylbismuth.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of cobalt and platinum is 3-6 %mass and 5-35 %mass.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The nucleophilic reagent is chosen from 1-(4-aminophenyl)imidazole, 1-(3-aminopropyl)imidazole or 1-(3-amino-phenyl)-3-methyl-2-imidazolidinone. The method is performed using reducing agent chosen from hydrazine hydrate, sodium borohydride or L-ascorbic acid, chloroform as solvent, complexing agent chosen from sodium tartrate, disodium edetate or sodium citrate, and surfactant chosen from cetyltrimethylammonium bromide or dodecyl trimethyl ammonium bromide ammonium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The inert gas or oxidizing gas is selected from one of argon, nitrogen, nitrous oxide (N2O) or hydrogen (H2).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Chloride includes nickel chloride, ferric chloride, or cobalt chloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In the step (i), the weight ratio of ionic resin is 95-99.5 parts, and graphene is 0.5-5 parts. The hollow spinneret: outer diameter is 100-2000 mu m; inner diameter is 80-1990 mu m. In the hollow inner cavity flow nozzle, the inflow of compressed air is 0-30 l/minute. The primary hollow fiber tube stretching condition is 2-3 times the tensile condition, the water bath treatment is carried out at 30-50 degrees C for 30-120 minutes. In the step (ii), the melting of raw material is realized by using the double-screw extruder. The double-screw extruder length-diameter ratio is 30-50. In double-screw extrusion of molten raw material, each area temperature is 150-400 degrees C, extruding and rotating speed is 30-100 revolutions/minute.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is chosen from water, ethanol, isopropyl alcohol, n-butyl alcohol, toluene, xylene and acetone.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The bonding agent is chosen from epoxy resin, methyl cellulose, polyvinyl butyral and polyethylene alcohol. The dipping agent comprises fish oil, polyacrylic acid, polyvinyl alcohol and polyacrylamide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred composition: The element percentage (O/Si) of oxygen (O) and silicon (Si) in the silicon oxide film is 1.6-2, measured using X-ray photoelectron spectroscopy. Preferred Property: The silicon oxide film has thickness of 10-300 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The gas barrier laminate further has an anchor-coat layer provided between the polyethylene terephthalate base-material and the silicon oxide film. The anchor-coat layer is formed using polyester resin, urethane resin, acrylic resin, and oxazoline group-containing resin. The number of protrusion having height of 0.7 mu m or more per square mm of polyethylene terephthalate base-material surface is 150 or less, measured using white interferometer. Preferred Process: The polyethylene-terephthalate base material is heat-processed at 110-150 degrees c for 15-30 minutes.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: beta X/ alpha T=100 or more, where X is weight (g carboxylic anhydride/m2) of carboxylic anhydride in water-trapping layer per m2, alpha is equivalent (g carboxylic anhydride/eq) of acid anhydride group of all carboxylic anhydrides, and beta is water equivalent (g/eq). The thickness of water-trapping layer is 1-1000 mu m. The moisture-proof film has a total light transmittance of 75% or more. Film (3) is a release film. The moisture-proof film consists of a laminate of structural units.
TECHNOLOGY FOCUS - POLYMERS - The transparent support film is selected from a group consisting of a polyethylene terephthalate film, a polyvinyl alcohol film, a PVC film, a vinyl-chloride copolymer film, a polyvinylidene chloride film, a vinylidene-chloride copolymer film, a polymethyl methacrylate copolymer film, a polystyrene film, a polyacrylonitrile film, a styrene copolymer film, a polyamide film and a cellulose derivative film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The outer carbide thin film comprises tungsten carbide, boron carbide, niobium carbide, molybdenum carbide, tantalum carbide and titanium carbide.    TECHNOLOGY FOCUS - METALLURGY - The catalyst particles are selected from a group consisting of platinum, gold, iridium, osmium, palladium, rhodium and ruthenium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The liquid fuel used by the liquid fuel cell is at least one of reactants of methanol, ethanol, formic acid, isopropanol, propanol, ethylene glycol, dimethyl ether, butanol, hydrogen, butane, ethane, propane, carbon dioxide, water, and/or bio fuel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sulfide of group 15 element is antimony sulfide Preferred Process: During manufacture of solar cell, layer (4) containing component (A) is baked under oxygen having concentration of 0.001-10%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The material comprises sulfide, selenide, telluride, nitride, phosphide, arsenide, fluoride, chloride, bromide, carbide or iodide of a transition metal, a rare earth metal, an alkali metal, an alkaline earth metals or elements carbon, aluminum, silicon, gallium, germanium, arsenic, indium, tin, antimony, tellurium, thallium, lead, bismuth, polonium and other ternary and higher order compounds. The oxide includes anatase polymorph of titania.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The transparent conductive film is zinc oxide film. The processing container comprises metal catalyst (18) containing platinum, tungsten, or their alloys. Preferred Process: The hydrogen-radical is obtained by introducing hydrogen gas in processing container.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The silicon oxide thin film has thickness of 5-300 nm. The laminated material further contains anchor coat layer chosen from polyester resin, urethane resin, acrylic resin, and oxazoline group containing resin, placed between the base material (1) and thin film (2).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The continuous phase comprises tin oxides. The oxide particles are silica particles. The planarization material contained in scattering layer comprises silica. The electrode layer contained in glass substrate comprises material chosen from indium tin oxide, tin oxide, zinc oxide, indium zinc oxide, aluminum doped zinc oxide, gallium doped zinc oxide, niobium doped titanium dioxide, and tantalum doped titanium dioxide. Preferred Property: The surface of the scattering layer has arithmetic mean roughness (Ra) of 200 nm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of silicon-containing microparticles is 0.5-20 wt.%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyvinyl alcohol-type resin is of formula (I).R1-R6=H or organic group;andX=single bond or joint chain.Preferred Property: The polyvinyl alcohol-type resin has saponification degree of 50-100 mol%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The catalyst film is doped with phosphorus. The substrate is a glass substrate, or comprises mica. The coated article further contains a dielectric layer provided on the substrate. The dielectric layer comprises metal oxide containing zinc oxide. The polycrystalline silicon film is doped with phosphorus, arsenic and/or boron. The catalyst film further contains silver.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: During manufacture of separation film, surfactant chosen from nonionic surfactant, cationic surfactant and anionic surfactant, and inorganic precursor chosen from alkoxide, hydroxide and oxide chosen from alumina, silica, titania and zirconia are used. Preferred Property: The separation film has porosity of 30-95%. The inorganic particles have BET surface area of 10-50 m2/g and density of 1-4 g/cm3. Preferred Composition: The inorganic particles are chosen from alumina, silica, titania and zirconia. The separation film further contains cation chosen from lithium, sodium and ammonium. The content of inorganic precursor is 1-100 vol.%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The conductor layer comprises at least an element chosen from aluminum, copper, stainless steel, steel and nickel.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polymer layer comprises polyether ether ketone.
TECHNOLOGY FOCUS - METALLURGY - The solar cell is formed of mono crystalline silicon, poly-crystalline silicon, amorphous silicon, thin film silicon, copper indium gallium selenide (CIGS), or cadmium telluride.
TECHNOLOGY FOCUS - METALLURGY - The absorbing medium is crystalline silicone. The first membrane layer is gallium phosphide. The second membrane is amorphous silicon and amorphous silicon carbide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The substrate and the auxiliary plate are made of glass material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The semiconductor quantum dot is formed using cadmium sulfide. The impurity atom is copper and calcium.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The substrate is glass, metal, ceramic or silicon sheet, and has flat, cylindrical or irregular shape.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic chelating agent is diethanolamine, citric acid or acetylacetone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: Pt/C catalyst has electrochemical activity area of 84.3 m2/g. Filter has pore size of 1 mu m. Preferred Compositions: Pt/C catalyst comprises 1.2 pts. wt. carbon black carrier, 150 pts. wt. deionized water, 249 pts. wt. of 15-30 g/L chloroplatinic acid hexahydrate in reducing polyol solution, 90 pts. wt. reducing polyol, and 35 pts. wt. of 1 M alkali solution. Acid is concentrated hydrochloric acid (HCl), concentrated sulfuric acid (H2SO4), or nitric acid (HNO3). Preferred Conditions: 1st standing time is 3-20 minutes, preferably 20 minutes, microwave heating power is 600-1000 W, preferably 700 W, and microwave heating time is 3-10 minutes, preferably 10 minutes. Preferred Processes: Drying is performed by vacuum-drying at 80 degrees C for 8 hours.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Carbon black carrier is XC-72R, EC300, EC600, graphene, or carbon nanotubes. Reducing polyol is isopropanol, ethylene glycol, and/or pentaerythritol, preferably ethylene glycol. Alkali is sodium carbonate (Na2CO3) or sodium hydroxide (NaOH).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The carbon nanofiber of the carbon nanofiber structure is transferred to a conductive substrate and a carbon nanofiber electrode is obtained.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin is chosen from polyimide, polyamidoimide and polyamide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The zinc oxide is doped with aluminum, boron, gallium (all preferred), indium, yttrium, scandium, fluorine, vanadium, silicon, germanium, titanium, zirconium or hafnium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The diethylzinc is present at 95-99.9 wt.%, preferably 99.5 wt.%. (X) is present at 0.1-5 wt.%, preferably 0.5 wt.%. (X) is anthracene. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The copper-zinc-tin containing chalcogenide material is a compound with kesterite structure of formula Cu(2x)Zn(1+y)Sn(S(1-z)Se(z))(4+q).x, y, z = 0-1; andq = -1 to 1.The emitter layer includes one of cadmium sulfide or cadmium telluride. The aluminum oxide including buffer layer includes aluminum oxide and the thickness of the buffer layer is 8-25 Angstrom , preferably 5-20 Angstrom . The conductive layer includes molybdenum and the substrate includes a glass substrate. The device (D1) further comprises a passivation layer formed in contact with absorber layer, where the passivation layer includes an atomic layer deposition layer having a thickness of less than 25 Angstrom . The passivation layer includes aluminum oxide and the thickness of the passivation layer is 8-15 Angstrom . The cadmium including emitter layer includes one of cadmium sulfide or cadmium telluride. The aluminum oxide including passivation layer includes aluminum oxide and the thickness of the passivation layer is 8-15 Angstrom . The conductive layer includes molybdenum and the substrate includes a glass substrate. The device (D2) further comprises a buffer layer formed between the emitter layer and the transparent conductor layer, where the buffer layer includes an atomic layer deposition layer having a thickness of less than 25 Angstrom . The buffer layer includes aluminum oxide and the thickness of the passivation layer is 8-25 Angstrom .
TECHNOLOGY FOCUS - METALLURGY - The dielectric comprises metal oxide such as aluminum oxide and zinc oxide.    TECHNOLOGY FOCUS - POLYMERS - The dielectric comprises polymer such as Teflon (RTM: PTFE), ULTEM, or polyetheretherketone (PEEK) (RTM: Colorless organic polymer thermoplastic).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Sodium hydroxide mass-to-volume concentration is 1.2%. Preferred Conditions: Sintering temperature is 760-780 degrees C and time is 1.8-2 s. Preferred Parameters: Silicon resistance is 70-75 Omega . Thickness of silicon nitride layer is 70-80 nm and refractive index is 2.05-2.10.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Parameters: Single band difference superlattice is divided into 2 types in which one is Delta Ev=0, and the other is Delta Ec=0, and structure of super-lattice carrier transition is present in 1-3 ways. Band breaking value is not less than 0.15 eV of semiconductor thin film and are alternately deposited. Super-lattice thin film thickness per cycle is nanometer thin with band structure and in transition mode. Preferred Form: Design is glass/transparent conductive film/containing single band difference with n-type thin film layer of super-lattice structure/containing single band difference with p-type thin film layer of super-lattice structure/back electrode (glass/transparent conductive oxide (TCO) film/n-SOS/p-SOS/electrode) as the backbone structure. Preferred Processes: PLD technique involves using transfer target sputtering method, using computer control plate shielding of time to control thickness and period of each layer of thin film and parameter, preparing thin film solar battery of new structure containing single band difference super-lattice.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The trivalent iron salt comprises iron(III) chloride and iron(III) sulfate. The manganese ore powder comprises manganese dioxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The glass composition comprises 3-20 %mass strontium oxide, and 2-15 %mass barium oxide, and has mass ratio of strontium oxide and barium oxide of 1.2 or more, preferably.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The organic binder is polyalkylene carbonate resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Ruthenium is present in metallic form without forming an alloy with palladium. The palladium/carbon catalyst in the step (a) is palladium deposited onto the carbon support. The carbon support comprises Vulcan XC-72 (RTM: Carbon black), carbo medicinalis ligni, carbon nanotube, carbon nanofiber or graphene. The ruthenium salt in the step (b) is ruthenium chloride. The reducing agent reducing ruthenium ions in the step (b) is sodium borohydride, formic acid or hydrazine. Preferred Method: The ruthenium in the step (b) is deposited on the palladium/carbon catalyst either by the reduction of ruthenium salts in an aqueous solution using a reducing agent or by impregnation (coating) of palladium/carbon catalyst with ruthenium hydroxide, and subsequently reducing ruthenium hydroxide using reducing agent. EXAMPLE - 1 g Palladium supported carbon black catalyst was mixed with 100 ml water and stirred for 30 minutes at a rotational speed of 400 revolutions/minute. The prepared mixture was added with a solution of 0.114 g of ruthenium(III) chloride dehydrate in 100 ml water and stirred for 30 minutes at a rotational speed of 400 revolutions/minute. The mixture was washed with 0.1 M sodium hydroxide in small portions until the pH of the mixture was 8. The mixture was heated to 50 degrees C and stirred for 60 minutes at a rotational speed of 400 revolutions/minute. The formed precipitate was filtered off and washed many times with deionized water. The precipitate was dried at 80 degrees C for 2 hours under reduced pressure and the resulting catalyst was reduced with 5% hydrogen in nitrogen at 200 degrees C for 30 minutes.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The n-type semiconductor nanostructure is made of material selected from group consisting of silicon, germanium, gallium arsenide, gallium phosphide, aluminum antimonide, indium phosphide, indium selenide, indium telluride, cadmium sulphide, cadmium selenide, cadmium telluride, zinc selenide, zinc telluride, bismuth sulphide, copper sulphide, molybdenum selenide, tungsten selenide, silicon oxide, titanium oxide, copper oxide, gallium nitride, and zinc oxide.    TECHNOLOGY FOCUS - METALLURGY - The p-type phthalocyanine nanostructure is made of material selected from group consisting of copper, zinc, iron, cobalt, nickel, palladium, and tin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The filler contains calcium carbonate surface-treated by stearic acid or rosin acid.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The main ingredient composition further contains 0.1-100 parts mass polyorganosiloxane (d) in which molecular chain terminal is blocked by vinyl group and/or methyl group. The molar ratio of total content of alkoxy group bonded with silicon atom in the components (e and f) and total content of hydroxyl group bonded with silicon atom in components (a and c) is 5-50. The curing agent composition (B) further contains 0.1-100 parts mass polyorganosiloxane (d) in which molecular chain terminal is blocked by vinyl group and/or methyl group. The molar ratio of p and q in polyorganosiloxane (c) (III) is 0.4-1.2. The content of hydroxyl group in polyorganosiloxane (c) (III) is 0.01-10 %mass. The component (a) is a mixture of 2 or more type of polydiorganosiloxane having different viscosities in which both terminal molecular chains are blocked with hydroxyl group. Preferred Properties: The polyorganosiloxane (d) and polyorganosiloxane (h) have viscosity of 0.1-100 Pa.second at 23 degrees C. The polyorganosiloxane (c) (III) has mass mean molecular weight of 500-20000.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The oxygen content is 100 wt ppm or less. The content of iron, nickel and silver and phosphorus is 10 wt ppm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The element (X) is chosen from lithium, magnesium, calcium, scandium, titanium, strontium, yttrium, zircoinium, niobium, lanthanum, cerium, neodymium, samarium, europium, holmium, hafnium, tantalum, tungsten and bismuth. The ratio of element (X) and sum of zinc, magnesium and element (X) is 0.0001-0.01. The ratio of sum of magnesium and element (X) and sum of zinc, magnesium and elemnt (X) is 0.0002-0.2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The first substrate comprises material selected from Germanium, Gallium-Arsenic, p-type Germanium, Germanium, Silicon-Germanium, Gallium-Arsenic and Indium phosphorus. The subcells comprises a base layer made of material selected from Aluminum-Indium-Gallium-phosphorus, Aluminum-Gallium-Arsenic, Indium-Gallium-Arsenic-phosphorus, Aluminum-Indium-Gallium-Arsenic, Indium-Gallium-Arsenic, Indium-phosphorus, Gallium-Indium-Arsenic and Aluminum-Gallium-Arsenic.    TECHNOLOGY FOCUS - METALLURGY - P-containing layer comprises alloy selected from Indium-Gallium-phosphorus, Indium-phosphorus, and Gallium-phosphorus. The III-AsNV subcell comprises Gallium-Indium-Arsenic-Antimony alloy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal thin film contains at least palladium, copper, iron and manganese. The silicon carbide thin film comprises at least polycrystalline silicon carbide thin film and amorphous silicon carbide thin film. The substrate comprises at least sapphire, lanthanum aluminate and strontium titanate. Preferred Property: The thickness of the silicon carbide thin film and the metal thin film is 1-10 nm, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal oxide contained in the nanostructure is group-II-VI metal oxide of period table, preferably zinc oxide. The source material further contains zinc oxide and graphite. The amount of zinc oxide used during the control process is 0.01-100 mol%. The thermal decomposition material contains gallium arsenide. The nanostructure contains zinc oxide wires (110).
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The corrosion-resistant nickel-based alloy comprises 14-46 %mass chromium, 0.1-20 %mass molybdenum, 0.01-6 %mass iron, 0.005-0.8 %mass manganese, 0.001-0.5 %mass silicon, 0.01-0.5 %mass aluminum, 0.001-0.5 %mass titanium, 0.001-0.05 %mass magnesium, 2-5 %mass tungsten, 1.1-4 %mass total content of niobium or tantalum, and remainder of nickel and unavoidable impurities.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of cerium (IV) ion (Ce4+) contained in the cerium-oxide nanoparticle layer before argon ion irradiation is more than the concentration of cerium (III) ion (Ce3+). Preferred Property: The thickness of the cerium-oxide nanoparticle layer is 50 nm or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred composition: The glass contains molar ratio of lead of 1-3.2 with respect to silicon and aluminum, and 5 mol% or less silicon dioxide, 18 mol% or less aluminum oxide, and 6 mol% or less phosphorus pentoxide, in conversion of an oxide.
TECHNOLOGY FOCUS - METALLURGY - Preferred Conditions: DC electroplating device uses Mo electrode as anode and Pt electrode as cathode to obtain Pt/Mo plating sample which is annealed under argon protective atmosphere at 900-950 degrees C for 3.5-4 hours, and DC electroplating device uses Pt/Mo layered annealed sample as anode and Ag electrode as cathode to obtain Pt/Mo/Ag plating sample which is annealed under argon protective atmosphere at 700-750 degrees C for 4-4.5 hours. Preferred Compositions: Laminated structure of Ag-Mo-Pt-Mo is obtained by interface diffusion of Pt-Mo and Mo-Ag and metallurgical bonding. Mo plating solution composition contains 140 g/L disodium hydrogen phosphate, 40 g/L diammonium phosphate, 0.5308 g/L chloromolybdic acid, and 0.01 g/L sodium dodecylsulfate in which pH is 7-7.5, electric current density is 4-4.5 A.dm-2, plating time is 3.5-4 hours, and plating temperature is 80-85 degrees C. Preferred Parameters: Pt base metal has thickness of 12 mu m, intermediate layer of Mo metal has thickness of 0.5 mu m, and Ag metal surface has thickness of 5 mu m. Preferred Processes: Annealing process during 1st time annealing is performed by heating to 250 degrees C at heating rate of 5 degrees C/minute, heat-preserving for 10 minutes, increasing temperature to 900 degrees C at heating rate of 6.5 degrees C/minute, heat-preserving for 4 hours, and cooling in furnace cooling. Annealing process during 2nd time annealing is performed by heating to 250 degrees C at heating rate of 5 degrees C/minute, heat-preserving for 10 minutes, increasing temperature to 700 degrees C at heating rate of 6.5 degrees C/minute, heat-preserving for 4 hours, and cooling in furnace cooling.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Compound (I) is prepared by mixing 2,7-dibromo-spiro(fluorene-9,9'-xanthene), one or more of 23 amine derivatives e.g. compound of formula (i)-(v) and strong alkali, adding weak polar solvent, stirring, adding organic palladium catalyst and organic phosphine catalyst, stirring, refluxing, cooling, extracting with cyclohexane and petroleum ether, washing, drying, filtering, and carrying out column chromatography. Preferred Components: The strong alkali is sodium tert-butoxide, potassium tert-butoxide, sodium ethoxide, potassium ethoxide or sodium butoxide. Weak polar solvent is toluene, tetrahydrofuran, dimethylformamide, dimethyl sulfoxide or dimethylacetamide. Organic palladium catalyst is tetrakis(triphenylphosphine)palladium(0), (1,1-bis(diphenylphosphino)ferrocene)dichloropalladium(II) or palladium(II) acetate. Organic phosphine catalyst is trimethylphosphine, triphenylphosphine or tri-n-butylphosphine. SPECIFIC COMPOUNDS - 20 Compounds (I) are specifically claimed, e.g. compounds (Ia)-(Ie).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The film (21) contains indium oxide as a main component, and further includes titanium, gallium, molybdenum, tin, tungsten and/or cerium. The film (22) contains zinc oxide as a main component, and further includes aluminum, gallium, boron, magnesium, silicon, titanium, germanium, zirconium and/or hafnium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: The 2-6-6 SCN is prepared by dissolving group II element, 1st group VI element, and 2nd group VI element in solvent containing octadecene and fatty acid to provide 2-6-6 SCN precursor solution and heating precursor solution to temperature sufficient to produce 2-6-6 SCNs. The 2-6-6 SCN is prepared by dissolving group II element and 1st group VI element in 1st solvent containing octadecene and fatty acid to prepare 1st solution, dissolving 2nd group VI element in 2nd solvent containing octadecene to prepare 2nd solution, mixing 1st and 2nd solutions to provide 2-6-6 SCN precursor solution, and heating precursor solution to temperature sufficient to produce 2-6-6 SCNs. The 2-6-6 SCN is prepared by dissolving group II element in 1st solvent containing octadecene and fatty acid to prepare 1st solution, dissolving 1st group VI element and 2nd group VI element in 2nd solvent containing octadecene to prepare 2nd solution, mixing 1st and 2nd solutions to provide 2-6-6 SCN precursor solution, and heating precursor solution to temperature sufficient to produce 2-6-6 SCNs. The 2-6-6 SCN is prepared by dissolving group II element in 1st solvent containing octadecene and fatty acid to prepare 1st solution, dissolving 1st group VI element in 2nd solvent containing octadecene to prepare 2nd solution, dissolving 2nd group VI element in 3rd solvent containing octadecene to prepare 3rd solution, mixing 1st-3rd solutions to provide 2-6-6 SCN precursor solution, and heating precursor solution to temperature sufficient to prepare 2-6-6 SCNs.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyethylene terephthalate film comprises polyethylene terephthalate containing 0.7-2 wt.% diethylene glycol, 0.6-11.2 mol/t metallic element chosen from manganese, calcium and phosphorus. The content of alkali metal with respect to the polyethylene terephthalate is M1 (mol/t). The total content of the manganese and calcium with respect to a polyethylene terephthalate is M2 (mol/t). When the content of phosphorus with respect to the polyethylene terephthalate is set to P (mol/t), the metal content (M) in the polyethylene terephthalate is calculated using a relation: M=M1/2+M2. The ratio of metal content (M) and content of elemental phosphorus (P) is 1.1-2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The transparent conductive layer is selected from a group consisting of fluorine-doped tin oxide, indium tin oxide or aluminum-doped zinc oxide. The absorber layer is made of silicon, chalcogenide semiconductor material or organic material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The difference of average value of carbon atom ratio in region (A) and region (B), when the gas barrier layer is bisected in thickness direction is 5-20%. The largest local maximum value of carbon distribution curve and minimum local maximum value is 15-35%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Coating composition contains colloidal silica (E).    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Coating composition comprises component (A-1) and component (A-2). Component (B) contains UV absorption group. Component (B) is benzotriazole-type compound of formula (8) or benzophenone-type compound of formula (9). Component (A-1) is represented by formula Si(OR1)4 (1). Component (A-2) is represented by formula R2aSi(OR3)4-a (2). Component (A-3) is represented by formula R4bSi(OR5)4-b (3). Component (A-4) is represented by formula R6cSi(OR7)4-c (4). Component (A-5) is represented by formula R8dSi(OR9)4-d (5). Component (A-6) is represented by formula R20eSi(OR21)4-e (20). Component (C) is organic acid.X=H or Cl;R10=H, Me, or 4-8C tert.-alkyl group;R11=2-10C alkylene;R12=H or Me;p=0 or 1;R13=H or Me;R14=optionally substituted 2-10C alkylene;R15=H or OH;R16=H, OH, or 1-6C alkoxy;R1=1-4C alkyl or 1-4C alkoxyalkyl;R2=1-10C alkyl, 1-10C fluorinated alkyl, or Ph;R3=1-4C alkyl or 1-4C alkoxyalkyl;a=1 or 2;R4=1-4C alkyl, Ph, or 1-3C alkyl substituted by NH2, aminoalkyl, and/or and alkylamino;R5=1-4C alkyl;b=1 or 2;R6=1-4C alkyl, Ph, or 1-6C alkyl substituted by glycidoxy and/or 3,4-epoxycyclohexyl;R7=1-4C alkyl;c=1 or 2;R8=1-4C alkyl, Ph, or 1-6C alkyl substituted by block forming isocyanate group;R9=1-4C alkyl;d=1 or 2;R20=1-4C alkyl, vinyl, or 1-6C alkyl substituted by vinyl, acryl, and/or methacryl;R21=1-4C alkyl; ande=1 or 2.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The tackifier contains an aliphatic hydrocarbon resin. The copolymer has a softening point of 80-200 degrees C and a mass mean molecular weight of 10000-400000. The content of copolymer is 5-200 parts mass with respect to 100 parts mass of polyisobutylene type resin. The content of tackifier is 5-60 parts mass with respect to a total of 100 parts mass of polyisobutylene type resin and copolymer. The polyisobutylene type resin contains isobutylene-isoprene copolymer having 0.1-30 mol% structural unit derived from isoprene, and a structural unit derived from isobutylene. Preferred Properties: The adhesive layer is clamped by two peeling sheets (13). The adhesive sheet has a gas-barrier base material (11), the adhesive layer, and a gas-barrier layer. The adhesive sheet has a total light transmittance of 90% or more. The adhesive layer has a water-vapor-permeation rate of 10 g/m2/day or less at 40 degrees C and 90% relative humidity.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The average shortest distance of the semiconductor quantum dot is less than 0.45 nm, preferably less than 0.2 nm. The quantum dots contain lead sulfide, lead selenide, indium nitride, indium arsenide, indium antimonide, and/or indium phosphide, preferably lead sulfide. The quantum dots have an average particle diameter of 2-15 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Ligands (I)-(III) are chosen from 2-aminoethane thiol (derivative), 2-aminoethanol (derivative), and 3-amino-1-propanol (derivative). The ligand forms a 5-membered ring chelate with the metal atom in the quantum dot. The log of complex stability between the ligand and metal atom is 8 or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The radical polymerizable monomer is styrene, P-methylstryene, M-methylstyrene, P-ethylstyrene, M-ethylstyrene, P-chlorostyrene, M-chlorostyrene, P-chloromethylstyrene, M-chloromethylstyrene, styrene sulfonic acid, P-T-butoxystyrene, M-t-butoxy styrene, alpha -methylstyrene, vinyl toluene, chlorostyrene, methyl(meth)acrylate, ethyl(meth)acrylate, butyl(meth)acrylate, octyl(meth)acrylate, stearyl(meth)acrylate, benzyl(meth)acrylate, glycidyl (meth) acrylate, fluoroethyl acrylate, trifluorethyl methacrylate, pentafluoride propyl methacrylate, fluoro ethylmethacrylate, hexafluoro butyl (meth) acrylate, hexafluor isopropyl methacrylate, perfluoroalkyl acrylate, octafluorphenyl methacrylate, vinyl acetate, vinylpropionate, vinyl butyrate, vinyl ether, allyl butyl ether, allylglycidylether, (meth) acrylic acid, maleic acid, alkyl (meth) acrylamide or (meth) acrylonitrile. The polymer resin has the average molecular weight of 30000-70000 g/mol. The air gap structuring agent is toluene, benzene, ethyl acetate, butylacetate, chloroform, dichloromethane, methyl ethyl ketone, xylene or cyclohexanol. The particle comprises 5-50 pts. wt. of air gap structuring agent and 100 pts. wt. of polymer resin. The dispersing stabilizer is cellulose derivative including methylcellulose, ethyl cellulose, hydroxypropylcellulose, polyvinyl alcohol, polyvinyl methyl ether, polyacrylic acid, polyvinylacetate, polyvinyl pyrrolidone or vinylpyrrolidone and vinyl acetate. The particle is consecutively washed with water for one time and with ethanol or methanol for two times. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Cleaning agent has 8-10 g, preferably 9 g potassium hydroxide, 1-3 g, preferably 2 g surfactant, 1 g osmotic agent, and 1-3 g, preferably 1 g chelating agent.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Chelating agent is ethylene diamine tetraacetic acid tetrasodium salt (EDTA.4Na), ethylene diamine tetraacetic acid disodium salt (EDTA.2Na), and/or ammonium citrate. Surfactant is alkyl glucoside and/or heterogeneous alcohol polyoxyethylene ether. Osmotic agent is isooctanol ethoxylates.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The raw materials used in the preparation of cathode material is praseodymium oxide, barium carbonate, and cobaltosic oxide. The complex oxide is preferably PrBa0.98Co2O5+0.5, PrBa0.96Co2O5+0.46, PrBa0.94Co2O5+0.41, PrBa0.92Co2O5+0.37, or PrBa0.9Co2O5+0.32.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The method of kerf formation and treatment in semiconductor films further involves rinsing the semiconductor film with deionized water after wet-cleaning the semiconductor film, where the solvent comprises a mixture of hydrogen peroxide, sulfuric acid and water. The solvent further comprises phosphoric acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Methyl butanetriol is 3-methyl-butane-1,2,3- triol and/or 2-methyl-butane-1,2,4-triol. The solvent contains 2-100% methyl butanetriol. The solvent contains water, ketone solvent, alcohol solvent, ester solvent, and ether solvent. Alcohol solvent is terpineol or dihydroterpineol, and ester solvent is terpinenyl acetate or dihydroterpinenyl acetate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Graphene layer contains 1-10 multiple graphene layer. Highly graphitized graphene dispersion contains dispersant ultrasonically combined or dispersed in multiple graphene layer. Dispersant is interface active agent. Graphene layer contains 0.01-20 wt.% graphite reinforced composite material. Graphite reinforced material contains additive composed of organic material, metal material, and/or ceramic material. Preferred Forms: Graphene layer has sheet-shaped structure and is hexagonal crystal in form. Preferred Processes: Highly graphitized graphene is prepared by dissolving carbon deposition. Highly graphitized graphene dispersion is subjected to ultrasonic oscillation treatment to form graphene layer. Graphite reinforced composite material is processed by heat treatment or chemical treatment. Heat treatment is processed by blank-firing process or thermal oxidation. Chemical treatment is processed by chemical oxidation or chemical doping process. Preferred Parameters: Graphite has 0.8-1 audability degree of graphitization. Graphene single layer bottom direction has 1-1000 nm size and 0.35-1 nm thickness.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Substrate is plastic, rubber, synthetic fiber, natural fiber, ceramic material, and/or metal material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Compound (I) is prepared by mixing 2,7-dibromo-spiro(fluorene-9,9'-xanthene), one or more of 23 amine derivatives e.g. compound of formula (i)-(v) and strong alkali, adding weak polar solvent, stirring, adding organic palladium catalyst and organic phosphine catalyst, stirring, refluxing, cooling, extracting with cyclohexane and petroleum ether, washing, drying, filtering, and carrying out column chromatography. Preferred Components: The strong alkali is sodium tert-butoxide, potassium tert-butoxide, sodium ethoxide, potassium ethoxide or sodium butoxide. Weak polar solvent is toluene, tetrahydrofuran, dimethylformamide, dimethyl sulfoxide or dimethylacetamide. Organic palladium catalyst is tetrakis(triphenylphosphine)palladium(0), (1,1-bis(diphenylphosphino)ferrocene)dichloropalladium(II) or palladium(II) acetate. Organic phosphine catalyst is trimethylphosphine, triphenylphosphine or tri-n-butylphosphine. SPECIFIC COMPOUNDS - 20 Compounds (I) are specifically claimed, e.g. (Ia-Ie).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The oxidation step is carried out at a temperature of 300-600?0C, preferably 400-600 degrees C. Preferred Components: The carbon black includes acetylene black. The oxidizing gas includes carbon dioxide and/or air. The hollow carbon black has total pore volume of greater than or equal to 1.3 cm3/g, preferably 0.32-1.50 cm3/g and specific surface area of 100-300 m2/g.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The length (yl) and diameter (yr) of two-ingredient fullerene nano whisker based on preparation amount (%mass) of 70C powder with respect to 60C powder satisfies the relation: yl=10.7-1.25x+0.0549x2 and yr=0.535+4.88x 10-3x+2.51x 10-4x2. Preferred Composition: The organic solvent is toluene and the poor solvent of the fullerene is isopropyl alcohol. Preferred Process: The diffusive mixing of the liquid-liquid interface is performed by hand gesture, ultrasonic irradiation and/or a rotor.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The epitaxial layer wide bandgap semiconductor is made of SiC, gallium-nitride (GaN), aluminum-nitride (AlN) or diamond.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The fiber is polyparaphenylene terephthalamide fiber or copolyparaphenylene 3,4'-oxydiphenylene terephthalamide fiber.    TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Properties: The total area of 50 mu m inscribed circle diameter and 50 mu m fiber diameter portion in the nonwoven fabricis 10% or less. The average hole diameter of hole is 1/10-1/10000. The melting point or thermal decomposition temperature of fiber is 300 degrees C or more. The nonwoven fabric has dry heat shrinkage of 2% or less at 200 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The microparticles are copper-zinc-tin-sulfur-selenium-containing compound of formula: Cu2-x'Zn1+y'SnSzSe4-z (I), where x' and y' are 0-1, and z is 0-4, and includes copper-sulfur-selenium-containing compound of formula: Cu2-xSySe2-y (II), zinc-sulfur-selenium-containing compound of formula: Zn2-xSySe2-y (II), and tin-sulfur-selenium-containing compound of formula: Sn2-xSySe2-y (III), where x is 0-1 and y is 0-2. Preferred Properties: The microparticles have average particle diameter of 1-2000 nm. The compound semiconductor thin film has average roughness of 200 nm or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of fluorine-containing monomer unit in the fluorinated copolymer is 15-85 %mass. The content of fluorinated olefin unit in the fluorinated copolymer is 10-90 %mass. The washing medium is chosen from hydrofluorocarbon, hydrofluoro ether, and perfluorocarbon. The fluorine-containing monomer is of formula: CF2=CF(CF2)p-(O)q-(CF2CFX)r-(O)s-(CF2)t-(CF2CFX')uA1 (I). The fluorinated olefin is tetrafluoroethylene.X,X'=fluoro or trifluoromethyl;A1=carboxylic-type functional group or sulfonic acid-type functional group;p,q,s=0 or 1;r,u=0-3;t=0-12;andor r+u=1 or more.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The fluorinated copolymer has average particle diameter of 0.10-10 mm and ion exchange capacity of 0.5-2.0 milliequivalent/g. The swelling degree of the fluorinated copolymer is 30-100 %mass, which is calculated using a relation: (WA2-WA1)/WA1x 100, where WA1 is dried mass of hot-pressed, molded polymer having thickness of 100 mu m, cut into 20 mmx 20 mm and dried, and WA2 is dried mass immersed in a solvent or washed for 16 hours, then removed the sample from the solvent and wiped off the solvent in the surface of the sample.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of hetero particles with respect to 100 pts. wt. copper contained in copper coated hetero-metal nanoparticles is 1-30 pts. wt. Preferred Property: The nanoparticles have average particle size of 50-1000 nm.    TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The hetero metal is zinc or aluminum.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic compound is amine. The content of organic compound is 0.1-4 wt.%. The curing agent is chosen from dimethylaminopropyl metal acrylamide, isocyanate, and phthalic anhydride. The solvent is chosen from diethylene glycol, triethylene glycol, tetraethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monomethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether acetate, dipropylene glycol monomethyl ether, dipropylene glycol monomethyl ether acetate, methyl pyrrolidone, and terpineol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The binder resin is chosen from cellulose-based resin, epoxy-type resin, and polyester-type resin obtained by mixing one or copolymers. The monomer and oligomer are chosen from acryl-type monomer and oligomer, urethane-type monomer and oligomer and epoxy-type monomer and oligomer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The carbon material is crystalline or amorphous.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The carbon nanotube is present in an amount of 1-50 wt.%. The silicon gum is present in an amount of 50-99 wt.%, and has a molecular weight of 80-1000. The mixing step comprises adding a volatile organic compound in the mixture. The synthetic resin base material comprises low density polyethylene, polyethylene terephthalate, PVC, and thermoplastic polyurethane. The master batch is present in an amount of 1-20 wt.%. The synthetic resin base material is present in an amount of 80-99 wt.%. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent (A) is chosen from trioctylphosphine, tridiethylaminophosphine and tributylphophine. The organic tin compound is chosen from bis(bis(trimethylsilyl)amino)tin(II) and tin(II)-2-ethylhexanoate. The solvents (B,C) are chosen from 1- octadecene, hexadecylamine and oleylamine. The molar ratio of sulfur and tin contained in the nanorod is 4-6:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The alkali metal halide is sodium halide or lithium halide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The alkyl halide is added to make the solution 0.005 M. The tetraalkyl ammonium alanate solution in toluene is prepared by the metathesis of a tetraalkyl ammonium halide and an alkali metal alanate in a toluene solution. The alkali metal halide is filtered from the solution. The method is continuous and the filtrate is used to create the tetraalkyl ammonium alanate solution in toluene by the addition of an alkali metal alanate. The crystallizing the alpha -alane by heating the solution at 50-95 degrees C, preferably 60-65 or 65-87 or 88-95 or 50-60 degrees C. EXAMPLE - A 0.22M toluene solution of the quaternary ammonium aluminohydride was prepared with stirring under inert atmosphere at ambient temperature. A benzyl chloride in toluene was added to the quaternary ammonium alanate solution slowly while cooling the solution in an ice-water bath. A slight molar excess of the benzyl chloride was preferred. The course of the reaction can be monitored. When the reaction was complete, as indicated by the absence of starting material, the suspension was diluted with toluene and filtered under inert atmosphere. The product was washed three times with toluene. The product was then dried overnight to obtain pure alane.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The organic electroluminescent device further comprises a light-emitting layer, a hole injection layer and a hole-transport layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. SPECIFIC COMPOUNDS - 300 Compounds (I) are specifically claimed e.g. 4-(10-methyl-10H-phenanthro(9,10-b)carbazol-13-yl)-N,N-diphenylaniline of formula (Ia), N-(4-(10-methyl-10H-phenanthro(9,10-b)carbazol-13-yl)phenyl)-N-phenylnaphthalen-2-amine, N-(4-(10-methyl-10H-phenanthro(9,10-b)carbazol-13-yl)phenyl)-N-phenylbiphenyl-4-amine, N-(4-(10-methyl-10H-phenanthro(9,10-b)carbazol-13-yl)phenyl)-N-phenylanthracen-2-amine, and N-(4-(10-methyl-10H-phenanthro(9,10-b)carbazol-13-yl)phenyl)-N-phenylphenanthren-3-amine.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): An alkyl halide-substituted styrene and alkylmagnesium halide-substituted norbornene are reacted, to obtain norbornene-based styrene derivative.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The hole transport polymer further has repeating unit of formulae (III) or (IV).m1=1-20;m2=0-20;p+q=1;p=more than 0;q=less than 1;Z=methyl ether or carboxy;Ar1,Ar2=6-40C aryl, arylalkyl, alkylaryl, arylsilyl, arylalkylsilyl, haloaryl, aryloxy, aryloxoalkyl, thioaryloxy oxoalkyl, aryl, aryliodo, arylsiloxy, arylalkylsiloxy, aryl, arylamino, arylamino aryl, arylphosphino, diaryl amido, triaryl amido or group of formula (a);andAr4-Ar6=6-40C aryl, arylalkyl, alkylaryl, arylsilyl, arylalkylsilyl, haloaryl, aryloxy, aryloxoalkyl, thioaryloxy oxoalkyl, aryl, aryliodo, arylsiloxy, arylalkylsiloxy, aryl, arylamino, arylamino aryl, arylphosphino, diaryl amido or triaryl amido.Preferred Process: During manufacture of hole transport polymer, co-catalyst(s) chosen from aromatic compound of formulae: -(Al(-R3)-O)p, B'(Ar7)3 or (Mb)(Q) is added.R3=1-20C alkyl, 3-20C cycloalkyl (both optionally substituted), 6-40C aryl, alkylaryl, arylalkyl or H;p=1-100;Ar7=6-40C aryl, haloaryl or haloalkylaryl;Mb=metal ion of group 1, 2 or 11-14;andQ=weakly-coordinating anion.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The inorganic salt is potassium bromide, potassium chloride, potassium nitrate, or ammonium chloride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The reducing agent is citric acid, sodium citrate or potassium citrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Concentration of ferric nitrate or ferric chloride is 0.1-1 wt.%. Platinum/carbon contains 10-70 wt.% platinum. Hydrogen-argon atmosphere contains 2-50 vol.% hydrogen. Acid concentration is 0.1-2 mol/L. Atom ratio of platinum and iron is 9:1-1:1. Preferred Components: Acid is perchloric acid, sulfuric acid, hydrochloric acid or nitric acid.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: Added amount of ammonia water is 0.1-1 wt.%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nitrogen content is 3-15%. Preferred Component: The nitrogen source is melamine, ammonia and/or urea. The carbon source is glucose, dopamine and/or polyaniline.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): A diethylaminocoumarin compound is prepared by reacting compound of formula (III) and compound of formula (IV) or compound of formula (V) in organic solvent under alkaline compound, heating and refluxing while stirring reaction for 1-10 hours, rotating solvent until dry when reaction is complete, and subjecting residue with eluting solvent to silicon glue column chromatography in which alkaline compound is piperidine, pyridine, triethylamine, or dimethylamine, organic solvent is acetonitrile, chloroform, tetrahydrofuran, or 1,4-dioxane, eluting solvent is (chloroform and/or methylene chloride)+(methanol and/or ethanol)+mixed solvent of acetic acid, ratio of compound of (III) and compound of formula (IV) or compound of formula (V) and alkaline compound is 1:1-3:0.1-0.3, and volume of organic solvent based on amount of formula (III) is 10-30 ml/mmol. Preferred Definitions:    Ar=compound of formula (I-1a), compound of formula (I-1b), or compound of formula (I-1c).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Solvents and copper used are analytical grade and water is highly pure water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The ratio of niobium powder and tantalum powder is 25-45:1, preferably 30-40:1. Preferred Method: The sintering step is carried out at temperature of 1100-1200 degrees C and pressure of 20-25 MPa for 2-4 hours. The demolding process is carried out at temperature of 500-950 degrees C, preferably 600-800 degrees C.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: The machinery processing is carried out using an electric discharge machining cutter and a cylindrical grinding machine.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Preparation of (I) comprises in an anaerobic environment, carrying out Stille coupling reaction of dibromonaphthalene-containing compound of formula (II) and a thiophene-containing compound of formula (III), where the mol ratio of (II) and (III) is 1:1.5, in an organic solvent containing an organic palladium catalyst at 70-120 degrees C; and purifying. Preferred Method: Compound (II) is prepared by dissolving a benzothiadiazole-containing compound of formula (IV) and an alkyne compound of formula R1=C-C=R2 (V), in a second solvent, where the mol ratio of (IV) and (V) is 1:2, and purifying. Compound (III) is prepared in an anaerobic environment, by adding tetrahydrofuran to a thiophene compound of formula (VI) by dissolving benzothiadiazole-containing compound of formula (VI) in tetrahydrofuran at - 78 degrees C, adding n-butyllithium to form a mixed solution, stirring for 2 hours, adding tributyl chloride at - 78 degrees C, stirring the reaction mixture at room temperature for 6 hours, adding saturated sodium chloride aqueous solution to terminate the reaction, extracting with anhydrous diethyl ether, suction filtering the organic phase and drying, and removing solvent from the filtrate. Preferred Component: The organic catalyst is tris (dibenzylideneacetone) palladium, tetrakis (triphenylphosphine) palladium, or triphenylphosphine palladium dichloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The sacrificial material consists of an oxide of group 3-13 metals, electrically insulative oxide, semiconductive metal oxide, and molybdenum nitrides.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The additive material consists of a triarylmethane compound, an azo compound, a xanthene compound, an acridinium compound, a phenazine compound, a thiazene compound, a phthalocyanine dye, carbon black, and a metal oxide pigment.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The film forming gas contains oxygen and source gas containing an organosilicon compound. The gas barrier layer contains carbon, silicon and oxygen as constituent element. The carbon atom ratio of gas barrier layer is 8-20 atomic%. The roller has diameter of 300-1000 mm. A polysilazane coating liquid is coated on gas barrier layer, and dried to form secondary gas barrier layer (4).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The porous separator comprises a composite separator containing aggregated inorganic particles enmeshed in a matrix. The aggregated inorganic particles comprise acid-stable, hydrophilic, inorganic material and the matrix comprises fully fluorinated polyolefin. The inorganic material comprises silicon oxide, and a material chosen from silicon, zirconium, niobium, titanium, boron, oxides and/or nitrides. The positive and negative electrolytes comprise vanadium redox couple.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The fully fluorinated polyolefin comprises a material chosen from polytetrafluoroethylene, hexafluoropropylene and/or fluorinated ethylene propylene.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I), comprises reacting free ligand which is optionally present in deprotonated form and optionally a further ligand (L2) with metal salts or metal complexes. Preferred Definitions:    Either L1 = CO, NO, alkyl cyanide, aryl cyanide, alkyl isocyanide, aryl isocyanide, NH2, phosphine, phosphite, arsine, stibine, nitrogen-containing heterocyclyl or carbene; or    L2+L2 = diamine, imine, heterocyclyl containing 2 N or diphosphine.    SPECIFIC COMPOUNDS - Approximately 112 compounds (I) are disclosed e.g. copper complexes of formula (Ia)-(Ie).    EXAMPLE - 47 mg Copper pyrrolidide in toluene was added dropwise to a solution of 300 mg tris((diphenylphosphino)methylphenyl)silane in toluene. Then the obtained solution was stirred for 2 hours and then worked up to obtain (Ia).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The anion of the component (B) is at least one of tetrafluoroborate anion and hexafluorophosphate anion. Preferred Process: The removal of silicon nitride film involves forming the composition on a silicon nitride film by the printing method and removing the silicon nitride film by heating.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The component (A) is chosen from boron trifluoride-monomethylamine complex, boron trifluoride-monoethylamine complex, boron trifluoride-monopropylamine complex, boron trifluoride-monobutylamine complex, boron trifluoride-dimethylamine complex, boron trifluoride-diethylamine complex, boron trifluoride-diisopropylamine complex, boron trifluoride-dibutylamine complex, boron trifluoride-trimethylamine complex, boron trifluoride-triethylamine complex, boron trifluoride-tributhylamine complex, boron trifluoride-dimethylbenzylamine complex, boron trifluoride-triethanolamine complex, boron trifluoride-acetonitrile complex, boron trifluoride-dimethylether complex, boron trifluoride-methyl ethyl ether complex, boron trifluoride-diethylether complex, boron trifluoride-tetrahydrofuran complex, boron trifluoride-tetrahydropyran complex, boron trifluoride-phenol complex, boron trifluoride-piperidine complex, boron trifluoride-acetic acid complex, boron trifluoride-methanol complex and boron trifluoride-ethanol complex. The cation of the component (B) is at least one of imidazolium cation and pyridinium cation. The composition further contains solvent. The weight ratio of the component (B) and component (A) 0.3-10.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The carbon material is carbon nanotube, carbon nano fiber, carbon black, activated charcoal or graphite, where the carbon nano fiber is platelet-carbon nano fiber. The silane polymer is polycarbomethylsilane. The silane polymer and the carbon material are mixed with the weight ratio of 1-25:99-75. The carbon material is coated with a silicon oxide layer with the thickness of 0.5-5 nm. The activity metal catalyst is platinum or platinum-ruthenium alloy.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent is carbon tetrachloride, chloroform, 1,2-dichloroethane, dichloromethane, chlorobenzene, propylene carbonate, n-methylpyrrolidone, dimethylformamide, acetonitrile, dipropyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethyleneglycol methyl ethylether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethyleneglycolmethylethylether, tetrahydrofuran, tetrahydropyran, n-pentane, n-hexane, n-heptane, n-octane, n-decane, benzene, toluene, xylene, durene, indene, tetrahydronaphthalene, decahydronaphthalene or squalene. The pulverized silane polymer is coated on the carbon material under an air atmosphere at 300-500 degrees C for 2 hours and under an oxygen atmosphere at 250-400 degrees C for 2 hours.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The dispersed phase solution is hexadecane, water, acetone, 1-5C alcohol and/or acetic acid. The dispersed phase solution further comprises a photoinitiator including benzoin, benzyl, benzophenone, 1-hydroxycyclohexylphenylketone, 2,4,6-trimethylbenzoyl diphenyl phosphine oxide, 2-hydroxy-2-methyl-1-phenylpropane-1-one, 2-methyl-1-(4-(methylthio) phenyl)-2-morpholino propan-1-one, 4,4'-bis(diethylamine)benzophenone, methyl-o-benzoylbenzoate, 2,4,6-trimethyl benzophenone, ethyl p-dimethylaminobenzoate, 2-ethylhexyl-4-dimethylaminobenzoate, 4-phenyl benzophenone, benzoin ethyl ether and tris(4-dimethylaminophethyl)methane, a crosslinking agent including ethyleneglycol dimethacrylate, 1,5-difluoro-2,4-dinitrobenzene, ethylene glycol bis(succinimidyl succinate), 3,3'-dithiobis(sulfosuccinimidyl propionate), disuccinimidyl tartarate, dithiobis (succinimidyl) propionate, disuccinimidyl glutarate, bis(2-(succinimido-oxycarbonyloxy)ethyl)sulfone, bis(succinimidyl)suberate, bis(succinimidyl)penta(ethylene glycol) and/or N,N'-methylenebisacrylamide, and a surfactant including sodium dodecyl sulfonate, sodium lauryl sulfonate, capric acid, n-dodecyl mercaptan, alkyl methacrylate, dodecyl methacrylate, sodium dodecylbenzene sulfonate, polyvinyl alcohol, polyvinyl pyrrolidone and their derivatives. (II) is diethylamino ethylmethacrylate, dimethylaminoethylmethacrylate, isopropyl acrylamide, isopropylmethacrylamide, tertiarybutyl acrylamide or dimethylaminopropyl methacrylamide. The injection ratio of the continuous phase and the dispersed phase is 1:20-1:3. The average particle size of the hydrogel absorber 1-5000 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic thin-film solar cell element Contains the organic layer containing a photoelectric converting layer between a pair of electrodes. The photoelectric converting layer comprises the organic thin-film solar cell element material. The photoelectric converting layer comprises fullerene derivative and inorganic semiconductor material as n-type-semiconductor material. Preferred Process: The photoelectric converting layer is formed into a film by coating.
TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The active layer is p-type layer or i-type layer. Preferred Definitions:    X1=H.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic particle comprises stannous oxide, barium titanate, aluminum oxide, cerium oxide, silicon dioxide, titanium dioxide, lithium phosphate, nickel(II) oxide, zinc oxide, magnesium oxide, Magnesium hydroxide, calcium oxide, zirconium dioxide, yttrium oxide and talc. The average granularity of the inorganic particle is 0.001~10 mu m.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The porous base material comprises high-density polyethylene, low density polyethylene, linear low density polyethylene, ultrahigh molecular weight polyethylene, polypropylene, polyethylene terephthalate, polybutylene terephthalate, polyester, polyacetal, polyamide, polycarbonate, polyimide, polyether-ether-ketone, polyethersulfone, polyphenylene oxide, polyphenylenesulfide and polyethylenenaphthalete. The porous base material has a: thickness of 1-100 mu m; pore size of 0.01-50 mu m; and porosity of 10-90%. The first organic binder is polystyrene, styrene butadiene rubber, nitrile rubber, polyolefin, acryl group, polyvinylidene fluoride group copolymer, ethylene-vinyl acetate, and polyvinyl butyral or polytetrafluoroethylene group polymer. The second organic binder is phosphate ester, phosphate acryl group copolymer, modified acryl type copolymer, carboxylic acid copolymer, siloxane and/or acrylic copolymer. The third organic binder comprises polyethylene oxide, carboxylmethylcellulose, polyvinyl alcohol, polyvinyl pyrrolidone, starch and ionic high molecule. The weight ratio of the: water and inorganic particles is 95:5-20:80; inorganic particles and first organic binder is 4:1-140:1; inorganic particles and second organic binder is 10:1-200:1; and inorganic particles and third organic binder is 50:1-200:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The surface active agent is surfactant P123, surfactant F127 or cetyl trimethylammonium bromide. The titanium source is tetrabutyl titanate, titanyl sulfate, titanium tetrachloride or titanium trichloride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The volatile organic solvent is toluene, ethanol or acetonitrile, preferably ethanol. The C60 solution is toluene, acetone, carbon tetrachloride or xylene.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Copolymer (I) is prepared by, in low oxygen free environment, reacting tin-containing compound of formula (M1) with bromine-containing compound of formula (M2) in organic solvent in the presence of a catalyst at 60-120 degrees C for Stille coupling reaction for 12-72 hours, stopping reaction, and obtaining compound (I). Preferred Materials: The organic solvent is tetrahydrofuran, N,N-dimethyl formamide, benzene and toluene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The platinum-containing compound is sodium chloroplatinate, chloroplatinic acid, platinum chloride, and/or platinum nitrate. The chromium-containing compound is chromium chloride and/or chromium trichloride. The pH of alkaline solution is 7.5-14. The alkaline solution of gas is of inert gas and/or carbon monoxide. The carbon carrier is carbon powder and/or activated carbon powder. The activated carbon powder is VXC-72, VXC-72R, KB-300, KB-600, AC-1 and/or AC-2. The gas used for protection during heating of intermediate is a mixture of hydrogen and inert gas. The inert gas is nitrogen and/or argon. The intermetallic compound has a grain diameter of 3-25 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The solvent is methanol, ethanol, acetone and/or acetonitrile.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The precursor is urea or melamine, preferably melamine.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass composition comprises 45-60 %mass silica, greater than 8 %mass to 20 %mass alumina, 0-4 %mass boria and lithia, 1-30 %mass sodium oxide and potassium oxide, 1-40 %mass magnesium oxide, calcium oxide, strontium oxide, and barium oxide, 10.5-20 %mass alumina and zirconia, and 0.001-0.2 %mass ferric oxide. The temperature at a viscosity of 102.5 dPa.second is 1520 degrees C.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass plate further contains 0-1 %mass boron trioxide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alkoxide comprises optionally substituted 1-24C (preferably 1-8C) alkyl, and the aryloxide comprises optionally substituted phenyl.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: In the composition (C1), the molar ratio of the M' metal selected from Group 2 of the Periodic Table to the M metal selected from any of Groups 3-12 of the Periodic Table, is 0.5:1-10:1 (preferably 2:1-1:1). The composition is made in the form of a solid film. Preferred Method: In the method, the mixing and/or the organic solvent removing step, are carried out at temperature of at least 30 degrees C. Preferred Components: The organic polymer comprising metal coordination sites is a poly(meth)acrylate, polyester, or poly(vinyl pyridine). Preferred Definitions:    M'=barium, strontium, calcium, titanium, zirconium, nickel, copper, zinc, palladium, silver, or lanthanum;    n and x=2-4.    EXAMPLE - To the 10 ml poly(methyl methacrylate) (PMMA) in anisole, 2.5 ml barium titanium (methoxisopropanol)6 (BaTi(MIP)6) was added to obtain PMMA-BaTi(MIP)6 composite mixture that contained 8.5 wt.% barium. The resulting mixture was diluted by addition of 10 ml anisole followed by addition of 2.3 ml 2-methoxy isopropanol and 1.5 ml carbitol. The solution was mixed by stirring for 12 hours to prepare poly(methyl methacrylate)(PMMA)-barium titanium (methoxisopropanol)6 composition.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The photovoltaic device further consists of layer (D) comprising cadmium and lead. The layers (A,B and C) comprise zinc.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sputtering gas comprises an oxygen-containing gas and a nitrogen-containing gas, boron trihydride, carbon dioxide, carbon monoxide and methane. The ternary compound comprises ZnNxOy, and comprises a dopant, which is aluminum. The semiconductor layer is amorphous.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The microcrystalline layer includes hydrogenated microcrystalline silicon, hydrogenated microcrystalline germanium or hydrogenated microcrystalline silicon germanium. The gettering gas includes silane at the temperature of room temperature to 300 degrees C under pressure of 1-20 Torr, and reactive element including sublimated titanium atoms. The contaminant species include oxygen, nitrogen and/or carbon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The atomic ratio of copper to total content of indium and gallium is 0.9-1. The atomic ratio of sodium to total content of copper, indium, gallium, selenium and sodium is 0.05-5%. The compound of sodium is sodium fluoride, sodium sulfide, sodium selenide and sodium selenium oxide. The sintered compact further contains bismuth, antimony, aluminum and zinc. The atomic ratio of total content of bismuth, antimony, aluminum and zinc to total content of copper, indium, gallium, selenium, bismuth, antimony, aluminum and zinc is 0.05-5.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of monomer having glass transition temperature of 10 degrees C or more of homopolymer is 5 wt.% or more with respect to 100 wt.% of total content of monomer components contained in acrylic polymer. The content of monomer having glass transition temperature of less than 10 degrees C of homopolymer is 65-94 wt.% with respect to 100 wt.% of total content of monomer components contained in acrylic polymer. The content of carboxyl group-containing monomer with respect to total content of monomer component in acrylic polymer is 2 wt.% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The copper precursor is chosen from blue vitriol, cuprous chloride, cupric chloride, copper nitrate, copper acetate, copper carbonate, cupric cyanide, and/or copper iodide. The reducing agents (A and B) are chosen from hydrazine, sodium borohydride, sodium chloride, sodium hydroxide, ammonia solution, and/or potassium bromide. The molar ratio of reducing agent (A) and copper precursor is 0.1-1. The molar ratio of reducing agent (B) and copper precursor is 0.01-0.1. Preferred Properties: The copper nanoparticles have pH of 6-8, and size of 10 nm or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic acid is chosen from ascorbic acid, erythorbic acid, glucuronolactone, and/or 2,3-diformyloxypropyl formate. The solvent is chosen from water, methanol, ethanol, butanol, acetone, isopropyl alcohol, ethylene glycol, diethylene glycol, toluene, and/or N-methypyrrolidone.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymers is chosen from polyacetylene, polyaniline, polypyrrole, polythiophene, polyvinylpyrrolidone, and/or poly(3,4-ethylenedioxythiophene). Preferred Properties: The pH of the reactant solution after adding reducing agent (B) is 6-8.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The polycrystalline silicon obtained by zinc reduction method contains 80 wt.% or more polycrystalline silicon particles having particle size of 0.1-4 mm. The washing liquid is acid aqueous solution or water. The acid aqueous solution comprises 0.5-5 wt.% aqueous hydrochloric acid. Preferred Process: The washing-liquid nozzle can move within a washing tank. The ultrasonic cleaning process (1) comprises ultrasonic cleaning process (1A), ultrasonic cleaning process (1B), and an ultrasonic cleaning process (1C). The ultrasonic-cleaning process (1A) involves preparing the polycrystalline silicon obtained by the zinc reduction method and installing in washing basket (a) and applying ultrasonic wave to polycrystalline silicon, supplying water in the washing tank through a washing-liquid supply nozzle, and obtaining the cleaned polycrystalline silicon (a). The ultrasonic-cleaning process (1B) involves preparing the polycrystalline silicon obtained by the zinc reduction method and installing in washing basket (b) and applying ultrasonic wave to polycrystalline silicon, supplying water in the washing tank through a washing-liquid supply nozzle, and obtaining the cleaned polycrystalline silicon (b). The ultrasonic-cleaning process (1C) involves preparing the polycrystalline silicon obtained by the zinc reduction method and installing in washing basket (c) and applying ultrasonic wave to polycrystalline silicon, supplying water in the washing tank through a washing-liquid supply nozzle, and obtaining the cleaned polycrystalline silicon (c). The washing method further involves drying the polycrystalline silicon obtained from ultrasonic cleaning process.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The etching component has melting point of 250 degrees C or less, and is non-volatile. The solvent has vapor pressure of less than 1.34x 103 Pa at 25 degrees C. Preferred Composition: The etching component is chosen from triphenylcarbenium tetrafluoroborate, tropylium tetrafluoroborate, di-n-butylammonium tetrafluoroborate, tetrabutyl ammonium tetrafluoroborate, trimethyloxonium tetrafluoroborate, triethyloxonium tetrafluoroborate, 1-ethyl-2,3-dimethyl imidazolium tetrafluoroborate, 1-butyl-1-methylpyrrolidinium tetrafluoroborate, methyl trifluoro potassium borate, 4-iodophenyl trifluoro potassium borate, methyl(4-methyl-1-piperazinyl)trifluoro potassium borate, tricyclo pentyl phosphine tetrafluoroborate, boron trifluoride monoethylamine complex, pyridine-3-trifluoro potassium borate and nitronium tetrafluoroborate, preferably boron trifluoride monoethylamine complex. The liquid composition further contains compound (C1) which dissolves the etching component. The compound (C1) is non-volatile liquid at 250 degrees C. The content rate of etching component is 30-80 %mass of whole liquid composition.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thixotropic nature imparting agent is chosen from polysiloxane, polyacryl, polyamide polyvinyl alcohol, alkyl modification cellulose, peptide, polypeptide and its copolymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The process layer formed on the glass substrate has thickness of 1-200 nm. The glass substrate has thickness of 1.5 mm or more. The residual percentage of the compressive stress of the glass substrate is 60% or more. Preferred Composition: The content of the hydrogen fluoride gas in the process gas is 2-10 vol.%. The process gas further contains nitrogen gas and/or argon gas.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The largest cross-section height of the wavy curve on surface of resin layer is 0.3 mu m or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The active energy ray radical polymerizable compound is (meth)acrylate compound having 2-6 functional groups and/or (meth)acrylic-type polymer having free (meth)acrylol group. The electroconductive composition further comprises a photoinitiator. The component ( beta ) is chosen from aliphatic epoxy resin, aromatic epoxy resin and alicyclic epoxy resin. The cycloaliphatic epoxy resin is obtained by epoxidizing an alicyclic olefin, and epoxy resin and/or hydrogenated epoxy resin. The electroconductive composition further contains epoxy group reactivity crosslinking agent, neutralizing agent and cation polymerization catalyst. Preferred Process: The electroconductive film is obtained by coating electroconductive composition to a base material, and irradiating and hardening the active energy ray. The non-active energy beam radical polymerizable acrylic copolymer is obtained by reacting ( alpha ),( beta )unsaturated carbon acid, (meth)acrylic-acid alkylester and (meth)acrylic-acid hydroxy alkylester. Preferred Definitions:    Y'=methylene or carbonyl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Acrylate monomer is methyl methacrylate, ethyl methacrylate, and/or butyl methacrylate, initiator is diisopropyl peroxydicarbonate, dicyclohexyl peroxydicarbonate, tert.-butyl peroxybenzoate or tert.-butyl peroxide tert.-pentanoic acid ester, and emulsifying agent is sodium dodecyl sulfate or sodium hexadecyl sulfate. Preferred Conditions: Vinylidene chloride monomer access time is 1.5-3 hours, primary stirring speed is 80-120 rpm, and secondary stirring speed is 180-300 rpm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Weather barrier coating raw material contains 80-120 pts. wt. polyvinylidene chloride emulsifier, 5-20 pts. wt. hydrophilic modified polytetrafluoroethylene powder, 0.5-1.5 pts. wt. flatting agent, and 0.1-1 pt. wt. defoaming agent. Hydrophilic modified polytetrafluoroethylene powder is polytetrafluoroethylene powder which is acceptor, and alcohol acid ester is used by hydrolyzed graft monomer after radiation or UV irradiation grafting. Weather barrier coating raw material contains 0.2-2 pts. wt. antioxidant and 0.5-3 pts. wt. anti-hydrolysis agent. Weather barrier coating raw material contains 5-30 pts. wt. inorganic filler and 0.1-0.5 pt. wt. dispersant. Inorganic filler is titanium dioxide, carbon black powder, montmorillonite, or silicon dioxide, and dispersant is alkaline polyurethane copolymer solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The transition metal precursor is transition metal acetate precursor, transition metal nitrate precursors, transition metal sulfate precursor or metal chloride precursor. The transition metal is copper, cobalt, nickel, zinc, manganese, chromium, vanadium, iron and/or titanium. The mineralizing agent is sodium salt, potassium nitrate salt (both preferred) and/or calcium salt. The sodium salt is sodium acetate, sodium chloride or sodium sulfate. The potassium salt is potassium acetate or potassium nitrate. The porous silicon material has pore size of 10-100 microns. The silicon raw material and transition metal salt precursor are present in the mass ratio of 50:1-5:1, preferably 45:1-10:1. The transition metal salt precursor and the mineralizing agent are present in the ratio of 10:1-1:5, preferably 8:1-1:3. The silicon raw material has granular or crystalline form including amorphous, monocrystalline and/or polycrystalline. Preferred Method: The catalytic reaction is carried out at 100-500 degrees C, preferably 150-250 degrees C and pressure of greater than 0.1 MPa, preferably 0.1-2 MPa for more than 2 hours, preferably 36-120 hours. The method comprises washing the product using deionized water and then acid washing, alkali washing and drying.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic solvent is alcohol, aldehyde, lipid, benzene, acetaldehyde, formaldehyde, ethyl acetate, ethyl ester, toluene, xylene, formic acid and/or acetic acid, and comprises 70 wt.% of deionized water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of catalyst comprises introducing carbon material and active components into a mortar and then adding solvent, grinding to completely volatilized and vacuum drying at temperature of 600-1000 degrees C and temperature raising speed of 20 degrees C/min under the protection of inert gas for 2-4 hours. Preferred Components: The metal salt contains cobalt salt and transition metal salt according to the ratio of 1:1. The cobalt salt is cobalt sulfate, cobalt nitrate, cobalt chloride, cobalt acetate or ethyl acetate. The transition metal salt is ammonium vanadate, acid amide, sodium tungstate or ammonium ceric nitrate. The inert gas is argon gas or nitrogen. The carbon material is Vulcan XC-72(RTM: carbon black), BP2000 Carbon Black, carbon nanotubes, carbon nanoparticles and/or graphene. The solvent is water, methanol, ethanol or chloroform.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The gas is argon gas or nitrogen gas.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The high-boiling solvent in the method is dimethyl sulfoxide, dimethylformamide, dimethylacetamide, or N-methyl-2-pyrrolidone, the additive is glycerol carbonate, dimethyl carbonate, diethyl carbonate, aliphatic propylene carbonate, poly vinylpyrrolidinone, or lithium chloride.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The high molecular polymer is hydrochloric acid, tetrafluoroethylene polyvinylidene, polyvinylidene fluoride-hexafluoropropylene copolymer (PVDF-HFP), phthalazinone polyether ketone (PPEK), polysulfone (PSF) or poly (ether sulfone) (PES), and the negatively charged polymer is sulfonated polyether or sulfonated polysulfone of sulfonated polymer material.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The membranous polymers include polyurethane resin, polyester resin, acrylic resin, polyether based resin, cellulose based resin, polyvinylalcohol based resin, epoxy-based resin, polyvinyl pyrrolidone, polystyrene based resin, polyethylene glycol and penthaerithritol.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The tungsten precursor is silicotungstic acid. Non-aqueous solvent is absolute ethyl alcohol or ethylene glycol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: Flow volume of inert gas and 100% selenized hydrogen gas is controlled by mass-flow controller.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The particle size distribution of copper-gallium alloy powder is 20-210 mu m. The particle size distribution of copper powder is 10-210 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The etching component contains phosphoric acid, phosphate, or a compound that produces phosphoric acid by heating.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The liquid composition further comprises dispersing agent and surface treating agent.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The etching component is selected from trifluoromethanesulfonic acid, trifluoromethanesulfonic acid sodium, trifluoromethanesulfonic acid potassium, trifluoromethanesulfonic acid lithium, trifluoromethanesulfonic acid potassium, trifluoromethanesulfonic acid imidazolium, triflic-acid tetraethylammonium, trifluoromethanesulfonic acid copper, trifluoromethanesulfonic acid ethyl, trifluoromethanesulfonic acid methyl, trifluoromethanesulfonic acid pyridinium, trifluoromethanesulfonic acid magnesium, trifluoromethanesulfonic acid N-morpholinium, and 1-ethyl- 3-methylimidazolium trifluoromethane sulfonate. The substance that dissolves the etching component is boron compound selected from salt of Lewis acid comprising halogen coupled with boron, ionic liquid and non-volatile liquid. The boron compound is tetrafluoroboric acid triphenyl carbenium, a tetrafluoroboric acid tropylium, tetrafluoroboric acid di-n-butylammonium, tetrafluoroboric acid tetrabutyl ammonium, tetrafluoroboric acid trimethyl oxonium, a tetrafluoroboric acid triethyl oxonium, 1-ethyl- 2, 3- dimethyl imidazolium tetra fluoroborate, a 1-butyl- 1-methylpyrrolidinium tetrafluoroboric acid salt, methyl trifluoro potassium borate, 4-iodophenyl trifluoro potassium borate, methyl (4-methyl-1- piperazinyl) trifluoro potassium borate, tricycle-pentyl phosphine tetrafluoroboric acid, boron trifluoride monoethylamine complex, pyridine-3-trifluoro potassium borate and tetrafluoroboric acid nitronium, preferably boron trifluoride monoethylamine complex. Preferred Composition: The composition further comprises 30-80 mass% solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Particles: The microparticles are solid at 250 degrees C or less, and have particle diameter of 10 nm to 10 mu m. The etching component has melting point of 250 degrees C or less.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The etching component is chosen from tetrafluoroboric acid triphenyl carbenium, tetrafluoroboric acid tropylium, tetrafluoroboric acid di-n-butylammonium, tetrafluoroboric acid tetrabutyl ammonium, tetrafluoroboric acid trimethyl oxonium, tetrafluoroboric acid triethyl oxonium, 1-ethyl-2,3-dimethyl imidazolium tetra fluoroborate, 1-butyl-1-methylpyrrolidinium tetrafluoroboric acid salt, methyl trifluoro potassium borate, 4-iodophenyl trifluoro potassium borate, methyl (4-methyl-1- piperazinyl)trifluoro potassium borate, tricyclo pentyl phosphine tetrafluoroboric acid, boron trifluoride monoethylamine complex, pyridine-3-trifluoro potassium borate and tetrafluoroboric acid nitronium. The liquid composition further contains compound capable of dissolving etching component. The etching component is preferably boron trifluoride monoethylamine complex. The content of etching component is 30-80 %mass. The solvent has vapor pressure of less than 1.34x 103 Pa at 25 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The raw material powder is mixed powder containing titanium carbide powder and zinc oxide powder, or mixed powder containing gallium oxide powder, aluminum oxide powder, aluminum-carbide powder, titanium carbide powder and zinc oxide powder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compounds: The major active component of layer (203b) is silicon, tin, aluminum, lead and/or antimony. The theoretical specific capacity of the major active component of layer (203b) is greater than 500 mAh/g. The theoretical specific capacity of the major active component of layer (203a) is less than 400 mAh/g. Layer (203b) contains 20 g/m2 or less or 30 g/m2 or more of major active component. The major active component of layer (203b) is doped or undoped silicon. The major active component of layer (203a) is activated carbon chosen from graphite and graphene.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The binder of layer (203a) is an elastomeric polymer, preferably polyvinylidene fluoride. The binder of layer (203b) is a non-elastomeric polymer, preferably polyacrylic acid (salt).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The semiconductor polycrystalline or amorphous material is selected from the group consisting of cadmium telluride, antimony telluride, bismuth telluride, lead telluride, zinc telluride, cadmium zinc telluride, cadmium selenide, cadmium sulfide and selenium sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The vapor deposition film layer further contains tin oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic functional group of silane coupling agent has isocyanate group. The polyol is acrylic polyol comprising methacrylic acid or acrylic acid as a monomer. The polyol is preferably acrylic polyol having hydroxyl value of 130-200 mg potassium hydroxide/g, chosen from copolymerized hydroxyethyl methacrylate, methylmethacrylate and methacrylic acid. The silane coupling agent is 3-isocyanate propyl triethoxysilane or 3-isocyanate propyltrimethoxysilane. The isocyanate-type compound is nurate component of hexamethylene diisocyanate of formula: (O=C=N-(CH2)6-NCO)n, where n is 3-5. Preferred Property: The film thicknesses of primer layer is 30-200 nm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic soil improvement material comprises mixture (M1) and (M2), which are mixed in a predetermined ratio. The mixture (M1) contains barks of cedar and cypress with long aging time, and is fermented using low-oxygen for long time. The mixture (M2) contains barks of cedar and cypress with short aging time, and is fermented using low-oxygen for short time. The ratio of mixture of barks of cedar and cypress in soil is 30-70%. The organic soil improvement material has ratio of carbon to nitrogen of 70-90. The soil of site structure further contains 20-40% soil reforming materials. The both concrete foundation and site comprise organic soil improvement material. Preferred Property: The barks of cedar and cypress have different cut length, and are mixed at a constant rate. Preferred Process: The concrete foundation is constructed in a rectangular form above the surface mixed with organic soil improvement material and local soil.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The graphene nanosheet and organic micromolecule has mass ratio of 100:2-23. The organic micromolecule is 7-8 wt.% pyrylene or 3-4 wt.% aminopyrene-based ethylene glycol. Preferred Method: Vacuum drying is done at 60-80 degrees C for 12-24 hours.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The epoxy compound (A) is bisphenol-type glycidyl epoxy compound and/or alicyclic epoxy compound having 2 or more alicyclic epoxy structures.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The resin composition is hardened by light irradiation of accumulated light quantity of 50-3000 mJ/cm2. The transparent composite has total light transmittance of 80% or more. Preferred Component: The glass filler is glass cloth or nonwoven glass fabric.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The protective film further comprises at least one inorganic layer formed on the organic layer. The inorganic layer comprises silicon oxide, aluminum oxide, titanium oxide, indium oxide, tin oxide, indium tin oxide, tantalum oxide and/or zirconium oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic layer comprises 10- 70 wt.% (I) and 30-90 wt.% (II). The protective film has 95% weight loss when measured by thermo-gravimetric analysis at greater than or equal to 300 degrees C. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The metallic board is made of iron, sliver, gold, copper, chromium, tungsten, aluminum, molybdenum, zinc, nickel, platinum, palladium, cobalt, indium, magnesium, silicon, tantalum, titanium, tin, lead, vanadium, ruthenium, iridium, zirconium, rhodium, manganese, carbon steel and stainless steel.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of the zwitterionic polymer in the zwitterionic carbon nanotube is 5-50 wt.%. The zwitterionic polymer includes poly(vinyl imidazolium propylsulfonate), poly(vinyl butyl sulfonate) or poly(vinylbenzene sulfonate). Preferred Definitions:    R 1=H, methyl, ethyl, propyl, butyl, pentyl or benzyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The porous material is made of silicon oxide, titanium oxide, zirconium oxide, ferric oxide and aluminum oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The metal nano-particle precursor is a mixture of molybdenum acetylacetonate and palladium acetylacetonate. The reducing agent is polyvinylpyrrolidone. The solvent is 1,4-butanediol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method comprises performing centrifugation process at a rate of 500-300 revolutions per minute for 5-20 minutes to remove precipitate. The ultrasonic treatment is performed at a frequency of 40 KHz and a power of 150 W for 30-90 minutes. The vacuum freezing and drying steps are carried out a temperature of 4-60 degrees C for 12-24 hours. Preferred Components: The amount of graphite and sodium nitrate is 0.5-2 g. The amount of concentrated sulfuric acid is 23-92 ml. The amount of potassium permanganate is 3-12 g. The amount of hydrogen peroxide is 50-20 ml. A concentration of aqueous graphene oxide solution is 0.25-0.5 mg/ml. A mass ratio of silver nitrate and graphite is 0.4-10. A mass ratio of silver nitrate and the sodium citrate is 0.4-10. The amount of ammonia is 35 mass%. A mass ratio of hydrazine hydrate and graphene oxide is 1-1.5. The sodium citrate is used as protective agent, and the hydrazine hydrate is used as a reducing agent. The silver particle has a size of 5-60 nm. The graphene or silver nanocomposite material has a conductivity of 3.71-18.32 S/cm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The boron-containing compound is sodium boron oxide (Na2B407), boron trioxide, boric acid, and/or potassium boron oxide (K2B4O7). The molar ratio of boron in boron-containing compound, aluminium in aluminium-containing, calcium in calcium-containing compound and silicon in silicon-containing compound is 0.1-0.5:0.1-0.6:0.3-1:0.2-1.2. The aluminium-containing compound is alumina, aluminum hydroxide, pseudo-boehmite and/or aluminum sulfate.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Transparent resin layer is ionizing radiation-hardenable resin layer. Hard-coat layer is ionizing radiation-hardenable resin. Preferred Parameters: Refractive index of transparent resin layer is 1.3-1.45. Difference of refractive index of hardcoat layer with refractive index of transparent film base material of less than or equal to 0.05.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The process layer formed on the glass substrate has thickness of 1-200 nm. The glass substrate has thickness of 1.5 mm or more. The arithmetic mean of the permeability of the glass substrate having thickness of 400-1100 nm, is 92% or more. The residual stress of the surface of the chemically strengthened glass substrate is 650 Mpa or more. The compressive-stress layer has a depth of 35-37 mu m. Preferred Composition: The content of the hydrogen fluoride gas in the process gas is 2-10 vol.%. The process gas further contains nitrogen gas and/or argon gas. The unevenness formed in the surface of the glass substrate is 1-200 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compound: The chalcopyrite compound is of formula: XY'Z2, where X is silver or copper, Y' is gallium, indium or aluminum and Z is sulfur, selenium or tellurium. The gas containing sulfur is hydrogen sulfide gas.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The support is Inconel (RTM: austenite nickel-chromium-based superalloy) mesh. The monolith catalyst has metal catalytic layer laminated on a buffer layer. The metal catalytic layer contains zirconium oxide, cerium oxide, cupric oxide and/or nickel oxide.
TECHNOLOGY FOCUS - METALLURGY - The metal contacts comprise a layer of aluminum, a layer of titanium and a layer of gold.
TECHNOLOGY FOCUS - POLYMERS - The base material is selected from a group consisting of polyethylene terephthalate, polyethylene naphthalate, Polyamide, polyimide, polyphenylene sulfide, aramid, polyethylene, polypropylene, polystyrene, polylactic acid, PVC, polycarbonate, Acryl-type and methacrylic resin, alicyclic acrylic resin, Cycloolefin resin, triacetyl cellulose and polyvinyl acetate resin.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polyol (a) contains polyurethane polyol obtained by reacting polycarbonate polyol and polyisocyanate. The polycarbonate polyol contains polycarbonate diol having crystallinity at normal temperature. Preferred Properties: The number average molecular weight of polycarbonate diol and polyol component is 1000 or less and 2000-8000, respectively.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The naphtho bisbenzo furan compound (I) is of formula (II) or (III).R1,R3-R7,R9-R12=H or substituent;La-Ld=single bond, or divalent linking group (ii)-(xiii);Ra-Rd=optionally substituted 2C or more alkyl, oligoethyleneoxy group having two or more repeating ethyleneoxy units or oligosiloxane group having two or more silicon atoms, preferably 6-12C straight alkyl;andR1,R2,R4-R8,R10-R12=H or substituent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The coating solution and organic-semiconductor thin film further comprise a polymer binder. Preferred Process: The organic-semiconductor thin film is produced by solution coating method. Preferred Definitions:    at least one of R2,R3,R8,R9=substituent (i).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The bivalent transition metal is manganese, iron, cobalt, nickel and/or copper. The oxide is manganese tungstate, iron tungsten oxide, cobalt tungstate, nickel tungstate and/or copper tungstate. The low heat-expansion material is zirconium tungsten phosphate, lithium aluminum silicate, silicon dioxide and/or magnesium aluminum silicate, preferably zirconium tungsten phosphate. The content of zirconium tungsten phosphate in filler particles is 80-98 %mass. The low melting glass is oxide glass containing vanadium, tellurium, iron and phosphorus, or vanadium, silver and tellurium. The content filler particles with respect to 100 vol.% low-melting-glass are 10-100 vol.%. Preferred Process: During manufacture process, the baking process is performed by irradiation of laser of 400-1100 nm in kiln.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): The anthracene derivative is obtained by reacting anthracene-9-carboaldehyde and indole in presence of an acidic catalyst, or non-catalyst in an organic solvent. Preferred Component: Indole is of formula (II).Z=1-20C organic group, hydroxy or halo;andn=0-5. Preferred Definitions:    X and/or Y'=group of formula (i).    SPECIFIC COMPOUNDS - 2 Anthracene derivatives (I) i.e. 3,3'-(9-anthracenyl methylene)bisindole of formula (IA) and 3,3'- (9-anthracenyl methylene )bis( 5-bromoindole) are disclosed.    EXAMPLE - Bisindole anthracene indole (292.9 g), anthracene-9-carboaldehyde (103.1 g), and methanol (292.9 g) were added to 3 L reaction container with reflux pipe, dissolved at 40 degrees C, and 35% hydrochloric acid (29.3 g) was added and reacted at 40 degrees C for 24 hours to obtain anthracene-9-carboaldehyde. The resultant compound was dissolved in methyl isobutyl ketone (1077 g), and aqueous sodium hydroxide (19 g),neutralized, and methyl isobutyl ketone was distilled. Toluene (1422 g) was added to the resultant mixture, stirred at 10 degrees C, dried under reduced-pressure and 3,3'-(9-anthracenyl methylene)bisindole (IA) (140.4 g) in form of precipitated crystals were separated with the yield of 66.5%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The sulfide-and-selenide annealing is performing using sulfur source and selenium source. Preferred Composition: The tin salt is stannic chloride and/or stannous chloride. The sulfur source comprises elemental sulfur and hydrogen sulfide. The selenium source comprises selenium substance and hydrogen selenide. The inert gas is nitrogen and/or argon gas.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The copper salt is copper acetate and/or copper chloride. The zinc salt is zinc acetate and/or zinc chloride. The volume ratio of ethylene glycol and propylene glycol is 1:1.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The film is (BW12/N3C1(1 :1))n, (BW12/N3C1(1:2))n and (BW12/N3C1(2:1))n as multilayer inorganic/organic hybrid film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The usage amount of barium salt, gadolinium-doped ceria and nickel is 10-20 %mass, 10-20 %mass and 60-80 %mass, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The calcination temperature in the calcination step is 320-380 degrees C, preferably 320-380 degrees C. Preferred Components: The platinum solution contains bis(ethanolammonium)hexahydroxo platinate(IV). The specific surface area of the alumina layer is greater than 200 m2/g, and the proportion of pores with a pore diameter of 1-10 nm in the total pores possessed by the alumina layer is greater than 60%. The surface area of platinum per unit mass of platinum is greater than 140 m2/g. EXAMPLE - Anodic oxidation was performed to an aluminum plate in 0.1-0.3M oxalate solution under conditions of 40-60 degrees C and 30-50 V for 1-2 hours. Then, the plate was subjected to hot-water treatment by immersion in boiling pure water for 5-6 hours and finally calcined under conditions of 500 degrees C for 3 hours to obtain an alumina carrier. The alumina carrier was immersed in bis(ethanolammonium)hexahydroxo platinate(IV) aqueous solution for 10 seconds, and then dried under conditions of 120 degrees C for 1 minute. Then, the carrier was calcined under conditions of 270 degrees C for 20 minutes to obtain a dehydrogenation catalyst.
TECHNOLOGY FOCUS - METALLURGY - The powder comprises material selected from a group consisting of copper, indium and gallium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The microporous film has thickness of 3-100 mu m, piercing strength of 50-1000 g, air permeabilities of 10-1000 seconds/100cc, and porosity of 15-80%. The air permeability of the peeling film is 1500 seconds/100 cc or more. The piercing strength of the peeling film is 40g or more, preferably 200g or more. The average particle diameter of the inorganic filler is 0.1-8 mu m.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The peeling film contains resin component and an inorganic filler, in mass ratio of 100/5-100/150, and comprises polypropylene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The alkali metal sulfate is sodium sulfate, potassium sulfate or lithium sulfate. The alkali metal molybdate is potassium tetrachloroplatinate or sodium tetrachloroplatinate. The proton exchange membrane fuel cell is a direct methanol fuel cell. Preferred Method: Plating under 0 V is done for 10-20 seconds. Plating at - 0.75 V is done for 150-200 seconds.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Process: The molten metal silicon is provided to a crucible obtained using graphite is heated by induction heating (2) under nitrogen atmosphere, and coated using silicon nitride baked using electric furnace. The impurities are removed by carrying out coagulation purification process, and reducing content of iron in molten metal silicon. The molten metal silicon is heated using crucible obtained using mullite material. The heated molten metal silicon and molten metal silicon heated by induction heating are mixed, solidified (5) after coating highly purified alumina on casting mold inner surface, and separated. Preferred Composition: The mullite material comprises 94.04 wt.% aluminum trioxide, 0.03 wt.% silicon dioxide, 0.22 wt.% iron oxide, and 5.62 wt.% sodium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The gas further contains noble gas chosen from argon, xenon, krypton and neon, or hydrogen. The laminate is a gas barrier film.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Device: In reactor, the area S having a center is provided in the center portion of a base plate (5) inside the virtual concentric circle of S0/2, when entire area of the base plate of reactor is S0.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: During precipitation process, the reaction is carried out at 980-1150 degrees C, and the source gas is supplied at pressure of 1-2 MPa using compressor.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Component: The distillation apparatus (11, 12) has group of distillation column in which some of distillation column is connected in cascades. Preferred Process: The water generation process and electrolyzing process are carried out using hydrogen fuel battery.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The support base material is glass plate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The silicone oil has phenyl group. The content of phenyl group is 5-50 mol.%, preferably 5-30 mol.% with respect to content of organic groups bonded with silicon atom of silicone oil. The content of silicone oil is 6-20 parts mass with respect to 100 parts mass silicone resin. Preferred Properties: The viscosity of the silicone oil at 25 degrees C is 100-6000 cP. The thickness of the silicone resin layer is 2-100 mu m.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The glass substrate has arithmetic mean roughness after contacting with processing gas of 10 nm or more, and height roughness of 0.3 mu m or more.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Gas: The processing gas comprises hydrogen fluoride, trifluoro acetic acid, nitrogen and/or argon. The hydrogen fluoride has concentration of 0.1-10 vol.%.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Property: The glass substrate has plate thickness of 3 mm or less, and transmittance of 88% or more.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The process gas contains hydrogen fluoride having concentration of 0.1-10 vol.% and/or trifluoro acetic acid as raw material, and further contains nitrogen and/or argon.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The fluorine-based organic compound contains fluorine-type polymer and/or fluorine-containing silane coupling agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: A film-forming gas introduced during manufacture of gas barrier film contains an organosilicon compound and oxygen. Preferred Properties: The absolute value of the difference of minimum value and maximum value of the silicon atomic ratio in the silicon distribution curve is 5% or less. The absolute value of the difference of the distance between the local maximum which the carbon distribution curve adjoins is 200 nm or less. The carbon distribution curve has 3 or more extreme values. In oxygen-content cloth curve, the local maximum of oxygen-atom ratio nearest to the gas barrier layer surface of base material side is 1.05 times or more of the local maximum of oxygen-atom ratio nearest to the gas barrier layer surface on the opposite side to the base material side on both sides of the gas barrier layer.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The base layer containing carbon-containing polymer is provided between the base material and the gas barrier layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The radically polymerizable compound is of formula (I). The alicyclic epoxy compound is of formula (II) and (III).X=single bond or bivalent coupling group containing 1 or more atom;R1-R5=H, halo, monovalent organic group, monovalent oxygen atom-containing group, monovalent nitrogen atom-containing group, or monovalent sulfur atom-containing group;R6-R8=H, halo, or alkyl;or R1+R2+C,R2+R3+C,R3+R4+C and R4+R5+C=ring;R9-R11= H, halo, monovalent organic group, monovalent oxygen atom-containing group, monovalent nitrogen atom-containing group, or monovalent sulfur atom containing group;andR10+R11+C=ring.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: Alternatively, the curable resin composition comprises radically polymerizable compound, alicyclic epoxy compound, and a cation hardening agent. The curable resin composition further contains radically polymerization initiator.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Fused heteroaromatic compound of formula (A) is reacted with halogen-containing compound of formula: X1-A-X2, to obtain heteroaromatic derivative (I).X1,X2=halo;T=Sn(R51)(R52)(R53);andR51-R53=1-10C alkyl.Preferred Process: The fused heteroaromatic compound (A) is obtained by reacting heteroaromatic compound of formula (B) with organotin compound of formula: Sn(R51)(R52)(R53)(X3). The heteroaromatic compound (B) is obtained by reacting aromatic compound of formula (C) with hydride compound of formula: R1-H. The aromatic compound (C) is obtained by reacting organolithium compound with fused carbonyl compound of formula (G) which is obtained by reacting carbonyl compound of formula (F) with Gilman reagent (E) formed by reacting fused compound of formula (D) with organic lithium compound and copper halide.X3-X5=halo;Y'=NR61R62, SiR63R64R65, SR66 or OR67;andR61-R67=H, halo, 1-10C alkyl, 6-20C aryl, 3-20C heteroaryl, 5-7-membered heterocycloalkyl or 3-20C cycloalkyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The electroless metal plating layer contains copper, tin, silver, nickel, or their alloys. The conductive paste composite contains silver paste or copper paste. The seed metal layer of printed circuit board contains gold, silver, platinum, copper, nickel, iron, lead, cobalt, and/or alloy. Preferred Properties: The thickness of the electroless metal plating layer is 1-10 mu m. The particle size of the conductive paste composite is 10 nm to 10 mu m.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The substrate contains polybutylene-terephthalate, polyethylene terephthalate, polysulfone, polyether, polyether imide, polyethylene naphthalate, acrylic resin, vinyl acetate resin, butyl rubber resin, heat-resistant epoxy resin, glass, silicone, polyarylate, polyimide, and/or pearlescent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises a second pyrolysis. The heat treating step comprises pyrolysis. The conditions to enable insitu polymerization comprise the addition of an acid i.e. sulfuric acid. The heat treatment comprises a first pyrolysis conducted at a temperature of 750-900 degrees C. The sacrificial template coated with a reactive polymer containing dispersed electrocatalytic material precursors is ball milled to form a fine powder prior to pyrolysis. Preferred Components: The reactive polymer comprises melamine, carbaldehyde and/or carbamide. The reactive polymer precursor comprises melamine, formaldehyde, urea, imidazolidinyl urea, diazolidinyl urea and/or pyrrole-2-carboxaldehyde. The metal precursor is a precursor of iron, preferably iron nitrate. The unsupported catalytic material has a surface area of at least 300 m2 g-1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal comprises zinc. The content of graphene sheet is 0.01-5 wt.% with respect to total weight of graphene sheet and metal. The component or structure is metallic.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The composition further comprises polymer. The molar ratio of carbon to oxygen in graphene sheet is 25:1, or 75:1. The composition is in the form of coating. The coating comprises a binder comprising acrylic polymer, and aromatic solvent. The coating further comprises polymer.
TECHNOLOGY FOCUS - METALLURGY - The stressor layer is made of tensile strained nickel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The porous metal nanoparticles contain platinum, nickel, and titanium, iron, cobalt, nickel, copper, iridium, rhenium, aluminum, manganese, palladium, osmium, rhodium, vanadium and/or chromium, and have specific surface area of 5-100 m2/g (preferably, 41 m2/g or less) and diameter of 10-100 nm, preferably 12-15 nm. The porous metal nanoparticles are supported on carbon.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The reaction-enhancing material comprises ionic liquid. The ionic liquid is at least one of methyl-1,5,7-triazabicyclo(4.4.0)dec-5-ene-bis(perfluoroethylsulfonyl)imide or MBTB-bis(trifluoromethylsulfonyl)imide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The absorber layer is semiconductor comprising copper-indium- gallium-selenium composition of formula: CuInxGa(1-x)Se2, where x is 0-1. The buffer layer comprises n-type semiconductor material, preferably cadmium sulfide or zinc sulfide. The zinc-containing salt is chosen from zinc nitrate, zinc acetate, zinc chloride and/or zinc sulfate, or their hydrates, preferably zinc nitrate or zinc acetate. The alkaline chemical in solution is chosen from ammonia, amine and amide, preferably hexamethylenetetramine. Preferred Property: The intrinsic zinc oxide layer has thickness of less than 140 nm, preferably 5-90 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The primary semiconductor material is silicon. The secondary semiconductor material is germanium. The each of primary compositionally-graded alloy is amorphous. The each of intrinsic semiconductor material layer and secondary compositionally-graded alloy are polycrystalline or amorphous, respectively. The atomic concentration of secondary semiconductor material is 100% at a primary interface between primary intrinsic compositionally-graded semiconductor layer and intrinsic semiconductor layer. The atomic concentration of secondary semiconductor material is 100% at secondary interface between secondary intrinsic compositionally-graded semiconductor layer and intrinsic semiconductor layer. The atomic concentration of secondary semiconductor material is 0% at a primary end surface of primary intrinsic compositionally-graded semiconductor layer. The atomic concentration of secondary semiconductor material is 0% at secondary end surface of secondary intrinsic compositionally-graded semiconductor layer. The photovoltaic device further comprises p-doped primary semiconductor material layer (30) containing a p-doped primary semiconductor material and located on primary end surface, and an n-doped primary semiconductor material layer (50) consisting of n-doped primary semiconductor material and located on primary end surface. The photovoltaic device further comprises a transparent conductive material layer electrically connected to primary intrinsic compositionally-graded semiconductor layer and one or more back reflector layer electrically connected to secondary intrinsic compositionally-graded semiconductor layer. Preferred Properties: The thickness of primary intrinsic compositionally-graded semiconductor layer, intrinsic semiconductor material layer and secondary intrinsic compositionally-graded semiconductor layer is 10-200 nm, 10-400 nm and 10-200 nm, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The molar ratio of potassium and sodium is preferably 0.6-2. The insulating support substrate further consists of electrodes (3, 7). The alkali-metal supply layer consists of transparent conductive layer (6). The crystal grain diameter of a photoelectric conversion layer (4) of copper-indium-gallium-selenide-type solar cell is 0.032exp(0.0065T).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The silane-type compound is coated on surface of overhead power line (10) comprising multiple wire.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of ammonium nitrate aqueous solution is 0.1-2 mol/L. The indium-hydroxide powder is pillar-shaped. Preferred Process: The electrolysis reaction is carried out at the liquid temperature of 20-60 degrees C under current density of 3-20 A/dm2. The pH of the reaction mixture during electrolysis process is 2.5-5. The slurry containing indium-hydroxide powder and having pH of 5-9, is subjected to solid-and-liquid separation process by cross flow filtration, during manufacture of indium-hydroxide powder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step (d): is carried out at 400-600 degrees C; and includes a selenization process (40) followed by a sulfurization process, and produces the absorber layer being a chalcopyrite crystalline layer, where the selenization process uses hydrogen selenide gas as a selenium source, incorporates selenium into the absorber layer, and causes the absorber layer to be a chalcopyrite crystalline material. The step (c) further includes sputtering copper-gallium material from a copper-gallium target onto the solar cell substrate over the back contact layer, prior to the sputtering material of the indium-aluminum target. The sputtering materials of the indium-aluminum target produces an indium-aluminum film having a thickness of 100 nm on the back contact layer. The method further comprises forming a buffer layer between the back contact layer and the metallic precursor layers, and forming a window layer over the absorber layer. Preferred Components: The indium-aluminum target comprises 0.05-30 atomic%, preferably 1 atomic% of aluminum. The absorber layer comprises a copper-indium-gallium-aluminum-selenium absorber layer having a thickness of 2-3 mu m. The back contact layer comprises molybdenum. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The A-B-A-type(s) of styrene-based triblock material is chosen from styrene-ethylenebutylene-styrene copolymer, styrene-ethylene-propylene styrene copolymer, styrene-ethyleneethylene-propylene styrene copolymer and styrene-isobutylene-styrene copolymer. The tackifying resin is hydride of 5C-type petroleum resin, hydride of 9C-type petroleum resin, and/or hydride of petroleum resin obtained by copolymerizing 5C-type petroleum resin and 9C-type petroleum resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Centrifugation and filtration process are further carried out during formation of graphene oxide. The acid is further recovered from the recycled reaction product. The graphite is oxidized using microwave which is applied in mixed solution containing acid solution and graphite. Preferred Composition: An oxidizing agent is used during formation of graphene oxide. The oxidizing agent is chosen from permanganate, ferrate, osmate, ruthenate, chlorate, chlorite, nitrate, osmium tetroxide, ruthenium tetroxide, lead dioxide, hexavalent chromium ion, hydrogen peroxide, silver oxide and ozone. The primary reaction product and the recycled reaction product have structure of 1-10 layers formed using hybridized carbon sheet. The acid is chosen from sulfuric acid, phosphoric acid, sodium nitrate, potassium persulfate, phosphorus pentoxide, chlorosulfonic acid, fluorosulfonic acid, oleum and acetic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The plating liquid further contains phosphorus. The oxidizing agent is peroxide, high oxidation compound and/or ozone. The plating liquid further contains 0.01-10 pts. wt. boron with respect to 100 pts. wt. plating liquid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Conditions: The silica and alkali metal at 650-900 degrees C more than melting point of alkali metal. The silicon and alkali metal are separated by heating the mixture of alkali-metal silicide and alkali-metal silicate is heated, melting in liquid alkali metal, cooling, crystallizing alkali-metal silicide, classifying crystallized alkali-metal silicide, heating, evaporating alkali metal, and crystallizing silicon at 700-900 degrees C. The alkali-metal silicide is crystallized at temperature more than melting point of alkali-metal silicide. Preferred Composition: The alkali metal is metallic sodium (1). The content of metallic sodium is 5 mol or more, preferably 2-8 mol with respect to 3 mol of silica.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The late-transition-metal core comprises Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag and/or Au (preferably not greater than 50 wt.% Pd or Pt). The transition metal core have diameter of 1-10 nm. The shell comprises CeO2, HfO2, TiO2, ZnO and/or ZrO2 (preferably CeO2). The Pt(II) salt comprises potassium tetrachloroplatinate(II). The (6-18C)-alkylamine comprises dodecylamine. The lithium alkylborohydride comprises lithium triethylborohydride. The metal alkoxide comprises zirconium(IV) tetrakis(butoxide) or a titanium(IV) butoxide, and the linking compound comprises 11-mercaptoundecanoic acid. The organosilane comprises triethoxy(octyl)silane. Preferred Method: The method (m1) further involves hydrolyzing the metal alkoxide superposed on Pt metal nanoparticle core, optionally in the presence of (6-18C)-alkylcarboxylic acid, to form Pt metal core encapsulated by metal alkoxide shell; and calcining the Pt metal core encapsulated by metal oxide shell to form Pt metal core encapsulated by metal oxide shell. The relative amounts of Pt metal nanoparticle coated with linking compound and metal alkoxide are effective to form Pt metal nanoparticle encapsulated by a metal oxide shell comprising 10 wt.% Pt and 90 wt.% metal oxide. The method (m2) further involves calcining the structure comprising core-shell nanoparticles displayed on a siloxane intermediate layer to form core-shell nanoparticles comprising late-transition-metal core encapsulated by metal oxide shell displayed on a silica layer that is attached to a metal oxide support.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The thermoplastic elastomer (B) having functional group is olefin-type thermoplastic elastomer which is modified by dicarboxylic acid and/or its derivatives. Preferred Properties: When the thermoplastic elastomer (B) is dispersed in the film, the average short axis of the domain of thermoplastic elastomer (B) is 0.01-1 mu m, and the average domain space of the thermoplastic elastomer (B) in the cross-section of the longitudinal direction of a film is 0.1-1.5 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The chalcogenide and semiconductor of rectifying region are formed of combination of zinc, tellurium, selenium, sulfur, cadmium, oxide, and magnesium. The semiconductor of semiconductor region is selected from the group containing zinc arsenide, zinc phosphide, zinc antimonide, cadmium phosphide, cadmium arsenide and cadmium antimonide.    TECHNOLOGY FOCUS - METALLURGY - The semiconductor region is formed of pnictide alloy, and the rectifying region is formed of magnesium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hydroxy alkyl-containing compound is chosen from hydroxy decanoic acid, hydroxy dodecanoic acid, hydroxy tetradecanoic acid and hydroxyhexadecanoic acid. The solvent is propylene glycol methyl-n-propyl ether, propylene glycol methyl-n-butyl ether, dipropylene glycol dimethyl ether, dipropylene glycol methyl-n-propyl ether, dipropylene glycol methyl-n-butyl ether, 3-methoxy butyl acetate, dipropylene glycol methyl ether acetate, propylene glycol monomethyl ether acetate, cyclohexanol acetate, lactic acid ethyl acetate, propylene glycol diacetate, 1,4-butanediol diacetate, propylene glycol monomethyl ether, 3-methoxy butanol and 1,2,5,6-tetrahydro benzyl alcohol. The content of the hydroxy alkyl-containing compound is 0.1-50 wt.% with respect to the whole solvent composition. The paste composition further contains electroconductive metal material, semiconductor material, magnetic material, dielectric material, or insulating material. Preferred Properties: The solubility parameter of the solvent is 7.8-11.8.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The paste composition comprises 10 wt.% or less binder resin. Preferred Definitions:    R1=8-14C monohydroxy alkyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The photoelectric converting layer contains p-type compound semiconductor of chalcopyrite-type structure containing group XI element including copper, or copper and silver, group XIII element chosen from boron, aluminum, gallium and indium, and group XVI element chosen from sulfur, selenium and tellurium, or p-type compound semiconductor of stannite-type structure or kesterite-type structure containing group XI element including copper, or copper and silver, and group XVI element chosen from sulfur, selenium and tellurium. The surface roughness of primary transparent conductive film is 0.1-0.4 mu m or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Compound (I) is represented by formula (II). Active layer is p layer or i layer.R1-R12=H, halo, optionally substituted 1-20C alkyl, optionally substituted 1-20C alkylamino, optionally substituted 6-30C aryl, or optionally substituted 2-30C alkenyl, provided that substituent is selected from optionally substituted 6-30C arylamino and optionally substituted 5-40C heteroaryl, and when group which adjoins greater than or equal to 1 of R1-R12 is substituent, greater than or equal to 1 of R1-R12 may combine with one other and may form ring. Preferred Definitions:    M=B, Si, Al, Mg, Fe, Cu, or Zn;    R1, R2=substituted Ph, except when R1 and R12 and/or R2 and R3 form a ring; and    R6, R9=substituted group.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method comprises purging the reactor with hydrogen and an inert gas to flush the reactor with gaseous reaction products and unreacted residues of the silicon-containing component, after or before the step of introducing silicon or silicon-containing compounds acting gas. The polycrystalline silicon rods are heated by direct passage of current at a temperature of 500-1000 degrees C during the introduction of the silicon or silicon-containing compounds acting gas. Preferred Components: The silicon or silicon-containing compounds acting gas includes hydrogen chloride. The temperature of the polycrystalline silicon rods is 500-1000 degrees C or 1100-1400 degrees C. A mixture of hydrogen chloride and hydrogen and a mixture of chlorosilanes and hydrogen are introduced as silicon or silicon-containing compounds acting gas. A mixture of hydrogen and trichlorosilane or a mixture of hydrogen and trichlorosilane and dichlorosilane is introduced. The amount of hydrogen is 90-99 mole%. The amount of trichlorosilane is 1-10 mole%. The amount of dichlorosilane is 0-2 mole%. A partial flow of chlorosilane 0.005-0.2 kMol/h per 1 m2.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Amount of absolute ethyl alcohol used is capable of dissolving imidazole and sodium ethoxide, and amount of absolute methanol used is capable of dissolving gamma -chloropropyl triethyoxysilane and imidazole.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): The preparation of (I) comprises functionalizing naphthalene or naphthalene derivatives at 1,5-positions, then coupling with aromatic group to obtain phenolic hydroxy groups containing 1,5-diaryl naphthalene compound, and performing ring closure reaction subsequently to obtain (I). Preferred Method: The method comprises: either brominating the naphthalene to obtain 1,5-dibromonaphthalene, then coupling obtained compound with 2,2'-(naphthalene-1,5-diyl)diphenol or 2,2'-(naphthalene-1,5-diyl)dithiophen-3-ol respectively, and ring closing to obtain 7,14-dioxa-dibenzo(b,def)chrysene or 7,17-dioxa-3,13-dithiahexacyclo(9.9.2.02,6.08,21.012,16.018,22)docosa-1(21),2(6),4,8,10,12(16),14,18(22),19-nonaene; or brominating the naphthalene to obtain 1,5-dibromonaphthalene, then reacting obtained compound with 4,4,5,5-tetramethyl-1,3,2-dioxaborolane to obtain 1,5-bis(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)naphthalene, then coupling obtained compound with 2,2'-(naphthalene-1,5-diyl)diphenol or 2,2'-(naphthalene-1,5-diyl)dithiophen-3-ol respectively and ring closing to obtain 7,14-dioxa-dibenzo(b,def)chrysene or 7,17-dioxa-3,13-dithiahexacyclo(9.9.2.02,6.08,21.012,16.018,22)docosa-1(21),2(6),4,8,10,12(16),14,18(22),19-nonaene. Preferred Components: The coupling reaction comprises Suzuki coupling, Stille coupling, Negishi coupling, Hiyama coupling or C-H activation coupling reaction. Preferred Definitions:    rings Ar1, Ar2 = phenyl-1,2-diyl, naphthalen-2,3-diyl, biphenyl-3,4-diyl, naphthalen-1,2-diyl, anthracen-2,3-diyl, (9H-carbazolyl)-benzene-3,4-diyl, (diphenylamino)-benzene-3,4-diyl, thiphen-2,3-diyl, bithiophen-2,3-diyl, benzothiophen-2,3-diyl, thieno(3,2-b)thiophen-2,3-diyl, quinolin-3,4-diyl or quinolin-5,6-diyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal acetate is cobalt acetate, copper acetate, ferrous acetate, zinc acetate or manganese acetate.
TECHNOLOGY FOCUS - BIOTECHNOLOGY - Preferred Strain: The T.osonensis strain P2-A-1 can grow under anaerobic and aerobic conditions. The T.osonensis strain P2-A-1 is cultured using culture medium at 22 degrees C for 48 hours on a tryptone soy broth plate, to form a circular, easy picking, non-transparent, regular white bacterial colony with diameter of 2-4 mm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The T.osonensis strain P2-A-1 can use catalase, glucose, lactose, maltose, sodium propionate, sodium acetate, sodium lactate, sodium succinate, ethanol, glycerin, fumarate and pyruvate, preferably glucose and sodium acetate as a substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Precursor layer of material is copper-indium-gallium or copper-indium, and selenide reaction gas is hydrogen selenide or hydrogen selenide and hydrogen sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: Hydrophilic nano calcium carbonate has diameter of 15-40 nm. Preferred Component: The imidazole derivative is alkylated imidazole component or carboxylated imidazole component.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metallic-element component contains 0.05-15 atomic% sodium, remainder of copper and unavoidable impurity. The sodium compound is sodium fluoride, sodium sulfide and selenization sodium. Preferred Property: The average particle diameter of sodium compound is 10 mu m or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The nickel plating bath at step (b) bases on a mixed aqueous solution of nickel chloride and boric acid, and is placed at room temperature while stirring. The scheduled time for nickel deposition is 1-2 minutes. Preferred Components: The silicon substrate is of p-type silicon wafer and negative type/positive type silicon solar cell material. The light source is a lamp or sunlight. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: In the semiconductor material, a composition of copper in the first layer as given by copper/(indium+gallium) or copper/(indium+gallium+aluminum) is 0.7-0.95, a composition of gallium in the first layer as given by gallium/(gallium+indium) is 0.1-0.4, a composition of gallium in the first layer gallium/(indium+gallium+aluminum) is 0-0.4, a composition of gallium in the first layer as given by aluminum/(indium+gallium+aluminum) is 0.1-0.4, and a composition of X1a in the first layer is 0-2 atomic%. The first layer is formed by one of batch or in-line (co)evaporation, batch or in-line physical vapor deposition (sputtering), atomic layer deposition, chemical vapor deposition, plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, atmospheric pressure chemical vapor deposition, ultra-fast atmospheric atomic layer deposition, plating, printing or spraying of inks, screen printing, inkjet printing, slot die coating, gravure printing, or wet chemical deposition. The semiconductor material has a band-gap, where the band-gap of the semiconductor material is double graded. The composition of aluminum in the first layer as given by aluminum/(indium+gallium+aluminum) is higher at a back surface of the first layer than at a front surface of the first layer. The thickness of the first layer is 200-1000 nm. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The cobalt-based alloy further contains 8-24 wt.% nickel, and 0.01-0.15 wt.% lanthanum and/or 0.01-0.15 wt.% cerium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The imprint material contains solvent as component (D) and surfactant as component (E). The component (A) has polymeric group chosen from acryloyloxy group, methacryloyl group, vinyl group and allyl group. Preferred Process: Film is obtained by coating imprint material on film, adhering the coating film on the surface having corrugated shape of mold, photocuring the coating film, and testing and measuring release force by peeling the cured film from the surface at 90 degrees after shaping and molding the corrugated surface, and has the value which converted the load when the cured film is peeled from surface which has corrugated shape of mold per 1 cm of lateral width of 0-0.5 g/cm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The composite encapsulating material further comprises a glass additive and bismuth yttrium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The polyester film contains titanium compound.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The amount of compound (A) contained in the polyester film is 10-1000 ppm with respect to the mass of the polyester film. The unsaturated carboxylic ester is methyl ester, ethyl ester, or butyl ester of unsaturated carboxylic acid. The basic compound is ammonia or organic amine compound. The amount of basic compound is 0.5-3 mole equivalents with respect to number of moles of the carboxyl groups in the acid-modified polyolefin resin.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The manufacture of laminated film further involves performing drying process by heating the resin mixture at 100-200 degrees C. Preferred Composition: The acid-modified polyolefin resin contains 0.1-10 %mass unsaturated carboxylic acid or its anhydride, or 0.1-25 %mass unsaturated carboxylic ester. The unsaturated carboxylic acid or its anhydride is acrylic acid, methacrylic acid, or its anhydride. The acid-modified polyolefin resin is a terpolymer of ethylene-unsaturated carboxylate-ester-unsaturated carboxylic acid or its anhydride, preferably terpolymer of ethylene-acryl acid ester-acrylic acid or its anhydride, or ethylene-methacrylate-acrylic acid or its anhydride. The resin mixture is a mixture of film for regeneration, and polyester resin. The amount of film for regeneration contained in the resin mixture is 20-80 %mass with respect to the polyester resin. Preferred Properties: The film layer has thickness of 0.01-1 mu m. The melt flow rate of 2160 g acid-modified polyolefin resin at 190 degrees C for 0 minute is 0.01-500 g/L.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Property: The cover glass has thickness of 0.3-4 mm.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of internal sodium is preferably 0.01-15 %mass in conversion of sodium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The materials that form the mask pattern are selected from the group that consists of an anatase type titanium dioxide, zinc oxide, silicon nitride and alumina. The filler layers are type of compounds selected from the group that consists of alumina, silicon dioxide and magnesium fluoride.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The microwave source of the microwave applicator is a semiconductor microwave source. Preferred Property: The absorption tube has microwave energy absorption efficiency of 80% or more with respect to water.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The organometallic complex is obtained using iridium, and has purity of 98% or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Processes: Synthesis of methane, methanol, ethanol, dimethyl ether, ethylene, and other organic products which involves using combination of CO2 with water or methanol under strong alkali condition. Synthesis reaction equation of formulae (A) and (B) of ethanol and methanol products is performed by using combination of CO2 or CO with water or methanol under strong alkali condition. Ethylene and paraformaldehyde are synthesized by using combination of CO2 or CO with water or methanol in which CO2 or CO and methane gas are injected into strong alkaline conditions.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is 2,2,4-trimethyl pentane, n-heptane, or cyclohexane. The amine compound is chosen from N,N-diethylethanolamine, triethylamine, N,N',N'-tetramethyl-1,3-diaminopropane, and N,N',N'-tetramethyl-1,6-diamino hexane. Preferred Condition: The drying process is carried out at 60-120 degrees C.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The base material is polycarbonate having anisotropy, copolymerizable polycarbonate film having anisotropy, cycloolefin resin, or copolymerizable cycloolefin resin film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The transition metal chalcogenide compound comprises molybdenum disulfide, tungsten(IV) sulfide, titanium disulfide, zirconium disulfide, hafnium disulfide, vanadium disulfide, niobium disulfide, tantalum sulfide, chromium disulfide, diselenoxomolybdenum, tungsten selenide, titanium selenide, zirconium selenide, hafnium selenide , vanadium selenide, diselenoxoniobium, tantalum selenide, molybdenum ditelluride, tungsten telluride, titanium telluride, zirconium telluride, hafnium telluride, ditelluroxovanadium, ditelluroxoniobium, tantalum telluride. The reducing agent is sodium borohydride, sodium citrate, and ascorbic acid. The metal salt is chloride, bromide, fluoride, nitrate, sulfate, phosphate, carbonate, acetate, iodate, chlorate, or bromate of gold, silver, palladium, platinum, copper, ruthenium, rhodium, iridium, rhenium, or osmium.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The stabilizer is sodium dodecyl sulfate (SDS), polyvinylpyrrolidone (PVP), Tween 80 (RTM: polyoxyethylene (20) sorbitan monooleate), carboxymethyl fiber sodium (CMC), polylysine, bovine serum albumin, polyacrylic acid, or polymethacrylic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The micro-nano conductive powder is molybdenum, silver (Ag), copper (Cu), nickel, magnesium, a, manganese, cobalt, zinc, iron, titanium, tungsten, tin, carbon, carbon nano tube, or graphite alkene.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent is at least one of water, resin group hydrocarbon, alcohol, ketone, aromatic hydrocarbon, ester, alcohol ether, animal and vegetable oil, and mineral oil.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The resin is an epoxy resin, a phenol resin, polyesterification resin, silicone resin, organic silicon resin, acrylic resin, melamine resin, polyurethane resin, rubber modified resin. The auxiliary agent is at least one of dispersant, coupling agent, defoaming agent, thickening agent, plasticizer, wetting agent, flatting agent, thixotropic agent, film-forming auxiliary agent, inhibitor, cross-linking agent, coloring agent, stabilizing agent, lubricant, bactericide, ultraviolet ray absorbent, and antioxidant.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition comprises 0.01-12 wt.% of acrylic copolymer, 00.5-30 wt.% of an amine-based compound, 0.1-15 wt.% of inorganic base, organic base or its mixture and remaining amount of water. The weight-average molecular weight of the acrylic copolymer is 1000-100000. Preferred Components: The inorganic base includes potassium hydroxide, sodium hydroxide, sodium silicate, potassium phosphate, sodium phosphate, potassium pyrophosphate, sodium pyrophosphate and ammonium sulfate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The amine-based compound includes methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, propylamine, dipropylamine, tripropylamine, butyl amine, dibutylamine, tributylamine, ethylenediamine, diethylenetriamine, triethylenetetraamine, diethylhydroxylamine, methylethanolamine, methyldiethanolamine, diethylethanolamine, cyclohexylamine, ammonium carbonate, ethanolamine, diethanolamine and triethanolamine. The organic base includes potassium carbonate, sodium carbonate, ethylenediaminetetraacetic acid disodium salt, glutamic acid sodium salt, diacetic acid sodium salt, diethylenediamine pentacetic acid sodium salt, diethylenediamine pentacetic acid potassium salt, hydroxyethyl ethylenediamine triacetic acid sodium salt, nitrilotriacetic acid sodium salt, ethanol diglycinic acid sosium salt, gluconic acid sodium salt and tetramethylammonium hydroxide. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of catalyst comprises impregnating mesoporous carbon structure into carbon-containing precursor and carbon source, and drying the impregnated mixture and then crystallizing, placing into a mesoporous silica mold, and removing by etching. Preferred Method: The carbon-containing precursor is prepared by carrying out condensation polymerization of a polymer precursor and mesophase pitch-based carbon precursor with an initiator, and carbonizing the reaction by graphitic carbon. The carbonizing step is carried out in an inert gas atmosphere and thermal decomposition at temperature of 500-2500 degrees C. Preferred Components: The mesoporous carbon structure is cylindrical carbon structure with length of 15 nm to 2.3 mu m and radius of 20 nm to 2.3 mu m. The catalyst has Brunauer-Emmett-Teller surface area of 600-2500 m2/g and a pore volume of 0.8-3 cm3/g. The phosphorus atom is present in an amount of 0.2-20 wt.%. The mesoporous silica mold comprises mesoporous silica containing mold tube with a length of 25 nm to 2.5 mu m and a radius of 20 nm to 2.5 mu m. The carbon-containing precursor is phenol, phenol-formaldehyde, furfuryl alcohol, resorcinol-formaldehyde, aldehyde, sucrose, glucose, xylose, divinylbenzene, acrylonitrile, PVC, vinyl acetate, styrene, methacrylate, methyl methacrylate, ethylene glycol dimethacrylate, urea, melamine or methylene compound of formula (CH2=CRR1). The carbon source is triphenylphosphine, 1,3-bis (diphenylphosphino) propane, or tris(4-methoxyphenyl)phosphine.R, R1 = alkyl or aryl. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: The active auxiliary agent is a mixture of ruthenium dioxide, ruthenium dioxide and iridium oxide, ruthenium dioxide in a weight ratio of 100:0-10:90. Preferred Components: The molybdenum-based agent is made up of pure molybdenum, molybdenum and nickel alloy or alloys of chromium, cobalt and iron, platinum alloys, platinum and nickel alloy, platinum and chromium alloy, platinum and cobalt alloy or platinum and iron alloy. Aqueous solution of active-component precursor comprises aqueous solution of platinum trioxide, chloroplatinic acid, platinum nitrate, platinum chlorate, iron nitrate, iron chlorate and chromium, nickel and cobalt alloy.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Carbon based agent is selected from carbon black, acetylene black (50-800m2 per g), carbon nanotube, carbon nanofiber or graphene. Preferred Process: Pre-treated carrier is prepared by reacting carrier with 2 molar of hydrochloric acid at 120 degrees C for 5-10 hours under reflux conditions to obtain a crude product, which is again refluxed with 5 molar of nitric acid at 120 degrees C for 5-10 hours under reflux conditions to obtain a product. The obtained product is purified to remove impurities to obtain a purified product having a larger surface area.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Ball milling is performed by ball milling at 20-50 rpm rotating speed for 10-30 minutes and ball milling for 2nd time at 200-400 rpm for 50-150 minutes. Silver nitrate solution and reducing agent solution slurry is preheated and heat-preserved at 20-50 degrees C before ball milling. Silver ball powder is washed using ethanol or acetone.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Dispersing agent is polyethylene glycol, polyvinylpyrrolidone, oleic acid, or citric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The nitrogen has a flow rate of 0.01-0.13 l/minute.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The roughened metal layer is made of indium tin oxide, p-type semiconductor layer is made of gallium, indium-gallium-selenium, copper-indium-sulphur, copper indium selenide. N type semiconductor layer is made of cadmium sulphide (CdS), cadmium selenide, zinc sulphide or indium sulfide. The transparent conductive layer is indium tin oxide, indium zinc oxide, aluminum zinc oxide, gallium zinc oxide, aluminum gallium zinc oxide, cadmium tin oxide, zinc oxide or zirconium dioxide.    TECHNOLOGY FOCUS - METALLURGY - The transition metal layer is made of metal aluminum, and roughened metal layer is made of metal, metal nickel, metal titanium, or any metal compound. Second transition metal layer is made of metal aluminum or metal key.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Compound (I) is prepared by placing thiadiazole in solvent, dropping bromine in chloroform solution, heating to 60-70 degrees C, refluxing for 10-15 hours, cooling to room temperature, and separating and purifying reaction solution to obtain product (A); under the protection of nitrogen, taking product (A) in tetra(triphenyl phosphine) palladium, heating to 155-165 degrees C, refluxing for 40-60 hours, cooling to room temperature, and separating and purifying to obtain product (B); and at room temperature, taking product (B) in tetrahydrofuran solution, adding bromide reagent, stirring for 10-15 hours, and separating and purifying to obtain compound (I).
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Method: Step (1) is performed based on water-soluble protein/ferric nitrate mass ratio of (5:1)-(10:1) and absolute ethyl alcohol/ultrapure water volume ratio of (1:1)-(3:1). Step (2) is performed based on XC-72 carbon powder/water-soluble protein mass ratio of (1:1)-(1:5).    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The carbon powder used in step (2) is preferably XC-72 carbon powder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The growth solution comprises 0.10-0.25 mol/L potassium hydroxide, zinc nitrate, and zinc hydroxide, and has pH value of 10-12.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The polishing solution comprises nitric acid and hydrofluoric acid.
TECHNOLOGY FOCUS - METALLURGY - The protective layer is made of silver, gold, lead, zinc, magnesium or tin material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: Deposition diffusion comprises flowing phosphoryl chloride and oxygen with volume ratio of 6:1-10:1 at 1000-2000 cm3/minute, flowing phosphoryl chloride and oxygen at 800-1500 cm3/minute with volume ratio of 4:1-6:1, and flowing phosphoryl chloride and oxygen at 1000-2000 standard cm3/minute with volume ratio of 2:1-4:1. Reaction is done at 840-870 degrees C for 3-15 minutes.
TECHNOLOGY FOCUS - METALLURGY - Preferred Method: Volume ratio of formaldehyde and hydrogen molybdenum bronze solution is 40-60 mL:1 g. Preferred Components: Glass sheet size is 3x 3 cm. ITO conductive film size is 1x 2 cm and resistance is 20 Omega /cm2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of nitric acid solution is 5 mol/l. The mass ratio of corn and ferric chloride is 10:1-1:1. Preferred Process: The drying is performed at 50-100 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: Nano calcium carbonate has diameter of 15-40 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The carbon source is monosaccharide or polysaccharide. The benzotriazole derivative is alkylated benzotriazole derivative or hydroxymethylated benzotriazole derivative.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The co-spinning-co-sintering improved phase inversion method is carried out by connecting anode functional layer and dense electrolyte layer of ceramic material with polymeric adhesive, adding organic solvent, vacuum degassing, spinning through tetracyclic hole spinneret mold, curing, sintering, and air-drying to obtain three-layer composite ceramic microtubes. Preferred Components: The ceramic material is metal oxide ceramic material; or combination of metal oxide and electrolyte at mass ratio of 9:1-8:2. The metal oxide is nickel oxide, cobalt oxide, iron oxide, or copper oxide. The electrolyte is yttria-stabilized zirconia, scandia-stabilized zirconia, gadolinium-doped ceria, samaria-doped ceria, or lanthanum strontium gallium magnesium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic solvent is N-methyl pyrrolidone.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The polymeric adhesive is polysulfone, polyether sulfone, or polyimide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of nitric acid is 2 mol/L. The concentration of iron(III) chloride and ethanol is 0.5-3 mol/L. The volume ratio iron(III) chloride and ethanol is 1:5-1:100 g/mL.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The substrate and selenium powder are placed in the reaction furnace of different position. The substrate is: placed in a high temperature heating zone of the furnace downstream from the high temperature at a furnace height of 1-10 cm; disposed in a first ceramic boat, and the boat is placed in a first ceramic high-temperature heating zone of the furnace. The selenium powder is placed in a second ceramic boat, which is placed upstream of the second ceramic temperature heating zone of the furnace from the temperature at a furnace height of 5-15 cm. The vacuumizing step is carried out at a pressure of 0.1 Pa, and by filling the inert gas to make a furnace chamber having an initial pressure of 1-100 KPa. The method comprises reducing the inert gas charging rate to be 5-100 sccm. The heating step is carried out at a temperature of 700-1000 degrees C for 5-30 minutes, and at heating rate of 10-25 degrees C/minute. Preferred Components: The substrate consists of silica/silicon, ceramic sheet, quartz or sapphire. The molybdenum trioxide powder has a purity of more than 99.9%. The inert gas is argon, nitrogen, helium gas or neon.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alkali solution is present in an amount of 0.5-7 wt.%, preferably 4 wt.%. The additive is present in an amount of 0.3-0.8 wt.%, preferably 0.5 wt.%. The non-alcoholic additives comprise a surfactant, a growth regulator, and a defoaming agent. The alkaline solution has 150-250 ml/100 of alcohol-free liquid. Preferred Method: The silicon wafer is heated at a temperature of 80-90 degrees C for 13-17 minutes.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The acrylate compound (A) further contains phosphate ester containing acrylate compound (A2) and carboxyl group-containing acrylate compound (A3).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The ratio of thickness and width of electroconductive film, is 0.1-1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The photovoltaic absorber layer comprises IB-IIIA-VIA material. The smoothing layer comprises at least one sol gel transparent conducting oxide (TCO) or TCO particles. The smoothing layer comprises zinc oxide:aluminum of a thickness of less than or equal to 100 nm or less than or equal to 150 nm or less than or equal to 200 nm. The group IB and/or IIIA hydroxide comprises indium-gallium hydroxide.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: The method (M1) further comprises: forming a sacrificial layer coupled to the transparent material layer; and depositing a smoothing layer on the photovoltaic absorber layer, where the smoothing layer comprises an electrically conductive material. In the method (M2), the smoothing insulator is sufficient to cover all peaks of the rough absorber, but sufficiently thin to allow electrons to pass out of the absorber layer, where the smoothing insulator conformally covers all peaks in the rough absorber. The method (M2) further comprises: creating the absorber layer by processing the precursor layer into a solid film and then thermally reacting solid film in an atmosphere containing at least an element of group VIA to form the photovoltaic absorber layer; or creating the absorber layer by thermal reaction of the precursor layer in an atmosphere containing at least an element of group to form the photovoltaic absorber layer. Preferred Components: The transparent material layer includes a web-like layer of conductive material comprising many metallic nanowires. The photovoltaic absorber layer prior to deposition of a smoothing layer has peaks at 10-1000 nm, preferably 10-100 nm. The smoothing layer and web layer have substantially the same thickness. The smoothing layer comprises an electrically conductive leveling layer. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The low reactivity ratio monomer comprises acrylic acid, methacrylic acid, giycidylmetbacrylate, and methvlmethacrylate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The cross-linking monomer comprises ethyleneglycol-dimethacrylate, m-divinylbenzene, and/or p-divinylbenzene. The polymeric microporous substrate comprises polypropylene, high molecular weight polyethylene, ultrahigh molecular weight polyethylene, polyvinyl chloride, or polyvinylidene fluoride. The cross-linked anion transferring polymer includes polymerization product of 1-vinylimidazole, vinylbenzyl chloride and/or divinylbenzene, and a quaternization agent including benzyl chloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The QTB layer is made of silicon oxide, hydrogenated silicon oxide silicon nitride, hydrogenated silicon nitride aluminum oxide, aluminum nitride, silicon oxynitride, hydrogenated silicon oxynitride, amorphous silicon, hydrogenated amorphous silicon, carbon doped silicon and silicon carbide. The TCO layer is made of tungsten doped indium oxide, Tin doped indium oxide, fluorine doped tin oxide, zinc doped indium oxide, zinc and tungsten doped indium oxide and aluminum doped zinc oxide. The hole collector is made of amorphous- silicon, hydrogenated amorphous- silicon and microcrystalline silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The positive electrode active material preferably has BET surface area of 3000-4000 m2/g. The ratio of discharge capacity in the high electric current conditions with respect to the capacity per weight of the positive electrode active material layer and discharge capacity in low electric power flow conditions of nonaqueous lithium electrical storage element is 115 or more. Preferred Composition: The mesopore amount (Vm1) of negative electrode active material derived from fine pores having diameter of 20-500 Angstrom calculated using Barrett-Joyner-Halenda method is 0.01-0.2 cm3/g. The micropore amount (Vm2) of negative electrode active material derived from fine pores having diameter less than 20 Angstrom calculated using micropore method is 0.01-0.4 cm3/g.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ratio of methyl cyclohexane is 89-88 %mass. The raw material oil further contains 0.048 %mass or more saturated 5-membered-ring component chosen from methylcyclopentane and dimethyl cyclopentane, and 0.28 %mass or more paraffin, in hydrogenated state. The ratio of saturated 6-membered-ring component is 94.7 %mass or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The base layer comprises a mono-crystalline silicon wafer and/or an epitaxially grown crystalline-silicon (c-Si) thin film. The quantum-tunneling-barrier layer comprises silicon oxide (SiOx), hydrogenated silicon (SiOx), silicon nitride (SiNx), hydrogenated silicon nitride (SiNx), aluminum oxide (AlOx), aluminum nitride (AlNx), silicon oxynitride (SiON), hydrogenated silicon oxynitride, amorphous silicon (a-Si), hydrogenated amorphous silicon, carbon doped-silicon and/or silicon carbide. The transparent conducting oxide layer contains tungsten doped-indium oxide (IWO), tin-doped indium oxide (ITO), gallium-indium oxide (GIO), gallium-indium-tin oxide (GITO), Zinc-indium oxide (ZIO), and/or zinc-indium-tin oxide (ZITO). The electron collector comprises quantum-tunneling-barrier layer, amorphous-Silicon (a-Si), hydrogenated amorphous silicon and micro-crystalline silicon. Preferred Properties: The quantum-tunneling-barrier layer has thickness of 1-50 Angstrom . The doping concentration of electron collector is 1x 1012/cm3-5x 1020/cm3. The base layer has n-type and p-type doping concentration of 1x 1015/cm3-1x 1016/cm3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The crystalline carbon is obtained by heating the carbon-based material at 1700-3000 degrees C. The crystalline carbon and aromatic amine compound are mixed in a weight ratio of 25:1 to 1.24:1. The agitating is performed at 50-500 revolution per minute. The agitating is performed at 0-30 degrees C. Preferred Components: The crystalline carbon has a Raman spectrum intensity ratio of (1360) plane and (1580) plane, G/D((I(1580 cm-1)/I(1360cm-1)) of greater than or equal to 0.7. The carrier has a specific surface area of 50-800 m2/g. The active metal is platinum, ruthenium, osmium, platinum-ruthenium alloy, platinum-osmium alloy, platinum-palladium alloy, and platinum-M alloy.M=transition element selected from Ga, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Sn, Mo, W, Rh, or Ru.Preferred Compound: The aromatic amine compound is a compound of formula (II).m=1 or 2.Provided that: when n is 3, then m is 1. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The acidic group-containing polymerizable monomer has a cyclic structure. The metal alkoxide is a tungsten alkoxide. The content of metal alkoxide and photoinitiator is 0.1-150 parts mass and 0.1-10 parts %mass, respectively with respect to 100 parts mass of acidic group-not-containing polymerizable monomers. The acidic group-containing polymerizable monomer is mixed such that the content of acidic group is 4-10 equivalents with respect to the metal atom of a metal alkoxide. Preferred Process: The composition is obtained by mixing metal alkoxide (I), acidic group-containing polymerizable monomer, acidic group-not-containing polymerizable monomer and photoinitiator.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition further contains 0.5-3 pts. wt. metal salt consisting of cation containing alkali metal or alkaline earth metal and anion which can be ion-dissociated, with respect to 100 pts. wt. acid resin component.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The composition further contains 0.1-2 pts. wt. silicone compound with respect to 100 pts. wt. resin component.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The composition contains 10-40 wt.% graft copolymer (B) obtained by graft copolymerizing rubber polymer with aromatic vinyl monomer and/or vinyl cyanide monomer, 60-90 wt.% vinyl type (co)polymer consisting of vinyl monomer and/or vinyl cyanide monomer, and 0-10 wt.% modified vinyl type (co)polymer (D) consisting of vinyl monomer, vinyl cyanide monomer and vinylic monomer modified by amino group.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Property: The glass has thickness of 300 mu m or less. The laminate is obtained by hardening and adhering by hot press.    TECHNOLOGY FOCUS - POLYMERS - Preferred Resin: The phenolic hydroxyl group-containing polyamide resin (A) is of formula (I).n/m+n=0.005-1;m+n=5-200;x=1-4;andAr=bivalent aromatic group.
TECHNOLOGY FOCUS - POLYMERS - The fluorine resin layer consists of resin selected from a group consisting of PTFE, polychlorotrifluoroethylene, tetrafluoroethylene and ethylene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The P-N junction semiconductor layer of solar cell is formed of silicon and phosphorus.    TECHNOLOGY FOCUS - METALLURGY - The P-N junction semiconductor layer of solar cell is formed of germanium, silicon-germanium, aluminum, gallium, indium and arsenic.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): The benzaldehyde derivative (I) is prepared by reacting amino acid alkylester of formula (i) and benzene carboxylic acid of formula (ii) under an acidic catalyst and alcohol.Ra=R1;Rb=R4;andX1-X3=halo.Preferred Process: The manufacture of electrolyte gel further involves heating mixture of gelatinizer and ionic liquid, and cooling. Preferred Composition: The ionic liquid contains organic cation chosen from imidazolium ion, pyridinium ion, piperidinium ion, pyrrolidinium ion, phosphonium ion, ammonium ion and sulfonium ion, and organic anion chosen from halogen ion, carboxylate ion, sulfate ion, sulfonate ion, thiocyanate ion, nitrate ion, aluminate ion, borate ion, phosphate ion, amide ion, antimonate ion, imide ion, methide ion, amino acid ion, N-acyl acidic-amino-acid ion and N-acyl neutral-amino-acid ion. The ionic liquid is chosen from 1-ethyl-3-methylimidazolium bis(trifluoro methylsulfonyl) amide, 1-butyl-3-methylimidazolium bis(trifluoro methylsulfonyl) amide, 1-hexyl-3-methylimidazolium bis(trifluoro methylsulfonyl) amide, 1-butyl pyridinium bis(trifluoro methylsulfonyl) amide, 1-ethyl-3-methylimidazolium trifluoro methanesulfonate and 1-butyl-3-methylimidazolium trifluoro methanesulfonate. The electrolyte gel further contains salt chosen from inorganic sulfate, inorganic phosphorus acid salt, hydration mineral salt, hexafluorophosphate mineral salt, trifluoro sulfonic-acid mineral salt, fault chloro acid mineral salt, tetrafluoroborate mineral salt, bis(fluoro sulfonyl)imide mineral salt, bis(trifluoro methylsulfonyl) amide mineral salt and inorganic cobalt acid salt. Preferred Definitions:    R1-R3=methyl, 2-propyl, 2-methylpropyl, 1-methylpropyl or methylthio ethyl;and    R4-R6=methyl.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The hydrogen generation catalyst further comprises oxygen ion, and has BET specific surface area of 1-100 m2g-1. The catalyst active metal is chosen from group 8, group 9, and group 10 metallic element. The content of catalyst active metal particles is 0.01-30 wt.%. Preferred Process: The dispersed powder is impregnated to solvent solution of compound of active catalyst, forming catalyst precursor comprising catalyst active metal compound, evaporating solvent, drying mixture, heating, reducing the active catalyst metal compound, and supporting the catalyst active metal particles. The mayenite type compound is obtained by hydrothermal method.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The fluorine atom-containing polymer is of formula (I) or (II). The fluorine atom-containing polymer is hydrolysis-condensation product of a silicon-containing compound of formula: (R6O)4-p-Si-(R7)p. The polymers are styrene-type polymers.R1,R3=H, fluoro, methyl, or trifluoromethyl;R2=1-6C alkyl or 4-20C alicyclyl, in which H is substituted by fluoro or substituent containing fluoro;R4=coupling group having (k+1) valence;X=bivalent coupling group having fluoro;R5=H or organic group;k,p=1-3;R6=1-6C alkyl;andR7=fluoro or organic group.Preferred Layers: Before forming phase-separation film on substrate, a lower layer film (102) is formed on substrate, and a pre-pattern (103) having perpendicular side surface with respect to substrate is formed on lower layer film. The phase-separation film is formed in the region on the lower layer film divided with the pre-pattern. The pre-pattern is further removed. Preferred Process: One portion phase of the phase-separation film and pre-pattern are removed by wet developing.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The average particle diameter of gold nanoparticles is 10 nm or less. Preferred Components: The support is a porous material. The support is carbon material or metal oxide, preferably powdered activated carbon, fibrous activated carbon, titanium oxide, cobalt oxide, and/or manganese oxide. Preferred Conditions: Gold carboxylate is dispersed in water to obtain a colloid dispersion liquid of gold carboxylate. The support is contacted with the colloid dispersion liquid and gold nanoparticles are supported. A reducing agent and a protective colloid are added to the colloid dispersion liquid of gold carboxylate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The gold carboxylate is gold acetate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The concentration of surface active agent in the carbon nanotube dispersion liquid is 0.2-4 wt.%. The surface active agent is chosen from sodium dodecyl sulfate, sodium dodecyl benzene sulfonate, sodium taurocholate or cetyl trimethyl ammonium bromide. The concentration of diazonium salt contained in the dispersion liquid is 0.1-20 mg/mL. The diazonium salt is chosen from 4-nitrophenyl diazonium tetrafluoroborate or 4-bromobenzene diazonium tetrafluoroborate salt. The concentration of carbon nanotube in printing ink is 0.001-0.01 mg/mL.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Mono-crystalline silicon piece etching additive composition comprises (in pts.wt.); polyethylene glycol (1-20), sodium benzoate (0.1-2), citric acid (1-5), hydrolyzed polymaleic anhydride (1-5) and sodium acetate (0.1-1). Preferred Components: Mono-crystalline silicon piece etching additive composition comprises water, which is selected from de-ionized water. Inorganic alkali aqueous solution is selected from sodium hydroxide or potassium hydroxide (0.5-3 wt.%.).
TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The polyvinylidene fluoride-polyvinyl alcohol composite proton exchange membrane comprises polyvinyl alcohol, polyvinylidene fluoride, sodium tungstate, silicon tetrachloride and oxalic acid, and the method involves dissolving polyvinyl alcohol in dimethyl sulfoxide and water to prepare solution A, where polyvinyl alcohol per g of dimethyl sulfoxide to be expanded is 19 g, and deionized water and dimethylsulfoxide mass ratio is 10:1; heating solution to 85-95 degrees C, and stirring for 3 hours to prepare solution B at same temperature; according to polyvinyl alcohol in solution B taking sodium tungstate, silicon tetrachloride, oxalic acid and polyvinylidene fluoride in weight ratio of 62-34 pts. wt., 10-15 pts. wt., 10-15 pts. wt., 2 pts. wt., and 16-34 pts. wt. respectively, in turn adding sodium tungstate, silicon tetrachloride and oxalic acid in solution B, stirring for 2-3 hours at 80-90 degrees C, and then adding polyvinylidene fluoride to form uniform solution C; heating solution C to 110-130 degrees C and continuously stirring in oil bath for 1-2 hours after cooling to room temperature to form solution D; casting solution D on polytetrafluoroethylene glass plate and vacuum drying, where film thickness is controlled to 0.1-0.2 mm, and vacuum drying is at 100-120 degrees C, to obtain polyvinylidene fluoride-polyvinyl alcohol composite proton exchange membrane doped with silicon tungstate and silicon dioxide.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The aluminum-silicon alloy contains 0.4-1.6 %mass, preferably 0.5-1 %mass silicon. The iron-based material is metal chosen from enameling iron, carbon steel, stainless steel and iron-nickel alloy, preferably ferritic stainless steel. The metal substrate further has aluminum layers (A) and (B), insulating layer and other reaction suppression layer formed using aluminum-silicon alloy. Preferred Property: The metal substrate has thickness of 30-150 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The thermally treating utilizes a nitrogen and hydrogen gas composition at 700-1000 degrees C. The thermally treating provides a lattice parameter of the structurally ordered material composition not greater than 0.3915 nanometers. The providing the nanoparticle that comprises the structurally disordered material composition provides the structurally disordered material composition supported upon a carbon support. Preferred Components: The nanoparticle that comprises the structurally ordered material composition comprises a structurally ordered core containing an intermetallic material having elemental components, and a structurally ordered shell surrounding the structurally ordered core and comprising one of the elemental components of the intermetallic material. The structurally disordered material composition comprises M1xM2y material composition; and the structurally ordered material composition comprises a structurally ordered core comprising M1xM2y intermetallic material; and a structurally ordered shell surrounding the structurally ordered core and comprising a M1 material. The structurally disordered material composition comprises Pt3Co material composition, and the structurally ordered material composition comprises a structurally ordered core comprising a Pt3Co intermetallic material, and a structurally ordered shell surrounding the structurally ordered core and comprising Pt material. The core comprises a Pt3Co intermetallic material, and the shell comprises a Pt material structurally ordered with respect to the Pt3Co intermetallic material.M1=Ru, Rh, Pd, Os, Ir or Pt;M2=Mn, Fe, Co, Ni or Cu;x and y=1-10. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The film or sheet is applied on a polymer material. The phenoxy resin composition further comprises bisphenol-A phenoxy, bisphenol-A/bisphenol-F phenoxy, brominated phenoxy, phosphorus phenoxy, bisphenol-A/bisphenol-S phenoxy, caprolactone modified phenoxy, and/or siloxane modified phenoxy. The weight-average molecular weight of the phenoxy resin is 1000-100000. An end of the phenoxy resin comprises an epoxy group, a hydroxyl group, an amine group, a fluorine group, a siloxane group, and an amide group. The crosslinking agent is isocyanate functional prepolymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Coiled carbon fiber generated by irradiation of microwave is embedded in support base. Upper surface of support base is roughened.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred composition: The oxide sinter further contains gallium and/or aluminum. The gallium source or aluminum source is chosen from gallium oxide, aluminum oxide and aluminum carbide. The ratio of number of atoms of gallium or aluminum is 0.1-2.5% with respect to total number of metal atom. The aluminum source is aluminum carbide. Preferred Properties: The primary particle size of the titanium carbide is 1.5 mu m or less. The relative density of oxide sinter is 93% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: The gas-releasing solid material does not undergo a self-sustaining exothermic reaction after the initiation of a gas releasing reaction. Heat producing materials extend into the unsegregated quantity of the fuel composition. Preferred Components: Heat producing materials are disposed on a surface of the unsegregated quantity of the fuel composition. The gas contains hydrogen gas. Initiators contain greater than or equal to 1 thermal initiators and electrical initiators. Fuel unit contains unsegregated quantities of fuel composition. Gas generator contains energy source for supplying electric energy for initiation of the reaction of heat producing materials. Gas consuming device is a hydrogen fuel cell, and gas generator is a hydrogen generator. Preferred Processes: Reaction of heat producing materials is selectively initiated to selectively release gas from the corresponding portions of the fuel composition.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The weight ratio of zinc oxide and magnesium oxide is 94:5-7, preferably 94:6. The weight ratio of indium oxide powder and tin oxide powder is 95:5. Preferred Composition: The amount of deionized water with respect to total weight of zinc oxide and magnesium oxide is 20-30%, preferably 25%. The total weight of zinc oxide and magnesium oxide is 66-70%, preferably 68%. The amount of deionized water with respect to total amount of indium oxide powder and tin oxide powder is 20-30%. The total amount of indium oxide powder and tin oxide powder is 66-70 wt.%. The amount of sodium powder is 5 wt.%.
TECHNOLOGY FOCUS - METALLURGY - The metal grid includes metal adhesive layer set between the electroplated metal layer and the photovoltaic structure, and the metal adhesive layer comprises one or more of copper, aluminum, cobalt, tungsten, chromium, molybdenum, nickel, titanium, tantalum, titanium nitride, titanium tungsten, titanium silicide, titanium silicon nitride, tantalum nitride, tantalum silicon nitride, nickel vanadium, tungsten nitride and their combinations, and the electroplated metal layer include one or more of copper layer, silver layer and tin layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The refined hydrogen selenide-containing gas contains less than 5 ppmv hydrogen sulfide. The refined hydrogen selenide-containing containing gas contains less than 1 ppm water. The refined hydrogen selenide contains less than 1 ppmv water. Preferred Process: The refining method further involves reducing the quantity of water in hydrogen selenide-containing gas to less than 20 ppmv by allowing hydrogen selenide-containing gas to pass through to 4-A molecular sieve, before passing through AW-500 molecular sieve, and receiving the refined hydrogen selenide-containing containing gas in a cylinder cooled to -20 degrees C to -60 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The substrate consists of silicon and unavoidable impurities. The primary aluminum gallium nitride layer comprises aluminum gallium nitride of formula: AlxGa1-xN, where x is more than 0.3 and less than 1. The secondary aluminum gallium nitride layer comprises aluminum gallium nitride of formula: AlyGa1-yN, where y is more than 0 and less than 0.5. The semiconductor wafer further comprises n-doped gallium nitride layer doped with silicon or germanium, a layer of quantum wells having thickness of 10-100 nm. Preferred Properties: The layer of crystalline gallium nitride islands has maximum thickness of 10-100 nm, and density of 108-1012 cm-2. The thickness of the substrate, aluminum nitride layer, primary aluminum gallium nitride layer, secondary aluminum gallium nitride layer and gallium nitride layer is 275-1000 mu m, 10-300 nm, 100-1500 nm, 50-2000 nm and 50-5000 nm, respectively. The semiconductor wafer has diameter of 12 inch or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Film: The surface coating film is passivation film. Preferred Composition: The composition for surface coating film formation comprises organic-solvent component including silicon and titanium in conversion of silicon dioxide and titanium dioxide at mass ratio 1:99-97:3, and zirconium and silicon in conversion of silicon dioxide and zirconium dioxide at mass ratio of 1:99-97:3.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The component (E) contains 0.5-2 parts mass trifunctional urethane (meth)acrylate, monofunctional urethane (meth)acrylate and/or bifunctional urethane (meth)acrylate. Preferred Properties: The component (F) has transmittance of 20% or less in light having wavelength of 400-700 nm, and transmittance of 3% or more in light having wavelength of 300-400. The aspect-ratio of component (F) is 1.1-1.8.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: In the fuel directing reaction device each of the reaction holes has many carbon nanotubes decorated with catalysts incorporated into inner wall of it. The inner walls of the reaction holes vertically extend through the substrate, and the length of the carbon nanotubes has a decreasing trend from the second side of the substrate to the first side of the substrate to form the taper reaction holes expanded toward the direction of the first side of the substrate. The reaction holes on the first side of the substrate have the hole diameter of 10-50 mu m. The first ribs and the second ribs are triangle ribs, V-shaped ribs (11) and/or Y-shaped ribs. The first rib array portion further comprises many arrow-shaped ribs disposed among the first row of the first rib array portion, and the first row is defined as the most adjacent row to the fuel introducing microfluidic channel portion. The fuel introducing microfluidic channel includes microfluidic channels having: a width of less than 5 mu ; or inner walls coated with a hydrophilic material or subjected to a hydrophilic treatment. The V-shaped portion of the first ribs has projective length ratio of lateral side to the axial side of 2:1-2:5. The V-shaped portion of the second ribs has projective length ratio of lateral side to the axial side of 2:1-2:5. The interlaced arrangement of the first and second V-shaped ribs are capable of delivering the fuel uniformly and rapidly to the delivery and reaction zone (1) by a nozzle-diffuser effect.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The graphene material comprises a material consisting of graphene, graphene oxide, reduced graphene oxide, graphene quantum dots, one-dimensional graphene nanoribbons, graphene nanomeshes, few layer graphene and chemically functionalized graphene. The nanoparticles comprise a nanomaterial consisting of gold, silver, copper, nickel, palladium, iridium, silicon dioxide, titanium dioxide, aluminum trioxide, zinc oxide, indium tin oxide, antimony trioxide, aluminum zinc oxide, tin dioxide, manganese dioxide, cobalt oxide, ferric trioxide, nickel oxide, cuprous oxide, ruthenium oxide, cadmium sulfide, cadmium selenide, cadmium telluride, indium phosphide, III-V semiconductors and II-VI semiconductors. The on dopant comprises fluorine, chlorine, bromine, nitrogen, potassium, iron chloride and boron.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The chemically functionalized graphene and/or the intermediate layer material comprise an organic functional group consisting of carboxyl group, hydroxyl group, epoxy group, amine group, azide group, isocyanate group, carbamate group, amide group and diazonium group.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanomaterial is chosen from nanoparticles, nanorods and nanowires. The nanomaterial comprises metallic nanomaterial, fullerenes and/or carbon nanotubes. The metallic nanomaterial comprises silver, gold, copper, nickel and/or indium-tin oxide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The compressive-stress layer comprises glass composition including 55-70 mol% silicon dioxide, 8-14 mol% aluminum trioxide, 0-5 mol% boron trioxide, 7-15 mol% sodium oxide, and 1-10 mol% potassium dioxide, where molar ratio total content of magnesium oxide, calcium oxide, strontium oxide, and barium oxide and total content of lithium dioxide, sodium dioxide, and potassium oxide is 0.3-1.5, and does not comprise arsenic trioxide, antimony trioxide, lead oxide and fluorine substantially. Preferred Properties: The tempered glass has strain point of 550 degrees C or more, compressive-stress value of the compressive-stress layer of 300 MPa where the layer has thickness of 5 mu m or more, decreasing rate of compressive-stress value of compressive-stress layer of 80% or less measured by heating at 500 degrees C for 30 minutes, thermal expansion coefficient of 40-100x 10-7/ degrees C at 30-380 degrees C, liquidus temperature of 1400 degrees C or less, and liquid phase viscosity of 103 dPa.second or more, and board shape.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass powder is made of glass containing 30-65 mol% glass forming material, 25-55 mol% modifier, 5-10 mol% intermediate oxide and 2-10 mol% additive. The ceramic powder is chosen from metal oxide having thermal expansion coefficient of 9-16x 10-6 K-1, composite metal oxide, silicate and aluminosilicate, preferably nickel oxide, yttrium oxide, zirconium oxide, yttria-stabilized zirconia, and calcium silicate. The glass forming material is silicon dioxide and less than 10 mol% boron trioxide. The modifier is chosen from magnesium oxide, calcium oxide and strontium oxide. The intermediate oxide is chosen from alumina and gallium oxide. The additive is chosen from transition metal oxide and rare earth metal oxide, preferably titanium dioxide, nickel oxide, zinc oxide, yttrium oxide, zirconium oxide and lanthanum oxide. The glass forming material does not contain barium oxide. The volume fraction of precipitated crystal phase is less than 10%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: Ethanol solution of polyvinyl butyral is used as adhesive during manufacture of seal material. The amount of adhesive is 5-20 wt.%. The amount of binder in slurry is 10-50%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): A method of synthesis of substituted beryline imide derivative of formula (I), involves: Suzuki coupling reaction of substituted beryline imide derivative of formula (II) with phenyl moronic acid derivative of formula (III) to obtain beryline imide derivative of formula (IV); and de-alkylation of the compound (IV) to obtain the compound (I).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The noble metal precursor solution is chloroauric acid. The noble metal nanoparticles are gold nanoparticles. The reducing agent is sodium borohydride or potassium borohydride. The chalcogenide semiconductor compound precursor solution containing IB-group or IIB-group metal cation, preferably copper(II)ion or cadmium(II)ion. The chalcogenide semiconductor compound is copper sulfide or cadmium sulfide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The anti-reflection microstructure is subjected to pre-treatment and activation process by using ethanol, nitric acid, ethylenediamine and anhydrous ethanol. Preferred Composition: The content of ethylenediamine is 10-40 %mass.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The coat containing phosphorus atoms is formed of a compound derived from lithium difluorophosphate contained in the nonaqueous electrolytic solution as a phosphorus-containing coat forming agent.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The electroconductive substance is a conductive polymer. A wiring made of conductive polymer is provided with respect to the conductive layer. The conductive layer is a layer in which metal is distributed.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The silicon monocrystal block for the silicon monocrystal seed is produced by Czochralski-method or floating zone melting method. The lateral surface with the (100)-crystal orientation extends undivided over a lateral length of the crucible base (5) in all tracks. The (100)-wafer surface is texture-etched by an alkali etching process, where the etched wafer surface has pyramid shaped elevations, and the edges of the base surface of the pyramid shaped elevations extend parallel to the outer edges of the wafer surface. The wafer has a gradient of concentration of carbon, oxygen and/or boron in the silicon over the (100)-wafer surface. The wafer has a gradient of the electrical conductivity over the (100)-wafer surface. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silver salt is silver nitrate. The stabilizing agent stabilizes the silver nanoparticles against aggregation. The microparticles contain calcium carbonate or dicalcium phosphate dihydrate. The concentration of silver nanoparticles contained in the acne or wound treatment product is 109 or more per milliliter. The acne or wound treatment product does not contain silver ions. Preferred Process: The silver salt and the reducing agent are mixed at a temperature of less than 50 degrees C.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The skin scrub or defoliate agent further contains soap. The molar ratio of reducing agent with respect to silver ions is more than 0.5. The reducing agent is preferably of formulae (V)-(VII).R1,R2=H, hydroxy, methyl, carboxy, amide, or group chosen from group of formulae (ii)-(iv).    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The preparation of hydrogel particles further involves dehydrating the hydrogel particles. The silver nanoparticles are coated using polysaccharides. Preferred Component: The acne treatment product contains the microparticles.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal salts (A,B) comprises copper (II) salt. The content of metal salt (A) is 0.05-0.25 stoichiometric equivalent with respect to metal salt (B). The metal shell comprises copper. The surfactant is chosen from surfactant (A) comprising 6-18C primary alkylamine and second surfactant comprising N,N'-dialkylethylenediamine Preferred Process: The metal salt (A) is reduced to insoluble compound by sugar comprising oxidizable group. The copper (II) salt is reduced to insoluble copper (I) compound, or insoluble copper (I) salt having particle size of 10 nm or less. During process of converting metal salt (A) to insoluble compound, the metal salt (A) forms metal carboxylate, metal sulfide, colloidal sulfur, metal hydroxide and metal chalcogenide. Preferred Property: The metal nanoparticles have size of 1-10 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The active-material layer further contains 0.5-2 %mass electroconductive additive chosen from carbon black, graphite, vapor-grown carbon fibers, carbon nanofibers, and carbon nanotubes. The active material is titanium oxide or lithium titanate. The metal foil is an aluminum foil. The thickness of film containing electroconductive material is 0.1-5 mu m.    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The film containing the electroconductive material further contains a binder, preferably polysaccharide. An organic acid is ester-bonded to the polysaccharide.
TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The ferritic stainless steel further contains 0.01-0.15 %mass niobium and/or 0.01 %mass to less than 0.4 %mass copper, or 0.02-0.5 %mass molybdenum and/or 0.02-0.3 %mass tungsten, or 0.001-0.1 %mass rare-earth metal, 0.01-0.5 %mass zirconium, 0.01-0.5 %mass vanadium and/or 0.01-0.5 %mass cobalt, or 0.0002-0.005 %mass boron, 0.0002-0.002 %mass magnesium, and/or 0.0005-0.003 %mass calcium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The article comprises functional nanoparticles or functional nanocomposite films of crystalline titania. The nanoparticles of crystalline metal oxide or nanocomposite films of crystalline metal oxides comprise titanium oxide, nickel oxide, zinc oxide, tin oxide, cobalt oxide, or copper oxide.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The substrate comprises glass, plastic, paper, or polymer film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The rare-earth material comprises thulium or ytterbium. The optical wavelength band filter is made of a material. The material is selected from titanium dioxide, silicon nitride, zirconium oxide, aluminum oxide, magnesium oxide, silicon dioxide, calcium fluoride or magnesium fluoride. A base composition is also used for preparing cover glass. The base composition is selected from silicon dioxide, alumina, sodium carbonate, potassium carbonate, magnesium carbonate, calcium carbonate or antimony oxide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The support base material is a glass plate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The thickness of silicone resin layer is 2-100 mu m. Preferred Composition: The crosslinked organopolysiloxane further includes siloxane unit (B) of formula (II). The ratio of siloxane unit (A) with respect to total of siloxane unit (A) and siloxane unit (B) is 30-90 mol%. The ratio of total siloxane units (A) with respect to all siloxane units and siloxane unit (B) is 80-100 mol%. The crosslinked organopolysiloxane is an alternating copolymer of siloxane unit (A) and siloxane unit (B). The siloxane unit (B) in crosslinked organopolysiloxane is obtained from siloxane unit (B-1) in which at least one group (R5 and R6) is 4C or less alkyl or 3C or less alkenyl, or siloxane unit (B-1) and siloxane unit (B-2) in which at least one group (R5 and R6) is 4C or less alkyl.R5,R6=hydrocarbyl optionally having hetero atom. Preferred Definitions:    R1-R4=4C or less alkyl or phenyl.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The organopolysiloxane is alternating copolymer of organopolysiloxane containing siloxane unit (A) and siloxane unit (B). The siloxane unit (B-1) is siloxane unit having methyl group or vinyl group. Preferred Property: The number average molecular weight of organopolysiloxane is 5000-30000. Preferred Process: The heating process is carried out during crosslinking organopolysiloxane. Preferred Definitions:    R1-R4=methyl.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The oxidizing agent is organic or inorganic peroxides, peracids, persulfates, perborates, metal salts, derivatives of oxyhalogenic acid, nitrates, halogens, ozone, nitrogen oxides, nitroso compounds, and/or oxygen. The oxidizing agent is present at 0.001-5 wt.%. The weight ratio of doped conductive polymer to the oxidizing agent is 1000:1-1:10. The solvent is water, alcohols, alkanes, cycloalkanes, alkenes, alkynes, ethers, esters, halogenated hydrocarbons, aromatics, lactones, carbonates, sulfoxides, nitro compounds, nitriles, ketones, carboxylic acid amides and/or urea derivatives. The solvent is present at 65-99.99 wt.%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The conductive polymer is a polythiophene or its derivative, a polyaniline or its derivative, a polypyrrole or an oligoaniline. The conductive polymer is present at 0.001-30 wt.%. EXAMPLE - 150 ml Well-stirred dispersion of polyaniline-polystyrene-indium complex (4% in water) was charged with 0.42 ml 30% added hydrogen peroxide solution in water and stirred at 60 degrees C for 1 hour to give the formulation.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent (A) is dichloromethane, tetrahydrofuran, or dimethylformamide. The reactant is 9-(4-bromophenyl) carbazole. The volume ratio of 9-(4-bromophenyl) carbazole to solvent (A) is 1 mmol:5-15 ml. The molar ratio of 9-(4-bromophenyl) carbazole to N-bromosuccinimide is 1:1.8-2.5. The solvent (B) is chloroform, tetrahydrofuran, or dimethylformamide. The molar ratio of solvent (B) to product is 1 mmol:5-15 ml. The reactant is pinacol boronate. The molar ratio of isopropanol with pinacol boronate is 1:8-9. The molar ratio of potassium carbonate and palladium tetrakis(triphenylphosphine) is 1:3:0.25-35:0.1-0.5. The solvent (C) is toluene, chloroform, or tetrahydrofuran. The auxiliary agent is triethylamine or piperidine.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The metal-containing fiber is metal fiber. The nonwoven fabric further contains resin fiber. Preferred Properties: The metal-containing fiber has diameter of 6-15 mu m, and length of 5 mm or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The reaction is performed in presence of base and catalyst containing transition metal compound and tri-substituted phosphine. The transition metal compound is chosen from palladium compound, rhodium compound, platinum compound, nickel compound, cobalt compound, copper compound, iron compound, iridium compound, ruthenium compound, silver compound and gold compound. The tri-substituted phosphine is trialkyl phosphine and/or triaryl phosphine. The base is chosen from potassium hydroxide and sodium hydroxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicate (B) is water swellable silicate particles chosen from smectite, bentonite, vermiculite, and mica. The composition further contains alcohol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The dispersing agent (C) is polycarboxylic acid salt type-dispersant, preferably sodium polyacrylate or ammonium polyacrylate, or polyalkylene glycol type dispersing agent, preferably polyethylene glycol or polypropylene glycol. The organic polymer (A) has carboxylate structure or carboxy anion structure, and is preferably completely neutralized or partial neutralized polyacrylate with weight average molecular weight of 1 million to 10 million.
TECHNOLOGY FOCUS - POLYMERS - Preferred Method: Deposition is done at 1400-1600 Torr with thickness of 15-20 nm, frequency power of 6100-6500 W and refractive index of 2.2-2.4.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The repeating unit (I) and (II) is selected from monomer of formula (III), (IV) and (V). The ratio of the repeating unit (I) and (II) is 0.1:1-10:1.X1, X2 and X3=NH, O, S or PH;R10, R'10, R11, R'11, R12 and R'12=-C(R3)(R4)(R5) or -C(R6)(R7)(R8).    TECHNOLOGY FOCUS - POLYMERS - Preparation: No preparation method given. Preferred Polymer: The polymer is doped with polymeric acids or Lewis acids as electron acceptors. Preferred Composition: The composition further comprises poly(3,4-ethylenedioxythiophene)poly(styrenesulfonate) (PEDOT:PSS). EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Tungsten source is tungsten oxide, tungstenic acid, tungstate, and/or tungsten acid salt.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Mass ratio of water and ethanol is 1:1-20, mass ratio of template agent and mixed solution is 1:20-100, mass ratio of tungsten source and carbon source is 1:1-15, and mass ratio of carbon source and mixed solution is 1:6-40. Template agent is poly(ethylene oxide)-poly(propylene oxide), poly(ethylene oxide)-poly(ethylene butylene), triblock, and/or diblock copolymer surfactant. Non-ionic surfactant is P123 (RTM: poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) triblock copolymer) and/or F127 (RTM: poly(propylene oxide)-poly(ethylene oxide) diblock copolymer). Carbon source is novolak prepolymer or melamine-formaldehyde prepolymer. Wood powder is wood product and mass ratio of wood powder and precursor solution is 1:1-8. Preferred Conditions: Flow rate of nitrogen in reduced atmosphere is 20-80 ml/minute and volume ratio of hydrogen gas and nitrogen gas is 1:1-6. Drying in furnace is performed at 900-1200 degrees C. Drying in furnace is performed for 3-6 hours.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Film-forming solution is dimethyl formamide, dimethyl acetamide, dimethyl sulfoxide, or tetrahydrofuran.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Polymer proton-conducting film contains perfluorosulfonic acid polymer, sulfonated polyaryl ether ketone, sulfonated polysulfone, sulfonated polyether ketone, sulfonated polyphosphazene, sulfonated polyamide, polybenzimidazole, quaternized polyether sulfone ketone, and/or quaternized polyether sulfone. Preferred Parameters: Graphene occupies greater than or equal to 95% of area of single-layer graphene. Preferred Processes: Graphene layer is formed by epitaxially growing graphene-containing layer via chemical vapor deposition, peeling off graphene layer, or chemical reducing graphene-containing layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of aluminum-doped zinc oxide film layer is 600-1200 nm. Preferred Process: During manufacture of conductive glass, strong acid chosen from hydrochloric acid and sulfuric acid, and weak acid chosen from acetic acid and oxalic acid, are used. Preferred Composition: The concentration of the strong acid and weak acid is 0.15-0.25 %mass and 0.3-0.45 %mass.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The glass substrate is low-iron ultra-white patterned glass.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silica hydrosol is obtained by stirring silicon source, water, aqueous ammonia, and absolute ethanol in a molar ratio of 1:(1-3):(0.4-1):(20-60), adding 15-20 vol.% strong polar solvent, and aging. The thickness of diamond film layer is 100-1000 nm and the thickness of antireflection film is 100-150 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compounds: The silicon source is tetraethylorthosilicate or tetramethylorthosilicate. The solvent is N,N-dimethylformamide, N,N-dimethylacetamide or N-methylpyrrolidone. The hydrocarbon gas is acetylene gas.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of carbon nanotubes is 15-20 %mass. The content of nano silica is 10-12 %mass.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The mass ratio of fatty alcohol ethoxylate and silane coupling agent is 2:1. The organic solvent is ethanol, propyl alcohol or isopropyl alcohol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of carbon nanotubes is 8-10 %mass. The content of nano silica is 10-12 %mass.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The mass ratio of free alkylphenol ether and acrylic acid is 2:1. The organic solvent is ethanol, propyl alcohol or isopropyl alcohol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (claimed): The preparation of hollow shell-type carbon supported platinum-based nanocatalyst involves stirring water soluble precursor, surface active agent, metal substituted quaternary ammonium salt and water, stirring to obtain solution A, saturating solution A and carbon carrier with inert gas, ultrasonic mixing, stirring, adding reducing agent, adding desired metal compound to water soluble precursor, stirring, aging for 0.5-0.6 hours, washing slurry, centrifuging at 60-120 degrees C for 4-12 hours, drying, grinding, calcining at 200-900 degrees C for 0.5-6 hours, adjusting pH using hydrochloric acid, sulfuric acid, nitric acid or perchloric acid, filtering, washing and drying for 4-12 hours. Preferred Component: The nanocatalyst comprises 1-80% active ingredient and balance carbon carrier. Carbon carrier is conductive carbon black, graphite carbon, carbon nanotube, carbon fiber, carbon microsphere or carbon gas gel. The water soluble precursor is nitrate, sulfate, and acetate of copper or zinc metal. The inert gas is high purity nitrogen or argon gas.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The middle thin film layer is formed from aluminum oxide film layer or titanium film layer or silicon layer or thin film silicon dioxide film layer. The substrate is cleaned with ethanol and de-ionized water, using high purity nitrogen process dry and clean.    TECHNOLOGY FOCUS - POLYMERS - The substrate is provided as transparent flexible substrate or polymethyl methacrylate substrate.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: The method (M1) further involves annealing the Cu2S layer, SnS2 layer, and ZnS layer to form Cu2ZnSnS4. The depositing of the Cu2S layer, SnS2 layer, and the ZnS layer involves the creation of a stack and further involves the creation of several stacks. The method (M1) involves: creating N Cu2S/SnS2/ZnS stacks by: depositing via X cycles of atomic layer deposition Cu2S; depositing via Y cycles of atomic layer deposition SnS2; and depositing via Z cycles of atomic layer deposition ZnS (where X is greater than or equal to 1; Y is greater than or equal to 1; Z is greater than or equal to 1; N is greater than or equal to 1). An atomic layer deposition (ALD) cycle for depositing Cu2S involves: exposing the substrate to a fluid containing a gaseous copper-containing precursor; purging the gaseous copper-containing precursor; exposing the substrate to a fluid containing a gaseous sulfur-containing precursor; and purging the gaseous sulfur-containing precursor. An ALD cycle for depositing SnS2 involves: exposing the substrate to a fluid containing a gaseous tin-containing precursor; purging the gaseous tin-containing precursor; exposing the substrate to a fluid containing a gaseous sulfur-containing precursor; and purging the gaseous sulfur-containing precursor. An atomic layer deposition cycle for depositing ZnS involves: exposing the substrate to a fluid containing a gaseous zinc-containing precursor; purging the gaseous zinc-containing precursor; exposing the substrate to a fluid containing a gaseous sulfur-containing precursor; and purging the gaseous zinc-containing precursor. The forming occurs via temporal atomic layer deposition, or spatial atomic layer deposition. In the method (M2), n is greater than or equal to 1 and further involves mixing the first sulfide layer, the second sulfide layer, and the third sulfide layer. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The intermetallic compound layer is metal silicide layer or metal germanide layer. The metal germanide layer contains germanium and metal chosen from nickel, cobalt and titanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The oxides of the electroconductive oxide layers (4,7,10) is chosen from indium, tin, gallium, zinc and aluminum. The oxygen content of electroconductive oxide layer (4) is 33-50 atomic%. The total oxygen content of electroconductive oxide layers (7 and 10) is less than 33 atomic%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The interlayer formed between silicon substrate and radiation-absorbing layer consists of silicon and germanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dielectric layer is made of silicon dioxide.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The particle size of mixture of silicon carbide powder and powdery pyrolyzed silicon-organic polymer is 100 mu m. Preferred Composition: The mixture of silicon carbide powder and powdery pyrolyzed silicon-organic polymer excludes boron or aluminum-containing compound.
TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Amount of polyvinylidene fluoride is 8 parts. Preferred Processes: Preparation of hydrogen fuel cell ion exchange membrane involves mixing polyvinylidene fluoride, and sodium hydroxide solution, reacting for 4 hours, soaking mixture in benzyl alcohol solution for 5 hours, and extending polymer for 3 hours.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The material comprises boron trioxide, aluminum oxide, silicon dioxide, metal oxide and manganese dioxide according to mol ratio of 510:0-5:40-60:25-40:10-25.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The bonding agent comprises a mixture of epoxy resin, methyl cellulose, polyvinyl butyral and/or polyethylene alcohol. The dispersing agent includes a mixture of fish oil, polyacrylic acid, polyvinyl alcohol and/or polyacrylamide. The solvent includes water, ethanol, isopropanol, n-butanol, toluene, dimethylbenzene and/or acetone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of microparticles in the blocking prevention layer is 0.6 wt.% or less. The microparticles comprise silica having average particle diameter of 50-200 nm. The glass film contains transparent conductive layer having laminated structure. The laminated structure includes silver layer containing silver or its alloy, which is interposed between thin films containing metal oxides. Preferred Properties: The surface of blocking prevention layer has average height (Ra) of 0.005-0.05 mu m, largest height (Rz) of 0.1-0.7 mu m, and haze value of 1.0 or less. The blocking prevention layer has thickness of 1-3 mu m.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thermosetting resin has chemical structure including siloxane bond.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The mixture contains less than 10% of compounds that are not correspond to (I), and one or more p-type dopants. (I) is present in an amount of at least 10%. SPECIFIC COMPOUNDS - Use of 255 compounds is disclosed, e.g. N-phenyl-N-(4-phenylphenyl)-9,9'-spirobi(fluorene)-2'-amine compound of formula (Ia), N-(9,9-dimethylfluoren-2-yl)-N-phenyl-9,9'-spirobi(fluorene)-2'-amine, N-(9,9-diphenylfluoren-2-yl)-N-phenyl-9,9'-spirobi(fluorene)-2'-amine, N-(9-methyl-9H-fluoren-2-yl)-N-(4-phenylphenyl)-9,9'-spirobi(fluorene)-2'-amine, and N-phenyl-N-(9,9'-spirobi(fluorene)-2'-yl)-9,9'-spirobi(fluorene)-2'-amine.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The crystalline titanium oxide is a rutile-type titanium oxide having crystal faces (110) and (111) and/or a rutile-type titanium oxide having crystal faces (110), (111), and (001). Preferred Properties: The specific surface area of a transition metal compound carrying titanium oxide is 10 m2/g or more. The pH of a supernatant liquid is three or more. When a transition metal compound carrying titanium oxide concentration is adjusted to 10 wt.%, the viscosity at 22.5 degrees C, is 5-25 mPa.second. The average particle diameter of a transition metal compound carrying titanium oxide is 20 mu m or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): 1,3-Dicarbonyl compound (II) and a cupric salt are mixed in the presence of a solvent and reacted to produce organocopper complex. Preferred Composition: The concentration of organocopper complex is 0.01-0.3 mol/L. The solvent is an aprotic polar solvent. The copper oxide thin film contains monovalent copper. Heating is carried out in atmosphere having oxygen concentration of 0.5-50 volume%. EXAMPLE - 9.5 g 1,8-Diazabicyclo(5.4.0)undec-7-ene was added to 50 ml N,N-dimethylacetamide, and 9 g 2,2-dimethyl-1,3-dioxane-4,6-dione was added. 7 mL Acetic anhydride was further dripped, and maintained at room temperature. A solution obtained by dissolving 4.2 g cupric chloride in 25 mL N,N-dimethylacetamide was added and maintained at room temperature for 1 hour. 200 ml Toluene was added and stirred. The liquid mixture was filtered and washed to produce 13 g copper complex. 48 ml N,N-dimethylacetamide was added to 5.5 g of acquired crystal. 200 mL Water was added, cooled, and filtered. The crystals were suction-filtered, washed and dried under reduced pressure. Columnar single crystal of copper complex with length of 0.3 mm was obtained.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: AZO ceramic target has purity of 99.99% and aluminum oxide (Al2O3) doping amount of 2 wt.%. Preferred Parameters: AZO ceramic target has relative density of 99.5% and target size of 75x 5 mm.
TECHNOLOGY FOCUS - BIOLOGY - Preferred Components: Acidophilus bacteria is Thiobacillus thiooxidans, Thiobacillus thioparus, Thiobacillus denitrificans, and/or Thiobacillus ferroxidans.    TECHNOLOGY FOCUS - BIOTECHNOLOGY - Preferred Conditions: Acidophilus bacteria culture medium has pH of 1-6, preferably 1.8-2.3. Operating temperature of acidophilic microbial fuel cell is 0-55 degrees C, preferably 28-35 degrees C. Preferred Forms: Acidophilic microbial fuel cell has non-membrane structure. Preferred Components: Acidophilus bacteria culture medium is 9K culture medium. Fuel is Leathen or 9K culture medium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Electrode material comprises carbon felt, carbon cloth, graphite rod, graphite particles, or carbon nanotubes.
TECHNOLOGY FOCUS - POLYMERS - The waveguide plate is made of polymethylmethacrylate material.
TECHNOLOGY FOCUS - METALLURGY - The metal layer comprises gold (Au), silver (Ag), ruthenium (Ru) or copper (Cu).
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The first set of the discrete elements: overlie the discrete regions of the first chemical functionality in a 1:1 correspondence; and is arranged in an ordered array. The second set of discrete elements is arranged in an ordered array. The first set of discrete elements is arranged in a first array and the second set of discrete elements is arranged in second array, so that the first and second arrays are interposed. At least one of the phases of the phase separated block copolymer film or the material comprises polystyrene, poly(methyl methacrylate), poly(isoprene), poly(ethylene oxide) or poly(acrylic acid). The block copolymer has a cylinder bulk morphology or a spherical bulk morphology, where a length scale of the discrete regions of the chemical pattern is greater than the corresponding lengths scale in the bulk morphology of the block copolymer. The chemical pattern has a first length scale, where the bulk morphology of the block copolymer has a corresponding second length scale that differs from the first length scale. The first length scale is greater than the second length scale.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The titanium-containing precursor is tetraethyl titanate, tetraisopropyl titanate, tetra-butyl titanate and/or titanium tetrachloride. The noble metal salt is chosen from chloroauric acid, chloroplatinic acid, silver nitrate and/or silver tetrafluoroborate. The non-polar solvent is cyclohexane, toluene or 6-16C aliphatic alkane. The polar solvent is a mixture of water and polar organic solvent. The polar organic solvent is ethylene glycol, dimethyl sulfoxide or dimethylformamide. The reducing agent is 80 %mass hydrazine hydrate solution or tetramethylethylenediamine. The emulsifier (E1) is chosen from Span 20 (RTM: emulsifier), Span 40 (RTM: emulsifier), Span 60 (RTM: emulsifier), Span 60 (RTM: emulsifier), Span 80 (RTM: emulsifier), Tween 20 (RTM: polysorbate-based emulsifier), Tween 40 (RTM: polysorbate-based emulsifier), Tween 60 (RTM: polysorbate-based emulsifier), Tween 80 (RTM: polysorbate-based emulsifier) OP-10-type emulsifier and poly(ethylene/butylene)-polyethylene block copolymer emulsifier. Preferred Process: The noble metal salt-titanium oxide composite nanoparticle dispersion liquid is added into muffle furnace, then heated at 200-500 degrees C, and calcined for 1-24 hour under nitrogen or air atmosphere to obtain anatase-type noble metal-titanium dioxide nano composite particles, or heated at 800-1200 degrees C, and calcined for 1-24 hour under nitrogen or air atmosphere to obtain rutile-type noble metal-titanium dioxide nano composite particles.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Inert atmosphere is nitrogen or argon. Metal is alkali metal, alkaline-earth metal, or rare earth elements, preferably barium metal. Preferred Conditions: Temperature during evaporation of ammonia from silicon substrate is from room temperature to 100 degrees C. Heating temperature of silicon substrate in inert atmosphere is 300-1200 degrees C, preferably 500-750 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The tin-type material is a compound containing metal tin, tin oxide, or tin. The content of tin-type material with respect to 100 wt.% silicon-type mixtures is 50 wt.%. Preferred Process: The vapor deposition material is obtained by mixing tin-type material and silicon-type mixture comprising metallic silicon and silicon oxide, and heating.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The glass powder preferably comprises 25-30 wt.% phosphorus pentoxide, 30-45 wt.% bismuth oxide, 3-5 wt.% boron trioxide, 8-15 wt.% silica, 2-4 wt.% alumina, 2-4 wt.% zinc oxide, 2-4 wt.% manganese dioxide and 2-3 wt.% iron(III) oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred: The susceptor is graphite, tungsten or molybdenum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The doped dielectric layer is provided with a doped silicon oxide layer or a doped silicon nitride layer. The doped dielectric layer is formed on the entire front surface of the silicon substrate, and patterned by selectively removing a phosphosilicate glass (PSG) layer that is formed on the entire front surface during emitter diffusion.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The magnetic material powder is iron powder. Preferred Properties: The density ratio of magnetic material powder is 0.38-0.65. The apparent density of the iron powder is 3-5 g/cm3. The circularity of particles contained in the magnetic material powder is 1-2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The columnar electrode consist of copper molybdenum. The ceramic substrate consist of aluminum, silicon nitride and aluminum silicon carbide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The electrolyte solution contains compound chosen from carbonate ester which has a carbon-carbon double bond, cyclic carbonate which has fluorine atom and sulfone. The carbonate ester is vinylene carbonate. The cyclic carbonate contains a fluoroethylene carbonate. The sulfone contains a sulfolane.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The base material contains a nonwoven fabric containing resin(s) chosen from polyolefin resin and polyester-based resin. The separator further contains 4 parts mass or more binders existing in the inner surface of the base material with respect to 100 parts mass of inorganic particles. The nonwoven fabric membrane contains composite fiber of sheath-core-type, in which sheath portion contains polyolefin resin and core portion contains polyester-based resin. The polyolefin resin contains polypropylene and polyethylene terephthalate.    TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Properties: The separator porosity of 45-70%, and pore diameter of 0.1-1 mu m or 1-10 mu m. The fiber diameter of the composite fiber is 30 mu m or less. The nonwoven fabric membrane has thickness of 10-60 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent is a low hygroscopic organic solvent chosen from ester solvent, ether solvent, carbonate-type solvent, glycol-type solvent, phenol-type solvent and ketone solvent. The solid content of the polyimide is 5 wt.% or more.    TECHNOLOGY FOCUS - POLYMERS - Preparation (Claimed): The polyimide is obtained by heating and imidating a polyamide precursor at less than 150 degrees C. Preferred Composition: The polyimide has structural unit of formula (II). The content of structural unit (I) in the polyimide is 70 mol% or more. Preferred Process: The polyimide film is obtained by coating polyimide varnish on a substrate, drying, and peeling polyimide varnish from substrate. Preferred Properties: The light transmittance of polyimide film at 400 nm is 80% or more, when film thickness is 10 mu m. The total light transmittance of polyimide film is 45% or more, when film thickness is 20 mu m. The total light transmittance of a polyimide film is 70% or more, when film thickness is 10 mu m. EXAMPLE - 0.9607 g 2,2'-Bis(trifluoromethyl)benzidine was dissolved in 11.3 g N,N-dimethylacetamide. 1.8558 g 2,2'-Bis(trifluoromethyl)benzidine powder was added slowly, stirred at room temperature for 96 hours, and polyamic acid having intrinsic viscosity of 1.84 dL/g was obtained as polyimide precursor. The solid content of obtained polyamic-acid solution was diluted to 10 wt.%. 2.8 mL Acetic anhydride and mixed solution of 1.2 mL pyridine were slowly dripped at room temperature to obtained polyamic-acid solution and stirred for 24 hours. The obtained polyimide solution was slowly dripped to lot of methanol, and the polyimide was settled. The obtained white deposit was cleaned with methanol, vacuum-dried at 160 degrees C for 12 hours, and 2.5130 g fibrous polyimide powder was obtained. The obtained polyimide had high molecular weight and intrinsic viscosity of 3.16 dL/g.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The curable epoxy resin composition further comprises hardening agent (C), hardening accelerator (D) and curing catalyst (E).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The dopant consists of optionally substituted pentaarylcyclopentadiene salts. An organic part of the dopant within the organic electron-conducting layer has an oxidation number of -1 to 0. The organic electron-conducting layer is applied to a component using a solvent or sublimation process. The molecular weight of the salts of cyclopentadiene compounds is 175-2000 g/mole. The sublimation process is carried out at a temperature of 120-600 degrees C. The dopant has layer thickness concentration of 0.01-50%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The compound (B) which acts as a Lewis base is chosen from alkali metal oxide, alkali metal hydroxide, alkaline-earth metal oxide, and alkaline-earth metal hydroxide, preferably zinc oxide, potassium oxide, magnesium oxide, calcium oxide, zinc hydroxide, potassium hydroxide, magnesium hydroxide, and calcium hydroxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alicyclic monomer is cycloaliphatic dicarboxylic acid, preferably 1,4-cyclohexandicarboxylic acid. The aliphatic diamine is 1,4-butane diamine, 1,5-pentane diamine, 1,6-hexane diamine, 2-methyl-1,5-pentane diamine, 1,8-octane diamine, 1,9-nonanediamine, 2-methyl-1,8-octane diamine, 1,10-decanediamine, 1,11-undecane diamine and 1,12-dodecane diamine.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: 10% or more total amount of terminal groups of the molecular chain of polyamide and polyamide oligomer are sealed with a terminal blocker. The polyamide and polyamide oligomer contains a structural unit derived from 4-12C aliphatic diamine. The polyamide resin contains 25 mol% or more structural unit derived from 1,4-cyclohexanedicarboxylic acid and structural units derived from aliphatic diamine, preferably 1,9-nonanediamine and/or 2-methyl-1,8-octane diamine, and structural unit derived from lactam and/or aminocarboxylic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal material comprises 30-60 atomic% gallium.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The copper-gallium-type-alloy target comprises alloy material containing copper and gallium, and has oxygen content of 20 ppm or less. Preferred Property: The alloy material has average particle diameter of 500 mu m or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Vinylene diamide alkali metal salt of formula (IV) is reacted with metal tetra-alkoxide of formula: M(OR5)4 and metal tetrachloride of formula: MCl4, to obtain vinylene diamide complex (I).M1=alkali-metal atom, preferably lithium.Preferred Composition: The metal tetrachloride is tetrachloro bis(tetrahydrofuran)zirconium. The organic solvent is alcohol. The film-forming material further contains alcohol. The alcohol is cellosolve, preferably ethylene glycol monomethyl ether. Preferred Definitions:    R1,R4,R5=tert-butyl or tert-pentyl;and    R2,R3=H.    EXAMPLE - 8.39 g N,N'-di-tert-pentyl-1,4-diaza-1,3-butadiene was dissolved in 80 mL tetrahydrofuran, 622 mg lithium was added, stirred at room temperature for 14 hours, solvent was removed under reduced pressure, remaining solid was dissolving in 50 mL toluene, to obtain toluene solution of dilithium(N,N'-di-tert-pentyl-1,2-vinylene diamide). 6.83 g Hafnium tetrachloride was suspended in mixed solvent of 60 mL diethyl ether and 20 mL tetrahydrofuran, 10.05 g tetra-(tert-butoxo)hafnium was added, stirred at room temperature for 14 hours, solvent was removed from reaction solution under reduced pressure, 80 mL toluene was added, cooled to -70 degrees C using dry ice methanol bath, toluene solution of dilithium(N,N'-di-tert-pentyl-1,2-vinylene diamide) was dripped to reaction mixture, stirred at room temperature for 14 hours, solvent was removed under reduced pressure, 100 mL hexane was added, extracted, hexane was removed from extract under reduced pressure, and residue was vacuum-distilled, to obtain 10.83 g di-tert-butyloxo(N,N'-di-tert-pentyl-1,2-vinylene diamide-(K)2N,N')hafnium.
Preferred Definitions:    L1-L8=13 groups chosen from e.g. group of formulae (ix)-(xiii).    SPECIFIC COMPOUNDS - 676 Anthracene derivatives e.g. 2-(4,5-diphenylanthracen-9-yl)-1,10-phenanthroline of formula (Ia), 2-(4,5-bis(naphthalen-2-yl)anthracen-9-yl)-1,10-phenanthroline, 2-(4,5-bis(naphthalen-1-yl)anthracen-9-yl)-1,10-phenanthroline, 2-(4,5-bis(4-phenylphenyl)anthracen-9-yl)-1,10-phenanthroline and 2-(4-(4,5-bis(naphthalen-2-yl)anthracen-9-yl)phenyl)-1,10-phenanthroline are specifically claimed.
TECHNOLOGY FOCUS - POLYMERS - Preparation (Disclosed): The compound (I) is prepared from polyethylene glycol and at least one polyalkoxylated diamine or alkylene triamine using conventional condensation reaction in inert gas atmosphere such as under N2 gas atmosphere. EXAMPLE - About 24 g of poly(ethylene glycol) bis(carboxymethyl) ether 600 with a number average molecular weight of 600 was reacted for 6 hours at 190-200 degrees C with 19 g pentaethylene-hexamine at a molar ratio of 1:1.7 in a round bottom flask with a short glass tube, distillation head, Liebig condenser and receiver flask under constant inert gas supply. Water was distilled out of the flask. The reaction liquid was heated using a condenser and receiver flask at 200 degrees C and 15 mbar. The remaining product was dissolved in water and extracted with ether. The water phase was dried by evaporation to yield a polyamidoamine having a formula: H-(NH-(CH2)2)5NH-(C(O)CH2O(C2H4)11-CH2-C(O)-NH-((CH2)2-NH)5-H. The number average molecular weight was 1050 as determined by SEC.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The vanadium-phosphorus-oxide further contains 0.1-1 wt.% titanium dioxide with respect to total weight of vanadium-phosphorus-oxide. The content of silver and vanadium-phosphorus-oxide are 85-95 wt.% and 0.2-5.5 wt.%, respectively, with respect to total weight of conductive silver paste. The conductive silver paste further contains 0.1-1 wt.% sintering inhibitant titanium resinate or titanium dioxide, with respect to total weight of conductive silver paste.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of silane and ammonia gas is 800:7500. Preferred Properties: The furnace tube has diameter of 380 mm, and length of 2100 mm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step of reforming the low-sulfur-content hydrocarbon fuel is performed after the step of reforming the high-sulfur content hydrocarbon fuel. The step of reforming the low-sulfur-content hydrocarbon fuel is performed both before and after the step of reforming the high-sulfur content hydrocarbon fuel. The method further comprises: providing a carrier for the catalyst; and activating the catalyst by heating the catalyst in hydrogen and/or another reducing gas. The step of providing the catalyst includes providing at least some of the platinum and the ruthenium in the form of a platinum-ruthenium alloy. Preferred Components: The platinum content is a minimum platinum content consistent with the desired level of sulfur resistance. The ruthenium content of the catalytically active materials is 75-99.99 wt.%, and the platinum content of the catalytically active materials is 0.01-25 wt.%. The carrier includes a refractory oxide including at least one of silica, alumina, zirconia or tungsten oxides. The carrier includes mixed refractory oxides having at least two cations. The alumina oxide is stabilized by at least one of baria, ceria, lanthana or magnesia oxides. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The metal is chosen from gold, silver, platinum and their alloys.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The organic solvent is chosen from ( alpha )-terpineol, N-methyl-2-pyrrolidone and propylene carbonate. The usage amount of organic solvent is 0.001-50 parts mass with respect to 100 parts mass of metals. The alkali is a tertiary amine compound or photo base generator. The usage amount of alkali is 0.001-4 parts mass with respect to 100 parts mass of metals.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The aliphatic polycarbonate is obtained by polymerizing epoxide and carbon dioxide. The aliphatic polycarbonate is preferably polyethylene carbonate and polypropylene carbonate. The usage amount of aliphatic polycarbonate is 0.001-10 parts mass with respect to 100 parts mass of metals.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The double salt is potassium pentacalcium nitrate decahydrate, and is a particulate product from the melt (M1) comprising an average chemical composition of 9 wt.% of potassium nitrate (having 1.5-5.5 (preferably 3.5) wt.% of potassium), 70-80 (preferably 74) wt.% of calcium nitrate and 13-18 (preferably 16) wt.% of water. The melt (M1) comprises at least sodium nitrate, potassium nitrate and calcium nitrate in a weight ratio of 30-50:10-20:30-50, preferably 42:15:43, where sum of the weight of calcium nitrate, sodium nitrate and potassium nitrate is 100%. Preferred Method: In the method: 56 wt.% of the double salt, 15 wt.% of the sodium nitrate and 38 wt.% of potassium nitrate are mixed, followed by controlled heating and melting of the resulting mixture, so that the resulting melt comprises calcium nitrate, sodium nitrate and potassium nitrate in a weight ratio of 42:15:43; the double salt, sodium nitrate and potassium nitrate are mixed in a solid particulate form; and the melt (M1) has an operating temperature of 131-560 degrees C. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The manganese element, calcium element and magnesium element are added as co-catalyst. The molar ratio (M/P) molar amount of elemental phosphorus (P) and sum (M) of 0.5 molar times the molar amount of alkali metal element is 1-1.2.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polyethylene terephthalate composition further comprises 0.8-1.5 wt.% diethylene glycol, preferably 0.8-1 wt.%. Preferred Process: The ethylene glycol solution containing alkali metal phosphate compound is mixed with terephthalic acid, and is added with speed of 3 m/second or more, stirred at speed of 30 m/second or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The element of the heat source is made of silicon carbide.    TECHNOLOGY FOCUS - METALLURGY - The element of the heat source is made of molybdenum and tungsten.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The composition further contains organosilicon compound (E) of formula: R6O-Si((-R8)(-R9)-O-)n-R7. The content of components (A)-(E) is 3-300 parts mass, 0.1-150 parts mass, 100 parts mass 0.1-10 parts mass and 10-400 parts mass, respectively.R6,R7=H or 1-4C alkyl;R8=aryl;R9=aryl or 1-4C alkoxy;andn=1-10.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The first dopant is boron and the second dopant is phosphorus. The phosphorus dopant source is selected from the phosphoryl trichloride and phosphine. The boron dopant source is selected from the group consisting of boron tri-bromide, boron trichloride and diborane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The glass material additionally comprises silver(I) oxide, nickel(II) oxide, antimony trioxide, titanium dioxide, molybdenum trioxide, vanadium pentoxide, boron trioxide, tungsten trioxide, cerium(IV) oxide, manganese dioxide, copper(II) oxide, cobalt(II) oxide or chromium(III) oxide. The glass material is a glass ceramic whose crystalline portion comprises lithium phosphate. The metal comprises silver, aluminum, gold, platinum, palladium, nickel, copper and/or their alloys. The glass material exhibits a transformation temperature of less than 450 degrees C. The substrate comprises a semiconductor material based on silicon. The solder paste further comprises at least one inorganic- or organic solvent and/or binder. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic phosphor includes europium-doped strontium aluminate (Sr4Al14O25:Eu), europium-doped barium magnesium aluminate (BaMg2Al16O27:Eu), manganese, europium-doped strontium aluminate (SrAl2O4:Eu), europium-doped barium, strontium silicon tetraoxide ((Ba, Sr)SiO4:Eu), europium-doped strontium, barium silicon tetraoxide ((Ba, Sr)SiO4:Eu), yttrium aluminum garnet doped with cerium (YAG:Ce), europium-doped strontium borate (Sr3B2O6:Eu), europium-doped strontium, barium silicon nitride ((Sr, Ba)2Si5N8:Eu), europium-doped strontium, calcium aluminum nitride ((Sr, Ca)SiAlN3:Eu), metal doped yttrium(III) oxide (Y2O3:(Er, Yb, Tm, Ho, Sm)), metal doped gadolinium(III) oxide (Gd2O3:(Er, Yb, Sm)), metal doped yttrium orthoaluminate (YAlO3:(Er, Pr)), metal doped yttrium-aluminum-garnet (Y3Al5O12:(Er, Yb)), metal doped strontium titanate (SrTiO3:(Er, Yb)), metal doped zirconium dioxide (ZrO 2:(Er, Yb)), metal doped tungsten oxide (KYb(WO4)2:(Tb3+, Yb3+)), metal doped yttrium phosphate (YPO4:(Tb3+, Yb3+)), metal doped gadolinium borate (GdBO3:(Tb3+,Yb3+)), metal doped gadolinium aluminum borate (GdAl3(BO3)4:(Tb3+, Yb3+)), metal doped aluminum garnet (Y3Al3O12:(Tb3+, Yb3+), Y3Al3O12:(Pr3+, Yb3+)). The coatings are produced by aerosol deposition of inorganic phosphor, and have an optically effective structure, preferably a lens array.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The etching step comprises: primary etching the polycrystalline silicon with hydrofluoric acid and nitric acid; washing the etched polycrystalline silicon using water; and mixing sodium hydroxide in the polycrystalline silicon and then secondary etching using hydrochloric acid. The primary etching step is carried out for 0.5-5 minutes, preferably 2 minutes. The washing step is performed using water for 1-3 minutes. The mixing step is carried out for 3-50 minutes, preferably 20 minutes. The secondary etching step is carried out for 10-300 seconds, preferably 30 seconds. Preferred Components: A mass ratio of the hydrofluoric acid and nitric acid is 1:100-100:1, preferably 1:5. A mass ratio of the sodium hydroxide in the polycrystalline silicon is 1:100, preferably 1:50. A ratio of the hydrochloric acid added in the secondary etching step is 1:10-1:1000, preferably 1:100.
TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The method (M1) further comprises delaminating the encapsulated coating from the substrate to form a free standing film. The substrate, porous coating and/or laminating material is patterned. The method (M1) comprises depositing the many bilayers in a layer-by-layer fashion and drying the porous coating prior to applying the hardening material. The method (M2) comprises depositing the hardening material on the porous coating after the predetermined period of time and hardening the hardening material. Preferred Components: The hardened hardening material: permeates to a depth of less than 50 nm below the surface of the porous coating; and is a transparent, semi-transparent, or opaque solid material. The hardening material: permeates through the open pore structure of the porous coating to contact the substrate; and is a polymer, a crosslinkable polymer, a polymerizable monomer and/or adhesive. An adhesion promoter is present on the surface of the porous coating prior to applying the hardening material. The bilayer comprises a pair of complementary materials capable of forming a chemical bond. The particles further comprise a hardened hardening material that is at least partially disposed within the porous structure of the first material. The article comprises a laminating material disposed between the first substrate and the porous coating. EXAMPLE - 7-Film quarter wavelength optical thickness porous film was deposited onto polycarbonate. UV-curable optical hardcoat formulation (comprised of mixture of 1,6-hexanediol diacrylate, ethoxylated trimethylolpropane triacrylate, tetrafunctional oligoether acrylate and Irgacure 184 (RTM: 1-Hydroxycyclohexyl phenyl ketone) was rod-coated onto the porous film. The encapsulated porous film was exposed to UV radiation under nitrogen blanket to obtain abrasion resistant encapsulated porous film.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Property: The anti-reflective layer has thickness of 90-120 nm.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The metal compound having polyvalent metal ion is added to the etching solution. Preferred Composition: The polyvalent metal ion is chosen from aluminum, lanthanum, boron, calcium, magnesium, barium, nickel, cobalt, copper and zinc. The hydroxide or fluoride compound includes boric acid or potassium fluoride. The metal compound is chosen from aluminum sulfate, lanthanum nitrate, orthoboric acid, aluminum chloride, calcium chloride, magnesium sulfate, barium chloride, nickel chloride, cobalt chloride, zinc chloride and copper chloride.
TECHNOLOGY FOCUS - POLYMERS - Preparation (disclosed): Fused aromatic compound of formula (Ia), carbazole derivative of formula (Ib) and biphenyl derivative of formula (Ic) are polymerized, to obtain high-molecular compound.p,q=0-3;Y'=I, Br, Cl, OSO2(C6H4)CH3;andY"=boronic acid or boronate ester. EXAMPLE - 2.570 g 2,2'-(9,9-Dioctyl-9H-fluorene-2,7-diyl)bis(4,4,5,5-tetramethyl-1,3,2-dioxaborane), 1.604 g 9-(3,5-dibromophenyl)-9H-carbazole and 1.8 mg palladium acetate, 9.7 mg tris(2-methylphenyl)phosphine, 2.764 g potassium carbonate, 9 mL toluene, 36 mL 1,4-dioxane and 7.6 mL pure water were mixed, polymerized by heating at 100 degrees C for 12 hours, 100 mL toluene was added, aqueous layer was removed, organic layer was washed with 50 mL pure water, filtered, 50 g toluene was added, organic layer was concentrated, dried, reprecipitated with 500 mL methanol, filtered and drying, to obtain polymer having molecular weight distribution of 13.3.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The electron beam curable resin composition contains an optical stabilizer and a mold release agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The non-noble metal salt is inorganic salt or organic salt, metal salt or iron element. The non-noble metal salt is ferrous sulfate, ferric nitrate, ferric chloride, iron porphyrin, dicyclopentadienyl iron, phthalocyanine iron, acetate, cobalt sulfate, cerium nitrate, sodium tungstate, ammonium vanadate, nickel sulfate and/or acid amide. The oxidant is hydrogen peroxide, iron chloride (FeCl3), potassium permanganate, sodium hypochlorite or ammonium sulfate. The carbon carrier is carbon black, mesoporous carbon, graphite, nanometer carbon fiber, carbon nanometer microsphere or carbon nano-tube.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The metal is transition metal such as cobalt, cerium, tungsten, vanadium and nickel.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The catalyst further comprises organic strong acid. The organic strong acid is p-toluenesulfonic acid, methanesulfonic acid and/or benzene sulfonic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): The naphtho-bis-thiadiazole derivative is manufactured by carrying out condensation reaction of tetracyclic compound of formula (II) with secondary amine in the presence of palladium complex or copper as catalyst.X,X'=halo. Preferred Definitions:    NY,NY'=carbazolyl or phenoxazinyl.    SPECIFIC COMPOUNDS - 2 Naphtho-bis-thiadiazole derivatives e.g. 4,9-dicarbazole naphtho(1,2-c:5,6-c')bis(1,2,5)thiadiazole of formula (III) and 4,9-diphenoxazinyl naphtho(1,2-c:5,6-c')bis(1,2,5)thiadiazole are disclosed.    EXAMPLE - 0.26 g 4,9-Dibromo naphtho(1,2-c:5,6-c')bis(1,2,5)thiadiazole, 0.32 g carbazole, 0.27 g potassium carbonate, and 0.025 g copper iodide were suspended in 26 g nitrobenzene under argon atmosphere, to prepare a suspension. The prepared suspension was refluxed for 8 hours, and reacted. The reacted mixture was cooled to room temperature, and filtered. A methanol was added into the mixture and stirred. The mixture was washed using hydrochloric acid, water, and methanol. The washed mixture was dried and crystallized, to obtain the 4,9-dicarbazole naphtho(1,2-c:5,6-c')bis(1,2,5)thiadiazole, with yield of 78.5% and purity of 99.9%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silver salt is hexafluoro silver antimonite and/or silver carbonate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Brominated fullerene, and methanol or ethanol are reacted in the presence of a silver salt and an organic solvent, to obtain fullerene derivative (I). Preferred Composition: The brominated fullerene is of formula (III). The organic solvent is chlorobenzene, dichlorobenzene, chloroform and/or tetrachloroethane. The fullerene derivative (I) is octamethoxy fullerene of formula (IV) or octaethoxy fullerene of formula (V). EXAMPLE - 30.5 mg Octabromo fullerene dibromide and 0.5 ml methanol were added to 50 ml chlorobenzene, and stirred. 300 mg hexafluoro silver antimonite was added to the obtained mixture, and stirred for 2 hours and reacted at 25 degrees C. The obtained solution was suction-filtered, washed for 3 times with sodium bicarbonate aqueous solution, washed with 50 ml water, and organic layer was solvent-removed by the evaporator. The obtained reaction product was purified by chloroform as solvent, to obtain 2.6 mg octamethoxy fullerene in the form of reddish brown solid with yield of 14 mol%.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Thermoplastic resin in P1 layer is polyamide-type resin. Thermoplastic resin in P3 layer is polyolefin resin. P1 layer is located on surface layer of laminated sheet, and P3 layer is located on surface layer opposite to P1 layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: 0.012 g or 0.014 g Cerium oxide and 0.038 g or 0.036 g carbon black are dissolved in 30 mL mixed solution of ethylene glycol and isopropyl alcohol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The layer comprises silicon nitride. The metal features comprise molybdenum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The III-V material is chosen from gallium arsenide, aluminum-gallium arsenide, gallium-indium arsenide, aluminum-gallium-indium arsenide, indium phosphide, gallium phosphide, gallium-indium phosphide, gallium-indium-phosphorus-arsenide, aluminum-indium phosphide, aluminum-gallium-indium phosphide, indium arsenide, indium-phosphorus arsenide, aluminum-indium arsenide, aluminum arsenide, gallium-tin composite, gallium-arsenic antimonide, indium antimonide, gallium-indium-arsenic antimonide, gallium-indium-nitrogen arsenide, gallium nitride, aluminum nitride, indium nitride, gallium-indium nitride, aluminum-gallium nitride, aluminum-indium nitride, aluminum-gallium-indium nitride and/or gallium-indium-nitrogen-arsenic antimonide. The window layer (B) further contains material (b3) chosen from germanium, silicon, silicon-germanium, carbon-germanium, germanium-tin, silicon-germanium-tin and carbon-silicon-germanium-tin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Wiring is metal wiring formed with the electroconductive paste, preferably metal copper and/or metal silver.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The composition further contains alcohol. The amine is monoethanolamine, N-ethylethanolamine, N,N-dimethylethanolamine, diethanolamine, triethanolamine, N-methyldiethanolamine, aminoethyl ethanolamine, N,N,N'-trimethylaminoethyl ethanolamine, N-(2-hydroxyethyl)morpholine, N-(2-hydroxyethyl)piperazine and/or N-methyl-N'-(2-hydroxyethyl)piperazine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The single crystal group IV material film has crystal lattice optionally matched to the rare earth structure. The single crystal group IV material film consists of layer(s) comprising germanium-tin compound with tin being graded through the layer. The rare earth structure comprises rare earth oxide. The single crystal group IV material film consists of layer(s) comprising silicon-germanium-tin compound, germanium-tin compound and/or germanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The hardness of shape retention layer is 0.01-0.1 GPa. The hardness of contact bonding layer is 0.1-2GPa. The thickness of the contact bonding layer is 0.01-2 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The shape retention layer contains crosslinking adjuvant.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The panel, in which the metallic particle is the silver nano particle, and the nanowires are silicon.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The silane coupling agent is present in an amount of 0.1-10 pts. wt. The heating medium is a diphenyl ether/biphenyl mixture. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The photosensitive resin (A) (meth)acryloylized with amine catalyst is resin obtained by reacting a polybasic acid or a polybasic acid anhydride with respect to the epoxy (meth)acrylate obtained by reacting epoxy group and radically polymerizable unsaturated monocarboxylic acid of polyfunctional epoxy resin under an amine catalyst.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The components are sealed with each other by the film. The first- and the second components comprise components of a battery, preferably a lithium-ion battery, or components of a fuel cell. At least one of the components is an electrode. At least one of the components is formed from a metallic material. At least one of the components is formed as a bipolar element, preferably a bipolar plate. The energy beam comprises laser beam.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The film comprises a plastic film, preferably a thermoplastic film. At least one of the components is formed from plastic, preferably fiber-reinforced plastic. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The amine is alkanolamine, preferably ethanolamine, more preferably monoethanolamine, N-methyl ethanolamine, N,N-dimethylethanolamine, diethanolamine, triethanolamine, N-methyldiethanolamine, amino ethyl ethanolamine, N,N,N'-trimethylamino ethyl ethanolamine, N-(2-hydroxyethyl) morpholine, N-(2-hydroxyethyl) piperazine and/or N-methyl-N'-2-(hydroxyethyl) piperazine. The composition further contains alcohol.
TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): The phthalocyanine-substituted cellulose is obtained by reacting azide compound of formula (VI) and phthalocyanine-type compound of formula (VII). A carboxyl group-containing compound of formula: Y'-C(=O)-C(-W1)(-W2)-(CH2)n-X and cellulose fiber are reacted, and obtained compound reacts with azide compound (VI). The resultant product is reacted with phthalocyanine-type compound (VII). Preferred Process: Cellulose is obtained by subjecting cellulose fiber as raw material to machine entanglement process and/or chemical entanglement process. EXAMPLE - 55 mg Azide compound of formula (VIII) and 171 mg zinc phthalocyanine compound of formula (IX) were dispersed to N-methylpyrrolidone (20 ml) under nitrogen atmosphere, and copper (I) bromide (62 mg) was added and stirred at room temperature for 24 hours. Then, the reaction mixture was centrifuged using N-methylpyrrolidone as solvent, and 6 g phthalocyanine substituted cellulose of formula (X) was obtained.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The propylene/( alpha )-olefin copolymer has density of 0.86-0.89 g/cm3 where content of ( alpha )-olefin is 5-20 wt.%, and is polymerized using metallocene catalyst. The ethylene/( alpha )-olefin copolymer has density of 0.86-0.91 g/cm3, and is polymerized using metallocene catalyst.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catalysts include copper(I) compound and copper(II) compound, which are promoted with tin, zinc, phosphorus and antimony, and copper(II) chloride with zinc as promoter.
TECHNOLOGY FOCUS - POLYMERS - A protective layer includes a PTFE membrane. A porous region is formed of PTFE.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The base film contains polyetherimide resin, polyphenylene sulfide resin, polyethersulfone resin, polyethylene naphthalate resin, and a transparent polyimide resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Off-gas introduced to carbon dioxide separation part contains 35-45 vol.% carbon dioxide. After carbon dioxide separation, amount of carbon dioxide contained in off-gas is reduced to 5-15 vol.%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Source gas contains greater than or equal to 85 vol.% methane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The non-conducting substance is comprised of silicon oxide film, silicon nitride film or metal oxide layer. The nitride semiconductor layers are comprised of Indium-aluminum-gallium layer, doping gallium nitride layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation given. Preferred Compound: Compound (I) is preferably of formula (II) or (III).L'a,L'b=single bond or bivalent coupling group, preferably -(CR'2)n-, -C(-R')=C(-R')-, -CC-, -O-, -S-, -C(=O)-, -C(=O)-O-, -O-C(=O)-, -SO2-, or group of formula (i), (ii) or (iii);R'a,R'b=2C or more alkyl, oligoethyleneoxy having two or more ethyleneoxy units, or oligosiloxane having two or more silicon atoms, preferably 6-12C linear alkyl;R'c,R'd=substituent, preferably 6-12C linear alkyl;nc,nd=0-5;n=1 or more;m=4;o=2;andR'=H or substituent. EXAMPLE - 1.99 g 3-(2,5-difluoro-4-(3-hydroxy-2-naphthyl)phenyl)-2-naphthol, 1.66 g potassium carbonate, and 30 mL dehydrated N-methylpyrrolidone (NMP) were mix-stirred for 1 hour at 170 degrees C in nitrogen atmosphere. After cooling the reaction liquid to room temperature, the solid content was filtered and washed with NMP, pure water, and acetone. The obtained powder was washed with ethyl acetate, to obtain 2.43 g 14,28-dioxaheptacyclo(15.11.0.03,15.04,13.06,11.018,27.020,25)octacosa-1,3(15),4(13),5,7,9,11,16,18(27),19,21,23,25-tridecaene as a pale yellow powder with a yield of 87%. The obtained compound had excellent FET characteristics, such as carrier mobility and threshold voltage.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The method further involves adding a chelating agent to form a complex with the metal organic precursor. Preferred Composition: The precursor of copper is copper acetylacetonate. The precursor of indium is indium acetylacetonate. The precursor of gallium is gallium acetylacetonate. The solvent is ketone compound. The molar ratio of precursor of copper, precursor of gallium and precursor of indium is 1:0.5-2:0-2. The ketone compound is chosen from acetyl acetone, acetone, methyl acetylacetate, tert-butyl acetoacetate and ethyl-2-methylacetoacetate. The chelating agent is chosen from mono-alkylamine of formula: RNH2 (I), dialkylamine of formula: R1R2NH (II), trialkylamine of formula: R1R2R3N (III), diamine of formula: R1R2N-R'-NR3R4 (IV), monoalcohol amine of formula: RNH2OH (V), dialcohol amine of formula: (R1OH)(R2OH)NH (VI) and trialcohol amine of formula: (R1OH)(R2OH)(R3OH)N (VII).R,R1,R2,R3=1-8C alkyl;andR',R1-R4=H or 1-8C alkyl.Preferred Condition: The heat treatment is performed at 100-400 degrees C under reducing gas atmosphere.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic coating is an oxide, nitride or carbide. The oxide is silicon oxide and hydrogenated silicon-oxynitride. The nitride is titanium nitride, silicon nitride and silicon-oxynitride layer. The carbide is silicon carbide and diamond. The gas is oxygen, argon, fluorine, neon, krypton and nitrogen.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The transparent substrate material is polyethylene terephthalate, protactinium, polypropylene, polyethylene and polyethylene naphthalate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The aluminum oxide thin film is a uniform compact material having thickness of 30-100 nm and thickness uniformity deviation of less than 3% with a step coverage high aspect ratio of more than 100:1. The aluminum oxide thin film is a high permeability membrane with an average transmission rate of more than 80%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content ratio of carbon fiber, graphitized additive and metal particles is 100:0.5:10:5:60. The transition metal is platinum, rhodium, palladium, gold, silver, copper, manganese or iron. The graphitized additive is carbon material or reduced state carbon material. Carbon nano-fiber, metal precursor and reducing agent are used during preparation of carbon fiber-loaded metal catalyst. The mass ratio of carbon nano-fiber and metal precursor is 100:10-100:60.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The reducing agent is sodium borohydride, ethylene glycol or methanol.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Method: The semiconductor wafer is fabricated from silicon and/or, germanium or monocrystalline silicon and/or polycrystalline silicon. The wafer is heated to the etching temperature before or after the first etching composition is applied to the first surface of the semiconductor wafer. The first etching composition is heated to the etching temperature after the first etching composition is applied to the first surface of the semiconductor wafer. The etching temperature is 60-200 degrees C, preferably 80-150 degrees C. The step of applying the first etching composition is performed by spray coating, spin coating, screen printing or a scraper. The additive forms an oxide mask on the first surface of the semiconductor wafer at the etching temperature. The method further comprises: applying a second etching composition to a second surface of the semiconductor wafer; and etching the semiconductor wafer at 60-200 degrees C, where the second etching composition comprises the base and alcohol.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The base comprises sodium hydroxide, potassium hydroxide and/or potassium carbonate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alcohol comprises ethylene glycol, diethylene glycol, glycerol and/or triethylene glycol. EXAMPLE - Typical etching composition comprised of: 10 wt.% potassium hydroxide; 80 wt.% ethylene glycol; 5 wt.% boric acid; and 5 wt.% water.
TECHNOLOGY FOCUS - POLYMERS - Preferred Articles: The article further comprises at least one second layer disposed on the first layer, where the second layer comprises a network of silver nanowires dispersed within at least one polymer binder. Preferred Method: The method further involves applying at least one second coating mixture onto the first coated layer, where the second coating mixture comprising silver nanowires and at least one polymer binder. In the method, the steps of applying the first coating mixture and the applying the second coating mixture occur simultaneously. Preferred Components: The polymer binder comprises an organic solvent soluble polymer. The organic solvent soluble polymer binder comprises cellulose acetate, cellulose acetate butyrate, and/or cellulose acetate propionate. Preferred Definitions:    R1-R4=H, halo, hydroxyl, 1-6C alkyl, 6C aryl, 1-6C alkoxy;or    R1 and R2, or R2 and R3, or R3 and R4 are joined together with 4 carbon atoms=fused benzo ring.    SPECIFIC COMPOUNDS - Use of 25 compounds are specified as the 1,2-diazine compound (Q1), e.g. 6-sec-butyl-phthalazine (Ia), phthalazine, phthalazine-6-carboxylic acid, 6-butyl-2H-pyridazin-3-one, 4-(4-Oxo-3,4-dihydro-phthalazin-1-yl)-benzoic acid.    EXAMPLE - No suitable example is given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The multi layer structure comprises (Cu/In1-aGaa)l/Se1-y-zSyTez (where a is less than 0.7, y and z is 0 or 1, and l is less than 100). At least one layer of the multilayer structure comprises up to approximately 20 atomic % of at least one of the following elements: Al, Si, Ti, V, Zn, Ga, Zr, Nb, Mo, Ru, Pd, In, Sn, Ta, W, Re, Ir, Pt, Au, Pb, or Bi. The film layer is annealed in the presence of H2S and/or H2Se. The film layer is doped with at least one Na, P, K, N, B, As, or Sb.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The oxide phase comprises crystal phase of titanium dioxide, indium(III) trioxide and/or zinc oxide. The dual phase structure thin material is of formula: (InSb)100-x-yTixOy.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The buffer substrate is made of glass and gallium nitride. The transparent conducting oxides thin film is made of indium tin oxide, indium gallium zinc oxide, indium zinc oxide, indium zinc tin oxide, zinc oxide and indium oxide.    TECHNOLOGY FOCUS - POLYMERS - The buffer layer is made of silicone compound, epoxy resin, synthetic resin and phenoxy resin. The synthetic resin substrate is made of polycarbonate, polyethylene terephthalate, polystyrene, propidium iodide and polyethylene.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Composition: Electrical component comprising material forms an array of field emitter tips being arranged as cathode at one end of vacuum tube. The vacuum tube comprises an anode and an extractor, and further comprises at least one accelerator dynode.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The he insulating material is oxide, oxy-nitride, nitride or semiconductor material. Preferred Property: The distance between insulating material and nano crystals is 2 nm or less. Preferred Process: During manufacture process, the deposition system has computer controlled inorganic molecule and metallic precursor molecules (61, 62, 67) gas supply system.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The glass substrate has glass transition point temperature of 640 degrees C or more, average coefficient of thermal expansion of 70x 10-7-90x 10-7/ degrees C, and density of 2.75 g/cm3 or less. Preferred Composition: The glass substrate preferably contains 8.5-14.5 %mass aluminum oxide, 3-10 %mass calcium oxide, 2 %mass or less barium oxide, and 4-7 %mass sodium oxide. The sum of total amount of magnesium oxide, calcium oxide, strontium oxide, and barium oxide contained in the glass substrate is preferably 17-23 %mass.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The process of peeling of organic polymer thin film from the base material is carried out to obtain self-supportive film. The transmission electron microscope observation of cross-section of thin film is carried out after osmium staining process. The surface structure of the thin film and orientation analysis of the thin film are observed with respect to cross section of thin film from irradiation surface to non-irradiation surface of thin film. The surface structure of the thin is analyzed by atomic force microscope and energy dispersion X-ray analysis. The orientation of thin film is analyzed by ultra-fine angle X-ray diffraction. Preferred Composition: The organic polymer thin film comprises raw material compound containing compound (a) having hydrophilic functional group chosen from hydroxyl group, carboxyl group and group containing polyalkylene glycol chain in a molecule, and compound (b) having polymerization activity group chosen from double bond between carbon-carbon, double bond between carbon-nitrogen and double bond between carbon-oxygen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of nanoparticle includes preparing a metal seed, and mixing the metal seed, a metal shell precursor, shell reducing agent, a seed reducing agent and anionic ligand under a growing solution. Preferred Components: The metal seed is made of gold or silver. The anionic ligand includes 3-5 carboxylic acid groups, and includes sodium citrate, ethylenediaminetetraacetic acid, and diethylene tetramine penta-acetic acid. The metal shell is made of gold, silver, palladium, platinum, nickel, copper and/or zinc. The metal seed has an average diameter of 1-3 nm. The metal particle is allogenic metal particle or hetero-metal particle. The precursor is silver nitrate, silver acetate, silver lactate, silver tetrafluoroborate, silver hexafluorophosphate, silver triflate, silver perchlorate, silver sulfate, gold (III) chloride, chloroauric acid and/or tetrabromoauric acid. The reducing agent is tetrakis hydroxymethyl phosphonium chloride, and the shell reducing agent is formaldehyde and/or ascorbic acid. The nanoparticle has a diameter of 2-100 nm. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: A pressurization inert gas is pumped to a vaporizer. Preferred Composition: The content of metallic element in cyclohexasilane package is 10 ppm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The density of area (1B) is higher than the density of layer (b) by 1-7 g/cm3. The density of area (1B) is less than the density of area (1A) by 0.2-4 g/cm3. The layer (a) is a layer having a zinc compound as main component. The area (1A) has coexistence phase of zinc oxide-silicon dioxide-aluminum oxide or coexistence phase of zinc sulfide and silicon dioxide. The density of area (1A) is 3.5-7 g/cm3. The density of area (1B) is 2.7-5.8 g/cm3. The density of layer (b) is 2-4 g/cm3. Preferred Composition: The coexistence phase of zinc oxide-silicon dioxide-aluminum oxide of area (IA) contains 20-40 atomic% zinc, 5-20 atomic% silicon, 0.5-5 atomic% aluminum and 35-70 atomic% oxygen, measured by inductively coupled plasma emission spectrochemical analysis. The coexistence phase of zinc sulfide and silicon dioxide of area (1A) contains 0.7-0.9 mol zinc sulfide with respect to total content of zinc sulfide and silicon dioxide. Preferred Layer: The gas-barrier film further has a crosslinked resin layer having pencil hardness of more than H, surface free energy of 45 mN/m or less, average surface roughness (Ra) of 1 nm or less, between polymer film base material and gas barrier layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): Naphthalene compound of formula (III) and carbonyl group-containing compound of formula (IV) are reacted in presence of solvent, to obtain perylene compound (I) or (II). Preferred Composition: The perylene compound (I) or (II) is a compound of formula (IIa) or (IIb).Z2=hydroxy, or alkoxy, preferably 6-18C alkoxy. EXAMPLE - Potassium t-butoxide (18 mmol) and 1,5-diazabicyclo(4.3.0)non-5-ene (24 mmol) were added to 30 mL round bottomed flask, and stirred using stirrer coated with polytetrafluoroethylene under nitrogen atmosphere for 1 hour. (6,7-benzo-(2-n-hexyloxy-benz) anthrone) was added and stirred at 170 degrees C for 3 hours. The reaction liquid was cooled to room temperature, filtered and washed by diethylene glycol and dimethyl ether. The resulting mixture was washed with water, acetone and dichlormethane and dried under reduced pressure at 120 degrees C for 6 hours, to obtain 22-(hexyloxy)-42-methoxyundecacyclo(22.14.2.22,5.03,20.04,17.06,15.08,13.021,39.025,34.027,32.036,40)dotetraconta-1(38),2,4,6(15),7,9,11,13,17,19,21(39),22,24(40),25(34),26,28,30,32,36,41-icosaene-16,35-dione.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): A compound containing metal (M) is contacted with nitrogen-containing compound of formula (II).X=F, CI, Br, I, PF6 or BF4. SPECIFIC COMPOUNDS - 602 Metal-carbene complexes e.g. 3,5,10'-trimethyl-2,6-dioxa-1',10'-diaza-1-platinaspiro(cyclohexane-1,8'-tetracyclo(7.7.0.02,7.011,16)hexadecan)-2,2',4,4',6',11'(16'),12',14'-octaene of formula (Ia), 3,5-dimethyl-10'-(propan-2-yl)-2,6-dioxa-1',10'-diaza-1-platinaspiro(cyclohexane-1,8'-tetracyclo(7.7.0.02,7.011,16)hexadecan)-2,2',4,4',6',11'(16'),12',14'-octaene-5'-carbonitrile, 3,5-dimethyl-10'-phenyl-2,6-dioxa-1',10'-diaza-1-platinaspiro(cyclohexane-1,8'-tetracyclo(7.7.0.02,7.011,16)hexadecan)-2,2',4,4',6',11'(16'),12',14'-octaene, 3,5-di-tert-butyl-10'-phenyl-2,6-dioxa-1',10'-diaza-1-platinaspiro(cyclohexane-1,8'-tetracyclo(7.7.0.02,7.011,16)hexadecan)-2,2',4,4',6',11'(16'),12',14'-octaene and 3,5,10'-triphenyl-2,6-dioxa-1',10'-diaza-1-platinaspiro(cyclohexane-1,8'-tetracyclo(7.7.0.02,7.011,16)hexadecan)-2,2',4,4',6',11'(16'),12',14'-octaene are disclosed.    EXAMPLE - 269 g 1-Phenyl-3-methyl-1H-benzo(d)imidazolium iodide was reacted with 0.33 ml acetylacetone, to obtain metal-carbene complex.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The concentration of polyvinyl alcohol is 8 wt.%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Zinc oxide seed precursor is zinc acetate dihydrate as the reaction precursor, monoethanolamine as stabilizer, 2-methoxyethanol as solvent, and polyethylene glycol-4000 (PEG4000) as surfactant. The substrate is a conductor or an insulator. The substrate is copper chip, conductive glass or slide. Preferred Method: In the method of coating zinc oxide seed precursor on the substrate to form a thin film, a spin coater is used for spin coating plating film. The temperature in hot processing is 350-500 degrees C, and the time is 2 hours. The temperature of water bath is 20-50 degrees C, and the water bath time is 1-12 hours.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Conditions: Fluorine radical or trifluoromethyl is substituted to 1-5 benzene ring at ortho, meta and para positions.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: During formation of molded product, the injection molding is carried out at 260-340 degrees C at injection speed of 100-5000 mm/second. Preferred Composition: The content of (meth)acrylate copolymer (B) is 15-45 parts mass with respect to 100 parts mass polycarbonate resin (A). The content of polycarbonate resin (a1) in polycarbonate resin (A) is 80 %mass or more. In resin composition, the polycarbonate resin (A) further contains resin (a2) having phenyl acetate group-having structural unit of formula (II). The resin composition comprises 60-90 %mass polycarbonate resin (A) containing resin (a1) having phenyl acetate group-having structural unit (I), and 40-10 %mass polycarbonate resin (A) containing resin (a2) having phenyl acetate group-having structural unit (II).X=formula (i) or (ii);R1,R2=H or methyl;andZ+C=optionally substituted 6-12C aliphatic hydrocarbyl.Preferred Properties: The mass mean molecular weight of (meth)acrylate copolymer (B) is 5000-30000. The viscosity average molecular weight of polycarbonate resin (a1) having phenyl acetate group-having structural unit (I) and polycarbonate resin (a2) having phenyl acetate group-having structural unit (II) is 15000-35000 and 10000-28000, respectively.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The moisture and dust impurities of the byproduct gas are removed by heating in a furnace at 300-800 degrees C under reducing atmosphere. The moisture and dust impurities are removed by supplying the byproduct gas with a compression of 2-30 barg in a pressure swing adsorption tower. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): Isocyanate is reacted with 3,4-dihydroxy-2,5-dicarboxylic acid in presence of tertiary amine and basic inert solvent, to obtain 3,4-bis(carbamoyloxy)thiophene. Preferred Composition: The content of repeating unit (a) and repeating unit (b) is 0.01-25 mol% and 99.99-75 mol%, respectively. The thiophene monomer is 3,4-ethylene dioxythiophene. Preferred Definitions:    R1,R2=ethyl;    R3-R8=H or 3-methyl;and    or R4+R5,R7+R8=naphthalene ring with phenyl.    EXAMPLE - 0.5 g 3,4-dihydroxy-2,5-dicarboxylic acid thiophene and 4.8 g pyridine were added to 100 ml four neck flask under nitrogen atmosphere, heating at 100 degrees C in an oil bath, decarboxylated, and cooled to 4 degrees C. Then, 0.5 g ethyl isocyanate was added for more than 30 minutes, 0.7 g triethylamine was added to mixture at 6 degrees C or less, stirred for 16 hours, returned to room temperature, concentrated, diethyl ether was extracted, and water washed. The organic layer was concentrated at 55 degrees C or less, to obtain 0.5 g white solid of 3,4-bis(N-ethyl carbamoyl oxy)thiophene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The primary particle of indium oxide powder and zinc oxide powder is 0.3-1.5 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The portion of surface of aluminum base material is aluminum brazing filler metal. The central-line average roughness of aluminum material surface having composite-plating film is larger than the surface of aluminum material before the composite-plating film formation. Preferred Process: At least one portion of heat exchanger formed with aluminum material is processed by surface treatment method of aluminum material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Device: The BODIPY derivative (I) is selected from formulas (1-23).R=an optionally substituted monocyclic aryl or heteroaryl group and an optionally substituted 6-24C multicyclic aryl or heteroaryl group.The device further comprises at least one donor material and at least one acceptor material, where one of the donor and acceptor materials comprises the BODIPY derivative (I). The acceptor material comprises C60 (fullerene). The donor material comprises phthalocyanine (CuPc). The donor material and the acceptor material form a donor-acceptor heterojunction. The donor material and the acceptor material form a lamellar structure, and where the donor layer has a thickness of 1-150 nm. The thickness of the donor layer ranges from 20-80 nm. Preferred Method: In making the organic photosensitive optoelectronic device, the photoactive region comprises at least one donor material and at least one acceptor material, where one of the donor and acceptor materials comprises the BODIPY derivative (I). Deposition of the photoactive region comprises depositing the BODIPY derivative (I) over a substrate using a technique chosen from spin casting and vapor deposition. Preferred Definitions:    R1=optionally substituted benzene and optionally substituted fused benzene;    R2 and R3, and R6 and R7=taken together with any intervening atoms, both comprise a group chosen from an optionally substituted monocyclic group and an optionally substituted 6-24C multicyclic group;    R3 and R4, and R5 and R6=taken together with any intervening atoms, both comprise a group chosen from an optionally substituted monocyclic group and an optionally substituted 6-24C multicyclic group;    R2, R3, R4, R5, R6, and R7=H, an alkyl group, and a CN group; and    R=formulas (i-ix).    R'=H, alkyl, and aryl or heteroaryl groups.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Platinum content of core-shell structured composite material is 5-30 wt.%. Hydrogen-rich atmosphere comprises carbon monoxide (CO):hydrogen gas (H2) with volume ratio of 1:1.1-2.5. Platinum-containing compound solution is 2-10 mmol/L chloroplatinic acid solution. Preferred Processes: Ammonium metatungstate and copper nitrate mixed solution is prepared by mixing ammonium metatungstate:copper nitrate with mass ratio of 1:0.1-1 and adding deionized water to prepare 1-30 wt.% mixed solution. Ammonium metatungstate and copper nitrate mixed solution is fully dispersed by ultrasonic processing before spray-drying. Temperature-programmed solid reaction is performed by heating particles in hydrogen-rich atmosphere to 700-950 degrees C with heating rate of 1-10 degrees C/minute and maintaining temperature for 1-8 hours. Preferred Conditions: Substitution reaction is performed at room temperature to 100 degrees C for 1-24 hours.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Surfactant is N,N-bis(2-hydroxyethyl)oleamide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The quantum dot is made of indium arsenide and the semiconductor material is made of indium.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Component: The solar cell is chosen from dye sensitized solar cell, organic semiconductor-type solar cell, compound semiconductor-type solar cell and/or hybrid solar cell.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanostructure layer comprises photoresponsive oxide semiconductor containing zinc oxide, titanium dioxide, tin dioxide and/or tungsten oxide (WOx, where x is not defined). The nanostructure includes nanoparticles, nanorods, nanowires and nanoribbons.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The photoresponsive organic compound is chosen from azobenzene, spiropyran and thymine.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Composition: The reactor has a concentric cylinder of outer cylinder and an inner cylinder. The side surface of inner cylinder is provided with through-hole. Preferred Arrangement: An end plate is positioned at opening portion of outer cylinder. The interval of inner cylinder outer wall surface and outer cylinder inner wall surface of the reactor is 5 mm or less. Preferred Process: By turning inner cylinder, the mixture in inner cylinder is moved to outer cylinder through the through-hole by centrifugal force.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: During manufacture of composite material of metal oxide and conductive carbon, conductive carbon powder loaded with the hydroxide of the transition metal is mixed with metal-based compound(s) containing metal including group I element and group II element, heat-processed and reacted to obtain complex oxide nanoparticles. The liquid reaction mixture is obtained by mixing liquid obtained by dissolving conductive carbon powder and water-soluble salt of the transition metal in water, and liquid obtained by dissolving hydroxide of alkali metal in water. The nuclei of hydroxide of the transition metal are produced between inner cylinder outer wall surface and outer cylinder inner wall surface. Preferred Conditions: The centrifugal force applied to the mixture is more than 1500 kgms-2. The heat-processing is carried out at 200-300 degrees C in oxygen-containing atmosphere. Preferred Composition: At least one portion of the conductive carbon powder contains carbon nanotubes. The metal-based compound(s) is lithium compound, preferably lithium hydroxide. The complex oxide nanoparticles are nanoparticles of layered rock-salt type lithium oxide (LiMO2, where M is manganese, iron, nickel or cobalt), solid solution of layered lithium-manganese oxide-lithium oxide (Li2MnO3-LiMO2) or spinel-type lithium oxide (LiM2O4).
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Conditions: During formation of stable oxide film, the oxygen void volume in sludge solution is 0.02% or more. The temperature of aqueous solution is 65 degrees C or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred components: The feedstock composition comprises 5-35 pts. wt. of hollow particle and 1-40 pts. wt. of white inorganic particle based on 100 pts. wt. of polyester resin. The white inorganic particle comprises barium sulfate particle or titanium dioxide particle.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The hollow particle is a cross linked polyacrylic or polystyrene-based resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The doped regions comprise a dopant which is chosen from aluminum, nitrogen, gallium, magnesium, zinc, indium, chromium, titanium, silicon and argon. The material of semiconductor layer is group III-V compound, preferably aluminum gallium indium nitride (Alx1Gay1In(1-x1-y1)N, where x1 and y1 are 0-1).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The silicon nitride film has interface state density tolerance limit of less than 1.0E+11 cm-2.eV-1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The semiconductor support contains titanium and oxygen and is preferably selected from titanium dioxide, strontium titanate, SnTiO4, barium titanate, cerium(IV) oxide-titanium dioxide. The catalyst comprises 0.1-10 wt.%, preferably 0.4-8 wt.% alloy. The catalyst has a BET surface area of 10-50 m2 per g photocatalyst using the nitrogen absorption technique. The actinic radiation has a photonic energy of at least 2.5 eV, preferably at least 2.9 eV , especially at most 3.5eV and a radiant flux density of at least 0.1 mW/cm2, preferably at most 3 mW/cm2. The hydrogen containing precursor is selected from water, diols, and/or alcohols. Preferred Composition: The hydrogen containing precursor is a mixture of water and alcohol where the amount of alcohol is 0.1-10 vol.%; a mixture of water and diol, where the amount of diol is 0.1-10 vol.%; a mixture of water, alcohol and diol, where the combined amount of alcohol and diol is 0.1-10 vol.%.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The alloy is present on the semiconductor support as particles having an average major axis length of 1-100 nm, preferably 1-50 nm. The alloy comprises 10-90 wt.%, preferably 40-60 wt.% palladium and 90-10 wt.%, preferably 60-40 wt.% gold.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The alcohol is selected from ethanol, methanol, propanol, isopropanol, butanol, and/or iso-butanol. The mixture is an aqueous solution. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The tellurium ion soluble salt is sub-sodium tellurite and tellurium potassium soluble salt.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The softener comprises compound having repeating unit containing 80% or more saturated hydrocarbon. The compound having repeating unit containing saturated hydrocarbon (a) has isobutylene skeleton in main component. The isobutylene skeleton in main component is polybutylene.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin composition further contains hydrogenated cyclic olefin compound and desiccant. The hydrogenated cyclic olefin compound is hydrogenated petroleum resin. The hydrogenated petroleum resin has dicyclopentadiene structure. The diene polymer is chosen from styrene-butadiene copolymer or its hydride, styrene-isoprene copolymer or its hydride, styrene-butadiene-styrene block copolymer or its hydride, and styrene-isoprene-styrene block copolymer or its hydride, preferably styrene-butadiene-styrene block copolymer or its hydride and styrene-isoprene-styrene block copolymer or its hydride. The resin composition contains 10-35 %mass diene polymer, 50-75 %mass heterocyclic olefin compound and 10-30 %mass softener with respect to total mass of resin composition. Preferred Properties: The number average molecular weight of softener is 300-3000. The resin composition has average value of light transmittance of 85% or more in the wavelength of 400-800 nm and thickness of 0.1 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Dispersing agent added in wash water is nonionic surfactant e.g. polyoxyethylene distyrenated phenylether. Preferred Processes: Silicon is obtained from cutting, grinding, and polishing silicon during manufacture of solar cell ingot or semiconductor wafer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: A line-formed liquid used during formation of parallel line pattern comprises 0.1-5 wt.% electroconductive material.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Properties: The contact angle of line-formed liquid with respect to the base material is 5-50 degrees . The surface energy of the base material is 40 mN/m or more. The line-formed liquid comprises organic solvent. The difference of contact angle of organic solvent and contact angle of line-formed liquid with respect to base material is -20 degrees to 5 degrees . The base material contains transparent conductive film having total light transmittance of 85% or more and surface resistivity of 500 ( Omega )/square units or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The energy at the puncture point in surface of polycarbonate resin molded product measured by high-speed side impact test JIS K7211 is preferably 8 J or more. The polycarbonate resin comprises polycarbonate resin (i) and/or polycarbonate resin (ii). The mass ratio of polycarbonate resins (i) and (ii) is 80/50-20/80. The polycarbonate resin (i) has structural unit of formula (I). The polycarbonate resin (ii) has structural unit of formula (II).R1=methyl;R2-R5=H or ,methyl;andX=-C(R4)(R5)- or formula (a), preferably isopropylidene group.Preferred Properties: The viscosity average molecular weight of polycarbonate resins (i) and (ii) is 20000-35000 and 16000-28000, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The carrier gas includes nitrogen or a noble gas. The gaseous compound is a compound of the base element with hydrogen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The coating is essentially atomic-monolayer thick. The coating comprises at least one material consisting of iridium or osmium. The substrate comprises iridium. The coating comprises at least 5 wt.%, preferably 60-80 wt.% platinum. At least one of the substrate and coating comprises at least one of such materials in crystalline or nanoparticle form. Coating is deposited on the substrate by galvanic displacement of a copper layer on the substrate. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The solder layer is made of a material selected from a group consisting of a tin, lead, antimony and bismuth. The gettering process is performed by evaporating a metal such as titanium, molybdenum and chromium in the processing chamber.
TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The introducing a copolymer of the N-vinylimidazole derivative and a comonomer as the graft chain into the polymer substrate is graft-polymerized the N-vinylimidazole derivative and the comonomer with the polymer substrate. Preferred Components: The graft chain is a polymer having a polymerization unit of formula (I). The graft chain is a copolymer further containing a comonomer as a polymerization unit. The polymerization unit of the comonomer has a structure of formula (II). The N-vinylimidazole derivative is a vinyl monomer having an imidazole ring capable of forming the alkyl substituted imidazolium salt by reacting with the alkyl halide. The N-vinylimidazole derivative is a vinyl monomer of formula (III). The comonomer is a vinyl monomer of formula (IV).R1 = greater than 3C-alkyl;R2-R4 = H, CN or hydrocarbyl optionally having a substituent;X = negative ion;R5 = H, halo or alkyl optionally having a substituent; andm = 1-5.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The metal filler is metal wire. Preferred Composition: The transparent conductive layer further contains binder.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The optical absorption material is colored compound which absorbs visible ray, or carbon material. The colored compound is dye or chromophore. Preferred Property: The transmittance of light transmissive layer with respect to visible ray is 50% or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanowire layer comprises ceramic binder binding between metal nano wires. The ceramic binder comprises titanium oxide sol, alumina sol, silica sol, zinc oxide sol, zirconium oxide sol, yttrium oxide, magnesium oxide, manganese oxide sol, samarium oxide sol, tin oxide sol, nickel oxide sol, lanthanum sulfate sol, chromium oxide sol, cerium oxide, copper oxide and cobalt oxide sol. The film further has a base coating layer. The base coating layer includes nanoparticles. The nanoparticles are chosen from titanium oxide, silica, silicon oxynitride, zinc oxide, tin oxide, alumina, zirconium oxide, yttrium oxide, tungsten oxide, vanadium pentoxide, nickel oxide, manganese oxide, magnesium oxide, lanthanum oxide, iron oxide, chromium oxide, cobalt oxide, copper oxide, cerium oxide, indium-tin oxide and antimony oxide, and has size of 1 nm to 1 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The composition (C1) further comprises at least one oxygen scavenger; and at least one organic solvent. The pH of the composition is 13-14. The composition (C1) comprises 0.005-0.09 wt.% hydantoin and its derivative. Preferred Components: The alkoxylated glycols have molecular weights of greater than or equal to 100 g/mole. EXAMPLE - A composition comprising 2 wt.% tripropylene glycol (having weight average molecular weight of 192 g/mole), 6 wt.% potassium hydroxide, 2 wt.% 1,4-butanediol, 0.1 wt.% N-isopropylhydroxylamine, 0.05 wt.% hydantoin, and water (balanced), was prepared.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The dopant comprises one of arsenic, aluminum, phosphorus, antimony, iron, cobalt, zirconium, zinc, magnesium, calcium and boron. The solid acid catalyst is boron sulfonic acid, aluminum sulfonic acid, iron sulfonic acid, cobalt sulfonic acid, zirconium sulfonic acid, zinc sulfonic acid, magnesium sulfonic acid, calcium sulfonic acid or arsenic sulfonic acid.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The volatile agent is sugar alcohol that is mannitol, sorbitol, maltitol, inositol, dulcitol and erithritol.
TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The p-type dopant includes boron, aluminum, gallium, indium and/or zinc. The n-type dopant includes phosphorus, arsenic, antimony and/or tin.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The protective layer comprises hexafluoropropylene oxide. The functional layer is coated with the protective layer by physical or chemical vapor deposition. The protective layer is deposited on a metal-oxide functional layer by physical or chemical vapor deposition.
TECHNOLOGY FOCUS - POLYMERS - The conductive body is made of a plastic material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises: removing the organic solvent after preparing the nanoparticles of the target material by graphene oxide; and reducing the graphene oxide after removing the organic solvent. Preferred Components: The nanoparticles have: a structure in which one graphene oxide layer surrounds 1 and 2-10 target material particle; an average particle diameter of 1-1000 nm; and a structure in which the graphene oxide is formed on a surface of the target material. The graphene oxide is present in an amount of 1-10 pts. wt. The target material is present in an amount of 0.1-10 pts. wt. EXAMPLE - 0.6 mg of Graphene oxide was added into water to obtain 10 ml of aqueous solution. 10 mg of poly(9,9-dioctylfluorene) was dissolved in 1 ml of chloroform to obtain 1 ml of organic solution. The organic solution was added into the aqueous solution and pulverized by a 30 W ultrasonicator for 4 minutes to obtain an emulsion. The obtained emulsion was heated at 60 degrees C for 6 hours to remove chloroform to give nanoparticles.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Property: The organic device comprises an inverted structure or non-inverted structure.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The peroxide comprises hydrogen peroxide. The transition metal comprises vanadium, molybdenum and/or tungsten. The transition metal oxide film comprises molybdenum oxide, vanadium oxide and/or tungsten oxide. The transition metal oxide layer during operation of organic device comprises a hole transport layer. Preferred Process: The transition metal oxide film is formed by spin-coating the dispersed solution onto a substrate. The partially dried transition metal oxide is formed in a vacuum environment. The solution with predetermined amount of alcohol-based solvent is utilized to affect a rate of reaction of transition metal with peroxide during combining process. The transition metal oxide film is annealed at 60-240 degrees C, preferably less than 100 degrees C. The tungsten oxide is annealed at 80-180 degrees C.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alcohol-based solvent is ethanol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Etching process is performed by using inductively coupled plasma reactive ion etching in which plasma comprises gas e.g. chlorine (Cl2), boron trichloride (BCl3), mixture of Cl2 and BCl3, or mixture of Cl2, BCl3 and/or argon (Ar), preferably mixture of Cl2, BCl3 and/or Ar. Etched III-nitride surface is annealed by exposing surface to hydrochloric acid (HCl) solution. Thermal annealing is performed at 750 degrees C for 10 minutes in the presence of gallium chloride (GaCl), HCl, hydrogen (H2), and nitrogen (N2). Presence or absence of defects in surface is determined by photoluminescence or cathodoluminescence. Preferred Components: The III-nitride material is gallium nitride (GaN).
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of polyanion is 10-300 parts mass with respect to 100 mass parts 3,4-dialkoxy thiophene. The polyanion is polystyrene sulfonate.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of polyanion is 50-2000 parts mass with respect to 100 mass parts 3,4-dialkoxy thiophene. The polyanion is polystyrene sulfonate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The cathode pole contains metal consisting of 10-group element as a cathode catalyst.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The hydrazine compound is hydrazine, hydrazine hydrate and/or hydrazine derivatives. The aqueous solution has pH of 11 or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The basic chemical is formed by mixing ultrapure water and basic material having hydroxyl radical. The basic chemical additionally contains hydrogen peroxide. The basic material having hydroxyl radical includes potassium hydroxide solution or ammonium hydroxide solution. The acid chemical is formed by mixing ultrapure water, hydrogen chloride and hydrogen peroxide. A diluted acid chemical formed by mixing ultrapure water and hydrogen fluoride is used during manufacture of solar cell. An acid chemical formed by mixing ultrapure water, hydrogen chloride and hydrogen fluoride is used during manufacture of solar cell. Hydrogenated silicon nitride and aluminum oxide are used during manufacture of solar cell.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Process: The polishing process is done using polishing composition and a hard abrasive cloth (2), and by applying a load of 50-150 g/cm2. The polishing process is the process of polishing both the surfaces of compound semiconductor substrate.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The average particle diameter of colloidal silica is 10-100 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The fatty acid salt of alkali metal is sodium laurate and/or sodium oleate. The oxidizing agent is sodium dichloroisocyanurate and/or potassium dichloroisocyanurate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The n+-type germanium semiconductor layer has thickness of 2 nm or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The antireflection coating has refractive index of 1.42-1.54 and measurement reference wavelength of 600 nm. The diameter of the spherical nanoparticles is 10-1000 nm. Preferred Component: The nanoparticles are chosen from silica, zinc oxide, titanium dioxide, tantalum oxide, hafnium oxide and vanadium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The second reactant comprises sodium borohydride.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The compound (I) is derived from heterocyclic compound of formula (III), which is obtained by reacting alkynyl-substituted aromatic compound of formula (IV) and halogenated compound of formula (V).Z1=H or leaving group;Z2=leaving group;R3=lower alkyl;andX2=halo. Preferred Definitions:    R1,R2=H, halo, nitro, cyano, or alkyl, aryl or alkoxy (all optionally substituted);and    or R1+R2=benzene ring or naphthalene ring.    SPECIFIC COMPOUNDS - 124 Condensed heterocyclic compounds are disclosed, e.g. 5,10-dithia-indeno(2,1-a)indene of formula (Ia), 2,7-dimethyl-5,10-dithia-indeno(2,1 -a)indene, 2,3,7,8-tetramethyl-5,10-dithia-indeno(2,1-a)indene, 1,2,3,4,6,7,8-heptamethyl-5,10-dithia-indeno(2,1-a)indene and 1,2,3,4,6,7,8,9-octamethyl-5,10-dithia-indeno(2,1-a)indene.    EXAMPLE - 7.5 mmol Phenylsulfenyl chloride solution in 50 ml dichloromethane solvent was dripped in 5 mmol 2-(1-trimethyl silylethynyl)thioanisole in 70 ml dichloromethane at 0 degrees C under nitrogen atmosphere, and stirred at room temperature for 4 hours. The obtained reaction liquid was extracted with 10 ml dichloromethane, and washed with 150 ml water and 50 ml salt water. The extract was dried and concentrated with magnesium sulfate, to obtain 4.5 mmol 3-(phenyl sulfenyl)-2-trimethylsilyl benzo(b)thiophene with yield of 93%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation given. Preferred Definitions:    R1,R2=H, methyl, ethyl, propyl or phenyl;    R3-R6=H, methyl, ethyl, propyl, methoxy, phenyl or phenoxy;    or R1+R2=cyclopentane, cyclohexane or fluorene;and    Ar'=benzofluorenyl group (a) or phenyl optionally substituted by methyl, ethyl, propyl, methoxy or cyano.    SPECIFIC COMPOUNDS - Two dihydrophenazine compounds are specifically claimed i.e. 5,10-bis((17,17-dimethyltetracyclo(8.7.0.02,7.011,16)heptadeca-1(10),2(7),3,5,8,11(16),12,14-octaen-14-yl))-5,10-dihydrophenazine of formula (Ia) and 5-(17,17-dimethyltetracyclo(8.7.0.02,7.011,16)heptadeca-1(10),2(7),3,5,8,11,13,15-octaen-14-yl)-10-phenyl-5,10-dihydrophenazine.    EXAMPLE - 2.04 g 4a,5,10,10a-Tetrahydro-phenazine, 6.32 g 9-chloro-11,11-dimethyl-11H-benzo(a)fluorene, 2.55 g tert-butoxy sodium, 50 mg palladium acetate, 178 mg tri-tertbutylphosphine and 50 mL ortho-xylene were mixed, heated, stirred at 130 degrees C for 6 hours, cooled to room temperature, filtered, washed using 150 mL distilled water, 100 ml methanol, 100 mL toluene/hexane and 50 ml hexane, vacuum-dried and purified, to obtain 5,10-bis((17,17-dimethyltetracyclo(8.7.0.02,7.011,16)heptadeca-1(10),2(7),3,5,8,11(16),12,14-octaen-14-yl))-5,10-dihydrophenazine having melting point of 425.6 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The reaction is carried out at 20-90 degrees C and a pH of 3-12 or 4-6 for 10-90 minutes. The method further comprises drying (I) at 20-120 degrees C for 12-30 hours. Preferred Components: The sulfurate salt is sodium sulfide, iron sulfide and/or zinc sulfide. The copper salt is blue vitriol, copper carbonate and/or copper acetate. The average particle diameter of (I) is 10-00 nm. EXAMPLE - Distilled water, 1 mole of copper sulfate and 1 mole of sodium sulfate were added and stirred for 30 minutes to prepare an aqueous solution having a pH value of 4. Then the reaction mixture was heated at 20 degrees C for 90 hours using an isothermal reactor and then dried to obtain (I).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The nanoparticles comprises copper-selenium, indium-selenium, gallium-selenium, and gallium-selenium.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent is alcohol-based solvent including ethanol, methanol, pentanol, propanol and butanol. The chelating agent comprises monoethanolamine, diethanolamine, triethanolammine, ethylenediamine, ethylenediamine acetic acid, nitrilo triacetic acid, hydroxyethylenediaminetriacetic acid, O,O'-Bis(2-aminoethyl)ethyleneglycol-N,N,N',N'-tetraacetic acid, triethylenetetraaminehexaacetic acid, hydroxyethyl iminodiacetic acid and dihydroxyethylglycine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The reflective body is a quartz material coated with reflective nickel plating, and a reflective metal consisting of nickel, gold or silver.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The glass raw material has liquid phase viscosity of 104 dPa.second or more, and ( alpha )-ray emitting amount of 10000x 10-4C/cm2/hour or less. The compressive stress of compressive-stress layer formed on surface of sheet glass is 700 MPa or more. The comprehensive layer has thickness of 1 mu m or more, preferably 15 mu m or more. The surface of tempered glass substrate is non-polishing surface having surface roughness of 10 Angstrom or less.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The glass composition further comprises 1 %mass or less, 8 %mass or more alumina, 0-3 %mass total amount of strontium oxide and barium oxide, 50-80 %mass silica and 0-10 %mass potassium oxide. The total amount of magnesium oxide, calcium oxide, strontium oxide and barium oxide in the raw material is 0-5 %mass. The ratio of total amount of lithium oxide and potassium oxide with respect to the amount of sodium oxide is 0-0.5.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The method further comprises (c) removing the residual moisture by heat-treating at less than 200 degrees C after freeze-drying the graphene oxide slurry in the step (b). In the step (a), the oxidation-purification process is repeated after obtaining the graphene oxide slurry to obtain high-order graphene oxide slurry. In the step (b), the graphene oxide slurry is sprayed into micro-droplets, and then the micro-droplets are frozen and dried. The step (b) comprises coating the graphene oxide slurry on a base material, and freezing and drying the resulting coating film; or adding the graphene oxide slurry to a molding frame of height less than 10 mm, and freezing and drying. EXAMPLE - 50 g Graphite and 40 g sodium nitrate were added to 1.75 liter sulfuric acid solution and cooled and 230-250 g potassium permanganate was slowly added for 1 hour. Then 5 liter 4-7% sulfuric acid solution was slowly added for 1 hour. The mixture was centrifuged and supernatant was discard. The precipitated slurry was repeatedly washed with 3% sulfuric acid/0.5% hydrogen peroxide solution to obtain reddish brown graphene oxide slurry. The slurry was frozen and dried to obtain graphene oxide sponge.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The catalyst is a supported noble metal catalyst. The catalyst is supported on a carrier material comprising aluminum oxide, titanium oxide, zirconium oxide, tin oxide, cerium oxide, silicon oxide, zinc oxide and/or magnesium oxide, or an aluminosilicate, preferably zeolite, magnesium silicate or magnesium aluminate. The catalyst comprises vanadium(V) oxide. The first oxidizing agent comprises water, oxygen and/or air. The second oxidizing agent comprises oxygen, air or ozone.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The inlet- and the outlet channel exhibit a rectangular cross-section. The inlet- and the outlet channels are arranged alternately in cross-section of the catalyst unit. The channel density in the cross-section of the catalyst unit is 2-20/cm2, preferably 5-10/cm2. The catalyst unit is made of a ceramic material. The reactor is designed for carrying out steam reforming, autothermal steam reforming, partial oxidation or partial dehydrogenation. The oxidizing device is a bleed air device. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The fluoride is hydrofluoric acid, ammonium fluoride and ammonium hydrogen fluoride. The oxidizing agent is ozone, hydrogen peroxide, potassium permanganate, nitric acid, sodium hypochlorite and/or potassium chromate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Components: (I) has a structure of formula (II). The intermediate has an absorption wavelength of 450-550 nm. An optical property of the intermediate within an UV ray-viewable portion is maintained.R2-R9 = H or linear or branched 2-10C-alkyl not substituted with H. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The halogen is present in amount of 0.1-90 wt.%, preferably 5-30 wt.%.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The organic protective layer has oxygen permeability of 300 cc/m2.24 hours at 25 degrees C for 24 hours in the thickness direction, out gas generation rate of less than or equal to 2000 ppm. The optical member includes a substrate, an organic electro luminescence (EL) unit formed on the substrate, and an inorganic protective layer. The organic EL unit seals the in organic protective layer. The inorganic protective layer is stacked on a top of the organic protective layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The composition further comprises (i) a non-silicone-based photocurable monomer having a functional group, and/or (ii) halogen-free photocurable siloxane monomer having a functional group. The silicone compound has an average molecular weight of 100-5000 g/mol, and is present in amount of 0.1-99.9 wt.%, preferably 1-90 wt.%. The photopolymerization initiator is present in an amount of 0.1-99.9 wt.%, preferably 1-10 wt.%. The silicone compound has a structure of formula (R1a-R2b-R3cR4d-SiO(4-a-b-c-d)/2) (I). The photocurable monomers include (i) a monohydric alcohol or polyhydric alcohol having 5-30C, non-silicone (meth) acrylate monomer, and/or halogen-free siloxane monomer having (meth) acrylate groups or (meth) acryloxy groups. The photocurable monomer is present in an amount of 1-90 wt.%.R1 = 6-30C-aryl, 7-30C-aryl, 1-30C-alkyl (all halogenated), C6X5-(CX2)x-(CH2)y1- or CX3- (CX2)x-(CH2)y1-;R2-R4 = 1-10C-alkyl, 2-20C-alkenyl, 6-20C-aryl, 1-10C-alkoxy, 1-10C-silyl (all optionally substituted) or -O-C=O-CR5=;R5 = H or optionally substituted 1-30C-alkyl;a = 1-3;b, c, d = 0-4;a+b+c+d = 2 or 4;X = F, Cl, I or Br;x = 0-10; andy1 = 0-10. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - A mixed solution of hydrofluoric acid, nitric acid and acetic acid is used in metal organic chemical vapor deposition (MOCVD) process.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The doping method is a continuous ion layer absorption reaction (successive ionic layer adsorption and reaction). The impurity bismuth atom is chosen from bismuth chloride, bismuth nitrate, bismuth sulfate, and their soluble salt.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The doping method is continuous ion layer absorption reaction (successive ionic layer adsorption and reaction) method. The silver impurity atom is derived from silver nitrate soluble salt. The quantum dot is silver-doped lead sulfide quantum dot.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Base layer and absorbing layer contain indium-gallium arsenide (In0.01Ga0.99As). Germanium substrate is p-type germanium 6 degrees off towards (111) orientation. Emitter layer contains gallium phosphide. Isoelectric surfactant contains bismuth. Stressor layer contains metal.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The emitter layer is selected from group consisting of n-type indium gallium phosphide layer, p-type silicon layer, n-type silicon layer, p-type amorphous silicon layer, n-type amorphous silicon layer, or n-type cadmium sulfide layer. The solar cell structure is made of gadolinium telluride, copper indium gallium selenide, copper zinc tin sulfide, or thin-film silicon. The cadmium oxide layer is doped with an n-type dopant made of indium or gallium. The cadmium oxide layer is alloyed with metal-oxide such as zinc oxide or magnesium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The smoothening is performed by plasma bombardment and/or ultrasonic cleaning.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The process gas contains source gas for forming silicon nitride film, and gas for plasma excitation for producing plasma. Preferred Property: The ratio of supply flow rate of nitrogen gas with respect to supply flow rate of silane-type gas is 1-1.5.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The protective layer (C) and protective layer (D) contain zirconium and aluminum oxide or hafnium and aluminum oxide. A protective unit layer (E) (23) comprises oxide layer (e1) (21) containing zirconium oxide or hafnium oxide, oxide layer (e2) containing zirconium and aluminum oxide or hafnium and aluminum oxide, and oxide layer (e3) (22) containing aluminum oxide. A protective unit layer (F) comprises oxide layer (f1) containing zirconium oxide or hafnium oxide, oxide layer (f2) containing zirconium and aluminum oxide or hafnium and aluminum oxide, and oxide layer (f3) containing aluminum oxide.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The porous polymer web layers comprise swelling polymer and inorganic particles having size of 10-100 nm in weight ratio of 5:5-7:3. Preferred Property: The thickness of porous substrate, primary porous polymer web layer and secondary porous polymer web layer is 5-9 mu m, 2-3 mu m and 4-14 mu m, respectively.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of transparent conductive film is 200 nm or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicon wafer is multi-crystalline silicon wafer. The alkaline-earth metal is chosen from calcium, magnesium, barium and strontium. The alkaline-earth metal is in the form of aqueous solution or suspension. The alkaline-earth metal is alkaline-earth metal oxide and/or alkaline-earth metal carbonate. The content of calcium hydroxide in alkaline-earth metal suspension is 0.01-40 wt.%. Preferred Process: The etching of pre-etched silicon wafer is carried out using alkali and/or acid. The method further involves contacting wafer surface with hydrofluoric acid-nitric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The positive electrode further contains nitrogen.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polycarboxylic acid metal salt is polycarboxylic acid alkali metal salt and/or polycarboxylic acid alkaline-earth metal salt.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The conductive polymer is chosen from polyaniline, its derivative, polypyrrole, and its derivative. The positive electrode further contains component (a) comprising polycarboxylic acid and/or polycarboxylic acid metal salt. The polycarboxylic acid is chosen from polyacrylic acid, polymethacrylic acid, polyvinyl benzoic acid, polyallyl benzoic acid, polymethallyl benzoic acid, polymaleic acid, polyfumaric acid, polyaspartic acid and polyglutamic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The compound having thienothiophene skeleton is 16,18-dithiaoctacyclo(15.15.0.02,15.04,13.06,11.019,32.021,30.023,28)dotriaconta-1(17),2(15),3,5,7,9,11,13,19(32),20,22,24,26,28,30-pentadecaene. Preferred Definitions:    A=naphthalene, anthracene, pentacene, phenanthrene or triphenylene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The mol concentration of cobalt chloride hexahydrate in solution A is 0.06-0.30 mol/l. The mol concentration of sodium hydroxide in solution B is 2-4 mol/l. The mol concentration of sodium borohydride in solution C is 2-4 mol/l. The mol ratio of cobalt chloride hexahydrate and sodium borohydride in reaction solution is (1:5)-(1:20). Preferred Method: The hydrothermal reaction is carried out at 150-200 degrees C for 15-20 hours. The hydrothermal reaction also involves centrifuging turbid reaction liquid; washing precipitate with deionized water and ethanol; and vacuum drying precipitate at 40-60 degrees C for 4-6 hours to obtain black cobalt powder.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The volume ratio of deionized water and ethanol in solution A is (1:1)-(1:4).    TECHNOLOGY FOCUS - POLYMERS - Preferred Component: The surfactant is polyvinyl pyrrolidone and has dosage of 0.3-0.6 mol/l.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The film containing nanoparticles is coated on the substrate. The wavelength conversion layer formed on the substrate transmits ultraviolet ray. Preferred Layer: The wavelength conversion layer is an application layer containing nanoparticles of the perovskite-type oxide fluorescent substance. Preferred Properties: The transmittance of wavelength conversion layer is 90% or more. The nanoparticles are crystalline particles. The ultraviolet-ray (A) of 300-400 nm or less which injected from the substrate side and transmitted the substrate, light-emits red fluorescence (B) by irradiating the nanoparticles.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The conductive polymer is polyaniline or its derivative(s).
TECHNOLOGY FOCUS - METALLURGY - The metal container is fabricated from a metal selected from the group consisting of steel, titanium, and aluminum.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The pore-forming agent comprises aliphatic hydrocarbon based solvent, vegetable oil, and plasticizer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The mechanochemical reaction is generated by grinding the mixture of cobalt II oxide or iron III oxide, and hexagonal crystal boron nitride at 60 degrees C or less.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The lithium-ion secondary battery has negative electrode having active material layer including copper nanowire as conductive supporting agent on electrical power collector.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The aqueous solution of copper salt has pH of 12 or more. The copper is reduced at temperature less than boiling point of 50 degrees C or more. The copper salt is copper nitrate, copper sulfate, copper acetate, copper hydroxide, copper chloride, and copper oxides.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The molar ratio of the amine group-containing compound (I) and hydrocarbon chain-containing compound (II) is 1:10-1:500. The amine group-containing compound (I) comprises ortho-phenylenediamine, 3,4-diaminotoluene, and 3,4-diamino pyridine. The hydrocarbon chain-containing compound (II) comprises 1,3-propanediamine, 1,2-propanediamine, putrescine, 1,2-diaminocyclohexane, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, pentaethylene hexamine, piperazine, spermine, and spermidine. The reducing agent is chosen from hydrazine, glucose, ethylene glycol, glycerol, sodium borohydride, and potassium borohydride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The high refractive index layer and the base layer are made of titanium oxide, zirconium oxide, aluminum oxide, niobium oxide, antimony oxide, tin oxide or cerium oxide. The liquid containing hydrolyzate or its partial condensation product of an alkoxysilane compound is applied on the transparent substrate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The base is an organic base of formula: R11-N(-R12)-CH(-R13)=N-R14 (I). The sulfur-containing salt (I) is preferably sulfur-containing compound (I-1) or sulfur-containing compound of formula (I-2), more preferably of formula (VI). The fullerene derivative (IV) is preferably of formula (VII)-(IX). Fullerene is 60C fullerene or 70C fullerene. The sulfur-containing compound (I-1) is obtained by reacting monovalent anion-containing compound of formula: Ar1-CH(-Q)-R3 (X), sulfur-containing compound of formula: R1-S-R2 (XI) and salt of formula: M+X- (XII), or by reacting sulfur-containing compound of formula: Ar1-CH(-S-R2)-R3 (XV) and linear compound of formula: R1-X' (XVI). The sulfur-containing compound (I-2) is obtained by reacting monovalent anion-containing compound (X) and sulfur-containing compound (XI).R13=1-30C organic group, or optionally substituted amino;R11,R12,R14=H or 1-30C organic group;or 2 of R11-R14+C or N=ring;R10=methyl or butyl;Q=chloro, bromo or iodo;M+=monovalent cation;andX'=atom or atom group which forms monovalent group.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Component: The substrate is glass. Preferred Process: The substrate forms an intermediate layer (24) in surface(s) of plastic film as support component (12).    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of hydrogen gas in mixed gas is 2 vol% or more.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The surface side of the solar cell has glass.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The surface side of the solar cell has ethylene-vinyl acetate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The gas forming agent is cycloalkyl benzene compound, biphenyl compound and alkyl biphenyl compound.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silver compound is silver oxalate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alcohol solvent is 3-10 alcohol. The aliphatic hydrocarbon amine comprises aliphatic hydrocarbon monoamine (A) having total carbon number of 6 or more, and comprising aliphatic hydrocarbon group and amino group(s), aliphatic-hydrocarbon monoamine (B) having total carbon number of 5 or less, and comprising aliphatic hydrocarbon group and 1 amino group, and aliphatic hydrocarbon diamine (C) having total carbon number of 8 or less, and comprising aliphatic hydrocarbon group and 2 amino group(s). The aliphatic hydrocarbon monoamine (A) is 6-12C less alkyl monoamine. The aliphatic hydrocarbon monoamine (B) is 2-5C alkyl monoamine. The amount of alcohol solvent is 120 pts. wt. or more with respect to 100 pts. wt. silver compound. The amount of aliphatic hydrocarbon amine is 1-50 mole with respect to 1 mole silver atom in the silver compound. The aliphatic-hydrocarbon diamine (C) comprises primary amino group.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of gallium in the copper-gallium alloy particle covered with sodium containing material is 30-70%. The sodium compound grain is anhydrous sodium sulfate. The sodium containing material in the copper-gallium alloy particle covered with sodium containing material is anhydrous sodium sulfate. Preferred Property: The average particle diameter of sodium compound grain is 1-200 microns.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The concentration of gallium in the copper-gallium alloy sputtering target is 10-45 %mass except the sodium compound grain and sodium containing material. The concentration of sodium is 0.1-5 %mass in the copper-gallium alloy sputtering target except a chalcogen element.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The sodium containing organic substance is sodium lauryl sulfate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of secondary phase is 0.1-35 area% in target cross-sectional area. Preferred Property: The maximum particle size of molybdenum powder and selenium powder is 500 microns or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Metal precursors are chloride, bromide, nitrate, and/or acetate salts of transition metals e.g. platinum (Pt), palladium (Pd), rhodium (Rh), iridium (Ir), osmium (Os), ruthenium (Ru), silver (Ag), gold (Au), and/or their alloys, preferably rhodium acetate-dimer, palladium acetate, platinum chloride, ruthenium chloride, and/or silver nitrate. Reducing agent is sodium borohydride. Preferred Parameters: Ultra-small uniform sized metal nanoparticles are optionally in the form of nanorods.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Surfactant is didodecyl dimethyl ammonium bromide (DDAB). Organic solvent medium contains organic solvent e.g. toluene, benzene, or chlorobenzene, preferably toluene, or optionally with water. Capping agent is didodecyl thiol. Anti-solvent is methanol, ethanol, and/or isopropanol, preferably ethanol.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The antioxidant is the phosphorus-based antioxidant (II). The resin chosen from polyvinyl acetal resin, ethylene-vinyl acetate copolymer, (meth)acrylic-acid resin, polyester resin, polyurethane resin, vinyl chloride resin, polyolefin resin, polycarbonate resin, and norbornene resin, preferably polyvinyl butyral resin or ethylene-vinyl acetate copolymer. The content of near-infrared absorber is 0.05-30 parts mass with respect to 100 parts mass resin. The content of antioxidant is 0.01-30 parts mass with respect to 100 parts mass resin. Preferred Definitions:    R2-R4=methyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The neutral catalyst is ammonium fluoride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The coating composition comprises 10-40 pts. wt. silica precursor, 0.0001-0.02 pts. wt. neutral catalyst, 35-88 pts. wt. alcohol and 0.13-2.6 pts. wt. non-fluorine silane-based organic compound, with respect to 100 pts. wt. composition. The silica precursor is tetramethyl orthosilicate, tetraethyl orthosilicate and tetrapropoxysilane or tetraisopropoxy silane. The non-fluorine silane-based organic compound is chlorotrimethyl silane or octadecyltrichloro silane. The alcohol is methanol and ethanol or isopropanol. Preferred Conditions: The formation of silica nanostructure is carried out at 20-50 degrees C for 1-50 hours. The coating process is carried out at 20-100 degrees C for 0.5-5 hours.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The fluorine-containing polyarylene prepolymer (A) is fluorine-containing polyarylene ether prepolymer which is obtained by reacting fluorine-containing aromatic compound, phenol-type compound having two or more phenolic hydroxyl groups, and aromatic group having crosslinkable functional group and reactive group in presence of the dehydrohalogenation agent. The fluorine-containing aromatic compound is perfluoro(1,3,5- triphenyl benzene) or perfluoro biphenyl. The phenol-type compound is 1,3,5-trihydroxybenzene or 1,1,1-tris(4-hydroxyphenyl)ethane. The aromatic compound is pentafluorostyrene, acetoxystyrene, chloromethyl styrene or pentafluorophenylacetylene. The laminate further contains compound (B) having two or more crosslinkable functional groups, and does not have a fluorine atom, compound (C) having 6-24C alkyl group optionally having ether oxygen atom between carbon atoms, and crosslinkable functional group, and radical polymerization initiator. The compound (B) is polyacrylate of polyhydric alcohol, or polymethacrylate of polyhydric alcohol, and has number average molecular weight of 140-3000. The number average molecular weight of compound (C) is 3000-50000. The crosslinkable functional group is chosen from vinyl(oxy) group, allyl(oxy) group, ethynyl group, and (meth)acryloyl(oxy) group.
TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The average aspect ratio of electroconductive polymer particle is 3-10. Preferred Composition: The conductive polymer is polyaniline or its derivative. Preferred Process: The manufacture of slurry further involves ball milling conductive support agent and water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The atomic ratio of content of zirconium with respect to total content of indium, zirconium and hafnium is preferably 0.7-2.1. The atomic ratio of hafnium with respect to total content of indium, zirconium and hafnium is preferably 0.0002-0.08. The complex oxide sintered compact further contains tantalum. The atomic ratio of content of tantalum with respect to total content of indium, zirconium, hafnium and tantalum is 0.0002-1.5. The atomic ratio of total content of zirconium, hafnium and tantalum with respect to total content of indium, zirconium, hafnium and tantalum is 0.06-2. The complex oxide sintered compact has crystal phase containing bixbite-type oxide structure. Preferred Properties: The complex oxide sintered compact has relative density of 97% or more, and an average particle diameter of 8 mu m or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The sintered component has flexural strength of 90 MPa or more, relative density of 90% or more and 7.5 or more W/m.k, respectively.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Process: The ion-exchange treatment is performed in the state which carried out 0.1-30 degrees inclination of the glass substrate with respect to the perpendicular direction. Preferred Composition: The glass-making feedstock contains 40-80 mol% silica, 5-15 mol% alumina, 0-8 mol% boric oxide, 0-10 mol% lithium oxide, 0-20 mol% sodium oxide, 0-20 mol% potassium oxide, 0-10 mol% magnesium oxide, and does not contain lead oxide, and has liquid phase viscosity of 104 dPa.second or more. The total content of alumina and magnesium oxide is 8-16.5 mol%.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The size-exclusion membrane is an organic membrane or a polymeric membrane. The high-molecular-weight component is organic substance, metal-organic substance, oligomer, or polymer.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The resin film (51) or resin film (52) is weather resistance film or moisture proof film. The moisture proof film has inorganic layer on polyester film. The weather resistance film contains fluororesin. One of resin film (51) and resin film (52) is weather resistance and other is moisture proof film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The inorganic thin film layer contains complex oxide of silicon oxide and aluminum oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The blocking agent of the block isocyanate is bisulfate-type compound, pyrazole-type compound, active methylene-type compound or triazole-type compound. The laminated film contains inorganic thin film layers between base film and coating layer. Preferred Property: The boiling point of the blocking agent of block isocyanate is 180 degrees C or more.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent does not contain an amide system solvent substantially. The solvent is water, alcohol-based solvent, polyhydric alcohol-based solvent, ether-based solvent, ester-based solvent, ketone-based solvent and/or carbonate-based solvent. Preferred Properties: The boiling point of solvent is 200 degrees C or less. The applied voltage in electro-deposition process is 400 V or less. Preferred Definitions:    A=tetravalent aromatic group of formula: (i)-(vi).
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer (A) further contains polyether-based polymer and conjugated diene-type polymer. The transparent plastic is polymethylmethacrylate-type plastic.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The aluminum nitride or silicon-aluminum-oxygen-nitrogen-containing layer is formed on insulating thermally conductive filler, and is surface-treated using aluminum titanate-based coupling agent and titanate-based organic or silicon-based coupling agent. The content of insulating thermally conductive filler is 35-60 vol.%. Preferred Properties: The insulating thermally-conductive filler dispersion composition has viscosity of 0.5-35 Pa.second measured at 25 degrees C using rotational viscometer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is organic polar solvent chosen from N-methyl-2-pyrrolidone, N,N-dimethylformamide, N,N-diethyl formamide, N,N-dimethylacetamide, dimethyl sulfoxide, ( gamma )-butyrolactone, hexamethylphosphoramide, and 1,3-dimethyl-2-imidazolidinone.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises reacting the free ligand L and optionally L1a with metal alkoxides of formula (M(OR) n) (V), metal keto ketonates of formula (VI), metal halides of formula (MHal n) (VII), dimeric metal complexes of formula (VIII) or metal complexes of formula (IX).Hal=F, Cl, Br or I;L2a=alcohol or a nitrile; andanion=a non-coordinating anion. Preferred Definitions:    CyC=benzene, pyridine, pyrimidine, naphthalene, quinoxaline or 9H-fluorene; and    CyD=pyridine, isoquinoline, quinoline, quinoxaline, 2,3-dihydro-1H-imidazole, 2,3-dihydro-1H-benzimidazole, 1H-pyrazole or phenanthridine.    SPECIFIC COMPOUNDS - 162 Compounds (I) are disclosed, e.g. iridium complexes of formulae (Ia)-(Ie).    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The sodium sulfide solution is sodium sulfide nonahydrate crystal in organic solvent such as alcohol. The alcohol is one of glycol, ethanol, methanol, propanol, butanol, tertiary butanol, isopropanol, isoamylol or n-butyl alcohol. The dispersant is n-dodecyl mercaptan.
TECHNOLOGY FOCUS - POLYMERS - Preparation (claimed): Compound (I) is prepared by mixing 4,7-bis-(5-bromo-thiophen-2-yl)-5,6-bis-octyloxy-benzo(1,2,5)thiadiazole and 5,6-bis(octyloxy)-4,7-di(2-thienyl)-2,1,3-benzothiadiazole with molar ratio of 1:1 under nitrogen atmosphere, adding tetrahydrofuran, water and tetrakis(triphenylphosphine)palladium(0), and reacting at 100-200 degrees C for 72 hours.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of the fluorescent powder, involves: (1) accurately weighing oxides of elements or their corresponding salts in the structural formula, adding 8-12 times the total mol of cation, nitric acid solution, until all dissolve, then adding ethanol of 8-12 times the total mol of cation, in the solution and preparing the mixed solution; (2) weighing citric acid by 4-8 times the general mole of cation, adding in the mixed solution of step (1); (3) using ammonia water to adjust pH value to 8.5-7.5, at 70-90 degrees C, stirring until a blue transparent gel, adding the gel to 80-90 degrees C in the oven heat treatment for 1-3 hours to obtain the fluffy white foam product; (4) putting the fluffy white foam product into a muffle furnace, roasting for 3-6 hours; and (5) cooling the roasted material to the room temperature, crushing and sieving to obtain the final product at 500-900 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Graphene carbon material is graphite, carbon nanotube or fullerene. Heavy metal is ruthenium, cobalt or nickel. Preferred Composition: Ultrasonic dispersion liquid concentration is 0.01-1.00 g/L. Metal molybdenum and heavy metal mole ratio is 1:10-10:1. Mass ratio of molybdenum metal and heavy metal mixture and sodium borohydride is 1:40-1:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The near-infrared light excitation is carried out by simultaneously using two monochromatic lasers or continuous near-infrared excitation light source.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of tin(II)ion salt is 1-4 mmol/L. The concentration of copper(II)ion and zinc(II)ion salts in the solution is 8-14 mmol/L. The tin(II)ion salt is tin chloride, disodium tin chloride, tin sulfate or tin fluoride. The copper(II)ion salt is copper chloride, copper sulfate, copper acetate or copper nitrate. The zinc(II)ion salt is zinc chloride, zinc sulfate, zinc acetate or zinc nitrate. The molar ratio of tin(II)ion salt, zinc(II)ion salt and copper(II)ion salt is 1:1:2. The concentration of metal ion in the mixed solution is 4-16 mmol/L.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The sulfur source is sodium sulfide, hydrogen sulfide, thiocarbamide or thioacetamide. The molar ratio of metal ion and sulfur source is 1:1-1:2.5. The stabilizer is sodium hexametaphosphate, triethanolamine or ammonia triacetic acid. The mercapto compound is chosen from mercapto acid (S(CH)nCOOH) or mercapto alcohol (S(CH)nCH2OH), where n is 2-6. The content of stabilizer is 0.16-0.64 mmol/L.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Mixed solution of potassium hydroxide and isopropyl alcohol is used during etching process (a). The concentration of potassium hydroxide is 1-5%. The concentration of isopropyl alcohol is 5-10%. The acid solution is mixed solution of sodium persulfate and silver nitrate in the mass ratio of 0.05-0.1%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Processes: Preparation of graphene oxide (GO) involves mixing 2.5 g potassium persulfate and 2.5 g phosphorus pentoxide in 25-ml flask, adding concentrated sulfuric acid (H2SO4), heating at 40-180 degrees C, refluxing, adding 1-5 g graphite powder, reacting for 2-10 hours, neutralizing, adding 50-200 g graphite powder, concentrated H2SO4 and 8-30 g potassium permanganate (KMnO4), reacting for 1-10 hours in ice bath, increasing temperature to 35 plus minus 3 degrees C, stirring for 20-120 minutes, slowly adding 100-300 ml distilled water, cooling to room temperature, placing in 2-5-L beaker, adding 500-1500 ml distilled water and 5-60 ml H2O2, continuously stirring until bubbling stops and purple black mixture turns golden yellow, standing for 5-48 hours, discarding supernatant, adding aqueous hydrochloric acid (HCl) in which volume ratio HCl:water is 0.1-2:10, centrifugating to obtain brown colloid, vacuum drying at 30-80 degrees C to solidify, and grinding. Pretreatment of GO involves mixing 100-200 mg activated carbon XC-72 with nitric acid, heating at 80-120 degrees C for 10-24 hours, washing with water to neutralize, vacuum drying at 40-60 degrees C, acidifying, adding H2O2, sonicating for 20-40 minutes in ice bath, washing, filtering, and vacuum drying for 4-12 hours. Preferred Parameters: Power supply for microwave reactor is 800 W. Preferred Conditions: Temperature for drying GO is 60 degrees C. Calcining temperature is 300 degrees C. Calcining time is 30 minutes. Preferred Compositions: Ratio platinum cobalt in Pt-Co/C is 1:1. Mass ratio GO:activated carbon XC-72 is 4:1, preferably 1:1.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Process: The method further involves depositing transparent resistive oxide on buffer film.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The transparent resistive oxide includes amorphous zinc tin oxide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The glass substrate has glass transition point of 640-700 degrees C, average coefficient of thermal expansion of 60x 10-7/ degrees C to 110x 10-7/ degrees C, and density of 2.9 g/cm3 or less. Preferred Composition: The mass ratio of oxide of strontium and oxides of magnesium, calcium, strontium and barium is more than 0.6. The content of titanium oxide is 0.2 %mass or less with respect to 100 %mass total raw material. The total content of oxides of magnesium, calcium, strontium and barium is 17-30 %mass.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The glass sheet fluororesin laminated component has transmittance of 80% or more at wavelength of 400-700 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The thickness of the fluororesin coat layer is 0.1-1000 microns. The thickness of the fluororesin coat layer during setting thickness of the glass sheet to 1 microns is 0.001-10 microns. Preferred Component: The fluororesin is solvent soluble fluororesin, which is fluororesin which has ring structure in a principal chain. The solvent soluble fluororesin is polyvinylidene fluoride.
TECHNOLOGY FOCUS - METALLURGY - The crystalline silicon solar cell wafer has a crystalline silicon substrate that is an n-doped crystalline silicon substrate, or a p-doped crystalline silicon substrate. The crystalline silicon solar cell wafer has an insulating layer having a single-layer structure consisting of silicon oxide, silicon nitride, or silicon oxynitride. The crystalline silicon solar cell wafer has an insulating layer having a multi-layer structure selected from a group of silicon oxide layer, silicon nitride layer, and silicon oxynitride layer. The crystalline silicon solar cell has an insulating layer having a single-layer structure consisting of silicon oxide, silicon nitride, or silicon oxynitride. The crystalline silicon solar cell has an insulating layer having a multi-layer structure selected from a group of silicon oxide layer, silicon nitride layer, and silicon oxynitride layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The photosensitive film laminate further comprises polymerization inhibitor (D) containing nitroso compound and/or nitro compound, block isocyanate compound (E), and phosphorus compound (F). The polymeric compound (B) having unsaturated double bond is (di)pentaerythritol(meth)acrylate ester compound.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The base material is carrier film. The alkali-soluble resin (A) has polyimide structure of formula (II) and polyamic acid structure of formula (III) as repeating structural units. The polyimide structure (II) has diamine component of formula (IV).R9,R10,R12,R13,R15,R16,R18,R19,R21,R22=H or 1-20C monovalent organic group;R11,R14,R17,R20,R23=1-20C tetravalent organic group;m,n,p=0-100;R24=tetravalent organic group;R25=1-90C divalent organic group;R26=1-50C tetravalent organic group;q,r,s=0-30;andor q+r+s=1-30.Preferred Properties: The minimum thickness (a) of film obtained by baking on the wiring in flexible printed wiring board is 0.1-10 mu m. The maximum value (b) of surface level difference of film obtained by baking using portion which does not have wiring the wiring top is 3 mu m or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The upper limit of amount of copolymerization monomer of polypropylene resin contained in film is 0.1 mol%. The normal temperature xylene soluble portion of polypropylene resin contained in film is 7 %mass or less.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The minimum isotactic mesopentad fraction of the polypropylene resin comprised in the film is 96%, and the minimum plane-orientation coefficient of the film is 0.0125. The upper limit of the amount of copolymerization monomers of the polypropylene resin is 0.1 mol%. The normal-temperature xylene-soluble portion content of polypropylene resin is 7 %mass or less.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The sputtering target has theoretical density ratio of 90% or more, flexural strength of 100 N/mm2 or more, and bulk resistivity of 1 ( Omega )cm or less. The average particle diameter of metal phase in substrate of sintered compact is 50 mu m or less. Preferred Composition: The amount of oxygen in the sintered compact is 50-2000 ppm. An average of 1 or less aggregate(s) having size of 0.05 mm2 or more chosen from sodium fluoride, sodium sulfide and sodium selenide, is present in an area of 1 cm2 of target surface.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The adsorbent is obtained by attaching Lewis acid compound to base material. The adsorbent is used after it is processed with chlorosilane compound. Preferred Composition: The Lewis acid compound is chosen from copper sulfate, nickel sulfate and aluminum sulfate. The base material is chosen from silica gel, molecular sieve, zeolite and alumina.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The common semiconductor material is selected from silicon, germanium, gallium antimonide, gallium arsenide, indium arsenide, gallium phosphide, indium phosphide, indium gallium phosphide and cadmium telluride.
TECHNOLOGY FOCUS - METALLURGY - The second metal layer is made of material selected from a group consisting of copper, aluminum, silver, platinum and gold. The method involves forming a third metal layer covering the second metal layer, where material of the third metal layer comprises silver.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The alkaline component comprises potassium hydroxide, sodium hydroxide, choline hydroxide, tetramethylammonium hydroxide or tetraethylammonium hydroxide. The nanoparticle slurry comprises colloidal particles of alumina, silica, ceria, beryllia, magnesia, zirconia and titania. The aqueous alkaline etchant solution further comprises pre-etched conditioning silicon. The crystalline silicon substrate comprises single-crystalline silicon.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The additive is alcohol including isopropyl alcohol, ethylene glycol, glycerol, cyclohexanol or ethyl hexanol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The boron-doped layer made of silicon oxide or silicon nitride or silicon oxynitride or amorphous silicon is provided on the dielectric layer. The negative doping of the silicon substrate is performed by diffusion of phosphorus oxychloride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The liquid dopant source is a phosphorus-containing solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Condition: The contact process is carried out at 50-100 degrees C.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compound: The composition contains 100 parts mass water, 0.2-20 parts mass base, 0.0001-10 parts mass phosphonic acid anion, and 0.1-10 parts mass silicate (in solution (I) or (II)). Preferred Definitions:    R=5-24C alkyl, alkenyl, alkynyl, or aryl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The method further involves depositing gallium phosphide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polyarylate resin further comprises organosiloxane residue of formula: -R5(-Si(-R7)(-R8)-O-)m-Si(-R9)(-R10)-R6- (III), isophthalic-acid residue, monohydric-phenol residue, monovalent acid chloride residue, monohydric alcohol residue, and/or monocarboxylic acid residue. The bisphenol residue (I) is 2,2-bis(4-hydroxyphenyl)hexafluoro propane residue. The aromatic dicarboxylic acid residue (II) is diphenyl ether 4,4'-dicarboxylic acid residue.R5,R6=aliphatic or aryl having N or O;R7-R10=aliphatic or aryl;andm=5 or more.Preferred Property: The light transmittance of 100 mu m thickness film after irradiating UV ray of wavelength 400 nm with an illumination intensity of 1 mW/cm2 for 24 hours is 70% or more with respect to light transmittance of the film before irradiating with UV ray of wavelength 400 nm.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: Resin casing is internally equipped with communication apparatus.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: E components are phosphorus-based flame retarder or fluorine-containing organometallic salt.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Weight ratio A component/B component is 5/95-95/5. Resin composition contains 0.01-2 pts. wt. UV absorber (D component), 0.005-25 pts. wt. flame retardant (E component), 0.01-1 pt. wt. fluorine-containing dripping inhibiting agent (F component), and 0.1-30 pts. wt. styrene resin (G component) with respect to total of 100 pts. wt. A component, B component, and C component. Preferred Parameters: Resin composition is classified as V-0 for thickness of 1.8 mm according to UL94 test.
TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The intrinsic viscosity of the fully aromatic polyamide is 1.5 dl/g or more. The film has thickness of 10 mu m or more, and light transmittance of 75% or more at 400 nm. The thermal expansion coefficient of the film at 100-200 degrees C is -30 to 30 ppm/ degrees C. The arithmetic-mean surface roughness of the film surface is 0.1-10 nm. Preferred Component: The multifunctional compound of formula (V) is polyfunctional epoxy resin and/or polyfunctional isocyanate resin.R10,R11,R12=group having epoxy or isocyanate.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The fluorometer comprises light source, monochromator, sample cell and photo detector.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The solvent used is methanol, chloroform or benzene. The laser dye is rhodamine 575, rhodamine 590, or rhodamine 610, where the dyes were doped in sol-gel glass, polyethylene glycol and polymethyl methacrylate. In the system: 0.25 g of dye is dissolved in chloroform and added with 0.25 g of polymethyl methacrylate, and 10 mg of dye is dissolved in benzene and added with 1 g of polyethylene glycol to make the solution. The dye doped sol-gel glass samples were prepared using tetraethyl orthosilicate and fluorescence spectra were recorded.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preparation (claimed): The co-doped oxide-containing ceramic material with apatite toughened structure is prepared by weighing raw materials, ball milling, adding anhydrous ethanol or acetone as dispersant, oven-drying, calcining in muffle furnace, forming and sintering. Preferred Method: Ball milling is done for 0.25-0.48 hour. Calcining is done at 900-1500?OC for 0.25-36 hour. Sintering is done at 1450-1850 degrees C for 0.5-36 hours. Forming is by dry pressing, isostatic pressing, injection molding, casting or molding.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The dopant material comprises a chemical group having a chemical structure consisting of silanes, cyclosilanes, and siloxanes.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The lithium transition metal oxide contains lithium manganese complex oxide of spinel structure. The content of phosphoric acid compound with respect to 100 parts mass phyllosilicates is 1-20 parts mass. Preferred Property: The average length of the phyllosilicate is 100-200 nm, based on electron-microscope observation.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The positive electrode active material contains cation with higher ionization tendency than hydrogen ion in the interlayer. The phyllosilicate has cation exchange ability. The phyllosilicate contains group chosen from smectite group, vermiculite group, mica group and chlorite group.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Substrate: The substrate is chosen from (co)polymeric film or electronic devices comprising an organic light emitting device (OLED), an electrophoretic light emitting device, a liquid crystal display, a thin film transistor and/or a photovoltaic device.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The barrier film further comprises several alternating layers of the base polymer layer and the oxide layer between the substrate and the top coat polymer. The substrate has a flexible transparent film. The polymer layers have an acrylate. The oxide layer comprises a layer of an inorganic silicon aluminum oxide. The barrier film further has an inorganic layer (21) (oxide layer) applied to the top coat polymer layer. The adhesion-modifying layer is an adhesion-promoting layer comprising a silane and is a release layer. The adhesion-modifying layer is disposed between one of the substrate and the base polymer layer, the base polymer layer and the oxide material, and the oxide material and the top coat polymer layer.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The composition comprises Li(Li0.2Mn0.54Ni0.13Co0.13)O2 and LiMn1.5Ti0.5O4, where LiMn1.5Ti0.5O4 comprises a spinel structure. Either Li(M1-xLix)O2 or yLi2MnO3.(1-y)LiM2 is Li(Li0.2Mn0.54Ni0.13Co0.13)O2. The composition comprises Li(Li0.2Mn0.54Ni0.13Co0.13)O2 and at least one of LiMn1.5Ti0.5O4 and LiMn1.5Ni0.5O4. Preferred Parameters: The Li(Li0.2Mn0.54Ni0.13Co0.13)O2 has a particle size of from about 100 nm to about 300 nm and the LiMn1.5Ti0.5O4 has a particle size of from about 1 mu m to about 2 mu m. Particles of Li(Li0.2Mn0.54Ni0.13Co0.13)O2 and particles of LiMn1.5Ti0.5O4 are evenly distributed throughout the composition. Capacity retention of the Li-ion electrochemical cell is from about 80% to about 95% of an initial discharge capacity after about 40 cycles; or capacity retention of the Li-ion electrochemical cell is about 90% of the initial discharge capacity after about 40 cycles. First coulombic efficiency of the Li-ion electrochemical cell is from about 75% to about 95%; or first coulombic efficiency of the Li-ion electrochemical cell is about 93%. A charge transfer resistance value of the Li-ion electrochemical cell is about 6.8 ohm and about 11.4 ohm after the second and twentieth cycle, respectively. First irreversible capacity loss of the Li-ion electrochemical cell is less than about 20 mAh/g; or first irreversible capacity loss of the Li-ion electrochemical cell is about 17 mAh/g. First discharge capacity of the Li-ion electrochemical cell is from about 190 mAh/g to about 255 mAh/g; or first discharge capacity of the Li-ion electrochemical cell is about 220 mAh/g. Preferred Composition: The LiMn1.5Ti0.5O4 and Li(Li0.2Mn0.54Ni0.13Co0.13)O2 are provided in a molar ratio range of from about 1:1 to about 1:3, preferably 1:3.
TECHNOLOGY FOCUS - METALLURGY - The first metal plate is connected to a positive electrode terminal of a lithium ion battery, and the second metal plate is connected to a negative electrode terminal of the lithium ion battery for the battery cell with a lithium ion battery by the product made from a copper or copper alloy. The battery pack is formed by connecting the electrode terminal of a battery cell to a voltage detection circuit through a lead wire.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The low-viscosity solvent is lower alcohol or glycol monoalkyl ether. The lower alcohol is methanol, ethanol or propanol. The highly viscous alcohol is glycol. The glycol is propylene glycol or butanediol. The content of mixed alcohol is 300 pts. wt. with respect to 100 pts. wt. poly(3,4-ethylenedioxythiophene)/polystyrene sulfonate aqueous solution and. The ratio of low-viscosity solvent and highly viscous alcohol is 4:1. The mixed alcohol contains 100-150 pts. wt. low-viscosity solvent, 150-200 pts. wt. highly viscous alcohol. The concentration of poly(3,4-ethylenedioxythiophene)/polystyrene sulfonate aqueous solution is preferably 1.3-2 wt.%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The thermal conductor sections comprise a material including graphite based material and a metal, where the metal comprises aluminum, steel, stainless steel and copper.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The container comprises a polymer including polyetheretherketone, polyimide and phenolic polymer. The lid is made of poor thermal conductivity material including polyetheretherketone, polyimide and phenolic polymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The alkaline component comprises potassium hydroxide (KOH), sodium hydroxide (NaOH), choline hydroxide, tetramethylammonium hydroxide (TMAH) or tetraethylammonium hydroxide (TEAH) (preferably KOH). The nanoparticle slurry comprises colloidal particles of alumina, silica, ceria, magnesia, zirconia and titania (preferably silica).    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Solution: The aqueous alkaline etchant solution (S1) comprises 0.3-1.5 wt.% of nanoparticle slurry; and further comprises 0.1-20 wt.% of alcohol, and 0.00005-0.1 wt.% of surfactant. The size of colloidal particles of nanoparticle slurry is 10-1000 nm. Preferred Components: The alcohol is selected from isopropyl alcohol, ethylene glycol, glycerol, cyclohexanol and ethyl hexanol. EXAMPLE - A surface of single-crystalline silicon substrate was textured by immersing in test aqueous alkaline etchant solution containing 1.5 wt.% of KOH and 1.2 wt.% of nanoparticle slurry containing 30 wt.% of silica particles, or in comparative aqueous alkaline etchant solution containing 1.5 wt.% of KOH and 0.5 wt.% of pre-etched conditioning silicon. The texturing was performed at 75 degrees C for 15 minutes. The result showed the etching rate was 0.41/0.28 mu m/min and weighted average reflectance (WAR) was 0.112/0.117 of textured substrate by using test/comparative solution respectively.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The second material comprises a dispersing agent to inhibit agglomeration of the nanoparticulates in the dispersion medium; and a surfactant interacting with the nanoparticulates to modify surface properties of the nanoparticulates when the particles are decomposed in the liquid dispersion medium. The second material coats the surface of the nanoparticulates when the particles are decomposed in the liquid dispersion medium. The second material is chemically reactable with to functionalize the surface of the nanoparticulates. Preferred Method: After the step of forming particles the method further involves decomposing the particles in the liquid dispersion medium; releasing the nanoparticulates from the particles. During or after the decomposing, method involves reacting the second material with the nanoparticulates to functionalize a surface of the nanoparticulates, and during releasing, the second material interacts with the nanoparticulates to inhibit agglomeration and aid dispersion of the nanoparticulates in the liquid dispersion medium. The particles comprise matrix that maintain the nanoparticulates in a dispersed state, the matrix comprising the second material. The reducing agent is contained within the precursor medium, or is dissolved in the liquid vehicle of the precursor medium. The reaction of the reducing agent reduces temperature at which the first material forms in the gas dispersion by at least 50 degrees C. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The tin-zinc-sulfur type compound contains tin sulfide and zinc sulfide. The chalcogenide compound contains sulfur and does not contain selenium. The chalcogenide compound is copper-zinc-sulfur type compound or copper indium sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The excitation light has wavelength of 400-1500 nm. The average dimension of the gap is more than the dominant wavelength of the light emitted by the fluorescent substance layer. The gap is filled by gas chosen from air, nitrogen and argon. A material different from the fluorescent substance particles is distributed to the gap. The fluorescent substance particles comprise fluorescent substance particles (A) having light emission dominant wavelength of 500-560 nm, fluorescent substance particles (B) having light emission dominant wavelength of 600-650 nm, fluorescent substance particles (C) having light emission dominant wavelength of 430-490 nm and fluorescent substance particles (D) having light emission dominant wavelength of 560-590 nm. Each of fluorescent substance particles (A), fluorescent substance particles (B), fluorescent substance particles (C) and fluorescent substance particles (D) contains different phosphor material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The medium comprises alkaline component and/or viscosity-increasing substance, and oxidizing agent. The oxidizing agent is peroxodisulfate or peroxomonosulfate. Preferred Process: The substrate is contacted with diluted hydrofluoric acid, to remove glasses or oxides on substrate surface before contacting with medium.
TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: The porous crystalline material has a first pore diameter of 4 Angstrom , and a second pore diameter of 6.5 Angstrom , and a first pore size of 6.5 Angstrom and a second pore diameter of 7.5 Angstrom . The porous crystalline material is MgAPO-11 as the first pore size is between 4 and 6.5 Angstrom or MgAPO-36 as the first pore diameter is 6.5-7.5 Angstrom . Preferred Components: The dye is distributed in the monomeric state and aligned with respect to the direction of the channels of the array when the porous material is MgAPO-11. The dye is formed into geometric associations to coplanar type monomers in head-tail geometry when the porous material is MgAPO-36. The hybrid material is a hybrid anisotropic material. The dye is selected from pyronine, acridine and oxazine, preferably pyronine Y. The matrix is MgAlPO-36 and the dye is Pyronine Y. Hybrid material comprises two dyes. The magnesium source is selected from magnesium sulfate, magnesium nitrate and magnesium acetate. Aluminum source is selected from aluminum oxide, an aluminum oxide partially hydrated, aluminum isopropoxide, aluminum hydroxide, and its combination. The phosphorus source is orthophosphoric acid. Preferred Process: Heating the aqueous synthesis gel is carried out by heat treatment at a temperature between 100 and 200 degrees C, preferably 180 degrees C. Heating is conducted for a period of time ranging from 5 to 72 hours. Heating is carried out by hydrothermal synthesis or by microwaves. Preferred Definitions:    x=0.2;    y=0.75;    z=0.024;    w=300; and    R =selected from a primary amine, a secondary amine, a tertiary amine and a quaternary ammonium cation, preferably tripropylamine or ethylbutylamine.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The rock-salt type oxide nanoparticles contain nickel oxide or cobalt oxide. The base metal of rock-salt type oxide is chosen from nickel, cobalt, magnesium, titanium, iron, vanadium, manganese, tantalum, niobium, zirconium, calcium, barium, strontium, cadmium, barium, europium, samarium and other elements. Preferred Process: The joining structure is obtained in a state in which the rock-salt type oxide nanoparticles and metal nanoparticles are independently dispersed. The thermal oxidation process of an alloy nanoparticles is performed in gaseous phase at 600 degrees C or more for 10 seconds or less. During heating of an inert gas, an oxidizing gas is introduced for alloy nanoparticles. The alloy nanoparticles are produced by gas evaporation, laser ablation method, sputtering method, arc-plasma method or atmospheric pressure plasma process. Preferred Property: The metal nanoparticles have particles diameter of 1-50 nm.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The alloy nanoparticles further contains doping element. The noble metal is chosen from gold, platinum, palladium, rhodium, silver, ruthenium and iridium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): The metal complex (I) is manufactured by mixing and heating tetrahydroanthracene-containing compound of formula (II) and cobalt sulfate or iron sulfate, adding oxygen and pyridine-containing compound of formula (III)-(V) and heating, and adding zinc salt of formula: Zn.Y'(power)(-n) to reaction system. Preferred Definitions:    Y(power)(-n)=(PF6-)4, (ClO4-)4, (BF4-)4 or (PPh4-)4.    EXAMPLE - 40 mg Cobalt sulfate, 50 mg 1,8-bis(2,2':6',2"-terpyridyl)anthracene and 70 mL ethanol were mixed. 10 mL Distilled water was added to mixed solution, and stirred under ethanol recirculation for 18 hours. 24 mg 2,2'-Bipyridine was added and reacted by stirring for 24 hours under ethanol recirculation, and air was blown. 30 mL Saturated aqueous solution of ammonium hexafluorophosphate was added and stirred at room temperature, to obtain crystals. The crystals were filtered from reaction mixture, to obtain metal complex, with yield of 49%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: (I) is a halogen containing pyridine compound of formula (Ia) or (Ib) and (II) is an aniline compound of formula (IIa) or (IIb). SPECIFIC COMPOUNDS - 1 Compound is specifically claimed i.e. 3-(2-pyridyl)-N-(3-(2-pyridyl)phenyl)aniline of formula (IIIa).    EXAMPLE - 7.2 g of 2-(3-Bromophenyl)pyridine and 5.2 g of 3-(2-pyridyl)aniline were suspended in 200 ml of toluene under argon atmosphere. 340 mg of 1,1-Bis-(diphenylphosphino)-ferrocene and 140 mg of palladium(II) acetate were added to the flask and stirred vigorously under argon atmosphere. Then 3.5 g of sodium tert-butoxide was added to the flask under argon. The reaction mixture was stirred under reflux for 24 hours. After cooling to room temperature, the organic phase was separated off, washed three times with 100 ml of water, dried over magnesium sulfate, filtered and subsequently evaporated to dryness. The residue was purified by column chromatography on silica gel using a mixture of 1:2 of ethylacetate/heptane to give 8.2 g of 3-(2-pyridyl)-N-(3-(2-pyridyl)phenyl)aniline.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method involves placing silicon into smelting crucible, melting silicon in medium-frequency induction furnace into liquid, uniformly mixing with slag, adding the mixed slagging agent into silicon, heating to completely melt slag, passing medium to mixer and finishing medium smelting, pouring the slag onto bath surface, repeating the steps 2-4 times to obtain silicon liquid, pouring, cooling and solidifying in the mold. The mixing time is 5-20 minutes. The slagging agent and silicon liquid mass ratio is 0.3 to 1.2:1. The fourth step involves when medium smelting is finished, controlling the temperature at 1500 plus minus 20 degrees C. Preferred Components: The melting crucible is graphite crucible.
TECHNOLOGY FOCUS - POLYMERS - Preferred Parameters: Silicon material is doped in electro-active doping agent at 1-2 Omega .cm. Preferred Compositions: Doping agent is 790-850 kg boron. Preferred Processes: Inner surface of bottom of quartz crucible has rough surface and is coated with central purity sand stone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Pre-cleaning agent contains hydrogen peroxide and aqueous ammonia. Surfactant is an alkylphenol surfactant, prefearbly block copolymer E0P0E0. Surfactant composition is 0.059-0.5 vol.%. Base is sodium hydroxide or potassium hydroxide, preferably tetramethyl ammonium hydroxide. Alkali concentration is 10-20%. Acid-washing uses hydrochloric acid and hydrofluoric acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The heat conductive filler (B) contains silicon carbide or aluminum oxide, preferably silicon carbide. The heat conductive filler (B) further contains a metal-containing compound chosen from metal, metal oxide, metal carbide, and metal nitride compound.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polar monomer modified component (A2) is an unsaturated dicarboxylic acid anhydride-modified component.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The ethylene-type copolymer resin (A) contains ethylene and polar monomer copolymer resin (A1), polar monomer-modified component (A2), and an ethylene-alpha-olefin copolymer resin. The ethylene and polar monomer copolymer resin (A1) is chosen from ethylene vinyl ester copolymer resin, ethylene and (meth)acrylate copolymer resin, ethylene and (meth)acrylic acid copolymer resin, ethylene, (meth)acrylic acid and (meth)acrylate copolymer resin and/or their acid-modified components, ionomer of ethylene and (meth)acrylic-acid copolymer resin, and ionomer of ethylene, (meth)acrylic acid, and (meth)acrylate copolymer resin. Preferred Properties: A sheet formed using resin composition has volume resistivity value measured in 1 mm thickness at 23 degrees C and 50% of humidity based on JIS K6911:2006 of 1x 106-1x 1016 ( Omega )cm. The resin composition thermo-bonds or heat-adheres with respect to a metal, and has metal-bonding force measured at maximum value when 1 cm press sheet is peeled off from the aluminum foil at peeling rate of 300 mm/minute at 23 degrees C and humidity of 50% relative humidity of 1.5 N/15 mm or more. The press sheet of 1 mm thickness consists of the resin composition heat-sealed to an aluminum foil of a 50 mu m thickness at 150 degrees C under 0.4 MPa for 2 seconds. The molded product is sheet-shaped.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The copper-containing substance is chosen from copper aluminum oxide, copper gallium oxide, copper indium oxide, copper titanium oxide, copper-yttrium-calcium oxide (CuY1-xCaxO2), copper-chromium-magnesium oxide (CuCr1-xMgxO2) and/or copper oxide. The hole-conducting charge carrier pair generating layer contains zinc-cobalt oxide, zinc rhodium oxide and/or zinc iridium oxide. The hole-conducting charge carrier pair generating layer is chosen from lanthanum copper oxide sulfide, lanthanum-copper oxide selenide and/or lanthanum-copper ixide telluride. The secondary electron-leading charge carrier pair creation layer comprises intrinsic electron-leading substance.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The primary electron-leading charge carrier pair creation layer comprises dipyrazino(2,3-f:2',3'-h)quinoxaline 2,3,6,7,10,11-hexacarbonitrile, copper alloy (I) (Cu (I)pFBz), molybdenum oxide, tungsten oxide, vanadium oxide, rhenium oxide and bismuth alloy (Bi(III)pFBz).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The polar medium contains 50 vol.% or more water.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The addition amount of polypeptide in dispersion liquid is 0.2-2 wt.%. The polypeptide has 3-fold spiral structure.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The particles (b) are non-scattering particles. The weight ratio of particles (b) with respect to particles (a) is 0.05-10.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The substrate further contains 10-2000 pts. wt. binder having refractive index of is 1.4 or more. The binder contains polyamic acid or polyimide substrate, and polysiloxane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The primary particles have refractive index of 2.2 or more. The ratio of total content (A+B) of primary particles and secondary particles, with respect to content (C) of binder is 2-5.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The binder is polysiloxane, polyamic acid or polyimide. The binder has refractive index of 1.7 or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The third layer: has a different composition than that of the first layer and the second layer; has a higher density than that of the first layer and the second layer; comprises a different precursor than that of the first layer and the second layer; comprises at least one sintered material; and comprises many entangled fibers and a reinforcing structure joined to and extending between the entangled fibers. The reinforcing structure comprises a ceramic powder sintered together with the entangled fibers. The entangled fibers have a ceria, zirconia or alumina coating. The first compressibility and the second compressibility are sufficient to conform to surface irregularities in a mating surface (24). At least one of the first layer and the second layer: is a composite comprising at least two first sublayers; and comprise CEF-100 ceria felt. The third layer is a composite comprising at least two second sublayers. The two second sublayers comprise at least one of ZYF-100, ZYF-150 and CEF-100, where the zirconia felt ZYF-100, ZYF-150 or CEF-100 is sintered at 1625 degrees C, preferably 1600 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Body: The macropores have diameter of 0.5-30 mu m. The walls of the macropores are not porous. The walls of the macropores have mesopores with diameter of 2-50 nm, and micropores with diameter of less than 2 nm, thus resulting in bicontinuous porous material with hierarchical pores. The body is hollow body that is even-walled; and comprises at least one metal and/or metal oxide. The walls of macropores are 50 nm to 15 mu m thick. The body has surface area of 5-200 m2/g; and is monolith and free of silica and surfactant.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The metals are selected from Li, Be, Na, Mg, Al, K, Ca, Sc, Ti, V, Cr, Fe, Cu, Ga, Rb, Sr, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Cd, In, Sb, Cs, Ba, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Tl, Pb, and Bi; or selected from Ni, Co, Mn, Ag, Zn, and Sn. EXAMPLE - A concentrated solution comprising 77.7 g of Co(NO3)2.6H2O dissolved in 59 g de-ionized water (4.5 mol/kg solvent) was prepared. Silica monoliths containing large pores, 1-5 mu m in diameter, and much smaller pores, 4.5 nm in diameter, were dried under vacuum for 20 minutes and filled with the solution. Monoliths became translucent and excess solution was removed from the outside. Filled monoliths were heated at 150 degrees C for 10 hours and then heated up to 400 degrees C over 4 hours and held at 400 degrees C for 30 hours while flowing 5% H2 in N2. The filling and heating steps were repeated 4 times. The silica was removed by soaking the composite in an aqueous potassium hydroxide solution (3 mol/l water) overnight. This resulted in free standing, porous cobalt metal monolith.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The sensitizer can absorb the energy of UV or blue light via 4f-5d transition. The energy absorbed by the sensitizer can be transferred to the acceptor. The light-emitting device comprises a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and an active layer formed between the first conductivity type semiconductor layer and the second conductivity type semiconductor layer. The optoelectronic apparatus (a1) further comprises: a circuit board comprising a circuit on it, where the light-emitting device is formed on it; and a transparent encapsulating material formed on the circuit board and covering the light-emitting device, where the wavelength converting material is distributed in the transparent encapsulating material. The first light is UV or blue light. The second light is near infrared light. The optoelectronic device comprises solar cell. Preferred Definitions:    A1 = Li, Na, K, Rb or Cs;    B1 = Mg, Ca, Sr or Ba; and    M1, N1 = Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb or Lu.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The base material is transparent or semi-transparent material. Preferred Structure: The base material is electroconductive film, when shirasu structure is light-control element. The light-control element further comprises secondary electroconductive film provided on oxidation color development film provided on thin film of shirasu provided on reduction color development film provided on base material. High-refractive index thin film having refractive index higher than thin film of shirasu is provided on base material, when the shirasu structure is light-reflection prevention material. The electroconductive film is transparent component or translucent component.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The silver compound is silver oxalate. The cycloaliphatic hydrocarbon is a compound including six-membered-ring structure, mono-cyclic structure or polycyclic structure. The content of cycloaliphatic hydrocarbon is 10-90 wt.% with respect to content of dispersion solvent. The dispersion solvent further contains 4C or more aliphatic alcohol. The content of 4C or more aliphatic alcohol is 10-90 wt.% with respect to content of dispersion solvent. The aliphatic-hydrocarbon monoamine (A) is 6-12C alkyl monoamine. The aliphatic-hydrocarbon monoamine (B) is 2-5C alkyl monoamine. In aliphatic-hydrocarbon diamine (C) is alkylene diamine in which one of 2 amino group(s) is primary amino group, and other is tertiary amino group. The total content of monoamine (A), monoamine (B), and diamine (C) is 1-50 mol with respect to 1 mol of silver atoms of silver compound. The content of silver nanoparticles is 25 wt.% or more with respect to total content of silver nanoparticle-containing ink.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The positive electrode in the battery contains lithium containing compound as positive electrode material. The lithium containing compound is a compound chosen from metal chalcogenide having lithium oxide. The negative electrode contains material(s) chosen from metallic lithium, carbon material and material having lithium and element in which alloy formation is possible as negative electrode active material.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The fluorine containing cyclic-sulfonate-ester is substituted 1,3-propane sultone or 1,4-butane sultone having hydrogen atom(s) substituted by 1-4 fluorine atoms.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: In all the single-crystal silicon blocks of a seed crystal, the crystal orientation of direction perpendicular to crucible bottom face is arranged within plus minus 10 degrees . The crystal orientation of surface used as the boundary during block of single-crystal silicon block is less than plus minus 10 degrees from mirror-symmetry surface with respect to crystal orientation of single-crystal silicon block of both sides.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The portion has cap covering a tube transducing the inert gas into the crucible. Preferred Gas: The inert gas is argon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Hydrogen source gas is mixed gas of ammonia gas and carrier gas. Carrier gas is gas inactive with respect to light at wavelength of less than or equal to 200 nm. Light source is a xenon excimer lamp.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of volume of chemical thermal storage medium after dehydration reaction of hydroxide of alkali metal or alkaline-earth metal with respect to volume of chemical thermal storage medium before dehydration reaction of hydroxide of alkali metal or alkaline-earth metal is more than 0.70. The structure component consists of sepiolites.    TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Components: The thermal accumulator is mounted on a vehicle. The vehicle consists of catalyst for exhaust gas purification, exhaust passage which circulates the exhaust gas from an engine, and the reactor in the middle of exhaust passage. The reactor is positioned in an exhaust gas flow upstream rather than the catalyst of exhaust passage. Preferred Conditions: During thermal storage operation, heat is supplied from the exhaust gas to the chemical thermal storage medium. The exhaust gas is heated by thermal radiation emitted from hydration reaction of the chemical thermal storage medium and the catalyst is heated with the heated exhaust gas.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The tin ionic compound is tin sulfate. Preferred Process: The heat-firing process is carried out at 800 degrees C or more in inert gas atmosphere and is further heated at 500 degrees C or less under atmospheric condition, to obtain carbon, metal tin and/or tin oxide composite nanosheet. Preferred Properties: The carbon, metal tin and/or tin oxide composite nanosheet has thickness of 5-150 nm and width of 0.0005-10 mm. The nanoparticles of carbon, metal tin and/or tin oxide composite nanosheet have average particle diameter of 2-50 nm. The nanoparticles of tin oxide have average particle diameter of 5-50 nm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: Polyamine is water-soluble and has average molecular weight of 1000-1000000.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Iron compound is iron sulfate. Nanosheet contains 1-30 mass% iron-based crystalline substance. Iron-based crystalline substance in nanosheet is iron sulfide or iron oxide nanoparticle with average particle diameter of 1-1000 nm. Preferred Processes: Heating-and-firing process is performed in inert gas atmosphere. Preferred Parameters: Thickness of nanosheet is 5-100 nm. Size of nanosheet in 2-dimensional direction is 500 nm to 10 mm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Polyamine is water-soluble polyamine with number average molecular weight of 1000-1000000. Mole ratio of amino group in polyamine and iron cation in iron compound is 1:1-5:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of silicon dioxide is 30-50 %mass, boron trioxide is 10-25 %mass and metal oxide is 0-13 %mass, based on oxide conversion. The mass ratio of metal oxide with respect to sum of silicon dioxide and boron trioxide is 0.3 or less.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The reinforced material includes glass fiber, glass fabric, glass nonwoven fabric, glass beads, glass flakes, silica particles and colloidal silica. The content of reinforced material is 40-70 wt.%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The matrix further includes silicone urethane (meth)acrylate. The silicone urethane (meth)acrylate has weight-average molecular weight of 350-50000 g/mol. The matrix further includes UV-curable catalyst. The UV-curable catalyst includes platinum-containing diene, rhodium-containing diene or ruthenium-containing diene. The thickness of composite sheet is 15-200 mu m.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The silicone-based resin comprises ultraviolet curable-silicone resin comprising functional group chosen from (meth)acrylate group, epoxy group, alkoxy alkyl group, epoxy alkyl group, allyl group and vinyl group. The ultraviolet curable-silicone resin comprises structural unit of formula: -(O-Si(-Ra)(-Rb)-)n (I). The UV-curable silicone-based resin has number-average molecular weight of 350-50000 g/mol. The silicone-based resin is polydimethylsiloxane resin.Ra,Rb=H, 1-20C alkyl, 2-20C alkenyl, 2-20C alkynyl, 1-20C alkoxy, 3-30C cycloalkyl, 3-30C cycloalkenyl, 3-30C cycloalkynyl, 6-30C aryl, or 6-30C aryloxy;andn=2-1000.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises either reacting a fluorine derivative containing a leaving group with an amine compound of formula (Ar2-NH-Ar1) (III) using a single-stage Buchwald coupling, or reacting a fluorine derivative containing a leaving group with an amine compound of formula (Ar2-NH2) (IV) and (H2N-Ar1) (V) using a second-stage Buchwald coupling. SPECIFIC COMPOUNDS - 169 Compounds (I) are disclosed, e.g. 9,9-dimethyl-N,N-bis(4-phenylphenyl)fluoren-2-amine compound of formula (Ia), 9,9-dimethyl-N-(2-phenylphenyl)-N-(4-phenylphenyl)fluoren-2-amine, 9,9-dimethyl-N,N-bis(3-phenylphenyl)fluoren-2-amine, 9,9-dimethyl-N-(2-phenylphenyl)-N-(3-phenylphenyl)fluoren-2-amine, and 9,9-dimethyl-N-(3-phenylphenyl)-N-(4-phenylphenyl)fluoren-2-amine.    EXAMPLE - 23.5 g of Biphenyl-2-yl-biphenyl-4-yl-amine and 20 g of 2-bromo fluorene were dissolved in 500 ml of toluene. The solution was degassed and saturated with nitrogen. Then, 2.52 g of tri-tert-butylphosphine and 0.33 g of palladium(II) acetate were added to the reaction mixture. 10.8 g of Sodium tert-butoxide are subsequently added to the reaction mixture. The reaction mixture was heated for 6 hours under a protective atmosphere to a boil. The mixture was distributed between toluene and water. The organic phase was washed three times with water, dried over sodium sulfate and evaporated. After filtration of the crude using silica gel with toluene, the residue was recrystallized from heptane/toluene and was finally sublimed in high vacuum and worked up to give biphenyl-2-yl-biphenyl-4-yl-(9,9-dimethyl-9H-fluoren-2-yl)-amine.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preparation: No preparation method is given. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: In the step (i), the inoculum concentration of Staphylococcus in the strain seed liquid is 5-20%, allowing it to stand and culturing for 2-5 days, where the culture temperature is 25-35 degrees C in the constant-temperature culture box. The microbial fuel cell anodic liquid comprises 2 g/l glucose, 3.13 g/l sodium bicarbonate, 0.31 g/l ammonium chloride, 4.97 g/l sodium dihydrogen phosphate, 0.56 g/l ammonium sulfate, 0.13 g/l potassium chloride, 15 mg/l calcium chloride, 20 mg/l manganese sulfate, 1 mg/l ferric chloride, 6.93 g/l disodium hydrogen phosphate dodecahydrate, and 0.2 g/l magnesium sulfate. The cathode liquid comprises 16.5 g/l potassium ferricyanide, 0.4 g/l sodium dihydrogen phosphate dihydrate, and 6 g/l disodium hydrogen phosphate dodecahydrate. The graphene oxide suspension concentration is 0.22 %, the volume ratio of anodic bacterial suspension and graphene oxide suspension is 1:1-1:10; the mixed culture time is 0.5-3 days, the culture temperature is 25-35 degrees C. In the step (iii), washing sequentially using dilute hydrochloric acid, ethanol, and water, and repeatedly washing, where the volume of diluted hydrochloric acid is 0.1- 5 mol/l, and the volume fraction of ethanol is 70-80%, the centrifugal rotating speed is 8000-12000 revolutions/minute, centrifugal time is 15-80 minutes, drying by common vacuum drying or vacuum freezing drying, where the common vacuum drying temperature is 50-100 degrees C, vacuum freezing and drying temperature is -20 to -80 degrees C, the vacuum degree is less than 160 Pa, and the drying time is 24-48 hours.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Copper gridline is obtained by connecting voltage stabilized controllable cathode terminal to PN junction solar cell, connecting molybdenum tab anode terminal to voltage stabilized power supply, setting copper solution with magnetic stirring system, placing cathode and anode sheet in copper solution with circulating loop, adjusting flow rate of magnetic rotor in copper solution to set temperature of copper solution, starting power supply, and reacting copper ions to form gridline. Solution tank is cleaned before used by soaking in 3-5% alkaline solution for hours, rinsing with water repeatedly, soaking in 8-12% acid solution for hours, and rinsing with water repeatedly. Nickel solution pH is adjusted by adding potassium hydrogen phthalate with pH of 4.003 and glacial acetic acid to obtain pH of 2.5-5, and copper solution pH is adjusted by adding mixed phosphate of pH 6.864 and 5-6 vol.% dilute hydrochloric acid to obtain pH of 4-6.3. Nickel gridline solution is prepared by stirring NiSO4.6H20, NaH2PO2.2H20, sodium citrate, and sodium propionate for 30 minutes, adding brightening agent and stabilizing agent, and stirring for 1 hour, and copper gridline solution is obtained by stirring CuSO4.5H20, H2SO4, and Cl- for 30 minutes, adding brightening agent and leveling agent, and stirring for 1 hour. PN junction solar cell with ultraviolet exposure is cleared after obtaining gridlines by removing mask layer, washing, and drying. Preferred Parameters: Photoresist film thickness is 300-600 nm with UV exposure time of 5 s to 1 minute.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The transition metal iron salt precursor solution comprises iron chloride hexahydrate, cobalt chloride hexahydrate or nickel chloride hexahydrate. The molar ratio of hexachloroplatinic acid aqueous solution and transition metal iron salt precursor solution is 0.5:1-2:1. The content of carbon carrier is 20-40 %mass. The molar ratio of sodium citrate and hexachloroplatinic acid aqueous solution is 2:-5:1. The concentration of aqueous sodium borohydride is 0.1-0.5 mol/L.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The inert gas nitrogen or argon.
TECHNOLOGY FOCUS - POLYMERS - Preferred Processes: Processing comprises blasting, extracting, grinding, chamfering, and slicing. Preferred Parameters: Silicon raw material is polycrystalline silicon with purity of greater than or equal to 6 N. Purity of gallium is 99.9999-99.999999%. Resistivity of electroactive dopant boron-silicon alloy is 0.001-.01 Omega .cm, preferably 0.8-6 Omega .cm. Temperature of furnace is not greater than 1500 degrees C until completely melted; temperature is not less than 1400 degrees C when partly melting seed crystal. Temperature is reduced to 1420-1450 degrees C; insulating at 0.3-0.8 cm/hour with open cage ingot furnace; and control temperature gradient is 26 K/cm. Preferred Components: Seed is tail and/or pellet of raw material silicon. Amount of silica is 400-800 kg, gallium is 1-40 g gallium. Amount of electroactive dopant is boron-silicon alloy is 10-300 g for every 400-800 kg silica.
Preferred Definitions:    X=compound of formulae (7)-(8), preferably formula (12);    S1-S4=H or 1-3C alkyl, preferably H or Me;    b=1-3, preferably 1; and    1st and 2nd heterocyclic ring=formula (11), preferably formulae (13-15).    .    Y1=0-6.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The selenium is obtained from a source of dihydrogen selenide, selenide vapor or diethylselenide. The first temperature is 350-400 degrees C. The concentration of copper in the precursor film is 0.8-1.0 and is calculated by (copper/(indium+gallium)). The concentration of gallium in the precursor film is 0.2-0.4 and is calculated by (gallium/(gallium+indium)).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The positive electrode active material comprises lithium-containing transition metal oxide (Li1.5(NiaCobMnc(Li)d)O3, where a is more than 0 to less than 1.4, b is 0 or more to less than 1.4, c is more than 0 to less than 1.4, d is 0.05-0.5, a+b+c+d is 1.5, and a+b+c is 0-1.4).    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The positive electrode further includes 5 %mass or less carbon material as conductive support agent and 5 %mass or less binder with respect to total content of positive electrode active material, carbon material and binder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The compound contains at least one atom of element group containing oxygen, sulfur, phosphorus and/or boron.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The redox-active substance is boron-dipyrromethene of formula (I), or phenothiazine of formula (II). The supporting electrolyte contains tertiary ammonium salt, tertiary alkyl ammonium salt including fluoride, hexafluorophosphate, tetrafluoroborate anion, sulfate, and ammonium sulfate or sulfuric acid. The solvent water or organic solvent is aprotic solvent chosen from acetonitrile, benzonitrile and dimethyl formamide.R1,R2,R5,R6=linear or branched 1-4C alkyl, H or sulfonate;R3,R4=linear or branched 1-4C alkyl, formyl, halo or sulfonate;R7=H or aryl;R1=H or 1-8C linear chain, preferably 6C linear chain;R2=H, NH2, N(CH3)2, halo, or OH;R3=H or CH3;andR4=H, NO2 or SO3.Preferred Properties: The potential difference between two redox states of the compound is 0.5 Vol.% or more. The operation of the energy storage is carried out in ambient temperature.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The gas-barrier film further has primer layer containing ultraviolet-light resistant deterioration agent containing ultraviolet absorber and hindered amine light stabilizer.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The high-molecular compound comprises monomer, oligomer or prepolymer of urethane acrylate.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass plate contains 60-65 mol% silicon dioxide, 6-13 mol% alumina, 0-7 mol% magnesium oxide, 0-5 mol% calcium oxide, 0-5 mol% strontium oxide, 0-5 mol% barium oxide, 0-3 mol% zirconium oxide, 12-20 mol% sodium oxide, and 3-10 mol% potassium oxide. When the amount of alumina is 6-7 mol%, the amount derived from relation: 1.5Na2O+3K2O-0.5MgO-0.75CaO-SrO-BaO-0.25Al2O3 is 18 mol% or more. When the amount of alumina is 7-13 mol%, the amount derived from relation: Na2O+3K2O-0.5MgO-0.75CaO-SrO-BaO-0.5Al2O3 is 18 mol% or more. The glass plate has glass transition temperature of 550 degrees C or more and average coefficient of thermal expansion is 70x 10-7-120x 10-7/( degrees C). The solar cell has a copper-indium-gallium-selenium photoelectric conversion layer between a glass substrate and a cover glass. The glass substrate and/or cover glass has glass plate. The crystal of photoelectric conversion layer has peak intensity ratio (I220/112) of 0.55 or more, preferably 0.9 or more by X-ray diffraction pattern. The solar cell has lower electrode with thickness of 300-800 nm between the glass substrate and the photoelectric conversion layer. The photoelectric conversion layer has compositional formula: Cu(In1-xGax)Se2, where x is between 0 and 1, atomic ratio (Cu/(In+Ga)) is 0.75-1, and atomic ratio (Ga/(In+Ga)) is 0.35-0.45.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The predetermined pH of the solution is 9-11. The pH of the solution (A) is reduced to 6-8. Preferred Process: The pH of the solution (A) is reduced by adding acid solution or diluted solution to the solution (A), and supplying gas into the solution (A). After manufacturing wavelength conversion nanoparticles, an inert gas is supplied to the surroundings of the solution (A) and reducing pH of the solution (A). The wavelength conversion nanoparticles are manufactured by mixing ion source which provides metal ion (M1), ion source which provides atom contained in inorganic nanoparticles, and hydrophilic ligand coordinated to the inorganic nanoparticles in an aqueous medium, controlling the pH of the obtained solution, heating the solution at 150-250 degrees C under high pressure condition, and producing the wavelength conversion nanoparticles in the solution. Alternatively, the wavelength conversion nanoparticles are manufactured by preparing solution (S1) by mixing ion source which provides each atom other than selenium contained in inorganic particles, and ligand in aqueous medium and controlling pH of the solution, preparing solution (S2) by mixing ion source which provides each atom other than sulfur contained in the inorganic nanoparticles, and ligand in aqueous medium and controlling pH of the obtained solution, and mixing ion source which provides metal ion (M1) with the solution (S1) or solution (S2). Preferred Composition: The metal ion is manganese ion. The inorganic nanoparticles include zinc, or sulfur and selenium, as atom.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ligand is N-acetyl-L-cysteine. The molar ratio of N-acetyl-L-cysteine and magnesium ion in the solution is 1:1. The molar ratio of N-acetyl-L-cysteine and zinc atom in the solution is 1:4.8.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The pH of the solution (A) is reduced by adding acid solution or diluted solution to the solution (A), after supplying the gas containing oxygen. After manufacturing wavelength conversion nanoparticles, an inert gas is supplied to the surroundings of the solution (A), and then supplying gas containing oxygen. The wavelength conversion nanoparticles are manufactured by mixing ion source which provides metal ion (M1), ion source which provides atom contained in inorganic nanoparticles, and hydrophilic ligand coordinated to the inorganic nanoparticles in an aqueous medium, controlling the pH of the obtained solution, heating the solution at 150-250 degrees C under high pressure condition, and producing the wavelength conversion nanoparticles in the solution. Alternatively, the wavelength conversion nanoparticles are manufactured by preparing solution (S1) by mixing ion source which provides each atom other than selenium contained in inorganic particles, and ligand in aqueous medium and controlling pH of the solution, preparing solution (S2) by mixing ion source which provides each atom other than sulfur contained in the inorganic nanoparticles, and ligand in aqueous medium and controlling pH of the obtained solution, and mixing ion source which provides metal ion (M1) with the solution (S1) or solution (S2). Preferred Composition: The concentration of oxygen in the gas is less than the concentration of oxygen in air. The metal ion is manganese ion. The inorganic nanoparticles include zinc, or sulfur and selenium, as atom.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ligand is N-acetyl-L-cysteine. The molar ratio of N-acetyl-L-cysteine and magnesium ion in the solution is 1:1. The molar ratio of N-acetyl-L-cysteine and zinc atom in the solution is 1:4.8.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The infrared absorption pigment is a dimonium compound of formula (II).R11,R12,R13,R14,R15,R16,R17,R18=H, or 1-10C alkyl having substituent;R19,R20,R21,R22=H, halogen atom, amino having substituent, or 1-10C alkyl having substituent, in which methylene is optionally substituted by -O- or -CH=CH-;t=1-4;An(power)(q-)=anion;q=1 or 2;andp=coefficient, which maintains neutral electric charge.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The copolymer (I) is obtained by polymerizing a monomer chosen from (meth)acrylate, hydroxyl group-containing monomer, styrene-based monomer and unsaturated carboxylic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: At least one of pair of current collector is copper, nickel, aluminum or iron. The device further has electrode material on the graphene film.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Properties: The thickness of the glass film is 300 mu m or less, and support glass is 400 mu m or more. The difference of the thermal expansion coefficient at 30-380 degrees C of the glass film and the support glass is less than 5x 10-7/ degrees C.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The concentration of the surfactant in the aqueous solution is 0.001-2 %mass.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The curable functional group is an acryloyloxy group. The compound (a3) is a hydroxyalkyl acrylate having 2-12C hydroxyalkyl. The organotin compound is organotin carboxylate ester. The compound (B) is a mono-hydroxyalkyl acrylate having 3-8C hydroxyalkyl. The thiol compound (D1) is an aliphatic thiol compound. The thiol compound (D2) is 3-40C alicyclic thiol compound or 3-40C aliphatic thiol compound. The polyisocyanate (a2) is aliphatic diisocyanate or alicyclic diisocyanate. The content of oxyethylene group in compound (a1) is 8-50 wt.%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The polyoxyalkylene polyol (a1) is a poly(oxypropylene-oxyethylene) polyol, and has average hydroxyl number of 2-3 and hydroxyl value of 15-30 mg potassium hydroxide/g. The curable resin composition comprises 20-75 wt.% unsaturated urethane oligomer, 10-50 wt.% compound (B), and 0.05-3 wt.% thiol compound. The curable resin composition further comprises compound (C) having 8-22C alkyl group. The unsaturated urethane oligomer (A) has 2 or 3 curable functional groups on average per molecule.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic indium compound is condensation catalyst. The organic indium compound is soluble in organopolysiloxane. The organopolysiloxane has polydiorganosiloxane structure. The organopolysiloxane has 3 or more hydroxyl groups or hydrolyzable group bonded with silicon atom in a molecule.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The hardenable organopolysiloxane composition further contains polysiloxane having at least three hydrosilyl groups in a molecule.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The silicon melting part or the one-way direction solidification part has the copper material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Preferred Components: The fluxing agent is present and is 2,2,6,6-tetramethylpiperidinoxy, 4,4'-dithiodibutyric acid, succinic acid, 8-hydroxyquinoline, nitrolotri(methylphosphonic acid), triethanolamine, glutaric acid, malic acid, tartaric acid, acetylacetone, glycerin, dithiothreitol or 1,2,3-trihydroxy-benzene. The oxygenated solvent is present and is 2-(2-ethoxy-ethoxy)-ethyl acetate, propylene glycol monoethyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol, dipropylene glycol, monobutyl ether acetate or propylene carbonate. The peroxide is present and is tert-butyl peroxy-2-ethylhexanoate, tert-butyl peroxyneodecanoate, dilauroyl peroxide, tert-butyl peroctoate, 1,1,3,3-tetramethylbutyl peroxy-2-ethylhexanoate, di-tert-butyl peroxide, 2,5-bis-(tert-butylperoxy)-2,5-dimethyl hexane, dicumyl peroxide or di-tert-amyl peroxide. In the composition, the fluxing agent is present at 0.1-10 wt.%, the oxygenated solvent is present at 0.1-15 wt.%, and the peroxide is present at 0-1 wt.%. EXAMPLE - Typical composition comprised of: 100 g silver flake; 5 g acetylacetone; 5 g diethylene glycol monobutyl ether; and 5 g dipropylene glycol.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The ratio of peak intensity of absorption derived from siloxane bond, and peak intensity of absorption derived from a silanol group of the hydrolysis-condensation product of colloidal silica and alkoxysilane is 0.07 or more, measured from infrared absorption spectrum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ceramic adhesive has purity of more than 99.98% and size of 30-50 meshes. The ratio of silica sol, quartz sand and ceramic adhesive is 4.5-5.5:4.5-5.5:2, preferably 5:5:2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Conditions: Weak acidic environment has 0.05-0.5 M concentration of acid solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Substrate is metal substrate with glass electrode backing. Protective gas is nitrogen or argon gas. Preferred Processes: Copper-zinc-tin-sulfur precursor is obtained by depositing copper, zinc sulfide, and tin disulfide on substrate surface using sputtering method.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (disclosed): The cyano borate compound (I) is obtained by reacting boron compound, alkylsilyl compound and metal cyanide. Preferred Definitions:    Y'=cyano or halo.    SPECIFIC COMPOUNDS - New cyano borate compound i.e. lithium cyano(fluoro)oxalato borate of formula (Ia) and lithium dicyano oxalatoborate are disclosed.    EXAMPLE - 2.19 g lithium difluoro oxalyl borate and 15.2 mmol of lithium difluoro oxalatoborate were added to the 3 necked flask and nitrogen gas was supplied. Then, 4.7 mL trimethylsilyl cyanide and 37.9 mmol boron compound were dripped, reacted at room temperature, stirred, 20 mL isobutyronitrile was added, reaction solution was heated at 80 degrees C in oil bath, stirred for 2.5 hours and reacted, Then, the organic solvent was depressurizingly distilled and concentrated, to obtain obtained yellow solution and lithium cyano(fluoro)oxalatoborate as pale yellow solid with yield of 73%.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: Preparation of chitosan fiber involves processing chitosan using inorganic salt and ethanol solution, removing protein and pigment of chitin powder, adding sodium hydroxide solution, magnetically-stirring, heating in water bath, deacetylating, washing using water and drying at 60 degrees C for 2-48 hours.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The outer layer includes polyolefin resin as a base resin, a conductive polymer, an antistatic agent, an permanent antistatic polymer such as intrinsic dispassive polymer and its derivatives, or copolymers and surfactants. The central layer includes polyolefin resin as the base resin, low density polyethylene or high density polyethylene.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The carbohydrate material is selected from sucrose, glucose, fructose, ribose or chitosan. The activating agent is selected from potassium hydroxide, sodium hydroxide, potassium carbonate or sodium carbonate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Hydrofluoric acid, hydrochloric acid, sulfuric acid and nitric acid are used in the acid cleaning. The alkali solution is selected from sodium hydroxide solution or potassium hydroxide solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (Claimed): Preparation of the bifunctional catalyst comprises (a) mixing graphitic oxide with a source of sulfur, and (b) heating the mixture to form graphene that is doped with sulfur and provided with thiol functional groups. Preferred Components: The bifunctional catalyst comprises a sulfur doped graphene backbone and thiol functional groups bonded to it. The graphene is doped with heteroatoms or with sulfur, nitrogen, oxygen, phosphorus or boron. The source of sulfur is sodium thiosulfate or thiourea. EXAMPLE - Graphite was exposed to a mixture of sulfuric acid, sodium nitrate and potassium permanganate to obtain graphitic oxide. Then 100 mg of graphitic oxide was dispersed in 35 ml of deionized water and then 200 mg of sodium thiosulfate solution was added to form a reaction mixture. The reaction mixture was then transferred into a Teflon (RTM: Polytetrafluoroethylene) lined autoclave and subjected to a hydrothermal treatment at a temperature of 190 degrees C for 24 hours. The mixture was then filtered to obtain a thiol functionalized sulfur doped graphene (TFSG) catalyst. TFSG was then washed several times with deionized water and ethanol before being dried in a vacuum oven at a temperature of 100 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The aluminum film is formed in the whole surface of the surface side of the semiconductor substrate. The electrode layer is removed by the wet etching using hydrochloric acid.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The detector utilizes a wireless communication system such as Bluetooth, Universal asynchronous receiver transceiver (UART), Zigbee, Wi-Fi and Ethernet.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The powder comprises metal oxide.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Properties: The electron density of highly-denser portion of the plasma is 1x 1012/cm3 or more. The discharge current between the cathode and the anode of the plasma gun is more than 10 A.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The amorphous carbon film is a diamond-like carbon film having graphite bonding and diamond bonding.
TECHNOLOGY FOCUS - METALLURGY - Preferred Property: The reflectance of light having wavelength of 550 nm or more by the silver alloy film is larger than the reflectance of light by the pure silver film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The rare-earths ion contained in the core portion is erbium ion. The core portion and semiconductor portion contain ytterbium. A quantum dot which does not contain rare-earths ion which has up-conversion effect, and metal microparticles are dispersed to the support agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkali is ammonia.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: An aprotic polar solvent as solvent, alkali, and copper and/or copper compound, and/or tin and tin compound are mixed with mixture containing zinc and/or zinc compound, organic compound, sulfur-containing compound and selenium compound. Preferred Composition: The zinc and/or zinc compound is zinc element, zinc oxide and/or zinc hydroxide. The chalcogen element-containing organic compound has at least one hydroxyl group. The aprotic polar solvent is dimethyl sulfoxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Sealant: In the sealant, the glass material has a cumulative concentration of lithium oxide (Li2O), sodium oxide (Na2O), and potassium oxide (K2O) which is less than 0.5 mol%, such as less than 0.1 mol%, or 0 mol% Li2O, Na2O, or K2O. The glass material comprises the B2O3, the BaO, and at least two of the alkaline earth oxides selected from CaO, SrO, and MgO; and/or the B2O3, the BaO, the SiO2, and at least two of the alkaline earth oxides selected from CaO, SrO, and MgO; and/or the B2O3, the BaO, the Al2O3, and at least two of the alkaline earth oxides selected from CaO, SrO, and MgO; and/or the B2O3, the BaO, the SiO2, the Al2O3, and at least two of the alkaline earth oxides selected from CaO, SrO, and MgO. The sealant comprises 20-65 mol% of B2O3, 10-40 mol% of BaO, 10-25 mol% of SiO2, 2-10 mol% Al2O3; and/or 20-65 mol% of B2O3, 10-40 mol% of BaO, 10-25 mol% of SiO2, 2-10 mol% of Al2O3, and 2-10 mol% each of one or more selected from CaO, SrO, and MgO. Preferred Interconnect: The ferritic steel interconnect comprises the sealant, the stainless steel component, and an yttria-stabilized zirconia component.
TECHNOLOGY FOCUS - METALLURGY - The additional dopant comprises a Group III element such as boron or aluminum. The species comprise phosphorus or arsenic. The metal contacts are made of metal that is predominantly comprised of silver, aluminum or copper.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The non-aqueous electrolyte of non-aqueous-electrolyte secondary battery containing fluorinated carbonate or fluorinated cyclic carbonate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The non-aqueous electrolyte of non-aqueous-electrolyte secondary battery containing monofluoro ethylene carbonate or difluoro ethylene carbonate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The operating temperature for printing the conductive ink is 20-40 degrees C with a shear rate of 100 s-1 and viscosity of 20-200000 cP. The metal particle includes silver neodecanoate. The conductive additive includes silver acetate. The wire-type conductive additive includes silver nanowire or carbon nanotube. The sintering additive is copper nanoparticle.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate is sodalime glass board. The back plate is made of molybdenum. The group III metal includes indium and gallium. The liquid selenium source includes dimethyl selenide, di-tert-butylselenium, methylallyselenium, and diallyselenium. The liquid carrier gas is stored in a thermostat, a nitrogen flow meter, a pressure control valve and a chamber, where the chamber is a heated chamber.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Layers: The semiconductor structure further has transition metal chalcogenide layer including chalcogenide of at least one transition metal element, and high work function transition metal element layer (60) comprising at least one elemental metal. Preferred Composition: The high work function transition metal element layer comprises at least one element chosen from cobalt, ruthenium, rhodium, palladium, osmium, iridium, platinum and gold. The semiconductor chalcogenide material is semiconductor sulfide material. The transition metal element contains molybdenum. The transition metal layer contains transition metal element chosen from niobium, vanadium, zinc, titanium, molybdenum, chromium and tungsten. The chalcogenide material layer contains copper-indium-selenium sulfide (CuIn(Se,S)2(CIS)), copper-indium-gallium-selenide (CuInGaSe2(CIGS)), copper-zinc-iron-tin-sulfur-selenide (Cu2(Zn,Fe)Sn(S,Se)4), gallium-sulfur-selenide (Ga(S,Se)), gallium-telluride, gallium arsenide, indium-sulfur-selenide (In2(S,Se)3), indium telluride, indium phosphide, cadmium telluride, cadmium-sulfur-selenide (Cd(S,Se)), zinc telluride, zinc phosphide (Zn3P2), lead-selenium-sulfide (Pb(Se,S)), zinc-selenium-sulfide (Zn(S,Se)), tungsten-selenium-sulfide (W(S,Se)2), bismuth(III) sulfide, silver sulfide, nickel sulfide, zinc oxide, copper(II) oxide, copper oxide, copper sulfide and iron sulfide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Property: The synthetic silica glass powder has white grain number of 5-500 pieces/g.
TECHNOLOGY FOCUS - POLYMERS - Preferred Compositions: Olefin resin contains a polar group. Polar-group-containing olefin resin contains a carboxylic acid group or an acid-anhydride group. The resin composition contains 0.1-500 pts. wt. cellulose fibers on a dry weight conversion value with respect to 100 pts. wt. olefin resin. Cellulose fiber contains 1.6-66 mol.% functional group which has greater than or equal to 5 carbon-containing linear or branched aliphatic hydrocarbon chain. Preferred Parameters: Average number fiber diameter of cellulose fiber is 2-500 nm.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The solar cell of Uni-solar (RTM: Design services for solar panels) is a supple by a fixed type.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The spherical silicon solar cell module is formed in the corrugated shaped galvanized steel plate.
TECHNOLOGY FOCUS - BIOLOGY - Preferred Composition: The chaff is raw paddy shell and rice husk carbonization material. Preferred Properties: The BET specific surface area of adsorption agent is 20 m2/g or more. The average particle diameter of adsorption agent is 30 mu m or less.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The hydroxide of alkaline-earth metal is calcium hydroxide. The total amount of hydroxide of alkali metal and/or hydroxide of alkaline-earth metal is 20 pts. wt. or more with respect to 100 pts. wt. chaff.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dielectric material is selected from the group consisting of tetraethyl orthosilicate, silicon oxides, silicon nitrides, and silicon oxynitrides.    TECHNOLOGY FOCUS - METALLURGY - The noble metal material is selected from a group consisting of platinum, palladium, rhodium, ruthenium, iridium, and gold, and the electrode material is selected from the group consisting of platinum, palladium, rhodium, ruthenium, iridium, and gold.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Component: The recovery unit includes hydrogen recovery unit (6) which recovers hydrogen and oxygen recovery unit (7) which recovers oxygen.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: An electrolyte is added to water during decomposition. The activation energy of water is reduced by photocatalyst (8). The photocatalyst is metal-supported catalyst. The photocatalyst is provided on the surface of reaction tank. The frequency of microwave is set based on the oxidation-reduction potential of water. The produced oxygen is used as carbon dioxide with activated carbon. The oxygen recovery unit comprises activated carbon supported by photocatalyst(s). Preferred Process: The oxidation-reduction potential of water is measured by oxidation-reduction potential measurement unit.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first solution comprises a hydroxyl group chosen from potassium hydroxide, sodium hydroxide, ammonium hydroxide and choline, and tetramethylammonium hydrooxide, and second solution comprises a cyano group chosen from hydrogen cyanide, cyanogens, potassium cyanide, sodium cyanide, rubidium cyanide, cesium cyanide and ammonium cyanide. Preferred Method: The method utilizes chemical solution comprising isopropanol hydrogen cyanide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The scaffold silicate contain microporous sodium, potassium, lithium, rubidium and/or cesium ions, and sodium ions. The semiconductor absorber layer is selected from copper-indium-gallium selenide layer, copper-indium-gallium-selenium sulfide layer, copper-zinc-tin-selenium sulfide layer and copper-zinc-tin selenide or copper-zinc-tin sulfide layer.
TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The material of the base is a metal, preferably steel.
TECHNOLOGY FOCUS - METALLURGY - The sputtering target is the copper-indium-gallium alloy target, the copper-gallium alloy target, the copper-indium alloy target, and copper target, and indium target.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mass ratio of aluminum oxide and oxide of vanadium group element is 30/70-90/10. The oxide of vanadium group element is chosen from vanadium oxide, niobium oxide and tantalum oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition further comprises: at least one salt of a transition metal of group 8, 9 or 10; and 1-12 wt.%, preferably 2-11 wt.%, of at least one base. The composition comprises 65-90 wt.%, preferably 70-84 wt.%, of the alkali metal borohydride, 5-20 wt.%, preferably 7-13 wt.%, of the carbon, and 1-15 wt.%, preferably 1-13 wt.%, of the salt of a transition metal. Preferred Components: The alkali metal borohydride is sodium borohydride and/or potassium borohydride. The base is an alkali metal hydroxide, alkali metal alkoxide and/or alkaline earth alkoxide. The carbon is activated carbon derived from coal. The carbon comprises less than 94.5 wt.% of carbon and 4-15 wt.% of oxygen.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The liquid comprises 5-40 wt.% of an organic acid that is a 2-5C dicarboxylic acid, a 2-6C hydroxy carboxylic acid and/or a 2-6C hydroxy di- or tri-carboxylic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (Q) comprises reacting a precursor of (I) with diethylpyrocarbonate compound of formula (R5-O-C(=O)-O-C(=O)-OR6). SPECIFIC COMPOUNDS - 65 Compounds (Q) are disclosed e.g. fullerene pyrrolidines of formulae (Qa)-(Qe).    EXAMPLE - 250 mg of 60C Fullerene, 585 mg of N-(4-hydroxyphenyl) glycine, 50 mg of paraformaldehyde, and 100 ml of chlorobenzene were placed in a 200 ml double-necked flask equipped with Gimroth condenser. The mixture was heated to reflux for 3 hours. After the mixture was cooled to room temperature, the solvent was removed by a rotary evaporator. After the product was separated off by silica gel column chromatography with a mixed solvent, in which toluene and ethylacetate were mixed at a volume ratio of 10-1, and the solvent was removed by a rotary evaporator. The product was reprecipitated with 50 ml of methanol to give 100 mg of (Qa) as a brown solid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hardenable compound (A) is (meth)acrylic-type compound, preferably (meth)acrylic-type compound which has fluorene structure or (meth)acrylic-type compound of formula (II). The hardenable component further contains monofunctional hardenable compound chosen from aromatic (meth)acrylate and sulfur-containing (meth)acrylate. The content of monofunctional hardenable compound is 10-600 pts. wt. 100 pts. wt. hardenable compound (A). The content of fluorene compound is 0.1-30 pts. wt. with respect to 100 pts. wt. hardenable component.R3=H or methyl.Preferred Properties: The refractive index of the fluorene compound is 1.55 or more at 25 degrees C and wavelength of 589 nm. The molecular weight per hydrolytic condensation product contained in fluorene compound is 500-10000 with respect to the total amount of fluorene compound and hardenable component. The decreasing rate of refractive index of hardenable component at 25 degrees C under wavelength of 589 nm to refractive index of curable at 25 degrees C under wavelength of 589 nm is 0.5% or less.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hardenable compound is (meth)acrylic-type compound containing fluorene-containing compound of formula (I). The hardenable component further comprises monofunctional hardenable compound chosen from aromatic (meth)acrylate and sulfur-containing (meth)acrylate. The content of monofunctional hardenable compound is 10-600 pts. wt. with respect to 100 pts. wt. polyfunctional hardenable compound. The fluorene compound is of formula (II). The content of fluorene compound is 0.1-30 pts. wt. with respect to 100 pts. wt. hardenable components.Z=aryl;R1,R4=substituent;R2=alkylene;R3=H or methyl;k=0-4;m,n=0 or more;p=1 or more;R5-R7= H, hydroxyl, halo or -OR8;X=linking group, preferably -OCO-CHR11-CH2-S-X(power(4a));R8=hydrocarbyl or -(R9O)a-R10;R9,R10=hydrocarbyl;a=1 or more;R11=H or methyl;andX(power(4a))=alkylene.Preferred Properties: The refractive index of fluorene compound is 1.55 or more at 25 degrees C and 589 nm. The molecular weight of fluorene compound is 500-10000.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The polyimide precursor is obtained by reacting 80 mol% or more tetracarboxylic dianhydride chosen from pyromellitic dianhydride, 1,2,5,6-naphthalene tetracarboxylic dianhydride, 2,3,6,7-naphthalene tetracarboxylic dianhydride, 3,3',4,4'-benzophenone pyromellitic dianhydride, 3,3',4,4'-biphenyl tetracarboxylic dianhydride, 2,3,3',4'-biphenyl tetracarboxylic dianhydride, 2,2',3,3'-biphenyl tetracarboxylic dianhydride, p-phenylene bis (trimellitic acid monoester anhydride), 1,2,5,6-naphthalene tetracarboxylic dianhydride, 2,3,6,7-naphthalene tetracarboxylic dianhydride, 3,3'-oxydiphthalic acid dianhydride and 4,4'-oxydiphthalic acid dianhydride, and 80 mol% or more diamine chosen from p-phenylenediamine, m-phenylenediamine, benzidine, 4,4'-, 3,4'-, 3,3'-, or 2,4'-diamino diphenylether, 5-amino-2-(p-amino phenyl)benzoxazole, 6-amino-2-(p-amino phenyl)benzoxazole, and 5-amino-2- (m-amino phenyl)benzoxazole-6-amino-2-(m-amino phenyl)oxazole. The content of alkoxysilane compound with respect to 100 parts mass of polyimide precursor is 0.1-20 parts mass.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The resin composition is used for forming polyimide resin layer on the surface of inorganic substrate (11). The laminate comprising polyimide resin layer and inorganic substrate are heat-treated at 400-500 degrees C for 6 minutes to 5 hours in inert atmosphere. The resin composition is applied to inorganic substrate, polyimide resin layer is formed in the inorganic substrate by heat-treating the resin composition, and an amorphous silicon layer is formed on the upper side of polyimide resin layer, to obtain flexible device.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The oxidizing agent is present in an amount of 1-5 wt.% and includes hydrogen peroxide, ammonium persulfate, hypochlorous acid or perchloric acid. The acid is present in an amount of 2-10 wt.% and includes sulfuric acid, nitric acid, phosphoric acid, hydrochloric acid or acetic acid. Preferred Method: The method further comprises laminating the removed carbonization catalyst on a substrate; laminating a heat release film on the graphene to form a first laminated body, after forming the catalyst; removing the heat release film including graphene after removing the catalyst to form a second laminated body; and transferring the graphene sheet onto the substrate using the second laminated body. The graphene sheet is obtained within 3-30 minutes while removing the catalyst. The graphene sheet has sheet resistance of 0-300 Omega and relative standard deviation of less than 15%. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The raising in step (a) is carried out at temperature of 130 degrees C or 160 degrees C for 2.5 hours. The vacuum drying in step (a) is carried out at temperature of 60 degrees C for 24 hours. The reacting in step (a) is carried out at temperature of 160 degrees C for 40 minutes. The cooling in step (a) is carried out at 60 degrees C. The washing in step (a) is carried out for 4 times. The dripping in step (b) is carried out at 60 degrees C. The stirring and reacting in step (b) is carried for 12 hours. The washing in step (b) is carried out at for 4 times. The vacuum drying in step (b) is carried out at 60 degrees C for 12 hours. Preferred Components: The molybdenum salt is molybdic acid chloride, molybdenum tetrachloride or potassium molybdate. The mass ratio of nickel acetylacetone, iron acetylacetone, oleic acid, sodium hydroxide, sodium borohydride and functionalized Vulcan XC-72 (RTM: Carbon powder) is 1:2:0.03:0.02:10:2.5, preferably 1:1:0.01:0.01:5:1. The three-necked bottle is present in an amount of 75 ml or 250 ml, preferably 50 ml or 250 ml.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: Selenium, or sulfur ion generating involves heating selenium, or sulfur source using heating mechanism containing shell, and RF antenna.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The filler is selected from 5-9C petroleum resin, Vaseline (RTM: Petroleum jelly), stearic acid, castor oil, hydrogenated castor oil, castor oil acid, and ricinoleic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of the benzimidazole based ionic liquid (I) involves: reacting 1H-benzoimidazole with KOH and a compound of formula X-(CH2-CH2)n-X to obtain substituted 1H-benzoimidazole compound of formula (II); reacting (II) with 1,4-di(1H-imidazol-1-yl)butane and hydrochloric acid to obtain substituted 1H-benzo(d)imidazole chloride salt of formula (III) which further reacting with compound of formula H3C-(CH2)p-X and aqueous KOH solution to obtain the ionic liquid (I).
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred System: The FTIR spectrophotometer comprises source, beam splitter, a fixed mirror, a moving mirror, a detector and a computer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The laser dye is selected from coumarin group. The solvent is selected from dichloromethane, benzene, or chloroform. The solutions of dyes were prepared in the solvent. Preferred Method: The spectra of coumarin-6 in powder form and in different solvents are recorded in order to investigate the effect of solvents on coumarin-6 molecule by observing the changes in the spectra. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The additive is methyl benzimidazole, butyl benzimidazole or tert-butyl pyridine.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The content of polypropylene at the surface of microporous film is 60 %mass or less. The difference of total content of polypropylene and polypropylene at surface of microporous film is 10 %mass or more. The mixture of plasticizer and low molecular-weight polyethylene are added to the mixture of polypropylene and polyethylene during manufacture of microporous film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal is gold, aluminum, silver or copper. The p/n-type inorganic semiconductor layer includes silicon, germanium, silicon carbide, cadmium telluride, cadmium selenide, gallium phosphate, gallium arsenide, titanium dioxide, cerium oxide, niobium oxide, cadmium tellurium, zinc oxide, gallium nitride, and cadmium selenide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The p/n-type organic semiconductor layer includes poly(2-methoxy-5-(3,7-dimethyloctyloxy)-1,4-phenylene-vinylene), poly(p-phenylenedifluorovinylene), poly(3-hexylthiophene), poly(2,6-(4,4-bis(2-ethylhexyl)-4H-cyclopenta(2,1-b;3,4-b)-dithiophene)-alt-4,7(2,1,3-benzothiadiazole)), poly(9,9-dioctylfluorene-alt-bithiophene), poly((4,40-dioctyldithieno(3,2-b:20,30-d)silole-2,6-diyl)-alt-(2,1,3-benzothiadiazole-4,7-diyl)), poly((9,9-dialkyl-fluorene)-2,7-diyl-alt-(4, 7-bis(2-thienyl)-2,1,3-benzothiadiazole)-5,5'-diyl), and (6,6)-phenyl C61 butyric acid methyl ester.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises supplying a carrier gas when supplying the zinc precursor compound. The carrier gas comprises argon, helium and nitrogen. The temperature of the vessel is kept at 5-40 degrees C, when supplying water as oxygen precursor compound into the vessel. The temperature of the vessel is kept at room temperature when supplying 50-1000 sccm of oxygen and 50-500 sccm of ozone as oxygen precursor compound into 8 inches reaction chamber. The temperature of the chamber is kept at -20 degrees C to 80 degrees C, and temperature of the supply line is kept at room temperature of -200 degrees C while supplying the zinc precursor compound. The temperature of the chamber is kept at 0-80 degrees C, and temperature of the supply line is kept at room temperature of -200 degrees C while supplying the oxygen precursor compound. A temperature of the substrate is kept at 100-600 degrees C. The precursor compound of zinc and oxygen are supplied into the reaction chamber for 0.1-200 seconds. The pressure of the chamber is maintained at 0.1-100 Torr. The removing step is carried out by supplying purging gas comprising helium, hydrogen, nitrogen, argon and ammonia into the chamber. A thickness of the thin film is 10-100 nm. Preferred Components: The zinc precursor compound includes dimethyl zinc, diethyl zinc, methyl isopropyloxy zinc and ethyl isopropyloxy zinc. The oxygen precursor compound includes water, oxygen or ozone. The zinc precursor compound has a structure of formula R1-Zn-R2 (I).R1 = methyl, ethyl or propyl; andR2 = methyl, ethyl, propyl, methoxy, ethoxy or propoxy.
TECHNOLOGY FOCUS - METALLURGY - The inorganic layer is a one or two or more types of inorganic compound chosen from a metal oxide, metal nitride, metal carbide, a metal oxidation carbide, metal carbonization nitride, and a metal oxidation nitridation carbide.
TECHNOLOGY FOCUS - METALLURGY - Preferred Compositions: Plating solution contains of 70 g/L, preferably 100 g/L diamino platinum nitrite, 1 g/L, preferably 3 g/L ammonium, 10 g/L, preferably 30 g/L sodium nitrite, 80 g/L, preferably 120 g/L amino acid, 8 g/L, preferably 15 g/L amino acid rhodium, 0.4 g/L, preferably 0.8 g/L sulfate, 0.4 g/L, preferably 0.8 g/L nitrate box, and 2 g/L, preferably 8 g/L chloride.
TECHNOLOGY FOCUS - POLYMERS - Preparation (Disclosed): The preparation of the polymer, comprises polymerizing (II) by Suzuki-, Yamamoto-, Stille-, Heck-, Negishi-, Sonogashira-, Hiyama-, Ullmann-, Wittig- or Hartwig-Buchwald polymerization. Preferred Components: The polymer exhibits a molecular weight of 1000-2000000 g/mole. The polymer comprises 1-95 mole% (I). The polymer further comprises at least one further structural unit which is different from (I). Preferred Definitions:    X = halo, O-tosylate, O-triflate, O-sulfonate, boric acid ester, partially fluorinated silyl, diazonium group or organotin groups.    EXAMPLE - 50 mole% 2,7-bis(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)pyrene, 2 mole% 2,6-dibromo-9,10-di-naphthalen-1-yl-anthracene, 1.5 mole% N,N'-bis-(4-bromo-phenyl)-N,N'-bis-(4-butyl-phenyl)-benzene-1,4-diamine and 46.5 mole% 2,8-dibromo-6,6-bis-(4-(3-ethoxy-propyl)-phenyl)-12-heptyl-12-octyl-6,12-dihydro-indeno(1,2-b)fluorene were subjected to Suzuki polymerization to obtain the polymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The positive and negative electrical contact comprise gold and chromium.
TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The nanorod comprises platinum or nickel.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Condition: The heating process is preferably carried out at 600-800 degrees C. Preferred Compound: The composition further comprises compound of formula (II).R2=1-8C alkyl;n=0-3;X2,X3=O or methylene;andR3-R5=H or 1-8C alkyl. Preferred Definitions:    M=niobium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The mass ratio of niobium oxide and aluminum oxide is 30/70-90/20. The total content of niobium oxide and aluminum oxide is 90 %mass or more.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The passivation film further comprises organic component.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The water vapor is used as the purging gas. The permeate side of the membrane unit is a part of a purging gas cycle. The purging gas cycle is a water cycle. A condensor is arranged downstream to the permeate side of a gas outlet of the membrane unit. A separator with a water outlet and a hydrogen outlet is arranged downstream to the condenser. A supply pump is arranged at the output side of the water outlet. An evaporation device is arranged at the output side of the supply pump. Preferred Method: The purging gas is led in countercurrent to the flow of the gas mixture in the input side of the membrane. The hydrogen is separated from the purging gas at the output side of the permeate side of the space, which is adjacent to the membrane. The purging gas is used again for pressurizing the permeate side of the membrane, after separation of the hydrogen.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The sulfonic acid compound (I) is preferably benzene sulfonic acid, toluene sulfonic acid, xylene sulfonic acid and/or cumene sulfonic acid. Preferred Process: After processing the semiconductor substrate for solar cell with etching liquid, an etching force restorative agent containing alkali is added to the etching liquid and etching force is recovered.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The substrate is heated by irradiating using infrared rays.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The total amount of calcium carbonate, magnesium carbonate, alumina, strontium carbonate and barium carbonate in the composite glass-making feedstock is 0.3 %mass or more.
TECHNOLOGY FOCUS - IMAGING AND COMMUNICATION - Preferred Component: The ink further contains dispersion medium.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The number-average particle size of primary particle of zinc oxide particle is 1-1000 nm. Preferred Component: The metallic-element containing particle contains copper, copper oxide and copper dioxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The ink layer is heated at 120 degrees C or more in the conductorization process in the gas containing a formic acid. Preferred Component: The gas containing formic acid contains the organic compound having a nitrogen-containing heterocyclic structure.
TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The metal material is aluminum (alloy).    TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Property: The fine fiber has an average diameter of 0.5-500 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanoparticles are ceramic-based nanoparticles or metal oxide-based nanoparticles. Nanoparticles are nanoparticles of titanium dioxide, silicon dioxide, silicon oxynitride, silicon nitride, silicon nitride-based nanoparticles, zinc oxide, tin oxide, aluminum oxide, zirconium oxide, yttrium oxide, tungsten trioxide, vanadium pentoxide, nickel oxide, manganese tetraoxide, magnesium oxide, lanthanum trioxide, iron oxide, chromium trioxide, cobalt tetraoxide, copper oxide, cerium oxide, indium-tin oxide, antimony-tin oxide, antimony-doped zinc oxide, fluorine-doped tin oxide, gallium-doped zinc oxide, and antimony oxide. The content of nanoparticles is 1-500 pts. wt. with respect to 100 pts. wt. of carbon nanotube film. Preferred Property: The size of nanoparticles is 1 mu m to 1 nm. Preferred Process: The carbon nanotube coating layer is formed by coating a solution comprising mixture of carbon nanotubes, nanoparticles and solvent.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The ratio of flow rate of methane gas with respect to total flow rate of the methane gas and hydrogen gas is 0.1-0.9, preferably 0.1-0.7.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The carbon dioxide carrier is an alkali-metal carbonate, and contains cesium, rubidium, or potassium.    TECHNOLOGY FOCUS - POLYMERS - Preferred Property: The thickness of the liquid film is 0.5-2.5 mm. Preferred Process: The coating of coating liquid on the support material is carried out using roll-coating method or blade-coating method. Preferred Components: The coating liquid further comprises a thickener. The thickener is carboxymethyl cellulose. The water absorbing polymer is polyvinyl alcohol-polyacrylic acid copolymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred composition: The steel plate surface contains oxide film concentrated with chromium and manganese.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The ferritic stainless steel further comprises 0.5 %mass or less titanium, 0.5 %mass or less vanadium, 2 %mass or less nickel, 1 %mass or less copper, 1 %mass or less tin, 0.005 %mass or less magnesium, 0.005 %mass or less calcium, 1 %mass or less cobalt, 1 %mass or less tungsten, 0.1 %mass or less rare-earth metals, 0.1 %mass or less zirconium, 0.1 %mass or less lanthanum, and 0.1 %mass or less yttrium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of the organic compound is 30-99.9 %mass, with respect to 100 %mass passivation layer-forming composition. Preferred Definitions:    n=1-3.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The composite sheet has storage modulus of 0.1-5 MPa measured at 100 degrees C, and haze value of 15% or less at 220 degrees C. Preferred Component: The reinforcing material comprises glass fiber cloth, glass cloth, glass fabric, glass nonwoven fabric and glass mesh.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Ar, mixed Ar and oxygen, or water vapor plasma contains oxygen, or water vapor with partial pressure of 5-9x 10-3 Pa, and Ar with partial pressure of 2-2.5 Pa. Single Ar plasma contains Ar with partial pressure of 0.2-0.5 Pa. Preferred Parameters: Power density of Ar, mixed Ar and oxygen, or water vapor plasma is 0.5-2 W/cm2, and single Ar plasma is 5-10 W/cm2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation (claimed): Preparation of the anatase-type titanium dioxide nanorod involves mixing titanium alkoxide as a titanium source, with organic alkali as deflocculant, in presence of ethylene glycol-water or ethylene glycol-water-alcohol as solvent, where the volume ratio of the ethylene glycol to water is 1:4 to 15:1, and the mol. ratio of titanium alkoxide with organic alkali is 1:4 to 3:1, at lower-temperature to form sol-gel precursor, followed by performing hydro-thermal reaction, separating the hydro-thermal reaction product, then washing at high temperature, drying and heat treating to obtain the product. Preferred Components: The titanium alkoxide is tetraethyl titanate, isopropyl titanate, or butyl titanate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic alkali is any one of methyl ammonium hydroxide, ethyl ammonium hydroxide, propyl ammonium hydroxide and butyl ammonium hydroxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Sputtering gas is argon gas with flowrate of 10-40 sccm, and reaction gas is carbon source gas and nitrogen source gas. Nitrogen source gas is nitrogen. Protection gas is argon gas. Preferred Conditions: Vacuum device pressure is less than or equal to 1x 10-4 Pa. Substrate bias voltage is float voltage to - 250 V. Radio frequency magnetron sputtering deposition method is performed at reaction pressure of 0.5 Pa, radio frequency power of 150-250 W, preferably 150 W, sputtering time of 20-40 minutes, preferably 40 minutes, and carbon source gas, nitrogen source gas, and sputtering gas flowrate ratio of 25:5:20-25:25:20, preferably 25:15:20. Heating time is 1-3 hours, heat preservation time is 5 minutes-2 hours, and reaction temperature after passing protection gas is 300-1000 degrees C.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Carbon source gas is methane.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive agent is chosen from polyester, polyurethane, polyether base, polyolefin, acrylate, epoxy resin, imide, silicone resin, polyether polyester, polyether polyurethane, polyester polyurethane, polyisocyanate, polyethylene imine, cyanoacrylate compound, organotitanium compound and their modified substances. The heat-bondable resin is copolymer of polyethylene, polypropylene, acid-modified polyolefin resin or acid-modified polyolefin resin, polyolefin resin/ethylene-vinyl acetate copolymer, ethylene-acrylate copolymer, ethylene-methacrylate copolymer and/or ionomer. The base material layer and/or barrier-material reinforcement layer comprises biaxially-stretched polybutylene terephthalate film.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The urethane (meth)acrylate has 2 or more (meth)acryloyl group. The fluorene structure-containing compound (I) is 9,9-bis(mono- or di-1-4C alkyl hydroxy (poly)2-4C alkoxyphenyl)fluorene. The (meth)acrylic-type compound is mono(meth)acryloyloxy 2-6C alkyl isocyanate or di(meth) acryloyloxy 2-8C alkyl isocyanate. EXAMPLE - 20.02 g 9,9-bis(4-(2-hydroxyethoxy)phenyl)fluorene was dissolved in 80.0 g 1,4-dioxane, 13.14 g 2-acryloyloxyethyl isocyanate was added to the reaction mixture, dissolved, 0.15 g di-n-butyltin dilaurate was added to 1,4-dioxane, reacted at 80 degrees C for 21 hours, stirred using magnetic stirrer, 6.6 mg hydroquinone was added to the reaction mixture, and solvent was removed at 65-70 degrees C under reduced pressure, to obtain urethane acrylate having weight average molecular weight of 793 and number average molecular weight of 754.
TECHNOLOGY FOCUS - POLYMERS - The separator film includes micro-porous polyethylene film, micro-porous polypropylene film, multi-layer film, and polymer film for polymer electrolyte of polyvinylidene fluoride, polyethylene oxide, polyacrylonitrile, or polyvinylidene fluoride hexafluoropropylene copolymer. The polymer film for polymer electrolyte comprises primary micro-porous polymer layer and secondary gelling polymer layer of polyvinylidene fluoride-chlorotrifluoroethylene copolymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The spinel structure is of formula: MnxCo3-xO4, where x is 0-3. The perovskite structure is of formula: (La1-x'Srx')yMnO3 or La1-x'Srx'Co1-yFeyO3, where x is more than 0 to less than 1 and y is 0-1.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The spinel structure is obtained using slurry containing organic solvent and organic binder. The organic solvent is ethanol, acetone, butanone, isopropanol or terpineol.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The organic binder is polyvinyl alcohol, polyvinyl butyral, methyl cellulose or ethyl cellulose.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: The additive is methyl benzimidazole, butyl benzimidazole or tert-butyl pyridine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The titanium salt is chosen from butyl titanate, titanium isopropoxide and titanium acetylacetone. The tungsten salt is chosen from sodium tungstate and ammonium paratungstate.
TECHNOLOGY FOCUS - METALLURGY - The boundary layer is selected from one of a silicon oxide layer, a silicon nitride layer and an alumina layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Photocatalyzer contains titanium oxide, tungsten oxide, and/or strontium titanate. Non-metallic element is phosphorus, nitrogen, sulfur, and/or carbon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The etching solution comprises hydrofluoric acid. The treatment promoting gas includes ozone.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The copper source is anhydrous cupric sulfate, hydrated copper sulfate, anhydrous copper nitrate, copper nitrate, anhydrous copper chloride, copper chloride, cuprous chloride, cuprous chloride and/or copper acetate. The tin source is tin chloride, anhydrous tin chloride hydrate, anhydrous tin chloride and/or tin chloride hydrate. The zinc source is zinc oxide, anhydrous zinc chloride, zinc chloride, zinc sulfate, zinc nitrate, zinc acetate and/or zinc acetylacetonate. The sulfur source is elemental sulfur and/or thiourea. The amine is oleyl amine, ethylenediamine, butanediamine, hexadecylamine and/or lauryl amine.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The rate of temperature increased in step (b) is at least 6 degrees C/minute. In step (b), the temperature (T1) is not greater than 1280 degrees C, preferably not greater than 1000 degrees C. In step (c), the temperature (T2) is 1340-1380 degrees C. In step (d), the temperature of the base portion of the container is decreased at a rate of at least 2.6 degrees C/minute, preferably at least 6 degrees C/minute. In the method, during step (e), an annealing reaction is conducted. The annealing reaction is conducted at a temperature of 1000-1300 degrees C for 3 hours. The method further comprises, before step (e), repeating step (d). EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The thin film solar cell further comprises: an interface layer comprising molybdenum diselenide, where the interface layer is disposed between the back contact and the absorber layer; an intermediate layer comprising one of zinc oxide or stannic oxide, where the intermediate layer is disposed between the buffer layer and the conductive layer; an antireflection layer disposed over the conductive layer; and a layer of sodium selenide disposed between the absorber layer and the buffer layer. The antireflection layer comprises magnesium fluoride. The absorber layer comprises: one of copper indium gallium (sulfide) selenide (CIGS) (preferred), cadmium telluride or copper zinc tin (sulfide) selenide; CIGS and sodium; CIGS and a dopant, where the dopant comprises one of chlorine, bromine or iodine; and an inverted n-type sub-layer. The absorber layer has a thickness of 0.5-3 mu m, where the concentration of gallium in the absorber layer (comprising CIGS) is non-uniform, and is either higher at a side of the absorber layer facing the back contact than at an opposite side of the absorber layer, or higher at a side of the absorber layer facing the back contact and at a side of the absorber layer facing the buffer layer than in a middle of the absorber layer between these sides. The buffer layer: has a thickness of 30-80 nm; and comprises cadmium sulfide. The conductive layer: has a thickness of 0.3-2 mu m; and comprises one of aluminum-doped zinc oxide, indium tin oxide, indium-doped zinc oxide, boron-doped zinc oxide, gallium-doped zinc oxide, fluorine-doped zinc oxide or fluorine-doped tin oxide. The back contact: has a thickness of 0.3-2 mu m; and comprises one of copper-doped graphite, mercury telluride, copper-doped zinc telluride, tellurium, copper telluride, arsenic telluride/copper or antimony telluride.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: Bithiophene-diketopyrrolopyrrole-napththyl derivative is prepared by dissolving naphthyl derivative compound of formula (II), bithiophene-diketopyrrolopyrrole compound of formula (III), and catalyst which is tetra(triphenylphosphine) palladium, palladium acetate, or (1,1'-bi(diphenylphosphine)ferrocene) palladium chloride in reaction solvent in which molar ratio catalyst:compound (II) is 0.01-0.1:1 and molar ratio alkaline compound:compound (II) is 5-20:1, adding saturated aqueous solution of alkaline compound which is sodium carbonate, potassium carbonate or cesium carbonate, and carrying out reaction under inert atmosphere. Compound (II) is prepared by dissolving naphthyl-derivative compound of formula (IV) in tetrahydrofuran under action of n-butyl lithium and bis(pinacolato)alcohol boron acid ester in anhydrous oxygen-free conditions in which molar ratio compound (IV):bis(pinacolato)alcohol boron acid ester:n-butyl lithium is 1:1-1.5:1-1.5. Preferred Conditions: Reaction temperature under anhydrous oxygen-free condition is - 40 to - 78 degrees C and reaction time is 1-8 hours. Preferred Compositions: Molar-to-volume (mmol:ml) ratio naphthyl-derivative compound of formula (IV):tetrahydrofuran is 1:1-10. Molar-to-volume (mmol:ml) ratio compound (II):reaction solvent 1:5-10.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: Array filling rate is 0.2, and ratio inner diameter:outer diameter is greater than or equal to 0.4.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Material: The carbon material is carbon fiber cloth, carbon fiber, carbon paper, carbon rent and activated carbon grain or graphite particle.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The ratio of hydrogen fluoride, hydrochloric acid and water is 1:1:5.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The acid solution comprises sodium hypochlorite, hydrogen peroxide, ammonium nitrate, or nitric acid as oxidizing agent. The alkali solution comprises sodium hypochlorite, hydrogen peroxide, or ammonium nitrate as oxidizing agent. The acid solution is 0.1-15 %mass hydrofluoric acid solution and 1-15 %mass hydrochloric acid solution. The hydrofluoric acid solution contains 49 %mass hydrofluoric acid, and the hydrochloric acid solution contains 37 %mass hydrochloric acid. The alkali solution is 0.1-10 %mass sodium hydroxide and/or potassium hydroxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The catalyst active component comprises platinum, lead, tin, iron, cobalt, nickel. The mass ratio of activated carbon, carbon nano tube and spiral carbon nano tube is 10:1-10:1-10. The content of catalyst active component is 5-80 wt.%. The proton exchange membrane further comprises carbon black, nano carbon fiber, graphite, and porous carbon.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: At least one of the first heat curable monomer or the second heat curable monomer comprises at least three ether groups, or at least one melamine monomer (preferably hexamethoxymethylmelamine).    TECHNOLOGY FOCUS - POLYMERS - Preferred Film: The substrate comprises at least one polyester comprising at least 70 wt.% ethylene terephthalate repeat units. Preferred Components: At least one of the hydroxy-functional polymer, first cellulose ester polymer, and second hydroxy-functional polymer comprise cellulose acetate polymer, cellulose acetate butyrate polymer, or cellulose acetate propionate polymer (preferably cellulose acetate butyrate polymer). The hydroxy-functional polymer and second hydroxy-functional polymer comprise hydroxyl content of at least 1 wt.%, preferably at least 3 wt.%, especially about 4.8 wt.% according to ASTM D817-96. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The first alkoxy silane residue is tetraethoxy silane. The second alkoxy silane comprises methyltriethoxy silane.    TECHNOLOGY FOCUS - POLYMERS - The polymer further comprises a metal alkoxide residue; and a titanium isopropoxide residue.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal particles located in the pores are spaced from each other by a polymer of the polymer layer. The metal particles located in the pores are uniformly distributed on a surface of the carbon nanotubes. A diameter of the metal particles is 1-5 nanometers. Each of the metal particles is a nanocluster having a diameter of 1-2 nanometers. The nanocluster comprises metal atoms of less than or equal to 55. A mass percentage of the metal particles to the carbon nanotube-metal particle composite is 20-70%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: A surface of the carbon nanotubes is functionalized by hydrophilic groups. A surface of the carbon nanotubes is functionalized by carboxyl groups, and the polymer layer is adsorbed with the carbon nanotubes by the carboxyl groups.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: A polymer of the polymer layer is selected from polyaniline, polypyrrole, polythiophene, polyamide, polypropyleneimine, poly(N-acetylaniline), poly(N-methylpyrrole), poly(3,4-ethylendioxythiophene) and/or polycaprolactam. Only the polymer layer is coated on single carbon nanotube. A thickness of the polymer layer is 1-7 nanometers. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic molecule is arranged by intermolecular interaction with respect to organic molecule (61). The organic molecule (62) has pi -electron conjugated system. The organic molecule is hydrophilic group-containing organosilicon compound of formula: R-Si(-X1)(-X2)-X3.R=organic group having pi -electron conjugated system;andX1-X3=group obtained by removing hydrophilic group attached to silicon atom.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The pool rate of the uneven structure is 3-70%. The active material is conductive polymer. The binder contains anionic polymer as main component.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The mole ratio of number-of-moles of structural unit (I) and number-of-moles of structural unit (II) is 30/70-99/1. The structural unit (I) is imine-type compound of formula (III). The structural unit (II) is carbonyl group-containing compound of formula (IV). The organic solvent contains amide system solvent, ketone solvent, ester solvent and ether solvent. Preferred Properties: The film has light transmittance of 50% or more at wavelength of 400 nm, thickness of 10 mu m, thermal expansion coefficient of 50 ppm/K or less at 100-300 degrees C and glass transition temperature of 250 degrees C or more.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The polyimide is obtained by imidating the polyamic acid. Preferred Components: The polyimide contains carbonyl group-containing compounds of formula (V) or (VI).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The compound (a2) is chosen from hydrazine, dicarboxylic acid dihydrazide, and carbohydrazide. The functional group contained in the urethane resin and/or polyolefin resin is chosen from carboxyl group, hydroxyl group, and amino group.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The crosslinking agent preferably comprises melamine compound and epoxy compound. The melamine compound is an alkylated methylol melamine resin. The urethane resin and/or polyolefin resin have a functional group, which is capable of reacting with an epoxy group. The amount of alkylated methylol melamine resin contained in the crosslinking agent is 5-50 %mass with respect to the total mass of urethane resin and polyolefin resin. The ratio of sum total amount of epoxy groups contained in the epoxy compound with respect to the sum total amount of functional groups contained in the urethane resin or polyolefin resin is 5/1-1/5. The epoxy compound is trimethylolpropane polyglycidyl ether having hydrolyzable silyl group, or glycerol triglycidyl ether.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The 4-7 membered ring lactone in the compound (c) is ( epsilon )-caprolactone. The component (A) is a compound which does not have an aromatic group, and has a 2 or more ethylenically unsaturated group. The active-energy ray hardening-type composition further comprises compound (B) having ethylenically unsaturated groups other than component (A), photoinitiator (C), organic solvent (D). The content of components (A) and (B) with respect to total amount of components (A) and (B) is 40-99 wt.% and 1-60 wt.%, respectively. Preferred Process: Manufacture of the optical film/sheet involves coating composition to a sheet-like base material, bonding other sheet-like base material to the coating surface of the composition, irradiating an active energy ray from the side in any one of the sheet-like base material, and further involves peeling sheet-like base material(s).    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The number average molecular weight of polyol is 60-400. The component (A) has number average molecular weight of 600-3000.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The inorganic filler with particle size or length of 1-99 nm contains silicon dioxide, and particle size or length of 100 nm-100 mu m contains metal oxide chosen from aluminum oxide, magnesium oxide, titanium dioxide and/or aluminum nitride, or vice versa.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thermosetting resin is epoxy resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of primary gold plating layer is 0.01-0.1 mu m.
TECHNOLOGY FOCUS - METALLURGY - Preferred Component: The thickness of copper-indium-selenium transition layer is 50-100 nm. Preferred Method: The method further comprises presputtering for 5 minutes. Magnetic control sputtering is carried out for 6-10 minutes. Deposition involves heating at 500 degrees C for 3-5 minutes, and naturally cooling to room temperature.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises ultrasonic washing surface of silicon wafer with mixed solution of ammonia water, hydrogen peroxide and deionized water. Plasma enhanced chemical vapor deposition is carried out using silane, hydrogen, phosphorane and borane. Silicon wafer is P-type amorphous silicon thin film or hydrogenated N-type amorphous silicon thin film.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The oxygen scavengers are: substituted N-hydroxylamine compounds of formula ((R1)(R2)N(OH)); or organic acids.R1, R2 = 1-10C alkyl, 5-10C cycloalkyl, 6-10C aryl (all optionally substituted) or H.Provided that R1 and R2 are not H at the same time. Preferred Components: The surface tension of the solution is less than or equal to 72 dynes/cm2. The pH of the solution is 13-14. Preferred Composition: The texturing solution further comprises at least one organic solvent. EXAMPLE - Doped monocrystalline silicon wafers having n+ doped zones on the front side or emitter layer and pn-junctions below the emitter layer were immersed in an aqueous texturing solution comprising 0.5 wt.% of tripropylene glycol, 6 wt.% of potassium hydroxide, 0.5 wt.% of 1,4-butauediol, and 93 wt.% of water. Each wafer was weighed before texturing, then the surface of the treated emitter layer was examined for the quality of texturing.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The source solution further comprises a third type of metal ionic species, optionally where the third type of metal ionic species are selected from Group 11 metals, Group 12 metals, Group 13 metals, or Group 14 metals or elements. The first type of metal ionic species and the second type of metal ionic species are selected from Group 11 metals, Group 12 metals, Group 13 metals, or Group 14 metals or elements. The Group 11 metal is selected from Cu or Ag. The Group 12 metal is selected from Zn or Cd. The Group 13 metal is selected from Al, Ga, or In. The Group 14 metal or element is selected from Sn, Si, or Ge. The Group 15 element is selected from P, As, or Sb or the Group 16 element is selected from S, Se, or Te. The material comprising Group 15 or Group 16 element is provided as a gas. The reaction product comprises CuInGaSe2 or CuInGaS. The reactive material is a reducing agent. The gas is selected from ASH3, SbH3, PH3, H2S, H2Se, vapors of S, vapors of Se, and vapors of Te.
TECHNOLOGY FOCUS - METALLURGY - The highly doped, electrically conductive layer comprises silicon and indium in specific ratio, Gallium and Arsenide.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Photocurable resin composition contains compound of formula (III) as cationically polymerizable organic substance. Energy-beam-sensitive cationic polymerization initiator is a salt of a cation and an anion of formula (A)SUPERSCRIPTr+(B)sSUPERSCRIPTt-.r, t=1-4; ands=coefficient which keeps an electric charge neutral.
TECHNOLOGY FOCUS - METALLURGY - The metal material of solar battery comprises aluminum, molybdenum, titanium, tungsten, gallium and boron.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Property: The soda-lime-silica glass composition has thermal expansion coefficient of 60-85x 10-7/ degrees C.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass substrate contains composition which includes 40-80 %mass silica, 1-25 %mass alumina and 0.5-20 %mass sodium oxide. The glass substrate has compressive stress layer with compressive stress of 100MPa or more, stress thickness of 10 mu m or more and internal tensile stress of 200 MPa or less, and alkali barrier film formed on at least one surface with thickness of 10-1000 nm.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The tempered glass substrate contains 40-71 %mass silica, 3-30 %mass alumina, 0-3.5 %mass lithium oxide, 7-20 %mass sodium oxide or 40-71 %mass silica, 7.5-30 %mass alumina, 0-2 %mass lithium oxide, 10-19 %mass sodium oxide, 0-15 %mass potassium oxide, 0-6 %mass magnesium oxide, 0-6 %mass calcium oxide, 0-3 %mass strontium oxide, 0-3 %mass barium oxide and 0-8 %mass zinc oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Metal: The meal is tin, indium and/or bismuth.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The surface of the substrate comprises an electrode.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The particulates are removed by exposing the surface of the substrate to a stream of compound(s) chosen from a solvent for a known contaminant, preferably chosen from ammonia, carbon dioxide, nitrous oxide, hydrocarbons, chlorinated hydrocarbons and fluorinated hydrocarbons. The compound comprises supercritical fluid. Preferred Property: The compound(s) have one or more phases chosen from supercritical, gaseous, solid, and liquid phases.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The hydrocarbons are chosen from acetylene, propane and butane, the chlorinated hydrocarbons are chosen from chloroethane, and the fluorinated hydrocarbons are chosen from fluoroethane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: At least some boron is removed, such that the purified aluminum contains less boron than the aluminum. Removal of portion of the solidified aluminum is carried out mechanically or by cutting solidified aluminum. 5000 or more ppm Metal additive with respect to the aluminum is added. The metal additive is added to the aluminum and/or molten liquid. Preferred Composition: The purified aluminum contains less than about 0.25 ppm boron. The metal additive contains titanium. The aluminum contains 0.1 ppm boron. The impurities that contains reaction product of metal additive and boron comprise titanium diboride. The aluminum and metal additive are present together in the aluminum. The aluminum contains purified aluminum or solidified aluminum. The silicon crystals comprise less than 0.2 ppm boron. The silicon is metallurgical grade silicon. The content of silicon is 20-50 wt.%. The content of aluminum is 50-80 wt.%. The silicon crystals comprise 65 wt.% or more silicon. Preferred Conditions: The molten liquid is formed at 650 degrees C or more. The molten liquid is cooled at a rate of less than 75 degrees C/hour for 2 hour or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The passivating layer is a non-absorbing layer selected from a thick silicon nitride (SiNx) layer and aluminum trioxide (Al2o3) layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The hydrogenated amorphous silicon is alloyed with atoms selected from oxygen (0), nitrogen (N), carbon (C), and gallium (Ge) and the fraction of Silicon (Si) atoms.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The carbon carrier includes hierarchical multiple structure carbon structure body consisting of carbon black, carbon nanotube, carbon nanofiber, graphene and mesoporous carbon. The metal includes ruthenium, manganese, copper, iron, nickel, cobalt, chrome, cesium, gold, lead, palladium and vanadium. The urea is added with the platinum-metal to the molar ratio of 10-50:1. The platinum chloride solution is prepared at 70-130 degrees C. The platinum-metal particles are reduced by hydrothermal synthesis at 70-130 degrees C using microwaves. The amount of metal particles present in the platinum-metal/carbon catalyst is 10-80 wt.%. The platinum-metal particle has average granularity of 1-5 nm. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic layered compound is of formula (M1pX1n).M1 = metal comprising transition metal, post-transition metal, lanthanide metal or actinide metal, preferably W, Mo, V, Zr, Hf, Pt, Re, Nb, Ti, Ga, In, Sn, Pb, Ta or Bi;X1 = S, Se, or Te;p = 1-2; andn = 1-5.The inorganic layered compound is tungsten disulfide, molybdenum disulfide, tungsten diselenide, molybdenum diselenide, niobium disulfide, rhenium(IV) sulfide, titanium sulfide and/or zirconium disulfide. The inorganic layered compound is in the form of a nanotube. The metal nanoparticle is nickel, cobalt, iron, titanium, copper, vanadium, manganese, chromium, gold, platinum, palladium, ruthenium, rhodium, iridium, silver, and/or osmium or their oxides. The nanoparticle has a particle size of 1-100 nm. The diameter of the nanotube and nanoparticle is 20-200 nm. The hybrid comprises: tungsten disulfide nanostructure and metal nanoparticle; or at least one inorganic fullerene-like nanoparticle and metal nanoparticle. Preferred Process: The metal nanoparticle is deposited on the surface of the inorganic layered compound. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The metal salt is manganese salt, copper salt, zinc salt, cadmium salt, lead salt, iron salt, cobalt salt, silver salt, bismuth salt, onium salt, europium salt or gadolinium salt. The amine is nonyl amine, 11-amine, lauryl amine, 14-amine, 16-amine, 18-amine, benzyl amine, oleylamine, dodecoxy propylamine and/or diethylene glycol. The amine solution further comprises thiol compound. The sulfur compound is 1-octyl mercaptan. The manganese salt is manganese acetate or manganese. The iron salt is succinate, ferric oxalate or ferrous. The cobalt salt is cobalt acetate or acetylacetone cobalt. The copper salt is copper acetate, copper oxalate or copper. The silver salt is silver acetate, silver oxalate, silver or silver, the zinc salt is zinc acetate, zinc oxalate or zinc acetylacetonate. The cadmium salt is cadmium acetate or cadmium. The lead salt is lead acetate or lead. The onium salt is acetic acid or acetylacetone. The europium is europium or europium oleic acid oil. The gadolinium is acetic acid gadolinium or gadolinium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: Flow rate of O2 is 150-250 ml/minute. Flow rate of POCl3 is 750-850 ml/minute. Flow rate of N2 is 14000-16000 ml/minute.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step (5) comprises adjusting sputtering working air pressure to 10-30 sccm under pressure of 0.5 Pa and flow of argon gas.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The amount of normal-temperature xylene soluble portions contained in the polypropylene resin is 7 wt.% or less.    TECHNOLOGY FOCUS - POLYMERS - Preferred Properties: The film has minimum mesopentad fraction of polypropylene resin of 96%, and plane orientation coefficient of 0.0125. Preferred Composition: The upper limit of the amount of copolymerization monomers contained in the polypropylene resin is 0.1 mol%.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ratio of hardening agent (C) is 10-100 parts mass with respect to 100 parts mass of the fluororesin (A) and the polyester polymer (B). The composition further contains pigment (E) and hindered amine light stabilizer (G) with molecular weight of 300-5000 and melting point of 50-250 degrees C.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The fluororesin (A) is hydroxyl-containing fluoropolymer (A1) or polyvinylidene fluoride. The coating material composition preferably contains hydroxyl-containing fluoropolymer (A1), polyester polymer (B), block forming isocyanate hardening agent (C1) and ultraviolet absorber (D1) chosen from inorganic type ultraviolet absorber and organic type ultraviolet absorber with molecular weight of 200-1000 and melting point of 50-150 degrees C. The unit derived from aromatic polyhydric carboxylic acid compound is unit derived from phthalic acid, unit derived from isophthalic acid, unit derived from terephthalic acid, unit derived from naphthalene dicarboxylic acid, unit derived from trimellitic acid, and unit derived from pyromellitic acid. The polyester polymer (B) contains 30-60 mol% of units derived from the aromatic polyhydric carboxylic acid compound with respect to all the units in a polyester polymer, with number average molecular weight of 500-5000. The mass ratio of the fluororesin (A) and the polyester polymer (B) is 70/30-10/90.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The inorganic compound has a solubility in water, at 20 degrees C, of less than 0.0020 g/100 ml, and comprises at least 100 ppm of impurities, preferably 750 ppm of impurities. At least one of the impurities has a solubility in water, at 20 degrees C, of greater than 0.0025 g/100 ml. The aqueous solution comprises at least one mineral acid such as 1-50 wt.%, preferably 20 wt.%, of 6N aqueous hydrochloric acid. Preferred Method: The method further comprises: washing the purified inorganic compound with a second aqueous solution to remove mineral acid from the purified inorganic compound; washing the purified inorganic compound with water to remove mineral acid from the purified inorganic compound; separating the aqueous solution from the purified inorganic compound; and separating the second aqueous solution from the purified inorganic compound, where the starting inorganic compound comprises at least 100 ppm, preferably 100-200 ppm, of phosphorus containing impurities, and the purified inorganic compound comprises less than 10 ppm, preferably less than 5 ppm, of phosphorus containing impurities. The washing step: comprises mixing the inorganic compound and the aqueous solution; and is carried out with the aqueous solution having a temperature of 5-75 degrees C. The inorganic compound is washed with the aqueous solution by shaking, agitating, mixing or stirring.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The lining further comprises flux material reacting with the molten silicon, to form a slag, and sodium carbonate, calcium oxide, and/or calcium fluoride. The colloidal silica comprises silica particles suspended in a liquid. The lining comprises silicon carbide particles bound together using colloidal silica. The content of lining and silicon carbide is 40 wt.% and 60 wt.%, respectively. Preferred Properties: The silica particles have particle size of 10-30 nm. The silicon carbide particles have particle size of 3.5 mm or less. The lining has thickness of 2-10 mm. The refractory material comprises alumina.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Both sides of the n-GaAs substrate are polished. The n/p-Ge layer uses isobutylgermane. The n/p-Ge layer comprises a back surface field (BSF) layer for preventing recombination of a carrier generated in the multiple junction solar cell. The BSF layer is formed with the n/p-InGaP layer. The n/p-InGaP layer has energy band gap of 0.7-1.3. The multiple junction solar cell gradually controls a composition of gallium and indium in which an indium-gallium-arsenic-nitrogen-antimony (InGaAsNSb) layer is formed into buffer layers. The n/p-InGaP layer, the n/p-GaAs layer, n/p-InGaAsNSb layer and n/p-Ge layer are laminated to an upper part of the n-GaAs substrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The method enables utilizing three dielectric layers that are fabricated from material selected from a group consisting of silicon oxide (SiO), silicon nitride (SiN), silicon nitride hydride, silicon oxynitride, silicon oxycarbonnitride, silicon oxycarbide, titanium oxide, tantalum oxide, lanthanum oxide, Hafnium oxide, titanium nitride, tantalum nitride, hafnium nitride, hafnium oxynitride, lanthanum nitride, lanthanum oxynitride, chlorinated silicon nitride, chlorinated silicon oxide, amorphous silicon, amorphous silicon carbide, aluminum oxide, aluminum nitrite or aluminum oxynitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The first active layer is formed with gallium nitride (GaN). The second active layer is selected from the group consisting of aluminum gallium nitride (AlGaN), aluminum indium nitride (AlInN) and aluminum indium gallium nitride (AlInGaN).
TECHNOLOGY FOCUS - POLYMERS - The permeable membrane includes a washer made of silicone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Preparation of CdSe quantum dots loaded graphene uses 1 mg/ml graphene oxide suspension, and 0.25 mmol/L CdCl2. Reducing agent is ethylenediamine. Preferred Conditions: Ice bath temperature is 0 plus minus 1 degrees C. Oil bath temperature is 90 degrees C. High temperature vacuum drying is at 50 degrees C. Contant temperature oven is at 180 degrees C. Preferred Forms: Reacting in constant temperature oven for 6 hours yields granular CdSe quantum dots, for 12 hours yields rod-shaped CdSe quantum dots, and for 24 hours yields dendritic CdSe quantum dots.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal oxide precursor is Al(NO3)3, Cr(NO3)3, Mn(NO3)2, Mn(CH3COO)2, Fe(NO3)3, Co(NO3)2, Co(CH3COO)2, Ni(NO3)2, Ni(CH3COO)2, Cu(NO3)2, Cu(CH3COO)2, Zn(CH3COO)2, Zn(NO3)2, Zr(NO3)4, Zr(CH3COO)4, Ba(CH3COO)2, Ba(NO3)2, La(NO3)3, La(CH3COO)3, Ce(NO3)3 or Ce(CH3COO)3. The noble metal precursors is palladium(II) acetylacetonate (Pd(acac)2), platinum(II) acetylacetonate (Pt(acac)2), rhodium(III) acetylacetonate (Rh(acac)3), or ruthenium (III) acetylacetonate (Ru(acac)3).    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The oil phase solvent is hexane, heptane, octane, cyclopentane, cyclohexane, benzene, toluene, xylene, gasoline, diesel fuel or kerosene.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The insulator comprises one of quartz and a ceramic material including aluminum oxide, aluminum nitride, boron nitride or silicon carbide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The zinc source is selected from zinc sulfate, zinc acetate, zinc, zinc iodide or zinc nitrate. The catalyst is selected from ammonia or hydrazine.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The sulfur source is thioacetamide. The catalyst is acetic acid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Conditions: Grinding and mixing time for raw materials is 8-12 minutes. Calcining temperature is 1100 degrees C and time is 24 hours. Preferred Processes: Intermediate temperature solid oxide fuel cell-doped double perovskite cathode material is prepared by dehydrating ground and mixed raw materials, performing 2nd grinding for 25-35 minutes to obtain mixed material in which volume to mass ratio of ethyl alcohol:raw materials is 10 ml:4-7 g. Intermediate temperature solid oxide fuel cell-doped double perovskite cathode material is prepared by performing 2nd calcining process at 1250 degrees C for 24 hours.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - One buffer layer is made of gallium arsenide, aluminum gallium arsenide and aluminum gallium indium phosphide.    TECHNOLOGY FOCUS - METALLURGY - The middle battery is made of gallium arsenide antimony. The bottom battery is made of germanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The polycrystalline silicon is crystallized by placing silicon material in crucible of ingot furnace and heating; gradually increasing heating temperature until solid silicon coexists with liquid silicon; coexisting solid silicon on upper layer of liquid silicon layer; crystallizing to form polycrystalline silicon ingot; and carrying out post-processing.
TECHNOLOGY FOCUS - METALLURGY - The metal pieces are made of copper, silver and aluminum or aluminum alloy.
TECHNOLOGY FOCUS - METALLURGY - The rim is made of aluminum material.
TECHNOLOGY FOCUS - METALLURGY - The absorber surface and emitter surface are formed on both surfaces of base material consisting of tungsten and molybdenum.
TECHNOLOGY FOCUS - METALLURGY - The pillar is made of hollow aluminum material.
TECHNOLOGY FOCUS - METALLURGY - The conductor portion of first connection element is formed of copper.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The radical reaction is initiated by contacting lubricant (R(H)) and per(halo)fluorinated aromatic compound (F) with organic or inorganic peroxides, redox systems, ozone, hydrogen peroxide or by thermal or photochemical decomposition of lubricant (R(H)). The radical reaction is carried out in the absence of solvents. Preferred Components: The lubricant (R(H)): is one or more lubricant whose viscosity is 2-1000000 cSt; contains straight or branched hydrocarbon moieties; and is present in liquid form or in semi-solid form at room temperature. The lubricant (R(H)) consists of one or more mineral oils of hydrocarbon type, animal or vegetable oils, synthetic oils like poly alpha -olefins, dibasic acid esters, polyol esters, phosphate esters, polyesters, alkylated naphthalenes, polyphenyl ethers, polybutenes, multiply-alkylated cyclopentanes, silane hydrocarbons, siloxanes and polyalkylene glycols. The organic peroxide is benzoyl peroxide or di-tert-butyl peroxide. (F) consists of perfluorobenzene, perfluorobiphenyl (both preferred), perfluoronaphthalene, perfluoroanthracene, perfluoropyridine, perfluorotoluene and/or their derivatives comprising perfluorinated substituents.
TECHNOLOGY FOCUS - METALLURGY - The dye-sensitized photoelectric converter consists of dye carrier containing material such as tungsten trioxide or titanium dioxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The PV cells comprise cadmium telluride.    TECHNOLOGY FOCUS - METALLURGY - The PV cells comprise copper, indium, gallium and selenide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The intermediate dielectric layer comprises a silicon oxide or nitride.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The oxetane-containing compound is aromatic oxetane ester embraced by following oxetane structure of formula (I) or (II), or aromatic oxetane ether embraced by oxetane structure (III). The oxetane-containing compound is chosen from 27 oxetane-containing compounds e.g. bis-(3-methyl-oxetan-3-ylmethyl)terephthalate, bis-(3-methyl-oxetan-3-ylmethyl)isophthalate, 3-ethyl-oxetan-3-ylmethyl-naphthalene-1-carboxylate, bis-(3-ethyl-oxetan-3-lmethyl)naphthalene-2,6-dicarboxylate and bis-(3-ethyl-oxetan-3-ylmethyl)terephthalate. The latent carboxylic acid is anhydride embraced by carboxylic acid of formula (IV), preferably chosen from 9 carboxylic acids e.g. 5-(4-(2-(4-((1,3-dioxo-1,3-dihydro-2-benzofuran-5-yl)oxy)phenyl)propan-2-yl)phenoxy)-1,3-dihydro-2-benzofuran-1,3-dione, 5-(2-(1,3-dioxo-1,3-dihydro-2-benzofuran-5-yl)propan-2-yl)-1,3-dihydro-2-benzofuran-1,3-dione, 1,3-dihydro-2-benzofuran-1,3-dione, 5-tert-butyl-1,3-dihydro-2-benzofuran-1,3-dione and 5-((1,3-dioxo-1,3-dihydro-2-benzofuran-5-yl)oxy)-1,3-dihydro-2-benzofuran-1,3-dione.R=methyl or ethyl;K'=C(=)O;G=none or (CH2)mO;m=1-4;X=O, S, SO2, C(=O), phenaldehyde, CH2 or C3H7;X'=1-5C alkyl, 3-10C alkylene (both optionally substituted or interrupted by heteroatom including O, N or S), biphenyl or bisphenol A, E, F or S structure;n=1-3;X"=1-5C alkyl or 3-10C alkylene (both optionally substituted or interrupted by heteroatom including O, N or S, or interrupted by ketone, aryl or phenaldehyde);R'=none or O;andX'"=none, phenyl, phenylene, biphenyl biphenylene, or bisphenol A, E, F or S.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The photovoltaic cells comprise an indium gallium phosphide cell, a gallium arsenide cell, a silicon cell and a germanium cell.
TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Device: The flow tube is in the shape of waveform or bent arc made up of brass, copper or aluminum composite. The thermal storage tank is provided with a heating coil (304) which extends into the tank.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The lower basic cell is manufactured from silicon germanium alloy. The upper basic cell is manufactured from materials chosen among gallium-aluminum arsenide, gallium-indium phosphide, gallium-indium arsenide-phosphide and gallium-indium-aluminum phosphide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The base is made of P-type or N-type silicon.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The photovoltaic device comprises a roof-top photovoltaic array based upon photovoltaic technologies provided with crystalline silicon, cadmium telluride, copper-indium-gallium-selenide, copper-zinc-tin-sulfide, amorphous silicon.
TECHNOLOGY FOCUS - METALLURGY - The shape memory elements are made from shape memory alloy having an austenitic phase start temperature 10 to 20 degrees Celsius higher than its martenisitic phase completion temperature. The alloy is nickel-titanium alloy or nickel-titanium-copper alloy.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The float board is selected from the material group of cement, metal reinforced cement and cement mixture.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Device: The primary and secondary steam pipe eject identical amount of the exhaust gas. The first economizer and the second economizer capacity are identical. The engine collects waste heat from the exhaust gas. The exhaust gas from the engine is passed at a slow speed in the system.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The strip-shaped element made of copper extends along the entire upper edge from at least one photovoltaic element. The strip-shaped element made of copper extends over the entire width of the active surface. The strip-shaped element is designed as a single strip along the entire upper edge of the active surface. The strip-shaped element is fixedly attached on the active surface by means an adhesive bond. The adhesive bond is designed with an adhesive layer separating the strip-shaped element electrically from the active surface. At least one spacer is provided in the adhesive layer. The strip-shaped element is wider than 1-5 cm, preferably 2-4 cm, and/or thicker than 0.5-4 mm, preferably 1-3 mm thicker than the metal strips. The upper side is formed with transparent plate overlapping many photovoltaic elements. The strip shaped element is arranged on the transparent plate or on the frame. The active surface is designed with a frame (20) enclosing many photovoltaic elements.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Method: Step (A) utilizes a cooling medium consisting of brine, industrial waste brine, or refined seawater obtained after refining a portion of the circulation cooling seawater from the cooling tower using seawater refining system (15).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The solar liquid comprises water.
TECHNOLOGY FOCUS - METALLURGY - The frame is made of aluminum alloy material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The Rankine cycle working fluid is selected from a group consisting of organic solvent e.g. ethanol, n-pentane, and toluene.
TECHNOLOGY FOCUS - METALLURGY - The tubes comprise fins that are formed from stainless steel and hybrid of stainless steel and titanium.    TECHNOLOGY FOCUS - POLYMERS - The manifold is formed from plastic.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - The array of photovoltaic cells comprises several micro photovoltaic cells. The micro photovoltaic cells include flexible thin-film photovoltaic cells. The array of photovoltaic cells comprises several photovoltaic cells formed from at least one of amorphous silicon, crystalline silicon, silicon germanium, germanium, indium gallium arsenide, or indium arsenide. The micro light emitting diodes includes flexible thin-film light emitting diodes. The container is formed from a Bisphenol A-free polymer.
TECHNOLOGY FOCUS - METALLURGY - The pressure block is an aluminum alloy block.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The cells are made of gallium-indium-arsenide-phosphide, silicon, gallium arsenide, gallium indium phosphide, and aluminum gallium indium phosphide.
TECHNOLOGY FOCUS - METALLURGY - The cable is made of stainless steel.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Cyanide group-containing compound of formula: Kt(BH z(CN) 4-z), is reacted with cobalt chloride or cobalt hydrate and 3 equivalents or more bipyridine of formula (II), to obtain cobalt complex salt (I).Kt=alkali metal cation.Preferred Composition: The concentration of at least 1 cobalt complex salt (I) is 0.01-0.5 M, preferably 0.05-0.3 M. The charge transport layer comprises an organic solvent and/or ionic liquid(s). The cobalt complex salt is contained in the electrolytic solution. Preferred Definitions:    y=0 or 1;and    n=2.    SPECIFIC COMPOUNDS - 72 Cobalt complex salts are disclosed e.g. tris(2,2'-bipyridyl)cobalt(II) bis(tricyano borohydride) of formula (Ia), tris(2,2'-bipyridyl)cobalt(III) tris(tricyano borohydride), tris(2,2',4,4',5,5'-tetramethyl bipyridyl)cobalt(II) bis(tricyano borohydride), tris(2,2',4,4',5,5'-tetramethyl bipyridyl)cobalt(III) bis(tricyano borohydride) and tris(2,2',4,4'-tetramethyl bipyridyl)cobalt(II) bis(tricyano borohydride).    EXAMPLE - 2.35 g Cobalt chloride hexahydrate was dissolved in 10 mL water and 4.64 g bipyridine in 25 mL methanol was mixed. The reaction mixture becomes immediately deep-brown. In 10 minutes, the solution of 2.56 g potassium(tricyano borohydride) in 20 mL water was added to the reaction mixture. The product was precipitated immediately as yellow solid, filtered, and washed with 20 mL water and 50 mL diethyl ether for 2 times. The resultant product was dried in vacuum at room temperature, to obtain 6.167 g tris(2,2'-bipyridyl)cobalt (II) bis(tricyano borohydride) with yield of 88%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The binder is a fluorine-based polymer. The crosslinkable group of the binder is a hydroxy group. The molar ratio of the total amount of isocyanate groups of the crosslinking agents to the total amount of hydroxy groups of the binder is 0.25-2.50. The weather resistant layer further comprises a tin, zinc or bismuth based catalyst, which improves the crosslinking efficiency. The back sheet comprises the weather resistant layer on one side of the support and a primer (11) on the other side of the support to enhance the adhesion of the back sheet towards an encapsulant layer. Preferred Method: The weather resistant layer is applied on the support by coating from an aqueous or non-aqueous coating solution. The side of the support, on which the weather resistant layer is applied, is surface treated to improve the adhesion between the support and the layer.
TECHNOLOGY FOCUS - METALLURGY - The inner reservoir of thermal oil circuit heat exchanger is made of copper.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The first silicone-containing hot melt composition and the second silicone-containing hot melt composition comprise resin-linear composition, hydrosilylation cure composition, high-phenyl-T composition, silicon sealant composition, polyurea-polysiloxane composition, quadri-functional (MQ)/polysiloxane composition, MQ/X-diorganosiloxane composition, polyimide-polysiloxane composition, polycarbonate-polysiloxane composition, polyurethane-polysiloxane composition, polyacrylate-polysiloxane composition, or polyisobutylene-polysiloxane composition, where X is an organic polymer.
TECHNOLOGY FOCUS - METALLURGY - The first thermally conductive layer is made of copper, aluminum, iron, chrome, nickel, molybdenum, zinc, silver, gold or tin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The insulating backing is made of zirconia, alumina, silicon carbide, magnesium oxide and ceramic.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The one fluid is cooling water, another fluid is ambient air and the third fluid is selected from wehrlite RB4a, ethanol, ammonia, water or a mixture of ethanol and water.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The turbine expansion machine is of screw type or scroll type. The sea water desalting device is of evaporation type or reverse osmosis type device.
TECHNOLOGY FOCUS - METALLURGY - The metal lead is made of gold, silver, copper or aluminum material.
TECHNOLOGY FOCUS - METALLURGY - The wires are formed of copper, tin, nickel, aluminum and silver or alloy.
TECHNOLOGY FOCUS - POLYMERS - The layers are made of thermoplastic polymer.
TECHNOLOGY FOCUS - METALLURGY - The panels are continuous pieces of rigid material e.g. metal such as steel or aluminum.
TECHNOLOGY FOCUS - METALLURGY - The heat exchanger is made of aluminum or stainless steel.
TECHNOLOGY FOCUS - METALLURGY - The boxes are made of steel or aluminum.
TECHNOLOGY FOCUS - METALLURGY - The substrate is made of ceramic copper-clad substrate, water tank of water-cooling of the ceramic copper-clad substrate, copper substrate, or aluminum substrate.
TECHNOLOGY FOCUS - ELECTRONICS - The converter disposed in the superposed waveguides is selected from light source, light emitter, light modulator, light sensor, inorganic photovoltaic converter, organic photovoltaic converter, quantum-dot-based converter, charged coupled device (CCD) converter, Complementary metal-oxide-semiconductor (CMOS) converter, light emitting device (LED), organic light emitting device (OLED), liquid crystal display (LCD), phototransistor photodiode, diode, electroluminescent device, fluorescent device, gas discharge device, and/or electrochemical converter.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The remote monitoring device such as ZigBee or wireless fidelity (WiFi) device is included within the safety switch to monitor power output of electricity supplying output connected to the safety device.
TECHNOLOGY FOCUS - METALLURGY - The interposer connectors comprise a lug connection formed from gold plated aluminum, brass and copper. The lug connection is joined to finger spring contacts formed from gold plated beryllium copper. The interposer connector is a solder such as tin- lead eutectic solder and tin-silver-copper solder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The zeolite has pore structure of less than 10-membered oxygen ring or pore structure of less than 8-membered oxygen ring, and is preferably CHA-type zeolite. The molar ratio of silica and alumina in the zeolite is 5-10000.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The current sense data is transmitted through Zigbee communication.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The main component of the p-type-semiconductor layer and n-type-semiconductor layer is formed of copper-indium sulfide and copper-zinc sulfide.
TECHNOLOGY FOCUS - METALLURGY - The device is made of spring steel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The weight ratio of silica particles and binder is 88:12-93:7. The reflection suppression film contains 3-6 %mass zirconium oxide. Preferred Properties: The surface asperity of glass plate has preferable arithmetic mean roughness of 0.5-1 mu m and average inclination angle of 0.05-1 degrees .
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The oxide is zinc oxide or titanium oxide.
TECHNOLOGY FOCUS - POLYMERS - The transmission is toothed by rubber belt pulley. The water pump is connected to the turbine through a polyvinyl chloride tube.
TECHNOLOGY FOCUS - METALLURGY - The profile element is made from aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The separation layer is formed by aluminum oxide (Al2O3), aluminum nitride (AlN), silicon dioxide (SiO2), magnesium oxide (MgO), silicon nitride (Si3N4), boron nitride (BN), diamond, lithium aluminate (LiAlO2), lithium gallate (LiGaO2), gallium arsenide (GaAs), carborundum (SiC), titanium dioxide (titanium(IV) oxide) (TiO2), zirconium(IV) oxide (ZrO2), strontium titanate (SrTiO3), gallium oxide (Ga2O3), zinc sulfide (ZnS), magnesium aluminum oxide (MgAl2O4), lithium niobate (LiNbO3), lithium tantalum oxide (LiTaO3), yttrium aluminum garnet (YAG) crystal, potassium niobium oxide (KNbO3), lithium fluoride (LiF), magnesium fluoride (MgF2), barium fluoride (BaF2), gallium(III) fluoride (GaF2), lanthanum fluoride (LaF3), beryllium oxide (BeO), gallium phosphide (GaP), gallium nitride (GaN) and one or combination of rare earth oxides (REO) materials.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The thermal energy storage material including a salt is selected from the group consisting of potassium nitrate, sodium nitrate, or sodium nitrite.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The electrode includes a substrate and a metal oxide layer, where (I) is absorbed on the metal oxide layer.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Definitions:    R5, R8 = H, CH3 or C2H5;    A1, A2 = phenylene, naphthylene or furanylene;    R2 = OH or OCH3;    R1 = -C(=O)-OH, -C(=O)-O-CH3 or -CH=C(CN)(C(=O)-OH); and    R3, R4 = phenyl, furanyl or naphthyl.    SPECIFIC COMPOUNDS - 8 Compounds (I) are specifically claimed, e.g. methyl 4-((E)-2-(4-diphenylamino-phenyl)-vinyl)-2-methoxy-benzoate (Ia), methyl 4-((E)-2-(4-diphenylamino-phenyl)-vinyl)-2-hydroxy-benzoate, 4-((E)-2-(4-diphenylamino-phenyl)-vinyl)-2-methoxy-benzoic acid, 4-((E)-2-(4-diphenylamino-phenyl)-vinyl)-2-hydroxy-benzoic acid and 4-((E)-2-(3-diphenylamino-phenyl)-vinyl)-2-methoxy-benzoic acid.    EXAMPLE - 5.55 g Methyl 2-methoxy-4-vinylbenzoate, 14.1 g 4-bromo-1-(N,N-diphenylamino)benzene, 8.2 g tetrabutylammonium chloride, 0.325 g palladium(II) acetate, 6.05 g sodium bicarbonate and 100 ml dimethylformamide were mixed, stirred at 110 degrees C for 12 hours, and then the undissolved compound was removed and solvent was evaporated. The obtained product was purified by chromatography using 9:1 mixture of dichloromethane and methanol to obtain 10.15 g pure yellow methyl 4-((E)-2-(4-diphenylamino-phenyl)-vinyl)-2-methoxy-benzoate with 80.8% yield.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: (Q) comprise: electron donor groups including phenyl, 4-methoxyphenyl, 4-dimethylaminophenyl, 2,4-difluorophenyl, 2,9,9-trimethylfluorene, N,N-diethyl-4-methyl-aniline, 9-ethylcarbazol-2-yl, 9-ethyl-2-methyl-carbazole, 2-methyl-9-(p-tolyl)carbazole, 2,9,9-trimethylfluorene, (4-(bis(9,9-dimethylfluoren-2-yl)amino)phenyl), or monovalent groups of formulae (a)-(l); and spacer groups including 1-methyl-4-((E)-prop-1-enyl)benzene, toluene, (2,5-diethyl-3,6-dioxo-pyrrolo(3,4-c)pyrrol-1-yl), (2,5-bis((methyl-bis(trimethylsilyloxy)silyl)methyl)-3,6-dioxo-pyrrolo(3,4-c)pyrrol-1-yl), or monovalent groups of formulae (I)-(XX).n = 0-10. SPECIFIC COMPOUNDS - 14 Compounds (Q) are specifically claimed, e.g. 4-((E)-2-(5-(4-(bis(9,9-dimethylfluoren-2-yl)amino)phenyl)-2-thienyl)vinyl)-5,5-dimethyl-2-oxo-furan-3-carbonitrile of formula (Ia), 4-((E)-2-(5-(4-(bis(9,9-dimethylfluoren-2-yl)amino)phenyl)benzothiophen-2-yl)vinyl)-5,5-dimethyl-2-oxo-furan-3-carbonitrile, 4-((E)-2-(5-(1-(5-(4-(bis(9,9-dimethylfluoren-2-yl)amino)phenyl)-3H-thiophen-2-yl)-2,5-diethyl-3,6-dioxo-pyrrolo(3,4-c)pyrrol-4-yl)-2-thienyl)vinyl)-5,5-dimethyl-2-oxo-furan-3-carbonitrile, 4-((E)-2-(4-((E)-2-(4-(diphenylamino)phenyl)vinyl)phenyl)vinyl)-5,5-dimethyl-2-oxo-furan-3-carbonitrile, and 4-((E)-2-(4-cyano-2,2-dimethyl-5-oxo-3-furyl)-2-(4-((E)-2-(4-(diphenylamino)phenyl)vinyl)phenyl)vinyl)-5,5-dimethyl-2-oxo-furan-3-carbonitrile.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The alkaline earth metal oxide is selected from beryllium oxide, magnesium oxide, calcium oxide, strontium oxide or barium oxide. The alkali-free metal oxide is selected from lead oxide, bismuth oxide, tellurium oxide, silicon dioxide, vanadium oxide, phosphorus oxide, cerium oxide, boron trioxide, molybdenum oxide, titanium oxide, tin oxide, indium oxide, nickel oxide, copper oxide, antimony oxide, germanium oxide, gallium oxide, arsenic oxide, cobalt oxide, zirconium oxide, manganese oxide aluminum oxide. An additive is also used in the composition. The additive is selected from dispersing agent, thixotropic agent, plasticizer, viscosity stabilizer, antifoaming agent, pigment, UV stabilizer, antioxidant or coupling agent.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Process: The compound is thermo-mechanically processed for less than two hours by hot-pressing at 600-700 degrees C. The compound is in an as-cast state before ball-milling. The compound is ball-milled for 1-5 hours. The compound is formed by vacuum-melting.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The component (X) comprises at least one pnictogen atom. Preferred Properties: The compound has an average grain size of 200-500 nm. The compound comprises several particles with an average diameter less than 1 mu m.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The component (M) comprises at least one of rare-earth metal, actinide, alkaline-earth metal, and alkali metal. The component (T) comprises at least one metal of subgroup-(VIII).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of dopant is 0.2-5 wt.% of material (A). The dopant is nickel, cobalt, iron, boron, or their alloys. The weight ratio of chromium, iron and nickel in material (A) is 3:6:1. The weight ratio of chromium, iron and cobalt in material (A) is 3:6:1. The powder (B) comprises p-type filled skutterudite (804). Preferred Properties: The specific contact resistance between primary layer of ball-milled powder (A) and powder (B) is 0.3-0.8 mu ( Omega ).cm2. The work function of ball-milled powder (A) is similar to the work function of the n-type filled skutterudite the p-type filled skutterudite.
TECHNOLOGY FOCUS - METALLURGY - The electric conduction particles are formed by gold powder, silver powder, copper powder, gold-coated nickel powder, silver and nickel copper powder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method (M1) further comprises removing lithium, manganese and zinc from the reduced silica and iron brine before the step (f). The step (a) is performed using a crystallizer reactor clarifier process or a pH modification flashing process. The steps (b1) and (c1) are the same steps or different steps. In the method (M3), the step of supplying the geothermal brine to silica management process and the step of supplying the reduced silica geothermal brine to an iron removal process are the same steps or different steps. Preferred Components: In the method (M1), the reduced silica and iron brine has less than 20 ppm of silica, and less than 20 ppm of iron. In the method (M2), the treated brine has a packed bed test result that yields an operation time at least 100%, preferably 300% greater than an operation time of the geothermal brine. In the methods (M2) and (M3), the treated brine has a total suspended solids of less than 30 ppm, preferably less than 10 ppm. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The polymer comprises a metal dopant e.g. lead, cobalt, zinc and copper.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The polymer comprises a hardener provided with a bi- or trifunctional or multifunctional hydroxyl compound with trimethylpropane or glycerin.    TECHNOLOGY FOCUS - POLYMERS - The polyurethane derivatives comprise polyurethane oligomers, epoxy-urethane oligomers. The oligo-glycoladipates comprise polyethyleneglycoladipinates.
TECHNOLOGY FOCUS - METALLURGY - The base plate is formed as an aluminum base plate.
TECHNOLOGY FOCUS - METALLURGY - The plates are made of metal.    TECHNOLOGY FOCUS - POLYMERS - The plates are made of reinforced plastic.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The inorganic material further comprises a coating comprising an organic polymeric material, where the coating is disposed between the substrate and layers deposited by layer-by-layer self-assembly. The polyelectrolyte is covalently bonded to the organic light absorbing compound and/or organic light stabilizing compound. Preferred Components: The substrate consists of an inorganic material or an organic material. The substrate is light-transmissive to visible light. The organic light absorbing compound reduces the transmission of ultraviolet light. The organic light stabilizing compound or the organic ultraviolet absorbing compound comprises a group selected from a hindered amine, benzotriazole, benzophenone and/or triazine.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The layers comprise a polyelectrolyte copolymer of an ionic monomer and a copolymerizable organic light absorbing compound, and/or copolymerizable organic light stabilizing compound. The polyelectrolyte is a grafted copolymer or a random copolymer. The layers deposited by layer-by-layer self-assembly further provide a durable top coat or a reduction in surface reflections at 550 nm to less than 2%. The layers deposited by layer-by-layer self-assembly comprise alternating stacks of low refractive index bi-layers and high refractive index bi-layers that increase the total reflectivity of the multilayer optical film. The polyelectrolyte is provided in an aqueous solvent.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The chemical energy source: includes methane gas (substitute natural gas or liquefied natural gas) and its derivatives; is loaded with hydrogen substances, preferably carbazole and/or its derivatives; and includes hydrocarbons extracted from air and organic substance and water using carbon dioxide, carbon monoxide, and/or carbon hydrogen oxide (CnHmOo).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The n or p-type semi-conductor material precursor layer is made of aluminum doped zinc oxide. The barrier layer is made of a nitride or an oxide. The buffer layer is made of indium(III) selenide, indium(III) sulfide, zinc oxide, zinc sulfide and/or zinc selenide.    TECHNOLOGY FOCUS - METALLURGY - The p or n-type photovoltaic material precursor layers comprises precursors of a metal that is selected from a group consisting of copper, zinc, tin, gallium and/or indium. The method enables realization of a rear electrode that is made of molybdenum.
Preferred Definitions:    L1,L3=group chosen from 38 groups e.g. groups of formulae (i)-(v);    R3=1-20C alkyl;    m=1-3;and    Ar=group chosen from groups of formula (vi)-(viii).    SPECIFIC COMPOUNDS - 2 Dihydro-acridines i.e. (2Z)-2-cyano-3-(5-(7-(10-(4-hexylphenyl)-7-(octan-3-yl)-10H-phenothiazin-3-yl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)thieno(3,2-b)thiophen-2-yl)prop-2-enoic acid of formula (Ia), and (2Z)-2-cyano-3-(7-(10-(4-hexylphenyl)-7-(octan-3-yl)-10H-phenothiazin-3-yl)-2H,3H,4H-thieno(3,4-b)pyran-5-yl)prop-2-enoic acid are claimed.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. SPECIFIC COMPOUNDS - 1 Compounds (I) is specifically claimed, i.e. (Z)-3-(5-(4-((3,5-Bis-(hexyl-phenyl-amino)-phenyl)-hexyl-amino)-phenyl)-thiophen-2-yl)-2-cyano-acrylic acid (Ia).    EXAMPLE - 0.35 g 5-(4-((3,5-Bis-(hexyl-phenyl-amino)-phenyl)-hexyl-amino)-phenyl)-thiophene-2-carbaldehyde was dissolved in 20 ml chloroform, then 0.06 g cyanoacetic acid and 0.06 g piperidine were added to the obtained solution and refluxed under stirring condition for 24 hours. The obtained reaction solution was vacuum distilled to remove the solvent and purified by column chromatography using methanol and chloroform to obtain 0.3 g yellow solid of (Z)-3-(5-(4-((3,5-Bis-(hexyl-phenyl-amino)-phenyl)-hexyl-amino)-phenyl)-thiophen-2-yl)-2-cyano-acrylic acid (Ia) with 78% yield.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The conductive nano-material is carbon nanotube. The electrodes (13) and (15) are formed using aluminum, gold, silver or copper.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The melting point of compound chosen from sulfonium salt of formula (1a) or (1b), phosphonium salt of formula (2a) or (2b), and quaternary ammonium salt of formula (3a) or (3b), is 100?oC or less. The mass ratio of conductive nano-material, and compound chosen from sulfonium salt of formula (1a) or (1b), phosphonium salt of formula (2a) or (2b), and quaternary ammonium salt of formula (3a) or (3b), in thermoelectric conversion layer, is 1:9-9:1. The thermoelectric conversion material further contains an organic solvent. Preferred Process: The thermoelectric conversion material is formed by dispersing conductive nano-material in an organic solvent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thermoelectric conversion element further contains conjugated polymer in the thermoelectric conversion layer. Preferred Definitions:    R11-R13=alkyl;    R21-R24=alkyl;    A=nitrogen-containing heteroaryl;and    X-,Xp-=conjugate base of strong acid.
TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Components: The clamp handles are covered with a protective sleeve, where outer surface of the protective sleeve is coated with optical layer.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The tubular conductor is mixed with acetone liquid.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Conditions: Softening temperature is 70 degrees C, and softening time is 30 minutes. Preferred Parameters: Soda ash has concentration of 30%. Preferred Processes: Indirect heating is performed to evaporate water at 90-105 degrees C for 10-15 minutes. Preferred Components: Decoloring agent is activated white clay or activated carbon.
TECHNOLOGY FOCUS - METALLURGY - The heat absorbing type concave groove substrate is made of copper, copper alloy, aluminum alloy or ceramic material.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The back plate comprises molybdenum, and the light absorption layer comprises the transparent electrode includes zinc oxide and copper-indium-gallium-selenium-sulfur.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The thermoelectric semiconductor nanofiber core unit is formed of material of bismuth-tellurium group, cobalt-antimony group, lead-tellurium group, and antimony-tellurium group. The thermoelectric semiconductor precursor for core is nitrate, chloride, oxide or acetate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Oxides: The metal oxide is selected from lithium oxide, vanadium oxide, phosphorus oxide, magnesium oxide, cerium oxide, boron oxide, strontium oxide, molybdenum oxide, titanium oxide, tin oxide, indium oxide, nickel oxide, cupric oxide, sodium oxide, potassium oxide, antimony oxide, germanium oxide, gallium oxide, calcium oxide, arsenic oxide, cobalt oxide, zirconium oxide, manganese oxide or aluminum oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition comprises 1-30 wt.% of organic vehicle, 60-65 wt.% of silver powder, 0.5-20 wt.% of glass frit, and 1-10 wt.% of germanium-selenium group alloy particle. Preferred Components: The metal is selected from indium, strontium, ceramic, zinc, tellurium, tin, selenium, europium, lanthanum, antimony, lead, sodium, lithium, praseodymium, arsenic or bismuth. The glass frit is selected from zinc oxide-silicon oxide, zinc oxide-oxidation boron-silicon oxide, zinc oxide-oxidation boron-silicon oxide-aluminum oxide, bismuth (III) oxide, bismuth oxide-silicon oxide, bismuth oxide-oxidation boron-silicon oxide, bismuth oxide-oxidation boron-silicon oxide-aluminum oxide, bismuth oxide-zinc oxide-oxidation boron-silicon oxide, bismuth oxide-zinc oxide-oxidation boron-silicon oxide-aluminum oxide, lead oxide, lead oxide-tellurium oxide, lead oxide-tellurium oxide-silicon oxide, lead oxide-tellurium oxide-lithium oxide, bismuth oxide-tellurium oxide, bismuth oxide-tellurium oxide-silicon oxide, bismuth oxide-tellurium oxide-lithium oxide, tellurium oxide, tellurium oxide-zinc oxide or tellurium oxide-zinc oxide. The additive is selected from dispersing agent, thickening agent, plasticizer, viscosity stabilizer, antifoaming agent, pigment, ultraviolet stabilizer, antioxidant or coupling agent.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation given. Preferred Property: The fullerene derivative has lowest unoccupied molecular orbital energy level of -3.4 eV to -5 eV. Preferred Composition: The organic layer contains photoactive layer and fullerene derivative-containing organic layer arranged between the photoactive layer and the primary electrode or the secondary electrode. The photoactive layer is bilayer structure containing n-type organic layer including fullerene derivative, and p-type organic layer. The photoactive layer includes electron donor and electron acceptor. The electron acceptor includes fullerene derivative. The electron donor and electron acceptor comprise bulk heterojunction. The electron donor is poly(3-hexylthiophene) or thiadiazole derivative of formula (II).R11-R13=alkyl or alkoxy (both optionally substituted). SPECIFIC COMPOUNDS - 162 Fullerene derivatives (I) are specifically claimed, but structures of fullerene derivative are illegible and cannot be drawn.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition comprises 1-30 wt.% of organic vehicle, 55-95 wt.% of silver powder, 0.5-20 wt.% of glass frit, and 0.1-40 wt.% of metal particles. Preferred Components: The metal is selected from indium, strontium, ceramic, zinc, tellurium, tin, selenium, europium, lanthanum, antimony, lead, sodium, lithium, praseodymium, arsenic or bismuth. The glass frit is selected from zinc oxide-silicon oxide, zinc oxide-oxidation boron-silicon oxide, zinc oxide-oxidation boron-silicon oxide-aluminum oxide, bismuth(III) oxide, bismuth oxide-silicon oxide, bismuth oxide-oxidation boron-silicon oxide, bismuth oxide-oxidation boron-silicon oxide-aluminum oxide, bismuth oxide-zinc oxide-oxidation boron-silicon oxide, bismuth oxide-zinc oxide-oxidation boron-silicon oxide-aluminum oxide, lead oxide, lead oxide-tellurium oxide, lead oxide-tellurium oxide-silicon oxide, lead oxide-tellurium oxide-lithium oxide, bismuth oxide-tellurium oxide, bismuth oxide-tellurium oxide-silicon oxide, bismuth oxide-tellurium oxide-lithium oxide, tellurium oxide, tellurium oxide-zinc oxide or tellurium oxide-zinc oxide. The additive is selected from dispersing agent, thickening agent, plasticizer, viscosity stabilizer, antifoaming agent, pigment, ultraviolet stabilizer, antioxidant or coupling agent.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Thickener is bentonite, diatomite, methyl cellulose and/or gluten. Third monomer is acrylamide, methacrylamide, methyl acrylate, ethyl acrylate and/or butyl acrylate. Foaming agent is N,N-dimethylurea, isopropanol or isobutanol. Crosslinker is allyl acrylate, allyl methacrylate, magnesium oxide or ethylene glycol dimethacrylate.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: Nanocalcium carbonate modified polyamide foam comprises 40-60 pts. wt. methyl methacrylate, 40-60 pts. wt. methacrylonitrile, 5-20 pts. wt. third monomer, 0.05-0.6 pt. wt. initiator, 1-30 pts. wt. thickener, 1-16 pts. wt. foaming agent, 1-12 pts. wt. crosslinker, 0.1-3 pts. wt. density control agent and 0.3-18 pts. wt. calcium carbonate.
TECHNOLOGY FOCUS - METALLURGY - Preferred Compositions: Wind power main shaft steel contains 0.34 mass% C, 0.53 mass% Mn, 0.32 mass% Si, 0.006 mass% P, 1.6 mass% Cr, 1.57 mass% Ni, 0.25 mass% Mo, 0.05 mass% Cu, 0.01 ppm H, and balance Fe and unavoidable impurities.
TECHNOLOGY FOCUS - ENVIRONMENT - Preferred Processes: Refrigerant is distributed inside the low temperature side rotary body. In inner side of high temperature side rotary body, aerobic fermentation of mixed material containing granular porous carbon and organic waste is carried out. Granular porous carbon and cellulosic material are sent to kiln with hot air, firing process is performed, and calcined charcoal is quenched by adding cooling water immediately after coming out of kiln. Subturbine of auxiliary electric power generation unit is driven by pressure of water vapor arising from quenching process of charcoal, and electric power is produced by auxiliary electric power generation unit. Process cake containing mixture of granular porous carbon and organic waste is solidified and injected to high temperature side rotary body.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass frit has average particle diameter of 0.1-10 mu m. The composition further contains additive chosen from dispersing agent, thixotropic agent, plasticizer, viscosity stabilizer, antifoaming agent, pigment, ultraviolet stabilizer, antioxidant and coupling agent.
TECHNOLOGY FOCUS - METALLURGY - The first electrodes and the second electrodes are made of silver (Ag), nickel (Ni), copper (Cu), aluminum (Al), tin (Sn), zinc (Zn), indium (In), titanium (Ti) and gold (Au). The first and second conductive elements are made of tin (Sn) based material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The fluid is refrigerant chosen from propane, cyclopropane, isobutene, isobutane, n-butane, propylene, n-pentane, isopentane, cyclopentane, 1,1,1,2-tetrafluoroethane (R-134a), dichloromethane (R-30), difluoromethane (R-32), hydrochlorofluorocarbon (R-123), pentafluoroethane (R-125),(R-143a), 1,1,1-trifluoroethane (R-134), 1,1-difluoroethane (R-152a), fluoroethane (R-161), hexafluoropropylene (R-1216), 1,1,1,2,3,3,3-heptafluoropropane (R-227ea), 1,1,1,3,3-pentafluoropropane (R-245fa), 1,1,1,2,2-pentafluoropropane (R-245cb), R-236ea-type refrigerant, 1,1,1,3,3,3-hexafluoropropane (R-236fa), 1,1,1,3,3-pentafluorobutane (R-365mfc), perfluoropolyether (HT-55), decafluoropentane (R-43-10 mee), hydrofluoroether(7100), Novec-649 (RTM: refrigerant), trifluoroiodomethane, 1,3,3-tetrifluoro-1-propene (R-1234ye), 2,3,3,3-tetrafluoropropene (R-1234yf), trans-1,3,3,3-tetrafluoropropene (R-1234ze), trans-1-Chloro-3,3,3-trifluoropropylene (R-1233zd(E)), 1-chloro,3,3,3-trifluoropropene (R-1233zd(Z)), (1Z)-1,2,3,3,3-pentafluoroprop-1-ene (R-1225ye(Z)), (1E)-1,2,3,3,3-pentafluoroprop-1-ene (R-1225ye(E)), chlorocyclopentane, 2H,3H-decafluoropentane, 3,3,3-trifluoroprop-1-ene (R-1243zf), E-134a-type refrigerant, E134-type refrigerant, E125-type refrigerant, E143a-type refrigerant, siloxane, dimethylether and carbon dioxide.
TECHNOLOGY FOCUS - POLYMERS - The electric power generation device is provided with elastic main portion which contained elastomer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The quantum dot layer comprises cobalt triantimonide, tin telluride, lanthanum antimonide and cerium nitride. The ligand comprises magnesium oxide, titanium oxide and titanium oxynitride.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The ligand comprises ethanedithiol, benzenedithiol and mercaptopropionic acid.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The carbazole derivative present in the dye layer has a structure of formula (I). The dye-sensitized solar cell further includes a recombination barrier layer and an optical scattering layer.X1, X2, R1, R2 = aryl hydrocarbyl, heteroaryl ring (both optionally substituted), H, 1-20C-alkyl, 2-20C-alkenyl or 2-20C-alkynyl;A1, A2 = H, or optionally substituted aliphatic or aryl 1-20C-hydrocarbyl, where one of A1 and A2 contains an electron-withdrawing group, and both of A1 and A2 include an acidic hydrogen;n = 0-5; andm = 1-5. SPECIFIC COMPOUNDS - Use of 1 compound (I) is specifically claimed i.e. (Z)-3-(4-(9'-(4-((Z)-2-carboxy-2-cyano-vinyl)-phenyl)-9'H-(3,3')bicarbazolyl-9-yl)-phenyl)-2-cyano-acrylic acid of formula (Ia).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): Preparation of (I) comprises carbon-carbon coupling a substituted aminobenzoic acid, adding halogen atom, and then performing a Suzuki coupling reaction or an amination. Preferred Components: The organic layer comprises a hole injection layer, a hole-transport layer, a light-emitting layer, a hole blocking layer and an electron-transport layer. SPECIFIC COMPOUNDS - 32 Compounds (I) are disclosed, e.g. 1-(3,6-dimethyl-7-(10-phenylanthracen-9-yl)phenanthren-2-yl)pyrene of formula (Ia), N-(1,8-dimethyl-7-(10-phenylanthracen-9-yl)phenanthren-2-yl)-N-(naphthalen-1-yl)pyren-1-amine, 10,10'-(1,3,5,8-tetraphenylphenanthrene-2,7-diyl)bis(9-phenylanthracene), 10,10'-(3,4,5,6-tetramethylphenanthrene-2,7-diyl)bis(9- phenylanthracene), and 10,10'-(3,6-bis(4-tert-butylphenyl)phenanthrene-2,7-diyl)bis(9-phenylanthracene).    EXAMPLE - 5 g of Pyren-1-ylboronic acid and 2.01 g of 2-bromo-3,6-dimethyl-7-(10-phenylanthracen-9-yl) phenanthrene were added into 200 ml of dimethylformamide and 2.35 g of tetrakis(triphenylphosphine)palladium(0). 50 ml of Aqueous potassium carbonate solution was dropwisely added into the reaction mixture. The reaction mixture was stirred at 80 degrees C after the completion of the reaction at room temperature. The reaction mixture was cooled and then 400 ml of ethyl acetate was added. After taking the organic layer, the organic layer was washed with 100 ml of purified water. The organic layer was dried. The mixture was stirred for 30 minutes after adding 10 g of magnesium sulfate. The organic layer was filtered and concentrated under reduced pressure, and then the concentrated residue was undergone a gel chromatography to obtain 1-(3,6-dimethyl-7-(10-phenylanthracen-9-yl)phenanthren-2-yl)pyrene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The hydrogen content of a buffer layer is high in comparison with the hydrogen content of the center reflecting layer.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The electricity generating element comprises first insulating substrate having holes or discontinuities and clamps for fixing the lyophilized cell membrane fragments, and further comprises second insulating substrate, where the insulating substrate is subjected to hydrophobic modification. The element has second cell membrane fragments which are arranged above the lyophilized cell membrane fragments, with predetermined spacing so as to oppose inner surfaces. The electricity generating element is provided with flow path supplying liquid containing ATP to the inner surface of the cell membrane fragments, and liquid containing a neurotransmitter to the outer surface of the cell membrane fragments. The biological origin for cell membrane fragments is a living organism chosen from Narke japonica, Electrophorus electricus and Malapterurus electricus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The rotor and/or stator is/are made of tungsten carbide.    TECHNOLOGY FOCUS - POLYMERS - The rotor and/or stator are made of ceramic material.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The communication between the control apparatus and the information technology equipment conforms to Echonet-lite or ZigBee standard.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The liquid fuel is methanol, formic acid, ethanol or acetylene.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No general preparation given. Preferred Properties: The photosensitizing dye comprises photosensitizing dye including other photosensitizing dye. The other photosensitizing dye has absorption peak in short wavelength side than absorption peak of photosensitizing dye. Preferred Composition: The dye-sensitized solar cell further consists of co-adsorption agent which is adsorbed in oxide semiconductor layer. SPECIFIC COMPOUNDS - 1 photosensitizing dye having structure is disclosed i.e. tetra(t-butyl azanium)3,4-dicarboxy-2,2':6',2"-terpyridyl-triiso-thiocyanato ruthenium of formula (II).    EXAMPLE - 3',4'-Dicarboxy-2,2':6',2"-terpyridine was dissolved in 100 ml ethanol, and rutheniumchloride (III) trihydrate was added and stirred well. 3',4'-Dicarboxy-2,2':6',2"-terpyridine dissolved in 100 ml chloroform to the reaction mixture, and the reaction mixture was heat-refluxed for 4 hours and reacted. The reaction solution was dried after completion of reaction, and remaining solid was dissolved in dimethylformamide. 3.2 g Potassium thiocyanate was dissolved in water, and the mixture was added tot solution. The mixture was heat-refluxed under nitrogen atmosphere for 30-minutes. In the reaction solution, 63 ml triethylamine was further added, heated and refluxed for two days in nitrogen atmosphere under light-shielding. 3',4'-Dicarboxy-2,2':6',2"-terpyridine, ruthenium-chloride (III) trihydrate, potassium thiocyanate were reacted and dried to obtain 168 mg tetra(t-butyl azanium)3,4-dicarboxy-2,2':6',2"-terpyridyl-triiso-thiocyanato ruthenium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Gas chosen from silane, disilane and chlorosilane is further supplied during formation of metal electrode wiring. Transparent electrode layer further contains aluminum-doped zinc oxide. Seed layer is formed using 0.01-3 g/L palladium chloride, deionized water, 1-20 ml/L hydrochloric acid and 1-20 ml/L sulfuric acid. Copper metal electrode layer is formed using 2-5 g/L copper sulfate, 1-20 g/L sodium hydroxide, 0.1-3% pyridine, and 0.1-2% ethylenediaminetetraacetic acid and Rochelle salt.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: Cap layer is formed using silver, tin, silver-tin alloy, lead and nickel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The chamber comprises thermal fluid containing potassium nitrate. The drill bit comprises a material selected from the group consisting of silicon carbide, boron carbide and carbon fiber.
TECHNOLOGY FOCUS - POLYMERS - The spine is formed of polymer or polymer-based composite. The blades and other component parts are formed of polymer and or polymer-based composites, such as polyethylene.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Property: The laminated component has a rectangular parallelepiped shape. The main surfaces (20 and 22) are planar.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The material (i) does not contain bismuth. The content of particles in the material (i) is 0.1-10 wt.%, preferably 1-5 wt.%. The particles are oxide particles, preferably silicon dioxide. The metal is chosen from nickel, cobalt, silver, gold, copper, chromium and aluminum. The material (ii) is a bismuth-antimony-tellurium-containing complex of formula: Bi0.5Sb1.5Te3 (I). The particle size of particles is 5-100 nm.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The peak temperature of sealing material of laminated block is measured according to the procedure prescribed by JISK7121 standards.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The water-vapor permeability and the diffusion coefficient of a test piece are calculated based on JIS K 7129 B specification.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The first and second electrodes are formed of copper and tin. The insulating layer is formed of silicon nitride, silicon oxide, silicon oxynitride and aluminum oxide.
TECHNOLOGY FOCUS - METALLURGY - The bonding layer is selected between alloys of nickel (Ni), chrome (Cr), cobalt (Co) and molybdenum (Mo). The light absorption layer is provided with CIGS group compound layer comprising copper (Cu), indium (In), gallium (Ga) and selenium (Se).
TECHNOLOGY FOCUS - METALLURGY - The back electrode layer is selected between alloys of molybdenum (Mo). The light absorption layer is provided with CIGS group compound layer comprising copper (Cu), indium (In), gallium (Ga) and selenium (Se).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The environmental control system comprises a carbon dioxide scrubber, an oxygen supply and an atmosphere circulator.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The p-type granular bodies in the first planar body are either: directly connected to the p-type granular bodies in the adjacent at least one second planar body; or electrically connected to the p-type granular bodies in the adjacent at least one second planar body via conductors. The n-type granular bodies in the first planar body are either: directly connected to the n-type granular bodies in the adjacent at least one second planar body; or electrically connected to the n-type granular bodies in the adjacent at least one second planar body via conductors. Each of the p-type granular bodies and the n-type granular bodies has flat faces formed by processing part of each of the p-type granular bodies and the n-type granular bodies to be flat. The flat face of each of the p-type granular bodies in the first planar body is either: contacted or joined to the flat face of each of the p-type granular bodies in the adjacent at least one second planar body via a conductor; or directly contacted or joined to the flat face of each of the p-type granular bodies in the adjacent at least one second planar body. The flat face of each of the n-type granular bodies in the first planar body is either: contacted or joined to the flat face of each of the n-type granular bodies in the adjacent at least one second planar body via a conductor; or directly contacted or joined to the flat face of each of the n-type granular bodies in the adjacent at least one second planar body. The flat faces are substantially parallel to the face of the base material.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The proppant comprises a proppant material which interacts with the formation fluid and/or fracturing fluid which migrates through the surface layer and is taken up by proppant material which hardens proppant material. The proppant material is cement, preferably dry cement, or an expandable material. The proppant comprises hollow vesicles (406).    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The surface layer comprises carbon fibers, preferably nanotubes.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The surface layer is obtained from polymers chosen from polystyrene, polyethylene, polypropylene and nylon.
TECHNOLOGY FOCUS - METALLURGY - The single metal material is provided with aluminum alloy comprising marine-grade aluminum alloy, titanium alloy and stainless steel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The thermally-conductive powder comprises iron powder and iron oxide.
TECHNOLOGY FOCUS - METALLURGY - The electric conduction belt is a copper belt that is coated with tin, tin silver and tin lead-silver alloy material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The zinc oxide-nanorod composite has width of 30-200 nm and length of 3-10 mu m. The photoactive layer has thickness of 3-10 mu m. Preferred Composition: The nano-oxide layer includes oxide of metal chosen from 22 metals e.g. cobalt, copper, titanium, zirconium and strontium, and has thickness of 3-30 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The oxide precursor is chosen from zinc tetrachloride, zinc acetate, cobalt acetate and copper acetate (II). The concentration of oxide precursor in the precursor solution is 0.05-0.1 M.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The microcrystalline silicon material is provided, in which a center reflecting layer contains the oxygen and germanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The particle size distribution of kaolin nanotube is 1-2 mu m, the outer diameter is 50-60 nm and the inner diameter is 20-30 nm. The weight ratio of kaolin nanotube and PEDOT:PSS is 1:0.77-1:3.85.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Method: The container is a ceramic crucible.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The phase change heat storage medium comprises 25-35 mol.%, preferably 30 mol.% Ca(NO3)2 and 65-75 mol.%, preferably 70 mol.% NaNO3. Preferred Method: The high temperature environment is at 300-350 degrees C. Heat preservation is conducted for 4-6 hours.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The transparent base material is a tempered glass plate, a sapphire glass plate and a soda glass plate.
TECHNOLOGY FOCUS - METALLURGY - The white inorganic pigment is titanium white, zinc white, barium sulfate, lithopone and silica.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The monomer component further comprises phosphinic acid.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The water-soluble copolymer does not contain phosphorus.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The deposition inhibitor is phosphonates, polymers, or phosphates esters or derivatives. The deposition inhibitor is diphosphonic acids, triphosphonic acids, tetraphosphonic acids, pentaphosphonic acids or hexaphosphonic acids or their salts. The concentration of the deposition inhibitor is 2-30 wt.%.    TECHNOLOGY FOCUS - POLYMERS - Preferred Method: The injection of the deposition inhibitor and the polymeric agent is simultaneous. The injection of the deposition inhibitor and the polymeric agent is sequential, and the inhibitor is injected before the polymeric agent. Preferred Components: The deposition inhibitor is copolymers, terpolymers or green polymers. The polymeric agent is copolymers based on acrylamide, 2-acrylamido-2-methylpropanesulfonic acid, vinylpyrrolidone and acrylic acid. The polymeric agent is a microgel formed by crosslinking the copolymers based on acrylamide, 2-acrylamido-2-methylpropane sulfonic acid, vinylpyrrolidone and acrylic acid by a crosslinking agent. The concentration of the polymeric agent is 0.05-1 wt.%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The plasma enhanced chemical vapor deposition process is provided with gas selected from a group consisting of silane, disilane and trichlorosilane. The transparent electrode layer is selected between indium tin oxide and aluminum-doped zinc oxide. The seed layer is made of palladium chloride, ultra-pure water, hydrochloric acid, sulfuric acid component, composition of sulfuric acid, hydrochloric acid and palladium chloride. The copper metal electrode is made of copper sulfate, sodium hydroxide, pyridine, ethylenediaminetetraacetic acid, rochelle salt and water. The cap layer is made of silver, tin, silver-tin, lead and nickel.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The heat-treatment of zinc oxide precursor is carried out at a temperature of preferably 100-150 degrees C for 1-90 minutes in the presence of hydrogen or argon gas. Formation of thin film further involves performing ultraviolet treatment process in the heat-treated zinc oxide precursor at room temperature to 150 degrees C for 1 second to 30 minutes, and curing the zinc oxide precursor using ultraviolet ray of 100-1000 nm. Preferred Components: The zinc salt is zinc chloride, zinc sulfate, zinc nitrate, zinc acetate, zinc phosphate, zinc fluoride, zinc bromide, or zinc iodide. The basic substance used during the manufacturing process is ammonia solution, sodium hydroxide, potassium hydroxide, or lithium hydroxide. The basic substance is capable of separating a portion of solution from the supersaturated basic solution.
TECHNOLOGY FOCUS - METALLURGY - The metal particle structure comprises copper particles or particles of copper-containing alloy.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The conductive layer includes conductive layer (a) and conductive layer (b). The conductive layer (a) comprises 0-1 wt.% glass frit and metal particles chosen from nickel, titanium, cobalt, platinum, palladium, molybdenum, chromium, tungsten, copper or their alloy.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The conductive layer (b) comprises silver, gold, aluminum, nickel, platinum, copper or their alloy.
TECHNOLOGY FOCUS - POLYMERS - The adhesion layers formed in surface of heat absorption layer consists of silicone resin, acrylic resin, urethane resin, styrene resin, alpha-olefin resin, ethylene vinyl acetate copolymer resin, epoxy resin, and styrene-butadiene-rubber resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The laminated main portion is a sintered compact and the carbon containing layers are a portion of the sintered compacts.    TECHNOLOGY FOCUS - METALLURGY - The second material contains bismuth (Bi), and the first material does not contain Bi but contains the metal different from Bi.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The tackifier is terpene phenol having content of 3-20 wt.%, and has softening point of 100-130 degrees C. The (meth)acrylate is a (meth)acrylate containing phosphoric acid group or phosphate ester group.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Properties: The dye-sensitized solar cell has photocurrent density of 25 mA/cm2 or more, and conversion efficiency ( eta ) of 10% or more.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of zirconium precursor is 10-70 pts. wt. and content of nitrogen precursor is 90-150 pts. wt., with respect to 100 pts. wt. titanium oxide. The nitrogen-doped compound semiconductor comprises 35-45 wt.% titanium oxide particles, 1-15 wt.% zirconium oxide particles and 40-60 wt.% nitrogen. Preferred Properties: The thickness of the coating of nitrogen-doped compound semiconductor on transparent electrode is 10-25 mu m. The nitrogen-doped compound semiconductor has BET specific surface area of 200 m2/g or more.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solution of titanium tetrachloride comprises isopropyl alcohol, methanol, ethanol, butyl alcohol and/or distilled water, and has concentration of 35-80 mM.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The dissolved heat regenerable salt is selected from a group consisting of ammonium bicarbonate and ammonium hydroxide.
TECHNOLOGY FOCUS - METALLURGY - The electrically conductive structures comprises silicide film, aluminum film, titanium film, titanium-nitride stack, gold, tungsten.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The specific surface area of titanium dioxide nanotube is 280-340 m2/g.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic solvent is 1-5C alcohol, 3-6C ketone, 2-6C ether, and/or 6-30C arene (all optionally substituted), preferably methanol, ethanol, propanol, acetone, dimethyl ether, methyl ethylether, benzene and/or toluene. Preferred Method: The step (d) is carried out in organic solvent under reflux condition for 30-200 minutes, preferably for 30-150 minutes. The step (a) is carried out at 80-200 degrees C for 18-60 hours, preferably at 100-150 degrees C for 18-60 hours. The step (b) is carried out by adjusting electrical conductivity of the titanium dioxide nanotube particles to 60-80 mu s/cm. The step (c) is carried out at 110-150 degrees C. EXAMPLE - Titanium dioxide powder (anatase) was annealed in 10M sodium hydroxide solution at 110 degrees C for 20 hours to synthesize titanium dioxide nanotube particles and refluxed to maintain concentration of the solution. The synthesized particles were washed with ultra pure water for 48 hours, adjusted the electrical conductivity of the particles to 70 mu s/cm, and dried at 130 degrees C for 20 hours to obtain the titanium dioxide nanotube.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The alkyl iodide is 1-methyl iodide, 1-ethyl iodide, 1-propyliodide, 1-butyl iodide, 1-hexyl iodide, 1-octyl iodide, 1-decyl iodide and/or 1-dodecyl iodide. The alkylpyridine is 1-ethyl pyridinium iodide, 1-propyl pyridinium iodide, 1-butyl pyridinium iodide, 1-hexyl pyridinium iodide, 1-octyl pyridinium iodide, 1-decyl pyridinium iodide, 1-dodecyl pyridinium iodide, 1-ethyl 2-methyl pyridinium iodide, 1-ethyl 2-ethyl pyridinium iodide, 1-ethyl 2-propyl pyridinium iodide, 1-ethyl 2-butyl pyridinium iodide, 1-ethyl 2-hexyl pyridinium iodide, 1-ethyl 2-octyl pyridinium iodide, 1-ethyl 2-decyl pyridinium iodide, 1-ethyl 2-dodecyl pyridinium iodide, 1-ethyl 3-methyl pyridinium iodide, 1-ethyl 3-ethyl pyridinium iodide, 1-ethyl 3-propyl pyridinium iodide, 1-ethyl 3-butyl pyridinium iodide, 1-ethyl 3-hexyl pyridinium iodide, 1-ethyl 3-octyl pyridinium iodide, 1-ethyl 3-decyl pyridinium iodide, 1-ethyl 3-dodecyl pyridinium iodide, 1-ethyl 4-methyl pyridinium iodide, 1-ethyl 4-ethyl pyridinium iodide, 1-ethyl 4-propyl pyridinium iodide, 1-ethyl 4-butyl pyridinium iodide, 1-ethyl 4-hexyl pyridinium iodide, 1-ethyl 4-octyl pyridinium iodide, 1-ethyl 4-decyl pyridinium iodide and/or 1-ethyl 4-dodecyl pyridinium iodide. The alkylimidazole is of formula (III) or (IV). The non-polar solvent is n-butane, n-pentane, n-hexane, n-heptane, n-octane, n-nonane and/or n-decane. The ionic liquid is of formula (I) or (II).R1=linear or branched 1-12C alkyl;andR2-R11=H or linear or branched 1-12C alkyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Iron oxide (a) is iron(II) oxide, iron(III) oxide and/or iron(II,III) oxide. Silica formed by reduce iron oxide (a) is in amorphous phase.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The conductive polymer contains thiophene-type structural unit of formula (II), 2,3-dihydrothieno(3,4-b)(1,4)dioxine-type structural unit of formula (III) and/or thieno(3,4-b)(1,4)dioxine-type structural unit of formula (IV).R3,R4=aliphatic hydrocarbyl, aryl, aliphatic heterocyclyl, heteroaryl, alkoxy, aryloxy, alkylthio, arylthio (all optionally substituted), substituted amino, acyl, alkoxycarbonyl, aryloxycarbonyl, alkylsulfonyl, arylsulfonyl, H or halo.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The photovoltaic micro-inverter concentrator comprises WIFI, Ethernet interface and PLC interface.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The spacer is introduced into the fiber bundle before impregnating the resin in the fiber bundle. The solution containing spacer material is heated, to form a spacer by depositing resin (a) as a material of the spacer. Preferred Composition: The fiber contains carbon fiber. The resin contains thermoplastic resin, and polyolefin, preferably polypropylene. The resin (a) is naphthoxazine resin. Preferred Properties: The average particle diameter of the spacer is 0.2-1.5 times the average diameter of the fiber. The number of fiber contained in the fiber bundle is 3000 or more.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step (b) comprises establishing the molar ratio by adjusting at least one of a cathode material, a surface morphology of the cathode, pH level to 4-8, and flow rate of carbon dioxide. Preferred Components: The first and second components comprise carbon monoxide and hydrogen. The electrolyte comprises at least one of sodium sulfate, potassium chloride, sodium nitrate, sodium chloride, sodium fluoride, sodium perchlorate, potassium perchlorate, potassium metasilicate, calcium chloride, hydrogen cation, lithium cation, sodium cation, potassium cation, rubidium cation, cesium cation, calcium cation, ammonium cation, alkylammonium cation, fluorine anion, chlorine anion, bromine anion, iodine anion, astatine anion, alkyl amine, berates, carbonates, nitrites, nitrates, phosphates, polyphosphates, perchlorates, silicates, sulfates and tetraalkyl ammonium salt. A faradaic yield of hydrogen in the synthesis gas is at least 25%. The faradaic yield of carbon monoxide in the synthesis gas is at least 25%. The molar ratio comprises at least 1 mole of hydrogen/mole of carbon monoxide. The electrical potential is -0.7 to -1.5 volts.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The catalyst comprises one or more of adenine, amines containing sulfur, amines containing oxygen, azoles, benzimidazole, bipyridines, furan, imidazoles, imidazole related species with at least one five-member ring, indoles, methylimidazole, oxazoles, phenanthroline, pterin, pteridine, pyridines, pyridine related species with at least one six-member ring, pyrrole, quinoline and thiazoles. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The tin oxide is selected from a group consisting of indium tin oxide, fluorine dope tin oxide and antimony dope tin oxide.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: A number of adjacently arranged emitter metal contacts have many interruptions, which are arranged such that a straight line from an upper edge region of the substrate rear side can be pulled to a lower edge region of the substrate rear side by interruptions, to cross without uninterrupted regions of emitter metal contacts. A number of adjacently arranged base metal contacts have many interruptions, which are arranged such that a straight line from an upper edge region of the substrate rear side can be pulled to a lower edge region of the substrate rear side by interruptions, to cross without uninterrupted regions of base metal contacts. The interruptions are 40% shorter than a continuous length of adjacent areas of the emitter metal contacts or base metal contacts. The interruptions are shorter than 5 mm, preferably less than 2 mm. The emitter metal contacts have a widened contact region in areas adjacent to areas where adjacent base metal contacts have interruptions. At least partial regions of the enlarged contact portion of the surface of the substrate rear side are separated by an interposed electrically insulating layer. The metal wires are arranged transverse to the emitter regions and base portions. The first and second metal wires which are used for the interconnection of the solar cell can run through these interruptions to cross the emitter and base regions, without producing shorts. The metal wires have a cross-sectional area of less than 0.2 mm2. The interruptions in the base metal contacts and emitter metal contacts have a length which corresponds to 200-1000% of the width of the metal wires.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass frit further contains 0.1-10 wt.% tungsten oxide, 60-80 wt.% tellurium oxide, and metal oxide chosen from phosphorus pentoxide, silica, magnesium oxide, cerium oxide, strontium oxide, molybdenum trioxide, titania, tin oxide, indium oxide, vanadium(V) oxide, barium oxide, nickel oxide, cuprous oxide, cupric oxide, sodium oxide, potassium oxide, antimony trioxide, antimony tetroxide, antimony pentoxide, germanium oxide, gallium oxide, calcium oxide, arsenic oxide, cobalt(II) oxide, cobalt oxide (Co2O3), zirconium dioxide, manganese oxide, magnesium(III) oxide, magnesium(II,III) oxide, lead oxide and alumina. The composition contains 1-30 wt.% organic vehicle, 0.5-20 wt.% glass frit and 60-95 wt.% conductive powder, and further includes additive chosen from dispersing agent, thixotropic agent, plasticizer, viscosity stabilizer, antifoaming agent, pigment, UV stabilizer, antioxidant and coupling agent. Preferred Property: The glass frit has average particle diameter of 0.1-10 mu m.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The conductive powder is silver powder. Preferred Property: The conductive powder has average particle diameter of 0.1-10 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silica is prepared further using bentonite and water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Treated geothermal brine contains less then 50 (preferably less than 20, especially less than 10) mg/kg of lithium, less then 30 (preferably less than 20, especially less than 5) mg/kg of silica and less then 200 (preferably less than 100, especially less than 5) mg/kg of iron. Preferred Method: Treating geothermal brine involves injecting the brine into a geothermal reservoir. EXAMPLE - A simulated brine having 260 parts per million (ppm) of lithium, 63000 ppm sodium, 20100 ppm potassium, 33000 ppm calcium, 130 ppm strontium, 700 ppm zinc, 1700 ppm iron, 450 ppm boron, 54 ppm sulfate, 3 ppm fluoride, 450 ppm ammonium ion, 180 ppm barium, 160 ppm silica (measured as silicon dioxide), and 181000 ppm chloride was prepared. 1.6 ml of 0.1M solution of AlCl3 was added to a 60 ml of the simulated brine. Approximately 1.5 wt.% of solid amorphous aluminosilicate was added to the solution. The AlCl3 was slowly added to achieve a ratio of silica to aluminum of about 1:1. The solution was heated to approximately 95 degrees C and stirred constantly. The pH was monitored and adjusted to 5 by titrating with calcium hydroxide. The solution was allowed to stir for 10 minutes. Total silica removal for the process after 15 minutes of stirring was 95%, resulting in a brine solution having a silica content of 10 ppm and aluminum content 2-10 ppm.
TECHNOLOGY FOCUS - POLYMERS - The selected base material is Nitrile Rubber, Silicon Rubber and Polyurethane including high and ultra-high Molecular Weight Polyethylenes, Polyamides (Nylon) and PEEK type material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The concentration of silica is 0-50 mg/kg or less than 5 mg/kg (preferably less than 30 mg/kg). The iron concentration is 0-300 mg/kg or less than 10 mg/kg (preferably less than 300 mg/kg). The geothermal brine has a concentration of arsenic of 0-7 mg/kg or less than 7 mg/kg, barium of 0-200 mg/kg or less than 200 mg/kg and lead of 0-100 mg/kg or less than 100 mg/kg. The geothermal brine is a Salton Sea brine. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Process: Saw damage etching is carried out using etching solution containing deionized water, base material and organic solvent.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The base material includes 40-45 wt.% potassium hydroxide solution.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic solvent includes alcohol-based substance.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The light absorption layer contains aluminum in the indium gallium phosphorus compound, and indium in the gallium arsenide compound.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): Dihalogenated naphthalene compound is aminated to obtain binaphthyl diamine derivative (I). Preferred Compounds: Binaphthyl diamine derivative (I) is chosen from 26 compounds e.g. compound of formulae (II)-(VI). Preferred Layer: The organic layer includes hole injection layer, hole transport layer, light-emitting layer, hole blocking layer and/or electron transport layer. Preferred Definitions:    Ar1-Ar4=group chosen from 101 groups e.g. groups of formulae (i)-(v).
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The dyes are dyes having terminal groups, which can be fixed on titanium dioxide, preferably (2E)-2-cyano-3-(10-hexyl-10H-phenothiazin-3-yl)acrylic acid (M-Red), (E)-3-(10-(6-(3-((E)-2-Carboxy-2-cyano-vinyl)-phenothiazin-10-yl)-hexyl)-10H-phenothiazin-3-yl)-2-cyano-acrylic acid (D-Red) and (Z)-4-((5-carboxy-3,3-dimethyl-1-octyl-3H-indolium-2-yl)methylene)-2-((E)-(5-carboxy-3,3-dimethyl-1-octylindolin-2-ylidene)methyl)-3-oxocyclobut-1-enolate (S-blue). The mixing molar ratio of D-Red dye or M-Red dye and S-Blue dye is 1-3:1. The dye is a mixture of D-Red dye and S-Blue dye in a molar ratio of 1-3:1. The mixture of at least 2 different types of absorbing dyes can simultaneously have 2 different types of colors.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): The organic dye (I) is prepared by subjecting compound having electron acceptor group, compound having spacer group and compound having electron acceptor group to Suzuki-coupling reaction in an organic solvent. SPECIFIC COMPOUNDS - 51 Compounds (I) are specifically claimed e.g. (2E)-3-(4-(bis(4-(7-hexyl-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl)amino)phenyl)-2-cyanoprop-2-enoic acid of formula (IA), (2E)-3-(5-(4-(bis((4-(7-(2-ethylhexyl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl))amino)phenyl)-4-hexylthiophen-2-yl)-2-cyanoprop-2-enoic acid, (2E)-3-(5-(5-(4-(bis((4-(7-(2-ethylhexyl)-2H,3H-thieno(3,4-b)(1,4)dioxin-5-yl)phenyl))amino)phenyl)thiophen-2-yl)thiophen-2-yl)-2-cyanoprop-2-enoic acid, (2E)-3-(5-(4-(bis((4-(3,3-diethyl-8-(2-ethylhexyl)-2H,3H,4H-thieno(3,4-b)(1,4)dioxepin-6-yl)phenyl))amino)phenyl)thiophen-2-yl)-2-cyanoprop-2-enoic acid and (2E)-3-(8-(4-(bis(4-(7-octyl-2H,3H-thieno(3,4-b)(1,4)dithiin-5-yl)phenyl)amino)phenyl)-3,3-diethyl-2H,3H,4H-thieno(3,4-b)(1,4)dioxepin-6-yl)-2-cyanoprop-2-enoic acid.
TECHNOLOGY FOCUS - METALLURGY - The basal body is made of material using tungsten, molybdenum, tantalum, Nickel, platinum, niobium, rhenium, graphite or P-type semiconductor material.
TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The element substance is copper, sulfur, selenium and/or tellurium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The ordinarily metallic layer comprises titanium, germanium, tin and zinc. The platinum metal layer comprises ruthenium, rhodium, palladium, osmium, iridium and platinum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The protective film is comprised of amorphous silicon material.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Definitions:    B1 = carboxyl, aluminum nitride, sulfonic acid, phosphinic acid, hydroxyl, oxy acid, or amide acid.    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - Preferred Method: Pretreating with electrolyte using anodic oxidizing is carried out by impregnating in anodizing electrolyte solution, energizing first anodic oxidizing, ultrasonically treating with deionized water or alcohol at 50-70 degrees C for 2-20 minutes, second anodic oxidizing, ultrasonically treating with anodizing electrolyte solution, and heat treating. Anodic oxidizing is carried out with molybdenum electrode or calomel electrode at 15- 50 degrees C for 10-500 minutes at anode oxidation voltage of 5-50 V. Heat treating is carried out at rate of 1-3 degrees C/minute for 3 hours. Dipping is carried out by dipping treated substrate in deposition liquid for 5-20 hours, drying for 1-3 days and heat treating in muffle furnace at 100-600 degrees C, or pulling treated substrate in hydrophobic solvent glue, drying for 1-3 days and heat treating in muffle furnace at 100-600 degrees C at heating rate of 1-3 degrees C/minute. Preferred Components: Anodizing electrolyte solution is 0.1-5 wt.% hydrofluoric acid, 0.1-0.5 wt.% glacial acetic acid and deionized water as solvent. Deposition liquid is 0.01-2 wt.% heptadecafluorodecyl triisopropoxysilane, 0.001-1 wt.% hydrochloric acid and balance alcohol as solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nano electroconductivity material is nano carbon material or nano metal material, preferably carbon nanotubes, carbon nanofiber, graphite, graphene, carbon nano particles and/or metal nanowire, more preferably carbon nanotubes.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The nitrogen-containing repeating unit (I) is preferably of formula (II)-(V), preferably structure (V). Preferred Composition: The thermoelectric conversion layer contains dopant chosen from at least one of onium salt compound, oxidizing agent, acidic compound and electron-acceptor compound. The content of polymer and dopant in the thermoelectric conversion element is 0-100 parts mass and 60 parts mass or less, respectively. The onium salt compound is a compound which produces an acid by heat, or active energy ray irradiation. The thermoelectric conversion material further contains an organic solvent. Preferred Process: The thermoelectric conversion material is formed by dispersing nano electroconductivity material in an organic solvent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nano electroconductivity material is nano carbon material or nano metal material, preferably carbon nanotubes, carbon nanofiber, graphite, graphene, carbon nanoparticles and/or metal nanowire. Preferred Process: The electrodes (13) and (15) are formed with aluminum, gold, silver or copper.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The thermoelectric conversion element includes structure of formula (II) as repeating structure. The thermoelectric conversion layer contains 60 parts mass or less dopant chosen from onium salt compound, oxidizing agent, acidic compound and electron-acceptor compound, and thermal excitation assist agent. The onium salt compound is compound which generates an acid under heating or active energy ray irradiation. The thermoelectric conversion material contains organic solvent.R1a,R1b=aryl, heteroaryl, aliphatic heterocyclic, alkyl or alkoxy;X3=single bond, aryl, heteroaryl, -BR11-, -NR11-, or group of formula:-X4-CH=CH- (2A);andX4=X2.When m is 1, group (2A) is different group from phenylene vinylene structure (II).    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The thermoelectric conversion layer contains nonconjugated polymer chosen from polyvinyl type-polymer, poly (meth)acrylate, polycarbonate, polyester, polyamide, polyimide and polysiloxane, formed by polymerizing vinyl compound. The moisture content of thermoelectric conversion layer is 0.01-15 %mass. Preferred Process: The thermoelectric conversion material is formed by dispersing nano electroconductivity material in the organic solvent.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The content of glass frit is 0.5-20 weight%. The glass frit comprises glass frits with different transitions points, and has average particle diameter (D50) of 0.1-10 mu m.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The content of metal powder (a) and metal powder (b) is 60-95 weight% and 0.1-20 weight%, respectively. The metal powder (b) is chosen from indium, strontium, cerium, zinc, tellurium, tin, selenium, europium, lanthanum, antimony, lead, sodium, lithium, praseodymium, arsenic, aluminum, barium, calcium, germanium, gallium and bismuth, and has particle diameter of 0.1-10 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of organic vehicle is 1-30 weight%. The composition further includes additive chosen from dispersing agent, thixotropic agent, plasticizer, viscosity stabilizer, antifoaming agent, pigment, UV stabilizer, antioxidant and coupling agent.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Component: The solar cell further contains a grid electrode containing aluminum and/or nickel in contact with the buffer layer, an anti-reflective layer (c) containing aluminum oxide and an anti-reflective layer (d) containing magnesium fluoride at the upper portion of the light-absorption layer, an electrode (b) between substrate and buffer layer.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The buffer layer includes cadmium sulfide, cadmium-zinc sulfide, zinc sulfide, zinc selenide, zinc-indium sulfide, zinc-indium selenide, zinc magnesium oxide, zinc-tin oxide, zinc oxide, indium selenide, and/or indium oxide. The electrode (b) includes zinc oxide, gallium oxide, aluminum oxide, indium oxide, lead oxide, cupric oxide, titanium oxide, tin oxide, iron oxide and/or indium tin oxide. The light-absorption layer includes copper-indium selenide, copper-indium sulfide, copper-gallium sulfide, copper-gallium selenide, copper-indium-gallium selenide, copper-indium-gallium selenide, copper-indium-aluminum-gallium oxide and/or copper-indium-aluminum-gallium-selenium sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises: solidifying emulsion by mixing with 41-60 wt.% of water, polyacrylic emulsion of having pH of 6-8, viscosity of 1000-3000 cps and solids content of 31-50 wt.%, and 3-5 wt.% of surfactant having hydrophile lipophile balance of 8-15; polymerizing the mixture by adding 0.1-0.2 wt.% of ammonium persulfate and 1-1.5 wt.% of sodium bisulfite as additives; adding 8-10 wt.% of surfactant; stirring the mixture; cooling the polymerized reactant; and aging at high temperature of 60-80 degrees C. Preferred Components: The grouting material comprises 30-39 wt.% of water, 40-49 wt.% of bentonite or silica sand, and 20-29 wt.% of graphite.
SPECIFIC COMPOUNDS - 16 Ruthenium or osmium-based dyes e.g. 1,1,1-triisothiocyanato-10-(((5Z)-7-methylidene-2H,3H,5H,7H-thieno(3,4-b)(1,4)dioxin-5-ylidene)methyl)-2,18-diaza-19-aza-1-ruthenapentacyclo(10.6.1.02,7.08,19.013,18)nonadeca-2(7),3,5,8,10,12(19),13(18),14,16-nonaene-5,15-dicarboxylic acid of formula (IA), 1,1,1-triisothiocyanato-10-(((2Z)-5-methylidene-2,5-dihydrothiophen-2-ylidene)methyl)-2,18,19 -triaza-1-ruthenapentacyclo(10.6.1.02,7.08,19.013,18)nonadeca-2(7),3,5,8,10,12(19),13(18),14,16-nonaene-5,15-dicarboxylic acid, 1,1,1-triisothiocyanato-10-(((2Z)-5-methylidene-2H,5H-thieno(3,2-b)thiophen-2-ylidene)methyl)-2,18,19-triaza-1-ruthenapentacyclo(10.6.1.02,7.08,19.013,18)nonadeca-2(7),3,5,8,10,12(19),13(18),14,16-nonaene-5,15-dicarboxylic acid, 1-(4-carboxy-1 -pyridin-1-yl)-1,1-diisothiocyanato-10-(((5Z)-7-methylidene-2H,3H,5H,7H-thieno(3,4-b)(1,4)dioxin-5-ylidene)methyl)-2,18,19-triaza-1-ruthenapentacyclo(10.6.1.02,7.08,19.013,18)nonadeca-2(7),3,5,8,10,12(19),13(18),14,16-nonaene-5,15-dicarboxylic acid, and 1-(4-carboxy-1-pyridin-1-yl)-1,1-diisothiocyanato-10-(((2Z)-5-methylidene-2,5-dihydrothiophen-2-ylidene)methyl)-2,18,19-triaza-1-ruthenapentacyclo(10.6.1.02,7.08,19.013,18)nonadeca-2(7),3,5,8,10,12(19),13(18),14,16-nonaene-5,15-dicarboxylic acid are specifically claimed.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The material: is co-doped material; and has a thermoelectric figure of merit at 1050K of greater than 0.2 and a thermal conductivity of less than 6 W/m-K over a temperature of 400-1200K. The amount of lanthanum hexaboride is 0.25-10 wt.%. The raw materials comprise: elements and/or compounds; or oxides, borides or a reducing agent. The reducing agent comprises lanthanum boride, titanium carbide, titanium nitride, titanium oxide or titanium boride. Preferred Method: The combining step is done in air at a temperature of 900 degrees C, and comprises forming the mixture of raw materials into a pellet. The heating step is carried out at a temperature of 1200-1800 degrees C.
TECHNOLOGY FOCUS - POLYMERS - The plastic shell is made of a thermoplastic resin and/or a polylactide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: Output factor of thermoelectric material at room temperature is greater than or equal to 0.4x 10-3 W m-1 K-2. Ratio (I/I0) of strongest peak intensity (I) of heterogenous phase with respect to strongest peak intensity (I0) of compound (a) is less than or equal to 0.1. Preferred Processes: Raw material is mixed so that S/(Sb+M') ratio may be set to 3 plus minus 0.1. Manufacturing method of thermoelectric material involves performing mixing process of raw material so that (Cu+M)/(Sb+M') ratio and S/(Sb+M') ratio may become target value, performing sulfide preparation process by heat-melting mixture obtained by mixing process and solidifying, repeating mixing process and sulfide preparation for greater than or equal to 1 time, and sintering powder of sulfide obtained at repetition process. Preferred Definitions:    M=Ag;    M'=Ge;    x=0.01-0.09; and    y=0.05-0.15.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: A portion of titanium is replaced by element chosen from nickel, cobalt, molybdenum, vanadium, chromium and tungsten. The content of nickel, cobalt, molybdenum, vanadium, chromium and tungsten is 1 %mass or less, 1 %mass or less, 0.5 %mass or less, 0.5 %mass or less, 0.5 %mass or less and 0.5 %mass or less, respectively. The platinum group element is ruthenium. The rare-earth element is yttrium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The atomic ratio of barium/titanium is 0.97-1.05, preferably 0.99-1.05. The complex oxide has a specific surface area of greater than or equal to 6 m2/g, preferably greater than or equal to 20 m2/g and an average particle size of less than or equal to 150 nm, preferably less than or equal to 70 nm. The carbon dioxide adsorbent shows a 90% breakthrough point carbon dioxide adsorption capacity of greater than or equal to 2.7 wt.% at a temperature of 190-400 degrees C. The adsorption layer has a thickness of greater than or equal to 0.2 cm. Preferred Method: The method-I further comprises stopping the input gas stream to the carbon dioxide capture module, and heat-treating the carbon dioxide adsorbent at a temperature of 50-700 degrees C to desorb the carbon dioxide from the surface of the carbon dioxide adsorbent. The heat-treating step is performed at a temperature of 100-600 degrees C. The supplying step involves supplying the input gas stream comprising at least one of hydrogen, nitrogen, and methane. The contacting step occurs a temperature of 150-400 degrees C, preferably 100-450 degrees C.
TECHNOLOGY FOCUS - ENVIRONMENT - Preferred Method: The stream of wastewater comprises at least one of flue gas desulfurization purge water, cooling tower purge water, service water, power plant leachate, and power plant holding reservoir water. The stream of hot feed gases is heated with waste heat from within the thermoelectric power plant, comprise hot flue gases from a hydrocarbon-fired combustion heater. The direct contact evaporative section comprises venturi section. The gas-liquid separator comprises at least one of a cross flow gas-liquid separator and cyclonic gas-liquid separator operatively connected to the direct contact evaporative section.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The thickness of deposited graphene compound on fluorine doped tin oxide transparent electrode is 0.1-0.6 mu m. Preferred Composition: The graphene compound comprises 1-15 wt.% nitrogen element.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The method further involves sputtering molybdenum on electrode layer. The content of copper, indium, gallium and selenium is 25 atomic%, 18.7 atomic%, 6.3 atomic% and 50 atomic%, respectively.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The curing agent is diaminodiphenyl sulfone.
TECHNOLOGY FOCUS - MECHANICAL ENGINEERING - Preferred Components: The solar cell module unit has fitting portion which is provided in lower-frame material (in outdoor side of solar cell module), snow holding portion which is positioned lower (upper surface of the fitting portion), and rising piece which is provided in the outdoor side of the snow holding portion. The solar cell module unit has drain hole of melted snow, which is provided in root portion of the rising piece (in the lower frame material), and assistance frame material, which has the rising piece (positioned separately from the lower-frame material of the solar cell module) (the rising piece is set as structure which attaches the assistance frame material to the lower-frame material).
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Device: The wiring structure comprises cylinder, where the cylinder is fitted to the opening portion provided with the cover, and cable was filled with the sealing material between the cable and the cylinder.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The step (a) comprises heating the lithium precursor to a temperature of 600-1200 degrees C for 5-10 hours. The step (b) is carried out at a temperature of 200-500 degrees C for 10-45 days. The method comprises adding metallic catalyst. Preferred Components: The metal precursor is an organometallic compound comprising lithium, and tin. The metallic catalyst includes alkali metal elements, titanium, chromium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, cerium, potassium, and sodium. The ratio of the metal precursor, zinc precursor and zinc stannate is 1:7-9:5-7. The lithium precursor is lithium carbonate, lithium hydroxide, lithium oxide, lithium chloride, lithium acetate, lithium sulfate, lithium phosphate, or lithium nitrate. The tin precursor is tin oxide, tin hydroxide, tin chloride, tin acetate, tin sulfate, tin phosphate, or tin nitrate. The zinc precursor is zinc carbonate, zinc oxide, zinc hydroxide, zinc chloride, zinc acetate, zinc sulfate, zinc phosphate, or zinc nitrate. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic-metal halide satisfies the relations of formulae: AX (I) and MX2 (II), where A is monovalent organic ammonium ion or cesium ion, X is halogen ion, and M is divalent metal ion. The ratio of mole number of organic halide with respect to mole number of metal halide contained in the light absorption material solution is 1-1.25.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Titanium pigment is rutile-type titanium dioxide. Nano material is dispersed titanium dioxide powder and/or nano silicon dioxide powder. Preferred Parameters: Particle size of talcum powder is 800-2000 meshes. Particle size of nano material is less than or equal to 100 nm.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Component B has less than or equal to 5 wt.% organic catalyst e.g. dibutyl tin laurate, dibutyltin diacetate, organic titanate, lead octanoate, naphthenic bismuth, manganese octoate, vanadium acetyl acetonate, stannous chloride, zinc naphthenate, and/or mercury acetate. Organic solvent is aromatic hydrocarbon, alcohol, ether, ester, ether alcohols, and/or ketone. Aminosilane is of formula Y'-Si-(O-X)3.X=1-6C alkyl, hydroxyalkyl, alkoxyalkyl, or hydroxyalkoxy;Y'=H(HNR)a where a is 1-6; andR=aryl, alkyl, dialkyl aryl, alkoxyalkyl, or cycloalkyl.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Epoxy resin is aromatic epoxy resin and/or non-aromatic epoxy resin. Silicone resin is alkoxy-containing silicone resin and/or silanol silicone resin. Additive contains dispersant, leveling agent, anti-settling agent, UV stabilizer, wetting agent, thixotropic agent, plasticizer, and/or defoamer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The composition ratio of lanthanum is same as that of a lanthanum antimony compound. Preferred Method: The quenching step is carried out by soaking the mixture in water and cooling at a temperature of 900-1200 degrees C for 10-15 hours. The plasma sintering process is carried out at a pressure of 30-300 mega Pascal and temperature of 300-600 degrees C for 5 minutes to 3 hours.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Property: The solar cell has power generation efficiency of 18% or more when allowed to stand for 100 hours at 25 degrees C with relative humidity of 55%. Preferred Composition: The electron transport layer is a porous metal oxide layer filled with light absorbing component.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The organic-metal halide solid solution comprises organic-metal halide of formulae: AMX3 (I), A'M'X'3 (II), and A"M"(X"(1-m)X'"(m))3 (III), where organic metal halide is bromide or iodide.A,A',A"=monovalent organic ammonium ion, ammonium ion or monovalent cesium ion;M,M',M"=divalent metal ion;X=Br;X'=Al or Cl;X"=I or Cl;m=0-0.3;andX'"=Br.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The radiation is irradiated in high-dose or low-dose. The irradiation dose of low-dose is 1-1000 Gy, and the irradiation dose of high-dose is 1-100 Gy. The raw material of dye is yellow. Preferred Components: The raw material of dye is chosen from ruthenium system dye, ruthenium-free dye and natural dye. The ruthenium system dye is chosen from N719, N712, Z907, Z910, N3, K19 and black dye. The radiation is chosen from ( gamma )-ray, X-ray, electron beam and ion beam. Preferred State: The raw material of dye is in solution-state or solid-state.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Components: The bottom plate is thermally separated from the heat exchange member. The bottom plate is joined to the heat exchange member through the side wall and a sealing member having heat insulation properties. The thermoelectric power generation unit further comprises a spacer made of a thermal conductor and laminated with the thermoelectric power generation module, where the spacer is provided in the space. The thermoelectric power generation unit further comprises a spacer made of a thermal conductor and laminated with the thermoelectric power generation module, where a portion of the spacer protrudes from the bottom plate to provide outside the space. The thermoelectric power generation module is disposed at the center of the bottom plate, the circuit board has substantially the same external dimensions as the bottom plate, and a cutout is provided in the circuit board, the thermoelectric power generation module is disposed in the cutout.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Pipe: In the drill pipe tool joint or the drill pipe, the surface layers consisting respectively of a hard metal and of a soft material occupy at least 90% of the contacting zone surfaces. The male threaded contacting surface or the female threaded contacting surface is a surface layer consisting of a hard metal and respectively the female threaded contacting surface or the male threaded contacting surface is a surface layer consisting of a soft material. The hardness of the hard metal is equal or greater than 600 Hv, for example greater than or equal to 800 Hv. The hardness of the soft material is equal or lower than 350 Hv, for example greater than or equal to 150 Hv. The hardness ratio of the hard metal to the soft material is greater than or equal to 2.8, for example greater than or equal to 5. The hard metal substantially consists of a metal chosen within the list consisting of chromium (Cr), nickel (Ni), or their mixture. The layer of hard metal is obtained through a plating process. The thickness of the layer of hard metal is comprised between 5-100 mu m, for example greater than or equal to 10 mu m, for example less than or equal to 50 mu m. The soft material consists of a metal chosen within the list consisting of copper (Cu), zinc, (Zn), or their mixture. The layer of soft material is obtained through a plating process. The soft material substantially consists of a phosphate layer. The thickness of the layer of soft material is comprised between 5-100 mu m, for example greater than or equal to 10 mu m, for example less than or equal to 50 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The composition further comprises 1-3 wt.% carbon and/or 1-3 wt.% silicon. Preferred Method: The alloy powder is coated on base material by gas-type flame spraying, gas type detonation-gun spraying, high velocity oxygen fuel spraying, electric arc spraying and plasma spraying by mixing with a solvent to produce amorphous or crystalline coating layer. The top surface of molten steel is covered with boron oxide to prevent the oxidation of molten steel. The method further comprises adding carbon and/or silicon while melting. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The constriction element is made of nickel, where a non-unidirectional shape memory alloy is made of nitinol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The total content of silicon dioxide, aluminum oxide, zinc oxide and bismuth oxide is 50-70 wt.%, and the total content of tellurium oxide and lead oxide is 30-50 wt.%. The glass frit comprises 35-45 wt.% lead oxide, 15-25 wt.% tellurium oxide, 10-20 wt.% silicon dioxide, 5-15 wt.% aluminum oxide, 5-10 wt.% zinc oxide, and 5-15 wt.% bismuth oxide. The content of glass frit is 0.1-10 wt.% with respect to 100 wt.% silver paste composition. The glass frit further contains 0-10 wt.% boron trioxide, lithium oxide, sodium oxide and/or zirconium oxide. Preferred Property: The tap density of the silver powder is 4.5-5.5 g/cm3.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Definitions:    X1a = single bond, S or O;    n = 0;    R1a = -CH2-CH2-O-CH2-CH2-O-CH2-CH2-O-;    R2a = CH3;    L1a-L3a = phenylene, naphthalendiyl, 9H-fluoren-9,9-diyl, or (hetero)aryl moieties of formulae (a1)-(a25) (all optionally substituted by vinyl, polyvinyl or acetyl);    Ar1a, Ar2a = hydrogen bonding acid groups i.e. -COOH, or -CH=C(CN)(COOH), 3-carboxymethyl-4-oxo-2-thioxo-thiazolidin-(5E)-ylidenemethyl, or 3-carboxy-5-oxo-1-phenyl-1,5-dihydro-pyrazol-(4Z)-ylidenemethyl;    R3b = 1-20C alkyl (optionally substituted); and    m = 1-3.    SPECIFIC COMPOUNDS - 2 Compounds (I) are specifically claimed i.e. (Z)-3-(5-(7-(5-((Z)-2-carboxy-2-cyano-vinyl)-thiophen-2-yl)-10-(4-(2-(2-(2-methoxy-ethoxy)-ethoxy)-ethoxy)-phenyl)-10H-phenothiazin-3-yl)-thiophen-2-yl)-2-cyano-acrylic acid, and (Z)-3-(7-(7-(7-((Z)-2-Carboxy-2-cyano-vinyl)-2,3-dihydro-thieno(3,4-b)(1,4)dioxin-5-yl)-10-(4-(2-(2-(2-methoxy-ethoxy)-ethoxy)-ethoxy)-phenyl)-10H-phenothiazin-3-yl)-2,3-dihydro-thieno(3,4-b)(1,4)dioxin-5-yl)-2-cyano-acrylic acid.    EXAMPLE - 0.4 g 5,5'-(10-(4-(2-(2-(2-Methoxyethoxy)ethoxy)ethoxy)phenyl)-10H-phenothiazine-3,7-diyl)dithiophene-2-carbaldehyde, 0.34 g 2-cyanoacrylic acid and piperidine were dissolved in 20 ml acetonitrile and refluxed for 6 hours. The resultant solid was filtered and worked up to obtain 0.45 g of (Z)-3-(5-(7-(5-((Z)-2-carboxy-2-cyano-vinyl)-thiophen-2-yl)-10-(4-(2-(2-(2-methoxy-ethoxy)-ethoxy)-ethoxy)-phenyl)-10H-phenothiazin-3-yl)-thiophen-2-yl)-2-cyano-acrylic acid (yield 88.5%).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The silicon nitride, oxidation silicon nitride, aluminum oxide, aluminum nitride, titanium nitride, silicon carbide, and titanium carbide are contained as a main component and forms multilayer films.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The elemental silver originates from silver cyanide or silver nitrate. The composition comprises 60-95 wt.% silver powder, 0.1-20 wt.% glass frit, and 1-30 wt.% organic vehicle. The composition comprises 0.9-45 mol% glass frit with respect to total amount of elemental silver. The composition comprises metal oxide chosen from oxides of lead, bismuth, tellurium, phosphorus, germanium, gallium, cerium, iron, lithium, silicon, zinc, tungsten, magnesium, cesium, strontium, molybdenum, titanium, tin, indium, vanadium, barium, nickel, copper, sodium, potassium, arsenic, cobalt, zirconium, manganese and aluminum. The composition further contains additive chosen from dispersing agent, thixotropic agent, plasticizer, viscosity stabilizer, antifoaming agent, pigment, ultraviolet stabilizer, antioxidant and coupling agent. Preferred Properties: The average particle diameter (D50) of the glass frit is 0.1-10 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method comprises coating aluminum paste composition in predetermined portion of a bar shaped substrate, and then coating silver paste composition in the bar shaped substrate. Preferred Components: The silver paste composition contains silver powder. The glass frit is bismuth oxide, aluminum oxide, boron trioxide, silicon dioxide, strontium oxide and zinc oxide. The glass frit has a softening point of 400-600 degrees C. The amount of glass frit is 0.01-10 wt.%, preferably 0.01-5 wt.%. The silver paste composition is applied to a width of 0.3-0.7 mm. The aluminum paste composition contains aluminum powder. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The tunnel junction layer comprises silicon oxide and amorphous silicon. The antireflection film further comprises silicon nitride and transparent conducting oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The concentration of zinc is 0-300 mg/kg, less than 100 mg/kg, less than 50 mg/kg, less than 30 mg/kg, less than 20 mg/kg, less than 10 mg/kg, or less than 5 mg/kg. The concentration of silica is 0-30 mg/kg, less than 30 mg/kg, less than 20 mg/kg, less than 10 mg/kg, or less than 5 mg/kg. The concentration of iron is 0-300 mg/kg, less than 300 mg/kg, less than 200 mg/kg, less than 100 mg/kg, less than 50 mg/kg, less than 10 mg/kg, or less than 5 mg/kg. The treated geothermal brine is a salton sea brine. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The treated geothermal brine is Salton Sea geothermal brine.    TECHNOLOGY FOCUS - METALLURGY - Preferred Components: The composition further comprises 30-200 mg/kg rubidium.
TECHNOLOGY FOCUS - METALLURGY - The low resistance metal layer is formed from single metal material or the alloy material selected the groups consisting of nickel (Ni), silicide formed by bond with the silicone, silver (Ag), gold (Au), aluminum (Al), cobalt (Co) and titanium (Ti) and/or tin (Sn). The first electrodes comprise conductive particle selected from silver (Ag), and the alloy of the aluminum (Al) and silver.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The sulfur compounds comprises hydrogen sulfide or sulfur dioxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Processes: Substrate and solid silicon are positioned in parallel in reactive gas atmosphere containing hydrogen, temperature of substrate and solid silicon are maintained, silicon is deposited on substrate by making discharge occur between substrate and solid silicon, and silicon particle is formed on substrate. Silicon particle is formed by forming 1st conductivity-type silicon particle, forming 2nd conductivity-type silicon film on 1st conductivity-type silicon particle formed on substrate by chemical transport, and bonding silicon particles. Preferred Components: Substrate is quartz substrate or glass substrate. Substrate is silicon substrate by which surface is coated with silicon oxide film. Target is solid silicon. Reactive gas is reactive gas containing hydrogen.
TECHNOLOGY FOCUS - METALLURGY - The metal particle layer is provided with metal particles containing gold, silver and copper.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The nozzle discharges the liquid with respect to the front-end portion towards the region in substantially parallel linear shape on the to-be-cleaned surface. The nozzle discharges the liquid towards circular shaped region on the to-be-cleaned surface. The nozzle discharges the liquid towards the front-end portion from the diagonal direction with respect to the blade. Along stretching direction of the front-end portion, the edge portions of some blade pieces are connected to the blade. The hole of the nozzle is positioned in the position which does not overlap with connector joint of the blade piece, when seen from a direction perpendicular to the reference plane.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of organic vehicle, glass frit and silver powder is 1-30 wt.%, 0.1-20 wt.% and 60-95 wt.%, respectively. The ratio of glass frit (a) and glass frit (b) is 1:2-1:3. The content of lead oxide in glass frit (a) is 50-90 wt.%. The ratio of vanadium pentoxide and tellurium oxide is 1:2-1:3. Preferred Property: The average particle diameter of glass frit (a) and glass frit (b) is 0.1-10 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The composition further contains additive chosen from dispersing agent, thixotropic agent, plasticizer, viscosity stabilizer, antifoaming agent, pigment, ultra violet stabilizer, antioxidant and coupling agent.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The quantum dot is capped with organic oxide. The organic oxide is trioctylphosphine oxide. The quantum dot comprises cadmium sulfide, cadmium selenide, zinc selenide, lead selenide, indium phosphate, lead phosphate, zinc sulfide, cadmium telluride, and gallium arsenide. Preferred Method: The method further comprises adding hydrochloric acid and sodium nitrate in the compound and then reacting, mixing 4-aminothiol phenol in the mixture after the step of forming the compound, and applying voltage to the mixture using positive and negative electrodes, where the applying step comprises connecting compound containing solution in a positive terminal of the electrode and connecting the graphene containing solution in a negative terminal of the electrode. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The back electrode is made of molybdenum and sodium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The semiconductor layers comprise the crystalline silicon. The quantum dots of shell comprise cadmium selenide, indium phosphide, copper-indium sulfide, lead sulfide and cadmium telluride, preferably cadmium selenide. The core comprises zinc sulfide, zinc selenide and cadmium selenide, preferably zinc sulfide. Preferred Properties: The size of core is 0.1-6 nm, and size of shell is 8-20 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preparation: No preparation method is given. Preferred Components: (I) has monoclinic crystalline structure, conductivity of greater than or equal to 10 siemens/cm at 300K, lattice thermal conductivity of less than or equal to 0.5 W/mK at 300K, thermal conductivity of less than or equal to 1 W/mK at 300K, Seebeck coefficient absolute value of greater than or equal to 100 mu V/K at 300K, belongs to C2/m space group, and is monocrystalline or polycrystalline compound. The thermoelectric material is bulk thermoelectric material, and is sinter or powder. Preferred Definitions:    x = greater than 1.5 and less than 2;    y-a = greater than 4.5 and less than 5;    z-b = greater than 7.5 and less than 8.5;    b = 0-less than 8.5;    M = Sc, Y, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd or Hg;    A = Al, Si, P, Ga, Ge, As, In, Sn, Sb, Tl or Pb; and    B' = S, Cl, Br, Te, I, Po or At.    Provided that: When M is Cu or Ag, A = Sb or Sn and B' is Te or S, then a and b are 0.    EXAMPLE - Copper, bismuth and selenium are weighed according to molar ratio of 1.7:4.7:8, sealed in a quartz tube of 12 mm diameter under vacuum degree of 10-3 torr, melted at 1100 degrees C, maintained for 10 hours and quenched. The obtained polycrystalline raw material ingot was crushed to powder of less than or equal to 45 mu m and subjected to spark plasma sintering at 480 degrees C for 5 minutes under vacuum degree of 70 MPa and current of 500 A to obtain copper bismuth selenide bulk phase thermoelectric material of formula (Cu1.7Bi4.7Se8).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The transparent electrode is made of zinc oxide i.e. gallium doped zinc oxide, and the second electrode is doped with gallium, where the zinc oxide is reacted with water or oxygen at 250-600 degrees C or 100-400 degrees C.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The gallium doped with zinc oxide is trimethylgallium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of transition metal oxide precursor is 5-50 wt.%. The weight ratio of the binder and organic solvent is 1:5-1:20. The transition metal oxide precursor is precursor of transition metal oxide chosen from titanium oxide, indium oxide, zinc oxide, tin oxide, tungsten oxide, lead oxide, niobium oxide, iron-titanium oxide, manganese-titanium oxide and barium-titanium oxide. The paste composition has viscosity of 500-30000 cps.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The fluorescent substance is chosen from ytterbium and erbium-doped yttrium(III) fluoride, ytterbium and erbium-doped sodium yttrium(III) fluoride, ytterbium and erbium-doped sodium lanthanum fluoride, ytterbium and erbium-doped lanthanum fluoride, and ytterbium and erbium-doped barium yttrium fluoride.
TECHNOLOGY FOCUS - ENVIRONMENT - Preferred Method: The desalination method further comprises providing geothermal heat, and driving an electricity generating turbine using the hydrogen generated. The voltage is less than or equal to 1 V. The method-I further comprises: applying the generated electricity as an energy source to the solution; turning a turbine to generate electricity using one or more gases that are generated at the solution; combusting the hydrogen and oxygen to generate heat and water; and transporting the heat and water to be added to the solution. The method-II further comprises regenerating the catalyst by providing an amount of light.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The solution comprises water containing salt, preferably sea water. The hydrogen producing catalyst comprises aluminum, silver, and copper. The oxygen is generated by the hydrogen producing catalyst. In the method-I, the solution is a non-acidic solution having a pH value of greater than or equal to 7. The gases comprise hydrogen and/or oxygen. The hydrogen generating catalyst comprises aluminum hydroxide, copper hydroxide and/or silver hydroxide.    TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The system further comprises a light source. The light source comprises LED, and provides lights having wavelengths approximately in the visible light region. The geothermal heating device receives a geothermal heat from the earth. The system further comprises a computer automating a transportation of the non-acidic solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The acid solvent is hydrochloric acid, sulfuric acid and/or nitric acid. The conductive substrate is indium tin oxide or silicon wafer. Preferred Process: The conductive substrate is carried out using mixture of hydrochloric acid and hydrogen peroxide, or mixture of ammonium hydroxide, hydrogen peroxide and ammonia, such that hydroxyl group or amine functional group is formed on surface.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent (S1) is water, alcohol, acetone, dimethyl sulfoxide, dimethylformamide, benzene, toluene, xylene, pyridine or tetrahydrofuran. The condensing agent is dicyclohexylcarbodiimide. Metallic board used in solar cell containing the short carbon nanotube electrode chemically bound to conductive substrate as electrode is titanium or stainless steel.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The glass further comprises 0-20 %mass magnesium oxide, 0-20 %mass calcium oxide, 0-20 %mass strontium oxide, 0-20 %mass zinc oxide, 0-20 %mass sodium oxide, 0-20 %mass potassium oxide, 0-10 %mass titania and 0-5 %mass of cesium oxide, neodymium oxide, praseodymium oxide, europium oxide, terbium oxide, erbium oxide, yttrium oxide and ytterbium oxide. The total content of silica, boron oxide and aluminum oxide is 30-80 %mass. The total content of magnesium oxide, calcium oxide, strontium oxide and barium oxide is 20 %mass or less. The total content of lithium oxide, sodium oxide and potassium oxide is 20 %mass or less. The glass does not contain lead component, arsenic component and fluorine component. Preferred Properties: The glass has average linear thermal expansion coefficient at 30-300 degrees C of 120x 10-7/ degrees C or less, temperature at viscosity of 102 Pa.second of 1300 degrees C or less, softening point of 750 degrees C or less, and internal transmittance at wavelength of 400 nm of 90% or more.
TECHNOLOGY FOCUS - METALLURGY - Electroless-plating layer is a metal layer made of nickel.
TECHNOLOGY FOCUS - METALLURGY - The portion of first wiring material contains copper.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Component: Quenching medium is water.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The steel sheet comprises 0.07-0.08 mass% of carbon, 0.25-0.3 mass% of silicon, 1.30-1.35 mass% of manganese, 0.021-0.030 mass% of niobium, 0.030-0.040 mass% of aluminum and 0.0008-0.0030 wt.% of calcium. The manganese and silicon have a ratio of 4.5-5. The carbon is present in an amount of 0.32 mass%. Preferred Method: The heating step is carried out at a speed of 8-10 minutes/cm. The cooling step is carried out at a temperature of 10-15 degrees C for greater than 48 hours.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The first composition and/or the second composition further comprise at least one component selected from glasses.    TECHNOLOGY FOCUS - ELECTRONICS - The silicon substrate is a photovoltaic cell.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The particles of the first composition comprise (i) B and/or Al or (ii) P and/or Sb; and/or where the particles of the second composition comprise an electrically conductive metal, preferably Al. The first composition and/or the second composition further comprise at least one component selected from solvents, dispersing agents, additives, rheology adjusting agents, fillers.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electrode composition further contains nickel particles. The connection material further contains hardening agent, electroconductive particles and film formation material. Preferred Process: During manufacture of solar cell, the heat processing process is carried out at 450-900 degrees C.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal tape comprises a metal such as copper, aluminium, soft steel and/or zinc.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ratio of sum total of 1-chloro-2,3,3,3-tetrafluoropropene and 1,1-dichloro-2,3,3,3-tetrafluoropropene is 60 %mass or more with respect to 100 %mass of working medium. The working medium further contains 40 %mass or less of compound chosen from chlorofluoro olefin, hydrocarbon, hydrofluoro carbon, and hydrofluoro olefin free of chlorine atom, with respect to 100 %mass of working medium.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - The elongate strip may be formed of ceramic.    TECHNOLOGY FOCUS - METALLURGY - The elongate strip is formed of metal matrix composite or metal such as copper, titanium or its alloys, and stainless steel.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The sensors transmits the measuring parameters or data or signals to an electronic evaluation system over IEEE 802, IEEE 488, LIN bus, Ethernet bus, Profibus, USB bus, CAN bus, IEEE 802.11, Bluetooth, GSM or UMTS wireless network.
TECHNOLOGY FOCUS - BIOLOGY - Preferred Components: The biomass material include wood, bamboo, rice hull, furfural residue, vinasse, vinegar residue, bagasse or residue. The biomass material is granular having grain diameter of less than or equal to 10 mm. The biomass material is sheet-shaped having thickness of less than or equal to 10 and length and width of less than or equal to 50 mm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The fluorescent substance comprises yttrium compound of formula ((Y,Tb)3Al5O12:Ce3+), a strontium compound of formula ((Sr,Ba,Ca)2Si5N8:Eu2+), an aluminum compound of formula (CaAlSiN3:Eu2+), a barium compound of formula (BaMgAl10O17:Eu2+), a magnesium compound of formula (BaMgAl10O17:Eu2+, Mn2+), a silicon compound of formula (Ca- alpha -SiAlON:Eu2+), a barium compound of formula ((Ca,Sr,Ba)2P2O7:Eu2+), a strontium compound of formula ((Ca,Sr,Ba)2P2O7:Eu2+,Mn2+), barium compound of formula ((Ca,Sr,Ba)5(PO4)3Cl:Eu2+), lutetium compound of formula (Lu2SiO5:Ce3+), barium compound of formula ((Ca,Sr,Ba)3SiO5:Eu2+), strontium compound of formula ((Ca,Sr,Ba)2SiO4:Eu2+), zinc compound of formula (Zn2SiO4:Mn2+), aluminum compound of formula (BaAl12O19:Mn2+), magnesium compound of formula (BaMgAl14O23:Mn2+), aluminum compound of formula (SrAl12O19:Mn2+), aluminum compound of formula (CaAl12O19:Mn2+), yttrium compound of formula (YBO3:Tb3+), LuBO3:Tb3+, yttrium compound of formula Y2O3:Eu3+, yttrium compound of formula Y2SiO5:Eu3+, aluminum compound of formula Y3Al5O12:Eu3+, yttrium compound of formula YBO3:Eu3+, yttrium compound of formula Y(0.65)Gd(0.35)BO3:Eu3+, gadolinium compound of formula BO3:Eu3+, and yttrium compound of formula YVO4:Eu3+.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: An amount of lead-free glass frit present in the composition is 0.1-10 wt.% or 0.01-10 wt.%. The lead-free glass frit comprises 20-40 wt.% of Bi2O3, 5-20 wt.% of aluminum oxide, 10-35 wt.% of boron trioxide, 10-20 wt.% of silicon dioxide, and 0.1-10 wt.% of Nb2O5. An amount of aluminum powder is 60-78 wt.%.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The organic mixture is present in an amount of 20-35%, and comprises 1-25 wt.% of polymer resin and 75-99 wt.% of organic solvent.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Composition: The apparatus is further equipped with the pipe (S) which can be opened and closed, and connects the pipes (6, 8), and a biogas generation unit. The heat generated from the biogas generation unit is used in the heating unit.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The gas which does not include an acid-gas component is air or nitrogen gas.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The methane concentration of biogas is raised to 98% or more. The physical-absorption liquid is polyalkyl glycol ether or its derivatives. The chemical-absorption liquid is amine. Preferred Process: The manufacturing process further involves performing absorption liquid regeneration process (A) of removing the component absorbed from biogas from the physical-absorption liquid, performing absorption liquid regeneration process (B) of removing the component absorbed from biogas from the chemical-absorption liquid, and recycling the physical-absorption liquid and the chemical-absorption liquid which are regenerated in the absorption liquid regeneration process (A) and absorption liquid regeneration process (B) in the concentration process. The absorption liquid regeneration process (B) is performed by sending gas which does not include an acid-gas component in the chemical-absorption liquid. The chemical-absorption liquid is heated using the heat generated when generating biogas as a heat source in the process (B).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The slurry mixture comprises 90 pts. wt., preferably 95 pts. wt. of the mixture of raw materials. Preferred Components: The rheology controlling agent is a natural or modified clay i.e. bentonite. The slag of blast furnace has a fineness of 2500-5000 Blaine, preferably 3500-4500 Blaine. The mixture further comprises 2.5-5 pts. wt. of activating agent. The slurry has a thermal conductivity of greater than or equal to 2 W/m.K, and a compressive strength of 1-3 MPa in the cured state. Preferred Process: The method further comprises activating the slag of the blast furnace. EXAMPLE - Typical composition comprised of: 510 1/m3 of water; 100 kg/m3 of channel evolution model type-III water-hardenable cement; and 1200 kg/m3 of silica.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The electrical distribution network includes a maximum voltage held below allowable limits defined by a EN50160 standard.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Arrangement: The solar cell further contains catalytic particles layer comprising metallic catalyst, and conductive compound layer containing conductive compounds chosen from zinc oxide, aluminum oxide, indium-tin oxide, graphene and carbon nanotube.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nanowire growth layer includes gold, platinum, silver and palladium. The back electrode layer comprises molybdenum, tungsten, nickel and/or copper. Preferred Properties: The diameter and length of n-type and p-type nanowire compound is 1-100 nm and 1-20 mu m, respectively.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The additional layer is formed in between the layer of the multilayer tube or the multilayer tube molding. The additional layer is an adhesive layer, a diffusion barrier layer, a protective layer, a reinforcing layer, a leveling layer or a heat conducting layer. The first and second polymeric materials form a lumen (2) and the first layer of the multilayer tube or the multilayer tube molding. An outer layer (3) is formed on the multilayer tube or the multilayer tube molding. At least one of the first and second layers and outer layer is modified.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The first polymeric material and/or the second polymeric material is a polyethylene.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The counter electrode is formed by carbon nano-material including gold, platinum, nickel, copper or iron. The lower substrate is lower transparent substrate and a conductive transparent electrode is provided on the inner surface of the lower transparent substrate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The carbon nano-material comprises carbon nanotube, carbon fiber, graphene, carbon black or graphite. The functional groups are derivatives of 2-ureido-4(1H) pyrimidinone, 2-ureido-4(1H) pyrimidinol, 2-ureido-4-pyrimidone, diacylpyrimidine, ureidoacylpyrimidine, acetylaminotriazine, ureidotriazine, 2,6-di(acetylamino)-4-pyridyl, thymine, 2-aminobenzimidazole, 2,7-diamino-1, 8-naphthyridine, di(hexanoylamino) pyrimidine and/or 2-butylureido-4-acetylaminopyridine. The carbon nano-material is formed in paste form.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The primary i-type semiconductor layer is made of amorphous silicon and secondary i-type semiconductor layer is made of microcrystalline silicon, where microcrystalline silicon germanium material, the amorphous silicon germanium or the microcrystalline silicon material are also included in manufacturing i-type semiconductor layers.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The fluorescent substance contained in the fluorescent material layer is inorganic phosphor which absorbs light at wavelength of 350-1000 nm and emits light at wavelength of 500-800 nm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The paste composition further comprises less than 3 pts. wt. conductive metal powder containing germanium, gallium, boron, nickel, tin, bismuth, lithium, indium, cadmium, phosphorus and/or zinc.
TECHNOLOGY FOCUS - METALLURGY - The tile is made of aluminum.
TECHNOLOGY FOCUS - METALLURGY - Preferred Conditions: Smelting process blowing temperature is 1520-1540 degrees C and oxygen pressure is 0.5-0.55 MPa. Preferred Composition: Lime amount is 1.8-2 wt.%.
TECHNOLOGY FOCUS - METALLURGY - Preferred Compositions: Carburant is graphite carburant containing less than or equal to 0.05 mass% sulfur. Preferred Parameters: Pretreatment agent has particle size of 2-6 mm.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The main control computer is connected to a scene of communication data bus through a RS485 interface.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of copper oxide and iron oxide is 4 %mass or more. The molar ratio of barium oxide and zinc oxide is 0.01-2. The molar ratio of bismuth oxide and boron oxide is 1.6 or more. The molar ratio of bismuth oxide and zinc oxide is 1.55 or more. The content of barium oxide is 0.1 %mass or more. The content of copper oxide and iron oxide is %mass or more. The ratio of bismuth oxide and boron oxide is 1.5 or less. The ratio of barium oxide and zinc oxide is 0.7 or more. The sealing material comprises 55-100 vol.% glass powder and 0-45 vol.% fire-resistant filler powder. The fire-resistant filler powder is chosen from cordierite, willemite, alumina, zirconium phosphate, zirconium, zirconia, and tin oxide. The sealing material does not contain lead oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The extreme pressure friction and abrasion-reducing product is molybdenum disulfide.    TECHNOLOGY FOCUS - POLYMERS - The extreme pressure friction and abrasion-reducing product is epoxy resin coating.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The metal precursor is made of copper sulfide and zinc sulfide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The metal oxide is zinc oxide. The metal layer comprises zinc. The shape of the metal layer is concavo-convex shape. The reducing agent is carbon or hydrogen. Preferred Method: The front electrode layer is integrated with the metal layer to form the solar cell. The thickness of the metal layer is 1-10 nm. The heating is carried out at 250 degrees C. The metal layer containing zinc is formed by reducing zinc oxide of the front electrode with carbon monoxide, carbon or hydrogen.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The diameter or width of contact patterning is 10-150 mu m.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Component: The dye-sensitized solar cell comprises an oxide semiconductor absorption layer containing titanium oxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The tin-based plating solution has a weight ratio of Sn and X is 1:10-10:1, and includes tin-indium or tin-copper. The electrodes are silver-based front electrode or aluminum-based rear electrode, and have a surface resistance of less than 8.6 m Omega /sq. Preferred Method: The method comprises coating the tin-based plating solution to the solar cell, and pre-treating the solar cell for removing contaminants from the solar cell. The pretreating step includes organic solvent degreasing, alkali degreasing and acid degreasing.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The example of wireless LAN is Wi-Fi and USB port for RS232/RS485Wandler.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The bond comprises refractory intermetallic compounds including triindium dinickel (In3Ni2), tritin dinickel (Sn3Ni2) and/or indium tin nickel (InxSn(1-x))3Ni2 intermetallic phases.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electrolytic capacitor contains separator holding the electrolyte solution positioned between the anode containing valve metal foil which equipped the surface with the oxide film, the cathode containing valve metal foil, and an anode and a cathode.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of 1,6-decane di-carboxylic acid is 6.5-8 %mass with respect to total content of electrolyte solution.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (Claimed): A bromine-containing thiophene derivative of formula (II) and thiophene derivative of formula (III) are reacted to obtain silole derivative (I).R'1,R'2=2-ethylhexyl or n-octyl.Preferred Process: A bis(triphenylphosphine)palladium (II) dichloride is used as catalyst during manufacture of silole derivative. Preferred Composition: The photoactive layer further includes fullerene derivative. SPECIFIC COMPOUNDS - 4 Silole derivatives are specifically claimed i.e. 3-(5-(10-(5-(2,5-bis(2-ethylhexyl)-3,6-dioxo-4-(thiophen-2-yl)-2H,3H,5H,6H-pyrrolo(3,4-c)pyrrol-1-yl)thiophen-2-yl)-7,7-bis(2-ethylhexyl)-3,11-dithia-7-silatricyclo(6.3.0.02,6)undeca-1(8),2(6),4,9-tetraen-4-yl)thiophen-2-yl)-2,5-bis(2-ethylhexyl)-6-(thiophen-2-yl)-1H,2H,4H,5H-pyrrolo(3,4-c)pyrrole-1,4-dione of formula (Ia), 3-(5-(10-(5-(2,5-dioctyl-3,6-dioxo-4-(thiophen-2-yl)-2H,3H,5H,6H-pyrrolo(3,4-c)pyrrol-1-yl)thiophen-2-yl)-7,7-bis(2-ethylhexyl)-3,11-dithia-7-silatricyclo(6.3.0.02,6)undeca-1(8),2(6),4,9-tetraen-4-yl)thiophen-2-yl)-2,5-dioctyl-6-(thiophen-2-yl)-1H,2H,4H,5H-pyrrolo(3,4-c)pyrrole-1,4-dione, 3-(5-(10-(5-(2,5-bis(2-ethylhexyl)-3,6-dioxo-4-(thiophen-2-yl)-2H,3H,5H,6H-pyrrolo(3,4-c)pyrrol-1-yl)thiophen-2-yl)-7,7-dioctyl-3,11-dithia-7-silatricyclo(6.3.0.02,6)undeca-1(8),2(6),4,9-tetraen-4-yl)thiophen-2-yl)-2,5-bis(2-ethylhexyl)-6-(thiophen-2-yl)-1H,2H,4H,5H-pyrrolo(3,4-c)pyrrole-1,4-dione and 3-(5-(10-(5-(2,5-dioctyl-3,6-dioxo-4-(thiophen-2-yl)-2H,3H,5H,6H-pyrrolo(3,4-c)pyrrol-1-yl)thiophen-2-yl)-7,7-dioctyl-3,11-dithia-7-silatricyclo(6.3.0.02,6)undeca-1(8),2(6),4,9-tetraen-4-yl)thiophen-2-yl)-2,5-dioctyl-6-(thiophen-2-yl)-1H,2H,4H,5H-pyrrolo(3,4-c)pyrrole-1,4-dione.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method comprises surface modification treatment is carried out on the acicular wollastonite.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The thickening agent is gas phase silicon dioxide having specific surface area of 50-250 m2/g, organic bentonite, diatomite, methyl cellulose and/or glutin. The monomer is acrylamide, acrylic acid alkyl ester containing double bond, methacrylamide, methyl acrylate, ethyl acrylate and/or butyl acrylate. The foaming agent is carbon amide, formamide, N, N-dimethyl carbamide, isopropyl alcohol and/or isobutyl alcohol. The crosslinking agent is allyl acrylate, allyl methacrylate, magnesium oxide or ethylene glycol dimethacrylate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The electrode further comprises 3 pts. wt. conductive metal powder based on 100 pts. wt. paste composition, where the conductive metal powder comprises germanium, gallium, boron, nickel, tin, bismuth, lithium, indium, cadmium, phosphorus or zinc. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The thickening agent is chosen from gas-phase silicon dioxide, organic bentonite, diatomaceous earth, methyl cellulose and gelatin. Preferred Property: The specific surface area of gas-phase silicon dioxide is 50-250 m2/g.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The tertiary monomer is chosen from acrylamide, methacrylamide, methyl acrylate, ethyl acrylate and butyl acrylate. The foaming agent is chosen from N,N-dimethylurea, isopropanol and isobutanol. The crosslinking agent is chosen from allyl acrylate, allyl methacrylate, magnesium oxide and ethylene glycol dimethacrylate. The nucleating agent is chosen from t-butyl methacrylate, N-dimethylformamide and iso-butyl methacrylate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Vulcanization promoting auxiliary agent is zinc oxide. Vulcanizing agent contains magnesium oxide and N,N'-m-phenylenebismaleimide with mass ratio 2-4:6. Reinforcing agent is highly dispersed silica. Coupling agent is triisopropyl titanate, isopropyl stearate, or di(dioctyl phosphite) tetraisopropyltitanate.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Vulcanization accelerator contains 2-mercapto-benzothiazole, dithiocarbamate salt, antimony dithiocarbamate, dithiocarbamate, or molybdenum dithiocarbamate with thiazole to dithiocarbamate mass ratio of 0.4:1-2. Scorch retarder contains N-cyclohexyl-phthalimide, and N-nitroaniline with mass ratio 2:1. Anti-aging agent contains N-phenyl-2-naphthylamine, N-phenyl-N'- isopropyl-p-phenylenediamine, and 2-mercaptobenzimidazole with mass ratio 1:1:8. Flame retardant contains triphenyl phosphate, and melamine with mass ratio 1:1-4. Plasticizer contains dioctyl phthalate, and chlorinated paraffin with mass ratio 2:1.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: Crude rubber is chlorosulfonated polyethylene.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The lamp utilizes a power supply output interface that is connected with an USB female interface/USB plug.
TECHNOLOGY FOCUS - METALLURGY - The hot guide plate, the radiating plate and the power generating element are fixed together using hot silicon glue adhesive.
TECHNOLOGY FOCUS - METALLURGY - The contact layer is formed of nickel and titanium.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Substrate: The substrate is selected from inorganic material or polymeric material. It is porous. The substrate is diatomaceous earth, aluminum oxide or boehmite, and iron oxide. The ratio of alumina to lithium is 1:0.1 to 1:0.6. The substrate has an average particle size of less than 500 mu m and an average pore size of less than 5 mu m. Preferred Method: The method (M1) further involves pre-treating the particle substrate with a surface modifier, where the surface modifier is operable to increase the bonding affinity between particle substrate and polyaluminum hydroxyl chloride. The lithium salt intercalated into the polyaluminum hydroxyl chloride coating is lithium chloride. The step of intercalating the lithium salt into the polyaluminum hydroxyl halide coating involves contacting the polyaluminum hydroxyl halide coating with an alkali hydroxide, and then optionally contacting the coating with lithium chloride. The wash water has a lithium concentration of less than 200 ppm.    TECHNOLOGY FOCUS - POLYMERS - Preferred Substrate: The particle substrate is a polymer or resin-based material. The particles are formed by extrusion. The polyaluminum hydroxyl halide has a general formula of Al2(OH)a(X)b (I).X=fluoride, bromide, chloride and iodide (preferably chloride);a and b=0.5-5.5;a+b=6;a=3-6;b=0.5-3. EXAMPLE - 0.9 g of FW80 (RTM: diatomaceous silica) was combined with 2 g of a 50 wt.% Al2OH5Cl solution (9 mmol of aluminum) and stirred at room temperature for 30 minutes. To the resulting mixture was added 0.21 g lithium chloride (5 mmol) and stirred at room temperature for 5 minutes. To lithium chloride intercalated mixture was added 2 mmol of lithium hydroxide (5.7 wt.% aqueous solution) and stirred. The resulting slurry was dried at 70 degrees C and washed with 15 mL of deionized water. The resulting composition (1.4 g, 155% yield) had an Al:Li ratio of 1:0.26.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: At least one additional glycerol monoester is present as an additional component of the coating agent. The additional glycerol ester is glycerol monostearate. The coating agent contains precipitated silica as an additional component. The polymer particle is coated with: a coating composition comprising 50-74 pts. wt. glycerol tribenzoate, 25-50 pts. wt. glycerol monoester, 1-20 pts. wt. precipitated silica; and an additional substance comprising antistatic agents, hydrophobing agents, flame retardants and inorganic fillers. The polymer comprises at least one additional copolymerized monomer comprising acrylonitrile, maleic anhydride, maleimides, (meth)acrylate and (meth)acrylic acid. The nitrogen and/or carbon dioxide are used as co-blowing agent.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The styrene polymer is a styrene-acrylonitrile copolymer. The polymer particle comprises styrene-acrylonitrile- or alpha -methyl styrene acrylonitrile copolymer. The polymer particle comprises a styrene-acrylonitrile copolymer in a mixture comprising a styrene-maleic anhydride copolymer and/or a styrene-N-phenylmaleimide copolymer. The polymer particles contain mixture of styrene-acrylonitrile- and/or a-methyl styrene acrylonitrile and styrene-maleic anhydride. The polymer particles contain styrene-methyl methacrylate copolymer and 1-10 wt.% a blowing agent. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The flame retardant is tris(tribromoneopentyl)phosphate. The styrene copolymer component is made of at least one styrene-acrylonitrile copolymer, preferably styrene acrylonitrile and/or styrene maleic anhydride or styrene-acrylonitrile-maleic acid anhydride-terpolymer. Preferred Composition: The expandable polymer granule comprises 0.01-3 pts. wt. dicumyl (prefereably), hydroxylamines and/or anhydrides as a flame retardant synergist, based on polymer component. EXAMPLE - 90 wt.% Luran 3380 (RTM: Styrene acrylonitrile with 33 wt.% acrylonitrile) was melted with 6.5% additive mixture (72.32 wt.% Luran 3380 (RTM: Styrene acrylonitrile with 33 wt.% acrylonitrile), 8 wt.% talc, 0.88 wt.% Printex FP (RTM: Carbon black), 10 wt.% Bay-ferrox 110M (RTM: Synthetic alpha -iron oxide) and 8.8 wt.% Thermoplast yellow 104 (RTM: Solvent Yellow 93, methine dye) at 230-260 degrees C in a twin-screw extruder. The polymer melt loaded with 3.5% mixture of 80 wt.% n-pentane and 20 wt.% iso-pentane, based on the polymer matrix was homogenized in two static mixer, and cooled to 220-230 degrees C. Luran 3380 (RTM: Styrene acrylonitrile with 33 wt.% acrylonitrile), which was added with 7 wt.% tris(tribromoneopentyl)-phosphate, was melted at 200-240 degrees C and homogenized. The melt was cooled to 200-220 degrees C and extruded to obtain a polymer stand. The polymer strand was cut to obtain a blowing agent loaded granule.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The solar cell further comprises a recombination barrier layer arranged between the first electrode and the semiconductor layer and a light scattering layer on the top of the semiconductor layer. Preferred Method: In the method: the dye and the diamine derivatives are introduced to the semiconductor layer surface sequentially or simultaneously.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The diamine derivatives are of formula (I).X1-X4 = functional group that can be immobilized on the surface semiconductor layer through physical adsorption or chemical bond by reaction with hydroxy group, preferably COOH or its metal salts or amine salts, -SO3H or its metal salts or amine salts, -OSO2OH or its metal salts or amine salts, -OP(=O)(OH)2 or its metal salts or amine salts, -P(=O)(OH)2 or its metal salts or amine salts, - P(OH)2 or its metal salts or amine salts, anhydride or siloxane group; andR1-R5 = 1-30C alkylene, 1-30C heteroalkylene, 1-30C oxyalkylene, 1-30C thioalkylene, 1-30C oxyheteroalkylene, 1-30C thioheteroalkylene, 6-30C arylene, 6-30C oxyarylene, 6-30C thioarylene, 6-30C arylenealkylene, 2-30C heteroarylene, 2-30C oxyheteroarylene, 2-30C thioheteroarylene, 2-30C heteroarylenealkylene, 5-20C cycloalkylene, 5-20C oxycycloalkylene, 5-20C thiocycloalkylene, 5-20C cycloalkylenealkylene, 2-30C heterocycloalkylene, 2-30C oxyheterocycloalkylene, 2-30C thioheterocycloalkylene, 2-30C thioheterocycloalkylenealkylene, 1-30C alkylene ester, 1-30C heteroalkylene ester, 6-30C arylene ester or 2-30C heteroarylene ester (all optionally substituted).
TECHNOLOGY FOCUS - METALLURGY - The transmission track is made of stainless steel material.    TECHNOLOGY FOCUS - POLYMERS - The turning blades are made of plastic material.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Method: In the step (ii), the infiltration carbon potential (Cp) is 1.2%, the diffusion time Cp is 1%, the carburizing temperature is 940 degrees C, the carburizing time is 1240 minutes, and the carburized layer depth is 1.9-2.3 mm. In the step (ii), remaining volume left is single side of 4-5 mm. In the step (iv), the quenching temperature is 820 degrees C, the quenching time is 240 minutes, and the quenching layer depth is 2.1-2.8 mm. In the step (v), the surface processing is polishing.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The metal complex comprises 0.1-10 vol.% of the reaction mixture prior to heating. The semiconductor material is in powder form prior to heating, and the temperature is sufficient to sinter the semiconductor material. The method comprises: preparing a reaction mixture by mixing a semiconductor material comprising silicon and a metal complex consisting of ferrocene (Fe(C5H5)2) or tungstencene (W(C5H5)2) using a ball milling device for 1-4 hours, where the silicon is in powder form, and the metal complex comprises 0.1-10 vol.% of the reaction mixture; and heating the reaction mixture using a hot pressing device to a temperature of at least 1160 degrees C and at a pressure of at least 150 MPa, where the heating forms silicide inclusions having a size less than 100 nm that are substantially evenly distributed throughout the semiconductor material, the temperature is sufficient to sinter the semiconductor material, if the metal complex is ferrocene, the silicide inclusions comprise iron silicide, and if the metal complex is tungstencene, the silicide inclusions comprise tungsten silicide. Preferred Components: The semiconductor material is silicon (preferred), magnesium silicide or a silicon-germanium compound of formula (Si1-yGey). The metal complex is an organometallic compound. The organometallic compound is ferrocene or tungstencene. The metallic inclusions comprise the silicide inclusions (I), preferably iron silicide or tungsten silicide. The silicide inclusions are substantially not located in grain boundaries of the semiconductor material. At least a portion of the silicide inclusions have a size less than 2 nm.y = greater than 0 to less than 1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Layer: The photoactive layer is quantum dot photoactive layer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: Particle diameter of fly ash is 30 mu m. Particle size of mineral ore is 30 mu m. Particle diameter of sand is 0.5-0.8 mu m. Silicone emulsion is cationic hydroxy silicone oil emulsion with 30% solid content.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Particle size of fly ash is 30-50 mu m. Particle size of mineral powder is 30 mu m. Particle size of sand is 0.5-1 mu m.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Antifreeze agent is aqueous solution of ethylene glycol. Preferred Composition: Content of ethylene glycol is 58%.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The first quantum dot group is green quantum dot and yellow quantum dot. The second quantum dot group is orange-red color quantum dot and red quantum dot. The band gap of the green quantum dot and yellow quantum dot of the first quantum dot group is 2.64 eV and 2.44 eV, respectively. The band gap of the orange-red color quantum dot and red quantum dot of the second quantum dot group is 2.25 eV and 2.21 eV, respectively. The moving quantum dot includes semiconductor quantum dot or nanosilver particle including cadmium selenide and lead sulfide.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The redox pair is lithium iodide, iodine or 1-ethyl-3-methylimidazolium iodide with iodine ion or triiodide ion.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The dye is lutein (N719) and the first exciton peak is 530 nm (2.32 eV). The ionic liquid is 1-ethyl-3-methylimidazolium bis (trifluromethylsulfonyl) imide. The moving quantum dot functions with thiol group ligand. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The insulated substrate is made of silicon dioxide (SiO2) for covering the substrate. The thermoelectric semiconductor is provided with bismuth-antimony-tellurium (Bi-Sb-Te) thin film. The protection film is made of polyimide protection film.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The lower layer of low-reflection film is provided with silicon dioxide as main component.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Inorganic salt is selected from sodium nitrate, sodium sulfate or potassium chloride. Ceramic substrate is selected from kaolin, silicon dioxide or diatomite. Hot material is selected from carbon black, graphite or activated carbon powder.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The mass ratio of inorganic solvent and ceramic substrate is 1-20:1-4, preferably 3-15:2-17.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The soluble gas is inert gas, organic solvent or carbon dioxide. The soluble gas is allowed the act on carbon fiber composite material at 0.5 MPa or more.    TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Process: In carbon fiber composite material, the carbon fibers are oriented in single direction in the form of fibers, or oriented in direction (D1) and direction (D2) which is perpendicular to the direction (D1) in the form of fabric. Preferred Properties: In carbon fiber composite material, tensile test is carried out in direction inclined 45 degrees from directions (D1, D2). The tensile modulus at 23 degrees C is 3 GPa or more. The maximum tensile stress at 23 degrees C is 45 MPa or more. During manufacture process, the carbon fiber composite material is reheated at (Tm-40)-(Tm-5) degrees C.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The foaming agent is carbon amide, formamide, N,N-dimethyl carbamide, isopropanol and/or isobutanol. The nucleating agent is tert-butyl methacrylate, N-methyl formamide or methacrylic acid isobutyl ester.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The flame retardant is melamine polyphosphate and/or ammonium polyphosphate. The thickener is gas phase silica, organic bentonite, diatomaceous earth, cellulose, and/or gelatin. The third monomer is acrylamide or acrylic acid alkyl ester containing double bond, preferably acrylamide, methacrylamide, methyl acrylate, ethyl acrylate and/or butyl acrylate. The crosslinking agent is allyl acrylate, allyl methacrylate, magnesium oxide or ethylene glycol dimethacrylate.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Process: The concrete is obtained by mixing 200 pts. wt. cement, 60 pts. wt. fly ash, 100 pts. wt. mineral powder, 400 pts. wt. sand and 150 pts. wt. water. Preferred Properties: The fly ash has particle size of 30-50? mu m. The mineral powder has particle size of 30 mu m. The sand has particle size of 0.5-1 cm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Hydrofluoric acid solution concentration is 1-20 M.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The filling emitter layer contains element chosen from silicone, nitrogen, phosphorus, arsenic, antimony and bismuth, or element chosen from silicone, boron, aluminum, gallium, indium and thallium. The base electrode contains silver, nickel, copper, aluminum and/or tin. Preferred Property: The diameter of the via-hole is 25-100 mu m.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The dye is chosen from 20 compounds e.g. ruthenium complex, rhodamine B, zinc porphyrin, magnesium porphyrin and azo dye. The solvent is chosen from dimethylacetamide, dimethylformamide, dimethyl sulfoxide, N-methylpyrrolidone, tetrahydrofuran, methanol, ethanol, isopropyl alcohol, N-propyl alcohol, water and butyl alcohol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Method: The method further comprises: maintaining the pH of the brine solution at 4.8-5.3 during the contacting step; maintaining the pH of the aqueous product stream at 4-7, supplying the aqueous product stream to a column charged with activated alumina at a pH of 4-7, such that silica present in the aqueous product stream selectively binds to the activated alumina, and recovering a column product stream having a reduced silica concentration relative to the aqueous product stream; supplying the aqueous product stream to means for recovering at least one metal, such as lithium, zinc and manganese from the aqueous brine solution; and adding an amorphous aluminosilicate solid to the second solution. The step of oxidizing the iron(II) salt comprises sparging the aqueous brine solution with air. The pH of the aqueous brine solution is maintained at a predetermined pH by the addition of base, such as calcium oxide or calcium hydroxide. The pH of the aqueous brine solution is maintained at 4.75-5.5, preferably 4.9-5.3. The aluminosilicate solid in an amount of at least 0.25 wt.% is added to the second solution. The pH of the second aqueous solution is maintained at 4.85-5.15. Preferred Components: The iron(II) salt is iron(II) chloride. The silica concentration of the aqueous product stream is less than 20 ppm.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preparation (claimed): A 1-chloro anthraquinone is reacted with boronic acid compound of formula: X-Q-B(OH)2 (Ia), to obtain anthraquinone compound of formula (Ib). The compound (Ib) is reacted with bromo compound of formula: R1-Br or R2-Br (Ic), to obtain dialcohol compound of (Id). The compound (Id) is reacted with potassium iodide and sodium hypophosphite, to obtain compound (I). Preferred Layer: The organic layer is hole injection layer, hole-transport layer, light-emitting layer and/or electron-transport layer. Preferred Definitions:    Q=phenylenyl, naphthalenyl or biphenylenyl;    R1,R2=phenylthiophenyl, anthracenyl, fluorenyl, biphenyl, 1-naphthyl, 2-naphthyl, stilbenyl, 2-tetralinyl, 1-tetralinyl, triphenyl, diphenylamine or carbazolyl;and    X=1-naphthyl, 2-naphthyl or biphenyl.    SPECIFIC COMPOUNDS - 24 Anthracene derivatives are specifically claimed e.g. 9,10-diphenyl-1-(4-(10-phenylanthracen-9-yl)phenyl)anthracene of formula (IA), 9,10-diphenyl-1-(3-(10-phenylanthracen-9-yl)phenyl)anthracene, 1-(4-(10-(naphthalen-2-yl)anthracen-9-yl)phenyl)-9,10-diphenylanthracene, 1-(3-(10-(naphthalen-2-yl)anthracen-9-yl)phenyl)-9,10-diphenylanthracene and 1-(4-(10-(naphthalen-1-yl)anthracen-9-yl)phenyl)-9,10-diphenylanthracene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: Concentration of sulfur (S) is gradually reduced from interfacial surface between back electrode layer and light absorbing layer to interfacial surface between light absorbing layer and buffer layer. Buffer layer contains 1st buffer layer and 2nd buffer layer on 1st buffer layer in which both layers contains ZnS, ZnO, and/or Zn(OH)2. Concentration of ZnS is gradually reduced from 1st buffer layer to 2nd buffer layer. Interfacial surface between 1st and 2nd buffer layers contain ZnS, ZnO, and/or Zn(OH)2. Concentration of ZnO is gradually increased from 1st buffer layer to 2nd buffer layer. Alkaline solution contains Zn salt, complex compound, and thiourea (CH4N2S). Complex compound contains ammonium hydroxide (NH4OH) in which concentration of NH4OH of alkaline solution used in forming 1st buffer layer is lower than concentration of NH4OH of alkaline solution used in forming 2nd buffer layer. Preferred Parameters: The 1st buffer layer or 2nd buffer layer has thickness of less than or equal to 50 nm, preferably 15-50 nm. Buffer layer has thickness of 30-100 nm. Preferred Processes: The 1st and 2nd buffer layers are formed through chemical bath deposition (CBD) scheme using an alkaline solution.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The prevention method of silica-type scale in water-system further involves adding sulfonic acid group-containing polymer to the polyethylene glycol and/or polyethylene glycol monomethyl ether.
TECHNOLOGY FOCUS - METALLURGY - The aluminum type plating layer with 12% silicon is constructed on the cover portion.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Excitation light source is LED or laser diode. White light-emitting device contains blue fluorescent material and red fluorescent material. Blue fluorescent material is europium-containing compound of formula BaMgAl10O17:Eu2+, (Ba, Sr, Ca)5(PO4)3(F, Cl, Br, OH):Eu2+, 2SrOx 0.84P2O5x 0.16B2O3:Eu2+, Sr2Si3O8x 2SrCl2:Eu2+, or (Mg, Ca, Sr, Ba, Zn)3B2O6:Eu2+. Red fluorescent material is europium-containing compound of formula (Sr, Ca)S:Eu2+, (Y, La, Gd, Lu)2O3:Eu3+, Bi3+, (Y, La, Gd, Lu)2O2S:Eu3+, Bi3+, Ca2Si5N8:Eu2+, or ZnCdS:AgCl. Preferred Definitions:    Md=Sn, Yb, Pb, Tb, Ce, Dy, and/or Pr; and    q=0.
TECHNOLOGY FOCUS - ELECTRONICS - Preferred Components: The particle size of the oxide semiconductor film is less than 100 nm, preferably less than 50 nm. Preferred Method: The oxide semiconductor film of a thickness 12 micron is dipped in dye for 20 minutes, and allowing to stand for 20 minutes in a mixed solution ammonia, distilled water and ethanol in a volume ratio of 1:5:5, where the amount of dye desorption is more than 1x 107mol/cm2, preferably 2x 107mol/cm2. EXAMPLE - 3.577 g Tin(IV) chloride pentahydrate and 2.467g barium chloride dihydrate were dissolved in 30% aqueous hydrogen peroxide, then120 ml aqueous ammonia to mixed solution for precipitation and was aged for 12 hours. The obtained precipitate was washed, freeze-dried, and annealed at 900 degree C for 2 hours to obtain barium stannate powder. The barium stannate powder was mixed with terpineol and ethyl cellulose to form a paste, the formed paste was coated on a fluorine-doped tin oxide substrate by the screen printing method, heat treated at 500 degree C for 1 hour, and the film was dipped in dye for 20 minutes to obtain photoelectrode.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Method: The method further comprises etching to remove the second region, separating grown secondary titanium dioxide nanotube from the substrate, and heat-treating to crystallize the grown secondary nanotube. The etching step is carried out using 33 wt.% of hydrogen peroxide liquid for 30 minutes to 3 hour. The growing step is done at 60 V for less than 10 minutes. The heating step is carried out at 250 degrees C for a plasticizing process that is carried out at a temperature of greater than or equal to 450 degrees C. Preferred Components: The secondary grown region has a length of 0.1-2 mm. The dye-sensitized solar cell further comprises counter electrode and a sealing member having an electrolyte solution. The solar light is incident through the semiconductor electrode. The upper end thickness of the titanium nanotubes is greater than lower part thickness. The titanium nanotube layer has a thickness of 4-50 micrometer. The semiconductor electrode has a nano-crystal thin film layer with the thickness of 1-5 mm.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - A phosphorus silicate glass layer and boron silicate glass formed on the front side of the silicon substrate are removed.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The n-type emitter layer is made of phosphorus oxychloride and the p-type emitter layer is made of boron tribromide or diborane.    TECHNOLOGY FOCUS - METALLURGY - The front electrode is made of silver and the back contact electrode is made of aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The carbon nanophase material includes one of at least carbon nanotubes, carbon nanoplatelets, and/or carbon nanoparticles. The active layer further comprises a first metal layer coupled to the first surface of the active layer; and a second metal layer coupled to the second surface of the active layer. The cooling layer comprises one of at least ceramic oxides, metal oxides, and/or carbon nanophase materials.    TECHNOLOGY FOCUS - POLYMERS - The polymer composite includes one of at least metal, metal oxide particles, ceramic salts, ceramic particles, and/or carbon nanophase materials.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Conditions: Forging temperature in step (A) is 500-550 degrees C. Preferred Processes: Cooling in steps (B) and (D) by blast spray cooling. Step (F) further involves air cooling at 400 degrees C, cooling at 250 degrees C in oven, and cooling at less than or equal to 25 degrees C/hour in oven.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The thin film solar cells are made of silicon, cadmium telluride and copper indium gallium selenide.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The evaporation cooling medium consists of 30-40 %mass dodeca perfluorohexane and 60-70 %mass dodeca perfluorohexene as primary component. The evaporative cooling medium further comprises a secondary component chosen from fluorine-containing alkane, fluorine-containing olefin, fluoroketone and fluoroether. The fluorine-containing alkane is of formula: CxHyFz. The fluorine-containing olefin is of formula: Cx'Hy'Fz'. The fluoroketone is of formula: Cx'Hy'Fz'O. The fluoroether is of formula: CxHyFzO.y+z=2x+2;y'+z'=2x;andx=4-8.The amount of primary component and secondary component is 50-100 %mass and 0-50 %mass, preferably 70-90 %mass and 10-30 %mass, respectively. The fluorine-containing alkane is chosen from HFC-365mfc, decafluoropentane and HFC-245fa. The fluorine-containing olefin is chosen from butene-hexafluoropropylene. The fluoroketone is perfluoro cyclohexanone. The fluoroether is 1-methoxy-heptafluoropropane. The mass ratio of fluorine-containing alkane and fluorine-containing olefin is 3:2-1:1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The size of the silica-titania hollow nanoparticles is 50 nm to 3 mu m.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The sea water desalinization device is a sealed cylinder set with at least two reverse osmosis (RO) membranes which are stacked up to down, where the RO membranes are vertically arranged in the cylinder. The sea water desalinization device is equipped with a sea water inlet, a desalinated sea water outlet and a fresh water outlet, where the desalinated sea water outlet is equipped with a pressure regulating valve for regulating the hydrostatic pressure of the sealed cylinder. The power output end of any one hydraulic motor is connected with a secure power supply including generators and batteries connected to generators. The system further comprises a tower located on the ground, where the desalinization device is stacked up and down in the tower, the tower is equipped with the hydraulic motor and the high speed pump, and wind turbine provided on the tower.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The electrical isolation layer comprises an electrically insulating metal-containing compound layer that comprises an oxide of a material of conductive substrate. The electrical isolation layer comprises an inorganic dielectric material. The electrical isolation layer comprises a dielectric metal oxide, a dielectric metal nitride, and/or a dielectric metal oxynitride. The electrical isolation layer comprises titanium dioxide.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The electrical isolation layer comprises an organic dielectric material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The film of solar cell is made up of hydrogenated silicon oxide. The solar cell is provided with aluminum oxide and hydrogenated silicon nitride.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The dopant includes n-dopant containing amine compound, reducing agent or metal nanoparticles. The metal nanoparticles are chosen from lithium, magnesium, sodium, potassium, rubidium, cesium, gold, silver, platinum and copper.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The amine compound is chosen from diethylene triamine, the ammonia, hydrazine, pyridine, pyrrole, acetonitrile, triethanolamine, aniline, methylamine, dimethylamine, 2-aminopentane and propylamine. The reducing agent is sodium borohydride, lithium aluminum hydride and hydroquinone.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The light absorption layer comprises copper-indium selenide. The bottom electrode comprises molybdenum, nickel, gold, platinum or palladium. The buffer layer comprises cadmium sulfide. The transparent electrode comprises zinc oxide or indium-tin oxide. Preferred Property: The thickness of light absorption layer is 1-3 mu m. Preferred Process: The bottom electrode is formed by thermal evaporation, electron beam evaporation, sputtering method, chemical vapor deposition technique, metal organic chemical vapor deposition, laser molecular beam epitaxy, or pulsed laser deposition.
TECHNOLOGY FOCUS - METALLURGY - The plate is made of stainless or electro galvanized steel.
TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The styrene-based monomer is styrene optionally substituted with one or more substituents of (1-15C)alkyl, (2-6C)alkenyl, (5-8C)cycloalkyl, aryl and aryl-(1-6C)alkyl, preferably (1-6C)alkyl-styrene such as para-tert-butyl-styrene (PTBS) and/or para-methyl-styrene (PMS). The monomer (b) is at least one (meth)acrylate-based monomer of formula (H2C=C(R1a)-C(=O)-O-R1b) (A), preferably isobornyl methacrylate (IBOMA), isobutyl methacrylate (IBMA), and/or 2-ethylhexyl acrylate (2-EHA). The monomer (a) to monomer (b) is present in a ratio of 100:0-10:90, preferably 100:0-70:30. The copolymerizable surfactant has a structure of formula (CHR1=CRa1L-(O-CHR7-CHR8)n-X1). The copolymerizable and non polymerizable surfactants are present in an amount of 0.5-10 wt%, preferably 1-7 wt.%. The oil-based drilling fluid contains 0.1-10 parts per billion (ppb) (0.285-28.5 kg/m3) of the rheological agent. The non polymerizable surfactant has a structure of formula (X3-(OCH2CH2)q-X2).R1a = H or methyl;R1b = (1-15C) saturated hydrocarbon;L = single bond or a linker;Ra1, R1 = H or (1-25C)alkyl, preferably H;n = at least 1, preferably 5-40;R7, R8 = H or methyl, but R7 and R8 cannot both represent a methyl;X1 = -O-(optionally substituted aryl), -O(1-25C)alkyl, -O-(1-6C)alkanediyl-SO3H, -OH, -S(O)2(OH), -O-P(O)(OH)2 or -O-S(O)2(OH), or its salt such as a sodium, potassium or ammonium salt;q = 1-60, preferably 3-20;X3 = (8-25C)alkyl or aryl optionally substituted with a (1-25C)alkyl; andX2 = -OH, -S(O)2(OH), -O-P(O)(OH)2 or -O-S(O)2(OH), or its salt such as a sodium, potassium or ammonium salt. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The filler is chosen from tantalum, zirconium, thorium, magnesium, barium, titanium, aluminum, niobium, iron, lithium, palladium, platinum, calcium oxide, calcium chloride, zeolite, silica gel, alumina and activated charcoal.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The substrate is a positive-type silicon wafer substrate. The ionizing gas includes argon, neon, and nitrogen. The output of the radio frequency power applied to the electrode of target module is 150-300 W. The thin film has refractive index of 2.7-3.7.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The method further comprises a first surface treatment process for treating the surface of the substrate with trichloroethylene, acetone, methanol and distilled water, and second surface treatment process for washing the surface of the substrate using the acid solution. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - METALLURGY - The conductor is made of copper and aluminum.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The nanoparticles comprise copper, tin, silver, zinc, platinum, palladium, gold, indium and/or cadmium, and have a size of 1-300 nm.
TECHNOLOGY FOCUS - INSTRUMENTATION AND TESTING - Preferred Components: The conductor strip connecting element comprises an electrically conductive sleeve which directly and electrically connects the oppositely arranged first- and second cable connectors. The conductor strip is wound and/or welded to the electrically conductive sleeve. The first- and second cable connectors are protected by a distinct configuration in a reverse polarity manner. The first- and second cable connectors respectively comprise a contact securing sleeve, and the dielectric edge connector housing is shock proof. The cable connector comprises a sealing unit and the dielectric edge connector housing is waterproof. The cable connectors are designed as plug connectors. The mounting tab of the edge connector is inserted and glued into a slot in the end-face edge of the solar module, or the mounting tab of the edge connectors is glued in the laminate of the solar module as a part of the lamination. The mounting tab has openings to improve the adhesive bond to the solar module. The electrically conductive parts of the edge connector are encapsulated by the edge connector housing and the conductor strip of the edge connector housing is partially encapsulated. The replaceable edge connector line comprises a reverse current diode, such that they are easily replaced in case of failure and/or saved for non-anticipated shading of the solar module.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Component: The thermoelectric conversion element has base material, pair of electrode (33) on base material and thermoelectric conversion layer arranged between the electrodes.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of carbon nanotube in total solid content of thermoelectric conversion material is 10-60 %mass.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The ratio of head-to-tail coupling in polythiophene polymer is less than 95%. The mass ratio of polythiophene polymer and carbon nanotube is 1:4-4:1. The thermoelectric conversion material further contains a solvent. The polythiophene polymer further has metal impurity having concentration of 1000 ppm or less and containing metal chosen from iron, zinc and nickel. Preferred Definitions:    R=2-ethylhexyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The window pane is made of germanium, calcium fluoride, sapphire, lithium fluoride, zinc, selenide, barium fluoride and/or infrared transmitting polymer.    TECHNOLOGY FOCUS - POLYMERS - The window pane is made of infrared transmitting polymer.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The first and second high value resistor buffer layer comprise zinc oxide.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The substrate comprises amorphous substrate, a crystalline substrate, and/or a polycrystalline substrate. The electroconductive material further comprises a seed layer having growth sites adjacent to the substrate. Preferred Properties: The crystalline metal oxide layer has a surface root mean square roughness of 5-12 nm and grain size of 500 nm to 3 mu m.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Properties: The growth solution is provided in a volume which is dependent on an area of the continuous layer of electroconductive crystalline metal oxide to be grown such that the ratio of the volume of growth solution provided to the area of the continuous layer of electroconductive crystalline metal oxide to be grown is 15-30 ml/cm2, when the concentration of the growth solution is 25-60 mM. Preferred Composition: The growth sites and the crystalline metal oxide layer comprise a metal oxide chosen from zinc oxide, tin oxide and titanium dioxide. The growth solution further comprises dopant(s) which comprise rare earth metal and/or group (III) metal.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The thin film comprises vanadium oxide of VO2 or V2O3. The thin film comprises strongly-correlated metal that comprises YBa2Cu3O7 or MgB2.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The thickener is chosen from metal sulfonate thickener, metal complex soap thickener and non-soap thickener, and comprises polytetrafluoroethylene. The non-hydrocarbon-based grease further comprises additive containing metal sulfide, friction-reducing solid, graphite, polytetrafluoroethylene, silica, inorganic sulfur-containing solid, inorganic phosphorus-containing solid, inorganic boron-containing solid, titanium, and zirconium. The additive is chosen from extreme pressure additive, oxidation inhibitor additive, wear-reducing additive, friction-reducing additive, polymeric additive, pour point depressant additive, corrosion inhibitor additive and anti-rust additive. The component (A) comprises pressure-compensation piston. The component (B) comprises tubular component.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The non-hydrocarbon-based grease comprises perfluoroalkylether polymer and thickener. The perfluoroalkylether polymer comprises structure chosen from F-(CF(CF3)CF2-O-)n-CF2CF3, CF3CF2CF2O-(CF(CF3)CF2-O-)n-CF2CF3 and CF3CF2CF2O-(CF2CF2CF2-O-)n-CF2CF3.n=10-60;and(y+m)=10-60.
TECHNOLOGY FOCUS - METALLURGY - The insulating member comprises at least one of silicon, silicon oxide, and nitride comprising silicon.
TECHNOLOGY FOCUS - INDUSTRIAL STANDARDS - The communication interface is selected from one of an RS232 interface, an RS485 interface, an RS422 interface, an Ethernet interface and a ProfibusDP interface.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The alkali metal salt is lithium salt.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The nonaqueous solvent further comprises cyclic carbonic ester. The cyclic carbonic ester is chosen from ethylene carbonate and propylene carbonate. The fluorinated solvent is 1,1,2,2-tetrafluoroethyl-2,2,3,3-tetrafluoropropyl ether. The alicyclic skeleton of alicyclic quaternary ammonium cation is 5C or less alicyclic skeleton. The substituent is bonded to nitrogen in the alicyclic skeleton of the alicyclic quaternary ammonium cation. The nonaqueous solvent preferably comprises fluorinated solvent, and 1-methyl-1-propylpiperidin-1-ium cation-containing ionic liquid of formula (G1).R1-R5=H, 1-20C alkyl, or 1-20C alkoxy, with at least one being 1-20C alkyl or 1-20C alkoxy;andA-=monovalent imide anion, monovalent methide anion, perfluoroalkyl sulfonic acid anion, tetrafluoroborate or hexafluorophosphate.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Properties: The charge capacity of the battery remains within 25% between 10 and 50 cycles and 35% between 10 and 90 cycles for potential range between 4.2 V and 4.8 V versus lithium/lithium cation (Li/Li+) reference potential.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Conditions: The heat-treating temperature and time are 900 degrees C and 60 minutes, respectively.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The electrolyte solution is obtained in the presence of an amine compound.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The content of the ethylene carbonate based compound is 0.1-10 wt.% based on a total weight of the organic electrolyte solution. The concentration of the lithium salt in the organic electrolyte solution is 0.01-2.0 M. Preferred Components: The organic solvent comprises a low boiling point solvent. The organic solvent is selected from dialkyl carbonate, a cyclic carbonate, a linear or cyclic ester, a linear or cyclic amide, an aliphatic nitrile, linear or cyclic ether, and its derivatives. The organic solvent comprises dimethyl carbonate, ethyl methyl carbonate, methyl propyl carbonate, ethyl propyl carbonate, diethyl carbonate, dipropyl carbonate, propylene carbonate, ethylene carbonate, fluoro-ethylene carbonate, butylene carbonate, ethyl propionate, ethyl butyrate, acetonitrile, succinonitrile, dimethyl sulfoxide, dimethylformamide, dimethylacetamide, gamma valerolactone, gamma-butyrolactone, and tetrahydrofuran. The anode comprises graphite. SPECIFIC COMPOUNDS - The use of 6 compounds (I) is specifically claimed e.g. 2-oxo-(1,3)dioxolane-4,5-dicarboxylic acid dimethyl ester, 2-oxo-(1,3)dioxole-4,5-dicarboxylic acid dimethyl ester, 2-oxo-(1,3)dioxolane-4,5-dicarboxylic acid diethyl ester, 2-oxo-(1,3)dioxole-4,5-dicarboxylic acid diethyl ester, and 2-oxo-(1,3)dioxolane-4,5-dicarboxylic acid di-tert-butyl ester of formula (Ia).    EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Battery: The cation-permeable separator comprises cation exchange membrane, porous polymeric material, porous ceramic material, porous insulating metal, zeolite, cation-conducting glass, and liquid-liquid interface between immiscible liquids. The negative electrode and the positive electrode each independently comprise metal, and/or carbon material.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The cations of the electrolyte salts are selected from Li+ and Na+. The anions of the electrolyte salts are selected from BF4-, PF6-, ClO4-, AsF6-, CF3SO3-, N(SO2CF3)2-, N(SO2CF2CF3)2-, B(C2O4)2-, and B12XnH(12-n)2-. The organic carbonates are selected from at least one ethylene carbonate, propylene carbonate, dimethyl carbonate, diethyl carbonate and/or ethyl methyl carbonate.X=halo.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The redox reactant of the negative electrolyte is selected from quinoxaline compound, dipyridyl ketone compound, viologen compound, and benzophenone compound (preferably viologen compound and benzophenone compound). The redox reactant of the positive electrolyte is selected from 1,2,4,5-tetrafluoro-3,6-dimethoxybenzene (TFDMB), 1,2,4,5-tetrafluoro-3,6-diethoxybenzene (TFDEB), and 1,2,4,5-tetrafluoro-3,6-bis(2-methoxyethoxy)benzene (TFBMEB). The redox reactant of the positive electrolyte is liquid 1,2,4,5-tetrafluoro-3,6-bis(2-methoxyethoxy)benzene, and no electrochemically stable organic solvent is included in the positive electrolyte. The electrochemically stable organic solvents comprise organic carbonates. The redox reactant of the negative electrolyte comprises compound of formulae (III) and (IV).R1-R6=H, alkyl, alkoxy, phenyl, pyridyl, halo or amino (preferably H, alkyl or alkoxy);R7-R14=H, halo, alkyl, phenyl, alkoxy or amino (preferably H, alkyl or alkoxy).
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The second electrode contains silicon.    TECHNOLOGY FOCUS - METALLURGY - The p-type semiconductor is selected form a group consisting of antimony, lead, phosphorus, boron, aluminum and gallium. The composite oxide contains lithium-Nickel and lithium-Manganese-Polonium. The second electrode contains alkali metal e.g. sodium, potassium, titanium and zinc.    TECHNOLOGY FOCUS - POLYMERS - The acrylic resin layer includes rubber macromolecules containing polyacrylic acid as a basic unit.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: The molar ratio of component (c) to (a) is at least 0.9. The crosslinking agent has a melting point below 80 degrees C, when measured at atmospheric pressure. The anionic group is sulfo (preferred), carboxy and phosphato groups. The composition comprises: at least 5 wt.% and less than 70 wt.% of the crosslinking agent; or 0.05-10 wt.% of photoinitiator. The crosslinking agent has a solubility in water of less than 0.03 mol/l, preferably less than 0.01 mol/l, when measured at 25 degrees C. The weight ratio of component (b) to (a) is greater than 0.3. The crosslinking agent comprises at least two groups comprising acrylamide groups. The tertiary amine has a melting point below 50 degrees C. The tertiary amine is tri(1-12C alkyl)amines and heterocyclic N-(1-12C alkyl) amines. The curable compound has a molecular weight of less than 1000 Dalton. The crosslinking agent has a molecular weight of less than 1000 Dalton. The tertiary amine has a molecular weight of less than 400 Dalton. The inert solvent comprises water and/or an organic solvent. The composition has a viscosity of below 12 Pa.s when measured at 50 degrees C. Preferred Process: The curing is performed by irradiating the composition for less than 30 seconds. The composition is partly dried and/or the inert solvent is partly removed by evaporation before curing step. EXAMPLE - Typical composition comprised of: 36.8 wt.% 2-acryloylamido-2-methylpropanesulfonicacid; 27.1 wt.% tricydo(5.2.1.0(2,6))decanedimethanoldiacrylate; 22.1 wt.% 1-butylimidazole; 13 wt.% dimethyl sulfoxide; 0.5 wt.% 2-hydroxy-2-methyl-1-phenyl-propan-1-one; and 0.5 wt.% Genorad 16 (RTM: Polymerization inhibitor).
TECHNOLOGY FOCUS - POLYMERS - The beam structure of solar cell panel is formed of plastic, rubber and metal ceramic materials.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Shape: The carbon film is in a hollow-fiber form.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The aromatic compound is chosen from benzene, toluene, xylene, ethylbenzene, tetralin, naphthalene, methylnaphthalene and ethylnaphthalene.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: The manufacture of lithium-manganese system complex oxide further involves adsorbing metallic compounds by liquid phase process, heat-processing to form metal-containing compound film, adsorbing compound chosen from porphyrin compound, phthalocyanine compound and polycyclic aromatic hydrocarbon by liquid phase process and heat-processing to form carbon film. The carbon film is formed by chemical vapor deposition method. Preferred Composition: The metal-containing compound is chosen from metal oxide and phosphoric acid compound, and the metal is chosen from titanium, aluminum, iron, magnesium, potassium, sodium, zinc, cerium, calcium, zirconium, germanium and tin. The mass of the metal-containing compound film and carbon film is 20 %mass or less with respect to the mass of lithium-manganese system complex oxide. The metallic compound is chosen from metal mineral salt, organometallic compound, metal complex and metal alkoxide.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Parameters: Thickness of surface of negative electrode active material layer is 30-100 mu m. Density of negative electrode active material layer is 1-1.5 g/cm3. Preferred Components: Negative electrode active material layer contains natural graphite.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Ethylene carbonate, dimethyl carbonate, and ethyl methyl carbonate are contained in non-aqueous electrolyte as non-aqueous solvent. Amount of ethylene carbonate in non-aqueous solvent is 20-40 vol.%. Alkyne sulfonic acid compound is compound of formula R1SO2-O-C(R2)(R3)-CC-C(R4)(R5)-O-SO2R1 (I). Alkyne sulfonic acid compound is 2-butyne-1,4-diol di(methane sulfonate).R1=1-12C linear or branched alkyl, 3-6C cycloalkyl, 6-12C aryl, or 1-10C perfluoroalkyl; andR2-R5=H or 1-4C linear or branched alkyl.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The cathode active material (b) is chosen from iron sulfide, iron oxyfluoride, ferric fluoride, ferrous fluoride, molybdenum oxide, sulfur, cupric oxide, cuprous oxide, ferrous oxide, ferric oxide, vanadium oxide (V6O13 or VO2), lithium vanadate (Li1+xV3O8, where x is 0-3), silver vanadate (Agx'V2O5, where x' is more than 0 to 2), copper vanadate (Cux"V4O11, where x" is more than 0 to 3), and vanadium oxyphosphate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The sodium alloy precursor is tin-germanium. The amount of: (I) is 60-67 wt.%; and electron conductivity agent is 18-25 wt.%. The electron conductivity agent is carbon black, vapor grown carbon fibers, carbon nanotubes and/or carbon SP.    TECHNOLOGY FOCUS - POLYMERS - Preferred Components: The binder is carboxymethyl cellulose, polyvinylidene fluoride and/or styrene butadiene rubber. The amount of binder is 12-20 wt.%. EXAMPLE - No suitable example given.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of carbon in complex is 0.1-50 %mass. The molar ratio of silicon to aluminum in complex is 0.1-500. Preferred Property: The powder resistivity of aluminum silicate complex is 0.001-100 Omega .cm.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The molar ratio of silicon, tin and titanium is preferably 46-58 mol%, 7-21 mol% and 24-37 mol%, respectively. Alternately, the negative electrode active material contains silicon-tin-zinc alloy or silicon-tin-carbon alloy. The coverage of alloy by the carbonaceous material is 50-400 mol%, preferably 250-400 mol%.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The positive electrode active material comprises sodium-iron-phosphorus oxide-containing complex of formula: Na2-2xM'12xFe1-yM'2yP2O7. The salt of the element A is sodium salt. The positive electrode active material comprises iron-based pyrophosphate compound of formula: Na2FeP2O7. The negative electrode active material comprises titanium compound and/or non-graphitizing carbon containing the element A.x=0-0.1;y=0-0.1;M'1=elements other than sodium;andM'2=elements other than iron.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The ionic liquid contains salt of sulfonylimide anion of formula: ((R1SO2)(R2SO2))N-, and cation.R1,R2=F or CnF2n+1;andn=1-5.
TECHNOLOGY FOCUS - CERAMICS AND GLASS - Preferred Composition: The amount of glass and/or ceramic particles and organic polymeric material in the mixture is 5-95 %mass, each with respect to the mixture. The ceramic particles are formed using material chosen from lithium-aluminum-titanium phosphate ((LixAlyTiz(PO)4)3), nano-alumina, zirconia, silicon carbide, lithium aluminate, tin dioxide and barium titanate, where x is 1-2, y is 0-1 and z is 1-2. The glass and/or ceramic particles are ionic conductive and/or non ionic conductive particles.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The solvent is chosen from tetrahydrofuran, acetone, ethanol, acetic acid, dimethylacetamide, dimethyl sulfoxide, hexamethylphosphoramide, N-methylpyrrolidone, triethyl phosphate, trimethyl phosphate, tetramethylurea, butanone, propylene carbonate, aqueous butanol, silanol, silanediol, ethylene glycol monohexyl ether, N,N-dimethylethanolamine, isopropyl alcohol, toluene, n-butanol, maleic anhydride and xylene.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The organic polymeric material is chosen from polyvinylidene fluoride-hexafluoropropene, polyvinylidene fluoride, PTFE, polymethyl methacrylate, polypropylene, polyacrylic acid, polyvinylpyrrolidone, aqueous polyvinylidene fluoride, acrylate, polyacrylate, styrene-butadiene rubber, natural and synthetic rubber, latex, OPPANOL (RTM: polyisobutene), polyethylene, ethylene-vinyl acetate copolymer and polyvinyl alcohol. The mixture further comprises adhesion additive chose from urethane and resin.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The lithium-rich material is lithium oxide composite (xLi2MnO3.(1-x)LiMO2, Li(1+b)Ni alpha Mn beta Co gamma A delta O2), lithium nickel oxide, lithium titanate derivatives and their respective doped composites (xLi2MnO3.(1-x)LiMO2, Li(1+b)Ni alpha Mn beta Co gamma A delta O2), lithium nickel oxide, lithium titanate derivative, where b is 0.1-0.3, alpha is 0-0.4, beta is 0.2-0.65, gamma is 0-0.46, delta is 0-0.15 and A is magnesium, strontium, barium, cadmium, zinc, aluminum, gallium, boron, zirconium, titanium, calcium, cerium, yttrium, niobium, chromium, iron, vanadium or lithium. The porous collector main material is nickel foam, copper foam, aluminum foam, carbon foam, stainless steel mesh, nickel mesh, copper mesh or aluminum mesh. The anode active substance used in the preparation method of lithium battery electrode is of formula: LiaNibCocMndMeO2, LiAO2, D'X2, LiD'S2, vanadium pentoxide, lithium vanadium pentoxide, LiMn2O4, lithium iron phosphate, where a is 0.95-1.1, b is 0-0.9, c is 0-0.5, d is 0-0.5, e is 0.001-0.1, M is aluminum, chromium, manganese, iron, magnesium, lanthanum, cerium, strontium or vanadium, A is cobalt, nickel or manganese, D' is titanium, molybdenum or manganese and X is oxygen or sulfur. The cathode active substance used in the preparation method of lithium battery electrode is carbonaceous materials, silica, SiOx, Si alloy, Si-carbon composites, tin, SnOx, Sn alloy or Sn composite material of carbon, where x is 0-2.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The adhesive used in the preparation method of lithium battery current collector is polyethylene oxide, polyvinylidene fluoride, polytetrafluoroethylene, copolymer of polyvinylidene fluoride and hexafluoropropylene, polyurethane or polyacrylate.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Process: The pH value of resulting mixture is adjusted using aqueous ammonia.    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The binder used for preparing perovskite oxide crystal is 6% polyvinyl alcohol solution. The addition amount of polyvinyl alcohol solution is 5 %mass.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The isolation layer contains phosphorus oxide.    TECHNOLOGY FOCUS - METALLURGY - The negative electrode contains a lithium element and the copper element.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Arrangement: The negative electrode further includes layered material made of graphene. The positive electrode includes core particles with diameter of 1 mu m or more. The secondary battery further has ion transmission component (30) configured to transmit ions between the negative electrode and positive electrode, and a hole transmission component (40) configured to transmit holes between the negative electrode and positive electrode.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The primary particles are preferably made of lithium. The secondary particles are preferably made of silicon oxide.    TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Component: The hole transmission component is composed of nonwoven cloth supporting a ceramic material.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The carbon fiber fabric is carbon fiber paper, carbon fiber felt and carbon fiber sheet. The precursor lead cationic salt is lead nitrate, lead sulfate and lead acetate.
TECHNOLOGY FOCUS - METALLURGY - The rectangular tube is selected from any one of material such as aluminum, copper and stainless steel. The heat diffusion guide vane is selected from any one of material such as copper, aluminum, silicon glue and graphite. The electrode and expansion bolt are selected from any one of material such as aluminum and copper.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Process: The method further involves etching the metal to obtain self-supported film on the primary layer, cutting the self-supported film, and then coating a secondary layer comprising the active material particles on the self-supported film.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: Reducing agent is used during manufacture of electrical appliance. The two-dimensional carbon comprises 1-10 sheets of graphene. The solution is aqueous solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Components: The lithium ion battery comprises positive electrode active material comprising lithium-nickel-manganese-cobalt-oxide-fluoride (Li(1+x)NiaMnbCocAdO(2-z)Fz), where x is 0.01-0.3, a is 0-0.4, b is 0.2-0.65, c is 0-0.15, z is 0-0.2, provided that a and c are not zero, A is magnesium, strontium, barium, cadmium, zinc, aluminum, gallium, boron, zirconium, titanium, calcium, cerium, yttrium, niobium, chromium, iron, vanadium, and lithium.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - The coolant is selected from acetone, methanol, ammonia, N-heptane, tetrafluoroethane and fluorocarbons.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Component: The zirconium-containing precursor is zirconium hydrogen phosphate dihydrate.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The silicon-containing material is silicon composite having microcrystalline or fine particles dispersed in the structure with different material compositions of the silicon. The silicon composite component is silicon oxide of formula: SiOx. The microcrystal of silicon or microparticles, and compositionally different substances are silicon-type compound which is silicon dioxide. A film is obtained by applying a coating of conductive material on silicon-containing material. The conductive material is carbon.x=0.9-1.6.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The BET specific surface area of the alloy is preferably 10-35 m2/g.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The average particle diameter of secondary particles is 0.4-10 mu m.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The half value width of diffraction peak of the plane (111) of silicon at angle (2( theta )) of 24-33 degrees , is preferably 1.4 degrees or more.
TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The organic polymer porous component is formed by precipitating solution containing organic polymer and metal.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Property: The average degree of polymerization of crosslinked polyacrylate is 3000-30000.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The negative electrode active material is chosen from carbon material, metallic lithium, lithium alloy and metal oxide. The positive electrode active material is chosen from metal oxide having lithium element, polyanion-based compound and sulfur-type compound. Preferred Property: The volume mol concentration of lithium bis(fluorosulfuryl)imide is preferably 3.5-5 mol/L.
TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The acidic radical or its derivative(s) is of formula: -Z(O)a(OR)b. The polymer compound is of formula (I), (II), (III) or (IV). The polymer compound further comprises a crosslinking component of formula (A) or (B).Z=P or S;R=H, alkali metal, Mg, alkaline-earth metal, alkyl, or aryl;Y2=spacer;Y3=-CO2-C6H4-C6H4-CO2-, -CO2-C6H4-SiMe2-C6H4-CO2-, -CO2-C6H4-C(CH3)2-C6H4-CO2-, -CO2-C6H10-CO2-, or -CO2-(CH2)n-CO2-;andn=2 or 4.(i) When Z is P, a is 1 and b is 2; and (ii) When Z is S, a is 2 and b is 1.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The compound (B) is chosen from sulfate, carbonate, phosphate and carboxylate. The polymer electrolyte composition further contains radical scavenging agent (C).    TECHNOLOGY FOCUS - POLYMERS - Preferred Composition: The polymer electrolyte (A) is of formula: -(CF2CX1X2)a-(CF2-CF(-O-(CF2-CF(CF2X3))b-Oc-(CFR1)d-(CFR2)e-(CF2)f-X4))g- (I).X1-X3=halo or 1-3C perfluoroalkyl;a=0-1 (excluding 1);g=0-1 (excluding 0);a+g=1;b=0-8;c=0 or 1;d,e=0-6;f=0-10;d+e+f=more than 0;R1,R2=halo, 1-10C perfluoroalkyl or fluorochloroalkyl;X4=COOZ, SO3Z, PO3Z2 or PO3HZ;Z=H, alkali metal atom, alkaline-earth metal atom, NH4, NH3R3, NH2R3R4, NHR3R4R5 and NR3R4R5R6;andR3-R6=alkyl or aryl.
TECHNOLOGY FOCUS - CHEMICAL ENGINEERING - Preferred Component: The manufacturing apparatus of the conductor wire further consists of guide portion (202) which peels and guides the carbon nanofiber aggregate from the substrate, and regulation portion (203) which regulates motion of front-end portion of carbon nanofiber aggregate which is peeled from substrate by the guide portion.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Process: During collection process, the carbon nanofiber aggregate is peeled from the substrate, and carbon nanofibers are withdrawn from front-end portion of the carbon nanofiber aggregate, by regulating motion of front-end portion of the carbon nanofiber aggregate which is peeled from the substrate. Withdrawing process is carried out, while rotating the carbon nanofibers around drawing-out direction from the carbon nanofiber aggregate. The collection portion is capable of rotating the carbon nanofibers withdrawn from the carbon nanofiber aggregate around the drawing-out direction.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The aqueous solution containing nickel and cobalt is sulfate or chloride aqueous solution.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Property: The metal catalyst has diameter of 1.5-2.5 nm. Preferred Component: The carbon-based catalyst support is activated carbon, carbon black, carbon nanotube and/or graphene.    TECHNOLOGY FOCUS - METALLURGY - Preferred Composition: The transition metal precursor is platinum, palladium, ruthenium, cobalt, nickel, tungsten and/or titanium. The content of transition metal precursor is 0.01-10 mg/ml.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The chelating agent is ethylenediaminetetraacetic acid, ethylene glycol tetraacetic acid, ethylenediamine, diethylenetriamine, tetraethylenepentamine, pentaethylenehexamine, dipropylenetriamine, tripropylenetetramine, tetrapropylenepentamine, pentapropylenehexamine, vitamin C, (2-aminoethyl)propanediamine, or (2-amino-propyl)ethylenediamine. The mass ratio of carbon-based catalyst support and chelating agent is 1:1-10.5. The solvent (a) is ethanol, methanol, ethylene glycol, diethylene glycol and/or triethylene glycol. The solvent (b) is urea, ethylene glycol, diethylene glycol or triethylene glycol. The reducing agent is sodium hydride, hydrazine, sodium hydroxide and/or formaldehyde.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The diamine component is of formula (I) or (II) or formula: H2N-R5-NH2 (III). The diamine component of formula (II) is preferably m-xylylene diamine. The diamine component of formula (III) is preferably 1,6-hexamethylenediamine, 1,9-nonanediamine, 2-methyl-1,8-octanediamine, or 1,12-dodecanediamine. The diamine component comprises 1,9-nonamethylene diamine and 2-methyl-1,8-octamethylenediamine.R1-R4=hydrocarbyl;andR5=linear or branched 4-12C bivalent hydrocarbyl.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Arrangement: The separator is arranged between the positive electrode and the negative electrode. The thickness of the insulating layer is 20 mu m or less along thickness direction of the separator.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The nonaqueous electrolyte comprises difluoro lithium phosphate. The content of difluoro lithium phosphate is 0.05-1 %mass. The insulating layer is porous layer containing inorganic oxide.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The cyclic sulfate compound (I) is 4-(2,2-dioxo-1,3,2-dioxathiolan-4-yl)-1,3,2-dioxathiolane-2,2-dione, (2,2-dioxo-1,3,2-dioxathiolan-4-yl)methyl methanesulfonate, or 4-propyl-1,3,2-dioxathiolane-2,2-dione. The disulfonate compound (II) is 1,5,2,4-dioxadithiane-2,2,4,4-tetrone, 1,5,2,4-dioxadithiepane-2,2,4,4-tetrone or 3H-1,5,2,4-benzodioxadithiepine-2,2,4,4-tetrone. The content of cyclic sulfate compound (I) or cyclic disulfonate compound (II) is 0.01-2 %mass.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The sulfide solid electrolyte material comprises lithium-phosphorus sulfide of formula: Li5x+2y+3P1-xS4, preferably Li5x+3P1-xS4 where x is 0-0.2, preferably 0.1-0.2, and y is more than 0 to 0.3 or less. The sulfide solid electrolyte material further has a peak in position of 2( theta ) of 24.60 plus minus 0.50 degrees .
TECHNOLOGY FOCUS - TEXTILES AND PAPER - Preferred Composition: The fibrous structure includes fiber of perfluorosulfonic acid-type polymer and/or fiber of fluorocarbon-type polymer. The content of perfluorosulfonic acid-type polymer is 0.25-4 times the content of fluorocarbon-type polymer. Preferred Component: The nonwoven fabric is buried in inside the electrolytic membrane at a depth of 2 times or more of the diameter of the fibrous structure. The nonwoven fabric is contained in an area which is 10% or more of the thickness of the catalyst layer, and 90% or less from the interface of the electrolytic membrane and the catalyst layer. The nonwoven fabric is contained in both catalyst layers, and is arranged only at the cathode electrode side.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The content of 330-mesh sieve residue is 0.1 %mass or less. Preferred Process: The titanium raw material and lithium compound are wet-ground, dried, granulated, baked at 600-950 degrees C, to obtain lithium titanate, which is further dry-ground. Preferred Properties: The 50% cumulative particle diameter of lithium titanate before pulverizing is 0.5-50 mu m, preferably 0.1-5 mu m. The BET specific surface area of lithium titanate granules or lithium titanate powder is 5-50 m2/g. The 50% cumulative particle size of titanium raw material is 0.5-3 mu m, after wet-grinding.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - The PVA solution of a of no-load fuel electrode voltage ring has a wt.% of 13% elvanol 75-15 PVA powder (dry) and 87% de-ionized (DI) water.    TECHNOLOGY FOCUS - POLYMERS - The fuel assembly has a no-load fuel electrode voltage ring in which has a sheet with wt.% of 29.66% poly vinyl alcohol (PVA) solution, 69.84% nickel powder, and 0.5% ceria powder.
TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Composition: The polyol is alcohol having functionality of 2-3, preferably ethylene glycol, propylene glycol, diethylene glycol, tetraethylene glycol, 1,4-butanediol, glycerol, trimethylolethane, trimethylolpropane and/or 2-methyl-propanetriol.
TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Compositions: Moisture content within the battery case is 104-248 ppm during battery assembly. Amount of sulfonic acid compound in non-aqueous electrolyte is prepared so that it may be set to 9-21 mu mol of unit surface area (1 m2) contact of the positive electrode active material, and amount of vinylene carbonate compound in non-aqueous electrolyte is prepared so that it may be set to 2.2-6.9 mu mol with respect to 1 mu mol of sulfonic acid compounds. Preferred Parameters: Positive electrode and negative electrode have opposed through a separator, and R value which divides thickness T ( mu m) of separator by air permeability G (s/100 ml) 0.1-0.28. Charge process is performed at charge rate of 0.6-1 C to voltage of greater than or equal to 3.95 V.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Components: Sulfonic acid compound is an alkyne sulfonic acid compound of formula R1SO2-O-C(R2)(R3)-CC-C(R4)(R5)-O-SO2R1 (I). Vinylene carbonate compound is vinylene carbonate.R1=1-12C alkyl, 3-6C cycloalkyl, 6-12C aryl, or 1-10C perfluoroalkyl; andR2-R5=H or 1-4C alkyl.
TECHNOLOGY FOCUS - ELECTRICAL POWER AND ENERGY - Preferred Processes: In 1st charging process, constant current charging is performed until electric potential (vs. Li/Li+) of negative electrode reaches 0.9-2.4 V. In 2nd charging process, constant current charging is performed until electric potential (vs. Li/Li+) of negative electrode reaches minimum discharge electric potential. Preferred Parameters: Charge rate in 1st charging process and 2nd charging process is set to 0.1-0.5 C. Preferred Conditions: Holding time is 10 minutes to 2 hours.    TECHNOLOGY FOCUS - ORGANIC CHEMISTRY - Preferred Compositions: Ethylene carbonate, dimethyl carbonate, and ethyl methyl carbonate are contained in non-aqueous electrolyte as non-aqueous solvent. Amount of ethylene carbonate in non-aqueous solvent is 20-40 vol.%. Alkyne sulfonic acid compound is 2-butyne-1,4-diol di(methane sulfonate) and/or 2-propynyl-2-(methylsulfonyloxy)propanoic acid. Addition amount of alkyne sulfonic acid compound is 0.1-2 mass% with respect to total amount of non-aqueous electrolyte. Vinylene carbonate is used as vinylene carbonate compound. Addition amount of vinylene carbonate compound is 0.5-7 mass% with respect to total amount of non-aqueous electrolyte.