NOVELTY - The apparatus (2a,2b) has a mask retainer board (210) that holds a mask (M) including a magnetic material with a first magnet. A substrate retainer board (220) holds a substrate (G) by a second magnet or an electrostatic chuck. An alignment mechanism aligns substrate and mask. The mask is positioned and mask retainer board is carried in to a vacuum chamber in a state of holding first magnet. The alignment mechanism aligns the positioned mask and substrate. The substrate retainer board holds substrates aligned by alignment mechanism and the masks by second magnet or chuck.    USE - Holding apparatus of film-forming apparatus such as cluster type vacuum device or in line type vacuum device (all claimed) for conveying substrate used for electroluminescent element of organic EL device, Can also be used for conveying substrate for flat panel display, solar cell, and mobile telephone.    ADVANTAGE - The substrate retainer board holds substrates aligned by alignment mechanism and the masks by second magnet or chuck such that the alignment mechanism aligns the positioned mask and substrate. Thus, the mask and substrate are conveyed efficiently at reduced tact-time so as to improve productivity of holding apparatus. Since shape is corrected by the substrate retainer board, the fine mask and the substrate obtains the stable plane by the substrate retainer board. Thus, the bending of substrate and the characteristics of the large sized fine mask are prevented effectively. Hence, the occurrence of pattern blur is eliminated. The connection of power supply to the electrostatic chuck provided in the substrate retainer board with a wire communication is not necessary. Thus, the fall of substrate in film-forming is prevented while allowing movement of substrate retainer board and designing of conveyance path easily.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following:    (1) a film-forming apparatus; and    (2) a method for conveying mask and substrate.    DESCRIPTION OF DRAWING(S) - The drawing shows a block diagram of the film-forming apparatus of in line type. (Drawing includes non-English language text)    Holding apparatus (2a,2b)    Mask retainer board (210)    Substrate retainer board (220)    Substrate (G)    Mask (M)