NOVELTY - Forming conductive film, comprises exposing substrate (102) to monomer source according to a first process protocol, where: substrate has first layer (104) disposed on it; first layer has composition comprising oxidant; monomer source polymerizes first layer to form poly(3,4-ethylenedioxythiophene) film with conductivity of greater than or equal to 300 S/cm; composition is formulated to neutralize acid that develops during polymerization without inhibiting polymerization of poly(3,4-ethylenedioxythiophene) film; and in first process protocol, exposure temperature is less than or equal to 60 degrees C and exposure time is less than or equal to 60 minutes.    USE - The method is useful for forming a conductive film (claimed), which is useful in solar cells.    ADVANTAGE - The method provides the conductive film, which: exhibits improved conductivity, optical transparency, and resistivity under cycling; has a crystalline structure that is highly defined, or well-structured; and is deformable and flexible.    DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for:    (1) a film, comprising a crystalline structure comprising poly(3,4-ethylenedioxythiophene), where the crystalline structure exhibits an x-ray diffraction pattern having a diffraction intensity with a first peak and a second peak that is smaller than the first peak, and the first peak and the second peak occur at a diffraction angle of 25 2 theta and 12.5 2 theta , respectively; and    (2) a device (100) comprising the substrate, and the film disposed on the substrate, where: the film has a first region (106) and a second region (108) formed between the substrate and the first region; the first region comprises poly(3,4-ehtylenedioxythiphene); the second region comprises the oxidant; and the first region has a conductivity that is greater than the second region.    DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of the device that utilizes conductive films and/or material layers.    Device (100)    Substrate (102)    First layer (104)    First region (106)    Second region (108)