NOVELTY - The method comprises forming an inorganic oxide layer on a surface of a first substrate, coating a carbon dispersion on the inorganic oxide layer, drying the carbon dispersion to form a carbon conductive film (15) on the inorganic oxide layer, dipping the carbon conductive film into a solvent to separate the carbon conductive film and the inorganic oxide layer, and attaching the separated carbon conductive film to a second substrate (17) for transferring the carbon conductive film onto the second substrate. The inorganic oxide layer has a total surface energy of 30-75 mJ/m2.    USE - The method is useful for transferring a carbon conductive film (claimed) from one substrate to another substrate for flat displays, touch panels, photovoltaics and flexible electronic applications.    ADVANTAGE - The method is capable of completely and uniformly transferring the carbon nanotube conductive film without affecting the flexibility, climate resistance and natural color of the conductive film.    DETAILED DESCRIPTION - The method comprises forming an inorganic oxide layer on a surface of a first substrate, coating a carbon dispersion on the inorganic oxide layer, drying the carbon dispersion to form a carbon conductive film (15) on the inorganic oxide layer, dipping the carbon conductive film into a solvent to separate the carbon conductive film and the inorganic oxide layer, and attaching the separated carbon conductive film to a second substrate (17) for transferring the carbon conductive film onto the second substrate. The inorganic oxide layer has a total surface energy of 30-75 mJ/m2, and a dispersive surface energy to the total surface energy ratio of 0.4-0.8. The step of forming the inorganic oxide layer on the surface of the first substrate comprises coating a dispersion of inorganic oxide particles on the surface of the first substrate, and drying the dispersion of the inorganic oxide particles to form the inorganic oxide layer, and is performed by evaporation deposition method, sputtering deposition method, chemical vapor deposition method, or physical vapor deposition method. The inorganic oxide particles are sol in solvent phase. The inorganic oxide particles have a size of 2-200 nm. The carbon dispersion has a carbon material concentration of 0.001-2 wt.%. The step of drying the carbon dispersion is performed at a temperature of 60-140 degrees C for 30 seconds to 1 hour. The second substrate comprises glass, plastics, synthetic resin, or metal. The second substrate comprises a non-planar substrate. The method further comprises applying an adhesive layer (19) on a surface of the carbon conductive film, where the carbon conductive film is disposed between the adhesive layer and the second substrate, attaching a third substrate (21) to the adhesive layer and then curing the adhesive layer for transferring the carbon conductive film onto the third substrate, and removing the second substrate. The step of curing the adhesive layer comprises thermal curing, photo curing, moisture curing, or pressure curing. The third substrate comprises a non-planar substrate.    DESCRIPTION OF DRAWING(S) - The diagram shows a schematic view of a process of transferring a carbon conductive film from the second substrate to a third substrate.    Carbon conductive film (15)    Second substrate (17)    Adhesive layer (19)    Third substrate. (21)