TECHNOLOGY FOCUS - ELECTRONICS - Preferred Process: The solar cell substrate, optionally after deposition of layer(s) is subjected to pre-treatment, in-situ and post deposition inclusion of pre-cursor, molecule, polymer and mixtures/additives as coating to provide passivation, anti-reflective and other enhanced performance properties for improvement of silicon and silicon nitride (SiNx:H, where x is not defined) as anti-reflection/passivation coating. The photovoltaic device is treated to improve front and back side contact characteristics with, precursor, molecule, polymer and mixture/additive as coatings to provide passivation, anti-reflective and other enhanced performance layers.    TECHNOLOGY FOCUS - INORGANIC CHEMISTRY - Preferred Composition: The solar cell substrate comprises n-type or p-type silicon substrate. Hydrogen release and passivating layer in the device comprises silicon, oxygen and hydrogen for emitter of p-type solar cell and for back side of n-type solar cell, silicon, carbon and hydrogen for emitter of p-type solar cell and for back side of n-type solar cell, silicon, carbon, oxygen and hydrogen for emitter of p-type solar cell and for back side of n-type solar cell, aluminum, oxygen and hydrogen for back side of p-type solar cell or for front side of n-type solar cell, titanium, oxygen and hydrogen for back side of p-type solar cell or for front side of n-type solar cell, or aluminum, titanium, oxygen and hydrogen for back side of p-type solar cell or for front side of n-type solar cell.    TECHNOLOGY FOCUS - POLYMERS - Preferred Process: The functional layer is formed from chemical substance chosen from precursor, molecule, polymer and/or intermediate by deposition, preferably chemical deposition, more preferably liquid phase deposition, a sub-atmospheric deposition, atomic layer deposition, spray coat deposition, roller coat deposition, dip coat deposition, slot coat deposition, or screen print or silk screen coat deposition on front and/or back side of the substrate. The chemical deposition is activated, such that hydrogen is introduced into the bulk as well as onto surface of the photovoltaic device. The hydrogenation and passivation of the photovoltaic device is achieved. During production of photovoltaic device, the layer is activated when brought into contact with the surface, after thermal process, after irradiation with ultraviolet, visible or infrared radiation, when introduced into activating atmosphere, contacted on photovolatic device with chemical substance already deposited on the surface, contacted with the device following pre-treatment of the surface enabling the chemical to become activated, activated by depositing secondary chemical substance onto the layer, during the deposition process onto the surface and/or activated when exposed to an ultrasonic process, and additional layer(s) having properties of passivation, anti-reflection and other properties enhanced performance is formed on the substrate, either between substrate and the functional layer or on top of the functional layer. The functional layer exhibits a chemical substance having a hydrogen moiety in composition in which hydrogen is capable of being released then during further processing of photovoltaic device to provide hydrogenation and passivation of the device. The polymer and its intermediates are formed using hybrid silane and metal oxide monomer. The hydrogen release and passivating layer is formed by polymerizing siloxane of formula: Si(OR1)4 (I) and/or HSi(OR1)3 (II). The passivating layer contains aluminum oxide formed by polymerizing aluminum isopropoxide and titanium isopropoxide and siloxane (II), titanium oxide formed by polymerizing titanium isopropoxide, siloxane (II) and titanium chloride, or aluminum oxide and silicon oxide hybrid formed by polymerizing siloxane (II) and aluminum isopropoxide.R1=alkyl, preferably linear or branched 1-4C alkyl.Preferred Properties: The functional layer has thickness of 1-1000 nm, preferably 5-250 nm. The functional layer comprises siloxane or metal oxide coating material having molecular weight of 400-150000 g/mol, preferably 500-100000 g/mol, more preferably 750-50000 g/mol. Preferred Composition: The functional layer comprises silane, carbosilane, hybrid organic-inorganic polymer or its intermediate. The polymer or intermediate has siloxane backbone containing 4-10000, preferably 10-5000 repeating units of formula: -Si-C-Si- O, -Si-O- and/or -Si-C-Si-Containing and backbone comprising repeating unit of formula: -Si-O-M-O, where M is metal atom chosen from titanium, tantalum and aluminum.